For measurement of the main body of gas discharge station

Abstract

A light source device includes a gas discharge table, comprising: a three-dimensional body, the three-dimensional body defining a cavity, the cavity being configured to interact with an energy source, the body including at least two ports, the at least two ports being capable of transmitting a light beam having a wavelength in the ultraviolet range; a sensor system including a plurality of sensors, each sensor being configured to measure a physical aspect of a corresponding different region of the body of the gas discharge table relative to the sensor; and a control device in communication with the sensor system. The control device is configured to analyze the physical aspects measured from the sensors to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis, wherein the X-axis is defined by the geometry of the gas discharge table.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to U.S. Application No. 62 / 730,428, filed on September 12, 2018, entitled “MEASUREMENTS OF BODIES FOR GAS DISCHARGE STATIONS,” the entire contents of which are incorporated herein by reference. Technical Field

[0003] The disclosed subject matter relates to controlling the position or alignment of a body of a gas discharge table to improve the performance of the gas discharge table. Background Art

[0004] In semiconductor lithography (or optical lithography), the manufacture of integrated circuits (ICs) requires various physical and chemical processes performed on semiconductor (e.g., silicon) substrates (also known as wafers). A lithographic exposure apparatus (also known as a scanner) is a machine that applies a desired pattern to a target area of ​​a substrate. The substrate is fixed to a stage so that the substrate is typically moved along the orthogonal X-axis of the scanner. L Direction and Y L The substrate is irradiated with a light beam having a wavelength in the ultraviolet range, somewhere between visible light and x-rays, and thus between about 10 nanometers (nm) and about 400 nm. Thus, the wavelength of the light beam may, for example, be in the deep ultraviolet (DUV) range, where the wavelength may drop from about 100 nm to about 400 nm, or in the extreme ultraviolet (EUV) range, where the wavelength is between about 10 nm and about 100 nm. These wavelength ranges are not precise, and there may be overlap between whether the light is considered DUV or EUV.

[0005] The beam is along the Z direction of the scanner. L The direction corresponds to the axial direction of travel. L Direction and image plane (X L -Y L ) orthogonal. The beam passes through a beam delivery unit, is filtered by a reticle (or mask), and then projected onto the prepared substrate. The relative position between the substrate and the beam is moved in the image plane, and the process is repeated at each target area of ​​the substrate. In this way, the chip design is patterned onto the photoresist, which is then etched and cleaned, and the process is repeated. Summary of the Invention

[0006] In some general aspects, a light source apparatus includes: a gas discharge table including a three-dimensional body defining a cavity configured to interact with an energy source, the body including at least two ports that transmit a light beam having a wavelength in the ultraviolet range; a sensor system including a plurality of sensors, each sensor configured to measure a physical aspect of a corresponding different region of the body of the gas discharge table relative to the sensor; and a control device in communication with the sensor system. The control device is configured to analyze the physical aspects measured from the sensors to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis, where the X-axis is defined by a geometric shape of the gas discharge table.

[0007] Various implementations may include one or more of the following features. For example, the light source apparatus may further include a measurement system configured to measure one or more performance parameters of a light beam generated from the gas discharge table. The control device may communicate with the measurement system. The control device may be configured to analyze the position of the body of the gas discharge table in an XYZ coordinate system and one or more measured performance parameters of the light beam; and determine whether modifying the position of the body of the gas discharge table will improve one or more of the measured performance parameters. The light source apparatus may include an actuation system physically coupled to the body of the gas discharge table and configured to adjust the position of the body of the gas discharge table. The control device may communicate with the actuation system. The control device may be configured to provide a signal to the actuation system based on the determination of whether the position of the body of the gas discharge table should be modified. The actuation system may include a plurality of actuators, each actuator configured to be in physical communication with a region of the body of the gas discharge table. Each actuator may include one or more of the following: an electromechanical device, a servomechanism, an electric servomechanism, a hydraulic servomechanism, and / or a pneumatic servomechanism.

[0008] The control device may be configured to determine the position of the main body of the gas discharge table in the XYZ coordinate system by determining a translation of the main body of the gas discharge table about the X axis or a rotation of the main body of the gas discharge table about the X axis. The translation of the main body of the gas discharge table about the X axis may include one or more of the following: a translation of the main body of the gas discharge table along the X axis, a translation of the main body of the gas discharge table along a Y axis perpendicular to the X axis, and / or a translation of the main body of the gas discharge table along a Z axis perpendicular to the X axis and the Y axis. The rotation of the main body of the gas discharge table about the X axis may include one or more of the following: a rotation of the main body of the gas discharge table about the X axis, a rotation of the main body of the gas discharge table about the Y axis perpendicular to the X axis, and / or a rotation of the main body of the gas discharge table about the Z axis perpendicular to the X axis and the Y axis.

[0009] Each sensor may be configured to measure a distance from the sensor to the body of the gas discharge table as a physical aspect of the body of the gas discharge table relative to the sensor.

[0010] The gas discharge table may include a beam steering device located at a first end of the body and a beam coupler located at a second end of the body, the beam steering device and the beam coupler intersecting the X-axis such that a light beam generated in the gas discharge table interacts with the beam coupler and the beam steering device. When the body of the gas discharge table is within an acceptable position range, an energy source may supply energy to the cavity of the body, and the beam steering device and the beam coupler may be aligned to generate a light beam. The light beam may be an amplified light beam having a wavelength in the ultraviolet range. The beam steering device may be an optical module including a plurality of optical devices for selecting and adjusting the wavelength of the light beam, and the beam coupler may include a partially reflective mirror. The beam steering device may include an optical device arrangement configured to receive a light beam that exits the body of the gas discharge table through a first port and redirect the light beam so that the light beam re-enters the body of the gas discharge table through the first port. The gas discharge table may also include a beam expander configured to interact with the light beam as it travels between the beam coupler and the cavity.

[0011] Each sensor may be configured to be fixedly mounted relative to the body of the gas discharge station. When each sensor is fixedly mounted relative to the body of the gas discharge station, each sensor may be configured to be fixed at a distance from another sensor.

[0012] The light source apparatus may further include: a second gas discharge stage optically connected in series with the gas discharge stage; and a second plurality of sensors. The second gas discharge stage includes a second three-dimensional body defining a second cavity configured to interact with the energy source, the second body including at least two ports that transmit a light beam having a wavelength in the ultraviolet range. Each sensor in the second plurality of sensors may be configured to measure a physical aspect of a corresponding different region of the second body relative to the sensor. The control device may be in communication with the second plurality of sensors and may be configured to analyze the physical aspects measured from the second plurality of sensors to determine a position of the second body relative to a second XYZ coordinate system defined by a second X-axis that passes through the at least two ports of the second body.

[0013] Each sensor may include a displacement sensor. The displacement sensor may be an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor, and / or an ultrasonic displacement sensor. Each sensor may include a non-contact sensor.

[0014] The X-axis may be defined by a beam steering device located at the first end of the body and optically coupled to the first port, and a beam coupler located at the second end of the body and optically coupled to the second port.

[0015] In other general aspects, a metrology apparatus includes: a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a body of a gas discharge table relative to the sensor; a measurement system configured to measure one or more performance parameters of a light beam generated from the gas discharge table; an actuation system comprising a plurality of actuators, each actuator configured to physically couple to a different region of the body of the gas discharge table, the plurality of actuators working together to adjust a position of the body of the gas discharge table; and a control device in communication with the sensor system, the measurement system, and the actuation system. The control device is configured to: analyze the physical aspects measured from the sensors to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis defined by the gas discharge table; analyze the position of the body of the gas discharge table; analyze one or more measured performance parameters; and provide a signal to the actuation system to modify the position of the body of the gas discharge table based on the analysis of the position of the body of the gas discharge table and the one or more measured performance parameters.

[0016] Implementations can include one or more of the following features: For example, the sensors can be separate from each other and positioned relative to the body of the gas discharge station.

[0017] The control device can be configured to provide a signal to the actuation system to modify the position of the body of the gas discharge table based on an analysis of the position of the body of the gas discharge table and one or more measured performance parameters, by determining the position of the body of the gas discharge table that optimizes multiple performance parameters of the light beam.

[0018] The X-axis may be defined by a beam steering device located at the first end of the body and optically coupled to the first port, and a beam coupler located at the second end of the body and optically coupled to the second port.

[0019] In other general aspects, a method includes: measuring a physical aspect of a body of a gas discharge table of a light source at each of a plurality of different regions of the body at the region; measuring one or more performance parameters of a light beam generated from the gas discharge table; analyzing the measured physical aspect to determine a position of the body in an XYZ coordinate system defined by an X-axis, wherein the X-axis is defined by a plurality of apertures associated with the gas discharge table; analyzing the determined position of the body of the gas discharge table; analyzing one or more measured performance parameters; determining whether a modification to the position of the body of the gas discharge table will improve one or more measured performance parameters; and modifying the position of the body of the gas discharge table if it is determined that a modification to the position of the body of the gas discharge table will improve one or more measured performance parameters.

[0020] Implementations can include one or more of the following features: For example, the position of the body of the gas discharge table can be modified based on an analysis of the determined position of the body of the gas discharge table.

[0021] The position of the body of the gas discharge table can be determined by determining one or more of the following: translation of the body of the gas discharge table from the X-axis and / or rotation of the body of the gas discharge table from the X-axis. The body of the gas discharge table can be translated from or along the X-axis by one or more of the following: translation of the body of the gas discharge table along the X-axis, translation of the body of the gas discharge table along a Y-axis perpendicular to the Y-axis, and / or translation of the body of the gas discharge table along a Z-axis perpendicular to the X-axis and the Y-axis. The body of the gas discharge table can be rotated from or about the X-axis by one or more of the following: rotation of the body of the gas discharge table about the X-axis, rotation of the body of the gas discharge table about a Y-axis perpendicular to the X-axis, and / or rotation of the body of the gas discharge table along a Z-axis perpendicular to the X-axis and the Y-axis.

[0022] Physical aspects of the body can be measured by measuring the distance from a sensor to an area of ​​the body of the gas discharge table.

[0023] Determining whether a modification to the position of the body of the gas discharge table will improve one or more of the measured performance parameters may include determining a position of the body of the gas discharge table that optimizes a plurality of the measured performance parameters.

[0024] The method may also include generating an optical beam from the gas discharge stage, comprising forming a resonator defined by a beam coupler located on one side of the body and a beam steering device located on another side of the body, the beam coupler and the beam steering device defining an X-axis and generating energy within a gain medium in a cavity defined by the body.

[0025] One or more performance parameters of the light beam can be measured by measuring multiple performance parameters. The multiple performance parameters can be measured by measuring two or more of the following: a repetition rate of the pulsed light beam generated by the light source, an energy of the pulsed light beam, a duty cycle of the pulsed light beam, and / or a spectral characteristic of the pulsed light beam. The method may further include: determining an optimal position of the body of the gas discharge table that provides an optimal set of performance parameter values ​​for the light beam; and modifying the position of the body of the gas discharge table to the optimal position.

[0026] In other general aspects, a metrology kit includes: a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a three-dimensional body relative to the sensor; a measurement system comprising a plurality of measurement devices, each measurement device configured to measure a performance parameter of a light beam; an actuation system comprising a plurality of actuators configured to be physically coupled to the three-dimensional body; and a control device configured to communicate with the sensor system, the measurement system, and the actuation system. The control device includes: a sensor processing module configured to interface with the sensor system and receive sensor information from the sensor system; a measurement processing module configured to interface with the measurement system and receive measurement information from the measurement system; an actuator processing module configured to interface with the actuation system; and a light source processing module configured to interface with a gas discharge stage having a three-dimensional body.

[0027] Various implementations may include one or more of the following features. For example, the control device may include an analysis and processing module that communicates with the sensor processing module, the measurement processing module, the actuator processing module, and the light source processing module. The analysis and processing module may be configured to, when in use, instruct the light source processing module to adjust one or more characteristics of the gas discharge stage, and to analyze sensor information and measurement information based on the adjusted characteristics of the gas discharge stage and determine instructions for the actuator processing module.

[0028] The metrology kit may be modular such that it is configured to be operatively connected and disconnected with one or more gas discharge stations, each gas discharge station comprising a respective three-dimensional body defining a cavity that generates a respective light beam. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 is a block diagram of an apparatus configured to determine a position of a three-dimensional body in an XYZ coordinate system of a gas discharge table, the apparatus including a sensor system;

[0030] Figure 2A yes Figure 1 A perspective view of the device;

[0031] Figure 2B Is from Figure 2A A perspective view of a body of the device, wherein the longitudinal axis of the body is aligned with the X-axis of the XYZ coordinate system;

[0032] Figure 3A Is from Figure 2A a perspective view of a body of the device, wherein a longitudinal axis of the body is misaligned with an X-axis of the XYZ coordinate system by rotation of the body about the Y-axis of the XYZ coordinate system;

[0033] Figure 3B Is from Figure 2A a perspective view of a body of the device, wherein a longitudinal axis of the body is misaligned with an X-axis of the XYZ coordinate system by rotation of the body about a Z-axis of the XYZ coordinate system;

[0034] Figure 3C Is from Figure 2A a perspective view of a body of the device, wherein a longitudinal axis of the body is misaligned with the X-axis of the XYZ coordinate system by rotation of the body about the X-axis of the XYZ coordinate system;

[0035] Figure 3D Is from Figure 2A a perspective view of a body of the apparatus, wherein a longitudinal axis of the body is misaligned with an X-axis of the XYZ coordinate system by translation of the body along the Y-axis of the XYZ coordinate system;

[0036] Figure 3E Is from Figure 2A a perspective view of a body of the apparatus, wherein a longitudinal axis of the body is misaligned with an X-axis of the XYZ coordinate system by translation of the body along the Z-axis of the XYZ coordinate system;

[0037] Figure 3F Is from Figure 2A a perspective view of a body of the apparatus, wherein a longitudinal axis of the body is misaligned with the X-axis of the XYZ coordinate system by translation of the body along the X-axis of the XYZ coordinate system;

[0038] Figure 4 yes Figures 1 to 2B A perspective view of the body and device showing the implementation of the sensor system and the control device;

[0039] Figure 5 It is along Figure 4 A side sectional view of the body and the device taken along the YZ plane;

[0040] Figure 6 is a plan view of the XY plane, which shows the body and Figures 1 to 2A An example of how a sensor system of a device measures a position of a body;

[0041] Figure 7 is a perspective view of an apparatus configured to measure the position of a body, the apparatus being Figure 2A The design is similar, except Figure 7 The apparatus further includes an actuation system configured to adjust the position of the body relative to the X-axis of the XYZ coordinate system (thereby adjusting the longitudinal direction of the body);

[0042] Figure 8 yes Figure 7A perspective view of the body and device of FIG, which shows the implementation of the sensor system, the control device and the actuation system;

[0043] Figure 9 is a perspective view of an apparatus configured to measure the position of a body and adjust the position of the body, the apparatus being Figure 7 The design is similar, except Figure 9 The apparatus also includes a measurement system configured to measure or monitor the performance or performance characteristics of the gas discharge station;

[0044] Figure 10 yes Figure 9 A perspective view of the body and device of the invention, which shows the implementation of the sensor system, the control device, the actuation system and the measurement system;

[0045] Figure 11 is a diagram illustrating an implementation of an alignment feedback control process in which the optimum energy of a light beam output from a gas discharge stage is determined as the position of the body is rotated about the Z axis and translated along the Y axis;

[0046] Figure 12 is a block diagram of a dual-stage light source comprising two gas discharge stages, wherein one or both of the gas discharge stages may include Figure 2A 、 Figure 7 or Figure 9 device;

[0047] Figure 13 This is a block diagram of the measurement suite, which consists of Figure 9 components of the device;

[0048] Figure 14 yes Figure 1 、 Figure 2A 、 Figure 7 or Figure 9 a flowchart of a program executed by a device; and

[0049] Figure 15 is included Figure 1 、 Figure 2A 、 Figure 7 or Figure 9 Block diagram of a light source of the device. DETAILED DESCRIPTION

[0050] refer to Figure 1 and Figure 2A, apparatus 100 is designed to determine the position of a three-dimensional body 102 in an XYZ coordinate system 104 relative to an X-axis 106 of the coordinate system 104. Body 102 is a portion of a gas discharge station 108 configured to generate a light beam 110 having a wavelength in the ultraviolet range. Body 102 defines a cavity 112 configured to interact with an energy source 114, which may include a pair of electrodes. As discussed in more detail below, energy source 114 may be secured to body 102.

[0051] The gas discharge stage 108 includes a body 102 and other optical components (such as components 140, 142) for generating the light beam 110. The gas discharge stage 108 may include Figure 1 and Figure 2A Other components not shown in the figure. The gas discharge station 108 is Figure 2A The rectangular parallelepiped shown in FIG. 1 does not necessarily correspond to a physical wall and is shown in this manner to indicate that it may include other components not shown. The gas discharge table 108 may simply correspond to a platform on which all optical components (including the body 102) are placed. The light beam 110 output from the gas discharge table 108 may be used in a photolithography exposure apparatus (as described below with reference to FIG. Figure 15 The substrate W may be patterned using an apparatus such as that discussed above, or it may be processed before use in the apparatus.

[0052] The body 102 is movable relative to components of the gas discharge table 108. During operation, the position of the body 102 in the XYZ coordinate system 104 may change due to factors external to the body 102. For example, pressure and temperature changes within the gas discharge table 108 may cause the body 102 to move in the XYZ coordinate system 104. Another cause of misalignment is internal changes within the body 102 that cause the alignment to change. For example, this may occur as the electrodes of the energy source 114 age and change shape during their use. Additionally, wear on the electrodes and geometric modifications to the electrodes of the energy source 114 are one reason why the body 102 must be replaced with a new body. Moreover, when the body 102 is replaced with a new body 102, the body 102 becomes misaligned. In this case, the new body 102 needs to be properly aligned with the X-axis 106.

[0053] exist Figure 1 and Figure 2A In the example of FIG, the body 102 is aligned with the X-axis 106. The alignment between the body 102 and the X-axis 106 can be determined based on the degree to which the longitudinal axis Ab of the body 102 is aligned with the X-axis 106. Figure 2B1. The longitudinal axis Ab of the body 102 is shown in FIG. The longitudinal axis Ab can be defined as the axis that intersects two ports 118, 120 located at the ends of the body 102. The ports 118, 120 can transmit a light beam 122 having a wavelength in the ultraviolet range (which will form the light beam 110).

[0054] refer to Figures 3A to 3F , the body 102 of the gas discharge table 108 may be misaligned relative to the X-axis 106 in one or more ways. For example, Figure 3A In , the body 102 is rotated out of alignment about the Y axis and its longitudinal axis Ab is not aligned with the X axis 106. Figure 3B In , the body 102 is rotated about the Z axis into misalignment and its longitudinal axis Ab is not aligned with the X axis 106. Figure 3C In this case, the body 102 is rotated about the X axis into misalignment. In this case, the longitudinal axis Ab is offset along the X axis 106. If the body 102 is configured to rest on a platform, it is lifted by gravity and the plane of the earth is the XY plane. In this case, a typical misalignment is Figure 3B The misalignment shown is where the body 102 is rotated about the Z axis into misalignment.

[0055] exist Figure 3D In , the body 102 is translated into misalignment along the Y axis, and the longitudinal axis Ab is offset from the X axis 106 along the Y axis. Figure 3E In , the body 102 is translated into misalignment along the Z axis, and the longitudinal axis Ab is offset from the X axis 106 along the Z axis. And in Figure 3F In FIG, the body 102 is translated into misalignment along the X-axis 106, and the longitudinal axis Ab is offset along the X-axis 106. If the body 102 is configured to rest on a platform and be lifted by gravity, and the plane of the earth is the XY plane, a common misalignment that has a relatively large impact on the efficiency of the gas discharge table 108 is Figure 3D The misalignment is shown where the body 102 is translated along the Y-axis.

[0056] The body 102 can be misaligned in more than one manner, and thus it can both translate and rotate, can translate along more than one axis, or can rotate about more than one axis.

[0057] Certain misalignments with the body 102 may have different effects on the efficiency and operation of the gas discharge stage 108. Moreover, modifications to some adjustments may be easier to make or more feasible. For example, alignment along the Y axis ( Figure 3D ) and translation around the Z axis ( Figure 3B) and thus, their impact on the efficiency and operation of the gas discharge stage 108 can be tracked. Thus, in this example, the apparatus 100 determines the translation of the body 102 along the Y axis and determines the rotation value (angle) of the body 102 about the Z axis. The apparatus 100 can also determine the translation value of the body 102 along one or both of the other two axes and the rotation value about one or both of the other two axes.

[0058] The position of body 102 or misalignment of body 102 relative to X-axis 106 has an impact on the efficiency of gas discharge stage 108 operation. If body 102 is misaligned relative to X-axis 106, this may cause inefficiencies in the operation of gas discharge stage 108, which may result in a reduction in the quality of beam 110. For example, beam path 110 coincides with X-axis 106, and X-axis 106 is determined based on the apertures associated with optical components 140 and 142. An energy source 114 (which includes electrodes) affixed to body 102 supplies energy to cavity 112 to pump a gas using an electrical discharge. Pumping the gas using energy source 114 creates a plasma state of the gas. Furthermore, when this plasma state is aligned with X-axis 106 (which occurs when body 102 is properly aligned with X-axis 106), efficient coupling occurs between the resonant cavity (formed by components 140 and 142 and defined along X-axis 106) and the plasma state, and beam 110 parameters are improved. On the other hand, when the plasma state is misaligned with the X-axis 106 (which occurs when the body 102 is misaligned with the X-axis 106), the coupling efficiency between the resonant cavity and the plasma state is low, and the parameters of the beam 110 are affected. For example, the operating efficiency of the gas discharge stage 108 is reduced. In this scenario, more energy (e.g., via the energy source 114) must be supplied to the body 102 in order to maintain the performance parameters of the beam 110.

[0059] As another example, in the following Figure 12 In the dual-stage design discussed, misalignment of the body 102 within the first gas discharge stage 1272 results in inefficiency of the first gas discharge stage 1272, which in turn degrades the performance of the second gas discharge stage 1273 that receives the light beam 1273 output from the first gas discharge stage 1272. This, in turn, affects the operation of the second gas discharge stage 1273 unless modifications are made to the operation of the second gas discharge stage 1273.

[0060] The apparatus 100 provides a quantifiable measure for this alignment and also provides a previously unavailable, fast and accurate direct measurement of the position of the body 102 relative to the X-axis 106. Furthermore, the apparatus 100 determines the position of the body 102 from the X-axis 106 without having to rely on slow and inaccurate measurements of the performance of the gas discharge stage 108.

[0061] In particular, as discussed below, apparatus 100 uses a plurality of direct measurements of body 102 to determine the position of body 102 relative to XYZ coordinate system 104 .

[0062] In some implementations, the apparatus 100 can be operable to determine the position of the body 102 during use of the gas discharge station 108 in which the light beam 110 is being generated. In other implementations, the apparatus 100 can be operable to determine the position of the body 102 after the body 102 is initially installed in the system but before it is used to generate the light beam 110 for use by the apparatus.

[0063] The apparatus 100 includes a sensor system 124 whose output is used to determine the position of the body 102 relative to the X-axis 106. The sensor system 124 includes at least two sensors 124a and 124b that provide orientation measurements of the body 102. Figure 1 Two sensors 124a and 124b are shown, but the sensor system 124 may have more than two sensors. Each sensor 124a, 124b is configured to measure a physical aspect of a corresponding different region 126a, 126b of the body 102 of the gas discharge table 108 relative to the sensor 124a, 124b.

[0064] Apparatus 100 includes a control device 128 in communication with each sensor 124a, 124b of sensor system 124. Control device 128 is configured to analyze physical aspects measured from sensors 124a, 124b to determine a position of body 102 of gas discharge table 108 relative to X-axis 106.

[0065] Body 102 can be any shape configured to contain a gas mixture including a gain medium within cavity 112. When energy provided by energy source 114 is sufficient to form a plasma state, optical amplification occurs in the gain medium. The gas mixture can be any suitable gas mixture configured to produce an amplified optical beam (or laser beam) around a desired wavelength and bandwidth. For example, the gas mixture can include argon fluoride (ArF), which emits light at a wavelength of approximately 193 nm, or krypton fluoride (KrF), which emits light at a wavelength of approximately 248 nm.

[0066] Furthermore, as discussed in detail below, an optical feedback mechanism can be arranged or configured relative to the body 102 to provide an optical resonator.

[0067] The energy source 114 may include two elongated electrodes extending within the cavity 112 and fixed to the body 102. Current supplied to the electrodes generates an electromagnetic field within the cavity 112 that provides the energy required for the gain medium to form a plasma state in which optical amplification occurs. The body 102 may also house a fan that circulates the gas mixture between the electrodes.

[0068] The body 102 is made of a rigid, non-reactive material such as a metal alloy (stainless steel). The body 102 can have any suitable geometry, and the geometry is determined by the arrangement of the electrodes and the ports 118, 120. The body 102 can have a rectangular parallelepiped shape or a cubic shape. Figure 2A As shown, the body 102 has a rectangular parallelepiped shape having two flat, parallel surfaces 130x and 131x that intersect the X-axis 106, and four flat surfaces 132z, 133z, 134y, and 135y extending between the flat surfaces 130x and 131x. Surfaces 132z and 133z are parallel to each other and intersect the Z-axis, and surfaces 134y and 135y are parallel to each other and intersect the Y-axis. In this example, regions 126a and 126b are located on surface 134y. In other implementations, regions 126a and 126b may be located on other surfaces or on several different surfaces of the body 102.

[0069] The ports 118, 120 on the body 102 can transmit a light beam 122 that forms the light beam 110. Thus, the ports 118, 120 can transmit light having a wavelength in the ultraviolet range. The ports 118, 120 can be made of a rigid substrate such as fused silica or calcium fluoride that can be coated with an anti-reflective material. The ports 118, 120 can have a flat surface that interacts with the light beam 122. Because the cavity 112 of the body 102 holds or retains the gas mixture, the body 102 needs to be enclosed or sealed, and the body 102 can be hermetically sealed. Therefore, the ports 118, 120 are also hermetically sealed in corresponding openings of the body 102 to ensure that the gas mixture does not leak from the body 102 at the seam between the ports and the body 102.

[0070] In some implementations, the X-axis 106 and the XYZ coordinate system 104 are defined by the design of the gas discharge table 108. Specifically, the X-axis 106 is defined as a line passing through two holes in the gas discharge table. The two holes can be positioned adjacent to respective optical components 140, 142 that interact with the body 102 in the gas discharge table 108. Thus, the optical components 140, 142 and their holes define the X-axis 106 (and therefore the XYZ coordinate system 104). Furthermore, these optical components 140, 142 define an optical resonator for forming the light beam 110.

[0071] In some implementations, the optical components 140, 142 can form an optical feedback mechanism to provide an optical resonator to output the light beam 110 from the light beam 122. Thus, when the body 102 of the gas discharge table 108 is within an acceptable position range, the energy source 114 supplies energy to the cavity 112 of the body 102, and the optical components 140, 142 are aligned, generating the light beam 122.

[0072] In some implementations, optical component 140 can be a spectral characterization device that receives precursor beam 121 and enables fine-tuning of the spectral characteristics of beam 122 by adjusting the spectral characteristics of precursor beam 121. Spectral characteristics that can be tuned using the spectral characterization device include the central wavelength and bandwidth 122 of the beam. The spectral characterization device includes a set of optical features or components arranged to optically interact with precursor beam 121. The optical components of the spectral characterization device include, for example, a dispersive optical element, which can be a grating, and a beam expander, which can be a prism and is made of a set of refractive optical elements. Optical component 142 can be an output coupler that allows beam 122 to be extracted from the intracavity beam. The output coupler can include a partially reflective mirror that allows a specific portion of the intracavity beam to be transmitted as beam 122. The gas discharge stage 108 can also include a beam expander configured to interact with beam 122 as it travels between the output coupler (optical component 142) and the cavity 112.

[0073] In other implementations, the optical component 140 can be a beam steering device and the optical component 142 can be a beam coupler. The beam steering device includes an optical device arrangement configured to receive a precursor beam 121 that exits the body 102 of the gas discharge table 108 through the port 118 and redirect the beam 121 so that the beam 121 re-enters the body of the gas discharge table through the first port 118.

[0074] As discussed above, each sensor 124a, 124b in the sensor system 124 is configured to measure a physical aspect of the body 102 of the gas discharge station 108 relative to the sensor 124a, 124b. As a physical aspect of the body 102, each sensor 124a, 124b can measure a distance from the sensor 124a, 124b to the body 102 of the gas discharge station 108.

[0075] In various implementations, the sensors 124a, 124b are mounted to a mechanically stable structure of the gas discharge stage 108, wherein the structure maintains the sensors 124a, 124b in a fixed position relative to each other and relative to components defining the X-axis 106 or defining the XYZ coordinate system 104. For example, the sensors 124a, 124b can be mounted on an optical table or other stable mechanical mount that is rigidly coupled to optical elements (e.g., optical elements 140, 142) that describe the X-axis 106, which is the optical axis of the system.

[0076] For example, each sensor 124a, 124b is configured to be fixedly mounted relative to the XYZ coordinate system 104. Thus, during measurement, the sensors 124a, 124b are fixed relative to the XYZ coordinate system 104. Additionally, each sensor 124a, 124b is configured to be fixed at a distance from the other sensor 124b, 124a when it is fixedly mounted relative to the XYZ coordinate system 104. Thus, during operation and measurement, the distance d(ss) between the sensors 124a, 124b is fixed. The distance d(ss) between the sensors 124a, 124b is sufficiently large along the X-axis 106 that the control device 128 can determine the rotation about the Z-axis ( d(ss) ) based on the outputs from the sensors 124a, 124b. Figure 3B In particular, the relative changes between the outputs from each of the sensors 124a, 124b can be used to determine rotation about the Z axis ( Figure 3B The measurement resolution of sensors 124a, 124b is fast enough to achieve alignment. For example, a time resolution of 1 second (s) may be fast enough; or a time resolution of less than 1 s (e.g., 0.1 s) may be fast enough.

[0077] In some implementations, each sensor 124a, 124b includes a displacement sensor. The displacement sensor can be an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor, or an ultrasonic displacement sensor.

[0078] Each sensor 124a, 124b can be a non-contact sensor, meaning that it does not come into contact with the body 102. In such a design where the sensors 124a, 124b are contact sensors or non-contact sensors, the measurement itself does not significantly (e.g., greater than 1 μ) displace the body 102, as any such displacement would affect the performance of the gas discharge stage 108.

[0079] Any non-contact measurement with suitable resolution (e.g., resolution better than 10 μm (i.e., less than 10 μm)) is suitable for this application. One example of a contactless sensor is a laser displacement sensor, which is an off-the-shelf product that includes a laser light source and a photodiode array. The laser light source of each sensor 124 a, 124 b illuminates light on the surface 134 y of the body 102; the light is reflected back to the corresponding sensor 124 a, 124 b; and the position on the diode array where the reflected light lands corresponds to the displacement of the surface 134 y of the body 102.

[0080] In other implementations, the sensors 124a, 124b are contact sensors that minimize contact with the body 102 at the respective regions 126a, 126b. For example, the sensors can be electromechanical devices that convert mechanical motion of the body 102 into a variable current, voltage, or electrical signal. An example of such a sensor is a linear variable displacement transducer (LVDT), which is a device that provides a voltage output that is related to the characteristic (position) being measured.

[0081] The control device 128 includes one or more of the following: digital electronic circuitry, computer hardware, firmware, and software. The control device 128 includes memory, which may be read-only memory and / or random access memory. Storage devices suitable for tangibly embodying computer program instructions and data include all forms of non-volatile memory, including, for example, semiconductor memory devices such as EPROM, EEPROM, and flash memory devices; magnetic disks such as internal hard disks and removable disks; magneto-optical disks; and CD-ROM disks. The control device 128 may also include one or more input devices (such as a keyboard, touch screen, microphone, mouse, handheld input device, etc.) and one or more output devices (such as a speaker or monitor).

[0082] The control device 128 includes one or more programmable processors and one or more computer program products tangibly embodied in a machine-readable storage device for execution by the programmable processors. The one or more programmable processors can each execute a program of instructions to perform a desired function by operating on input data and generating appropriate outputs. Typically, the processor receives instructions and data from a memory. Any of the foregoing can be supplemented or incorporated into a specially designed ASIC (application-specific integrated circuit).

[0083] The control device 128 includes a set of modules, each of which includes a set of computer program products executed by one or more processors, such as processors. Furthermore, any of the modules can access data stored in memory. Each module can receive data from other components and analyze such data as needed. Each module can communicate with one or more other modules.

[0084] Although the control device 128 is shown as a box (all of its components can be located in the same location), the control device 128 can be composed of components that are physically separated from each other. For example, a particular module can be physically located in the same location as the sensor system 124, or a particular module can be physically located in the same location as another component.

[0085] refer to Figure 4 In some implementations, the sensors 124a, 124b are arranged to interact with the surface 134y. In these implementations, the sensors 124a, 124b are mounted on a platform 144 that supports the weight of the sensors 124a, 124b and maintains the stability of the sensors 124a, 124b. Figure 4 In FIG. 1 , platform 144 is a three-legged frame or stand. Figure 5 A side cross-sectional view of the arrangement is shown. Figure 5 In FIG, platform 144 is a basic platform base 544 on which sensors 124a, 124b are placed. Platform base 544 can be integrated into a frame or other component fixed within gas discharge table 108. Sensors 124a, 124b can be repositionable; that is, sensors 124a, 124b can be placed at any location relative to any two areas of body 102 and then moved to another location relative to another two areas of body 102.

[0086] like Figure 5 As shown, the energy source 114 is a pair of electrodes 514A, 514B disposed in the cavity 112. The electrodes 514A, 514B extend along the X-axis 106.

[0087] In addition, reference Figure 6, each sensor 124a, 124b measures a distance or displacement from a corresponding area 126a, 126b of the surface 134y of the body 102. For example, sensor 124a measures a displacement d(a) from sensor 124a to area 126a of the surface 134y, and sensor 124b measures a displacement d(b) from sensor 124b to area 126b of the surface 134y. Additionally, the calculations performed by the control device 128 require a set of reference displacements D(a) and D(b). The reference displacements D(a) and D(b) are measurements made by the respective sensors 124a, 124b during a time when the body 102 is properly aligned with the X-axis 106 and the XYZ coordinate system 104 (this is shown by the dashed box labeled 102_ref). In some implementations, proper alignment between body 102 and X-axis 106 may be assumed to occur when gas discharge stage 108 operates at its highest efficiency (eg, when maximum energy input via energy source 114 is converted to energy in beam 110 ).

[0088] The values ​​of the displacements d(a) and d(b) output from the respective sensors 124a, 124b need not be linearly independent of one another. This means that the displacement of one sensor, such as d(a), can be written in terms of the displacement of another sensor, such as d(b). By using additional information, such linearly dependent values ​​can be transformed into linearly independent values. In this case, the distance L taken along the X-axis 106 between the regions 126a, 126b when the body 102 is aligned with the X-axis 106 can be used to provide such a transformation. Specifically, as discussed next, the distance L, together with d(a) and d(b), can be used to determine the relative position of the center of the body 102 (given by R) and the relative angular orientation θ of the body about the Z-axis.

[0089] The relative displacements d′(a) and d′(b) are given by:

[0090] d'(a) = D(a) - d(a): and

[0091] d′(b)=D(b)-d(b).

[0092] Furthermore, the relative displacement R of the body 102 is defined as half the sum of the relative displacements d′(a) and d′(b), as follows:

[0093]

[0094] The relative angular orientation θ can be approximated as the ratio of the relative displacements d′(a) and d′(b) to the difference in distance L as follows:

[0095]

[0096] Since L>>|d′(a)-d′(b)|, a small angle approximation is invoked. For example, L is on the order of several hundred millimeters (mm) (e.g., 0.5 to 0.7 meters), while |d′(a)-d′(b)| is on the order of mm.

[0097] refer to Figure 7 In some implementations, the apparatus 700 is designed to not only determine the position of the three-dimensional body 102, but also to move the body 102 in the XYZ coordinate system 104. To this end, the apparatus 700 is substantially similar to the apparatus 100 and includes the components detailed above and in Figure 1 All components shown in FIG are included, and the discussion of those components will not be repeated herein.

[0098] The apparatus 700 also includes an actuation system 754 that is physically coupled to the body 102 of the gas discharge table 108, the actuation system 754 being configured to adjust the position of the body 102 of the gas discharge table 108 within the XYZ coordinate system 104. The control device 128 is in communication with the actuation system 754 and is configured to provide signals to the actuation system 754 based on the output from the sensor system 124. In particular, the control device 128 determines whether the position of the body 102 of the gas discharge table 108 should be modified based on the output from the sensor system 124, and the control device 128 determines how to adjust one or more signals to the actuation system 754 based on the determination.

[0099] The actuation system 754 includes a plurality of actuators 754a, 754b, etc., wherein each actuator is configured to be in physical communication with a corresponding region 756a, 756b, etc., of the body 102 of the gas discharge table 108. Although the actuation system 754 is shown as being in physical communication with the surface 134y, the actuation system 754 may include one or more actuators in physical communication with one or more other surfaces of the body 102. Furthermore, the actuation system 754 need not be in physical communication with the same surface or surfaces being measured by the sensor system 124.

[0100] Each actuator 754a, 754b may include one or more of the following: an electromechanical device, a servo mechanism, an electric servo mechanism, a hydraulic servo mechanism, and / or a pneumatic servo mechanism. The various motions imparted to regions 756a, 756b are used to move the actuator along the axis as described above with respect to FIG. Figures 3A to 3C Any of the directions of rotation detailed above and Figures 3D to 3F Any of the detailed translation directions adjusts the position of the body 102 .

[0101] refer to Figure 8In some implementations, each respective region 756a, 756b is associated with a rotating base 857a, 857b attached to surface 134y. The rotating bases 857a, 857b are actuated by rotation, and the rotation is converted into translational motion. Thus, for example, rotation of the base 857a in a clockwise direction translates the rod affixed to the region 756a in the -Y direction (which causes the region 756a to translate in the -Y direction). And, simultaneously, rotation of the base 857a in a counterclockwise direction translates the rod affixed to the region 756a in the Y direction (which causes the region 756a to translate in the Y direction). By rotating the two rotating bases 857a, 857b simultaneously and synchronously (in the same direction), the body 102 is translated along the Y axis, as shown in FIG. Figure 3D As shown. Figure 3B As shown, simultaneous and asynchronous rotation (in opposite directions) of bases 857a and 857b causes body 102 to rotate about the Z axis. For example, rotating one base 857a clockwise and the other base 857b counterclockwise causes region 756a to translate along the -Y direction while simultaneously translating region 756b along the Y direction, which in turn causes body 102 to rotate about the Z axis. Synchronous and asynchronous rotation of bases 857a and 857b can be performed simultaneously to impart translation along the Y axis and rotation about the Z axis to body 102. In this example, the rotating bases 857a and 857b at respective regions 756a and 756b are controlled by actuators 754a and 754b, respectively. Actuators 754a and 754b can be any device that rotates respective bases 857a and 857b. Furthermore, the rotation of bases 857a and 857b can be in an incremental step-by-step manner.

[0102] refer to Figure 9 In some implementations, the apparatus 900 is designed to not only determine the position of the three-dimensional body 102 (using the sensor system 124) and adjust the position of the body 102 (using the actuation system 754), but also to measure or monitor the performance or performance characteristics of the gas discharge table 108. As discussed above, the alignment of the body 102 affects or changes the performance of the gas discharge table 108, and therefore, it is expected that misalignment of the body 102 will degrade performance. To this end, the apparatus 900 is substantially similar to the apparatus 700 and includes the components detailed above and in the Figure 1 All components shown in FIG are included, and the discussion of those components will not be repeated herein.

[0103] The apparatus 900 also includes a measurement system 960 that is configured to measure performance parameters of the light beam 110. Examples of performance parameters include the energy E of the light beam 110, spectral characteristics such as the bandwidth or wavelength of the light beam 110, and the dose of the light beam 110 at an apparatus (such as a lithographic exposure apparatus). The control device 128 communicates with the measurement system 960. In this way, the control device 128 can find an optimal or improved position or alignment of the body 102 that provides one or more optimal or improved performance parameters. Because the performance of the gas discharge table 108 is measured based on many different parameters, the control device 128 can consider a parameter space including multiple parameters when making its determination. For example, the control device 128 can perform adaptive control for adjusting the position of the body 102, which provides a set of performance parameters of the light beam 110 that fall within an acceptable range.

[0104] The measurement system 960 may include one or more measurement devices, each positioned relative to the beam 110 and measuring a specific performance parameter. The measurement system 960 may include an energy monitor for measuring the energy of the beam 110 as a measurement device. The measurement system 960 may include a spectral signature analysis device configured to measure spectral characteristics (bandwidth or wavelength) as a measurement device. In these cases, the measurement device may be equipment already included in the gas discharge stage 108 or part of an analysis module already in place to measure these aspects of the beam 110. For example, the analysis module may include a wavelength meter and a bandwidth meter, which may include, among other components, an etalon with an imaging lens and beam homogenization optics. The analysis module may also include a photodetector module (PDM) that monitors the energy of the beam 110 and provides a fast photodiode signal for diagnostic and timing purposes. In some implementations, one or more energy sensors may be placed anywhere along the path of the beam 110. The control device 128 may estimate the efficiency of the gas discharge stage 108 based on the ratio of this measured energy to the energy input by the energy source 114 (which may be a voltage applied to electrodes of the energy source 114).

[0105] The measuring device can be used with a spectral characteristic modifier such as Figure 12 The spectral signature adjuster 1275 is associated with diagnostics within the spectral signature adjuster 1275 shown in FIG. Spectral signature adjuster 1275 receives a precursor beam 1276 from the body 102 of the gas discharge stage 1272 to enable fine-tuning of spectral parameters such as the central wavelength and bandwidth of the beam 1274 at relatively low output pulse energies. Because the beam expansion within the spectral signature adjuster 1275 is directly related to the bandwidth of the beam 1274 (and therefore the beam 110), the beam expansion optics within the spectral signature adjuster 1272 can be monitored to track the spectral characteristics (such as bandwidth) of the beam 110.

[0106] Measurement system 960 may include a measurement device configured to measure the dose of beam 110 at the lithographic exposure apparatus. Measurement system 960 may include a measurement device configured to measure the repetition rate of pulses generated by beam 110. Measurement system 960 may include a measurement device configured to measure the duty cycle of beam 110. These measurement devices may include a laser energy detector (such as a photodetector). In this example, the dose may be estimated as the sum of the energy within a fixed number of pulses detected by the laser energy detector; the repetition rate may be estimated as the inverse of the time between any two pulses (typically a fixed number of pulses) detected by the laser energy detector; and the duty cycle may be arbitrarily defined as the number of pulses emitted in a time frame (such as the last two minutes) divided by the maximum repetition rate multiplied by the time elapsed in that time frame (e.g., two minutes). The measurement device may also include a timer so that control device 128 can calculate the repetition rate and duty cycle from the output.

[0107] The control device 128 can send independent signals to the actuators 754a, 754b, read independent measurements from each of the sensors 124a, 124b, and read independent measurements from each of the measurement devices in the measurement system 960.

[0108] In operation, the control device 128 analyzes both the position of the body 102 of the gas discharge table 108 (which it receives from the sensor system 124) and one or more measured performance parameters of the light beam 110 (which it receives from the sensor system 960). The control device 128 determines whether a modification to the position of the body 102 of the gas discharge table 108 will improve one or more of the measured performance parameters. The control device 128 may perform a process of mapping the position space and determine an optimal position that achieves the best performance parameter(s).

[0109] refer to Figure 11 , an example of an alignment feedback control process is shown in topographic map 1162, where the position of body 102 can be adjusted around the Z axis ( Figure 3B ) rotation, translation along the Y axis ( Figure 3D ), or both. Graph 1162 shows the value of a performance parameter (such as energy) relative to the value of rotation about the Z axis (1162Z) and the value of translation along the Y axis (1162Y). Because the graph is a topographic map, energy values ​​are listed on each row. The shape of the three-dimensional surface corresponding to graph 1162 is depicted by these contour lines, and the relative spacing of these lines indicates the relative slope of the three-dimensional surface.

[0110] In this example, the control device 128 receives the positions measured by the sensors 124a, 124b while controlling the actuators 754a, 754b to generate a map 1162 of the energy of the light beam 110. Higher values ​​of energy represent more efficient energy values. Thus, values ​​of the position of the body 102 along the Y axis and values ​​of the rotation angle of the body 102 around the Z axis are determined that provide the most efficient energy value for the light beam 110. In some implementations, the feedback control process can be configured to intelligently find peaks in the map (and therefore peaks in energy) without having to map the entire space. For example, the search path 1164 illustrates a specific way to modify the position of the body 102 along the Y axis and rotate the body 102 around the Z axis to obtain the most efficient energy value for the light beam 110.

[0111] The feedback control process can be a nonlinear optimization problem that can find the best solution (peak of the graph or peak of energy) from all feasible solutions. For example, the process can be gradient ascent, which is a first-order iterative optimization algorithm for finding the maximum value of a function.

[0112] refer to Figure 12 In some implementations, the gas discharge stage 108 can be incorporated into a dual-stage light source 1270. The light source 1270 is designed as a pulsed light source that generates an amplified beam 1271 of optical pulses. The light source 1270 includes a first gas discharge stage 1272 and a second gas discharge stage 1273. The second gas discharge stage 1273 is optically connected in series with the first gas discharge stage 1272. Generally speaking, the first stage 1272 includes a first gas discharge chamber that houses an energy source and contains a gas mixture that includes a first gain medium. The second gas discharge stage 1273 includes a second gas discharge chamber that houses an energy source and contains a gas mixture that includes a second gain medium.

[0113] The first stage 1272 includes a master oscillator (MO), while the second stage 1273 includes a power amplifier (PA). The MO provides a seed beam 1274 to the PA. The master oscillator typically includes a gain medium in which amplification occurs and an optical feedback mechanism such as an optical resonator. The power amplifier typically includes a gain medium in which amplification occurs when seeded with the seed beam 1274 from the master oscillator. If the power amplifier is designed as a regenerative ring resonator, it is described as a power ring amplifier (PRA), in which case sufficient optical feedback can be provided from the ring design.

[0114] The spectral characteristic adjuster 1275 receives the precursor beam 1276 from the master oscillator of the first stage 1272 to enable fine adjustment of spectral parameters such as the central wavelength and bandwidth of the beam 1274 at relatively low output pulse energy. The power amplifier receives the beam 1274 from the master oscillator and amplifies the output to obtain the power necessary for optical lithography by the lithography exposure apparatus.

[0115] The master oscillator includes a discharge chamber with two elongated electrodes, a laser gas serving as a gain medium, and a fan to circulate the gas between the electrodes. A laser resonator is formed between a spectral characteristic adjuster 1275 located on one side of the discharge chamber and an output coupler 1277 located on the other side of the discharge chamber to output a seed beam 1274 to a power amplifier.

[0116] The power amplifier includes a power amplifier discharge chamber and, if the power amplifier is a regenerative ring amplifier, a beam reflector or beam steering device that reflects the beam back into the discharge chamber to form a loop path. The power amplifier discharge chamber includes a pair of elongated electrodes, a laser gas serving as a gain medium, and a fan for circulating the gas between the electrodes. The seed beam 1274 is amplified by repeatedly passing through the power amplifier. The second stage 1273 may include a beam modifying optical system that provides a means (e.g., a partial reflector) for both optically coupling the seed beam 1274 into the power amplifier and optically coupling a portion of the amplified radiation out of the power amplifier to form the amplified beam 1271.

[0117] The laser gas used in the discharge chamber of the master oscillator and power amplifier can be any suitable gas for generating a laser beam near the desired wavelength and bandwidth. For example, the laser gas can be argon fluoride (ArF), which emits light at a wavelength of approximately 193 nm, or krypton fluoride (KrF), which emits light at a wavelength of approximately 248 nm.

[0118] In general, the light source 1270 may also include a control system 1278 that communicates with the first station 1272 and the second station 1273. The control system 1278 includes one or more of the following: digital electronic circuitry, computer hardware, firmware, and software. The control system 1278 includes memory, which may be read-only memory and / or random access memory. Storage devices suitable for tangibly embodying computer program instructions and data include all forms of non-volatile memory, including, for example, semiconductor memory devices such as EPROM, EEPROM, and flash memory devices; magnetic disks such as internal hard disks and removable magnetic disks; magneto-optical disks; and CD-ROM disks. The control system 1278 may also include one or more input devices (such as a keyboard, touch screen, microphone, mouse, handheld input device, etc.) and one or more output devices (such as a speaker or monitor).

[0119] The control system 1278 includes one or more programmable processors and one or more computer program products tangibly embodied in a machine-readable storage device for execution by the programmable processors. The one or more programmable processors can each execute a program of instructions to perform a desired function by operating on input data and generating appropriate outputs. Typically, the processor receives instructions and data from a memory. Any of the foregoing can be supplemented or incorporated into a specially designed ASIC (application-specific integrated circuit).

[0120] The control system 1278 includes a set of modules, each of which includes a set of computer program products executed by one or more processors such as processors. Furthermore, any module can access data stored in memory. Each module can receive data from other components and analyze such data as needed. Each module can communicate with one or more other modules.

[0121] Although the control system 1278 is shown as a box (all of its components may be co-located therein), the control system 1278 may be composed of components that are physically separate from each other. For example, a particular module may be physically co-located with the light source 1270, or a particular module may be physically co-located with the spectral characteristic adjuster 1275. Furthermore, the control system 1278 may be a module incorporated into the control device 128.

[0122] The first gas discharge stage 1272 can correspond to the gas discharge stage 108. The second gas discharge stage 1273 can correspond to the gas discharge stage 108. Alternatively, each of the first gas discharge stage 1272 and the second gas discharge stage 1273 can correspond to the gas discharge stage 108. Thus, the apparatus 100, 700, or 900 described above can be configured to determine the position of the body in the first gas discharge stage 1272; adjust the position of the body in the first gas discharge stage 1272; and base the adjustment of the position on a monitored performance parameter associated with the first gas discharge stage 1272. Additionally or alternatively, the apparatus 100, 700, or 900 described above can be configured to determine the position of the body in the second gas discharge stage 1273; adjust the position of the body in the second gas discharge stage 1273; and base the adjustment of the position on a monitored performance parameter associated with the second gas discharge stage 1273. Adjustment and optimization of the position of the main body in the second gas discharge stage 1273 can be performed simultaneously with adjustment and optimization of the position of the main body in the first gas discharge stage 1272. Furthermore, performance parameters associated with the first gas discharge stage 1272 can be measured by measuring performance parameters of the seed beam 1274 or the amplified beam 1271 (which is generated by the seed beam 1273). Performance parameters associated with the second gas discharge stage 1273 can be measured by measuring performance parameters of the amplified beam 1271.

[0123] If both first gas discharge stage 1272 and second gas discharge stage 1273 are under the control of apparatus 100 , 700 , or 900 , a single control apparatus 128 may be configured to communicate with two sensor systems 124 , two drive systems 754 , and two measurement systems 960 .

[0124] refer to Figure 13 , measurement kit 1380 includes components that constitute an apparatus such as apparatus 900. Measurement kit 1380 is useful because it need not be fixed or associated with a single gas discharge station 108 and can be moved from one gas discharge station 108 to another. Furthermore, for this reason, measurement kit 1380 can be used with more than one gas discharge station 108, instead of providing apparatus 900 for each gas discharge station 108, which would result in higher costs.

[0125] The measurement kit 1380 includes a sensor system 1324, which includes a plurality of sensors 1324a, 1324b, ..., 1324i (where i is any integer greater than 1). Each sensor 1324a, 1324b, ..., 1324i is configured to measure a physical aspect of the three-dimensional body 102 relative to the sensor. The measurement kit 1380 includes a measurement system 1360, which includes at least one measurement device 1360a, 1360b, ..., 1360j (where j is any integer). Each measurement device 1360a, 1360b, ..., 1360j is configured to measure a performance parameter of the beam 110. The measurement kit 1380 includes an actuation system 1354, which includes a plurality of actuators 1354a, 1354b, ..., 1354k configured to be physically coupled to the body 102.

[0126] Metrology suite 1380 includes a control device 1328 configured to communicate with sensor system 1324, measurement system 1360, and actuation system 1354. Control device 1328 includes a sensor processing module 1381 configured to interface with sensor system 1324 and receive sensor information from sensor system 1324. Control device 1328 includes a measurement processing module 1382 configured to interface with measurement system 1360 and receive measurement information from measurement system 1360. Control device 1329 includes an actuator processing module 1383 configured to interface with actuation system 1354.

[0127] The control device 1328 may also include a light source processing module 1384 configured to interface with the gas discharge stage 108 having the three-dimensional body 102 .

[0128] The control device 1328 may further include an analysis processing module 1385 that communicates with the sensor processing module 1381, the measurement processing module 1382, the actuator processing module 1383, and the light source processing module 1384. The analysis processing module 1385 is configured to, when in use, instruct the light source processing module 1384 to adjust one or more characteristics of the gas discharge stage 108 and to analyze sensor information (from the sensor system 1324) and measurement information (from the measurement system 1360) and determine instructions to the actuator processing module 1383 based on the adjusted characteristics of the gas discharge stage 108.

[0129] The measurement kit 1380 is modular, allowing it to be configured to operably connect and disconnect with one or more gas discharge stations 108. Each gas discharge station 108 includes a respective three-dimensional body 102 defining a cavity 112 that generates a respective light beam 102. Thus, the measurement kit 1380 can be mounted to the gas discharge chamber 108 when it is desired to optimize the position of the body 102. For example, sensors 1324a, 1324b, ..., 1324i can be mounted at respective locations relative to their respective regions of the body 102. Measurement devices 1360a, 1360b, ..., 1360j can be positioned at various locations to measure performance parameters of the light beam 110. Actuators 1354a, 1354b, ..., 1354k can be physically coupled to respective regions of the body 102. Furthermore, the sensor system 1324, measurement system 1360, and actuation system 1354 can be connected to or placed in communication with the control device 1328. After the body 102 has been optimized, the reverse disconnection steps may be performed.

[0130] In some implementations, instead of one or more of the measurement devices, the measurement system 1360 includes one or more measurement interfaces, each of which can be connected to a measurement device mounted within the gas discharge station 108 and can also be connected to the control device 128 in the kit 1380 .

[0131] refer to Figure 14 , process 1487 is executed by apparatus 900. Process 1487 can be executed any time a component of the gas discharge station 108 is moved or replaced, or any time the efficiency of the gas discharge station 108 falls below an acceptable range. Process 1487 is typically executed while the gas discharge station 108 is offline from the photolithography exposure apparatus.

[0132] The efficiency of the gas discharge station 108 can be represented by one or more performance parameters of the light beam 110. Moreover, a set of multiple performance parameters can be considered as a parameter space. Therefore, the parameter space includes multiple performance parameters. The program 1487 strives to optimize the parameter space. Optimization of the parameter space does not necessarily mean that a specific performance parameter is optimized or that every performance parameter is optimized. Instead, a set or multiple performance parameters that provide the most efficient operation of the gas discharge station 108 are determined. As discussed above, examples of performance parameters include the energy E of the light beam 110, spectral characteristics such as the bandwidth or wavelength of the light beam 110, the dose of the light beam 110 at an apparatus (such as a photolithography exposure apparatus), the repetition rate of the pulses that generate the light beam 110, and the duty cycle of the light beam 110.

[0133] The procedure 1487 includes measuring 1488 a physical aspect of the body 102 at each of the plurality of different regions 126 a, 126 b, etc., of the body 102 of the gas discharge station 108. For example, the sensor system 124 (particularly, the sensors 124 a, 124 b, etc.) may measure the physical aspect at each of the different regions 126 a, 126 b, etc.

[0134] Procedure 1487 includes measuring 1489 one or more performance parameters of the light beam 110 generated from the gas discharge stage 108. For example, the measurement system 960 can measure one or more performance parameters of the light beam 110. The measurement system 960 can measure only one performance parameter as an indication of the efficiency of the gas discharge stage 108. The measurement system 960 can also measure multiple performance parameters to indicate the efficiency of the gas discharge stage 108. Examples of performance parameters that can be measured include a repetition rate of the pulsed light beam 110, an energy of the pulsed light beam 110, a duty cycle of the pulsed light beam 110, and / or a spectral characteristic of the pulsed light beam 110.

[0135] The process 1487 includes analyzing the measured physical aspects (1490) to determine the position of the body in the XYZ coordinate system 104 defined by the X-axis 106 defined by the plurality of apertures defined by the plurality of optical elements 140, 142 of the gas discharge table 108 (1491). The process 1487 also includes analyzing the determined position of the body 102 of the gas discharge table 108 (1492) and analyzing one or more measured performance parameters (1493). After receiving the outputs from the measurements 1488 and 1489 and determining the position of the body 1491, the control device 128 performs the analyses 1490, 1492, 1493.

[0136] The procedure 1487 includes determining whether modifying the position of the body 102 of the gas discharge table 108 will improve one or more of the measured performance parameters (1494), and modifying the position of the body 102 of the gas discharge table 108 if it is determined that modifying the position of the body 102 of the gas discharge table 108 will improve one or more of the measured performance parameters (1495). For the example where the performance parameter is the energy E of the light beam 110, the control device 128 may use a parameter such as Figure 11 The system 1400 utilizes a feedback control such as that shown and makes incremental adjustments to the position of the body 102 and then remeasures the performance parameter at 1489 to determine whether the adjustment has improved the performance parameter (1494).

[0137] If it is determined that modifying the position of the body 102 will not improve one or more of the measured performance parameters (1494), then the process 1487 ends. In particular, the process 1487 has determined a position of the body 102 of the gas discharge table 108 that optimizes the plurality of measured performance parameters. The optimal position of the body 102 of the gas discharge table 108 provides the best set of performance parameter values ​​for the light beam 110, and the process 1487 operates to modify the position of the body 102 of the gas discharge table 108 to the optimal position.

[0138] The position of the body 102 of the gas discharge table 108 may be modified (1495) based on the analysis of the determined position of the body 102 of the gas discharge table 108 at 1492. The gas discharge table 108 may be determined (1491) by determining one or more of: a translation of the body 102 of the gas discharge table 108 about the X-axis 106 and a rotation of the body 102 of the gas discharge table 108 about the X-axis 106. Figure 6 An example of this determination is described.

[0139] As discussed above, physical aspects of body 102 at different areas of body 102 may be measured ( 1488 ) by measuring distances from corresponding sensors to the areas of body 102 .

[0140] The procedure 1487 may also include generating a light beam 110 from the gas discharge stage 108 by forming a resonator defined by a beam coupler (such as optical component 142) located on one side of the body 102 and a beam steering device (such as optical component 140) located on the other side of the body 102, and generating energy within a gain medium in the cavity 112. The beam coupler and beam steering device may also define the X-axis 106.

[0141] As discussed above and with reference to Figure 15 , the light beam 110 can be used in an apparatus such as a lithographic exposure apparatus EX to pattern a substrate W. In this case, the apparatus 100, 700, or 900 is incorporated into a light source LS that provides an amplified pulsed light beam LB to the lithographic exposure apparatus EX. The light beam LB can correspond to the light beam 110 output from the gas discharge stage 108. Alternatively, the light beam LB can correspond to a light beam formed by the light beam 110 output from the gas discharge stage 108. Furthermore, as discussed above, the gas discharge stage 108 and the apparatus 100, 700, or 900 can be incorporated into a dual-stage light source LS.

[0142] For example, although the connections between the control device 128 and other components of the devices 100 , 700 , 900 are shown as lines, the connections between the control device 128 and the other components may be wired connections or wireless connections.

[0143] These implementations can also be described using the following terms:

[0144] 1. A light source device, comprising:

[0145] A gas discharge station comprising a three-dimensional body defining a cavity configured to interact with an energy source, the body comprising at least two ports capable of transmitting a light beam having a wavelength in the ultraviolet range;

[0146] a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a respective different region of the body of the gas discharge table relative to the sensor; and

[0147] A control device is in communication with the sensor system and is configured to analyze the physical aspects measured from the sensors to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X axis defined by the geometry of the gas discharge table.

[0148] 2. The light source apparatus of clause 1, further comprising a measurement system configured to measure one or more performance parameters of the light beam generated from the gas discharge stage.

[0149] 3. A light source apparatus according to clause 2, wherein the control device is in communication with the measurement system and is further configured to:

[0150] analyzing the position of the body of the gas discharge table in an XYZ coordinate system and one or more measured performance parameters of the light beam; and

[0151] A determination is made as to whether a modification to the position of the body of the gas discharge table will improve one or more of the measured performance parameters.

[0152] 4. The light source apparatus of clause 3, further comprising an actuation system physically coupled to the body of the gas discharge table and configured to adjust a position of the body of the gas discharge table.

[0153] 5. A light source arrangement according to clause 4, wherein the control arrangement is in communication with the actuation system and is configured to provide a signal to the actuation system based on the determination as to whether the position of the body of the gas discharge table should be modified.

[0154] 6. The light source apparatus of clause 5, wherein the actuation system comprises a plurality of actuators, each actuator configured to be in physical communication with a region of the body of the gas discharge table.

[0155] 7. The light source arrangement of clause 6, wherein each actuator comprises one or more of: an electromechanical device, a servomechanism, an electric servomechanism, a hydraulic servomechanism, and / or a pneumatic servomechanism.

[0156] 8. The light source device according to clause 1, wherein the control device is configured to determine the position of the body of the gas discharge table in the XYZ coordinate system by determining the translation of the body of the gas discharge table from the X axis or the rotation of the body of the gas discharge table from the X axis.

[0157] 9. A light source device according to claim 8, wherein the translation of the body of the gas discharge table from the X-axis includes one or more of the following: translation of the body of the gas discharge table along the X-axis, translation of the body of the gas discharge table along the Y-axis perpendicular to the X-axis, and / or translation of the body of the gas discharge table along the Z-axis perpendicular to the X-axis and the Y-axis.

[0158] 10. A light source device according to claim 8, wherein the rotation of the body of the gas discharge table from the X-axis includes one or more of the following: the rotation of the body of the gas discharge table around the X-axis, the rotation of the body of the gas discharge table around the Y-axis perpendicular to the X-axis, and / or the rotation of the body of the gas discharge table along the Z-axis perpendicular to the X-axis and the Y-axis.

[0159] 11. The light source apparatus of clause 1, wherein each sensor is configured to measure a distance from the sensor to the body of the gas discharge table as a physical aspect of the body of the gas discharge table relative to the sensor.

[0160] 12. A light source device according to claim 1, wherein the gas discharge table includes a beam steering device located at a first end of the body and a beam coupler located at a second end of the body, the beam steering device and the beam coupler intersecting the X-axis so that the light beam generated in the gas discharge table interacts with the beam coupler and the beam steering device.

[0161] 13. The light source apparatus of clause 12, wherein when the body of the gas discharge table is within the acceptable position range, the energy source supplies energy to the cavity of the body and the beam steering device and the beam coupler are aligned to generate a light beam.

[0162] 14. The light source device according to clause 13, wherein the light beam is an amplified light beam having a wavelength in the ultraviolet range.

[0163] 15. The light source arrangement of clause 12, wherein the beam steering device is an optical module comprising a plurality of optical components for selecting and adjusting the wavelength of the light beam, and the beam coupler comprises a partially reflecting mirror.

[0164] 16. A light source arrangement according to clause 12, wherein the beam steering device comprises an optical device arrangement configured to receive the light beam that exits the body of the gas discharge table through the first port and change the direction of the light beam so that the light beam re-enters the body of the gas discharge table through the first port.

[0165] 17. The light source apparatus of clause 12, wherein the gas discharge stage further comprises a beam expander configured to interact with the light beam as it travels between the beam coupler and the cavity.

[0166] 18. The light source apparatus of clause 1, wherein each sensor is configured to be fixedly mounted relative to a body of the gas discharge table.

[0167] 19. The light source apparatus of clause 18, wherein each sensor can be configured to be fixed at a distance from another sensor when each sensor is fixedly mounted relative to the body of the gas discharge table.

[0168] 20. The light source device according to clause 1, further comprising:

[0169] a second gas discharge stage optically connected in series with the gas discharge stage, the second gas discharge stage having a second three-dimensional body defining a second cavity configured to interact with the energy source, the second body including at least two ports capable of transmitting a light beam having a wavelength in the ultraviolet range; and

[0170] a second plurality of sensors, each sensor of the second plurality of sensors being configured to measure a physical aspect of a respective different region of the second body relative to the sensor;

[0171] The control device is in communication with the second plurality of sensors and is configured to analyze physical aspects measured from the second plurality of sensors to determine a position of the second body relative to a second XYZ coordinate system defined by a second X-axis passing through the at least two ports of the second body.

[0172] 21. The light source device of clause 1, wherein each sensor comprises a displacement sensor.

[0173] 22. The light source device according to clause 21, wherein the displacement sensor is an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor, or an ultrasonic displacement sensor.

[0174] 23. The light source device of clause 1, wherein each sensor comprises a non-contact sensor.

[0175] 24. A light source apparatus according to clause 1, wherein the X-axis is defined by a beam steering device and a beam coupler, wherein the beam steering device is located at the first end of the body and optically coupled to the first port, and the beam coupler is located at the second end of the body and optically coupled to the second port.

[0176] 25. A measuring device comprising:

[0177] a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a body of the gas discharge table relative to the sensor;

[0178] a measurement system configured to measure one or more performance parameters of a light beam generated from the gas discharge stage;

[0179] an actuation system comprising a plurality of actuators, each actuator configured to be physically coupled to a different region of a body of the gas discharge table, the plurality of actuators working together to adjust a position of the body of the gas discharge table; and

[0180] A control device in communication with the sensor system, the measurement system, and the actuation system, and the control device is configured to:

[0181] analyzing the physical aspects measured from the sensor to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis defined by the gas discharge table;

[0182] Analyze the position of the gas discharge station body;

[0183] analyzing one or more measured performance parameters; and

[0184] A signal is provided to an actuation system to modify the position of the body of the gas discharge table based on an analysis of the position of the body of the gas discharge table and one or more measured performance parameters.

[0185] 26. The measurement device of clause 25, wherein the sensors are separated from each other and positioned relative to the body of the gas discharge table.

[0186] 27. A measuring device according to claim 25, wherein the control device is configured to provide a signal to the actuation system to modify the position of the body of the gas discharge table based on an analysis of the position of the body of the gas discharge table and one or more measured performance parameters, by determining the position of the body of the gas discharge table that optimizes multiple performance parameters of the light beam.

[0187] 28. The metrology apparatus of clause 25, wherein the X-axis is defined by a beam steering device located at a first end of the body and optically coupled to the first port, and a beam coupler located at a second end of the body and optically coupled to the second port.

[0188] 29. A method comprising:

[0189] measuring, at each of a plurality of different regions of a body of a gas discharge table of the light source, a physical aspect of the body at that region;

[0190] measuring one or more performance parameters of a light beam generated from the gas discharge station;

[0191] analyzing the measured physical aspects to determine a position of the body in an XYZ coordinate system defined by an X-axis defined by the plurality of apertures associated with the gas discharge table;

[0192] analyzing the determined position of the body of the gas discharge table;

[0193] analyzing one or more measured performance parameters;

[0194] determining whether a modification to the position of the body of the gas discharge table will improve one or more of the measured performance parameters; and

[0195] If it is determined that modification of the position of the body of the gas discharge table will improve one or more of the measured performance parameters, the position of the body of the gas discharge table is modified.

[0196] 30. The method of clause 29, wherein modifying the position of the body of the gas discharge table is based on an analysis of the determined position of the body of the gas discharge table.

[0197] 31. The method of clause 29, wherein determining the position of the body of the gas discharge table comprises one or more of determining a translation of the body of the gas discharge table from an X-axis and a rotation of the body of the gas discharge table from an X-axis.

[0198] 32. The method of clause 31, wherein translating the body of the gas discharge table from the X-axis comprises one or more of: translating the body of the gas discharge table along the X-axis, translating the body of the gas discharge table along the Y-axis perpendicular to the Y-axis, and translating the body of the gas discharge table along the Z-axis perpendicular to the X-axis and the Y-axis.

[0199] 33. The method of claim 31, wherein rotating the body of the gas discharge table from the X-axis comprises one or more of: rotating the body of the gas discharge table around the X-axis, rotating the body of the gas discharge table around a Y-axis perpendicular to the X-axis, and / or rotating the body of the gas discharge table along a Z-axis perpendicular to the X-axis and the Y-axis.

[0200] 34. The method of clause 29, wherein measuring the physical aspect of the body at the region comprises measuring a distance from the sensor to the region of the body of the gas discharge table.

[0201] 35. The method of clause 29, wherein determining whether a modification to the position of the body of the gas discharge table will improve one or more of the measured performance parameters comprises determining a position of the body of the gas discharge table that optimizes a plurality of the measured performance parameters.

[0202] 36. The method of clause 29 further comprises generating a light beam from a gas discharge station, comprising forming a resonator defined by a beam coupler on one side of the body and a beam steering device on the other side of the body, the beam coupler and the beam steering device defining an X-axis and generating energy within a gain medium in a cavity defined by the body.

[0203] 37. The method of clause 29, wherein measuring one or more performance parameters of the light beam comprises measuring a plurality of performance parameters.

[0204] 38. A method according to clause 37, wherein measuring multiple performance parameters includes measuring two or more of the following: a repetition rate of the pulsed beam generated by the light source, an energy of the pulsed beam, a duty cycle of the pulsed beam, and / or a spectral characteristic of the pulsed beam.

[0205] 39. The method according to clause 37, further comprising:

[0206] determining an optimal position of the body of the gas discharge table that provides an optimal set of performance parameter values ​​for the light beam; and

[0207] The position of the main body of the gas discharge station is modified to the optimal position.

[0208] 40. A measurement kit comprising:

[0209] a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a three-dimensional body relative to the sensor;

[0210] a measurement system comprising a plurality of measurement devices, each measurement device configured to measure a performance parameter of the light beam;

[0211] an actuation system comprising a plurality of actuators configured to be physically coupled to a three-dimensional body; and

[0212] A control device configured to communicate with the sensor system, the measurement system, and the actuation system, the control device comprising:

[0213] a sensor processing module configured to interface with the sensor system and receive sensor information from the sensor system;

[0214] a measurement processing module configured to interface with the measurement system and receive measurement information from the measurement system;

[0215] an actuator processing module configured to interface with the actuation system; and

[0216] A light source processing module is configured to interface with a gas discharge stage having a three-dimensional body.

[0217] 41. A measurement kit according to claim 40, wherein the control device includes an analysis and processing module that communicates with the sensor processing module, the measurement processing module, the actuator processing module, and the light source processing module, and is configured to instruct the light source processing module to adjust one or more characteristics of the gas discharge table when in use, and analyze the sensor information and measurement information based on the adjusted characteristics of the gas discharge table and determine instructions to the actuator processing module.

[0218] 42. The metrology kit of clause 40, wherein the metrology kit is modular such that it is configured to be operatively connected and disconnected with one or more gas discharge stations, each gas discharge station comprising a respective three-dimensional body defining a cavity that generates a respective light beam.

[0219] Other implementations are within the scope of the following claims.

Claims

1. A light source device, comprising: A gas discharge station, comprising a three-dimensional body, the three-dimensional body defining a cavity, the cavity configured to interact with an energy source, the body comprising at least two ports, the at least two ports being capable of transmitting a light beam having a wavelength in the ultraviolet range; a sensor system including a plurality of sensors, each sensor configured to measure a physical aspect of a respective different region of the body of the gas discharge table relative to the sensor; as well as a control device in communication with the sensor system and configured to analyze the physical aspects measured from the sensors to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis, wherein the X-axis is defined by the geometry of the gas discharge table; Wherein each sensor is configured to measure a distance from the sensor to the body of the gas discharge station as the physical aspect of the body of the gas discharge station relative to the sensor.

2. The light source apparatus of claim 1 , further comprising a measurement system configured to measure one or more performance parameters of the light beam generated from the gas discharge stage; wherein the control device is in communication with the measurement system and is further configured to: analyzing the position of the body of the gas discharge table in the XYZ coordinate system and the measured one or more performance parameters of the light beam; and A determination is made as to whether a modification to the position of the body of the gas discharge table will improve one or more of the measured performance parameters.

3. The light source apparatus of claim 2, further comprising an actuation system physically coupled to the body of the gas discharge stage and configured to adjust a position of the body of the gas discharge stage; Wherein the control device is in communication with the actuation system and is configured to provide a signal to the actuation system based on a determination as to whether the position of the body of the gas discharge table should be modified.

4. The light source apparatus of claim 3, wherein the actuation system comprises a plurality of actuators, each actuator being configured to be in physical communication with a region of the body of the gas discharge table.

5. The light source device according to claim 1, wherein the control device is configured to determine the position of the body of the gas discharge table in the XYZ coordinate system by determining one or more of the following items: the translation of the body of the gas discharge table from the X-axis and / or the rotation of the body of the gas discharge table from the X-axis.

6. The light source device according to claim 5, wherein: The translation of the body of the gas discharge table from the X-axis includes one or more of: translation of the body of the gas discharge table along the X-axis, translation of the body of the gas discharge table along a Y-axis perpendicular to the X-axis, and / or translation of the body of the gas discharge table along a Z-axis perpendicular to the X-axis and the Y-axis; and The rotation of the body of the gas discharge table from the X-axis includes one or more of the following: rotation of the body of the gas discharge table around the X-axis, rotation of the body of the gas discharge table around the Y-axis perpendicular to the X-axis, and / or rotation of the body of the gas discharge table along the Z-axis perpendicular to the X-axis and the Y-axis.

7. The light source device according to claim 1, wherein: The gas discharge stage includes a beam steering device at a first end of the body and a beam coupler at a second end of the body, the beam steering device and the beam coupler intersecting the X-axis such that a light beam generated in the gas discharge stage interacts with the beam coupler and the beam steering device; as well as When the determined position of the body of the gas discharge table in the XYZ coordinate system defined by the X axis is within an acceptable position range, the energy source supplies energy to the cavity of the body and the beam steering device and the beam coupler are aligned to generate the light beam.

8. The light source device according to claim 7, wherein the light beam is an amplified light beam having a wavelength in the ultraviolet range.

9. The light source device according to claim 7, wherein: The beam steering device is an optical module comprising a plurality of optical devices for selecting and adjusting the wavelength of the light beam, and the beam coupler comprises a partially reflecting mirror; and / or The beam steering device comprises an optics arrangement configured to receive the light beam exiting the body of the gas discharge table through a first port and redirect the light beam so that the light beam re-enters the body of the gas discharge table through the first port.

10. The light source device according to claim 1, wherein each sensor is configured to be fixedly mounted relative to the body of the gas discharge table; and when each sensor is fixedly mounted relative to the body of the gas discharge table, the sensor is configured to be fixed at a distance from another sensor.

11. The light source device according to claim 1, further comprising: a second gas discharge station optically connected in series with the gas discharge station; the second gas discharge station having a second three-dimensional body, the second three-dimensional body defining a second cavity, the second cavity being configured to interact with an energy source, the second three-dimensional body including at least two ports, the at least two ports being capable of transmitting a light beam having a wavelength in the ultraviolet range; as well as a second plurality of sensors, each sensor of the second plurality of sensors being configured to measure a physical aspect of a respective different region of the second three-dimensional body relative to the sensor; wherein the control device is in communication with the second plurality of sensors and is configured to analyze the physical aspects measured from the second plurality of sensors to determine a position of the second three-dimensional body relative to a second XYZ coordinate system defined by a second X-axis passing through the at least two ports of the second three-dimensional body.

12. The light source apparatus of claim 1, wherein each sensor comprises a non-contact sensor.

13. The light source device according to claim 1, wherein the X-axis is defined by a beam steering device and a beam coupler, wherein the beam steering device is located at the first end of the body and optically coupled to the first port, and the beam coupler is located at the second end of the body and optically coupled to the second port.

14. A measuring device comprising: a sensor system comprising a plurality of sensors, each sensor configured to measure a physical aspect of a body of a gas discharge station relative to the sensor, wherein each sensor is configured to measure a distance from the sensor to the body of the gas discharge station as the physical aspect of the body of the gas discharge station relative to the sensor; a measurement system configured to measure one or more performance parameters of a light beam generated from the gas discharge station; an actuation system including a plurality of actuators, each actuator configured to be physically coupled to a different region of the body of the gas discharge table, the plurality of actuators working together to adjust a position of the body of the gas discharge table; as well as a control device in communication with the sensor system, the measurement system, and the actuation system, and configured to: analyzing the physical aspect measured from the sensor to determine a position of the body of the gas discharge table in an XYZ coordinate system defined by an X-axis defined by the gas discharge table; analyzing the position of the body of the gas discharge station; analyzing the measured one or more performance parameters; and A signal is provided to the actuation system to modify the position of the body of the gas discharge table based on the analysis of the position of the body of the gas discharge table and the measured one or more performance parameters.

15. The measurement device of claim 14, wherein the sensors are separated from each other and positioned relative to the body of the gas discharge table.

16. The measuring device according to claim 14, wherein the control device is configured to provide the signal to the actuation system to modify the position of the body of the gas discharge table based on the analysis of the position of the body of the gas discharge table and the one or more performance parameters measured, by determining the position of the body of the gas discharge table that optimizes multiple performance parameters of the light beam.

17. The metrology apparatus of claim 14, wherein the X-axis is defined by a beam steering device and a beam coupler, the beam steering device being located at a first end of the body and optically coupled to a first port, and the beam coupler being located at a second end of the body and optically coupled to a second port.

18. A measurement method, comprising: measuring, at each of a plurality of different regions of a body of a gas discharge table of a light source, a physical aspect of the body at said region; measuring one or more performance parameters of a light beam generated from the gas discharge station; analyzing the measured physical aspects to determine a position of the body in an XYZ coordinate system defined by an X-axis defined by a plurality of apertures associated with the gas discharge table; analyzing the determined position of the body of the gas discharge station; analyzing the measured one or more performance parameters; determining whether a modification to the position of the body of the gas discharge station will improve one or more of the measured performance parameters; as well as modifying the position of the body of the gas discharge table if it is determined that modification of the position of the body of the gas discharge table will improve one or more of the measured performance parameters; Wherein measuring the physical aspect of the body at the region comprises measuring a distance from a sensor to the region of the body of the gas discharge station.

19. The method of claim 18, wherein modifying the position of the body of the gas discharge table is based on the analysis of the determined position of the body of the gas discharge table.

20. The method of claim 18, wherein: Determining the position of the body of the gas discharge table includes determining one or more of: a translation of the body of the gas discharge table from the X-axis and / or a rotation of the body of the gas discharge table from the X-axis; Translating the body of the gas discharge stage from the X-axis comprises one or more of: translating the body of the gas discharge stage along the X-axis, translating the body of the gas discharge stage along a Y-axis perpendicular to the X-axis, and / or translating the body of the gas discharge stage along a Z-axis perpendicular to the X-axis and the Y-axis; and Rotating the body of the gas discharge table from the X-axis includes one or more of the following: rotating the body of the gas discharge table around the X-axis, rotating the body of the gas discharge table around a Y-axis perpendicular to the X-axis, and / or rotating the body of the gas discharge table along a Z-axis perpendicular to the X-axis and the Y-axis.

21. The method of claim 18, wherein determining whether the modification to the position of the body of the gas discharge station will improve one or more of the measured performance parameters comprises: A position of the body of the gas discharge station that optimizes a plurality of measured performance parameters is determined.

22. The method of claim 18, further comprising: determining an optimal position of the body of the gas discharge table, the optimal position providing an optimal set of one or more performance parameter values ​​of the light beam; as well as The position of the body of the gas discharge station is modified to the optimal position.

23. A measurement kit, comprising: a sensor system comprising a plurality of sensors, each sensor being configured to measure a physical aspect of a three-dimensional body relative to the sensor, wherein each sensor is configured to measure a distance from the sensor to the three-dimensional body as the physical aspect of the three-dimensional body relative to the sensor; a measurement system including a plurality of measurement devices, each measurement device configured to measure a performance parameter of the light beam; an actuation system comprising a plurality of actuators configured to be physically coupled to the three-dimensional body; as well as a control device configured to communicate with the sensor system, the measurement system and the actuation system, the control device comprising: a sensor processing module configured to interface with the sensor system and receive sensor information from the sensor system; a measurement processing module configured to interface with the measurement system and receive measurement information from the measurement system; an actuator processing module configured to interface with the actuation system; and A light source processing module is configured to interface with a gas discharge stage having a three-dimensional body.

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