Annular lining apparatus, liner, process chamber, and semiconductor process device
By designing a telescopic annular lining device in the process chamber of the semiconductor process equipment, the poor shielding effect and plasma escape caused by poor grounding of the process chamber liner are solved, and a stable grounding electrical connection and good shielding effect are achieved.
Patent Information
- Application Number
- PCT/CN2024/125653
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-11-08
- Filing Date
- 2024-10-18
- Publication Date
- 2025-05-15
AI Technical Summary
The process chamber linings in existing semiconductor process equipment have poor grounding problems, resulting in poor shielding effect and serious plasma escape.
A ring-shaped lining device is designed, including a first ring liner, a cylindrical lining and a second ring liner. The cylindrical lining is retractable. By adjusting the position of the second ring liner, a compact electrical contact with the first member and the second member is achieved to ensure stability of the ground electrical connection.
Through the flexible position adaptability of the annular lining device, good electrical contact effect between the electrical contact members is ensured, and problems of poor grounding effect and poor shielding effect are avoided, thereby alleviating plasma escape.
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Figure CN2024125653_15052025_PF_FP_ABST
Abstract
Description
Annular lining device, lining, process chamber and semiconductor process equipment Technical Field
[0001] The present application belongs to the technical field of semiconductor process equipment, and specifically relates to an annular liner device, a liner, a process chamber and semiconductor process equipment. Background Art
[0002] To ensure effective processing and prevent plasma leakage within the process chamber during semiconductor processing, the process chamber in the related art is equipped with a liner. This liner is grounded to provide radio frequency shielding, thereby preventing plasma leakage. However, the liner in the related art suffers from poor grounding, ultimately failing to provide effective shielding, leading to severe plasma escape.
[0003] Summary of the Invention
[0004] The present application discloses an annular liner device, a liner, a process chamber and semiconductor process equipment to solve the problem of poor grounding of the liner of the process chamber involved in the related art, resulting in poor shielding effect.
[0005] In order to solve the above technical problems, this application provides the following technical solutions:
[0006] In a first aspect, embodiments of the present application disclose an annular liner device for a process chamber, the annular liner device comprising a first annular liner, a cylindrical liner, and a second annular liner, wherein:
[0007] The first annular liner is connected to the first end of the cylindrical liner, the second annular liner is connected to the second end of the cylindrical liner, and the cylindrical liner is telescopic in the axial direction thereof.
[0008] In a second aspect, an embodiment of the present application discloses a liner for a process chamber. The disclosed liner includes a third ring liner and the annular liner device described above. The second ring liner and the third ring liner of the annular liner device can be press-fitted.
[0009] In a third aspect, an embodiment of the present application discloses a process chamber, comprising a chamber body, a carrier seat, and the aforementioned liner, wherein the chamber body has a film transfer port, and the third ring liner is disposed around the carrier seat;
[0010] In a process state, the second ring liner presses the third ring liner;
[0011] In a non-process state, the second ring liner is separated from the third ring liner, and the cylindrical liner is shortened to avoid the film transfer port.
[0012] In a fourth aspect, an embodiment of the present application discloses a semiconductor process equipment, and the disclosed semiconductor process equipment includes the process chamber described above.
[0013] The technical solution adopted in this application can achieve the following technical effects:
[0014] The annular liner device disclosed in the embodiment of the present application has a cylindrical liner connected between the first and second ring liners that can be extended and retracted, so that the distance between the first and second ring liners can be changed by the extension and retraction of the cylindrical liner. Therefore, when the first ring liner is in pressed electrical contact with the first component cooperating with it, the cylindrical liner can adjust the position of the second ring liner by extension and retraction, so that the second ring liner can adaptively find the second component cooperating with it and achieve pressed electrical contact, and further, the first ring liner and the second ring liner can respectively achieve pressed electrical contact with the first component and the second component independently without generating a gap between the first component or the second component that affects the grounding electrical connection effect, and finally the first component can be electrically connected to the second component through the first ring liner, the cylindrical liner and the second ring liner in sequence, and finally a relatively stable grounding electrical connection can be achieved.
[0015] The annular liner device of this structure has relatively flexible position adaptability, thereby ensuring better electrical contact between the electrically contacting components. That is to say, the position of the first annular liner will not limit the position of the second annular liner and fail to achieve better compressed electrical contact with the second component, thereby avoiding the problem of poor electrical contact caused by a gap between the second annular liner and the second component, thereby alleviating the problem of poor grounding effect caused by this, and thereby avoiding the problem of poor shielding effect caused by poor grounding. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] FIG1 is a schematic structural diagram of a process chamber disclosed in an embodiment of the present application;
[0017] FIG2 is an exploded schematic diagram of a partial structure of a process chamber disclosed in an embodiment of the present application;
[0018] FIG3 is a schematic structural diagram of FIG2 in an assembled state;
[0019] FIG4 is a cross-sectional view of a portion of FIG3 at another viewing angle;
[0020] FIG5 is a cross-sectional view of the pressing mechanism disclosed in an embodiment of the present application;
[0021] FIG6 is an enlarged schematic diagram of a portion of the structure in FIG1 ;
[0022] FIG7 is an enlarged schematic diagram of a portion of the structure in FIG6;
[0023] FIG8 is a schematic structural diagram of a process chamber in a non-processing state according to an embodiment of the present application;
[0024] FIG9 is a schematic structural diagram of the process chamber in a process state disclosed in an embodiment of the present application.
[0025] Description of reference numerals:
[0026] 01-third ring lining, 011-second bending surface, 012-second annular positioning groove,
[0027] 02-Bearing seat,
[0028] 03-distribution plate, 031-edge, 0311-first annular positioning groove,
[0029] 04-first annular liner, 041-annular edge, 042-first mounting hole, 043-first sleeve, 044-annular body, 045-lining,
[0030] 05-cylindrical lining, 051-avoidance window, 052-first ring, 053-second ring, 054-inner bellows, 055-outer bellows,
[0031] 06-second ring liner, 061-first bending surface, 062-connecting groove, 063-hanging protrusion,
[0032] 07-Guide rod,
[0033] 08-Cavity, 081-Transmission port, 082-Perforation,
[0034] 09-First induction coil,
[0035] 10- Second induction coil,
[0036] 11-pressing mechanism, 111-cylindrical housing, 112-first sliding member, 1121-sliding cylinder, 1122-guide block, 1123-connecting block, 1124-third annular flange, 1125-second mounting hole, 1126-first shaft sleeve, 1127-seventh annular flange,
[0037] 113-second sliding member, 1131-first rod body, 1132-first annular flange, 1133-second rod body, 1134-second annular flange, 1135-sixth annular flange, 114-elastic member, 115-first telescopic cylinder, 116-fourth annular flange, 117-second telescopic cylinder, 118-second shaft sleeve, 119-fifth annular flange, 120-mounting seat,
[0038] 12-card plate, 13-washer, 14-power source, 15-connecting rod,
[0039] 101-second guide hole, 102-first guide hole, A-first gap, B-second gap, C-third gap, D-process space, E-internal space. DETAILED DESCRIPTION
[0040] To make the objectives, technical solutions, and advantages of this application more clear, the technical solutions of this application will be clearly and completely described below in conjunction with the specific embodiments of this application and the corresponding drawings. Obviously, the embodiments described are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.
[0041] In the process chamber involved in the related art, the process chamber includes an inner liner and a lifting mechanism. The inner liner may include a ring liner and a bottom liner. The lifting mechanism is connected to the ring liner, thereby realizing the overall lifting of the ring liner. After being lifted, the ring liner can avoid the wafer transfer port of the process chamber, thereby realizing the wafer can enter and exit through the wafer transfer port. After landing, the ring liner will be electrically contacted with the corresponding first component and second component respectively. The first component may be, for example, a distribution plate for distributing gas, and the second component may be, for example, a bottom liner. In the process of realizing the invention of this application, the inventor found that after the grounding electrical contact between the inner liner and one of the first component and the second component is guaranteed, there is often a large gap between the inner liner and the other of the first component and the second component, which makes it impossible to form a conductive path between the two, seriously affecting the radio frequency shielding performance of the inner liner.
[0042] In order to solve this problem, the inventors of this application have designed a technical solution and proposed the technical solution in the embodiments of this application. The technical solutions disclosed in each embodiment of this application are described in detail below with reference to the accompanying drawings.
[0043] Please refer to Figures 1 to 7. The embodiment of the present application discloses an annular liner device. The disclosed annular liner device is used for a process chamber. The disclosed annular liner device includes a first annular liner 04, a cylindrical liner 05, and a second annular liner 06. The first annular liner 04 is connected to the first end of the cylindrical liner 05. The second annular liner 06 is connected to the second end of the cylindrical liner 05. Specifically, the first annular liner 04 and the first end of the cylindrical liner 05, and the second annular liner 06 and the second end of the cylindrical liner 05 can be fixedly connected by bonding, clamping, connecting with a connector, etc.
[0044] The cylindrical liner 05 is retractable along its axial direction. It should be noted that the axial direction refers to the direction in which the axis of the cylindrical liner 05 extends along the direction through which the cylindrical cavity extends. The cylindrical liner 05 is retractable along its axial direction, thereby making its length adjustable, and thus the distance between the first annular liner 04 and the second annular liner 06 adjustable. Specifically, if the distance between the first annular liner 04 and the second annular liner 06 increases, the cylindrical liner 05 extends; conversely, if the distance between the first annular liner 04 and the second annular liner 06 decreases, the cylindrical liner 05 shortens. Of course, extending the cylindrical liner 05 increases the distance between the first annular liner 04 and the second annular liner 06. Conversely, shortening the cylindrical liner 05 decreases the distance between the first annular liner 04 and the second annular liner 06.
[0045] In the embodiment of the present application, the inner edge of the first annular liner 04 protrudes from the inner wall of the cylindrical liner 05 and forms an annular edge 041. The annular edge 041 at least performs a pressing function.
[0046] The annular liner device disclosed in the embodiment of the present application has a cylindrical liner 05 connected between the first annular liner 04 and the second annular liner 06 that can be extended and retracted, so that the distance between the first annular liner 04 and the second annular liner 06 can be changed by the extension and retraction of the cylindrical liner 05. Therefore, when the first annular liner 04 is in pressed electrical contact with the first component (such as the distribution plate 03) that cooperates with it, the cylindrical liner 05 can adjust the position of the second annular liner 06 by extension and retraction, so that the second annular liner 06 can adaptively find the second component (such as the third annular liner 01) that cooperates with it and achieve pressed electrical contact, thereby enabling the first annular liner 04 and the second annular liner 06 to achieve pressed electrical contact with the first component and the second component respectively, without generating a gap between the first component or the second component that affects the grounding electrical connection effect, and finally enabling the first component to be electrically connected to the second component through the first annular liner 04, the cylindrical liner 05 and the second annular liner 06 in sequence, and finally achieving a relatively stable electrical connection, such as stable grounding.
[0047] The annular lining device of this structure has relatively flexible position adaptability, thereby ensuring better electrical contact between the electrically contacting components. That is to say, the position of the first annular lining 04 will not limit the position of the second annular lining 06 and fail to achieve better compressed electrical contact with the second component, thereby avoiding the problem of poor electrical contact caused by a gap between the second annular lining 06 and the second component, thereby alleviating the problem of poor grounding effect caused thereby, thereby avoiding the problem of poor shielding effect caused by poor grounding.
[0048] In the embodiment of the present application, the inner edge of the first annular liner 04 protrudes from the inner wall of the cylindrical liner 05 and forms an annular edge 041 , so that the first annular liner 04 can be electrically connected to the first component through the pressed electrical contact of the annular edge 041 .
[0049] As described above, the cylindrical liner 05 is telescopic, thereby allowing the distance between the first annular liner 04 and the second annular liner 06 to change. To enhance the telescopic effect and ensure that the relative movement between the first annular liner 04 and the second annular liner 06 is along the axis of the cylindrical liner 05, in some embodiments, the annular liner device disclosed in the embodiments of the present application may further include a guide rod 07. The guide rod 07 performs a guiding function. The first end of the guide rod 07 is fixedly connected to one of the first annular liner 04 and the second annular liner 06. The second end of the guide rod 07 passes through the side wall of the cylindrical liner 05 and is disposed in at least the other of the first annular liner 04 and the second annular liner 06, thereby slidingly engaging with the other of the first annular liner 04 and the second annular liner 06 (i.e., the first annular liner 04 or the second annular liner 06). The guide rod 07 slides with the first annular liner 04 or the second annular liner 06 to guide the alignment of the first annular liner 04 and the second annular liner 06. Under the guidance of the guide rod 07, the relative movement between the first ring liner 04 and the second ring liner 06 can be well performed along the axial direction of the cylindrical liner 05. It should be noted that the guide rod 07 is parallel to the axial direction of the cylindrical liner 05.
[0050] As described above, the guide rod 07 can be fixed to the first ring liner 04 and slidably engaged with the second ring liner 06. Conversely, the guide rod 07 can be fixed to the second ring liner 06 and slidably engaged with the first ring liner 04, which is not limited in this embodiment of the present application.
[0051] To alleviate wear of the first ring bushing 04 or the second ring bushing 06 that slides with the guide rod 07, further, in some embodiments, the first ring bushing 04 or the second ring bushing 06 is provided with a first mounting hole 042, in which a first sleeve 043 is fixedly mounted. The guide rod 07 is inserted into the first sleeve 043 and slides with the first sleeve 043. In this case, the first sleeve 043 plays a role of sliding contact with the guide rod 07, thereby preventing the guide rod 07 from directly contacting the first ring bushing 04 or the second ring bushing 06 and causing wear to the first ring bushing 04 or the second ring bushing 06.
[0052] In some embodiments, the number of guide rods 07 can be one or more, and the embodiments of the present application do not limit the specific number of guide rods 07. In embodiments where there are multiple guide rods 07, the multiple guide rods 07 can be spaced apart in the circumferential direction of the annular lining device, thereby enabling a more balanced guiding effect in the circumferential direction of the annular lining device.
[0053] As described above, the cylindrical liner 05 can be telescopic, thereby changing its length. The structure of the cylindrical liner 05 can be various. For example, the cylindrical liner 05 can be a cylindrical member similar to that made of a flexible material. The cylindrical liner 05 can also be designed as a telescopic structure. For example, the cylindrical liner 05 can be a structure similar to the shape of a bellows. Based on this, please refer to Figures 4 to 7. In some embodiments, the cylindrical liner 05 can include a first ring 052, a second ring 053, an inner bellows 054, and an outer bellows 055. The inner bellows 054 is arranged within the outer bellows 055, and an annular gap is formed between the two. The first ring 052 is sealed at the first end of the annular gap, and the second ring 053 is sealed at the second end of the annular gap. The first ring 052 is connected to one of the first ring liner 04 and the second ring liner 06. The second ring 053 is connected to the other of the first ring liner 04 and the second ring liner 06. During the specific expansion and contraction process, the distance between the first and second ring bushings 04 and 06 decreases, which in turn reduces the distance between the first and second rings 052 and 053, thereby shortening the inner and outer bellows 054 and 055. Conversely, the distance between the first and second ring bushings 04 and 06 increases, which in turn increases the distance between the first and second rings 052 and 053, thereby extending the inner and outer bellows 054 and 055. This structure of the cylindrical liner 05 utilizes the coordinated expansion and contraction function of the inner and outer bellows 054 and 055, while the first and second rings 052 and 053 facilitate the connection of the first and second ring bushings 04 and 06 to the cylindrical liner 05.
[0054] Specifically, the first ring 052 and the first ring liner 04 or the second ring liner 06, and the second ring 053 and the first ring liner 04 or the second ring liner 06 can be connected by snapping, bonding, connecting with connectors, etc. The embodiment of the present application does not limit the specific connection method between the first ring 052 and the first ring liner 04 or the second ring liner 06, and the second ring 053 and the first ring liner 04 or the second ring liner 06.
[0055] When the annular liner device disclosed in the embodiment of the present application includes a guide rod 07, the guide rod 07 passes through the side wall of the cylindrical liner 05. In other words, part of the structure of the guide rod 07 is disposed in the side wall of the cylindrical liner 05, which should not cause damage to the side wall of the cylindrical liner 05 and thus allow plasma to escape. When the cylindrical liner 05 includes a first ring 052, a second ring 053, an inner bellows 054, and an outer bellows 055, part of the guide rod 07 is located in the annular gap. The first end of the guide rod 07 passes through one of the first ring 052 and the second ring 053 and is fixedly connected to the first ring liner 04 or the second ring liner 06. The second end of the guide rod 07 passes through the other of the first ring 052 and the second ring 053 and is slidably engaged with the first ring liner 04 or the second ring liner 06. The cylindrical liner 05 of this structure can form an annular gap for the guide rod 07 to pass through, thereby facilitating the assembly of the guide rod 07 and not easily causing the guide rod 07 to pierce the side wall of the cylindrical liner 05 during the assembly process.
[0056] In the embodiment of the present application, the first annular liner 04 may include an annular body 044, which may be an annular sheet, with an annular edge 041 formed on the inner edge of the annular body 044. Of course, in another embodiment, the first annular liner 044 may include an annular body 044 and further include a sleeve 045, the inner edge of the annular body 044 protruding from the inner wall of the sleeve 045 and forming the annular edge 041. The first end of the sleeve 045 is sealingly connected to the surface of the annular body 044 facing the second annular liner 06. Specifically, the first end of the sleeve 045 and the surface of the annular body 044 may be bonded together using a sealant. Of course, the sleeve 045 and the annular body 044 may be a monolithic structure, i.e., both are manufactured through an integral molding process. The second port of the liner 045 is arranged adjacent to the second annular liner 06, and at least a portion of the liner 045 is arranged inside the cylindrical liner 05. In this case, the liner 045 is located inside the cylindrical liner 05, thereby helping the cylindrical liner 05 to achieve double protection.
[0057] In some embodiments, at least one of the annular edge 041 and the edge of the first component (e.g., the distribution plate 03) is provided with a first annular positioning groove 0311 for mounting the first induction coil 09. In this embodiment, the first annular positioning groove 0311 is provided on the surface of the edge 031 of the distribution plate 03 that faces the annular edge 041. However, the present embodiment is not limited thereto. In practical applications, the first annular positioning groove 0311 may also be provided on the surface of the annular edge 041 that faces the second annular liner 06. Alternatively, the first annular positioning groove 0311 may be provided on both opposing surfaces of the annular edge 041 and the first component (e.g., the distribution plate 03). In this case, the first induction coil 09 may be disposed in both first annular positioning grooves 0311, or two first induction coils 09 may be disposed in each of the first annular positioning grooves 0311, with both being in electrical contact with each other.
[0058] In some embodiments, at least one of the second ring liner 06 and the second member (e.g., the third ring liner 01) is provided with a second annular positioning groove 021 for mounting the second induction coil 10. In this embodiment, the second annular positioning groove 021 is provided on the surface of the third ring liner 01 facing the edge of the second ring liner 06. However, the present invention is not limited thereto. In practical applications, the second annular positioning groove 012 may also be provided on the edge of the second ring liner 06. Alternatively, the second annular positioning groove 012 may be provided on both opposing surfaces of the second ring liner 06 and the second member (e.g., the third ring liner 01). In this case, the second induction coil 10 may be disposed in both second annular positioning grooves 012, or two second induction coils 10 may be disposed in each of the two second annular positioning grooves 012, with electrical contact between them.
[0059] In some embodiments, as shown in FIG. 2 and FIG. 7 , the second ring liner 06 may be provided with a connecting groove 062 , and a portion of the connecting groove 062 adjacent to the inner edge of the second ring liner 06 is provided with a hanging protrusion 063 .
[0060] Based on the annular liner device disclosed in the embodiments of this application, the embodiments of this application further disclose a process chamber liner. The disclosed process chamber liner includes a third annular liner 01 and the annular liner device provided in the embodiments above. The second annular liner 06 of the annular liner device is press-fitted with the third annular liner 01. Specifically, the third annular liner 01 is the second component mentioned in the embodiments above.
[0061] To enhance electrical connection, the process chamber liner disclosed in the embodiments of this application may also include a second inductive coil 10. This coil extends circumferentially around the third ring liner 01 and, when the process chamber is in process mode, is compressed between the second and third ring liners 06 and 01, electrically connecting the two. This second inductive coil 10 enhances electrical connection, ensuring better electrical connection between the second and third ring liners 06 and 01, thereby optimizing grounding and facilitating the formation of a robust shielding structure.
[0062] In order to better position the second inductive coil 10 between the second ring liner 06 and the third ring liner 01, further, in some embodiments, at least one of the third ring liner 01 and the second ring liner 06 may be provided with a second annular positioning groove 012, and the second inductive coil 10 may be positioned in the second annular positioning groove 012, thereby being positioned by the second annular positioning groove 012 and being more stably located between the second ring liner 06 and the third ring liner 01.
[0063] The annular end surface at the bottom end of the second annular liner 06 can be a flat surface or a bent surface. Similarly, the edge of the third annular liner 01 can be a flat surface or a bent surface, and this is not limited in the embodiments of the present application. In some embodiments, the annular end surface at the bottom end of the second annular liner 06 can be a first bent surface 061, and the edge of the third annular liner 01 can be provided with a second bent surface 011. The shapes of the first bent surface 061 and the second bent surface 011 are adapted to form a bent third gap C. In this case, the third gap C is essentially a bent matching gap, which makes it easier to form a maze structure, which is ultimately more conducive to preventing the escape of plasma. Even if plasma enters, it is more likely to be annihilated due to the long maze structure, and thus will not cause the plasma to escape. For example, the first bent surface 061 and the second bent surface 011 can both be concave and convex surfaces.
[0064] Based on the liner disclosed in the embodiment of the present application, the embodiment of the present application further discloses a process chamber. The disclosed process chamber includes a cavity 08, a carrier 02 and the liner provided in the above embodiment.
[0065] Cavity 08 is the main peripheral component of the process chamber. Cavity 08 not only provides a mounting base for other components of the process chamber but also forms some of the necessary structures of the process chamber. For example, cavity 08 is provided with a wafer transfer port 081 for wafers to pass through. The liner and support seat 02 are both located within cavity 08, with a third annular liner 01 surrounding support seat 02. The process chamber has a process state and a non-process state. The space above support seat 02 is process space D. An annular liner device can be arranged around process space D.
[0066] When the process chamber is in a process state, the second ring liner 06 presses against the third ring liner 01, thereby isolating the process space D from the film transfer port 081. The process space D can be effectively sealed to prevent plasma escape, and a shielding structure is formed to shield the process space D. As shown in FIG9 , the process space D is the shaded area in FIG9 . As can be seen from FIG9 , the process space D is isolated from other areas in the internal space E (such as the diagonal grid filled area in FIG9 ). It is easy to understand that at this time, the first ring liner 04 is in a state of pressing against the first component (such as the distribution plate 03 described below). Specifically, the first ring liner 04 can be provided with an annular edge 041 to press against the first component (such as the distribution plate 03 described below).
[0067] Referring to Figure 8 , when the process chamber is in a non-processing state, the second annular liner 06 is separated from the third annular liner 01, and the cylindrical liner 05 is shortened to avoid the wafer transfer port 081. Specifically, the cylindrical liner 05 is shortened to form a connecting channel with the third annular liner 01. The connecting channel connects the wafer transfer port 081 and the process space D, allowing wafers to be transported from the process space D through the wafer transfer port 081 or to enter the process space D from the wafer transfer port 081. In this case, the process space D is connected to other areas of the internal space E, as shown in the diagonal grid filled area in Figure 8 .
[0068] In some embodiments, the process chamber disclosed in the embodiments of the present application may further include a distribution plate 03 for distributing process gases. The distribution plate 03 is disposed within the chamber 08, and a process space D is formed between the distribution plate 03 and the carrier 02. When the process chamber is in a process state, the first annular liner 04 is in a state of pressing against a first component (e.g., the distribution plate 03 described below). Specifically, the first annular liner 04 can be provided with an annular edge 041 to press against an edge 031 of the distribution plate 03.
[0069] When the process chamber includes a distribution plate 03, the cavity 08 may have a top opening, and the distribution plate 03 covers the top opening of the cavity 08, so that the edge 031 of the distribution plate 03, the third annular liner 01, the annular liner device, and the support base 02 are all located within the cavity 08. In this case, the distribution plate 03 not only performs the function of distributing process gases, but also, together with the cavity 08, forms the outer structure of the process chamber.
[0070] To enhance electrical connection, the process chamber disclosed in the embodiments of this application may further include a first inductive coil 09. In embodiments where an annular edge 041 is provided on the inner edge of the first annular liner 04, the first inductive coil 09 is disposed along the circumference of the annular edge 041. When the process chamber is in a process state, the first inductive coil 09 is compressed between the annular edge 041 of the first annular liner 04 and the edge 031 of the distribution plate 03. The first inductive coil 09 effectively blocks plasma from escaping from the gap between the annular edge 041 and the edge of the distribution plate 03, while also enhancing grounding electrical connection.
[0071] Furthermore, at least one of the annular edge 041 and the distribution plate 03 may be provided with a first annular positioning groove 0311, and the first induction coil 09 may be positioned in the first annular positioning groove 0311. The first induction coil 09 is positioned and matched with the first annular positioning groove 0311, thereby ensuring a relatively stable position of the first induction coil 09.
[0072] As described above, when the process chamber is in a process state, the first ring liner 04 is in a state of pressing against the distribution plate 03. Specifically, the first ring liner 04 can be pressed against the edge 031 of the distribution plate 03 by providing an annular edge 041, and the second ring liner 06 can be pressed against the third ring liner 01. To achieve this pressing, in some embodiments, the process chamber disclosed in the embodiments of the present application may include a first drive mechanism and a second drive mechanism, wherein the first drive mechanism is connected to the first ring liner 04 and is used to drive the first ring liner 04 (e.g., its annular edge 041) to press against the edge 031 of the distribution plate 03. The second drive mechanism is connected to the second ring liner 06 and is used to drive the second ring liner 06 to press against the third ring liner 01. In this case, the pressing of the first ring liner 04 against the distribution plate 03 and the pressing of the second ring liner 06 against the third ring liner 01 can be achieved by the first drive mechanism and the second drive mechanism, respectively. The first drive mechanism and the second drive mechanism operate independently without affecting each other.
[0073] Of course, in other embodiments disclosed in the embodiments of the present application, the first ring liner 04 that presses the distribution plate 03 and the second ring liner 06 that presses the third ring liner 01 can share a driving mechanism. Based on this, the embodiments of the present application discloses a driving mechanism that is respectively connected to the first ring liner 04 and the second ring liner 06. This driving mechanism can drive the first ring liner 04 to press the distribution plate 03, and can also drive the second ring liner 06 to press the third ring liner 01.
[0074] The driving mechanism disclosed in the embodiment of the present application is connected to the first ring liner 04 and the second ring liner 06 respectively, and when the process chamber is in the process state, drives the first ring liner 04 to drive the annular edge 041 to press the edge 031 of the distribution plate 03 and the second ring liner 06 to press the third ring liner 01 respectively.
[0075] In some embodiments, the drive mechanism may include a clamping mechanism 11, which may include a first sliding member 112, a second sliding member 113, and an elastic member 114. The cavity 08 may be provided with a through-hole 082, through which the first sliding member 112 may pass and connect to the first ring liner 04. The second sliding member 113 is partially slidably disposed within the first sliding member 112 and passes through the through-hole 082 and connects to the second ring liner 06. The elastic member 114 is connected between the first sliding member 112 and the second sliding member 113 and is in a pre-compressed state. When the drive mechanism is compressing and actuated, the second ring liner 06 and the third ring liner 01 only contact each other, while the first ring liner 04 (e.g., the annular edge 041) and the edge 031 of the distribution plate 03 are spaced apart in the compressing direction. In other words, the first ring liner 04 (e.g., the annular edge 041) does not contact the edge of the distribution plate 03. In this case, the elastic member 114 can be deformed and placed in a pre-stressed state, and is elastically connected between the first sliding member 112 and the second sliding member 113. As a result, when the driving mechanism is pressed and driven, the second ring liner 06 and the third ring liner 01 first come into contact. Then, as the pressing force increases, the second ring liner 06 presses against the third ring liner 01, while the first ring liner 04 (e.g., the annular edge 041) approaches the edge 031 of the distribution disc 03 until it presses against the edge 031 of the distribution disc 03. Of course, the elastic member 114 in the pre-stressed state can further cause the first ring liner 04 (e.g., the annular edge 041) to press against the edge 031 of the distribution disc 03. This design allows the elastic member 114 to serve as an elastic connection, allowing the compression between the second ring liner 06 and the third ring liner 01 and the compression of the annular edge 041 against the edge 031 of the distribution disc 03 to be performed in steps, thereby more easily achieving the purpose of independent compression.
[0076] In a further technical solution, the clamping mechanism 11 may further include a cylindrical shell 111. The cylindrical shell 111 serves as a peripheral component of the clamping mechanism 11 and is more easily provided with an installation base and protection for other parts of the clamping mechanism 11. The cylindrical shell 111 is fixed outside the cavity 08, thereby achieving installation based on the cavity 08. The cylindrical shell 111 is connected to the internal space E of the cavity 08 through the through-hole 082. At least part of the first sliding member 112 is slidably disposed within the cylindrical shell 111. In this case, the first sliding member 112 can slide through the through-hole 082 with the cylindrical shell 111 as a sliding base, and then be connected to the first annular liner 04 in the cavity 08. Specifically, the first sliding member 112 and the first annular liner 04, as well as the cylindrical shell 111 and the cavity 08, can be fixed by connecting with a connector (such as a threaded connector). In order to reduce the generation of particles, in some embodiments, the connectors located in the cavity 08 can be made of resin parts. Compared with metal connectors that are more likely to generate metal particles and cause pollution, resin parts are less likely to generate particles and are less likely to pollute the internal environment of the cavity 08.
[0077] In the embodiment of the present application, the first sliding member 112 can have various structures. For example, the first sliding member 112 can be a common sliding rod. Referring again to Figures 5 and 6, in some embodiments, the first sliding member 112 can include a slide cylinder 1121, a guide block 1122, and a connecting block 1123.
[0078] Slide 1121 is the main sliding portion of the first sliding member 112. At least a portion of slide 1121 is slidably disposed within cylindrical housing 111. Connecting block 1123 seals the port of slide 1121 adjacent to cavity 08 and extends into interior space E to connect with first annular liner 04, thereby connecting the first sliding member 112 to the first annular liner 04. At least a portion of guide block 1122 is fixed within slide 1121. Guide block 1122 and connecting block 1123 are spaced apart. Specifically, guide block 1122 and connecting block 1123 are located at opposite ends of slide 1121. Connecting block 1123 is provided with a first guide hole 102, and guide block 1122 is provided with a second guide hole 101. The first guide hole 102 and the second guide hole 101 facilitate the sliding of the second sliding member 113. The first end of the second sliding member 113 is connected to the second ring bushing 06, and the second end of the second sliding member 113 passes through the first guide hole 102 and extends into the second guide hole 101 and slides with the first guide hole 102 and the second guide hole 101 respectively, thereby achieving the purpose of partially sliding the second sliding member 113 in the first sliding member 112.
[0079] In a further technical solution, the end of the connecting block 1123 connected to the first annular liner 04 may be provided with a seventh annular flange 1127. Specifically, the seventh annular flange 1127 may be connected to the first annular liner 04. The seventh annular flange 1127 provides a larger connection area, thereby facilitating the application of pressure by the connecting block 1123 on the first annular liner 04, ultimately achieving a better compression effect. In some embodiments, the seventh annular flange 1127 may be a separate structure connected to the connecting block 1123 through assembly, or it may be a monolithic structure, i.e., the two are manufactured through an integral molding process.
[0080] The elastic member 114 is sleeved on the portion of the second sliding member 113 located between the first guide hole 102 and the second guide hole 101, and the first end of the elastic member 114 is connected to the second sliding member 113. Specifically, the first end of the elastic member 114 can be fixedly connected to the second sliding member 113 (for example, by bonding, welding, etc.), and the second end of the elastic member 114 abuts against the guide block 1122, thereby realizing the elastic connection of the elastic member 114 between the first sliding member 112 and the second sliding member 113.
[0081] This structure not only enables the elastic member 114 to be elastically connected between the first sliding member 112 and the second sliding member 113, but also enables the first sliding member 112 to be provided with a guide space including the first guide hole 102 and the second guide hole 101, thereby achieving the sliding cooperation between the second sliding member 113 and the first sliding member 112. Furthermore, by reasonably designing the structure of the first sliding member 112, an accommodating space for accommodating the elastic member 114 is formed between different components of the first sliding member 112, thereby avoiding the elastic member 114 from occupying more extra space, which is conducive to the compact design of the clamping mechanism.
[0082] In the embodiment of the present application, the second sliding member 113 can have a variety of structures, and the second sliding member 113 can be an ordinary rod-shaped body. Of course, the structure of the second sliding member 113 can also be designed to enable it to perform more functions. Based on this, in some embodiments, the second sliding member 113 can include a first rod body 1131 and a first annular flange 1132. The first annular flange 1132 is fixed to the first rod body 1131 and extends around the circumference of the first rod body 1131. The first rod body 1131 extends into the second guide hole 101 and slidably cooperates with the second guide hole 101. The elastic member 114 is sleeved on the first rod body 1131, and the first end of the elastic member 114 elastically contacts the first annular flange 1132. In this case, the first end of the elastic member 114 is in contact with the first annular flange 1132, thereby achieving axial positioning of the second sliding member 113 (i.e., the sliding direction of the second sliding member 113), so that when the first sliding member 112 slides, the guide block 1122 will compress the elastic member 114, so that the elastic member 114 shrinks between the guide block 1122 and the first annular flange 1132, thereby adapting to the relative sliding between the first sliding member 112 and the second sliding member 113.
[0083] In the embodiment of the present application, the elastic member 114 may be a coil spring, a bellows structure, or an elastic structure made of elastic material. The embodiment of the present application does not limit the specific type and structure of the elastic member 114.
[0084] In a further technical solution, the second sliding member 113 may include a second rod body 1133 and a second annular flange 1134. The second rod body 1133 may be connected to the first rod body 1131 by a threaded connection. The first end of the second rod body 1133 is located within the slide 1121, and the second end of the second rod body 1133 passes through the first guide hole 102 and is connected to the second annular bushing 06. The second annular flange 1134 is located within the slide 1121. The clamping mechanism 11 disclosed in the embodiment of the present application may further include a first telescopic cylinder 115. The first telescopic cylinder 115 is sleeved on the second rod body 1133, and the two ends of the first telescopic cylinder 115 are sealed and connected to the second annular flange 1134 and the connecting block 1123 respectively. In this case, after the second rod body 1133 extends into the cavity 08 through the first guide hole 102, the two ports of the first telescopic cylinder 115 are sealed and connected respectively, so that the first guide hole 102 can at most connect the cylinder cavity of the first telescopic cylinder 115 and the internal space E of the cavity 08. The first telescopic cylinder 115 then serves the purpose of sealing the first guide hole 102, thereby preventing the internal space E of the cavity 08 from being connected with the interior of the first sliding member 112, and finally achieving the sealing of the internal space E of the cavity 08 at the first guide hole 102.
[0085] In some embodiments, the first telescopic tube 115 may be a first bellows or other elastic sleeve structure. The embodiment of the present application does not limit the specific type and structure of the first telescopic tube 115 .
[0086] In an embodiment of the present application, a third annular flange 1124 may also be provided in the slide 1121, and the third annular flange 1124 surrounds a second mounting hole 1125. A first sleeve 1126 is installed in the second mounting hole 1125, and the first sleeve 1126 is located between the guide block 1122 and the connecting block 1123. The second sliding member 113 passes through the first sleeve 1126, and the central axis of the first sleeve 1126, the central axis of the first guide hole 102 and the central axis of the second guide hole 101 are collinear. Because the first sleeve 1126 installed in the second mounting hole 1125 is located between the guide block 1122 and the connecting block 1123, and the central axis of the first sleeve 1126, the central axis of the first guide hole 102, and the central axis of the second guide hole 101 are collinear, the first sleeve 1126 can play a guiding role between the guide block 1122 and the connecting block 1123, thereby preventing the second slider 113 from being too long and causing the portion of the second slider 113 located between the guide block 1122 and the connecting block 1123 to bend, thereby ensuring more stable sliding of the second slider 113. The first sleeve 1126 can also prevent direct wear on the third annular flange 1124. The first sleeve 1126 is typically made of a wear-resistant material.
[0087] Furthermore, the first shaft sleeve 1126 can be detachably installed in the second mounting hole 1125 , and when the first shaft sleeve 1126 is severely worn, the first shaft sleeve 1126 can be replaced.
[0088] Since the first sliding member 112 also passes through the through-hole 082 and extends into the internal space E of the cavity 08, it is connected to the first annular liner 04. To ensure the sealing of the internal space E, similarly, the clamping mechanism 11 disclosed in the embodiment of the present application may include a second telescopic cylinder 117. The outer wall of the first sliding member 112 may be provided with a fourth annular flange 116. The second telescopic cylinder 117 may be sleeved on the first sliding member 112 and located within the cylindrical shell 111. The two ends of the second telescopic cylinder 117 are respectively sealed and docked with the fourth annular flange 116 and the cavity 08. Specifically, the cavity 08 may include a mounting seat 120, which is used to achieve the installation of the cylindrical shell 111. The mounting seat 120 is provided with a through hole connected to the through-hole 082. Accordingly, in this case, the two ends of the second telescopic cylinder 117 are respectively sealed and docked with the outer surface of the fourth annular flange 116 and the mounting seat 120 (i.e., the surface facing away from the internal space E).
[0089] Similarly, in some embodiments, the second telescopic tube 117 may be a first bellows or other elastic sleeve structure. The embodiment of the present application does not limit the specific type and structure of the second telescopic tube 117 .
[0090] In order to make the sliding of the first sliding member 112 within the cylindrical housing 111 more stable, the clamping mechanism 11 disclosed in the embodiment of the present application may further include a second sleeve 118 and a fifth annular flange 119 fixed within the cylindrical housing 111. The second sleeve 118 is axially fixed to the fifth annular flange 119 and is sleeved outside the first sliding member 112. The fifth annular flange 119 can prevent the second sleeve 118 from sliding within the cylindrical housing 111, thereby positioning the second sleeve 118 at a preset height of the cylindrical housing 111. The first sliding member 112 and the second sleeve 118 are guided and slidably matched in the sliding direction of the first sliding member 112. The second sleeve 118 is essentially a linear bearing. The second sleeve 118 can make the sliding of the first sliding member 112 within the cylindrical housing 111 more standardized. At the same time, the second sleeve 118 can prevent the first sliding member 112 from directly wearing the cylindrical housing 111. In some embodiments, the second sleeve 118 can be installed in the cylindrical housing 111 in a detachable manner.
[0091] In the embodiment of the present application, the second sliding member 113 of the clamping mechanism can be connected to the second ring liner 06 in a variety of ways. For example, the second sliding member 113 and the second ring liner 06 can be connected via a screw. Considering that screws require multiple turns during assembly and disassembly, which can easily generate contaminant particles, in some embodiments, the second ring liner 06 can be provided with a connecting groove 062, and a hooking protrusion 063 can be provided near the inner edge of the connecting groove 062.
[0092] Under this premise, the clamping mechanism disclosed in the embodiment of the present application may further include a snap-fit plate 12, which is detachably snapped onto the connecting groove 062. The snap-fit plate 12 is opposite to the hanging protrusion 063. The snap-fit plate 12 and the hanging protrusion 063 form a avoidance hole. The end of the second sliding member 113 is provided with a sixth annular flange 1135. The sixth annular flange 1135 is located in the connecting groove 062. Other parts of the second sliding member 113 extend out of the connecting groove 062 from the avoidance hole. The sixth annular flange 1135 is respectively engaged with the snap-fit plate 12 and the hanging protrusion 063. During installation, the end of the second sliding member 113 can be first placed into the connecting groove 062, and then the snap-fitting piece 12 can be snapped onto the connecting groove 062. This allows the snap-fitting piece 12 and the hooking protrusion 063 to form a clearance hole, ultimately achieving the simultaneous hooking and engagement of the sixth annular flange 1135 of the second sliding member 113 with the snap-fitting piece 12 and the hooking protrusion 063. This engagement allows the second sliding member 113 to move the second ring liner 06. Of course, during disassembly, the operator only needs to remove the snap-fitting piece 12 to disengage the sixth annular flange 1135 of the second sliding member 113 from the connecting groove 062, ultimately separating the second sliding member 113 from the second ring liner 06. This assembly method allows for connection through a single snap-fit operation, which reduces the generation of particulate contaminants compared to the long-term twisting required to connect screws.
[0093] In a further technical solution, the clamping mechanism 11 disclosed in the embodiment of the present application may further include a washer 13, which may be disposed between the sixth annular flange 1135, the engaging piece 12, and the hooking protrusion 063. The washer 13 can fill the gap, thereby improving the stability of the connection between the second sliding member 113 and the second annular liner 06, and can prevent the sixth annular flange 1135 from loosening within the connecting groove 062 and causing collisions, thereby preventing the generation of particles and foreign matter caused by the collisions.
[0094] When the first annular liner 04 includes a sleeve 045, the cylindrical liner 05 may be provided with an escape window 051, which serves as an escape function. The provision of escape window 051 facilitates the operator's attachment of the second slider 113 and the installation of the gasket 13 and the clip 12. In this case, the sleeve 045 is located inside the escape window 051, thereby preventing plasma from leaking through the escape window 051 within the process space D surrounded by the liner.
[0095] In the process chamber disclosed in the embodiment of the present application, the drive mechanism may further include a power source 14. The end of the first sliding member 112 may extend out of the end of the cylindrical housing 111 away from the chamber 08 and be connected to the power source 14. The power source 14 can drive the first sliding member 112 to slide, and the first sliding member 112 drives the second sliding member 113 to slide via the elastic member 114.
[0096] In a further optional solution, there can be multiple pressing mechanisms 11, and the multiple pressing mechanisms 11 can be spaced apart to achieve more balanced pressing. In some embodiments, there can be multiple power sources 14, and they correspond one-to-one to the multiple pressing mechanisms 11. Of course, in other embodiments, the power source 14 can be connected to the first sliding members 112 of the multiple pressing mechanisms 11 to drive the first sliding members 112 of the multiple pressing mechanisms 11 to slide.
[0097] In the embodiment of the present application, the power source 14 can be a telescopic mechanism or other structures. The embodiment of the present application does not limit the specific type of the power source 14. In order to realize the driving of multiple clamping mechanisms 11, further, in some embodiments, the driving mechanism can also include a connecting rod 15. The telescopic mechanism is fixed on the distribution plate 03, and the telescopic end of the telescopic mechanism is connected to the first sliding member 112 through the connecting rod 15. The telescopic mechanism can drive the first sliding members 112 of multiple clamping mechanisms 11 to slide synchronously through the connecting rod 15. In this case, the power source 14 can drive the first sliding members 112 of multiple clamping mechanisms 11 at the same time through the connecting rod 15, thereby achieving the purpose of driving more first sliding members 112 and second sliding members 113 to slide by using fewer power sources 14, which is undoubtedly conducive to streamlining the structure of the process chamber.
[0098] As described above, the first annular liner 04 may include an annular body 044 and a liner 045. In an embodiment where the inner edge of the annular body 044 includes an annular edge 041, the first port of the liner 045 is sealed and connected to the surface of the annular body 044 facing the second annular liner 06, the second port of the liner 045 is arranged adjacent to the second annular liner 06, and at least a portion of the liner 045 is arranged on the inner side of the cylindrical liner 05.
[0099] Based on this, the gap formed between the inner wall of the liner 045 and the opposing portion of the distribution plate 03 can be a first gap A, and the gap formed between the annular edge 041 and the edge 031 of the distribution plate 03 can be a second gap B. The first gap A and the second gap B can intersect. Specifically, the first gap A and the second gap B can be perpendicular. Because the first gap A and the second gap B intersect, a labyrinth structure can be formed between the first annular liner 04 and the distribution plate 03, effectively preventing plasma from escaping from the process space D. Furthermore, even if plasma does enter, it is easily annihilated due to the long labyrinth structure, preventing plasma from escaping.
[0100] Based on the process chamber provided in the embodiment of the present application, the embodiment of the present application further provides a semiconductor process equipment, and the provided semiconductor process equipment includes the process chamber provided in the above embodiment.
[0101] The above embodiments of this application focus on the differences between the various embodiments. As long as the different optimization features of the various embodiments are not contradictory, they can be combined to form a better embodiment. Considering the simplicity of the text, they will not be repeated here.
[0102] The embodiments of the present application are described above in conjunction with the accompanying drawings, but the present application is not limited to the above-mentioned specific implementation methods. The above-mentioned specific implementation methods are merely illustrative and not restrictive. Under the guidance of this application, ordinary technicians in this field can also make many forms without departing from the purpose of this application and the scope of protection of the claims, all of which are within the protection of this application.
Claims
1. An annular liner device for a process chamber, characterized in that: It includes a first ring liner, a cylindrical liner and a second ring liner, wherein: The first annular liner is connected to the first end of the cylindrical liner, the second annular liner is connected to the second end of the cylindrical liner, and the cylindrical liner is telescopic in the axial direction thereof.
2. The annular liner device according to claim 1, characterized in that: The annular liner device also includes a guide rod, a first end of which is fixedly connected to one of the first ring liner and the second ring liner, and a second end of which passes through the side wall of the cylindrical liner and is at least inserted into the other of the first ring liner and the second ring liner. The guide rod is slidably matched with the first ring liner or the second ring liner and is used to guide the alignment of the first ring liner and the second ring liner.
3. The annular liner device according to claim 2, characterized in that: The first ring liner or the second ring liner is provided with a first mounting hole, a first sleeve is fixedly installed in the first mounting hole, and the guide rod is inserted into the first sleeve and slidably cooperates with the first sleeve.
4. The annular liner device according to claim 2, characterized in that: There are multiple guide rods, which are distributed at intervals in the circumferential direction of the annular liner device.
5. The annular liner device according to claim 1, characterized in that: The inner edge of the first annular liner protrudes from the inner wall of the cylindrical liner to form an annular edge.
6. The annular liner device according to claim 5, characterized in that: The first annular liner includes an annular body and a liner, the inner edge of the annular body includes the annular edge, the first port of the liner is sealed and connected to the surface of the annular body facing the second annular liner, the second port of the liner is arranged adjacent to the second annular liner, and at least a portion of the liner is arranged on the inner side of the cylindrical liner.
7. The annular liner device according to claim 5, characterized in that: A first annular positioning groove is formed on a surface of the annular edge facing the second annular liner, and / or a second annular positioning groove is formed on an edge of the second annular liner.
8. The annular liner device according to claim 1, characterized in that: The second ring liner is provided with a connecting groove, and a portion of the connecting groove adjacent to the inner edge of the second ring liner is provided with a hanging protrusion.
9. The annular lining device according to any one of claims 1 to 8, characterized in that: The cylindrical liner includes a first ring, a second ring, an inner bellows and an outer bellows, the inner bellows is arranged inside the outer bellows, and the two form an annular gap, the first ring is sealed at the first end of the annular gap, the second ring is sealed at the second end of the annular gap, the first ring is connected to one of the first ring liner and the second ring liner, and the second ring is connected to the other of the first ring liner and the second ring liner.
10. The annular liner device according to claim 9, characterized in that: The annular lining device also includes a guide rod, part of which is located in the annular gap, one end of the guide rod passes through the second ring and is fixedly connected to one of the first and second ring liners, and the other end of the guide rod passes through the first ring and is slidably matched with the other of the first and second ring liners.
11. A lining of a process chamber, characterized in that: The invention comprises a third ring liner and the annular liner device according to any one of claims 1 to 10, wherein the second ring liner and the third ring liner of the annular liner device can be press-fitted.
12. The liner according to claim 11, characterized in that The inner liner further includes a second inductive coil extending along the circumference of the third ring liner and being compressed between the second ring liner and the third ring liner when the process chamber is in a process state, and electrically connecting the second ring liner and the third ring liner.
13. The liner according to claim 12, characterized in that At least one of the third ring liner and the second ring liner is provided with a second annular positioning groove, and the second induction coil is positioned in the second annular positioning groove.
14. The liner according to claim 11, characterized in that The annular end surface at the bottom end of the second ring liner is a first bending surface, and the edge of the third ring liner is provided with a second bending surface. The shapes of the first bending surface and the second bending surface are matched to form a bent third gap.
15. A process chamber, characterized in that: It comprises a cavity, a bearing seat and the liner according to any one of claims 11 to 14, wherein the cavity is provided with a film transmission port, and the third ring liner is arranged around the bearing seat; In the process state, the second ring liner presses the third ring liner; In a non-process state, the second ring liner is separated from the third ring liner, and the cylindrical liner is shortened to avoid the film transfer port.
16. The process chamber according to claim 15, characterized in that: The process chamber further comprises a distribution plate, which covers the top opening of the cavity. The edge of the distribution plate, the third annular liner, the annular liner device and the supporting seat are all arranged in the cavity.
17. The process chamber according to claim 16, characterized in that: The inner edge of the first ring liner protrudes from the inner wall of the cylindrical liner to form an annular edge; the process chamber also includes a first electromagnetic coil, which is arranged along the circumference of the annular edge and is pressed between the annular edge and the edge of the distribution plate under the process state, and electrically connects the first ring liner and the distribution plate.
18. The process chamber according to claim 17, characterized in that: At least one of the annular edge and the edge of the distribution plate is provided with a first annular positioning groove, and the first induction coil is positioned in the first annular positioning groove.
19. The process chamber according to claim 16, characterized in that: The process chamber also includes a driving mechanism, which is connected to the first ring liner and the second ring liner respectively, and is used to drive the first ring liner to drive the annular edge to press the edge of the distribution plate and the second ring liner to press the third ring liner under the process state.
20. The process chamber according to claim 19, characterized in that The inner edge of the first ring liner protrudes from the inner wall of the cylindrical liner and forms an annular edge; the driving mechanism includes a clamping mechanism, and the clamping mechanism includes a first sliding member, a second sliding member and an elastic member. The cavity is provided with a through hole, and the first sliding member passes through the through hole and is connected to the first ring liner. Part of the second sliding member is slidably arranged in the first sliding member, and passes through the through hole and is connected to the second ring liner. The elastic member is connected between the first sliding member and the second sliding member and is in a pre-stressed state. When the driving mechanism is pressed and driven, the second ring liner is only in contact with the third ring liner, and the annular edge and the edge of the distribution plate are spaced apart in the clamping direction.
21. The process chamber according to claim 20, characterized in that: The clamping mechanism further comprises a cylindrical outer shell, wherein the cylindrical outer shell is fixed outside the cavity, the cylindrical outer shell is connected with the inner space of the cavity through the through hole, and at least a part of the first sliding member is slidably disposed inside the cylindrical outer shell.
22. The process chamber according to claim 21, characterized in that The first sliding member includes a sliding cylinder, a guide block and a connecting block, wherein: At least part of the slide is slidably disposed in the cylindrical housing, the connecting block blocks the port of the slide adjacent to the cavity and extends into the internal space to be connected to the first ring liner, at least part of the guide block is fixed in the slide and spaced apart from the connecting block, the connecting block is provided with a first guide hole, and the guide block is provided with a second guide hole; The first end of the second sliding member is connected to the second ring bushing, the second end of the second sliding member passes through the first guide hole and extends into the second guide hole to slide with the first guide hole and the second guide hole respectively, the elastic member is sleeved on the portion of the second sliding member located between the first guide hole and the second guide hole, the first end of the elastic member is connected to the second sliding member, and the second end of the elastic member abuts against the guide block.
23. The process chamber according to claim 22, characterized in that: The second sliding member includes a first rod body and a first annular flange, the first annular flange is fixed to the first rod body and extends in a circumferential direction around the first rod body, the first rod body extends into the second guide hole and slidably cooperates with the second guide hole, the elastic member is sleeved on the first rod body, and the first end of the elastic member elastically contacts the first annular flange.
24. The process chamber according to claim 22, characterized in that The second sliding member includes a second rod body and a second annular flange, the first end of the second rod body is located in the slide cylinder, the second end of the second rod body passes through the first guide hole and is connected to the second annular bushing, the second annular flange is located in the slide cylinder, and the clamping mechanism also includes a first telescopic cylinder, the first telescopic cylinder is sleeved on the second rod body, and the two ports of the first telescopic cylinder are respectively sealed and connected to the second annular flange and the connecting block.
25. The process chamber according to claim 22, characterized in that A third annular flange is provided in the slide cylinder, and the third annular flange surrounds a second mounting hole. A first sleeve is installed in the second mounting hole, and the first sleeve is located between the guide block and the connecting block. The second sliding member passes through the first sleeve, and the central axis of the first sleeve, the central axis of the first guide hole and the central axis of the second guide hole are collinear.
26. The process chamber according to claim 21, characterized in that The outer wall of the first sliding member is provided with a fourth annular flange, and the clamping mechanism also includes a second telescopic cylinder, which is sleeved on the first sliding member and located inside the cylindrical outer shell, and the two ends of the second telescopic cylinder are respectively sealed and connected to the fourth annular flange and the cavity.
27. The process chamber according to claim 21, characterized in that The clamping mechanism also includes a second sleeve and a fifth annular flange fixed inside the cylindrical shell, the second sleeve is axially fixed to the fifth annular flange and is sleeved outside the first sliding member, and the first sliding member and the second sleeve are guided and slidably matched in the sliding direction of the first sliding member.
28. The process chamber according to claim 21, characterized in that The second ring liner is provided with a connecting groove, and a portion of the connecting groove adjacent to the inner edge of the second ring liner is provided with a hanging protrusion; The clamping mechanism also includes a snap-in piece, which is detachably snap-into the connecting groove, the snap-in piece is opposite to the hanging protrusion, and the snap-in piece and the hanging protrusion form a avoidance hole. A sixth annular flange is provided at the end of the second sliding member, and the sixth annular flange is located in the connecting groove. Other parts of the second sliding member extend out of the connecting groove from the avoidance hole, and the sixth annular flange is respectively engaged with the snap-in piece and the hanging protrusion.
29. The process chamber according to claim 28, characterized in that The clamping mechanism further includes a gasket, which is arranged between the sixth annular flange, the clamping piece and the hanging protrusion.
30. The process chamber according to claim 21, characterized in that The end of the first sliding member extends out of the port of the cylindrical shell away from the cavity, the driving mechanism also includes a power source, there are multiple clamping mechanisms, and the multiple clamping mechanisms are distributed at intervals. The power source is connected to the first sliding members of the multiple clamping mechanisms to drive the first sliding member to slide.
31. The process chamber according to claim 30, characterized in that: The power source is a telescopic mechanism, and the driving mechanism also includes a connecting rod. The telescopic mechanism is fixed on the distribution plate, and the telescopic end of the telescopic mechanism is connected to the first sliding member through the connecting rod. The telescopic mechanism can drive the first sliding members of multiple clamping mechanisms to slide synchronously through the connecting rod.
32. The process chamber according to claim 16, wherein: The first annular liner comprises an annular body and a liner, wherein the inner edge of the annular body protrudes from the inner wall of the liner and forms an annular edge; the first port of the liner is sealed and connected to the surface of the annular body facing the second annular liner, the second port of the liner is arranged adjacent to the second annular liner, and at least a part of the liner is arranged on the inner side of the cylindrical liner; The gap formed between the inner wall of the liner and the distribution plate is a first gap, the gap formed between the annular edge and the edge of the distribution plate is a second gap, and the first gap intersects with the second gap.
33. A semiconductor process equipment, characterized in that: A process chamber comprising any one of claims 15 to 32.
Citation Information
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