Substrate processing equipment

Abstract

According to an embodiment of the present invention, a substrate processing device may include: a first exposure device and a second exposure device, configured to perform exposure on a substrate with different patterns; and a substrate conveying device, configured to convey the substrate to the first exposure device and the second exposure device and to convey the substrate from the first exposure device and the second exposure device, the substrate conveying device including: a first conveyor, configured to feed the substrate into and out of the first exposure device; a second conveyor, configured to feed the substrate into and out of the second exposure device; a third conveyor and a fourth conveyor, arranged between the first conveyor and the second conveyor and configured to convey the substrate to the first conveyor and the second conveyor in sequence; and a multi-layer transfer machine, arranged between the third conveyor and the fourth conveyor and configured to transfer multiple substrates in at least 2 layers.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus that performs a series of processes on a substrate. Background Art

[0002] Products such as semiconductor elements and liquid crystal display panels are manufactured by subjecting substrates to a series of processes such as coating, exposure, development, etching, evaporation, and cleaning.

[0003] The time required to perform the exposure process in such a series of processes is longer than the time required to perform other processes. Therefore, a substrate processing device having a substrate conveying device is required, which, during a period of performing exposure processing on one substrate, properly conveys other substrates to be subjected to exposure processing to the exposure process, and properly conveys another other substrate that has finished exposure processing from the exposure process to a subsequent process, so as to effectively perform a series of processes on multiple substrates in the shortest time, thereby being able to improve the processing efficiency of multiple substrates. Summary of the invention

[0004] The object of the present invention is to provide a substrate processing device that can effectively execute the process of conveying a substrate from a preceding process to an exposure device, the process of conveying a substrate into the exposure device, the process of conveying a substrate out of the exposure device, and the process of conveying a substrate to a subsequent process in the shortest time.

[0005] According to the first embodiment of the present invention, a substrate processing device may include: a first exposure device and a second exposure device, configured to perform exposure on a substrate with different patterns; and a substrate conveying device, configured to convey the substrate to the first exposure device and the second exposure device and to convey the substrate from the first exposure device and the second exposure device, the substrate conveying device including: a first conveyor, configured to feed the substrate into and out of the first exposure device; a second conveyor, configured to feed the substrate into and out of the second exposure device; a third conveyor and a fourth conveyor, arranged between the first conveyor and the second conveyor and configured to convey the substrate to the first conveyor and the second conveyor in sequence; and a multi-layer transfer machine, arranged between the third conveyor and the fourth conveyor and configured to transfer multiple substrates in at least 2 layers.

[0006] The first conveyor, the second conveyor, the third conveyor, the fourth conveyor, and the multi-layer transfer machine may each be configured to perform four operations to transport the substrate.

[0007] A substrate processing device according to a second embodiment of the present invention may include: a first exposure device and a second exposure device, configured to perform exposure on a substrate with different patterns; and a substrate conveying device, configured to convey a substrate to and from the first exposure device and the second exposure device, the substrate conveying device including: a first conveyor, configured to deliver a substrate to and from the first exposure device; a second conveyor, configured to deliver a substrate to and from the second exposure device; a third conveyor, a fourth conveyor, and a fifth conveyor, configured to convey a substrate to the first conveyor and the second conveyor in sequence; and a multi-layer transfer machine, arranged between the first conveyor and the second conveyor and configured to transfer a plurality of substrates in at least 2 layers.

[0008] The first conveyor, the second conveyor, the third conveyor, the fourth conveyor, the fifth conveyor, and the multi-layer transfer machine may each be configured to perform four operations to transport the substrate.

[0009] According to the substrate processing apparatus of the embodiment of the present invention, the multiple conveyors and the multi-layer transfer machine of the substrate conveying device each perform only four actions to convey the substrate, so that the time required for conveying the substrate to the first exposure device and the second exposure device and the process of conveying the substrate from the first exposure device and the second exposure device can be shortened. Therefore, the process of conveying the substrate from the preceding process to the first exposure device and the second exposure device, the process of feeding the substrate into the first exposure device and the second exposure device, the process of feeding the substrate out from the first exposure device and the second exposure device, and the process of conveying the substrate to the subsequent process can be effectively performed in the shortest time. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 FIG. 1 is a block diagram schematically showing a substrate processing apparatus according to a first embodiment of the present invention.

[0011] Figure 2 This is a block diagram schematically showing a part of a substrate processing apparatus according to a first embodiment of the present invention.

[0012] Figure 3 FIG. 1 is a block diagram schematically showing a substrate processing apparatus according to a second embodiment of the present invention.

[0013] Figure 4 It is a block diagram schematically showing a part of a substrate processing apparatus according to a second embodiment of the present invention.

[0014] (Explanation of Reference Numerals)

[0015] 181: first exposure device; 182: second exposure device; 700: first substrate conveying device; 800: second substrate conveying device. DETAILED DESCRIPTION

[0016] Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.

[0017] like Figure 1 As shown, the substrate processing device of the first embodiment of the present invention is a device for processing a photolithography process of a glass substrate for manufacturing a flat panel display panel. The substrate processing device may include a plurality of substrate processing units (or unit modules) for processing a substrate. For example, the plurality of substrate processing units may include an indexer 110, a cleaning device 120, first to third baking devices 131, 132, 133, a glue coater 140, a drying device 150, a first exposure device 181, a second exposure device 182, a coding machine 190, a developing device 200, and an inspection device 210. The plurality of substrate processing units may be arranged in an inline manner.

[0018] For example, the first to third baking devices 131 , 132 , 133 may be respectively arranged between the cleaning device 120 and the glue coater 140 , between the drying device 150 and the first exposure device 181 , and between the developing device 200 and the inspection device 210 .

[0019] In addition, the substrate processing apparatus may include a first substrate transferring unit 300 and a second substrate transferring unit 400 which are disposed between the plurality of substrate processing units and transfer the substrate.

[0020] The first substrate transfer unit 300 includes a plurality of conveying rollers arranged along a moving direction of the substrates, and plays a role of transferring the plurality of substrates one by one in sequence.

[0021] For example, the first substrate transfer unit 300 can be arranged between the indexer 110 and the cleaning device 120, between the cleaning device 120 and the first baking device 131, between the coding machine 190 and the developing device 200, between the developing device 200 and the inspection device 210, and between the inspection device 210 and the indexer 110.

[0022] The second substrate transfer unit 400 serves to transport two substrates that are transferred one by one to a subsequent process together.

[0023] For example, the second substrate transfer unit 400 can be arranged between the cleaning device 120 and the first baking device 131, between the first baking device 131 and the glue coater 140, between the glue coater 140 and the drying device 150, between the drying device 150 and the second baking device 132, and between the developing device 200 and the third baking device 133.

[0024] According to this structure, after two substrates are simultaneously fed and transferred by the indexer 110, they can be transferred one by one to a subsequent process by the first substrate transfer unit 300. Then, the two substrates transferred one by one by the first substrate transfer unit 300 can be simultaneously transported to a subsequent process by the second substrate transfer unit 400.

[0025] The substrate processing apparatus according to the first embodiment of the present invention includes a first exposure device 181 and a second exposure device 182 .

[0026] The first exposure device 181 and the second exposure device 182 perform exposure processing of mutually different patterns on one substrate. Since the first exposure device 181 and the second exposure device 182 perform exposure processing of mutually different patterns, the time required for the exposure processing can be shortened.

[0027] For example, the first exposure device 181 can perform an exposure process on the substrate in a pattern corresponding to the large panel, and the second exposure device 182 can perform an exposure process on the area on the substrate other than the area corresponding to the large panel in a pattern corresponding to the small panel. Therefore, since the exposure process is performed on one substrate in a pattern corresponding to the large panel and a pattern corresponding to the small panel, a large area substrate can be effectively used.

[0028] like Figure 1 as well as Figure 2 As shown, the substrate processing apparatus of the first embodiment of the present invention includes a first substrate conveying device 700. The first substrate conveying device 700 can take into account the time for performing exposure processing on the substrate in the first exposure device 181 and the second exposure device 182, and can effectively perform the process of conveying the substrate from the preceding process to the first exposure device 181 and the second exposure device 182, the process of feeding the substrate into the first exposure device 181 and the second exposure device 182, the process of feeding the substrate out from the first exposure device 181 and the second exposure device 182, and the process of conveying the substrate to the subsequent process in the shortest time.

[0029] For example, the preceding process may be a process performed by the cleaning device 120, the first baking device 131, the glue coating machine 140, the drying device 150, and the second baking device 132. In addition, the subsequent process may be a process performed by the coding machine 190, the developing device 200, the third baking device 133, and the inspection device 210.

[0030] like Figure 2 As shown, the first substrate conveying device 700 may include a first conveyor 711 , a second conveyor 712 , a third conveyor 713 , a fourth conveyor 714 , and a multi-layer transfer machine 720 .

[0031] For example, the first conveyor 711 , the second conveyor 712 , the third conveyor 713 , and the fourth conveyor 714 may each be configured as a robot that grips and transfers a substrate.

[0032] The first conveyor 711 is disposed adjacent to the first exposure device 181. The first conveyor 711 is configured to carry a substrate into the first exposure device 181 and carry a substrate out from the first exposure device 181.

[0033] The second conveyor 712 is arranged adjacent to the second exposure device 182. The second conveyor 712 is configured to carry a substrate into the second exposure device 182 and carry a substrate out from the second exposure device 182.

[0034] The third conveyor 713 and the fourth conveyor 714 are disposed on the substrate conveying path between the first conveyor 711 and the second conveyor 712. The third conveyor 713 and the fourth conveyor 714 are configured to convey substrates to the first conveyor 711 and the second conveyor 712 in sequence.

[0035] The multi-layer transfer machine 720 is disposed between the third conveyor 713 and the fourth conveyor 714 and is configured to transfer a plurality of substrates in at least two layers.

[0036] Below, refer to Figure 2 , the structure of the first substrate conveying device 700 is described in more detail.

[0037] The fourth conveyor 714 is configured to receive substrates from a preceding process.

[0038] The fourth conveyor 714 is configured to deliver substrates to the multi-layer transfer machine 720 and receive substrates from the multi-layer transfer machine 720 .

[0039] A first buffer table 741 for storing substrates may be provided at one side of the fourth conveyor 714 .

[0040] In addition, the fourth conveyor 714 is configured to convey the substrate to the second conveyor 712. On the other hand, a first rotating table 731 for rotating the substrate may be provided between the fourth conveyor 714 and the second conveyor 712. In this case, the fourth conveyor 714 may convey the substrate to the second conveyor 712 via the first rotating table 731.

[0041] In this way, the fourth conveyor 714 can perform four actions (the action of transferring the received substrate from the previous process, the action of transferring the substrate to the multi-layer transfer machine 720, the action of transferring the received substrate from the multi-layer transfer machine 720, and the action of transferring the substrate to the second conveyor 712).

[0042] The second conveyor 712 is arranged adjacent to the second exposure device 182. The second conveyor 712 is configured to carry a substrate into the second exposure device 182 and carry a substrate out from the second exposure device 182.

[0043] The second conveyor 712 is configured to transfer the receiving substrate from the fourth conveyor 714. In the case where the first rotating table 731 is provided, the second conveyor 712 may transfer the receiving substrate from the fourth conveyor 714 via the first rotating table 731.

[0044] In addition, the second conveyor 712 is configured to transfer the substrate to a subsequent process.

[0045] In this way, the second conveyor 712 can perform four actions (the action of transferring the received substrate from the fourth conveyor 714, the action of sending the substrate to the second exposure device 182, the action of sending the substrate out from the second exposure device 182, and the action of transferring the substrate to the subsequent process).

[0046] The third conveyor 713 is configured to receive substrates from the multi-layer transfer machine 720 .

[0047] A second buffer stage 742 for storing substrates is provided on one side of the third conveyor 713. The third conveyor 713 is configured to transfer substrates to the second buffer stage 742 and receive substrates from the second buffer stage 742.

[0048] The third conveyor 713 is configured to transfer the substrate to the first conveyor 711. On the other hand, a second rotating table 732 for rotating the substrate may be provided between the third conveyor 713 and the first conveyor 711. In this case, the third conveyor 713 may transfer the substrate to the first conveyor 711 via the second rotating table 732.

[0049] In this way, the third conveyor 713 can perform four actions (the action of transferring the received substrate from the multi-layer transfer machine 720, the action of transferring the substrate to the second buffer table 742, the action of transferring the received substrate from the second buffer table 742, and the action of transferring the substrate to the first conveyor 711).

[0050] The first conveyor 711 is disposed adjacent to the first exposure device 181. The first conveyor 711 is configured to carry a substrate into the first exposure device 181 and carry a substrate out from the first exposure device 181.

[0051] The first conveyor 711 is configured to transfer the substrate to the multi-layer transfer machine 720 .

[0052] The first conveyor 711 is configured to transfer the receiving substrate from the third conveyor 713. In the case where the second rotating table 732 is provided, the first conveyor 711 may transfer the receiving substrate from the third conveyor 713 via the second rotating table 732.

[0053] In this way, the first conveyor 711 can perform four actions (the action of transferring and receiving the substrate from the third conveyor 713, the action of sending the substrate to the first exposure device 181, the action of sending the substrate out from the first exposure device 181, and the action of transferring the substrate to the multi-layer transfer machine 720).

[0054] The multi-layer conveyor 720 may include a plurality of conveyors arranged in at least two layers. The plurality of conveyors of the multi-layer conveyor 720 may be arranged vertically relative to the ground. For example, the conveyors constituting the multi-layer conveyor 720 may be roller conveyors in which a plurality of rollers are arranged in a row.

[0055] For example, when the multi-layer transfer machine 720 is configured to transfer substrates in two layers, the two substrates can be transferred in opposite directions by the multi-layer transfer machine 720 .

[0056] The multilayer transfer machine 720 is configured to receive a substrate from the fourth conveyor 714 and to transfer the substrate to the fourth conveyor 714. The multilayer transfer machine 720 is configured to transfer the substrate to the third conveyor 713. The multilayer transfer machine 720 is configured to receive a substrate from the first conveyor 711.

[0057] In this way, the multilayer transfer machine 720 can perform four actions (the action of transferring the received substrate from the fourth conveyor 714, the action of transferring the substrate to the fourth conveyor 714, the action of transferring the substrate to the third conveyor 713, and the action of transferring the received substrate from the first conveyor 711).

[0058] The following describes a process of conveying a substrate from a preceding process to a first exposure device 181 and a second exposure device 182 by a first substrate conveying device 700 in a substrate processing device according to a first embodiment of the present invention, and a process of conveying a substrate from the first exposure device 181 and the second exposure device 182 to a subsequent process.

[0059] First, a substrate is transferred from the preceding process to the fourth conveyor 714. The fourth conveyor 714 transfers the substrate to the multilayer transfer machine 720. The multilayer transfer machine 720 transfers the substrate via the third conveyor 713. The third conveyor 713 delivers the substrate to the second buffer stage 742. The third conveyor 713 delivers the substrate from the second buffer stage 742. The third conveyor 713 delivers the substrate to the first conveyor 711. The first conveyor 711 delivers the substrate to the first exposure device 181. Thus, the substrate is subjected to exposure processing in the first exposure device 181.

[0060] When the exposure process of the substrate is completed in the first exposure device 181, the first conveyor 711 sends the substrate out of the first exposure device 181. The first conveyor 711 transfers the substrate to the multi-layer transfer machine 720. The multi-layer transfer machine 720 transfers the substrate to the fourth conveyor 714. The fourth conveyor 714 transfers the substrate to the second conveyor 712. The second conveyor 712 sends the substrate to the second exposure device 182. Thus, the exposure process of the substrate is performed in the second exposure device 182.

[0061] When the exposure process of the substrate is completed in the second exposure device 182 , the second conveyor 712 transfers the substrate to a subsequent process.

[0062] Through this process, the first exposure device 181 and the second exposure device 182 sequentially perform exposure processing on the substrate.

[0063] According to the substrate processing apparatus of the embodiment of the present invention, the first conveyor 711, the second conveyor 712, the third conveyor 713, the fourth conveyor 714, and the multi-layer transfer machine 720 of the first substrate conveying device 700 each perform only four operations to convey the substrate, so that the time required for conveying the substrate to the first exposure device 181 and the second exposure device 182 and the process of conveying the substrate from the first exposure device 181 and the second exposure device 182 can be shortened. Therefore, the process of conveying the substrate from the preceding process to the first exposure device 181 and the second exposure device 182, the process of feeding the substrate into the first exposure device 181 and the second exposure device 182, the process of feeding the substrate out from the first exposure device 181 and the second exposure device 182, and the process of conveying the substrate to the subsequent process can be effectively performed in the shortest time.

[0064] Below, refer to Figure 3 as well as Figure 4 , a substrate processing apparatus according to a second embodiment of the present invention is described. The same parts as those described in the first embodiment are marked with the same reference numerals, and detailed description thereof is omitted.

[0065] like Figure 3 as well as Figure 4 As shown, the substrate processing apparatus of the second embodiment of the present invention includes a second substrate conveying apparatus 800. The second substrate conveying apparatus 800 can take into account the time for performing exposure processing on the substrate in the first exposure apparatus 181 and the second exposure apparatus 182, and can effectively perform the process of conveying the substrate from the preceding process to the first exposure apparatus 181 and the second exposure apparatus 182, the process of feeding the substrate into the first exposure apparatus 181 and the second exposure apparatus 182, the process of feeding the substrate out from the first exposure apparatus 181 and the second exposure apparatus 182, and the process of conveying the substrate to the subsequent process in the shortest time.

[0066] For example, the preceding process may be a process performed by the cleaning device 120, the first baking device 131, the glue coating machine 140, the drying device 150, and the second baking device 132. In addition, the subsequent process may be a process performed by the coding machine 190, the developing device 200, the third baking device 133, and the inspection device 210.

[0067] like Figure 4 As shown, the second substrate conveying device 800 may include a first conveyor 811 , a second conveyor 812 , a third conveyor 813 , a fourth conveyor 814 , a fifth conveyor 815 , and a multi-layer transfer machine 820 .

[0068] For example, the first conveyor 811 , the second conveyor 812 , the third conveyor 813 , the fourth conveyor 814 , and the fifth conveyor 815 may each be configured as a robot that grips and transfers a substrate.

[0069] The first conveyor 811 is arranged adjacent to the first exposure device 181. The first conveyor 811 is configured to carry a substrate into the first exposure device 181 and carry a substrate out from the first exposure device 181.

[0070] The second conveyor 812 is arranged adjacent to the second exposure device 182. The second conveyor 812 is configured to carry a substrate into the second exposure device 182 and carry a substrate out from the second exposure device 182.

[0071] The third conveyor 813 , the fourth conveyor 814 , and the fifth conveyor 815 are configured to sequentially convey the substrates to the first conveyor 811 and the second conveyor 812 .

[0072] The multi-layer transfer machine 820 is disposed between the first conveyor 811 and the second conveyor 812 and is configured to transfer a plurality of substrates in at least two layers.

[0073] Below, refer to Figure 4 , the structure of the second substrate conveying device 800 is described in more detail.

[0074] The fourth conveyor 814 is configured to transfer receiving substrates from a preceding process.

[0075] A first buffer stage 841 for storing substrates is provided on one side of the fourth conveyor 814. The fourth conveyor 814 is configured to transfer substrates to the first buffer stage 841 and receive substrates from the first buffer stage 841.

[0076] The fourth conveyor 814 is configured to transfer the substrate to the first conveyor 811. On the other hand, a first rotating table 831 for rotating the substrate may be provided between the fourth conveyor 814 and the first conveyor 811. In this case, the fourth conveyor 814 may transfer the substrate to the first conveyor 811 via the first rotating table 831.

[0077] In this way, the fourth conveyor 814 can perform four actions (the action of transferring the received substrate from the previous process, the action of transferring the substrate to the first buffer table 841, the action of transferring the received substrate from the first buffer table 841, and the action of transferring the substrate to the first conveyor 811).

[0078] The first conveyor 811 is configured to transfer the receiving substrate from the fourth conveyor 814. In the case where the first rotating table 831 is provided, the first conveyor 811 may transfer the receiving substrate from the fourth conveyor 814 via the first rotating table 831.

[0079] The first conveyor 811 is arranged adjacent to the first exposure device 181. The first conveyor 811 is configured to carry a substrate into the first exposure device 181 and carry a substrate out from the first exposure device 181.

[0080] The first conveyor 811 is configured to transfer the substrate to the multi-layer transfer machine 820 .

[0081] In this way, the first conveyor 811 can perform four actions (the action of transferring and receiving the substrate from the fourth conveyor 814, the action of sending the substrate to the first exposure device 181, the action of sending the substrate out from the first exposure device 181, and the action of transferring the substrate to the multi-layer transfer machine 820).

[0082] The third conveyor 813 is configured to receive substrates from the multi-layer transfer machine 820 .

[0083] A second buffer stage 842 for storing substrates is provided on one side of the third conveyor 813. The third conveyor 813 is configured to transfer substrates to the second buffer stage 842 and receive substrates from the second buffer stage 842.

[0084] The third conveyor 813 is configured to transfer the substrate to the second conveyor 812. On the other hand, a second rotating table 832 for rotating the substrate may be provided between the third conveyor 813 and the second conveyor 812. In this case, the third conveyor 813 may transfer the substrate to the second conveyor 812 via the second rotating table 832.

[0085] In this way, the third conveyor 813 can perform four actions (the action of transferring the received substrate from the multi-layer transfer machine 820, the action of transferring the substrate to the second buffer table 842, the action of transferring the received substrate from the second buffer table 842, and the action of transferring the substrate to the second conveyor 812).

[0086] The second conveyor 812 is arranged adjacent to the second exposure device 182. The second conveyor 812 is configured to carry a substrate into the second exposure device 182 and carry a substrate out from the second exposure device 182.

[0087] The second conveyor 812 is configured to transfer the receiving substrate from the third conveyor 813. In the case where the second rotating table 832 is provided, the second conveyor 812 may transfer the receiving substrate from the third conveyor 813 via the second rotating table 832.

[0088] The second conveyor 812 is configured to transfer the substrate to the multi-layer transfer machine 820 .

[0089] In this way, the second conveyor 812 can perform four actions (the action of transferring and receiving the substrate from the third conveyor 813, the action of sending the substrate to the second exposure device 182, the action of sending the substrate out from the second exposure device 182, and the action of transferring the substrate to the multi-layer transfer machine 820).

[0090] The fifth conveyor 815 is configured to receive substrates from the multi-level transfer machine 820 .

[0091] A third rotating table 833 for rotating the substrate is provided on one side of the fifth conveyor 815. The fifth conveyor 815 is configured to deliver the substrate to the third rotating table 833 and receive the substrate from the third rotating table 833.

[0092] The fifth conveyor 815 is configured to transfer the substrate to a subsequent process.

[0093] In this way, the fifth conveyor 815 can perform four actions (the action of transferring the received substrate from the multi-layer transfer machine 820, the action of transferring the substrate to the third rotating table 833, the action of transferring the received substrate from the third rotating table 833, and the action of transferring the substrate to the subsequent process).

[0094] The multi-layer conveyor 820 may include a plurality of conveyors arranged in at least two layers. The plurality of conveyors of the multi-layer conveyor 820 may be arranged vertically relative to the ground. For example, the conveyors constituting the multi-layer conveyor 820 may be roller conveyors in which a plurality of rollers are arranged in a row.

[0095] For example, when the multi-layer transfer machine 820 is configured to transfer substrates in two layers, the two substrates can be transferred in opposite directions by the multi-layer transfer machine 820 .

[0096] For example, the multi-layer transfer machine 820 may be configured in three layers. In this case, the second rotating table 832 and the third rotating table 833 may be arranged in one of the three layers. Then, conveyors may be arranged in two of the three layers, respectively.

[0097] The multilayer transfer machine 820 is configured to receive a substrate from the first conveyor 811. The multilayer transfer machine 820 is configured to transfer a substrate to the third conveyor 813. The multilayer transfer machine 820 is configured to receive a substrate from the second conveyor 812. The multilayer transfer machine 820 is configured to transfer a substrate to the fifth conveyor 815.

[0098] In this way, the multi-layer transfer machine 820 can perform four actions (the action of transferring the received substrate from the first conveyor 811, the action of transferring the substrate to the third conveyor 813, the action of transferring the received substrate from the second conveyor 812, and the action of transferring the substrate to the fifth conveyor 815).

[0099] The following describes a process of conveying a substrate from a preceding process to the first exposure device 181 and the second exposure device 182 by the second substrate conveying device 800 in a substrate processing device according to a second embodiment of the present invention, and a process of conveying a substrate from the first exposure device 181 and the second exposure device 182 to a subsequent process.

[0100] First, the substrate is transferred from the preceding process to the fourth conveyor 814. The fourth conveyor 814 transfers the substrate to the first conveyor 811. The first conveyor 811 carries the substrate to the first exposure device 181. Thus, the first exposure device 181 performs exposure processing on the substrate.

[0101] When the exposure process of the substrate is completed in the first exposure device 181, the first conveyor 811 sends the substrate out of the first exposure device 181. The first conveyor 811 transfers the substrate to the multi-layer transfer machine 820. The multi-layer transfer machine 820 transfers the substrate to the third conveyor 813. The third conveyor 813 transfers the substrate to the second conveyor 812. The second conveyor 812 sends the substrate to the second exposure device 182. Thus, the exposure process of the substrate is performed in the second exposure device 182.

[0102] When the exposure process of the substrate is completed in the second exposure device 182, the second conveyor 812 transfers the substrate to the multi-layer transfer machine 820. The multi-layer transfer machine 820 transfers the substrate to the fifth conveyor 815. Then, the fifth conveyor 815 transfers the substrate to the subsequent process.

[0103] Through this process, the first exposure device 181 and the second exposure device 182 sequentially perform exposure processing on the substrate.

[0104] According to the substrate processing apparatus of the embodiment of the present invention, the first conveyor 811, the second conveyor 812, the third conveyor 813, the fourth conveyor 814, the fifth conveyor 815, and the multi-layer transfer machine 820 of the second substrate conveying device 800 each perform only four operations to convey the substrate, so that the time required for the process of conveying the substrate to the first exposure device 181 and the second exposure device 182 and the process of conveying the substrate from the first exposure device 181 and the second exposure device 182 can be shortened. Therefore, the process of conveying the substrate from the preceding process to the first exposure device 181 and the second exposure device 182, the process of feeding the substrate into the first exposure device 181 and the second exposure device 182, the process of feeding the substrate out from the first exposure device 181 and the second exposure device 182, and the process of conveying the substrate to the subsequent process can be effectively performed in the shortest time.

[0105] Although the preferred embodiments of the present invention have been described by way of example, the scope of the present invention is not limited to the specific embodiments and can be appropriately modified within the scope of the claims.

Claims

1. A substrate processing device, comprising: The first exposure device and the second exposure device are configured to perform exposure on the substrate in different patterns; as well as a substrate transport device configured to transport the substrate to the first exposure device and the second exposure device and to transport the substrate from the first exposure device and the second exposure device; The substrate conveying device comprises: a first conveyor configured to carry the substrate into and out of the first exposure device; a second conveyor configured to carry the substrate into and out of the second exposure device; A third conveyor and a fourth conveyor are arranged between the first conveyor and the second conveyor and are configured to sequentially convey the substrate to the first conveyor and the second conveyor; and a multi-layer transfer machine, arranged between the third conveyor and the fourth conveyor and configured to transfer a plurality of substrates in at least two layers, The first conveyor, the second conveyor, the third conveyor, the fourth conveyor, and the multi-layer transfer machine are each configured to perform a total of four actions to transport the substrate. The substrate processing apparatus further includes a buffer table configured to store the substrate. The first conveyor performs the actions of receiving the substrate from the third conveyor, feeding the substrate into the first exposure device, feeding the substrate out from the first exposure device, and transferring the substrate to the multi-layer transfer machine. The second conveyor performs the actions of receiving the substrate from the fourth conveyor, feeding the substrate into the second exposure device, feeding the substrate out of the second exposure device, and transferring the substrate to a subsequent process. The third conveyor performs the actions of receiving and transferring the substrate from the multi-layer transfer machine, transferring the substrate to the buffer table, receiving and transferring the substrate from the buffer table, and transferring the substrate to the first conveyor. The fourth conveyor performs the actions of receiving the substrate from the previous process, transferring the substrate to the multi-layer transfer machine, receiving the substrate from the multi-layer transfer machine, and transferring the substrate to the second conveyor. The multi-layer transfer machine performs the actions of transferring and receiving the substrate from the fourth conveyor, transferring the substrate to the fourth conveyor, transferring the substrate to the third conveyor, and transferring and receiving the substrate from the first conveyor.

2. The substrate processing device according to claim 1, characterized in that: The first exposure device performs exposure processing on the substrate in a pattern corresponding to the large panel, The second exposure device performs exposure processing on a region on the substrate other than a region on the substrate corresponding to the large panel in a pattern corresponding to the small panel.

3. A substrate processing device, comprising: The first exposure device and the second exposure device are configured to perform exposure on the substrate in different patterns; as well as a substrate transport device configured to transport the substrate to the first exposure device and the second exposure device and to transport the substrate from the first exposure device and the second exposure device; The substrate conveying device comprises: a first conveyor configured to carry the substrate into and out of the first exposure device; a second conveyor configured to carry the substrate into and out of the second exposure device; a third conveyor configured to convey the substrate to the second conveyor; a fourth conveyor configured to convey the substrate to the first conveyor; a multi-layer transfer machine disposed between the first conveyor and the second conveyor and configured to transfer a plurality of substrates in at least two layers; and The fifth conveyor is configured to receive the substrate from the multi-layer transfer machine.

4. The substrate processing device according to claim 3, characterized in that: The first conveyor, the second conveyor, the third conveyor, the fourth conveyor, the fifth conveyor, and the multi-layer transfer machine are each configured to perform a total of four operations to transport the substrate.

5. The substrate processing device according to claim 3, characterized in that: The substrate processing apparatus further includes a first buffer table and a second buffer table configured to store the substrate. The first conveyor performs the actions of receiving the substrate from the fourth conveyor, feeding the substrate into the first exposure device, feeding the substrate out from the first exposure device, and transferring the substrate to the multi-layer transfer machine. The second conveyor performs the actions of receiving the substrate from the third conveyor, feeding the substrate into the second exposure device, feeding the substrate out from the second exposure device, and transferring the substrate to the multi-layer transfer machine. The third conveyor performs the actions of receiving and transferring the substrate from the multi-layer transfer machine, transferring the substrate to the second buffer table, receiving and transferring the substrate from the second buffer table, and transferring the substrate to the second conveyor. The fourth conveyor performs the actions of receiving the substrate from the previous process, transferring the substrate to the first buffer stage, receiving the substrate from the first buffer stage, and transferring the substrate to the first conveyor. The fifth conveyor performs the actions of receiving and transferring the substrate from the multi-layer transfer machine, transferring the substrate to the third rotating table, receiving and transferring the substrate from the third rotating table, and transferring the substrate to a subsequent process. The multi-layer transfer machine performs the actions of transferring and receiving the substrate from the first conveyor, transferring the substrate to the third conveyor, transferring and receiving the substrate from the second conveyor, and transferring the substrate to the fifth conveyor.

6. The substrate processing apparatus according to any one of claims 3 to 5, characterized in that: The first exposure device performs exposure processing on the substrate in a pattern corresponding to the large panel, The second exposure device performs exposure processing on a region on the substrate other than a region on the substrate corresponding to the large panel in a pattern corresponding to the small panel.

7. A substrate processing apparatus, comprising a plurality of substrate processing units configured to perform predetermined processing on a substrate, wherein: The plurality of substrate processing units include a first exposure device and a second exposure device configured to perform exposure on the substrate in different patterns. The substrate processing apparatus further includes a substrate transport device configured to transport the substrate to the first exposure device and the second exposure device and to transport the substrate from the first exposure device and the second exposure device. The substrate conveying device comprises: a first conveyor configured to carry the substrate into and out of the first exposure device; a second conveyor configured to carry the substrate into and out of the second exposure device; A third conveyor and a fourth conveyor are arranged between the first conveyor and the second conveyor and are configured to sequentially convey the substrate to the first conveyor and the second conveyor; and a multi-layer transfer machine, arranged between the third conveyor and the fourth conveyor and configured to transfer a plurality of substrates in at least two layers, The first conveyor, the second conveyor, the third conveyor, the fourth conveyor, and the multi-layer transfer machine are each configured to perform a total of four actions to transport the substrate. The first conveyor performs the actions of receiving the substrate from the third conveyor, sending the substrate to the first exposure device, sending the substrate out from the first exposure device, and transferring the substrate to the multi-layer transfer machine.

8. The substrate processing device according to claim 7, characterized in that: The first exposure device performs exposure processing on the substrate in a pattern corresponding to the large panel, The second exposure device performs exposure processing on a region on the substrate other than a region on the substrate corresponding to the large panel in a pattern corresponding to the small panel.

9. The substrate processing device according to claim 7, characterized in that: The second conveyor performs the actions of receiving the substrate from the fourth conveyor, sending the substrate to the second exposure device, sending the substrate out from the second exposure device, and transferring the substrate to a subsequent process.

10. The substrate processing apparatus according to claim 7, wherein: The third conveyor performs the actions of transferring and receiving the substrate from the multi-layer transfer machine, transferring the substrate to a buffer table, transferring and receiving the substrate from the buffer table, and transferring the substrate to the first conveyor.

11. The substrate processing apparatus according to claim 7, wherein: The fourth conveyor performs the actions of receiving the substrate from the previous process, transferring the substrate to the multi-layer transfer machine, receiving the substrate from the multi-layer transfer machine, and transferring the substrate to the second conveyor.

12. The substrate processing apparatus according to claim 7, wherein: The multi-layer transfer machine performs the actions of transferring and receiving the substrate from the fourth conveyor, transferring the substrate to the fourth conveyor, transferring the substrate to the third conveyor, and transferring and receiving the substrate from the first conveyor.

13. The substrate processing apparatus according to claim 7, wherein: The plurality of substrate processing units further include an indexer, a cleaning device, a baking device, a developing device, and an inspection device.

14. The substrate processing apparatus according to claim 7, wherein: The substrate processing apparatus includes a substrate transfer unit disposed between a pair of substrate processing units adjacent to each other among the plurality of substrate processing units and configured to move the substrate.

15. The substrate processing apparatus according to claim 14, wherein: The substrate transfer unit is configured to sequentially transfer a plurality of substrates one by one.

16. The substrate processing apparatus according to claim 14, wherein: The substrate transfer unit is configured to transfer two substrates together.

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