Antenna module
The antenna module with a unique radiator configuration enhances the angular range and resistance matching to meet 5G O-RAN standards by incorporating specific radiators and angles, achieving improved radiation patterns.
JP2026091260APending Publication Date: 2026-06-03PEGATRON
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- PEGATRON
- Filing Date
- 2025-11-11
- Publication Date
- 2026-06-03
AI Technical Summary
Technical Problem
The current planar inverted-F antenna (PIFA) has a limited angular range of its radiation pattern, failing to meet the requirements of the 5G open radio access network (O-RAN).
Method used
The antenna module incorporates a main radiator, a supply radiator, a first ground radiator, a first inclined radiator, a second ground radiator, and a pattern adjustment radiator, with specific angles and connections to enhance the angular range of the radiation pattern.
Benefits of technology
The enhanced antenna module achieves a gain greater than -2 dBi in 150-degree radiation patterns, meeting the requirements of the 5G open radio access network by improving angular range and resistance matching.
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Smart Images
Figure 2026091260000001_ABST
Abstract
The present invention provides an antenna module capable of improving the angular range of the radiation pattern. [Solution] The antenna module includes a main radiator, a supply radiator, first and second ground radiators, a first inclined radiator, and a pattern adjustment radiator. The main radiator includes a first open end. The supply radiator, the first and second ground radiators, and the first inclined radiator are flexibly connected to the main radiator. The first inclined radiator has a second open end away from the main radiator, is located on the opposite side of the first ground radiator and the supply radiator, and forms a first angle with the normal direction of the main radiator. The second ground radiator is located on the opposite side of the first open end. The pattern adjustment radiator is located near the first open end, spaced away from the first open end, and includes a matching radiator and a second inclined radiator, the matching radiator being close to the first open end, and the second inclined radiator forming a second angle with the normal direction.
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Citation Information
Patent Citations
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