Film structure and transparent substrate

Abstract

The present invention relates to a film structure and a light-transmitting substrate. The film structure comprises a plurality of first refractive films and a plurality of second refractive films, wherein the second refractive films are stacked alternately with the first refractive films. The film structure of the present invention can effectively reduce the reflectivity of light.

Description

Technical Field

[0001] The invention relates to a film layer structure, and in particular to an anti-reflection (AR) film layer structure and a light-transmitting substrate. Background Art

[0002] With the rapid development and popularization of flat panel display products, anti-reflection film has become a must-have product for pursuing higher visual effects, because reducing reflected light can improve the contrast and color vividness of display products. Therefore, all kinds of information, communication products or televisions will use anti-reflection films that reduce reflected light to improve image quality.

[0003] For example, the protective cover or touch panel of a flat-panel display device is easily affected by the reflected light from the external light source projected onto the product surface under strong external light or in a car environment, which may affect the comfort or safety of the viewer. Therefore, an anti-reflection film that can reduce the reflected light on the surface is particularly needed.

[0004] In addition, in the curved side of conventional 2.5D or 3D transparent glass (such as cover glass or touch glass), in addition to the poor tactile feel when touched, the curved side also has a color difference problem of a gold edge or a red edge. Summary of the invention

[0005] The purpose of the present invention is to provide a film layer structure with anti-reflection function and a light-transmitting substrate using the film layer structure, which can effectively reduce the reflectivity of light.

[0006] Another object of the present invention is to provide a light-transmitting substrate that can achieve a smooth touch at the edge and improve the edge color difference phenomenon.

[0007] To achieve the above-mentioned purpose, a film structure according to the present invention includes a plurality of first refractive films and a plurality of second refractive films, wherein the second refractive films and the first refractive films are alternately stacked.

[0008] In one embodiment, the material of the first refractive film is silicon dioxide, aluminum oxide or zinc dioxide, and the material of the second refractive film is niobium pentoxide, titanium pentoxide or tantalum pentoxide.

[0009] In one embodiment, the thickness of each of the first refractive films is between 10 and 110 nanometers, and the thickness of each of the second refractive films is between 4 and 90 nanometers.

[0010] In one embodiment, the total number of film layers of the first refractive films and the second refractive films is at least ten layers, which are sequentially stacked on a light-transmitting substrate. The second refractive films are respectively located in a first film layer, a third film layer, a fifth film layer, a seventh film layer and a ninth film layer among the ten film layers. The first refractive films have a second film layer, a fourth film layer, a sixth film layer, an eighth film layer and a tenth film layer. The first film layer is the film layer closest to the light-transmitting substrate.

[0011] In one embodiment, the thickness of the first film layer is between 3.92 and 7.28 nanometers; the thickness of the second film layer is between 57.81 and 107.37 nanometers; the thickness of the third film layer is between 9.59 and 17.81 nanometers; the thickness of the fourth film layer is between 38.68 and 71.83 nanometers; the thickness of the fifth film layer is between 21.89 and 40.65 nanometers; the thickness of the sixth film layer is between 14.64 and 27.18 nanometers; the thickness of the seventh film layer is between 59.07 and 109.71 nanometers; the thickness of the eighth film layer is between 9.35 and 17.37 nanometers; the thickness of the ninth film layer is between 22.06 and 40.96 nanometers; and the thickness of the tenth film layer is between 71.49 and 132.77 nanometers.

[0012] In one embodiment, the first refractive film further includes a zeroth film layer disposed between the first film layer and the light-transmitting substrate, and the thickness of the zeroth film layer is between 27.45 and 50.99 nanometers.

[0013] In one embodiment, the film layer structure further includes a protective film disposed on a side of the tenth film layer away from the light-transmitting substrate.

[0014] In one embodiment, when the wavelength of the incident light is between 400 and 900 nanometers, the average reflectivity of the film structure is less than 5.5%.

[0015] In one embodiment, the refractive index of the first refractive film is smaller than the refractive index of the second refractive film.

[0016] To achieve the above-mentioned purpose, a transparent substrate according to the present invention includes a transparent substrate and the film layer structure as described above. The transparent substrate has a first surface and a second surface opposite to the first surface. The film layer structure is arranged on the first surface and / or the second surface of the transparent substrate.

[0017] In one embodiment, the light-transmitting substrate is a 2D, 2.5D or 3D rigid substrate or a flexible substrate.

[0018] To achieve the above-mentioned purpose, a transparent substrate according to the present invention includes a transparent base material having a flat surface and at least one curved side edge connected to the flat surface, the curved side edge sequentially including an arc corner, a side edge and a chamfer, wherein the flat surface is connected to the arc corner.

[0019] In one embodiment, the light-transmitting substrate is 2D, 2.5D or 3D light-transmitting glass.

[0020] In one embodiment, the length of the side edge is equal to the thickness of the light-transmitting substrate minus the length of the arc corner in the thickness direction of the light-transmitting substrate, and further minus the length of the chamfer in the thickness direction of the light-transmitting substrate.

[0021] In one embodiment, the radius of the rounded corner is between 1 and 10 mm, and the length of the chamfer is 0.15 mm.

[0022] In one embodiment, a film structure as described above is disposed on a flat surface of a light-transmitting substrate, and extends to and covers the arc corners of the curved side edges.

[0023] As described above, in the film layer structure and the transparent substrate of the present invention, the reflectivity of light can be effectively reduced by alternately stacking a plurality of second refractive films and a plurality of first refractive films, and the structural design and refractive index of the first refractive films and the second refractive films are matched.

[0024] In addition, in the light-transmitting substrate of the present invention, the curved side of the light-transmitting substrate includes arc angles, side edges and chamfers in sequence, and the structural design of the flat surface of the light-transmitting substrate connected to the arc angle can achieve a smooth touch of the side edge, and at the same time has the effect of improving the chromatic aberration of the curved side. In addition, in one embodiment of the present invention, the light-transmitting substrate also matches the refractive index of the coating material through the structural design of the film layer structure to obtain a wider optical thickness and physical thickness. In this way, the flat surface of the light-transmitting substrate can also achieve low light reflectivity, and avoid the chromatic aberration problem of the gold edge or red edge of the curved side. The specific details of the present invention will be described in detail in the following embodiments and related drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 is a schematic diagram of a light-transmitting substrate according to an embodiment of the present invention;

[0026] FIG. 2A to FIG. 2C They are schematic diagrams of light-transmitting substrates according to different embodiments of the present invention;

[0027] Figure 3 is a schematic diagram of a light-transmitting substrate according to another embodiment of the present invention;

[0028] Figure 4 Schematic diagrams of light-transmitting substrates according to different embodiments of the present invention.

[0029] Component Symbol:

[0030] 1: Translucent substrate

[0031] 10: Light-transmitting substrate

[0032] 11: First refractive film

[0033] 12: Second refractive film

[0034] F: Film structure

[0035] L1: First layer

[0036] L2: Second film layer

[0037] L3: The third film layer

[0038] L4: The fourth film layer

[0039] L5: The fifth film layer

[0040] L6: The sixth film layer

[0041] L7: The seventh film layer

[0042] L8: The eighth film layer

[0043] L9: The ninth film layer

[0044] L10: The tenth film layer

[0045] S1: First surface

[0046] S2: Second surface DETAILED DESCRIPTION

[0047] The following will refer to the relevant drawings to illustrate the film structure and the transparent substrate according to some embodiments of the present invention, wherein the same components will be described with the same reference symbols. In order to clearly illustrate the present invention, the following embodiments are only schematically illustrated, and the size and proportion of each component are only for illustrating the technology of the present case and cannot limit the present invention.

[0048] Please refer to Figure 1 , which is a schematic diagram of a light-transmitting substrate according to an embodiment of the present invention. The light-transmitting substrate 1 can be a 2D, 2.5D or 3D rigid substrate or a flexible substrate. The rigid substrate is, for example but not limited to, a light-transmitting glass, and the flexible substrate is, for example but not limited to, a polyimide (PI) soft board. The light-transmitting substrate 1 of this embodiment is an example of a 2.5D rigid substrate, for example but not limited to, a light-transmitting glass.

[0049] The light-transmitting substrate 1 includes a light-transmitting base material 10 and a film structure F.

[0050] The light-transmitting substrate 10 has a first surface S1 and a second surface S2 (lower surface) opposite to the first surface S1 (upper surface), and the film structure F is an anti-reflection film, which can be disposed on the first surface S1 and / or the second surface S2 of the light-transmitting substrate 10. The film structure F of this embodiment is disposed on the first surface S1 (upper surface) of the light-transmitting substrate 10 as an example.

[0051] The film layer structure F includes a plurality of first refractive films 11 and a plurality of second refractive films 12, wherein the second refractive films 12 are alternately stacked with the first refractive films 11, and the total number of film layers of the first refractive films 11 and the second refractive films 12 is at least ten layers (or less than ten layers, at least ten layers are used as an example for discussion herein, but not limited). Here, "alternately stacked" means that a first refractive film 11, a second refractive film 12, a first refractive film 11, a second refractive film 12, ... may be sequentially overlapped and disposed on the light-transmitting substrate 10; or a second refractive film 12, a first refractive film 11, a second refractive film 12, a first refractive film 11, ... may be sequentially overlapped and disposed on the light-transmitting substrate 10. The number of the first refractive films 11 and the second refractive films 12 may be the same or different. In this embodiment, the number of the first refractive film 11 and the number of the second refractive film 12 are the same, and each of them has 5 layers, so that the total number of film layers of the first refractive film 11 and the second refractive film 12 is ten.

[0052] In this embodiment, the film layer structure F has ten film layers sequentially stacked on the light-transmitting substrate 10, the second refractive films 12 are respectively located in a first film layer L1, a third film layer L3, a fifth film layer L5, a seventh film layer L7 and a ninth film layer L9 (a total of 5 layers) among the ten film layers, and the first refractive films 11 are respectively located in a second film layer L2, a fourth film layer L4, a sixth film layer L6, an eighth film layer L8 and a tenth film layer L10 (a total of 5 layers) among the ten film layers, and the first film layer L1 is the film layer closest to the light-transmitting substrate 10. Here, in order to make it clear which type of refractive film the ten film layers in the film layer structure F are and which layer they are located in, Figure 1 In addition to indicating the film number (L1, L2, ..., L10), each of the ten film layers is also indicated as the first refractive film 11 or the second refractive film 12. For example, L4 (11) is the fourth film layer, which is also the first refractive film 11; L7 (12) is the seventh film layer, which is also the second refractive film 12.

[0053] The refractive index of the first refractive film 11 is less than that of the second refractive film 12. The first refractive film 11 is made of a material with a relatively low refractive index, such as silicon dioxide (SiO2, with a refractive index of 1.46 / 500nm), aluminum oxide (Al2O3, with a refractive index of 1.63 / 550nm), and zinc dioxide (ZnO, with a refractive index of 2.0 / 550nm). The second refractive film 12 is made of a material with a relatively high refractive index, such as niobium pentoxide (Nb2O5, with a refractive index of 2.3 / 550nm), titanium pentoxide (Ti3O5, with a refractive index of 2.35 / 550nm), and tantalum pentoxide (Ta2O5, with a refractive index of 2.1 / 550nm). In this embodiment, the material of the first refractive film 11 is SiO2, and the material of the second refractive film 12 is Ti3O5, for example.

[0054] The thickness of the first refractive film 11 may be between 10 nanometers (nm) and 110 nanometers, and the thickness of the second refractive film 12 may be between 4nm and 90nm. The "thickness" referred to in this embodiment refers to the thickness in the direction perpendicular to the first surface S1 or the second surface S2 of the light-transmitting substrate 10. In some embodiments, the thickness of the first film layer L1 may be between 3.92 and 7.28 nanometers, for example, 4.05, 5.59, 6.33, 7.18 nm; the thickness of the second film layer L2 may be between 57.81 and 107.37 nanometers, for example, 62.50, 77.36, 82.69, 103.58 nm; the thickness of the third film layer L3 may be between 9.59 and 17.81 nanometers. , for example, 10.25, 13.25, 15.84, 17.12 nm; the thickness of the fourth film layer L4 may be between 38.68 and 71.83 nm, for example, 39.69, 45.36, 55.95, 70.51 nm; the thickness of the fifth film layer L5 may be between 21.89 and 40.65 nm, for example, 23.52, 31.58, 36.51, 39.21 nm; The thickness of the sixth film layer L6 may be between 14.64 and 27.18 nm, such as 14.88, 16.57, 20.19, and 26.22 nm; the thickness of the seventh film layer L7 may be between 59.07 and 109.71 nm, such as 63.25, 84.54, 96.53, and 103.98 nm; the thickness of the eighth film layer L8 may be between 9.35 and 17.37 nm, such as The thickness of the ninth film layer L9 may be between 22.06 and 40.96 nanometers, such as 25.32, 31.15, 36.69, and 39.21 nanometers; the thickness of the tenth film layer L10 may be between 71.49 and 132.77 nanometers, such as 78.64, 95.21, 102.96, and 126.96 nanometers. The above thickness values ​​are only examples and cannot limit the present invention.

[0055] In some embodiments, a transparent coating layer can be oxidized by, for example, magnetron cathode sputtering supplemented by inductively coupled plasma, using a first refractive film 11 and a second refractive film 12 with different refractive indices, and performing different refractive index matching to obtain a wider optical thickness and physical thickness. Since light will produce different phenomena when passing through different media, when the reflected light of different refractive films interferes destructively with each other, the reflected light will be offset, so that the reflectivity of the light incident from the tenth film layer L10 (first refractive film 11) to the film structure F can be effectively reduced. Experiments have shown that the film structure F of this embodiment has a relatively low light reflectivity at different incident light wavelengths, and its color variation is not large at different light incident angles. It should be noted that the total number of film layers of the first refractive film 11 and the second refractive film 12 of the film structure of the present invention is at least ten layers. When the total number of film layers of the film structure is more, its light reflectivity will be lower. In addition, during the verification of the low reflectivity of the film structure, when the total number of film layers of the first refractive film 11 and the second refractive film 12 of the film structure is less than ten (for example, at least 9 layers, at least 7 layers), the light reflectivity performance is slightly worse than the effect when the total number of film layers is at least ten.

[0056] FIG. 2A to FIG. 2C They are schematic diagrams of light-transmitting substrates according to different embodiments of the present invention. Figure 2A As shown, the light-transmitting substrate 1a of the present embodiment is substantially the same as the light-transmitting substrate 1 of the aforementioned embodiment in terms of component composition and connection relationship of each component. The difference is that in the light-transmitting substrate 1a of the present embodiment, the film layer structure Fa may further include a zeroth film layer L0, and the zeroth film layer L0 is disposed between the first film layer L1 (12) and the light-transmitting substrate 10. The zeroth film layer L0 of the present embodiment is the first refractive film 11, that is, the zeroth film layer L0 is equivalent to the first refractive film 11 (L0 (11)), and its thickness may be between 27.45 and 50.99 nm, for example, 28.45, 32.14, 37.26, 39.75 or 46.35 nm. Therefore, in essence, in the film layer structure Fa of the present embodiment, the total number of the first refractive films 11 (6 layers) is greater than the total number of the second refractive films 12 (5 layers). In addition, the zeroth film layer L0 (11) contacts the light-transmitting substrate 10, and the tenth film layer L10 farthest from the light-transmitting substrate 10 is also the first refractive film 11. Therefore, the film layer structure Fa of this embodiment has eleven layers in total.

[0057] like Figure 2BAs shown, the light-transmitting substrate 1b of this embodiment is substantially the same as the light-transmitting substrate 1 of the aforementioned embodiment in terms of its component composition and connection relationship of each component. The difference is that in the light-transmitting substrate 1a of this embodiment, the film structure Fb may further include a protective film 13, and the protective film 13 is disposed on the side of the tenth film layer L10 (11) away from the light-transmitting substrate 10. Here, the protective film 13 is disposed on the tenth film layer L10 (11), for example but not limited to a light-transmitting anti-scratch film, an anti-fingerprint film, a waterproof and anti-fouling film, an explosion-proof film or other types of protective films, and is not limited thereto.

[0058] like Figure 2C As shown, the light-transmitting substrate 1c of this embodiment is substantially the same as the light-transmitting substrate 1b of the aforementioned embodiment in terms of component composition and connection relationship of each component. The difference is that in the light-transmitting substrate 1c of this embodiment, the film structure Fc may further include a protective film 13, and the protective film 13 is disposed on the side of the tenth film layer L10 (the first refractive film 11) away from the light-transmitting substrate 10. Here, the protective film 13 may be, but is not limited to, a light-transmitting anti-glare film, an anti-scratch film, an anti-fingerprint film, a waterproof and anti-fouling film, an anti-explosion film, or other types of protective films, without limitation.

[0059] When the wavelength of the incident light is between 400 and 900 nm, the reflectivity of the film structure of the present invention is less than 6%. When the wavelength of the incident light is between 450 and 900 nm, the reflectivity can be lower than 5.5%, or even lower than 5%. When the wavelength of the incident light is between 400 and 900 nm, the average reflectivity is less than 5.5%. When the wavelength of the incident light is greater than 700 nm, the light reflectivity of the film structure of the present invention remains below 5%. The present invention utilizes refractive films of different refractive indices to be staggered and stacked for refractive index matching, which can achieve a better low reflectivity purpose.

[0060] In addition, in the conventional 2.5D or 3D transparent glass, the curved side has a poor smooth touch and a color difference problem of a gold or red edge. Therefore, the present invention also discloses a transparent substrate with a curved side, which can achieve a smooth touch on the side edge and improve the color difference of the curved side.

[0061] Please refer to Figure 3 , which is a schematic diagram of a light-transmitting substrate according to another embodiment of the present invention. Figure 3The light-transmitting substrate 2 includes a light-transmitting substrate 21, which can be a 2D, 2.5D or 3D light-transmitting glass, and has a flat surface 211 and at least one curved side 212 connected to the flat surface 211. Taking the quadrilateral light-transmitting substrate 21 as an example, there can be up to four curved side edges 212. As the name implies, the curved side edge 212 is located on the side of the light-transmitting substrate 21, and it is not a 90-degree right-angle side edge, but a side edge including a curved surface. The curved side edge 212 of this embodiment includes a radius R, a side edge H, and a chamfer C in sequence. Among them, the flat surface 211 is connected to the radius R, the side edge H is an uncut edge, and the side edge H is respectively connected to the radius R and the chamfer C, and the chamfer C is connected to the bottom surface of the light-transmitting substrate 21.

[0062] In the present embodiment, the length d1 of the side H is equal to the thickness D of the light-transmitting substrate 21 minus the length d2 of the arc angle R in the thickness direction of the light-transmitting substrate 21, and then minus the length d3 of the chamfer C in the thickness direction of the light-transmitting substrate 21 (i.e., d1=D-d2-d3). Here, the thickness D or the lengths d1, d2, and d3 of the light-transmitting substrate 21 are the thickness in the direction perpendicular to the flat surface 211 of the light-transmitting substrate 21. In addition, the length W of the arc angle R in the direction parallel to the flat surface 211 of the present embodiment is 0.4467ln(R)+1.1603. In some embodiments, the radius of curvature of the arc angle R may be between 1 and 10 millimeters (mm), and the length of the chamfer C is 0.15 mm. In some embodiments, the radius of curvature of the arc angle R may be between 1 and 10 millimeters (mm). In some embodiments, the radius of the arc angle R may be, for example but not limited to, 1.15, 1.59, 3.5, 4.96, 6.75, 8.25, 9.56 mm. In some embodiments, the arc angle R may be manufactured by, for example, a CNC machine tool, a grinding wheel, laser cutting, and / or polishing so that the radius of the arc angle R is between 1 and 10 mm.

[0063] As mentioned above, in the light-transmitting substrate 2 of the present embodiment, the curved side 212 of the light-transmitting substrate 21 sequentially includes a rounded corner R, an uncut side H and a chamfered corner C, which can achieve a smooth touch to the side edge and improve the chromatic aberration of the curved side.

[0064] Figure 4 Schematic diagrams of light-transmitting substrates according to different embodiments of the present invention. Figure 4As shown, the light-transmitting substrate 2a of this embodiment is substantially the same as the light-transmitting substrate 2 of the aforementioned embodiment in terms of its component composition and connection relationship of each component. The difference is that the light-transmitting substrate 2a of this embodiment may further include a film structure 22. The film structure 22 is disposed on the flat surface 211 of the light-transmitting substrate 21, and extends and covers the arc angle R of the curved side 212. The film structure 22 includes a plurality of first refractive films and a plurality of second refractive films, the first refractive films and the second refractive films are alternately stacked, and the total number of film layers of the first refractive films and the second refractive films is at least ten. Here, the film structure 22 may be one of the film structures F, Fa, Fb, or Fc of the aforementioned embodiments, or a variation thereof. The specific technical content has been described in detail above and will not be further described here.

[0065] As mentioned above, in the light-transmitting substrate 2a of the present embodiment, in addition to achieving a smooth touch feel of the side edge through the structural design of the curved side 212, it also has the effect of improving the chromatic aberration phenomenon of the curved side. In addition, the light-transmitting substrate 2a of the present embodiment also utilizes the structural design of the film layer structure 22 to match the refractive index of the coating material to obtain a wider optical thickness and physical thickness. In this way, the flat surface 211 of the light-transmitting substrate 2a has a low light reflectivity, and the curved side 212 does not have the chromatic aberration problem of gold edges or red edges.

[0066] In summary, in the film layer structure and the transparent substrate of the present invention, the reflectivity of light can be effectively reduced by alternately stacking a plurality of second refractive films and a plurality of first refractive films, and the structural design and refractive index of the first refractive films and the second refractive films match.

[0067] In addition, in the transparent substrate of the present invention, the curved side of the transparent substrate includes arc angle R, side H and chamfer C in sequence, and the flat surface of the transparent substrate is connected to the arc angle R. The structural design can achieve a smooth touch of the side edge, and also has the effect of improving the chromatic aberration of the curved side. In addition, in one embodiment of the present invention, the transparent substrate also matches the refractive index through the structural design of the film structure to obtain a wider optical thickness and physical thickness. In this way, the flat surface of the transparent substrate can also achieve low light reflectivity, and avoid the chromatic aberration problem of the gold edge or red edge of the curved side.

[0068] The above is for illustrative purposes only and is not intended to be limiting. Any equivalent modifications or changes made thereto without departing from the spirit and scope of the present invention shall be included in the scope of the attached patent application.

Claims

1. A film structure comprising: a plurality of first refractive films; as well as A plurality of second refractive films are stacked alternately with the first refractive films. The total number of film layers of the first refractive films and the second refractive films is at least ten, which are sequentially stacked on a light-transmitting substrate. The second refractive films have a first film layer, a third film layer, a fifth film layer, a seventh film layer and a ninth film layer. The first refractive films have a second film layer, a fourth film layer, a sixth film layer, an eighth film layer and a tenth film layer. The first film layer is the film layer closest to the light-transmitting substrate. wherein the thickness of the first film layer is between 3.92 and 7.28 nanometers; the thickness of the second film layer is between 57.81 and 107.37 nanometers; the thickness of the third film layer is between 9.59 and 17.81 nanometers; the thickness of the fourth film layer is between 38.68 and 71.83 nanometers; the thickness of the fifth film layer is between 21.89 and 40.65 nanometers; the thickness of the sixth film layer is between 14.64 and 27.18 nanometers; the thickness of the seventh film layer is between 59.07 and 109.71 nanometers; the thickness of the eighth film layer is between 9.35 and 17.37 nanometers; the thickness of the ninth film layer is between 22.06 and 40.96 nanometers; the thickness of the tenth film layer is between 71.49 and 132.77 nanometers, The refractive index of the first refractive film is smaller than the refractive index of the second refractive film.

2. The film structure as claimed in claim 1, wherein a material of the first refractive film is silicon dioxide, aluminum oxide or zinc dioxide, and a material of the second refractive film is niobium pentoxide, titanium pentoxide or tantalum pentoxide. 3 . The film structure as claimed in claim 1 , wherein a thickness of each of the first refractive films is between 10 and 110 nanometers, and a thickness of each of the second refractive films is between 4 and 90 nanometers.

4. The film structure as claimed in claim 1, wherein the first refractive film further comprises: A zeroth film layer is disposed between the first film layer and the light-transmitting substrate, and has a thickness between 27.45 and 50.99 nanometers.

5. The film structure according to claim 1 or 4, further comprising: A protective film is disposed on a side of the tenth film layer away from the light-transmitting substrate.

6. The film structure according to claim 1, wherein: When the wavelength of the incident light is between 400 and 900 nanometers, the average reflectivity of the film structure is less than 5.5%.

7. A light-transmitting substrate, comprising: A light-transmitting substrate having a first surface and a second surface opposite to the first surface; as well as A film structure as claimed in any one of claims 1 to 6, wherein the film structure is disposed on the first surface and / or the second surface of the light-transmitting substrate. 8 . The light-transmitting substrate as claimed in claim 7 , which is a 2D, 2.5D or 3D rigid substrate or a flexible substrate.

9. A light-transmitting substrate, comprising: A light-transmitting substrate having a flat surface; At least one curved side edge connected to the flat surface, the curved side edge sequentially comprising a rounded corner, a side edge and a chamfer, wherein the flat surface is connected to the rounded corner; and A film structure as claimed in any one of claims 1 to 6, wherein the film structure is disposed on the flat surface of the light-transmissive substrate and extends to and covers the arc corner of the curved side. 10 . The light-transmitting substrate as claimed in claim 9 , wherein the light-transmitting base material is 2D, 2.5D or 3D light-transmitting glass. 11 . The light-transmitting substrate as claimed in claim 9 , wherein the length of the side edge is equal to the thickness of the light-transmitting substrate minus the length of the arc corner in the thickness direction of the light-transmitting substrate minus the length of the chamfer in the thickness direction of the light-transmitting substrate. 12 . The light-transmitting substrate as claimed in claim 9 , wherein a radius of curvature of the rounded corner is between 1 and 10 mm, and a length of the chamfer is 0.15 mm.

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