Actuator device for aligning component, projection exposure equipment and method for aligning component

Abstract

The invention relates to an actuator device (1) for aligning an element (2), comprising at least one first actuator unit (7) which can be fastened to a support structure (5) for a first setting range and a second actuator unit (8) which can be fastened to the element (2) for a second setting range. The first actuator unit (7) has an adjustment element (13) and a fixing element (14) which can be fastened to the support structure (5), wherein the fixing element (14) is designed to fix an output element (9) in a force-fitting manner in an operating state of the element (2). The fixing element (14) is additionally designed to release the force-fitting connection in the adjustment state of the element (2) in order to adjust the output element (9) by means of the adjustment element (13).

Description

[0001] This application claims the priority of German patent application number DE 10 2018 216 964.0, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0002] The invention relates to an actuator arrangement for aligning elements.

[0003] The invention further relates to a projection exposure apparatus for semiconductor lithography, comprising an illumination system comprising a radiation source and an optical unit.

[0004] The invention also relates to a method for aligning a component. Background Art

[0005] It is known from the general prior art, in particular electronics or optics, that a plurality of components or elements must be aligned as accurately as possible, in particular for the purpose of optimizing their function. For the purpose of aligning such components, actuator devices are known which perform the alignment or setting of the components within a defined setting range, the so-called "actuator range".

[0006] If the setting range is to be relatively large and the setting is to be achieved relatively accurately, specific demands are placed on the actuator device. Large setting ranges with simultaneously very high positioning accuracy can only be achieved with difficulty or at high cost using the solutions known from the prior art.

[0007] In this context, specific demands are made on projection exposure apparatuses for semiconductor lithography.

[0008] Due to the increasingly miniaturized semiconductor circuits, the requirements on the resolution and accuracy of projection exposure apparatuses are increasing equally. Correspondingly high requirements are also placed on the components used therein, in particular on the optical elements which, among other things, influence the beam path within the projection exposure apparatus.

[0009] In projection exposure devices for semiconductor lithography, a plurality of actuators, for example moving coil actuators, are often used in order to mechanically adjust or align optical elements in the illumination system of the projection exposure device, so that the beam path of the radiation source can be controlled or influenced and in particular imaging aberrations can thereby be corrected and the projection exposure device can thus be optimized.

[0010] WO 2005 / 026801 A2 discloses the use of a drivable axis of motion for adjusting or aligning optical elements (such as mirrors) for EUV ("extreme ultraviolet") projection exposure equipment with multiple degrees of freedom by means of an actuating unit in the form of a Lorentz actuator. A moving coil actuator can be used for this purpose, wherein a linearly movable actuating unit in the form of a magnet - a translator - can be moved by electromagnetic interaction with a statically mounted coil surrounding the translator. In this case, the translator is connected to the optical element via a guide element, to which the effected movement is transmitted.

[0011] The increasing demands on the alignment or actuation of optical elements in projection exposure apparatuses, in particular mirrors in EUV projection exposure apparatuses, presuppose relatively large setting ranges with simultaneously very high positioning accuracy. In this case, the large setting ranges also result from assembly, adjustment and integration tolerances as well as thermal influences.

[0012] DE 198 31 744 A1 discloses an actuator device of the generic type, in which provision is made for providing a spindle nut for coarse adjustment for converting a rotary movement into a linear movement and for arranging a piezoelectric linear actuating element in series therebetween for fine adjustment.

[0013] In addition to adjustments of several millimeters, the device described in DE 198 31 744 A1 is also intended to enable exact positioning.

[0014] The problem in this case is that optical elements, in particular mirrors of an EUV projection exposure apparatus, can weigh several hundred kilograms, so that a particularly stable construction is necessary, in particular in order to maintain a high positioning accuracy also in the operating state.

[0015] For this reason, projection exposure apparatuses used in the prior art currently do not use actuator arrangements in which two actuator units are connected in series. Instead, actuators are used which are aligned so as to cover the entire setting range. For this purpose, actuators of this type generally have a setting range of approximately 1000 μm. A disadvantage of actuator arrangements of this type is that only very high positioning accuracy can be achieved with difficulty due to the relatively large setting range (“actuator range”) of the projection exposure apparatus.

[0016] An actuator known from the prior art and used in a projection exposure apparatus may be a linear actuator, for example a piezoelectric actuator. Summary of the invention

[0017] The invention is based on the object of providing an actuator arrangement for an alignment element which allows a high positioning accuracy within a relatively large setting range.

[0018] Likewise, the invention is based on the object of providing a method for aligning components which can maintain a high positioning accuracy within a relatively large setting range.

[0019] Additionally, the invention is based on the object of providing a projection exposure apparatus for semiconductor lithography which comprises at least one optical element to be aligned which can be set with a high positioning accuracy within a relatively large setting range.

[0020] This object is achieved for an actuator arrangement for an alignment element by the features presented below and for a method for an alignment element by the features presented below.This object is achieved for a projection exposure apparatus by the features presented below.

[0021] The dependent claims and the features described below relate to advantageous embodiments and variants of the invention.

[0022] The actuator device for aligning an element according to the invention comprises: at least one first actuator unit capable of being fastened to a supporting structure for a first setting range, and a second actuator unit capable of being fastened to the element for a second setting range. According to the invention, the second actuator unit is operatively connected to an output element of the first actuator unit, such that the positioning of the second actuator unit is adjustable by adjusting the output element. Preferably, the output element supports the second actuator unit, such that adjustment of the output element results in adjustment of the second actuator unit or a change in its alignment.

[0023] The invention provides that the first actuator unit has an adjustment element and a fixing element which can be fastened to a support structure, wherein the fixing element is configured to fasten the output element in a force-locking manner in the operating state of the element. The fixing element is also configured to release the force-locking connection in the setting state of the element (i.e. when the element is intended to be aligned within a first setting range) so that the output element can be adjusted by the adjustment element.

[0024] The fastening of the output element by force locking or frictional engagement is particularly suitable in order to ensure a reliable transmission of the weight of the element, in particular the optical element, in the operating state and in order to introduce forces into the support structure.

[0025] By means of the fact that the actuator device comprises two actuator units arranged in series, the tasks that the actuator device has to fulfill can be shared. The first actuator unit for the first setting range preferably meets the task of the rough setting of the element. It has been found that a large setting range is required for the first setting and / or start-up and / or basic setting of the element. In the case of the first setting, it is usually necessary to compensate for assembly, adjustment and integration tolerances. This is achieved in the case of a projection exposure device, for example, by the following process: measuring the wavefront and performing a basic setting of the optical element (mirror, lens element, prism, etc.) depending on the measurement results in order to compensate for deviations. In the case of a projection exposure device in particular, it has been found that during the first setting only 90% of the setting range of 1000 μm required in total is required, for example, in order to align the element, in the present case the optical element, for example the mirror of the EUV projection exposure device, depending on the result of the wavefront measurement. According to the invention, this alignment, which can also be referred to as the rough setting, is preferably performed by the first actuator unit of the actuator device. Therefore, the first actuator unit is preferably designed to cover a corresponding large setting range.

[0026] The second actuator unit for the second setting range preferably performs fine settings, in particular alignment of the component during operation. Insofar as the component is an optical element, in particular an optical element of a projection exposure apparatus, it has been found that the setting range required during operation is relatively small compared to the setting range required to perform the first setting of the optical element. The setting range required for aligning the component, in particular the optical element, during operation is typically only 10% of the total setting range. In the case of a projection exposure apparatus, it is sufficient if the second setting range is 100 μm. Therefore, the second actuator unit is preferably configured to cover the corresponding setting range, but not the setting range of the first setting.

[0027] The actuator arrangement according to the invention can now configure the first actuator unit in a particularly advantageous manner so that the first setting range preferably enables a rough setting. For this purpose, the first actuator unit can be configured to cover a relatively large setting range, wherein the restrictions in the case of positioning accuracy are not primarily relevant in this regard. In other words, it is acceptable that the positioning accuracy does not have to be as high as is ultimately desired for the alignment element, in particular the reflector. The actuator arrangement according to the invention can accomplish this task by means of a second actuator unit, which then requires a smaller setting range than the first actuator unit, such as in the ratio of 9:1, which results in the second actuator unit being able to have a very high positioning accuracy.

[0028] The disadvantages of the actuator devices known from the prior art, which comprise two actuator units arranged in series, are avoided by the actuator device according to the invention by means of the fact that the first actuator unit has an adjustment element and a fixing element, which can be fastened to the support structure. In this case, the fixing element is configured to fasten the output element in a force-locking manner in the operating state of the element. The fixing element thus establishes a fixed connection between the output element and the support structure. The weight of the element, in particular the weight of the optical element of the projection exposure device, is thus introduced into the support structure via the output element and the fixing element in the operating state, so that a fixed connection is created. The fixing element is fixedly and immovably connected to the support structure.

[0029] The fixing element is further configured to release the force-locking connection in the setting state of the element so that the output element can be adjusted by the adjusting element. This ensures that within a first setting range, in particular for the purpose of rough setting, in particular before a first start-up, the element can be aligned over a desired range by the first actuator unit. Once the alignment has been achieved, the fixing element closes the force-locking connection and thus fixes the alignment of the element, in particular the alignment of the optical element. In the operating state, the alignment required for the operation of the element, in particular the optical element, can then be achieved by the second actuator unit. The actuator device according to the invention thus makes it possible to perform the rough setting with the first actuator unit, which can also be referred to as a "long-stroke" actuator, while during operation the fine setting is performed by the second actuator unit, which can also be referred to as a "short-stroke" actuator. In particular in the case of optical elements of a projection exposure apparatus, in particular in the case of mirrors of an EUV projection exposure apparatus, it has been found that a range of 100 μm is sufficient to correct optical aberrations during operation.

[0030] According to the invention, it can be provided that the first actuator unit, in particular the adjusting element of the first actuator unit, is configured to carry out a stroke movement in order to raise or lower the output element in an axial direction. In this case, the axial direction is a direction extending axially parallel to a center axis of the output element, so that the output element is displaced, i.e. raised or lowered, preferably orthogonally to a plane of the element, in particular a plane of an optical element of the projection exposure apparatus.

[0031] Preferably, the first actuator unit or the adjusting element of the first actuator unit is configured to perform a stroke movement only in the axial direction and not in other directions.

[0032] According to the invention, it can be provided that the first actuator unit has a housing which can be fastened to a supporting structure, wherein the fixing element and / or the adjusting element is fastened in the housing.

[0033] The effect of an embodiment of an actuator unit having a housing (which is preferably rigidly or immovably fastened or connected to a support structure and in which the fixing element and / or the adjustment element are correspondingly immovably fastened) is that the force from the element (in particular the optical element) is introduced via the output element and the fixing element into the housing of the first actuator unit and from there into the support structure.

[0034] The first actuator unit thus particularly advantageously absorbs the weight of the element and introduces this weight into the supporting structure.

[0035] It is advantageous if the securing element is configured to secure the output element in a force-locking manner by clamping.

[0036] An arrangement in which the fixing element secures the output element in a force-locking manner by clamping has proven to be particularly suitable in order to achieve a secure connection in the operating state on the one hand and to be able to release the connection between the fixing element and the output element in the setting state on the other hand.

[0037] It is advantageous if the fastening element is shrink-fitted onto at least one section of the output element in the operating state.

[0038] It has proven particularly suitable to realize a force-locking connection by shrinking the fixing element onto at least one part of the output element, preferably in an annular manner, extending around a partial area of ​​the output element. Shrink fitting is a technical method for force-locking connections based on the principle of thermal expansion. A permanent and fixed connection can be produced by shrink fitting. In this regard, it is known, for example, to connect a wheel tire of a railway wheel to an axle by shrink fitting.

[0039] It is particularly advantageous if the fastening element is embodied as a clamping ring.

[0040] It is particularly advantageous if the clamping ring is shrink-fitted onto the output element.

[0041] It can be provided that the clamping ring and the output element, which is preferably embodied as a shaft or a piston, are produced with an interference fit; preferably such that the two parts cannot be connected to one another at normal temperature. If the outer part (generally the clamping ring) is heated, the latter expands, so that the clamping ring and the output element are not connected to one another in a force-locking manner. As soon as a force-locking connection is desired, for example in the operating state, this can be achieved by cooling the clamping ring, preferably to normal or ambient temperature, so that the clamping ring is shrink-fitted onto the outer peripheral edge of the output element.

[0042] In principle, a non-positive connection between the clamping ring and the output element can also be achieved by a reverse method known as cold shrinking or by thermal expansion joining.

[0043] Alternatively, it can also be provided that the output element cools in order to release the force-locking connection between the fixing element and the output element. The force-locking connection can then be reestablished by subsequently heating the output element again, for example to normal or ambient temperature.

[0044] However, a shrink-fit connection by heating (releasing) or cooling (connecting) of the clamping ring is particularly suitable.

[0045] According to the invention, it can be provided that the clamping ring has a receiving opening which circumferentially surrounds at least a portion of the output element, and wherein the receiving opening has a first diameter in an operating state in order to fix the output element in a force-locking manner, and wherein the receiving opening has a second, enlarged diameter in a set state so that the force-locking connection to the output element is released in order to be able to adjust the output element by means of an adjustment element.

[0046] Such a configuration makes it possible to establish a connection between the clamping ring and the output element particularly advantageously, in particular when the latter is embodied as an output shaft or output piston. Preferably, the output element has an outer lateral surface embodied in cylindrical form at least in a partial region and is surrounded by the clamping ring. Preferably, the lateral surface is embodied as a right cylinder.

[0047] It is advantageous if the clamping ring is heated in the set state.

[0048] Furthermore, it is advantageous if the clamping ring is not heated in the operating state and preferably has a normal temperature. Thus, in the operating state, a force-locking connection between the clamping ring and the output element is established, which does not require energy input. Such a solution is advantageous for many applications in the technical field, since the introduction of energy and heat is often undesirable or triggers negative effects. In particular, if the element is an optical element of a projection exposure apparatus, it is advantageous if the force-locking connection requires no energy input or heating in the operating state.

[0049] It is advantageous if the clamping ring has power terminals and / or is powered for heating purposes.

[0050] Such a configuration makes it possible in a simple manner to heat the clamping ring, so that the latter expands and releases the connection to the output element.

[0051] Preferably, the clamping ring is made of high-grade steel.

[0052] Preferably, the output element is formed of a material that expands very little when exposed to heat and preferably has a low, particularly preferably very low, coefficient of thermal expansion. An embodiment of the output element made of an ionic nickel alloy, preferably Invar (a trademark owned by Imphy Alloys), is particularly suitable. However, some other materials may also be used for the output element.

[0053] Heating the clamping ring by means of an electric current can preferably be achieved by means of a clamping ring comprising or being equipped with a wire, which preferably has a high electrical resistance and through which an electric current is passed so that the latter correspondingly heats up.

[0054] It is advantageous if the clamping ring is energized in the operating state.

[0055] This configuration firstly prevents the clamping ring from heating up and secondly prevents the clamping ring from being able to generate interfering magnetic fields.The emission of heat or magnetic influences should be avoided in particular in the case of projection exposure apparatuses.

[0056] It is advantageous if the clamping ring is connected to the housing via webs and / or connecting elements and / or joints.

[0057] The clamping ring can be expanded particularly advantageously if it is connected in the housing via webs and / or connecting elements and / or joints which allow a defined thermal expansion of the clamping ring. The webs and / or connecting elements are preferably designed integrally with the housing.

[0058] It is advantageous if the web and / or the connecting element and / or the coupling are flexible and / or compliant and / or yielding in the radial direction so that the clamping ring can expand thermally in the radial direction, but are embodied in a rigid and / or immovable manner in the axial direction in order to absorb the forces acting in the axial direction of the output element and in order to introduce them into the support structure via the housing.

[0059] The above-described configuration makes it possible for the clamping ring to expand in order to release the connection to the output element. At the same time, it is ensured that, when the clamping connection is closed again, the weight of the element, in particular an optical element of the projection exposure apparatus, can be reliably absorbed and introduced from the clamping ring via the web and / or the connecting element and / or the joint into the housing and from there into the support structure.

[0060] The web and / or the connecting element and / or the joint are preferably implemented to be radially flexible and axially rigid. In this case, "axial rigidity" should be understood to mean that the web and / or the connecting element and / or the joint can withstand forces in the axial direction, i.e., forces extending axially parallel to the central axis of the output element or the clamping ring, without yielding. "Radial flexibility" should be understood to mean that the web and / or the connecting element and / or the joint are implemented to be flexible or can be compliant or compliant in the radial direction (i.e., in a plane extending orthogonal to the central axis of the clamping ring or the output element).

[0061] In the case of a configuration in which the clamping ring has webs or the like, preferably an axially rigid and radially flexible configuration can be achieved by means of webs that do not extend radially or are not aligned with the center axis of the clamping ring but extend at an angle thereto, so that these webs deflect or yield if the clamping ring exerts radial forces thereon.

[0062] The housing can be produced from any desired material suitable for taking up the forces, in particular also the weight of the element, and introducing these forces into the support structure. In particular, embodiments of the housing consisting of metal, optionally high-grade steel or invar, are possible.

[0063] It is advantageous if the temperature of the clamping ring in the set state is 40° C. to 100° C., preferably 50° C. to 90° C., particularly preferably 50° C. to 80° C., very particularly preferably 50° C. to 70° C., in particular 60° C. + / - 5° C. This has proven to be particularly suitable for releasing the force-locking connection between the clamping ring and the output element in the set state. If the heating is achieved by energizing, this energizing is controlled accordingly by closed-loop or open-loop control.

[0064] It is advantageous if the temperature of the clamping ring in the operating state is 10° C. to 30° C., preferably 15° C. to 25° C., particularly preferably 20° C. to 25° C., very particularly preferably 22° C.+ / -2° C. or the ambient temperature. The aforementioned values ​​have proven to be particularly suitable in order to obtain a reliable and permanent force-locking connection between the clamping ring and the output element in the operating state. The values ​​can also preferably be selected such that they take into account the temperature at which the element to be aligned, in particular an optical element of a projection exposure apparatus, is operated.

[0065] According to the invention, it can be provided that the adjusting element is heatable for the purpose of adjusting the output element. In principle, after releasing the force-locking connection between the output element and the fastening element, the adjusting element can be actuated in various ways in order to achieve the effect that the adjusting element is aligned with the output element to the desired extent. However, it has proven to be particularly suitable if the adjusting element is designed to be heatable for the purpose of adjusting the output element.

[0066] The adjustment element can be implemented in particular as a thermal actuator, for example a so-called high output paraffin (HOP) actuator. Thermal actuators are actuators comprising an expansion material element (e.g. wax, oil, paraffin or metal) which undergoes a change in volume in a temperature-dependent manner which is so significant that this can be converted into a movement of a piston, for example. For the purpose of heating, which can preferably be provided by energization, such thermal actuators generally require only a small energy requirement. Thermal actuators require only a small space requirement.

[0067] It is advantageous if the adjusting element is heated so that a mechanical connection to the output element is established or a force is exerted on the output element before the fixing element releases the force-locking fixing of the output element. This avoids a situation in which the element to be aligned changes its position in an undesirable manner or falls out after the force-locking connection between the fixing element and the output element is released.

[0068] In the set state, the adjusting element can then influence the alignment of the output element so that the element is aligned in a defined manner.

[0069] After the output element has been aligned by the adjusting element or when the elements have been aligned to the desired extent and with regard to positioning accuracy, the fixing element can close the non-positive connection again. Preferably, in this case, the fixing element, in the embodiment of a clamping ring, is cooled down again to normal or ambient temperature in order to reestablish the non-positive connection. Afterwards, preferably, the adjusting element can also be cooled down again, so that preferably the mechanical connection between the output element and the adjusting element is disconnected again or the adjusting element no longer exerts a force on the output element.

[0070] It is advantageous if the actuating element is mechanically decoupled from the output element in the actuated state and / or does not exert any force on the output element.

[0071] Furthermore, it is advantageous if the setting element fully supports the weight forces assigned to the elements of the actuator arrangement in the set state.

[0072] According to the invention, it can be provided that the first setting range of the first actuator unit corresponds to three to twenty times, preferably four to fifteen times, particularly preferably five to fifteen times, more preferably six to twelve times, particularly preferably seven to eleven times, and very particularly preferably eight to ten times the second setting range of the second actuator unit.

[0073] The abovementioned values ​​have proven to be particularly suitable in order to achieve the effect that the first actuator unit covers a large setting range and the second actuator unit can have a high positioning accuracy due to the significantly smaller setting range.

[0074] It is advantageous if the setting range of the first actuator unit is 700 to 1500 μm, preferably 800 to 1200 μm, particularly preferably 800 to 1000 μm and in particular 900 μm+ / -50 μm, and / or if the setting range of the second actuator unit is 10 to 200 μm, preferably 50 to 200 μm, more preferably 50 to 150 μm, particularly preferably 80 to 120 μm and in particular 100 μm+ / -10 μm.

[0075] The above values ​​have proven to be suitable for many applications. In particular, the above values ​​are suitable if the element to be aligned is an optical element of a projection exposure apparatus, in particular a mirror of an EUV projection exposure apparatus.

[0076] According to the invention, it can also be provided that the accuracy of the setting accuracy of the second actuator unit is better than 100 pm, preferably better than 50 pm, particularly preferably better than 10 pm. In particular, if the element to be aligned is an optical element of a projection exposure apparatus, in particular a mirror of an EUV projection exposure apparatus, the above values ​​have proven to be particularly suitable.

[0077] It is advantageous if the element to be aligned is an optical element of a projection exposure apparatus.

[0078] It can be provided that, in particular for aligning an optical element of a projection exposure apparatus, a plurality of, preferably three, actuator devices are combined to form an actuator device for aligning the optical element.

[0079] The present invention also relates to a method for aligning an element by means of an actuator device, the actuator device comprising a first actuator unit fastened to a supporting structure and designed for a first set range and a second actuator unit fastened to the element and designed for a second set range, the second actuator unit then being operably connected to an output element of the first actuator unit so that the positioning of the second actuator unit is adjusted by adjusting the output element, wherein the first actuator unit has a fixing element and an adjusting element, wherein the method according to the invention provides that the fixing element is fastened to the supporting structure and the fixing element fixes the output element in a force-locking manner in an operating state of the element, and then the fixing element releases the force-locking connection in a set state of the element, in which set state the element is aligned within the first set range, the adjusting element then adjusts the output element, and then the fixing element closes the force-locking connection again after adjusting the output element.

[0080] It is advantageous if the first setting range of the first actuator unit is used for coarse setting, preferably during first setting and / or basic setting and / or start-up of the element, while the second setting range of the second actuator unit is used in the operating state of the element for the purpose of aligning the element.

[0081] Furthermore, it is advantageous if during the alignment of the element by means of the first actuator unit the alignment of the element is measured and settings are effected by means of the first actuator unit until a defined alignment of the element is obtained.

[0082] It is advantageous if the first actuator unit has a closed-loop control function or a feedback function so that the first actuator unit can align the output element in a targeted manner and infer the alignment accordingly. In principle, however, it is also possible to omit the closed-loop control or feedback function in the case of the first actuator unit and to measure the correspondingly achieved element alignment by a separate measuring system. In particular if the element to be aligned is an optical element of a projection exposure apparatus, an available measuring system can check the alignment of the optical element and control the first actuator unit accordingly.

[0083] It is advantageous if the adjusting element is heatable for the purpose of adjusting the output element.

[0084] Features and advantages which have been described above or which will be described below in conjunction with the device according to the invention apply correspondingly to the method according to the invention, or vice versa.

[0085] The device according to the invention and the method according to the invention are particularly suitable for a projection exposure device for semiconductor lithography, which comprises an illumination system, which comprises a radiation source and an optical unit having at least one optical element to be aligned, wherein the optical element to be aligned is alignable and / or mountable and / or adjustable and / or manipulable and / or deformable by an actuator device as claimed in any one of claims 1 to 18 or the above description.

[0086] In principle, the invention is suitable for a plurality of applications for correcting imaging aberrations of projection exposure apparatuses, since according to the invention large setting ranges can be corrected simultaneously with a high setting accuracy.

[0087] The invention can also be used advantageously for correcting pattern errors in projection exposure apparatuses, for example in which the projection lens has a strongly free surface, such as for example projection lenses for EUV lithography with a high numerical aperture (so-called "high NA" EUV projection lenses).

[0088] The solution according to the invention, in particular with regard to EUV projection exposure tools, also advantageously makes it possible to correct imaging aberrations caused by undesired heating of optical elements, such as mirrors or wafers.

[0089] The invention is particularly suitable for use with microlithography DUV ("deep ultraviolet") and EUV projection exposure equipment.

[0090] One possible use of the invention relates to immersion lithography, where process errors requiring a large actuator range can also be corrected with high accuracy.

[0091] Furthermore, reference is made to the fact that terms such as "comprising", "having" or "having" do not exclude other features or steps. Furthermore, terms such as "a" or "the" indicating a single step or feature do not exclude a plurality of features or steps - and vice versa.

[0092] Exemplary embodiments of the present invention are explained in more detail below with reference to the accompanying drawings.

[0093] The accompanying drawings show preferred exemplary embodiments in each case, in which individual features of the invention are described in combination with one another. The features of the exemplary embodiments can also be realized independently of other features of the same exemplary embodiment and can therefore be combined accordingly by a person skilled in the art with the features of other exemplary embodiments to form other advantageous combinations and sub-combinations. BRIEF DESCRIPTION OF THE DRAWINGS

[0094] In the figures, functionally identical elements are provided with the same reference symbols.

[0095] Indicatively,

[0096] Figure 1 An EUV projection exposure apparatus is shown;

[0097] Figure 2 A DUV projection exposure apparatus is shown;

[0098] Figure 3 A projection exposure apparatus for immersion lithography is shown;

[0099] Figure 4 shows a basic representation of an element to be aligned in an embodiment as an optical element of a projection exposure apparatus comprising an actuation device of three actuator devices according to the invention for aligning the optical element;

[0100] Figure 5 Shown according to Figure 4 A basic diagram of the actuator device;

[0101] Figure 6 shows a cross-sectional view through a basic diagram of an actuator arrangement comprising a first actuator unit and a second actuator unit;

[0102] Figure 7 The first actuator unit is shown along Figure 6 A cross-sectional view taken along line VII-VII; and

[0103] Figure 8 The basic illustration shows a shrink-fitting of the securing element in the embodiment as a clamping ring onto the output element embodied as a piston. DETAILED DESCRIPTION

[0104] Figure 1As an example, a basic setup of an EUV projection exposure apparatus 400 for semiconductor lithography in which the invention can find application is shown. In addition to a radiation source 402, an illumination system 401 of the projection exposure apparatus 400 comprises an optical unit 403 which illuminates an object field 404 in an object plane 405. A reticle 406 arranged in the object field 404 is illuminated, said reticle being held by a schematically illustrated reticle holder 407. A projection optical unit 408, which is only schematically illustrated, serves to image the object field 404 into an image field 409 in an image plane 410. The structures on the reticle 406 are imaged onto a photosensitive layer of a wafer 411 arranged in the image plane 410 in the region of the image field 409, said wafer being held by a wafer holder 412, which is also partially illustrated. The radiation source 402 can emit EUV radiation 413 in particular in the range between 5 nanometers and 30 nanometers. Optically differently embodied and mechanically adjustable optical elements 415 , 416 , 418 , 419 , 420 are used to control the radiation path of the EUV radiation 413 . Figure 1 In the case of the illustrated EUV projection exposure apparatus 400 , the optical elements are embodied as mirrors which are adjustable in suitable embodiments, which are mentioned in the following merely as examples.

[0105] The EUV radiation 413 generated by the radiation source 402 is collimated by a collector integrated in the radiation source 402 so that the EUV radiation 413 passes through an intermediate focus in the region of an intermediate focal plane and then impinges on a field facet mirror 415. Downstream of the field facet mirror 415, the EUV radiation 413 is reflected by a pupil facet mirror 416. With the aid of the pupil facet mirror 416 and an optical assembly 417 having mirrors 418, 419, 420, the field facets of the field facet mirror 415 are imaged into the object field 404.

[0106] Figure 2 An exemplary DUV projection exposure apparatus 100 is illustrated. The projection exposure apparatus 100 comprises an illumination system 103, a device known as a reticle stage 104 for receiving and precisely positioning a reticle 105, by which subsequent structures on a wafer 102 are determined, a wafer holder 106 for holding, moving and precisely positioning the wafer 102, and an imaging device, in particular a projection lens 107 having a plurality of optical elements 108, which are held in a lens housing 140 of the projection lens 107 by means of a mount 109.

[0107] The optical elements 108 may be implemented as individual refractive, diffractive and / or reflective optical elements 108, such as lens elements, mirrors, prisms, stop plates, and the like.

[0108] The basic functional principle of the projection exposure apparatus 100 provides for imaging a structure introduced into the reticle 105 onto the wafer 102 .

[0109] The illumination system 103 provides a projection beam 111 in the form of electromagnetic radiation, which is required for imaging the reticle 105 onto the wafer 102. Lasers, plasma sources, etc. can be used as sources of this radiation. The radiation is shaped in the illumination system 103 by optical elements so that the projection beam 111 has the desired properties with respect to diameter, polarization, shape of the wavefront when incident on the reticle 105.

[0110] An image of the reticle 105 is generated by the projection beam 111 and transferred in a suitably reduced form from the projection lens 107 onto the wafer 102. In this case, the reticle 105 and the wafer 102 can be moved synchronously, so that areas of the reticle 105 are imaged onto corresponding areas of the wafer 102 virtually continuously during a so-called scanning process.

[0111] Figure 3 A third projection exposure apparatus 200 in an embodiment as a DUV projection exposure apparatus for immersion lithography is illustrated as an example. For further background pertaining to such a projection exposure apparatus 200, reference is made to WO 2005 / 069055 A2, for example, the corresponding content of which is incorporated by reference into the present specification; therefore, the specific functions will not be discussed in detail at this time.

[0112] In accordance with Figure 2 In a manner comparable to the DUV projection exposure apparatus 100 of the present invention, the reticle stage 104 is identifiable, by which the later structures on the wafer holder 106 or the wafer 102 arranged on the wafer stage are determined. For this purpose, Figure 3 The projection exposure device 200 in FIG. 2 likewise has a plurality of optical elements, in particular lens elements 108 and mirrors 201 .

[0113] The use of the invention is not limited to use in projection exposure apparatuses 100 , 200 , 400 , in particular not to the described settings.

[0114] In principle, the device according to the invention and the method according to the invention are suitable for aligning any component, in particular for applications in which the aim is to align or set a component with a relatively large setting range and a relatively high positioning accuracy.

[0115] The invention and the following exemplary embodiments should also not be considered to be limited to a specific design.The following figures illustrate the invention only as examples and highly schematically.

[0116] Figures 4 to 8 Possible exemplary embodiments and variants of the actuator device 1 according to the invention are shown.

[0117] Figure 4The diagram shows a setting known from the prior art for aligning an element 2 in the exemplary embodiment as an optical element. Figure 4 The setup illustrated in is also particularly suitable in order to use the actuator device 1 according to the invention or a plurality of actuator devices 1 according to the invention to align an optical element 2. For other configurations of the basic setup for aligning an optical element 2, which can also be implemented in the context of the present invention, reference is made to WO 2005 / 026801 A2.

[0118] Figure 4 and 6 The optical element 2 shown in the figure can be Figure 1 , 2 One of the optical elements 415, 416, 418, 419, 420, 108, 201 shown in and 3, or a portion of the optical elements 415, 416, 418, 419, 420, 108, 201.

[0119] As from Figure 4 It is evident that the optical element is mounted or aligned by an actuation device 3 comprising a plurality (three in the exemplary embodiment) of actuator devices 1 for aligning the optical element 2 .

[0120] It has proven to be particularly suitable to mount the optical element 2 by means of three actuator devices 1. However, the invention is not limited to a specific number of actuator devices 1. The actuator devices 1 are connected to the optical element 2 via attachment points 4.

[0121] like Figure 4 As shown in the basic illustration in , the optical element 2 can be aligned or set in all axial directions of the coordinate system X, Y, Z by the actuator device 1 via the attachment points 4.

[0122] Figure 4 Also illustrated is a support structure 5 which is connected to a housing part 6 which is only shown in a basic illustration.

[0123] Figure 5 As an example, a single actuator device 1 is shown, which can also be used in Figure 4 In the actuator 3 shown.

[0124] For alignment Figure 5 The illustrated actuator device 1 of the optical element 2 comprises a first actuator unit 7 for a first setting range. In this case, the first actuator unit 7 is fastened to a support structure 5. The basic principle is as follows: Figure 4 It is also obvious.

[0125] also, Figure 5The illustrated actuator device 1 comprises a second actuator unit 8 for a second setting range, which is connected in series with the first actuator unit 7. In this case, the second actuator unit 8 is fastened to the element to be aligned, in the exemplary embodiment the optical element 2, such as Figure 4 As an example, the optical element 2 is shown in FIG. Figure 5 In this case, the attachment point 4 can be used for connection to the optical element 2 .

[0126] The invention provides that the output element 9 of the first actuator unit 7 is operatively connected to the second actuator unit 8 such that the positioning of the second actuator unit 8 is adjustable by adjusting the output element 9 .

[0127] In the exemplary embodiment, the first actuator unit 7 or the output element 9 supports the second actuator unit 8, with reference to this Figure 6 Basic diagram in .

[0128] In the exemplary embodiment, it is provided that the first actuator unit 7 is configured to carry out a coarse setting of the optical element 2, while the second actuator unit 8 is configured for a fine setting. It can be provided that the first setting range corresponds to three to twenty times, preferably four to fifteen times, particularly preferably five to fifteen times, more preferably six to twelve times, particularly preferably seven to eleven times, and very particularly preferably eight to ten times, the second setting range of the second actuator unit 8.

[0129] It is advantageous if the first setting range of the first actuator unit 7 is 700 to 1500 μm, preferably 800 to 1200 μm, particularly preferably 800 to 1000 μm and in particular 900 μm+ / -50 μm, and / or if the setting range of the second actuator unit 8 is 10 to 200 μm, preferably 50 to 200 μm, more preferably 50 to 150 μm, particularly preferably 80 to 120 μm and in particular 100 μm+ / -10 μm.

[0130] In the exemplary embodiment, it is provided that the accuracy of the setting accuracy of the second actuator unit 8 is better than 100 pm, preferably better than 50 pm, particularly preferably better than 10 pm.

[0131] In the exemplary embodiment, provision is made for a first setting range of the first actuator unit 7 for coarse setting, preferably during first setting and / or basic setting and / or start-up of the element, while a second setting range of the second actuator unit 8 is used for the purpose of aligning the element 2 in the operating state.

[0132] In an exemplary embodiment, provision can be made that during the alignment of the element 2 by the first actuator unit 7 , the alignment of the element 2 is measured and settings are effected by the first actuator unit 7 until a defined alignment of the element 2 is achieved.

[0133] In the case of the projection exposure apparatus 100 , 200 , 400 , measurements during alignment of the optical element 2 by the first actuator unit 7 can be realized by a measuring system which the projection exposure apparatus 100 , 200 , 400 has in order to check the alignment of the optical element 2 .

[0134] The second actuator unit 8 can have a construction which is known in principle, in this regard also reference being made to WO 2005 / 026801 A2.

[0135] The second actuator unit 8 can also be just a simple linear motor or a Lorentz actuator or a moving coil actuator.

[0136] In the exemplary embodiment, it is provided that the second actuator unit 8 has a configuration which has proven to be particularly valuable in principle, in particular for the alignment of the optical elements 415, 416, 418, 419, 420, 108, 201 of the projection exposure apparatus 100, 200, 400. However, the invention is not limited thereto. If the first actuator unit 7 is connected to any second actuator unit 8, the actuator device 1 according to the invention also has the advantages provided.

[0137] A particular advantage of the actuator device 1 according to the invention is that it has a modular construction. In principle, the first actuator unit 7 can be combined with any desired second actuator unit 8, without the second actuator unit 8 having to be changed in terms of design or fundamental principle. This has the advantage that the functional principle of the second actuator unit 8, which is fastened to the element to be aligned (the optical element 2 in the exemplary embodiment), can remain unchanged, so that relatively small changes need to be made to a complex system such as a projection exposure apparatus, for example in order to implement the solution according to the invention. In principle, the proven construction of the second actuator unit 8 can be maintained, wherein advantageously the second setting range of the second actuator unit 8 can be correspondingly reduced and the accuracy can therefore be increased. No further changes, in particular in terms of fundamental principle, have to be made to the second actuator unit 8.

[0138] Since the construction of the second actuator unit 8 can remain unchanged in terms of the basic principle and actuator units of this type are sufficiently known from the prior art, reference will be made below to the second actuator unit 8. Figure 5 In principle only one possible but advantageous configuration is explained.

[0139] Figure 5The illustrated second actuator unit 8 comprises (optionally) a gravity compensation device 10 and two actuator elements 11 for aligning the optical element 2. Such a configuration is particularly suitable for aligning the optical element 2, but the present invention is not limited thereto. In particular, it can also be provided that the second actuator unit 8 is implemented to be formed or constituted only by the gravity compensation device 10, or that the second actuator unit 8 is implemented as one or more (particularly two or three) actuator elements 11.

[0140] The actuating element 11 can be a known actuator, in particular an actuator that can be controlled by magnetic force. The actuating element 11 can be implemented as, for example, a Lorentz actuator or a moving coil actuator. And the same applies to the gravity compensation device 10. However, both the gravity compensation device 10 and the actuating element 11 can also be actuated mechanically; in particular, a spring for withstanding gravity can also be provided for example for the gravity compensation device 10.

[0141] The prior art discloses actuating elements 11 or actuators and gravity compensation devices 10 in various embodiments, which can be used in the context of the present invention to realize the second actuator unit 8 .

[0142] like Figure 5 As shown, the second actuator unit 8 is embodied such that it is capable of a two-dimensional movement which can be transmitted to the optical element 2 via the attachment point 4. For this purpose, a corresponding articulated connection is provided which is embodied as part of the attachment point 4 in the exemplary embodiment.

[0143] The second actuator unit 8 has a base point 12 , when adjusting the base point the gravity compensation device 10 and the actuating element 11 are also correspondingly adjusted.

[0144] It should be mentioned again that according to Figure 4 and 5 The illustration is given only as an example in order to illustrate one possible implementation of the present invention based on a particularly suitable embodiment, but the present invention is not limited thereto.

[0145] The solution according to the invention is particularly suitable for aligning an optical element 2 which is embodied as a mirror. In this case, the invention is particularly suitable for a projection exposure apparatus 100, 200 or 400, but the invention is not restricted thereto either.

[0146] In the exemplary embodiment it is provided that the base point 12 of the second actuator unit 8 is connected to the output element 9 of the first actuator unit 7. An alignment of the output element 9 thus has the effect of correspondingly adjusting the entire second actuator unit 8.

[0147] In the exemplary embodiment, it is provided that the output element 9 performs a stroke movement and thus the second actuator unit 8 is raised or lowered, ie is moved orthogonally to the plane of the optical element 2 in a direction towards the plane of the optical element 2 or away from the plane of the optical element 2 .

[0148] In the exemplary embodiment it is provided that the first actuator unit 7 is configured to carry out only a stroke movement without a movement in a different direction, so that the first actuator unit 7 only causes the second actuator unit 8 to be raised or lowered.

[0149] It goes without saying that other configurations are also possible here.

[0150] Figure 6 and 7 A particularly advantageous embodiment of the first actuator unit 7 is shown in order to adjust the output element 9 and thus the second actuator unit 8 and to fix the position setting.

[0151] Figure 6 The optical element 2 is also shown using dashed lines and in a basic illustration.

[0152] As from Figure 6 and 7 It is evident that the first actuator unit 7 has an adjustment element 13 and a fixing element 14 which can be fastened to the support structure 5. The fixing element 14 is fastened to the support structure 5 by virtue of the fact that the fixing element 14 is fastened in a housing 15 of the first actuator unit 7 and the housing 15 itself is in turn fastened to the support structure 5. The adjustment element 13 is also fastened in the housing 15 and is therefore correspondingly fastened to the support structure 5.

[0153] As will be described in even more detail below, the fixing element 14 is configured to secure the output element 9 in a force-locking manner in an operating state of the optical element 2. In this case, in the case of a projection exposure apparatus, the operating state is a state in which the projection exposure apparatus is operated in order to manufacture semiconductor components. In an exemplary embodiment, a force-locking connection (force-locking engagement or friction engagement) is achieved by clamping the output element 9 by means of the fixing element 14. For this purpose, the fixing element 14 is shrink-fitted into the output element 9 in the operating state. As explained in more detail below, the fixing element is embodied as a clamping ring 14 in an exemplary embodiment.

[0154] The invention provides that the fixing element or the clamping ring 14 provided in the exemplary embodiment releases the non-positive connection in the set state of the optical element 2 in order to be able to adjust the output element 9 via the adjusting element 13 .

[0155] In the case of a projection exposure apparatus, setting generally takes place only once, before start-up. For this purpose, a wavefront measurement is carried out, in which tolerances are determined. In order to compensate for tolerances of the system, a rough setting is then carried out by the first actuator unit 7. It goes without saying that even during subsequent operating states, at regular or irregular intervals, the apparatus can be provided to be restored to the setting state, for example in order to compensate for the effects of aging caused by re-rough setting. However, this is generally not necessary.

[0156] In the exemplary embodiment, it is provided that the output element 9 is embodied as a shaft, a cylinder or preferably as a piston. Figures 6 to 8 Basic diagram in .

[0157] In the exemplary embodiment, it is further provided that the clamping ring 14 has a receiving opening 14a which circumferentially surrounds at least one portion of the output element 9, which is preferably embodied in the form of a piston. In this case, in the operating state, the receiving opening 14a has a first diameter in order to fix the output element 9 in a force-locking manner. In contrast, in the setting state, the receiving opening 14a has a second, enlarged diameter so that the force-locking connection to the output element 9 is released.

[0158] Figure 8 A substantially force-locking connection is shown between a clamping ring 14 and an output element 9, which is preferably embodied in the form of a piston, which is produced by clamping. In this case, an interference fit is provided so that the clamping ring 14 and the output element 9 are connected to each other by clamping or shrink fit at normal or ambient temperature. In order to release the force-locking connection thus achieved, it is then provided that the clamping ring 14 is heated. In the exemplary embodiment, the set state can therefore be obtained by heating the clamping ring 14. In the exemplary embodiment, it is provided that the clamping ring 14 has a power supply terminal 16 for heating purposes. Alternatively, some other energization or heating can also be provided. In the exemplary embodiment (not shown), it is provided that the clamping ring 14 includes or is equipped with one or more wires connected to the power supply terminal 16 in order to heat the clamping ring 14.

[0159] In the exemplary embodiment, it is provided that the temperature of the clamping ring 14 in the set state is 40° C. to 100° C., preferably 50° C. to 90° C., particularly preferably 50° C. to 80° C., very particularly preferably 50° C. to 70° C., in particular 60° C.+ / −5° C.

[0160] In the exemplary embodiment, it is provided that the temperature of the clamping ring 14 in the operating state is 10° C. to 30° C., preferably 15° C. to 25° C., particularly preferably 20° C. to 25° C., very particularly preferably 22° C.+ / −2° C. or at ambient temperature.

[0161] In the exemplary embodiment, the clamping ring is preferably made of high-grade steel. In the exemplary embodiment, the adjustment element 13 is preferably made of an iron-nickel compound, preferably invar. This ensures that the output element 9 does not expand or does not expand to the same extent as the clamping ring 14 if the clamping ring 14 is heated.

[0162] In order to allow the clamping ring 14 to expand or to not hinder its expansion too much, provision is made in the exemplary embodiment for the clamping ring 14 to be connected to the housing 15 via webs 17 and / or connecting elements and / or joints.

[0163] In the exemplary embodiment, it is provided that the web 17 and / or the connecting element and / or the joint are flexible and / or compliant and / or yielding in the radial direction so that the clamping ring 14 can thermally expand radially, but in the axial direction Z (see Figure 6 ) are embodied in a rigid and / or immovable manner in order to absorb forces acting in the axial direction Z of the output element 9 and to introduce them 5 into the support structure 5 via the housing 15.

[0164] like Figure 7 As can be seen from the basic illustration in , the web 17 shown therein does not extend in the radial direction or is not aligned with the center point of the output element 9 or the clamping ring 14, so that if heat causes the clamping ring 14 to expand in the radial direction, lateral forces act on the web 17 and have the effect of making the web 17 yield or flexibly compliant and thus preventing expansion of the clamping ring 14 caused by heat.

[0165] In an exemplary embodiment, the housing 15 can be made of any suitable material, in particular a material that enables thermal expansion of the clamping ring 14 and ensures that the clamping ring 14, optionally via the web 17, is connected to the housing 15 so that the forces received from the optical element 2 can be reliably introduced into the support structure 5. In this case, the housing 15 can also be embodied as consisting of high-grade steel or invar.

[0166] In the exemplary embodiment, it is provided that the adjustment element 13 is configured to perform a stroke movement in order to raise or lower the output element 9 in the axial direction Z (see Figure 6 ). The stroke movement of the output element 9 and thus of the second actuator unit 8 is determined by Figure 6 In the exemplary embodiment, it is provided that the adjustment element can only perform a stroke movement and cannot move in other directions. The output element 9 and the second actuator unit 8 can therefore only be raised or lowered by the adjustment element 13. However, this is sufficient to perform the desired rough setting within the first setting range.

[0167] In the exemplary embodiment, the adjustment element 13 can in principle be implemented in any desired manner. However, for the realization of the invention, in particular also for use in projection exposure apparatuses 100, 200, 400, it has proven to be particularly suitable if the adjustment element 13 is implemented as a thermal actuator. Thermal actuators cause linear movements due to their heating. In this case, a material with a significant thermal expansion, such as wax, is heated in the thermal actuator. In the exemplary embodiment, it is therefore provided that the adjustment element 13 is heated for the purpose of adjusting the output element 9. Thermal actuators of this type are known from the prior art, for example also from space travel, so that their basic function will not be discussed in detail below.

[0168] In the exemplary embodiment, it is (optionally) provided that the adjustment element 13 or the movable piston of the adjustment element has been moved to the output element 9 and that the mechanical connection has been established before the force-locking connection between the output element 9 and the clamping ring 14 is released. This is intended to prevent the optical element 2 from changing its position or falling out due to the release of the force-locking connection. Afterwards, the position of the output element 9 can be changed accordingly by correspondingly heating or cooling the adjustment element 13. After the output element 9 has been adjusted by the adjustment element 13 to the desired extent within a first setting range, that is to say a rough setting has been performed, it is provided that the force-locking connection between the clamping ring 14 and the output element 9 is reestablished, so that the force introduced by the optical element 2 is again introduced via the output element 9 into the clamping ring 14 and from there into the support structure 5 via the housing 15. Thus, the operating state is reestablished, wherein it is also provided that the adjustment element 13 is no longer heated and that the mechanical connection between the adjustment element 13 and the output element 9 is therefore released again. In the exemplary embodiment, it is provided that the adjustment element does not exert a force on the output element 9 in the operating state.

Claims

1. An actuator device (1) for aligning an element (2), comprising at least one first actuator unit (7) that can be fastened to a support structure (5) for a first setting range and a second actuator unit (8) that can be fastened to the element (2) for a second setting range, wherein: The second actuator unit (8) is operatively connected to an output element (9) of the first actuator unit (7), so that the positioning of the second actuator unit (8) is adjustable by adjusting the output element (9), characterized in that the first actuator unit (7) has an adjustment element (13) and a fixing element (14), the fixing element being capable of being fastened to the support structure (5), wherein the fixing element (14) is configured to fasten the output element (9) in a force-locking manner in an operating state of the element (2), and wherein the fixing element (14) is also configured to release the force-locking connection in a set state of the element (2) so that the output element (9) can be adjusted by the adjustment element (13); wherein the fixing element (14) is connected to the housing (15) via a web (17) and / or a connecting element and / or a joint; And wherein the web (17) and / or the connecting element and / or the joining part are flexible and / or compliant and / or yielding in the radial direction so that the fixing element (14) can expand radially due to thermal expansion, but are rigid and / or immovable in the axial direction (Z) so as to withstand the forces acting in the axial direction (Z) of the output element (9) and so as to introduce said forces into the supporting structure (5) via the housing (15).

2. The actuator device according to claim 1, characterized in that The first actuator unit (1) has a housing (15) which can be fastened to the support structure (5), wherein the fixing element (14) and / or the adjustment element (13) are fastened in the housing (15).

3. The actuator device according to claim 1 or 2, characterized in that: The fixing element (14) is configured to fasten the output element (9) in a force-locking manner by clamping.

4. The actuator device according to claim 1 or 2, characterized in that: In the operating state, the fixing element (14) is shrink-fitted to at least one portion of the output element (9).

5. The actuator device according to claim 1 or 2, characterized in that: The fixing element is designed as a clamping ring (14).

6. The actuator device according to claim 5, characterized in that The clamping ring (14) has a receiving opening (14a) which circumferentially surrounds at least a portion of the output element (9), and wherein the receiving opening (14a) has a first diameter in the operating state in order to fix the output element (9) in a force-locking manner, and wherein the receiving opening (14a) has a second, enlarged diameter in the setting state so that the force-locking connection to the output element (9) is released so that the output element (9) can be adjusted by the adjustment element (13).

7. The actuator device according to claim 6, characterized in that The clamping ring (14) is heated in the set state.

8. The actuator device according to claim 7, characterized in that For heating purposes, the clamping ring (14) has power supply terminals (16) and / or can be powered.

9. The actuator device according to claim 5, characterized in that The temperature of the clamping ring (14) in the set state is 40°C to 100°C.

10. The actuator device according to claim 9, characterized in that The temperature of the clamping ring (14) in the set state is 50°C to 90°C.

11. The actuator device according to claim 10, characterized in that The temperature of the clamping ring (14) in the set state is 50°C to 80°C.

12. The actuator device according to claim 11, characterized in that The temperature of the clamping ring (14) in the set state is 50°C to 70°C.

13. The actuator device according to claim 12, characterized in that The temperature of the clamping ring (14) in the set state is 60°C + / - 5°C.

14. The actuator device according to claim 5, characterized in that The temperature of the clamping ring (14) in the operating state is 10°C to 30°C.

15. The actuator device according to claim 14, characterized in that The temperature of the clamping ring (14) in the operating state is 15°C to 25°C.

16. The actuator device according to claim 15, characterized in that The temperature of the clamping ring (14) in the operating state is 20°C to 25°C.

17. The actuator device according to claim 16, characterized in that The temperature of the clamping ring (14) in the operating state is 22°C + / - 2°C.

18. The actuator device according to claim 1 or 2, characterized in that: The adjustment element (13) is heatable for the purpose of adjusting the output element (9).

19. The actuator device according to claim 18, characterized in that In the operating state, the adjustment element (13) is mechanically decoupled from the output element (9) and / or does not exert a force on the output element (9).

20. The actuator device according to claim 18, characterized in that The adjustment element (13) is configured to perform a stroke movement in order to raise or lower the output element (9) in the axial direction (Z).

21. The actuator device according to claim 1 or 2, characterized in that The first setting range of the first actuator unit (7) corresponds to three to twenty times the second setting range of the second actuator unit (8).

22. The actuator device according to claim 21, characterized in that The first setting range of the first actuator unit (7) corresponds to four to fifteen times that of the second actuator unit (8).

23. The actuator device according to claim 22, characterized in that The first setting range of the first actuator unit (7) corresponds to five to fifteen times that of the second actuator unit (8).

24. The actuator device according to claim 23, characterized in that The first setting range of the first actuator unit (7) corresponds to six to twelve times that of the second actuator unit (8).

25. The actuator device according to claim 24, characterized in that The first setting range of the first actuator unit (7) corresponds to seven to eleven times that of the second actuator unit (8).

26. The actuator device according to claim 25, characterized in that The first setting range of the first actuator unit (7) corresponds to eight to ten times that of the second actuator unit (8).

27. An actuator device according to any one of claims 1 or 2, characterized in that The setting range of the first actuator unit (7) is 700 to 1500 μm, and / or the setting range of the second actuator unit (8) is 10 to 200 μm.

28. The actuator device according to claim 27, characterized in that The setting range of the first actuator unit (7) is 800 to 1200 μm, and / or the setting range of the second actuator unit (8) is 50 to 200 μm.

29. The actuator device according to claim 28, characterized in that The setting range of the first actuator unit (7) is 800 to 1000 μm, and / or the setting range of the second actuator unit (8) is 50 to 150 μm.

30. The actuator device according to claim 29, characterized in that The setting range of the first actuator unit (7) is 900 μm + / - 50 μm, and / or the setting range of the second actuator unit (8) is 80 to 120 μm.

31. The actuator device according to claim 30, characterized in that The setting range of the second actuator unit (8) is 100 μm + / - 10 μm.

32. The actuator device according to claim 1 or 2, characterized in that The element (2) to be aligned is an optical element (415, 416, 418, 419, 420, 108, 201) of a projection exposure apparatus (100, 200, 400).

33. A projection exposure apparatus (100, 200, 400) for semiconductor lithography, comprising an illumination system (103, 401), the illumination system comprising a radiation source (402) and an optical unit (107, 403) having at least one optical element (415, 416, 418, 419, 420, 108, 201) to be aligned, wherein: The optical element (415, 416, 418, 419, 420, 108, 201) to be aligned is alignable and / or mountable and / or adjustable and / or manipulable and / or deformable by means of an actuator device (1) according to any one of claims 1 to 32.

34. Method for aligning an element (2) by means of an actuator device (1) according to any one of claims 1 to 32, the actuator device comprising a first actuator unit (7) fastened to a support structure (5) and designed for a first setting range and a second actuator unit (8) fastened to the element (2) and designed for a second setting range, the second actuator unit (8) then being operatively connected to an output element (9) of the first actuator unit (7) so that the positioning of the second actuator unit (8) is adjusted by adjusting the output element (9), characterized in that The first actuator unit (7) has a fixing element (14) and an adjusting element (13), wherein the fixing element (14) is then fastened to the supporting structure (5) and the fixing element fastens the output element (9) in a force-locking manner in the operating state of the element (2), and then the fixing element (14) releases the force-locking connection in the setting state of the element (2), in which the element (2) is aligned within the first setting range, and then the adjusting element (13) adjusts the output element (9), and then the fixing element (14) closes the force-locking connection again after adjusting the output element (9).

35. The method according to claim 34, characterized in that The first setting range of the first actuator unit (7) is used for coarse setting, while the second setting range of the second actuator unit (8) is used for fine setting in the operating state of the element (2) for the purpose of aligning the element (2).

36. The method according to claim 35, characterized in that The first setting range of the first actuator unit (7) is used for a rough setting during a first setting and / or a basic setting and / or a start-up of the element (2).

37. The method according to claim 34 or 35, characterized in that During the alignment of the element (2) by means of the first actuator unit (7), the alignment of the element (2) is measured and the setting is carried out by means of the first actuator unit (7) until a defined alignment of the element (2) is obtained.

38. The method according to claim 34 or 35, characterized in that The adjusting element (13) is heated for the purpose of adjusting the output element (9).

39. The method according to claim 34 or 35, characterized in that The method is used to increase the imaging accuracy of a projection exposure device (100, 200, 400), wherein the element (2) to be aligned is at least one optical element (415, 416, 418, 419, 420, 108, 201) of the projection exposure device (100, 200, 400), and then the alignment of the optical element (415, 416, 418, 419, 420, 108, 201) is achieved in the set state by the following process: the first actuator unit (7) positions the second actuator unit (8), and for this purpose, the fixing element (14) releases the force-locking connection to the output element (9), and then the alignment of the optical element (415, 416, 418, 419, 420, 108, 201) is achieved in the operating state by the second actuator unit (8).

Images