Conductive structure for an electrochromic device

Abstract

The application discloses a conduction structure of an electrochromic device and belongs to the technical field of the electrochromic device. The conduction structure of the electrochromic device comprises a first conductive substrate layer, an electrochromic layer and a second conductive substrate layer which are sequentially and superimposedly arranged, the first conductive substrate layer comprises a first transparent conductive layer and a first substrate layer which are sequentially and superimposedly arranged, the second conductive substrate layer comprises a second transparent conductive layer and a second substrate layer which are sequentially and superimposedly arranged, the second transparent conductive layer is provided with a partition groove so that the second transparent conductive layer is divided into two independent first and second conductive areas, at least part of the electrochromic layer corresponding to the second conductive area is removed to form a conduction opening, the conduction opening is filled with a conduction piece with conductivity, and the conduction piece is used for electrically connecting the first transparent conductive layer and the second conductive area. The conduction structure of the electrochromic device only needs to be once heat pressed and welded, the process is simple, the efficiency is relatively high, and the yield can be improved.

Description

Technical Field

[0001] This invention relates to the field of color-changing device technology, and more particularly to a conductive structure for an electrochromic device. Background Technology

[0002] Electrochromism refers to the phenomenon where a material undergoes a reversible oxidation-reduction reaction under the influence of an external electric field, leading to changes in its optical properties (such as transmittance, absorptivity, and reflectivity). This manifests as reversible changes in color and transparency. Therefore, electrochromic devices have been widely used in industries such as electrochromic energy-saving smart windows, automotive rearview mirrors, and display devices. In existing technologies, when leading out the electrodes for electrochromic devices, the electrode leads connecting the first transparent conductive layer and the electrode leads connecting the second transparent conductive layer are typically led out separately from the upper and lower conductive substrates. This requires two thermocompression welding processes; for example, after welding the electrode leads of the lower substrate, the electrochromic device is flipped over, and the electrode leads of the upper substrate are welded. This process is complex, unsuitable for automated production, inefficient, and detrimental to improving yield. Summary of the Invention

[0003] The purpose of this invention is to propose a conductive structure for an electrochromic device that requires only one thermoforming process, is simple and efficient, and helps to improve yield.

[0004] To achieve this objective, the present invention adopts the following technical solution:

[0005] A conductive structure for an electrochromic device includes a first conductive substrate layer, an electrochromic layer, and a second conductive substrate layer stacked sequentially. The first conductive substrate layer includes a first transparent conductive layer and a first substrate layer stacked sequentially, with the first transparent conductive layer bonded to one side of the electrochromic layer. The second conductive substrate layer includes a second transparent conductive layer and a second substrate layer stacked sequentially, with the second transparent conductive layer bonded to the other side of the electrochromic layer. A partition groove is formed on the second transparent conductive layer to divide it into two independent first conductive regions and a second conductive region. At least a portion of the electrochromic layer corresponding to the second conductive region is removed to form a conductive port. A conductive element is filled into the conductive port to electrically connect the first transparent conductive layer and the second conductive region.

[0006] Optionally, the surface of the first conductive region, at least on the side closest to the partition groove, is covered by the electrochromic layer.

[0007] Optionally, at least a portion of the peripheral surface of the conductive element is adjacent to the electrochromic layer.

[0008] Optionally, the through-hole extends through the first conductive substrate layer.

[0009] Optionally, at least a portion of the surface of the top side of the conductive element overflows the conductive port and covers at least a portion of the first conductive substrate layer away from the electrochromic layer.

[0010] Optionally, at least a portion of the peripheral surface of the conductive element is not in close contact with the electrochromic layer.

[0011] Optionally, the top side of the conductive element covers the first conductive substrate layer.

[0012] Optionally, the conductive structure of the electrochromic device further includes a conductor disposed on the surface and / or inside the first transparent conductive layer, and the conductor is connected to the conductive element.

[0013] Optionally, the electrochromic layer includes an electrochromic material layer, an electrolyte layer, and an ion storage layer stacked sequentially.

[0014] Optionally, a water-oxygen barrier layer is provided on the side of the first substrate layer away from the electrochromic layer; and / or a water-oxygen barrier layer is provided on the side of the second substrate layer away from the electrochromic layer.

[0015] The advantages of this invention compared to the prior art are as follows: First, the second transparent conductive layer is etched to create a partition groove, dividing the second transparent conductive layer into two independent first conductive regions and second conductive regions. At least a portion of the electrochromic layer corresponding to the second conductive region is removed to form a conductive port. A conductive element is injected into the conductive port, which electrically connects the first transparent conductive layer and the second conductive region, thereby enabling the same-side electrode to be led out. Therefore, the electrode leads used to connect the first transparent conductive layer and the electrode leads used to connect the second transparent conductive layer can both be led out from the second conductive substrate layer, facilitating the simultaneous welding of the two electrode leads of the electrochromic device in a single thermocompression welding process. The process is simple, conducive to automated production, and greatly improves work efficiency and product yield. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the conductive structure of an electrochromic device without a conductive element provided in a specific embodiment of the present invention;

[0017] Figure 2 This is a schematic diagram of the conduction structure of the electrochromic device provided in Embodiment 1 of the present invention;

[0018] Figure 3 This is a schematic diagram of the conduction structure of the electrochromic device provided in Embodiment 2 of the present invention;

[0019] Figure 4This is a schematic diagram of the conduction structure of the electrochromic device provided in Embodiment 3 of the present invention;

[0020] Figure 5 This is a schematic diagram of the conduction structure of the electrochromic device provided in Embodiment 4 of the present invention;

[0021] Figure 6 This is a schematic diagram of the conduction structure of the electrochromic region provided in Embodiment 5 of the present invention.

[0022] Figure label:

[0023] First conductive substrate layer-1; First transparent conductive layer-11; First substrate layer-12; Electrochromic layer-2; Second conductive substrate layer-3; Second transparent conductive layer-31; First conductive region-311; Second conductive region-312; Second substrate layer-32; Partition groove-4; Conductive opening-5; Conductive element-6; Conductor-7; Water and oxygen barrier layer-8; Photopolymer layer-9. Detailed Implementation

[0024] To make the technical problems solved by the present invention, the technical solutions adopted, and the technical effects achieved clearer, the technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0025] The following is for reference. Figures 1-6 The specific structure of the conduction structure of the electrochromic device according to an embodiment of the present invention is described.

[0026] like Figures 1 to 6 As shown, this embodiment provides a conductive structure for an electrochromic device, including a first conductive substrate layer 1, an electrochromic layer 2, and a second conductive substrate layer 3 stacked sequentially. The first conductive substrate layer 1 includes a first transparent conductive layer 11 and a first substrate layer 12 stacked sequentially, with the first transparent conductive layer 11 bonded to one side of the electrochromic layer 2. The second conductive substrate layer 3 includes a second transparent conductive layer 31 and a second substrate layer 32 stacked sequentially, with the second transparent conductive layer 31 bonded to the other side of the electrochromic layer 2. A partition groove 4 is formed on the second transparent conductive layer 31 to divide the second transparent conductive layer 31 into two independent first conductive regions 311 and second conductive regions 312. At least a portion of the electrochromic layer 2 corresponding to the second conductive region 312 is removed to form a conductive port 5. A conductive element 6 with conductivity is injected into the conductive port 5, and the conductive element 6 is used to electrically connect the first transparent conductive layer 11 and the second conductive region 312.

[0027] It should be noted that, firstly, the second transparent conductive layer 31 is etched to create a partition groove 4, which divides the second transparent conductive layer 31 into two independent first conductive regions 311 and second conductive regions 312. At least a portion of the electrochromic layer 2 corresponding to the second conductive region 312 is removed to form a conductive port 5. The conductive port 5 is filled with a liquid conductive element 6. After the liquid conductive element 6 becomes a solid conductive element 6, the conductive element 6 is connected to the first transparent conductive layer 11 and the second conductive region 312 located in the conductive port 5, respectively, electrically connecting the first transparent conductive layer 11 and the second conductive region 312, thereby realizing the same-side electrode lead-out. Therefore, the electrode leads used to connect the first transparent conductive layer 11 and the electrode leads used to connect the second transparent conductive layer 31 can both be led out from the second conductive substrate layer 3, which facilitates the simultaneous welding of the two electrode leads of the electrochromic device in one thermo-pressure welding process. The process is simple, which is conducive to realizing automated production and greatly improves work efficiency and product yield.

[0028] In this invention, at least one of the first substrate layer 12 and the second substrate layer 32 is preferably transparent to display the optical property changes of the electrochromic device.

[0029] The materials of the first conductive substrate layer 1 and the second conductive substrate layer 3 can be glass, plastic, etc. Plastic substrate materials include, but are not limited to, any one or at least a combination of two of polyethylene terephthalate (PET), cyclic olefin copolymers, or cellulose triacetate. Typical but non-limiting combinations include combinations of PET and cyclic olefin copolymers, combinations of cyclic olefin copolymers and cellulose triacetate, combinations of PET and cellulose triacetate, or combinations of PET, cyclic olefin copolymers, and cellulose triacetate. Preferably, the thickness of the plastic substrate material is 20-500 μm, for example, 20 μm, 50 μm, 100 μm, 150 μm, 200 μm, 250 μm, 300 μm, 350 μm, 400 μm, 450 μm, or 500 μm, but is not limited to the listed values; other unlisted values ​​within the range are also applicable. When the substrate material is glass, the thickness of the substrate layer is not overly limited; those skilled in the art can make reasonable selections based on actual applications.

[0030] At least one of the first transparent conductive layer 11 and the second transparent conductive layer 31 is preferably transparent to demonstrate changes in the optical properties of the electrochromic device. The materials of the transparent conductive layers include, but are not limited to, any one or at least two combinations of indium tin oxide (ITO), zinc aluminum oxide (AZO), fluorine-doped tin oxide (FTO), silver nanowires, graphene, carbon nanotubes, metal meshes, or silver nanoparticles; typical but non-limiting combinations include combinations of ITO and ZAO, combinations of AZO and FTO, combinations of silver nanowires and graphene, combinations of graphene and carbon nanotubes, combinations of carbon nanotubes and metal meshes, combinations of metal meshes and silver nanoparticles, combinations of ITO, AZO, and silver nanowires, combinations of silver nanowires, graphene, and carbon nanotubes, combinations of graphene, carbon nanotubes, metal meshes, and silver nanoparticles, or combinations of ITO, AZO, FTO, silver nanowires, graphene, carbon nanotubes, metal meshes, and silver nanoparticles. The thickness of the conductive layer is 0.1nm-10μm, for example, it can be 0.1nm, 0.5nm, 1nm, 5nm, 10nm, 100nm, 500nm, 1μm, 3μm, 5μm, 7μm or 10μm, but is not limited to the listed values. Other unlisted values ​​within the range are also applicable, and it is further preferred to be 0.1nm-1μm.

[0031] The electrochromic layer 2 is a sheet with adjustable transmittance composed of one or more layers of gel-state or solid materials, such as polymer-dispersed liquid crystal (PDLC) glass, suspended particle device (SPD), and electrochromic (EC) types.

[0032] The conductive element 6 is made of a material with high conductivity, such as silver paste. Of course, in other embodiments of the present invention, the conductive element 6 can be selected according to actual needs.

[0033] Optionally, such as Figures 1 to 6 As shown, the surface of the first conductive region 311, at least on the side closest to the partition groove 4, is covered by an electrochromic layer 2.

[0034] It should be explained that since the surface of the first conductive area 311 near the partition groove 4 is covered by the electrochromic layer 2, it can be ensured that after the conductive port 5 is filled with the conductive element 6, the conductive element 6 will not come into contact with the first conductive area 311, thereby preventing the first conductive area 311 and the second conductive area 312 from becoming electrically connected, and thus avoiding the electrochromic device from short-circuiting.

[0035] Optionally, such as Figure 2 , Figure 3 , Figure 4 , Figure 5 and Figure 6 As shown, at least a portion of the peripheral surface of the conductive element 6 is adjacent to the electrochromic layer 2.

[0036] It should be noted that, since at least a portion of the peripheral surface of the conductive element 6 is adjacent to the electrochromic layer 2, it serves to support and fix the conductive element 6, thereby ensuring the reliability of the electrical connection between the first transparent conductive layer 11 and the second conductive region 312 through the conductive element 6. Figure 2 and Figure 3 In some embodiments shown, a portion of the peripheral surface of the conductive element 6 is adjacent to the electrochromic layer 2, and the conductive ports 5 are all open; such as Figure 4 and Figure 5 In some embodiments shown, the entire peripheral surface of the conductive element 6 is adjacent to the electrochromic layer 2, and the conductive port 5 is in the form of a receiving groove or receiving cavity. Compared with a partial surface being adjacent to the electrochromic layer 2, the conductive element 6 has a better and more stable support effect when the entire peripheral surface is adjacent to the electrochromic layer 2.

[0037] Optionally, such as Figures 1 to 4 as well as Figure 6 As shown, the through-hole 5 penetrates the first conductive substrate layer 1. It can be understood that by setting the through-hole 5 through the first conductive substrate layer 1, it is convenient to pour the liquid conductive element 6 from the top along the side of the electrochromic device near the through-hole 5 into the through-hole 5, so that the electrical connection between the conductive element 6 and the first transparent conductive layer 11 and the second conductive region 312 is more stable.

[0038] Optionally, such as Figure 3 As shown, at least a portion of the surface of the top side of the conductive element 6 overflows the conductive port 5 and covers at least a portion of the side of the first conductive substrate layer 1 away from the electrochromic layer 2.

[0039] It needs to be explained that, for example Figure 3 In the embodiment shown, since at least a portion of the surface of the top side of the conductive element 6 overflows the conductive port 5 and covers at least a portion of the side of the first conductive substrate layer 1 away from the electrochromic layer 2, the end faces of the conductive element 6 and the first substrate layer 12 are less likely to crack, thus avoiding electrical connection failure of the first transparent conductive layer 11 and the second conductive region 312, resulting in better adhesion and improved production yield.

[0040] Optionally, such as Figure 2 and Figure 3 As shown, at least a portion of the peripheral surface of the conductive element 6 is not in close contact with the electrochromic layer 2.

[0041] It is understandable that, such as Figure 2 and Figure 3In the embodiments shown, at least a portion of the peripheral surface of the conductive element 6 is not in close contact with the electrochromic layer 2. When forming the conductive port 5, for example, the first conductive substrate layer 1 corresponding to the region of the conductive port 5 can be removed by laser cutting, and then the material of the electrochromic layer 2 within the conductive port 5 can be removed by wiping. Figure 2 , 3 The right side of the conductive port 5 shown is unobstructed by any material, making the removal of the first conductive substrate layer 1 and the electrochromic layer 2 much easier in terms of process, greatly improving product yield. For example... Figure 2 and Figure 3 The structure includes a conductive element 6 covering the left sidewall of the conductive port 5, attached to the side of the first conductive substrate layer 1 and the electrochromic layer 2, achieving electrical connection between the first transparent conductive layer 11 and the second conductive region 312. As a preferred embodiment, to prevent the conductive element 6 from cracking from the side of the first conductive substrate layer 1 and the electrochromic layer 2, the top portion of the conductive element 6 covers the surface of the first conductive substrate layer 1, thereby strengthening the connection stability between the conductive element 6 and the side of the first conductive substrate layer 1 and the electrochromic layer 2, ensuring the reliability of the electrical connection between the first transparent conductive layer 11 and the second conductive region 312, avoiding product failure due to open circuits, and greatly improving product yield.

[0042] Optionally, such as Figure 5 As shown, the top side of the conductive element 6 covers the first conductive substrate layer 1. (As indicated...) Figure 5 In the embodiment shown, at least two adjacent sides of the first conductive base layer 1 corresponding to the top side of the conductive port 5 are first etched, the etched portion of the first conductive base layer 1 is lifted or removed, the conductive element 6 is spot-applied into the conductive port 5 with a needle, and then the first conductive base layer 1 is fixed in its original position. In this way, the contact area between the conductive element 6 and the conductor 7 is larger, which greatly improves the conductivity yield.

[0043] Optionally, such as Figures 1 to 5 As shown, the conductive structure of the electrochromic device also includes a conductor 7, which is disposed on the surface and / or inside the first transparent conductive layer 11, and the conductor 7 is connected to the conductive element 6.

[0044] The conductor 7 of the present invention is made of a metal material with high conductivity, such as any one or a combination of at least two of conductive silver paste, conductive copper paste, conductive carbon paste, nano-silver conductive ink, copper foil, copper wire, or conductive film; typical but non-limiting combinations include combinations of conductive silver paste and conductive copper paste, combinations of conductive copper paste and conductive carbon paste, combinations of conductive carbon paste and nano-silver conductive ink, combinations of nano-silver conductive ink and conductive film, combinations of copper foil and copper wire, combinations of conductive silver paste, conductive copper paste and conductive carbon paste, combinations of conductive silver paste, conductive carbon paste and nano-silver conductive ink, combinations of conductive copper paste, conductive carbon paste and conductive film, or combinations of conductive silver paste, conductive copper paste, conductive carbon paste, nano-silver conductive ink, copper wire, copper foil and conductive film, preferably conductive silver paste.

[0045] It is understandable that, since the conductor 7 is disposed on the surface and / or inside the first transparent conductive layer 11 and is connected to the conductive element 6, the conductor 7 helps to quickly transfer electrons from the conductive element 6 to the entire first transparent conductive layer 11, thereby increasing the conductivity rate and the color change speed.

[0046] Additionally, the conductor 7 can also be provided on the first conductive region 311 and the second conductive region 312. Based on the fact that the first conductive region 311 and the second conductive region 312 can conduct electricity, the conductivity is further improved, thereby further improving the conductivity yield.

[0047] Optionally, the electrochromic layer 2 includes a superimposed electrochromic material layer, an electrolyte layer, and an ion storage layer. The materials of the electrochromic material layer, the electrolyte layer, and the ion storage layer can be those available in the prior art, and the present invention does not impose any special limitations on them.

[0048] Optionally, a water-oxygen barrier layer is provided on the side of the first substrate layer 12 away from the electrochromic layer 2; a water-oxygen barrier layer is also provided on the side of the second substrate layer 32 away from the electrochromic layer 2. It is understood that using a water-oxygen barrier layer on one side of the first substrate layer 12 and the second substrate layer 32 can effectively isolate external water vapor and oxygen, thereby preventing water vapor and oxygen from entering the electrochromic layer 2 and affecting its normal operation.

[0049] Specifically, the water and oxygen barrier layer can be rigid glass or a flexible water and oxygen barrier film as used in existing technologies; no specific limitations are imposed here.

[0050] Advantageously, such as Figure 6As shown, the electrochromic device also includes an optical adhesive layer, which is bonded to the side of the first substrate layer 12 and / or the second substrate layer 32 away from the electrochromic layer 2. It is understood that the optical adhesive layer can effectively connect the water and oxygen barrier layer to the first substrate layer 12 and / or the second substrate layer 32, resulting in a strong, stable connection with good adhesive strength. The optical adhesive layer can be any one or a combination of at least two of the following: polyvinyl butyral (PVB), ethylene-vinyl acetate copolymer (EVA), OCA (Optically Clear Adhesive) optical adhesive, SCA optical adhesive, Super Safe Glas (SGP), Liquid Optical Clear Adhesive (LOCA), or acrylic.

[0051] The following is combined with Figures 2 to 6 Five preferred embodiments of the present invention will be described in detail below.

[0052] Example 1:

[0053] like Figure 2 As shown, a conductive structure of an electrochromic device includes a first conductive substrate layer 1, an electrochromic layer 2, and a second conductive substrate layer 3 stacked sequentially. The first conductive substrate layer 1 includes a first transparent conductive layer 11 and a first substrate layer 12 stacked sequentially. The first transparent conductive layer 11 is connected to one side of the electrochromic layer 2. The second conductive substrate layer 3 includes a second transparent conductive layer 31 and a second substrate layer 32 stacked sequentially. The second transparent conductive layer 31 is connected to the other side of the electrochromic layer 2. A partition groove 4 is formed on the second transparent conductive layer 31 to divide the second transparent conductive layer 31 into two independent first conductive regions 311 and second conductive regions 312. At least a portion of the electrochromic layer 2 corresponding to the second conductive region 312 is removed to form a conductive port 5. The conductive port 5 is open. A conductive element 6 with conductivity is filled into the conductive port 5. The conductive element 6 is used to electrically connect the first transparent conductive layer 11 and the second conductive region 312. The surface of the first conductive region 311 near the partition groove 4 is covered by the electrochromic layer 2. Part of the surface of the conductive member 6 is close to the electrochromic layer 2, and part of the surface is not close to the electrochromic layer 2. The conductive port 5 penetrates the first conductive substrate layer 1.

[0054] Example 2:

[0055] like Figure 3 The structure of the electrochromic device shown is largely the same as that of Embodiment 1. The difference is that at least a portion of the surface of the top side of the conductive element 6 overflows the conductive port 5 and covers at least a portion of the side of the first conductive substrate layer 1 away from the electrochromic layer 2.

[0056] Example 3:

[0057] like Figure 4 The structure of the electrochromic device shown is roughly the same as that of Embodiment 1. The difference is that the through port 5 is an upward-facing receiving groove, and the entire surface of the peripheral side of the conductive element 6 is adjacent to the electrochromic layer 2.

[0058] Example 4:

[0059] like Figure 5 The structure of the electrochromic device shown is roughly the same as that of Embodiment 1. The difference is that the through port 5 is a closed receiving cavity, the entire surface of the peripheral side of the conductive element 6 is adjacent to the electrochromic layer 2, and the top side of the conductive element 6 is covered under the first conductive substrate layer 1.

[0060] Example 5:

[0061] like Figure 6 The structure of the electrochromic device shown is largely the same as that of Embodiment 1, except that the water and oxygen barrier layer 8 is bonded to the side of the first substrate layer 12 and the second substrate layer 32 away from the electrochromic layer 2 via a photoresist layer 9. Figure 6 The width of the water-oxygen barrier layer 8 and the photoresist layer 9 located outside the first substrate layer 12 is narrower than that of the first substrate layer 12. This allows the top portion of the conductive element 6 to cover the surface of the first substrate layer 12, strengthening the connection stability between the conductive element 6 and the sides of the first conductive substrate layer 1 and the electrochromic layer 2. This ensures the reliability of the electrical connection between the first transparent conductive layer 11 and the second conductive region 312, preventing product failure due to open circuits and greatly improving product yield. During the manufacturing process, the water-oxygen barrier layer 8 and the photoresist layer 9 can be pre-attached at a certain distance from the side of the first substrate layer 12 to provide a certain area of ​​the surface of the first substrate layer 12 for the conductive element 6 to attach; alternatively, the photoresist layer 9 and the water-oxygen barrier layer 8, which are the same width as the first substrate layer 12, can be attached first, and then a small section of the water-oxygen barrier layer 8 and the photoresist layer 9 can be cut off along the side of the first substrate layer 12 to form a shape like... Figure 6 The exposed surface of the first substrate layer 12 is used for the attachment of the conductive element 6.

[0062] In the description of this specification, references to terms such as "some embodiments," "other embodiments," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0063] Furthermore, it should be understood that the terms "upper," "lower," "inner," "outer," "vertical," and "horizontal," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0064] In this invention, unless otherwise explicitly specified and limited, terms such as "connected," "linked," "installed," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meanings of the above terms within this invention according to the specific circumstances.

[0065] Furthermore, features specified as "first" or "second" may explicitly or implicitly include one or more of those features, used to distinguish and describe features, without any order or emphasis. In the description of this invention, unless otherwise stated, "multiple" means two or more.

[0066] The above description is only a preferred embodiment of the present invention. For those skilled in the art, there will be changes in the specific implementation and application scope based on the ideas of the present invention. The content of this specification should not be construed as a limitation of the present invention.

Claims

1. A conductive structure for an electrochromic device, characterized in that, The first conductive substrate layer (1), the electrochromic layer (2), and the second conductive substrate layer (3) are stacked in sequence. The first conductive substrate layer (1) includes a first transparent conductive layer (11) and a first substrate layer (12) stacked in sequence. The first transparent conductive layer (11) is bonded to one side of the electrochromic layer (2). The second conductive substrate layer (3) includes a second transparent conductive layer (31) and a second substrate layer (32) stacked in sequence. The second transparent conductive layer (31) is bonded to the other side of the electrochromic layer (2). A partition groove (4) is formed on the second transparent conductive layer (31) so that the second transparent conductive layer (31) is divided into two independent first conductive regions (311) and second conductive regions (312). At least part of the electrochromic layer (2) corresponding to the second conductive region (312) is removed to form a through-hole (5). A conductive component (6) with conductivity is filled into the through-hole (5). The conductive component (6) is used to electrically connect the first transparent conductive layer (11) and the second conductive region (312). The through-hole (5) is a closed receiving cavity, the entire surface of the peripheral side of the conductive element (6) is adjacent to the electrochromic layer (2), and the top side of the conductive element (6) is covered under the first conductive substrate layer (1); and the conductor (7) is disposed on the surface and / or inside the first transparent conductive layer (11), and the conductor (7) is connected to the conductive element (6).

2. The conductive structure of the electrochromic device as described in claim 1, characterized in that, The surface of the first conductive region (311) at least on the side closest to the partition groove (4) is covered by the electrochromic layer (2).

3. The conductive structure of the electrochromic device as described in claim 1, characterized in that, The electrochromic layer (2) includes an electrochromic material layer, an electrolyte layer and an ion storage layer stacked sequentially.

4. The conductive structure of the electrochromic device as described in claim 1, characterized in that, A water and oxygen barrier layer is provided on the side of the first substrate layer (12) away from the electrochromic layer (2); and / or a water and oxygen barrier layer is provided on the side of the second substrate layer (32) away from the electrochromic layer (2).

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