Display device and method of repairing a display device

Abstract

Disclosed are display devices and methods of repairing display devices, wherein the display devices include a defective pixel region that includes a defective wavelength conversion pattern, the methods including removing the defective wavelength conversion pattern of the defective pixel region, injecting ink including a wavelength conversion material into the defective pixel region, and curing the ink injected into the defective pixel region.

Description

[0001] Cross-references to related applications

[0002] This application claims priority and benefit to Korean Patent Application No. 10-2020-0028874, filed on March 9, 2020, the entire disclosure of which is incorporated herein by reference. Technical Field

[0003] This disclosure relates to a display device and a method for repairing a display device. Background Technology

[0004] With the development of multimedia, the importance of display devices has increased. Accordingly, various types of display devices have been developed, such as liquid crystal displays (LCDs) and organic light-emitting diode (OLEDs).

[0005] In these display devices, self-emissive display devices include self-emissive elements, such as organic light-emitting elements. A self-emissive element may include two electrodes facing each other and a light-emitting layer inserted therebetween. When the self-emissive element is an organic light-emitting element, electrons and holes supplied from the two electrodes recombine with each other in the light-emitting layer to generate excitons, and the generated excitons transition from an excited state to a ground state to emit light.

[0006] Because this self-emissive display device does not require an additional light source, it has low power consumption and can be made light and thin. It also has high-level characteristics such as wide viewing angle, high brightness and contrast, and fast response speed, making it a highly anticipated next-generation display device.

[0007] Simultaneously, when the display device is manufactured and subsequently tested to evaluate display quality, adjacent wavelength conversion patterns may mix with each other. Therefore, defects may be found where some subpixels are identified as black spots (e.g., defects in the subpixels that cause black spots). This mixing of adjacent wavelength conversion patterns may occur due to ink mis-injection during the inkjet process that forms the wavelength conversion patterns, or due to defects in the separating walls used to separate the wavelength conversion patterns and light transmission patterns, etc.

[0008] Therefore, a repair process can be performed to reformat the wavelength conversion pattern set in the defective sub-pixel into a normal wavelength conversion pattern, thereby reducing or minimizing the degradation of the display device's quality. Summary of the Invention

[0009] This disclosure relates to a method for repairing a display device, wherein a defective wavelength conversion pattern is repaired to form a normal wavelength conversion pattern (hereinafter referred to as a repair pattern), thereby improving the reliability of the display quality of the display device.

[0010] Another aspect of the present disclosure relates to a display device in which display quality is improved by repairing a defective wavelength conversion pattern.

[0011] However, aspects of the present disclosure are not limited to or by the aspects set forth herein. The above and other aspects of the present disclosure will become more apparent to one of ordinary skill in the art from the following detailed description of the present disclosure when considered in conjunction with the accompanying drawings.

[0012] According to an embodiment of the present disclosure, a method of repairing a display device, in which the display device includes a defective pixel area including a defective wavelength conversion pattern, includes removing the defective wavelength conversion pattern of the defective pixel area, injecting an ink including a wavelength conversion material into the defective pixel area, and curing the ink injected into the defective pixel area.

[0013] In an example embodiment, in the removing of the defective wavelength conversion pattern, the defective wavelength conversion pattern is removed by irradiating the defective wavelength conversion pattern with a laser beam.

[0014] In an example embodiment, the laser beam is applied with a laser unit, and the laser unit includes a nano laser or a femto laser.

[0015] In an example embodiment, the display device further includes a substrate, a color filter on a surface of the substrate, and a partition wall on a surface of the color filter, and the defective wavelength conversion pattern is on the surface of the color filter in a space partitioned by the partition wall.

[0016] In an example embodiment, in the removing of the defective wavelength conversion pattern, the defective wavelength conversion pattern is removed by irradiating the defective pixel area with a laser beam to selectively remove only the defective wavelength conversion pattern without removing the color filter.

[0017] In an example embodiment, the color filter selectively transmits light of a first color, and the wavelength conversion material includes a material that converts light of a second color different from the first color into light of the first color.

[0018] In an example embodiment, the removing of the defective wavelength conversion pattern includes forming a groove in the defective pixel area by removing the defective wavelength conversion pattern, and the injecting of the ink includes forming a repair material layer including the wavelength conversion material by filling the groove with the ink including the wavelength conversion material.

[0019] In an example embodiment, the curing of the ink includes forming a repair pattern by irradiating the repair material layer with light.

[0020] In an example embodiment, the method includes inspecting a height of the repair pattern after forming the repair pattern.

[0021] In an example embodiment, the curing of the ink includes applying light to the ink in a state in which gas is introduced in the defective pixel region.

[0022] In an example embodiment, the method includes detecting a pixel region in which a defect has occurred before removing the defective wavelength conversion pattern.

[0023] According to an embodiment of the disclosure, a method of repairing a display device, in which the display device includes a mixed wavelength conversion pattern, includes removing the mixed wavelength conversion pattern, and forming a repair pattern in a groove formed by removing the mixed wavelength conversion pattern.

[0024] In an example embodiment, the mixed wavelength conversion pattern includes a first wavelength conversion material that converts light of a first color into light of a second color, and a second wavelength conversion material that converts light of the first color into light of a third color, and the repair pattern includes the first wavelength conversion material without including the second wavelength conversion material.

[0025] In an example embodiment, the removing of the mixed wavelength conversion pattern includes irradiating the mixed wavelength conversion pattern with a laser beam.

[0026] In an example embodiment, the forming of the repair pattern includes forming a repair material layer including the first wavelength conversion material in the groove, and forming the repair pattern by curing the repair material layer.

[0027] In an example embodiment, the forming of the repair material layer in the groove includes injecting an ink including the first wavelength conversion material into the groove.

[0028] According to an embodiment of the disclosure, a display device includes a pixel including a first sub-pixel configured to display a first color and a second sub-pixel configured to display a second color, the display device including a color conversion substrate including a first substrate, a color control layer on a surface of the first substrate and including a first wavelength conversion pattern belonging to the first sub-pixel and a repair pattern belonging to the second sub-pixel, and a mixed wavelength conversion layer between the first substrate and the repair pattern.

[0029] In an example embodiment, the mixed wavelength conversion layer includes a first wavelength conversion material that converts light of a third color into light of the first color and a second wavelength conversion material that converts light of the third color into light of the second color, and the repair pattern includes the second wavelength conversion material without including the first wavelength conversion material.

[0030] In an example embodiment, a display device includes a display substrate facing a color conversion substrate, wherein the display substrate includes a second substrate facing a first substrate, a sub-pixel electrode on a surface of the second substrate facing the first substrate and provided to each sub-pixel, a pixel defining layer on the second substrate along a boundary of the sub-pixel and exposing the sub-pixel electrode, a light emitting layer on the sub-pixel electrode exposed by the pixel defining layer, and a common electrode on the light emitting layer.

[0031] In an example embodiment, the pixel further includes a third sub-pixel configured to display a third color, and the color control layer further includes a light transmission pattern belonging to the third sub-pixel.

[0032] According to the method of repairing a display device according to the embodiment, a wavelength conversion pattern having a defect (hereinafter referred to as a defective wavelength conversion pattern or a mixed wavelength conversion pattern) can be selectively removed to form a normal wavelength conversion pattern (hereinafter referred to as a repair pattern), thereby improving the light efficiency and display quality of the display device.

[0033] According to the display device according to the embodiment, the defective wavelength pattern provided in the defective sub-pixel is repaired into the repair pattern to reduce the number of black spots that can occur in the defective sub-pixel, thereby improving the light efficiency and display quality of the display device.

[0034] Aspects of the present disclosure are not limited by the foregoing, and other various aspects are contemplated herein.

[0035] While example embodiments of the present disclosure have been disclosed for illustrative purposes, one of ordinary skill in the art will appreciate that various suitable modifications, additions and / or substitutions are possible without departing from the scope and spirit of the present disclosure as disclosed in the following claims and their equivalents. BRIEF DESCRIPTION OF DRAWINGS

[0036] Example embodiments of the present disclosure will be described in greater detail by referring to the accompanying drawings, in which:

[0037] Figure 1 is a perspective view of a display device according to an embodiment;

[0038] Figure 2 is a cross-sectional view of a display device taken along a line II-II’ of Figure 1

[0039] Figure 3 is a schematic layout view of a pixel arrangement of a display substrate according to an embodiment;

[0040] Figure 4 is a schematic layout view of a pixel arrangement of a color conversion substrate according to an embodiment;​

[0041] Figure 5 a cross-sectional view of the display device taken along the line V-V' of Figure 3 and Figure 4 ;

[0042] Figure 6 a cross-sectional view of the portion Q of Figure 5 ;

[0043] Figure 7 and Figure 8 ; Figure 6 ;

[0044] Figures 9 to 12 ;

[0045] Figure 13 ;

[0046] Figure 14 ;

[0047] Figure 15 ;

[0048] Figure 16 ;

[0049] Figure 17 ;

[0050] Figure 18 ;

[0051] Figures 19 to 21 ;

[0052] Figure 22 ; DETAILED DESCRIPTION

[0053] The present disclosure will now be described more fully hereinafter with reference to the accompanying drawings, in which example embodiments of the disclosure are shown. The disclosure may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and fully convey the scope of the disclosure to those skilled in the art.

[0054] It will also be understood that when an element or layer is referred to as being "on" another element, layer, or substrate, it can be directly on the other element, layer, or substrate, or intervening elements (one or more intervening elements) or intervening layers (one or more intervening layers) can also be present. In contrast, when an element or layer is referred to as being "directly on" another element or layer, there are no intervening elements (one or more intervening elements) or intervening layers (one or more intervening layers) present.

[0055] The same reference numerals are used throughout the specification to indicate the same components. In the accompanying drawings, the thickness of layers and regions can be exaggerated for clarity. As used herein, the use of the term "may" indicates "one or more embodiments of the present disclosure." As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. As used herein, the terms "substantially," "about," "approximately," and similar terms are used as terms of approximation and not as terms of degree, and are intended to account for the inherent deviations in measured or calculated values that would be recognized by those of ordinary skill in the art.

[0056] Embodiments of the present disclosure will be described below with reference to the accompanying drawings.

[0057] Figure 1 is a perspective view of a display device according to an embodiment, and Figure 2 is a cross-sectional view of the display device taken along line II-II' of Figure 1

[0058] Referring to Figure 1 and Figure 2 The display device 1 can refer to any suitable electronic device that provides a display screen. Examples of the display device 1 can include a television, a notebook computer, a monitor, a billboard, a mobile phone, a smart phone, a tablet personal computer (PC), an electronic clock, a smart watch, a watch phone, a mobile communication terminal, an electronic notebook, an electronic book, a portable multimedia player (PMP), a navigation device, a game console, a digital camera, and an Internet of Things (IoT).

[0059] ​In the drawings, a first direction DR1, a second direction DR2, and a third direction DR3 are defined. The first direction DR1 and the second direction DR2 can be directions perpendicular to each other in a plane. The third direction DR3 can be a direction perpendicular to the plane in which the first direction DR1 and the second direction DR2 lie. The third direction DR3 is perpendicular to each of the first direction DR1 and the second direction DR2. In some embodiments, the third direction DR3 indicates a thickness direction of the display device 1.

[0060] In the following embodiments, unless otherwise indicated, "up" or "above" indicates a display direction on one side of the third direction DR3 (e.g., a positive DR3 direction), and similarly, "upper surface" indicates a surface facing one side (e.g., a positive DR3 direction) of the third direction DR3. Further, "under" or "below" indicates a direction on the other side of the third direction DR3 (e.g., a negative DR3 direction) opposite the display direction, and similarly, "lower surface" indicates a surface facing the other side (e.g., a negative DR3 direction) of the third direction DR3.

[0061] For ease of description, spatially relative terms, such as "under", "below", "lower", "down", "above", "upper", and the like, can be used herein for describing an element's or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It is to be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, elements described as "below" or "under" other elements or features would then be oriented "above" the other elements or features. Thus, the example terms "below" and "under" can encompass both an orientation of above and below. The device can be otherwise oriented (e.g., rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

[0062] The display device 1 can have a rectangular shape on a plane. For example, the display device 1 can have a rectangular planar shape having a long side in the first direction DR1 and a short side in the second direction DR2. An edge of the display device 1 where the long side in the first direction DR1 and the short side in the second direction DR2 meet (e.g., cross or intersect) can be formed as a right angle, or can be rounded to have a set or predetermined curvature. However, the planar shape of the display device 1 is not limited to the illustrated shape, and can be applied as a circular shape or other shape. For example, the planar shape of the display device 1 can be any appropriate shape.

[0063] The display device 1 can include a display area DA in which an image is displayed and a non-display area NDA in which an image is not displayed. The display area DA can include a plurality of pixels PX. The non-display area NDA can be located around (e.g., can be located adjacent to) the display area DA, and can partially or completely surround the display area DA.

[0064] The display device 1 can include a display substrate 10 and a color conversion substrate 30 facing the display substrate 10. For example, the color conversion substrate 30 and the display substrate 10 can partially or completely overlap each other in the third direction DR3. The display device 1 can further include a sealing member 50 coupling the display substrate 10 and the color conversion substrate 30, and a filling layer 70 filled between (e.g., located between) the display substrate 10 and the color conversion substrate 30.

[0065] The display substrate 10 can emit light having a set or predetermined peak wavelength from a plurality of light emitting areas of the display area DA. The display substrate 10 can include elements and circuits for displaying an image. For example, the display substrate 10 can include a pixel circuit such as a switching element, a pixel definition layer defining light emitting areas and non-light emitting areas of the display area DA, and a self-light emitting element.

[0066] For example, the self-light emitting element can include at least one selected from an organic light emitting diode, a quantum dot light emitting diode, an inorganic micro light emitting diode (e.g., micro LED), and an inorganic nano light emitting diode (e.g., nano LED). Hereinafter, a case where the self-light emitting element is an organic light emitting diode will be described as an example. However, the present disclosure is not limited thereto.

[0067] The color conversion substrate 30 can be disposed above the display substrate 10 and can face the display substrate 10. The color conversion substrate 30 can convert a peak wavelength of light emitted from the display substrate 10 and transmit the light, or can maintain a peak wavelength of light emitted from the display substrate 10 and transmit the light. For example, the display substrate 10 can emit light having a set or predetermined peak wavelength, and the color conversion substrate 30 can transmit at least two kinds of light having different peak wavelengths. For example, the display substrate 10 can emit blue light, and the color conversion substrate 30 can convert at least a portion of the blue light, and can transmit blue light, green light, and / or red light.

[0068] The sealing member 50 can be disposed along edges of the display substrate 10 and the color conversion substrate 30 in the non-display area NDA, and can be interposed between the display substrate 10 and the color conversion substrate 30. The sealing member 50 can surround the display area DA in a plan view. The display substrate 10 and the color conversion substrate 30 can be coupled to each other by the sealing member 50. For example, the sealing member 50 can include (e.g., be) an organic material. The sealing member 50 can be made of an epoxy resin, but its material is not limited thereto.

[0069] The filling layer 70 can be disposed in a space between the display substrate 10 and the color conversion substrate 30 surrounded by the sealing member 50. For example, the filling layer 70 can be encapsulated by the lower display substrate 10, the upper color conversion substrate 30, and the side sealing member 50. The filling layer 70 can fill a space between the display substrate 10 and the color conversion substrate 30. The filling layer 70 can be made of a light-transmissive material (e.g., a transparent material). The filling layer 70 can include (e.g., be) an organic material. For example, the filling layer 70 can be made of a silicon (Si)-based organic material and / or an epoxy-based organic material, but the material thereof is not limited thereto.

[0070] Figure 3 A schematic layout view of a pixel arrangement of a display substrate according to an embodiment.

[0071] Reference Figures 1 to 3 The display area DA of the display device 1 includes a plurality of pixels PX arranged along a plurality of rows and a plurality of columns. The pixel PX means a repeated minimum unit for display. To display full colors, each pixel PX can include a plurality of sub-pixels PXS (PXS1, PXS2, and PXS3) to emit light of different colors. For example, each pixel PX includes a first sub-pixel PXS1 to emit blue light, a second sub-pixel PXS2 to emit green light, and a third sub-pixel PXS3 to emit red light.

[0072] The first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 can be provided to (e.g., included in) each pixel PX. The sub-pixels PXS1, PXS2, and PXS3 can be arranged in order of the first sub-pixel PXS1, the second sub-pixel PXS2, and the third sub-pixel PXS3 along a first direction DR1.

[0073] Each pixel PX of the display substrate 10 can include a plurality of light emitting areas LA (LA1, LA2, and LA3) and a non-light emitting area NLA.

[0074] The light emitting area LA can be an area in which light generated from the display substrate 10 is emitted to the outside of the display substrate 10, and the non-light emitting area NLA can be an area in which light generated from the display substrate 10 is not emitted to the outside of the display substrate 10.

[0075] The plurality of light emitting areas LA (LA1, LA2, and LA3) can include a first light emitting area LA1, a second light emitting area LA2, and a third light emitting area LA3. The first to third light emitting areas LA1, LA2, and LA3 can be light emitting areas LA of the first to third sub-pixels PXS1, PXS2, and PXS3, respectively. For example, the first light emitting area LA1 is a light emitting area LA of the first sub-pixel PXS1, the second light emitting area LA2 is a light emitting area LA of the second sub-pixel PXS2, and the third light emitting area LA3 can be a light emitting area LA of the third sub-pixel PXS3.

[0076] The light emitted from the first to third light emitting areas LA1, LA2, and LA3 to the outside of the display substrate 10 can be light having a set or predetermined peak wavelength. For example, the first to third light emitting areas LA1, LA2, and LA3 can emit blue light. The light emitted from the first to third light emitting areas LA1, LA2, and LA3 can have a peak wavelength ranging from 440 nm to 480 nm. As used herein, the term "nm" can refer to a distance equal to 10 -9

[0077] The first to third light emitting areas LA1, LA2, and LA3 can be arranged in the display area DA of the display substrate 10 in order along the first direction DR1. The planar shape of each of the first to third light emitting areas LA1, LA2, and LA3 can be a rectangle in which the width in the second direction DR2 is longer than the width in the first direction DR1, but is not limited thereto.

[0078] In an example embodiment, the width WL1 of the first light emitting area LA1 in the first direction DR1 can be smaller than the width WL2 of the second light emitting area LA2 in the first direction DR1, and can be smaller than the width WL3 of the third light emitting area LA3 in the first direction DR1. The width WL2 of the second light emitting area LA2 in the first direction DR1 can be smaller than the width WL3 of the third light emitting area LA3 in the first direction DR1. However, the relationship between the widths WL1, WL2, and WL3 of the first to third light emitting areas LA1, LA2, and LA3 in the first direction DR1 is not limited to the embodiment illustrated in FIG. 11. For example, the width WL1 of the first light emitting area LA1 in the first direction DR1, the width WL2 of the second light emitting area LA2 in the first direction DR1, and the width WL3 of the third light emitting area LA3 in the first direction DR1 can be substantially the same as each other. Figure 3

[0079] In some embodiments, the area (e.g., planar area) of the first light emitting area LA1 can be smaller than the area of the second light emitting area LA2 and can be smaller than the area of the third light emitting area LA3. The area of the second light emitting area LA2 can be smaller than the area of the third light emitting area LA3. However, the present disclosure is not limited thereto. For example, the areas of the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 can be substantially the same as each other.

[0080] The non-light emitting area NLA can be arranged to surround the plurality of light emitting areas LA (LA1, LA2, and LA3).

[0081] ​​The non-light emitting area NLA of one sub-pixel PXS contacts the non-light emitting area NLA of an adjacent sub-pixel PXS (whether it is a sub-pixel PXS in the same pixel PX or not). The non-light emitting areas NLA of the adjacent sub-pixels PXS can be connected as one. In addition, the non-light emitting areas NLA of all the sub-pixels PXS can be connected as one, but the present disclosure is not limited thereto. The light emitting areas LA1, LA2, and LA3 of each of the adjacent sub-pixels PXS can be divided (e.g., separated or partitioned) by the non-light emitting area NLA.

[0082] Figure 4 A schematic layout view of a pixel arrangement of a color conversion substrate according to an embodiment.

[0083] In conjunction with Figure 1 and Figure 2 Referring to Figure 4 , each pixel PX of the color conversion substrate 30 can include a plurality of light transmitting areas TA (TA1, TA2, and TA3) and a plurality of light blocking areas BA (BA1, BA2, and BA3).

[0084] The light transmitting area TA can be an area in which light emitted from the display substrate 10 is transmitted (e.g., transmitted through) the color conversion substrate 30 and emitted to the outside of the display device 1, and the light blocking area BA can be an area in which light emitted from the display substrate 10 is not transmitted. For example, the light blocking area BA can be an area in which light emitted from the display substrate 10 is blocked.

[0085] The plurality of light transmitting areas TA: TA1, TA2, and TA3 can include a first light transmitting area TA1, a second light transmitting area TA2, and a third light transmitting area TA3. The first to third light transmitting areas TA1, TA2, and TA3 can be light transmitting areas TA of the first to third sub-pixels PXS1, PXS2, and PXS3, respectively (e.g., corresponding to the first to third sub-pixels PXS1, PXS2, and PXS3). For example, the first light transmitting area TA1 is a light transmitting area TA of the first sub-pixel PXS1, the second light transmitting area TA2 is a light transmitting area TA of the second sub-pixel PXS2, and the third light transmitting area TA3 can be a light transmitting area TA of the third sub-pixel PXS3. The first to third light transmitting areas TA1, TA2, and TA3 can correspond to the first to third light emitting areas LA1, LA2, and LA3 of the display substrate 10, respectively.

[0086] The light emitted from the light emitting areas LA1, LA2, and LA3 of the display substrate 10 can be transmitted (e.g., pass through) the first to third light transmitting areas TA1, TA2, and TA3 of the color conversion substrate 30, respectively, and can be emitted to the outside of the display device 1. The first light transmitting area TA1 can emit light of a first color to the outside of the display device 1, the second light transmitting area TA2 can emit light of a second color different from the first color to the outside of the display device 1, and the third light transmitting area TA3 can emit light of a third color different from the first color and the second color to the outside of the display device 1. For example, the light of the first color can be blue light having a peak wavelength range of 440 nm to about 480 nm, the light of the second color can be green light having a peak wavelength range of 510 nm to 550 nm, and the light of the third color can be red light having a peak wavelength range of 610 nm to 650 nm.

[0087] The first to third light transmitting areas TA1, TA2, and TA3 can be arranged in the display area DA of the color conversion substrate 30 in the first direction DR1 in order. The planar shapes of the first to third light transmitting areas TA1, TA2, and TA3 can be similar to the planar shapes of the first to third light emitting areas LA1, LA2, and LA3, but the present disclosure is not limited thereto. In some embodiments, the planar shapes of the first to third light transmitting areas TA1, TA2, and TA3 can correspond to the planar shapes of the first to third light emitting areas LA1, LA2, and LA3, respectively.

[0088] In an example embodiment, the width WT1 of the first light transmitting area TA1 in the first direction DR1 can be smaller than the width WT2 of the second light transmitting area TA2 in the first direction DR1 and can be smaller than the width WT3 of the third light transmitting area TA3 in the first direction DR1. The width WT2 of the second light transmitting area TA2 in the first direction DR1 can be smaller than the width WT3 of the third light transmitting area TA3 in the first direction DR1. However, the relationship between the widths WT1, WT2, and WT3 of the first to third light transmitting areas TA1, TA2, and TA3 in the first direction DR1 is not limited to the illustrated embodiment. For example, the width WT1 of the first light transmitting area TA1 in the first direction DR1, the width WT2 of the second light transmitting area TA2 in the first direction DR1, and the width WT3 of the third light transmitting area TA3 in the first direction DR1 can be substantially the same as each other. Figure 4

[0089] In some embodiments, the area (e.g., planar area) of the first light transmitting area TA1 can be smaller than the area of the second light transmitting area TA2 and can be smaller than the area of the third light transmitting area TA3. The area of the second light transmitting area TA2 can be smaller than the area of the third light transmitting area TA3. However, the present disclosure is not limited thereto. For example, the areas of the first light transmitting area TA1, the second light transmitting area TA2, and the third light transmitting area TA3 can be substantially the same as each other.

[0090] ​The light-blocking area BA can be disposed to surround the plurality of light-transmitting areas TA. The light-transmitting area TA of each adjacent sub-pixel PXS can be divided by the light-blocking area BA.

[0091] The light-blocking area BA can include a first light-blocking area BA1, a second light-blocking area BA2, and a third light-blocking area BA3. The first to third light-blocking areas BA1, BA2, and BA3 can be connected as one, but the present disclosure is not limited thereto.

[0092] The first light-blocking area BA1 can be located between the first light-transmitting area TA1 and the second light-transmitting area TA2 along the first direction DR1, the second light-blocking area BA2 can be located between the second light-transmitting area TA2 and the third light-transmitting area TA3 along the first direction DR1, and the third light-blocking area BA3 can be located between the third light-transmitting area TA3 and the first light-transmitting area TA1 along the first direction DR1. For example, the third light-blocking area BA3 can be located between the third light-transmitting area TA3 of a first pixel and the first light-transmitting area TA1 of a second pixel adjacent to the first pixel in the first direction DR1. The first to third light-blocking areas BA1, BA2, and BA3 can prevent or reduce color mixing of light emitted from the first to third light-transmitting areas TA1, TA2, and TA3.

[0093] Figure 5 To be along Figure 3 and Figure 4 a cross-sectional view of the display device taken along a line V-V' of

[0094] Referring to Figure 5 , the display substrate 10 can include a first substrate 110, and a switching element T, a plurality of light-emitting elements EL, and a thin film encapsulation structure 130 disposed on the first substrate 110. The color conversion substrate 30 can include a second substrate 310 and color control structures CFL, WCL, and TPL disposed on a surface (e.g., a lower surface) of the second substrate 310 facing the first substrate 110. The color control structures can include a wavelength conversion layer WCL and a light transmission pattern TPL disposed at the same level (e.g., height) as the wavelength conversion layer WCL in some sub-pixels. The color control structures can further include a color filter layer CFL. The filling layer 70 can be disposed between the thin film encapsulation structure 130 and the color control structures CFL, WCL, and TPL. As described above, the filling layer 70 can couple the display substrate 10 and the color conversion substrate 30 while filling the space between the display substrate 10 and the color conversion substrate 30.

[0095] The first substrate 110 can be an insulating substrate. The first substrate 110 can include (e.g., be) a transparent material. For example, the first substrate 110 can include (e.g., be) a transparent insulating material such as glass and / or quartz. The first substrate 110 can be a suitable rigid substrate. However, the first substrate 110 is not limited to the materials shown above. The first substrate 110 can include (e.g., be) a plastic such as polyimide (PI) and can have suitable flexible properties that enable warping, bending, folding, and / or rolling.

[0096] The switching element T can be disposed on a surface (e.g., an upper surface) of the first substrate 110. The switching element T can be provided (e.g., correspond to) each sub-pixel PXS. The switching element T can be disposed in the light emitting area LA of each sub-pixel PXS. The switching element T can be disposed in each of the first to third light emitting areas LA1, LA2, and LA3 of the display substrate 10. However, the present disclosure is not limited thereto. For example, at least one switching element T included in each sub-pixel PXS can be disposed in the non-light emitting area NLA.

[0097] The switching element T can be a thin film transistor including (e.g., be) polysilicon or a thin film transistor including (e.g., be) an oxide semiconductor. A plurality of signal lines (e.g., gate lines, data lines, and power lines, etc.) for transmitting signals to the switching element T can be further disposed on the first substrate 110.

[0098] The insulating film 120 can be disposed on the switching element T. In an example embodiment, the insulating film 120 can be a planarization film. The insulating film 120 can include an organic film. For example, the insulating film 120 can include (e.g., be) an organic material such as an acrylic resin, an epoxy resin, an imide resin, and / or an ester resin.

[0099] A light emitting element (or light emitting diode) EL can be disposed on the insulating film 120. The light emitting element EL can include a sub-pixel electrode PXSE, a light emitting layer EML, and a common electrode CME. Light emitted from the light emitting layer EML can be emitted upward (e.g., toward an upper surface of the display device 1) through the common electrode CME in a third direction DR3, for example, to the upper surface of the display device 1.

[0100] The sub-pixel electrode PXSE can be disposed on a surface (e.g., an upper surface) of the insulating film 120. The sub-pixel electrode PXSE can be provided for each of the first to third light emitting areas LA1, LA2, and LA3 defined by a pixel defining layer PDL, which will be described in more detail later. The sub-pixel electrode PXSE can be electrically coupled (e.g., electrically connected) to the switching element T through a contact hole that penetrates (e.g., is formed to penetrate) the insulating film 120.

[0101] The sub-pixel electrode PXSE can be a first electrode, e.g., an anode electrode, of the light emitting element EL. The sub-pixel electrode PXSE can have a laminate structure in which a high work function material layer including (e.g., being) indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and / or indium oxide (In2O3) and a reflective material layer including (e.g., being) silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), lead (Pb), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), MgF, or a mixture thereof are laminated. The high work function material layer can be disposed on top of the reflective material layer to be disposed closer to the light emitting layer EML. The sub-pixel electrode PXSE can have a multi-layer structure of ITO / Mg, ITO / MgF2, ITO / Ag, or ITO / Ag / ITO, but the present disclosure is not limited thereto.

[0102] The pixel defining layer PDL can be disposed on a surface (e.g., an upper surface) of the insulating film 120 along a boundary of each sub-pixel PXS. The pixel defining layer PDL can be disposed on the sub-pixel electrode PXSE (e.g., on a side or edge of the sub-pixel electrode PXSE) and can include an opening that exposes the sub-pixel electrode PXSE (e.g., a central portion of the sub-pixel electrode PXSE). The non-light emitting area NLA and the light emitting area LA can be divided by the pixel defining layer PDL and the opening thereof. For example, the non-light emitting area NLA can correspond to (e.g., overlap) the pixel defining layer PDL, and the light emitting area LA can correspond to (e.g., overlap) the opening of the pixel defining layer PDL. The pixel defining layer PDL can separate and insulate the sub-pixel electrode PXSE of each of the plurality of light emitting elements EL.

[0103] The pixel defining layer PDL can include (e.g., be) an organic insulating material such as a polyacrylate resin, an epoxy resin, a phenol resin, a polyamide resin, a polyimide resin, an unsaturated polyester resin, a polyphenylene ether resin, a polyphenylene sulfide resin, and / or benzocyclobutene (BCB). The pixel defining layer PDL can also include (e.g., be) an inorganic material.

[0104] The light-emitting layer EML is disposed on the sub-pixel electrode PXSE exposed by the pixel-defining layer PDL. In an embodiment in which the display device 1 is an organic light-emitting display device, the light-emitting layer EML can include an organic layer including (e.g., being) an organic material. The organic layer includes an organic light-emitting layer, and in some cases, can further include a hole-injection layer / hole-transport layer and / or an electron-injection layer / electron-transport layer as auxiliary layers to assist light emission. For example, the organic layer can include an organic light-emitting layer and can further include a hole-injection layer, a hole-transport layer, an electron-injection layer, and / or an electron-transport layer. In another embodiment, when the display device 1 is a micro-LED display device or a nano-LED display device, etc., the light-emitting layer EML can include (e.g., being) an inorganic material, such as an inorganic semiconductor.

[0105] In some embodiments, the light-emitting layer EML can have a tandem structure including a plurality of organic light-emitting layers overlapping each other in a thickness direction and a charge generation layer disposed therebetween. For example, the charge generation layer can be located between each pair of adjacent organic light-emitting layers of the plurality of organic light-emitting layers. The organic light-emitting layers overlapping each other can emit light of the same wavelength, but can also emit light of different wavelengths. At least a portion of the light-emitting layer EML of each sub-pixel PXS can be separated from the light-emitting layer EML of an adjacent (e.g., adjacent) sub-pixel PXS.

[0106] In an embodiment, for each sub-pixel PXS, the wavelength of light emitted by each light-emitting layer EML can be the same. For example, the light-emitting layer EML of each sub-pixel PXS can emit blue light, and the color control structure of the color conversion substrate 30 can include a wavelength conversion layer WCL and a light transmission pattern TPL, thereby displaying a color of each sub-pixel PXS.

[0107] In another embodiment, for each sub-pixel PXS, the light emission wavelength band of the wavelength of light emitted by each light-emitting layer EML can be different. For example, the light-emitting layer EML of a first sub-pixel PXS1 can emit light of a first color, and the light-emitting layer EML of a second sub-pixel PXS2 can emit light of a second color, and the light-emitting layer EML of a third sub-pixel PXS3 can emit light of a third color.

[0108] The common electrode CME can be disposed on the light-emitting layer EML. The common electrode CME can not only contact the light-emitting layer EML, but can also contact the upper surface of the pixel-defining layer PDL in the non-light-emitting area NLA.

[0109] The common electrode CME can be coupled (e.g., connected) without distinguishing the sub-pixels PXS. For example, the common electrode CME can be commonly coupled to a plurality (e.g., some or all) of the sub-pixels PXS. The common electrode CME can be an electrode provided integrally without distinguishing the sub-pixels PXS. The common electrode CME can be a second electrode of the light emitting element EL, for example, a cathode electrode.

[0110] The common electrode CME can include a low work function material layer including (e.g., being) at least one of lithium (Li), calcium (Ca), LiF, aluminum (Al), magnesium (Mg), silver (Ag), platinum (Pt), palladium (Pd), nickel (Ni), gold (Au), neodymium (Nd), iridium (Ir), chromium (Cr), BaF, barium (Ba), a compound thereof, or a mixture thereof (e.g., a mixture of Ag and Mg). The common electrode CME can further include a transparent metal oxide layer provided on the low work function material layer.

[0111] The thin film encapsulation structure 130 can be provided on the common electrode CME. The thin film encapsulation structure 130 can prevent or block penetration of oxygen and / or moisture into the light emitting element EL.

[0112] The thin film encapsulation structure 130 can include at least one thin film encapsulation layer. For example, the thin film encapsulation layer can include a first inorganic film 131, an organic film 132, and a second inorganic film 133. Each of the first inorganic film 131 and the second inorganic film 133 can include (e.g., be) silicon nitride, silicon oxide, and / or silicon oxynitride. The organic film 132 can include (e.g., be) an organic insulating material such as a polyacrylate resin, an epoxy resin, a phenol resin, a polyamide resin, a polyimide resin, an unsaturated polyester resin, a polyphenylene ether resin, a polyphenylene sulfide resin, and / or benzocyclobutene (BCB).

[0113] As described above, the color conversion substrate 30 can include first to third light transmission areas TA1, TA2, and TA3 and first to third light blocking areas BA1, BA2, and BA3. The first to third light transmission areas TA1, TA2, and TA3 of the color conversion substrate 30 can correspond to the first to third light emission areas LA1, LA2, and LA3 of the display substrate 10, respectively. The first to third light blocking areas BA1, BA2, and BA3 can prevent or block color mixing of light emitted from the first to third light transmission areas TA1, TA2, and TA3.

[0114] The color conversion substrate 30 can include a second substrate 310, a color filter layer CFL, a light blocking member VAB, a first capping layer 320, a partition wall PTL, a wavelength conversion layer WCL, a light transmission pattern TPL, and a second capping layer 330.

[0115] The color conversion substrate 30 can be disposed on the thin film encapsulation structure 130 to face the thin film encapsulation structure 130. For example, the color conversion substrate 30 and the thin film encapsulation structure 130 can partially or completely overlap each other. The second substrate 310 of the color conversion substrate 30 can include (e.g., be) a transparent material. For example, the second substrate 310 can include (e.g., be) a transparent insulating material such as glass and / or quartz. The second substrate 310 can be a proper rigid substrate. However, the second substrate 310 is not limited to the materials shown above. The second substrate 310 can include (e.g., be) a plastic such as polyimide (PI) and can have proper flexible properties capable of being warped, bent, folded, and / or rolled.

[0116] The second substrate 310 can be the same substrate as the first substrate 110 but can be different from the first substrate 110 in terms of material, thickness, and transmittance, etc. For example, the second substrate 310 can have a higher transmittance than the first substrate 110. Because the second substrate 310 includes (e.g., is) a light-transmissive material, light emitted from the first to third light-transmissive areas TA1, TA2, and TA3 can be transmitted to provide to the outside of the display device 1. The second substrate 310 can be thicker or thinner than the first substrate 110.

[0117] A buffer layer can be further disposed on a surface (e.g., a lower surface) of the second substrate 310 facing the first substrate 110. The buffer layer can prevent or block impurities from flowing into the surface of the second substrate 310.

[0118] A color filter layer CFL can be disposed on a surface (e.g., a lower surface) of the second substrate 310 facing the first substrate 110.

[0119] The color filter layer CFL can include a first color filter CF1, a second color filter CF2, and a third color filter CF3. Each of the color filters CF1, CF2, and CF3 can include (e.g., be) a colorant such as a dye and / or a pigment that absorbs wavelengths other than a corresponding color wavelength.

[0120] The first color filter CF1 can be disposed in the first light-transmissive area TA1 of the first sub-pixel PXS1. The first color filter CF1 can also be disposed in the first to third light-blocking areas BA1, BA2, and BA3. In an example embodiment, the first color filter CF1 disposed in the first light-transmissive area TA1 and the first color filter CF1 disposed in the first to third light-blocking areas BA1, BA2, and BA3 can be formed by the same process (e.g., can be formed of the same material or the same layer). The first color filter CF1 disposed in the first light-transmissive area TA1 can be formed to extend toward the first and third light-blocking areas BA1 and BA3 adjacent to the first light-transmissive area TA1 to be integral with each other.

[0121] The first color filter CF1 can be a blue color filter. The first color filter CF1 can selectively transmit light of a first color (e.g., blue light), and can block and / or absorb light of a second color (e.g., green light) and light of a third color (e.g., red light). For example, the first color filter CF1 can include (e.g., be) a blue colorant. The blue colorant can include (e.g., be) a blue dye and / or a blue pigment.

[0122] When the first color filter CF1 includes (e.g., is) a blue colorant, the external light or the reflected light transmitted through the first color filter CF1 can have a blue wavelength band. The eye color sensitivity perceived by the user's eye can vary according to the color of light. For example, the user's eye can be less sensitive to light in the blue wavelength band than to light in the green wavelength band and light in the red wavelength band. Accordingly, the first color filter CF1 includes (e.g., is) a blue colorant so that the user can perceive the reflected light with lower sensitivity.

[0123] The second color filter CF2 can be disposed in the second light-transmissive area TA2 of the second sub-pixel PXS2. The second color filter CF2 can be disposed in the second light-transmissive area TA2 and can extend toward the first and second light-blocking areas BA1 and BA2 adjacent to the second light-transmissive area TA2 to be partially disposed on the light-blocking member VAB disposed on the first color filter CF1.

[0124] The second color filter CF2 can be a green color filter. The second color filter CF2 can selectively transmit light of a second color (e.g., green light), and can block and / or absorb light of a first color (e.g., blue light) and light of a third color (e.g., red light). For example, the second color filter CF2 can include (e.g., be) a green colorant. The green colorant can include (e.g., be) a green dye and / or a green pigment.

[0125] The third color filter CF3 can be disposed in the third light-transmissive area TA3 of the third sub-pixel PXS3. The third color filter CF3 can be disposed in the third light-transmissive area TA3 and can extend toward the second and third light-blocking areas BA2 and BA3 adjacent to the third light-transmissive area TA3 to be partially disposed on the light-blocking member VAB disposed on the first color filter CF1.

[0126] The third color filter CF3 can be a red color filter. The third color filter CF3 can selectively transmit light of a third color (e.g., red light), and can block and / or absorb light of a first color (e.g., blue light) and light of a second color (e.g., green light). For example, the third color filter CF3 can include (e.g., be) a red colorant. The red colorant can include (e.g., be) a red dye and / or a red pigment.

[0127] The first to third color filters CF1, CF2, and CF3 can absorb a portion of light flowing from the outside of the display device 1 into the color conversion substrate 30 to reduce reflected light due to external light. Accordingly, the first to third color filters CF1, CF2, and CF3 can be used to prevent or reduce color distortion due to reflection of external light.

[0128] The light-blocking member VAB can be disposed on a surface (e.g., a lower surface) of the first color filter CF1 facing the first substrate 110 along the boundary of the sub-pixel PXS. The light-blocking member VAB is disposed in the first to third light-blocking areas BA1, BA2, and BA3 to block light transmission. The light-blocking member VAB can be disposed to surround the first to third light-transmitting areas TA1, TA2, and TA3 and can thus have a lattice shape in a plan view.

[0129] The light-blocking member VAB can include (e.g., be) an organic material. The light-blocking member VAB can absorb external light to reduce color distortion due to reflection of external light. In addition, the light-blocking member VAB can prevent or block intrusion and / or mixing of light between the light-transmitting areas TA1, TA2, and TA3 disposed adjacent to each other, thereby improving color reproducibility of the display device 1.

[0130] In an embodiment, the light-blocking member VAB can absorb light of all visible wavelengths. The light-blocking member VAB can include (e.g., be) a light-absorbing material. For example, the light-blocking member VAB can be made of a material used as a black matrix of the display device 1. In another embodiment, the light-blocking member VAB can absorb light of a set wavelength or wavelength range among visible wavelengths and transmit light of another set wavelength or wavelength range.

[0131] The light-blocking member VAB can be omitted.

[0132] The first capping layer 320 can be disposed on the color filter layer CFL. For example, in the first to third light-transmitting areas TA1, TA2, and TA3, the first capping layer 320 can directly contact a surface (e.g., a lower surface) of each of the first to third color filters CF1, CF2, and CF3 disposed in the first to third light-transmitting areas TA1, TA2, and TA3 and in the first to third light-blocking areas BA1, BA2, and BA3. The first capping layer 320 can directly contact the light-blocking member VAB disposed in the first to third light-blocking areas BA1, BA2, and BA3. For example, the first capping layer 320 can cover lower surfaces of the first to third color filters CF1, CF2, and CF3 and the light-blocking member VAB. Figure 5

[0133] ​The first capping layer 320 can prevent or block impurities such as moisture and / or air from penetrating from the outside to damage and / or contaminate the color filter layer CFL and / or the wavelength conversion layer WCL. In addition, the first capping layer 320 can prevent or block a colorant included in the color filter layer CFL from diffusing into the wavelength conversion layer WCL and / or the light transmission pattern TPL, which will be described in greater detail later.

[0134] The first capping layer 320 can be made of an inorganic material. For example, the first capping layer 320 can include (e.g., be) at least one selected from silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, and silicon oxynitride.

[0135] The partition wall PTL can be disposed on the first capping layer 320. The partition wall PTL can be located in the first to third light-blocking areas BA1, BA2, and BA3 and can overlap the non-light-emitting area NLA. The partition wall PTL can be disposed to overlap the light-blocking member VAB. The partition wall PTL can be disposed to surround the first to third light-transmissive areas TA1, TA2, and TA3. The partition wall PTL can include an opening that exposes the color filter layer CFL and the light transmission pattern TPL.

[0136] The color control layer WCL and TPL can be disposed in a space exposed by the opening of the partition wall PTL. In an embodiment, the color control layer WCL and TPL can be formed by an inkjet process using the partition wall PTL as a bank. The partition wall PTL can function as a guide that stably places an ink composition for forming the color control layer WCL and TPL at a set or predetermined position. The partition wall PTL can include (e.g., be) a photosensitive organic material, but its material is not limited thereto. The partition wall PTL can further include (e.g., be) a light-blocking material.

[0137] The color control layer WCL and TPL can include a wavelength conversion layer WCL that converts the wavelength of incident light and a light transmission pattern TPL that maintains and passes the wavelength of incident light. The wavelength conversion layer WCL and / or the light transmission pattern TPL can be disposed to be separate for each sub-pixel PXS. The wavelength conversion layer WCL and / or the light transmission pattern TPL can overlap the light-emitting area LA and the light-transmissive area TA in a thickness direction. The wavelength conversion layer WCL and / or the light transmission pattern TPL disposed adjacent to each other can be spaced apart from each other by the partition wall PTL disposed in the light-blocking area BA.

[0138] The wavelength conversion layer WCL and the light transmission pattern TPL can be disposed on the first capping layer 320. In some embodiments, as described above, the wavelength conversion layer WCL and the light transmission pattern TPL can be formed by an inkjet method. However, the present disclosure is not limited thereto. For example, each of the wavelength conversion layer WCL and the light transmission pattern TPL can be formed by applying a photosensitive material and exposing and developing the applied photosensitive material to form a pattern. Hereinafter, a case where the wavelength conversion layer WCL and the light transmission pattern TPL are formed by an inkjet method will be described in more detail.

[0139] The wavelength conversion layer WCL can be disposed in a sub-pixel PXS in which a wavelength of light incident by the light emitting element EL is different from a wavelength of a color of the corresponding sub-pixel PXS and thus in which a wavelength needs to be converted. The light transmission pattern TPL can be disposed in a sub-pixel PXS in which a wavelength of light incident by the light emitting element EL is the same as a wavelength of a color of the corresponding sub-pixel PXS. An example embodiment is a case where a light emitting layer EML of each sub-pixel PXS is to emit light of a first color. In this case, the light transmission pattern TPL is disposed in the first sub-pixel PXS1, and the wavelength conversion layer WCL is disposed in the second sub-pixel PXS2 and the third sub-pixel PXS3. As another example, when the light emitting element EL of each sub-pixel PXS is to emit light of a wavelength different from a wavelength of a color of each sub-pixel PXS, such as ultraviolet light, only the wavelength conversion layer WCL can be disposed in each sub-pixel PXS without the light transmission pattern TPL.

[0140] In an example embodiment, the wavelength conversion layer WCL can include a first wavelength conversion pattern WCL1 disposed in the second sub-pixel PXS2 and a second wavelength conversion pattern WCL2 disposed in the third sub-pixel PXS3.

[0141] The light transmission pattern TPL can be disposed in a first light transmission area TA1 separated by the partition wall PTL in the first sub-pixel PXS1. The light transmission pattern TPL can overlap the first color filter CF1 disposed in the first light transmission area TA1. The light transmission pattern TPL is to transmit light of a first color incident from the light emitting layer EML and maintain a wavelength of the light of the first color. For example, the light transmission pattern TPL is to transmit blue light incident from the light emitting layer EML and maintain a wavelength of the blue light.

[0142] The light transmission pattern TPL can include (e.g., be) a first base resin BRS1. The light transmission pattern TPL can further include (e.g., be) a first scatterer SCP1 dispersed in the first base resin BRS1.

[0143] The first wavelength conversion pattern WCL1 can be disposed in the second light-transmissive area TA2 separated by the partition wall PTL in the second sub-pixel PXS2. The first wavelength conversion pattern WCL1 can overlap the second color filter CF2 disposed in the second light-transmissive area TA2. The first wavelength conversion pattern WCL1 can convert light having a wavelength of a first color incident from the light-emitting layer EML into light having a wavelength of a second color different from the first color, and can emit the converted light. For example, the first wavelength conversion pattern WCL1 can convert blue light incident from the light-emitting layer EML into green light, and can emit the green light.

[0144] The first wavelength conversion pattern WCL1 can include (e.g., be) the second base resin BRS2 and the first wavelength conversion material WCP1 dispersed in the second base resin BRS2. The first wavelength conversion pattern WCL1 can further include (e.g., be) the second scatterer SCP2 dispersed in the second base resin BRS2.

[0145] The second wavelength conversion pattern WCL2 can be disposed in the third light-transmissive area TA3 separated by the partition wall PTL in the third sub-pixel PXS3. The second wavelength conversion pattern WCL2 can overlap the third color filter CF3 disposed in the third light-transmissive area TA3. The second wavelength conversion pattern WCL2 can convert light having a wavelength of the first color incident from the light-emitting layer EML into light having a wavelength of a third color different from the first color, and can emit the converted light. For example, the second wavelength conversion pattern WCL2 can convert blue light incident from the light-emitting layer EML into red light, and can emit the red light.

[0146] The second wavelength conversion pattern WCL2 can include (e.g., be) the third base resin BRS3 and the second wavelength conversion material WCP2 dispersed in the third base resin BRS3. The second wavelength conversion pattern WCL2 can further include (e.g., be) the third scatterer SCP3 dispersed in the third base resin BRS3.

[0147] The first to third base resins BRS1, BRS2, and BRS3 can include (e.g., be) a translucent organic material. For example, the first to third base resins BRS1, BRS2, and BRS3 can include (e.g., be) an epoxy resin, an acrylic resin, a cardo resin, and / or an imide resin. The first to third base resins BRS1, BRS2, and BRS3 can be made of the same material, but the present disclosure is not limited thereto.

[0148] The first to third scatterers SCP1, SCP2, and SCP3 can have different refractive indexes from the first to third base resins BRS1, BRS2, and BRS3, respectively. The first to third scatterers SCP1, SCP2, and SCP3 can be metal oxide particles and / or organic material particles. Examples of the metal oxide can include titanium oxide (TiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), indium oxide (In2O3), zinc oxide (ZnO), and tin oxide (SnO2), and examples of the organic material can include acrylic resin and urethane resin. The first to third scatterers SCP1, SCP2, and SCP3 can be made of the same material, but the disclosure is not limited thereto.

[0149] The first wavelength conversion material WCP1 can convert a first color into a second color, and the second wavelength conversion material WCP2 can convert the first color into a third color. For example, the first wavelength conversion material WCP1 can convert blue light into green light, and the second wavelength conversion material WCP2 can convert blue light into red light. The first wavelength conversion material WCP1 and the second wavelength conversion material WCP2 can be quantum dots, quantum rods, and / or phosphors. The quantum dots can include Group IV nanocrystals, Group II-VI compound nanocrystals, Group III-V compound nanocrystals, Group IV-VI compound nanocrystals, or a combination thereof.

[0150] The second capping layer 330 is disposed on the wavelength conversion layer WCL and the light transmission pattern TPL. The second capping layer 330 can be made of an inorganic material. The second capping layer 330 can include (e.g., be) a material selected from the materials listed as the material of the first capping layer 320. The second capping layer 330 and the first capping layer 320 can be made of the same material, but the disclosure is not limited thereto.

[0151] The second capping layer 330 can cover each of the wavelength conversion patterns WCL1 and WCL2 and the light transmission pattern TPL. The second capping layer 330 can not only cover one surface (e.g., a lower surface) of each of the wavelength conversion patterns WCL1 and WCL2 and the light transmission pattern TPL but also can cover side surfaces thereof. The second capping layer 330 can contact the partition wall PTL in a space between adjacent color control layers WCL and TPL. The second capping layer 330 can have a conformal shape with respect to a surface step formed by the color control layers WCL and TPL.

[0152] The filling layer 70 can be disposed between the display substrate 10 and the color conversion substrate 30. The filling layer 70 can serve to fill a space between the display substrate 10 and the color conversion substrate 30, and can serve to couple the display substrate 10 and the color conversion substrate 30. The filling layer 70 can be disposed between the thin film encapsulation structure 130 of the display substrate 10 and the second encapsulation layer 330 of the color conversion substrate 30. The filling layer 70 can be made of a silicon-based organic material or an epoxy-based organic material, etc., but its material is not limited thereto.

[0153] Figure 6 An enlarged cross-sectional view of a portion Q of Figure 5 , and Figure 7 , and Figure 8 is a cross-sectional view illustrating a modification example of the structure shown in Figure 6

[0154] Referring to Figure 6 , in an embodiment, the light emitting layer EML can include a hole transport layer HTL disposed on the sub-pixel electrode PXSE, a first light emitting material layer ELL1 disposed on the hole transport layer HTL, and an electron transport layer ETL disposed on the first light emitting material layer ELL1. In the present embodiment, the light emitting layer EML includes only one light emitting material layer, e.g., the first light emitting material layer ELL1 as the light emitting material layer, and the first light emitting material layer ELL1 can emit blue light. However, the lamination structure of the light emitting layer EML is not limited to the structure of Figure 6 , and can be modified, e.g., as shown in Figure 7 , and Figure 8 to be described below.

[0155] Referring to Figure 7 , in another embodiment, the light emitting layer EML can include a first charge generation layer CGL1 disposed on the first light emitting material layer ELL1 and a second light emitting material layer ELL2 disposed on the first charge generation layer CGL1, and the electron transport layer ETL can be disposed on the second light emitting material layer ELL2.

[0156] The first charge generation layer CGL1 can serve to inject charges into the first light emitting material layer ELL1 and the second light emitting material layer ELL2. The first charge generation layer CGL1 can serve to control charge balance between the first light emitting material layer ELL1 and the second light emitting material layer ELL2. In some embodiments, the first charge generation layer CGL1 can include an n-type (e.g., n-type) charge generation layer and a p-type (e.g., p-type) charge generation layer. The p-type charge generation layer can be disposed on the n-type charge generation layer.

[0157] ​The second light-emitting material layer ELL2 can emit blue light as in the first light-emitting material layer ELL1, but the second light-emitting material layer ELL2 is not limited thereto. The second light-emitting material layer ELL2 can emit blue light having the same peak wavelength or a different peak wavelength from light emitted from the first light-emitting material layer ELL1. In another embodiment, the first light-emitting material layer ELL1 and the second light-emitting material layer ELL2 can emit light of different colors from each other. For example, the first light-emitting material layer ELL1 can emit blue light, and the second light-emitting material layer ELL2 can emit green light. Having Figure 7 The light-emitting layer EML having the structure shown in Figure 7 The light emission efficiency and lifespan of the light-emitting layer EML having the structure shown in Figure 6 may be improved compared to the light emission efficiency and lifespan of the structure of

[0158] Referring to Figure 8 In another embodiment, it is illustrated that the light-emitting layer EML can include three light-emitting material layers ELL1, ELL2, and ELL3 and two charge generation layers CGL1 and CGL2 interposed therebetween. As Figure 8 As shown in

[0159] As in the first light emitting material layer ELL1 and the second light emitting material layer ELL2, the third light emitting material layer ELL3 can emit blue light. In an example embodiment, each of the first light emitting material layer ELL1, the second light emitting material layer ELL2, and the third light emitting material layer ELL3 can emit blue light, but the light emitted from each of the light emitting material layers ELL1, ELL2, and ELL3 can all have the same peak wavelength, or some peak wavelengths can be different. In another embodiment, the color of the light emitted from the first light emitting material layer ELL1, the second light emitting material layer ELL2, and the third light emitting material layer ELL3 can be different from each other. For example, each light emitting material layer can emit blue light or green light, and each light emitting material layer can emit red light, green light, and blue light to emit white light as a whole. For example, in some embodiments, all three of the first to third light emitting material layers ELL1, ELL2, and ELL3 are to emit blue light. In some embodiments, one or two of the first to third light emitting material layers ELL1, ELL2, and ELL3 are to emit blue light and the remaining light emitting material layer(s) of the first to third light emitting material layers ELL1, ELL2, and ELL3 are to emit green light. In some embodiments, one of the first to third light emitting material layers ELL1, ELL2, and ELL3 is to emit blue light, another of the first to third light emitting material layers ELL1, ELL2, and ELL3 is to emit green light, and the remaining one of the first to third light emitting material layers ELL1, ELL2, and ELL3 is to emit red light.

[0160] Figures 9 to 12 A cross-sectional view of a method of repairing a display apparatus according to an embodiment is illustrated.

[0161] Figure 5 The display apparatus 1 can be manufactured before a repair process of Figure 9 is performed. Thereafter, an inspection process is performed to determine the presence or absence of a defective sub-pixel (e.g., a sub-pixel having a defect in a wavelength conversion pattern). The inspection process can be performed, for example, by bonding the display substrate 10 and the color conversion substrate 30 to implement a test pattern to grasp (e.g., detect) the presence and location of a black spot of each sub-pixel. Hereinafter, in an embodiment of the disclosure, a case where a defect occurs in a wavelength conversion pattern disposed in a second light-transmissive area TA2 of a second sub-pixel PXS2 displaying a second color (e.g., green) will be described as an example.

[0162] Referring to Figure 9 , in an embodiment of the disclosure, a first wavelength conversion pattern in which a defect has occurred (hereinafter, a defective wavelength conversion pattern WCL1_D or a hybrid wavelength conversion pattern WCL1_D) can be formed in a second light-transmissive area TA2 of a second sub-pixel PXS2. Figure 9The defective wavelength conversion pattern WCL1_D illustrated in FIG. 1A can be generated due to a material defect during an inkjet process of forming the wavelength conversion layer WCL, or due to a facility operation defect such as ink mis-injection or ink overflow.

[0163] For example, the defective wavelength conversion pattern WCL1_D can include (e.g., be) a fourth base resin BRS2’ in which the second base resin BRS2 and the third base resin BRS3 are mixed, and the second scatterer SCP2, the first wavelength conversion material WCP1, and the second wavelength conversion material WCP2 dispersed in the fourth base resin BRS2’. For example, the defective wavelength conversion pattern WCL1_D, which can be a wavelength conversion layer formed by mixing materials included in the first wavelength conversion pattern WCL1 disposed in the second sub-pixel PXS2 with materials included in the second wavelength conversion pattern WCL2 disposed in the third sub-pixel PXS3, can be a defective wavelength conversion layer that causes a black spot in the display device 1.

[0164] Hereinafter, a method of repairing a display device according to an embodiment of the disclosure will be described in more detail.

[0165] Referring to Figures 9 to 12 , the method of repairing a display device according to an embodiment includes the tasks of removing a defective wavelength conversion pattern (or a mixed wavelength conversion pattern), and forming a repair pattern in a groove formed by removing the defective wavelength conversion pattern. The task of forming a repair pattern can include the task of injecting ink including (e.g., being) a wavelength conversion material into the groove formed by removing the defective wavelength conversion pattern to form a repair material layer, and the task of curing the repair material layer to form a repair pattern. The method of repairing a display device can further include the task of checking the thickness of the repair pattern. Hereinafter, each repair process will be described in more detail with reference to Figures 9 to 12

[0166] First, referring to Figure 9 , a defective wavelength conversion pattern formed in a second sub-pixel (or a defective pixel) is removed.

[0167] For example, the defective wavelength conversion pattern WCL1_D can be removed by irradiating the defective wavelength conversion pattern WCL1_D with a laser beam L1. The laser beam L1 can be applied with a laser unit 710. For example, the laser unit 710 can include at least one of a nano laser and a femtosecond laser. In some embodiments, the laser unit 710 can include a nanosecond laser.

[0168] ​Laser unit 710 can use laser beam L1 to irradiate a defective wavelength conversion pattern WCL1_D disposed in the second light-transmitting region TA2 to remove the defective wavelength conversion pattern WCL1_D. The defective wavelength conversion pattern WCL1_D disposed in the space separated by the partition wall PTL disposed in the first light-blocking region BA1 and the second light-blocking region BA2 can be at least partially removed by laser beam L1.

[0169] Before radiating the laser beam L1, a first mask MK1 may be aligned between the laser unit 710 and the color conversion substrate 30. The first mask MK1 may include a pattern plate including a transmissive portion (e.g., an opening in the first mask MK1) that will transmit the laser beam L1 emitted from the laser unit 710 and a blocking portion that blocks the laser beam L1.

[0170] The first mask MK1 can be configured such that the transmissive portion of the first mask MK1 is aligned with the area corresponding to the second light-transmitting area TA2 of the second sub-pixel PXS2. For example, the transmissive portion of the first mask MK1 can be an opening in the first mask MK1 that overlaps with the second light-transmitting area TA2. Accordingly, when the laser unit 710 radiates the defective wavelength conversion pattern WCL1_D with the laser beam L1, the first mask MK1 can be used to prevent or reduce the occurrence of damage or removal of components or assemblies of the color conversion substrate 30 disposed in areas other than the second light-transmitting area TA2 of the defective second sub-pixel PXS2 by the laser beam L1.

[0171] The focus of the laser beam L1 can be controlled or adjusted so that the laser beam L1 radiated from the laser unit 710 selectively removes (e.g., is set or configured to remove) the defective wavelength conversion pattern WCL1_D without removing the second color filter CF2.

[0172] like Figure 10 As shown, a defective wavelength conversion pattern WCL1_D can be removed from the second light-transmitting area TA2 to form a slot OP. The slot OP can overlap with the second light-transmitting area TA2 of the second sub-pixel PXS2 where a defect has occurred. The slot OP can be a space separated by a partition wall PTL provided in the first light-blocking area BA1 and the second light-blocking area BA2. For example, the slot OP can be the volume occupied by a portion of the defective wavelength conversion pattern WCL1_D removed by the laser beam L1 by the laser unit 710.

[0173] Subsequently, reference Figure 10 A repair material layer is formed in the groove OP formed by removing the defective wavelength conversion pattern WCL1_D.

[0174] For example, repair material layer WCL1_R (see Figure 11) can be formed in the trench OP formed by removing the defective wavelength conversion pattern WCL1_D by an inkjet method. The inkjet nozzle 720 injects the ink I into a space divided by the partition wall PTL disposed in the first light-blocking area BA1 and the second light-blocking area BA2. The second color filter CF2 is located on a bottom surface of the space divided by the partition wall PTL. For example, the second color filter CF2 can be located on a bottom surface of the first capping layer 320 such that the first capping layer 320 separates the second color filter CF2 from the ink I disposed in the trench OP. The ink I can include (e.g., be) the first wavelength conversion material WCP1 or the second wavelength conversion material WCP2 that converts (e.g., respectively converts) the light of the first color into the light of the second color or the light of the third color. The wavelength conversion material included in the ink I can be a wavelength conversion material that converts the light of a set or predetermined color into the light of a color represented by the sub-pixel PXS in which the repair process is performed (e.g., the sub-pixel PXS in which the defect occurs).

[0175] For example, when the defective sub-pixel is the second sub-pixel PXS2, the ink I can include (e.g., be) the first wavelength conversion material WCP1. The ink I can include (e.g., be) a solvent containing the same material as the material included in the first wavelength conversion pattern WCL1 of the first sub-pixel PXS1, and the second scatter SCP2 and the first wavelength conversion material WCP1 dispersed in the solvent. For example, the ink I can include (e.g., be) a solvent containing the same material as the second base resin BRS2, and the second scatter SCP2 and the first wavelength conversion material WCP1 dispersed in the solvent. The injection amount of the ink I can be determined in consideration of the surface tension of the ink I and the volume shrinkage after the ink I is dried. Figure 5 The ink I can be injected into the trench OP to form a repair material layer WCL1_R of the first sub-pixel PXS1 that fills the space divided by the partition wall PTL.

[0176] The repair material layer WCL1_R can be controlled or adjusted so as not to overflow toward the adjacent sub-pixel area (sub-pixel areas) beyond the partition wall PTL. Figure 11

[0177] ​Before injecting the ink I with the inkjet nozzle 720, the second mask MK2 can be aligned between the inkjet nozzle 720 and the color conversion substrate 30. The second mask MK2 can include an opening in a region corresponding to the second light-transmissive region TA2 of the second sub-pixel PXS2. When the ink I is injected onto the first capping layer 320 with the inkjet nozzle 720, the second mask MK2 can function to prevent or block the ink I containing the first wavelength conversion material WCP1 from being injected into a region other than the second light-transmissive region TA2 of the second sub-pixel PXS2 in which a defect has occurred. In some embodiments, the ink I can be injected onto the first capping layer 320 with the inkjet nozzle 720, and the second mask MK2 can function as described above. However, the present disclosure is not limited thereto. For example, the second mask MK2 can be omitted.

[0178] The inkjet nozzle 720 can be coupled to (e.g., connected to) an ink supply device to receive the ink I from the ink supply device. The ink supply device can include an ink storage unit in which the ink I is stored and a circulation pump for circulating the ink I. Because the circulation pump circulates the ink I, the circulation pump can function to prevent or reduce a phenomenon in which the ink I hardens (e.g., coagulates or clogs) and maintain the viscosity of the ink I, thereby improving the quality and / or reliability of the repair process of the display device 1.

[0179] Subsequently, with reference to Figure 11 the repair material layer is cured to form a repair pattern.

[0180] The repair pattern WCL1’ can be formed by curing the repair material layer WCL1_R (see Figure 12 ). For example, the repair material layer WCL1_R can be cured by radiating light on (e.g., to) the repair material layer WCL1_R with a light radiation device 730. The light radiation device 730 is not limited as long as it can cure the repair material layer WCL1_R. For example, the light radiation device 730 can be any device suitable for curing the repair material layer WCL1_R. For example, the light radiation device 730 can include a UV lamp.

[0181] In an example embodiment, in the process of curing the repair material layer WCL1_R, the repair material layer WCL1_R can be cured by radiating light on the repair material layer WCL1_R with the light radiation device 730 in a state in which a gas atmosphere is generated with the gas injector 740 introducing the gas AP onto the repair material layer WCL1_R. For example, the repair material layer WCL1_R can be cured by radiating light onto the repair material layer WCL1_R while generating a gas atmosphere including (e.g., of) the gas AP at (e.g., on, near, or around) the repair material layer WCL1_R. The gas AP can include (e.g., be) nitrogen (N2) or any appropriate gas. The gas AP can be injected onto the repair material layer WCL1_R only locally, so as not to affect the color conversion substrate 30 formed in the adjacent sub-pixel PXS. For example, the gas atmosphere including the gas AP can be generated so that the gas atmosphere is substantially only at (e.g., on, near, or around) the repair material layer WCL1_R. However, the present disclosure is not limited thereto. For example, the entire display device can be in a gas atmosphere including the gas AP.

[0182] Before radiating light on the repair material layer WCL1_R with the light radiation device 730 and generating a gas (AP) atmosphere, the third mask MK3 can be aligned between the light radiation device 730 and the gas injector 740 and the color conversion substrate 30. The third mask MK3 can include an opening in a region corresponding to the second light-transmissive region TA2 of the second sub-pixel PXS2. The third mask MK3 can be used to prevent or reduce occurrence of damage of components or assemblies of the color conversion substrate 30 disposed in a region other than the second light-transmissive region TA2 of the second sub-pixel PXS2 in which the defect occurs from light emitted from the light radiation device 730.

[0183] Subsequently, the repair pattern is inspected with reference to Figure 12 , for example.

[0184] For example, the thickness of the repair pattern WCL1’ formed in the second light-transmissive region TA2 of the second sub-pixel PXS2 can be inspected with the camera unit 750. The camera unit 750 can measure the thickness of the repair pattern WCL1’ by photographing the repair pattern WCL1’ from an upper portion of the region in which the repair process is performed. For example, the camera unit 750 can be placed above the repair pattern WCL1’ so that it can photograph the repair pattern WCL1’ in a plan view. When the thickness is at or less than a reference set value, the inkjet process of Figure 10 may be performed again. The quality and / or reliability of the repair process can be improved by performing the process of inspecting the thickness of the repair pattern WCL1’.

[0185] Figure 13 A cross-sectional view of another example of a process of repairing a display device is illustrated.

[0186] refer to Figure 13 , Figure 13 Implementation methods and Figure 10 The difference in the implementation method is that ink I1 containing the first wavelength conversion material WCP1 and ink I2 containing the second wavelength conversion material WCP2 are injected into the second sub-pixel PXS2 and the third sub-pixel PXS3 respectively, so as to concurrently or simultaneously repair the adjacent sub-pixels that have defects included in the pixel.

[0187] For example, slots OP1 and OP2 formed by removing defective wavelength conversion patterns (e.g., by removing defective wavelength conversion patterns from the second sub-pixel PXS2 and the third sub-pixel PXS3, respectively) can overlap with the second light-transmitting area TA2 of the second sub-pixel PXS2 and the third light-transmitting area TA3 of the third sub-pixel PXS3. Slots OP1 and OP2 formed by removing defective wavelength conversion patterns may include a first slot OP1 overlapping the second light-transmitting area TA2 and a second slot OP2 overlapping the third light-transmitting area TA3.

[0188] Inkjet nozzles 721 and 722 may include a first inkjet nozzle 721 for injecting ink into a first slot OP1 and a second inkjet nozzle 722 for injecting ink into a second slot OP2. The first inkjet nozzle 721 and the second inkjet nozzle 722 may be configured to be controlled or adjusted based on the spacing between adjacent sub-pixels PXS. For example, the height of each of the first inkjet nozzle 721 and the second inkjet nozzle 722 may be controlled or adjusted based on the horizontal distance between adjacent sub-pixels PXS.

[0189] The first inkjet nozzle 721 can inject the first ink I1 into the first tank OP1. The first ink I1 can be combined with... Figure 10 Ink I includes (for example,) substantially the same material.

[0190] The second inkjet nozzle 722 can inject the second ink I2 into the second tank OP2. The second ink I2 may include (e.g., a solvent containing the same material as the third base resin BRS3, e.g., a third scatterer SCP3 and a second wavelength conversion material WCP2 dispersed in the solvent.

[0191] The second mask MK2' can be aligned between the first inkjet nozzle 721 and the second inkjet nozzle 722 and the color conversion substrate 30. The second mask MK2' may include a plurality of transmissive portions (e.g., openings) and a plurality of blocking portions. The second mask MK2' may be configured such that the plurality of transmissive portions are disposed in areas corresponding to the second light-transmitting area TA2 and the third light-transmitting area TA3.

[0192] The second mask MK2' can be omitted.

[0193] The following text will describe what has already happened. Figures 9 to 12 The figure shows a cross-sectional view of the display device with the repair process illustrated. In the following embodiments, the description of components identical to those in the already described embodiments may be simplified or omitted, and the differences will be described primarily. Although the following figures only show pixels that have undergone the repair process due to the occurrence of defects (e.g., the formation of defective wavelength conversion patterns (or mixed wavelength conversion patterns)), another pixel in which no defects of the display device have occurred may also include... Figure 5 The structure shown. For example, according to the display device of this disclosure, it can be... Figures 9 to 12 The repair process shown is applied to a subset of pixels in a plurality of pixels of a display device, and the repair process may not be applied to the remaining pixels of the plurality of pixels.

[0194] Figure 14 This is a cross-sectional view illustrating an example of a display device that has undergone a repair process according to an embodiment.

[0195] In such Figure 14 In the display device shown that has undergone a repair process, the residual mixed wavelength conversion layer can be disposed on the partition wall disposed in the second light-blocking area.

[0196] For example, the residual hybrid wavelength conversion layer PA can be disposed on the separator wall PTL, which is located at the boundary between the repaired second sub-pixel PXS2 and the third sub-pixel PXS3. The separator wall PTL with the residual hybrid wavelength conversion layer PA can overlap with the second light-blocking region BA2 located between the second light-transmitting region TA2 and the third light-transmitting region TA3. The residual hybrid wavelength conversion layer PA can be disposed on the surface of the separator wall PTL located in the second light-blocking region BA2 (e.g., based on...). Figure 14 On the lower surface.

[0197] Combination Figure 9 refer to Figure 14 In the process of forming the first wavelength conversion pattern WCL1 belonging to the second sub-pixel PXS2 and the second wavelength conversion pattern WCL2 belonging to the third sub-pixel PXS3, residual mixed wavelength conversion layer PA can be formed due to ink mis-injection or overflow. For example, in the mixed wavelength conversion material layer formed above the second sub-pixel PXS2 and the third sub-pixel PXS3, residual mixed wavelength conversion layer PA can be formed due to ink overflow through the space separated by the partition wall PTL, because the mixed wavelength conversion material layer is removed... Figure 9 The defective wavelength conversion pattern WCL1_D shown is retained in the process and not removed.

[0198] The residual mixed wavelength conversion layer PA can include (e.g., be) the material included in the first wavelength conversion pattern WCL1 and the material included in the second wavelength conversion pattern WCL2. For example, the residual mixed wavelength conversion layer PA can include (e.g., be) the first wavelength conversion material WCP1 and the second wavelength conversion material WCP2. The residual mixed wavelength conversion layer PA can further include (e.g., be) the second scatterer SCP2 and / or the third scatterer SCP3.

[0199] The second capping layer 330 can cover the light transmission pattern TPL, the repair pattern WCL1', the second wavelength conversion pattern WCL2, the partition wall PTL, and the residual mixed wavelength conversion layer PA.

[0200] Figure 15 A cross-sectional view of another example of a display device that has undergone a repair process according to an embodiment is illustrated.

[0201] In a display device that has undergone a repair process as illustrated in Figure 15 , the level of the surface of the repair pattern can be different from the level of the surface of the wavelength conversion pattern and / or the light transmission pattern. The surface can be the surface of the color control layer facing the display substrate, for example, Figure 15 , the lower surface of the color control layer in

[0202] For example, the level H2 of the surface of the repair pattern WCL1'_1 disposed in the second light transmissive area TA2 of the second sub-pixel PXS2 that has undergone a repair process can be different from the level H1 of the surface of the adjacent light transmission pattern TPL and / or the level H3 of the surface of the second wavelength conversion pattern WCL2. Further, the level H2 of the surface of the repair pattern WCL1'_1 can be different from the level of the surface of the first wavelength conversion pattern WCL1 (see Figure 5 ) that has not undergone a repair process. In this specification, the level of the surface can be defined as the distance from the surface of the second substrate 310 facing the first substrate 110 to the lower surface of the color control layer TPL, WCL1'_1, and WCL2. For example, the levels H1, H2, and H3 can be the distance from the surface (e.g., the lower surface as illustrated in Figure 15 ) of the second substrate 310 to the surface (e.g., the lower surface as illustrated in Figure 15 ) of the light transmission pattern TPL, the surface (e.g., the lower surface as illustrated in Figure 15 ) of the repair pattern WCL1'_1, and the surface (e.g., the lower surface as illustrated in Figure 15 ) of the second wavelength conversion pattern WCL2, respectively.

[0203] In connection with Figure 10 and Figure 11 Reference is made to Figure 15In the present embodiment, the repair pattern WCL1'_1 (whose surface has a different level (e.g., whose surface has a level that can be controlled)) can be formed by injecting the ink into the space partitioned by the partition wall PTL in an amount different from the amount of the ink set or preset in the process of forming the repair material layer WCL1_R. For example, the repair pattern WCL1'_1 (whose surface has a different level) can be formed by differently setting the injection amount of the ink I (e.g., by controlling the injection amount) in the process of forming the repair material layer WCL1_R by injecting the ink I including the first wavelength conversion material WCP1 into the groove OP corresponding to the second light transmission area TA2 illustrated in FIG. 10B. For example, the level of the repair pattern WCL1'_1 can be controlled by controlling the amount of the ink injected into the groove OP. Although it is illustrated in the drawings that the level H2 of the surface of the repair pattern WCL1'_1 is less than the level H1 of the surface of the light transmission pattern TPL and / or the level H3 of the surface of the second wavelength conversion pattern WCL2, the present disclosure is not limited thereto. For example, the level H2 of the surface of the repair pattern WCL1'_1 can be greater than the level H1 of the surface of the light transmission pattern TPL and / or the level H3 of the surface of the second wavelength conversion pattern WCL2. Figure 10 In the present embodiment, the repair pattern WCL1'_1 (whose surface has a different level (e.g., whose surface has a level that can be controlled)) can be formed by injecting the ink into the space partitioned by the partition wall PTL in an amount different from the amount of the ink set or preset in the process of forming the repair material layer WCL1_R. For example, the repair pattern WCL1'_1 (whose surface has a different level) can be formed by differently setting the injection amount of the ink I (e.g., by controlling the injection amount) in the process of forming the repair material layer WCL1_R by injecting the ink I including the first wavelength conversion material WCP1 into the groove OP corresponding to the second light transmission area TA2 illustrated in FIG. 10B. For example, the level of the repair pattern WCL1'_1 can be controlled by controlling the amount of the ink injected into the groove OP. Although it is illustrated in the drawings that the level H2 of the surface of the repair pattern WCL1'_1 is less than the level H1 of the surface of the light transmission pattern TPL and / or the level H3 of the surface of the second wavelength conversion pattern WCL2, the present disclosure is not limited thereto. For example, the level H2 of the surface of the repair pattern WCL1'_1 can be greater than the level H1 of the surface of the light transmission pattern TPL and / or the level H3 of the surface of the second wavelength conversion pattern WCL2.

[0204] Figure 16 A cross-sectional view of another example of a display device that has undergone a repair process according to an embodiment is illustrated.

[0205] In the display device that has undergone a repair process as illustrated in Figure 16 In the display device that has undergone a repair process as illustrated in

[0206] For example, the residual mixed wavelength conversion layer PA_1 can be disposed in the second light transmission area TA2 of the second sub-pixel PXS2 that has undergone a repair process. The residual mixed wavelength conversion layer PA_1 can be disposed between the second color filter CF2 disposed in the second light transmission area TA2 that has undergone a repair process and the repair pattern WCL1'_2. The residual mixed wavelength conversion layer PA_1 can be disposed on one surface of the second color filter CF2 disposed in the second sub-pixel PXS2, and can extend outward to be disposed on a portion of the side surface of the partition wall PTL disposed in the first and second light blocking areas BA1 and BA2. Although it is illustrated in Figure 16 Although it is illustrated in FIG. 10B that the residual mixed wavelength conversion layer PA_1 is integrally formed, the present disclosure is not limited thereto. For example, the residual mixed wavelength conversion layer PA_1 can include two or more portions that are not physically connected to each other.

[0207] In conjunction with Figure 9 Referring to Figure 16The residual hybrid wavelength conversion layer PA_1 can be formed by remaining without being completely removed in the process of removing the defective wavelength conversion pattern WCL1_D. For example, only a portion of the defective wavelength conversion pattern WCL1_D can be removed so that a portion of the defective wavelength conversion pattern WCL1_D remains in the second light-transmissive area TA2. The volume of the residual hybrid wavelength conversion layer PA_1 disposed in the space overlapping the second light-transmissive area TA2 separated by the partition wall PTL can be smaller than the volume of the repair pattern WCL1'_2. In an example embodiment, a ratio of the volume in which the residual hybrid wavelength conversion layer PA_1 is disposed in the second light-transmissive area TA2 to the volume of the space separated by the partition wall PTL in the second light-transmissive area TA2 can be about 10% or less.

[0208] Figure 17 A cross-sectional view of another example of a display device that has undergone a repair process according to an embodiment is illustrated.

[0209] In a display device that has undergone a repair process as illustrated in FIG. 1A, Figure 17 In a display device that has undergone a repair process as illustrated in FIG. 1A,

[0210] For example, a lift-up phenomenon can occur in at least one selected from the color filters CF1 and CF2 disposed in the second sub-pixel PXS2 that has undergone a repair process, and thus a lift-up space DE can be formed between the second substrate 310 and at least one selected from the color filters CF1 and CF2 disposed in the second sub-pixel PXS2.

[0211] In conjunction with Figure 9 Referring to Figure 17 The lift-up space DE can be formed by upwardly transferring energy generated from the laser beam L1 in the process of removing the defective wavelength conversion pattern WCL1_D to the second substrate 310 and the first and second color filters CF1 and CF2 disposed in the second sub-pixel PXS2.

[0212] The lift space DE can be a fine space formed between the second substrate 310 and the color filter layer CFL, which are spaced apart from each other. For example, the lift space DE can be the space between the second substrate 310 and at least one of a first color filter CF1 and a second color filter CF2 disposed in the second sub-pixel PXS2. In some embodiments, the lift space DE can be a volume including empty space (e.g., vacuum) or gas, but this disclosure is not limited thereto. The lift space DE can be formed between the second substrate 310 and the second color filter CF2 disposed to overlap with the second light-transmitting area TA2 of the second sub-pixel PXS2. The lift space DE can also be formed between the second substrate 310 and the first color filter CF1 (e.g., a portion of the first color filter CF1) disposed to overlap with the first light-blocking area BA1 and / or the second light-blocking area BA2.

[0213] Figure 18 This is a cross-sectional view illustrating another example of a display device that has undergone a repair process according to an embodiment.

[0214] In such Figure 18 In the display device shown that has undergone the repair process, the viscosity of the repair pattern is illustrated to be different from the viscosity of the first wavelength conversion pattern.

[0215] For example, the viscosity of the second base resin BRS2_1 included in the repair pattern WCL1'_3 set in the second light-transmitting area TA2 of the second sub-pixel PXS2 that has undergone the repair process may be different from the viscosity of the second base resin BRS2 included in the first wavelength conversion pattern WCL1 set in the normal pixel (see...). Figure 5 The viscosity of the repair pattern WCL1'_3 may include a second base resin BRS2_1, and a first wavelength conversion material WCP1 and a second scatterer SCP2 dispersed in the second base resin BRS2_1. In this embodiment, the second base resin BRS2_1 included in the repair pattern WCL1'_3 may be... Figure 5 The second base resin BRS2 shown includes (for example,) the same material, but only the viscosity may be different.

[0216] Combination Figure 5 and Figure 10 refer to Figure 18 The repair pattern WCL1'_3 can be formed by the viscosity change of ink I caused by the time difference between the process of forming the first wavelength conversion pattern WCL1 belonging to the second sub-pixel PXS2 and the second wavelength conversion pattern WCL2 belonging to the third sub-pixel PXS3 and its repair process. The repair pattern WCL1'_3 includes a second base resin BRS2_1, which is combined with a second base resin BRS2_1 and a second base resin BRS2_1. Figure 5The second base resin BRS2 in the first wavelength conversion pattern WCL1 shown has a different viscosity.

[0217] Figures 19 to 21 This is a cross-sectional view illustrating another example of the process for repairing a display device according to an embodiment.

[0218] refer to Figure 19 A wavelength conversion layer, comprising a first wavelength conversion material WCP1 and a second wavelength conversion material WCP2, can be disposed in the second sub-pixel PXS2 and the third sub-pixel PXS3. For example, a defective wavelength conversion layer WCL3_D (hereinafter referred to as the defective wavelength conversion layer WCL3_D or the mixed wavelength conversion layer WCL3_D) can be formed by the second light-transmitting region TA2, the second light-blocking region BA2, and the third light-transmitting region TA3. It can be formed by the absence of a partition wall PTL in the area overlapping with the second light-blocking region BA2 disposed between the second light-transmitting region TA2 and the third light-transmitting region TA3. Figure 19 The defective wavelength conversion layer WCL3_D shown is illustrated.

[0219] For example, the defective wavelength conversion layer WCL3_D may include a fourth base resin BRS2' in which a second base resin BRS2 and a third base resin BRS3 are mixed, and a second scatterer SCP2, a first wavelength conversion material WCP1, and a second wavelength conversion material WCP2 dispersed in the fourth base resin BRS2'. In some embodiments, the defective wavelength conversion layer WCL3_D may further include Figure 5 The third scatterer SCP3 is shown in the second wavelength conversion pattern WCL2 of the third sub-pixel PXS3. For example, the defective wavelength conversion pattern WCL3_D (which is a wavelength conversion layer formed by mixing the material included in the first wavelength conversion pattern WCL1 provided in the second sub-pixel PXS2 with the material included in the second wavelength conversion pattern WCL2 provided in the third sub-pixel PXS3) can be a defective wavelength conversion layer that causes black spots in the display device 1.

[0220] In the following text, it will be described Figure 19 The method for repairing a display device including a color conversion substrate is shown. In the following embodiments, the methods already referenced may be simplified or omitted. Figures 9 to 12 The description of the process is the same as the description of the process, and will mainly describe the differences in configuration.

[0221] First, refer to Figure 19 The area overlapping with the second transparent area is removed from the defective wavelength conversion layer (or hybrid wavelength conversion layer) included in the second sub-pixel and the third sub-pixel (or defective pixel).

[0222] For example, the first mask MK1 is aligned between the laser unit 710 and the color conversion substrate 30, and then the laser beam L1 can be applied. The first mask MK1 can be disposed such that a transmissive portion thereof is aligned with a region corresponding to the second light-transmissive region TA2. The transmissive portion of the first mask MK1 can be irradiated with the laser beam L1 to remove a portion of the defective wavelength conversion layer WCL3_D overlapping the second light-transmissive region TA2.

[0223] The portion of the defective wavelength conversion layer WCL3_D overlapping the second light-transmissive region TA2 can be removed to form a trench OP in the second light-transmissive region TA2. The portion of the defective wavelength conversion layer WCL3_D not overlapping the second light-transmissive region TA2 can remain on the second substrate 310. As Figure 20 indicated in FIG. 6B, the mixed wavelength conversion pattern WCL3’ remaining by removing the portion of the defective wavelength conversion layer WCL3_D can be disposed over the third light-transmissive region TA3 and the second light-blocking region BA2.

[0224] Subsequently, referring to Figure 20 , a repair material layer is formed in the trench OP formed by removing the portion of the defective wavelength conversion layer WCL3_D. For example, the trench OP can be partitioned or defined by the partition wall PTL in the first light-blocking region BA1 and the sidewall of the mixed wavelength conversion pattern WCL3’.

[0225] For example, the repair material layer WCL1_R can be formed in the trench OP formed by removing the portion of the defective wavelength conversion layer WCL3_D by an inkjet method. The inkjet nozzle 720 injects ink I into a space in which the partition wall PTL disposed in the first light-blocking region BA1 and the mixed wavelength conversion pattern WCL3’ are partitioned. Accordingly, the repair material layer WCL1_R can fill the space in which the partition wall PTL disposed in the first light-blocking region BA1 and the mixed wavelength conversion pattern WCL3’ are partitioned.

[0226] Subsequently, referring to Figure 21 , the repair material layer WCL1_R can be cured to form a repair pattern WCL1’. The repair material layer WCL1_R can contact the mixed wavelength conversion pattern WCL3’. The repair material layer WCL1_R can be cured to form the repair pattern WCL1’ having a structure as Figure 22 indicated in FIG. 6C, which will be described in greater detail later. The repair pattern WCL1’ can contact the mixed wavelength conversion pattern WCL3’ belonging to the adjacent third sub-pixel PXS3.

[0227] Figure 22 A cross-sectional view of another example of a display device that has undergone a repair process according to an embodiment is illustrated.

[0228] In FIG. 6C, the repair pattern WCL1’ is formed in the trench OP formed by removing the portion of the defective wavelength conversion layer WCL3_D. The repair pattern WCL1’ can be formed in the trench OP by curing the repair material layer WCL1_R. The repair pattern WCL1’ can be formed in the trench OP by curing the repair material layer WCL1_R to fill the trench OP. Figure 22In the display device that has undergone the repair process shown in FIG. 6, it is illustrated that the partition wall is not provided in the second light-blocking area, and the color control layer belonging to the second sub-pixel and the third sub-pixel can contact each other.

[0229] For example, the repair pattern WCL1' provided in the second light-transmissive area TA2 of the second sub-pixel PXS2 that has undergone the repair process can contact the mixed wavelength conversion pattern WCL3' provided in the third light-transmissive area TA3 of the adjacent third sub-pixel PXS3. In some embodiments, the mixed wavelength conversion pattern WCL3' can also be provided in the second light-blocking area BA2, and the repair pattern WCL1' can contact the mixed wavelength conversion pattern WCL3' at the boundary between the second light-transmissive area TA2 and the second light-blocking area BA2. The partition wall PTL can not be provided in the second light-blocking area BA2. Accordingly, the mixed wavelength conversion pattern WCL3' can be provided to overlap the third light-transmissive area TA3 and the second light-blocking area BA2.

[0230] In combination Figure 19 With reference Figure 22 The mixed wavelength conversion pattern WCL3' can be formed by retaining without removing the defective wavelength conversion layer WCL3_D provided in the area corresponding to the third light-transmissive area TA3 and the second light-blocking area BA2 in the process of removing the mixed wavelength conversion layer WCL3_D overlapping the second light-transmissive area TA2.

[0231] The mixed wavelength conversion pattern WCL3' provided in the third sub-pixel PXS3 can include (e.g., be) the material included in the first wavelength conversion pattern WCL1 and the material included in the second wavelength conversion pattern WCL2. For example, the mixed wavelength conversion pattern WCL3' can include (e.g., be) the first wavelength conversion material WCP1 and the second wavelength conversion material WCP2.

[0232] In some embodiments, the defective wavelength conversion layer WCL3_D provided in the area overlapping the third light-transmissive area TA3 can also be removed. In this case, the above-described repair process can also be performed in the third sub-pixel PXS3, thereby forming a repair pattern including (e.g., being) the second wavelength conversion material WCP2 in the third light-transmissive area TA3. In this case, a repair pattern including the first wavelength conversion material WCP1 can be formed in the second light-transmissive area TA2, and a repair pattern including the second wavelength conversion material WCP2 can be formed in the third light-transmissive area TA3. Further, the mixed wavelength conversion pattern can remain and be provided between the repair pattern provided in the second light-transmissive area TA2 and the repair pattern provided in the third light-transmissive area TA3. For example, the residual mixed wavelength conversion pattern including the first wavelength conversion material WCP1 and the second wavelength conversion material WCP2 can be provided in the second light-blocking area BA2 in a shape similar to the partition wall PTL.

[0233] In concluding the detailed description, it should be noted that many aspects of the disclosed embodiments have been described as separate options, in order to introduce the concepts as clearly and distinctly as possible. However, the described features, concepts, and / or options can be implemented independently of one another, and each described feature, concept, and / or option can be utilized, incorporated, or combined in any way and / or in any number with the other described features, concepts, and / or options.

Claims

1. A method for repairing a display device, wherein the display device comprises: Color filters; as well as The wavelength conversion layer on the color filter is configured to convert the wavelength of light incident on the wavelength conversion layer, and includes a defect wavelength conversion pattern corresponding to the defective pixel region. The method includes: Remove the defective wavelength conversion pattern from the defective pixel area without removing the color filter; Injecting ink comprising a wavelength conversion material into the defective pixel area where the defective wavelength conversion pattern has been removed; and The ink injected into the defective pixel area is cured.

2. The method as described in claim 1, in, In the removal of the defective wavelength conversion pattern, the defective wavelength conversion pattern is removed by irradiating the defective wavelength conversion pattern with a laser beam.

3. The method as described in claim 2, The laser beam is applied using a laser unit, which may include a nanolaser or a femtosecond laser.

4. The method as described in claim 1, The display device further includes: The color filter is disposed on a substrate and a partition wall is disposed on the surface of the color filter, and The defective wavelength conversion pattern is on the surface of the color filter in the space separated by the partition wall.

5. The method as described in claim 4, in, In the removal of the defective wavelength conversion pattern, the defective wavelength conversion pattern is removed by irradiating the defective pixel area with a laser beam to selectively remove only the defective wavelength conversion pattern without removing the color filter.

6. The method as described in claim 4, The color filter is to selectively transmit light of a first color, and the wavelength conversion material includes a material that converts light of a second color, different from the first color, into light of the first color.

7. The method as described in claim 1, The removal of the defective wavelength conversion pattern includes: Grooves are formed in the defective pixel area by removing the defective wavelength conversion pattern, and The injection of the ink includes forming a repair material layer comprising the wavelength conversion material by filling the groove with the ink comprising the wavelength conversion material.

8. The method as described in claim 7, The curing of the ink includes: A repair pattern is formed by irradiating the repair material layer with light.

9. The method of claim 8, further comprising: After the repair pattern is formed, check the height of the repair pattern.

10. The method as described in claim 1, The curing of the ink includes: Light is applied to the ink while gas is introduced into the defective pixel area.

11. The method of claim 1, further comprising: Detect the pixel areas in which defects have occurred before removing the defective wavelength conversion pattern.

12. A method for repairing a display device, wherein the display device comprises: Color filters; as well as The wavelength conversion layer on the color filter is configured to convert the wavelength of light incident on the wavelength conversion layer, and includes a mixed wavelength conversion pattern. The method includes: Remove the mixed wavelength conversion pattern without removing the color filter; as well as A repair pattern is formed in the groove created by the removal of the mixed wavelength conversion pattern.

13. The method as described in claim 12, The hybrid wavelength conversion pattern includes a first wavelength conversion material that converts light of a first color into light of a second color, and a second wavelength conversion material that converts the light of the first color into light of a third color. The repair pattern includes the first wavelength conversion material but excludes the second wavelength conversion material.

14. The method as described in claim 13, The removal of the mixed wavelength conversion pattern includes: The mixed wavelength conversion pattern is irradiated with a laser beam.

15. The method as described in claim 13, The formation of the repair pattern includes: A repair material layer comprising the first wavelength conversion material is formed in the groove; as well as The repair pattern is formed by curing the repair material layer.

16. The method of claim 15, The formation of the repair material layer in the groove includes: Ink comprising the first wavelength conversion material is injected into the tank.

17. A display device comprising pixels, the pixels including a first sub-pixel configured to display a first color and a second sub-pixel configured to display a second color, the display device comprising: Color conversion substrate, the color conversion substrate comprising: First substrate; Color filter on the surface of the first substrate; A color control layer, the color control layer being on the surface of the color filter and including a first wavelength conversion pattern belonging to the first sub-pixel and a repair pattern belonging to the second sub-pixel; and A hybrid wavelength conversion layer is provided between the color filter and the repair pattern, the hybrid wavelength conversion layer being configured to convert the wavelength of light incident on the hybrid wavelength conversion layer.

18. The display device as claimed in claim 17, The hybrid wavelength conversion layer includes a first wavelength conversion material that converts light of a third color into light of the first color, and a second wavelength conversion material that converts light of the third color into light of the second color. The repair pattern includes the second wavelength conversion material but not the first wavelength conversion material.

19. The display device of claim 18, further comprising: A display substrate facing the color conversion substrate. The display substrate includes: A second substrate facing the first substrate. Sub-pixel electrodes are located on the surface of the second substrate facing the first substrate and are provided to each sub-pixel. A pixel defining layer is provided on the second substrate along the boundary of the sub-pixel and exposes the sub-pixel electrode. The light-emitting layer on the sub-pixel electrode exposed by the pixel-defining layer, and The common electrode on the light-emitting layer.

20. The display device as claimed in claim 18, The pixel further includes a third sub-pixel configured to display a third color, and The color control layer further includes a light transmission pattern belonging to the third sub-pixel.

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