Biometric recognition device

Abstract

The present invention proposes a biometric identification device. The biometric identification device includes a substrate, a photosensitive element layer, a light-transmitting layer, and a light angle control layer. The photosensitive element layer is arranged on the substrate. The photosensitive element layer has at least one photosensitive element. The photosensitive element includes a first electrode, a second electrode, and a photosensitive layer located between the first electrode and the second electrode, and the first electrode is electrically connected to a reading element. The light-transmitting layer is arranged on the substrate and is located on the photosensitive element layer. The light angle control layer is arranged on the substrate, and the light angle control layer overlaps with the photosensitive element layer. The light angle control layer has a first light-shielding layer and a second light-shielding layer. The light-transmitting layer is located between the first light-shielding layer and the second light-shielding layer. The first light-shielding layer has at least one first light-transmitting area. The second light-shielding layer has at least one second light-transmitting area. The first light-transmitting area overlaps with the second light-transmitting area and corresponds to the photosensitive element.

Description

Technical Field

[0001] The present invention relates to an identification device, and in particular to a biometric identification device. Background Art

[0002] The development of optical sensing technology has opened up a wide range of applications, including smart bracelets, electronic products equipped with fingerprint recognition (such as laptops and smartphones), and even display panels with optical touch functionality. Although the sensing technologies used in these products vary in terms of light sources, sensing elements, and detection targets, improving the sensitivity of optical sensing remains a common challenge for manufacturers.

[0003] For example, in existing fingerprint recognition technology, when light shines on a finger's fingerprint, the unevenness of the fingerprint creates a reflected light field of varying degrees. Consequently, different fingerprint features are distinguished by the sensor. To improve recognition success rates, existing fingerprint recognition devices incorporate a collimating film in their backlight sources. However, collimating films are not only expensive but also hinder the overall thickness of existing fingerprint recognition devices. Summary of the Invention

[0004] The object of the present invention is to provide a biometric identification device that can improve the problems of being expensive and thick.

[0005] The biometric identification device of the present invention includes a substrate, a photosensitive element layer, a light-transmitting layer and a light angle control layer. The photosensitive element layer is arranged on the substrate. The photosensitive element layer has at least one photosensitive element. The photosensitive element includes a first electrode, a second electrode and a photosensitive layer located between the first electrode and the second electrode, and the first electrode is electrically connected to at least one reading element. The light-transmitting layer is arranged on the substrate and is located on the photosensitive element layer. The light angle control layer is arranged on the substrate, and the light angle control layer overlaps with the photosensitive element layer. The light angle control layer has at least a first light-shielding layer and a second light-shielding layer. The light-transmitting layer is located between the first light-shielding layer and the second light-shielding layer. The first light-shielding layer has at least a first light-transmitting area. The second light-shielding layer has at least a second light-transmitting area. The first light-transmitting area overlaps with the second light-transmitting area and corresponds to the photosensitive element. The first light-shielding layer and the second light-shielding layer respectively include at least a stacked structure of a light-shielding conductive material and a low-reflective material.

[0006] In one embodiment of the present invention, the first light shielding layer is disposed adjacent to the photosensitive element, and the second light shielding layer is away from the photosensitive element.

[0007] In one embodiment of the present invention, both the first light shielding layer and the second light shielding layer partially overlap with the photosensitive element.

[0008] In one embodiment of the present invention, a ratio of a distance between a top portion of the photosensitive element and a top portion of the second light shielding layer to a width of the first light-transmitting region is 0.1 to 10.

[0009] In one embodiment of the present invention, a ratio of a distance between a top portion of the photosensitive element and a top portion of the second light shielding layer to a width of the first light-transmitting region is 0.5 to 5.

[0010] In one embodiment of the present invention, the biometric identification device further includes a light-transmitting cover plate, which includes at least one of a touch panel, a display panel, and a protection plate.

[0011] In one embodiment of the present invention, the first light-transmitting region and the second light-transmitting region are through holes.

[0012] In one embodiment of the present invention, the first electrode is located under the photosensitive layer, the second electrode is located on the photosensitive layer, and the first light shielding layer is located on the second electrode.

[0013] In one embodiment of the present invention, the low reflective material includes metal oxide or metal oxynitride.

[0014] In one embodiment of the present invention, the ratio of the thickness of the low-reflection material to the total thickness of the low-reflection material and the light-shielding conductive material is less than 1 and greater than 0.

[0015] A biometric identification device comprises a substrate, a photosensitive element layer, a light angle control layer and a light-transmitting layer. The photosensitive element layer is arranged on the substrate. The photosensitive element layer has at least one photosensitive element. The photosensitive element comprises a first electrode, a second electrode and a photosensitive layer located between the first electrode and the second electrode, and the first electrode is electrically connected to at least one reading element. The light angle control layer is arranged on the substrate. The light angle control layer has at least a first light-shielding layer and a second light-shielding layer. The light-transmitting layer is arranged on the substrate and is located between the light angle control layer and the photosensitive element layer. The light-transmitting layer has at least one convex portion that partially overlaps with the photosensitive element. The first light-shielding layer is arranged on the top surface of the convex portion. The second light-shielding layer is arranged on a partial side surface of the convex portion. The first light-shielding layer is connected to the second light-shielding layer to form an opening facing the other partial side surface of the convex portion.

[0016] In one embodiment of the present invention, the second light shielding layer is not parallel to the photosensitive element.

[0017] In one embodiment of the present invention, the second light shielding layer is not connected to at least one of the first electrode and the second electrode of the photosensitive element.

[0018] In one embodiment of the present invention, the biometric identification device further includes a light-transmitting cover plate, which includes at least one of a touch panel, a display panel, and a protection plate.

[0019] In one embodiment of the present invention, the first light-shielding layer and the second light-shielding layer each include at least a stacked structure of a light-shielding conductive material and a low-reflective material.

[0020] In one embodiment of the present invention, the low reflective material includes metal oxide or metal oxynitride.

[0021] In one embodiment of the present invention, the ratio of the thickness of the low-reflection material to the total thickness of the low-reflection material and the light-shielding conductive material is less than 1 and greater than 0.

[0022] In one embodiment of the present invention, the biometric feature recognition device further includes a protective layer covering the light angle control layer and the substrate.

[0023] In one embodiment of the present invention, the area of ​​the orthographic projection of the first light shielding layer on the substrate is substantially greater than or equal to the area of ​​the orthographic projection of the photosensitive element on the substrate.

[0024] In one embodiment of the present invention, the opening and the second light shielding layer are located on opposite sides of the protrusion.

[0025] Based on the above, the biometric identification device of the present invention utilizes the light-transmitting areas of the two light-shielding layers to produce a collimating effect, or utilizes the side light incident from the convex portion of the light-transmitting layer to enhance the amount of light incident at large angles and the collimating effect of the side light. Consequently, the cost of the biometric identification device of the present invention can be reduced, and the overall thickness can be decreased. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 FIG. 1 is a partial top view of a biometric identification device according to an embodiment of the present invention.

[0027] Figure 2 yes Figure 1 Schematic cross-sectional view of the biometric identification device along line AA.

[0028] Figure 3 FIG. 1 is a partial top view of a biometric identification device according to another embodiment of the present invention.

[0029] Figure 4A FIG. 4 is a schematic top view of a biometric identification device according to another embodiment of the present invention.

[0030] Figure 4B yes Figure 4A A partial cross-sectional diagram of a biometric identification device along line BB.

[0031] The reference numerals are as follows:

[0032] 50: Fingerprint

[0033] 100, 300, 400: Biometric identification device

[0034] 105: Backlight module

[0035] 110:Substrate

[0036] 120,320: photosensitive layer

[0037] 122,322: Optical sensor

[0038] 122A: first electrode

[0039] 122B, 342: Second electrode

[0040] 122C: Photosensitive layer

[0041] 130,430: light-transmitting layer

[0042] 140,340,440,540,640: light angle control layer

[0043] 142,342,442,542,642: First light shielding layer

[0044] 142A: first light-transmitting area

[0045] 144,244,344,444,544,644: Second light shielding layer

[0046] 144A, 244A: Second light-transmitting area

[0047] 150: Read component

[0048] 170: Translucent cover

[0049] M12: Light-shielding conductive material

[0050] M14: Low reflective material

[0051] W10: Width

[0052] D10: Distance

[0053] 460: Protective layer

[0054] P10, P20, P30: Open

[0055] 432:convex part

[0056] 432A, 632A: Top surface

[0057] 432B, 432C, 632B, 632C: Side DETAILED DESCRIPTION

[0058] As used herein, "about," "approximately," "substantially," or "substantially" include the stated value and the mean value within an acceptable deviation range for the particular value as determined by one of ordinary skill in the art, taking into account the measurement in question and the particular amount of error associated with the measurement (i.e., the limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within, for example, ±30%, ±20%, ±15%, ±10%, ±5%. Furthermore, as used herein, "about," "approximately," "substantially," or "substantially" can be selected based on the acceptable deviation range or standard deviation of the measured property, cut property, or other property, and may not apply to all properties without a single standard deviation.

[0059] In the accompanying drawings, the thickness of layers, films, panels, regions, etc. is exaggerated for clarity. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it may be directly on or connected to another element, or an intermediate element may also exist. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there is no intermediate element. As used herein, "connection" may refer to physical and / or electrical connection. Furthermore, "electrical connection" may refer to the presence of other elements between two elements.

[0060] In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another element, as shown in the figures. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in a figure is turned over, the element described as being on the "lower" side of the other elements will be oriented on the "upper" side of the other elements. Thus, the exemplary term "lower" can include both "lower" and "upper" orientations, depending on the particular orientation of the figure. Similarly, if the device in a figure is turned over, the element described as being "below" or "beneath" the other elements will be oriented as being "above" the other elements. Thus, the exemplary terms "above" or "below" can include both "above" and "below" orientations.

[0061] Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals are used in the drawings and the description to refer to the same or like parts.

[0062] Figure 1 FIG. 1 is a partial top view of a biometric identification device according to an embodiment of the present invention. Figure 2 yes Figure 1 A schematic cross-sectional view of the biometric identification device along line AA. Figure 1 and Figure 2The biometric identification device 100 of this embodiment includes a substrate 110, a photosensitive layer 120, a light-transmitting layer 130, and a light angle control layer 140. The photosensitive layer 120 is disposed on the substrate 110. The photosensitive layer 120 has at least one photosensitive element 122. For the convenience of description, Figure 2 Although only one photosensitive element 122 is illustrated, multiple photosensitive elements may be used in other embodiments. The photosensitive element 122 includes a first electrode 122A, a second electrode 122B, and a photosensitive layer 122C located between the first electrode 122A and the second electrode 122B. The first electrode 122A is electrically connected to at least one reading element 150. The reading element 150 is, for example, a thin-film transistor, but the present invention is not limited thereto. Furthermore, the reading element 150 in this embodiment is a top-gate type, but may also be a bottom-gate or other type, and the present invention is not limited thereto.

[0063] The light-transmitting layer 130 is disposed on the substrate 110 and is located on the photosensitive element layer 120. The light-angle control layer 140 is disposed on the substrate 110, and the light-angle control layer 140 overlaps with the photosensitive element layer 120. The light-angle control layer 140 has at least a first light-shielding layer 142 and a second light-shielding layer 144. The light-transmitting layer 130 is located between the first light-shielding layer 142 and the second light-shielding layer 144. The first light-shielding layer 142 has at least a first light-transmitting area 142A. The second light-shielding layer 144 has at least a second light-transmitting area 144A. The first light-transmitting area 142A overlaps with the second light-transmitting area 144A and corresponds to the photosensitive element 122. The first light-shielding layer 142 and the second light-shielding layer 144 respectively include at least a stacked structure of a light-shielding conductive material M12 and a low-reflective material M14.

[0064] In the biometric identification device 100 of this embodiment, the combination of the first light-transmitting region 142A of the first light-shielding layer 142 and the second light-transmitting region 144A of the second light-shielding layer 144 can collimate the light incident on the light-sensing element 122. Therefore, when the biometric identification device 100 of this embodiment is used in conjunction with a backlight module, the backlight module does not need to include an expensive collimating film, thereby reducing the cost and overall thickness of the biometric identification device 100 of this embodiment.

[0065] In addition, the first light-shielding layer 142 and the second light-shielding layer 144 of the present embodiment respectively include at least a stacked structure of a light-shielding conductive material M12 and a low-reflective material M14. The material of the light-shielding conductive material M12 can be a metal, such as Mo, Al or other metals or alloys, but can also be other light-shielding conductive materials. The light-shielding conductive material M12 can also be a single material layer or a stack of multiple material layers, such as a stacked layer of molybdenum / aluminum / molybdenum. The material of the low-reflective material M14 can be a metal oxide or a metal nitride oxide or other suitable low-reflective materials, such as molybdenum tantalum oxide, molybdenum tantalum nitride oxide, etc. The light-shielding conductive material M12 can provide a light-shielding effect, and the low-reflective material M14 can reduce the reflectivity of the light-shielding conductive material M12 to external incident ambient light, thereby avoiding secondary reflected light that reduces the recognition rate. The light reflectivity of the low-reflective material M14 is lower than that of the light-shielding conductive material M12. Furthermore, the ratio of the thickness of the low-reflective material M14 to the total thickness of the low-reflective material M14 and the light-shielding conductive material M12 is, for example, less than 1 and greater than 0, but the present invention is not limited to this. In other words, the thickness of the low-reflective material M14 is, for example, less than 50% of the total thickness of the first light-shielding layer 142, and the thickness of the low-reflective material M14 is, for example, less than 50% of the total thickness of the second light-shielding layer 144. The thickness of the light-shielding conductive material M12 and the low-reflective material M14 is, for example, less than or equal to 0.05 microns.

[0066] In this embodiment, the first light-shielding layer 142 is disposed adjacent to the light-sensing element 122, and the second light-shielding layer 144 is disposed away from the light-sensing element 122. In other words, the light-transmitting layer 130 and the first light-shielding layer 142 are located between the light-sensing element 122 and the second light-shielding layer 144. In this embodiment, the light-transmitting layer 130 is composed of two material layers, but in other embodiments, it may also be a single material layer or a combination of multiple material layers.

[0067] In this embodiment, both the first light-shielding layer 142 and the second light-shielding layer 144 partially overlap with the photosensitive element 122. In other words, the orthographic projection of the first light-shielding layer 142 on the substrate 110 partially overlaps with the orthographic projection of the photosensitive element 122 on the substrate 110, and the orthographic projection of the second light-shielding layer 144 on the substrate 110 partially overlaps with the orthographic projection of the photosensitive element 122 on the substrate 110. Of course, a complete overlap is also included in a partial overlap.

[0068] In this embodiment, the ratio of the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 to the width W10 of the first light-transmitting region 142A is, for example, 0.1 to 10. In this embodiment, the first light-transmitting region 142A and the second light-transmitting region 144A are, for example, through-holes. Although the first light-transmitting region 142A and the second light-transmitting region 144A are the same size in this embodiment, the first light-transmitting region 142A may be larger than the second light-transmitting region 144A, or vice versa, and the present invention is not limited thereto.

[0069] In actual measurements, when the first light-transmitting region 142A and the second light-transmitting region 144A were each circular with a diameter of 4 microns (i.e., a width W10 of 4 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 73.6, and the minimum grayscale value was 50. When the number of first light-transmitting regions 142A and the number of second light-transmitting regions 144A were seven, each of which was a circular with a diameter of 4 microns (i.e., a width W10 of 4 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 74.2, and the minimum grayscale value was 48. This indicates that as the number of first light-transmitting regions 142A and second light-transmitting regions 144A increases, the recognition capability of the biometric recognition device 100 tends to improve.

[0070] Please refer to Figure 1 In this embodiment, the second light shielding layer 144 has a second light-transmitting area 144A, and the second light-transmitting area 144A is circular. Figure 1 yes Figure 2 A schematic top view of the second light shielding layer of the biometric feature recognition device. Figure 3 This is a partial top view of a biometric identification device according to another embodiment of the present invention. Figure 3 In another embodiment, the second light-shielding layer 244 has two second light-transmitting regions 244A, and the second light-transmitting regions 244A are circular. In other embodiments, the second light-transmitting regions 144A may also have other regular geometric shapes or random shapes. When there are multiple second light-transmitting regions 144A, their distribution can be adjusted as needed, and the shapes of the multiple second light-transmitting regions 144A do not necessarily have to be the same.

[0071] Please refer to Figure 2When the first light-transmitting area 142A and the second light-transmitting area 144A were each a circle with a diameter of 5 microns (i.e., a width W10 of 5 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 70.4, and the minimum grayscale value was 50. When the first light-transmitting area 142A and the second light-transmitting area 144A were each a circle with a diameter of 6 microns (i.e., a width W10 of 6 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 70.3, and the minimum grayscale value was 39. When the first light-transmitting region 142A and the second light-transmitting region 144A were each circular with a diameter of 12 microns (i.e., a width W10 of 12 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 56.4, and the minimum grayscale value was 33. When the first light-transmitting region 142A and the second light-transmitting region 144A were each circular with a diameter of 20 microns (i.e., a width W10 of 20 microns), and the distance D10 between the top of the photosensitive element 122 and the top of the second light-shielding layer 144 was 12 microns, the average grayscale value of the measured fingerprint 50 image was 52.3, and the minimum grayscale value was 35. It can be seen that when the width W10 of the first light-transmitting area 142A and the second light-transmitting area 144A increases, the average grayscale value and the minimum grayscale value of the measured fingerprint 50 image tend to decrease, and the recognition capability of the biometric recognition device 100 tends to decrease.

[0072] Therefore, the ratio of the distance D10 between the top of the photosensitive element 122 and the top of the second light shielding layer 144 to the width W10 of the first light-transmitting region 142A can be set to 0.5 to 5.

[0073] In this embodiment, the biometric recognition device 100 further includes a light-transmitting cover plate 170, which can be a touch panel, a display panel, a protective plate or other cover plate, wherein the display panel can be a self-luminous form or a non-self-luminous form. In other words, the user's fingerprint 50 contacts the light-transmitting cover plate 170. In this embodiment, the biometric recognition device 100 further includes at least one microlens corresponding to the second light-transmitting area 144A. The microlens (not shown) can be a convex lens, a concave lens, a cylindrical prism or other suitable forms of lens. The microlens (not shown) is used to transmit the light reflected by the fingerprint 50 to the light sensing element 122.

[0074] In this embodiment, the first electrode 122A is located below the photosensitive layer 122C, and the second electrode 122B is located above the photosensitive layer 122C and contacts the first light-shielding layer 142. When the portion of the first light-shielding layer 142 contacting the second electrode 122B is conductive, it helps to reduce the transmission impedance of the second electrode 122B. The second electrode 122B can be made of a light-transmitting conductive material, such as a metal oxide material, to allow light to penetrate and enter the photosensitive layer 122C. Metal oxide materials include indium tin oxide, indium oxide, zinc oxide, etc. The first electrode 122A can be made of an opaque conductive material. The photosensitive layer 122C can have the property of converting light energy into electrical energy, thereby realizing optical sensing. The material of the photosensitive layer 122C includes silicon-rich materials, such as silicon-rich oxide, silicon-rich nitride, silicon-rich oxynitride, silicon-rich carbide, silicon-rich oxycarbon, hydrogenated silicon-rich oxide, hydrogenated silicon-rich nitride, hydrogenated silicon-rich carbide, and materials doped with high work function elements, such as silicon-germanium compounds or other suitable organic materials or stacked combinations of the above materials.

[0075] Figure 4A FIG. 4 is a schematic top view of a biometric identification device according to another embodiment of the present invention. Figure 4B yes Figure 4A A partial cross-sectional diagram of the biometric identification device along line BB. Please refer to Figure 4A and Figure 4B The biometric identification device 400 of this embodiment is Figure 2 The biometric feature recognition device 100 is similar to the biometric feature recognition device 100, and only the differences between the two are described here. Figure 2 Other parts of the embodiment not described in this embodiment may also be applied to this embodiment. The biometric identification device 400 of this embodiment includes a substrate 110, a photosensitive element layer 120, a light angle control layer 440 and a light-transmitting layer 430. The photosensitive element layer 120 is disposed on the substrate 110. The photosensitive element layer 120 has at least one photosensitive element 122. The photosensitive element 122 includes a first electrode 122A, a second electrode 122B and a photosensitive layer 122C located between the first electrode 122A and the second electrode 122B, and the first electrode 122A is electrically connected to at least one reading element 150. The light angle control layer 440 is disposed on the substrate 110. The light angle control layer 440 has at least a first light-shielding layer 442 and a second light-shielding layer 444. The light-transmitting layer 430 is disposed on the substrate 110 and is located between the light angle control layer 440 and the photosensitive element layer 120. The light-transmitting layer 430 has at least one protrusion 432 that partially overlaps the light-sensing element 122. A first light-shielding layer 442 is disposed on a top surface 432A of the protrusion 432. A second light-shielding layer 444 is disposed on a portion of a side surface 432B of the protrusion 432. The first light-shielding layer 442 connects to the second light-shielding layer 444 to form an opening P10 facing another portion of a side surface 432C of the protrusion 432.

[0076] In the biometric identification device 400 of this embodiment, the light provided by the backlight module 105 is reflected by the fingerprint 50 and then irradiated to the light sensing element 122 from the opening P10. By providing a first light shielding layer 442 and a second light shielding layer 444, a large-angle incident light can be obtained, thereby reducing the crosstalk phenomenon caused by the sensing results obtained by the adjacent light sensing elements 122, thereby improving the recognition rate. In addition, even if the backlight module used in the biometric identification device 400 of this embodiment does not have an expensive collimating film, which makes the light more divergent, in terms of pixel design, the maximum aperture ratio is concentrated on the opening P10 of the light angle control layer 440, which allows more incident light and improves the brightness of the image of the fingerprint 50, thereby improving the fingerprint recognition rate. In one embodiment, the design of the pixel is to make the opening formed by the first light shielding layer and the second light shielding layer face the area with the maximum aperture ratio of the pixel or the adjacent pixel.

[0077] In this embodiment, the light-transmitting layer 430 is taken as an example to have a substantially uniform thickness, and the protrusion 432 is as follows. Figure 4B The portion framed by a dotted line in the figure. In other embodiments, the light-transmitting layer may have an actual raised appearance only at the position of the convex portion, rather than having a roughly uniform thickness. It can also be said that the convex portion 432 of this embodiment is defined by a first light-shielding layer 442 located on the top surface 432A of the convex portion 432 and a second light-shielding layer 444 located on the side surface 432B of the convex portion 432. The side surface 432B of the convex portion 432 of this embodiment is a slope. In other words, the second light-shielding layer 444 located on the side surface 432B of the convex portion 432 is inclined, that is, the second light-shielding layer 444 is not parallel to the substrate 110 and the photosensitive element 122. The second light-shielding layer 444 of this embodiment is not connected to at least one of the first electrode 122A and the second electrode 122B of the photosensitive element 122.

[0078] Figure 1 The transparent cover plate 170 can also be applied to this embodiment. The first light shielding layer 442 and the second light shielding layer 444 of this embodiment can be Figure 2 The first light shielding layer 142 and the second light shielding layer 144 are both stacked structures of light shielding conductive materials and low reflective materials, and other details of the light shielding conductive materials and low reflective materials are also the same. Figure 2 The same as the embodiment.

[0079] In this embodiment, the biometric recognition device 400 further includes a protective layer 460 covering the light angle control layer 440 and the substrate 110. In this embodiment, the orthographic projection area of ​​the first light shielding layer 442 on the substrate 110 is substantially greater than or equal to the orthographic projection area of ​​the light sensor 122 on the substrate 110, but the present invention is not limited to this. In other words, the first light shielding layer 442 can substantially block light incident from directly above the light sensor 122.

[0080] In this embodiment, the opening P10 and the second light shielding layer 444 are located on opposite sides of the convex portion 432. Specifically, the opening P10 is located on the side surface 432C of the convex portion 432, and the second light shielding layer 444 is located on the side surface 432B of the convex portion 432. Figure 4A From the perspective of the convex portion 432 (marked at Figure 4B ) is generally rectangular, with the light angle control layer 440 disposed on one side of the convex portion 432. In other embodiments, the light angle control layer may be located on three sides of the convex portion. In other embodiments, the convex portion may be generally circular or triangular in shape when viewed from above. The convex portion may also be in the shape of a triangular pyramid, a polygonal pyramid, a circular hemisphere, an elliptical hemisphere, or other suitable design, but the present invention is not limited thereto.

[0081] In summary, the biometric authentication device of the present invention utilizes two light-shielding layers to collimate light through the light-transmitting area, or utilizes the side openings in the convex portion of the light-transmitting layer to collect oblique, wide-angle light. This eliminates the need for conventional collimating films. Consequently, the manufacturing cost of the biometric authentication device of the present invention can be reduced, and the overall thickness can be decreased.

Claims

1. A biometric recognition device, comprising: a substrate; A photosensitive layer is disposed on the substrate, wherein The photosensitive element layer has at least one photosensitive element, the photosensitive element including a first electrode, a second electrode and a photosensitive layer located between the first electrode and the second electrode, and the first electrode is electrically connected to at least one reading element; a light-transmitting layer disposed on the substrate and located on the light-sensitive component layer; as well as a light angle control layer disposed on the substrate and overlapping the light-sensitive element layer, wherein the light angle control layer comprises at least a first light-shielding layer and a second light-shielding layer, the light-transmitting layer being located between the first light-shielding layer and the second light-shielding layer, the first light-shielding layer having at least a first light-transmitting region, the second light-shielding layer having at least a second light-transmitting region, the first light-transmitting region and the second light-transmitting region overlapping and corresponding to the light-sensitive element, the first light-shielding layer and the second light-shielding layer respectively comprising at least a stacked structure of a light-shielding conductive material and a low-reflective material; Among them, the second light-shielding layer is the outermost layer, and the first light-shielding layer is the innermost layer; the ratio of the distance between the top of the photosensitive element and the top of the second light-shielding layer to the width of the first light-transmitting area is 0.5 to 5, wherein the first electrode is located under the photosensitive layer, the second electrode is located on the photosensitive layer and contacts the first light-shielding layer, the second electrode is a light-transmitting conductive material, and the first electrode is a light-opaque conductive material.

2. The biometric feature recognition device according to claim 1, wherein: The first light shielding layer is adjacent to the light sensing element, and the second light shielding layer is far away from the light sensing element.

3. The biometric identification device according to claim 1, wherein: The first light shielding layer and the second light shielding layer both partially overlap with the light sensing element.

4. The biometric recognition device as claimed in claim 1, further comprising a light-transmitting cover plate, which includes at least one of a touch panel, a display panel and a protection plate.

5. The biometric feature recognition device according to claim 1, wherein: The first light-transmitting area and the second light-transmitting area are through holes.

6. The biometric identification device according to claim 2, wherein: The first light shielding layer is located on the second electrode.

7. The biometric feature recognition device according to claim 1, wherein: The low reflective material includes metal oxide or metal oxynitride.

8. The biometric feature recognition device according to claim 1, wherein: The ratio of the thickness of the low-reflection material to the total thickness of the low-reflection material and the light-shielding conductive material is less than 1 and greater than 0.

9. A biometric identification device comprising: a substrate; A photosensitive layer is disposed on the substrate, wherein The photosensitive element layer has at least one photosensitive element, the photosensitive element including a first electrode, a second electrode and a photosensitive layer located between the first electrode and the second electrode, and the first electrode is electrically connected to at least one reading element; a light angle control layer disposed on the substrate, wherein the light angle control layer at least comprises a first light shielding layer and a second light shielding layer; and A light-transmitting layer is disposed on the substrate and is located between the light angle control layer and the photosensitive element layer, wherein the light-transmitting layer has at least one convex portion that partially overlaps with the photosensitive element, the first light-shielding layer is disposed on the top surface of the convex portion, the second light-shielding layer is disposed on a partial side surface of the convex portion, and the first light-shielding layer is connected to the second light-shielding layer to form an opening toward another partial side surface of the convex portion.

10. The biometric feature recognition device according to claim 9, wherein: The second light shielding layer is not parallel to the light sensing element.

11. The biometric feature recognition device according to claim 9, wherein: The second light shielding layer is not connected to at least one of the first electrode and the second electrode of the photosensitive element.

12. The biometric recognition device as claimed in claim 9, further comprising a light-transmitting cover plate comprising at least one of a touch panel, a display panel and a protection plate.

13. The biometric feature recognition device according to claim 9, wherein: The first light-shielding layer and the second light-shielding layer respectively include at least a stacked structure of a light-shielding conductive material and a low-reflection material.

14. The biometric feature recognition device according to claim 13, wherein: The low reflective material includes metal oxide or metal oxynitride.

15. The biometric feature recognition device according to claim 13, wherein: The ratio of the thickness of the low-reflection material to the total thickness of the low-reflection material and the light-shielding conductive material is less than 1 and greater than 0. 16 . The biometric feature recognition device as claimed in claim 9 , further comprising a protective layer covering the light angle control layer and the substrate.

17. The biometric feature recognition device according to claim 9, wherein: The area of ​​the orthographic projection of the first light-shielding layer on the substrate is greater than or equal to the area of ​​the orthographic projection of the light-sensing element on the substrate.

18. The biometric feature recognition device according to claim 9, wherein: The opening and the second light shielding layer are located at opposite sides of the convex portion.

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