Mask drying apparatus

Abstract

Disclosed is a mask drying apparatus. The mask drying apparatus includes a chamber, a plasma generating part connected to a side wall of the chamber, a first drying part disposed at a lower wall of the chamber perpendicular to the side wall, a mask fixing part fixing a mask, and a rotating part connected to the mask fixing part, wherein the mask fixing part is rotatable between the plasma generating part and the first drying part by the rotating part.

Description

TECHNICAL FIELD

[0001] The present invention relates to a mask drying apparatus and a mask cleaning system, and more particularly, to a mask drying apparatus using plasma and a mask cleaning system. BACKGROUND

[0002] In a process of manufacturing a display device, a mask can be used. A deposition material can be deposited on a substrate or the like in a desired pattern through the mask. In a deposition process, in a case where the mask is contaminated with foreign matter, the deposition material can not be deposited on the substrate in a desired pattern due to the foreign matter. Therefore, it is necessary to clean the mask. After cleaning is performed, it is necessary to ensure that cleaning liquid, moisture, or the like remaining on the mask is completely dried to smoothly perform the deposition process using the mask.

[0003] A conventional drying process is performed using an air dryer after volatile chemicals are applied to the mask. In this case, there is a risk of explosion of the volatile chemicals, and there are disadvantages such as a cost of managing the volatile chemicals.

[0004] Therefore, research on performing the drying process in a new way is being actively conducted. SUMMARY

[0005] The technical problem of the present invention is conceived based on these problems, and an object of the present invention is to provide a mask drying apparatus including a plasma device.

[0006] An object of the present invention is to provide a mask cleaning system including a plasma device.

[0007] However, the technical problem to be solved by the present invention is not limited to the above-mentioned technical problem, and can be variously extended without departing from the scope of the idea and field of the present invention.

[0008] The mask drying apparatus according to an embodiment for achieving the object of the present invention can include a chamber, a plasma generating part connected to a side wall of the chamber, a first drying part disposed at a lower wall of the chamber perpendicular to the side wall, a mask fixing part fixing a mask, and a rotating part connected to the mask fixing part, wherein the mask fixing part is rotatable between the plasma generating part and the first drying part by the rotating part.

[0009] In an embodiment, the first drying part can include a halogen lamp.

[0010] In an embodiment, the first drying part can include a heater.

[0011] In an embodiment, the heater can include a heating coil.

[0012] In an embodiment, the first drying part can generate microwaves.

[0013] In an embodiment, when the plasma generating part and the mask fixing part are arranged in parallel, a distance between the plasma generating part and the mask can be 5 mm to 15 mm.

[0014] In an embodiment, when the first drying part and the mask fixing part are arranged in parallel, a distance between the first drying part and the mask can be 5 mm to 15 mm.

[0015] In an embodiment, the plasma generating part can include an ultraviolet lamp.

[0016] In an embodiment, the plasma generating part can include a plurality of plasma heads.

[0017] In an embodiment, the chamber can include an inert gas.

[0018] In an embodiment, the plasma generating part can generate at least one of an oxygen radical and a nitrogen radical.

[0019] In an embodiment, a reaction of the at least one of the oxygen radical and the nitrogen radical with the inert gas can be performed at normal temperature and normal pressure.

[0020] In an embodiment, the plasma generating part and the first drying part can be arranged perpendicular to each other.

[0021] In an embodiment, when the first drying part and the mask fixing part are arranged in parallel, the mask and the first drying part can overlap.

[0022] In an embodiment, a second drying part of an upper wall of the chamber, which is arranged opposite to the lower wall, can be further included.

[0023] In an embodiment, the second drying part can be arranged in parallel with the first drying part.

[0024] In an embodiment, when the second drying part and the mask fixing part are arranged in parallel, the mask and the second drying part can overlap.

[0025] The mask cleaning system according to an embodiment for achieving the object of the present application can include a mask transfer part transferring a mask, a mask cleaning device connected to the mask transfer part, and a mask drying device connected to the mask transfer part. The mask drying device can include a chamber, a plasma generating part connected to a side wall of the chamber, a drying part disposed at a lower wall of the chamber perpendicular to the side wall, a mask fixing part fixing the mask, and a rotating part connected to the mask fixing part, wherein the mask fixing part can be rotated between the plasma generating part and the drying part by the rotating part.

[0026] In an embodiment, the plasma generating part and the drying part can be disposed perpendicular to each other.

[0027] In an embodiment, the drying part can be one selected from a halogen lamp, a heater, and a microwave generating device.

[0028] The mask drying device according to an embodiment of the present application can include a chamber, a plasma generating part connected to a side wall of the chamber, a first drying part disposed at a lower wall of the chamber perpendicular to the side wall, a mask fixing part fixing a mask, and a rotating part connected to the mask fixing part, wherein the mask fixing part can be rotated between the plasma generating part and the first drying part by the rotating part.

[0029] Accordingly, plasma treatment and drying treatment can be simultaneously performed in the same chamber. Also, by using the plasma treatment and the drying treatment, drying using a chemical substance can not be performed, and thus the cost of drying the mask can be reduced. Also, since the chemical substance is not used, safety in drying the mask can be improved.

[0030] However, the effects of the present application are not limited to the above-mentioned effects, and can be expanded in various ways without departing from the scope of the idea and the field of the present application. BRIEF DESCRIPTION OF DRAWINGS

[0031] Figure 1 is a block diagram illustrating a mask cleaning system according to an embodiment of the present application.

[0032] Figure 2 is a block diagram illustrating a mask cleaning system according to an embodiment of the present application. Figure 1 is a diagram illustrating an embodiment of a second mask drying device included in the mask cleaning system of

[0033] Figure 3 is a diagram illustrating an embodiment of a rotating part rotation included in the second mask drying device of Figure 2

[0034] ​Figure 4 is a view showing an embodiment of the plasma generating part of the second mask drying device arranged in Figure 1

[0035] Figure 5a and Figure 5b is a view showing an embodiment of the plasma generating part movement of Figure 4

[0036] Figure 6 is a view showing another embodiment of the plasma generating part of the second mask drying device arranged in Figure 1

[0037] Figure 7a and Figure 7b is a view showing an embodiment of the plasma generating part movement of Figure 6

[0038] Figure 8 is a view showing another embodiment of the second mask drying device included in the mask cleaning system of Figure 1

[0039] Figure 9 is a view showing an embodiment of the rotation of the rotating part included in the second mask drying device of Figure 8

[0040] Figure 10 is a view showing an embodiment of the plasma generating part of the second mask drying device arranged in Figure 1

[0041] Figure 11 is a view showing another embodiment of the plasma generating part of the second mask drying device arranged in Figure 1

[0042] Figure 12a and Figure 12b is a view showing an embodiment of the second mask drying device included in the mask cleaning system of Figure 1

[0043] Figure 13a and Figure 13b is a view showing an embodiment of the second mask drying device included in the mask cleaning system of Figure 1

[0044] BRIEF DESCRIPTION OF DRAWINGS

[0045] 100a: mask loading part 100b: mask transfer part

[0046] 100c: mask unloading part 200: first mask cleaning device

[0047] ​​​​​​​​​​300: second mask cleaning device 400: first mask drying device

[0048] 500: second mask drying device 505: chamber

[0049] 510, 515: plasma generating part

[0050] 520: first drying part 530: rotating part

[0051] 540: mask fixing part 550: mask

[0052] 560: second drying part DETAILED DESCRIPTION

[0053] Hereinafter, embodiments of the present application will be described in greater detail with reference to the accompanying drawings. Like reference numerals refer to like elements throughout the drawings and repeated description on the same elements will be omitted.

[0054] Figure 1 is a block diagram illustrating a mask cleaning system according to an embodiment of the present application.

[0055] Referring to Figure 1 , the mask cleaning system can include a mask loading part 100a, a mask transfer part 100b, a mask unloading part 100c, a first mask cleaning device 200, a second mask cleaning device 300, a first mask drying device 400, and a second mask drying device 500.

[0056] The mask loading part 100a can load a mask. The mask loading part 100a can transfer the mask to the mask transfer part 100b. The mask can be transferred along the mask transfer part 100b. The mask transfer part 100b can be connected to the first mask cleaning device 200, the second mask cleaning device 300, the first mask drying device 400, and the second mask drying device 500. The mask transferred through the mask transfer part 100b can be transferred to the mask unloading part 100c.

[0057] In an embodiment, the mask transferred from the mask transfer part 100b can be transferred to the first mask cleaning device 200. In the first mask cleaning device 200, the mask can be cleaned by a dip method or a spray method. The first mask cleaning device 200 can include a cleaning liquid. In an embodiment, the mask can be repeatedly cleaned in the first mask cleaning device 200.

[0058] In an embodiment, the first mask cleaning apparatus 200 can be configured in plural. The first mask cleaning apparatus 200 can mix use of an immersion method and a spraying method. That is, a part of the first mask cleaning apparatus 200 can use the immersion method, and the remaining first mask cleaning apparatus 200 other than the part can use the spraying method. In this case, each of the first mask cleaning apparatuses 200 can include a cleaning liquid different from each other, or can include a cleaning liquid identical to each other. Accordingly, cleaning of the mask by the cleaning liquid can be effectively performed.

[0059] In an embodiment, the cleaning liquid can use an organic solvent having solubility or peeling property with respect to an organic substance, such as acetone, cyclohexanone, or the like.

[0060] Also, in an embodiment, the cleaning liquid can include an alcohol, such as ethanol, propanol, butanol, isopropanol, pentanol, or the like, or a combination thereof. In a case where the mask is cleaned using the alcohol, the cleaning liquid can spontaneously evaporate from the mask due to volatility of the alcohol itself.

[0061] Also, the cleaning liquid can further include a substance having an acidic property and assisting a cleaning action. For example, the cleaning liquid can further include an auxiliary agent, such as a reducing agent, a buffer, a surfactant, or the like. After the cleaning is completed, the mask can be again transferred to the mask transfer portion 100b.

[0062] Thereafter, the mask can be transferred to the second mask cleaning apparatus 300. In the second mask cleaning apparatus 300, the mask can be cleaned by an immersion method or a spraying method. In an embodiment, the second mask cleaning apparatus 300 can include distilled water.

[0063] In an embodiment, the mask can be repeatedly cleaned in the second mask cleaning apparatus 300. In an embodiment, the second mask cleaning apparatus 300 including distilled water can be configured in plural. In this case, a part of the second mask cleaning apparatus 300 can use the immersion method, and the remaining second mask cleaning apparatus 300 other than the part can be used by mixing the spraying method.

[0064] Although the first mask cleaning apparatus 200 and the second mask cleaning apparatus 300 are described as being configured in plural, the present application is not limited thereto. That is, the first mask cleaning apparatus 200 and the second mask cleaning apparatus 300 can be configured in one. Figure 1It is shown that the second mask cleaning device 300 including distilled water is arranged behind the first mask cleaning device 200 including the cleaning liquid, but it is only exemplary and is not limited thereto. For example, the second mask cleaning device 300 including distilled water can also be located in front of the first mask cleaning device 200 including the cleaning liquid. Alternatively, the first mask cleaning device 200 including the cleaning liquid and the second mask cleaning device 300 including distilled water can also be repeatedly and alternately arranged.

[0065] The substance (e.g., organic deposition substance, dust, etc.) adhered to the mask can be cleaned by the first mask cleaning device 200 and the second mask cleaning device 300. The mask on which the cleaning is completed can be transferred to the first mask drying device 400 by the mask transfer part 100b.

[0066] In an embodiment, the first mask drying device 400 can include an air dryer. The air dryer can dry the distilled water and the cleaning liquid remaining on the mask using air. In an embodiment, the first mask drying device 400 can be plural. Thereafter, the mask can be transferred to the second mask drying device 500 by the mask transfer part 100b. Details of the second mask drying device 500 will be described later. Figures 2 to 11 with reference to

[0067] In an embodiment, the mask on which the second mask drying device 500 is dried can be transferred to the mask unloading part 100c by the mask transfer part 100b. The mask unloading part 100c can transfer the mask to a position where a deposition process is performed by unloading the mask.

[0068] As described above, the mask cleaning system can include a plurality of mask cleaning devices 200, 300 and a plurality of drying devices 400, 500.

[0069] Figure 2 is a view illustrating an embodiment of a second mask drying device included in the mask cleaning system of Figure 1 Figure 3 is a view illustrating an embodiment of a rotation of a rotating part included in the second mask drying device of Figure 2

[0070] with reference to Figure 2 and Figure 3 ​​The second mask drying apparatus 500 can include a chamber 505. In an embodiment, the chamber 505 can include an inert gas. For example, the inert gas can include argon (Ar). The chamber 505 can maintain a normal temperature and a normal pressure. In an embodiment, the second mask drying apparatus 500 can further include a plasma generating part 510, a first drying part 520, a rotating part 530, and a mask fixing part 540.

[0071] The plasma generating part 510 can be connected to a side wall of the chamber 505. A mask 550 can be plasma treated by the plasma generating part 510. The plasma generating part 510 can generate radicals. In an embodiment, the radicals can include at least one of oxygen radicals and nitrogen radicals. The radicals can react with the inert gas to dry the mask 550. Also, the radicals can react with the inert gas to clean the mask 550. In an embodiment, the radicals can react with the inert gas at a normal temperature and a normal pressure.

[0072] To dry the mask 550 by the plasma generating part 510, the plasma generating part 510 and the mask fixing part 540 can be arranged in parallel. Accordingly, the mask 550 fixed by the mask fixing part 540 can also be arranged in parallel with the plasma generating part 510. In this case, a distance between the plasma generating part 510 and the mask fixing part 540 can be about 5 mm to about 15 mm. Accordingly, a distance D1 between the mask 550 and the plasma generating part 510 can also be about 5 mm to about 15 mm. In this embodiment, since the mask 550 is very thin, the distance between the plasma generating part 510 and the mask fixing part 540 can be considered to correspond to the distance D1 between the mask 550 and the plasma generating part 510.

[0073] In an embodiment, the plasma generating part 510 can move in a first direction DR1, a second direction DR2 perpendicular to the first direction DR1, a third direction DR3 opposite to the first direction DR1, a direction opposite to the second direction DR2, a fourth direction DR4 perpendicular to the first direction DR1 and the second direction DR2, and a direction opposite to the fourth direction DR4, etc. Accordingly, the mask 550 can be completely plasma treated.

[0074] In an embodiment, the plasma generating part 510 can further include an ultraviolet lamp. The plasma generating part 510 can dry the mask 550 using the ultraviolet lamp. Ultraviolet generated by the ultraviolet lamp can facilitate the plasma processing. Also, the ultraviolet lamp can dry distilled water and the cleaning solution, etc. remaining on the mask 550.

[0075] The first drying part 520 can be disposed at a lower wall of the chamber 505 perpendicular to the one side wall. The first drying part 520 can be disposed perpendicular to the plasma generating part 510. As such, by disposing the plasma generating part 510 perpendicular to the first drying part 520, the plasma processing using the plasma generating part 510 and the drying using the first drying part 520 can be performed independently of each other. However, unlike this, the plasma processing and the drying can also be performed simultaneously.

[0076] In an embodiment, the first drying part 520 can dry distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550. For example, the first drying part 520 can include a halogen lamp. The first drying part 520 can dry distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550 using the halogen lamp.

[0077] In an embodiment, the first drying part 520 can include a heater. The heater can include a metal heater, a heating coil, etc. In an embodiment, the heater can be defined as a device capable of generating heat to dry the distilled water and the cleaning solution. For example, the heater can generate heat by converting electric energy into heat energy using a resistor (e.g., a heating coil, etc.) included inside the heater. The first drying part 520 can dry distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550 using the heater.

[0078] In an embodiment, the first drying part 520 can include a microwave generating device generating microwaves. The first drying part 520 can dry the mask 550 by generating the microwaves.

[0079] To dry the mask 550 by the first drying part 520, the mask fixing part 540 can be arranged in parallel with the first drying part 520. Accordingly, the mask 550 can also be arranged in parallel with the first drying part 520. In this case, the distance between the mask fixing part 540 and the first drying part 520 can be about 5 mm to about 15 mm. Accordingly, the distance D2 between the mask 550 and the first drying part 520 can also be about 5 mm to about 15 mm. In the present embodiment, since the thickness of the mask 550 is very thin, the distance between the mask fixing part 540 and the first drying part 520 can be considered to correspond to the distance D2 between the mask 550 and the first drying part 520.

[0080] In an embodiment, when the mask 550 is arranged in parallel with the first drying part 520, the mask 550 can overlap the first drying part 520. Although the shape of the mask 550 is illustrated as a hollow rectangular frame, it is not limited thereto. To coat a deposition material in a desired form, the mask 550 can have various shapes.

[0081] In an embodiment, the shape of the mask 550 can be substantially the same as the shape of the first drying part 520.

[0082] As described above, in the case of using the plasma generating part 510 and the first drying part 520, since a drying chemical is not used, the cost of using the mask cleaning system can be reduced. Also, drying can be performed in a shorter time compared to when the drying chemical is used, and the drying effect can be further improved compared to when the drying chemical is used.

[0083] The rotating part 530 can be disposed in the chamber 505. In an embodiment, the rotating part 530 can be disposed on the first drying part 520. One side of the rotating part 530 can be connected to the first drying part 520. The other side opposite to the one side of the rotating part 530 can be connected to the mask fixing part 540. The rotating part 530 can rotate the mask fixing part 540. The mask fixing part 540 can be rotated between the first drying part 520 and the plasma generating part 510 by the rotating part 530.

[0084] Figure 4 FIG. 1 is a view illustrating a first mask drying apparatus according to an embodiment of the disclosure, Figure 1 FIG. 2 is a view illustrating an embodiment of a plasma generating part of a second mask drying apparatus, Figure 5a and Figure 5b FIG. 3 is a view illustrating Figure 4FIG. 1 is a diagram illustrating an embodiment of a second mask drying apparatus of the present application.

[0085] Referring to Figure 2 , Figure 4 , Figure 5a and Figure 5b , the second mask drying apparatus 500 can include the chamber 505, the plasma generating part 510, the first drying part 520, the rotating part 530, and the mask fixing part 540. The mask 550 can be fixed to the mask fixing part 540.

[0086] In an embodiment, the plasma generating part 510 can be formed in one body. For example, the plasma generating part 510 can be a quadrangular shape. However, this is merely exemplary, and the shape of the plasma generating part 510 is not limited thereto, and can be various. The plasma generating part 510 formed in one body can generate radicals. For example, the radicals can include at least one of oxygen radicals and nitrogen radicals.

[0087] The plasma generating part 510 can dry the mask 550 while moving. For example, the plasma generating part 510 can move in the first direction DR1 and a direction opposite to the first direction DR1 and dry the mask 550. Also, the plasma generating part 510 can dry the mask 550 while moving in the second direction DR2, the fourth direction DR4, and the like. However, this is merely exemplary, and the present application is not limited thereto. That is, the plasma generating part 510 can move in various directions within a range capable of drying the mask 550.

[0088] Figure 6 is a diagram illustrating another embodiment of a plasma generating part of a second mask drying apparatus of the present application, Figure 1 Figure 7a and Figure 7b is a diagram illustrating an embodiment of a plasma generating part moving, Figure 6

[0089] Referring to Figure 2 , Figure 6 , Figure 7a and Figure 7b , Figure 6 The second mask drying apparatus 500 of the present application can include the chamber 505, a plasma generating part 515, the first drying part 520, the rotating part 530, and the mask fixing part 540. The mask 550 can be fixed to the mask fixing part 540.

[0090] ​​In an embodiment, the plasma generating part 515 can include a plurality of plasma heads. The plurality of plasma heads can generate the radicals. The radicals can include at least one of oxygen radicals and nitrogen radicals. The radicals can react with the inert gas to dry the mask 550. The reaction of the radicals with the inert gas can be performed at normal temperature and normal pressure. The inert gas can include argon (Ar).

[0091] In an embodiment, the plurality of plasma heads can generate the radicals while moving. For example, the plurality of plasma heads can move in the first direction DR1. The plurality of plasma heads can also move in a direction opposite to the fourth direction DR4. However, it is merely exemplary and is not limited thereto. That is, the plasma generating part 515 can move in various directions within a range capable of drying the mask 550. Thereby, the plurality of plasma heads can dry the entire mask 550.

[0092] Figure 8 is a view illustrating another embodiment of a second mask drying apparatus included in a mask cleaning system of Figure 1 , Figure 9 is a view illustrating an embodiment of rotation of a rotating part included in the second mask drying apparatus of Figure 8 . Except for the addition of a second drying part 560, Figure 8 and Figure 9 the second mask drying apparatus 500 of Figure 2 and Figure 3 may be substantially the same as the second mask drying apparatus 500 of

[0093] Referring to Figure 2 , Figure 3 , Figure 8 and Figure 9 , the second mask drying apparatus 500 can include the chamber 505, the plasma generating part 510, the first drying part 520, the rotating part 530, the mask fixing part 540, and the second drying part 560. The mask 550 can be fixed to the mask fixing part 540.

[0094] The second drying part 560 can be disposed at an upper wall of the chamber 505 opposite to the lower wall. The second drying part 560 can be disposed in parallel with the first drying part 520.

[0095] In an embodiment, the second drying unit 560 can dry the distilled water and the cleaning liquid remaining on the mask 550 by performing a heat treatment on the mask 550. For example, the second drying unit 560 can include the halogen lamp. The second drying unit 560 can dry the distilled water and the cleaning liquid remaining on the mask 550 by performing a heat treatment on the mask 550 using the halogen lamp.

[0096] In an embodiment, the second drying unit 560 may include the heater. The heater may include the metal heater, the heating coil, etc. The second drying unit 560 may dry the distilled water and the cleaning liquid remaining on the mask 550 by performing a heat treatment on the mask 550 using the heater.

[0097] In an embodiment, the second drying unit 560 may include a microwave generating device for generating the microwaves. The second drying unit 560 may dry the mask 550 by generating the microwaves.

[0098] In an embodiment, the second drying unit 560 can move toward the mask fixing unit 540 when the mask fixing unit 540 and the first drying unit 520 are arranged in parallel. When the mask fixing unit 540 and the first drying unit 520 are arranged in parallel, the mask 550 and the second drying unit 560 can overlap. Thus, the distilled water and the cleaning liquid remaining on the mask 550 can be effectively dried.

[0099] Figure 10 It is shown that the arrangement Figure 1 FIG. 1 shows an embodiment of a plasma generating component of a second mask drying device. In addition to adding a second drying component 560, Figure 10 The second mask drying device 500 can be used with Figure 4 The second mask drying device 500 is substantially the same as that of FIG. 1 . Therefore, description of the overlapping configuration will be omitted.

[0100] Reference Figure 4 and Figure 10 The second mask drying device 500 may include the chamber 505 , the plasma generating part 510 , the first drying part 520 , the rotating part 530 , the mask fixing part 540 , and the second drying part 560 . The mask 550 may be fixed to the mask fixing part 540 .

[0101] The second drying unit 560 may be disposed on an upper wall of the chamber 505 opposite to the lower wall. The second drying unit 560 may be disposed in parallel with the first drying unit 520 .

[0102] In an embodiment, the second drying part 560 can dry the distilled water and the cleaning liquid remaining in the mask 550 by performing a heat treatment on the mask 550. For example, the second drying part 560 can include the halogen lamp. The second drying part 560 can dry the distilled water and the cleaning liquid remaining in the mask 550 by performing a heat treatment on the mask 550 using the halogen lamp.

[0103] In an embodiment, the second drying part 560 can include the heater. The heater can include the metal heater, the heating coil, etc. The second drying part 560 can dry the distilled water and the cleaning liquid remaining in the mask 550 by performing a heat treatment on the mask 550 using the heater.

[0104] In an embodiment, the second drying part 560 can include a microwave generating device that generates microwaves. The second drying part 560 can dry the mask 550 using the microwaves.

[0105] In an embodiment, the second drying part 560 can move in a direction toward the mask fixing part 540 while the mask fixing part 540 and the first drying part 520 are arranged in parallel. The mask 550 and the second drying part 560 can overlap while the mask fixing part 540 and the first drying part 520 are arranged in parallel. Accordingly, the distilled water and the cleaning liquid remaining in the mask 550 can be effectively dried.

[0106] Figure 11 is a view illustrating another embodiment of a plasma generating part of a second mask drying device arranged in Figure 1 of FIG. 4, a second drying part 560 is further included. Figure 11 The second mask drying device 500 of FIG. 4 can be substantially the same as the second mask drying device 500 of Figure 6 FIG. 4. Accordingly, a description of the repeated configuration will be omitted.

[0107] Referring to Figure 6 and Figure 11 , the second mask drying device 500 can include the chamber 505, the plasma generating part 515, the first drying part 520, the rotating part 530, the mask fixing part 540, and the second drying part 560. The mask 550 can be fixed to the mask fixing part 540.

[0108] The second drying part 560 can be arranged in an upper wall of the chamber 505 facing the lower wall. The second drying part 560 can be arranged in parallel with the first drying part 520.

[0109] In an embodiment, the second drying part 560 can dry the distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550. For example, the second drying part 560 can include the halogen lamp. The second drying part 560 can dry the distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550 using the halogen lamp.

[0110] In an embodiment, the second drying part 560 can include the heater. The heater can include the metal heater, the heating coil, etc. The second drying part 560 can dry the distilled water and the cleaning solution remaining on the mask 550 by performing a heat treatment on the mask 550 using the heater.

[0111] In an embodiment, the second drying part 560 can include a microwave generating device generating the microwaves. The second drying part 560 can dry the mask 550 using the microwaves.

[0112] In an embodiment, the second drying part 560 can move in a direction toward the mask fixing part 540 while the mask fixing part 540 and the first drying part 520 are arranged in parallel. The mask 550 and the second drying part 560 can overlap while the mask fixing part 540 and the first drying part 520 are arranged in parallel. Accordingly, the distilled water and the cleaning solution remaining on the mask 550 can be effectively dried.

[0113] In the mask cleaning system according to the embodiment of the present application, since the plasma generating parts 510, 515 and the first drying part 520 are vertically arranged in the same chamber 505, plasma processing and drying can be performed in one chamber 505. Accordingly, the area of the apparatus for performing cleaning can be reduced. Also, the distilled water and the cleaning solution remaining on the mask 550 can be dried using plasma processing and drying without using a drying chemical substance. Accordingly, the process cost of the mask cleaning system can be reduced, and safety can be ensured.

[0114] Figure 12a and Figure 12b is a view illustrating an embodiment of a second mask drying device included in the mask cleaning system of Figure 1 will be substantially the same as Figure 12a and Figure 12b may be substantially the same as Figure 8 Therefore, a description of the repeated configuration will be omitted.

[0115] Referring toFigure 12a and Figure 12b The extension member 562 can support the second drying member 560. In an embodiment, the extension member 562 can extend in a direction opposite to the second direction DR2. Accordingly, the second drying member 560 can be located adjacent to the mask 550. For example, when the first drying member 520 and the mask 550 are arranged in parallel, the extension member 562 can extend. Accordingly, the distance D2 between the second drying member 560 and the mask 550 can be approximately 5 mm to approximately 15 mm.

[0116] Figure 13a and Figure 13b It shows Figure 1 FIG. 1 is a diagram of an embodiment of a second mask drying device included in a mask cleaning system. In addition to arranging the position of the second drying component 564, Figure 13a and Figure 13b Can be used with Figure 2 Therefore, the description of the repeated configuration will be omitted.

[0117] Reference Figure 13a and Figure 13b The second drying component 564 can be connected to the first drying component 520 via a rotating component 532. Alternatively, in an embodiment, the second drying component 564 can be connected to the sidewall of the chamber 505 in the third direction DR3 via the rotating component 532. The rotating component 532 can rotate the second drying component 564. Accordingly, the second drying component 564 can be located adjacent to the mask 550. For example, when the first drying component 520 and the mask 550 are arranged in parallel, the rotating component 532 can rotate. Accordingly, the distance D2 between the second drying component 564 and the mask 550 can be approximately 5 mm to approximately 15 mm. The second drying component 564 can be substantially the same as the drying components 520 and 560 described above.

[0118] Although the above content describes the present invention with reference to exemplary embodiments, anyone with ordinary knowledge in the art will understand that various modifications and changes can be made to the present invention without departing from the scope of the concept and technical field of the present invention described in the claims.

[0119] Industrial applicability

[0120] The present invention can be applied to a mask cleaning system, a mask drying device, and the like.

[0121] While the above description has been made with reference to the exemplary embodiments of the present application, it will be understood by those having ordinary knowledge in the art that various modifications and changes can be made to the present application without departing from the spirit and technical scope of the present application recited in the claims.

Claims

1. A mask drying device, characterized in that: include: chamber; a plasma generating component connected to a side wall of the chamber and used for drying and / or cleaning the mask; a first drying component arranged on a lower wall of the chamber perpendicular to the one side wall; A mask fixing component for fixing the mask; as well as a rotating component arranged in the chamber and connected to the mask fixing component, The mask fixing member can be reciprocated and rotated between the plasma generating member and the first drying member by the rotating member, so that plasma treatment by the plasma generating member and heat treatment by the first drying member can be performed in the chamber.

2. The mask drying device according to claim 1, wherein The first drying component includes a halogen lamp.

3. The mask drying device according to claim 1, wherein: The first drying part includes a heater.

4. The mask drying device according to claim 3, wherein: The heater includes a heating coil.

5. The mask drying device according to claim 1, wherein: The first drying part generates microwaves.

6. The mask drying device according to claim 1, wherein: When the plasma generating part and the mask fixing part are arranged in parallel, a distance between the plasma generating part and the mask is 5 mm to 15 mm.

7. The mask drying device according to claim 1, wherein: When the first drying member and the mask fixing member are arranged in parallel, a distance between the first drying member and the mask is 5 mm to 15 mm.

8. The mask drying device according to claim 1, wherein: The plasma generating part includes an ultraviolet lamp for drying the mask.

9. The mask drying device according to claim 1, wherein: The chamber includes an inert gas.

10. The mask drying device according to claim 9, wherein: The plasma generating part generates at least one of oxygen radicals and nitrogen radicals for drying and / or cleaning the mask.

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