Electrolytic cathode plate cleaning lifting device
By designing an electrolytic cathode plate cleaning and lifting device during the electrolytic copper production process, and gradually lifting the cathode plate conductive beam using the pin rod, the problem that the cathode plate conductive beam cannot be completely cleaned is solved, and the complete cleaning of the cathode plate and the improvement of copper generation efficiency are achieved.
Patent Information
- Application Number
- CN202011032560.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-09-27
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2040-09-27
AI Technical Summary
During the electrolytic copper production process, the dirt in the contact area of the conductive beam of the cathode plate and the conductive copper strip of the electrolytic cell cannot be completely cleaned, resulting in conductivity obstacles and the cathode plate is cooled and burned, affecting the copper generation efficiency.
An electrolytic cathode plate cleaning and lifting device is designed. By setting a top rod next to the washing chain, the contour shape of the top rod is gradually lifted up the conductive beam of the cathode plate to make its bottom exposed, ensuring that the cathode plate is completely washed clean.
The complete cleaning of the cathode plate conductive beam is achieved, which avoids conductive obstacles and cathode plate coolant, improves copper generation efficiency, and reduces the workload of personnel handling coolant.
Smart Images

Figure CN112170341B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to electrolytic copper production technology, in particular to a cleaning station arranged at the front end of a stripping unit. Background Art
[0002] In modern PC electrolysis production, the cathode copper in the electrolytic cell is hoisted by the hoisting frame to the conveyor chain at the front end of the cleaning station, and the conveyor chain, also known as the washing chain, transports the cathode copper to the washing box. The spray pump attached to the washing box pressurizes and pumps water to spray the cathode copper by the spray unit, washing the acid and dirt attached to the surface of the cathode copper, and then the conveyor chain continues to transport it to the downstream side where the stripping machine is located. In the stripping unit, the robot's manipulator picks up the cathode plate and the cathode copper attached to it that are still on the washing chain after washing, and transfers them to the stripping machine to separate the copper plate and the cathode plate.
[0003] When the cathode copper is transported in the washing chain, most of the contact parts of the cathode plate conductive beam with the conductive copper bar of the electrolytic cell fall on the washing chain, causing the washing water to be unable to completely clean the dirt attached to the contact parts of the cathode plate conductive beam with the conductive copper bar of the electrolytic cell. In other words, the washing water cannot reach the contact part between the washing chain and the cathode plate conductive beam, and the dirt remaining and attached due to the contact between the cathode plate conductive beam and the conductive copper bar of the electrolytic cell still remains on the cathode plate.
[0004] When the cathode plate with the cathode copper stripped off is put into the slot again, a conductive barrier occurs between the conductive beam that has not been rinsed clean and the conductive copper bar between the slots, causing the cathode to burn cold when entering the slot and no copper to grow on the cathode plate, which affects the efficiency of cathode copper production and increases the workload of personnel dealing with cold burning. Summary of the invention
[0005] The purpose of the present invention is to provide a lifting device for flushing electrolytic cathode plates.
[0006] To achieve the above-mentioned purpose of the invention, the present invention adopts the following technical scheme: a lifting device for cleaning an electrolytic cathode plate, wherein push rods are arranged at intervals on the sides of a washing chain, and the top end of the push rod has a contour shape that rises from low to low and then falls from the upstream to the downstream side. The height of the low part on the upstream side of the top end of the push rod is equal to or lower than the height of the bearing part of the washing chain, and the height of the high part in the middle of the top end of the push rod is higher than the height of the bearing part of the washing chain and lower than the height of the rear end blocking part of the washing chain. The push rods are correspondingly arranged on the sides of the washing chains arranged on both sides.
[0007] It can be seen from the above technical solution that under the guidance of the profile of the top end of the top rod which is set from low to high and then from high to low, the conductive beam of the anode plate is first gradually lifted up and away from the washing chain, so that the bottom of the conductive beam of the anode plate is exposed, and under the action of the jet water flow, all parts of the cathode plate are thoroughly rinsed, and then fall back to the washing chain and continue to be transported downstream, that is, to the stripping machine. BRIEF DESCRIPTION OF THE DRAWINGS
[0008] Figure 1 , 2 It is a three-dimensional structural schematic diagram of the present invention;
[0009] Figure 3 , 4 They are Figure 1 , 2 A top view of the
[0010] Figure 5 yes Figure 4 AA section view in;
[0011] Figure 6 It is a state diagram of the jacking process;
[0012] Figure 7 yes Figure 6 AA section view in;
[0013] Figure 8 , 9 10 and 11 are respectively partial enlarged schematic diagrams of the upper end of the push rod. DETAILED DESCRIPTION
[0014] A lifting device for cleaning an electrolytic cathode plate, wherein a push rod 20 is arranged adjacent to a washing chain 10 at intervals, and the top of the push rod 20 is in a contour shape that rises from low to low and then falls from upstream to downstream. The height of the low part on the upstream side of the top of the push rod 20 is equal to or lower than the height of the bearing part of the washing chain 10, and the height of the high part in the middle of the top of the push rod 20 is higher than the height of the bearing part of the washing chain 10 and lower than the height of the rear end stopper 11 of the washing chain 10. The push rod 20 is correspondingly arranged on the sides of the washing chains 10 arranged on both sides.
[0015] In the above technical scheme, the two washing chains 10 are arranged in parallel with equal height spacing, and the conductive beam A on the cathode plate has overhanging sections A1 on both sides of the cathode plate for supporting, and the overhanging sections A1 are supported on the conductive bars at the edge of the electrolytic cell during electrolysis, and are supported on the washing chain 10 or the bracket during transportation.
[0016] The top rod 20 is arranged close to the washing chain 10 to avoid the normal movement of the cathode plate body, while being able to contact the overhanging section A1 of the conductive beam A. When arranging the top rod 20 specifically, it is selected to be on the inside or outside of the washing chain 10. This is determined reasonably based on the distance between the washing chain 10 and the plate surface on the corresponding side of the cathode plate and the length of the overhanging section A1 placed on the outside of the washing chain 10.
[0017] In order to ensure that the washing chain 10 can smoothly carry the plates, the middle section of the plate edge of the chain plate of the washing chain 10 is a horizontal flat section 12, and the stopper 11 is located at the rear end of the flat section 12. Figure 1 , 2 As shown in Figures 3 and 4, the washing chain 10 is hinged by a chain link 10a and a chain link connecting plate 10b through a pin shaft. The upper and lower edges of the chain link 10a and the chain link connecting plate 10b are straight edges as a whole, namely the flat section 12. The blocking portion 11 can be arranged at the rear end of the chain link 10a, and of course it can also be arranged at the chain link connecting plate 10b. Of course, it is more preferred to arrange the blocking portion 11 at the rear end of the chain link 10a because the contact area is small, which is conducive to cleaning.
[0018] The push rod 20 is arranged inside two parallel washing chains 10, which can reduce the volume of the washing box or the transformation of old equipment. The support beam 1 under the washing chain 10 is directly used for rooting and fixing, that is, it is very easy to fix the lower end of the push rod 20.
[0019] The following describes the preferred schemes for the shape of the upper rod end of the top rod 20 to ensure that the overhanging section A1 of the conductive beam A is stably supported. Preferred scheme 1 is that the top end of the top rod 20 is projected into an arc shape with a high middle portion and low ends in a vertical plane parallel to the conveying direction of the washing chain 10; preferred scheme 2 is that the top end of the top rod 20 is projected into a roof shape with a high middle portion and low ends in a vertical plane parallel to the conveying direction of the washing chain 10.
[0020] In addition, the top rod 20 is plate-shaped and the plate surface is located parallel to the conveying direction of the washing chain 10. A more preferred solution is that the plate surface of the top rod 20 is located in a vertical plane parallel to the conveying direction of the washing chain 10. This solution ensures that the top rod 20 has a simple shape and occupies the least space.
[0021] Since the distance between the washing chain 10 and the plate surface on the corresponding side of the cathode plate is limited, the top rod 20 can be in the shape of a strip plate, which can save space.
[0022] Both of the above solutions can ensure that the overhanging section A1 is lifted up steadily and falls slowly, thereby preventing the washing chain 10 from colliding with the top rod 20 or the overhanging section A1 from sliding down or falling. Figure 8 , 10 The above two schemes are illustrated respectively. Fig. 9 The bottom has a straight section at one end.
[0023] The purpose of setting the top rod 20 is to allow the overhanging section A1 to be temporarily separated from the horizontal section 12 of the washing chain 10, so that the washing water can reach all the parts to be cleaned. Therefore, in order to achieve a more ideal washing effect, the top of the top rod 20 has a jet of water directed toward the top of the rod. If the original equipment is to be modified, it is possible to consider fixing the top rod 20 at a position where a water jet nozzle is arranged. In this way, the washing chain 10 and the top rod 20 are cleaned at the contact part of the overhanging section A1, and the overhanging section A1 is cleaned.
[0024] The above is the basic technical idea of the present invention, that is, to ensure the cleaning of the cathode plate, specifically, through the supporting effect of the top rod 20, the contact part between the overhanging section A1 and the washing chain 10 is exposed to facilitate cleaning, and the contact part between the top rod 20 and the overhanging section A1 can be cleaned before and after the two contact. Figure 5 , 7 As shown, the push rod 20 and the overhanging section A1 are respectively in the initial contact state and in the lifting state.
[0025] The arrangement of the push rod 20 brings another technical effect, that is, the push rod 20 and the overhanging section A1 form a resistance to limit the cathode plate from continuing to move downstream from the beginning of contact, such as Figure 1 , 2 As shown, as the washing chain 10 continues to move downstream, the blocking portion 11 will eventually contact the overhanging section A1 and provide sufficient thrust for moving downstream, so that the overhanging section A1 begins to lift upward. As the washing chain 10 continues to move downstream, the blocking portion 11 gradually leaves the top rod 20 while keeping in contact with the overhanging section A1. Therefore, the position of the cathode plate is determined, that is, the plate surface of the cathode plate remains perpendicular to the travel direction, as shown in FIG. Figure 4 , 5 , 6, and 7, which provide a fixed position for the transfer robot to pick up between the downstream end of the washing chain 10 and the stripping machine; if the plate surface of the cathode plate is too far away from the vertical direction of the travel direction, the pick-up hand of the transfer robot cannot align with the conductive beam A, or cannot pick up or picks up out of position and damages the anode plate. Figure 1 , 3 shown.
[0026] Since the cathode plate has to travel a distance after cleaning, the cathode plate just after leaving the push rod 20 may still be interfered by the splashing of the cleaning water flow, etc., causing the overhanging section A1 at one or both ends to be separated from the blocking portion 11. In this way, it is impossible to ensure that the plate surface is perpendicular to the travel direction when arriving at the downstream end of the washing chain 10. Even if the plate surface is perpendicular to the travel direction when arriving at the downstream end of the washing chain 10, its position still deviates from the picking position of the picking hand of the transfer robot. Therefore, in order to ensure that the overhanging sections A1 at both ends are in contact with the blocking portion 11 at the same time and arrive at the picking position of the transfer robot, the present invention arranges two groups of push rods 20 at intervals at the upstream and downstream positions of the washing chain 10. The meaning of the two groups of push rods 20 is that there are four push rods 20 in total, which are placed on the inner side of the washing chains 10 on both sides and the two push rods 20 at the same position upstream and downstream constitute a group. In this way, it is ensured that the cleaning task is completed at the position of the push rod 20 on the upstream side, and the push rod 20 at the downstream position ensures that the cathode plate arrives at the downstream end in a state of contact with the blocking portion 11.
Claims
1. A lifting device for cleaning an electrolytic cathode plate, characterized in that: A push rod (20) is arranged adjacent to the washing chain (10) at intervals. The top of the push rod (20) has a contour shape that rises from low to low and then decreases from the upstream to the downstream side. The height of the low part of the top of the push rod (20) on the upstream side is equal to or lower than the height of the bearing part of the washing chain (10). The height of the high part in the middle of the top of the push rod (20) is higher than the height of the bearing part of the washing chain (10) and lower than the height of the rear end stopper (11) of the washing chain (10). The push rod (20) is correspondingly arranged on the sides of the washing chains (10) arranged on both sides. A conductive beam (A) is conveyed on the washing chain (10), and a water jet directed toward the top of the rod of the top rod (20) is provided at the top of the rod. The sprayed water jet is used to clean the contact part between the washing chain (10) and the conductive beam (A) at that location.
2. The electrolytic cathode plate cleaning lifting device according to claim 1, characterized in that: The middle section of the plate edge of the chain plate of the washing chain (10) is a horizontal flat section (12), and the stopper (11) is located at the rear end of the flat section (12).
3. The electrolytic cathode plate cleaning lifting device according to claim 1, characterized in that: The top rod (20) is arranged on the inner side of two washing chains (10) arranged in parallel.
4. The electrolytic cathode plate cleaning lifting device according to claim 1 or 3, characterized in that: The top end of the push rod (20) is projected into an arc shape with a high middle portion and low ends in a vertical plane parallel to the conveying direction of the washing chain (10).
5. The electrolytic cathode plate cleaning lifting device according to claim 1 or 3, characterized in that: The top end of the top rod (20) is projected into a roof shape with a high middle portion and low ends in a vertical plane parallel to the conveying direction of the washing chain (10).
6. The electrolytic cathode plate cleaning lifting device according to claim 4, characterized in that: The top rod (20) is plate-shaped, and the plate surface is located in a vertical plane parallel to the conveying direction of the washing chain (10).
7. The electrolytic cathode plate cleaning lifting device according to claim 4, characterized in that: Two groups of push rods (20) are arranged at intervals at upstream and downstream positions of the washing chain (10).
Citation Information
Patent Citations
Electrolytic cathode plate cleaning and jacking device
CN213793056U
Cleaning of rod for electrical conduction and cleaning equipment for rod for electrical conduction executing the same
JP1999172486A