A double-layer elevated structure for use in high-intensity areas with limited clearance and a construction method thereof

By adopting a frame structure connecting the support and the lower column in the double-layer elevated bridge structure under limited clearance, combining the seismic resistance design of the seismic isolation support and the cable seismic isolation support, the dual requirements of structural stress and clearance height are solved, and the seismic resistance performance is significantly improved.

CN113026532BActive Publication Date: 2025-04-04SHANGHAI MUNICIPAL TRANSPORTATION DESIGN INST
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Patent Information

Application Number
CN202110298256.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2021-03-19
Publication Date
2025-04-04
Estimated Expiration
2041-03-19

AI Technical Summary

Technical Problem

In the high intensity zone under limited clearance, the existing double-layer elevated bridge structure is difficult to meet the dual needs of structural stress and clearance height at the same time, especially in terms of earthquake resistance.

Method used

A frame structure is adopted that is fixedly connected to the upper end face of the lower column through a support, including the upper main beam, the upper column and the lower main beam. The seismic isolation support and cable seismic isolation support are used for seismic resistance design.

Benefits of technology

The significant earthquake reduction and isolation effect of the double-layer elevated structure in the high-intensity zone under limited clearance is achieved, while reducing the overall structural height and solving the earthquake resistance problem.

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Abstract

The present invention relates to a double-layer elevated structure for use in high-intensity areas with limited headroom, comprising: a frame structure fixedly connected to the upper end surface of the lower column through a support; wherein the support is a seismic isolation support; the frame structure comprises: an upper main beam, an upper column and a lower main beam; the lower end surface of the upper main beam is fixedly connected to the upper end surface of the upper column, and the lower end surface of the upper column is fixedly connected to the upper end surface of the lower main beam. The present invention also relates to a construction method for the double-layer elevated structure as described above. The seismic isolation and earthquake resistance method adopted by the double-layer elevated structure of the present invention has an obvious seismic isolation effect, and the overall height of the structure is low, which cleverly solves the earthquake resistance problem of the double-layer elevated structure in high-intensity areas with limited headroom.
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Description

Technical Field

[0001] The invention relates to the field of bridge earthquake resistance, and in particular to a double-layer elevated structure used in high-intensity areas with limited clearance and a construction method thereof. Background Art

[0002] At present, most of the double-deck elevated bridges in domestic cities are mainly in the form of columns and cap beams. Due to the use of cap beams, this double-deck elevated structure has a high height of the bridge structure, which compresses the clearance under the bridge. However, in the case of extremely limited clearance in airports and stations, it is difficult for this double-deck elevated structure to balance the dual requirements of structural force and clearance height. If a structure in which the columns and main beams are fully fixed is adopted, although the dual requirements of structural force and clearance height are effectively met, the seismic resistance problem of the bridge is difficult to solve due to the heavy weight of the double-deck elevated superstructure, especially in high-intensity areas with limited clearance, the disadvantages of the structure in which the columns and main beams are fully fixed are more obvious.

[0003] Therefore, there is an urgent need for a double-layer elevated structure and a construction method thereof for use in high-intensity areas with limited clearance. Summary of the invention

[0004] The purpose of the present invention is to provide a double-layer elevated structure and a construction method thereof for use in high-intensity areas with limited clearance in view of the deficiencies in the prior art.

[0005] To achieve the above object, the technical solution adopted by the present invention is:

[0006] The first aspect of the present invention is to provide a double-layer elevated structure for use in high-intensity areas under limited headroom, comprising: a frame structure fixedly connected to the upper end surface of the lower column through a support;

[0007] Wherein, the support is a seismic isolation support; the frame structure includes: an upper main beam, an upper column and a lower main beam;

[0008] The lower end surface of the upper main beam is fixedly connected to the upper end surface of the upper column, and the lower end surface of the upper column is fixedly connected to the upper end surface of the lower main beam.

[0009] Preferably, the lower end surface of the lower main beam is fixedly connected to the upper end surface of the lower column through the support.

[0010] Preferably, the upper columns are located at the left and right ends of the lower main beam.

[0011] Preferably, the lower column is located at the left and right ends of the lower main beam.

[0012] Preferably, the upper columns above the lower main beam and the lower columns below the lower main beam are located at the same horizontal position.

[0013] Preferably, the support is a cable-type seismic isolation support.

[0014] A second aspect of the present invention is to provide a construction method of the double-layer elevated structure as described above, the steps comprising:

[0015] Step S1: constructing the lower column;

[0016] Step S2: placing the support on the upper end of the lower column;

[0017] Step S3: forming a transverse frame on the ground at the connection between the upper main beam and the lower main beam and the upper column;

[0018] Step S4: integrally constructing the transverse frame on the upper end of the support;

[0019] Step S5: erecting a support on the ground and constructing the remaining lower main beams;

[0020] Step S6: erecting brackets on the lower main beams and constructing the remaining upper main beams to obtain the double-deck elevated structure.

[0021] The present invention adopts the above technical solution, and has the following technical effects compared with the prior art:

[0022] The seismic isolation and earthquake resistance method adopted by the double-layer elevated structure of the present invention has obvious seismic isolation effect and the overall height of the structure is low, which ingeniously solves the earthquake resistance problem of the double-layer elevated structure in high-intensity areas with limited clearance. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the cross-sectional structure of the double-layer elevated structure of the present invention;

[0024] Figure 2 It is a schematic diagram of the elevation structure of the double-layer elevated structure of the present invention;

[0025] Figure 3-5 It is a schematic diagram of the construction process of the double-layer elevated structure of the present invention;

[0026] The reference numerals include:

[0027] Upper main beam 1; upper column 2; lower main beam 3; lower column 4; support 5. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0030] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but they are not intended to limit the present invention.

[0031] Example 1

[0032] like Figure 1-2 As shown, this embodiment provides a double-layer elevated structure for use in high-intensity areas with limited headroom, including: a frame structure fixedly connected to the upper end surface of the lower column 4 through a support 5;

[0033] The support 5 is a seismic isolation support; the frame structure includes: an upper main beam 1, an upper column 2 and a lower main beam 3;

[0034] The lower end surface of the upper main beam 1 is fixedly connected to the upper end surface of the upper column 2 , and the lower end surface of the upper column 2 is fixedly connected to the upper end surface of the lower main beam 3 .

[0035] As a preferred embodiment, the lower end surface of the lower main beam 3 is fixedly connected to the upper end surface of the lower column 4 through the support 5.

[0036] As a preferred embodiment, the upper columns 2 are located at the left and right ends of the lower main beam 3 .

[0037] As a preferred embodiment, the lower column 4 is located at the left and right ends of the lower main beam 3 .

[0038] As a preferred embodiment, the upper columns 2 above the lower main beam 3 and the lower columns 4 below the lower main beam 3 are located at the same horizontal position.

[0039] As a preferred embodiment, the support 5 is a cable-type seismic isolation support.

[0040] Example 2

[0041] like Figure 3-5 As shown, this embodiment provides a construction method of a double-layer elevated structure as described in Embodiment 1, the steps comprising:

[0042] Step S1: constructing the lower column 4;

[0043] Step S2: placing the support 5 on the upper end of the lower column 4;

[0044] Step S3: forming a transverse frame on the ground at the beam-column connection points of the upper main beam 1 and the lower main beam 3 and the upper column 2;

[0045] Step S4: integrally constructing the transverse frame on the upper end of the support 5;

[0046] Step S5: erecting a support on the ground and constructing the remaining lower main beam 3;

[0047] Step S6: erecting a support on the lower main beam 3 and constructing the remaining upper main beam 1 to obtain the double-layer elevated structure.

[0048] In summary, the seismic reduction and isolation method adopted by the double-layer elevated structure of the present invention has obvious seismic reduction and isolation effects, and the overall height of the structure is low, which cleverly solves the seismic problem of double-layer elevated structures in high-intensity areas with limited clearance.

[0049] The above description is only a preferred embodiment of the present invention, and does not limit the implementation mode and protection scope of the present invention. For those skilled in the art, it should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the description and illustrations of the present invention should be included in the protection scope of the present invention.

Claims

1. A double-layer elevated structure for use in high-intensity areas with limited headroom, characterized in that: include: A frame structure fixedly connected to the upper end surface of the lower column (4) via a support (5); The support (5) is a seismic isolation support; the frame structure comprises: an upper main beam (1), an upper column (2) and a lower main beam (3); The lower end surface of the upper main beam (1) is fixedly connected to the upper end surface of the upper column (2), and the lower end surface of the upper column (2) is fixedly connected to the upper end surface of the lower main beam (3); The lower end surface of the lower main beam (3) is fixedly connected to the upper end surface of the lower column (4) via the support (5); The support (5) is a cable-type seismic isolation support.

2. The double-layer elevated structure according to claim 1, characterized in that: The upper column (2) is located at the left and right ends of the lower main beam (3).

3. The double-layer elevated structure according to claim 2, characterized in that: The lower layer columns (4) are located at the left and right ends of the lower layer main beam (3).

4. The double-layer elevated structure according to claim 3, characterized in that: The upper column (2) above the lower main beam (3) and the lower column (4) below the lower main beam (3) are located at the same horizontal position.

5. A construction method for a double-layer elevated structure according to any one of claims 1 to 4, characterized in that the steps include: Step S1: constructing the lower column (4); Step S2: placing the support (5) on the upper end of the lower column (4); Step S3: forming a transverse frame on the ground at the beam-column connection points of the upper main beam (1) and the lower main beam (3) and the upper column (2); Step S4: integrally constructing the transverse frame on the upper end of the support (5); Step S5: erecting a support on the ground and constructing the remaining lower main beam (3); Step S6: erecting a support on the lower main beam (3), and constructing the remaining upper main beams (1), so as to obtain the double-layer elevated structure.

Citation Information

Patent Citations

  • Full-prefabricated assembling dual-layer framework pier structure system of which functions can be recovered after earthquake

    CN108103927A

  • Double-layer elevated structure for high-intensity area under limited clearance

    CN215714560U