Photomask storage box and photomask holding method

Abstract

This invention discloses a photomask storage box and a photomask holding method, comprising a base having multiple support members, each support member supporting a corner of a photomask, and each support member extending upward with a pair of limiting blocks located on two sides of the corner; and a cover, with multiple elastic pressing mechanisms corresponding to the multiple support members, each elastic pressing mechanism having at least one elastic arm acting on the corner of the photomask supported by the corresponding support member; wherein, when the cover is closed with the base to accommodate the photomask, the pair of limiting blocks restrict the lateral displacement of the elastic arm; the photomask storage box of this invention has a sufficient protection mechanism to prevent the intrusion of external particles, and does not require complex structures and processing, thus helping to reduce manufacturing costs.

Description

Technical Field

[0001] This invention relates to the field of photomask storage technology, and more particularly to a photomask storage box and a photomask holding method. Background Technology

[0002] Currently, in extreme ultraviolet (EUV) lithography, photomasks require protection using a dual-layer photomask delivery pod (EUV POD). This pod consists of an inner pod (EIP) and an outer pod (EOP). To store the photomask, it is placed in the inner pod, which is then housed within the outer pod. The entire pod is then placed inside a nitrogen chamber and filled with nitrogen gas to store the photomask.

[0003] Furthermore, existing photomask transport boxes are designed to prevent particulate contamination and photomask damage caused by vibration and misalignment during long-distance transport. Additionally, existing photomask transport boxes can be designed to be used in various process equipment for different tests, making the inner box structure more complex and the manufacturing cost relatively higher than the outer box. Storing the inner box of such a photomask transport box in a nitrogen cabinet for extended periods would not be efficient.

[0004] Please refer to the following: Figure 1 and Figure 2 As shown, the existing photomask delivery box 10 is a double-layer box structure, including an inner box 11 and an outer box 12. The inner box 11 houses a photomask R, and the outer box 12 houses the inner box 11. The inner box 11 includes a base 20 and a cover 30, which cooperate to seal and house the photomask R. The outer box 12 includes an outer base 40 and an outer cover 50, wherein the outer base 40 has a support structure for the inner box 11, and the outer cover 50 is engaged with the outer base 40 to define the accommodating space of the inner box 11. The inner side of the outer cover 50 usually provides a suitable pressing structure so that the outer cover 50 can press down on the inner box 11 when engaged with the outer base 40, thereby forming a stable containment. The outer base 40 generally also has a locking structure to lock the outer cover 50 to the outer base 40. Since the transport of this photomask transport box 10 in the plant is performed by an overhead crane system, the top of the outer cover 50 has a handle 52 for the crane arm to grip. Therefore, the existing photomask transport box 10 is not conducive to stacking and storage due to the height of the handle 52, and the handle 52 will occupy additional storage space.

[0005] Furthermore, in typical designs, existing inner and outer boxes have corresponding mating mechanisms, meaning that the outer box can only be paired with a corresponding inner box, and cannot be adapted to inner boxes with different mechanism designs. In other words, only specific outer and inner boxes are compatible and can achieve the desired stable containment of the photomask. Using incompatible outer and inner boxes will not achieve the desired stability. When considering manufacturing costs and storage efficiency, existing outer box designs cannot meet the requirements for photomask transport box technology.

[0006] Therefore, the industry needs a dedicated photomask storage box suitable for long-term storage and related methods, as well as a photomask storage system and method for storing dedicated photomask storage boxes. Furthermore, this invention develops a technology that uses a single outer box to accommodate at least two inner boxes with different mechanical designs, which will help reduce storage costs.

[0007] Existing photomask transport boxes have an inner box with a mechanism for stabilization by external force applied from the outer box, namely a hold-down pin. This mechanism only works on the photomask within the inner box when the inner box is housed within the outer box. For example, the tip of the hold-down pin is exposed on the top outer side of the inner box. When only the inner box is transported without using the outer box, insufficient stability of the photomask within the inner box can easily lead to vibration and impact.

[0008] Furthermore, if photomasks are to be stored long-term in a dedicated photomask storage system, the photomasks must be removed from the double-layered photomask transfer box and transferred to the dedicated box. Therefore, before photomasks can be housed in a photomask storage system, it is also necessary to develop compatible photomask loading systems and related methods.

[0009] Furthermore, photomasks are used in high-precision processes in semiconductor manufacturing equipment. The long-term storage of these costly photomasks in storage cabinets requires adherence to stringent environmental conditions. Therefore, there is a need to develop a gas-filling system and related methods for photomask storage cabinets used for long-term storage, as well as a photomask storage cabinet management system and related methods suitable for scheduling storage cabinet systems. Summary of the Invention

[0010] To enable the storage of more photomasks within the same space, this invention provides a storage device to increase the efficiency of photomask storage. Specifically, this invention provides a dedicated photomask storage box, which differs from existing photomask transport boxes. In the description of this invention, "photomask transport box" refers to existing photomask boxes, while "photomask storage box" refers to the dedicated photomask box proposed by this invention to improve storage technology, thus distinguishing the two.

[0011] If the photomask storage box is only transported within the storage racks of the photomask loading system and the photomask storage system, the design of the photomask storage box for this purpose, apart from still having sufficient protection mechanisms to prevent the intrusion of external particles, does not require complex structures and processes, which helps to reduce manufacturing costs.

[0012] The present invention aims to provide a photomask storage box, comprising: a base having a plurality of support members, each support member supporting a corner of a photomask, each support member extending an upward pair of limiting blocks located on two sides of the corner; and a cover having a plurality of elastic pressing mechanisms corresponding to the plurality of support members, each elastic pressing mechanism having at least one elastic arm acting on the corner of the photomask supported by the corresponding support member; wherein, when the cover is closed with the base to accommodate the photomask, the pair of limiting blocks restrict the lateral displacement of the elastic arm.

[0013] In one embodiment, the support has a pair of inclined surfaces that respectively engage the lower edges of the two sides of the corner.

[0014] In one specific embodiment, the elastic pressing mechanism includes a body and a pair of elastic arms extending from the body in different directions. Each elastic arm has a limiting portion and an inclined surface extending from the limiting portion. The two inclined surfaces formed by the pair of elastic arms respectively engage the upper edges of the two sides of the corner.

[0015] In one specific embodiment, the pair of limiting blocks restrict the two limiting portions of the pair of elastic arms.

[0016] In one specific embodiment, the two inclined surfaces formed by the pair of elastic arms extend away from the limiting portion and are connected together.

[0017] Another object of the present invention is to provide a photomask storage box, comprising: an inner box having a cover, a base and a holding mechanism, the cover being coupled to the base to define a receiving space, the holding mechanism for holding a photomask in the receiving space; and an outer box having an outer cover and an outer base, the outer cover being coupled to the outer base to receive the inner box within the outer box; wherein the outer cover has a flat top surface and a circumferential side surface extending downward from the flat top surface, the circumferential side surface being provided with at least a pair of handles, the pair of handles not exceeding the height of the flat top surface.

[0018] In one specific embodiment, a plurality of positioning posts are provided on a top surface of the outer base, and the plurality of positioning posts support the base of the inner box.

[0019] In one specific embodiment, the outer cover is provided with at least one pressing mechanism, which acts on the cover to secure the inner box.

[0020] In one specific embodiment, the pressing mechanism is a pressing column, which acts on the cover of the inner box.

[0021] In one specific embodiment, the holding mechanism includes at least one support member disposed on the base; and at least one elastic pressing mechanism disposed on the cover corresponding to the support member. When the outer cover is combined with the outer base to accommodate the inner box, the pressing post presses against the elastic pressing mechanism, thereby securing the photomask.

[0022] In one specific embodiment, the pressing mechanism is a pressing rib. When the outer cover and the outer base are combined to accommodate the inner box, the pressing rib presses against an upper surface of the cover of the inner box.

[0023] In one specific embodiment, a groove is formed on the upper surface of the cover corresponding to the lower pressing rib. When the outer cover and the outer base are combined to accommodate the inner box, the lower pressing rib presses against the corresponding groove to securely position the cover on the base.

[0024] In one specific embodiment, the holding mechanism includes at least one support member disposed on the base; and at least one photomask limiter disposed on the cover corresponding to the support member. The photomask limiter has at least one elastic arm. When the cover is engaged with the base to accommodate the photomask, the support member supports a corner of the photomask, and the elastic arm of the photomask limiter engages with the corresponding corner, thereby holding the photomask in place by the holding mechanism.

[0025] Another objective of this invention is to provide a photomask storage box, comprising: an inner box housed within an outer box; a plurality of pressing mechanisms are provided on the inner surface of the outer box; the inner box includes a cover, a base, and a plurality of holding mechanisms; the cover and the base are combined to define a receiving space; the plurality of holding mechanisms are used to hold the photomask housed in the receiving space; wherein, a plurality of grooves are formed on an upper surface of the cover corresponding to the plurality of pressing mechanisms; when the inner box is housed within the outer box, the plurality of grooves of the cover engage with the pressing mechanisms respectively, the cover receives a pressure to stabilize and position the inner box, and the pressure enhances the holding mechanism's retention of the photomask.

[0026] In one embodiment, the groove has a bottom surface and a surrounding side surface around the bottom surface, the surrounding side surface having a profile, and the cap exposes the retaining mechanism at the lower surface of the groove.

[0027] In one specific embodiment, the pressing mechanism is a pressing rib, which has a contour corresponding to the groove. When the inner box is stored in the outer box, the pressing rib presses against the bottom surface of the groove.

[0028] Another objective of this invention is to provide a photomask storage box, comprising: an outer box, the outer box including an outer cover and an outer base, the outer cover and the outer base being combined to securely accommodate a first inner box or a second inner box of different structures within the outer box, the first inner box and the second inner box being used to accommodate a photomask; wherein, the outer cover is provided with at least one first pressing mechanism and at least one second pressing mechanism, the first pressing mechanism and the second pressing mechanism acting on a cover of the first inner box and a cover of the second inner box of different structures, respectively.

[0029] In one specific embodiment, the first pressing mechanism and the second pressing mechanism extend from a lower surface of the outer cover at different heights, and the first pressing mechanism and the second pressing mechanism respectively engage with the corresponding structure of the cover of the first inner box and the corresponding structure of the cover of the second inner box, which have different structures.

[0030] In one specific embodiment, the first pressing mechanism is a pressing column, and the second pressing mechanism is a pressing rib with a horseshoe-shaped profile, wherein the pressing column is located inside the horseshoe-shaped profile of the pressing rib.

[0031] In one specific embodiment, the cover of the first inner box is provided with an elastic pressing mechanism corresponding to the first pressing mechanism. The elastic pressing mechanism includes a pressing pin. When the first inner box is housed in the outer box, the pressing pin presses against the pressing pin to hold the photomask housed in the first inner box.

[0032] In one specific embodiment, the elastic pressing mechanism includes a cap that restricts the pressing pin, wherein, with the first inner box housed within the outer box, the horseshoe-shaped profile of the pressing rib restricts the lateral displacement of the cap.

[0033] In one specific embodiment, the cover of the second inner box is provided with a groove corresponding to the second pressing mechanism. The groove has a bottom surface and a surrounding side surface. The surrounding side surface has a horseshoe-shaped profile corresponding to the pressing rib. When the second inner box is housed in the outer box, the pressing rib presses against the bottom surface of the groove, and the pressing rib restricts the lateral displacement of the cover.

[0034] Another objective of this invention is to provide a photomask holding method for a photomask storage box to hold a photomask, comprising: disposing of a plurality of support members on a base of the photomask storage box, each of the support members extending upward to form a pair of limiting blocks; disposing of a plurality of elastic pressing mechanisms on a cover of the photomask storage box corresponding to the plurality of support members, each of the elastic pressing mechanisms having at least one elastic arm; and when the cover is engaged with the base to accommodate the photomask, each of the support members supports a corner of the photomask, and the elastic arm of each elastic pressing mechanism acts on the corresponding corner, thereby limiting the lateral displacement of the elastic arm on the limiting blocks.

[0035] In one specific embodiment, the pair of limiting blocks are located on the two sides of the corner.

[0036] In one specific embodiment, the elastic pressing mechanism includes a body and a pair of elastic arms, each of the elastic arms having a limiting portion and an inclined surface extending from the limiting portion.

[0037] In one specific embodiment, when the cap is combined with the base to accommodate the photomask, the two inclined surfaces formed by the pair of elastic arms respectively engage the upper edges of the two sides of the corner.

[0038] In one specific embodiment, the pair of elastic arms extend from different directions of the body.

[0039] In one specific embodiment, the ends of the pair of elastic arms are connected together.

[0040] The features and advantages of this invention are:

[0041] The photomask storage box of the present invention has sufficient protection against the intrusion of external particles, and does not require complex structure and processing, thus helping to reduce manufacturing costs. Furthermore, the photomask storage box of the present invention is compatible with inner boxes of different structures, and is suitable for storage systems, thereby improving the space utilization rate of storage systems. Attached Figure Description

[0042] The invention can be further understood by referring to the following figures and descriptions. Non-limiting and non-exhaustive examples are described with reference to the following figures. The components in the figures are not necessarily actual dimensions; the focus is on illustrating the structure and principle.

[0043] Figure 1 The image shown is an exploded side view of an existing photomask storage box.

[0044] Figure 2 The image shown is an exploded perspective view of the existing inner box and photomask.

[0045] Figure 3 The diagram shown is a block diagram of the photomask storage system of the present invention.

[0046] Figure 4 The image shown is a perspective view of the photomask storage system of the present invention.

[0047] Figure 5A The image shown is an exploded side view of the photomask storage box of the present invention.

[0048] Figure 5B The image shown is a perspective view of the outer cover of the special outer box of this invention.

[0049] Figure 5C The image shown is a perspective view of the outer base of the special outer box of this invention.

[0050] Figure 5D The image shown is an exploded perspective view of the inner box of this invention.

[0051] Figure 5E The image shown is a top view of the lid of the inner box of this invention.

[0052] Figure 5F The image shown is a bottom view of the lid of the inner box of this invention.

[0053] Figure 5G The image shows the special inner box of this invention. Figure 5E A cross-sectional view of the cap at the dotted line.

[0054] Figure 5H The image shown is a top view of the base of the special inner box of this invention.

[0055] Figure 5I The image shown is a bottom view of the base of the special inner box of this invention.

[0056] Figure 5J The image shows the special inner box of this invention. Figure 5H A cross-sectional view of the base at the dashed line.

[0057] Figure 5K The figure shown is a perspective view of the base of the special inner box of the present invention.

[0058] Figure 5LThe image shown is a perspective view of one corner of the base of the present invention.

[0059] Figure 5M The image shown is a perspective view of another corner of the base of the present invention.

[0060] Figure 5N The image shows a photomask limiter disposed inside the cover of the present invention.

[0061] Figure 6A The diagram shows a photomask limiter and a corresponding support member of the special inner box of the present invention, which limit a corner of a photomask.

[0062] Figure 6B The diagram shown is a partial magnified view of the support member of the present invention limiting the lateral displacement of the photomask limiter.

[0063] Figure 7A The image shown is a perspective view of the inner box specifically designed for this invention.

[0064] Figure 7B The image shows the special inner box of this invention. Figure 7A Sectional view at the dashed line.

[0065] Figure 8A The image shown is a bottom view of the outer cover of the special outer box of this invention.

[0066] Figure 8B The image shown is an enlarged view of the pressing mechanism acting on the lid of the special inner box.

[0067] Figure 9A As shown Figure 5A Cross-sectional view of the photomask storage box when assembled.

[0068] Figure 9B As shown Figure 9A A magnified view of the area indicated by the dashed line.

[0069] Figure 10A The image shown is a perspective view of an existing photomask transmission inner box.

[0070] Figure 10B The diagram shows the corresponding mechanism of the pressing mechanism acting on the existing photomask conveying inner box cover.

[0071] Figure 10C The image shown is an enlarged view of the corresponding mechanism between the pressing mechanism and the inner box of the photomask transport box.

[0072] Figure 11A The image shown is a cross-sectional view of a dedicated inner box housed within a dedicated outer box of the photomask storage box of the present invention.

[0073] Figure 11B The image shown is a cross-sectional view of a non-dedicated inner box housed in a dedicated outer box of the photomask storage box of the present invention.

[0074] Figure 12 The image shown is an overlapping view of the cover of the inner box of the present invention and the inner box cover of the photomask transport box.

[0075] Figure 13 The image shown is a perspective view of the photomask loading system of the present invention.

[0076] Figure 14 The diagram shown is a schematic of the photomask loading system of the present invention.

[0077] Figure 15 The diagram shown is a loading flowchart of the photomask storage method of the present invention.

[0078] Figure 16 The diagram shown is a flowchart of the loading process of the photomask storage method of the present invention.

[0079] Figure 17 The diagram shown is a detailed flowchart of the photomask transfer process of the present invention.

[0080] Figure 18 The image shown is a specific embodiment of the photomask loading system of the present invention.

[0081] Figure 19A The image shown is a specific embodiment of a photomask clamping mechanism used in a photomask loading system.

[0082] Figure 19B The image shown is a front view of the photomask clamping mechanism.

[0083] Figure 19C The image shown is a top view of the photomask clamping mechanism.

[0084] Figure 20 The diagram shows the interaction between the photomask clamping mechanism and the lifting platform.

[0085] Figure 21 The diagram shows the anomaly handling process of the photomask loading system.

[0086] Figure 22 The diagram shows another exception handling process for the photomask loading system.

[0087] Figure 23 The diagram shows the abnormal handling process of the photomask clamping mechanism.

[0088] Figure 24 The diagram shown is a block diagram of the photomask loading system and photomask storage system of the present invention.

[0089] Figure 25 The image shown is a top view of the photomask storage system of the present invention, which shows the specific internal configuration of the photomask storage system.

[0090] Figure 26A The image shown is a perspective view of a specific embodiment of the storage rack of the present invention.

[0091] Figure 26B The bottom configuration of the storage rack is shown.

[0092] Figure 27A The image shows a storage rack with a photomask storage box.

[0093] Figure 27B The image shown is a bottom view of the storage rack with a photomask storage box.

[0094] Figure 27C The image shown is another view of the storage rack with a photomask storage box.

[0095] Figure 28A The diagram shows a top view of a specific embodiment of the storage rack and robotic arm, wherein the robotic arm is located below the photomask storage box, and the positioning groove at the bottom of the photomask storage box on the storage rack is indicated by dashed lines.

[0096] Figure 28B The image shown is a side view of a robotic arm entering beneath a storage rack to retrieve a photomask storage box.

[0097] Figure 28C The image shown is a side view of a robotic arm removing a photomask storage box from a storage rack.

[0098] Figure 29 The image shows the upstream gas supply line and its flow control equipment for the storage rack.

[0099] Figure 30 The figures show two specific embodiments of the upstream gas supply line connected to the storage rack.

[0100] Figure 31 The diagram shows the abnormal handling process of the robotic arm in the photomask storage system.

[0101] Figure 32 The diagram shown is a schematic diagram of another embodiment of the photomask loading device and photomask storage system of the present invention.

[0102] Figure 33 As shown Figure 32 Flowchart of the photomask loading process in the embodiment.

[0103] Figure 34 As shown Figure 32 A flowchart illustrating the process of loading the photomask in this embodiment.

[0104] Figure 35 As shown Figure 32 The specific transfer process of the photomask in the embodiment.

[0105] Figure 36The diagram shown is a flowchart of the process for transferring the inner box.

[0106] Figure 37 The diagram shown is a schematic diagram of another embodiment of the photomask loading device and photomask storage system of the present invention.

[0107] Figure 38A The image shows a specific embodiment of the storage room.

[0108] Figure 38B The diagram shows the configuration of the upward-facing load-bearing surface inside the storage room.

[0109] Figure 38C The image shows a storage room with a single-layer box.

[0110] Figure 38D The image shows the support structure of the storage chamber, which supports the bottom of the single-layer box.

[0111] Figure 39A As shown Figure 37 The process of loading photomasks.

[0112] Figure 39B As shown Figure 37 The process of loading the photomask.

[0113] Figure 40 As shown Figure 37 The specific transfer process of the photomask in the embodiment.

[0114] Figure 41A The diagram illustrates an interactive embodiment of a storage system's robotic arm with a storage compartment, showing the process of placing a box into the storage compartment.

[0115] Figure 41B The diagram illustrates an example of the interaction between a robotic arm and a storage compartment in a storage system, showing the process of retrieving a box from the storage compartment.

[0116] Figure 42A The diagram shows another example of the interaction between the robotic arm of the storage system and the storage room, illustrating the process of placing a box into the storage room.

[0117] Figure 42B The diagram shows another example of the interaction between the robotic arm of the storage system and the storage room, illustrating the process of retrieving a box from the storage room.

[0118] Figure 43 The diagram shown is a schematic representation of an embodiment of the photomask storage tank pipeline inflation system of the present invention.

[0119] Figure 44 The diagram shown is a schematic diagram of another embodiment of the photomask loading device and photomask storage system of the present invention.

[0120] Figure 45A As shown Figure 44The photomask loading process of the embodiment.

[0121] Figure 45B As shown Figure 44 The photomask loading process of the embodiment.

[0122] Figure 46A As shown Figure 44 Another photomask loading process in the embodiment.

[0123] Figure 46B As shown Figure 44 Another photomask loading process in the embodiment.

[0124] Explanation of icon numbers

[0125] 10: Photomask Transport Box 121: Main Body

[0126] 11: Inner box; 122: Flexible arm

[0127] 12: Outer box 123: Limiting part

[0128] 20: Base 124: Inclined surface

[0129] 30: Capping 125: Pressing section

[0130] 32: Lower pressure pin 130: Base

[0131] 34: Cap 131: Protective film groove

[0132] 40: Outer base 132: Positioning groove

[0133] 50: Outer cover; 134: Support component

[0134] 52: Handle 135: Inclined surface

[0135] 100: Photomask storage box; 136: Limiting block

[0136] 101: Dedicated inner box; 150: Outer cover

[0137] 102: Dedicated outer box; 151: Handle

[0138] 110: Capping 152: Flat top surface

[0139] 111: Handle 153: Press down on the rib

[0140] 112: Filter membrane cover; 154: Lower pressure column

[0141] 114: Groove 160: Outer base

[0142] 120: Photomask limiter; 161: Positioning post

[0143] 162: Air valve; 1906: Clamping arm

[0144] 163: Positioning groove; 1908: Contact plate

[0145] 200: Photomask Loading System; 1910: Fitting Part

[0146] 200': Photomask loading system; 2000: Lifting platform

[0147] 200”: Photomask loading system; 2600: Front end

[0148] 202: First interface; 2602: Backend

[0149] 204: Second interface; 2604: Inflation tubing

[0150] 206: Photomask Transfer Environment 2606: Nozzle

[0151] 300: Photomask storage cabinet control system; 2608: Dynamic coupling positioning column

[0152] 400: Photomask storage tank inflation piping system; 2610: Stop section

[0153] 500: Photomask Storage Management System; 2612: Connecting Arm

[0154] 600: Photomask storage system; 2700: Locking mechanism

[0155] 600': Photomask storage system; 2800: Front end

[0156] 600”: Photomask storage system 2802: Backend

[0157] 602: Storage cabinet; 2804: Positioning post

[0158] 604: Storage rack; 2900: Gas supply line

[0159] 604': Storage compartment 2901: Ball valve

[0160] 606: Buffer Zone; 2902: Flow Display

[0161] 608: Management Equipment; 2903: Flow Restrictor Valve

[0162] 609: Robotic arm; 2904: Filter

[0163] 610: Control equipment; 2905: Thermometer / hygrometer

[0164] 612: Flow control equipment; 2906: Mechanical pressure gauge

[0165] 614: Cleaning device; 2907: Electronic pressure gauge

[0166] 1800A: Outer box cover support surface; 2908: Pressure regulating valve

[0167] 1802A: Lifting Platform; 2909: Main Pipeline

[0168] 1900: Photomask clamping mechanism; 2910: Pressure gauge

[0169] 1900': Photomask clamping mechanism; 2911: Air valve

[0170] 1902: Track 3000: Flow Controller

[0171] 1904: Clamping assembly; 3001: Filter

[0172] 3002: Needle valve; 4312: Pressure gauge

[0173] 3700: Single-layer box; 4314: Pressure sensor

[0174] 3900 to 3912: Step 4316: Voltage Regulator

[0175] 3800: Connector; 4318: Ball valve

[0176] 3802: Dynamically Coupled Positioning Post; R: Photomask

[0177] 3804: Guide column W: Window

[0178] 4000 to 4012: Step H: Vertical Drop

[0179] 4100: Gripping mechanism A of the robotic arm: First lifting device

[0180] 4102: Front-end interactive mechanism of the robotic arm; B: Second lifting device

[0181] 4104: Storage room P: Box

[0182] 4200: Grasping section A0 to A2: Height

[0183] 4202: Propulsion Department B0 to B2: Height

[0184] 4204: Storage room 1500 to 1510: Procedure

[0185] 4206: Gates 1600 to 1608: Procedure

[0186] 4208: Plates 1700 to 1712: Steps

[0187] 4300: Main road 3300 to 3310: Steps

[0188] 4302: Nitrogen source 3400 to 3408: Step

[0189] 4304: Branch pipes 3500 to 3510: Steps

[0190] 4306: Flow controller 4500 to 4516: Procedure

[0191] 4308: Control valve 4600 to 4622: Procedure

[0192] 4310: Particulate Filter Detailed Implementation

[0193] The invention will now be described in more detail with reference to the accompanying drawings, and specific embodiments of particular examples will be shown by way of example. However, the invention can be embodied in many different forms, and therefore the scope of the claims is not limited to any specific embodiments disclosed in this specification; the specific embodiments are merely examples. Likewise, the invention is intended to provide a reasonably broad scope for the claims.

[0194] The term "in one embodiment" as used in this specification does not necessarily refer to the same specific embodiment, and the term "in other (some, certain) embodiments" as used in this specification does not necessarily refer to different specific embodiments. The purpose is, for example, to invent a combination of all or some of the specific embodiments.

[0195] In the following description of the embodiments, the term "dedicated" refers to the technical means proposed to solve the storage problem according to the present invention, such as a dedicated box, a dedicated outer box, or a dedicated inner box; the term "non-dedicated" refers to the technical means involved that are not based on the storage target, and can be existing or other novel photomask inner or outer boxes. The non-dedicated box mentioned herein can be understood as an existing photomask box, such as... Figure 1 The image shows an existing double-layer box, but this does not mean that the non-dedicated box can only be an existing photomask box. More specifically, the non-dedicated box in this document should be understood as a photomask box that is not specifically designed for storage purposes, such as a photomask box that can be used for transmission purposes in general factory operations.

[0196] Figure 3The diagram shown is a block diagram of the photomask storage system of the present invention. The present invention provides a photomask storage system for storing photomasks within a photomask transport box 10. The photomask storage system includes a photomask loading system 200 and a photomask storage cabinet system 600. The photomask loading system 200 is used to transfer a photomask between the photomask transport box 10 and the dedicated photomask storage box 100, or to place an inner box for storing the photomask in the photomask transport box 10 or the dedicated photomask storage box 100. It should be understood that the photomask transport box 10 mentioned herein can refer to an existing photomask transport box or a photomask transport box that works with an overhead crane system in a factory. The photomask storage box 100 is a storage method proposed in this invention that differs from existing photomask boxes and is specifically designed for use in the photomask storage cabinet system 600 of the present invention.

[0197] The photomask loading system 200 has a first interface 202 for connection to the plant environment and a second interface 204 for connection to the photomask storage system 600. The first interface 202 allows the photomask transfer box 10 to be transferred between the plant environment and the loading environment provided by the photomask loading system 200, and the second interface 204 allows the photomask storage box 100 to be transferred between the loading environment and the storage environment of the photomask storage system 600. The first interface 202 and the second interface 204 may include valve devices to independently separate the plant environment, the loading environment, and the storage environment. The first interface 202 can also be configured to cooperate with an overhead crane system.

[0198] The photomask storage system 600 includes one or more photomask storage racks (not shown in the attached drawings) capable of storing multiple photomask storage boxes 100, a photomask storage control system 300 responsible for storing and retrieving the photomask storage boxes 100, a photomask inflation pipeline system 400 responsible for the gas environment of each photomask storage rack, and a photomask management system 500 responsible for all processes, the details of which will be described later.

[0199] Figure 4 The diagram shows the specific external configuration of the photomask storage system 600 of the present invention. The photomask loading system 200 is located adjacent to one side of the photomask storage system 600, but this is not a limitation of the present invention. The first interface 202 of the photomask loading system 200 faces upward to facilitate vertical loading or unloading of the photomask transport box 10 in conjunction with the overhead crane system. The second interface (not shown) is located on the side of the photomask loading system 200 and faces the photomask storage system 600 for horizontal loading or unloading of the photomask storage box 100.

[0200] The photomask loading system 200 is configured to have an identification method for the photomask delivery box 10 and the photomask storage box 100, for identifying radio frequency identification (RFID) codes or two-dimensional barcodes on the inner and / or outer boxes, which can be associated with the identification number of the box or the photomask. The identification method may also include detecting whether the photomask protective film (Pellicle) in the box is damaged through a window on the box and reading the two-dimensional barcode.

[0201] The first interface 202 and the second interface 204 correspond to different lifting devices in the photomask loading system 200, i.e., after the photomask transport box 10 and the photomask storage box 100 enter the loading environment, they are respectively held by their respective lifting devices. The loading environment also includes a clamping device for the photomask, used to transfer the photomask between the photomask transport box 10 and the photomask storage box 100. Details about the lifting devices and clamping devices will be described in subsequent paragraphs.

[0202] In case of maintenance required if the photomask loading system 200 is unavailable, the photomask storage cabinet system 600 can deliver the photomask storage box 100 along with the required photomask to the second interface 204. The photomask storage cabinet system 600 provides a manually operated door for personnel to retrieve the photomask storage box 100, ensuring the photomask can be safely removed under the protection of the storage box 100. A fan-filter unit (FFU) can be installed on the top of the photomask storage cabinet system 600 to draw air from the outside for use by the system. A corresponding exhaust unit is also required.

[0203] Figure 5A The image shown is an exploded side view of the photomask storage box of the present invention, wherein the photomask storage box 100 of the present invention includes a dedicated inner box 101 and a dedicated outer box 102. In a preferred embodiment of the present invention, the photomask storage box 100 has a double-layer box structure and is dedicated to the storage rack of the photomask storage cabinet system 600 of the present invention. Although dedicated to storage, the photomask storage box 100 of the present invention, like the existing photomask transport box 10, still has sealing means to protect the photomask, that is, the contact surface of the box body has a good sealing and dust-blocking design.

[0204] The photomask storage box 100 specifically used in the photomask storage system 600 of the present invention includes a dedicated outer box 102 and a dedicated inner box 101. The dedicated outer box 102 houses the dedicated inner box 101, and the photomask R is stored inside the dedicated inner box 101. The dedicated outer box 102 consists of an outer cover 150 and an outer base 160 (also referred to as a door), while the dedicated inner box 101 consists of a cover 110 and a base 130.

[0205] Figure 5A The photomask storage box 100 shown is Figure 1 Compared to the existing photomask transport box 10, the outer cover 150 of the photomask storage box 100 of the present invention does not need to cooperate with the overhead crane system, therefore the handle 52 of the existing photomask transport box 10 is removed, making the overall height of the photomask storage box 100 lower than that of the existing photomask transport box 10. Furthermore, Figure 5A The photomask storage box 100 shown is Figure 1 Compared to the existing photomask transfer box 10 shown, the positioning post 161 provided on the inner side of the outer base 160 of the photomask storage box 100 of the present invention is also shorter, making the height of the outer cover 150 and the outer base 160 of the present invention less than that of the photomask storage box 100 of the present invention. Figure 1 The height of the outer cover 50 and outer base 40 of the existing photomask transport box 10 is shown. To minimize the overall height of the photomask storage box 100 of the present invention, the pair of handles 151 provided on both sides of the outer cover 150 are not higher than the top surface of the outer cover 150. The shorter positioning post 161 reduces the height of the space containing the dedicated inner box 101. Therefore, the overall height of the photomask storage box 100 of the present invention is significantly smaller than the height of the existing photomask transport box 10, allowing the photomask storage system 600 of the present invention to accommodate a relatively larger number of dedicated photomask storage boxes 100 and photomasks.

[0206] Figure 5B The diagram shows a perspective view of the outer cover 150 of the special outer box 102 of the present invention. The outer cover 150 has removed the structural design for cooperating with the overhead crane system. The outer cover 150 has a flat top surface 152 and a surrounding side surface extending downward from the flat top surface 152. A handle 151 extends from the surrounding side surface and the handle 151 is not higher than the flat top surface 152, or only slightly higher than the flat top surface 152.

[0207] Figure 5C The figure shown is a perspective view of the outer base 160 of the special outer box 102 of the present invention. The bottom of the outer base 160 includes a plurality of air valves 162 and a positioning groove 163. The air valves 162 can be used with specific ports to supply specific gas to the special outer box 102 or to discharge gas from the special outer box 102. The positioning groove 163 is used to position the special outer box 102 at a certain position in the device.

[0208] Figure 5D The diagram shows an exploded perspective view of the dedicated inner box 101 of the present invention, including a cover 110, a base 130, and a retaining mechanism. The cover 110 and the base 130 are combined to define a receiving space, and the retaining mechanism supports and restricts a photomask R to be received within the receiving space. The top of the cover 110 is a flat surface and is provided with a filter membrane cover 112 and has a plurality of grooves 114 of a specific shape and arrangement. This embodiment is illustrated by providing four grooves 114 of a specific shape and arrangement.

[0209] See Figures 5E to 5J As shown, compared to Figure 1 The structure of the inner box 11 of the photomask transport box 10 shown is such that the holding mechanism of the dedicated inner box 101 of the photomask storage box 100 of the present invention makes chamfered contact with the photomask R. For example... Figure 5F and Figure 5H As shown, the holding mechanism includes elastic pressing mechanisms (i.e., photomask limiters 120) disposed at the four inner corners of the cover 110, and four support members 134 disposed on the upper side of the base 130. The number and position of the elastic pressing mechanisms and support members 134 are configured to match the number and position of the grooves 114 on the top of the cover 110. Therefore, the positions of these photomask limiters 120 and support members 134 correspond to each other. When the cover 110 is combined with the base 130 to accommodate the photomask R, the four support members 134 and their corresponding photomask limiters 120 will contact and limit the four corners of the photomask R. Multiple gas channels are provided at the center of the cover 110, and a filter membrane cover 112 is disposed on its upper side to cover these gas channels. Specifically, the filter membrane cover 112 is installed in the central recess on the top surface of the cover 110, as shown in the figure. Figure 5G As shown, the filter membrane cover 112 does not protrude from the top surface of the cap 110. A pair of handles 111 extending outward from the side of the cap 110 can interact with specific mechanisms during the opening operation of the photomask loading system 200, the details of which will be described in subsequent paragraphs.

[0210] Furthermore, the position of the groove 114 on the top of the cover 110 corresponds to the position of the photomask limiter 120. Therefore, when the dedicated inner box 101 is housed in the dedicated outer box 102, the groove 114 of the cover 110 can engage with the pressing mechanism provided inside the outer cover 150, so that the cover 110 receives pressure, thereby strengthening the connection of the dedicated inner box 101 and the retention of the photomask R, the details of which will be further explained in subsequent paragraphs.

[0211] Compared to Figure 1 The inner box 11 of the photomask transport box 10 shown, and the dedicated inner box 101 of the photomask storage box 100 of the present invention, can more securely store the photomask R. An external force is applied to the top surface of the cover 110 of the dedicated inner box 101 by the outer cover 150 of the dedicated outer box 102, causing the elastic pressing mechanism (i.e., photomask limiter 120) provided on the inner side of the cover 110 to stably press the four corners of the photomask R. More specifically, Figure 1 To stabilize the photomask during long-distance transport, the photomask transport box 10 utilizes an outer cover 50 of the outer box 12 to directly apply an external force to an elastic pressing mechanism on the cover 30 of the inner box 11, causing this elastic pressing mechanism to act on the upper surface of the photomask. In other words, Figure 1The outer cover 50 shown does not act on the cover 30.

[0212] Compared to Figure 1 The base 20 of the inner box 11 of the photomask transport box 10 shown in the invention, and the base 130 of the dedicated inner box 101 of the photomask storage box 100 of the present invention, remove the complex structure of the base 20 of the photomask transport box 10. These removed complex structures may include reflective laser engraving on the bottom surface of the base 20, partial window frames, and stepped structures, so that the base 130 of the present invention does not require additional processing, thereby significantly reducing costs. Furthermore, the bottom surface of the base 130 is a flat surface except for the configuration of the positioning groove 132 and the window W. The base 130 has a window W for detecting the two-dimensional barcode and protective film (Pellicle) on the photomask R. The bottom surface and sides of the base 130 are continuous flat surfaces; this stepless design facilitates rinsing and cleaning.

[0213] In addition, the depth of the protective film groove 131 on the base 130 is relatively... Figure 1 The base 20 shown has a deeper protective film groove, which improves airflow replacement efficiency within the chamber, increases the rate of decrease in relative humidity (RH%), and is beneficial for long-term preservation of the photomask. The base 130 has a surrounding groove 133 (e.g., Figure 6A As shown), four supports 134 are provided at the four corner positions of the photomask R within the surrounding groove 133. When the cover 110 is sealed to the base 130, the configuration of the surrounding groove 133 helps to capture particles entering the box.

[0214] Figure 5K The image shown is a perspective view of the base 130 of the special inner box 101 of this invention. Figure 5L and Figure 5M It is based on Figure 5K The dashed boxes in the image show the support member 134, which is configured within the surrounding groove 133.

[0215] Figure 5N The image shown is a photomask limiter 120 provided on the inner side of the cover 110 of the present invention. The elastic pressing mechanism of the cover 110 of the present invention can be provided by... Figure 5N The photomask limiter 120 shown is used to implement this. The photomask limiter 120 includes a body 121 and a pair of elastic arms 122 extending from both sides of the body 121 in different directions. One end of each elastic arm 122 is connected to the body 121, and the other end is connected to a limiting portion 123. One end of the limiting portion 123 is connected to the elastic arm 122, and the other end is connected to an inclined surface 124. The two inclined surfaces 124 extend upward from the limiting portion 123, and the ends of the two inclined surfaces 124 away from the limiting portion 123 are connected together. Specifically, the ends of the two inclined surfaces 124 are connected to a pressing portion 125, but the invention is not limited thereto, and the pressing portion 125 may be omitted.

[0216] The body 121 of the photomask limiter 120 is provided with a screw hole, allowing the photomask limiter 120 to be fixed to the inside of the cover 110 by existing locking means. The two inclined surfaces 124 connecting the pair of elastic arms 122 are used to respectively contact the upper edges of two corners of the photomask. In this embodiment, the limiting portion 123 is essentially a horizontally extending structure to cooperate with... Figure 5L and Figure 5M The support member 134 shown achieves the effect of limiting the lateral displacement of the pair of elastic arms 122, thereby limiting the swaying of the corner of the photomask.

[0217] Figure 6A The image shows the photomask limiter 120 and the corresponding support member 134 of the special inner box 101 of the present invention, which limit and support a corner of the photomask. Figure 6B The image shown is a magnified view of the support member 134 of the present invention restricting the lateral displacement of the photomask limiter 120.

[0218] The four support members 134 of the base 130 of the present invention are respectively disposed in the surrounding grooves 133 at the four corners of the base 130, and are used to support the corresponding corners of the photomask R. Each support member 134 has two support portions protruding upward from the surrounding grooves 133, and each support portion forms an inclined surface 135 facing the photomask R and inclined downward toward the photomask R. These inclined surfaces 135 are substantially orthogonal and respectively touch and engage the lower edges of the corresponding corners of the photomask R, such as... Figure 6A As shown. Each support portion of the support member 134 also extends an upwardly from its top end with a limiting block 136. The limiting block 136 is located at the top end of the inclined surface 135 and does not interfere with the photomask R. When the photomask R is placed on the support member 134, the two limiting blocks 136 of each support member 134 are respectively located on the two sides of the corner of the photomask R. When the cover 110 is combined with the base 130, the two limiting blocks 136 of each support member 134 are respectively located outside the limiting portion 123 of the photomask limiter 120 to limit the lateral displacement of the limiting portion 123 connecting the pair of elastic arms 122, as shown. Figure 6A and Figure 6B As shown. Therefore, when the cover 110 is combined with the base 130, the two limiting portions 123 of the photomask limiter 120 are constrained between the two support portions of each support member 134, thereby limiting the lateral displacement of the pair of limiting portions 123 and reducing the wobbling of the photomask limiter 120. In other possible embodiments, it is also feasible for the limiting block 136 to be located inside the limiting portion 123. Preferably, as Figure 6B As shown, there is a buffer gap between the limiting part 123 and the limiting block 136 to prevent the generation of particles by hardware friction.

[0219] Figure 7AThe image shown is a perspective view of the special inner box 101 of this invention. Figure 7B The image shows the special inner box 101 of this invention. Figure 7A The cross-sectional view shown by the dashed lines. Compared to Figure 1 The structure of the inner box 11 of the photomask delivery box 10 shown in the invention is such that the cover 110 and the base 130 of the dedicated inner box 101 of the present invention have no specific joining direction. The top surface of the cover 110 is a large flat surface without a stepped structure, meaning that the cover 110 as a whole greatly reduces the number of grooves and edges. The bottom surface of the base 130 also reduces or removes laser-engraved markings, windows, counterweights, and stepped structures, making the cover 110 and base 130 of the dedicated inner box 101 of the present invention easier to manufacture by reducing the number of processing steps, which helps to improve the yield. In addition, the base 130 has a protective film groove 131 with a relatively increased depth, which allows the receiving space of the dedicated inner box 101 to obtain better internal and external gas exchange efficiency, which helps to control the relative humidity (RH%) of the receiving space.

[0220] Furthermore, the holding mechanism of the dedicated inner box 101 of the present invention includes a pair of elastic arms 122 of the photomask limiter 120 engaging with the chamfer of the photomask edge, and a pair of limiting blocks 136 of the support member 134 limiting the pair of limiting portions 123 of the photomask limiter 120, thereby holding the photomask R. The support member 134 and the photomask limiter 120 contact the photomask R through the inclined surface 135 of the support member 134, which avoids imprints on the upper and lower surfaces of the photomask R and helps maintain the horizontal state of the photomask R and guide the photomask R. The contact surface between the cover 110 and the base 130 can form a sealed contact by existing means. In this embodiment, the contact surface of the base 130 is lower than the highest surface of the base 130, and the contact surface of the base 130 is separated from the highest surface by a surrounding groove 133, which helps prevent particles from entering the protective film area.

[0221] Figure 8A The image shown is a bottom view of the outer cover 150 of the special outer box 102 of the present invention, which shows four pressing mechanisms. Figure 8B The details of the pressing mechanism and its action on the cover 110 of the dedicated inner box 101 are shown; the outer cover 150 is omitted and not shown. Figure 9A As shown Figure 5A The cross-sectional view of the photomask storage box 100 when assembled. Figure 9B As shown Figure 9A A magnified view of the area indicated by the dashed line.

[0222] When the outer casing 102 of this invention is equipped with these pressing mechanisms and houses the inner casing 101, the outer cover 150 provides a pressing force to the inner casing 101 housed within the outer casing 102. Please refer to the following: Figure 5B and Figure 5CAs shown, the special outer box 102 of the present invention includes an outer cover 150 and an outer base 160. According to the present invention, a pressing mechanism is further provided, and the outer cover 150 and the outer base 160 can be used to accommodate inner boxes of different structures, i.e. Figure 2 The inner box 11 shown Figure 5D The special inner box 101 is shown. In this embodiment, the inner boxes with different structures are described using the special inner box 101 of the present invention and the inner box 11 of the photomask transport box 10. The two have different configurations on the top surfaces of the cover 110 and the cover 30, but the present invention is not limited to these two types of inner boxes.

[0223] Each pressing mechanism provided on the inner downward-facing surface of the outer cover 150 is positioned approximately corresponding to the four corners of the photomask R held by the dedicated inner boxes 101 and 11 of different structures. Each pressing mechanism includes a first pressing mechanism and a second pressing mechanism, wherein the first pressing mechanism is configured to provide downward pressure only to the cover 30 of the inner box 11 of the photomask transport box 10, but not to the cover 110 of the dedicated inner box 101 of the present invention. Conversely, the second pressing mechanism is configured to provide downward pressure only to the cover 110 of the dedicated inner box 101 of the present invention, but not to the cover 30 of the inner box 11 of the photomask transport box 10. Furthermore, the present invention does not limit the first pressing mechanism and the second pressing mechanism to be separate components or integrally formed single components.

[0224] See Figure 8A As shown, the pressing mechanism of the present invention is disposed on the lower surface of the outer cover 150, roughly corresponding to the corner of the photomask R. In this embodiment, the first pressing mechanism is a horseshoe-shaped pressing rib 153, and the second pressing mechanism is a pressing post 154, both of which can be made of elastic material. Specifically, the horseshoe-shaped pressing rib 153 is a meandering U-shaped extension structure, and the pressing post 154 is located inside the horseshoe-shaped pressing rib 153, or the pressing post 154 is surrounded by the horseshoe-shaped pressing rib 153. In this embodiment, the pressing post 154 has a Y-shaped structure, but the present invention is not limited thereto.

[0225] See Figure 8B As shown, in order for the first pressing mechanism and the groove 114 of the cover 110 to cooperate, the horseshoe-shaped pressing rib 153 has a specific size and shape. When the dedicated outer box 102 of the photomask storage box 100 of the present invention stores the dedicated inner box 101, the horseshoe-shaped pressing ribs 153 arranged on the inner side of the outer cover 150 of the dedicated outer box 102 precisely enter the corresponding grooves 114 of the cover 110, and the lower surface of the horseshoe-shaped pressing rib 153 contacts the bottom surface of the groove 114, so that the weight of the outer cover 150 can be applied to the cover 110 through the horseshoe-shaped pressing rib 153, but the pressing post 154 fails to contact the bottom surface of the groove 114 due to its size. Figure 9A and Figure 9B As shown, when the outer cover 150 is combined with the outer base 160 and accommodates the dedicated inner box 101, because the vertical dimension of the horseshoe-shaped pressing rib 153 is larger than the vertical dimension of the pressing post 154, the lower end of the horseshoe-shaped pressing rib 153 can enter the groove 114 and abut against the bottom surface of the groove 114, while the pressing post 154 is suspended in the groove 114. In other words, when the dedicated outer box 102 accommodates the dedicated inner box 101, the pressing post 154 does not interact with the cover 110. In addition, the sidewall of the groove 114 can restrict the lateral displacement of the horseshoe-shaped pressing rib 153, preventing the dedicated inner box 101 from swaying laterally in the dedicated outer box 102.

[0226] Figure 10A The image shown is a perspective view of the photomask transmission inner box 11. Figure 10B The diagram shows the corresponding mechanism of the pressing mechanism acting on the inner box 11 of the photomask transport box 10, with the outer cover 150 omitted. Figure 10C The diagram shows the corresponding mechanism between the pressing mechanism and the inner box 11 of the photomask transport box 10 in the magnified display.

[0227] On the cover 30 of the inner box 11, roughly corresponding to the corner of the photomask R, a corresponding elastic pressing mechanism is provided. The elastic pressing mechanism includes a pressing pin 32 and a cap 34 for fixing the pressing pin 32. Specifically, the top end of the pressing pin 32 is exposed on the top of the cover 30, and the lower end of the pressing pin 32 extends downward to the inside of the cover 30 and is exposed to the receiving space of the inner box 11. When the inner box 11 houses a photomask R and the top end of the pressing pin 32 is subjected to pressure, the pressing pin 32 is forced down, so that the lower end of the pressing pin 32 abuts against the upper surface of the photomask R to hold the photomask.

[0228] When the photomask storage box 100 of the present invention is stored in the dedicated outer box 102 Figure 10A When the inner box 11 is shown, the pressing mechanism provided on the inner side of the outer cover 150 of the dedicated outer box 102 can act on the elastic pressing mechanism of the inner box 11. Specifically, as shown... Figure 10B As shown, due to the different vertical dimensions of the horseshoe-shaped pressing rib 153 and the pressing post 154, the bottom end of the pressing post 154 in the pressing mechanism can abut against the exposed top end of the pressing pin 32. This allows the weight of the outer cover 150 to be pressed down onto the exposed top surface of the pressing pin 32 via the pressing post 154, while the horseshoe-shaped pressing rib 153 surrounds the cap 34 and does not interact with the cap 30. Figure 10C As shown, the inner wall of the horseshoe-shaped downward pressing rib 153 can limit the lateral displacement of the cap 34, thereby preventing the inner box 11 from swaying laterally in the dedicated outer box 102.

[0229] The Y-shaped structure of the pressure post 154 in this embodiment aims to create structural interference between the pressure post 154 and the cap 34, preventing the pressure post 154 from excessively pressing down on the pressure pin 32, which could lead to improper stress on the photomask R. Preferably, there is an appropriate buffer gap between the horseshoe-shaped pressure rib 153 and the cap 34 to prevent the generation of particles due to hardware friction.

[0230] Figure 11A The image shown is a cross-sectional view of a dedicated inner box 101 housed in a dedicated outer box 102 of the photomask storage box 100 of the present invention. Figure 11B The diagram shows a cross-sectional view of a non-dedicated inner box 11 housed in a dedicated outer box 102 of the photomask storage box 100 of the present invention. In other words, the dedicated outer box 102 provided by the present invention, because it contains a pressing mechanism composed of two structures, can accommodate not only a dedicated inner box 101 proposed for storage purposes, but also existing inner boxes 11 that are widely used in the art. Furthermore, this pressing mechanism effectively achieves stable housing for both types of inner boxes 11 and dedicated inner boxes 101 with different configurations and uses.

[0231] Figure 12 The view of the cover 110 of the dedicated inner box 101 and the cover 30 of the non-dedicated inner box 11 overlaps. The volume of the groove 114 is larger than the cap 34 of the elastic pressing mechanism, and the top height of the lower pressing pin 32 of the elastic pressing mechanism is higher than the bottom surface of the groove 114, as shown by the vertical drop H. When the dedicated inner box 101 or the non-dedicated inner box 11 is housed in the dedicated outer box 102, the horseshoe-shaped pressing rib 153 can press against the bottom surface of the groove 114, or the bottom surface of the lower pressing post 154 of the outer cover 150 can press against the top of the lower pressing pin 32. In other words, in order to match the dedicated inner box 101 and the non-dedicated inner box 11, the vertical dimensions of the first pressing mechanism such as the horseshoe-shaped pressing rib 153 and the second pressing mechanism such as the lower pressing post 154 provided on the inner side of the outer cover 150 of the present invention are substantially the same as the height difference of the vertical drop H.

[0232] Figure 13 The image shown is a perspective view of the photomask loading system 200 of the present invention. Figure 14 The diagram shows the configuration of the photomask loading system 200 of the present invention.

[0233] The photomask loading system 200 of the present invention has a first interface 202 supporting the E84 standard, allowing the loading or unloading of the photomask transport box 10, and a second interface 204 connected to, for example, Figure 4A connection channel in the photomask storage system 600 is shown to allow the loading or unloading of the photomask storage box 100. Specifically, the overhead crane system of the plant can cooperate with the first interface 202 to load the photomask transport box 10 into or remove the photomask transport box 10 from the photomask loading system 200; the second interface 204 can cooperate with the robotic arm in the photomask storage system 600 to transfer the photomask storage box 100 between the environment of the photomask storage system 600 and the environment of the photomask loading system 200. In this embodiment, the second interface 204 is located on the back of the photomask loading system 200 and is therefore not visible on the back. Figure 13 middle.

[0234] The photomask loading system 200 is configured to have identification and inspection equipment for the photomask delivery box 10 and the photomask storage box 100, such as a radio frequency identification (RFID) reading device, a two-dimensional barcode reading device, and a photomask plecle inspection device related to the box or the photomask R.

[0235] The first interface 202 and the second interface 204 correspond to a first lifting device and a second lifting device, respectively. In this embodiment, the first lifting device A mainly controls a lifting platform to carry the photomask transport box 10, and the second lifting device B mainly controls another lifting platform to carry the photomask storage box 100. The first lifting device A can stop the lifting platform at different vertical heights, from high to low, namely height A0, height A1, and height A2. Similarly, the second lifting device B can stop the lifting platform at different vertical heights, from high to low, namely height B0, height B1, and height B2. Figure 14 As shown, the photomask transport box 10 and photomask storage box 100 located at heights A0 and B0 are both closed. The photomask transport box 10 and photomask storage box 100 located at heights A1 and B1 are both open (not shown in the figure). The photomask transport box 10 and photomask storage box 100 located at heights A2 and B2 are both open, and one of them can expose the photomask. More specifically, when the photomask transport box 10 and photomask storage box 100 are located at heights A1 and B1, an opening device intervenes to separate the outer and inner covers from the outer and inner bases. More specifically, when the photomask transport box 10 and photomask storage box 100 are located at heights A2 and B2, only their respective outer and inner bases remain on the lifting platform. The inner and outer covers are blocked and do not descend to heights A2 and B2. At this time, the photomask R can be located in a photomask transfer environment 206.

[0236] The conditions of the photomask transfer environment 206 can differ from those at heights A0, A1, B0, and B1 to ensure a lower risk of photomask R transfer. The photomask transfer environment 206 includes a photomask clamping mechanism configured to pick up the photomask R from or place it on the base, allowing the photomask R to be transferred between the base of the photomask transport box 10 and the base of the photomask storage box 100.

[0237] Furthermore, the robotic arm in the photomask storage system 600 can retrieve the photomask storage box 100 from the photomask loading system 200 via the second interface 204. If the photomask loading system 200 malfunctions and still contains the photomask storage box 100, the robotic arm of the photomask storage system 600 can temporarily remove the photomask storage box 100 to ensure that the dedicated box of the photomask storage system 600 is not contaminated during the maintenance of the photomask loading system 200.

[0238] To ensure that the environment within the photomask loading system 200 also maintains a certain level of cleanliness, such as... Figure 13 As shown, a fan-filter unit (FFU) is installed above the cabinet, which is responsible for air intake, filtration and exhaust.

[0239] Figure 15 and Figure 16 yes Figure 14 The flowchart of photomask loading and unloading in the embodiment is shown.

[0240] In step 1500A, a photomask transport box 10 is loaded through the first interface 202. The photomask transport box 10 includes an inner box containing a photomask R and an outer box containing the inner box, wherein the photomask R needs to be stored because it is unused or has been used up. The inner box and the outer box can respectively correspond to Figure 1 The inner box 11 and outer box 12 are shown.

[0241] In step 1500B, a photomask storage box 100 is loaded from the photomask storage system 600. The photomask storage box 100 includes an empty dedicated inner box 101 and a dedicated outer box 102 that houses the dedicated inner box 101. The photomask storage system 600 already stores multiple photomask storage boxes 100. The one loaded in this step is an empty dedicated box. The dedicated inner box and the dedicated outer box can correspond to each other. Figure 5A The dedicated inner box 101 and the dedicated outer box 102.

[0242] In step 1502, the photomask loading system 200 detects the photomask transport box 10 and the photomask storage box 100 respectively; performs the opening action of the inner and outer boxes of the photomask transport box 10; performs the opening action of the dedicated outer box 102 and the dedicated inner box 101 of the photomask storage box 100; and lowers the outer base of the photomask transport box 10 and the outer base of the photomask storage box 100 to the photomask transfer environment 206. Specifically, this step may cover Figure 14 The heights of the first lifting device A to the height A2 and the heights of the second lifting device B to the height B2 are shown.

[0243] In step 1504, the photomask R is removed from the base of the photomask transfer box 10 and transferred to the base of the photomask storage box 100. This transfer is performed by a photomask clamping mechanism, and the photomask R is moved in a high-cleanliness photomask R transfer environment 206 to reduce the risk of photomask R contamination.

[0244] In step 1506, the photomask delivery box 10 and the photomask storage box 100 are returned to the closed state. At this time, the photomask delivery box 10 is empty, while the photomask storage box 100 contains the photomask R to be stored.

[0245] In step 1508, the photomask storage cassette 100 containing the photomask R is transferred to a designated storage rack in the photomask storage system 600. Preferably, the designation of the storage rack is based on the relationship between the storage rack and the storage location. Figure 14 The shortest motion path of the robotic arm between the second interface 204 shown is determined.

[0246] In step 1510, a gas filling operation is performed, filling the photomask storage box 100 with a non-reactive gas to complete the storage of the photomask R. Specifically, the storage rack has dedicated piping and connectors connected to the photomask storage box 100, which can fill the dedicated outer box 102 of the photomask storage cabinet system 600 with nitrogen. In other words, the dedicated inner box 101 is stored in a specific gaseous environment.

[0247] In step 1600A, a photomask transport box 10 is loaded from the first interface 202. The photomask transport box 10 includes an empty inner box and an outer box that houses the inner box. The inner box and the outer box can correspond to each other. Figure 1 The inner box 11 and outer box 12 are shown.

[0248] In step 1600B, a photomask storage box 100 is loaded from the photomask storage cabinet system 600 into the photomask loading system 200. The photomask storage box 100 includes a dedicated inner box 101 for housing a photomask and a dedicated outer box 102 for housing the dedicated inner box 101. The dedicated inner box and the dedicated outer box can correspond to each other. Figure 5AThe dedicated inner box 101 and dedicated outer box 102. The photomask R used in this step has been stored in the photomask storage system 600 and will be retrieved for various applications.

[0249] In step 1602, the photomask loading system 200 detects the photomask transport box 10 and the photomask storage box 100 respectively; opens the inner and outer boxes of the photomask transport box 10; opens the inner and outer boxes of the photomask storage box 100; and lowers the outer bases of the photomask transport box 10 and the photomask storage box 100 to the photomask transfer environment 206.

[0250] In step 1604, the photomask R is removed from the base of the photomask storage cassette 100 and placed on the base of the photomask transfer cassette 10. Similarly, the photomask loading system 200 uses a photomask clamping mechanism to transfer the photomask R from the base of the photomask storage cassette 100 to the base of the photomask transfer cassette 10, and the photomask R moves within the photomask transfer environment 206.

[0251] In step 1606, the photomask delivery box 10 and the photomask storage box 100 are returned to the closed state. At this time, the photomask delivery box 10 carries the photomask R, while the photomask storage box 100 is empty.

[0252] In step 1608, the photomask transport box 10 carrying the photomask R is removed from the photomask loading system 200 through the first interface 202. Specifically, the first interface 202 can cooperate with the overhead crane system to remove the photomask transport box 10. The empty photomask storage box 100 is then returned to the appropriate area of ​​the photomask storage system 600 to await its next use.

[0253] Figure 17 The diagram shown is a detailed flowchart of the transfer process of the photomask R according to the present invention. The following is in conjunction with... Figure 14 The explanation is as follows: the left half is executed by the first lifting device A, the right half is executed by the second lifting device B, and the rest are executed jointly.

[0254] Step 1700A: The photomask transport box 10 is loaded from the first interface 202 into the first lifting device A of the photomask loading system 200. The photomask transport box 10 includes an inner box and an outer box that houses the inner box. Specifically, the lifting platform of the first lifting device A is stopped at a height A0 to receive and carry the photomask transport box 10.

[0255] Step 1700B: A second lifting device B is used to load the photomask storage box 100 from the photomask storage system 600 to the photomask loading system 200 via a connecting channel. The photomask storage box 100 includes a dedicated inner box 101 and a dedicated outer box 102 that houses the dedicated inner box 101. Specifically, the lifting platform of the second lifting device B is stopped at a height B0 to receive and carry the photomask storage box 100.

[0256] In step 1702A, the cover of the outer box of the photomask transport box 10 is grasped, and when the lifting platform of the first lifting device A descends from height A0 to height A1, the cover of the outer box separates from the base of the outer box. When the lifting platform is at height A1, the cover of the outer box has been removed, leaving only the base of the outer box and the inner box on the lifting platform.

[0257] In step 1702B, the cover of the outer box of the photomask storage box 100 is grasped, and when the lifting platform of the second lifting device B descends from height B0 to height B1, the cover of the outer box separates from the base of the outer box. When the lifting platform is at height B1, the cover of the outer box has been removed, leaving only the base of the outer box and the inner box on the lifting platform.

[0258] In step 1704A, the cover of the inner box of the photomask transport box 10 is grasped, and as the lifting platform of the first lifting device A descends from height A1 to height A2, the cover of the inner box separates from the base. When the lifting platform is at height A2, the cover of the inner box has been removed, leaving only the base of the outer box and the base of the inner box. During the descent of the lifting platform from height A0 to height A2, the photomask loading system 200 can read the two-dimensional barcode of the inner box, the two-dimensional barcode of the photomask R, and / or detect the protective film status as appropriate.

[0259] In step 1704B, the cover of the inner box of the photomask storage box 100 is grasped, and as the lifting platform of the second lifting device B descends from height B1 to height B2, the cover of the inner box separates from the base. When the lifting platform is at height B2, the cover of the inner box has been removed, leaving only the base of the outer box and the base of the inner box. During the descent of the lifting platform from height B0 to height B2, the photomask loading system 200 can read the two-dimensional barcode of the inner box, the two-dimensional barcode of the photomask R, and / or detect the protective film status as appropriate.

[0260] In step 1706, a photomask R is transferred between the base of the inner box of the photomask transport box 10 and the base of the inner box of the photomask storage box 100 using the photomask clamping mechanism of the photomask loading system 200. A specific embodiment of the photomask clamping mechanism can be found in [reference needed]. Figures 19A to 19C As shown.

[0261] In step 1708A, the lifting platform of the first lifting device A is raised from height A2 to height A1, so that the cover of the inner box of the photomask transfer box 10 is connected to the base of the inner box.

[0262] In step 1708B, the lifting platform of the second lifting device B is raised from height B2 to height B1, so that the cover of the inner box of the photomask storage box 100 is connected to the base of the inner box.

[0263] In step 1710A, the lifting platform of the first lifting device A is raised from height A1 to height A0, so that the cover of the outer box of the photomask transfer box 10 is naturally attached to the base of the outer box.

[0264] In step 1710B, the lifting platform of the second lifting device B is raised from height B1 to height B0, so that the cover of the outer box of the photomask storage box 100 is connected to the base of the outer box.

[0265] In step 1712A, the photomask transport box 10 is removed through the first interface 202. The lifting platform of the first lifting device A is higher than the height A0, exposing the photomask transport box 10 to the first interface 202 of the photomask loading system 200, awaiting subsequent actions of the overhead crane system.

[0266] In step 1712B, the photomask storage box 100 is loaded into the photomask storage system 600 through the connection channel of the photomask storage system 600. The robotic arm of the photomask storage system 600 can enter the photomask loading system 200 and retrieve the photomask storage box 100 from the second lifting device B.

[0267] In the above embodiments, the first lifting device A and the second lifting device B can each perform dedicated customized operations on the photomask transport box 10 and the photomask storage box 100. For example, the first lifting device A can be configured to lock and unlock the outer box of the photomask storage box 100.

[0268] Figure 18 The image shown is a specific embodiment of the photomask loading system of the present invention, having the following characteristics: Figure 14 The first lifting device A and the second lifting device B are shown. It can be seen that the first lifting device A has an outer box cover support surface 1800A, which essentially only contacts the cover of the outer box of the photomask transport box 10. That is, the center of the outer box cover support surface 1800A has a cutout that allows the base of the outer box to fall. The base of the outer box of the photomask transport box 10 is supported by a lifting platform 1802A. Therefore, when the outer box of the photomask transport box 10 is not locked, the descent of the lifting platform 1802A can naturally separate the cover of the outer box from the base, causing the base of the outer box to fall together with the inner box, achieving the purpose of opening the box. Closing the box is similar; when the lifting platform 1802A rises to a height approximately level with the outer box cover support surface 1800A, the cover of the outer box of the photomask transport box 10 naturally engages with the base.

[0269] The second lifting device B can have a similar configuration to operate the photomask storage box 100. Although Figure 18The diagram only shows the outer casing of the photomask delivery box 10 open; the inner casing of the photomask delivery box 10 can be opened by intervention of other mechanisms. The photomask storage box 100 can also be opened and closed by the same mechanism. Furthermore, the photomask loading system 200 may provide appropriate identification devices or sensing units to identify relevant information on the boxes, such as Radio Frequency Identification (RFID) codes and two-dimensional barcodes, when the photomask delivery box 10 and the photomask storage box 100 are opened.

[0270] Figure 19A , Figure 19B and Figure 19C The diagram shows a specific embodiment of a photomask clamping mechanism 1900 used in a photomask loading system. The photomask clamping mechanism 1900 is configured as follows: Figure 14 The photomask transfer environment 206 shown includes a track 1902 and a clamping assembly 1904. The track 1902 is fixed to the inside of the photomask loading system 200, as shown. Figure 20 As shown, the clamping assembly 1904 is controlled to move laterally on the track 1902. The clamping assembly 1904 has a pair of clamping arms 1906 and a pair of contact plates 1908. The pair of contact plates 1908 can be driven to move closer to each other and engage with the periphery of the photomask R through their mating portions 1910, thereby clamping the photomask R. The photomask clamping mechanism 1900 does not have the ability to move vertically, so the lifting platform must be lowered to remove the photomask R from the base.

[0271] Figure 20 The image shown is a side view of the photomask clamping mechanism 1900 in cooperation with the lifting platform 2000. The lifting platform 2000, which carries the outer base 40 of the outer box 12, the base 20 of the inner box 11, and the photomask (not shown), descends below the photomask clamping mechanism 1900, as shown. Figure 20 As shown on the right. Next, the clamping assembly 1904 moves horizontally above the photomask R carried by the lifting platform 2000. The lifting platform 2000 rises to a height where the photomask can be clamped, as shown... Figure 20 As shown on the left. After the clamping assembly 1904 clamps the photomask R, the lifting platform 2000 descends. The clamping assembly 1904 moves horizontally above another lifting platform (not shown). Similarly, the other lifting platform rises to the height of the inner box base to support the photomask. The clamping assembly 1904 releases the photomask, completing the transfer action. During periods when the photomask clamping mechanism 1900 is not in operation, the clamping assembly 1904 can move between the two lifting devices to avoid operational interference. Figure 20 The dashed line indicates that the clamping assembly 1904 maintains the same height during movement.

[0272] Figure 21The diagram shows the anomaly handling process of the photomask loading system, especially... Figure 14 The abnormal loading process of the photomask transfer box 10 of the lifting platform of the first lifting device A or the second lifting device B shown.

[0273] In the event of a shutdown due to an abnormal loading of the photomask transport box 10, the photomask loading system 200 can display the abnormal status and detect whether an initialization button is activated. When the initialization button is activated, the photomask loading system 200 undergoes a full system initialization. The lifting platform returns the photomask transport box 10 to its original position at height A0.

[0274] In the event of a shutdown due to an abnormal loading of the photomask storage box 100, the photomask loading system 200 can display the abnormal status and detect whether an initialization button is activated. When the initialization button is activated, the photomask loading system 200 undergoes a full system initialization. The lifting platform then returns the photomask storage box 100 to its original position at height B0.

[0275] If the lifting platforms of the first lifting device A and the second lifting device B malfunction and stop due to a transition error at heights A2 and B2, the photomask loading system 200 can display the abnormal status and detect whether an initialization button is activated. When the initialization button is activated, the photomask loading system 200 performs a full system initialization. The photomask clamping mechanism 1900 places the photomask in the inner box of the photomask transfer box 10 or the inner box of the photomask storage box 100. The lifting platforms of the first lifting device A and the second lifting device B return to their respective heights A0 and B0.

[0276] Figure 22 The diagram shows another abnormality handling process of the photomask loading system 200, which further includes checking the protective film status. The photomask loading system 200 can also detect whether the one-key ejection is activated and perform various actions to return the photomask to the photomask transport box 10 or the photomask storage box 100, or return the photomask storage box 100 to the designated storage rack.

[0277] Figure 23 The diagram shows the abnormal handling process of the photomask clamping mechanism. The photomask R comes from the inner box of the photomask transport box 10 or from the inner box of the photomask storage box 100. The photomask clamping mechanism 1900 can return the photomask to the inner box of the photomask transport box 10 or from the inner box of the photomask storage box 100, and then return the photomask transport box 10 or the photomask storage box 100 to the position specified in the initialization process.

[0278] Figure 24The diagram shows a block illustration of the photomask loading system and photomask storage system of the present invention. The photomask storage system 600 includes one or more storage cabinets 602. Each storage cabinet 602 includes multiple vertically stacked storage racks 604. The storage cabinet 602 can be divided into an upper section and a lower section. Each storage rack 604 of the storage cabinet 602 can hold a dedicated photomask storage box 100. The dedicated photomask storage box 100 consists of a dedicated outer box 102 and a dedicated inner box 101, wherein the dedicated outer box 102 is adapted to receive and secure the dedicated inner box 101, and the dedicated inner box 101 is adapted to receive and secure a photomask R. The dedicated inner box 101 and the dedicated outer box 102 can correspond to each other. Figure 5A The special inner box 101 and special outer box 102 are shown.

[0279] Part of the storage rack 604 of the storage cabinet 602 can be configured as a buffer zone 606, which is used to store cleaned photomask storage boxes 100 or used photomask storage boxes 100. Cleaned photomask storage boxes 100 are empty boxes awaiting delivery to the photomask loading system 200 to receive the photomask R to be housed. Used photomask storage boxes 100 refer to empty boxes returned from the photomask loading system 200, which are at risk of contamination due to exposure to a lower cleanliness environment during photomask conversion.

[0280] The photomask storage system 600 includes a management device 608, primarily configured to manage the photomask information stored in the storage cabinet 602, and to monitor the temperature and humidity within the storage cabinet 602. For example, an oxygen detection unit is used to detect the oxygen concentration within the cabinet. Preferably, the environment within the storage cabinet 602 meets Class 10 cleanliness standards, and the filling gas meets Class 1 cleanliness standards. The photomask storage system 600 also includes a control device 610, which controls a robotic arm 609 to transport photomask storage boxes to designated storage racks 604 in a general storage area or buffer zone 606. The photomask storage system 600 also includes a flow control device 612, responsible for various flow controls within the storage cabinet 602, particularly for non-reactive gases connected to each storage rack 604. For example, a mass flow controller is used to control the flow rate of one or more nitrogen main pipelines. The flow control device 612 also includes a fan-filter unit (FFU) configured on top of the photomask storage system 600 and an air extraction module configured at the bottom of the photomask storage system 600.

[0281] The photomask storage system 600 also includes a cleaning device 614 adjacent to a buffer zone 606 to provide clean photomask storage boxes 100 to the storage cabinet 602, and to receive used photomask storage boxes 100 from the storage cabinet 602.

[0282] Figure 25 The diagram shows a top view of the photomask storage system 600 of the present invention, illustrating the specific internal configuration of the photomask storage system 600. Storage cabinets 602 are primarily placed along the inner wall of the photomask storage system 600. A robotic arm 609 is located at the center of the photomask storage system 600 and can access each storage rack 604 of these storage cabinets 602.

[0283] Figure 26A The figure shown is a perspective view of a specific embodiment of the storage rack 604 of the present invention. Figure 26B The bottom configuration of storage rack 604 is shown.

[0284] Each storage rack 604 is a flat rack with a front end 2600 and a rear end 2602. The rack has an upward-facing support surface and a downward-facing bottom surface. The front end 2600 of the rack has a notch that provides space for the robotic arm 609 to move, allowing the robotic arm 609 to smoothly place the photomask storage box 100 on the storage rack 604 or remove the photomask storage box 100 from the storage rack 604. The rear end 2602 of the rack is equipped with a nitrogen filling pipe 2604, the upstream end of which is connected to a nitrogen source, and the downstream end is connected to a pair of nozzles 2606 on the flat rack, simultaneously supplying nitrogen.

[0285] Each storage rack 604 has three kinematic coupling pins 2608 on its bearing surface to support the bottom of the photomask storage box 100. Two of the pins 2608 are located near the front end 2600 and on either side of the notch, while the third pin 2608 is located at the rear end 2602 of the rack. This allows the storage rack 604 to primarily support and position the photomask storage box 100 via these three pins 2608. Specifically, these three pins 2608 correspond to the following... Figure 5C The positioning groove 163 of the outer base shown Figure 5I The positioning groove 132 of the base 130 shown depends on whether the storage rack 604 supports the outer or inner box of the special box.

[0286] The support surface of the storage rack 604 is also provided with a stop 2610 for limiting the photomask storage box 100. Preferably, the stop 2610 may be marked with information that can be identified by the robotic arm 609. This information may also be marked on the front end 2600 of the storage rack 604. Figure 26AAs shown, side walls are also formed on both sides of the frame to limit the photomask storage box 100. The two sides of the storage rack 604 are fixed to a wall or a vertical branch of a frame by a pair of connecting arms 2612 to establish a vertical stack of multiple storage racks 604. The positioning post 2608, the stop 2610 and the side walls can be made of polyetheretherketone (PEEK) plastic to reduce particles generated by friction.

[0287] Figure 27A The storage rack 604 shown has a photomask storage box 100. Figure 27B The image shown is a bottom view of the storage rack 604 with the photomask storage box 100. Figure 27C The image shown is another view of the storage rack 604 with the photomask storage box 100.

[0288] as Figure 5A As shown, the photomask storage box 100 includes a dedicated inner box 101 and a dedicated outer box 102, wherein the dedicated outer box 102 has an outer cover 150 and an outer base 160. The bottom of the outer base 160 has a locking mechanism 2700 for interlocking or unlocking the outer cover 150 and the outer base 160. When the photomask storage box 100 is loaded with... Figure 14 When the photomask loading system 200 is lifted, the operating mechanism provided in the second lifting device B can cooperate with the locking mechanism 2700 of the outer base 160 to lock or unlock the dedicated outer box 102.

[0289] When the photomask storage box 100 is placed on the designated storage rack 604, the positioning post 2608 of the storage rack 604 engages with the corresponding positioning slot 163 on the bottom of the photomask storage box 100 to position the photomask storage box 100 on the storage rack 604. Specifically, the positioning post 2608 of the storage rack 604 is located at one outer end of the corresponding positioning slot 163, that is, the end away from the locking mechanism 2700, while the inner end of each positioning slot 163 near the locking mechanism 2700 is exposed through a notch, so that when the robotic arm 609 approaches the bottom of the photomask storage box 100, the positioning post 2804 of the robotic arm 609 can engage the proximal end of the corresponding positioning slot 163.

[0290] Figure 28A The diagram shows a top view of a specific embodiment of the storage rack 604 and the robotic arm 609, wherein the robotic arm 609 is located below the photomask storage box 100, and the positioning groove 163 at the bottom of the photomask storage box 100 on the storage rack 604 is indicated by dashed lines. Figure 28B The image shown is a side view of the robotic arm 609 entering below the storage rack 604 to extract the photomask storage box 100. Figure 28C The image shown is a side view of the robotic arm 609 removing the photomask storage box 100 from the storage rack 604.

[0291] The robotic arm 609 has a front end 2800 and a rear end 2802. The front end 2800 is essentially an arrow-shaped flat plate with three positioning posts 2804 on its upward-facing bearing surface. These three positioning posts 2804 correspond precisely to the inner ends of the positioning grooves 163 at the bottom of the photomask storage box 100, while the positioning posts 2608 of the storage rack 604 correspond to the outer ends of the engagement positioning grooves 163. In other words, the positioning grooves 163 at the bottom of the photomask storage box 100 of the present invention extend at least from the flat plate frame of the storage rack 604 to the notch area, but the present invention is not limited thereto. The rear end 2802 is connected to a transmission mechanism, so the robotic arm 609 can move at least laterally and longitudinally.

[0292] like Figure 28A and Figure 28B As shown, when the robotic arm 609 approaches the photomask storage box 100, the front end 2800 of the robotic arm 609 first extends into the notch below the target storage rack 604, and the positioning post 2804 of the robotic arm 609 is aligned with the corresponding positioning groove 163 at the bottom of the photomask storage box 100.

[0293] The robotic arm 609 rises to engage the positioning post 2804 with the positioning groove 163 at the bottom of the photomask storage box 100. The robotic arm 609 continues to rise to lift the photomask storage box 100 away from the storage rack 604, and the lifting height is at least above the height of the front end 2600 of the storage rack, allowing the robotic arm 609 to exit the storage rack 604. Figure 28C As shown.

[0294] Given the minimum space required for the robotic arm 609 to access each photomask storage box 100, the height between the upper and lower storage shelves 604 can be minimized to achieve maximum storage efficiency.

[0295] Figure 29 The upstream gas supply line 2900 and its flow control device of the storage rack 604 are shown. Downstream of the gas supply line 2900 is connected to... Figure 26A The inflation line 2604 is shown. Therefore, nitrogen gas can be supplied through the nozzle 2606 of the storage rack 604 and, as shown... Figure 5CTwo corresponding air valves 162 of the photomask storage box 100 shown supply gas to the box. The other two unconnected air valves 162 of the photomask storage box 100 vent gas from the box, thus the photomask housing space of the photomask storage box 100 located on the storage rack 604 has convective gas. Flow control devices upstream of each air supply line 2900 may include a ball valve 2901, a flow indicator 2902, a flow restrictor valve 2903, a filter 2904, a thermometer / hygrometer 2905, a mechanical pressure gauge 2906, an electronic pressure gauge 2907, a pressure regulating valve 2908, and a main line 2909 with a pressure gauge 2910 and an air valve 2911, but the invention is not limited thereto.

[0296] Figure 30 Two specific embodiments of the upstream gas supply line connected to the storage rack 604 are shown. In the configuration with a flow controller 3000, one or more sensors provided on the storage rack 604 can transmit detection signals to the flow controller 3000 based on whether the storage rack 604 has a photomask storage box 100, allowing the flow controller 3000 to control the gas flow rate entering the storage rack 604 accordingly. For example, nitrogen is supplied when the storage rack 604 has a dedicated box; the nitrogen supply is shut off when the storage rack 604 does not have a dedicated box. In the configuration with a needle valve 3002, the gas flow rate supplied to the storage rack 604 can be manually adjusted, or even maintained in a continuous gas supply state. Regardless of the gas used, the filter 3001 ensures that impurities in the gas are reduced.

[0297] Figure 31 The diagram shows the abnormal handling process of the robotic arm 609 of the photomask storage system 600, which includes checking the protective film status and selectively causing the non-dedicated photomask transfer box or the dedicated photomask storage box to perform specific actions and return to the designated position according to the protective film status.

[0298] Figure 32 The diagram shown is a schematic representation of another embodiment of the photomask loading device 200' and photomask storage cabinet system 600' of the present invention. In this embodiment, each storage rack 604 of the storage cabinet 602 is used only for... Figure 5A The dedicated outer box 102 of the dedicated photomask storage box 100 shown does not provide a dedicated inner box 101 for the photomask storage box 100, but the dedicated outer box 102 can accommodate the inner box obtained from the photomask loading system 200', that is, as shown Figure 1 The inner box 11 of the non-dedicated photomask transport box 10 shown. Therefore, the purpose of the photomask loading system 200' in this embodiment is to transfer the inner box containing the photomask. Apart from this, the remaining configuration is generally the same as... Figure 24 The embodiments are the same, and related descriptions will not be repeated. Details regarding the photomask loading system 200' and the photomask storage system 600' will be described later.

[0299] The reason why the photomask storage system 600' in this embodiment does not supply a dedicated inner box 101 is because the dedicated outer box 102 of the photomask storage box 100 of the present invention has the same... Figure 8A The downward pressing mechanism shown is compatible with non-dedicated inner boxes. For example... Figure 8A and Figure 11B As shown, when the dedicated outer box 102 of the storage cabinet 602 accommodates the non-dedicated inner box 11, the horseshoe-shaped downward pressing rib 153 of the dedicated outer box 102 surrounds and restricts the cap 34, and the downward pressing post 154 abuts against the lower pressing pin 32 on the cover 30 of the inner box 11, thereby realizing the reception of the non-dedicated inner box 11 and the photomask R. The advantage of this is that the photomask R is not exposed to the environment outside the box during the transfer process, thereby reducing the risk of particulate contamination.

[0300] Figure 33 According to Figure 32 The flowchart of photomask loading in the embodiment is shown, where the left half represents the steps performed by the first lifting device A and the right half represents the steps performed by the second lifting device B.

[0301] In step 3300A, the overhead crane system or manually loads the photomask transport box 10 into the photomask loading system 200' via the first interface 202. The photomask transport box 10 includes an inner box 11 and an outer box 12 that house the photomask R. The loaded photomask transport box 10 is received by the lifting platform of the first lifting device A at a height A0.

[0302] In step 3300B, a dedicated outer box 102 of a dedicated box is loaded from the photomask storage system 600' to the photomask loading system 200' via the second interface 204, wherein the loaded dedicated outer box 102 is an empty box that does not contain any inner box. Specifically, the robotic arm 609 of the photomask storage system 600' places the dedicated outer box 102 on the lifting platform of the second lifting device B, i.e., at a height B0.

[0303] In step 3302, the photomask transfer box 10 and the dedicated outer box 102 are detected, for example, by identifying information marked on or inside the box and the state of the photomask protective film. The lifting platforms of the first lifting device A and the second lifting device B are lowered to heights A2 and B2, respectively. During the descent, the non-dedicated outer box 12 and the dedicated outer box 102 are opened by a similar mechanism. At heights A2 and B2, the lifting platform of the first lifting device A only carries the outer base 40 and the inner box 11, and the lifting platform of the second lifting device B only carries the outer base 160 of the dedicated box, and both are located in the photomask transfer environment 206. It should be understood that since this embodiment does not require opening the inner box 11, the photomask transfer environment 206 only needs to meet the cleanliness requirements for transferring the inner box. Furthermore, since this embodiment does not require opening the inner box 11 to transfer the photomask R, it is consistent with... Figure 14Compared to the previous embodiment, the actions related to height A1 and height B1 can be omitted for the first lifting device A and the second lifting device B.

[0304] In step 3304, the clamping mechanism of the photomask loading system 200' extracts the inner box 11 and transfers it onto the outer base 160 of the dedicated box. This clamping mechanism can be similar to... Figure 19A As shown, but applicable to inner box 11. The operation of this clamping mechanism is similar to... Figure 20 The explanation shown.

[0305] In step 3306, after the transfer of the inner box 11 is completed, the lifting platforms of the first lifting device A and the second lifting device B rise to heights A0 and B0, respectively, causing the non-dedicated outer box 12 to close, while the dedicated outer box 102 closes and accommodates the inner box 11.

[0306] In step 3308, the dedicated outer box 102 containing the inner box 11 is placed on the designated storage rack 604 of the storage cabinet 602. The photomask storage cabinet system 600' can designate the target storage rack 604 according to a shortest path that the robotic arm 609 can move.

[0307] In step 3310, the storage rack 604 fills the dedicated outer box 102 with nitrogen gas. Similarly, the dedicated outer box 102 and the storage rack 604 in this embodiment can be configured as follows: Figure 27A and Figure 27B The illustrated embodiment is used to achieve gas filling.

[0308] Figure 34 According to Figure 32 The flowchart of photomask loading in the embodiment is shown, wherein the left half represents the steps performed by the first lifting device A, and the right half represents the steps performed by the second lifting device B.

[0309] In step 3400A, an empty outer box 12 of the non-dedicated photomask transport box 10 is loaded from the first interface 202. The loaded outer box 12 contains no inner box and is supported at height A0 by the lifting platform of the first lifting device A.

[0310] In step 3400B, a dedicated outer box 102 is loaded from the photomask storage system 600' through the second interface 204, and the loaded dedicated outer box 102 houses the inner box 11 containing the photomask. The loaded dedicated outer box 102 and inner box 11 are carried at a height B0 by the lifting platform of the second lifting device B.

[0311] In step 3402, similarly, the first lifting device A and the second lifting device B detect the non-dedicated outer box 12, the dedicated outer box 102, and the inner box 11. The outer box 12 and the dedicated outer box 102 are opened respectively, and the outer base 40 of the outer box 12 and the outer base 160 of the dedicated outer box 102 are lowered to heights A2 and B2 respectively, so that the inner box 11 is located in the photomask transfer environment 206.

[0312] In step 3404, the inner box 11 is extracted and transferred to the outer base 40 of the outer box 12. This transfer takes place in a photomask transfer environment 206 or another environment with a cleanliness level suitable for the transfer of the inner box.

[0313] In step 3406, the lifting platforms of the first lifting device A and the second lifting device B rise from heights A2 and B2 to heights A0 and B0, causing the non-dedicated outer box 12 to close and accommodate the inner box 11, and causing the dedicated outer box 102 to close. At this time, the closed dedicated outer box 102 is empty, and the non-dedicated inner box 11 and outer box 12 form the photomask transport box 10.

[0314] In step 3408, the first lifting device A removes the photomask transport box 10 from the first interface 202 out of the photomask loading system 200' and sends it to various processing environments.

[0315] Figure 35 The following is based on Figure 32 The flowchart of the inner box 11 transfer in the embodiment is shown, where the left half represents the action performed by the first lifting device A and the right half represents the action performed by the second lifting device B.

[0316] In steps 3500A and 3500B, the first lifting device A receives the outer box 12 of the non-dedicated photomask transport box 10 at height A0, and the second lifting device B receives the dedicated outer box 102 of the dedicated photomask storage box 100 at height B0. Either the non-dedicated outer box 12 or the dedicated outer box 102 houses an inner box 11 containing a photomask, and the inner box 11 is structurally compatible with both the non-dedicated outer box 12 and the dedicated outer box 102.

[0317] In steps 3502A and 3502B, the first lifting device A and the second lifting device B respectively operate to unlock the non-dedicated outer box 12 and the dedicated outer box 102. After unlocking, the first lifting device A and the second lifting device B respectively grasp the outer covers of the non-dedicated outer box 12 and the dedicated outer box 102 and lower the lifting platform from heights A0 and B0 to heights A2 and B2, so that the non-dedicated outer box 12 and the dedicated outer box 102 are opened during the descent.

[0318] In steps 3504A and 3504B, the first lifting device A and the second lifting device B operate respectively to identify information such as a two-dimensional barcode or photomask markings on the non-dedicated outer box 12, the dedicated outer box 102, the contained inner box 11, and / or the photomask cover status during descent. If the identification result does not match the expected target, the photomask loading system 200' can execute the relevant exception handling procedure.

[0319] In step 3506, in a similar manner Figure 19A The photomask clamping mechanism 1900 shown transfers the inner box 11 between the non-dedicated outer base 40 and the dedicated outer base 160. For example, Figure 19A The clamping arm 1906 and contact plate 1908 of the photomask clamping mechanism 1900 shown can be modified to adapt to the size and structure of the inner box 11 in order to realize the transfer of the inner box 11.

[0320] In steps 3508A and 3508B, the first lifting device A and the second lifting device B operate respectively to raise the lifting platform from height A2 and height B2 to height A0 and height B0, so that the non-dedicated outer box 12 and the dedicated outer box 102 close accordingly, and lock the two respectively.

[0321] In steps 3510A and 3510B, an empty non-dedicated outer box 12 or a photomask transport box 10 with an inner box 11 can be removed from the photomask loading system 200' through the first interface 202, while an empty dedicated outer box 102 or a dedicated outer box 102 containing a non-dedicated inner box 11 can be returned to the photomask storage cabinet system 600' through the second interface 204.

[0322] Figure 36 The diagram shows the process flow for transferring the inner box 11. During this process, the first lifting device A and the second lifting device B operate in a photomask transfer environment 206 or other environment that meets the required cleanliness standards.

[0323] like Figure 36 As shown, the lifting platforms descend below the inner box clamping mechanism 1900'. The clamping mechanism 1900' moves horizontally above the inner box 11. When the inner box clamping mechanism 1900' does not move up or down, the lifting platform of the first lifting device A rises to a height where the inner box 11 can be clamped. After the inner box 11 is clamped, the lifting platform descends to complete the separation. The inner box 11 is moved horizontally to the lifting platform of the second lifting device B. The lifting platform of the second lifting device B rises to receive the inner box 11, while the photomask clamping mechanism 1900' releases, thereby realizing the transfer of the inner box 11.

[0324] Figure 37The diagram shown is a schematic representation of another embodiment of the photomask loading device 200 and photomask storage system 600” of the present invention. The photomask storage system 600” has a configuration largely the same as the aforementioned embodiment, with the main difference being that the storage cabinet 602 provides multiple storage chambers 604'. Each storage chamber 604' can accommodate a dedicated double-layer box, such as… Figure 5A The photomask storage box 100 is shown. Alternatively, each storage chamber 604' may contain a single-layer box 3700, which mainly consists of a cover and a base, for holding a photomask obtained from the photomask transfer box 10.

[0325] Figure 38A The illustration shows a specific embodiment of storage chamber 604'. Figure 38B The image shows the upward-facing bearing surface inside storage chamber 604'. Figure 38C The image shows a storage chamber 604' containing a single-layer box 3700. Figure 38D The bottom of the single-layer box 3700 is shown as the support surface mechanism of the storage chamber 604'.

[0326] These storage chambers 604' can be fixed to the support of the storage cabinet 602 in a similar manner to form a vertical stack. Each storage chamber 604' is essentially a box with an opening, providing sufficient storage space to accommodate a single-layer box 3700. The opening allows a robotic arm 609 to access the single-layer box 3700. The back of the storage chamber 604' is provided with two connectors 3800, connected upstream to a nitrogen source, thereby allowing nitrogen to be filled into the storage chamber 604'. The inner upward bearing surface of the storage chamber 604' is provided with three dynamically coupled positioning posts 3802 and two auxiliary guide posts 3804 for positioning and supporting the single-layer box 3700. In another embodiment, the opening of the storage chamber 604' may be provided with a gate to prevent the single-layer box 3700 from falling and to maintain the nitrogen conditions in the storage chamber 604'.

[0327] Figure 39A As shown Figure 37 The photomask loading process. Figure 39B As shown Figure 37 The photomask loading process.

[0328] In step 3900A, a double-layer box is loaded from the first interface 202 onto the lifting platform of the first lifting device A of the photomask loading system 200, such as the photomask transfer box 10, which includes an inner box that houses a photomask and an outer box that houses the inner box.

[0329] In step 3900B, an empty single-layer box 3700 is loaded from the photomask storage system 600” via the second interface 204 onto the lifting platform of the second lifting device B.

[0330] In step 3902, the photomask R contained in the inner box of the photomask transfer box 10 is removed and transferred to an empty single-layer box. Similar to... Figure 24 In one embodiment, as the lifting platform of the first lifting device A descends from height A0 to height A2, it opens the outer and inner boxes to expose the photomask. Similarly, as the lifting platform of the second lifting device B descends from height B0 to height B2, it opens the single-layer box 3700 to expose the inner base. Next, the photomask clamping mechanism transfers the photomask from the inner box base of the photomask transfer box 10 to the base of the single-layer box 3700. Finally, the lifting platform of the second lifting device B rises from height B2 to height B0 to house the photomask within the single-layer box 3700.

[0331] In step 3904, the single-layer box 3700 containing the photomask is transferred from the photomask loading system 200 to the photomask storage cabinet system 600” and moved according to the storage chamber 604’ designated by the storage cabinet 602. Preferably, the designated storage chamber 604’ is determined by a shortest motion path of the robotic arm 609.

[0332] In step 3906, the robotic arm 609 opens the gate of storage chamber 604' and places the single-layer box 3700 into storage chamber 604'; after closing the gate, nitrogen gas is filled into storage chamber 604' to complete the photomask storage. In embodiments without a gate, the robotic arm 609 does not need to open the gate. The gate can be replaced by continuous nitrogen gas filling.

[0333] In step 3908A, an empty double-layer box, such as photomask transfer box 10, or an empty single-layer box 3700, is loaded onto the lifting platform of the first lifting device A of the photomask loading system 200.

[0334] In step 3908B, the robotic arm 609 retrieves the single-layer box 3700 containing the specified photomask from the designated storage chamber 604' and loads it into the lifting platform of the second lifting device B of the photomask loading system 200.

[0335] In step 3910, the first lifting device A and the second lifting device B respectively lower the inner box base of the photomask transfer box 10 and the photomask of the single-layer box 3700 to the photomask transfer environment 206 to transfer the photomask of the single-layer box into the photomask transfer box 10.

[0336] In step 3912, the photomask transport box 10 containing the photomask is taken out by the overhead crane system through the first interface 204 and sent to the target station.

[0337] Figure 40 As shown Figure 37The specific photomask transfer process of the embodiment is shown in the left half, which represents the steps performed by the first lifting device A, and the right half, which represents the steps performed by the second lifting device B. Step 4000A: Load the double-layer box, such as the photomask transfer box 10, from the first interface 202 to the lifting platform of the first lifting device A. Step 4000B: Load a single-layer box 3700 from the photomask storage system 600” onto the lifting platform of the second lifting device B. Step 4002A: Grasp the cover of the outer box, unlock the outer box, and lower the lifting platform of the first lifting device A from height A0 to height A1. Step 4002B: Grasp the cover of the single-layer box 3700 at height B0 or ​​height B1, and lower the lifting platform of the base carrying the single-layer box 3700 from height B0 to height B1. Step 4004A: Lower the lifting platform of the base carrying the inner box from height A1 to height A2. Step 4004B: Lower the lifting platform of the base carrying the single-layer box 3700 from height B1 to height B2. Step 4006: The photomask clamping mechanism transfers the photomask between the base of the inner box and the base of the single-layer box 3700. Step 4008A: After the lifting platform is raised from height A2 to height A1, the inner box is closed. Step 4008B: After the lifting platform is raised from height B2 to height B1, the single-layer box 3700 is closed. Step 4010A: After the lifting platform is raised from height A1 to height A0, the outer box is closed and locked. Step 4010B: The lifting platform is raised from height B1 to height B0. Step 4012A: The double-layer box is removed by the overhead crane system. Step 4012B: The single-layer box 3700 returns to the photomask storage cabinet system 600.

[0338] Regardless of whether the photomask R is ultimately stored in a single-layer or double-layer box, the storage environment is crucial for its preservation. A storage chamber with a gate helps maintain suitable storage conditions. However, the gate's operation is also limited by the internal configuration of the storage system. The following example illustrates the valve operation mechanism of the storage chamber in the storage system of this invention.

[0339] Figure 41A The diagram shows the interaction process between the robotic arms 4100 and 4102 of the storage system and the storage room 4104, where a box P is placed into the storage room 4104. Figure 41B The diagram illustrates the interaction between robotic arms 4100 and 4102 and storage compartment 4104 in a storage system, where a box P is retrieved from storage compartment 4104. Storage compartment 4104 has a gate, and the tip 4102 of the robotic arm can be configured to interact with the gate of storage compartment 4104. For example, the tip 4102 of the robotic arm could have a specific mechanism that extends into the bottom notch of the gate and lifts it to expose the space of storage compartment 4104, but this is not a limitation of the invention. More specifically, the robotic arm can consist of at least two parts: a gripping mechanism 4100 and an interaction mechanism 4102 for the gate, both of which can operate independently. Figure 41AAs shown, one part of the robotic arm first opens the gate, and then the other part performs the action of placing box P. Only after the placement is completed is the gate returned to the closed state. Figure 41B The process is the opposite.

[0340] Figure 42A The diagram shows another example of the interaction between the robotic arm of the storage system and the storage room, illustrating the process of placing a box into the storage room. Figure 42B The diagram illustrates another embodiment of the interaction between a robotic arm and a storage compartment in a storage system, showing the process of retrieving a box from the storage compartment. The robotic arm in this embodiment comprises two separate parts: a gripping part 4200 and a pushing part 4202. The gripping part 4200 is used to carry or hold a box P and can access the space of the storage compartment 4204. The storage compartment 4204 has a pivotable gate 4206. The pushing part 4202 can extend forward relative to the gripping part 4200 to push a plate 4208 on the gate 4206, causing the gate 4206 to be opened in a lever-like manner, allowing the gripping part to deliver the box P into the storage compartment 4204. After completion, the pushing part 4208 retracts, returning the gate 4206 to a closed state.

[0341] Figure 43 The diagram illustrates an embodiment of the photomask storage tank pipeline filling system of the present invention. At least one main pipeline 4300 is upstream connected to a nitrogen source 4302 and downstream connected to multiple branch pipelines 4304. Each branch pipeline 4304 is connected to a corresponding storage chamber 604' in the storage tank 602. At least one flow controller 4306 is connected to the main pipeline 4300. When a photomask is placed in a designated storage chamber 604' of the storage tank 602, the flow controller 4306 determines the opening and closing of a specific gas valve to fill the designated storage chamber 604' with nitrogen. For example, the flow controller 4306 may be configured to monitor the gas flow rate of the main pipeline 4306 and control the opening and closing of a regulating valve 4308 on each branch pipeline 4304, which can be used to regulate the gas flow rate of each branch pipeline 4304. Figure 43 As shown, the upstream end of the main pipeline 4300 may include a particulate filter 4310, a pressure gauge 4312, a pressure sensor 4314, a regulator 4316, and a ball valve 4318, but the present invention is not limited thereto.

[0342] Figure 44The diagram shown is a schematic representation of another embodiment of the photomask loading device and photomask storage system 600” of the present invention. Compared with the previous embodiment, it can be seen that the photomask loading system 200” in this embodiment uses only a single first lifting device A to transfer the photomask. Similarly, the photomask transfer box 10 is opened during its descent from height A0 to height A1, ultimately exposing the inner box 11. The inner box 11, located at height A1, allows interaction with the robotic arm 609 for gripping, shortening the photomask transfer path and reducing the risk of photomask swaying.

[0343] Figure 45A As shown Figure 44 The photomask loading process of the embodiment. Figure 45B As shown Figure 44 The photomask unloading process of this embodiment is as follows: Step 4500: Load a double-layer box, such as a photomask transfer box 10, onto the lifting platform. The double-layer box includes an inner box 11 that houses a photomask and an outer box that houses the inner box 11. Step 4502: Expose the inner box 11 of the double-layer box to height A1, i.e., the photomask transfer environment. Step 4504: Transfer the inner box 11 to a designated storage chamber 604' in the storage cabinet 602. Step 4506: Open the gate of the designated storage chamber 604' to place the inner box 11 inside. After closing the gate, fill the storage chamber 604' with nitrogen gas to complete the storage. Step 4508: Load the outer box of the double-layer box, such as the outer box 12 in the first figure, onto the lifting platform. The outer box includes a cover and a base. Step 4510: Lower the lifting platform to open the outer box and place the base at height A1. Step 4512: Remove the inner box 11 containing the photomask from the designated storage chamber 604' of storage cabinet 602, and place the inner box on the base at height A1. Step 4514: Raise the lifting platform to close and lock the double-layer box. Step 4516: Remove the double-layer box.

[0344] Figure 46A for Figure 44 Another photomask loading process in an embodiment of the present invention. Figure 46B As shown Figure 44Another photomask unloading process of an embodiment. Step 4600: Load a double-layer box into a lifting platform from an interface. The double-layer box includes an inner box 11 and an outer box that houses the inner box. Step 4602: Grasp the cover of the outer box and lower the lifting platform carrying the inner box 11 and the outer box base from height A0 to height A1, thereby opening the outer box. Step 4604: During the descent of the lifting platform from height A0 to height A1, read the two-dimensional barcode on the inner box 11 using an identification device and detect the protective film status. Step 4606: The robotic arm of the photomask storage system 600” removes the inner box 11 carried by the outer box base, leaving only the outer box of the double-layer box in the photomask loading system 200”. Step 4608: As the lifting platform rises from height A1 to height A0, close and lock the outer box of the double-layer box. Step 4610: Remove the outer box of the double-layer box from the interface. Step 4612: Load the outer box of a double-layer box from the interface onto the lifting platform to receive an inner box 11 from the photomask storage cabinet system 600". Step 4614: Grasp the cover of the outer box and lower the lifting platform carrying the outer box base from height A0 to height A1, thereby opening the outer box. Step 4616: The robotic arm of the photomask storage cabinet system 600" places a designated inner box 11 onto the outer box base of the lifting platform. Step 4618: During the elevation of the lifting platform from height A1 to height A0, read the two-dimensional barcode on the inner box 11 using an identification device and check the protective film status. Step 4620: After the lifting platform is raised from height A1 to height A0, the double-layer box closes and locks. Step 4622: Remove the double-layer box from the interface.

Claims

1. A photomask storage cassette, characterized by, The utility model relates to a photomask storage device, comprising: a base having a plurality of supports, each of the supports being configured to support a corner of a photomask, each of the supports extending upwardly a pair of limit blocks, the pair of limit blocks being located on two sides of the corner, respectively; and a cover having a plurality of elastic pressing mechanisms corresponding to the plurality of supports, each of the elastic pressing mechanisms having at least one elastic arm, the elastic arm having a limit portion and an inclined surface extending from the limit portion, the inclined surface being configured to act on the corner of the photomask supported by the corresponding support; wherein, in a state that the cover is combined with the base to accommodate the photomask, the pair of limit blocks limits the lateral displacement of the elastic arm.

2. The photomask storage cassette of claim 1, wherein, The support has a pair of inclined surfaces, the pair of inclined surfaces being configured to engage two lower edges of the two sides of the corner, respectively.

3. The photomask storage cassette of claim 1, wherein, The elastic pressing mechanism includes a body and a pair of elastic arms extending from the body in different directions, the pair of elastic arms forming two inclined surfaces, the two inclined surfaces being configured to engage two upper edges of the two sides of the corner, respectively.

4. The photomask storage cassette of claim 3, wherein, The pair of limit blocks limits the two limit portions of the pair of elastic arms.

5. The photomask storage cassette of claim 3, wherein, The two inclined surfaces of the pair of elastic arms extend away from the limit portions and are connected together.

6. A photomask storage cassette, characterized by The utility model relates to a photomask storage device, comprising: an inner box having a cover, a base and a holding mechanism, the cover and the base being combined to define an accommodation space, the holding mechanism being configured to hold a photomask in the accommodation space; and an outer box having an outer cover and an outer base, the outer cover and the outer base being combined to accommodate the inner box in the outer box; wherein, the outer cover has a flat top surface and a surrounding side surface extending downwardly from the flat top surface, the surrounding side surface being provided with at least one pair of handles, the pair of handles not exceeding the height of the flat top surface; the holding mechanism includes at least one support provided on the base and at least one photomask limiter provided on the cover corresponding to the support, in a state that the cover and the base are combined to accommodate the photomask, the support supporting a corner of the photomask, the elastic arm of the photomask limiter having a limit portion and an inclined surface extending from the limit portion, the inclined surface engaging the corresponding corner so that the holding mechanism holds the photomask. A top surface of the outer base is provided with a plurality of positioning columns, the plurality of positioning columns supporting the base of the inner box.

7. The photomask storage cassette of claim 6, wherein, The outer cover is provided with at least one pressing mechanism, the pressing mechanism acting on the cover to stabilize the inner box.

8. The photomask storage cassette of claim 6, wherein, The pressing mechanism is a pressing column, the pressing column acting on the cover of the inner box.

9. The photomask storage cassette of claim 8, wherein, The holding mechanism includes at least one elastic pressing mechanism, the elastic pressing mechanism being provided on the cover corresponding to the pressing mechanism, in a state that the outer cover and the outer base are combined to accommodate the inner box, the pressing column pressing on the elastic pressing mechanism so that the elastic pressing mechanism holds the photomask.

10. The photomask storage cassette of claim 9, wherein, ​ 11. The photomask storage cassette of claim 8, wherein, The downward pressing mechanism is a downward pressing rib, which presses against an upper surface of the cover of the inner box in a state where the outer cover and the outer base are combined to accommodate the inner box.

12. The photomask storage cassette of claim 11, wherein, An upper surface of the cover is formed with a groove corresponding to the downward pressing rib, and the downward pressing rib presses against the corresponding groove in a state where the outer cover and the outer base are combined to accommodate the inner box.

13. The photomask storage cassette of claim 12, wherein, The downward pressing rib presses against the corresponding groove to stabilize the position of the cover combined with the base.

14. A photomask storage cassette, characterized by: It comprises: An inner box is accommodated in an outer box, and the inner side surface of the outer box is provided with a plurality of downward pressing mechanisms. The inner box comprises a cover, a base and a plurality of holding mechanisms. The cover and the base are combined to define an accommodation space, and a plurality of holding mechanisms are used to hold the photomask accommodated in the accommodation space. Wherein, an upper surface of the cover is formed with a plurality of grooves corresponding to a plurality of downward pressing mechanisms respectively. In a state where the inner box is accommodated in the outer box, the plurality of grooves of the cover correspondingly engage the downward pressing mechanisms, and the cover obtains a downward pressure to stabilize and position the inner box, and the downward pressure enhances the holding mechanism to hold the photomask.

15. The photomask storage cassette of claim 14, wherein, The groove has a bottom surface and a surrounding side surface around the bottom surface, and the surrounding side surface has a profile. The cover exposes the holding mechanism at the lower surface of the groove.

16. The photomask storage cassette of claim 15, wherein, The downward pressing mechanism is a downward pressing rib, which has a profile corresponding to the groove. In a state where the inner box is accommodated in the outer box, the downward pressing rib corresponds to the bottom surface of the groove.

17. A photomask storage cassette, characterized by: It comprises: An outer box comprises an outer cover and an outer base. The outer cover and the outer base are combined to stably accommodate a first inner box or a second inner box with different structure from the first inner box in the outer box. The first inner box and the second inner box are respectively used to accommodate a photomask. Wherein, the outer cover is provided with at least one first downward pressing mechanism and at least one second downward pressing mechanism. The first downward pressing mechanism and the second downward pressing mechanism respectively act on a cover of the first inner box and a cover of the second inner box with different structure.

18. The photomask storage cassette of claim 17, wherein, The first downward pressing mechanism and the second downward pressing mechanism respectively extend different heights from a lower surface of the outer cover. The first downward pressing mechanism and the second downward pressing mechanism respectively engage corresponding structures of the cover of the first inner box and the cover of the second inner box with different structure.

19. The photomask storage cassette of claim 17, wherein, The first downward pressing mechanism is a downward pressing column, and the second downward pressing mechanism is a downward pressing rib with a horseshoe-shaped profile. The downward pressing column is located inside the horseshoe-shaped profile of the downward pressing rib.

20. The photomask storage cassette of claim 19, wherein, The cover of the first inner box is provided with an elastic downward pressing mechanism corresponding to the first downward pressing mechanism. The elastic downward pressing mechanism comprises a downward pressing pin. In a state where the first inner box is accommodated in the outer box, the downward pressing column presses against the downward pressing pin to hold the photomask accommodated in the first inner box.

21. The photomask storage cassette of claim 20, wherein, The elastic pressing mechanism includes a cap limiting the pressing pin, and the horseshoe-shaped profile of the pressing rib limits the lateral displacement of the cap when the first inner box is accommodated in the outer box.

22. The photomask storage cassette of claim 19, wherein, The second inner box is provided with a groove corresponding to the second pressing mechanism, and the groove has a bottom surface and a surrounding side surface surrounding the bottom surface. The surrounding side surface has a horseshoe-shaped profile corresponding to the pressing rib, and the pressing rib presses against the bottom surface of the groove when the second inner box is accommodated in the outer box, and the pressing rib limits the lateral displacement of the cap.

23. A photomask holding method for a photomask storage case to hold a photomask, comprising: Comprising: a plurality of supports are arranged on a base of the photomask storage box, each of the supports extends upward to form a pair of limiting blocks; a plurality of elastic pressing mechanisms are arranged on a cover of the photomask storage box corresponding to the plurality of supports respectively, each of the elastic pressing mechanisms has at least one elastic arm; and When the cover and the base are combined to accommodate the photomask, each of the supports supports a corner of the photomask, and the elastic arm of each of the elastic pressing mechanisms has a limiting portion and an inclined surface extending from the limiting portion, and the inclined surface acts on the corresponding corner, and the pair of limiting blocks limit the lateral displacement of the elastic arm.

24. The photomask holding method of claim 23, wherein, The pair of limiting blocks are located on two sides of the corner respectively.

25. The photomask holding method of claim 23, wherein, The elastic pressing mechanism includes a body and a pair of elastic arms.

26. The photomask holding method of claim 25, wherein, Comprising: When the cover and the base are combined to accommodate the photomask, the two inclined surfaces formed by the pair of elastic arms engage the upper edges of the two sides of the corner respectively.

27. The photomask holding method of claim 25, wherein, The pair of elastic arms extend from different directions of the body.

28. The photomask holding method of claim 25, wherein, The ends of the pair of elastic arms are connected together.

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