Device with a laminated structure and method of manufacturing a laminated structure comprising dielectric layers
FR3158590A1Pending Publication Date: 2025-07-25STMICROELECTRONICS INT NV
Patent Information
- Application Number
- FR2024000510
- Authority / Receiving Office
- FR · FR
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-01-18
- Publication Date
- 2025-07-25
Abstract
TITLE: Device with a laminated structure and method for manufacturing a laminated structure comprising dielectric layers The present description relates to a method for manufacturing a laminated structure (100) comprising one or more metal tracks, the method comprising: depositing on a substrate (104) a first layer of a first dielectric material (106); forming one or more openings (108) in the first layer; and depositing a second dielectric material (112), with dielectric properties distinct from the dielectric properties of the first dielectric material, at the location of the openings made in the first layer. Figure for abstract: Fig. 1A
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Citation Information
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