Optical measurement device and optical measurement method

Abstract

An optical measurement device and an optical measurement method capable of more accurately measuring the transmittance or reflectance of a measurement object. The optical measurement device includes: an irradiation optical system that linearly irradiates an object area with irradiation light including a plurality of wavelengths; a light receiving optical system that receives measurement light that is transmitted light or reflected light generated from the object area by irradiating the object area with the irradiation light; and a calculation unit that generates a light receiving spectrum based on the light receiving result of the measurement light in the light receiving optical system and calculates the transmittance or reflectance of the measurement object disposed in the measurement area at each wavelength based on the generated light receiving spectrum. The calculation unit calculates the transmittance spectrum or reflectance spectrum of the measurement object based on a first reference spectrum based on the measurement light generated from the measurement area when there is no measurement object, a second reference spectrum based on the measurement light generated from a non-measurement area, and a measurement spectrum based on the measurement light generated from the measurement area when there is a measurement object.

Description

Technical Field

[0001] The present invention relates to an optical measurement device and an optical measurement method. Background Art

[0002] In recent years, the following technique has been known: based on transmitted light or reflected light generated from a measurement object by irradiating the measurement object with linear light, the transmittance or reflectance of the measurement object is measured, and thereby, for example, the film thickness distribution of the measurement object is measured.

[0003] For example, Patent Document 1 (Japanese Patent Application Laid-Open No. 2017-146288) discloses the following film thickness distribution measurement method. That is, a film thickness distribution measurement method for measuring the film thickness distribution of a film of a coated wafer having at least one film formed on the surface of a substrate by reflection spectroscopy using a linear light source, the film thickness distribution measurement method including: using a linear light source having a light source longer than the diameter of the coated wafer as the linear light source, and when detecting reflected light by scanning the surface of the coated wafer with linear light irradiated from the linear light source, simultaneously irradiating a part of the linear light to a reference and detecting its reflected light; a step of correcting the intensity of the reflected light reflected from the coated wafer using the intensity of the reflected light reflected from the reference; and a step of calculating the film thickness distribution based on the intensity of the reflected light of the coated wafer after the correction.

[0004] In addition, Patent Document 2 (Japanese Patent Application Laid-Open No. 2015-17804) discloses the following film thickness distribution measurement method. That is, a film thickness distribution measurement method for measuring the film thickness distribution of a film on a coated wafer having at least one film formed on the surface of a substrate by reflection spectroscopy using a linear light source, the film thickness distribution measurement method having the following first, second, and third steps of correcting the incident angle at each point in the direction of the linear light source on the coated wafer and a fourth step of measuring the film thickness distribution of the film on the coated wafer using the corrected incident angle. In the first step, a coated wafer having a film with a known film thickness is used, the reflectance at the center of the coated wafer is measured, and the corrected incident angle at the wafer center is calculated based on the measured reflectance and the known film thickness. In the second step, a coated wafer to be measured for the film thickness distribution having a film of the same material as the film on the coated wafer used in the first step and the corrected incident angle at the wafer center calculated above are used, and while moving the coated wafer in a direction within the wafer plane perpendicular to the linear light source, the film thickness distribution in the region along the wafer center line at the center position of the linear light source is measured. In the third step, after rotating the coated wafer after the second step by 90°, the reflectance distribution in the region measured in the second step is measured at each point in the direction of the linear light source, and the corrected incident angle at each point in the direction of the linear light source is calculated based on the measured reflectance distribution and the film thickness distribution measured in the second step.

[0005] There is a need for a technique that is better than the techniques of Patent Document 1 and Patent Document 2 and can measure the transmittance or reflectance of a measurement object more accurately.

[0006] Prior Art Documents

[0007] Patent Documents

[0008] Patent Document 1: Japanese Patent Application Laid-Open No. 2017-146288

[0009] Patent Document 2: Japanese Patent Application Laid-Open No. 2015-17804 Summary of the Invention

[0010] Problems to be Solved by the Invention

[0011] The present invention is an invention completed to solve the above problems, and an object thereof is to provide an optical measurement device and an optical measurement method capable of measuring the transmittance or reflectance of a measurement object more accurately.

[0012] Solutions to the Problems

[0013] (1) To solve the above problems, an optical measurement device according to one aspect of the present invention includes: an irradiation optical system that linearly irradiates an object region with irradiation light including a plurality of wavelengths, the object region including a measurement region and a non-measurement region that is a region different from the measurement region; a light-receiving optical system that receives measurement light that is transmitted light or reflected light generated from the object region by irradiating the object region with the irradiation light; and a calculation unit that generates, based on the light-receiving result of the measurement light in the light-receiving optical system, a light-receiving spectrum that is a relationship between the wavelength and the intensity of the measurement light at each position in the object region, and calculates, based on the generated light-receiving spectrum, the transmittance or reflectance of the measurement object disposed in the measurement region at each wavelength. The calculation unit calculates the transmittance spectrum or reflectance spectrum of the measurement object based on a first reference spectrum, a second reference spectrum, and a measurement spectrum. The first reference spectrum is based on the light-receiving spectrum of the measurement light generated from the measurement region when the measurement object does not exist in the measurement region. The second reference spectrum is based on the light-receiving spectrum of the measurement light generated from the non-measurement region. The measurement spectrum is based on the light-receiving spectrum of the measurement light generated from the measurement region when the measurement object exists in the measurement region.

[0014] Thus, by calculating the transmittance spectrum or reflectance spectrum of the measurement object based on the first reference spectrum, the second reference spectrum, and the measurement spectrum, where the first reference spectrum is based on the spectrum of the measurement light from the measurement region when the measurement object does not exist in the measurement region, the second spectrum is based on the spectrum of the measurement light from the non-measurement region, and the measurement spectrum is based on the spectrum of the measurement light from the measurement region when the measurement object exists in the measurement region, with such a configuration, for example, temporal variations in the irradiation light intensity and light-receiving sensitivity caused by the time difference before and after the measurement object is disposed in the measurement region, and deviations in the irradiation light intensity and light-receiving sensitivity caused by different irradiation positions between the measurement region and the non-measurement region can be taken into account, and the transmittance spectrum or reflectance spectrum can be calculated based on the measurement spectrum. Therefore, the transmittance spectrum or reflectance spectrum of the measurement object can be measured more accurately.

[0015] (2) Preferably, the second reference spectrum is a spectrum pre-generated by the calculation unit based on the measurement light generated from the non-measurement region when the measurement object does not exist in the measurement region. The calculation unit further calculates the transmittance spectrum or the reflectance spectrum of the measurement object based on a reference spectrum, which is based on the light-receiving spectrum of the measurement light generated from the non-measurement region when the measurement object exists in the measurement region.

[0016] According to this configuration, for example, based on the first reference spectrum, the second reference spectrum, and the reference spectrum, it is possible to more accurately estimate the received light spectrum generated on the assumption that there is no measurement object in the measurement region at the time when the measurement spectrum is to be generated, and based on the estimated received light spectrum, calculate the transmittance spectrum or the reflectance spectrum more accurately.

[0017] (3) More preferably, the reference spectrum and the measurement spectrum are respectively spectra generated by the calculation unit based on the measurement light generated from the non-measurement region and the measurement light generated from the measurement region received by the light-receiving optical system at the same time when the measurement object exists in the measurement region.

[0018] According to this configuration, for example, it is possible to reduce the influence of temporal variations in the irradiation light intensity and the light-receiving sensitivity caused by the time difference between the time when the reference spectrum is generated and the time when the measurement spectrum is generated. Therefore, it is possible to calculate the transmittance spectrum or the reflectance spectrum more accurately using such a reference spectrum.

[0019] (4) Preferably, the first reference spectrum and the second reference spectrum are respectively spectra generated by the calculation unit based on the measurement light generated from the measurement region and the measurement light generated from the non-measurement region received by the light-receiving optical system at the same time before the measurement object exists in the measurement region.

[0020] According to this configuration, for example, it is possible to reduce the influence of temporal variations in the irradiation light intensity and the light-receiving sensitivity caused by the time difference between the time when the first reference spectrum is generated and the time when the second reference spectrum is generated. Therefore, it is possible to calculate the transmittance spectrum or the reflectance spectrum more accurately using such a first reference spectrum and a second reference spectrum.

[0021] (5) Preferably, the calculation unit calculates the transmittance spectrum or the reflectance spectrum of the measurement object based on a plurality of the first reference spectra, the second reference spectra, and a plurality of the measurement spectra respectively based on the measurement light generated from a plurality of positions in the measurement region when there is no measurement object in the measurement region.

[0022] According to this configuration, it is possible to measure the transmittance distribution or the reflectance distribution of the measurement object in the measurement region.

[0023] (6) To solve the above problems, an optical measurement method according to one aspect of the present invention includes: a step of linearly irradiating an object region with irradiation light including a plurality of wavelengths, where the object region includes a measurement region and a non-measurement region that is a region different from the measurement region; a step of receiving measurement light that is transmitted light or reflected light generated from the object region by irradiating the object region with the irradiation light; and a step of generating, based on the light reception result of the measurement light, a light reception spectrum representing the relationship between the wavelength and the intensity of the measurement light at each position in the object region, and calculating, based on the generated light reception spectrum, the transmittance or reflectance of the measurement object disposed in the measurement region at each wavelength. In the step of calculating the transmittance or the reflectance, based on a first reference spectrum, a second reference spectrum, and a measurement spectrum, a transmittance spectrum or a reflectance spectrum of the measurement object is calculated. The first reference spectrum is based on the light reception spectrum of the measurement light generated from the measurement region when the measurement object does not exist in the measurement region, the second reference spectrum is based on the light reception spectrum of the measurement light generated from the non-measurement region, and the measurement spectrum is based on the light reception spectrum of the measurement light generated from the measurement region when the measurement object exists in the measurement region.

[0024] Thus, by calculating the transmittance spectrum or the reflectance spectrum of the measurement object based on the first reference spectrum, the second reference spectrum, and the measurement spectrum, where the first reference spectrum is based on the spectrum of the measurement light from the measurement region when the measurement object does not exist in the measurement region, the second spectrum is based on the spectrum of the measurement light from the non-measurement region, and the measurement spectrum is based on the spectrum of the measurement light from the measurement region when the measurement object exists in the measurement region, according to such a method, for example, temporal changes in the irradiation light intensity and the light reception sensitivity caused by the time difference before and after the measurement object is disposed in the measurement region, and deviations in the irradiation light intensity and the light reception sensitivity caused by different irradiation positions between the measurement region and the non-measurement region can be taken into account, and the transmittance spectrum or the reflectance spectrum is calculated based on the measurement spectrum. Therefore, the transmittance spectrum or the reflectance spectrum of the measurement object can be measured more accurately.

[0025] Advantages of the Invention

[0026] According to the present invention, the transmittance or reflectance of the measurement object can be measured more accurately. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 FIG. is an example showing the configuration of an optical measurement apparatus according to a first embodiment of the present invention.

[0028] Figure 2This is a diagram showing an example of the configuration of the optical measurement device according to the first embodiment of the present invention.

[0029] Figure 3 This is a diagram showing the configuration of the light-receiving optical system in the optical measurement device according to the first embodiment of the present invention.

[0030] Figure 4 This is a diagram showing the configuration of the processing device in the optical measurement device according to the first embodiment of the present invention.

[0031] Figure 5 This is a diagram showing an example of the first reference spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0032] Figure 6 This is a diagram showing an example of the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0033] Figure 7 This is a diagram showing another example of the first reference spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0034] Figure 8 This is a diagram showing another example of the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0035] Figure 9 This is a diagram showing the intensity ratio of the first reference spectrum and the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0036] Figure 10 This is a diagram showing the transmittance spectrum generated by the optical measurement device according to the first embodiment of the present invention.

[0037] Figure 11 This is a flowchart showing an example of the workflow for calculating the transmittance spectrum of the measurement object in the optical measurement device according to the first embodiment of the present invention.

[0038] Figure 12 This is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention.

[0039] Figure 13 This is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention.

[0040] Figure 14 This is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention.

[0041] Figure 15This is a diagram showing an example of the configuration of an optical measurement device according to a modified example of the second embodiment of the present invention.

[0042] Description of Reference Numerals

[0043] 10: Irradiation optical system;

[0044] 20: Light-receiving optical system;

[0045] 30: Processing device;

[0046] 31: Receiving unit;

[0047] 32: Calculation unit;

[0048] 33: Storage unit;

[0049] 101, 102: Optical measurement devices. Detailed Embodiment

[0050] Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the same or corresponding parts in the drawings are denoted by the same reference numerals and their description is omitted. In addition, at least a part of the embodiments described below can be arbitrarily combined.

[0051] <First Embodiment>

[0052] [Optical Measurement Device]

[0053] Figure 1 This is a diagram showing an example of the configuration of the optical measurement device according to the first embodiment of the present invention.

[0054] Refer to Figure 1 , the optical measurement device 101 includes an irradiation optical system 10, a light-receiving optical system 20, a processing device 30, a base member 4, and a support member 6. The base member 4 and the support member 6 fix the light-receiving optical system 20. It should be noted that the optical measurement device 101 is not limited to being configured to include the base member 4 and the support member 6, and may also be configured to include other members for fixing the light-receiving optical system 20 instead of or in addition to the base member 4 and the support member 6.

[0055] Figure 2 This is a diagram showing an example of the configuration of the optical measurement device according to the first embodiment of the present invention. Figure 2 Shows a state in which a measurement object S, which is the object to be measured of the optical measurement device 101, is arranged.

[0056] Refer to Figure 2 , the optical measurement device 101 measures the transmittance of a measurement object S such as a thin film arranged in the measurement region R1.

[0057] For example, the optical measurement device 101 automatically measures the transmittance spectra at a plurality of measurement positions M on the measurement object S conveyed through the measurement region R1 on the production line of the measurement object S. That is, the optical measurement device 101 performs in-line measurement of the transmittance spectra at a plurality of measurement positions M on the measurement object S.

[0058] More specifically, the optical measurement device 101 periodically performs transmittance measurement, for example, and thereby calculates the transmittance at each wavelength at the measurement position M of the conveyed measurement object S.

[0059] [Irradiation optical system]

[0060] The irradiation optical system 10 irradiates the object region R with irradiation light including a plurality of wavelengths in a linear shape. The object region R includes the measurement region R1 and a non-measurement region R2 that is a region different from the measurement region R1.

[0061] More specifically, the irradiation optical system 10 irradiates the object region R with irradiation light. The object region R includes the measurement region R1 that is a linear region and the non-measurement region R2 adjacent to the measurement region R1 at the end in the long dimension direction of the measurement region R1.

[0062] The irradiation optical system 10 includes a light source 11 and a linear optical waveguide 12.

[0063] The light source 11 emits light including a plurality of wavelengths. The spectrum of the light emitted by the light source 11 may be a continuous spectrum or a line spectrum. The wavelength of the light emitted by the light source 11 is set according to the range of the wavelength information to be obtained from the measurement object S, etc. The light source 11 is, for example, a halogen lamp.

[0064] The linear optical waveguide 12 receives the light emitted from the light source 11 and emits the received light from a linear opening portion, thereby irradiating the object region R with irradiation light in a linear shape. A diffusion member for suppressing uneven light quantity, etc. is disposed on the emission surface of the irradiation light in the linear optical waveguide 12. The linear optical waveguide 12 is disposed directly below the surface for conveying the measurement object S.

[0065] For example, when the irradiation optical system 10 performs in-line measurement of the transmittance spectrum of the measurement object S, it irradiates the object region R with irradiation light at the measurement time, and on the other hand, stops irradiating the object region R with irradiation light at times other than the measurement time. It should be noted that the irradiation optical system 10 may also be configured to continuously irradiate the object region R with irradiation light regardless of the measurement time.

[0066] [Light receiving optical system]

[0067] The light-receiving optical system 20 receives measurement light, which is transmitted light generated from the object region R due to the irradiation of the irradiation light onto the object region R.

[0068] The light-receiving optical system 20 includes an objective lens 21, an imaging spectrometer 22, and a photographing unit 23.

[0069] The light-receiving optical system 20 is disposed at a position facing the linear optical waveguide 12 with the measurement object S therebetween.

[0070] The light-receiving optical system 20 receives, as measurement light, the transmitted light that penetrates the object region R among the irradiation light emitted from the linear optical waveguide 12. Specifically, the light-receiving optical system 20 receives the transmitted light of the measurement object S disposed in the measurement region R1 among the irradiation light emitted from the linear optical waveguide 12.

[0071] Figure 3 FIG. is a diagram showing the configuration of the light-receiving optical system in the optical measurement device according to the first embodiment of the present invention.

[0072] Refer to Figure 3 , the imaging spectrometer 22 has a slit 221, a first lens 222, a diffraction grating 223, and a second lens 224. The slit 221, the first lens 222, the diffraction grating 223, and the second lens 224 are arranged in this order from the objective lens 21 side.

[0073] The photographing unit 23 is constituted by an imaging element 231 having a two-dimensional light-receiving surface. Such an imaging element 231 is, for example, a CCD (Charge Coupled Device) image sensor or a CMOS (Complementary Metal Oxide Semiconductor) image sensor. The photographing unit 23 generates a two-dimensional image P based on the measurement light received from the imaging spectrometer 22. The two-dimensional image P generated by the photographing unit 23 includes wavelength information and position information.

[0074] The objective lens 21 converges the measurement light from the object region R and guides it to the imaging spectrometer 22.

[0075] The slit 221 in the imaging spectrometer 22 shapes the light beam cross-section of the measurement light incident on itself via the objective lens 21 into a specified shape. The length in the long dimension direction of the slit 221 is set to a length corresponding to the length of the object region R, and the width in the short dimension direction of the slit 221 is set according to the resolution of the diffraction grating 223 or the like.

[0076] The first lens 222 in the imaging spectrometer 22 converts the measurement light passing through the slit 221 into parallel light and guides the converted measurement light to the diffraction grating 223. The first lens 222 is, for example, a collimating lens.

[0077] The diffraction grating 223 in the imaging spectrometer 22 performs wavelength expansion on the measurement light in a direction orthogonal to the long dimension direction of the measurement light. More specifically, the diffraction grating 223 performs wavelength expansion, i.e., spectral splitting, on the linear measurement light passing through the slit 221 in a direction orthogonal to the light ray direction.

[0078] The second lens 224 in the imaging spectrometer 22 forms the measurement light that has undergone wavelength expansion by the diffraction grating 223 as a two-dimensional optical spectrum reflecting wavelength information and position information on the light-receiving surface of the imaging element 231 in the imaging unit 23.

[0079] The imaging unit 23 transmits the two-dimensional image data representing the two-dimensional image P formed on the light-receiving surface of the imaging element 231 to the processing device 30 as the light-receiving result of the light-receiving optical system 20.

[0080] Hereinafter, the D1 direction in the two-dimensional image P Figure 3 is referred to as the "position direction", and the D2 direction, which is a direction orthogonal to the position direction, is referred to as the "wavelength direction". Each point in the position direction corresponds to each measurement point X on the object region R. Each point in the wavelength direction corresponds to the wavelength of the measurement light from the corresponding measurement point X. In addition, the light-receiving surface of the imaging element 231 has m channels in the resolution in the wavelength direction and n channels in the resolution in the position direction. n is, for example, 1200.

[0081] [Processing Device]

[0082] Figure 4 It is a diagram showing the configuration of the processing device in the optical measurement device according to the first embodiment of the present invention.

[0083] Refer to Figure 4 , the processing device 30 includes a receiving unit 31, a calculation unit 32, and a storage unit 33. The receiving unit 31 and the calculation unit 32 are implemented by processors such as a CPU (Central Processing Unit) and a DSP (Digital Signal Processor), for example. The storage unit 33 is a non-volatile memory, for example.

[0084] The receiving unit 31 receives the two-dimensional image data from the imaging unit 23 in the light-receiving optical system 20 and stores the received two-dimensional image data in the storage unit 33.

[0085] Based on the light reception result of the measurement light of the light receiving optical system 20, the calculation unit 32 generates a light reception spectrum S(λ) that represents the relationship between the wavelength λ and the intensity of the measurement light at each position in the object region R. Then, based on the generated light reception spectrum S(λ), the calculation unit 32 calculates the transmittance of the measurement object S disposed in the measurement region R1 at each wavelength.

[0086] More specifically, the calculation unit 32 generates the light reception spectrum S(λ) based on the two-dimensional image data stored in the storage unit 33, and calculates the transmittance of the measurement object S at each wavelength λ based on the generated light reception spectrum S(λ).

[0087] The calculation unit 32 calculates the transmittance spectrum of the measurement object S based on a first reference spectrum St1(λ), a second reference spectrum St2(λ), and a measurement spectrum Stm(λ). The first reference spectrum St1(λ) is based on the light reception spectrum S(λ) of the measurement light generated from the measurement region R1 when the measurement object S is not present in the measurement region R1. The second reference spectrum St2(λ) is based on the light reception spectrum S(λ) of the measurement light generated from the non-measurement region R2. The measurement spectrum Stm(λ) is based on the light reception spectrum S(λ) of the measurement light generated from the measurement region R1 when the measurement object S is present in the measurement region R1.

[0088] Figure 5 is a diagram showing an example of the first reference spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 5 the horizontal axis represents the wavelength, and the vertical axis represents the intensity. Figure 5 shows the first reference spectrum St1(λ, X) based on the transmitted light generated from each of the n measurement points X on the measurement region R1.

[0089] Refer to Figure 5 and the calculation unit 32 generates a plurality of first reference spectra St1(λ, X) based on the measurement light generated from a plurality of positions, i.e., measurement points X, in the measurement region R1 when the measurement object S is not present in the measurement region R1.

[0090] Then, the calculation unit 32 calculates the transmittance spectrum of the measurement object S based on the generated plurality of first reference spectra St1(λ, X), the second reference spectrum St2(λ), and a plurality of measurement spectra Stm(λ, X) respectively based on the measurement light generated from the plurality of measurement points X.

[0091] For example, the calculation unit 32 calculates the transmittance distribution of the measurement position M of the measurement object S based on the first reference spectrum St1(λ, X), the second reference spectrum St2(λ), and the measurement spectrum Stm(λ, X).

[0092] More specifically, the calculation unit 32 uses the first reference spectrum St1(λ, X) and the second reference spectrum St2(λ) as reference data, and calculates the transmittance distribution of the measurement position M of the measurement object S based on the reference data and the measurement spectrum Stm(λ, X).

[0093] Figure 6 FIG. is a diagram showing an example of the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 6 the horizontal axis is the wavelength and the vertical axis is the intensity. Figure 6 The second reference spectrum St2(λ) based on the transmitted light generated from the non-measurement region R2 is shown.

[0094] For example, the second reference spectrum St2(λ) is a spectrum pre-generated by the calculation unit 32 based on the measurement light generated from the non-measurement region R2 when the measurement object S is not present in the measurement region R1.

[0095] For example, the first reference spectrum St1(λ, X) and the second reference spectrum St2(λ) are spectra respectively generated by the calculation unit 32 based on the measurement light generated from the measurement region R1 and the measurement light generated from the non-measurement region R2 received by the light receiving optical system 20 at the same time before the measurement object S is present in the measurement region R1.

[0096] More specifically, the first reference spectrum St1(λ, X) and the second reference spectrum St2(λ) are spectra respectively generated by the calculation unit 32 in a state where the measurement object S is not present in the measurement region R1, based on the transmitted light from the measurement region R1 and the transmitted light from the non-measurement region R2 received by the light receiving optical system 20 through the irradiation of the irradiation light to the object region R by the irradiation optical system 10.

[0097] For example, before starting the online measurement of the transmittance distribution of the measurement object S and in a state where the measurement object S is not arranged in the measurement region R1, the calculation unit 32 generates the first reference spectrum St1(λ, X) and the second reference spectrum St2(λ) based on the transmitted light from the measurement region R1 and the transmitted light from the non-measurement region R2 received by the light receiving optical system 20 at the same time through the irradiation of the irradiation light to the object region R by the irradiation optical system 10.

[0098] Here, the received spectrum S(λ) generated by the calculation unit 32 is affected by the deviation of the irradiation light intensity corresponding to the irradiation position of the irradiation light from the irradiation optical system 10 and the deviation of the sensitivity of the light receiving position of the imaging element 231, etc.

[0099] Therefore, referring to Figure 5 and Figure 6, for example, the first reference spectrum St1(λ, x1) and the second reference spectrum St2(λ) are different from each other due to the influence of the deviation of the above-mentioned irradiation light intensity and the deviation of the above-mentioned sensitivity, etc.

[0100] In addition, the intensity of the irradiation light from the irradiation optical system 10 and the light reception sensitivity in the light reception optical system 20 change with time, that is, change temporally.

[0101] Figure 7 It is a diagram showing another example of the first reference spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 7 , the horizontal axis is the wavelength and the vertical axis is the intensity. Figure 7 The dashed line in Figure 5 represents the first reference spectrum St1(λ, x1) corresponding to the measurement point x1 in Figure 7 The solid line in Figure 5 represents the first reference spectrum St1(λ, x1) measured at a time different from the measurement time of the first reference spectrum St1(λ, x1) in

[0102] Figure 8 It is a diagram showing another example of the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 8 , the horizontal axis is the wavelength and the vertical axis is the intensity. Figure 8 The dashed line in Figure 6 represents the second reference spectrum St2(λ) in Figure 8 The solid line in Figure 6 represents the second reference spectrum St2(λ) measured at a time different from the measurement time of the second reference spectrum St2(λ) in

[0103] Referring to Figure 7 , the intensity of the first reference spectrum St1(λ, x1) varies with the measurement time due to the influence of the temporal change of the intensity of the above-mentioned irradiation light and the temporal change of the light reception sensitivity, etc.

[0104] In addition, referring to Figure 8 , the intensity of the second reference spectrum St2(λ) varies with the measurement time due to the influence of the temporal change of the intensity of the above-mentioned irradiation light and the temporal change of the light reception sensitivity, etc.

[0105] Therefore, for example, in the case where a long, strip-shaped measurement object S is conveyed while continuously performing online measurement of the transmittance distribution of the measurement object S over a long period of time, in a method of calculating a transmittance spectrum based on a first reference spectrum St1(λ, X) and a second reference spectrum St2(λ) generated before starting the online measurement and a measurement spectrum Stm(λ, X) generated during the online measurement, sometimes due to the influence of the temporal change in the intensity of the irradiation light, the temporal change in the light-receiving sensitivity, etc., a deviation occurs in the calculated transmittance spectrum.

[0106] Therefore, the calculation unit 32 also calculates the transmittance spectrum of the measurement object S based on a reference spectrum Str(λ), which is a light-receiving spectrum of measurement light generated from the non-measurement region R2 when the measurement object S is present in the measurement region R1.

[0107] More specifically, the calculation unit 32 corrects the reference spectrum Str(λ) using the first reference spectrum St1(λ, X) and the second reference spectrum St2(λ), thereby generating a hypothetical reference spectrum Stv(λ, X) that is a hypothetical reference data in the measurement region R1 taking into account the deviation and variation of the light-receiving spectrum S(λ). Then, the calculation unit 32 calculates the transmittance spectrum of the measurement object S based on the generated hypothetical reference spectrum Stv(λ, X) and the measurement spectrum Stm(λ, X).

[0108] The reference spectrum Str(λ) and the measurement spectrum Stm(λ, X) are, for example, spectra generated by the calculation unit 32 based on the measurement light generated from the non-measurement region R2 and the measurement light generated from the measurement region R1 that are received by the light-receiving optical system 20 at the same time when the measurement object S is present in the measurement region R1.

[0109] More specifically, the reference spectrum Str(λ) and the measurement spectrum Stm(λ, X) are spectra generated by the calculation unit 32 based on the transmitted light from the non-measurement region R2 and the transmitted light from the measurement region R1, which is the measurement object S, that are received by the light-receiving optical system 20 through the irradiation of the irradiation light to the object region R by the irradiation optical system 10 in a state where the measurement object S is present in the measurement region R1.

[0110] For example, the calculation unit 32 generates the reference spectrum Str(λ) and the measurement spectrum Stm(λ, X) based on the transmitted light from the non-measurement region R2 and the transmitted light from the measurement region R1 that are received by the light-receiving optical system 20 at the same time through the irradiation of the irradiation light to the object region R by the irradiation optical system 10 after starting the online measurement of the transmittance distribution of the measurement object S and in a state where the measurement object S is disposed in the measurement region R1.

[0111] Figure 9It is a graph showing the intensity ratio between the first reference spectrum and the second reference spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 9 the horizontal axis is the wavelength and the vertical axis is the intensity ratio.

[0112] For example, the storage unit 33 stores the intensity ratio Pt(λ, X) which is the ratio of the first reference spectrum St1(λ, t, X) to the second reference spectrum St2(λ, t) at each wavelength λ of each measurement point X, and is pre-generated at a certain moment t (t = t0) before the start of on-line measurement. The intensity ratio Pt(λ, X) is represented by the following formula (1).

[0113]

[0114] When the measurement spectrum Stm(λ, t, X) and the reference spectrum Str(λ, t) are generated at a certain moment t (t = t1) after the start of on-line measurement, the calculation unit 32 obtains the intensity ratio Pt(λ, X) in the storage unit 33, and uses the imaginary reference spectrum Stv(λ, t, X) represented by the following formula (2) to calculate the transmittance spectrum ST(λ, t, X) which is represented by the following formula (3) and represents the transmittance of a plurality of measurement points X of the object to be measured S.

[0115] Stv(λ,t,X)=Str(λ,t)×Pt(λ,X)···(2)

[0116]

[0117] Figure 10 It is a graph showing the transmittance spectrum generated by the optical measurement device according to the first embodiment of the present invention. In Figure 10 the horizontal axis is the wavelength and the vertical axis is the transmittance. Figure 10 The solid line in Figure 10 represents the transmittance spectrum ST(λ, t, X) calculated based on the imaginary reference spectrum Stv(λ, t, X) and the measurement spectrum Stm(λ, t, X),

[0118] Referring to Figure 10 , the imaginary reference spectrum Stv(λ, t, X) is used instead of the first reference spectrum St1(λ, t, X), thereby calculating a transmittance spectrum ST(λ, t, X) different from the transmittance spectrum calculated in the case of using the first reference spectrum St1(λ, t, X).

[0119] For example, based on the calculated transmittance spectrum ST(λ, t, X), the calculation unit 32 calculates a film thickness distribution representing the film thickness of each measurement point X of the measurement object S. Alternatively, based on the calculated transmittance spectrum ST(λ, t, X), the calculation unit 32 calculates the hue of the measurement object S.

[0120] [Workflow]

[0121] The optical measurement device according to an embodiment of the present invention includes a computer having a memory, and a CPU or the like in the computer reads and executes a program including a part or all of the steps of the following flowcharts and sequences from the memory. The program of this device can be installed from the outside. The program of this device circulates in a state stored in a recording medium.

[0122] Figure 11 It is a flowchart showing an example of a workflow for calculating the transmittance spectrum of a measurement object in the optical measurement device according to the first embodiment of the present invention.

[0123] Refer to Figure 11 , first, before starting the online measurement of the transmittance distribution of the measurement object S, the optical measurement device 101 irradiates the object area R including the measurement area R1 and the non-measurement area R2 with irradiation light including a plurality of wavelengths in a straight line in a state where the measurement object S is not disposed in the measurement area R1 (step S102).

[0124] Next, the optical measurement device 101 receives measurement light, that is, transmitted light, generated from the object area R by irradiating the object area R with the irradiation light (step S104).

[0125] Next, the optical measurement device 101 generates a first reference spectrum St1(λ, t, X) and a second reference spectrum St2(λ, t) based on the light reception result of the measurement light (step S106).

[0126] Next, the optical measurement device 101 calculates the intensity ratio Pt(λ, X) of the first reference spectrum St1(λ, t, X) to the second reference spectrum St2(λ, t), and stores the calculated intensity ratio Pt(λ, X) in the storage unit 33 (step S108).

[0127] Next, after the start of the online measurement, the optical measurement device 101 waits for the measurement time, that is, the measurement moment (No in step S110), and irradiates the object area R with the irradiation light in a straight line at the measurement moment (Yes in step S110). Specifically, the optical measurement device 101 irradiates the measurement object S and the non-measurement area R2 with the irradiation light in a straight line (step S112).

[0128] Next, the optical measurement device 101 receives measurement light, i.e., transmitted light, generated from the object region R by irradiating the object region R with irradiation light. Specifically, the optical measurement device 101 receives the transmitted light that has passed through the measurement object S and the transmitted light from the non-measurement region R2 (step S114).

[0129] Next, the optical measurement device 101 generates a reference spectrum Str(λ, t) and a measurement spectrum Stm(λ, t, X) based on the light reception result of the measurement light (step S116).

[0130] Next, the optical measurement device 101 calculates the transmittance spectrum ST(λ, t, X) of the measurement position M of the measurement object S based on the imaginary reference spectrum Stv(λ, t, X) calculated using the reference spectrum Str(λ, t) and the intensity ratio Pt(λ, X) and the measurement spectrum Stm(λ, t, X) (step S118).

[0131] Next, the optical measurement device 101 waits for the next measurement time (No in step S110).

[0132] It should be noted that in the optical measurement device 101 according to the embodiment of the present invention, the irradiation optical system 10 is configured to irradiate the object region R including the measurement region R1 and the non-measurement region R2 adjacent to the measurement region R1 at one end in the long dimension direction of the measurement region R1 with irradiation light, but is not limited thereto. The irradiation optical system 10 may also be configured to irradiate the object region R including the measurement region R1, the non-measurement region R2a adjacent to the measurement region R1 at one end in the long dimension direction of the measurement region R1, and the non-measurement region R2b adjacent to the measurement region R1 at the other end in the long dimension direction of the measurement region R1 with irradiation light.

[0133] In this case, for example, the calculation unit 32 calculates the average value of the light reception spectrum of the measurement light generated from the non-measurement region R2a and the light reception spectrum of the measurement light generated from the non-measurement region R2b as the second reference spectrum St2(λ) or St2(λ, t). Further, for example, the calculation unit 32 calculates the average value of the light reception spectrum of the measurement light generated from the non-measurement region R2a when the measurement object S exists in the measurement region R1 and the light reception spectrum of the measurement light generated from the non-measurement region R2b when the measurement object S exists in the measurement region R1 as the reference spectrum Str(λ) or Str(λ, t).

[0134] In addition, in the optical measurement device 101 according to an embodiment of the present invention, the calculation unit 32 is configured to: in a state where the measurement object S is not disposed in the measurement area R1, generate a second reference spectrum St2(λ) or St2(λ, t) based on the transmitted light from the non-measurement area R2 received by irradiating the object area R with the irradiation light, but not limited thereto. The calculation unit 32 may also be configured to: in a state where the measurement object S is disposed in the measurement area R1, generate a second reference spectrum St2(λ) or St2(λ, t) based on the transmitted light from the non-measurement area R2 received by irradiating the object area R with the irradiation light. That is, the calculation unit 32 may also be configured to: for example, after the start of the line measurement of the transmittance distribution of the measurement object S, generate a second reference spectrum St2(λ) or St2(λ, t) at a time different from the generation time of the reference spectrum Str(λ) or Str(λ, t).

[0135] In addition, in the optical measurement device 101 according to an embodiment of the present invention, the calculation unit 32 is configured to: in a state where the measurement object S is disposed in the measurement area R1, generate a reference spectrum Str(λ) or Str(λ, t) and a measurement spectrum Stm(λ, X) or Stm(λ, t, X) based on the transmitted light from the non-measurement area R2 and the transmitted light from the measurement area R1 received by the light receiving optical system 20 at the same time by irradiating the object area R with the irradiation light by the irradiation optical system 10, but not limited thereto. The calculation unit 32 may also be configured to: generate a reference spectrum Str(λ) or Str(λ, t) and a measurement spectrum Stm(λ, X) or Stm(λ, t, X) based on the transmitted light received by the light receiving optical system 20 at different times.

[0136] In addition, in the optical measurement device 101 according to an embodiment of the present invention, the calculation unit 32 is configured to: in a state where the measurement object S is not disposed in the measurement area R1, generate a first reference spectrum St1(λ, X) or St1(λ, t, X) and a second reference spectrum St2(λ) or St2(λ, t) based on the transmitted light from the measurement area R1 and the transmitted light from the non-measurement area R2 received by the light receiving optical system 20 at the same time by irradiating the object area R with the irradiation light by the irradiation optical system 10, but not limited thereto. The calculation unit 32 may also be configured to: in a state where the measurement object S is not disposed in the measurement area R1 and at different times, generate a first reference spectrum St1(λ, X) or St1(λ, t, X) and a second reference spectrum St2(λ) or St2(λ, t) based on the transmitted light received by the light receiving optical system 20.

[0137] In addition, in the optical measurement device 101 according to the embodiment of the present invention, the calculation unit 32 is configured to calculate the transmittance spectra ST(λ, X) or ST(λ, t, X) of the measurement object S at a plurality of measurement points X based on a plurality of first reference spectra St1(λ, X) or St1(λ, t, X), second reference spectra St2(λ) or St2(λ, t), and a plurality of measurement spectra Stm(λ, X) or Stm(λ, t, X) respectively generated from the measurement light generated from the plurality of measurement points X in the measurement region R1, but not limited thereto. The calculation unit 32 may also be configured to calculate the transmittance spectra ST(λ, xj) or ST(λ, t, xj) of the measurement object S at the position xj based on the first reference spectrum St1(λ, xj) or St1(λ, t, xj), second reference spectrum St2(λ) or St2(λ, t), and the measurement spectrum Stm(λ, xj) or Stm(λ, t, xj) generated from the measurement light generated from a position xj in the measurement region R1.

[0138] Next, other embodiments of the present invention will be described with reference to the drawings. It should be noted that the same or corresponding parts in the drawings are denoted by the same reference numerals, and their descriptions will not be repeated.

[0139] <Second Embodiment>

[0140] Compared with the optical measurement device 101 of the first embodiment, the present embodiment relates to an optical measurement device 102 that receives the reflected light generated from the object region R by irradiating the object region R with irradiation light and generates a reflectance spectrum at each wavelength of the measurement object S based on the light reception result of the reflected light. The content other than that described below is the same as that of the optical measurement device 101 of the first embodiment.

[0141] [Optical Measurement Device]

[0142] Figure 12 is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention.

[0143] Referring to Figure 12 , the optical measurement device 102 includes an irradiation optical system 10, a light reception optical system 20, a processing device 30, a base member 4, and a support member 6. The base member 4 and the support member 6 fix the light reception optical system 20. It should be noted that the optical measurement device 102 is not limited to being configured to include the base member 4 and the support member 6, and may also be configured to include other members for fixing the light reception optical system 20 instead of or in addition to the base member 4 and the support member 6.

[0144] Figure 13This is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention. Figure 13 It shows a state where the reflector 41 is arranged in the measurement area R1 and the reflector 40 is arranged in the non-measurement area R2.

[0145] The reflectors 40 and 41 are, for example, glass plates, silicon plates, or aluminum mirrors. For example, the reflectivity of the reflector 40 and the reflectivity of the reflector 41 are substantially the same. The reflectors 40 and 41 may be an integrated single reflector.

[0146] Figure 14 This is a diagram showing an example of the configuration of the optical measurement device according to the second embodiment of the present invention. Figure 14 It shows a state where the measurement object S, which is the object to be measured by the optical measurement device 102, is arranged.

[0147] Refer to Figure 14 , the optical measurement device 102 measures the reflectance spectrum of the measurement object S arranged in the measurement area R1 in a state where the reflector 40 is arranged in the non-measurement area R2.

[0148] For example, the optical measurement device 102 automatically measures the reflectance spectra at a plurality of measurement positions M on the measurement object S conveyed through the measurement area R1 on the production line of the measurement object S. That is, the optical measurement device 102 measures the reflectance spectra at a plurality of measurement positions M on the measurement object S online.

[0149] More specifically, the optical measurement device 102 periodically performs reflectance measurement, thereby calculating the reflectance at each wavelength of the measurement position M of the conveyed measurement object S.

[0150] [Irradiation optical system]

[0151] The irradiation optical system 10 linearly irradiates the object area R including the measurement area R1 and the non-measurement area R2, which is a region different from the measurement area R1, with irradiation light including a plurality of wavelengths.

[0152] The linear optical waveguide 12 of the irradiation optical system 10 is arranged such that the incident angle of the irradiation light on the measurement object S arranged in the measurement area R1 is θ.

[0153] [Light receiving optical system]

[0154] The light receiving optical system 20 receives the measurement light, which is the reflected light generated from the object area R by irradiating the object area R with the irradiation light.

[0155] The light receiving optical system 20 is arranged on the same side as the linear optical waveguide 12 with respect to the measurement object S and at a position where it can receive the reflected light with a reflection angle of θ of the measurement object S.

[0156] The light-receiving optical system 20 receives, as measurement light, the reflected light that is reflected in the object region R from the irradiation light emitted from the linear optical waveguide 12. Specifically, the light-receiving optical system 20 receives the reflected light of the measurement object S disposed in the measurement region R1 from the irradiation light emitted from the linear optical waveguide 12.

[0157] [Processing device]

[0158] Based on the light-receiving result of the measurement light of the light-receiving optical system 20, the calculation unit 32 in the processing device 30 generates, for each position in the object region R, the relationship between the wavelength λ and the intensity of the measurement light, that is, the light-receiving spectrum S(λ). Then, based on the generated light-receiving spectrum S(λ), the calculation unit 32 calculates the reflectance at each wavelength of the measurement object S disposed in the measurement region R1.

[0159] More specifically, the calculation unit 32 generates the light-receiving spectrum S(λ) based on the two-dimensional image data stored in the storage unit 33, and calculates the reflectance of λ at each wavelength of the measurement object S based on the generated light-receiving spectrum S(λ).

[0160] As Figure 13 shown, the calculation unit 32 calculates the reflectance spectrum of the measurement object S based on the first reference spectrum Sr1(λ), the second reference spectrum Sr2(λ), and the measurement spectrum Srm(λ). The first reference spectrum Sr1(λ) is based on the light-receiving spectrum S(λ) generated from the measurement region R1 when there is no measurement object S in the measurement region R1 and there is a reflector 41 in the measurement region R1 as Figure 13 shown. The second reference spectrum Sr2(λ) is based on the light-receiving spectrum S(λ) generated from the non-measurement region R2 when there is a reflector 40 in the non-measurement region R2. The measurement spectrum Srm(λ) is based on the light-receiving spectrum S(λ) generated from the measurement region R1 when there is a measurement object S in the measurement region R1 as Figure 14 shown.

[0161] For example, the calculation unit 32 generates a plurality of first reference spectra Sr1(λ, X) respectively based on the measurement light generated from a plurality of measurement points X in the measurement region R1 when there is no measurement object S in the measurement region R1 and there is a reflector 41 in the measurement region R1.

[0162] Then, the calculation unit 32 calculates the reflectance spectrum of the measurement object S based on the generated plurality of first reference spectra Sr1(λ, X), the second reference spectrum Sr2(λ), and a plurality of measurement spectra Srm(λ, X) respectively based on the measurement light generated from the plurality of measurement points X.

[0163] For example, the calculation unit 32 calculates the reflectance distribution of the measurement position M of the measurement object S based on the first reference spectrum Sr1(λ, X), the second reference spectrum Sr2(λ), and the measurement spectrum Srm(λ, X).

[0164] For example, the second reference spectrum Sr2(λ) is a spectrum pre-generated by the calculation unit 32 based on the measurement light generated from the non-measurement area R2 when the measurement object S does not exist in the measurement area R1.

[0165] The first reference spectrum Sr1(λ, X) and the second reference spectrum Sr2(λ) are spectra generated by the calculation unit 32 respectively based on the measurement light generated from the measurement area R1 and the measurement light generated from the non-measurement area R2 received by the light-receiving optical system 20 at the same time before the measurement object S exists in the measurement area R1.

[0166] More specifically, as Figure 13 shown, the first reference spectrum Sr1(λ, X) and the second reference spectrum Sr2(λ) are spectra generated by the calculation unit 32 respectively based on the reflected light from the measurement area R1 and the reflected light from the non-measurement area R2 received by the light-receiving optical system 20 through irradiating the object area R with irradiation light in a state where the measurement object S does not exist in the measurement area R1 and the reflecting plates 41 and 40 exist in the measurement area R1 and the non-measurement area R2 respectively.

[0167] For example, the optical measurement device 102 generates the first reference spectrum Sr1(λ, X) and the second reference spectrum Sr2(λ) respectively based on the reflected light from the reflecting plates 41 and 40 received by the light-receiving optical system 20 through irradiating the object area R with irradiation light in a state where the reflecting plates 40 and 41 are arranged in the object area R before starting the on-line measurement of the reflectance distribution of the measurement object S.

[0168] The calculation unit 32 also calculates the reflectance spectrum of the measurement object S based on the reference spectrum Srr(λ), which is the received spectrum of the measurement light generated from the non-measurement area R2 when the measurement object S exists in the measurement area R1.

[0169] The reference spectrum Srr(λ) and the measurement spectrum Srm(λ, X) are spectra generated by the calculation unit 32 respectively based on the measurement light generated from the non-measurement area R2 and the measurement light generated from the measurement area R1 received by the light-receiving optical system 20 at the same time when the measurement object S exists in the measurement area R1.

[0170] More specifically, as Figure 14As shown, the reference spectrum Srr(λ) and the measurement spectrum Srm(λ, X) are spectra respectively generated by the calculation unit 32 based on the reflected light from the non-measurement region R2, i.e., the reflector 40, and the reflected light from the measurement region R1, i.e., the measurement object S, which are received by the light-receiving optical system 20 after the irradiation light is irradiated by the irradiation optical system 10 to the object region R in a state where the measurement object S exists in the measurement region R1.

[0171] For example, the calculation unit 32 generates the reference spectrum Srr(λ) and the measurement spectrum Srm(λ, X) based on the reflected light from the non-measurement region R2 and the reflected light from the measurement region R1, which are received by the light-receiving optical system 20 at the same time after the irradiation light is irradiated by the irradiation optical system 10 to the object region R in a state where the measurement object S is arranged in the measurement region R1 instead of the reflector 41 after the start of the on-line measurement of the reflectance distribution of the measurement object S.

[0172] For example, the storage unit 33 stores the intensity ratio Pr(λ, X), which is the ratio of the first reference spectrum Sr1(λ, t, X) to the second reference spectrum Sr2(λ, t) at each wavelength of each measurement point X, i.e., the intensity ratio, which is pre-generated at a certain moment t (t = t0) before the start of the on-line measurement. The intensity ratio Pr(λ, X) is represented by the following formula (4).

[0173]

[0174] When the calculation unit 32 generates the measurement spectrum Srm(λ, t, X) and the reference spectrum Srr(λ, t) at a certain moment t (t = t1) after the start of the on-line measurement, the calculation unit 32 obtains the intensity ratio Pr(λ, X) in the storage unit 33 and calculates the reflectance spectrum SR(λ, t, X), which represents the reflectance of multiple measurement points X of the measurement object S, using the imaginary reference spectrum Srv(λ, t, X) represented by the following formula (5).

[0175] Srv(λ,t,X)=Srr(λ,t)×Pr(λ,X)···(5)

[0176]

[0177] For example, the calculation unit 32 calculates the film thickness distribution representing the film thickness of each measurement point X of the measurement object S based on the calculated reflectance spectrum SR(λ, t, X). Or, the calculation unit 32 calculates the hue of the measurement object S based on the calculated reflectance spectrum SR(λ, t, X).

[0178] It should be noted that in the optical measurement device 102 according to the second embodiment of the present invention, the linear optical waveguide 12 of the irradiation optical system 10 is configured to irradiate the measurement object S disposed in the measurement region R1 with the irradiation light at an incident angle of θ, but is not limited thereto.

[0179] In addition, in the optical measurement device 102 according to the second embodiment of the present invention, the light receiving optical system 20 is configured to be on the same side as the linear optical waveguide 12 with respect to the measurement object S and disposed at a position where the reflected light with a reflection angle of θ of the measurement object S can be received, but is not limited thereto.

[0180] Figure 15 It is a diagram showing an example of the configuration of an optical measurement device according to a modified example of the second embodiment of the present invention.

[0181] Refer to Figure 15 , the linear optical waveguide 12 has a half mirror 121. The linear optical waveguide 12 irradiates the object region R with the irradiation light reflected by the half mirror 121. In this case, for example, the linear optical waveguide 12 is disposed directly above the surface on which the measurement object S is conveyed so as to irradiate the measurement object S disposed in the measurement region R1 with the irradiation light at an incident angle of 0°. That is, the irradiation optical system 10 of the optical measurement device 102 is coaxial epi-illumination.

[0182] The light receiving optical system 20 receives the reflected light generated from the object region R by irradiating the object region R with the irradiation light via the half mirror 121. In this case, for example, the light receiving optical system 20 is disposed at a position where the reflected light with a reflection angle of 0° of the measurement object S can be received, that is, a position opposed to the object region R across the linear optical waveguide 12.

[0183] It should be considered that the above embodiments are illustrative in all aspects and not restrictive. The scope of the present invention is represented by the claims rather than the above description, and includes all modifications within the meaning and scope equivalent to the claims.

Claims

1. An optical measurement device, characterized in that, Comprising: An irradiation optical system that linearly irradiates an object region with irradiation light containing multiple wavelengths, where the object region includes a measurement region and a non-measurement region that is a region different from the measurement region; A light-receiving optical system that receives measurement light that is transmitted light or reflected light generated from the object region by irradiating the object region with the irradiation light; And A calculation unit that, based on the light-receiving result of the measurement light in the light-receiving optical system, generates a light-receiving spectrum that is the relationship between the wavelength and the intensity of the measurement light at each position in the object region, and calculates the transmittance or reflectance of the measurement object disposed in the measurement region at each wavelength based on the generated light-receiving spectrum, The calculation unit calculates the transmittance spectrum or reflectance spectrum of the measurement object based on a first reference spectrum, a second reference spectrum, and a measurement spectrum. The first reference spectrum is based on the light-receiving spectrum of the measurement light generated from the measurement region when the measurement object does not exist, the second reference spectrum is based on the light-receiving spectrum of the measurement light generated from the non-measurement region, and the measurement spectrum is based on the light-receiving spectrum of the measurement light generated from the measurement region when the measurement object exists, The second reference spectrum is a spectrum pre-generated by the calculation unit based on the measurement light generated from the non-measurement region when the measurement object does not exist in the measurement region, The calculation unit further calculates the transmittance spectrum or the reflectance spectrum of the measurement object based on a reference spectrum, where the reference spectrum is based on the light-receiving spectrum of the measurement light generated from the non-measurement region when the measurement object exists in the measurement region.

2. The optical measurement device according to claim 1, wherein: The reference spectrum and the measurement spectrum are respectively spectra generated by the calculation unit based on the measurement light generated from the non-measurement region and the measurement light generated from the measurement region received by the light-receiving optical system at the same time when the measurement object exists in the measurement region.

3. The optical measurement device according to claim 1 or 2, wherein: The first reference spectrum and the second reference spectrum are respectively spectra generated by the calculation unit based on the measurement light generated from the measurement region and the measurement light generated from the non-measurement region received by the light-receiving optical system at the same time before the measurement object exists in the measurement region.

4. The optical measurement device according to claim 1 or 2, wherein: The calculation unit calculates the transmittance spectrum or the reflectance spectrum of the measurement object based on a plurality of the first reference spectra, the second reference spectra, and a plurality of the measurement spectra respectively based on the measurement light generated from multiple positions in the measurement region when the measurement object does not exist.

5. An optical measurement method, characterized in that, Including: A step of linearly irradiating an object region with irradiation light including a plurality of wavelengths, wherein the object region includes a measurement region and a non-measurement region that is a region different from the measurement region; A step of receiving measurement light that is transmitted light or reflected light generated from the object region by irradiating the object region with the irradiation light; and A step of generating, based on the light reception result of the measurement light, a light reception spectrum that is a relationship between the wavelength and the intensity of the measurement light at each position in the object region, and calculating a transmittance or reflectance at each wavelength of a measurement object disposed in the measurement region based on the generated light reception spectrum, In the step of calculating the transmittance or the reflectance, a transmittance spectrum or a reflectance spectrum of the measurement object is calculated based on a first reference spectrum, a second reference spectrum, and a measurement spectrum. The first reference spectrum is based on the light reception spectrum of the measurement light generated from the measurement region when the measurement object does not exist. The second reference spectrum is based on the light reception spectrum of the measurement light generated from the non-measurement region. The measurement spectrum is based on the light reception spectrum of the measurement light generated from the measurement region when the measurement object exists, The second reference spectrum is a spectrum pre-generated based on the measurement light generated from the non-measurement region when the measurement object does not exist in the measurement region, In the step of calculating the transmittance or the reflectance, the transmittance spectrum or the reflectance spectrum of the measurement object is further calculated based on a reference spectrum, and the reference spectrum is based on the light reception spectrum of the measurement light generated from the non-measurement region when the measurement object exists in the measurement region.

Images