Touch sensor

Abstract

A touch sensor includes first sensing electrode units formed in a first direction on a substrate, and second sensing electrode units formed in a second direction intersecting the first direction on the substrate. A plurality of micro-etching patterns are formed on boundaries of unit transparent electrodes constituting the first sensing electrode units and the second sensing electrode units. The unit transparent electrodes have shapes in which a portion of a curve connecting vertices of a polygon is removed, and adjacent unit transparent electrodes are electrically connected to each other. The touch sensor includes a segmentation pattern that divides the first sensing electrode units or the second sensing electrode units into two or more regions.

Description

TECHNICAL FIELD

[0001] The present invention relates to a touch sensor. In particular, the present invention relates to a touch sensor capable of blocking or minimizing visibility of a segmented pattern formed on a sensing electrode for separate driving. BACKGROUND

[0002] The touch sensor includes a sensing electrode for sensing a touch operation of a user. The sensing electrode can include a plurality of sensing electrode units (sensing units) arranged to cross each other. The sensing electrode can be divided into a sensing region in which the sensing electrode units exist and an inter-cell region in which the sensing electrode units do not exist.

[0003] The sensing region and the inter-cell region can have different optical characteristics, such as transmittance and reflectance. Thus, the sensing region and the inter-cell region are distinguished, which causes a problem of being unnecessarily distinguished by the user.

[0004] To solve this problem, Korean Patent Registration No. 10-1952770 (Touch sensor) minimizes the difference in optical characteristics between the sensing region and the inter-cell region by forming a fine pattern on the sensing electrode unit. Thereby, Korean Patent Registration No. 10-1952770 prevents or minimizes the sensing region from being unnecessarily distinguished by the user.

[0005] Meanwhile, a large-area touch sensor adopts a method of separately driving the touch sensor. The sensing electrode unit is divided into a first region and a second region that are separately driven. At a boundary of the divided first region and the second region, a segmented pattern is formed to penetrate the sensing electrode unit upward and downward and to physically and electrically separate the sensing electrode unit.

[0006] Figure 1A And Figure 1B are a plan view and a perspective view showing a conventional touch sensor in which a segmented pattern is configured in a line shape.

[0007] As shown in Figure 1A And Figure 1B , the conventional touch sensor for separate driving configures a segmented pattern P1 as an integrated segmented etching portion SH1 in a line form, which divides the sensing electrode unit 10 into a first region A11 and a second region A12. However, the segmented pattern P1 in the line form is distinguished in visibility from the sensing electrode unit 10 having a specific pattern, such as a sensing electrode unit in which a micro-etching pattern in which a boundary is formed with a pattern etching portion PH is arranged in a damascene structure. Thus, a problem can occur in which the segmented pattern P1 in the line form is distinguished by the user. SUMMARY

[0008]

Technical Problem

[0009] An object of the present application is to prevent or minimize the recognition of a segmentation pattern formed for separate driving in a large-area touch sensor.

[0010] Another object of the present application is to make a split stitching exposure method used in manufacturing a large-area touch sensor easy to apply.

[0011]

Technical Solution

[0012] A touch sensor of the present application for achieving the object includes first sensing electrode units formed on a substrate in a first direction, and second sensing electrode units formed on the substrate in a second direction crossing the first direction. A plurality of micro-etching patterns are formed on boundaries of unit transparent electrodes constituting the first sensing electrode units and the second sensing electrode units. The unit transparent electrodes have shapes in which a part of a curve connecting vertices of a polygon is removed. Adjacent unit transparent electrodes are electrically connected to each other. The touch sensor of the present application includes a segmentation pattern that divides the first sensing electrode units or the second sensing electrode units into two or more regions.

[0013] In the touch sensor of the present application, the segmentation pattern can be etched in an island shape along the boundaries of the unit transparent electrodes.

[0014] In the touch sensor of the present application, the segmentation pattern can be formed to have a width equal to or greater than a width of the micro-etching pattern.

[0015] In the touch sensor of the present application, the segmentation pattern can vertically divide the first sensing electrode units or the second sensing electrode units.

[0016] In the touch sensor of the present application, the segmentation pattern can horizontally divide the first sensing electrode units or the second sensing electrode units.

[0017] In the touch sensor of the present application, the segmentation pattern can be formed in the same process as the micro-etching pattern.

[0018] In the touch sensor of the present application, the segmentation pattern can be formed of one or more lines.

[0019] In the touch sensor of the present application, the segmentation pattern can have the same spatial frequency as the micro-etching pattern.

[0020] The touch sensor of the present application can include a bridge electrode unit connecting two second sensing electrode units adjacent to each other with a first sensing electrode unit interposed therebetween. An electrode interstitial void is formed between the first and second sensing electrode units. The electrode interstitial void has the same shape as the unit transparent electrode. The electrode interstitial void is insulated from the unit transparent electrode. The plurality of unit transparent electrodes divided by the micro-etching pattern can have a mosaic structure.

[0021] The touch sensor of the present application can include an insulating layer formed on a substrate on which the first sensing electrode unit is formed. The second sensing electrode unit can be formed on the insulating layer.

[0022] In the touch sensor of the present application, the curve can be one or more selected from the group consisting of a sinusoidal curve, a cosinusoidal curve, a conic curve, a catenary, a tractrix, a trochoid, a cycloid, a cardioid.

[0023] In the touch sensor of the present application, the curve can be a curve continuously connecting vertices of a polygon, or a curve partially formed by discontinuously connecting vertices of a polygon.

[0024] In the touch sensor of the present application, the boundary of the unit transparent electrode can have a shape in which a portion of a curve connecting two adjacent vertices of six vertices of a hexagon is removed.

[0025] In the touch sensor of the present application, the boundary of the unit transparent electrode can have a shape in which a portion of a curve connecting two adjacent vertices of four vertices of a rectangle arranged in a grid structure is removed.

[0026] In the touch sensor of the present application, the boundary of the unit transparent electrode can have a shape in which a portion of a curve connecting two adjacent vertices of four vertices of a rectangle arranged in a zigzag structure is removed.

[0027] In the touch sensor of the present application, the boundary of the unit transparent electrode can have a shape in which a portion of a curve connecting two adjacent vertices of four vertices of a rhombus is removed.

[0028] In the touch sensor of the present application, the pitch of the unit transparent electrode can be 100 μm to 500 μm

[0029] In the touch sensor of the present application, the width of the micro-etching pattern can be 5 μm to 20 μm.

[0030] In the touch sensor of the present application, the width of the connecting portion connecting adjacent unit transparent electrodes can be 20 μm to 60 μm.

[0031] In the touch sensor of the present application, by inserting a plurality of dummy patterns having the same spatial frequency as the micro-etching pattern between the first and second sensing electrode units, the same high frequency component can be provided on the entire surface of the touch sensor. Thus, the same high frequency component provided on the entire surface of the touch sensor makes it impossible to recognize the touch sensor pattern.

[0032] [Advantages]

[0033] In the present application, when a segmented pattern is formed on a sensing electrode unit to divide the touch sensor into a plurality of regions and is driven in a large-area touch sensor, it is possible to prevent or minimize recognition of the segmented pattern by providing the segmented pattern with the same shape as a micro-etching pattern forming a boundary of a unit transparent electrode.

[0034] In the present application, by forming the micro-etching pattern of the sensing electrode unit and the segmented pattern for separate driving in the same pattern and the same spatial frequency, it is easy to apply a split stitching exposure method used when forming a large-area touch sensor.

[0035] Further, in the present application, when the touch sensor is combined with a display panel, it is possible to solve the problem in which an optical interference pattern is generated due to interference between a pixel array of the display panel and a pixel array of the touch sensor to be expressed in a moire form, thereby reducing optical quality of an imaging device. BRIEF DESCRIPTION OF DRAWINGS

[0036] Figure 1A and Figure 1B is a plan view and a perspective view of a conventional touch sensor in which a segmented pattern is formed in a linear shape.

[0037] Figure 2A and Figure 2B is a plan view and a perspective view of a touch sensor according to the present application in which a segmented pattern is formed in an island shape spaced apart.

[0038] Figure 3A and Figure 3B is a plan view and a perspective view showing a modified form of a touch sensor according to the present application in which a segmented pattern is formed in an island shape spaced apart.

[0039] [REFERENCE NUMERALS]

[0040] 10, 100, 300: sensing electrode unit 20, 200, 400: substrate

[0041] PH: pattern etching portion P1: conventional segmented pattern

[0042] P2, P3: segmented pattern of the present application

[0043] SH1: conventional segmented etching part

[0044] SH2, SH3: segmented etching part of the present application. DETAILED DESCRIPTION

[0045] Hereinafter, the present application will be described in detail with reference to the accompanying drawings.

[0046] Korean Patent Registration No. 10-1952770 (Touch Sensor) as a prior art document was filed and registered by the same applicant as the present application, and the description of Korean Patent Registration No. 10-1952770 is incorporated herein as a part of the present application to the extent that it does not conflict with the present application.

[0047] Figure 2A and Figure 2B are a plan view and a perspective view of a touch sensor according to the present application in which a segmented pattern is formed as islands spaced apart.

[0048] Referring to Figure 2A and Figure 2B , a touch sensor according to the present application can include a substrate 200, a sensing electrode, etc.

[0049] The substrate 200 is a base of the sensing electrode, and for example, can be constituted of a cyclo-olefin polymer (COP), polycarbonate, polyethylene terephthalate (PET), polymethyl methacrylate, polyimide, polyethylene naphthalate, polyether sulfone, etc.

[0050] When the touch sensor is manufactured by a transfer method, the substrate 200 can be a separation layer, a protection layer, or a laminate of the separation layer and the protection layer.

[0051] The separation layer can be constituted of an organic polymer film, for example, polyimide, polyvinyl alcohol, polyamide acid, polyamide, polyethylene, polystyrene, polynorbornene, etc.

[0052] The protection layer can include at least one of an organic insulating layer or an inorganic insulating layer, and it can be formed by coating / curing or deposition.

[0053] The sensing electrode, for example, can include a plurality of sensing electrode units 100 regularly arranged and connected horizontally and vertically on the substrate 200. Here, the sensing electrode unit 100 serves the same meaning as a sensing cell. The sensing electrode unit 100 can have various shapes, for example, a triangle, a quadrangle, a pentagon, and a hexagon. Figure 2A and Figure 2B A portion of such a sensing electrode unit 100 is shown.

[0054] The sensing electrode unit 100 can be composed of a transparent oxide, a conductive metal, or the like. The transparent oxide can be a conductive oxide such as indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum oxide (Al2O3), or the like. In addition, indium zinc tin oxide (IZTO), indium oxide (InOx), tin oxide (SnOx), cadmium tin oxide (CTO), gallium-doped zinc oxide (GZO), zinc tin oxide (ZTO), indium gallium oxide (IGO), or the like can be used. The conductive metal can be gold, silver, copper, or the like.

[0055] The sensing electrode unit 100 can have a plurality of pattern etching portions PH and a plurality of segment etching portions SH2.

[0056] The pattern etching portion PH serves to prevent or minimize visual distinguishability between the sensing region and the inter-cell region, and can form a specific arrangement pattern by removing a portion of the sensing electrode unit 100 while penetrating up and down. The arrangement pattern of the pattern etching portion PH can form a micro-etching pattern of the same shape. Here, a region surrounded by the micro-etching pattern can constitute a cell transparent electrode. The cell transparent electrode can be arranged to form a so-called inlaid structure.

[0057] The pattern etching portion PH can form a micro-etching pattern in combination with an adjacent pattern etching portion PH. The micro-etching pattern can have a polygonal shape such as a rectangle, a pentagon, a hexagon, a rhombus, or the like.

[0058] At a circumference connecting polygonal vertices of the micro-etching pattern, the pattern etching portion PH has a curved shape such as a sinusoidal curve, a cosinusoidal curve, a conic curve, a catenary curve, a tractrix curve, a trochoid, a hypocycloid, a cardioid, or the like.

[0059] In a process of forming a square micro-etching pattern, first, a virtual micro-square is assumed in the sensing electrode unit 100, and two adjacent vertices can be virtually connected with a sinusoidal wave. This process is repeatedly performed for four vertices, and as a result, a virtual curve connecting four sinusoidal waves based on one imaginary square, i.e., a circumference, can be generated.

[0060] Thereafter, by etching and removing a portion of the curve connecting the four sinusoidal waves, a micro-etching pattern can be formed. The micro-etching pattern can have a pitch (total width) of, for example, 100-500 μm, and the width of the pattern etching portion PH can be 5-20 μm.

[0061] If this process is performed on the entire sensing electrode unit 100, a sensing electrode unit 100 in which a plurality of micro-etching patterns are arranged in an inlaid structure can be formed. Here, since the micro-etching pattern is partially removed along the circumference of the cell transparent electrode, the remaining regions of the micro-etching pattern are electrically connected to each other to form an integrated sensing region with the adjacent cell transparent electrode.

[0062] With this configuration, the low-frequency component of the spatial frequency induced by the sensing electrode unit 100 is converted into a high-frequency component in the sensing electrode unit 100, making it difficult for the user's eyes to discern. In addition, the light transmittance of the sensing electrode unit 100 can be increased due to the pattern etching portion PH, thereby increasing the overall light transmittance of the touch sensor.

[0063] The segmented etching portion SH2 is formed to divide and drive the sensing electrode unit 100 into the first region A21 and the second region A22. As shown in FIGS. 10A and 10B, the segmented etching portion SH2 can be formed to physically and electrically separate the sensing electrode unit 100 by removing the transparent oxide constituting the sensing electrode unit 100 along the boundary between the first region A21 and the second region A22. Figure 2A Figure 2B As shown in FIGS. 10A and 10B, when viewed from one sensing electrode unit 100, the segmented etching portion SH2 can be formed to physically and electrically separate the sensing electrode unit 100 by removing the transparent oxide constituting the sensing electrode unit 100 along the boundary between the first region A21 and the second region A22.

[0064] The segmented etching portion SH2 can be in communication with the pattern etching portion PH by vertically penetrating the non-penetrated region of the sensing electrode unit 100 along the periphery of the unit transparent electrode at the boundary between the first region A21 and the second region A22. For example, when the unit transparent electrode is formed of a polygon and the pattern etching portion PH is formed to be spaced apart along the periphery connecting the vertices of the polygon, the segmented etching portion SH2 can be located between the vertices of the unit transparent electrode and the pattern etching portion PH. In this way, the segmented etching portion SH2 can be formed to be spaced apart from each other in an island shape.

[0065] The segmented pattern having the island-shaped arrangement of the segmented etching portion SH2 is arranged in the same shape as the micro-etching pattern to form the same spatial frequency. Accordingly, it can be prevented or minimized that the segmented pattern P2 is discerned due to the distinction from the sensing region, the inter-cell region, etc. In addition, the light transmittance of the sensing electrode unit 100 can be increased due to the segmented etching portion SH2, and thus the total light transmittance of the touch sensor can be increased.

[0066] The segmented etching portion SH2 can have different shapes according to its location, for example, the vertex region, the periphery between the vertices, etc.

[0067] Preferably, the segmented etching portion SH2 has the same width as the pattern etching portion PH. However, when the touch sensor is configured with a large area, a separate stitching exposure is generally performed using a separate exposure mask. At this time, considering the tolerance due to the continuous exposure, the width of the segmented etching portion SH2 can be formed to be greater than the width of the pattern etching portion PH in the exposure mask. In this case, in the completed touch sensor, the width of the segmented etching portion SH2 can be formed to be wider than the width of the pattern etching portion PH.

[0068] ​The above segmented pattern P2 can be formed at the same time in the process of forming the pattern etching portion PH.

[0069] In Figure 2A and Figure 2B , an insulating layer or a passivation layer can be formed on the upper surfaces of the sensing electrode unit 100, the pattern etching portion PH, and the segmented etching portion SH2.

[0070] The insulating layer or the passivation layer serves to insulate and protect the sensing electrode unit 100. The insulating layer or the passivation layer can be composed of one or more materials selected from among a curable prepolymer, a curable polymer, and a plastic polymer as general insulators.

[0071] The insulating layer or the passivation layer can be made of a varnish-type material capable of film formation. The varnish-type material can be a silicone polymer such as polydimethylsiloxane (PDMS) or polyorganosiloxane (POS), a polyimide, or a polyurethane such as spandex. The varnish-type material is a soft insulating material that can increase the ductility and dynamic folding ability of the touch panel.

[0072] As shown in Figure 2A and Figure 2B , a region that does not serve as a sensing region due to the formation of the pattern etching portion PH and the segmented etching portion SH2, i.e., a dummy region D1, can be formed between the first region A21 and the second region A22.

[0073] Figure 3A and Figure 3B are plan and perspective views showing modified forms of the touch sensor in which the segmented pattern is formed as islands spaced apart.

[0074] As shown in Figure 3A and Figure 3B , the segmented pattern P3 can be formed to be wide, i.e., to have two or more lines (arrangements). In this case, the dummy region D2 formed by the pattern etching portion PH and the segmented etching portion SH3 between the first region A31 and the second region A32 can be formed to have a wider width.

[0075] Meanwhile, in the above description, a case in which the substrate is separated left and right by forming the segmented patterns P2 and P3 along the boundaries of the unit transparent electrodes has been exemplified. A form in which the substrate is separated up and down can also be used.

[0076] The above touch sensor can include a bridge electrode unit connecting two adjacent sensing electrode units with the sensing electrode unit interposed therebetween.

[0077] The above-described touch sensor can form an inter-electrode dummy portion between the sensing electrode units. The inter-electrode dummy portion can have the same shape as the unit transparent electrode, but can be configured to be electrically insulated from the unit transparent electrode. In the inter-electrode dummy portion, a dummy pattern having the same spatial frequency as the unit transparent electrode can be inserted to provide the same high frequency component on the entire surface of the touch sensor. Thereby, it is possible to prevent the touch sensor pattern from being visibly distinguished by the same high frequency component provided on the entire surface of the touch sensor.

[0078] In the touch sensor of the present application, the sensing electrode units can be vertically arranged. In this case, an insulating layer can be formed between the upper sensing electrode and the lower sensing electrode.

[0079] In the touch sensor of the present application, the width of the connection portion connecting the adjacent unit transparent electrodes can be in the range of 20 μm to 60 μm. With this configuration, it is possible to prevent an increase in resistance that can occur in the process of connecting the adjacent unit transparent electrodes, while it is possible to prevent visibility reduction due to the connection portion.

[0080] Although specific embodiments of the present application have been shown and described, it will be understood by those skilled in the art that this is not intended to limit the present application to the preferred embodiments, and it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present application.

[0081] Accordingly, the scope of the present application is defined by the appended claims and their equivalents.

Claims

1.A touch sensor comprising: a first sensing electrode unit formed on a substrate in a first direction; a second sensing electrode unit formed on the substrate in a second direction crossing the first direction, wherein a plurality of micro-etching patterns are formed on boundaries of unit transparent electrodes constituting the first and second sensing electrode units, the unit transparent electrodes having a shape in which a portion of a curve connecting vertices of a polygon is removed, and adjacent unit transparent electrodes are electrically connected to each other; and a segmentation pattern insulating an inside of the first or second sensing electrode unit into two or more regions, wherein the segmentation pattern is formed continuously in an island shape along the boundaries of the unit transparent electrodes adjacent to the micro-etching patterns, thereby making it easy to apply a split-exposure method used when forming a large-area touch sensor. 2.The touch sensor of claim 1, wherein the segmentation pattern is formed to have a width equal to or greater than a width of the micro-etching pattern. 3.The touch sensor of claim 1, wherein the segmentation pattern divides the first or second sensing electrode unit in a vertical direction. 4.The touch sensor of claim 1, wherein the segmentation pattern divides the first or second sensing electrode unit left and right. 5.The touch sensor of claim 1, wherein the segmentation pattern is formed in the same process as the micro-etching pattern. 6.The touch sensor of claim 1, wherein the segmentation pattern is formed by one or more lines. 7.The touch sensor of claim 1, wherein the segmentation pattern has the same spatial frequency as the micro-etching pattern. 8.The touch sensor of claim 1, further comprising: a bridge electrode unit connecting two second sensing electrode units adjacent to each other, wherein the first sensing electrode unit is interposed between the two second sensing electrode units adjacent to each other; and an inter-electrode dummy portion formed between the first and second sensing electrode units, the inter-electrode dummy portion being identical in shape to the unit transparent electrode and insulated from the unit transparent electrode, wherein a plurality of unit transparent electrodes divided by the micro-etching pattern have a mosaic structure. 9.The touch sensor of claim 1, further comprising an insulating layer formed on the substrate on which the first sensing electrode unit is formed, wherein the second sensing electrode unit is formed on the insulating layer. 10.The touch sensor of claim 1, wherein the curve includes one or more selected from the group consisting of a sinusoidal curve, a cosinusoidal curve, a conic curve, a catenary, a tractrix, a trochoid, a cycloid, and a cardioid. ​ ​ 11.The touch sensor of claim 1, wherein the curve is a curve continuously connecting the vertices of the polygon, or is a curve partially formed by discontinuously connecting the vertices of the polygon. 12.The touch sensor of claim 1, wherein the boundary of the unit transparent electrode has a shape in which a portion of a curve connecting two adjacent vertices among six vertices of a hexagon is removed. 13.The touch sensor of claim 1, wherein the boundary of the unit transparent electrode has a shape in which a portion of a curve connecting two adjacent vertices among four vertices of a rectangle arranged in a grid structure is removed. 14.The touch sensor of claim 1, wherein the boundary of the unit transparent electrode has a shape in which a portion of a curve connecting two adjacent vertices among four vertices of a rectangle arranged in a zigzag structure is removed. 15.The touch sensor of claim 1, wherein the boundary of the unit transparent electrode has a shape in which a portion of a curve connecting two adjacent vertices among four vertices of a rhombus is removed. 16.The touch sensor of claim 1, wherein a pitch of the unit transparent electrode is 100 μm to 500 μm. 17.The touch sensor of claim 1, wherein a width of the micro-etching pattern is 5 μm to 20 μm. 18.The touch sensor of claim 1, wherein a width of a connection portion connecting adjacent unit transparent electrodes is 20 μm to 60 μm. 19.The touch sensor of claim 1, wherein the same high frequency component is provided on the entire surface of the touch sensor by inserting a plurality of dummy patterns having the same spatial frequency as the micro-etching pattern between the first sensing electrode unit and the second sensing electrode unit, so that the touch sensor pattern cannot be distinguished due to the same high frequency component provided on the entire surface of the touch sensor.

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