Drawing data generation method and multi-charged particle beam drawing apparatus

Abstract

The present invention relates to a drawing data generation method and a multi-charged particle beam drawing apparatus, and generates drawing data used in the multi-charged particle beam drawing apparatus. In this drawing data generation method, a plurality of control points representing the curve and a plurality of vertices of the curve and the straight line included in the design data are calculated for a figure including the curve and the straight line, and the positions of the respective control points and the respective vertices are represented by displacements from adjacent control points or vertices, thereby generating the drawing data.

Description

[0001] This invention is a divisional application of the Chinese patent application with the application number 201910972026.5 and the invention title "Drawing Data Generation Method and Multi-Charged Particle Beam Drawing Device" submitted by the applicant on October 14, 2019. Technical Field

[0002] This invention relates to a drawing data generation method and a multi-charged particle beam drawing device. Background Art

[0003] With the high integration of LSIs, the circuit line widths required for semiconductor devices have been miniaturized year by year. To form a desired circuit pattern on a semiconductor device, a method is adopted in which a high-precision original pattern (mask, or especially the original pattern used in a step exposure device or a scanning exposure device is also called an intermediate mask) formed on quartz is reduced and transferred onto a wafer using a reduction projection exposure device. The high-precision original pattern is drawn by an electron beam drawing device using a so-called electron beam exposure technique.

[0004] As an electron beam drawing device, for example, a multi-beam drawing device that uses multiple beams irradiated at once by multiple beams and has an increased throughput is known. In this multi-beam drawing device, for example, an electron beam emitted from an electron gun forms multiple beams by passing through a diaphragm member having multiple holes, and each beam is subjected to blanking control in a blanking plate. The unblocked electron beam is reduced by an optical system and irradiated to a desired position on a mask to be drawn.

[0005] In the case of performing electron beam drawing using a multi-beam drawing device, first, the layout of a semiconductor integrated circuit is designed, and design data is generated as layout data. Further, the polygonal graphics included in the design data are divided into multiple trapezoids, and thus drawing data input to the multi-beam drawing device is generated. This drawing data sets one vertex as a configuration origin for each trapezoid and has the coordinate data of this configuration origin and the data indicating the displacements from the configuration origin to the other three vertices.

[0006] When the design data includes a graphic having a curve such as an elliptical graphic or a graphic mixed with curves and straight lines, the graphic is approximated as a polygon to produce drawing data. If the approximation is performed with high precision, there is a problem that the number of vertices or the number of graphics increases and the data volume of the drawing data becomes huge. Summary of the Invention

[0007] This invention provides a drawing data generation method and a multi-charged particle beam drawing device that can generate drawing data that can suppress the data volume and the calculation amount in a multi-charged particle beam drawing device based on design data including a graphic mixed with curves and straight lines.

[0008] A method for generating drawing data according to an aspect of the present invention is to generate drawing data used in a multi-charged particle beam drawing apparatus. In this method, for a figure including curves and straight lines included in design data, a plurality of control points representing the curves, the curves, and a plurality of vertices of the straight lines are calculated, and the positions of each control point and each vertex are represented by displacements from adjacent control points or vertices, thereby generating the drawing data. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Figure 1 It is a schematic diagram of a multi-charged particle beam drawing apparatus according to an embodiment of the present invention.

[0010] Figure 2 It is a flowchart for explaining a method for generating drawing data according to this embodiment.

[0011] Figure 3 It is a diagram showing an example of the representation of a figure mixed with curves and straight lines.

[0012] Figure 4 It is a diagram showing an example of the data structure of drawing data.

[0013] Figure 5 It is a diagram showing an example of a border.

[0014] Figure 6 It is a diagram showing an example of the data structure of drawing data based on another embodiment.

[0015] Figure 7 It is a schematic structural diagram of a pattern inspection apparatus. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0016] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0017] Figure 1 It is a schematic diagram of a multi-charged particle beam drawing apparatus that performs drawing using drawing data based on this embodiment. In this embodiment, a structure using an electron beam as an example of a charged particle beam is described. However, the charged particle beam is not limited to an electron beam, and may be other charged particle beams such as an ion beam.

[0018] Figure 1 The illustrated drawing apparatus 1 includes: a drawing unit 10 that irradiates an object such as a mask or a wafer with an electron beam to draw a desired pattern; and a control unit 50 that controls the drawing operation performed by the drawing unit 10. The drawing unit 10 includes an electron beam column 12 and a drawing chamber 30.

[0019] Inside the electron beam column 12, an electron gun 14, an illumination lens 16, a diaphragm member 18, a blanking plate 20, a reduction lens 22, a limiting diaphragm member 24, an objective lens 26, and a deflector 28 are arranged. An XY stage 32 is arranged inside the drawing chamber 30. A mask substrate 34 as a drawing object substrate is placed on the XY stage 32. As an object, for example, it includes a wafer or a mask for exposure that transfers a pattern onto a wafer using a reduction projection exposure apparatus such as a stepper exposure apparatus or a scanning exposure apparatus using an excimer laser as a light source, or an extreme ultraviolet exposure apparatus. Also, the drawing object substrate may, for example, also include a mask on which a pattern has already been formed. For example, a Levinson type mask requires two drawings, so sometimes a second pattern is drawn on an object processed on the mask in one drawing. On the XY stage 32, a mirror 36 for position measurement of the XY stage 32 is also arranged.

[0020] The control unit 50 includes a control computer 52, deflection control circuits 54, 56, and a stage position detector 58. The control computer 52, the deflection control circuits 54, 56, and the stage position detector 58 are interconnected via a bus.

[0021] The electron beam 40 emitted from the electron gun 14 illuminates the entire diaphragm member 18 substantially perpendicularly with the aid of the illumination lens 16. In the diaphragm member 18, holes (openings) are formed in a matrix at a predetermined arrangement pitch. The electron beam 40 illuminates an area including all the holes of the diaphragm member 18. A part of the electron beam 40 passes through the above-mentioned multiple holes respectively, thereby forming Figure 1 the multi-beams 40a to 40e as shown.

[0022] In the blanking plate 20, through holes are formed corresponding to the arrangement positions of the respective holes of the diaphragm member 18, and blankers each composed of a pair of two electrodes are arranged in the respective through holes. The electron beams 40a to 40e passing through the respective through holes are deflected independently by the voltage applied by the blankers. Blanking control is performed through the above-mentioned deflection. In this way, the multiple blankers perform blanking deflection of the corresponding beams in the multi-beams after passing through the multiple holes of the diaphragm member 18.

[0023] The multi-beams 40a to 40e after passing through the blanking plate 20 are reduced by the reduction lens 22 and advance toward the central hole formed in the limiting diaphragm member 24. Here, the position of the electron beam deflected by the blanker of the blanking plate 20 deviates from the central hole of the limiting diaphragm member 24 and is blocked by the limiting diaphragm member 24. On the other hand, the electron beam not deflected by the blanker of the blanking plate 20 passes through the central hole of the limiting diaphragm member 24.

[0024] In this way, the aperture member 24 restricts each of the light beams deflected in such a manner that the blanker of the blanking plate 20 is shielded to be in a light beam cutoff state. Further, the light beams that pass through the aperture member 24 during the period from when the light beam is turned on to when it is turned off become the light beams for single exposure. The multi-light beams 40a to 40e that pass through the aperture member 24 are focused by the objective lens 26 to form a pattern image with a desired reduction ratio. Each of the light beams (the entire multi-light beam) that passes through the aperture member 24 is deflected in the same direction all at once by the deflector 28 and is irradiated onto the respective irradiation positions on the mask substrate 34 of each light beam.

[0025] When the XY stage 32 moves continuously, the irradiation position of the light beam is controlled by the deflector 28 so as to follow the movement of the XY stage 32. The movement of the XY stage 32 is carried out by a stage control unit (not shown), and the position of the XY stage 32 is detected by the stage position detector 58.

[0026] The multi-light beams for single irradiation are arranged at intervals obtained by multiplying the arrangement pitch of the multiple holes of the aperture member 18 by the above-described desired reduction ratio in an ideal state. This drawing apparatus performs a drawing operation in a raster scan mode of continuously and sequentially irradiating exposure light beams. When drawing a desired pattern, the light beams required according to the pattern are controlled to be light beam on through blanking control. When the XY stage 32 moves continuously, the irradiation position of the light beam is controlled by the deflector 28 so as to follow the movement of the XY stage 32.

[0027] The control computer 52 reads out the drawing data D1 from the storage device 60 and performs a multi-level data conversion process to generate exposure data inherent to the device. The exposure data defines the irradiation amount and irradiation position coordinates for each exposure, etc. For example, the control computer 52 assigns the graphic pattern defined in the drawing data to the corresponding pixels. Further, the control computer 52 calculates the area density of the graphic pattern arranged for each pixel.

[0028] The control computer 52 calculates the irradiation amount of the electron beam for each exposure for each pixel. For example, the irradiation amount proportional to the area density of the pixel is obtained, and the irradiation amount is corrected in consideration of dimensional variations due to proximity effects, blurring effects, loading effects, etc.

[0029] The control computer 52 outputs the irradiation amount for each exposure to the deflection control circuit 54 based on the exposure data. The deflection control circuit 54 divides the input irradiation amount by the current density to obtain the irradiation time t. Further, during the corresponding exposure, the deflection control circuit 54 applies a deflection voltage to the corresponding blanker of the blanking plate 20 so that the blanker conducts the light beam for the irradiation time t.

[0030] Further, the control computer 52 outputs the deflection position data to the deflection control circuit 56 so that each light beam is deflected toward the position (coordinates) indicated by the exposure data. The deflection control circuit 56 calculates the deflection amount and applies a deflection voltage to the deflector 28. Thereby, the multiple light beams for this exposure are deflected together.

[0031] Next, the method for generating the drawing data D1 will be described according to Figure 2 the flowchart shown. First, the layout of the semiconductor integrated circuit is designed to generate design data (CAD data) D0 as the layout data and input it to the conversion device 70 (step S1). Further, the design data D0 is converted by the conversion device 70 to generate the drawing data D1 input to the control computer 52 of the drawing device 1.

[0032] The design data D0 includes a figure having sides with curves and sides with straight lines mixed therein. The conversion device 70 calculates a plurality of control points for expressing the curve (parametric curve representation) for the curve portion and obtains information on the positions or curve types of the control points (step S2). The conversion device 70 obtains the displacements from adjacent control points for each control point (step S3). Further, the conversion device 70 extracts the straight line portion and obtains the displacement from one end to the other end of the straight line (step S4). Furthermore, the conversion device 70 expresses the positions of the control points in terms of the displacements from adjacent control points in a manner of surrounding the figure once starting from one vertex (figure arrangement origin), and expresses the position of the vertex at one end of the straight line in terms of the displacement from the position of the vertex at the other end, thereby defining the information related to each side and generating the drawing data D1 (step S5).

[0033] Figure 3 An example of a figure having curves and straight lines mixed therein is shown. This figure is surrounded by curves C1, C2 and straight lines S1 to S11.

[0034] In Figure 3 the example shown, the curve C1 is represented (approximated) by a curve defined by four control points P0, P1, P2, P3. As the type of curve, for example, a B-spline curve or a Bezier curve can be used. The conversion device 70 calculates the control points of the curve portion of the figure and expresses the positions of the control points in terms of the displacements from adjacent control points, thereby generating the drawing data D1.

[0035] For example, in Figure 3 the example shown, the coordinates (x0, y0) of the vertex (control point) P0 are defined as the figure arrangement origin of this figure.

[0036] The position of the control point P1 that follows the control point P0 (the one after the control point P0) among the control points of the curve C1 is defined by the displacement δx1 in the x direction and the displacement δy1 in the y direction observed from the control point P0.

[0037] The position of control point P2 that follows control point P1 is defined by the displacement δx2 in the x direction and the displacement δy2 in the y direction as observed from control point P1.

[0038] The position of control point P3 that follows control point P2 is defined by the displacement δx3 in the x direction and the displacement δy3 in the y direction as observed from control point P2. In this way, the positions of the control points of the curved portion are successively defined by the displacement in the x direction and the displacement in the y direction as observed from the previous control point.

[0039] Line S1 is connected to curve C1 at vertex (control point) P3. Line S1 connects vertex P3 and vertex P4. The position of vertex P4 is defined by the displacement δx4 in the x direction and the displacement δy4 in the y direction as observed from vertex P3. The transformation device 70 represents line S1 using the positions of vertex P3 and vertex P4 and the information that vertex P3 and vertex P4 are connected by a line, and generates drawing data D1.

[0040] Line S2 is connected to line S1 at vertex P4. Line S2 connects vertex P4 and vertex P5. The position of vertex P5 is defined by the displacement δx5 in the x direction and the displacement δy5 in the y direction as observed from vertex P4. The transformation device 70 represents line S2 using the positions of vertex P4 and vertex P5 and the information that vertex P4 and vertex P5 are connected by a line, and generates drawing data D1.

[0041] Line S3 is connected to line S2 at vertex P5. Line S3 connects vertex P5 and vertex P6. The position of vertex P6 is defined by the displacement δx6 in the x direction and the displacement δy6 in the y direction as observed from vertex P5. The transformation device 70 represents line S3 using the positions of vertex P5 and vertex P6 and the information that vertex P5 and vertex P6 are connected by a line, and generates drawing data D1.

[0042] Line S4 is connected to line S3 at vertex P6. Line S4 connects vertex P6 and vertex P7. The position of vertex P7 is defined by the displacement δx7 in the x direction and the displacement δy7 in the y direction as observed from vertex P6. The transformation device 70 represents line S4 using the positions of vertex P6 and vertex P7 and the information that vertex P6 and vertex P7 are connected by a line, and generates drawing data D1.

[0043] Line S5 is connected to line S4 at vertex P7. Line S5 connects vertex P7 and vertex P8. The position of vertex P8 is defined by the displacement δx8 in the x direction and the displacement δy8 in the y direction as observed from vertex P7. The transformation device 70 represents line S5 using the positions of vertex P7 and vertex P8 and the information that vertex P7 and vertex P8 are connected by a line, and generates drawing data D1.

[0044] The vertex P8 on one end side of the straight line S6 is connected to the straight line S5. The other end of the straight line S6 is connected to one end of the straight line S7, and the straight line S6 is perpendicular to the straight line S7. The position of the vertex P9 at the other end of the straight line S7 is defined by the displacement δx9 in the x direction and the displacement δy9 in the y direction observed from the vertex P8. The transformation device 70 represents the straight lines S6 and S7 using the information of the positions of the vertex P8 and the vertex P9 and the fact that the vertex P8 and the vertex P9 are connected by a straight line of a right angle type (Manhattan type), and generates the drawing data D1.

[0045] The vertex P9 on one end side of the straight line S8 is connected to the straight line S7. The other end of the straight line S8 is connected to one end of the straight line S9, and the straight line S8 is perpendicular to the straight line S9. The position of the vertex P10 at the other end of the straight line S9 is defined by the displacement δx10 in the x direction and the displacement δy10 in the y direction observed from the vertex P9. The transformation device 70 represents the straight lines S8 and S9 using the information of the positions of the vertex P9 and the vertex P10 and the fact that the vertex P9 and the vertex P10 are connected by a straight line of a right angle type (Manhattan type), and generates the drawing data D1.

[0046] The vertex P10 on one end side of the straight line S10 is connected to the straight line S9. The other end of the straight line S10 is connected to one end of the straight line S11, and the straight line S10 is perpendicular to the straight line S11. The position of the vertex P11 at the other end of the straight line S11 is defined by the displacement δx11 in the x direction and the displacement δy11 in the y direction observed from the vertex P10. The transformation device 70 represents the straight lines S10 and S11 using the information of the positions of the vertex P10 and the vertex P11 and the fact that the vertex P10 and the vertex P11 are connected by a straight line of a right angle type (Manhattan type), and generates the drawing data D1.

[0047] The curve C2 connects the vertices P0 and P11 and is represented (approximated) by a curve defined by five control points P11, P12, P13, P14, P0. The position of the control point P12 following the control point (vertex) P11 is defined by the displacement δx12 in the x direction and the displacement δy12 in the y direction observed from the control point P11.

[0048] The position of the control point P13 following the control point P12 is defined by the displacement δx13 in the x direction and the displacement δy13 in the y direction observed from the control point P12.

[0049] The position of the control point P14 following the control point P13 is defined by the displacement δx14 in the x direction and the displacement δy14 in the y direction observed from the control point P13.

[0050] The control point P0 following the control point P14 is the origin of the graphic configuration.

[0051] Figure 4An example of the data structure of the drawing data D1 that defines a figure mixed with curves and straight lines is shown. The drawing data D1 has a header and a body. The header defines a figure code (Code), the number of segments (N), and other information.

[0052] The figure code is information indicating what kind of figure is defined. In the case of a figure mixed with curves and straight lines, information indicating "edge mixing type" is recorded in the figure code.

[0053] The transformation device 70 divides the curve part and the straight line part into different segments to generate the drawing data D1. Also, the transformation device 70 aggregates the continuous parts of straight lines of any angle type (non-right angle type) into 1 segment. Similarly, the transformation device 70 aggregates the continuous parts of straight lines of right angle type into 1 segment.

[0054] In Figure 3 In the example of the figure shown, the position information of the control points P1 to P3 used to represent the curve C1 is classified as the first segment. The position information of the vertices P4 to P8 of the straight lines S1 to S5 of any angle type is classified as the second segment. The position information of the vertices P9 to P11 of the straight lines S6 to S11 of right angle type is classified as the third segment. The position information of the control points P12 to P14 used to represent the curve C2 is classified as the fourth segment.

[0055] In the other information, the size w, h of the smallest rectangle (border) that encloses the figure as shown in Figure 5 is defined. Since there is border information, it is possible to easily determine whether there is an overlap with other figures. Also, parameters for determining a parametric curve such as curve type, degree, knot vector information, and endpoint information are set.

[0056] In the body part, first, the coordinates (x0, y0) of the figure configuration position origin P0 are recorded. Continuing from the figure configuration position origin, the information of each segment is defined in sequence.

[0057] At the segment header SH of each segment, the number of points n, edge type, bit length, and border size are defined. The number of points n indicates the number of control points or vertices included in the segment. For example, the number of points n of the first segment is 3, and the number of points n of the second segment is 5.

[0058] The edge type indicates the type of the edge represented (curve, straight line of any angle type, or straight line of right angle type). The bit length indicates the data length of the position information (displacement information) of the vertex or control point. The border size indicates the size of the border that encloses the edge defined in this segment.

[0059] In the first paragraph, in the paragraph header, it is defined as the case of the curve type. Following the paragraph header, the position information of the control points P1 to P3 is defined. Specifically, as the position information of the control point P1, the displacement δx1 in the x direction and the displacement δy1 in the y direction observed from the graphic configuration origin (x0, y0) are defined. As the position information of the control point P2, the displacement δx2 in the x direction and the displacement δy2 in the y direction observed from the control point P1 are defined. As the position information of the control point P3, the displacement δx3 in the x direction and the displacement δy3 in the y direction observed from the control point P2 are defined.

[0060] In the second paragraph, in the paragraph header, it is defined as the case of a straight line of the arbitrary angle type. Following the paragraph header, the position information of the vertices P4 to P8 is defined in sequence. The position information of the vertices is the displacement in the x direction and the displacement in the y direction from the previous vertex.

[0061] In the third paragraph, in the paragraph header, it is defined as the case of a straight line of the right angle type. Following the paragraph header, the position information of the vertices P9 to P11 is defined in sequence. The position information of the vertices is the displacement in the x direction and the displacement in the y direction from the previous vertex.

[0062] In the fourth paragraph, in the paragraph header, it is defined as the case of the curve type. Following the paragraph header, the position information of the control points P12 to P14 is defined in sequence. The position information of the control points is the displacement in the x direction and the displacement in the y direction from the previous control point.

[0063] If the part surrounded by the curve is approximated by a polygon as in the conventional method, the number of vertices is large and the amount of drawing data is huge.

[0064] On the other hand, in the present embodiment, a parametric curve using a plurality of control points is used to represent the curved portion of the graphic. The number of control points is smaller than the number of vertices in the case of approximating the curve by a polygon, so that the amount of drawing data D1 can be reduced.

[0065] The control computer 52 reads the drawing data D1 and reconstructs the graphic. For example, the control computer 52 determines the position of the control point P0 that becomes the origin of the graphic configuration position according to the coordinates (x0, y0) of the drawing data D1.

[0066] The control computer 52 sequentially calculates the positions of the control points P1 to P3 according to the information defined in the first paragraph, and calculates the curve C1.

[0067] Next, the control computer 52 calculates the positions of the vertices P4 to P8 according to the information defined in the second paragraph, and calculates the straight lines S1 to S5.

[0068] Next, the control computer 52 calculates the positions of vertices P9 to P11 based on the information defined in Paragraph 3, and calculates straight lines S6 to S11 that connect the vertices with right-angle type edges.

[0069] Next, the control computer 52 calculates the positions of control points P12 to P14 based on the information defined in Paragraph 4, and calculates curve C2 that connects vertex P0 and P11. Thus, the figure surrounded by curve C1, C2, and straight lines S1 to S11 is reconstructed.

[0070] In this way, the drawing data D1 representing a figure mixed with curves and straight lines is easy to process within the control computer 52 of the drawing device 1, and the calculation amount can be suppressed. Since the drawing device 1 corresponds to the curve format, curves can be processed in the upstream data channel including OPC (Optical Proximity Correction), and even in the upstream process, TAT (Turn Around Time) can be shortened.

[0071] In the above embodiment, an example of generating the drawing data D1 by dividing the curve part and the straight line part into different segments and defining the edge type at the segment head has been described. However, as Figure 6 shown, it is also possible to sequentially define a flag indicating the type of the edge to which each vertex (control point) belongs and the displacement from the previous 1 vertex (control point) in a manner of surrounding the figure once from the figure configuration origin. In this case, N at the head represents the total number of vertices and control points.

[0072] For example, when the flag is 0, it represents a Manhattan type (right-angle type straight line), when it is 1, it represents an arbitrary angle type straight line, and when it is 2, it represents a curve.

[0073] Since control points P1 to P3 are points for representing a curve, the flag is 2. Since vertices P4 to P8 are points for representing an arbitrary angle type straight line, the flag is 1. Since vertices P9 to P11 are points for representing a right-angle type straight line, the flag is 0. Since control points P12 to P14 are points for representing a curve, the flag is 2.

[0074] The drawing data D1 generated by the transformation device 70 based on the above embodiment can be input to the pattern inspection device. For example, as Figure 7 shown, the pattern inspection device 80 is input with the drawing data D1 (the first drawing data) generated by the transformation device 70, and the drawing data D2 (the second drawing data) created based on the pattern actually drawn on the drawing object substrate by the drawing device 1 according to the drawing data D1 as Figure 1 shown. The drawing data D2 is input to the pattern inspection device 80 from a storage device (not shown) via a wired or wireless network.

[0075] The pattern inspection device 80 inspects the pattern actually drawn on the drawing target substrate by the drawing device 1 based on the input drawing data D1 and D2. In this inspection, for example, an inspection is performed in which the drawing data D1 is compared with the drawing data D2. In addition, various information such as drawing conditions is also used in the inspection.

[0076] Since the amount of data of the drawing data D1 generated by the conversion device 70 is small and data processing is easy, the processing efficiency of the pattern inspection device 80 can be improved.

[0077] The conversion device 70 may be provided in the pattern inspection device 80. In this case, the pattern inspection device 80 includes: a conversion unit that generates drawing data D1 based on the input design data D0; and an inspection unit that compares the drawing data D1 with the drawing data D2 to inspect the pattern actually drawn on the drawing target substrate.

[0078] The generation of the drawing data D1 implemented by the above-described embodiment may also be performed in the control computer 52 of the drawing device 1.

[0079] In the above-described embodiment, at least a part of the conversion device 70 that generates the drawing data D1 may be configured by hardware or by software. In the case of being configured by software, a program that implements at least a part of the functions of the conversion device 70 may be stored in a storage medium such as a floppy disk or a CD-ROM, and the computer may read and execute it. The storage medium is not limited to a detachable storage medium such as a magnetic disk or an optical disk, and may also be a fixed storage medium such as a hard disk device or a memory.

[0080] Furthermore, a program that implements at least a part of the functions of the conversion device 70 may be distributed via a communication line such as the Internet (including wireless communication). In addition, the program may be encrypted or modulated and distributed in a compressed state via a wired line or a wireless line such as the Internet or stored in a storage medium.

[0081] In addition, the present invention is not limited to the above-described embodiment itself, and constituent elements can be deformed and embodied within the scope not departing from the gist thereof at the implementation stage. And, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the above-described embodiment. For example, several constituent elements may be deleted from all the constituent elements shown in the embodiment. In addition, constituent elements of different embodiments may be appropriately combined.

Claims

1. A drawing data generation method for generating drawing data used in a multi-charged particle beam drawing apparatus, characterized in that: calculate multiple control points representing the curve and multiple vertices of the curve and the straight line in the design data for a figure including a curve and a straight line, so that the control points at both ends of the curve representing the curve coincide with the vertices located at both ends of the curve; divide different segments on the curve and the straight line, and represent the positions of each control point and each vertex by displacements from adjacent control points or vertices, thereby generating the drawing data.

2. The drawing data generation method according to claim 1, characterized in that: starting from the origin of the figure, in a manner of surrounding the figure once, sequentially define a curve portion formed by the curve and a straight line portion formed by the straight line, thereby generating the drawing data.

3. The drawing data generation method according to claim 1, characterized in that: define size information of a rectangle surrounding the figure in the drawing data.

4. The drawing data generation method according to claim 1, characterized in that: the drawing data has: displacement information from adjacent control points or vertices for each of the control points or the vertices; and edge type information indicating the curve or the straight line.

5. The drawing data generation method according to claim 4, characterized in that: the edge type information indicating the curve represents a B-spline curve or a Bezier curve.

6. The drawing data generation method according to claim 4, characterized in that: the edge type information indicating the straight line represents an arbitrary angle type or a right angle type.

7. The drawing data generation method according to claim 4, characterized in that: there are multiple types of the edge type information indicating the straight line, and further divide into the different segments according to the multiple types of the edge type information indicating the straight line to generate the drawing data.

8. A multi-charged particle beam drawing device, characterized in that, Comprising: a drawing unit that forms a multi-beam composed of multiple charged particle beams, and independently conducts / cuts off the beams corresponding to the respective beams in the multi-beam, and irradiates the charged particle beams onto an object to draw a pattern; and a control unit that is input with drawing data, which is drawing data of a figure including a curve and a straight line in the design data, in which the positions of multiple control points where the control points at both ends of the curve representing the curve coincide with the vertices located at both ends of the curve, and the multiple vertices of the curve and the straight line are represented by displacements from adjacent control points or vertices, the multiple control points are multiple control points representing the curve that are divided into different segments on the curve and the straight line, the control unit calculates the positions of the multiple control points or the multiple vertices using the displacements, reconstructs the figure using the curve and the straight line obtained based on the calculated positions of the multiple control points or the multiple vertices, and performs data transformation processing on the reconstructed figure to control the drawing unit.

9. The multi-charged particle beam drawing apparatus according to claim 8, characterized in that: The above-described drawing data has: Displacement information starting from adjacent control points or vertices for each of the above control points or the above vertices; and Edge type information indicating the above curve or straight line, There are multiple types of edge type information indicating the above straight line, and the above drawing data is data further divided into the above different segments according to the multiple types of edge type information indicating the above straight line.

10. The multi-charged particle beam drawing device according to claim 9, wherein The multiple types of edge type information indicating the above straight line are arbitrary angle types or right angle types.

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