Vacuum pump pressure reducing device and pressure reducing vacuum pump

Abstract

The present application relates to a kind of vacuum pump pressure reducing device and pressure reducing vacuum pump, and the vacuum pump pressure reducing device is equipped with air inlet passage end, exhaust passage end and pressure reducing cavity, by setting gas acceleration module in pressure reducing cavity, the gas flow rate in gas acceleration area is greater than the gas flow rate in gas inflow area, according to Bernoulli principle (the greater the gas flow rate, the smaller the pressure), by velocity change, the air inlet passage end and exhaust passage end that originally have similar pressure difference are generated, the pressure difference generated in two ends drives the gas flow rate of air inlet passage end to be larger.Thus, the exhaust resistance of air inlet passage end is relieved, the rotation rate of vacuum pump rotor is reduced, thereby preventing the excessive wear of vacuum pump, and prolonging the service life of vacuum pump.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor manufacturing, in particular to a vacuum pump pressure reducing device and a pressure reducing vacuum pump. BACKGROUND

[0002] In recent years, the semiconductor industry has developed rapidly, and the market has put forward higher requirements for the product quality and production efficiency of semiconductors. Therefore, production enterprises must continuously improve and perfect their own production equipment and process level to adapt to new market demands.

[0003] At present, the commonly used technical means for processing semiconductor devices is processing technology such as etching and physical vapor deposition. Since the above-mentioned process has very high requirements for the cleanliness and vacuum degree of the process chamber, it is necessary to use mechanical pumps, molecular pumps and other vacuum pump equipment to reduce the air pressure in the process chamber from atmospheric pressure to a vacuum state.

[0004] According to statistics, more than 90% of vacuum pump replacement is due to the excessive air pressure at the exhaust end of the vacuum pump, which causes the rotor of the main pump to rotate too fast and cause wear or overload. The common preventive maintenance method is to define a fixed time for replacement to reduce the risk, and the replacement of the vacuum pump requires a large amount of manpower, money and machine usage time resources. SUMMARY

[0005] Therefore, it is necessary to provide a vacuum pump pressure reducing device and a pressure reducing vacuum pump to solve the technical problem of excessive air pressure at the exhaust end of the vacuum pump causing the main pump to wear or overload.

[0006] In order to achieve the purpose of the present application, the present application adopts the following technical solutions:

[0007] A vacuum pump pressure reducing device is provided with:

[0008] an air inlet channel end;

[0009] an air outlet channel end;

[0010] a pressure reducing chamber, the pressure reducing chamber is connected to the air inlet channel end and the air outlet channel end, a predetermined air flow path is provided in the pressure reducing chamber, the gas output by the air inlet channel end enters the air outlet channel end along the predetermined air flow path, and the air inlet channel end and the air outlet channel end have a positive pressure difference.

[0011] The technical solutions are further described as follows:

[0012] In one embodiment, a baffle is provided in the pressure reducing chamber; the baffle is used to define the predetermined air flow path and divide the predetermined air flow path into a gas inflow area close to the air inlet channel end and a gas acceleration area close to the air outlet channel end.

[0013] In one of the embodiments, the decompression chamber further comprises a gas acceleration module for controlling the flow speed of the gas in the gas acceleration zone, and the flow speed of the gas in the gas inflow zone is less than the flow speed of the gas in the gas acceleration zone.

[0014] In one of the embodiments, the included angle between the surface of the baffle near one side of the gas acceleration zone and the inner wall of the decompression chamber ranges from 45 degrees to 90 degrees, and the baffle rotates within the included angle range.

[0015] In one of the embodiments, the baffle further divides the predetermined gas flow path into a gas guide zone between the gas inflow zone and the gas acceleration zone for guiding the gas from the gas inflow zone into the gas acceleration zone, and the gas acceleration module does not control the flow speed of the gas in the gas guide zone.

[0016] In one of the embodiments, the gas acceleration module is provided with a valve for controlling the flow speed of the gas in the gas acceleration zone.

[0017] In one of the embodiments, the decompression chamber further comprises a dust collection assembly arranged in the overlapping range of the baffle and the gas inflow zone.

[0018] In one of the embodiments, the outer wall of the decompression chamber is provided with an openable and closable dust discharge port, which is attached to the dust collection assembly for discharging dust from the dust collection assembly.

[0019] In one of the embodiments, the dust discharge port is provided with a transparent mirror.

[0020] The technical solution of the present application further provides a decompression vacuum pump comprising the foregoing vacuum pump decompression device, and the gas inlet channel end of the vacuum pump decompression device is connected with the gas outlet end of the vacuum pump.

[0021] The foregoing vacuum pump decompression device, by arranging the gas acceleration module, makes the flow speed of the gas in the gas acceleration zone greater than the flow speed of the gas in the gas inflow zone, according to Bernoulli's principle (the greater the flow speed of the gas, the smaller the pressure), through the change of speed, makes the gas inlet channel end and the gas outlet channel end, which originally have similar pressure, produce a positive pressure difference, and the pressure difference produced by the two ends drives the flow speed of the gas at the gas inlet channel end to become larger. Thus, the exhaust resistance at the gas inlet channel end is relieved, the rotation rate of the rotor of the vacuum pump is reduced, the excessive wear of the vacuum pump is prevented, and the service life of the vacuum pump is prolonged.

[0022] The vacuum pump decompression device accelerates the gas flow speed at the inlet channel end and reduces the gas pressure at the inlet channel end. As the gas pressure at the exhaust end of the vacuum pump decreases, the exhaust resistance of the vacuum pump also decreases, which reduces the rotation rate of the rotor of the vacuum pump, thereby preventing excessive wear of the vacuum pump and prolonging the service life of the vacuum pump. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 A structural block diagram of the vacuum pump decompression device in one embodiment;

[0024] Figure 2 A sectional structural schematic diagram of the decompression chamber in one embodiment;

[0025] Figure 3 A sectional structural schematic diagram of the decompression chamber in another embodiment;

[0026] Figure 4 A structural schematic diagram of the vacuum pump;

[0027] Figure 5 A main pump pressure schematic diagram of the vacuum pump in a conventional use method;

[0028] Figure 6 A main pump pressure schematic diagram of the vacuum pump connected with the vacuum pump decompression device in one embodiment;

[0029] Figure 7 A structural block diagram of the decompression vacuum pump in one embodiment. DETAILED DESCRIPTION

[0030] In order to facilitate the understanding of the present application, the present application will be described in more detail below with reference to the relevant drawings. The drawings show optional embodiments of the present application. However, the present application can be implemented in many different forms, and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.

[0031] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs. The terms used in the specification of the present application herein are only for the purpose of describing specific embodiments and are not intended to limit the present application.

[0032] Figure 1 A structural block diagram of the vacuum pump decompression device in one embodiment.

[0033] In the present embodiment, the vacuum pump decompression device is provided with an inlet channel end 110, a decompression chamber 120, and an exhaust channel end 130.

[0034] A pressure-reducing chamber 120 is provided, which connects the intake passage end 110 and the exhaust passage end 130. For example... Figure 2 As shown, the pressure relief chamber is provided with a predetermined airflow path 122. The gas output from the intake channel end 110 enters the exhaust channel end 130 along the predetermined airflow path 122, and there is a positive pressure difference between the intake channel end 110 and the exhaust channel end 130.

[0035] The shape of the pressure reducing chamber 120 is not limited; it can be a regular shape such as a sphere, cylinder, or rectangle, or an irregular shape such as a non-circular object. The gas volume of the pressure reducing chamber 120 is matched with the diameter of the inlet channel 110 and the pumping speed of the vacuum pump. In actual use, the appropriate shape and size of the pressure reducing chamber 120 can be selected according to the usage environment and pressure reduction requirements.

[0036] The exhaust passage end 130 is used to connect to the exhaust gas collection device, so that the pressure reducing chamber 120 is connected to the exhaust gas collection device, and the gas in the pressure reducing chamber 120 is discharged. The diameter of the exhaust passage end 130 is similar to the diameter of the intake passage end 110. The exhaust passage end 130 and the exhaust gas collection device are movably connected, specifically, it can be one of the following: threaded connection, snap-fit ​​connection, and riveting.

[0037] exist Figure 2 In the illustrated embodiment, a baffle 121 is provided inside the pressure-reducing chamber 120. The baffle 121 is disposed between the intake channel end 110 and the exhaust channel end 130 to define the predetermined airflow path 122 and divide the predetermined airflow path 122 into a gas inflow area 123 near the intake channel end and a gas acceleration area 124 near the exhaust channel end. The baffle 121 and the inner wall of the pressure-reducing chamber 120 are partially connected and partially spaced, so that the gas inflow area 123 and the gas acceleration area 124 are connected, and gas can flow from the gas inflow area 123 to the gas acceleration area 124 through the connected channel.

[0038] Furthermore, the vacuum pump pressure reducing device 100 also includes a gas acceleration module 140, which is used to control the flow rate of gas in the gas acceleration zone 124, wherein the gas flow rate in the gas inflow zone 123 is less than the gas flow rate in the gas acceleration zone 124.

[0039] When the gas in the gas acceleration zone 124 is subjected to an external force from the gas acceleration module 140, and the gas flow velocity increases, the gas flow velocity and the pressure in the gas acceleration zone 124 will satisfy the following Bernoulli equation:

[0040]

[0041] Therefore, under the premise that the gas density p, the gravity acceleration g and the height h of the cavity remain unchanged, if the gas flow speed v becomes faster, the pressure p in the region will decrease accordingly.

[0042] In the present embodiment, by setting the gas acceleration module 140, the gas flow speed in the gas acceleration zone 123 is greater than the gas flow speed in the gas inflow zone 124. According to Bernoulli's principle (the greater the gas flow speed, the smaller the pressure), a positive pressure difference is generated between the gas inlet channel end 110 and the gas outlet channel end 130, which drives the gas flow speed of the gas inlet channel end 110 to increase. Thus, the exhaust resistance of the gas inlet channel end 110 is relieved, the rotation rate of the rotor of the vacuum pump is reduced, the excessive wear of the vacuum pump is prevented, and the service life of the vacuum pump is prolonged.

[0043] In an embodiment, the material of the baffle 121 can be a metal element such as copper, iron, an alloy such as nickel-copper, or a metal-nonmetal mixture such as stainless steel. In order to achieve better corrosion resistance, a corresponding corrosion-resistant material can be sprayed or electroplated on the inner wall of the pressure reduction cavity 120 and the surface of the baffle 121 according to the acid-base or PH value of the gas to be pumped by the vacuum pump, so as to improve the acid-base corrosion resistance of the inner wall of the pressure reduction cavity 120 and the surface of the baffle 121, and prolong the service life of the vacuum pump pressure reduction device 100.

[0044] In an embodiment, the inside of the baffle 121 can be hollow, meshed or solid. The solid baffle 121 has the best stability, and is not easy to be damaged when the gas flow of the vacuum pump is large and the flow speed is fast. The hollow baffle 121 has the lightest weight, and is suitable for scenes where the flow is small and the vacuum pump and the pressure reduction device need to be moved frequently. The meshed baffle 121 can adjust the corresponding characteristics between the above two structures by adjusting the density of the meshed structure. The operator can select the baffle 121 of the corresponding structure according to the actual use scene, so that the vacuum pump pressure reduction device 100 has better scene compatibility.

[0045] In the present embodiment, the baffle 121 and the inner wall of the pressure reduction cavity 120 are fixedly connected.

[0046] In an embodiment, if the baffle 121 and the pressure reduction cavity 120 are made of the same material, they can be made by one-time casting. The operation process of casting is relatively simple, and the time and money cost are also relatively low. If the baffle 121 and the pressure reduction cavity 120 are made of different materials, the two components can be connected by resistance spot welding, electric arc welding and other welding methods after being processed respectively. By selecting different manufacturing methods, the material selection of the baffle 121 and the pressure reduction cavity 120 can have higher flexibility.

[0047] In Figure 3In the shown embodiment, the baffle 121 is movably connected to the inner wall of the decompression cavity 120. Through the movable connection structure, the working position of the baffle 121 can be adjusted to adapt to different use requirements.

[0048] In the embodiment, one end of the baffle 121 is rotatably connected to the inner wall of the decompression cavity 120 through the hinge structure 126, and the other end of the baffle 121 away from the hinge structure 126 is provided with a locking piece 127. The baffle 121 is locked at the set working position through the locking piece 127. One end of the locking piece 127 is connected to the baffle 121, and the other end abuts against the inner wall of the decompression cavity 120. When the vacuum pump decompression device 100 is working, the locking piece 127 makes the baffle 121 not shake at the set position, thereby ensuring the stable operation of the vacuum pump decompression device 100.

[0049] In one embodiment, recesses or convex points are arranged on the inner wall of the decompression cavity 120. When the baffle 121 is at different working positions, the locking piece 127 can abut against the corresponding recess or convex point to avoid relative sliding between the locking piece 127 and the inner wall of the decompression cavity 120, thereby further improving the stability of the baffle 121.

[0050] In one embodiment, the material of the locking piece 127 can be a metal element such as copper or iron, an alloy such as nickel-copper, or a metal-nonmetal mixture such as stainless steel. According to different gas flow rates of the vacuum pump, a material with appropriate hardness is selected to prevent the locking piece 127 from being bent when the vacuum pump decompression device 100 is working.

[0051] In one embodiment, the included angle θ between the side of the baffle 121 close to the gas acceleration area 124 and the inner wall of the decompression cavity 120 ranges from 45° to 90°, and the baffle 121 rotates within the included angle range. If the included angle between the baffle 121 and the inner wall of the decompression cavity 120 is too small, the baffle 121 cannot effectively divide the decompression cavity 120 into the gas inflow area 123 and the gas acceleration area 124, that is, the gas flow rate in the acceleration gas acceleration area 124 cannot be increased to reduce the pressure between the gas inlet channel end 110 and the exhaust end of the vacuum pump.

[0052] In one embodiment, the side of the baffle 121 close to the gas inflow area 123 is an arc surface. If there are foreign matters inside the inflowing gas, the arc surface prevents the foreign matters carried inside the gas from splashing upward along the baffle 121 when the gas reaches the baffle 121 through the gas inlet channel end 110, thereby preventing the foreign matters from reaching and blocking the output port of the gas acceleration module 140 and ensuring the normal operation of the vacuum pump decompression device 100.

[0053] In one embodiment, the baffle 121 further divides the predetermined gas flow path 122 into a gas guiding region 125, which is located between the gas inflow region 123 and the gas acceleration region 124, for guiding the gas from the gas inflow region 123 into the gas acceleration region 124, and the gas acceleration module does not control the flow rate of the gas in the gas guiding region 125.

[0054] In Figure 3 In the illustrated embodiment, the gas acceleration module 140 includes a gas delivery pipe 141, which is in communication with the gas acceleration region 124, and the gas outflow direction of the gas delivery pipe 141 is the same as the gas flow direction in the gas acceleration region 124. If the gas outflow direction of the gas delivery pipe 141 is opposite to or has a certain angle with the gas flow direction in the gas acceleration region 124, the gas in the gas acceleration region 124 cannot be accelerated most effectively, resulting in waste of the gas outflowing from the gas delivery pipe 141. It should be noted that the specific position of the gas delivery pipe 141 is not required to be limited in the present embodiment, as long as the gas delivery pipe 141 can meet the above requirement of the gas outflow direction.

[0055] In one embodiment, the gas outflow speed of the gas delivery pipe 141 is not less than 50 pound-force per square inch. When the gas outflow speed meets this requirement, the vacuum pump deceleration device can make the pressure at the gas inlet end 110 reach a vacuum state under the premise of consuming less gas, and the gas pressure at the exhaust end of the vacuum pump can also be reduced from 760 torr when the vacuum pump deceleration device is not installed to 130 torr, i.e., from a standard atmospheric pressure state to a near-vacuum state. Figure 4 is a structural schematic diagram of a vacuum pump, which includes a booster pump and a main pump. The main pump and the booster pump work together to achieve the required compression ratio and the required pumping speed, and reduce the power requirement. Specifically, the gas in the cavity to be vacuumized is sucked into the booster pump from the gas inlet end of the vacuum pump, is continuously pressurized by the rotors driven by the main pump motor, and is finally discharged through the exhaust end of the vacuum pump.

[0056] As Figure 5As shown, the conventional use of the vacuum pump is to directly discharge the extracted gas to the atmospheric environment, and the gas pressure of the atmospheric environment is 760 Torr. The exhaust resistance of the exhaust end of the vacuum pump is extremely large. In order to facilitate the discharge of the gas, the gas pressure in the main pump needs to be increased from 0.06 Torr at the first rotor (R1) to 130 Torr at the fifth rotor (R5). The main pump increases the pressure by increasing the rotation speed of each rotor. The high rotation speed of each rotor increases the working temperature of the main pump and increases the loss. In the embodiment, the extracted gas is discharged into the vacuum pump pressure reducing device. Based on the special mechanical structure of the vacuum pump pressure reducing device, the gas pressure at the exhaust end of the vacuum pump can be reduced to 130 Torr. The exhaust resistance of the exhaust end of the vacuum pump is significantly reduced. The gas pressure and rotation speed required by each rotor are also reduced accordingly. Specifically, as shown in the figure, the gas pressure at the fifth rotor (R5) can be reduced from 130 Torr when the vacuum pump pressure reducing device is not connected to 20 Torr, thereby achieving the effect of reducing the loss of the vacuum pump. Figure 6

[0057] In an embodiment, the gas output by the gas supply pipe 141 is inert gas, which is used to accelerate the flow speed of the gas in the gas acceleration zone 124. Optionally, the inert gas can be one of nitrogen, argon, helium, neon, etc.

[0058] In an embodiment, the gas supply pipe 141 is provided with a valve 142 for controlling the gas outflow speed of the gas supply pipe 141. According to the Bernoulli equation, the flow speed of the gas is inversely related to the pressure in the region, that is, the greater the flow speed of the gas, the smaller the pressure in the region. When the pressure difference between the gas acceleration zone 124 and the gas inflow zone 123 changes, the spontaneous flow of the gas in the gas inflow zone 123 into the gas acceleration zone 124 will also change, and the pressure change of the gas inflow zone 123 will also be different. Therefore, the pressure of the gas inflow zone 123 can be adjusted by adjusting the gas outflow speed of the gas supply pipe 141.

[0059] In the embodiment, when the gas outflow speed of the gas supply pipe 141 is greater than the flow speed of the gas inflow zone 123, the pressure of the gas inflow zone 123 can be reduced. When the vacuum degree of the exhaust end of the vacuum pump is low, the gas outflow speed of the gas supply pipe 141 can be slowed down by adjusting the valve 142 to reduce the gas consumption. When the pumping speed of the vacuum pump is fast, the gas outflow speed of the gas supply pipe 141 can be increased to match the flow speed of the gas in the gas inflow zone 123 and the gas acceleration zone 124, thereby further reducing the pressure of the gas inflow zone 123.

[0060] ​In one embodiment, the valve 142 can be an electric or pneumatic ball valve or butterfly valve. The pneumatic valve is sensitive and safe and reliable, but needs to be used with a gas source; for the occasion that it is inconvenient to install a gas source; the electric valve only needs the support of the power supply, and the control system is also relatively simple. Selecting different valves 142 for different scenarios can improve the compatibility of the vacuum pump pressure relief device 100 for different situations.

[0061] In one embodiment, the pressure relief chamber 120 is also provided with a dust collection area, which can be a section of the pressure relief chamber wall with an inclined angle design corresponding to the overlapping area of the baffle 121 and the gas inflow area 123, or a dust collection assembly 151 arranged in the overlapping range of the baffle 121 and the gas inflow area 123.

[0062] In one embodiment, the pressure relief chamber 120 is provided with an openable and closable dust discharge port 152, which is attached to the dust collection assembly 151 for dust discharge of the dust collection assembly 151. In this embodiment, the dust collection assembly 151 is provided with an opening near the side of the dust discharge port 152, so that the foreign matter in the dust collection assembly 151 can be effectively discharged, thereby avoiding the accumulation of foreign matter in the dust collection assembly 151. By providing the dust discharge port 152, the vacuum pump pressure relief device 100 can be well applied to the chamber in which the gas in the pressure relief chamber 120 contains solid foreign matter, especially to the case where the solid foreign matter is non-sublimation solid.

[0063] In one embodiment, the dust discharge port is provided with a transparent mirror 153. The material of the transparent mirror 153 can be one of plastic, glass, acrylic or sapphire. A protective layer can be provided on the surface of the transparent mirror 153 by one of sintering, spraying and other processes, and the material of the protective layer can be one of polyester film, glass glaze and the like. By providing a protective layer on the surface of the transparent mirror 153, the wear resistance and acid and alkali resistance of the transparent mirror 153 can be improved, and the corrosion of the transparent mirror 153 caused by the solid foreign matter or acid and alkali gas in the pressure relief chamber 120 can be effectively prevented.

[0064] In one embodiment, the size of the transparent mirror 153 matches the size of the dust discharge port 152, i.e. the dust discharge port 152 can be blocked by the transparent mirror 153. By blocking the dust discharge port 152, the inflow of gas through the dust discharge port 152 is avoided, and the gas environment in the pressure relief chamber 120 is prevented from being destroyed; it can also avoid that the foreign matter is discharged through the dust discharge port 152 in the case that the operator does not know, causing environmental pollution outside the pressure relief chamber 120 or the splashing of foreign matter to the operator.

[0065] In one embodiment, the transparent mirror 153 is movably connected to the outer wall of the pressure-reducing chamber 120. The relative movement between the transparent mirror 153 and the outer wall of the pressure-reducing chamber 120 exposes the dust discharge port 152, thereby discharging foreign objects from the pressure-reducing chamber 120. Alternatively, the transparent mirror 153 can be movably connected to the outer wall of the pressure-reducing chamber 120 via a roller, allowing it to rotate up and down around the roller. When foreign objects need to be discharged, the transparent mirror 153 is flipped upwards to expose the dust discharge port 152; when foreign objects do not need to be discharged, the transparent mirror 153 is flipped downwards to cover the discharge port. The transparent mirror 153 can also be movably connected to the outer wall of the pressure-reducing chamber 120 via a slot, where a slot of similar size to the transparent mirror 153 is provided on the outer wall of the pressure-reducing chamber 120. When foreign objects need to be discharged, the transparent mirror 153 is pulled out of the slot to expose the dust discharge port 152; when foreign objects do not need to be discharged, the transparent mirror 153 is inserted into the slot to cover the discharge port.

[0066] In this embodiment, the transparent mirror 153 is also used to observe the foreign matter deposition inside the dust collection assembly 151. Operators can observe the interior of the dust collection assembly 151 through the transparent mirror 153 to easily determine whether the amount of foreign matter deposited inside the dust collection assembly 151 exceeds a threshold, and promptly discharge the foreign matter from the dust collection assembly 151 through the dust discharge port 152. Furthermore, a foreign matter deposition line can be set on the transparent mirror 153 as a threshold indicator. When the amount of foreign matter deposition is below the foreign matter deposition line, it is not necessary to discharge the foreign matter. When the amount of foreign matter deposition is above the foreign matter deposition line, the transparent mirror 153 needs to be opened promptly to prevent the accumulation of foreign matter inside the dust collection assembly 151.

[0067] In one embodiment, the vacuum pump pressure reducing device 100 further includes a dust collection bin 154 for receiving foreign matter discharged through the dust discharge port 152. The shape of the dust collection bin 154 is not limited; it can be a regular shape such as a cylinder or rectangle, or an irregular shape such as an irregular shape. The size of the dust collection bin 154 can be adjusted accordingly based on the size of the pressure reducing chamber 120 and the pumping capacity of the vacuum pump.

[0068] In one embodiment, in order to prevent foreign objects from corroding the dust collection bin 154, the dust collection bin 154 can be manufactured with a corresponding anti-corrosion material according to the processing material and process of the vacuum pump connected to the vacuum pump pressure reducing device 100, or the dust collection bin 154 can be sprayed or electroplated with a corresponding anti-corrosion material, thereby effectively preventing the dust collection bin 154 from being corroded and damaged, resulting in leakage of foreign objects.

[0069] exist Figure 7 In the illustrated embodiment, a vacuum pump with reduced pressure is also provided, including a vacuum pump pressure reducing device 100 and a vacuum pump 200 as described above, wherein the inlet end 110 of the vacuum pump pressure reducing device 100 is connected to the exhaust end of the vacuum pump 200.

[0070] The above-mentioned vacuum pump reduces the gas pressure of the exhaust end of the vacuum pump 200 through the vacuum pump pressure reducing device 100. As the gas pressure of the exhaust end of the vacuum pump 200 is reduced, the exhaust resistance of the vacuum pump 200 is also reduced, which reduces the rotation rate of the rotor of the vacuum pump 200, thereby preventing excessive wear of the vacuum pump 200 and prolonging the service life of the vacuum pump 200. At the same time, by reducing the rotation rate of the rotor, the vacuum pump of the present embodiment can save 30% to 70% of the power consumption and 50% of the cooling water consumption.

[0071] The technical features of the above-mentioned embodiments can be combined in any way. In order to make the description simple, all possible combinations of the technical features in the above-mentioned embodiments are not described, but as long as the combinations of the technical features do not contradict, they should be considered as within the scope of the present disclosure.

[0072] The above-mentioned embodiments only express several embodiments of the present application, and the description is more specific and detailed, but it should not be understood as a limitation on the scope of the patent. It should be pointed out that for ordinary skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are within the scope of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.

Claims

1. A vacuum pump pressure reducing device, characterized in that, The vacuum pump pressure reducing device is equipped with: Intake channel end; Exhaust passage end; A pressure-reducing chamber is provided, which connects the intake channel end and the exhaust channel end. A predetermined airflow path is provided in the pressure-reducing chamber. The gas output from the intake channel end enters the exhaust channel end along the predetermined airflow path, and there is a positive pressure difference between the intake channel end and the exhaust channel end. The pressure-reducing chamber is equipped with a baffle, which is used to limit the predetermined airflow path and divide the predetermined airflow path into a gas inflow area near the end of the air inlet channel and a gas acceleration area near the end of the exhaust channel. The angle between the side of the baffle near the gas acceleration area and the inner wall of the pressure-reducing chamber is in the range of 45° to 90°. The side of the baffle near the gas inflow area is an arc surface. The baffle can rotate within the included angle range. The decompression chamber also includes a gas acceleration module, which is used to control the flow rate of gas in the gas acceleration zone. The gas flow rate in the gas inflow zone is less than the gas flow rate in the gas acceleration zone. The baffle also divides the predetermined airflow path into a gas guiding zone, which is located between the gas inflow zone and the gas acceleration zone. It is used to guide gas from the gas inflow zone into the gas acceleration zone, and the gas acceleration module does not control the flow rate of the gas in the gas guiding zone. The pressure reducing chamber also includes a dust collection assembly, which is disposed within the area where the baffle overlaps with the gas inflow area and the gas guiding area.

2. The vacuum pump pressure reducing device according to claim 1, characterized in that, The gas acceleration module is equipped with a valve to control the flow rate of gas within the gas acceleration zone.

3. The vacuum pump pressure reducing device according to claim 1, characterized in that, The outer wall of the pressure relief chamber is provided with an openable and closable dust discharge port, which is attached to the dust collection component for dust discharge by the dust collection component.

4. The vacuum pump pressure reducing device according to claim 3, characterized in that, The dust outlet is equipped with a transparent mirror.

5. A pressure-reducing vacuum pump, characterized in that, The vacuum pump pressure reducing device includes the vacuum pump pressure reducing device according to any one of claims 1-4, wherein the inlet end of the vacuum pump pressure reducing device is connected to the exhaust end of the vacuum pump.

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