Display device

Abstract

A display device is provided, comprising: a display panel; a polarizing film disposed on the display panel; and a reflective layer disposed on the polarizing film, wherein the reflective layer is disposed between a first hole and a first groove, wherein the first hole passes through the display panel and the polarizing film, and the first groove is disposed around the first hole in the display panel.

Description

[0001] This patent application claims the benefit of Korean Patent Application No. 10-2018-0145368, filed on November 22, 2018, the disclosure of which is hereby incorporated by reference in its entirety. Technical Field

[0002] The inventive concept relates to a display device and a method for manufacturing the display device. Background Art

[0003] Generally, electronic devices such as smart phones, digital cameras, laptop computers, navigation units, and smart TVs include a display device for displaying images to a user. The display device generates an image and provides the generated image to the user through a display screen.

[0004] The display device includes a display panel for generating an image and a functional element for providing various functions to a user. The functional element includes a speaker, a camera, a functional button, etc. A plurality of holes are provided in the display panel, and the functional element is provided in the holes. The holes are manufactured by removing a cutting area from the display panel while manufacturing the display device.

[0005] Laser light having a predetermined wavelength is irradiated to each boundary (hereinafter, referred to as a cutting line) in the cutting area to cut the cutting area. However, if the laser light vibrates, the cutting line will not be accurately cut. Summary of the invention

[0006] An exemplary embodiment of the inventive concept provides a display device, comprising: a display panel; a polarizing film disposed on the display panel; and a reflective layer disposed on the polarizing film, wherein the reflective layer is disposed between a first hole and a first groove, wherein the first hole passes through the display panel and the polarizing film, and the first groove is disposed around the first hole in the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] The exemplary embodiments of the inventive concept will be more clearly understood through the following detailed description in conjunction with the accompanying drawings. In the accompanying drawings:

[0008] Figure 1 is a plan view of a display device according to an exemplary embodiment of the inventive concept;

[0009] Figure 2 yes Figure 1 A block diagram of a display device shown in ;

[0010] Figure 3 yes Figure 2 An equivalent circuit diagram of a pixel shown in ;

[0011] Figure 4 It is shown Figure 3A schematic diagram of the cross-sectional structure of the pixel shown in ;

[0012] Figure 5 It is set with Figure 1 An enlarged view of the planar configuration near the aperture of the camera shown in ;

[0013] Figure 6 is along Figure 5 A cross-sectional view taken along line 1-I';

[0014] Figure 7 It is shown Figure 6 A view of a stacked structure of a reflective layer shown in FIG.

[0015] Figure 8 , Fig. 9 , Fig.10 and Fig.11 is a view for describing a method for manufacturing a display device according to an exemplary embodiment of the inventive concept;

[0016] Fig.12 is a view showing a reflective layer of a display device according to another exemplary embodiment of the inventive concept;

[0017] Fig.13 is a view of a planar configuration near a hole in a display device according to another exemplary embodiment of the inventive concept;

[0018] Fig.14 is along Fig.13 A cross-sectional view taken along line II-II';

[0019] Fig.15 is along Fig.13 A cross-sectional view taken along line III-III';

[0020] Fig.16 is a view of a planar configuration near a hole in a display device according to another exemplary embodiment of the inventive concept;

[0021] Fig.17 is along Fig.16 A cross-sectional view taken along line IV-IV';

[0022] Fig.18 is along Fig.16 A cross-sectional view taken along line V-V';

[0023] Fig.19 Is used to describe Fig.18 A view of the functions of the recessed and protruding parts shown in FIG.

[0024] Fig. 20 is a view showing a cross-sectional configuration of a display device according to another exemplary embodiment of the inventive concept;

[0025] Fig.21 is a plan view showing a touch sensing portion of a display device according to another exemplary embodiment of the inventive concept;

[0026] Fig. 22 It is shown Fig.21 A cross-sectional surface view of a first connecting portion connected to a first sensor portion shown in FIG.

[0027] Fig.23 yes Fig.21 An enlarged view of the first area A1 shown in FIG.

[0028] Fig.24 is a view of a cross-sectional configuration of a display device according to another exemplary embodiment of the inventive concept; and

[0029] Fig.25 is a view of a cross-sectional configuration of a display device according to another exemplary embodiment of the inventive concept. DETAILED DESCRIPTION

[0030] In this specification, when an element (or region, layer, part, etc.) is referred to as being "on", "connected to" or "coupled to" another element, the element may be directly on, directly connected to or directly coupled to the other element, or a third element may be placed therebetween.

[0031] In the accompanying drawings, the same reference numerals may refer to the same elements. In addition, in the accompanying drawings, the sizes of layers and regions may be exaggerated for clarity of illustration.

[0032] Hereinafter, exemplary embodiments of the inventive concept will be described in detail with reference to the accompanying drawings.

[0033] Figure 1 is a plan view illustrating a display device DD according to an exemplary embodiment of the inventive concept.

[0034] Reference Figure 1 The display device DD may include a display area DA and an edge portion EG surrounding the display area DA and forming a boundary of the display device DD. The display area DA may have a plane extending in a first direction DR1 and a second direction DR2 crossing the first direction DR1.

[0035] The display device DD may include functional elements SPK and CAM disposed in a plurality of holes H in the display device DD. The functional elements SPK and CAM may include a speaker SPK and a camera CAM. However, the inventive concept is not limited thereto, and various functional elements (eg, sensors and functional buttons) may be disposed in additional holes H.

[0036] Figure 1The display device DD is shown to be a mobile phone. However, the display device DD can be used for large electronic devices such as televisions and external advertising boards, and can also be used for small and medium-sized electronic devices such as personal computers, laptop computers, car navigation systems, game consoles, and tablet computers. It will be understood that these electronic devices are provided only as examples, and therefore, the display device DD can also be used for other electronic devices.

[0037] Figure 2 yes Figure 1 A block diagram of a display device DD is shown in FIG.

[0038] Reference Figure 2 The display device DD may include a display panel DP, a scan driver SDV, a data driver DDV, an emission driver EDV, and a timing controller TC. The display panel DP may be an organic light emitting display panel, but the inventive concept is not limited thereto, and various display panels such as a liquid crystal display panel, an electrowetting display panel, and an electrophoretic display panel may be used as the display panel DP.

[0039] The display panel DP may be a flexible display panel. The display panel DP may have a plane extending in the first direction DR1 and the second direction DR2. Figure 1 The display area DA shown in FIG. 1 is overlapped. The display area DA may be a display area of ​​the display panel DP. Figure 1 The edge portion EG shown in FIG. 4 may be disposed on the periphery of the display panel DP.

[0040] The display panel DP may include a plurality of pixels PX, a plurality of scan lines SL1 to SLm, a plurality of data lines DL1 to DLn, and a plurality of emission lines EL1 to ELm. m and n are natural numbers. The pixels PX may be connected to the scan lines SL1 to SLm, the data lines DL1 to DLn, and the emission lines EL1 to ELm.

[0041] Scan lines SL1 to SLm may extend in a first direction DR1 and be connected to a scan driver SDV and pixels PX. Data lines DL1 to DLn may extend in a second direction DR2 and be connected to a data driver DDV and pixels PX. Emission lines EL1 to ELm may extend in a first direction DR1 and be connected to an emission driver EDV.

[0042] The scan driver SDV may generate a plurality of scan signals, and the scan signals may be applied to the pixels PX through the scan lines SL1 to SLm. The scan signals may be sequentially applied to the pixels PX.

[0043] The data driver DDV may generate a plurality of data voltages, and the data voltages may be applied to the pixels PX through the data lines DL1 to DLn. The emission driver EDV may generate a plurality of emission signals, and the emission signals may be applied to the pixels PX through the emission lines EL1 to ELm.

[0044] The timing controller TC may control operation timings of the scan driver SDV, the data driver DDV, and the emission driver EDV. The timing controller TC may respond to a control signal CS received from the outside and generate a scan control signal SCS, a data control signal DCS, and an emission control signal ECS.

[0045] The timing controller TC may receive an image signal RGB from the outside and convert the data format of the image signal RGB into an interface specification conforming to the display device DD for the data driver DDV. The timing controller TC may provide the converted image signal R'G'B' to the data driver DDV.

[0046] The scan driver SDV may respond to the scan control signal SCS and generate a scan signal. The data driver DDV may receive the converted image signal R'G'B' and respond to the data control signal DCS to generate a data voltage corresponding to the converted image signal R'G'B'. The emission driver EDV may respond to the emission control signal ECS to generate an emission signal.

[0047] A first power supply voltage ELVDD and a second power supply voltage ELVSS may be provided to the pixel PX. The pixel PX may respond to a scan signal and receive a data voltage. The pixel PX may respond to an emission signal and generate light having a brightness corresponding to the data voltage to display an image. The light emission time of the pixel PX may be controlled by the emission signal.

[0048] Each of the pixels PX may express one of the primary colors or one of the mixed colors. The primary colors may include red, green, and blue, and the mixed colors may include various colors such as yellow, cyan, magenta, and white. However, the colors displayed by the pixels PX are not limited thereto.

[0049] Figure 3 yes Figure 2 An equivalent circuit diagram of one of the pixels PX shown in FIG.

[0050] although Figure 3 The configuration of only one pixel PX is shown, but all pixels PX may have the same Figure 3 The configuration of the pixel PX shown in FIG. 1 is the same as that of FIG.

[0051] Reference Figure 3, the pixel PX can be connected to a corresponding scan line SLi among the scan lines SL1 to SLm, a corresponding data line DLj among the data lines DL1 to DLn, and a corresponding emission line ELi among the emission lines EL1 to ELm. i is a natural number equal to or less than m, and j is a natural number equal to or less than n.

[0052] The pixel PX may include a light emitting element OLED, a driving transistor T1, a capacitive element Cst, a switching transistor T2, and an emission control transistor T3. The light emitting element OLED may be an organic light emitting diode.

[0053] A source terminal of the driving transistor T1 may receive the first power supply voltage ELVDD, and a drain terminal of the driving transistor T1 may be connected to a source terminal of the emission control transistor T3. A gate terminal of the driving transistor T1 may be connected to a drain terminal of the switching transistor T2.

[0054] The gate terminal of the switching transistor T2 may be connected to the scan line SLi, and the source terminal of the switching transistor T2 may be connected to the data line DLj. The first electrode of the capacitor Cst may be connected to the source terminal of the driving transistor T1, and the second electrode of the capacitor Cst may be connected to the gate terminal of the driving transistor T1.

[0055] The gate terminal of the emission control transistor T3 can be connected to the emission line ELi, and the drain terminal of the emission control transistor T3 can be connected to the anode electrode of the light emitting element OLED. The cathode electrode of the light emitting element OLED can receive the second power supply voltage ELVSS. The second power supply voltage ELVSS can have a voltage level lower than the voltage level of the first power supply voltage ELVDD.

[0056] The switching transistor T2 may be turned on in response to a scan signal SCAN received through the scan line SLi. The turned-on switching transistor T2 may provide the gate terminal of the driving transistor T1 with a data voltage DATA received through the data line DLj. The capacitive element Cst may be charged with the data voltage DATA applied to the gate terminal of the driving transistor T1, and may maintain the data voltage DATA after the switching transistor T2 is turned off.

[0057] The gate terminal of the emission control transistor T3 can be turned on in response to the emission signal EM received through the emission line ELi. The turned-on emission control transistor T3 can provide the current Ioled flowing through the driving transistor T1 to the light emitting element OLED. The pixel PX can emit light during the application time of the emission signal EM. The light emitting element OLED can emit light with different light intensities according to the amount of the provided current Ioled.

[0058] For example, the transistors T1 to T3 of the pixel PX may be p-channel metal oxide semiconductor (PMOS) transistors, but the inventive concept is not limited thereto, and the transistors T1 to T3 of the pixel PX may be n-channel metal oxide semiconductor (NMOS) transistors.

[0059] Figure 4 It is shown Figure 3 Schematic diagram of the cross-sectional structure of the pixel PX shown in FIG. Figure 4 In the figure, for example, PA refers to a pixel area and NPA refers to a non-pixel area.

[0060] Reference Figure 4 , the pixel PX may include a transistor TR disposed on the first base substrate BS1 and a light emitting element OLED connected to the transistor TR. The transistor TR may be an emission control transistor T3. The first base substrate BS1 may be a flexible substrate. For example, the first base substrate BS1 may include polyimide (PI).

[0061] The second base substrate BS2 may be disposed under the first base substrate BS1. The second base substrate BS2 may be a protective substrate that protects the lower surface of the first base substrate BS1. The second base substrate BS2 may be a flexible substrate. For example, the second base substrate BS2 may include polyimide or polyethylene terephthalate (PET).

[0062] An inorganic insulating layer may be disposed between the first base substrate BS1 and the second base substrate BS2. For example, the inorganic insulating layer may include, but is not limited to, silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, or aluminum oxide.

[0063] The buffer layer BFL is disposed on the first base substrate BS1 and may include an inorganic material. For example, the buffer layer BFL may include, but is not limited to, silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, or aluminum oxide.

[0064] An inorganic insulating layer may be disposed between the first base substrate BS1 and the buffer layer BFL. For example, the inorganic insulating layer may include, but is not limited to, silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, or aluminum oxide.

[0065] The transistor TR may be disposed on the buffer layer BFL. The transistor TR may include a gate electrode GE, a source electrode SE, a drain electrode DE, and a semiconductor layer SM. The transistor TR may be disposed on a layer on which the first insulating layer IL1, the second insulating layer IL2, the third insulating layer IL3, and the fourth insulating layer IL4 are disposed.

[0066] The semiconductor layer SM may be disposed on the buffer layer BFL. The semiconductor layer SM may include a semiconductor composed of an inorganic material such as amorphous silicon or polycrystalline silicon or an organic semiconductor. In addition, the semiconductor layer SM may include an oxide semiconductor. The semiconductor layer SM may include a source region, a drain region, and a channel region between the source region and the drain region.

[0067] The buffer layer BFL may provide a modified surface to the semiconductor layer SM. In this case, the semiconductor layer SM may have higher adhesion to the buffer layer BFL than when the semiconductor layer SM is directly disposed on the first base substrate BS1. The buffer layer BFL may be a barrier layer that protects the lower surface of the semiconductor layer SM. In this case, the buffer layer BFL may prevent contaminants, moisture, etc. from being introduced into the first base substrate BS1 and the second base substrate BS2 or introduced into the semiconductor layer SM through the first base substrate BS1 and the second base substrate BS2.

[0068] The first insulating layer IL1 may be disposed on the buffer layer BFL to cover the semiconductor layer SM. The first insulating layer IL1 may include an inorganic material. For example, the first insulating layer IL1 may include, but is not limited to, silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, or aluminum oxide.

[0069] The gate electrode GE overlapped with the semiconductor layer SM may be disposed on the first insulating layer IL1. The gate electrode GE may be disposed to overlap with the channel region of the semiconductor layer SM. The second insulating layer IL2 may be disposed on the first insulating layer IL1 to cover the gate electrode GE. The second insulating layer IL2 may include an inorganic material. The third insulating layer IL3 may be disposed on the second insulating layer IL2. The third insulating layer IL3 may include an organic material and / or an inorganic material.

[0070] The source electrode SE and the drain electrode DE may be disposed on the third insulating layer IL3 and spaced apart from each other. The source electrode SE may be connected to the source region of the semiconductor layer SM through a first contact hole CH1 passing through the first insulating layer IL1, the second insulating layer IL2, and the third insulating layer IL3. The drain electrode DE may be connected to the drain region of the semiconductor layer SM through a second contact hole CH2 passing through the first insulating layer IL1, the second insulating layer IL2, and the third insulating layer IL3.

[0071] The fourth insulating layer IL4 may be disposed on the third insulating layer IL3 to cover the source electrode SE and the drain electrode DE. The fourth insulating layer IL4 may be a planarization film providing a planar upper surface, and may include an organic material.

[0072] The light emitting element (eg, organic light emitting element) OLED may include a first electrode E1, an organic light emitting layer OEL, and a second electrode E2. The first electrode E1 may be disposed on the fourth insulating layer IL4. The first electrode E1 may be connected to the drain electrode DE through a third contact hole CH3 passing through the fourth insulating layer IL4.

[0073] The first electrode E1 may be a pixel electrode or an anode electrode. The first electrode E1 may be a positive electrode of a hole injection electrode. The first electrode E1 may include a transparent electrode or a reflective electrode.

[0074] A pixel defining layer PDL exposing a predetermined portion of the first electrode E1 may be disposed on the fourth insulating layer IL4 . A pixel opening PX_OP exposing a predetermined portion of the first electrode E1 may be in the pixel defining layer PDL.

[0075] The organic light emitting layer OEL may be disposed on the first electrode E1 within the pixel opening PX_OP. The organic light emitting layer OEL may generate light having any one color among red, green, and blue. However, the inventive concept is not limited thereto, and the organic light emitting layer OEL may generate mixed color light by combining organic materials that generate red, green, and blue light.

[0076] The second electrode E2 may be disposed on the pixel defining layer PDL and the organic light emitting layer OEL. The second electrode E2 may be a common electrode or a cathode electrode. The second electrode E2 may be a negative electrode of an electron injection electrode. The second electrode E2 may include a transparent electrode or a reflective electrode.

[0077] When the display panel DP is a top emission type organic light emitting display panel, the first electrode E1 may include a reflective electrode, and the second electrode E2 may include a transparent electrode. When the display panel DP is a bottom emission type organic light emitting display panel, the first electrode E1 may include a transparent electrode, and the second electrode E2 may include a reflective electrode.

[0078] The encapsulation layer TFE may be disposed on the second electrode E2. The encapsulation layer TFE may be a thin film encapsulation layer. The encapsulation layer TFE may include at least two inorganic layers and an organic layer disposed between the two inorganic layers. The inorganic layer may contain an inorganic material and may protect the light emitting element OLED from moisture / oxygen. The organic layer may contain an organic material and may protect the light emitting element OLED from foreign substances such as dust particles.

[0079] A first power supply voltage ELVDD that allows the organic light emitting layer OEL to emit light may be applied to the first electrode E1 through the transistor TR, and a second power supply voltage ELVSS may be applied to the second electrode E2. Holes and electrons injected into the organic light emitting layer OEL are combined so that excitons may be formed, and when the excitons transition to a ground state, the light emitting element OLED may emit light.

[0080] Figure 5 It is set with Figure 1 An enlarged view of the planar structure near the hole H of the camera CAM shown in FIG. Figure 6 is along Figure 5 A cross-sectional view taken along line II'.

[0081] The configuration near the hole H in which the camera CAM is provided and the configuration near the hole H in which the speaker SPK is provided may be substantially the same. Figure 5 and Figure 6 , only the configuration near the hole H in which the camera CAM is disposed will be described in detail.

[0082] Reference Figure 5 and Figure 6 , the display device DD may include a polarizing film (or polarizing layer) POL disposed on the display panel DP. The display panel DP may include first and second base substrates BS1 to BS2, first to fourth insulating layers IL1 to IL4, a pixel defining layer PDL, and an encapsulation layer TFE. The polarizing film POL may be disposed on the encapsulation layer TFE.

[0083] The polarizing film POL may be bonded to the display panel DP by an adhesive. The adhesive may include an optically transparent adhesive. The polarizing film POL may be an anti-reflection film.

[0084] Touch detection unit (or touch sensing unit) TS (see Fig.21 ) may be disposed between the encapsulation layer TFE and the polarization film POL. The touch detection unit TS may detect an external touch.

[0085] The polarizing film POL may reduce reflectivity of external light incident on the display panel DP from above the display panel DP. For example, the polarizing film POL may include a retarder and / or a polarizer.

[0086] The hole H may penetrate the display panel DP and the polarizing film POL. The camera CAM may be disposed in the hole H.

[0087] In the display panel DP, a plurality of grooves G1 and G2 may be provided around the hole H. Two grooves G1 and G2 are exemplarily shown in the display panel DP, but the number of the grooves G1 and G2 is not limited thereto. For example, a single groove may be provided in the display panel DP, or more than two grooves may be provided in the display panel DP. The polarizing film POL may cover the first groove G1 and the second groove G2.

[0088] The grooves G1 and G2 may include a first groove G1 and a second groove G2 surrounding the first groove G1. The first and second grooves G1 and G2 may pass through the first to fourth insulating layers IL1 to IL4 and the buffer layer BFL and be recessed to a predetermined depth in the first base substrate BS1.

[0089] The pixel PX may be disposed in a region of the display panel DP excluding a region where the hole H and the first and second grooves G1 and G2 are disposed. For example, the pixel PX may be disposed on the first base substrate BS1 between the second groove G2 and the periphery of the display panel DP.

[0090] For example, when viewed in a plan view, the hole H may have a circular shape, and each of the first groove G1 and the second groove G2 may have an annular shape, but the shapes of the hole H and the first groove G1 and the second groove G2 are not limited thereto. The term "when viewed in a plan view" may refer to a state in which a plane is viewed from above the plane itself. The plane may be defined by a first direction DR1 and a second direction DR2.

[0091] An opening OP overlapping the first and second grooves G1 and G2 and an area between the first and second grooves G1 and G2 may be provided in the pixel defining layer PDL and the encapsulation layer TFE. The polarizing film POL may cover the opening OP. The opening OP, the first and second grooves G1 and G2 may be an integrated space.

[0092] The reflective layer RL may be disposed on the polarizing film POL between the hole H and the first groove G1. The reflective layer RL may reflect light. For example, the reflective layer RL may reflect laser light having a predetermined wavelength. The wavelength of the laser light may be about 355 nm.

[0093] The reflective layer RL may include a plurality of layers. A specific configuration of the reflective layer RL will be described in detail below.

[0094] The configuration near the hole H in which the camera CAM is disposed is exemplarily described; however, the configuration near each of the holes H in which other functional elements are disposed may be substantially the same as the configuration near the hole H in which the camera CAM is disposed.

[0095] Figure 7 It is shown Figure 6A view of the stacked structure of the reflective layer RL shown in FIG.

[0096] Reference Figure 7 , the reflective layer RL may include a plurality of refractive layers RF1, RF2, ..., RFk. The refractive layers RF1, RF2, ..., RFk may be formed by stacking about 13 or more layers, for example, by stacking about 13 to 15 layers. The refractive layers RF1, RF2, ..., RFk may be inorganic insulating layers containing inorganic materials.

[0097] Hereinafter, the thickness may be referred to as the distance between the upper end (or upper surface) and the lower end (or lower surface) of the corresponding structure. In addition, the thickness may be a value measured relative to a direction perpendicular to a plane defined by the first direction DR1 and the second direction DR2. The width may be the distance between the two side surfaces of the corresponding structure, and may be a value measured relative to the horizontal direction.

[0098] Each of the refractive layers RF1, RF2, ..., RFk may have a thickness of about 10 nm to about 30 nm. The refractive layers RF1, RF2, ..., RFk may have at least two refractive indices different from each other. For example, the refractive layers RF1, RF2, ..., RFk may include: a plurality of first refractive layers RF1; and a plurality of second refractive layers RF2 having a refractive index different from that of the first refractive layers RF1. Each of the second refractive layers RF2 may have a refractive index greater than that of each of the first refractive layers RF1.

[0099] The first refractive layer RF1 and the second refractive layer RF2 may be alternately stacked. For example, the first refractive layer RF1 may be first disposed on the polarizing film POL, and then, the second refractive layer RF2 and the first refractive layer RF1 may be alternately stacked. However, the inventive concept is not limited thereto, and the second refractive layer RF2 may be first disposed on the polarizing film POL, and then, the first refractive layer RF1 and the second refractive layer RF2 may be alternately stacked.

[0100] When the refractive layers RF1, RF2, ..., RFk include an odd number of layers, the uppermost refractive layer RFk may be the first refractive layer RF1. When the refractive layers RF1, RF2, ..., RFk include an even number of layers, the uppermost refractive layer RFk may be the second refractive layer RF2.

[0101] The first refraction layer RF1 and the second refraction layer RF2 may include inorganic materials different from each other. For example, each of the first refraction layers RF1 may include silicon oxide (SiO 2 Each of the second refractive layers RF2 may include titanium oxide (TiO 2 ).

[0102] When the first refractive layer RF1 and the second refractive layer RF2 are formed by stacking 13 or more layers, the reflective layer RL may reflect laser light having a predetermined wavelength.

[0103] Figures 8 to 11 is a view for describing a method for manufacturing a display device DD according to an exemplary embodiment of the inventive concept.

[0104] For ease of description, Figure 8 , Fig.10 and Fig.11 Shown as corresponding to Figure 6 sectional view of .

[0105] Reference Figure 8 , a display panel DP including a cutting area CA defined by a cutting line CL may be prepared. The cutting line CL may be Figure 5 Therefore, the cutting line CL can be a closed curve.

[0106] A polarizing film POL may be disposed on the display panel DP to cover the first groove G1 and the second groove G2. A reflective layer RL may be disposed on the polarizing film POL between the cutting line CL and the first groove G1.

[0107] The laser unit LU may be disposed above the polarization film POL, and the laser LAR generated by the laser unit LU may be irradiated toward the cutting line CL. As described above, the wavelength of the laser LAR may be about 355 nm. The laser LAR may be irradiated along the cutting line CL to draw a closed curve.

[0108] Reference Fig. 9 , the laser LAR may irradiate the cutting line CL while slightly vibrating. Therefore, the laser LAR does not irradiate the cutting line CL accurately, and irradiates near the cutting line CL. For example, Fig. 9 As shown in FIG. 1 , the laser light LAR may be irradiated to an outer area of ​​the cutting area CA adjacent to the cutting line CL. The laser light LAR provided to the outer area of ​​the cutting area CA may be reflected by the reflective layer RL.

[0109] The laser light LAR may also be supplied to a portion of the cutting area CA adjacent to the cutting line CL. However, since the cutting area CA is an area to be removed, even if the laser light LAR is supplied to the cutting area CA, the yield of the display device DD is not affected.

[0110] However, when the reflective layer RL is not provided on the polarizing film POL, the laser LAR is provided to the outside of the cutting area CA. Due to such laser cutting tolerance, the cutting area CA is not accurately cut. In addition, due to the vibration of the laser LAR, the cutting surface is not smooth.

[0111] Since the laser LAR may be inaccurate when providing the laser LAR to the cutting area CA, the laser cutting tolerance should be considered to ensure sufficient process margin. The process margin is a space provided so that the first groove G1 and the second groove G2 are not irradiated by the laser LAR during the laser cutting process. For example, the process margin may correspond to the space between the first groove G1 and the cutting line CL. For example, since the laser LAR will not be accurately provided to the cutting line CL, the space between the first groove G1 and the cutting line CL should be large enough to prevent the first groove G1 and the second groove G2 from being hit by the laser LAR.

[0112] However, in an exemplary embodiment of the inventive concept, due to the reflective layer RL, the laser LAR may not be provided to the outside of the cutting area CA, and therefore, the laser LAR may be provided to the cutting line CL more accurately. In this case, the cutting area CA may be cut more accurately, and the cutting surface may be smoother. Due to the possibility that the laser LAR is provided to the outside of the cutting area CA, a sufficient process margin (e.g., space) is generally ensured; however, according to an exemplary embodiment of the inventive concept, such a space is not required, and therefore, the process margin may be reduced.

[0113] Reference Fig.10 and Fig.11 , irradiating the laser LAR toward the cutting line CL, the cutting area CA may be cut and the cutting area CA may be removed. By removing the cutting area CA, a hole H may be provided in the display panel DP and the polarizing film POL. Since the cutting area CA is cut more accurately, the hole H may be processed more accurately. A display device DD having a camera CAM provided in the hole H may be manufactured.

[0114] When the cutting area CA is cut, external moisture may be introduced into the display panel DP through the hole H and the cutting surface. Moisture may be transferred through the pixel defining layer PDL and the first to fourth insulating layers IL1 to IL4. However, since the first and second grooves G1 and G2 are disposed near the hole H, moisture is blocked by the first and second grooves G1 and G2 and is not provided to the display panel DP in which the pixel PX is disposed.

[0115] The process for manufacturing the hole H for setting the camera CAM is described exemplarily, but the process for manufacturing the hole H for setting the speaker SPK may be the same as the process for manufacturing the hole H for setting the camera CAM. In addition, the process for manufacturing the hole H for setting other functional elements is substantially the same as the process for manufacturing the hole H for setting the camera CAM.

[0116] Therefore, in the method for manufacturing the display device DD according to an exemplary embodiment of the inventive concept, the hole H where the functional elements such as the speaker SPK and the camera CAM are disposed is accurately processed so that the process margin can be reduced.

[0117] Fig.12 is a view for explaining a reflective layer RL1 of a display device DD_1 according to another exemplary embodiment of the inventive concept.

[0118] In addition to the reflective layer RL1, Fig.12 Other configurations shown in Figure 6 Therefore, hereinafter, the configuration of the reflective layer RL1 will be mainly described. For the convenience of description,

[0119] Fig.12 Shown as corresponding to Figure 6 cross-sectional surface.

[0120] Reference Fig.12 , the display device DD_1 includes a reflective layer RL1, which may be disposed on the polarizing layer POL between the hole H and the first groove G1. The reflective layer RL1 may be disposed as a single layer on the polarizing layer POL. The reflective layer RL1 may include a metal material that reflects light. For example, the reflective layer RL1 may include a metal material such as aluminum (Al), copper (Cu), or silver (Ag).

[0121] The thickness of the reflective layer RL1 may be at least about 50 nm, for example, about 50 nm to about 1 μm. When the thickness of the reflective layer RL1 is at least 50 nm, the reflective layer RL1 may reflect the laser light LAR having a wavelength of about 355 nm. Therefore, when the laser light LAR is irradiated to the cutting line CL to form the hole H, the laser light LAR provided to the outside of the cutting area CA may be reflected by the reflective layer RL1.

[0122] A black layer BL that absorbs light may be disposed on the reflective layer RL1. When the black layer BL is not disposed on the reflective layer RL1, a user may view light reflected by the reflective layer RL1. In an exemplary embodiment of the inventive concept, since external light is absorbed by the black layer BL, the reflective layer RL1 may not be viewed. In a manufacturing method according to an exemplary embodiment of the inventive concept, the black layer BL may be disposed on the reflective layer RL1 after the hole H is formed by the laser LAR.

[0123] Fig.13 2 is a view of a plan configuration near a hole H in a display device DD_2 according to another exemplary embodiment of the inventive concept. Fig.14 is along Fig.13 A cross-sectional view taken along line II-II'. Fig.15 is along Fig.13A cross-sectional view taken along line III-III'.

[0124] In addition to the structure of the reflective layer RL2, Fig.13 , Fig.14 and Fig.15 The construction shown in can be used with Figure 5 and Figure 6 Therefore, hereinafter, the configuration of the reflective layer RL2 will be mainly described. For the convenience of description, Fig.13 Shown as corresponding to Figure 5 , and Fig.14 Shown as corresponding to Figure 6 cross-sectional surface.

[0125] Reference Fig.13 and Fig.14 , the display device DD_2 includes a reflective layer RL2, and the reflective layer RL2 may be disposed on the polarization layer POL between the hole H and the first groove G1. The reflective layer RL2 may include a metal material. A plurality of concave portions RCS may be disposed in the reflective layer RL2. The concave portions RCS may be disposed along a boundary of the hole H to surround the hole H. The concave portions RCS may be disposed at regular intervals, but the inventive concept is not limited thereto, and the concave portions RCS may be disposed at irregular intervals.

[0126] Reference Fig.15 , a portion of the reflective layer RL2 between the concave portions RCS may be referred to as a protrusion portion PT, and a portion of the reflective layer RL2 below the concave portions RCS may be referred to as a bottom portion LP. The protrusion portion PT may have a rectangular shape.

[0127] The width WT of each of the protrusions PT may be the same as the distance DT between two adjacent protrusions PT. For example, the width WT of each of the protrusions PT may be about 50 nm, and the distance DT between two adjacent protrusions PT may be about 50 nm. However, the inventive concept is not limited thereto, and the width WT of each of the protrusions PT may be different from the distance DT between two adjacent protrusions PT. The thickness TH of the bottom LP may be greater than about 50 nm, and the reflective layer RL2 including a metal material may reflect the laser LAR.

[0128] In the formation of Fig.13 and Fig.14 After forming the hole H, a black layer BL may be disposed on the reflective layer RL2.

[0129] Fig.16 2 is a view of a plan configuration near a hole H in a display device DD_3 according to another exemplary embodiment of the inventive concept. Fig.17 is along Fig.16A cross-sectional view taken along line IV-IV'. Fig.18 is along Fig.16 A cross-sectional view taken along line V-V'. Fig.19 Is used to describe Fig.18 A view of the functions of the concave portion RCS1 and the protruding portion PT1 shown in FIG.

[0130] In addition to the structure of the reflective layer RL3, Fig.16 , Fig.17 and Fig.18 The construction shown in can be used with Figure 5 and Figure 6 Therefore, hereinafter, the configuration of the reflective layer RL3 will be mainly described. For ease of description, Fig.16 Shown as corresponding to Figure 5 , and Fig.17 Shown as corresponding to Figure 6 In addition, Fig.19 A concave portion RCS1 and a convex portion PT1 are shown.

[0131] Reference Fig.16 and Fig.17 , the display device DD_3 includes a reflective layer RL3, which may be disposed on the polarizing layer POL between the hole H and the first groove G1. The reflective layer RL3 may be an insulating layer. For example, the reflective layer RL3 may be an inorganic insulating layer including an inorganic material. The reflective layer RL3 may be disposed as a single layer on the polarizing layer POL.

[0132] A plurality of concave portions RCS1 may be disposed in the reflective layer RL3 , and the concave portions RCS1 may be disposed along a boundary of the hole H to surround the hole H. The concave portions RCS1 may be disposed at regular intervals, but the inventive concept is not limited thereto and the concave portions RCS1 may be disposed at irregular intervals.

[0133] Reference Fig.18 , the closer to the upper portion of each protrusion PT1, the larger the width WT1 of each of the protrusions PT1. For example, each of the protrusions PT1 may have an inverted trapezoidal shape. The thickness TH1 of each of the protrusions PT1 may be at least about 100 nm, for example, about 100 nm to about 300 nm.

[0134] Reference Fig.19, the protruding portion PT1 and the recessed portion RCS1 may be divided into a plurality of layers. The protruding portion PT1 and the recessed portion RCS1 are divided into six layers L1, L2, L3, L4, L5, and L6, but may also be divided into more than six layers. The protruding portion PT1 may have a refractive index greater than that of the recessed portion RCS1. For example, the recessed portion RCS1 may be an air layer and have a refractive index of about 1.0, and the protruding portion PT1 may be an inorganic material and may have a refractive index of about 1.8.

[0135] In the first layer L1, the concave portion RCS1 may have a first width RW1, and the protrusion portion PT1 may have a second width PW1. In the first layer L1, an average refractive index of the concave portion RCS1 and the protrusion portion PT1 may be a first refractive index.

[0136] The average refractive index can be a value obtained in such a manner as to add the product of the area of ​​the concave portion RCS1 and the refractive index of the concave portion RCS1 to the product of the area of ​​the protruding portion PT1 and the refractive index of the protruding portion PT1, and divide the resulting sum by two, which is the number of corresponding media (e.g., the concave portion RCS1 and the protruding portion PT1).

[0137] In the second layer L2, the concave portion RCS1 may have a third width RW2 greater than the first width RW1, and the protrusion portion PT1 may have a fourth width PW2 less than the second width PW1. Compared with the protrusion portion PT1 in the first layer L1, the width of the protrusion portion PT1 in the second layer L2 may be smaller and the width of the concave portion RCS1 may be greater. Since the area of ​​the protrusion portion PT1 having a greater refractive index than the concave portion RCS1 is reduced in the second layer L2 rather than in the first layer L1, the average refractive index of the concave portion RCS1 and the protrusion portion PT1 may be a second refractive index less than the first refractive index in the first layer L1.

[0138] In the third layer L3, the concave portion RCS1 may have a fifth width RW3 greater than the third width RW2, and the protrusion portion PT1 may have a sixth width PW3 less than the fourth width PW2. Compared with the protrusion portion PT1 in the second layer L2, the width of the protrusion portion PT1 in the third layer L3 may be smaller, and the width of the concave portion RCS1 may be greater. Since the area of ​​the protrusion portion PT1 having a greater refractive index than the concave portion RCS1 is reduced in the third layer L3 rather than in the second layer L2, the average refractive index of the concave portion RCS1 and the protrusion portion PT1 may be a third refractive index less than the second refractive index in the second layer L2.

[0139] According to the areas of the protruding portion PT1 and the recessed portion RCS1, the average refractive index of the fourth layer L4 may be a fourth refractive index less than the third refractive index, and the average refractive index of the fifth layer L5 may be a fifth refractive index less than the fourth refractive index. In addition, in the sixth layer L6, the average refractive index of the recessed portion RCS1 and the protruding portion PT1 may be a sixth refractive index less than the fifth refractive index.

[0140] Therefore, the six layers L1 to L6 may have different refractive indices from each other, and the closer to the lower portion of the protruding portion PT1, the smaller the refractive index may be. The protruding portion PT1 and the concave portion RCS1 are shown as being divided into six layers L1 to L6, and the average refractive index of the six layers L1 to L6 is described; however, the protruding portion PT1 and the concave portion RCS1 may be divided into more than six layers, and the average refractive index of the more than six layers may be different.

[0141] The reflective layer RL3 is a single layer, but can play a similar role as a refractive layer having substantially different refractive indices from each other. When light travels from a high refractive index layer to a low refractive index layer, a portion of the light may be reflected at the interface between the low refractive index layer and the high refractive index layer, or the light may be totally reflected depending on the incident angle. Therefore, when the laser light LAR travels from the first layer L1 toward the sixth layer L6, the laser light LAR may be reflected. Therefore, the reflective layer RL3 may reflect the laser light LAR.

[0142] The moth-eye structure that can be used for the non-reflective coating technology includes a protruding portion protruding upward and an air layer disposed between the protruding portions. Fig.19 Unlike the protruding portion PT1 shown in FIG. 3 , the width of each of the protruding portions of the moth-eye structure may decrease toward the upper portion. Therefore, in the moth-eye structure different from the reflective layer RL3 , the average refractive index may be greater toward the lower portion of the moth-eye structure.

[0143] When light travels from a low refractive index layer to a high refractive index layer, the light is not reflected from the interface between the low refractive index layer and the high refractive index layer, but is refracted toward the high refractive index layer and propagates. Therefore, since the average refractive index is larger as it approaches its lower portion, the moth-eye structure can transmit light instead of reflecting it. The moth-eye structure is a non-reflective structure, and therefore, the reflective layer RL3 of this embodiment uses the moth-eye structure in reverse phase and can reflect light.

[0144] For example, when the thickness of the protruding portion PT1 is at least about 100 nm, the laser LAR having a wavelength of about 355 nm may be reflected at the reflective layer RL3. When the laser LAR is irradiated to the cutting line CL to form the hole H, the laser LAR provided to the outside of the cutting area CA may be reflected from the reflective layer RL3.

[0145] Fig. 20is a view of a cross-sectional configuration of a display device DD_4 according to another exemplary embodiment of the inventive concept.

[0146] In addition to the structure of the light absorbing layer LAL, Fig. 20 The construction shown in Figure 6 Therefore, hereinafter, the structure of the light absorbing layer LAL will be mainly described. For the convenience of description, Fig. 20 Shown as corresponding to Figure 6 cross-sectional surface.

[0147] Reference Fig. 20 , the display device DD_4 includes a light absorbing layer LAL, and the light absorbing layer LAL may be disposed on the polarizing layer POL between the hole H and the first groove G1. The light absorbing layer LAL may include a material that reflects light. The light absorbing layer LAL may play a similar role as the reflective layer RL1. For example, when the laser LAR forming the hole H is irradiated to the cutting line CL, the laser LAR provided to the outside of the cutting area CA may be absorbed at the light absorbing layer LAL.

[0148] Fig.21 is a plan view illustrating a touch sensing part TS of a display device according to another exemplary embodiment of the inventive concept. Fig. 22 It is shown Fig.21 0 is a view of a cross-sectional surface of the first connection portion CP1 connecting the first sensor portion SP1 shown in FIG. Fig.23 yes Fig.21 An enlarged view of the first area A1 is shown in FIG.

[0149] Reference Fig.21 , the touch sensing part TS may include a plurality of detection electrodes SE1 and SE2, a plurality of lines SL1 and SL2, and a plurality of pads (or pads, pads) PAD. The touch sensing part TS may be disposed on the thin film encapsulation layer TFE. For example, the detection electrodes SE1 and SE2, the lines SL1 and SL2, and the pads PAD may be disposed on the thin film encapsulation layer TFE. The polarizing film POL may be disposed on the touch sensing part TS.

[0150] The detection electrodes SE1 and SE2 and the lines SL1 and SL2 may have a single-layer structure or a multi-layer structure stacked upward. The conductive layer having a multi-layer structure may include at least two of a transparent conductive layer and a metal layer. The conductive layer having a multi-layer structure may include a metal layer containing metals different from each other. The transparent conductive layer may contain indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (ITZO), PEDOT, metal nanowires, graphene, etc. The metal layer may contain molybdenum, silver, titanium, copper, aluminum, and alloys thereof.

[0151] The touch sensing part TS may include an active area AA and a non-active area NAA surrounding the active area AA. The detection electrodes SE1 and SE2 may be disposed in the active area AA, and the pad PAD may be disposed in the non-active area NAA. The lines SL1 and SL2 may be connected to the detection electrodes SE1 and SE2, extend to the non-active area NAA, and be connected to the pad PAD. The pad PAD may be connected to a driving part to drive the touch sensing part TS through a flexible printed circuit board.

[0152] The sensing electrodes SE1 and SE2 may include: a plurality of first sensing electrodes SE1 extending in the second direction DR2 and arranged in the first direction DR1; and a plurality of second sensing electrodes SE2 extending in the first direction DR1 and arranged in the second direction DR2. The lines SL1 and SL2 may include: a plurality of first signal lines SL1 connected to the first sensing electrodes SE1; and a plurality of second signal lines SL2 connected to the second sensing electrodes SE2.

[0153] The first detection electrodes SE1 and the second detection electrodes SE2 may extend to be insulated from each other and cross each other. The first detection electrodes SE1 and the second detection electrodes SE2 may have a mesh shape. An electrostatic capacitance may be formed by the first detection electrodes SE1 and the second detection electrodes SE2.

[0154] Each of the first detection electrodes SE1 may include: a plurality of first sensor parts SP1 arranged in the second direction DR2; and a plurality of first connection parts CP1 connecting the first sensor parts SP1. The first sensor parts SP1 may have a grid shape. Each of the first connection parts CP1 may be disposed between two adjacent first sensor parts SP1 and electrically connect the two adjacent first sensor parts SP1.

[0155] Each of the second detection electrodes SE2 may include: a plurality of second sensor parts SP2 arranged in the first direction DR1; and a plurality of second connection parts CP2 connecting the second sensor parts SP2. The second sensor parts SP2 may have a grid shape. Each of the second connection parts CP2 may be disposed between two adjacent second sensor parts SP2 and electrically connect the two adjacent second sensor parts SP2.

[0156] The first sensor part SP1 and the second sensor part SP2 may not overlap each other, may be spaced apart from each other, and may be alternately arranged with each other. The second connection part CP2 and the first connection part CP1 may extend to be mutually insulated from each other and cross each other. The first sensor part SP1 and the second sensor part SP2 and the second connection part CP2 may be arranged on the same layer. The first connection part CP1 may be arranged on a different layer from the first sensor part SP1 and the second sensor part SP2 and the second connection part CP2.

[0157] The first sensor part SP1 and the second sensor part SP2 and the second connection part CP2 may be formed by simultaneously patterning the first conductive material. The first connection part CP1 may be formed by patterning the second conductive material.

[0158] Reference Fig. 22 , the first sensor part SP1 and the second connection part CP2 may be disposed on the thin film encapsulation layer TFE. The second sensor part SP2 may also be disposed on the thin film encapsulation layer TFE. The second sensor part SP2 and the second connection part CP2 of the substantially identical second detection electrode SE2 may be formed integrally. Therefore, the second connection part CP2 may extend from the second sensor part SP2.

[0159] The first touch insulating layer TS-IL1 may be disposed on the thin film encapsulation layer TFE to cover the first sensor part SP1 and the second connection part CP2. The first touch insulating layer TS-IL1 may include an inorganic material. The first connection part CP1 may be disposed on the first touch insulating layer TS-IL1. The second touch insulating layer TS-IL2 may be disposed on the first touch insulating layer TS-IL1 to cover the first connection part CP1.

[0160] The first connection part CP1 may be connected to the first sensor part SP1 through a plurality of contact holes TS-CH in the first touch insulating layer TS-IL1. Both sides of the first connection part CP1 may be connected to the first sensor part SP1 through the contact holes TS-CH.

[0161] The first connection part CP1 may be disposed higher than the first sensor part SP1 and the second connection part CP2, but the stacked structure is not limited thereto. For example, the first connection part CP1 may be disposed on the thin film encapsulation layer TFE, and the first sensor part SP1 and the second connection part CP2 may be disposed on the first touch insulation layer TS-IL1.

[0162] Reference Fig.23 , the pixel PX may include a plurality of pixel areas PA and a non-pixel area NPA surrounding the pixel area PA. Each of the pixel areas PA may be Figure 4 The pixel area PA shown in FIG. The pixel area PA may display red, green, or blue. However, the inventive concept is not limited thereto, and the pixel area PA may also include pixels that display magenta, cyan, or white.

[0163] The pixel areas PA may have different sizes from each other according to the colors to be displayed. For example, the blue pixel area PAB may be larger than the red pixel area PAR, and the red pixel area PAR may be larger than the green pixel area PAG.

[0164] The pixel area PA may have a diamond shape, but the inventive concept is not limited thereto, and the pixel area PA may have various shapes such as a circle or a polygon. The pixel area PA may be arranged in a first diagonal direction DDR1 and a second diagonal direction DDR2.

[0165] The first diagonal direction DDR1 may be a direction crossing the first direction DR1 and the second direction DR2 on a plane defined by the first direction DR1 and the second direction DR2. The second diagonal direction DDR2 may be a direction crossing the first diagonal direction DDR1 on a plane defined by the first direction DR1 and the second direction DR2. For example, the first direction DR1 and the second direction DR2 may cross each other to be perpendicular to each other, and the first diagonal direction DDR1 and the second diagonal direction DDR2 may cross each other to be perpendicular to each other.

[0166] The first and second sensor parts SP1 and SP2 having the mesh shape may overlap the non-pixel area NPA. The opening TOP in the mesh structure may have a diamond shape corresponding to the shape of the pixel area PA and a size corresponding to the pixel area PA.

[0167] The pixel area PA may be a light emitting area, and the non-pixel area NPA may be a non-light emitting area. Since the first and second sensor parts SP1 and SP2 are disposed in the non-pixel area NPA, light generated in the pixel area PA may be normally emitted without being affected by the first and second sensor parts SP1 and SP2.

[0168] Fig.24 is a view of a cross-sectional configuration of a display device DD_5 according to another exemplary embodiment of the inventive concept.

[0169] In addition to the conductive layer CTL, Fig.24 The construction shown in can be used with Figure 6 Therefore, hereinafter, the structure of the conductive layer CTL will be mainly described. For the convenience of description, Fig.24 Shown as corresponding to Figure 6 cross-sectional surface.

[0170] Reference Fig.24, the display device DD_5 may include a conductive layer CTL, and the conductive layer CTL may be disposed between the hole H and the first groove G1. The conductive layer CTL may be disposed between the thin film encapsulation layer TFE and the polarizing film POL. The conductive layer CTL may be formed by simultaneously patterning the same material as the first sensor part SP1 and the second sensor part SP2 disposed between the thin film encapsulation layer TFE and the polarizing film POL. For example, the conductive layer CTL may include a metal forming the first sensor part SP1 and the second sensor part SP2 and may reflect light. Therefore, the laser light LAR may be reflected at the conductive layer CTL.

[0171] Any one of the above-described reflective layers RL, RL1, RL2, and RL3 or the light absorbing layer LAL may be further disposed on the polarizing film POL.

[0172] Fig.25 is a view for illustrating a cross-sectional configuration of a display device DD_6 according to another exemplary embodiment of the inventive concept.

[0173] Reference Fig.25 , the display device DD_6 may include a conductive layer CTL, and the conductive layer CTL may be disposed between the hole H and the first groove G1. The conductive layer CTL may be substantially Fig.24 The conductive layer CTL shown in FIG. Fig.25 In the embodiment, the hole H may not be formed in the polarizing film POL'. Other configurations of the display device DD_6 may be similar to Fig.24 The same as the display device DD_5 shown in FIG.

[0174] A display device and a method for manufacturing the same according to exemplary embodiments of the inventive concept may reduce a process margin by accurately machining a hole in which a functional element is disposed.

[0175] While the inventive concept has been shown and described with reference to exemplary embodiments of the inventive concept, it will be understood by those skilled in the art that modifications and variations may be made thereto without departing from the spirit and scope of the inventive concept as defined in the appended claims.

Claims

1. A display device, the display device include: Display panel; A polarizing film, disposed on the display panel; as well as a reflective layer disposed on the polarizing film, wherein the reflective layer is disposed between a first hole and a first groove, wherein the first hole passes through the display panel and the polarizing film, and the first groove is disposed around the first hole in the display panel, wherein the reflective layer contacts the upper surface of the polarizing film, and When viewed in a plan view, an inner surface of the reflective layer overlaps an edge of the first hole, and an outer surface of the reflective layer overlaps an edge of the first groove.

2. The display device according to claim 1, in, The polarizing film covers the first groove.

3. The display device according to claim 1, in, The reflective layer reflects laser light.

4. The display device according to claim 3, in, The wavelength of the laser is 355 nm.

5. The display device according to claim 1, in, The reflective layer includes a plurality of refractive layers having at least two refractive indices different from each other.

6. The display device according to claim 5, in, The refractive layer includes 13 to 15 layers.

7. The display device according to claim 5, in, Each of the refractive layers has a thickness of 10 nm to 30 nm.

8. The display device according to claim 5, in, The refraction layer includes: a plurality of first refraction layers; and a plurality of second refractive layers having a refractive index greater than that of the first refractive layer, The first refractive layers and the second refractive layers are alternately stacked.

9. The display device according to claim 8, in, The first refraction layer and the second refraction layer include inorganic materials different from each other.

10. The display device according to claim 1, further comprising a second hole.

11. The display device according to claim 10, in, The display panel includes a display area, and the first hole and the second hole are disposed in the display area. 12 . The display device according to claim 1 , further comprising a functional element disposed in the first hole. 13 . The display device according to claim 1 , further comprising a second groove.

14. The display device according to claim 13, in, The second groove is disposed around the first groove.

15. The display device according to claim 14, in, The display panel comprises: a base substrate; A plurality of insulating layers are disposed on the base substrate; A pixel defining layer, disposed on the insulating layer; an encapsulation layer, disposed on the pixel defining layer; and a plurality of pixels disposed on the base substrate between the second groove and the periphery of the display panel, wherein the first groove and the second groove pass through the insulating layer and are recessed into the base substrate, and the polarizing film is disposed on the encapsulation layer, wherein an opening overlapping the first groove, the second groove, and a region between the first groove and the second groove is provided in the pixel defining layer and the encapsulation layer, and The polarizing film covers the opening.

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