Rotating shaft and substrate support device including the rotating shaft

Abstract

The present invention provides a rotating shaft and a substrate support device including the rotating shaft. The rotating shaft includes: a central rotating shaft provided with a ventilation duct; a hollow outer shaft disposed around the periphery of the central rotating shaft, and the hollow outer shaft has a set spacing from the central rotating shaft; a gas guiding groove surrounding the inner wall of the hollow outer shaft and communicating with the ventilation duct; a gas supply duct disposed on the hollow outer shaft and communicating with the gas guiding groove; sealing ring protrusions disposed in pairs on the central rotating shaft, and the air inlet of the ventilation duct is located between the paired sealing ring protrusions in the axial direction of the central rotating shaft; sealing ring grooves disposed in pairs on the hollow outer shaft, and the gas guiding groove is located between the paired sealing ring grooves in the axial direction of the central rotating shaft; the sealing ring protrusions are embedded in the sealing ring grooves. By providing the sealing ring protrusions and the sealing ring grooves at the adjacent positions of the gas guiding groove and the gas supply duct in the rotating shaft, the present invention enhances the sealing performance of the sealing structure of the rotating shaft while ensuring that the central rotating shaft and the hollow outer shaft do not directly contact, and improves the process stability of the device.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing equipment, and particularly to a rotating shaft and a substrate support device including the rotating shaft. Background Art

[0002] In advanced semiconductor manufacturing processes, backside processing technologies such as etching, implantation, and laser annealing on the backside of wafers are being increasingly widely used. In the above-mentioned backside processing technologies, the protection of the device area on the front side of the wafer has an important impact on improving the wafer yield. If the front side of the wafer is directly placed on the processing device, it is possible that the device area on the front side of the wafer is affected by defects such as scratches, particulate contamination, or metal ion contamination, thereby significantly reducing the wafer yield.

[0003] Currently, there have been some solutions that attempt to float and clamp the wafer for rotation to perform backside processing technologies. When performing processing technologies such as cleaning on the backside of the wafer, the floating front side of the wafer will not directly contact the processing device, thus avoiding the generation of abnormal defects. Among them, the solution of jetting air to float the wafer has great application prospects due to its high clamping stability and good protection of the front side of the wafer. In the existing solutions of jetting air to float the wafer, in addition to using jet gas perpendicular to the placement surface to float the wafer, jet gas in an inclined direction is also used to form a fast-flowing air current between the wafer and the placement surface, and the wafer is adsorbed and held above the placement surface by the Bernoulli principle and will not be blown away by the jet gas. However, in the existing jetting air floating solutions, due to the requirements for jet cleanliness, in order to avoid the generation of particulate contaminants due to mechanical friction between different structures, the fixed structure and the rotating structure in the air supply pipeline cannot be in direct contact at their adjacent positions. The non-sealing at the above-mentioned adjacent positions will cause the air supply in the device to easily leak from the gaps, thus affecting the stability of jetting air to float the wafer during the process.

[0004] Therefore, it is necessary to propose a new rotating shaft and a substrate support device including the rotating shaft to solve the above problems. Summary of the Invention

[0005] In view of the above-mentioned disadvantages of the prior art, the purpose of the present invention is to provide a rotating shaft and a substrate support device including the rotating shaft, which are used to solve the problem that the sealing performance of the sealing structure of the rotating shaft in the prior art is poor, affecting the process stability.

[0006] To achieve the above purpose and other related purposes, the present invention provides a rotating shaft, which is characterized in that it includes:

[0007] A central rotating shaft, an air vent pipe is arranged inside the central rotating shaft, an air inlet of the air vent pipe is arranged on the outer wall of the central rotating shaft, and an air outlet of the air vent pipe is arranged at one end in the axial direction of the central rotating shaft;

[0008] A hollow outer shaft is arranged around the axis of the central rotating shaft on the periphery of the central rotating shaft, and there is a set distance between the inner wall of the hollow outer shaft and the outer wall of the central rotating shaft;

[0009] The inner wall of the hollow outer shaft is provided with air guide grooves which are arranged around the axis of the central rotating shaft and communicate with the air inlet of the air vent pipe;

[0010] The hollow outer shaft is further provided with an air supply pipe. The air inlet of the air supply pipe is arranged on the outer wall of the hollow outer shaft, and the air outlet of the air supply pipe communicates with the air guide grooves;

[0011] The central rotating shaft further has sealing ring protrusions arranged in pairs, which are arranged around the axis of the central rotating shaft on the outer wall of the central rotating shaft, and the air inlet of the air vent pipe is located between the sealing ring protrusions arranged in pairs in the axial direction of the central rotating shaft; The hollow outer shaft further has sealing ring grooves arranged in pairs, which are arranged around the axis of the central rotating shaft on the inner wall of the hollow outer shaft, and the air guide grooves are located between the sealing ring grooves arranged in pairs in the axial direction of the central rotating shaft; The sealing ring protrusions are embedded in the sealing ring grooves.

[0012] As an alternative embodiment of the present invention, there are multiple sealing ring protrusions and sealing ring grooves which correspond to each other one by one.

[0013] As an alternative embodiment of the present invention, there are multiple air vent pipes, air guide grooves and air supply pipes. The multiple air guide grooves are arranged in sequence along the axis of the central rotating shaft on the inner wall of the hollow outer shaft, and the air inlets of the multiple air vent pipes are arranged in sequence along the axis of the central rotating shaft on the outer wall of the central rotating shaft and correspond to the air guide grooves one by one.

[0014] As an alternative embodiment of the present invention, the radial gap between the sealing ring protrusions and the sealing ring grooves is smaller than the axial gap between the sealing ring protrusions and the sealing ring grooves.

[0015] As an alternative embodiment of the present invention, the protruding height of the sealing ring protrusions is smaller than the recessed depth of the sealing ring grooves.

[0016] As an alternative embodiment of the present invention, different regions in the sealing ring grooves have different recessed depths, and the recessed depth of the sealing ring grooves on the side close to the air guide grooves is greater than the recessed depth of the sealing ring grooves on the side far from the air guide grooves.

[0017] As an alternative embodiment of the present invention, one end of the central rotating shaft is fixedly connected to a transmission device and rotates around its axis under the drive of the transmission device.

[0018] As an alternative embodiment of the present invention, part or all of the structure of the hollow outer shaft is formed by the clamping of a pair of half shafts.

[0019] The present invention also provides a substrate support device, which is characterized by including:

[0020] A substrate chuck for receiving and fixing a substrate, the substrate chuck is provided with a first air jet pipe and a second air jet pipe, the air outlets of the first air jet pipe and the second air jet pipe are arranged on the receiving surface of the substrate chuck for receiving the substrate, the first air jet pipe is used for jetting air to the substrate and adsorbing the substrate by the Bernoulli principle, and the second air jet pipe is used for jetting air to the substrate and blowing the substrate up;

[0021] The rotating shaft as described in the present invention, the central rotating shaft of the rotating shaft is connected to and drives the substrate chuck to rotate, and the air outlet of the air supply pipe of the rotating shaft is connected to the air inlets of the first air jet pipe and the second air jet pipe.

[0022] As an alternative embodiment of the present invention, the air outlets of the first air jet pipe and the second air jet pipe are multiple.

[0023] As an alternative embodiment of the present invention, the jetting direction of the air outlet of the first air jet pipe is inclined to the receiving surface and forms a set angle with the receiving surface; the jetting direction of the air outlet of the second air jet pipe is perpendicular to the receiving surface.

[0024] As an alternative embodiment of the present invention, the substrate chuck is further provided with positioning pins for clamping and fixing the substrate, the positioning pins are driven by cylinders, and the cylinders are connected to the air supply pipe of the rotating shaft through cylinder drive air pipes.

[0025] As an alternative embodiment of the present invention, the substrate chuck is further provided with guide posts for guiding and limiting the substrate to a set position.

[0026] As described above, the present invention provides a rotating shaft and a substrate support device including the rotating shaft, which have the following beneficial effects:

[0027] The present invention introduces a new rotating shaft and a substrate support device including the rotating shaft. By setting a sealing ring convex and a sealing ring groove at a position adjacent to the air guide groove and the air supply pipe in the rotating shaft, while ensuring that the central rotating shaft and the hollow outer shaft do not directly contact, the sealing performance of the rotating shaft sealing structure is enhanced, and the process stability of the device is improved. Description of the Drawings

[0028] Figure 1 It shows a perspective view of the rotating shaft provided in the first embodiment of the present invention.

[0029] Figure 2 It shows a top view of the rotating shaft provided in the first embodiment of the present invention.

[0030] Figure 3 It shows a side view of the rotating shaft provided in the first embodiment of the present invention.

[0031] Figure 4 It shows the rotating shaft provided in the first embodiment of the present invention in Figure 2 a sectional view in the AA direction.

[0032] Figure 5 It shows the rotating shaft provided in the first embodiment of the present invention in Figure 3 a sectional view in the CC direction.

[0033] Figure 6 It shows the rotating shaft provided in the first embodiment of the present invention in Figure 5 an enlarged view of the D area.

[0034] Figure 7 It shows a front view of the central rotating shaft provided in the first embodiment of the present invention.

[0035] Figure 8 It shows a top view of the central rotating shaft provided in the first embodiment of the present invention.

[0036] Figure 9 It shows the central rotating shaft provided in the first embodiment of the present invention in Figure 7 a sectional view in the UU direction.

[0037] Figure 10 It shows the central rotating shaft provided in the first embodiment of the present invention in Figure 8 a sectional view in the YY direction.

[0038] Figure 11 It shows the central rotating shaft provided in the first embodiment of the present invention in Figure 7 an enlarged view of the B area.

[0039] Figure 12 It shows a front view of the half shaft provided in the first embodiment of the present invention.

[0040] Figure 13 It shows a perspective view of the half shaft provided in the first embodiment of the present invention as viewed obliquely from below.

[0041] Figure 14 It shows a front sectional view of the substrate support device provided in the second embodiment of the present invention.

[0042] Description of Component Labels

[0043] 101 Central Rotating Shaft

[0044] 102 Ventilation Duct

[0045] 102a First Ventilation Duct

[0046] 102b Second Ventilation Duct

[0047] 102c Third Ventilation Duct

[0048] 102d Fourth Ventilation Duct

[0049] 103 Hollow Outer Shaft

[0050] 103a Half Shaft

[0051] 104 Air Guide Groove

[0052] 105 Gas Supply Duct

[0053] 106 Sealing Ring Projection

[0054] 107 Sealing Ring Groove

[0055] 108 Positioning Hole

[0056] 109 Positioning Block

[0057] 110 Connecting Piece

[0058] 200 Substrate

[0059] 201 Substrate Chuck

[0060] 201a Receiving Surface

[0061] 202 First Jet Pipe

[0062] 203 Second Jet Pipe

[0063] 204 Positioning Pin

[0064] 205 Guide Post

[0065] 300 Rotating Shaft

[0066] 301 First Gas Source

[0067] 302 Second Gas Source

[0068] 400 Liquid Supply Nozzle Specific Embodiment

[0069] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand the other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0070] Please refer to Figures 1 to 14 . It should be noted that the diagrams provided in this embodiment only illustrate the basic concept of the present invention in a schematic manner. Although only the components related to the present invention are shown in the diagrams, rather than being drawn according to the number, shape, and size of the components in actual implementation, the form, quantity, and ratio of each component in actual implementation can be arbitrarily changed, and the layout form of its components may also be more complex.

[0071] Embodiment 1

[0072] Please refer to Figures 1 to 13 . This embodiment provides a rotating shaft. Figures 1 to 6 shows the structure of the rotating shaft provided in this embodiment, where Figure 1 is the perspective view of the rotating shaft, Figure 2 is its top view, Figure 3 is its side view, Figure 4 is Figure 2 the sectional view in the AA direction in Figure 5 is Figure 3 the sectional view in the CC direction in Figure 6 is Figure 5 the enlarged view of the D area in

[0073] As Figures 1 to 5 shown, the rotating shaft includes: a central rotating shaft 101, an air vent pipe 102 is provided inside the central rotating shaft 101, the air inlet of the air vent pipe 102 is arranged on the outer wall of the central rotating shaft 101, and the air outlet of the air vent pipe 102 is arranged at one end in the axial direction of the central rotating shaft 101. In Figures 7 to 11 the structure of the central rotating shaft 101 provided in this embodiment is separately shown, where Figure 7 is the front view of the central rotating shaft 101, Figure 8 is its top view, Figure 9 is Figure 7 the sectional view in the UU direction in Figure 10 is Figure 8 the sectional view in the YY direction in Figure 11 is Figure 7 the enlarged view of the B area in Figure 4 and Figure 5As shown, in this embodiment, there are multiple ventilation pipes 102, including a first ventilation pipe 102a, a second ventilation pipe 102b, a third ventilation pipe 102c, and a fourth ventilation pipe 102d. The air inlets of the above-mentioned ventilation pipes are arranged in sequence along the axis direction of the central rotating shaft 101 on the outer wall of the central rotating shaft 101, and their opening directions in the radial direction are different. As Figure 2 shown, the air outlets of each ventilation pipe are arranged at the top of the central rotating shaft 101. It should be noted that in this embodiment, the central rotating shaft 101 is vertically placed, so the axis direction of the central rotating shaft 101 is the vertical direction. In other embodiments of the present invention, the central rotating shaft 101 can also be placed in a horizontal direction or at any other angle. In addition, the number of the ventilation pipes 102 can also be adjusted according to actual needs. Combining Figure 8 and Figure 9 it can also be seen that the number of air outlets of each ventilation pipe 102 at the top of the central rotating shaft 101 can also be set differently according to actual needs.

[0074] As an example, as Figure 1 and Figure 7 shown, one end of the central rotating shaft 101 is fixedly connected to the transmission device and rotates around its axis under the drive of the transmission device. From Figure 1 and Figure 7 it can be seen that a connecting structure for connecting the transmission device (not shown in the figure) is provided at the lower end of the central rotating shaft 101. The central rotating shaft 101 is fixedly connected and driven to rotate around its axis through the transmission device, so as to realize the rotation function of the rotating shaft.

[0075] As Figures 1 to 6 shown, the rotating shaft further includes: a hollow outer shaft 103, which is arranged around the axis direction of the central rotating shaft 101 outside the central rotating shaft 101, and there is a set distance between the inner wall of the hollow outer shaft 103 and the outer wall of the central rotating shaft 101. From Figure 5 as well as Figure 6 the enlarged view, it can be seen that the hollow outer shaft 103 and the central rotating shaft 101 do not directly contact, but are connected at the top or bottom position of the rotating shaft through connecting parts such as bearings, which can avoid particulate matter pollution caused by mechanical friction between the hollow outer shaft 103 and the central rotating shaft 101 in the middle area of the rotating shaft, thereby improving the cleanliness of the rotating shaft structure.

[0076] As an example, as Figures 12 to 13 shown, part or all of the structure of the hollow outer shaft 103 is formed by the clamping of paired half shafts 103a. Among them, Figure 12is a front view of the half shaft 103a with respect to the air supply pipe 105. Figure 13 is a perspective view seen obliquely downward of the half shaft 103a. In this embodiment, the upper half of the hollow outer shaft 103, that is, the part where the first ventilation pipe 102a and the second ventilation pipe 102b are connected, is formed by the paired half shafts 103a being held together, and the other parts are formed by stacking a plurality of integral annular structures.

[0077] As an example, such as Figure 4 , Figure 5 , Figure 12 and Figure 13 shown, the inner wall of the hollow outer shaft 103 is provided with a gas guiding groove 104. The gas guiding groove 104 is arranged around the axis direction of the central rotating shaft 101 and communicates with the air inlet of the ventilation pipe 102. The hollow outer shaft 103 is further provided with an air supply pipe 105. The air inlet of the air supply pipe 105 is arranged on the outer wall of the hollow outer shaft 103, and the air outlet of the air supply pipe 105 communicates with the gas guiding groove 104.

[0078] Specifically, in this embodiment, the gas guiding groove 104 and the air supply pipe 105 are multiple. The multiple gas guiding grooves 104 are arranged in sequence along the axis direction of the central rotating shaft 101 on the inner wall of the hollow outer shaft 103. The air inlets of the multiple ventilation pipes 102 are arranged in sequence along the axis direction of the central rotating shaft 101 on the outer wall of the central rotating shaft 101 and correspond to the gas guiding grooves 104 one by one. That is, in the present invention, through the connection of the ventilation pipe 102, the gas guiding groove 104 and the air supply pipe 105, the compatibility of the air supply structure and the rotating structure in the rotating shaft is realized. The gas supplied by the gas supply source can enter the rotating shaft from the air inlet of the air supply pipe 105, pass through the air supply pipe 105, the gas guiding groove 104 and the ventilation pipe 102, and be discharged from the air outlet of the ventilation pipe 102.

[0079] Such as Figures 4 to 13 shown, the central rotating shaft 101 further has paired sealing ring protrusions 106. The sealing ring protrusions 106 are arranged around the axis direction of the central rotating shaft 101 on the outer wall of the central rotating shaft 101, and the air inlet of the ventilation pipe 102 is located between the paired sealing ring protrusions 106 in the axis direction of the central rotating shaft 101; the hollow outer shaft 103 further has paired sealing ring grooves 107. The sealing ring grooves 107 are arranged around the axis direction of the central rotating shaft 101 on the inner wall of the hollow outer shaft 103, and the gas guiding groove 104 is located between the paired sealing ring grooves 107 in the axis direction of the central rotating shaft 101; the sealing ring protrusions 106 are embedded in the sealing ring grooves 107. Such as Figure 6As shown, there are multiple sealing ring protrusions 106 and sealing ring grooves 107, which correspond to each other one by one. Since in the present invention, the hollow outer shaft 103 and the central rotating shaft 101 do not directly contact each other. To ensure that each of the air guiding grooves 104 has a certain sealing performance in the vertical direction and prevent poor process performance caused by air supply leakage, the present invention introduces the sealing ring protrusions 106 and the sealing ring grooves 107 that are paired and arranged in an alternating manner, forming a meandering flow path between the sealing ring protrusions 106 and the sealing ring grooves 107, and improving the sealing performance of the gas between the hollow outer shaft 103 and the central rotating shaft 101.

[0080] As an example, as Figure 6 shown, the radial clearance (H1) between the sealing ring protrusion 106 and the sealing ring groove 107 is smaller than the axial clearance (W1 / W2) between the sealing ring protrusion 106 and the sealing ring groove 107. When the air guiding groove 104 flows into the axial clearance through the radial clearance, due to the larger space of the axial clearance, this will cause a larger pressure loss, making the flow rate of the gas decrease step by step as it passes through the sealing ring protrusion 106 and the sealing ring groove 107, so as to achieve a good sealing effect.

[0081] Optionally, as Figure 6 shown, the protruding height of the sealing ring protrusion 106 is smaller than the recessed depth of the sealing ring groove 107. As can be seen from Figure 6 this, by setting a deeper recess in the sealing ring groove 107, the gas flowing out from the radial clearance can enter the axial clearance with a larger space, strengthening the effect of this structure on reducing the flow rate, and thus enhancing the gas sealing performance.

[0082] Optionally, as Figure 6 shown, different regions in the sealing ring groove 107 have different recessed depths, and the recessed depth (H2) of the sealing ring groove 107 near the air guiding groove 104 is greater than the recessed depth (H3) of the sealing ring groove 107 far from the air guiding groove 104. Specifically, in Figure 6 this, in the air guiding grooves 104 at the upper and lower positions, the recessed depth (H2) of the sealing ring groove 107 close to the air guiding groove 104 is greater than the recessed depth (H3) far from the air guiding groove 104. The deeper recessed depth near the air guiding groove 104 can ensure a larger space to buffer the gas flow rate, while the shallower region ensures that a narrower radial clearance can be set in the subsequent structure, which ensures that the embedding structure of the sealing ring protrusion 106 and the sealing ring groove 107 near the air guiding groove 104 can have a better sealing effect on the adjacent air guiding groove 104.

[0083] In this embodiment, the upper half of the hollow outer shaft 103, that is, the part where the first ventilation pipe 102a and the second ventilation pipe 102b are connected, is formed by the paired half shafts 103a being held together. This is because in this embodiment, the sealing structure of the sealing ring convex 106 and the sealing ring groove 107 is only introduced in the part where the first ventilation pipe 102a and the second ventilation pipe 102b are connected. The interlaced structure determines that the upper half of the hollow outer shaft 103 needs to be formed by the two half shafts 103a being held together, while other regions can be directly formed by the nested annular structures. Optionally, as Figure 13 shown, the half shaft 103a is also provided with a positioning hole 108 and a positioning block 109 for positioning when the two half shafts are held together. Figure 13 What is provided on the half shaft 103a shown in Figure 1 is the positioning block 109, and a positioning groove that can be fitted with the positioning block 109 is provided at the corresponding position of the other half shaft. As Figure 3 shown, after the two half shafts are held together, they can also be fixed by a connecting member 110. In this embodiment, the first ventilation pipe 102a and the second ventilation pipe 102b supply clean gas with high cleanliness requirements that directly contacts the wafer, so its sealing structure requires that no particulate matter pollution is generated due to mechanical friction; while the third ventilation pipe 102c and the fourth ventilation pipe 102d supply driving gas for driving the cylinder, and have lower cleanliness requirements, so a direct contact closed structure connected by a seal can be adopted, and its airtightness is relatively high. Of course, if only considering cleanliness, in other embodiments of the present invention, it can also be entirely replaced by the sealing structure composed of the sealing ring convex 106 and the sealing ring groove 107.

[0084] Embodiment Two

[0085] Please refer to Figure 14 , this embodiment provides a substrate support device including the rotating shaft described in Embodiment One.

[0086] The substrate support device includes:

[0087] a substrate chuck 201 for receiving and fixing the substrate 200. The substrate chuck 201 is provided with a first air jet pipe 202 and a second air jet pipe 203. The air outlets of the first air jet pipe 202 and the second air jet pipe 203 are arranged on the receiving surface 201a of the substrate chuck 201 for receiving the substrate 200. The first air jet pipe 202 is used for jetting air to the substrate 200 and adsorbing the substrate 200 by the Bernoulli principle, and the second air jet pipe 203 is used for jetting air to the substrate 200 and blowing up the substrate 200;

[0088] The rotating shaft 300 as described in Embodiment 1, the central rotating shaft of the rotating shaft 300 is connected to and drives the substrate chuck 201 to rotate, and the air outlet of the air supply pipe of the rotating shaft 300 is connected to the air inlets of the first air jet pipe 202 and the second air jet pipe 203.

[0089] It should be noted that Figure 14 only schematically marks the positional relationship between the substrate chuck 201 and the rotating shaft 300. For the specific structure of the rotating shaft 300, please refer to that described in Embodiment 1.

[0090] As an example, as Figure 14 shown, the air outlets of the first air jet pipe 202 and the second air jet pipe 203 are multiple. Among them, the jetting direction of the air outlet of the first air jet pipe 202 is inclined to the receiving surface 201a and forms a set angle with the receiving surface 201a; the jetting direction of the air outlet of the second air jet pipe 203 is perpendicular to the receiving surface 201a. By jetting air from the air outlet of the first air jet pipe 202, the substrate 200 can be adsorbed and held above the placement surface by using the Bernoulli principle and will not be blown away by the jetting gas. By jetting air from the air outlet of the second air jet pipe 203, the substrate 200 can be blown and floated to adjust the distance between the substrate 200 and the receiving surface 201a to keep it floating and not in contact with the receiving surface 201a. As described in Embodiment 1, the air supply of the first air jet pipe 202 and the second air jet pipe 203 comes from the first air supply pipe 102a and the second air supply pipe 102b. Since it will directly contact the surface of the wafer, the requirement for cleanliness is relatively high. The air supply of the above two groups of air supply pipes can be controlled separately, so that the substrate 200 can be stably held above the substrate chuck 201 during the process. In Figure 14 the above two groups of air supply pipes are supplied with air by the first air source 301 and the second air source 302. In this embodiment, the cleaning liquid or etching liquid is also supplied through the liquid supply nozzle 400, and the wet cleaning or etching process is carried out while keeping the substrate 200 rotating.

[0091] As an example, as Figure 14As shown, the substrate chuck 201 is further provided with positioning pins 204 for clamping and fixing the substrate 200. The positioning pins 204 are driven by a cylinder, and the cylinder is connected to the ventilation pipeline of the rotating shaft 300 through a cylinder driving air pipe. As described in Embodiment 1, the driving air supply of the cylinder comes from the third ventilation pipeline 102c and the fourth ventilation pipeline 102d, which have relatively low requirements for cleanliness but relatively high requirements for airtightness. In this embodiment, the reason for requiring two ventilation pipelines to supply air to the cylinder is that the multiple positioning pins 204 on the substrate chuck 201 and their driving cylinders are arranged in two groups. When one group clamps the substrate 200, the other group releases it; when the other group clamps the substrate 200, the previously clamped group releases the substrate 200. Through the above settings, the positions where the edges of the substrate 200 are clamped can also be fully processed by processes such as wet cleaning. The air supply source for the cylinder connecting the third ventilation pipeline 102c and the fourth ventilation pipeline 102d is not shown in Figure 14 The first gas source 301 and the second gas source 302 can both supply clean nitrogen or inert gas, and the flow rate is precisely controlled by the MFC. The air supply for the cylinder driving air supply is used to drive the cylinder to act. It has relatively low requirements for flow control and cleanliness and can be compressed air provided by equipment such as an air compressor, or the same gas source as the first gas source 301 and the second gas source 302 can also be used.

[0092] As an example, as Figure 14 shown, the substrate chuck 201 is further provided with guide posts 205 for guiding and positioning the substrate 200 at a set position. When the substrate 200 is placed from above the substrate chuck 201, the conical guide posts 205 can guide the substrate 200 to the set position on the substrate chuck 201.

[0093] Through the substrate support device provided in this embodiment, not only can it ensure that the substrate 200 floats above the substrate chuck 201 during the process without direct contact, but also through the sealing structure of the sealing ring protrusion 106 and the sealing ring groove 107, while maintaining a non-contact structure that does not generate particulate pollution, its sealing performance is also enhanced, and the stability of the substrate 200 during the process is increased. It should be noted that in this embodiment, what is exemplified is the case where the rotating shaft provided by the present invention is applied to the substrate support device of a single-wafer cleaning or etching device. In other embodiments of the present invention, the rotating shaft can also be applied to other rotating devices that require high-cleanliness air supply.

[0094] In summary, the present invention provides a rotating shaft and a substrate support device including the rotating shaft. The rotating shaft includes: a central rotating shaft, an air vent pipe is arranged inside the central rotating shaft, an air inlet of the air vent pipe is arranged on the outer wall of the central rotating shaft, and an air outlet of the air vent pipe is arranged at one end in the axial direction of the central rotating shaft; a hollow outer shaft, the hollow outer shaft is arranged around the axis of the central rotating shaft on the periphery of the central rotating shaft, and a set distance is provided between the inner wall of the hollow outer shaft and the outer wall of the central rotating shaft; a gas guiding groove is arranged on the inner wall of the hollow outer shaft, the gas guiding groove is arranged around the axis of the central rotating shaft and communicates with the air inlet of the air vent pipe; the hollow outer shaft is further provided with a gas supply pipe, an air inlet of the gas supply pipe is arranged on the outer wall of the hollow outer shaft, and an air outlet of the gas supply pipe communicates with the gas guiding groove; the central rotating shaft further has paired sealing ring protrusions, the sealing ring protrusions are arranged around the axis of the central rotating shaft on the outer wall of the central rotating shaft, and the air inlet of the air vent pipe is located between the paired sealing ring protrusions in the axial direction of the central rotating shaft; the hollow outer shaft further has paired sealing ring grooves, the sealing ring grooves are arranged around the axis of the central rotating shaft on the inner wall of the hollow outer shaft, and the gas guiding groove is located between the paired sealing ring grooves in the axial direction of the central rotating shaft; the sealing ring protrusions are embedded in the sealing ring grooves. By arranging the sealing ring protrusions and the sealing ring grooves at the adjacent positions of the gas guiding groove and the gas supply pipe in the rotating shaft, the present invention ensures that the central rotating shaft and the hollow outer shaft do not directly contact, and at the same time enhances the sealing performance of the sealing structure of the rotating shaft and improves the process stability of the device.

[0095] The above embodiments are only illustrative of the principles and effects of the present invention, and are not used to limit the present invention. Any person familiar with this technology can modify or change the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or changes made by those with ordinary knowledge in the technical field without departing from the spirit and technical idea disclosed by the present invention should still be covered by the claims of the present invention.

Claims

1. A rotating shaft, characterized in that, Comprising: A central rotating shaft, inside which there is a ventilation duct. The air inlet of the ventilation duct is arranged on the outer wall of the central rotating shaft, and the air outlet of the ventilation duct is arranged at one end in the axial direction of the central rotating shaft; A hollow outer shaft, which is arranged around the axis of the central rotating shaft on the periphery of the central rotating shaft, and there is a set distance between the inner wall of the hollow outer shaft and the outer wall of the central rotating shaft; The inner wall of the hollow outer shaft is provided with air guiding grooves, which are arranged around the axis of the central rotating shaft and communicate with the air inlet of the ventilation duct; The hollow outer shaft is also provided with a gas supply duct. The air inlet of the gas supply duct is arranged on the outer wall of the hollow outer shaft, and the air outlet of the gas supply duct communicates with the air guiding grooves; The central rotating shaft also has sealing ring protrusions arranged in pairs, which are arranged around the axis of the central rotating shaft on the outer wall of the central rotating shaft, and the air inlet of the ventilation duct is located between the sealing ring protrusions arranged in pairs in the axial direction of the central rotating shaft; The hollow outer shaft also has sealing ring grooves arranged in pairs, which are arranged around the axis of the central rotating shaft on the inner wall of the hollow outer shaft, and the air guiding grooves are located between the sealing ring grooves arranged in pairs in the axial direction of the central rotating shaft; The sealing ring protrusions are embedded in the sealing ring grooves.

2. The rotating shaft according to claim 1, characterized in that, There are multiple sealing ring protrusions and sealing ring grooves, and they correspond to each other one by one.

3. The rotating shaft according to claim 1, characterized in that, There are multiple ventilation ducts, air guiding grooves and gas supply ducts. The multiple air guiding grooves are arranged in sequence along the axial direction of the central rotating shaft on the inner wall of the hollow outer shaft, and the air inlets of the multiple ventilation ducts are arranged in sequence along the axial direction of the central rotating shaft on the outer wall of the central rotating shaft and correspond to the air guiding grooves one by one.

4. The rotating shaft according to claim 1, characterized in that, The radial gap between the sealing ring protrusions and the sealing ring grooves is smaller than the axial gap between the sealing ring protrusions and the sealing ring grooves.

5. The rotating shaft according to claim 1, characterized in that, The protruding height of the sealing ring protrusions is smaller than the recessed depth of the sealing ring grooves.

6. The rotating shaft according to claim 1, characterized in that, Different regions in the sealing ring grooves have different recessed depths. The recessed depth of the sealing ring groove on the side close to the air guiding groove is greater than the recessed depth of the sealing ring groove on the side far from the air guiding groove.

7. The rotating shaft according to claim 1, wherein One end of the central rotating shaft is fixedly connected to a transmission device and rotates around its axis under the drive of the transmission device.

8. The rotating shaft according to claim 1, characterized in that, Part or all of the structure of the hollow outer shaft is formed by the clamping of paired half shafts.

9. A substrate support device, characterized in that, Comprising: A substrate chuck for receiving and fixing a substrate. The substrate chuck is provided with a first air jet pipe and a second air jet pipe. The air outlets of the first air jet pipe and the second air jet pipe are arranged on the receiving surface of the substrate chuck for receiving the substrate. The first air jet pipe is used for jetting air to the substrate and adsorbing the substrate by the Bernoulli principle, and the second air jet pipe is used for jetting air to the substrate and blowing the substrate up; The rotating shaft as described in any one of claims 1-8, the central rotating shaft of the rotating shaft is connected to and drives the substrate chuck to rotate, and the air outlet of the ventilation duct of the rotating shaft is connected to the air inlets of the first air jet pipe and the second air jet pipe.

10. The substrate support device according to claim 9, characterized in that, The air outlets of the first air jet pipe and the second air jet pipe are multiple.

11. The substrate support device according to claim 10, wherein, The jetting direction of the air outlet of the first air jet pipe is inclined to the receiving surface and forms a set angle with the receiving surface; the jetting direction of the air outlet of the second air jet pipe is perpendicular to the receiving surface.

12. The substrate support device according to claim 9, wherein, The substrate chuck is further provided with positioning pins for clamping and fixing the substrate, the positioning pins are driven by cylinders, and the cylinders are connected to the ventilation pipeline of the rotating shaft through cylinder driving air pipes.

13. The substrate support device according to claim 9, wherein The substrate chuck is further provided with guide posts for guiding and limiting the substrate to a set position.

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