Display panel, method for manufacturing display panel, and display device

Abstract

The present application discloses a display panel, a manufacturing method of a display panel, and a display device, which belong to the field of display technology. The display panel includes: a substrate; an insulating layer, the insulating layer is located on the substrate and has a patterned groove; a first routing pattern and a second routing pattern, the first routing pattern is located in the groove, the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove. The display panel includes a substrate and a first routing pattern and a second routing pattern located on the base, the two routing patterns are located in the groove and on the insulating layer, respectively, and are two routing patterns formed by breaking at the edge of the groove, so that there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, which reduces the number of composition processes, solves the problem that the manufacturing process of the display panel in the related art is relatively complicated, and achieves the effect of simplifying the manufacturing process of the display panel.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel, a method for manufacturing a display panel, and a display device. Background Art

[0002] A display panel is a device that can realize an image display function. The display panel usually includes a plurality of wiring patterns located in different layers for connecting various structures in the display panel.

[0003] A display panel includes a light-transmitting display area and a conventional display area surrounding the light-transmitting display area. Light-emitting devices are arranged in both areas. A pixel driving circuit is arranged in the conventional display area. The pixel driving circuit can be electrically connected to the light-emitting device in the light-transmitting display area through multi-layer wiring to drive the light-emitting device, so that the display function can be realized in the light-transmitting display area.

[0004] However, the manufacturing process of the above display panel is relatively complicated. Summary of the invention

[0005] The embodiments of the present application provide a display panel, a method for manufacturing a display panel, and a display device. The technical solution is as follows:

[0006] According to one aspect of an embodiment of the present application, a display panel is provided, the display panel comprising:

[0007] substrate;

[0008] an insulating layer, the insulating layer being located on the substrate and having a patterned groove;

[0009] A first routing pattern and a second routing pattern, wherein the first routing pattern is located in the groove, and the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove.

[0010] Optionally, the display panel also includes a blocking pattern, which is located between the second routing pattern and the insulating layer, and the orthographic projection of the second routing pattern on the substrate is located in the orthographic projection of the blocking pattern on the substrate, and the edge of the blocking pattern protrudes from the edge of the groove away from the substrate.

[0011] Optionally, the material of the barrier pattern is a conductive material.

[0012] Optionally, the material of the barrier pattern includes indium tin oxide, and the insulating layer is an inorganic insulating layer.

[0013] Optionally, the groove includes at least one first groove wall, the first groove wall and the substrate are perpendicular to each other, and the first wiring pattern and the second wiring pattern are patterns broken at the first groove wall.

[0014] Optionally, the display panel also includes a lapped circuit, the groove includes at least one second groove wall, the second groove wall has an obtuse angle with the groove bottom, the lapped circuit is lapped on the second groove wall, one end is located on the insulating layer, and the other end is connected to the first routing pattern.

[0015] Optionally, the bonding circuit and the first routing pattern are in the same layer structure.

[0016] Optionally, the display panel further comprises a first planar layer, a third routing pattern, a second planar layer, a source / drain routing pattern, a third planar layer and an anode pattern sequentially stacked on the substrate provided with the second routing pattern in a direction away from the substrate.

[0017] Optionally, the display panel includes a light-transmitting display area and a conventional display area at least partially surrounding the light-transmitting display area, the conventional display area is provided with a plurality of light-emitting devices and a plurality of pixel driving circuits, the plurality of pixel driving circuits include a plurality of first pixel driving circuits and a plurality of second pixel driving circuits, the plurality of first pixel driving circuits are electrically connected to the light-emitting devices located in the conventional display area;

[0018] The light-transmitting display area is provided with a light-emitting device, and the plurality of second pixel driving circuits are electrically connected to the light-emitting device located in the light-transmitting display area through the first wiring pattern and the second wiring pattern.

[0019] Optionally, materials of the first routing pattern and the second routing pattern include indium tin oxide.

[0020] According to another aspect of an embodiment of the present application, a method for manufacturing a display panel is provided, wherein the method comprises:

[0021] providing a substrate;

[0022] forming an insulating material layer on the substrate;

[0023] forming patterned grooves on the insulating material layer to obtain an insulating layer;

[0024] A first routing pattern and a second routing pattern are formed on the insulating layer, wherein the first routing pattern is located in the groove, and the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove.

[0025] Optionally, forming a patterned groove on the insulating material layer to obtain an insulating layer comprises:

[0026] forming a blocking pattern on the insulating material layer;

[0027] Processing the insulating material layer to obtain the insulating layer having a patterned groove, wherein an edge of the blocking pattern protrudes from an edge of the groove away from the substrate;

[0028] forming a conductive material layer on the substrate having the insulating layer formed thereon, wherein the conductive material layer is broken at the edge of the groove;

[0029] The conductive material layer is processed to obtain the first routing pattern and the second routing pattern.

[0030] Optionally, the material of the blocking pattern includes indium tin oxide, and forming the blocking pattern on the insulating material layer includes:

[0031] forming an indium tin oxide layer on the insulating material layer;

[0032] The indium tin oxide layer is wet-etched to obtain the barrier pattern.

[0033] Optionally, the step of processing the insulating material layer to obtain the insulating layer having patterned grooves comprises:

[0034] forming a photoresist pattern on the substrate on which the blocking pattern is formed, wherein an orthographic projection of the blocking pattern on the substrate is located within an orthographic projection of the photoresist pattern on the substrate;

[0035] The insulating material layer is processed using the photoresist pattern as a mask to obtain the insulating layer having patterned grooves.

[0036] Optionally, the insulating layer is an inorganic insulating layer, and the insulating material layer is processed using the photoresist pattern as a mask to obtain the insulating layer having patterned grooves, comprising:

[0037] The photoresist pattern is used as a mask to perform dry etching on the insulating material layer to obtain the insulating layer with patterned grooves.

[0038] According to another aspect of an embodiment of the present application, a display device is provided, wherein the display device includes the above-mentioned display panel.

[0039] The beneficial effects brought by the technical solution provided by the embodiment of the present application include at least:

[0040] A display panel is provided, which includes a substrate and a first routing pattern and a second routing pattern located on the substrate, wherein the two routing patterns are located in a groove and on an insulating layer, respectively, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of a relatively complicated manufacturing process of the display panel in the related art, and achieving the effect of simplifying the manufacturing process of the display panel.

[0041] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is conducive to the mass production of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0043] Figure 1 is a schematic diagram of the structure of a display panel;

[0044] Figure 2 is a schematic diagram of the structure of a display panel provided in an embodiment of the present application;

[0045] Figure 3 yes Figure 1 A schematic structural diagram of a portion 10A of a display panel is shown;

[0046] Figure 4 yes Figure 3 A schematic diagram of a cross-sectional structure of a display panel shown;

[0047] Figure 5 is a schematic diagram of the structure of another display panel provided in an embodiment of the present application;

[0048] Figure 6 is a schematic diagram of the structure of another display panel provided in an embodiment of the present application;

[0049] Figure 7 is a method flow chart of a method for manufacturing a display panel provided in an embodiment of the present application;

[0050] Figure 8 is a method flow chart of another method for manufacturing a display panel provided in an embodiment of the present application;

[0051] Fig. 9 is a schematic structural diagram of various structures on a substrate in an embodiment of the present application;

[0052] Fig.10 is a schematic diagram of the structures on another substrate in an embodiment of the present application;

[0053] Fig.11 is a schematic diagram of the structures on another substrate in an embodiment of the present application;

[0054] Fig.12 is a schematic diagram of the structures on another substrate in an embodiment of the present application;

[0055] Fig.13 It is a structural schematic diagram of various structures on another substrate in an embodiment of the present application.

[0056] The above drawings have shown clear embodiments of the present application, which will be described in more detail later. These drawings and text descriptions are not intended to limit the scope of the present application in any way, but to illustrate the concept of the present application to those skilled in the art by referring to specific embodiments. DETAILED DESCRIPTION

[0057] In order to make the objectives, technical solutions and advantages of the present application clearer, the implementation methods of the present application will be further described in detail below with reference to the accompanying drawings.

[0058] Figure 1 The present invention is a schematic diagram of the structure of a display panel, which includes a substrate 11 and a first insulating layer pattern 12, a first flat layer pattern 13, a first wiring pattern 14, a second flat layer pattern 15, a second wiring pattern 16, a third flat layer pattern 17, a third wiring pattern 18, a fourth flat layer pattern 19, a fourth wiring pattern 191, a fifth flat layer pattern 192 and an anode pattern 193 stacked in sequence on the substrate 11 in a direction away from the substrate. Each of the patterns needs to be formed by a composition process respectively, and the number of composition processes to be performed is large, the number of mask plates to be used is large, the cost is high, and the manufacturing process is complex, resulting in a high production cost and a long production cycle for the display panel.

[0059] The embodiments of the present application provide a display panel, a method for manufacturing a display panel, and a display device, which can solve some problems existing in the above-mentioned technologies.

[0060] At present, the front side of the display device (the front side of the display device may refer to a side of the display device provided with a display surface for displaying an image) usually needs to be provided with some sensors (such as cameras, biometric information sensors, optical sensors, and distance sensors, etc.), but the sensor will affect the screen-to-body ratio of the display panel. One way is to increase the screen-to-body ratio of the display device by setting the display panel in the display device to a partially light-transmitting display panel. Exemplarily, the display panel has: a light-transmitting display area and a conventional display area outside the light-transmitting display area. The light-transmitting display area may also be referred to as an under-screen camera (English: Full Display with Camera; abbreviated: FDC) area. Light-emitting devices are provided in both the conventional display area and the light-transmitting display area, so that both the conventional display area and the light-transmitting display area can display images.

[0061] Please refer to Figure 2 and Figure 3 , Figure 2 is a schematic diagram of the structure of a display panel provided in an embodiment of the present application, Figure 3 yes Figure 1 The structure diagram of a part 10A of a display panel is shown. The display panel comprises: a substrate 11 , the substrate 11 may have a light-transmitting display area 111 and a non-light-transmitting conventional display area 112 at least partially surrounding the light-transmitting display area 111 .

[0062] The conventional display area 112 is provided with multiple light-emitting devices and multiple pixel driving circuits, the multiple pixel driving circuits include multiple first pixel driving circuits 13 and multiple second pixel driving circuits 16, and the multiple first pixel driving circuits 13 are electrically connected to the light-emitting devices (first light-emitting devices 12) located in the conventional display area 112.

[0063] The light-transmitting display area 111 is provided with a light-emitting device (second light-emitting device 15 ), and a plurality of second pixel driving circuits 16 are electrically connected to the light-emitting device (second light-emitting device 15 ) located in the light-transmitting display area 111 through the first wiring pattern 14 and the second wiring pattern 17 .

[0064] Figure 2 and Figure 3 A display panel using FDC technology is shown, but the display panel provided in the embodiment of the present application may also be a conventional display panel, that is, a display panel having only a conventional display area but not an FDC area, and the embodiment of the present application does not limit this.

[0065] Figure 4 yes Figure 3 A schematic diagram of a cross-section structure of a display panel (the cross-section position may be at AA) is shown, and the display panel includes:

[0066] A substrate 21; an insulating layer 22, wherein the insulating layer 22 is located on the substrate 21 and has a patterned groove c.

[0067] The first routing pattern 23 and the second routing pattern 24 are located in the groove c, and the second routing pattern 24 is located on the insulating layer 22. The first routing pattern 23 and the second routing pattern 24 are patterns formed by breaking at the edge of the groove c.

[0068] It should be noted that the display panel may also include other structures for realizing the display function. For example, the display panel also includes other insulating layers and routing patterns located on the first routing pattern 23 and the second routing pattern 24, and also includes light-emitting devices and pixel driving circuits connected to the first routing pattern 23 and the second routing pattern 24, etc. The embodiments of the present application do not limit this.

[0069] In summary, an embodiment of the present application provides a display panel, which includes a substrate and a first routing pattern and a second routing pattern located on the substrate, the two routing patterns are respectively located in a groove and on an insulating layer, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of a relatively complicated manufacturing process of the display panel in the related art, and achieving the effect of simplifying the manufacturing process of the display panel.

[0070] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is conducive to the mass production of the display panel.

[0071] Figure 5 It is a schematic diagram of the structure of another display panel provided in an embodiment of the present application. Figure 5 Can be Figure 3 Another schematic diagram of the cross-sectional structure of the display panel at AA is shown. The display panel further includes a blocking pattern 25, the blocking pattern 25 is located between the second wiring pattern 24 and the insulating layer 22, and the orthographic projection of the second wiring pattern 24 on the substrate 21 is located in the orthographic projection of the blocking pattern 25 on the substrate 21, and the edge of the blocking pattern 25 protrudes from the side of the groove c away from the substrate 21 (i.e. Figure 5 the upper side of the middle).

[0072] Due to the existence of the blocking pattern 25, when the insulating layer 22 is etched using an etching method for the insulating layer 22, a portion of the insulating layer below the blocking pattern 25 will also be etched away, but the blocking pattern 25 will not be substantially affected, and then there will be a structure in which the edge of the blocking pattern 25 protrudes from the edge of the groove c away from the substrate 21, which can be called an undercut structure. Due to the existence of the undercut structure, after a conductive structure layer is formed on the insulating layer 22 having the groove c, the conductive structure layer can be easily broken at the edge of the groove c, thereby forming a portion of the structure located on the insulating layer 22 and another portion of the structure located in the groove c, wherein the portion of the structure located on the insulating layer 22 may include the second wiring pattern 24, and the portion of the structure located in the groove may include the first wiring pattern 23.

[0073] Figure 5 A structure is shown that facilitates the first routing pattern 23 and the second routing pattern 24 to break at the edge of the groove c, but the display panel provided in the embodiment of the present application can also enable the first routing pattern 23 and the second routing pattern 24 to break at the edge of the groove c in other ways. For example, the depth of the groove c can be made deeper, and then the step difference between the upper surface of the insulating layer 22 and the bottom of the groove c is larger, which can also facilitate the first routing pattern 23 and the second routing pattern 24 to break at the edge of the groove c. Alternatively, the material of the conductive material layer can be adjusted so that the conductive material layer is easier to break at the edge of the groove c. The first routing pattern 23 and the second routing pattern 24 can be made of a light-transmitting conductive material to increase the transmittance of the display panel. Exemplarily, the material of the first routing pattern 23 and the second routing pattern 24 can include indium tin oxide.

[0074] The material of the blocking pattern 25 may include a material that is not easily etched by the etching process for the insulating layer 22 .

[0075] In an exemplary embodiment, the material of the blocking pattern 25 is a conductive material. The conductive material can be a conductive material that is not easily etched in the etching process of the insulating layer 22. In this structure, the electrical performance of the second wiring pattern 24 stacked with the blocking pattern 25 can be enhanced, which is beneficial for the second wiring pattern 24 to transmit electrical signals.

[0076] Optionally, the material of the blocking pattern 25 includes indium tin oxide (ITO), and the insulating layer is an inorganic insulating layer. Indium tin oxide is a light-transmitting and conductive material, and the material is not easily etched away in the etching process of the inorganic insulating layer (for example, the inorganic insulating layer may be a passivation layer (PVX) or a protective layer). Exemplarily, the blocking pattern 25 may be formed by a patterning process, and the etching process in the patterning process for forming the blocking pattern 25 may be wet etching. The inorganic insulating layer is also formed by a patterning process, and the etching process in the patterning process for forming the inorganic insulating layer may be a dry etching process. Indium tin oxide is not easily etched away in the dry etching process, and thus an undercut structure is easily formed.

[0077] It should be noted that the patterning process involved in the embodiments of the present application may include processes such as photoresist coating, exposure, development, etching, and photoresist stripping. Among them, different etching processes may be used for film layers of different materials, for example, dry etching (abbreviated as dry etching) and wet etching (abbreviated as wet etching) and other processes may be used.

[0078] In an exemplary embodiment, the groove c includes at least one first groove wall b1, the first groove wall b1 is perpendicular to the substrate 21, and the first wiring pattern 23 and the second wiring pattern 24 are patterns broken at the first groove wall b1. The vertical groove wall b can facilitate the first wiring pattern 23 and the second wiring pattern 24 to be broken at the first groove wall b.

[0079] It should be noted that the first groove wall b and the substrate 21 are perpendicular to each other, which may not be strictly perpendicular, and may have a certain angle offset. For example, the angle between the first groove wall b and the substrate 21 is in the range of 100 degrees to 80 degrees, or the angle between the first groove wall b and the substrate 21 is in the range of 95 degrees to 85 degrees.

[0080] In an exemplary embodiment, Figure 5 As shown, the insulating layer may have a patterned protrusion structure, and grooves c are formed between these protrusion structures. The protrusion structures are provided with blocking patterns 25. Of course, the insulating layer may also include a portion without the blocking pattern 25, and the embodiment of the present application is not limited thereto. Under such a structure, the two sides of the blocking pattern 25 may each have a groove c, wherein the groove wall adjacent to the edge of the blocking pattern 25 may be the first groove wall b1, that is, the groove wall adjacent to the edge of the blocking pattern 25 is perpendicular to the substrate 21.

[0081] In an exemplary embodiment, the display panel further includes a bridge line 26, the groove c includes at least one second groove wall b2, the second groove wall b2 has an obtuse angle with the groove bottom d, the bridge line 26 is bridged on the second groove wall, and one end is located on the insulating layer 22, and the other end is connected to the first wiring pattern 23. The bridge line 26 can be used to connect the first wiring pattern 23 with other circuits in the upper layer, and because the second groove wall b2 has an obtuse angle with the groove bottom d, that is, it has a normal slope angle, the wiring will not be broken when it is bridged on the second groove wall b2, and then the bridge line 26 can be connected to the first wiring pattern 23 of the groove bottom d.

[0082] Among them, one end of the jumper line 26 located on the insulating layer 22 is in the area where the insulating layer 22 is located, and no blocking pattern 25 is set, so no undercut structure is formed. The second groove wall b2 can have a regular slope angle with the groove bottom d, which is convenient for the setting of the jumper line 26.

[0083] Optionally, the bonding circuit 26 and the first wiring pattern 23 are in the same layer structure. That is, the bonding circuit 26 and the first wiring pattern 23 can be a structure obtained by the same material and the same process, which can save the number of patterning processes, reduce the manufacturing cost of the display panel, and improve the production efficiency of the display panel.

[0084] Figure 6 is a schematic diagram of the structure of another display panel provided in an embodiment of the present application. Figure 6 Can be Figure 3 Another schematic diagram of the cross-sectional structure of the display panel at AA is shown. The display panel further includes a first flat layer 271, a third wiring pattern 272, a second flat layer 273, a source and drain wiring pattern 274, a third flat layer 275 and an anode pattern 276 which are stacked one at a time on the substrate provided with the second wiring pattern 24 along a direction f1 away from the substrate 21. These structures can be formed by patterning processes respectively.

[0085] In an exemplary embodiment, the source-drain wiring pattern 274 can be a same-layer structure made of the same material as the source wiring and the drain wiring in the conventional display area.

[0086] In addition, other circuits or structures may be provided between the substrate and the insulating layer, for example, a pixel driving circuit may be provided, etc., which is not limited in the embodiments of the present application.

[0087] In summary, an embodiment of the present application provides a display panel, which includes a substrate and a first routing pattern and a second routing pattern located on the substrate, the two routing patterns are respectively located in a groove and on an insulating layer, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of a relatively complicated manufacturing process of the display panel in the related art, and achieving the effect of simplifying the manufacturing process of the display panel.

[0088] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is conducive to the mass production of the display panel.

[0089] Figure 7 : is a method flow chart of a method for manufacturing a display panel provided in an embodiment of the present application. The method can be used to manufacture the display panel provided in the above embodiment. The method includes:

[0090] Step 701: Provide a substrate.

[0091] Step 702: Form an insulating material layer on the substrate.

[0092] Step 703: forming patterned grooves on the insulating material layer to obtain an insulating layer.

[0093] Step 704 , forming a first routing pattern and a second routing pattern on the insulating layer, wherein the first routing pattern is located in the groove, and the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove.

[0094] In summary, an embodiment of the present application provides a method for manufacturing a display panel. The display panel manufactured by the method includes a substrate and a first routing pattern and a second routing pattern located on the substrate. The two routing patterns are respectively located in a groove and on an insulating layer, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of a relatively complicated manufacturing process of the display panel in the related art, and achieving the effect of simplifying the manufacturing process of the display panel.

[0095] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is conducive to the mass production of the display panel.

[0096] Figure 8 : is a flow chart of another method for manufacturing a display panel provided in an embodiment of the present application, the method comprising:

[0097] Step 801: Provide a substrate.

[0098] The substrate may be used to support various structures in the display panel. For example, the substrate may be a flexible substrate.

[0099] Step 802: Form an insulating material layer on the substrate.

[0100] The insulating material layer may be a passivation layer, and the passivation layer may be made of an inorganic insulating material. For example, the insulating material layer may include silicon nitride and silicon oxide.

[0101] Step 803: forming a blocking pattern on the insulating material layer.

[0102] The shape of the blocking pattern can refer to the above embodiment. Figure 5 and Figure 6 .

[0103] In an exemplary embodiment, the material of the barrier pattern includes indium tin oxide, and step 803 may include:

[0104] 1. Form an indium tin oxide layer on the insulating material layer.

[0105] The indium tin oxide layer may be formed on the insulating material layer by a deposition process.

[0106] 2. Wet etching of the ITO layer to obtain a blocking pattern

[0107] A photoresist pattern can be formed on the indium tin oxide layer first, and then the photoresist pattern is used as a mask to etch the indium tin oxide layer to process the indium tin oxide layer into a blocking pattern. When wet etching is performed, the etching solution used will not affect the insulating material layer below. After wet etching, the structure on the substrate can be as follows Fig. 9 As shown, Fig. 9 2 is a schematic diagram of the structure of each structure on a substrate in an embodiment of the present application. In the embodiment, an insulating material layer 221 is formed on the substrate 21, and a blocking pattern 25 and a photoresist pattern 251 covering the blocking pattern are formed on the insulating material layer 221, and the photoresist pattern 251 can be stripped off later.

[0108] Step 804 : Process the insulating material layer to obtain an insulating layer having a patterned groove, wherein an edge of the blocking pattern protrudes from an edge of the groove away from the substrate.

[0109] Since the insulating material layer is processed, the blocking pattern on the insulating material layer is usually not affected during the processing. After the insulating material layer is processed, the insulating layer under the blocking pattern will "shrink" relative to the blocking pattern, so that the edge of the blocking pattern protrudes from the edge of the groove away from the substrate side.

[0110] Optionally, step 804 may include:

[0111] 1. A photoresist pattern is formed on a substrate having a blocking pattern formed thereon, wherein an orthographic projection of the blocking pattern on the substrate is located in an orthographic projection of the photoresist pattern on the substrate.

[0112] This step may include first forming a photoresist layer on the substrate with the blocking pattern formed thereon, and then exposing the photoresist layer through a mask to form a photoresist pattern. Since the blocking pattern does not need to be etched, the orthographic projection of the blocking pattern on the substrate is located in the orthographic projection of the photoresist pattern on the substrate.

[0113] 2. Using the photoresist pattern as a mask to process the insulating material layer, a insulating layer having patterned grooves is obtained.

[0114] Optionally, the insulating material layer may be dry-etched using the photoresist pattern as a mask to obtain an insulating layer having patterned grooves.

[0115] At the end of step 2, the structures on the substrate can be Fig.10 As shown, Fig.10 2 is a schematic diagram of the structure of each structure on another substrate in an embodiment of the present application. An insulating layer 22 having a patterned groove c is formed on the substrate 21, and a blocking pattern 25 and a photoresist pattern 251 stacked in sequence are formed on the insulating layer 22. The photoresist pattern 251 can be stripped later.

[0116] Step 805 : forming a conductive material layer on the substrate having the insulating layer formed thereon, and breaking the conductive material layer at the edge of the groove.

[0117] The conductive material layer may include indium tin oxide, and the conductive material layer may be formed on a substrate having an insulating layer by a deposition process. Fig.11 As shown, Fig.11 1 is a schematic diagram of the structure of each structure on another substrate in an embodiment of the present application. An insulating layer 22 having a patterned groove c is formed on the substrate 21, and a portion of a conductive material pattern t2 is formed on the barrier pattern 25 on the insulating layer 22, and the portion of the conductive material pattern t2 includes a second conductive wiring pattern; another portion of a conductive material pattern t1 is formed in the area other than the barrier pattern 25 (such as in the groove c and on a portion of the insulating layer), and the portion of the conductive material pattern t1 includes a first wiring pattern and a lap wiring.

[0118] Depend on Fig.11It can be seen that on the insulating layer 22 formed with the blocking pattern 25, the conductive material layer on the insulating layer 22 is disconnected from the conductive material layer in the groove, but on the insulating layer 22 without the blocking pattern 25, the conductive material layer on the insulating layer 22 is connected to the conductive material layer in the groove.

[0119] Step 806: Process the conductive material layer to obtain a first routing pattern and a second routing pattern.

[0120] Since the conductive material pattern t2 including the second conductive trace pattern and the conductive material pattern t1 including the first trace pattern and the overlapping trace may both include redundant conductor material layers, the conductive material patterns t1 and t2 may be processed through one more patterning process.

[0121] In this step, a photoresist layer may be coated on the conductive material layer first, and the photoresist layer may be processed into a photoresist pattern through an exposure process and a development process. The specific structure may refer to Fig.12 , Fig.12 2 is a schematic diagram of the structure of each structure on another substrate in an embodiment of the present application. A photoresist pattern 29 is formed on the conductive material patterns t1 and t2. The photoresist pattern can then be used as a mask to process the conductive material patterns t1 and t2 to obtain a first routing pattern, a second routing pattern and a lapped routing. For example, please refer to Fig.13 , Fig.13 It is a structural schematic diagram of various structures on another substrate in an embodiment of the present application. After the conductive material patterns t1 and t2 are processed with a photoresist pattern 29, a first routing pattern 23, a second routing pattern 24 and a lapped routing 26 can be obtained, and the lapped routing 26 is connected to the first routing pattern 23.

[0122] The first wiring pattern 23 and the second wiring pattern 24 can be used to connect the light-emitting devices in the light-transmitting display area and the pixel driving circuit in the conventional display area. Since a large number of light-emitting devices in the light-transmitting display area need to be connected to the pixel driving circuit in the conventional display area through wiring, it is difficult to achieve this effect through wiring in the same layer. Then, one way is to connect the light-emitting devices in the light-transmitting display area with the pixel driving circuit in the conventional display area through multi-layer wiring, which leads to a large number of patterning processes. For example, the above Figure 1The composition process of the display panel shown in the figure when forming a multi-layer wiring pattern may include: the composition process of the passivation layer → the composition process of the narrow lower frame → the composition process of the first flat layer → the composition process of the source and drain metal pattern → the composition process of the second flat layer → the composition process of the first wiring pattern → the composition process of the third flat layer → the composition process of the second wiring pattern → the composition process of the fourth flat layer → the composition process of the third wiring pattern → the composition process of the fifth flat layer → the composition process of the anode pattern → the composition process of the pixel definition layer. This method requires a large number of composition processes and the manufacturing process is relatively complicated. However, the display panel provided in the embodiment of the present application can be manufactured by fewer composition processes. For example, it may include: the composition process of the blocking pattern → the composition process of the insulating layer → the composition process of the narrow lower frame → the composition process of the conductive material layer → the composition process of the first flat layer → the composition process of the third wiring pattern → the composition process of the second flat layer → the composition process of the source and drain pattern → the composition process of the third flat layer → the composition process of the anode pattern → the composition process of the pixel definition layer. Compared with Figure 1 The display panel shown reduces the patterning process by two times.

[0123] In summary, an embodiment of the present application provides a method for manufacturing a display panel. The display panel manufactured by the method includes a substrate and a first routing pattern and a second routing pattern located on the substrate. The two routing patterns are respectively located in a groove and on an insulating layer, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of a relatively complicated manufacturing process of the display panel in the related art, and achieving the effect of simplifying the manufacturing process of the display panel.

[0124] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is conducive to the mass production of the display panel.

[0125] In addition, an embodiment of the present application further provides a display device, which includes any one of the display panels provided in the above embodiments.

[0126] In addition, the display device may further include a sensor, which is located on the back of the display panel, and the orthographic projection on the display panel is located in the light-transmitting display area of ​​the display panel. The sensor may include a sensor such as a machine, a biometric information sensor, an optical sensor, and a distance sensor.

[0127] In addition, since the display panel in the display device is any one of the display panels provided in the above embodiments, the display device can also achieve the corresponding technical effect, that is, the display panel includes a substrate and a first routing pattern and a second routing pattern located on the substrate, and the two routing patterns are respectively located in the groove and on the insulating layer, and are two routing patterns formed by breaking at the edge of the groove. In this way, there is no need to process the insulating layer and the two layers of routing patterns separately through a composition process, thereby reducing the number of composition processes, solving the problem of the relatively complicated manufacturing process of the display panel in the related technology, and achieving the effect of simplifying the manufacturing process of the display panel.

[0128] In addition, since the manufacturing process of the display panel can reduce the number of patterning processes, the production cycle of the display panel can be shortened, which is beneficial to the mass production of display panels and display devices.

[0129] It should be noted that in the accompanying drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. It is also understood that when an element or layer is referred to as being "on" another element or layer, it may be directly on the other element, or there may be an intermediate layer. In addition, it is understood that when an element or layer is referred to as being "under" another element or layer, it may be directly under the other element, or there may be more than one intermediate layer or element. In addition, it is also understood that when a layer or element is referred to as being "between" two layers or two elements, it may be the only layer between the two layers or two elements, or there may also be more than one intermediate layer or element. Similar reference numerals throughout the text indicate similar elements.

[0130] In the present application, the terms "first", "second", "third", "fourth" and "fifth" are used for descriptive purposes only and should not be understood as indicating or implying relative importance. The term "plurality" refers to two or more, unless otherwise clearly defined.

[0131] The above description is only an optional embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A display panel, characterized in that: The display panel comprises: substrate; an insulating layer, the insulating layer being located on the substrate and having a patterned groove; A first routing pattern and a second routing pattern, wherein the first routing pattern is located in the groove, the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove; a blocking pattern, wherein the blocking pattern is located between the second wiring pattern and the insulating layer, and an orthographic projection of the second wiring pattern on the substrate is located in an orthographic projection of the blocking pattern on the substrate, and an edge of the blocking pattern protrudes from an edge of the groove away from the substrate; Wherein, the material of the blocking pattern includes indium tin oxide, and the insulating layer is an inorganic insulating layer.

2. The display panel according to claim 1, characterized in that: The groove includes at least one first groove wall, the first groove wall and the substrate are perpendicular to each other, and the first wiring pattern and the second wiring pattern are patterns broken at the first groove wall.

3. The display panel according to claim 1, characterized in that: The display panel also includes a lapped circuit, the groove includes at least one second groove wall, the second groove wall has an obtuse angle with the groove bottom, the lapped circuit is lapped on the second groove wall, one end of the lapped circuit is located on the insulating layer, and the other end is connected to the first wiring pattern.

4. The display panel according to claim 3, characterized in that: The bonding circuit and the first wiring pattern are in the same layer structure.

5. The display panel according to claim 3, characterized in that: The display panel further includes a first planar layer, a third wiring pattern, a second planar layer, a source / drain wiring pattern, a third planar layer and an anode pattern sequentially stacked on the substrate provided with the second wiring pattern in a direction away from the substrate.

6. The display panel according to any one of claims 1 to 5, characterized in that: The display panel comprises a light-transmitting display area and a conventional display area at least partially surrounding the light-transmitting display area, wherein the conventional display area is provided with a plurality of light-emitting devices and a plurality of pixel driving circuits, wherein the plurality of pixel driving circuits comprises a plurality of first pixel driving circuits and a plurality of second pixel driving circuits, and the plurality of first pixel driving circuits are electrically connected to the light-emitting devices located in the conventional display area; The light-transmitting display area is provided with a light-emitting device, and the plurality of second pixel driving circuits are electrically connected to the light-emitting device located in the light-transmitting display area through the first wiring pattern and the second wiring pattern.

7. The display panel according to any one of claims 1 to 5, characterized in that: The material of the first wiring pattern and the second wiring pattern includes indium tin oxide.

8. A method for manufacturing a display panel, characterized in that: The method comprises: providing a substrate; forming an insulating material layer on the substrate; forming patterned grooves on the insulating material layer to obtain an insulating layer; forming a first routing pattern and a second routing pattern on the insulating layer, wherein the first routing pattern is located in the groove, and the second routing pattern is located on the insulating layer, and the first routing pattern and the second routing pattern are patterns formed by breaking at the edge of the groove; The step of forming a patterned groove on the insulating material layer to obtain an insulating layer comprises: forming a blocking pattern on the insulating material layer; Processing the insulating material layer to obtain the insulating layer having a patterned groove, wherein an edge of the blocking pattern protrudes from an edge of the groove away from the substrate; forming a conductive material layer on the substrate having the insulating layer formed thereon, wherein the conductive material layer is broken at the edge of the groove; Processing the conductive material layer to obtain the first routing pattern and the second routing pattern; Wherein, the material of the blocking pattern includes indium tin oxide, and the insulating layer is an inorganic insulating layer.

9. The method according to claim 8, characterized in that The forming of a blocking pattern on the insulating material layer comprises: forming an indium tin oxide layer on the insulating material layer; Wet etching the indium tin oxide layer to obtain the blocking pattern; The step of processing the insulating material layer to obtain the insulating layer having patterned grooves comprises: forming a photoresist pattern on the substrate on which the blocking pattern is formed, wherein an orthographic projection of the blocking pattern on the substrate is located within an orthographic projection of the photoresist pattern on the substrate; The insulating material layer is processed using the photoresist pattern as a mask to obtain the insulating layer having patterned grooves.

10. The method according to claim 9, characterized in that The step of processing the insulating material layer using the photoresist pattern as a mask to obtain the insulating layer having patterned grooves comprises: The photoresist pattern is used as a mask to perform dry etching on the insulating material layer to obtain the insulating layer with patterned grooves.

11. A display device, characterized in that: The display device comprises the display panel according to any one of claims 1-7.

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