A MOCVD system reaction chamber cleaning device

Abstract

The invention discloses a cleaning device for a reaction chamber of an MOCVD system, comprising a reaction chamber with a self-contained heating device, a chlorine gas inlet and a cleaning gas inlet provided on the reaction chamber, the chlorine gas inlet being connected to a chlorine gas storage bottle, the cleaning gas inlet being connected to a purge system, a gas outlet being provided on the reaction chamber, the gas outlet being connected to a filter, the filter comprising a box body, a partition plate being provided on the box body, the partition plate dividing the box body into an inlet chamber and an outlet chamber, a connecting hole being provided on the partition plate, a filter element assembly being fixed in the inlet chamber on the partition plate, an exhaust port being provided on the outlet chamber and an exhaust fan being fixed inside, the inner cavity of the filter element assembly being connected to the connecting hole, a gas supply port being provided on the inlet chamber, the gas supply port being connected to the gas supply cooling system. The cleaning device can clean the reaction chamber online, thereby reducing the number of shutdowns, improving production efficiency, and ensuring product consistency.

Description

Technical Field

[0001] The invention relates to a cleaning device, which is used for cleaning the inside of a reaction chamber of an MOCVD system. Background Art

[0002] MOCVD is a new type of vapor phase epitaxial growth technology developed on the basis of vapor phase epitaxy (VPE). MOCVD uses organic compounds of group III and group II elements and hydrides of group V and VI elements as crystal growth source materials, and performs vapor phase epitaxy on the substrate in a thermal decomposition reaction to grow various group III-V, group II-VI compound semiconductors and their multi-component solid solutions of thin-layer single crystal materials. In this system, the reaction chamber is composed of a quartz tube and a graphite base. In order to grow compound semiconductor materials with uniform components, ultra-thin layers and heterogeneous structures, some residual substances will appear in the reaction chamber during the operation. These substances generally need to be cleaned. The current cleaning method is to shut down the equipment after using it for a period of time, wait for the temperature inside the reaction chamber to drop to room temperature, open the top cover of the reaction chamber, and then clean the internal graphite base or other parts that need to be cleaned. This cleaning method will cause the growth cycle of the epitaxial product to become longer, the production capacity to decrease, and the process results to be unstable. The reaction chamber must be cleaned and assembled before it is started up, and the final shutdown time is long and the production efficiency is relatively poor. At the same time, because the parameters before and after the shutdown need to be adjusted to a unified level to ensure the stable and consistent performance of the product, the startup also requires test pieces to adjust the parameters, which makes the process complicated and causes waste. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide a MOCVD system reaction chamber cleaning device, which can perform online cleaning of the reaction chamber, thereby reducing the number of shutdowns, improving production efficiency, and ensuring product consistency.

[0004] To solve the above technical problems, the technical solution of the present invention is: a MOCVD system reaction chamber cleaning device, comprising a reaction chamber with a heating device, the reaction chamber is provided with a chlorine gas inlet and a purge gas inlet, the chlorine gas inlet is connected to a chlorine gas storage bottle through a chlorine gas supply pipeline, the purge gas inlet is connected to a purge system through a purge pipeline, the reaction chamber is also provided with a gas outlet, the gas outlet is connected to a filter through the gas outlet pipeline, the gas outlet pipeline, the chlorine gas supply pipeline and the purge pipeline are all provided with a control valve, the filter comprises a box body, a partition plate is provided on the box body, the partition plate divides the box body into an air inlet chamber and an air outlet chamber, a connecting hole is provided on the partition plate, a filter element assembly is fixed on the partition plate in the air inlet chamber, an exhaust port is provided on the air outlet chamber and an exhaust fan is fixed inside, the inner cavity of the filter element assembly is communicated with the connecting hole, and an air supply port is provided on the air inlet chamber, the air supply port is communicated with the air supply cooling system.

[0005] As a preferred solution, the filter element assembly includes an upper mounting plate, a lower mounting plate and a central keel installed between the upper mounting plate and the lower mounting plate, the upper mounting plate is provided with a central through hole, the central keel includes a top plate, a bottom plate and a plurality of connecting screws connecting the top plate and the bottom plate, a plurality of support rods are welded between the top plate and the bottom plate, the support rods are located on the outside of the connecting screws, the upper and lower ends of the connecting screws respectively penetrate the upper mounting plate and the lower mounting plate and are fixed with the partition plate bolts, the outside of the central keel is provided with a filter material cartridge, the filter material cartridge is surrounded by folded filter material, the outside of the filter material cartridge is provided with a stainless steel filter cartridge, and the stainless steel filter cartridge is installed between the upper mounting plate and the lower mounting plate through a fixing structure.

[0006] As a preferred solution, the air supply cooling system includes an air supply fan, the number of the air supply ports is multiple and is arranged on the partition plate and passes through the upper mounting plate, the air supply fan is connected to each air supply port through an air supply pipe, and the air volume of the air supply fan is smaller than the air volume of the exhaust fan.

[0007] As a preferred solution, the fixing structure includes an upper fixing ring arranged on an upper mounting plate and a lower fixing ring arranged on a lower mounting plate. The upper fixing ring and the lower fixing ring are concentrically arranged. The upper end and the lower end of the stainless steel filter cartridge are located between the upper fixing ring and the lower fixing ring and are axially fixed by the upper mounting plate and the lower mounting plate.

[0008] As a preferred solution, the top plate and the bottom plate have the same shape, the top plate comprises an annular top plate body, the outer circumference of the top plate body is evenly distributed with upper protrusions protruding radially outward, the bottom plate comprises an annular bottom plate body, the outer circumference of the bottom plate body is evenly distributed with lower protrusions protruding radially outward, the upper protrusions and the lower protrusions are arranged in one-to-one correspondence, each support rod is fixed between the corresponding upper protrusion and the lower protrusion, and each support rod is located in the folding groove of the filter cartridge.

[0009] As a preferred solution, the purge system includes a purge fan, and a purge nozzle is provided on the reaction chamber at the purge air inlet, and the purge nozzle is connected to the purge fan through a purge pipe.

[0010] As a preferred solution, the purge nozzle includes a nozzle body, which is threadedly mounted on the top cover of the reaction chamber, the inner cavity of the nozzle body is connected to the purge air inlet, and a plurality of purge microholes are arranged on the nozzle body, and the angles of the purge microholes are different.

[0011] As a preferred solution, a mounting boss is provided on the central inner wall of the top cover of the reaction chamber, the nozzle body is threadedly mounted on the mounting boss, and the chlorine gas inlet is also provided on the mounting boss.

[0012] After adopting the above technical scheme, the effect of the present invention is as follows: since the reaction chamber cleaning device includes a reaction chamber with a self-contained heating device, a chlorine gas inlet and a cleaning gas inlet are provided on the reaction chamber, the chlorine gas inlet is connected to the chlorine gas storage bottle through a chlorine gas supply pipeline, and the cleaning gas inlet is connected to the cleaning system through a cleaning pipeline, and a gas outlet is also provided on the reaction chamber, and a filter is connected to the gas outlet through the gas outlet pipeline, and the gas outlet pipeline, the chlorine gas supply pipeline and the cleaning gas pipeline are all provided with a control valve, and the filter includes a box body, and a partition plate is provided on the box body, and the partition plate divides the box body into an inlet chamber and an outlet chamber. The chamber is provided with a connecting hole on the partition plate, a filter element assembly is fixed on the partition plate in the air inlet chamber, an exhaust port is provided on the air outlet chamber and an exhaust fan is fixed inside, the inner cavity of the filter element assembly is communicated with the connecting hole, and an air supply port is provided on the air inlet chamber, and the air supply port is communicated with the air supply cooling system. Therefore, when it is necessary to clean the reaction chamber, the chlorine supply pipeline can be opened to allow chlorine to enter the reaction chamber and fill the entire reaction chamber, and then the reaction chamber is heated by the heating device provided therein, and the temperature in the reaction chamber reaches about 600°C, and the chlorine will corrode the devices in the reaction chamber and the impurities on the inner wall. , so that these impurities are gradually corroded and fall off. After a period of corrosion cleaning, the heating device stops heating. At this time, the temperature in the reaction chamber is still relatively high. The chlorine supply pipeline is closed and the purge system is opened, and the outlet pipeline is opened. In this way, the positive pressure gas generated by the purge system will purge the fallen particulate impurities in the reaction chamber and discharge them from the outlet pipeline. Since the temperature in the reaction chamber is relatively high, it cannot be cooled down in a short time. Therefore, during the purge process, the gas with a higher temperature is discharged from the outlet pipeline and enters the filter before passing through the air supply cooling system to replenish air. Due to the existence of the air supply port, the air intake of the entire system can be increased. The amount of gas flowing out of the reaction chamber plus the amount of gas replenished through the air replenishment port is the total air extraction volume of the filter. The replenished gas is generally room temperature gas, which is much lower than the temperature of the chlorine gas used for etching and the purging gas in the reaction chamber. This can effectively cool the gas and extend the service life of the filter cartridge. At the same time, after the gas is replenished, the particle concentration of the gas discharged from the entire air outlet pipe is also reduced. In this way, a large amount of low-concentration gas will fill the entire air inlet chamber and enter from the surroundings of the filter cartridge more evenly instead of concentrating on the windward side. The filtration efficiency of each part of the filter cartridge is fully utilized, and the filtration effect is better.

[0013] Furthermore, since the filter element assembly includes an upper mounting plate, a lower mounting plate and a central keel installed between the upper mounting plate and the lower mounting plate, a central through hole is provided on the upper mounting plate, the central keel includes a top plate, a bottom plate and a plurality of connecting screws connecting the top plate and the bottom plate, a plurality of support rods are welded between the top plate and the bottom plate, the support rods are located on the outside of the connecting screws, the upper and lower ends of the connecting screws respectively penetrate the upper mounting plate and the lower mounting plate and are fixed with the partition plate bolts, a filter material cartridge is sleeved on the outside of the central keel, the filter material cartridge is surrounded by folded filter material, and the outer sleeve of the filter material cartridge It is equipped with a stainless steel filter cartridge, which is installed between the upper mounting plate and the lower mounting plate through a fixed structure. The filter element assembly adopts a central keel to effectively support the inside of the filter cartridge to prevent it from deformation. At the same time, the outer stainless steel filter cartridge is used to increase the strength of the filter element assembly, and some harmful particles in the reaction chamber will not collide with the filter cartridge at the first time when entering with the gas. At the same time, this structure can further meet the requirements of large-flow air extraction, thereby facilitating the intake of a large amount of gas at the air supply port, thereby quickly cooling the filter cartridge and reducing the impact of temperature on the filter cartridge and reducing the service life of the filter cartridge.

[0014] Furthermore, since the fixing structure includes an upper fixing ring arranged on the upper mounting plate and a lower fixing ring arranged on the lower mounting plate, the upper fixing ring and the lower fixing ring are concentrically arranged, the upper end and the lower end of the stainless steel filter cartridge are located between the upper fixing ring and the lower fixing ring and are axially fixed by the upper mounting plate and the lower mounting plate, the fixing structure can better fix the stainless steel filter cartridge and the installation is also very simple.

[0015] Since the top plate and the bottom plate have the same shape, the top plate includes an annular top plate body, and the outer circumference of the top plate body is uniformly distributed with upper protrusions protruding radially outward, and the bottom plate includes an annular bottom plate body, and the outer circumference of the bottom plate body is uniformly distributed with lower protrusions protruding radially outward, and the upper protrusions and the lower protrusions are arranged one by one, and each support rod is fixed between the corresponding upper protrusion and the lower protrusion, and each support rod is located in the folding groove of the filter cartridge. After adopting the above structure, a suitable number of support rods can be selected according to the size of the filter cartridge, and the support rods can be used to well support the inner wall of the filter cartridge. Of course, due to the presence of the stainless steel filter cartridge, the impact of the gas on the filter cartridge is also smaller, thereby further reducing deformation.

[0016] Furthermore, since the purge nozzle includes a nozzle body, the nozzle body is threadedly mounted on the top cover of the reaction chamber, the inner cavity of the nozzle body is connected to the cleaning air inlet, and a plurality of purge microholes are provided on the nozzle body, and the angles of the purge microholes are different, the purge nozzle can be used to effectively increase the spraying angle and the purge area, and increase the spraying pressure, thereby improving the cleaning effect.

[0017] Furthermore, since a mounting boss is provided on the central inner wall of the top cover of the reaction chamber, the nozzle body is threadedly mounted on the mounting boss, and the chlorine gas inlet is also arranged on the mounting boss, the nozzle body is arranged in the middle of the top cover, which can achieve a better purging effect and reduce purging dead angles. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention is further described below in conjunction with the accompanying drawings and embodiments.

[0019] Figure 1 is a system principle diagram of a reaction chamber cleaning device according to an embodiment of the present invention;

[0020] Figure 2 is a cross-sectional view of the filter;

[0021] Figure 3 yes Figure 2 Cross-sectional view at BB;

[0022] Figure 4 yes Figure 2 An enlarged schematic diagram at C;

[0023] Figure 5 yes Figure 1 A partial cross-sectional view at AA;

[0024] In the attached drawings: 1, reaction chamber; 2, chlorine gas storage bottle; 3, chlorine gas supply pipeline; 4, purge fan; 5, chlorine gas inlet; 6, purge gas inlet; 7, purge pipeline; 8, gas outlet pipeline; 9, filter; 91, box; 92, gas inlet chamber; 93, gas outlet chamber; 94, partition plate; 95, filter element assembly; 951, upper mounting plate; 952, lower mounting plate; 953, center keel; 9 531, top plate; 9532, bottom plate; 9533, connecting screw; 9534, support rod; 9535, upper protrusion; 954, filter cartridge; 955, stainless steel filter cartridge; 956, lower fixing ring; 957, upper fixing ring; 96, exhaust fan; 97, connecting hole; 10, air supply fan; 11, air supply pipeline; 12, mounting boss; 13, purge nozzle; 131, purge micropores. DETAILED DESCRIPTION

[0025] The present invention is further described in detail below through specific examples.

[0026] like Figures 1 to 5As shown, a MOCVD system reaction chamber cleaning device includes a reaction chamber 1 with a built-in heating device, the heating device is an electric heating device built into the reaction chamber 1, and during the normal production process of MOCVD, the electric heating device also needs to be heated to control its reaction temperature. The reaction chamber 1 is provided with a chlorine gas inlet 5 and a purge gas inlet 6, the chlorine gas inlet 5 is connected to a chlorine gas storage bottle 2 through a chlorine gas supply pipeline 3, the purge gas inlet 6 is connected to a purge system through a purge pipeline 7, and the reaction chamber 1 is also provided with a gas outlet, the gas outlet is connected to a filter 9 through a gas outlet pipeline 8, and the gas outlet pipeline 8, Control valves are provided on the chlorine supply pipeline 3 and the purge pipeline 7. The filter 9 includes a box body 91, on which a partition plate 94 is provided. The partition plate 94 divides the box body 91 into an air inlet chamber 92 and an air outlet chamber 93. A connecting hole 97 is provided on the partition plate 94. A filter element assembly 95 is fixed on the partition plate 94 in the air inlet chamber 92. An exhaust port is provided on the air outlet chamber 93 and an exhaust fan 96 is fixed inside. The inner cavity of the filter element assembly 95 is communicated with the connecting hole 97. An air supply port is provided on the air inlet chamber 92, and the air supply port is communicated with the air supply cooling system.

[0027] like Figures 2 to 4As shown, the filter element assembly 95 includes an upper mounting plate 951, a lower mounting plate 952 and a central keel 953 installed between the upper mounting plate 951 and the lower mounting plate 952, the upper mounting plate 951 is provided with a central through hole, the central keel 953 includes a top plate 9531, a bottom plate 9532 and a plurality of connecting screws 9533 connecting the top plate 9531 and the bottom plate 9532, a plurality of support rods 9534 are welded between the top plate 9531 and the bottom plate 9532, and the support rods 9534 are located at the connecting screws 9 533, the upper and lower ends of the connecting screw 9533 respectively penetrate the upper mounting plate 951 and the lower mounting plate 952 and are bolted to the partition plate 94, so that the entire filter element assembly 95 is well fixed on the partition plate 94, and the outer part of the central keel 953 is provided with a filter cartridge 954, which is surrounded by folded filter material, and the outer part of the filter cartridge 954 is provided with a stainless steel filter cartridge 955, which is installed between the upper mounting plate 951 and the lower mounting plate 952 through a fixing structure. Among them, the fixing structure includes an upper fixing ring 957 arranged on the upper mounting plate 951 and a lower fixing ring 956 arranged on the lower mounting plate 952, and the upper fixing ring 957 and the lower fixing ring 956 are arranged concentrically, and the upper and lower ends of the stainless steel filter cartridge 955 are located between the upper fixing ring 957 and the lower fixing ring 956 and are axially fixed by the upper mounting plate 951 and the lower mounting plate 952. Since the upper mounting plate 951 and the lower mounting plate 952 are integrally connected and fixed by a plurality of connecting screws 9533 , the entire stainless steel filter cartridge 955 and the filter material cartridge 954 are constrained between the upper mounting plate 951 and the lower mounting plate 952 , and the lower mounting plate 952 also blocks the bottom of the filter material cartridge 954 , so that gas can only enter from the surroundings of the filter material cartridge 954 .

[0028] In this embodiment, the top plate 9531 and the bottom plate 9532 have the same shape. The top plate 9531 includes an annular top plate 9531 body, and the outer circumference of the top plate 9531 body is evenly distributed with upper protrusions 9535 protruding radially outward. The bottom plate 9532 includes an annular bottom plate 9532 body, and the outer circumference of the bottom plate 9532 body is evenly distributed with lower protrusions protruding radially outward. The upper protrusions 9535 and the lower protrusions are arranged in one-to-one correspondence, and each support rod 9534 is fixed between the corresponding upper protrusion 9535 and the lower protrusion, and each support rod 9534 is located in the folding groove of the filter cartridge 954.

[0029] For example Figure 1As shown, the air supply cooling system includes an air supply fan 10, the number of the air supply ports is multiple and is arranged on the partition plate 94 and penetrates the upper mounting plate 951, the air supply fan 10 is connected to each air supply port through the air supply pipeline 11, and the air volume of the air supply fan 10 is less than the air volume of the exhaust fan 96. The air supply fan 10 supplies the normal temperature gas in the environment into the air inlet chamber 92, so that it can be mixed with the high temperature gas in the reaction chamber 1, thereby finally reducing the temperature of the gas entering the filter cartridge 954.

[0030] In addition, the purge system includes a purge fan 4, and a purge nozzle 13 is provided at the purge air inlet 6 on the reaction chamber 1, and the purge nozzle 13 is connected to the purge fan 4 through a purge pipe 7. Figure 5 As shown, in this embodiment, the purge nozzle 13 includes a nozzle body, the nozzle body is threadedly mounted on the top cover of the reaction chamber 1, the inner cavity of the nozzle body is connected to the purge air inlet 6, and a plurality of purge micropores 131 are provided on the nozzle body, and the angles of the purge micropores 131 are different. Since the purge micropores 131 at multiple angles can divert the purge gas and form a purge gas flow with a higher pressure, the impurity particles in the reaction chamber 1 are lifted up, so that they can be easily discharged from the gas outlet. The central inner wall of the top cover of the reaction chamber 1 is provided with a mounting boss 12, the nozzle body is threadedly mounted on the mounting boss 12, and the chlorine gas inlet 5 is also provided on the mounting boss 12, so that the purge gas is purged from the center to the surroundings, minimizing the purge dead angle.

[0031] The cleaning device uses chlorine gas to corrode the reaction chamber 1. After corrosion, impurities gradually fall off to form particles. The particles are blown out by using a purge gas, and the particles are filtered by a filter 9. Gas is added during filtering to increase the air extraction volume of the filter 9. The service life of the filter cartridge 954 is guaranteed while the gas temperature is reduced, so that the reaction chamber 1 can be directly purged and filtered when the temperature is high, thereby reducing waiting time.

[0032] The blower, control valve, etc. mentioned in this embodiment are conventional technologies at present. The specific structure and principle of the blower, control valve and other designs are disclosed in detail in the "Mechanical Design Manual Fifth Edition" printed in Beijing in April 2008, the fifth edition, the twenty-eighth edition, which belongs to the prior art and its structure is clear. The modern practical pneumatic technology, the third edition SMC training textbook published by the Machinery Industry Press on August 1, 2008, discloses the vacuum components, gas circuits and program control in detail, indicating that the gas circuit structure in this embodiment is also the existing technology, which is clear. Therefore, the circuit and gas circuit connection are clear. The above-mentioned embodiments are only descriptions of the preferred implementation methods of the present invention, and are not used as limitations on the scope of the present invention. On the basis of not departing from the design spirit of the present invention, various deformations and modifications made to the technical solution of the present invention should fall within the protection scope determined by the claims of the present invention.

Claims

1. A MOCVD system reaction chamber cleaning device, comprising a reaction chamber with a built-in heating device, characterized in that: The reaction chamber is provided with a chlorine gas inlet and a purge gas inlet, the chlorine gas inlet is connected to the chlorine gas storage bottle through a chlorine gas supply pipeline, the purge gas inlet is connected to the purge system through a purge pipeline, the reaction chamber is also provided with a gas outlet, the gas outlet is connected to a filter through the gas outlet pipeline, the gas outlet pipeline, the chlorine gas supply pipeline and the purge pipeline are all provided with a control valve, the filter comprises a box body, a partition plate is provided on the box body, the partition plate divides the box body into an air inlet chamber and an air outlet chamber, a connecting hole is provided on the partition plate, a filter element assembly is fixed on the partition plate in the air inlet chamber, an exhaust port is provided on the air outlet chamber and an exhaust fan is fixed inside, the inner cavity of the filter element assembly is connected to the connecting hole, the air inlet chamber An air supply port is provided, which is interconnected with the air supply cooling system, the filter element assembly includes an upper mounting plate, a lower mounting plate and a central keel installed between the upper mounting plate and the lower mounting plate, the upper mounting plate is provided with a central through hole, the central keel includes a top plate, a bottom plate and a plurality of connecting screws connecting the top plate and the bottom plate, a plurality of support rods are welded between the top plate and the bottom plate, the support rods are located on the outside of the connecting screws, the upper and lower ends of the connecting screws respectively penetrate the upper mounting plate and the lower mounting plate and are fixed with the partition plate bolts, the outside of the central keel is provided with a filter material cartridge, the filter material cartridge is surrounded by folded filter material, the outside of the filter material cartridge is provided with a stainless steel filter cartridge, and the stainless steel filter cartridge is installed between the upper mounting plate and the lower mounting plate through a fixing structure.

2. The MOCVD system reaction chamber cleaning device according to claim 1, characterized in that: The air supply cooling system includes an air supply fan, the number of the air supply ports is multiple and is arranged on the partition plate and passes through the upper mounting plate, the air supply fan is connected to each air supply port through an air supply pipe, and the air volume of the air supply fan is smaller than the air volume of the exhaust fan.

3. The MOCVD system reaction chamber cleaning device according to claim 2, characterized in that: The fixing structure includes an upper fixing ring arranged on an upper mounting plate and a lower fixing ring arranged on a lower mounting plate. The upper fixing ring and the lower fixing ring are arranged concentrically. The upper end and the lower end of the stainless steel filter cartridge are located between the upper fixing ring and the lower fixing ring and are axially fixed by the upper mounting plate and the lower mounting plate.

4. The MOCVD system reaction chamber cleaning device according to claim 3, characterized in that: The top plate and the bottom plate have the same shape, the top plate comprises an annular top plate body, the outer circumference of the top plate body is evenly distributed with upper protrusions protruding radially outward, the bottom plate comprises an annular bottom plate body, the outer circumference of the bottom plate body is evenly distributed with lower protrusions protruding radially outward, the upper protrusions and the lower protrusions are arranged in one-to-one correspondence, each support rod is fixed between the corresponding upper protrusion and the lower protrusion, and each support rod is located in the folding groove of the filter cartridge.

5. The MOCVD system reaction chamber cleaning device according to claim 4, characterized in that: The purge system comprises a purge fan, and a purge nozzle is arranged at the purge air inlet of the reaction chamber, and the purge nozzle is connected to the purge fan through a purge pipeline.

6. The MOCVD system reaction chamber cleaning device according to claim 5, characterized in that: The purge nozzle comprises a nozzle body, which is threadedly mounted on the top cover of the reaction chamber, an inner cavity of the nozzle body is connected to a purge air inlet, and a plurality of purge microholes are arranged on the nozzle body, each of which has a different angle.

7. The MOCVD system reaction chamber cleaning device according to claim 6, characterized in that: A mounting boss is arranged on the central inner wall of the top cover of the reaction chamber, the nozzle body is threadedly mounted on the mounting boss, and the chlorine gas inlet is also arranged on the mounting boss.

Images