Transportation device and transportation method

Abstract

To transport a cryopump safely and efficiently.SOLUTION: A transport device 10 comprises: a cart 12 having front wheels 26 and rear wheels 28; a mast 14 extending vertically from the front side of the cart 12; a lifting section 16 supported by the mast 14 and whose height is adjustable; a guide rail 18 extending forward from the lifting section 16; an arm 20 supported by the guide rail 18 and capable of sliding in the fore-and-aft direction; a loading platform 22 provided at the tip 46 of the arm 20 and holding a cryopump 70; and a counterweight 24 provided at the rear side of the cart 12.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a transportation device and a transportation method for transporting a cryopump. [Background technology]

[0002] Cryopumps are used in vacuum process equipment that requires a high vacuum, and are used to provide a high vacuum inside a vacuum vessel. One example of a vacuum process equipment is a semiconductor manufacturing equipment for processing semiconductor wafers. For example, a cryopump is attached to the side wall of a vacuum processing chamber in which the semiconductor wafers are processed. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2022-83523 Summary of the Invention [Problem to be solved by the invention]

[0004] In recent years, the size of semiconductor wafers has increased, and the vacuum processing chamber that houses the semiconductor wafers also tends to become larger. Since various devices for processing semiconductor wafers are arranged around the vacuum processing chamber, the space available for installing a cryopump is limited, and for example, it may be installed at a high position on the upper part of the vacuum processing chamber. In addition, as the vacuum processing chamber becomes larger, a large cryopump with higher exhaust performance may be used. When a large and heavy cryopump is installed at a high position, it is not easy to safely and efficiently perform the work of attaching and detaching the cryopump for maintenance. For example, it is laborious to use the limited space around the vacuum processing chamber to set up a temporary scaffolding, etc. In addition, if the maintenance work time is extended by setting up scaffolding, etc., the downtime of the semiconductor manufacturing equipment is extended, leading to a decrease in productivity.

[0005] An exemplary object of an embodiment of the present invention is to provide a technique for transporting a cryopump safely and efficiently. [Means for solving the problem]

[0006] One aspect of the present invention is a transport device for transporting a cryopump, the transport device including a cart having front and rear wheels, a mast extending in a height direction from a front side of the cart, a lifting section supported by the mast and capable of changing its height, a guide rail extending forward from the lifting section, an arm supported by the guide rail and capable of sliding in a front-rear direction, a load receiving platform provided at the tip of the arm for holding the cryopump, and a counterweight provided at the rear side of the cart.

[0007] Another aspect of the present invention is a method for transporting a cryopump using the transport apparatus of the aspect, the method including the steps of holding the cryopump on a load receiving platform, moving a dolly, changing the height of the lifting section, sliding an arm, and removing the cryopump from the load receiving platform.

[0008] Any combination of the above components or mutual substitution of the components or expressions of the present invention between methods, devices, systems, etc. are also valid as aspects of the present invention. Effect of the Invention

[0009] According to an aspect of the present invention, a cryopump can be transported safely and efficiently. [Brief description of the drawings]

[0010] [Figure 1] FIG. 2 is a side view showing a schematic configuration of a transport device according to an embodiment. [Diagram 2] FIG. 2 is a top view illustrating a schematic configuration of a transport device according to an embodiment. [Diagram 3] FIG. 2 is a front view showing a schematic configuration of the load receiving platform. [Figure 4]FIG. 1 is a side view illustrating a schematic configuration example of a vacuum process device. [Diagram 5] 11A to 11C are top views each showing a schematic diagram of a process for attaching and detaching a cryopump to and from a vacuum processing chamber. [Figure 6] 1 is a flowchart illustrating an example of a conveying method according to an embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, the embodiment of the present invention will be described in detail. Note that the configuration described below is an example and does not limit the scope of the present invention in any way. In addition, in the description of the drawings, the same elements are given the same reference numerals, and duplicated descriptions are omitted as appropriate. In addition, in the drawings referred to in the following description, the size and thickness of each component are for convenience of explanation, and do not necessarily indicate the actual dimensions or ratios.

[0012] Fig. 1 is a side view showing a schematic configuration of a transfer device 10 according to an embodiment. Fig. 2 is a top view showing a schematic configuration of the transfer device 10 according to an embodiment. The transfer device 10 is used to transfer a cryopump 70 shown in Fig. 1. Fig. 2 shows a state in which the cryopump 70 has been removed.

[0013] The cryopump 70 includes a cryopanel vessel 72, a connection vessel 74, and a refrigerator 76. The cryopanel vessel 72 is a portion that houses a cryopanel that is cooled to an extremely low temperature (e.g., 10K to 20K), and is a portion that is attached to a vacuum process apparatus via a flange 78. The cryopanel vessel 72 is a cylindrical vacuum vessel. The connection vessel 74 is a vacuum vessel that is provided on the side of the cryopanel vessel 72 and connects between the cryopanel vessel 72 and the refrigerator 76. The refrigerator 76 cools the cryopanel provided inside the cryopanel vessel 72 via the connection vessel 74.

[0014] The weight of the cryopump 70 depends on the size and performance, but is, for example, about 20 kg to 100 kg. Therefore, from the standpoint of safety and efficiency, it is not preferable for a human being to directly hold the cryopump 70 in his / her hands and move or raise and lower it.

[0015] The transfer device 10 is a device for moving and lifting the cryopump 70, which is a heavy object, and is a so-called power lifter. The transfer device 10 is configured to hold, for example, a cryopanel container 72 of the cryopump 70. The transfer device 10 includes a cart 12, a mast 14, a lifting section 16, a guide rail 18, an arm 20, a load receiving platform 22, and a counterweight 24.

[0016] The dolly 12 has front wheels 26 and rear wheels 28 for traveling on a ground surface G. In this embodiment, a direction A from the rear wheels 28 toward the front wheels 26 may be referred to as the forward direction, and a direction B from the front wheels 26 toward the rear wheels 28 may be referred to as the rear direction. A height direction H is a direction perpendicular to the ground surface G on which the dolly 12 travels.

[0017] A mast 14 is provided on the front side of the dolly 12. A lifting handle 30 for moving the lifting unit 16 in the height direction H along the mast 14 is provided on the front side of the dolly 12. Here, the front side of the dolly 12 refers to a position closer to the front wheels 26 than to the rear wheels 28. By manually operating the lifting handle 30, the height of the lifting unit 16 can be adjusted.

[0018] A steering wheel 32 for controlling the direction of the rear wheels 28 is provided at the rear side of the dolly 12. By operating the steering wheel 32 to drive the rear wheels 28, the direction of the dolly 12 can be changed, for example, around the front wheels 26. A counterweight 24 is provided at the rear side of the dolly 12. The weight of the counterweight 24 is, for example, 200 kg or more and 1000 kg or less, for example, 300 kg or more and 800 kg or less. The counterweight 24 is disposed between the front wheels 26 and the rear wheels 28, and is provided at a position close to the rear wheels 28 (i.e., a position farther from the front wheels 26). Here, the rear side of the dolly 12 refers to a position closer to the rear wheels 28 than to the front wheels 26.

[0019] The mast 14 is supported by the dolly 12 and extends from the dolly 12 in a height direction H. As shown in FIG. 2, a pair of masts 14 may be provided, disposed on the left and right of the dolly 12. The mast 14 may be configured to be slidable in the front-rear direction with respect to the dolly 12. The mast 14 may be configured so that its position in the front-rear direction can be adjusted between the front end of the dolly 12 (e.g., the position of the front wheels 26) and the vicinity of the center of the dolly 12, and may be configured so that its position in the front-rear direction can be fixed by a stopper (not shown). The height of the mast 14 (e.g., height h from the ground G) is, for example, 2 m or more and 3 m or less, e.g., about 2.5 m.

[0020] The lifting / lowering unit 16 is supported by the mast 14 and configured to move in a height direction H along the mast 14 so that its height can be changed. The lifting / lowering unit 16 is configured to be lifted and lowered by, for example, a hydraulic pump (not shown) that is operated by manually operating a lifting / lowering handle 30. The lifting / lowering unit 16 may also be configured to be lifted and lowered by an electric hydraulic pump or an electric motor.

[0021] The guide rail 18 is supported by the lifting / lowering unit 16 and extends linearly forward from the lifting / lowering unit 16. The guide rail 18 supports the arm 20 so that the arm 20 is slidable in the front-rear direction. The length L0 (see FIG. 2) of the guide rail 18 in the front-rear direction is, for example, 0.5 m or more and 1.5 m or less, for example, 0.7 m or more and 1.0 m or less. An end of the guide rail 18 is fixed to the lifting / lowering unit 16. When the height of the lifting / lowering unit 16 is changed, the height h0 of the guide rail 18 is also changed.

[0022] For example, the entire guide rail 18 can be positioned forward of the front wheels 26. As a result, no structure that comes into contact with the ground G to support the transport device 10 exists between the ground G and the guide rail 18, and a freely usable space S is created. The height h1 of the guide rail 18 can be adjusted according to the height of the lifting unit 16, for example, within a range of 0.2 m to 2.5 m.

[0023] The arm 20 is supported by a guide rail 18 and configured to be slidable in the front-rear direction along the guide rail 18. The arm 20 can be configured as a multi-joint arm. In the example shown in Figs. 1 and 2, the arm 20 includes a first arm member 34, a second arm member 36, and a third arm member 38. The first arm member 34 and the second arm member 36 are rotatably connected by a first joint 40. The second arm member 36 and the third arm member 38 are rotatably connected by a second joint 42. The arm 20 may include two arm members, or may include four or more arm members. The arm 20 may be configured without a joint.

[0024] The first arm member 34 is a portion supported by the guide rail 18. The length L1 of the first arm member 34 is, for example, 0.5 m or more and 1.5 m or less, for example, 0.7 m or more and 1.0 m or less. The length L1 of the first arm member 34 is, for example, approximately the same as the length L0 of the guide rail 18. This allows almost the entire first arm member 34 to be accommodated inside the guide rail 18, and the distance from the lifting unit 16 to the tip end of the first arm member 34 (for example, the first joint 40) can be approximately the same as the length L0 of the guide rail 18. In addition, almost the entire first arm member 34 can be drawn out to the outside of the guide rail 18, and the distance from the lifting unit 16 to the tip end of the first arm member 34 (for example, the first joint 40) can be approximately twice the length L0 of the guide rail 18. The position of the first arm member 34 relative to the guide rail 18 is configured to be fixed using a fixing pin 44.

[0025] The second arm member 36 is attached to the tip of the first arm member 34. The length L2 of the second arm member 36 is, for example, shorter than the length L1 of the first arm member 34. The length L2 of the second arm member 36 is, for example, 0.2 m or more and 1.0 m or less, for example, 0.3 m or more and 0.7 m or less. The second arm member 36 is attached to the first arm member 34 via a first joint 40 and configured to be rotatable relative to the first arm member 34. The first joint 40 is configured to be rotatable around an axis extending in the height direction. As a result, the second arm member 36 is rotatable in the left-right direction relative to the tip of the first arm member 34.

[0026] The third arm member 38 is attached to the tip of the second arm member 36. The length L3 of the third arm member 38 is, for example, shorter than the length L2 of the second arm member 36. The length L3 of the third arm member 38 is, for example, 0.1 m or more and 0.7 m or less, for example, 0.2 m or more and 0.5 m or less. The third arm member 38 is attached to the second arm member 36 via a second joint 42 and configured to be rotatable relative to the second arm member 36. The second joint 42 is configured to be rotatable around an axis extending in the height direction. As a result, the third arm member 38 is rotatable in the left-right direction relative to the tip of the second arm member 36.

[0027] The first joint 40 may be disposed between the first arm member 34 and the second arm member 36 and may include a sliding spacer for smoothing the rotation of the second arm member 36 relative to the first arm member 34. Similarly, the second joint 42 may be disposed between the second arm member 36 and the third arm member 38 and may include a sliding spacer for smoothing the rotation of the third arm member 38 relative to the second arm member 36. In other words, the sliding spacer may be provided between the two arm members connected at the joint. As the sliding spacer, for example, a resin spacer made of fluororesin or the like may be used.

[0028] The receiving platform 22 is provided at the tip 46 of the arm 20 (e.g., the tip of the third arm member 38) and is configured to hold the cryopump 70. The receiving platform 22 is, for example, fixed to the tip 46 of the arm 20 so as not to rotate relative to the tip 46. The receiving platform 22 may be attached so as to be rotatable relative to the tip 46 of the arm 20 via a joint or the like. The receiving platform 22 may be rotatable relative to the tip 46 of the arm 20 about an axis in the height direction H, or may be rotatable about an axis in the horizontal direction (e.g., the front-rear direction).

[0029] 3 is a front view showing a schematic configuration of the load receiving platform 22, as viewed in the direction in which the tip 46 of the arm 20 extends (front-rear direction). The load receiving platform 22 has an inner surface 48 having a concave shape for receiving the side of the cylindrical cryopanel vessel 72. A protective member 50 can be provided on the inner surface 48 of the load receiving platform 22 at a location that may come into contact with the cryopump 70. The protective member 50 is formed of a resin plate, for example, made of fluororesin or the like.

[0030] A grip handle 54 is provided on the outer surface 52 of the load receiving platform 22, which is gripped by a user to adjust the position and orientation of the load receiving platform 22. For example, a pair of grip handles 54 can be provided on the left and right sides of the load receiving platform 22. A through hole 56 is provided between the outer surface 52 of the load receiving platform 22 and the grip handle 54. A fixing device 60 (see FIG. 1 ), such as a fastening band for fixing the cryopump 70 to the load receiving platform 22, can be passed through the through hole 56. In this case, the grip handle 54 can function as a locking portion for locking the fixing device 60. Note that a cutout may be provided instead of the through hole 56.

[0031] The transport device 10 may further include outriggers (not shown) that can be extended laterally from the carriage 12. The outriggers can be provided so as to extend laterally from the front of the carriage 12 (for example, from a position near the front wheel 26). The outriggers may be provided so as to extend laterally from the mast 14. The outriggers are configured, for example, to be stored when the carriage 12 is traveling, and to extend and contact the ground G when the carriage 12 is stopped and the arm 20 is operated, thereby supporting the carriage 12. The outriggers can reduce the risk of the transport device 10 tipping over in the left-right direction.

[0032] The transport device 10 can hold the cryopump 70 at a position away from the carriage 12 and the mast 14 by using the guide rail 18 and the arm 20 extending forward from the lifting unit 16. The distance from the mast 14 to the load receiving platform 22 is, for example, 1.5 m or more and 5 m or less, for example, 2 m or more and 4 m or less, when the arm 20 is fully extended from the guide rail 18. The transport device 10 can adjust the position of the load receiving platform 22 in the front-rear direction by sliding the arm 20 relative to the guide rail 18. The transport device 10 can adjust the position of the load receiving platform 22 in the left-right direction and the orientation of the load receiving platform 22 relative to the guide rail 18 by rotating the first joint 40 and the second joint 42. The transport device 10 can adjust the height position of the load receiving platform 22 by changing the height of the lifting unit 16.

[0033] Next, a description will be given of a method of using the transfer device 10. The transfer device 10 can be used, for example, to transfer a cryopump 70 that is to be removed from a vacuum process apparatus or to be attached to a vacuum process apparatus. An example of a vacuum process apparatus is an ion implantation apparatus for irradiating a semiconductor wafer with an ion beam.

[0034] Fig. 4 is a side view showing a schematic configuration example of a vacuum process apparatus 100. The vacuum process apparatus 100 shown in Fig. 4 is an ion implantation apparatus. The vacuum process apparatus 100 includes an ion beam generating device 110, a vacuum processing chamber 112, a wafer transport device 114, a load port 116, and an outer housing 118.

[0035] The ion beam generating device 110 generates an ion beam and transports the generated ion beam along a beam line 120 to a vacuum processing chamber 112. The vacuum processing chamber 112 is a vacuum container in which a high vacuum is maintained, and an ion implantation process is performed inside the vacuum processing chamber 112 by irradiating a wafer W with an ion beam. A cryopump 70 is attached to a side wall of the vacuum processing chamber 112. The wafer transfer device 114 transfers the wafer W between the vacuum processing chamber 112 and a load port 116 along a transfer line 122. The load port 116 receives a container (e.g., a FOUP) for storing the wafer W. The outer housing 118 is provided around the periphery of the ion beam generating device 110, the vacuum processing chamber 112, and the wafer transfer device 114 to surround them. The outer housing 118 includes a radiation shielding material such as lead for shielding radiation generated near the beam line 120.

[0036] In the vacuum process apparatus 100, the height h3 of the beam line 120 and the transfer line 122 related to the processing of the wafer W is often set to about 1 m to 1.5 m in consideration of user convenience and the like. In this case, various devices constituting the ion beam generating device 110 and the wafer transfer device 114 adjacent to the vacuum processing chamber 112 occupy a height position of about 1 m to 1.5 m. As a result, there is almost no space at a workable height of about 1 m to 1.5 m, and the cryopump 70 is often attached to the upper part of the vacuum processing chamber 112 where there is relatively more space. The height h4 at which the cryopump 70 is installed is, for example, about 2 m to 2.5 m. The transfer device 10 is useful for transporting the cryopump 70 installed at such a high position.

[0037] FIG. 5 is a top view showing a process of attaching and detaching the cryopump 70 of the vacuum processing chamber 112, as viewed from above the vacuum process apparatus 100 shown in FIG. 4. First, the door 124 constituting a part of the outer housing 118 is opened to secure an access opening 126 for entering the inside of the outer housing 118. Next, the transfer device 10 is moved close to the access opening 126, and the arm 20 and the guide rail 18 are inserted into the inside of the outer housing 118 through the access opening 126. Since the rail 128 for supporting the door 124 is present at the foot of the access opening 126, it is difficult to insert the dolly 12 into the inside of the outer housing 118. Next, the position and orientation of the arm 20 are adjusted, and the load receiving platform 22 is placed directly under the cryopump 70 (for example, the cryopanel container 72).

[0038] In the example shown in FIG. 5, the cryopump 70 located directly above the wafer transport device 114 is to be removed. As shown in FIG. 4, the space 130 between the wafer transport device 114 and the cryopump 70 is narrow, and may be, for example, less than 1 m or less than 0.5 m. Also, since the wafer transport device 114 is located directly below the cryopump 70, it is difficult to build a scaffold directly below the cryopump 70. By using the transport device 10, adjusting the height of the lifting part 16, and sliding and extending the arm 20 from the guide rail 18, the load receiving platform 22 can be placed in such a limited space 130. Because there is a free space S (see FIG. 1) below the guide rail 18, the dolly 12 can be moved closer to the working opening 126, and the load receiving platform 22 can be inserted to a position away from the working opening 126.

[0039] Next, the cryopump 70 is removed from the vacuum processing chamber 112, and the removed cryopump 70 is held on the receiving platform 22. The cryopump 70 can be firmly fixed to the receiving platform 22 using a fixing device 60 such as a fastening band. Note that the cryopump 70 may be fixed to the receiving platform 22 before being removed from the vacuum processing chamber 112. In this case, the cryopump 70 can be removed from the vacuum processing chamber 112 with the cryopump 70 fixed to the receiving platform 22.

[0040] Next, by adjusting the position and orientation of the arm 20, the cryopump 70 can be transported inside the outer casing 118. For example, by storing the arm 20 inside the guide rail 18, the load receiving platform 22 can be brought closer to the cart 12. Thereafter, by running the cart 12 backward, the arm 20 can be drawn out through the access opening 126, and the cryopump 70 can be transported outside the outer casing 118. By lowering the height of the lifting section 16 outside the outer casing 118, the height of the load receiving platform 22 can be lowered, and the cryopump 70 can be safely removed from the load receiving platform 22.

[0041] When attaching the cryopump 70 to the vacuum processing chamber 112, the procedure for removing the cryopump 70 can be reversed. The cryopump 70 can be held on the load receiving platform 22 outside the outer casing 118, the cryopump 70 can be transported to the inside of the outer casing 118 using the transport device 10, the cryopump 70 can be removed from the load receiving platform 22, and the cryopump 70 can be attached to the vacuum processing chamber 112.

[0042] 6 is a flow chart showing an example of a transfer method according to an embodiment. The transfer method using the transfer device 10 includes a step (S10) of holding the cryopump 70 on the load receiving platform 22, a step (S12) of running the dolly 12, a step (S14) of changing the height of the lifting section 16, a step (S16) of sliding the arm 20, and a step (S18) of removing the cryopump 70 from the load receiving platform 22. The order of the running step (S12), the height changing step (S14), and the sliding step (S16) is not particularly important, and these steps may be performed in different orders, or may be performed multiple times in any order.

[0043] When the arm 20 is a multi-joint arm, the conveying method may further include a step of rotating a joint (for example, the first joint 40 or the second joint 42) to adjust the position and orientation of the load receiving platform 22. The step of rotating the joint can also be performed at any timing and any number of times between steps S10 and S18.

[0044] In the above embodiment, the case where the transfer device 10 is used for the purpose of transferring the cryopump 70 installed in the vacuum processing chamber of the ion implantation device has been described. The transfer device 10 may be used to transfer a cryopump installed in a place other than the vacuum processing chamber, or may be used to transfer a cryopump installed in the ion beam generating device 110 or the wafer transfer device 114. The transfer device 10 may be used to transfer a cryopump installed in any vacuum process device other than the ion implantation device. The transfer device 10 may be used to transfer any device other than a cryopump, or may be used to transfer any device constituting a vacuum process device.

[0045] The present invention has been described above based on the embodiments. It will be understood by those skilled in the art that the present invention is not limited to the above-described embodiments, that various design changes are possible, that various modifications are possible, and that such modifications are also within the scope of the present invention. [Explanation of symbols]

[0046] 10...transportation device, 12...cart, 14...mast, 16...lifting section, 18...guide rail, 20...arm, 22...load receiving platform, 24...counterweight, 26...front wheel, 28...rear wheel, 60...fixing device, 70...cryo-pump.

Claims

1. A transport device for transporting a cryopump, comprising: A dolly having front and rear wheels; A mast extending in a height direction from a front side of the carriage; a lifting section supported by the mast and capable of changing its height; A guide rail extending forward from the lifting section; an arm supported by the guide rail and slidable in a front-rear direction; a load receiving platform provided at a tip of the arm and holding the cryopump; A conveying device comprising: a counterweight provided on the rear side of the cart.

2. The transport device according to claim 1 , wherein the arm is an articulated arm.

3. 3. The transport apparatus of claim 2, wherein the arm includes a sliding spacer disposed between two arm members connected at an articulation.

4. The conveying device according to claim 1 , wherein the load receiving platform is rotatable with respect to the tip of the arm.

5. The transport device according to claim 1 , wherein the load receiving platform includes a locking portion for locking a fixing device for fixing the cryopump to the load receiving platform.

6. 2. The transport device according to claim 1, wherein the load receiving platform has a concave shape for receiving a side surface of a cylindrical vacuum vessel provided in the cryopump.

7. The transport device according to claim 1 , wherein the guide rail can be positioned forward of the front wheels.

8. The transport apparatus of claim 1 , further comprising an outrigger extendable laterally from the carriage.

9. A method for transporting a cryopump using the transport device according to any one of claims 1 to 8, comprising the steps of: holding the cryopump on the load platform; A step of running the cart; Changing the height of the lifting unit; Sliding the arm; and removing the cryopump from the load receiving platform.

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