A reflective display panel, manufacturing method and display device

Abstract

The application discloses a reflective display panel, a manufacturing method and a display device. The reflective display panel of one embodiment comprises a first substrate, a second substrate, a barrier structure between the first substrate and the second substrate, and a sub-pixel arranged in an opening region formed by the barrier structure. The barrier structure comprises a first blocking part intermittently arranged on a side surface of the first substrate close to the second substrate, the first blocking part forming a first projection on the first substrate; a second blocking part intermittently arranged on a side surface of the second substrate close to the second substrate, the second blocking part forming a second projection on the second substrate; and the first projection and the second projection do not overlap and jointly form a continuous annular projection surrounding a third projection of the sub-pixel on the first substrate. The reflective display panel of the embodiment can effectively reduce the risk of ink material overflow.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display. More particularly, it relates to a reflective display panel, a manufacturing method and a display device. BACKGROUND

[0002] At present, according to the type of light source (including: backlight or ambient light) used by the display device, the display device can be divided into three types: transmissive, reflective and semi-transmissive. Among them, the reflective display panel realizes display by reflecting the ambient light incident into the reflective display panel. Since the reflective display panel does not need to additionally set up a backlight module to provide backlight for its display, the reflective display panel has been widely concerned and applied. However, the reflective display panel in the prior art has the problems of difficulty in manufacturing sub-pixels, poor display uniformity in bright state display, and poor display effect. SUMMARY

[0003] The present application aims to provide a display panel, a manufacturing method thereof and a display device, so as to solve at least one of the problems in the prior art.

[0004] To achieve the above-mentioned purpose, the present application adopts the following technical solutions:

[0005] The first aspect of the present application provides a reflective display panel, comprising:

[0006] a first substrate, a second substrate, a barrier structure located between the first substrate and the second substrate, and a sub-pixel arranged in an opening region formed by the barrier structure;

[0007] The barrier structure comprises:

[0008] a first blocking part intermittently arranged on a surface of the first substrate close to the second substrate, the first blocking part forming a first projection on the first substrate;

[0009] a second blocking part intermittently arranged on a surface of the second substrate close to the second substrate, the second blocking part forming a second projection on the second substrate;

[0010] The first projection and the second projection do not overlap, and together form a continuous annular projection around the third projection of the sub-pixel on the first substrate.

[0011] Further, the barrier structure further comprises a first material layer and a second material layer arranged in layers, and the deformation rate of the second material layer is higher than that of the first material layer.

[0012] Further, the first substrate is a color filter substrate, and the second substrate is a driving circuit substrate.

[0013] The first material layer of the first barrier portion is arranged on the surface of the first substrate close to the second substrate, and the second material layer of the first barrier portion is arranged on the surface of the first material layer of the first barrier portion away from the first substrate;

[0014] The first material layer of the second barrier portion is arranged on the surface of the second substrate close to the first substrate, and the second material layer of the second barrier portion is arranged on the surface of the first material layer of the second barrier portion away from the second substrate.

[0015] Further, the first material of the first material layer is a support material, and the second material of the second material layer is a deformation material.

[0016] Further, the display panel further comprises a lens layer arranged on the surface of the first substrate close to the second substrate, and the lens layer comprises a plurality of lenses.

[0017] The thickness of the first barrier portion and the thickness of the second barrier portion are both greater than the arch height of the lens.

[0018] Further, the display panel further comprises a light shielding layer between the lens array and the first substrate, and the light shielding layer comprises: color filters arranged corresponding to the sub-pixels; and a light shielding layer between adjacent color filters, and the projection of the light shielding layer on the first substrate covers the first projection and covers the second projection.

[0019] Further, the lens layer comprises lens units arranged in an array in each of the opening regions, and the projection of the color filter on the first substrate covers the projection of each lens unit on the first substrate.

[0020] Further, the barrier wall structure further comprises a third material layer between the first material layer and the second material layer, the adhesion between the third material of the third material layer and the first material of the first material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer, and the adhesion between the third material of the third material layer and the second material of the second material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer.

[0021] Or

[0022] The surface of the first material layer and the second material layer is a hole structure;

[0023] Or

[0024] The first material layer and the second material layer are interlocking tooth-shaped structures.

[0025] The second aspect of the present application provides a method for manufacturing the reflective display panel of the first aspect of the present application, the method comprising:

[0026] forming the first blocking part intermittently disposed on the first substrate, the first blocking part forming a first projection on the first substrate;

[0027] forming the second blocking part intermittently disposed on the second substrate, the second blocking part forming a second projection on the second substrate;

[0028] forming the ink material layer of the sub-pixel on the first substrate or the second substrate;

[0029] aligning the first substrate and the second substrate to form the barrier structure and the sub-pixel located in the opening area of the barrier structure, the first projection and the second projection not overlapping and jointly forming a continuous annular projection surrounding the third projection of the sub-pixel on the first substrate.

[0030] Further, the first blocking part intermittently disposed on the first substrate comprises:

[0031] forming the first material layer of the first blocking part on the first substrate;

[0032] forming the second material layer of the first blocking part on the surface of the first material layer of the first blocking part away from the first substrate; wherein the deformation rate of the second material layer of the first blocking part is higher than the deformation rate of the first material layer of the first blocking part.

[0033] Further, the second blocking part intermittently disposed on the second substrate comprises:

[0034] forming the first material layer of the second blocking part on the second substrate;

[0035] forming the second material layer of the second blocking part on the surface of the first material layer of the second blocking part away from the second substrate; wherein the deformation rate of the second material layer of the second blocking part is higher than the deformation rate of the first material layer of the second blocking part.

[0036] Further, before the first blocking part intermittently disposed on the first substrate, the method further comprises:

[0037] forming a light filtering layer on the substrate of the first substrate, the light filtering layer comprising: color filters corresponding to the sub-pixels and light shielding layers between adjacent color filters;

[0038] or

[0039] The method further comprises, before forming the first blocking portion with the discontinuous arrangement on the first substrate:

[0040] forming a lens layer on the first substrate, the lens layer comprising a plurality of lenses.

[0041] Further, the method further comprises, before forming the second material layer of the first blocking portion on the surface of the first material layer of the first blocking portion away from the first substrate:

[0042] forming a third material layer of the first blocking portion on the surface of the first material layer of the first blocking portion away from the first substrate, the third material of the third material layer of the first blocking portion having a greater adhesion with the first material of the first material layer of the first blocking portion than the second material of the second material layer of the first blocking portion, and the third material of the third material layer of the first blocking portion having a greater adhesion with the second material of the second material layer of the first blocking portion than the first material of the first material layer of the first blocking portion.

[0043] or

[0044] The method further comprises, before forming the second material layer of the first blocking portion on the surface of the first material layer of the first blocking portion away from the first substrate:

[0045] bombarding the surface of the first material of the first blocking portion away from the first substrate to form the hole structure.

[0046] or

[0047] The method further comprises, before forming the second material layer of the first blocking portion on the surface of the first material layer of the first blocking portion away from the first substrate:

[0048] forming the first material layer of the first blocking portion and the second material layer of the first blocking portion into a mutually cooperating tooth-shaped structure.

[0049] Further, the method further comprises, before forming the second material layer of the second blocking portion on the surface of the first material layer of the second blocking portion away from the second substrate:

[0050] forming a third material layer of the second barrier portion on a surface of the first material layer of the second barrier portion away from the first substrate side, a third material of the third material layer of the second barrier portion having a greater adhesion with the first material of the first material layer of the second barrier portion than the first material of the first material layer of the second barrier portion has with the second material of the second material layer of the second barrier portion, and the third material of the third material layer of the second barrier portion having a greater adhesion with the second material of the second material layer of the second barrier portion than the first material of the first material layer of the second barrier portion has with the second material of the second material layer of the second barrier portion;

[0051] or

[0052] Before the forming of the second material layer of the second barrier portion on the surface of the first material layer of the second barrier portion away from the second substrate side, the method further comprises:

[0053] bombarding a surface of the first material layer of the second barrier portion away from the first substrate side to form the hole structure;

[0054] or

[0055] Before the forming of the second material layer of the second barrier portion on the surface of the first material layer of the second barrier portion away from the second substrate side, the method further comprises:

[0056] the surface of the first material layer of the second barrier portion and the surface of the second material layer of the second barrier portion are formed into interfitting tooth-shaped structures.

[0057] The third aspect of the present application provides a display device comprising the reflective display panel provided by the first aspect of the present application.

[0058] The present application has the following advantages:

[0059] The technical solution of the present application sets the barrier wall structure as a first barrier portion and a second barrier portion formed on two substrates respectively, the first barrier portion and the second barrier portion are discontinuously arranged, so that the ink material of the pixel can quickly spread to the entire substrate from the disconnected part of the first barrier portion or the second barrier portion, thereby improving the ink material spreading speed and effectively reducing the risk of ink material overflow; further, the projections of the first barrier portion and the second barrier portion do not overlap, and after the cell is closed, the first barrier portion and the second barrier portion can form a continuous annular projection, which encloses the sub-pixel in the opening area formed by the barrier wall structure, ensures the barrier performance of the barrier wall structure, further improves the display uniformity of the reflective display panel, improves the display effect, and has a wide application prospect. BRIEF DESCRIPTION OF DRAWINGS

[0060] The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings.

[0061] Figure 1a A schematic diagram of the structure of a prior art E-Ink reflective display panel under bright display conditions is shown.

[0062] Figure 1b A schematic diagram illustrating the structure of a prior art E-Ink reflective display panel in a dark display state is shown.

[0063] Figure 2a A schematic diagram of the structure of a prior art CID reflective display panel is shown.

[0064] Figure 2b A top view of a prior art CID reflective display panel is shown.

[0065] Figure 3 A schematic diagram of the structure of a reflective display panel according to an embodiment of the present invention is shown;

[0066] Figure 4a This diagram shows a projection schematic of the first blocking portion according to an optional embodiment of the present invention;

[0067] Figure 4b This diagram shows a projection schematic of the second blocking portion according to an optional embodiment of the present invention;

[0068] Figure 4c This invention is shown Figure 4a The first blocking part and Figure 4b A schematic projection of the retaining wall structure formed by the second blocking part shown;

[0069] Figure 5 This invention is shown Figure 3 The diagram shows the structure of the reflective display panel when it is mounted on the box.

[0070] Figure 6a This diagram shows a projection of the first blocking portion according to another optional embodiment of the present invention;

[0071] Figure 6b A schematic projection of the second blocking portion of another optional embodiment of the present invention is shown;

[0072] Figure 6c This invention is shown Figure 6a The first blocking part and Figure 6b A schematic projection of the retaining wall structure formed by the second blocking part shown;

[0073] Figure 7a A schematic diagram of the layer structure of a reflective display panel according to another optional embodiment of the present invention is shown;

[0074] Figure 7bA schematic diagram of the layer structure of a reflective display panel according to another optional embodiment of the present invention is shown;

[0075] Figure 7c A schematic diagram of the layer structure of a reflective display panel according to another optional embodiment of the present invention is shown;

[0076] Figure 8 A flowchart illustrating a method for manufacturing a reflective display panel according to another embodiment of the present invention is shown.

[0077] Figures 9a to 9h This illustrates the production of an embodiment of the present invention. Figure 3 The process flow diagram of the reflective display panel. Detailed Implementation

[0078] It should also be noted that in the description of this invention, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0079] Reflective display panels are device structures that utilize natural ambient light for display. They can achieve clear display using ambient light in both strong and weak light conditions, and have advantages such as low driving voltage, energy saving, and less eye strain. Currently, reflective display panels can include electronic ink (E-Ink) reflective display devices and Clear-Ink (CID) reflective display devices.

[0080] The working principle of existing E-Ink reflective display panels is as follows: When a voltage is applied to the electrodes in the reflective display panel, white particles in the ink move to the surface of the dielectric layer on the display side, and black particles in the ink move to the side opposite to the display side. At this time, light is reflected to achieve a bright state display. When a voltage is applied to the electrodes in the reflective display, white particles in the ink move to the side opposite to the display side, and black particles in the ink move to the surface of the dielectric layer on the display side. At this time, light is directly absorbed to achieve a dark state display.

[0081] Figure 1a This is a schematic diagram of the structure of an existing E-Ink reflective display panel in a bright display state.Figure 1b This is a schematic diagram of the E-Ink reflective display panel in dark conditions. Figure 1a and Figure 1b As shown, the reflective display panel may include: a first substrate 111 and a second substrate 121 disposed opposite to each other; a first electrode 112 disposed on the side of the first substrate 111 near the second substrate 121; a second electrode 122 disposed on the side of the second substrate 121 near the first substrate 111; and a microcapsule 13 disposed between the first electrode 112 and the second electrode 122. The microcapsule 13 may include: ink 14 containing white microparticles 141 (also referred to as white ink particles or white microspheres) and black microparticles 142 (also referred to as black ink particles or black microspheres), wherein the black microparticles 142 and the white microparticles 141 carry different charges. For example, when the first electrode 112 and the second electrode 122 are not energized, the black microparticles 142 carry a negative charge, and the white microparticles 141 carry a positive charge, and the entire microcapsule 13 is in an electrical equilibrium state. For example, as Figure 1a As shown, when a positive voltage is applied to the first electrode 112, black microparticles 142 move closer to the first electrode 112, while white microparticles 141 are distributed above the microcapsule 13. Ambient light incident from the second substrate 121 is reflected at the white microparticles 141 within the microcapsule 13, allowing the display device to display a bright state. For example, as... Figure 1b As shown, when a negative voltage is applied to the first electrode 112, white microparticles 141 move closer to the first electrode 112, and black microparticles 142 are distributed above the microcapsule 13. Ambient light incident from the second substrate 121 is absorbed by the black microparticles 142 in the microcapsule 13. At this time, the display device can present a dark display.

[0082] Another existing CID reflective display panel works as follows: When a voltage is applied to the electrodes in the reflective display panel, the black ink particles in the sub-pixels move to the side opposite to the display side. At this time, the high refractive index of the dielectric layer and the low refractive index of the electronic ink achieve total internal reflection to realize the bright state display. When a voltage is applied to the electrodes in the reflective display panel, the black ink particles in the sub-pixels move to the surface of the dielectric layer located on the display side, so that the light is directly absorbed to realize the dark state display.

[0083] Compared to E-ink reflective display panels, CID reflective display panels have advantages such as lower driving voltage, lower power consumption, and the ability to achieve color display. However, existing CID reflective display panels suffer from difficulties in sub-pixel fabrication. Through extensive research and experimentation, the inventors discovered that the main reason for this problem is:

[0084] like Figure 2aAs shown, existing CID reflective display panels utilize a barrier structure 23' disposed between the first substrate 21' and the second substrate 22' to form an opening area, and sub-pixels 24' are disposed in the opening area to form a display panel as shown in the figure. Figure 2b The structural schematic diagram shown is in top view, as follows: Figure 2b As shown, the barrier structure 23' and the sealing adhesive 25' located in the boundary area form multiple arrayed opening areas, with sub-pixels 24' disposed in each opening area. The CID reflective display panel requires each barrier structure 23' to be completely closed to form a closed space; otherwise, the black ink particles in the sub-pixels 24' will shuttle between adjacent sub-pixels, reducing the number of black ink particles in some sub-pixels and causing poor uniformity in the display state.

[0085] The blocking effect of the barrier structure makes it difficult for the ink material of the sub-pixel to diffuse across the entire first substrate. Specifically, the commonly used technique is to apply ink to the first substrate using a drop-coating process. However, due to the presence of the barrier structure, the ink material has difficulty crossing the barrier. Therefore, a large amount of ink material needs to be dropped in, which increases the risk of ink overflow due to excessive ink material, making sub-pixel fabrication difficult and increasing manufacturing costs.

[0086] Based on the above problems and research, this invention proposes a reflective display panel, a manufacturing method, and a display device to solve the aforementioned problems.

[0087] The first embodiment of the present invention proposes a reflective display panel, such as... Figure 3 , Figure 4a as well as Figure 4b As shown, the reflective display panel includes:

[0088] A first substrate 31, a second substrate 32, a barrier structure 33 located between the first substrate and the second substrate, and a sub-pixel 34 disposed in the opening area formed by the barrier structure 33.

[0089] The retaining wall structure includes:

[0090] A first blocking portion 331 is intermittently disposed on the surface of the first substrate 31 near the second substrate 32, and the first blocking portion 331 forms a first projection on the first substrate 31.

[0091] A second blocking portion 332 is intermittently disposed on the surface of the second substrate 32 near the side of the second substrate 32, and the second blocking portion 332 forms a second projection on the second substrate;

[0092] The first projection and the second projection do not overlap, and together they form a continuous annular projection 330 surrounding the outer side of the third projection of the sub-pixel 34 on the first substrate 31.

[0093] In the reflective display panel of this invention, the barrier structure is configured as a first blocking portion and a second blocking portion formed on two substrates respectively. The first blocking portion and the second blocking portion are intermittently arranged, so that the ink material of the pixel can quickly diffuse from the break in the first blocking portion or the second blocking portion to the entire substrate, thereby improving the diffusion speed of the ink material and effectively reducing the risk of ink material overflow. Furthermore, the projections of the first blocking portion and the second blocking portion do not overlap, and the first blocking portion and the second blocking portion can form a continuous annular projection after the cell is closed, enclosing the sub-pixel in the opening area formed by the barrier structure, ensuring the blocking performance of the barrier structure, further improving the display uniformity of the reflective display panel, and improving the display effect.

[0094] In a specific example, in a top-view orientation, the arrangement of the first blocking portion 331 on the first substrate 31 is as follows: Figure 4a As shown, the first blocking parts 331 are intermittently arranged in the vertical and horizontal directions. The specific arrangement of the second blocking parts 332, which correspond to the first blocking parts 331, is as follows: Figure 4b As shown, the second blocking part 332 is an elongated strip structure extending vertically. The distance between adjacent second blocking parts is the length of the first blocking part in the longitudinal direction (the long side of the first blocking part). The distance between partially adjacent first blocking parts is the length of the second blocking part in the longitudinal direction (the wide side of the second blocking part). After assembly, the first blocking part 331 and the second blocking part 332 form a closed structure as shown. Figure 4c The circular projection shown.

[0095] Figure 4a The first blocking part shown and Figure 4b The annular projection formed by the second blocking part shown is as follows: Figure 4c As shown, the annular projection is a closed region, and the third projection of sub-pixel 34 on the first substrate 31 is surrounded by this annular projection. In a specific example, Figure 5 It shows Figure 3 The diagram shown illustrates the structure of the reflective display panel during the assembly process. Figure 5 As can be seen from the overall structure, the first blocking part 331 is formed on the surface of the first substrate 31 facing the second substrate 32, and in Figure 5 A certain height is formed in the direction toward the second substrate 32, and a second blocking portion 332 is formed on the surface of the second substrate 32 facing the first substrate 31, and in... Figure 5 The barrier structure 33, extending to a certain height in the direction toward the first substrate 31, after the cell assembly process, together with the first blocking portion 331 and the second blocking portion 332, forms a barrier structure 33 that can completely enclose each sub-pixel 34 within the formed opening area. In other words, the formed barrier structure 33 as a whole is as shown... Figure 4cThe annular projection 330 shown is the projection of the opening region on the first substrate 31 in this embodiment. Since the sub-pixels are formed in the opening region, the area surrounded by the annular projection 330 is the third projection of the sub-pixels 34 formed in the opening region on the first substrate 31.

[0096] In other words, in the top view, the barrier structure of this embodiment can surround the sub-pixels in their projection, and in the vertical direction, the height of the barrier structure can block the flow of ink material, such as black particles in the ink material. In addition to realizing the rapid diffusion of ink material, the reflective display panel of this embodiment can also ensure the blocking performance of the barrier structure, thereby ensuring the overall performance of the reflective display panel.

[0097] In another specific example, when the ink material is configured to be in such Figure 4b When performing the drop-coating process on the second substrate shown, the ink material can also rapidly diffuse from the gaps between the second barriers to the entire second substrate, thereby increasing the diffusion rate of the ink material and achieving the same effect as the first barrier in improving the slow diffusion of the ink material, which will not be elaborated further here. Therefore, this embodiment does not limit which substrate to be selected for the ink material drop-coating process in the manufacturing process. Those skilled in the art can select the carrier substrate for the drop-coating process according to the actual application, which will not be elaborated further here.

[0098] It is worth noting that this embodiment does not limit the specific arrangement of the first blocking part. In a specific example, the first blocking part 331 can be arranged as follows: Figure 6a The longitudinally extending strip-shaped arrangement shown has a gap between adjacent first blocking portions 331. When the ink material is configured to be drop-coated on the first substrate, the ink material can quickly diffuse from the gap between each first blocking portion 331 to the entire first substrate 31, thereby increasing the diffusion speed of the ink material.

[0099] like Figure 6b As shown, the corresponding second blocking part 332 is arranged in a horizontally extending strip shape. After the ink material has diffused on the first substrate, the first substrate 31 and the second substrate 32 are aligned. Figure 6a The first blocking part 331 shown and Figure 6b The second blocking part 332 shown is formed as follows Figure 6c The closed opening area is shown, and the ink material is encapsulated in each opening area to form a sub-pixel 34.

[0100] It is worth noting that this embodiment does not limit the specific arrangement structure of the first blocking part and the second blocking part. Those skilled in the art can choose the specific arrangement method according to the actual application. The design principle is to form a continuous annular projection around the sub-pixel on the first substrate by the first blocking part and the second blocking part. This will not be elaborated here.

[0101] like Figure 2a and 2b As shown, CID reflective display panels require each baffle structure 23' to be completely closed to form a sealed space; otherwise, black ink particles in the sub-pixel 24' will shuttle between adjacent sub-pixels, reducing the number of black ink particles in some sub-pixels and causing poor uniformity in the display state. However, in the actual manufacturing process of the baffle structure, due to process fluctuations, it is impossible to completely guarantee that the height of the baffle structure around the sub-pixel is the same, such as... Figure 2a As shown, the heights of the two adjacent barrier structures 23' are not the same. Even a difference of a few micrometers in height can cause nanoscale black ink particles to move between adjacent subpixels, resulting in poor display quality.

[0102] Therefore, even though the first and second blocking portions of this embodiment can form an opening region surrounding the sub-pixel in the top view direction, in the vertical direction, due to process fluctuations in the manufacturing process of the first and second blocking portions, such as... Figure 2a As shown, the ink material in the sub-pixel flows from the gap between the barrier structure and the corresponding substrate into other sub-pixels, making the ink material in each open area of ​​the sub-pixel uneven, resulting in poor display uniformity.

[0103] In view of the above problems, in an alternative embodiment, such as Figure 7a As shown, the retaining wall structure also includes a first material layer and a second material layer stacked together. The deformation rate of the second material layer is higher than that of the first material layer. Through this solution, the present invention further improves the display uniformity of the display panel while reducing the difficulty of sub-pixel manufacturing.

[0104] For example, such as Figure 4a and 4b As shown, the retaining wall structure of this embodiment is configured with corresponding first blocking part 331 and second blocking part 332 in the top view direction to form a blocking performance in the top view direction, such as... Figure 7aAs shown, the barrier structure of this embodiment is also designed in the stacking direction. By setting the first blocking part 331 as two material layers (first material layer 3311 and second material layer 3312) and the second blocking part 332 as two material layers (first material layer 3321 and second material layer 3322), the second material layer of each blocking part can deform after being pressed after being placed in the box, thereby eliminating the gap between each blocking part and the substrate it is close to, so that the first blocking part 331 and the second blocking part 332 can completely abut against the first substrate 31 and the second substrate 32 to form a closed opening area.

[0105] In an optional embodiment, such as Figure 7a As shown, the first substrate is a color filter substrate, and the second substrate is a driving circuit substrate. The first material layer 3311 of the first blocking portion 331 is disposed on the surface of the first substrate 31 near the second substrate 32, and the second material layer 3312 of the first blocking portion 331 is disposed on the surface of the first material layer 3311 of the first blocking portion 331 away from the first substrate 31.

[0106] In other words, in this embodiment, the second material layer 3312 of the first blocking portion 331 is bonded to the second substrate 32. With this arrangement, during the manufacturing process, the second material layer 3312 of the first blocking portion 331 can be formed on the first material layer 3311. Due to the small deformation and good support of the first material layer 3311, the process error of forming the second material layer 3312 of the first blocking portion 331 on the first material layer as a base is small. Furthermore, due to the high deformation of the second material layer 3312, after the first substrate 31 and the second substrate 32 are assembled, the second material layer 3312 of the first blocking portion 331 can be tightly bonded to the second substrate 32. Therefore, this arrangement ensures that the second material layer utilizes its own deformation characteristics to bond with the second substrate during the assembly process, while also maintaining the manufacturing accuracy of the first blocking portion.

[0107] Similarly, the first material layer 3321 of the second blocking portion 332 is disposed on the surface of the second substrate 32 near the first substrate 31, and the second material layer 3322 of the second blocking portion 332 is disposed on the surface of the first material layer 3321 of the second blocking portion 332 away from the second substrate 32. That is, the second material layer 3322 of the second blocking portion 332 is attached to the first substrate 31 and is formed on the first material layer 3321 of the second blocking portion 332, which can also ensure the manufacturing accuracy of the second blocking portion.

[0108] It is worth noting that this embodiment does not limit the arrangement of the first material layer and the second material layer between the first substrate and the second substrate. Figure 7a The structure shown is a preferred embodiment of this invention. Other embodiments of the invention may also employ a structure where the side of the first blocking portion closest to the second substrate is a second material layer and the side closest to the first substrate is a first material layer, and vice versa. Alternatively, a structure may be designed where the side of the first blocking portion closest to the second substrate is a first material layer and the side closest to the first substrate is a second material layer, and vice versa. Those skilled in the art should design such structures according to actual applications; further details are omitted here.

[0109] In an optional embodiment, the first material layer is a support material, and the second material layer is a deformable material. In this embodiment, the deformable properties of the second material layer are used to achieve a tight fit with the corresponding substrate, thereby forming a closed opening area to accommodate the sub-pixel and preventing the flow of ink material within the sub-pixel. For example, the deformable material of the second material, after coating and curing, can have a high deformation capacity, capable of producing deformation modes such as elastic deformation and plastic deformation.

[0110] Furthermore, in this embodiment, the first material layer is set as a support material, such as acrylate, epoxy resin, cyclopentanone, etc., which utilize their high viscosity and high coating thickness to form a higher first material layer. For example, the thickness of the first material layer can be greater than 5μm. OC glue and other materials can also be selected as support materials. Those skilled in the art can design according to actual applications.

[0111] In an optional embodiment, such as Figure 7bAs shown, the retaining wall structure further includes a third material layer (the third material layer 3313 of the first blocking portion and the third material layer 3323 of the second blocking portion) located between the first material layer and the second material layer. The adhesion between the third material of the third material layer and the first material of the first material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer, and the adhesion between the third material of the third material layer and the second material of the second material layer is also greater than the adhesion between the first material of the first material layer and the second material of the second material layer. In this embodiment, the adhesion between the first material layer and the second material layer is increased by the third material layer as an adhesive layer. That is, the third material layer 3313 of the first blocking portion 331 is located between the first material layer 3311 and the second material layer 3312 of the first blocking portion 331, and the third material layer 3323 of the second blocking portion 332 is located between the first material layer 3321 of the second blocking portion 332 and the first material layer 3321 of the second blocking portion 332.

[0112] In other words, for the first blocking part 331, the adhesion between the third material layer 3313 and the first material layer 3311 is greater than the adhesion between the first material layer 3311 and the second material layer 3312, and the adhesion between the third material layer 3313 and the second material layer 3312 is greater than the adhesion between the first material layer 3311 and the second material layer 3312.

[0113] Similarly, for the second blocking part 332, the adhesion between the third material layer 3323 and the first material layer 3321 is greater than the adhesion between the first material layer 3321 and the second material layer 3322, and the adhesion between the third material layer 3323 and the second material layer 3322 is greater than the adhesion between the first material layer 3321 and the second material layer 3322.

[0114] For example, the third material layer in this embodiment may be a compound containing hydroxyl or carboxyl groups. The hydroxyl and carboxyl groups in the material of the third material layer react with the materials in the first and second material layers respectively to enhance the adhesion, thereby improving the structural stability of the first and second blocking parts.

[0115] In another alternative embodiment, such as Figure 7c As shown, the first material layer 3311 and the second material layer 3312 of the first blocking portion 331 are mutually cooperating toothed structures, and the first material layer 3321 and the second material layer 3322 of the second blocking portion 332 are mutually cooperating toothed structures. For example, as... Figure 7cAs shown, taking the fabrication of the first material layer 3311 and the second material layer 3312 of the first blocking portion 331 as an example, a one-dimensional or two-dimensional wire grid array is fabricated on the surface of the first material layer 3311 using techniques such as photolithography or nanoimprinting. Then, the second material layer 3312 is fabricated. This microstructure increases the contact area between the first and second material layers, thereby enhancing adhesion and improving the structural stability of the first and second blocking portions. In a specific example, the period of the wire grid is smaller than the width of the first and second blocking portions, such as a period of 400 nm, a height of 80 nm, and a duty cycle of 0.5, thus achieving the desired effect in this embodiment. Figure 7c The first and second blocking parts are shown.

[0116] In another optional embodiment, the surfaces where the first material layer and the second material layer are bonded are porous. In a specific example, the first material layer can be bombarded with O2 plasma to roughen its surface and form a porous structure, further increasing the contact area between the first and second material layers, enhancing the adhesion between the two materials, and thereby improving the structural stability of the first and second blocking portions.

[0117] In an optional embodiment, such as Figure 7a As shown, the display panel also includes a light-shielding layer 36 located between the lens array 35 and the first substrate 31. The light-shielding layer 36 includes: a color filter 361 disposed corresponding to the sub-pixel 34; and a light-shielding layer 362 located between adjacent color filters 361. The projection of the light-shielding layer 36 on the first substrate 31 covers the first projection and covers the second projection.

[0118] In this embodiment, the light-shielding layer 362 is disposed between adjacent color filters 361 to prevent crosstalk between different colors of light. To avoid the first blocking part 331 and the second blocking part 332 of the barrier structure affecting the light emission effect, in this embodiment, the first blocking part 331 and the second blocking part 332 of the barrier structure are disposed at the position of the light-shielding layer 362. The projection of the light-shielding layer 362 on the first substrate 31 covers the projection of the first blocking part 331 on the first substrate 31 and the projection of the second blocking part 332 on the first substrate 31, thereby ensuring that the first blocking part and the second blocking part are completely disposed at the position of the light-shielding layer and will not affect the light emission effect of the reflective display panel.

[0119] In an optional embodiment, such as Figure 3 , Figure 7a , Figure 7b as well as Figure 7cAs shown, the display panel further includes a lens layer 35 disposed on the surface of the first substrate 31 near the second substrate 32, the lens layer 35 including a plurality of lenses; the thickness of the first blocking portion and the thickness of the second blocking portion are both greater than the arch height of the lens.

[0120] In this embodiment, the overall height of the first and second blocking portions formed by the first and second material layers needs to be higher than the arch height of the lens. For example, the total height of the first blocking portion is 5–20 μm, and similarly, the total height of the second blocking portion is 5–20 μm. In a specific example, the height ratio of the second material layer to the first material layer is preferably in the range of 1:2.5 to 1:10.

[0121] In one specific embodiment, the curved lens can be made of a transparent material, which allows for higher light transmittance of the reflective display panel. As shown in the figure, the surface of the curved lens near the second substrate (driving TFT substrate) is a curved surface that convexes towards the second substrate. For example, this curved surface can be fabricated using nanoimprint lithography or photolithography. Exemplarily, this curved surface can be a portion of a sphere (e.g., a spherical or ellipsoidal surface). Of course, the curved surface of the lens can also be other shapes, which can be set according to the design parameters of the reflective display panel, and this embodiment of the invention does not limit this.

[0122] like Figure 7b As shown, the lens layer 35 is distributed across the entire surface of the filter layer 36, including the positions of the color filter 361 and the light-shielding layer 362. A first blocking portion 331 and a second blocking portion 332 are provided on the lens layer 35. Since the plane of the lens layer 35 is disposed on the first substrate 31 and the arcuate surface is disposed in the direction facing the second substrate 32, in this structure, the first blocking portion 331 is in close contact with the arcuate surface of the lens layer 35. Therefore, due to process precision issues, process errors may occur between the first blocking portion 331 and the second blocking portion 332 and the lens layer 35. For example, during cell assembly, gaps may form between the second blocking portion 332 and the arcuate surface of the lens layer 35, thereby affecting the overall performance of the reflective display panel.

[0123] Therefore, in an optional embodiment, the lens layer 35 includes an array of lens units (all lenses in one opening region) located in each of the opening regions, and the projection of the color filter 361 onto the first substrate 31 covers the projection of each of the lens units onto the first substrate 31. Figure 3 , Figure 7a as well as Figure 7c As shown, the barrier structure formed by the first blocking part 331 and the second blocking part 332 surrounds the outside of the corresponding lens unit. In this embodiment, the lens layer is only set at the location of the color filter; that is, the lens layer is not set at the location of the light-shielding layer. Figure 4a, 4b , Figure 4c as well as Figure 3 As shown, the annular projection 330 formed by the first blocking part 331 and the second blocking part 332 is disposed at the light-shielding layer 361, while the lens layer 35 is disposed at the position of the color filter 361. This allows the second blocking part 332 to contact the surface of the light-shielding layer 362 when it is aligned with the substrate, and the first blocking part 331 can be formed on the plane of the first substrate 31. This ensures that both the first blocking part and the second blocking part can be formed on the plane and fit against the plane, further ensuring a tight bond between the first blocking part and the second blocking part and the corresponding substrate, improving the display uniformity and structural stability of the reflective display panel, and effectively improving the overall performance of the reflective display panel.

[0124] In a specific example, such as Figure 3 , Figure 7a , Figure 7b as well as Figure 7c In the embodiment shown, the boundary region between the first substrate 31 and the second substrate 32 is further provided with a sealing adhesive 37 for encapsulating sub-pixels, thereby forming a fixed reflective display panel.

[0125] Corresponding to the above-mentioned reflective display panel, another embodiment of the present invention proposes a method for manufacturing a reflective display panel, such as... Figure 8 As shown, the method includes:

[0126] S3. A first blocking portion is formed intermittently on a first substrate, and a first projection is formed on the first substrate by the first blocking portion;

[0127] S4. A second blocking portion is formed intermittently on the second substrate, and a second projection is formed on the second substrate by the second blocking portion;

[0128] S5. Form an ink material layer for the sub-pixel on the first substrate or the second substrate;

[0129] S6. A barrier structure is formed on the first substrate and the second substrate, and a sub-pixel is formed in the opening area of ​​the barrier structure. The first projection and the second projection do not overlap and together form a continuous annular projection surrounding the third projection of the sub-pixel on the first substrate.

[0130] The reflective display panel formed using the method of this embodiment can form intermittently arranged first and second blocking portions on two substrates, allowing the ink material of the pixel to quickly diffuse from the break in the first or second blocking portion to the entire substrate, thereby increasing the ink material diffusion speed and effectively reducing the risk of ink material overflow. Furthermore, the projections of the first and second blocking portions do not overlap, and the first and second blocking portions after the cell is closed can form a continuous annular projection, enclosing the sub-pixel in the opening area formed by the barrier structure, ensuring the blocking performance of the barrier structure, further improving the display uniformity of the reflective display panel, and enhancing the display effect.

[0131] Now in production Figure 3 The manufacturing process of this method is explained using a reflective display panel as an example. The "patterning process" mentioned in this embodiment includes deposition of a film layer, coating with photoresist, mask exposure, development, etching, and photoresist stripping, which are known and mature fabrication processes. Deposition can employ known processes such as sputtering, evaporation, and chemical vapor deposition; coating can employ known coating processes; and etching can employ known methods, which are not limited here. In the description of the embodiments of this disclosure, a "thin film" refers to a thin film made of a certain material on a substrate using a deposition or coating process. If the "thin film" does not require a patterning process or photolithography process during the entire manufacturing process, it can also be called a "layer." If the "thin film" requires a patterning process or photolithography process during the entire manufacturing process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process or photolithography process contains at least one "pattern."

[0132] In an optional embodiment, such as Figure 8 As shown, before forming the intermittently arranged first blocking portion on the first substrate, the method further includes:

[0133] S1. A filter layer 36 is formed on the substrate of the first substrate 31.

[0134] In one specific embodiment, the first substrate is a color filter substrate, and its substrate can be a glass substrate. Those skilled in the art can choose according to the actual application, and will not elaborate further here. Figure 3 As shown, the light-shielding layer includes: a color filter disposed corresponding to a sub-pixel and a light-shielding layer located between adjacent color filters.

[0135] For example, step S1, "forming a filter layer on the first substrate", further includes:

[0136] S11. A patterned light-shielding layer 362 is formed on the substrate of the first substrate 31.

[0137] To prevent the first blocking part from affecting the light emission effect, in this embodiment, the light-shielding layer is arranged to correspond to the annular projection formed by the first blocking part and the second blocking part. Furthermore, the projection of the light-shielding layer on the first substrate covers the projection of the first blocking part on the first substrate and the projection of the second blocking part on the first substrate, so as to ensure that the light-shielding layer can not only block crosstalk between different colors of light, but also block the first blocking part, thus ensuring the light emission effect and guaranteeing the display performance of the reflective display panel.

[0138] S12. A color filter 361 is formed between adjacent light-shielding layers 362.

[0139] For example, color filters include red filters, blue filters, and green filters.

[0140] In an optional embodiment, such as Figure 8 As shown, before forming the intermittently arranged first blocking portion on the first substrate, the method further includes:

[0141] S2. A lens layer 35 is formed on a first substrate, the lens layer comprising a plurality of lenses.

[0142] like Figure 3 As shown, the lens layer includes multiple curved lenses, with the curved surfaces of the lenses facing the second substrate. Exemplarily, a high-refractive-index adhesive material can be coated on the surface of the first substrate, and then a nanoimprinting template can be used to imprint the adhesive material to form a lens array. Exemplarily, the arch height of the curved lenses in the lens array is typically 5–10 μm, and the aperture is preferably 5–30 μm, which can be designed by those skilled in the art according to actual applications, and will not be elaborated further here.

[0143] In one specific example, after forming the lens layer, an ITO film layer is further deposited on the curved surface of the lens array. Figure 9a (Not shown in the image), with a thickness of 20–100 nm, is used as an electrode to form... Figure 9a The diagram shows a layer structure.

[0144] In one specific example, a curved lens can be formed on the entire surface of the first substrate; in another specific example, such as... Figure 3 as well as Figure 9a As shown, the lenses can also be formed on the surface of the first substrate in an array of lens units, without forming the lens layer 35 at the position of the light-shielding layer 362. This allows the first blocking portion 331 to be formed on the plane of the first substrate 31, and the surface of the second blocking portion 332 in contact with the first substrate 31 to be flat, thereby improving the manufacturing precision of the reflective display panel. In one specific embodiment, the lenses can be made of transparent material, which allows for higher light transmittance of the reflective display panel.

[0145] like Figure 3 As shown, the surface of the lens layer 35 near the second substrate (driving TFT substrate) is a curved surface that protrudes towards the second substrate 32. For example, this curved surface can be fabricated using nanoimprint lithography or photolithography. Exemplarily, this curved surface can be a portion of a sphere (e.g., a spherical or ellipsoidal surface). Of course, the curved surface of the lens can also be other shapes, which can be set according to the design parameters of the reflective display panel; this embodiment of the invention does not limit this.

[0146] S3. A first blocking portion 331 is formed intermittently on the first substrate 31, and the first blocking portion forms a first projection on the first substrate.

[0147] In an optional embodiment, step S3, "forming intermittently disposed first blocking portions on the first substrate," includes:

[0148] S31, the first material of the first material layer on the first substrate 331 forming the first barrier portion 331, thereby forming Figure 9b The structure shown.

[0149] For example, taking the example of not providing a lens layer 35 on the light-shielding layer 362, a first material of the first blocking portion is coated on the first substrate. The first material has a high viscosity and can form a first material layer with a high coating thickness. For example, the thickness of the first material layer is greater than 5 μm.

[0150] S32. A second material of a second material layer of the first barrier portion is formed on the surface of the first material layer of the first barrier portion away from the first substrate; wherein the deformation rate of the first material of the first barrier portion is higher than the deformation rate of the second material of the first barrier portion.

[0151] For example, such as Figure 9c As shown, a second material layer is formed on the first material that is laid in a whole layer, covering the second barrier portion of the first material. The thickness of the second material can be 2 to 3 μm. The hardness of the second material after coating and curing is less than that of the first material, and it is more prone to deformation.

[0152] For example, the total thickness of the first material and the second material needs to be higher than the lens arch height of the lens layer. The total thickness is preferably 5 to 20 μm. In a specific example, the thickness ratio of the second material to the first material is preferably in the range of 1:2.5 to 1:10.

[0153] S33, The first material and the second material of the first blocking portion are patterned to form the first blocking portion 331.

[0154] For example, this step includes:

[0155] A metal (e.g., Al, Mo, etc.) or inorganic material (e.g., SiO, etc.) layer is deposited on the second material as a mask layer, thereby forming... Figure 9d The layer structure shown.

[0156] The mask layer is patterned using photolithography to form a pattern corresponding to the first projection of the first blocking portion, i.e., as shown below. Figure 9e The structure shown.

[0157] Furthermore, this mask layer is used as a mask for ICP etching, and then the mask layer is removed using an acid or alkali solution, thereby forming a layer such as... Figure 9f The first blocking portion 331 shown includes a first material layer 3311 and a second material layer 3312.

[0158] Considering the corresponding to such Figure 7a and 7b The structure of the first blocking part with different structures shown is similar to... Figure 3 Unlike other methods, this invention is manufactured using the following exemplary method.

[0159] For example Figure 7a In an optional embodiment, before step S32 "forming a second material layer of the first barrier on the surface of the first material layer of the first barrier away from the first substrate", the method further includes:

[0160] A third material layer of the first barrier is formed on the surface of the first material layer away from the first substrate. The adhesion between the third material of the third material layer and the first material of the first material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer.

[0161] This embodiment increases the adhesion between the first and second material layers by using a third material layer as an adhesive layer. For example, the third material layer in this embodiment can be a compound containing hydroxyl or carboxyl groups. The hydroxyl and carboxyl groups in the material of the third material layer react with the materials in the first and second material layers respectively, thereby enhancing the adhesion and improving the structural stability of the first and second blocking parts.

[0162] In another optional embodiment, before forming a second material layer of the first barrier on the surface of the first material layer of the first barrier away from the first substrate, the method further includes:

[0163] The first material layer of the first blocking part and the second material layer of the first blocking part are formed into a tooth-shaped structure that matches each other.

[0164] For example, such as Figure 7b As shown, a one-dimensional or two-dimensional wire grid array is fabricated on the surface of the first material layer using techniques such as photolithography or nanoimprinting. Then, a second material layer is fabricated. This microstructure increases the contact area between the first and second material layers, enhancing adhesion and thus improving the structural stability of the first and second blocking portions. In a specific example, the period of the wire grid is smaller than the width of the first and second blocking portions, such as a period of 400 nm, a height of 80 nm, and a duty cycle of 0.5, thereby achieving the desired effect in this embodiment. Figure 7b The first and second blocking parts are shown.

[0165] In another embodiment, before forming a second material layer of the first barrier on the surface of the first material layer of the first barrier away from the first substrate, the method further includes:

[0166] The first material is bombarded on the surface of the first barrier on the side away from the first substrate to form the hole structure.

[0167] In a specific example, O2 plasma can be used to bombard the first material of the first barrier to roughen its surface and form a porous structure, thereby increasing the contact area between the first material layer and the second material layer, enhancing the adhesion between the two materials, and thus improving the structural stability of the first barrier and the second barrier.

[0168] Those skilled in the art can select the appropriate structure according to the actual application to increase the adhesion between the first material layer and the second material layer, thereby achieving a structurally stable first blocking part.

[0169] In an optional embodiment, step S4, "forming the intermittently arranged second blocking portion on the second substrate," includes:

[0170] S41. A first material layer of the second barrier portion is formed on the second substrate.

[0171] The formation process of the first material layer of the second barrier is similar to that of the first material layer of the first barrier, and will not be described again here.

[0172] S42. A second material layer of the second barrier is formed on the surface of the first material layer of the second barrier away from the second substrate; wherein the deformation rate of the second material layer of the second barrier is higher than the deformation rate of the first material layer of the second barrier.

[0173] Similarly, the process for forming the second material layer of the second blocking part is similar to the process for forming the second material of the first blocking part, and will not be described in detail here. Both the second blocking part and the first blocking part formed by the above steps are located at corresponding positions in the light-shielding layer and will not affect light emission.

[0174] like Figure 7a As shown in 7b, the second blocking part in this embodiment, like the first blocking part, achieves structural stability through a process that increases the adhesion between the first material layer of the second blocking part and the second material layer of the second blocking part. The specific process can be referred to the process flow of the first blocking part, and will not be repeated here.

[0175] In an optional embodiment, when the second blocking portion adopts as shown in the figure, Figure 7a In the structure shown, before forming the second material layer of the second barrier on the surface of the first material layer of the second barrier away from the second substrate, the method further includes:

[0176] A third material layer of the second barrier is formed on the surface of the first material layer of the second barrier away from the first substrate. The adhesion between the third material of the third material layer and the first material of the first material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer, and the adhesion between the third material of the third material layer and the second material of the second material layer is greater than the adhesion between the first material of the first material layer and the second material of the second material layer.

[0177] In another alternative embodiment, when the second blocking portion adopts such as Figure 7b In the structure shown, before forming the second material layer of the second barrier on the surface of the first material layer of the second barrier away from the first substrate, the method further includes:

[0178] The first material layer of the first blocking part and the second material layer of the first blocking part are formed into a tooth-shaped structure that matches each other.

[0179] In another optional embodiment, the surface where the first material layer and the second material layer are bonded is a porous structure. Before forming the second material layer of the second barrier portion on the surface of the first material layer away from the first substrate, the method further includes:

[0180] The surface of the first material layer of the second barrier portion away from the first substrate is bombarded to form the hole structure.

[0181] Similarly, those skilled in the art can select the corresponding structure according to the actual application to increase the adhesion between the first material layer and the second material layer of the second barrier, thereby achieving a structurally stable second barrier.

[0182] In a specific example, after forming the first blocking portion and the second blocking portion, a dielectric layer (not shown in the figure) covering the first blocking layer, the second blocking layer and covering the lens array is formed. For example, SiO or SiN can be used, with a thickness of 10 to 100 nm.

[0183] S5. An ink material layer for a sub-pixel is formed on the first substrate 31 or the second substrate 32.

[0184] Since this embodiment sets the barrier structure as a first blocking part and a second blocking part formed on two substrates respectively, and the first blocking part and the second blocking part are intermittently arranged, the ink material of the pixel can quickly diffuse from the break of the first blocking part or the second blocking part to the entire substrate, thereby improving the ink material diffusion speed and effectively reducing the risk of ink material overflow.

[0185] It is worth noting that this embodiment does not limit the specific substrate on which the ink material layer is formed. That is, the ink material layer can be formed by drop-coating on either the first substrate or the second substrate. Similarly, regarding the sealing adhesive process involved before the drop-coating of the ink material layer, this embodiment of the invention does not limit the specific process steps of forming the sealing adhesive between the first and second substrates on either the first or the second substrate. Those skilled in the art should select the appropriate method according to the actual application, and will not elaborate further here.

[0186] For example, a sealing adhesive 37 is formed at the boundary region of the second substrate 32, and an ink material layer for the sub-pixel is formed on the first substrate for subsequent cell assembly processes. In another specific example, a sealing adhesive may also be formed on the first substrate, and the ink material layer for the sub-pixel may be formed on the second substrate; this embodiment of the invention is not limited thereto. In another specific example, a sealing adhesive is formed at the boundary region of the first substrate, and an ink material layer for the sub-pixel is formed on the first substrate, thereby forming... Figure 9g The diagram shows a layer structure.

[0187] S6, such as Figure 9h As shown, a barrier structure 33 is formed on the first substrate 31 and the second substrate 32, and a sub-pixel 34 is formed in the opening area of ​​the barrier structure 33. The first projection and the second projection do not overlap, and together they form a continuous annular projection surrounding the third projection of the sub-pixel on the first substrate.

[0188] For example, such as Figure 9hAs shown, the first substrate and the second substrate are vacuum aligned and bonded together. The first blocking part and the second blocking part form a barrier structure. Each corresponding first blocking part and second blocking part forms a continuous annular projection in the top view direction, thereby forming a closed opening area. A sub-pixel is formed in each opening area behind the cell. The sub-pixel is closed in the opening area formed by the barrier structure, ensuring the blocking performance of the barrier structure, further improving the display uniformity of the reflective display panel, and improving the display effect.

[0189] It is worth noting that this invention does not limit the display panel of the embodiments of this invention to the above-described manufacturing method as the only approach; that is, it can also be manufactured by other methods. Figure 3 The display panel shown is also within the protection scope of this invention.

[0190] Since the display panel manufacturing method provided in this embodiment corresponds to the display panels provided in the above-mentioned embodiments, the aforementioned implementation methods are also applicable to the display panel manufacturing method provided in this embodiment, and will not be described in detail in this embodiment. Those skilled in the art should understand that the aforementioned embodiments and their beneficial effects are also applicable to this embodiment; therefore, the same parts will not be repeated.

[0191] Another embodiment of the present invention provides a display device including the display panel as described in the above embodiments. Exemplarily, the display device can be any product or component requiring display functions, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, navigator, vehicle central control gear lever, and e-ink screen, and the embodiments of this disclosure are not limited thereto.

[0192] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. For those skilled in the art, other variations or modifications can be made based on the above description. It is impossible to exhaustively list all the implementation methods here. All obvious variations or modifications derived from the technical solutions of the present invention are still within the protection scope of the present invention.

Claims

1. A reflective display panel, characterized in that, a first substrate, a second substrate, a barrier structure between the first substrate and the second substrate, a sub-pixel arranged in an opening region formed by the barrier structure, the sub-pixel comprising an ink material; the barrier structure comprises: a first blocking portion intermittently arranged on a surface of the first substrate close to the second substrate, the first blocking portion forming a first projection on the first substrate; a second blocking portion intermittently arranged on a surface of the second substrate close to the first substrate, the second blocking portion forming a second projection on the second substrate; the ink material diffuses through the discontinuities of the first blocking portion or the second blocking portion, the first projection and the second projection do not overlap and jointly form a continuous annular projection surrounding a third projection of the sub-pixel on the first substrate to enclose the ink material in an opening region surrounded by the annular projection.

2. The reflective display panel of claim 1, wherein, the barrier structure further comprises a first material layer and a second material layer arranged in layers, the second material layer having a higher deformation rate than the first material layer. 3.The reflective display panel of claim 2, characterized in that, the first substrate is a color filter substrate, and the second substrate is a driving circuit substrate; the first material layer of the first blocking portion is arranged on a surface of the first substrate close to the second substrate, and the second material layer of the first blocking portion is arranged on a surface of the first material layer of the first blocking portion away from the first substrate; the first material layer of the second blocking portion is arranged on a surface of the second substrate close to the first substrate, and the second material layer of the second blocking portion is arranged on a surface of the first material layer of the second blocking portion away from the second substrate.

4. The reflective display panel of claim 3, wherein, the first material of the first material layer is a support material, and the second material of the second material layer is a deformation material.

5. The reflective display panel according to any one of claims 1 to 4, characterized in that, the display panel further comprises a lens layer arranged on a surface of the first substrate close to the second substrate, the lens layer comprising a plurality of lenses; the thickness of the first blocking portion and the thickness of the second blocking portion are both greater than the arch height of the lenses.

6. The reflective display panel of claim 5, wherein, the display panel further comprises a light shielding layer between the lens array and the first substrate, the light shielding layer comprising: a color filter arranged corresponding to the sub-pixel; and a light shielding layer between adjacent color filters, a projection of the light shielding layer on the first substrate covering the first projection and covering the second projection.

7. The reflective display panel of claim 6, wherein, the lens layer comprises a lens unit arranged in each of the opening regions in an array, a projection of the color filter on the first substrate covering a projection of each of the lens units on the first substrate.

8. The reflective display panel according to any one of claims 2 to 4, wherein The barrier structure further comprises a third material layer between the first material layer and the second material layer, a third material of the third material layer has a greater adhesion with the first material of the first material layer than the second material of the second material layer, and the third material of the third material layer has a greater adhesion with the second material of the second material layer than the first material of the first material layer. Or The surface of the first material layer and the second material layer is a hole structure. Or The first material layer and the second material layer are interlocking tooth structures.

9. A method of fabricating a reflective display panel according to any one of claims 1 to 8, characterized by Comprise: Forming the first barrier portion intermittently disposed on the first substrate, the first barrier portion forms a first projection on the first substrate; Forming the second barrier portion intermittently disposed on the second substrate, the second barrier portion forms a second projection on the second substrate; Forming the ink material layer of the sub-pixel on the first substrate or the second substrate; The first substrate and the second substrate are aligned to form the barrier structure and the sub-pixel located in the opening area of the barrier structure, the first projection and the second projection do not overlap, and together form a continuous annular projection around the third projection of the sub-pixel on the first substrate.

10. The method of claim 9, wherein, Forming the first barrier portion intermittently disposed on the first substrate comprises: Forming a first material layer of the first barrier portion on the first substrate; Forming a second material layer of the first barrier portion on the surface of the first material layer of the first barrier portion away from the first substrate; wherein the deformation rate of the second material layer of the first barrier portion is higher than the deformation rate of the first material layer of the first barrier portion.

11. The method of claim 9, wherein, Forming the second barrier portion intermittently disposed on the second substrate comprises: Forming a first material layer of the second barrier portion on the second substrate; Forming a second material layer of the second barrier portion on the surface of the first material layer of the second barrier portion away from the second substrate; wherein the deformation rate of the second material layer of the second barrier portion is higher than the deformation rate of the first material layer of the second barrier portion.

12. The method of claim 9, wherein, Before forming the first barrier portion intermittently disposed on the first substrate, the method further comprises: Forming a filter layer on the substrate of the first substrate, the filter layer comprises: color filters corresponding to sub-pixels and light shielding layers between adjacent color filters; Or Before forming the first barrier portion intermittently disposed on the first substrate, the method further comprises: Forming a lens layer on the first substrate, the lens layer comprises a plurality of lenses.

13. The method of claim 10, wherein, Before forming the second material layer of the first barrier portion on the surface of the first material layer of the first barrier portion away from the first substrate, the method further comprises: forming a third material layer of the first barrier portion on a surface of the first material layer of the first barrier portion away from the first substrate side, a third material of the third material layer of the first barrier portion having a greater adhesion with a first material of the first material layer of the first barrier portion than a second material of the second material layer of the first barrier portion, and the third material of the third material layer of the first barrier portion having a greater adhesion with the second material of the second material layer of the first barrier portion than the first material of the first material layer of the first barrier portion and the second material of the second material layer of the first barrier portion; or before the forming a second material layer of the first barrier portion on a surface of the first material layer of the first barrier portion away from the first substrate side, the method further comprises: bombarding a surface of the first material layer of the first barrier portion away from the first substrate side to form a pore structure; or before the forming a second material layer of the first barrier portion on a surface of the first material layer of the first barrier portion away from the first substrate side, the method further comprises: forming a surface of the first material layer of the first barrier portion and the second material layer of the first barrier portion to be conformed to each other into a tooth-shaped structure.

14. The method of claim 11, wherein, the forming the second material layer of the second barrier portion on a surface of the first material layer of the second barrier portion away from the second substrate side, the method further comprises: forming a third material layer of the second barrier portion on a surface of the first material layer of the second barrier portion away from the first substrate side, a third material of the third material layer of the second barrier portion having a greater adhesion with a first material of the first material layer of the second barrier portion than a second material of the second material layer of the second barrier portion, and the third material of the third material layer of the second barrier portion having a greater adhesion with the second material of the second material layer of the second barrier portion than the first material of the first material layer of the second barrier portion and the second material of the second material layer of the second barrier portion; or before the forming the second material layer of the second barrier portion on a surface of the first material layer of the second barrier portion away from the second substrate side, the method further comprises: bombarding a surface of the first material layer of the second barrier portion away from the first substrate side to form a pore structure; or before the forming the second material layer of the second barrier portion on a surface of the first material layer of the second barrier portion away from the second substrate side, the method further comprises: forming a surface of the first material layer of the second barrier portion and the second material layer of the second barrier portion to be conformed to each other into a tooth-shaped structure.

15. A display device comprising: A reflective display panel comprising any one of claims 1-8. A reflective display panel comprising any one of claims 1-8.

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