Reticle load lock system and method

The reticle load lock system with a variable orifice valve and servo control enhances the efficiency of pump down and venting operations, addressing the inefficiencies of traditional systems and ensuring faster and more reliable reticle handling in lithography.

WO2025113901A1 Publication Date: 2025-06-05ASML NETHERLANDS BV
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Patent Information

Application Number
PCT/EP2024/080393
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-11-27
Filing Date
2024-10-28
Publication Date
2025-06-05

AI Technical Summary

Technical Problem

Traditional reticle load lock systems in lithography apparatuses are inefficient due to the use of three discrete valves and orifices, which limit pump down and venting speeds and cannot be adjusted for optimal performance.

Method used

A reticle load lock system utilizing a valve with a variable-sized orifice, controlled by a servo valve system, to optimize pump down and venting operations by following a desired pressure profile, thereby maintaining the structural integrity of the reticle pellicle.

Benefits of technology

The system significantly reduces pump down and venting times while maintaining the structural integrity of the reticle pellicle, allowing for faster and more efficient operation of the lithography apparatus.

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Abstract

A reticle load lock having a valve with a variable size orifice, or servo valving, is described. Servo valving can continually adjust the size of the orifice such that the reticle load lock can pump or vent at an optimal level. The servo valving pressure profile follows an optimized pressure rate to protect the structural integrity of the pellicle. The optimized servo valving curves minimize the evacuation and vent times without exceeding the pressure rate (dP / dt) limits. By following the optimized pressure rate curve, servo valving significantly reduces the time to pump down and vent and prevents breakage of the pellicle.
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