Rotary cleaning device

Abstract

A rotary washing device is provided which ensures that a dry washed object is not wetted again. The rotary washing device (1) has a nozzle (60) which is horizontally movable and which sprays a mixture of washing water and air, a flying prevention cover (5) which surrounds a table (30) so as to cause the mixture which is intended to fly from the rotating table to flow downward, and a unit (16) which raises and lowers the prevention cover. The prevention cover includes a ring-shaped surrounding plate (51) which is inclined so as to be gradually spread from an opening (50) through which the table can pass in cross section, a side plate (52) which surrounds the surrounding plate and extends in the table raising and lowering direction, and an upper plate (53) which connects the side plate and the surrounding plate, and the rotary washing device further has a flying prevention portion (7) which, when the outer periphery (Wd) of a washed object is dried by spraying air from the nozzle after washing, causes the force of the air not to act on water accumulated on the upper surface of the upper plate so as to cause the water to not splash.

Description

TECHNICAL FIELD

[0001] The present application relates to a spin cleaning device that cleans a work such as a semiconductor wafer. BACKGROUND

[0002] A grinding device that grinds a work such as a semiconductor wafer using a grinding tool and a polishing device that polishes a work using a polishing pad have a spin cleaning device that spins a spin stage that holds a processed work at high speed and cleans the work while supplying cleaning water to the work (see, for example, Patent Literature 1).

[0003] Patent Literature 1: Japanese Patent Application Publication No. 2014-180739

[0004] When the work is supported by a substrate (supporting substrate), the processing chips are accumulated between the outer periphery of the substrate and the outer periphery of the work, and thus the outer periphery of the work needs to be actively cleaned. Therefore, the outer periphery of the work is blown with a two-fluid that is a mixture of water and cleaning water to remove the processing chips. In addition, one of the reasons why the processing chips are easily accumulated between the outer periphery of the substrate and the outer periphery of the work is, for example, because the outer periphery of the work is chamfered in a manner that becomes a cross-sectional circular arc, and a recess is formed at the boundary between the substrate and the work.

[0005] Further, in the spin cleaning device, in order to cause the blown two-fluid not to be rolled up on the upper surface of the work and to be attached to the work again, a slope that surrounds the work is provided around the spin stage, and when the cleaning waste liquid is radiated from the work toward the outside due to the centrifugal force caused by the rotation of the spin stage, it descends on the slope and falls into a drain container or the like to be drained. That is, the spin cleaning device has a scattering prevention cover that surrounds the spin stage that holds the work.

[0006] In addition, after the cleaning based on the two-fluid is performed, water droplets are easily accumulated at the boundary between the outer periphery of the substrate and the outer periphery of the work, and thus air is actively blown to the outer periphery of the cleaned work to dry the boundary between the outer periphery of the substrate and the outer periphery of the work.

[0007] However, when the outer periphery portion of the work is actively cleaned using the two-fluid, a water pool is sometimes formed on the scattering prevention cover. In addition, there is a problem that, in order to dry the outer periphery portion of the work, the air that is injected to the outer periphery portion splashes the water accumulated on the scattering prevention cover and can wet the dried work again. SUMMARY

[0008] Thus, an object of the present application is to provide a spin cleaning device that can ensure that a dried work after cleaning is not wetted again.

[0009] According to the present application, there is provided a rotary cleaning apparatus having a rotary table having a holding surface that holds an object to be cleaned, a rotation unit that rotates the rotary table, a cleaning nozzle that sprays a mixture of cleaning water and air to the object to be cleaned held by the rotary table, a horizontal movement unit that horizontally moves the cleaning nozzle above the rotary table, a scattering prevention cover that surrounds the rotary table so as to flow downward a mixture of the mixture of cleaning water and air that is intended to be scattered radially from the rotary table due to centrifugal force imparted to the rotary table by the mixture of cleaning water and air sprayed to the object to be cleaned from the cleaning nozzle, and a lifting unit that lifts the scattering prevention cover in the axial direction of a rotation shaft that rotates the rotary table, wherein the scattering prevention cover has an opening through which the rotary table is able to pass, an annular surrounding plate that is inclined so as to have a gradually expanding cross section from the opening, a side plate that surrounds the surrounding plate and extends in the lifting direction of the rotary table, and an upper plate that connects the side plate and the lower end of the surrounding plate, and the rotary cleaning apparatus further has a scattering prevention portion that, in a series of cleaning and drying operations in which the opening is positioned at a position higher than the upper surface of the object to be cleaned held by the rotary table, the object to be cleaned is cleaned by spraying the mixture of cleaning water and air from the cleaning nozzle, and then the object to be cleaned is dried by spraying air from the cleaning nozzle, in order to prevent water accumulated on the upper surface of the upper plate of the scattering prevention cover from being splashed by the force of the air sprayed from the cleaning nozzle when the outer periphery of the object to be cleaned is dried by spraying air from the cleaning nozzle after the cleaning, the scattering prevention portion causes the force of the air sprayed from the cleaning nozzle not to act on the water accumulated on the upper surface of the upper plate.

[0010] Preferably, the scattering prevention portion includes a slope plate that extends on the upper plate from the opening of the scattering prevention cover toward the outer periphery along the movement locus of the cleaning nozzle, the slope plate being higher on the opening side and lower on the outer periphery side, and a drain formed on the outer periphery so as to allow water to fall from the lower end side of the slope plate.

[0011] Alternatively, the scattering prevention portion is composed of a porous member provided on the upper plate of the scattering prevention cover along the movement locus of the cleaning nozzle.

[0012] According to the rotary cleaning apparatus of the present application, water accumulated on the upper surface of the upper plate of the scattering prevention cover can be prevented from being splashed by the air by absorbing the force of the air with the scattering prevention portion. Therefore, water droplets splashed by the air can be prevented from being reattached to the dried object to be cleaned.

[0013] The flying prevention portion includes: a slope panel extending from the opening of the flying prevention cover toward the outer periphery on the upper plate along the moving locus of the cleaning nozzle, the slope panel being higher on the opening side and lower on the outer periphery side; and a drain formed on the outer periphery to allow water to fall from the edge on the lower end side of the slope panel. In this case, when the outer periphery of the object to be cleaned is dried, the force of the air ejected from the cleaning nozzle does not act on the water accumulated on the upper surface of the upper plate, so that the water accumulated on the upper surface of the upper plate can not be splashed by the air. Therefore, it is possible to prevent water droplets splashed by the air from being attached again to the dried object to be cleaned.

[0014] In the case where the flying prevention portion is composed of a porous member provided on the upper plate of the flying prevention cover along the moving locus of the cleaning nozzle, when the outer periphery of the object to be cleaned is dried, the force of the air ejected from the cleaning nozzle does not act on the water accumulated on the upper surface of the upper plate, so that the water accumulated on the upper surface of the upper plate can not be splashed by the air. Therefore, it is possible to prevent water droplets splashed by the air from being attached again to the dried object to be cleaned. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 FIG. 1 is a perspective view showing an example of a rotary cleaning device in which a flying prevention portion has a slope panel and a drain.

[0016] Figure 2 FIG. 2 is a perspective view showing an example of the rotary cleaning device in which a flying prevention cover is pulled down.

[0017] Figure 3 FIG. 3 is a perspective view showing an example of the rotary cleaning device in which a flying prevention portion is a porous member provided on an upper plate of a flying prevention cover.

[0018] Figure 4 FIG. 4 is a sectional view for explaining a state in which the outer periphery of an object to be cleaned is dried by ejection of air from a cleaning nozzle in the rotary cleaning device in which the flying prevention portion has the slope panel and the drain.

[0019] Figure 5 FIG. 5 is a sectional view for explaining a state in which the outer periphery of an object to be cleaned is dried by ejection of air from a cleaning nozzle in the rotary cleaning device in which the flying prevention portion is the porous member provided on the upper plate of the flying prevention cover.

[0020] Figure 6 FIG. 6 is a sectional view for explaining a state in which an object to be cleaned is cleaned by ejection of a mixed liquid from a cleaning nozzle in a conventional rotary cleaning device.

[0021] Figure 7 FIG. 7 is a sectional view for explaining a state in which the outer periphery of an object to be cleaned is dried by ejection of air in the conventional rotary cleaning device.

[0022] REFERENCE NUMERALS

[0023] W: object to be cleaned; Wb: upper surface of the object to be cleaned; Wd: outer periphery of the object to be cleaned; Wl: semiconductor wafer; W2: substrate; 1: spin cleaning device; 16: lifting unit; 30: rotary table; 300: adsorption portion; 300a: holding surface; 301: frame; 32: rotary unit; 320: rotary shaft; 321: motor; 305: skirt; 2: container portion; 20: housing; 200: outer peripheral plate; 201: inner peripheral plate; 202: bottom plate; 21: support cover; 22: upper cover; 40: horizontal movement unit; 400: rotary shaft portion; 401: arm portion; 402: rotary motor; 60: cleaning nozzle; 600: spray port; 69: water source; 68: air source; 5: scattering prevention cover; 50: opening; 51: surrounding plate; 52: side plate; 53: upper plate; 7: scattering prevention portion; 70: inclined plate; 71: drain port; 7A: scattering prevention portion composed of a porous member; IB: conventional spin cleaning device. DETAILED DESCRIPTION

[0024] Figure 1 The spin cleaning device 1 illustrated has a rotary table 30 having a holding surface 300a that holds an object to be cleaned W, a rotary unit 32 that rotates the rotary table 30, a cleaning nozzle 60 that sprays a mixture (two-fluid) of cleaning water and air to the object to be cleaned W held by the rotary table 30, a horizontal movement unit 40 that horizontally moves the cleaning nozzle 60 above the rotary table 30, a scattering prevention cover 5 that surrounds the rotary table 30 so as to cause a mixture that is to be scattered radially from the rotary table 30 to flow downward due to centrifugal force imparted to the rotary table 30 by the mixture sprayed from the cleaning nozzle 60 to the object to be cleaned W, and a lifting unit 16 that lifts the scattering prevention cover 5 in the axial direction (Z-axis direction) of a rotary shaft 320 that rotates the rotary table 30. The spin cleaning device 1 can be used alone, or can be assembled to a grinding device, a polishing device, a cutting device, or a cluster-type device having the functions of a plurality of these devices, and the like.

[0025] The object to be cleaned W is, for example, a so-called bonded wafer. The bonded wafer is a wafer in which a circular semiconductor wafer Wl and a substantially same-diameter substrate (supporting substrate) W2 are bonded by an adhesive or the like, and the semiconductor wafer Wl and the substrate W2 are handled as a unit, so that the handling of the thin semiconductor wafer Wl can be improved, and warping or breakage of the semiconductor wafer Wl at the time of processing can be prevented.

[0026] The semiconductor wafer Wl is, for example, a circular wafer composed of a silicon base material or the like, and the substrate W2 is, for example, a circular substrate composed of a glass material or the like. Figure 1The front surface Wa of the semiconductor wafer W1, facing downward, has multiple devices formed on it and is protected by a substrate W2. The back surface Wb of the semiconductor wafer W1, opposite the front surface Wa, is ground and serves as the top surface Wb of the object W to be cleaned. In addition to silicon, the object W can be made of gallium arsenide, sapphire, ceramic, resin, gallium nitride, or silicon carbide.

[0027] Alternatively, the object W to be cleaned may be, for example, a circular semiconductor wafer W1 made of a silicon matrix or the like. Alternatively, the object W to be cleaned may be a so-called Taiko wafer: a semiconductor wafer W1 having devices formed on its front surface Wa, has its back surface Wb ground to form a circular recess in an area corresponding to the device region, and a ring-shaped convex portion for reinforcement is formed in an area of ​​the back surface Wb corresponding to the remaining peripheral area surrounding the device region.

[0028] The spin cleaning device 1 includes a container portion 2 that houses the aforementioned components. The container portion 2 comprises a housing 20, for example, having a polygonal shape when viewed from above; a bracket cover 21 extending vertically from the upper end surface of the housing 20 on the rear side (+X direction side); and an upper cover 22 connected to the bracket cover 21 to cover the housing 20 from above. When viewed from the +Z direction, the upper cover 22 has the same planar shape as the housing 20, and its end on the +Y direction side is secured to the upper end of the bracket cover 21 with a bolt or other fastener.

[0029] The housing 20 includes: an outer peripheral plate 200; Figure 4 The inner plate 201 shown in FIG. 1 is a bottom plate 202 connected to the lower ends of the outer plate 200 and the inner plate 201. The concave space defined by the outer plate 200, the inner plate 201, and the bottom plate 202 provides a space for temporarily storing used cleaning fluid. A drain hose, such as a drain hose, is connected to the bottom plate 202, which can communicate with a drain container (not shown).

[0030] The scattering prevention cover 5 has: an opening 50, which can allow the rotary table 30 to pass through; an annular surrounding plate 51, which is as shown Figure 4 As shown, the cross section is formed to be gradually expanded from the opening 50; the side plate 52 surrounds the surrounding plate 51 and extends in the lifting direction (Z-axis direction) of the rotary table 30; and the upper plate 53 connects the lower ends of the side plate 52 and the surrounding plate 51. Figure 1 , the side plate 52 is raised to clean the object W and the upper end surface thereof is in contact with the lower surface of the upper cover 22 .

[0031] The side plate 52 is a cylindrical body that is smaller than the housing 20 and has a polygonal shape similar to the housing 20 when viewed from the top. When viewed from the +Z direction, the side plate 52 is located inside the housing 20.Figure 2 As shown in FIG. 1 , when the object W to be cleaned is loaded and unloaded relative to the rotary table 30, the side plate 52 is lowered into the housing 20 and becomes an open state. Figure 1 As shown, when the object W is being cleaned and dried, the side panels 52 rise from the housing 20 and become closed to prevent the mixed liquid from scattering. The side panels 52 and the upper cover 22 can be made of transparent members such as acrylic plates, for example, so that the operator can confirm the state of the object W being cleaned.

[0032] A sealing member such as rubber (not shown) may be provided on the upper end surface of the side plate 52 . When the side plate 52 is raised to be closed, the bottom surface of the peripheral edge of the upper cover 22 contacts the sealing member, sealing the side plate 52 and the upper cover 22 .

[0033] The opening 50 of the scattering prevention cover 5 is formed in a circular shape according to the circular outer shape of the rotary table 30. Figure 4 As shown, the surrounding plate 51 is formed in a cross section that gradually expands and slopes from the opening 50, and is annular when viewed from above. Figure 1 In the example shown, the area of ​​the surrounding plate 51 is set smaller than the area of ​​the upper plate 53, but the present invention is not limited thereto. In addition, the inclination angle of the surrounding plate 51 is set to an appropriate value in consideration of the amount of the mixed liquid sprayed from the cleaning nozzle 60. Figure 1 、 Figure 4 As shown, the upper plate 53 connects the side plates 52 and the lower ends of the surrounding plate 51 , so that the bottom portion of the scattering prevention cover 5 is formed by the surrounding plate 51 and the upper plate 53 .

[0034] The rotary table 30, disposed within the container 2 and holding the object W, has a circular outer shape, for example. The rotary table 30 includes a suction portion 300, which is formed of a porous member or the like and which suctions the object W, and a frame 301 that supports the suction portion 300. The suction portion 300 is connected to a suction source (not shown) and suctions and holds the object W on a flat holding surface 300a, which is the exposed surface of the suction portion 300 and is flush with the upper end surface of the frame 301.

[0035] The rotation unit 32 includes a rotation shaft 320, the upper end of which is connected to the bottom surface of the rotary table 30, and a motor 321 connected to the lower end of the rotation shaft 320 to generate a rotational driving force. The axial direction of the rotation shaft 320, which rotates the rotary table 30, is the Z-axis (vertical direction).

[0036] For example, Figure 4 As shown, the rotating shaft 320 has a skirt 305 extending horizontally from its outer circumference and then hanging down toward the −Z direction. The skirt 305 prevents the mixed liquid flowing down from the rotating worktable 30 from entering between the rotating shaft 320 and the inner circumferential plate 201 .

[0037] The lifting unit 16 that lifts and lowers the scatter prevention cover 5 in the axial direction (Z-axis direction) of the rotation shaft 320 that rotates the rotary table 30 is a cylinder, an electric cylinder, or a ball screw mechanism, and is connected to the lower end side of the side plate 52 or the lower surface of the surrounding plate 51, for example. Figure 1

[0038] Figure 1 The horizontal movement unit 40 shown in the figure has, for example, a rotation shaft portion 400 that penetrates the upper plate 53 of the scatter prevention cover 5 by means of a bearing or a sealing material, and the like, and is vertically provided on the upper plate 53, an arm portion 401 that extends in the horizontal direction from the upper end side of the rotation shaft portion 400, and a rotary motor 402 whose shaft is connected to the lower end side of the rotation shaft portion 400. Further, a cleaning nozzle 60 is fixed to the front end of the arm portion 401.

[0039] Accordingly, when the rotary motor 402 rotates the rotation shaft portion 400 around the axis in the Z-axis direction, the arm portion 401 and the cleaning nozzle 60 move horizontally (rotationally) in the horizontal direction in conjunction therewith. Therefore, the moving track of the cleaning nozzle 60 becomes a circular arc shape in plan view, and the cleaning nozzle 60 can position the spray port 600 formed in the lower end portion thereof above the holding surface 300a of the rotary table 30 from the retreat position. It is preferable that the rotation center of the rotary table 30 be located below the moving track of the cleaning nozzle 60, for example.

[0040] The cleaning nozzle 60 is connected to a water source 69 that is configured by a pump, or the like, and that supplies, for example, pure water as cleaning water, via a joint 690 and a water flow path 691 that is a resin tube, or the like, that has flexibility. A water path on-off valve 692 is provided on the water flow path 691. Further, the cleaning nozzle 60 is connected to an air source 68 that is configured by a compressor, or the like, and that supplies compressed air, via a joint 680 and an air flow path 681 that is a resin tube, or the like, that has flexibility. An air flow path on-off valve 682 is provided on the air flow path 681. The cleaning water supplied from the water source 69 and the air supplied from the air source 68 are mixed in the cleaning nozzle 60 to become a mixed liquid, and are sprayed downward from the spray port 600.

[0041] Figure 1 ​The rotary cleaning device 1 shown has a scattering prevention portion 7 (hereinafter referred to as the scattering prevention portion 7 of the first embodiment). In a series of cleaning and drying operations, in which the opening 50 is positioned above the upper surface Wb of the object W held by the rotary worktable 30, a mixture of water and air is sprayed from the cleaning nozzle 60 to clean the object W, and then air is sprayed from the cleaning nozzle 60 to dry the object W, when air is sprayed from the cleaning nozzle 60 to dry the outer peripheral edge Wd of the object W after cleaning, in order to prevent water accumulated on the upper surface of the upper plate 53 of the scattering prevention cover 5 from splashing, the scattering prevention portion 7 prevents the force of the air sprayed from the cleaning nozzle 60 from acting on the water accumulated on the upper surface of the upper plate 53.

[0042] exist Figure 1 In the example shown, the scattering prevention portion 7 includes: an inclined panel 70 extending on the upper plate 53 from the opening 50 of the scattering prevention cover 5 toward the outer peripheral edge of the upper plate 53 along the arc-shaped movement trajectory of the cleaning nozzle 60, with the opening 50 side of the inclined panel 70 being higher and the outer peripheral edge side of the upper plate 53 being lower; and a drain outlet 71 formed on the outer peripheral edge of the upper plate 53, allowing water to fall from the edge of the lower end side of the inclined panel 70.

[0043] The inclined plate 70 has a substantially rectangular shape, for example, and is fixed with bolts (not shown) in a state where its upper end is placed on the upper end of the surrounding plate 51. The lower end of the inclined plate 70 is cut obliquely, for example. Figure 1 In the illustrated example, one side of the lower end of the inclined plate 70 reaches the outer peripheral edge of the upper plate 53. The lower end side of the inclined plate 70 is fixed to the upper surface of the upper plate 53 by bolts or the like (not shown).

[0044] The drain port 71 is formed by, for example, cutting the upper plate 53 of the scattering prevention cover 5 into a triangular shape so that a portion of the outer peripheral edge of the upper plate 53 becomes one side thereof, and is connected to the lower end of the inclined plate 70. Furthermore, the drain port 71 communicates with a concave space in the longitudinal cross-section of the housing 20, which can store the used mixed liquid.

[0045] In addition, the outer shape of the inclined panel 70 and the drain outlet 71 is not limited to the example shown in the figure. For example, the inclined panel 70 can also extend in an arc shape on the upper plate from the opening 50 of the scattering prevention cover 5 toward the outer peripheral edge of the upper plate 53 along the arc-shaped movement trajectory of the cleaning nozzle 60.

[0046] In addition, the scattering prevention unit 7 is Figure 1 In the example shown, only one scattering prevention part is provided on the upper plate 53. For example, another scattering prevention part identical to the scattering prevention part 7 may be provided at a position symmetrical to the configuration position of the scattering prevention part 7 and sandwiched between the center of the rotating worktable 30 under the arc-shaped moving trajectory of the cleaning nozzle 60.

[0047] The rotary cleaning device 1 of the present application can also be provided with Figure 1 the flying preventing portion 7 shown in FIG. 1, instead of Figure 3 the flying preventing portion 7A shown in FIG. 2 (hereinafter referred to as the flying preventing portion 7A of the second embodiment). The flying preventing portion 7A is a porous member provided on the upper plate 53 of the flying preventing cover 5 along the moving locus of the cleaning nozzle 60. As the porous member, for example, a porous ceramic, a porous metal, a porous carbon, or an object obtained by rolling or folding a metal mesh or a resin mesh into multiple layers can be used. The flying preventing portion 7A has, for example, a substantially triangular prism shape, extends from the opening 50 of the flying preventing cover 5 toward the outer periphery of the upper plate 53 in a manner so as to span the upper surface of the surrounding plate 51 and the upper plate 53 along the moving locus of the cleaning nozzle 60, and is fixed to the upper surface of the upper plate 53 with an adhesive or the like.

[0048] In Figure 3 the example shown in FIG. 2, the upper surface of the flying preventing portion 7A opposite to the cleaning nozzle 60 is a sloped surface that becomes lower toward the outer periphery of the upper plate 53, but is not limited thereto and can be a flat surface toward the outer periphery. In addition, the shape of the flying preventing portion 7A is not limited to a substantially triangular prism shape. In addition, the flying preventing portion 7A is provided only one on the upper plate 53 in the example shown in FIG. 2, but for example, another flying preventing portion identical to the flying preventing portion 7A can be provided at a position symmetrical to the position where the flying preventing portion 7A is provided with the center of the rotary table 30 interposed, under the circular arc-shaped moving locus of the cleaning nozzle 60. Figure 3

[0049] For example, as Figure 5 shown in FIG. 3, a drain 75 is formed through a position below the flying preventing portion 7A on the upper plate 53, and the drain 75 communicates with a longitudinally-sectioned concave space of the housing 20 that can store used mixed liquid. In addition, the provided position of the drain 75 is not limited to the example shown in the present embodiment.

[0050] Hereinafter, the operation of the rotary cleaning device 1 in a case where the rotary cleaning device 1 is used to dry the object W after cleaning the upper surface Wb of the object W with a mixed liquid (two-fluid) of air and cleaning water will be described.

[0051] First, as Figure 2 shown in FIG. 4, the lifting unit 16 of the rotary cleaning device 1 operates to lower the flying preventing cover 5 to a state where the side plate 52 is opened. That is, the rotary cleaning device 1 opens between the upper cover 22 and the Z-axis direction of the housing 20 to a state where the object W can enter the inside.

[0052] ​The object W to be cleaned is carried to the rotary table 30 and is placed on the holding surface 300a in such a way that the upper surface Wb becomes the upper side. Then, the suction force generated by the suction source (not shown) connected to the rotary table 30 is transferred to the holding surface 300a, so that the rotary table 30 attracts and holds the object W to be cleaned on the holding surface 300a.

[0053] Then, if Figure 1 As shown, lifting unit 16 moves and scattering prevention cover 5 rises in housing 20, and the upper end face of side plate 52 abuts and stops with the peripheral portion lower surface of upper cover 22. Upper cover 22 and housing 20 are sealed by side plate 52, thereby forming a closed space that is used for cleaning and drying the object W to be cleaned by upper cover 22 and scattering prevention cover 5. In addition, the opening 50 of scattering prevention cover 5 is positioned at a position on the upper surface Wb of the object W to be cleaned that is kept than rotary table 30. That is, the upper surface Wb of the object W to be cleaned is positioned at a position on the lower side than the upper end face around plate 51.

[0054] Next, the cleaning nozzle 60 is rotated by the horizontal moving unit 40, and the injection port 600 of the cleaning nozzle 60 is positioned above the center of the upper surface Wb of the object to be cleaned W, which is aligned and suction-held by the rotary table 30. In this state, cleaning water is supplied to the cleaning nozzle 60 from the water source 69, and compressed air is supplied to the cleaning nozzle 60 from the air source 68. A mixture of air and cleaning water (two fluids) is sprayed from the injection port 60 of the cleaning nozzle 60 toward the center of the upper surface Wb of the object to be cleaned W. In addition, the cleaning nozzle 60 spraying the mixed liquid is rotated and reciprocated at a predetermined angle around the axis in the Z-axis direction above the object to be cleaned W. In addition, the rotary table 30 is rotated at a predetermined rotational speed by the rotating unit 32, so that the mixed liquid is sprayed from the cleaning nozzle 60 onto the entire upper surface Wb of the object to be cleaned W.

[0055] Alternatively, the cleaning nozzle 60 may move linearly in the horizontal direction instead of rotating.

[0056] In addition, the cleaning nozzle 60 may not be positioned above the center of the object W. That is, the center and the central portion of the object W are not cleaned, but only the outer peripheral edge Wd portion is cleaned.

[0057] Thus, the grinding chips and other attachments attached to the upper surface Wb of the object to be cleaned are cleaned and removed by the mixed liquid. Then, the mixed liquid, which is given the centrifugal force generated by the rotation of the rotary table 30, flows from the center side to the outer peripheral side on the upper surface Wb of the object to be cleaned W, and flows from the upper surface Wb into the outer peripheral plate 200 and the inner peripheral plate 201 (see FIG. 2 ) of the housing 20. Figure 4 ) and bottom plate 202 (refer toFigure 1 ) is surrounded by a concave space in longitudinal section and is accumulated in the space.

[0058] In addition, the mixed liquid sprayed from the cleaning nozzle 60 to the object W is subjected to the centrifugal force caused by the rotation of the rotary table 30, and the mixed liquid radially scattered from the rotary table 30 or the object W is mixed with the mixed liquid. Figure 4 The liquid collides with the lower surface side of the surrounding plate 51 of the scattering prevention cover 5 shown in FIG. 1 , flows downward along the lower surface, and flows into the outer peripheral plate 200, the inner peripheral plate 201 and the bottom plate 202 of the housing 20 (see FIG. 1 ). Figure 1 ) is a concave space surrounded by a longitudinal section.

[0059] After cleaning the entire upper surface Wb of the object W for a predetermined period of time, the mixed liquid is actively used to clean the outer edge Wd of the object W, which is a bonded wafer. This is because grinding debris and other debris often accumulate on the outer edge Wd of the bonded wafer. The cleaning nozzle 60 is rotated and moved by the horizontal movement unit 40, and the injection port 600 of the cleaning nozzle 60 is positioned above the outer edge Wd of the object W, which is being sucked and held by the rotary table 30. The movement of the cleaning nozzle 60 is then stopped.

[0060] In this state, a mixture of air and cleaning water is sprayed from the nozzle 600 of the cleaning nozzle 60. Then, the rotary table 30 is rotated at a predetermined rotational speed, so that the mixture is sprayed to the entire outer periphery Wd of the object W to be cleaned. During the outer periphery cleaning, most of the mixture also flows into the concave space of the longitudinal section of the shell 20 through the surrounding plate 51 of the scattering prevention cover 5, but a part of the mixture sprayed from the cleaning nozzle 60 flows into the upper surface of the upper plate 53, or is given centrifugal force and radially scattered from the rotary table 30 or the object W to be cleaned to the upper surface of the upper plate 53. Therefore, water accumulates on the upper surface of the upper plate 53, sometimes forming Figure 4 or Figure 5 The puddle V is shown.

[0061] Then, in the rotary cleaning device 1, the object W to be cleaned is dried. In the drying of the object W to be cleaned, for example, the upper surface Wb is first dried. The cleaning nozzle 60 is rotated and moved by the horizontal moving unit 40, and the jet port 600 of the cleaning nozzle 60 is positioned above the center of the object W to be cleaned that the rotary table 30 attracts and holds, and the movement of the cleaning nozzle 60 is stopped. In addition, the cleaning nozzle 60 can also be rotated and moved in a reciprocating manner along the horizontal direction above the object W to be cleaned. Compressed air is provided to the cleaning nozzle 60 from an air source 68, and air is sprayed from the jet port 600 of the cleaning nozzle 60 towards the center of the upper surface Wb of the object W to be cleaned. In addition, the rotary table 30 is rotated at a predetermined rotational speed, so that the air flowing radially from the center on the upper surface Wb of the object to be cleaned W and the centrifugal force applied by the rotation of the rotary table 30 cause the washing water remaining on the upper surface Wb of the object to be cleaned to flow from the upper surface Wb into the outer peripheral plate 200 and the inner peripheral plate 201 of the housing 20 (see FIG. Figure 4 、 Figure 5 ) and the concave space in longitudinal section surrounded by the bottom plate 202.

[0062] After the entire upper surface Wb of the object W is dried for a predetermined time, the outer periphery Wd of the object W, which is a bonded wafer, is actively dried using air. This is because cleaning water often accumulates on the outer periphery Wd of the bonded wafer.

[0063] like Figure 4 or Figure 5 As shown, the cleaning nozzle 60 is rotated and moved by the horizontal moving unit 40, and the jet port 600 of the cleaning nozzle 60 is positioned on the side where the scattering prevention unit 7 is located and above the outer periphery Wd of the object to be cleaned W attracted and held by the rotary table 30. The movement of the cleaning nozzle 60 is then stopped. Then, air is sprayed from the jet port 600 of the cleaning nozzle 60. In addition, the rotary table 30 is rotated at a predetermined rotational speed, so that air is sprayed over the entire outer periphery Wd of the object to be cleaned W.

[0064] Here, use Figure 6 、 Figure 7 Problems in the conventional spin cleaning device 1B when actively using air to dry the outer peripheral edge Wd of the object W to be cleaned will be briefly described. Figure 6 、 Figure 7 The rotary cleaning device 1B shown in the figure is different from the rotary cleaning device 1 of the present invention and is configured without Figure 4 The scattering prevention unit 7 of the first embodiment shown, or Figure 5 The scattering prevention portion 7A of the second embodiment is shown.

[0065] As with the case of actively washing the outer periphery Wd of the object to be washed W with the mixed liquid using the rotary washing device 1 of the present application as explained before, when the outer periphery Wd of the object to be washed W is actively washed with the mixed liquid using the conventional rotary washing device IB as shown in FIG. 6, a part of the mixed liquid sprayed from the washing nozzle 60 flows onto the upper surface of the upper plate 53 or is given a centrifugal force to fly from the rotary table 30 or the object to be washed W to the upper surface of the upper plate 53. Therefore, water is accumulated on the upper surface of the upper plate 53, and sometimes a water pool V is formed as shown in FIG. 7. Figure 6 As with the case of actively washing the outer periphery Wd of the object to be washed W with the mixed liquid using the rotary washing device 1 of the present application as explained before, when the outer periphery Wd of the object to be washed W is actively washed with the mixed liquid using the conventional rotary washing device IB as shown in FIG. 6, a part of the mixed liquid sprayed from the washing nozzle 60 flows onto the upper surface of the upper plate 53 or is given a centrifugal force to fly from the rotary table 30 or the object to be washed W to the upper surface of the upper plate 53. Therefore, water is accumulated on the upper surface of the upper plate 53, and sometimes a water pool V is formed as shown in FIG. 7. Figure 6 As with the case of actively washing the outer periphery Wd of the object to be washed W with the mixed liquid using the rotary washing device 1 of the present application as explained before, when the outer periphery Wd of the object to be washed W is actively washed with the mixed liquid using the conventional rotary washing device IB as shown in FIG. 6, a part of the mixed liquid sprayed from the washing nozzle 60 flows onto the upper surface of the upper plate 53 or is given a centrifugal force to fly from the rotary table 30 or the object to be washed W to the upper surface of the upper plate 53. Therefore, water is accumulated on the upper surface of the upper plate 53, and sometimes a water pool V is formed as shown in FIG. 7.

[0066] In addition, as with the case of actively air-drying the outer periphery Wd of the object to be washed W after washing using the rotary washing device 1 of the present application as explained before, when the outer periphery Wd of the object to be washed W is actively air-dried using the conventional rotary washing device IB as shown in FIG. 6, there is a problem that, as shown in FIG. 8, the air sprayed from the spray port 600 of the washing nozzle 60 splashes the water of the water pool V of the upper surface of the upper plate 53 of the splash preventing cover 5, the splashed water is rolled up as mist, and further falls onto the upper surface Wb of the dried object to be washed W to re-wet the upper surface Wb. Figure 7 In addition, as with the case of actively air-drying the outer periphery Wd of the object to be washed W after washing using the rotary washing device 1 of the present application as explained before, when the outer periphery Wd of the object to be washed W is actively air-dried using the conventional rotary washing device IB as shown in FIG. 6, there is a problem that, as shown in FIG. 8, the air sprayed from the spray port 600 of the washing nozzle 60 splashes the water of the water pool V of the upper surface of the upper plate 53 of the splash preventing cover 5, the splashed water is rolled up as mist, and further falls onto the upper surface Wb of the dried object to be washed W to re-wet the upper surface Wb. Figure 7

[0067] On the other hand, in the rotary washing device 1 of the present application as shown in FIG. 1, the splash preventing portion 7 having the function of preventing the water accumulated on the upper surface of the upper plate 53 from being splashed by the air sprayed from the washing nozzle 60 is provided. The splash preventing portion 7 has the inclined surface plate 70 extending on the upper plate 53 from the opening 50 of the splash preventing cover 5 toward the outer periphery of the upper plate 53 along the moving locus of the washing nozzle 60, and the drain port 71 formed at the outer periphery of the upper plate 53 to allow the water to fall from the edge of the lower end side of the inclined surface plate 70. Therefore, when the outer periphery Wd of the object to be washed W is dried, the force of the air sprayed from the washing nozzle 60 flows along the inclined surface (upper surface) of the inclined surface plate 70 without acting on the water pool V of the upper surface of the upper plate 53, so that the water accumulated on the upper surface of the upper plate 53 can not be splashed by the air. Thus, the water droplets splashed by the air can be prevented from re-attaching to the dried object to be washed W. In addition, the upper surface of the inclined surface plate 70 is an inclined surface, so that the water droplets and the like attached to the upper surface of the inclined surface plate 70 flow downward and are drained from the drain port 71 when the object to be washed W is washed based on the mixed liquid, and thus the water droplets do not remain on the inclined surface of the inclined surface plate 70 when the outer periphery Wd of the object to be washed W is air-dried, so that the water is not splashed by the air. Figure 4 In addition, in the rotary washing device 1 of the present application as shown in FIG. 1, the splash preventing portion 7 having the function of preventing the water accumulated on the upper surface of the upper plate 53 from being splashed by the air sprayed from the washing nozzle 60 is provided. The splash preventing portion 7 has the inclined surface plate 70 extending on the upper plate 53 from the opening 50 of the splash preventing cover 5 toward the outer periphery of the upper plate 53 along the moving locus of the washing nozzle 60, and the drain port 71 formed at the outer periphery of the upper plate 53 to allow the water to fall from the edge of the lower end side of the inclined surface plate 70. Therefore, when the outer periphery Wd of the object to be washed W is dried, the force of the air sprayed from the washing nozzle 60 flows along the inclined surface (upper surface) of the inclined surface plate 70 without acting on the water pool V of the upper surface of the upper plate 53, so that the water accumulated on the upper surface of the upper plate 53 can not be splashed by the air. Thus, the water droplets splashed by the air can be prevented from re-attaching to the dried object to be washed W. In addition, the upper surface of the inclined surface plate 70 is an inclined surface, so that the water droplets and the like attached to the upper surface of the inclined surface plate 70 flow downward and are drained from the drain port 71 when the object to be washed W is washed based on the mixed liquid, and thus the water droplets do not remain on the inclined surface of the inclined surface plate 70 when the outer periphery Wd of the object to be washed W is air-dried, so that the water is not splashed by the air.

[0068] Figure 5 ​​In the rotary cleaning device 1 of the present application shown, the flying prevention portion 7A, which is a porous member provided on the upper plate 53 of the flying prevention cover 5 along the moving locus of the cleaning nozzle 60, is provided to prevent the force of the air jetted from the cleaning nozzle 60 from acting on the water accumulated on the upper surface of the upper plate 53, so that when the outer periphery Wd of the object to be cleaned W is dried, the force of the air jetted from the cleaning nozzle 60 is weakened by the flying prevention portion 7A as the porous member, and the air does not strongly act on the water pool V on the upper surface of the upper plate 53, so that the water accumulated on the upper surface of the upper plate 53 can not be splashed by the air. Therefore, the water droplets splashed by the air can be prevented from being attached again to the dried object to be cleaned W.

[0069] The rotary cleaning device 1 of the present application is not limited to the examples having the flying prevention portion 7 of the first embodiment or the flying prevention portion 7A of the second embodiment described above, and can of course be implemented in various different ways within the scope of the technical idea thereof. In addition, the shape and the like of each structure of the rotary cleaning device 1 shown in the drawings are not limited thereto, and can be appropriately changed within the range in which the effects of the present application can be exerted.

Claims

1. A rotary cleaning device comprising: A rotating worktable having a holding surface for holding the object to be cleaned; a rotating unit that rotates the rotary table; a cleaning nozzle for spraying a mixture of cleaning water and air toward the object to be cleaned held by the rotary table; a horizontal moving unit, which moves the cleaning nozzle horizontally above the rotating worktable; a scattering prevention cover surrounding the rotating table so that the mixed liquid sprayed from the cleaning nozzle onto the object to be cleaned is applied with centrifugal force caused by the rotation of the rotating table, thereby causing the mixed liquid to radially scatter from the rotating table to flow downward; and a lifting unit that lifts and lowers the scattering prevention cover along the axial direction of the rotating shaft that rotates the rotary table; in, The scatter prevention cover has: an opening capable of allowing the rotary table to pass through; an annular surrounding plate, which is formed to be inclined in a cross-section that gradually expands from the opening; a side plate surrounding the surrounding plate and extending in the lifting direction of the rotary table; and an upper plate connecting the side plates and the lower ends of the surrounding plates, The rotary cleaning device also has a scattering prevention unit. In a series of cleaning and drying operations, the opening is positioned above the upper surface of the object held by the rotary table, the mixed liquid is sprayed from the cleaning nozzle to clean the object, and then air is sprayed from the cleaning nozzle to dry the object. When air is sprayed from the cleaning nozzle after cleaning to dry the outer periphery of the object to be cleaned, in order to prevent the water accumulated on the upper surface of the upper plate of the scattering prevention cover from splashing, the scattering prevention portion prevents the force of the air sprayed from the cleaning nozzle from acting on the water accumulated on the upper surface of the upper plate.

2. The rotary cleaning device according to claim 1, wherein: The scattering prevention unit includes: an inclined plate extending from the opening of the scattering prevention cover toward the outer periphery on the upper plate along the movement trajectory of the washing nozzle, the inclined plate being higher on the opening side and lower on the outer periphery side; as well as A drain port is formed at the outer peripheral edge and allows water to fall from the edge of the lower end side of the inclined plate.

3. The rotary cleaning device according to claim 1, wherein: The scattering prevention portion is formed of a porous member disposed on the upper plate of the scattering prevention cover along a movement trajectory of the cleaning nozzle.

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