Photosensitive resin composition, photosensitive resin layer using the same, and display device

Abstract

The present invention provides a photosensitive resin composition comprising: (A) a binder resin comprising a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scatterer, and (F) a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, the amount of the first binder resin included is equal to or less than the amount of the second binder resin, and the primary particle size of the black inorganic pigment is less than or equal to 45 nanometers; a photosensitive resin layer using the photosensitive resin composition; and a display device including the photosensitive resin layer. The present invention can simultaneously achieve light-blocking properties and low-reflection properties, and can excellently maintain patterning capabilities.

Description

Technical Field

[0001] The present invention relates to a photosensitive resin composition, a photosensitive resin layer using the same, and a display device including the photosensitive resin layer. Background Art

[0002] Black photosensitive resin compositions are essential for manufacturing color filter display elements, liquid crystal display materials, organic light-emitting elements (EL), display panel materials, and the like. For example, color filters such as color liquid crystal displays and the like require black matrices or light-blocking partitions at the edges between colored layers such as red, green, blue, and similar colors to enhance display contrast or chromophore effects. The black matrix or light-blocking partitions can be primarily formed from a black photosensitive resin composition.

[0003] Specifically, recent developments in liquid crystal displays (LCDs) have focused on achieving high brightness and high color reproduction. To achieve these characteristics, efforts have been made to reduce outdoor light reflection. To reduce reflection in displays, a method for applying an anti-reflection film comprising a polarizing film, an anti-reflective (AR) film, and an anti-glare (AG) film has been primarily developed.

[0004] However, since this approach has now reached its limits and is relatively costly, efforts are ongoing to reduce reflections in other ways. Summary of the Invention

[0005] Technical Challenges

[0006] One embodiment provides a photosensitive resin composition having excellent surface roughness and pattern linearity while achieving light blocking properties and low reflective properties.

[0007] Another embodiment provides a photosensitive resin layer manufactured using the photosensitive resin composition.

[0008] Another embodiment provides a display device including a photosensitive resin layer.

[0009] Means of solving the problem

[0010] One embodiment provides a photosensitive resin composition comprising: (A) a binder resin comprising a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scatterer, and (F) a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, the amount of the first binder resin included is equal to or less than the amount of the second binder resin, and the primary particle size of the black inorganic pigment is less than or equal to 45 nanometers.

[0011] The second binder resin may have a refractive index less than or equal to 1.55.

[0012] The first binder resin may be a cardo-based binder resin, and the second binder resin may be an acrylic binder resin.

[0013] The amount of the second binder resin may be at least twice the amount of the first binder resin.

[0014] The primary particle size of the black inorganic pigment may be less than or equal to 30 nanometers.

[0015] The black inorganic pigment may comprise carbon black.

[0016] The inorganic scatterer may include SiO2, TiO2, ZrO2, BaSO3 or a combination thereof.

[0017] Both the black inorganic pigment and the inorganic scatterer may be included in the form of a dispersion, and the amount of the dispersion including the black inorganic pigment may be 3 times or more than the amount of the dispersion including the inorganic scatterer.

[0018] The photosensitive resin composition may further contain a dye.

[0019] The dye may comprise a red dye, a yellow dye, a violet dye, or a combination thereof.

[0020] The dye may be contained in an amount smaller than that of the dispersion containing the black inorganic pigment.

[0021] Based on the total amount of the photosensitive resin composition, the photosensitive resin composition may include 1 weight % to 10 weight % of (A) a binder resin, 0.5 weight % to 5 weight % of (B) a photopolymerizable monomer, 0.1 weight % to 5 weight % of (C) a photopolymerization initiator, 5 weight % to 10 weight % of (D) a black inorganic pigment, 0.01 weight % to 0.1 weight % of (E) an inorganic scatterer, and 30 weight % to 70 weight % of (F) a solvent.

[0022] The photosensitive resin composition may further include malonic acid, 3-amino-1,2-propylene glycol, a silane coupling agent, a leveling agent, a surfactant, or a combination thereof.

[0023] Another embodiment provides a photosensitive resin layer manufactured using the photosensitive resin composition.

[0024] The photosensitive resin layer may be a black matrix or a light-blocking partition wall.

[0025] Another embodiment provides a display device including a photosensitive resin layer.

[0026] Other embodiments of the present invention are included in the following detailed descriptions.

[0027] Effects of the present invention

[0028] According to one embodiment, a photosensitive resin composition uses two types of binder resins having different refractive indices at specific amounts, thereby limiting their amounts. Furthermore, by using a black inorganic pigment having a primary particle size within a certain range, light-blocking properties and low-reflection properties can be simultaneously achieved, thereby excellently maintaining patternability. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 is a scanning electron micrograph showing a pattern photograph of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Example 1.

[0030] Figure 2 is a scanning electron micrograph showing a pattern photograph of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Example 2.

[0031] Figure 3 is a scanning electron micrograph showing a pattern photograph of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Comparative Example 1.

[0032] Figure 4 is a scanning electron micrograph showing a pattern photograph of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Comparative Example 2.

[0033] Figure 5 The scanning electron micrograph is a photograph showing a pattern of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Comparative Example 3.

[0034] Figure 6 is a scanning electron micrograph showing a pattern photograph of a photosensitive resin layer manufactured by using the photosensitive resin composition according to Reference Example 1. DETAILED DESCRIPTION

[0035] Hereinafter, embodiments of the present invention will be described in detail. However, these embodiments are for illustrative purposes only and the present invention is not limited thereto, but is defined by the scope of the claims.

[0036] In the present specification, when a specific definition is not otherwise provided, “alkyl” refers to a C1 to C20 alkyl group, “alkenyl” refers to a C2 to C20 alkenyl group, “cycloalkenyl” refers to a C3 to C20 cycloalkenyl group, “heterocycloalkenyl” refers to a C3 to C20 heterocycloalkenyl group, “aryl” refers to a C6 to C20 aryl group, “aralkyl” refers to a C6 to C20 aralkyl group, “alkylene” refers to a C1 to C20 alkylene group, “arylene” refers to a C6 to C20 arylene group, “alkylarylene” refers to a C6 to C20 alkylarylene group, “heteroarylene” refers to a C3 to C20 heteroarylene group, and “alkyleneoxy” refers to a C1 to C20 alkyleneoxy group.

[0037] In the present specification, when a specific definition is not otherwise provided, “substituted” means that at least one hydrogen is replaced by a halogen atom (F, Cl, Br, I), a hydroxyl group, a C1-C20 alkoxy group, a nitro group, a cyano group, an amino group, an imino group, an azide group, a carbamimido group, a hydrazine group, a hydrazo group, a carbonyl group, a carbamoyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid or a salt thereof, a phosphoric acid or a salt thereof, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C2-C20 alkynyl group, a C6-C20 aryl group, a C3-C20 cycloalkyl group, a C3-C20 cycloalkenyl group, a C3-C20 cycloalkynyl group, a C2-C20 heterocycloalkyl group, a C2-C20 heterocycloalkenyl group, a C2-C20 heterocycloalkynyl group, a C3-C20 heteroaryl group, or a combination thereof.

[0038] In the present specification, when a specific definition is not otherwise provided, "hetero" refers to a hetero group containing at least one heteroatom selected from N, O, S and P in the chemical formula.

[0039] In this specification, when a specific definition is not otherwise provided, “(meth)acrylate” refers to both “acrylate” and “methacrylate”, and “(meth)acrylic acid” refers to both “acrylic acid” and “methacrylic acid”.

[0040] In the present specification, when no definition is provided otherwise, "combination" means mixing or copolymerization. In addition, "copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymer or random copolymer.

[0041] In the present specification, when no definition is otherwise provided, when a chemical bond in a chemical formula is not drawn, hydrogen is presumably bonded at the given position.

[0042] In this specification, the cardo-based resin refers to a resin including at least one functional group selected from Chemical Formula 2 to Chemical Formula 12 in its main chain.

[0043] In the present specification, when no definition is otherwise provided, "*" indicates a point of connection of the same or different atoms (including hydrogen atoms) or chemical formulas.

[0044] Unless otherwise defined herein, refractive index means the refractive index at a wavelength of 550 nanometers.

[0045] According to one embodiment, a photosensitive resin composition includes: (A) a binder resin including a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scatterer, and (F) a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, the amount of the first binder resin included is equal to or less than the amount of the second binder resin, and the inorganic pigment has an initial particle size of less than or equal to 45 nanometers, and therefore a photosensitive resin layer (for example, a black matrix or a light-blocking partition wall) using the photosensitive resin composition can achieve both light-blocking properties and low-reflection properties, and can have improved patterning capabilities (pattern surface roughness, pattern linearity, etc.) compared to conventional black matrices or light-blocking partition walls.

[0046] Specifically, a photosensitive resin composition according to one embodiment is applied to a black matrix or light-blocking partition wall to distinguish red, green, and blue in a color filter. However, most conventional compositions for black matrices or light-blocking partition walls contain carbon black as a primary component to achieve effective light-blocking properties. When carbon black is used as a primary component, the composition has a higher optical density and is therefore suitable for achieving light-blocking characteristics, but has the problem of not improving visibility. In addition, when the relative amount of black inorganic pigments such as carbon black is increased, there are problems of roughening the pattern surface or degrading pattern linearity, resolution, and the like. When the relative amount of carbon black is reduced, there is also the problem of reduced light blocking and, therefore, the inability to ensure the minimum optical density within a typical coating thickness (1 to 1.3 microns). Therefore, the inventors of the present invention have recognized the aforementioned problems and developed a panel with lower reflectivity to improve visibility, and have thus completed the present invention through several trials and errors. In fact, attempts have been made to attach films (e.g., low-reflection polarizing films, etc.) to improve reflectivity. However, polarizing films are not only expensive, but the corresponding technology has also reached its lower limit in terms of reflectivity, exposing the limitations of current methods of attaching additional films. Therefore, a composition for manufacturing a black matrix or light-blocking partitions has been developed that can reduce reflectivity in other ways. Specifically, since the surface area of ​​a TV with an 8K high-resolution screen is approximately twice that of a TV with a 4K screen, a greater effect of improving visibility can be achieved when reflectivity and light-blocking properties are reduced.

[0047] Hereinafter, each component is described in detail.

[0048] (E) Inorganic scatterers

[0049] According to one embodiment, a photosensitive resin composition includes an inorganic scatterer, specifically, a dispersion containing the inorganic scatterer. Conventionally, attempts have been made to add the dispersion containing the inorganic scatterer to the photosensitive resin composition. However, when the amount of the dispersion containing the inorganic scatterer increases, the amount of other inorganic materials used therewith must also increase by the same amount, and thus the relative amount of black colorants (e.g., black pigments and the like) that impart light-blocking properties decreases, thereby reducing the optical density and thus preventing the formation of a black matrix or light-blocking partition walls.

[0050] However, a photosensitive resin composition according to one embodiment uses a dispersion containing an inorganic scatterer. However, as described later, the aforementioned problem is solved by using two types of binder resins having different refractive indices and limiting the amounts of the two types of binder resins, while also further limiting the primary particle size of the black inorganic pigment used as a black colorant. In other words, a photosensitive resin composition according to one embodiment includes a dispersion containing an inorganic scatterer, but may not have the problem of reduced optical density.

[0051] For example, the inorganic scatterer may include SiO 2 , TiO 2 , ZrO 2 , BaSO 3 or a combination thereof, but is not limited thereto.

[0052] For example, the inorganic scatterer may be included in an amount of 1% by weight or greater based on the total solid content of the photosensitive resin composition according to one embodiment. In this case, the photosensitive resin layer manufactured using the photosensitive resin composition according to one embodiment may have an optical density (unit: / μm) of 3.2 or greater.

[0053] For example, the dispersion containing the inorganic scatterer may be included in an amount of 1 to 10% by weight, for example, 5 to 10% by weight, based on the total weight of the photosensitive resin composition. (The inorganic scatterer may be included in an amount of 0.01 to 0.1% by weight, based on the total weight of the photosensitive resin composition.) When the inorganic scatterer is included in the above amount range, the inorganic scatterer can have excellent compatibility with the dispersion containing the black inorganic pigment, thereby ensuring light blocking properties while maintaining low reflectivity and excellent patterning capabilities.

[0054] (A) Binder resin

[0055] According to one embodiment, the photosensitive resin composition includes two types of binder resins having different refractive indices, and includes a binder resin having a higher refractive index (first binder resin) in an amount equal to or less than that of a binder resin having a lower refractive index (second binder resin). If the binder resins do not have this configuration, low reflectivity may not be achieved.

[0056] Specifically, the second binder resin may have a refractive index of less than or equal to 1.55. For example, the first binder resin may have a refractive index of greater than or equal to 1.60.

[0057] For example, the amount of the second binder resin may be at least twice the amount of the first binder resin. In this case, developability and process margin can be improved.

[0058] For example, the first binder resin may be a cardo-based binder resin, and the second binder resin may be an acrylic binder resin. In this case, the heat resistance and chemical resistance of the photosensitive resin composition according to one embodiment can be improved, and in particular, low reflectivity can be ensured, which is very advantageous.

[0059] The cardo-based binder resin may have a weight average molecular weight of 1,000 to 50,000 g / mol, and specifically, 3,000 to 35,000 g / mol. When the cardo-based binder resin has a weight average molecular weight within this range, excellent patterning capability and developability can be achieved when manufacturing a black matrix or light-blocking partition walls.

[0060] The cardo-based binder resin may be a compound including a repeating unit represented by Chemical Formula 1.

[0061] [Chemical Formula 1]

[0062]

[0063] In Chemical Formula 1,

[0064] R 24 to R 27 may independently be a hydrogen atom, a halogen atom, or a substituted or unsubstituted C1 to C20 alkyl group,

[0065] R 28 and R 29 Can be independently a hydrogen atom or CH2OR a (where R a is vinyl, acryloyl or methacryloyl),

[0066] R 30 It may be a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, an acryloyl group or a methacryloyl group,

[0067] Z1 can be a single bond, O, CO, SO2, CR b R c 、SiR d R e (where R b to R eare the same or different and may be a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group), or one selected from the compounds represented by Chemical Formula 2 to Chemical Formula 12, and

[0068] Z2 can be an acid anhydride residue or an acid dianhydride residue.

[0069] [Chemical Formula 2]

[0070]

[0071] [Chemical Formula 3]

[0072]

[0073] [Chemical Formula 4]

[0074]

[0075] [Chemical Formula 5]

[0076]

[0077] [Chemical Formula 6]

[0078]

[0079] In Chemical Formula 6,

[0080] R f It is a hydrogen atom, an ethyl group, C2H4Cl, C2H4OH, CH2CH=CH2 or a phenyl group.

[0081] [Chemical Formula 7]

[0082]

[0083] [Chemical Formula 8]

[0084]

[0085] [Chemical Formula 9]

[0086]

[0087] [Chemical Formula 10]

[0088]

[0089] [Chemical Formula 11]

[0090]

[0091] [Chemical Formula 12]

[0092]

[0093] The cardo-based binder resin may be specifically obtained by reacting the compound represented by Chemical Formula 13 with tetracarboxylic dianhydride.

[0094] [Chemical Formula 13]

[0095]

[0096] The tetracarboxylic dianhydride may be an aromatic tetracarboxylic dianhydride. Examples of the aromatic tetracarboxylic dianhydride may include pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyl ethertetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, anhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, and the like, but are not limited thereto.

[0097] The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including at least one acrylic repeating unit.

[0098] The first ethylenically unsaturated monomer may be an ethylenically unsaturated monomer including one or more carboxyl groups, and specific examples thereof may include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

[0099] The first ethylenically unsaturated monomer may be included in an amount of 5 to 50 wt %, specifically 10 to 40 wt %, and particularly 10 to 40 wt %, based on the total amount of the acrylic binder resin.

[0100] The second ethylenically unsaturated monomer may include an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, and vinylbenzyl methyl ether; an unsaturated carboxylic acid ester compound such as methyl(meth)acrylate, ethyl(meth)acrylate, butyl(meth)acrylate, 2-hydroxyethyl(meth)acrylate, 2-hydroxybutyl(meth)acrylate, benzyl(meth)acrylate, cyclohexyl(meth)acrylate, and phenyl(meth)acrylate; an unsaturated carboxylic acid aminoalkyl ester compound such as 2-aminoethyl(meth)acrylate and 2-dimethylaminoethyl(meth)acrylate; a carboxylic acid vinyl ester compound such as vinyl acetate and vinyl benzoate; an unsaturated carboxylic acid glycidyl ester compound such as glycidyl(meth)acrylate; a vinyl cyanide compound such as (meth)acrylonitrile; an unsaturated amide compound such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.

[0101] Specific examples of the acrylic binder resin may include methacrylic acid / benzyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene copolymer, methacrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, but are not limited thereto, and these may be used alone or in combination of two or more.

[0102] The acrylic binder resin may have a weight average molecular weight of 3,000 g / mol to 150,000 g / mol, specifically, 5,000 g / mol to 50,000 g / mol, and more specifically, 20,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the acrylic binder resin is within this range, the photosensitive resin composition according to one embodiment has improved physical and chemical properties, has appropriate viscosity, and improves close contact with the substrate when manufacturing a black matrix or light-blocking partitions.

[0103] The acrylic binder resin may have an acid value of 15 mgKOH / g to 60 mgKOH / g, and specifically, 20 mgKOH / g to 50 mgKOH / g. When the acid value of the acrylic binder resin is within the above range, the resolution of the pixel pattern is improved.

[0104] The binder resin may be included in an amount of 1 to 10% by weight, for example, 3 to 9% by weight, based on the total amount of the photosensitive resin composition. When the binder resin is included within the above range, the viscosity is appropriately maintained, and thus, when a black matrix or light-blocking partition wall is manufactured, patterning capability, processability, and developability are improved.

[0105] (B) Photopolymerizable monomer

[0106] The photopolymerizable monomer may be a monofunctional or polyfunctional ester of (meth)acrylic acid containing at least one ethylenically unsaturated double bond.

[0107] Since the acrylic photopolymerizable monomer has an ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance, and chemical resistance by causing sufficient polymerization during exposure in a pattern forming process.

[0108] Specific examples of the photopolymerizable monomer may be ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol ... (meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy (meth)acrylate, ethylene glycol monomethyl ether (meth)acrylate, trimethylolpropane tri(meth)acrylate, tri(meth)acryloyloxyethyl phosphate, novolac epoxy (meth)acrylate, and the like.

[0109] Commercially available examples of the photopolymerizable monomer are as follows. The monofunctional (meth)acrylate may include Aronix M- M- M- etc.; Nippon Kayaku Co., Ltd.’s KAYARAD TC- KAYARAD TC- etc.; Osaka Organic Chemical Ind., Ltd.'s V- V- Examples of difunctional (meth)acrylates include Aronix M- Aronix M- Aronix M- Aronix M- etc.); Nippon Kayaku Co., Ltd.’s KAYARAD KAYARAD HX- KAYARAD R- etc.; Osaka Organic Chemical Industry Co., Ltd.'s V- V- V-335 and the like. Examples of trifunctional (meth)acrylates include Aronix M- Aronix M- Aronix M- Aronix M- AronixM- Aronix M- Aronix M- etc.; Nippon Kayaku Co., Ltd.’s KAYARAD KAYARAD DPCA- KAYARAD- KAYARAD- KAYARAD- etc.; Osaka Organic Chemical Industry Co., Ltd.'s V- V- V- V- V- V- etc.; and the like. The above products can be used alone or in combination of two or more.

[0110] The photopolymerizable monomers may be treated with anhydrides to improve developability.

[0111] The photopolymerizable monomer may be included in an amount of 0.5 wt % to 5 wt %, for example, 0.5 wt % to 3 wt %, based on the total weight of the photosensitive resin composition. When the photopolymerizable monomer is included within this range, the photopolymerizable monomer is sufficiently cured during exposure in a pattern forming process and exhibits improved reliability and developability using an alkaline developer solution.

[0112] (C) Photopolymerization initiator

[0113] The photopolymerization initiator may be an acetophenone compound, a benzophenone compound, a thioxanthone compound, a benzoin compound, a triazine compound, an oxime compound, or a combination thereof.

[0114] The acetophenone compounds may include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.

[0115] The benzophenone compound may include benzophenone, benzoyl benzoate, benzoyl benzoate methyl ester, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

[0116] The thioxanthone compounds may include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and the like.

[0117] The benzoin-based compounds may include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and the like.

[0118] The triazine compounds may include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-phenylvinyl-s-triazine, 2-(naphthol-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-sunflower-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxyphenylvinyl)-s-triazine and the like.

[0119] Oxime compounds may include O-acyloxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, 1-(3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl)propyleneaminooxy)ethanone, 2-(benzoyloxyimino)-3-cyclopentyl-1-(4-(phenylthio)phenyl)propan-1-one, and the like. Specific examples of O-acyloximes may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-one oxime-O-acetate, and 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-O-acetate, and the like.

[0120] The photosensitive resin composition according to one embodiment may include a mixture of an oxime compound and an acetophenone compound as a photopolymerization initiator. In this case, the oxime compound may be included in an amount higher than the acetophenone compound.

[0121] In addition to the compounds, the photopolymerization initiator may further include carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, biimidazole compounds, fluorene compounds, and the like.

[0122] The photopolymerization initiator may be included in an amount of 0.1 to 5 wt %, for example, 0.1 to 3 wt %, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, photopolymerization occurs sufficiently during exposure in the patterning process, and thus the sensitivity of the manufactured black matrix or light-blocking partition wall is excellent.

[0123] (D) Black inorganic pigment

[0124] Considering compatibility with the aforementioned dispersion containing inorganic scatterers, to improve light-blocking properties and facilitate achieving a black color, the black inorganic pigment constituting the dispersion containing the black inorganic pigment has a primary particle size of 45 nanometers or less. A dispersion containing a black inorganic pigment having a primary particle size of 45 nanometers or less is highly suitable for use as a black colorant in the photosensitive resin composition according to one embodiment.

[0125] For example, the primary particle size of the black inorganic pigment may be less than or equal to 30 nanometers.

[0126] For example, the black inorganic pigment may include carbon black. For example, the black inorganic pigment may be carbon black.

[0127] For example, the amount of the dispersion containing the black inorganic pigment can be 3 times or more than the amount of the dispersion containing the inorganic scatterer. In this case, due to the higher optical density, the light blocking property is more advantageous and the reflectivity can be effectively reduced.

[0128] The black inorganic pigment may be used together with a dispersant. Specifically, the black inorganic pigment may be surface-treated with a dispersant in advance, or may be used by adding the dispersant together with the black inorganic pigment when preparing the composition.

[0129] Nonionic dispersants, anionic dispersants, cationic dispersants and the like can be used as dispersants. Specific examples of dispersants include polyalkylene glycols and their esters, polyalkylene oxides, polyol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, formates, formates, alkylamide alkylene oxide adducts, alkylamines and the like, and these can be used alone or in combination of two or more.

[0130] For example, commercially available dispersant products are DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 and the like from BYK Co., Ltd.; DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101, DISPERBYK-101 Co.), EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 and the like; AstraZeneca Co., Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000 and the like; or Ajinomoto Inc., PB711, PB821 and the like.

[0131] The dispersant may be included in an amount of 0.1 to 15 weight percent based on the total weight of the photosensitive resin composition. When the dispersant is included within the above range, the dispersibility of the composition is improved, thereby achieving excellent stability, developability, and patterning capability when manufacturing light-blocking partition walls.

[0132] The pigment may be used after pre-treatment with a water-soluble inorganic salt and a wetting agent. When the pigment is used after pre-treatment, the average particle size of the pigment may become smaller.

[0133] The pretreatment can be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and then filtering and washing the kneaded pigment.

[0134] Kneading may be performed at a temperature ranging from 40° C. to 100° C., and filtering and washing may be performed by filtering the pigment after washing off inorganic salts with water and the like.

[0135] Examples of water-soluble inorganic salts include, but are not limited to, sodium chloride, potassium chloride, and the like. The wetting agent allows the pigment and water-soluble inorganic salt to be uniformly mixed and pulverized. Examples of wetting agents include: alkylene glycol monoalkyl ethers, such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, and the like; and alcohols, such as ethanol, isopropyl alcohol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol polyethylene glycol, and the like. These can be used alone or in combinations of two or more.

[0136] After kneading, the pigment may have an average particle size of 5 nm to 200 nm, for example, 5 nm to 150 nm. When the average particle size of the pigment is within the above range, the stability of the pigment dispersion is excellent, and the resolution of pixels may not be deteriorated.

[0137] Specifically, the black inorganic pigment may be included in an amount of 15 to 40 wt %, for example, 20 to 30 wt %, based on the total amount of the dispersion liquid containing the black inorganic pigment.

[0138] The black inorganic pigment may be included in an amount of 20 to 40% by weight, for example, 20 to 30% by weight, based on the total weight of the photosensitive resin composition. (The dispersion containing the black inorganic pigment may be included in an amount of 5 to 10% by weight, based on the total weight of the photosensitive resin composition.) When the dispersion containing the black inorganic pigment is included in an amount within the above range, black color development and development efficiency can be improved.

[0139] (F) Solvent

[0140] The solvent may be a material that is compatible with the aforementioned components and other additives described later but does not react therewith.

[0141] Examples of the solvent may be alcohols such as methanol, ethanol, and the like; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, and the like; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, and the like; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate, and the like; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, and the like; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, and the like; aromatic hydrocarbons such as toluene, xylene, and the like; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxybenzoic acid, -4-methyl-2-pentanone, methyl-n-acetone, methyl-n-butyl ketone, methyl-n-pentanone, 2-heptanone and the like; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate and the like; lactic acid esters such as methyl lactate, ethyl lactate and the like; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate and the like; alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate and the like; 3-Oxypropionic acid alkyl esters such as 3-oxypropionic acid methyl ester, 3-oxypropionic acid ethyl ester and the like; 3-alkoxypropionic acid alkyl esters such as 3-methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester, 3-ethoxypropionic acid ethyl ester, 3-ethoxypropionic acid methyl ester and the like; 2-Oxypropionic acid alkyl esters such as 2-oxymethyl propionate, 2-oxyethyl propionate, 2-oxypropyl propionate and the like; 2-alkoxypropionic acid alkyl esters such as 2-methoxymethyl propionate, 2-methoxyethyl propionate, 2-ethoxyethyl propionate, 2-ethoxymethyl propionate, Ester and the like; 2-oxy-2-methylpropanoic acid esters such as 2-oxy-2-methylmethyl propionate, 2-oxy-2-methylethyl propionate and the like; monooxymonocarboxylic acid alkyl esters of alkyl 2-alkoxy-2-methylpropanoic acid esters such as 2-methoxy-2-methylmethyl propionate, 2-ethoxy-2-methylethyl propionate and the like; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, ethyl hydroxyacetate, 2-hydroxy-3-methylethyl butyrate and the like; ketoesters such as ethyl pyruvate and the like.In addition, high-boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethylformamide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, 3-methylbenzoic acid, 3-methoxybutyl acetate, ethylene carbonate, propylene carbonate, phenyl celulose acetate, and the like can also be used.

[0142] In view of compatibility and reactivity, it is desirable to use ketones such as cyclohexanone and the like; glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol ethyl methyl ether and the like; ethylene glycol alkyl ether acetates such as ethyl celulose acetate and the like; esters such as 2-hydroxyethyl propionate and the like; carbitols such as diethylene glycol monomethyl ether and the like; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate and the like; 3-methylbenzoic acid; 3-methoxybutyl acetate; and the like.

[0143] The solvent may be included in an amount of, for example, 30% to 70% by weight, such as 35% to 65% by weight, or even 40% to 60% by weight, based on the total weight of the photosensitive resin composition. When the solvent is included within this range, the photosensitive resin composition may have an appropriate viscosity that improves the processability of the black matrix or light-blocking partition wall.

[0144] (G) Dye

[0145] The photosensitive resin composition according to one embodiment may further include a dye, which may include a red dye, a yellow dye, a violet dye, or a combination thereof.

[0146] When a red dye, a yellow dye, a violet dye, or a combination thereof is additionally used, the optical density can be further increased without compromising the surface roughness and linearity of the pattern.

[0147] Examples of red dyes include, but are not limited to, xanthene-based dyes, azo-based dyes (pyridone-based, barbituric acid-based, etc.), disazo-based dyes, anthraquinone-based dyes, and methine-based dyes. Furthermore, the red dye may be in the form of a deep red pigment obtained by using such dyes, an inorganic salt of an acid dye having an acid group such as sulfonic acid or carboxylic acid, a constitutive salt compound of an acid dye and a nitrogen-containing compound, or a sulfonic acid amide compound of an acid dye.

[0148] Examples of the yellow dye may include quinoline dyes, azo dyes (pyridone dyes, barbituric acid metal complex dyes, etc.), disazo dyes, and methine dyes, but are not limited thereto.

[0149] Examples of violet dyes may include xanthene-based oil-soluble dyes such as CI Solvent Violet 2, CI Solvent Violet 10, and the like; rhodamine-based oil-soluble dyes such as CI Solvent Violet 2; xanthene-based basic dyes such as CI Basic Violet 10; and xanthene-based acid dyes such as CI Acid Violet 9, but are not limited thereto.

[0150] The dye may be contained in an amount smaller than the amount of the dispersion containing the black inorganic pigment. For example, when the dye is contained in an amount higher than the amount of the dispersion containing the black inorganic pigment, this may not be desirable because the optical density is reduced due to the reduction in the relative amount of the dispersion containing the black inorganic pigment.

[0151] The dye may be included in an amount of, for example, 1 to 10 weight percent, for example, 3 to 8 weight percent, based on the total weight of the photosensitive resin composition. Including the dye within this range further increases the optical density of the photosensitive resin composition, and can achieve low reflectivity and excellent patterning capabilities.

[0152] (H) Other additives

[0153] Meanwhile, the photosensitive resin composition may further include the following additives: malonic acid, 3-amino-1,2-propylene glycol, a silane coupling agent, a leveling agent, a surfactant, or a combination thereof.

[0154] The silane coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, an epoxy group, and the like in order to improve close contact characteristics with the substrate.

[0155] Examples of the silane coupling agent may include trimethoxysilylbenzoic acid, γ-methacryloyloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-epoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in a mixture of two or more.

[0156] The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on the total amount of the photosensitive resin composition. When the silane coupling agent is included in an amount within the above range, close contact characteristics, storage capacity, and the like are improved.

[0157] In addition, if necessary, the photosensitive resin composition may further include a surfactant, such as a fluorine-based surfactant and / or a silicone-based surfactant, in order to improve coating properties and prevent defects.

[0158] Examples of fluorine-based surfactants include commercially available fluorine-based surfactants such as BM- BM- and the like; MEGAFACE F from Dainippon Ink Kagaku Kogyo Co., Ltd. MEGAFACE F MEGAFACE F MEGAFACEF MEGAFACE F and the like; FULORADFC- of Sumitomo 3M Co., Ltd. FULORAD FC- FULORAD FC- FULORAD FC- and the like; SURFLON S- SURFLON S- SURFLON S- SURFLON S- SURFLON S- and the like; SH- SH- SH- SZ- SF- and similar.

[0159] The silicone surfactant may be a commercially available silicone surfactant, such as BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, BYK-325 and the like from BYK Chem.

[0160] The surfactant can be used in an amount of 0.001 to 5 parts by weight based on the total amount of the photosensitive resin composition. When the surfactant is included within this range, coating uniformity can be ensured, stains can be avoided, and wettability on an IZO substrate or glass substrate can be improved.

[0161] Furthermore, the photosensitive resin composition may contain other additives such as an antioxidant, a stabilizer, and the like in a predetermined amount unless the additives deteriorate the characteristics of the photosensitive resin composition.

[0162] The photosensitive resin composition according to one embodiment may be positive-working or negative-working, but should be negative-working so as to completely remove residues in the exposed pattern area after exposing and developing the composition having light-blocking properties.

[0163] Another embodiment provides a photosensitive resin layer, such as a black matrix or light-blocking partition walls, manufactured by exposing, developing, and curing the aforementioned photosensitive resin composition.

[0164] The method for producing the photosensitive resin layer is as follows.

[0165] (1) Coating and film formation

[0166] The photosensitive resin composition is coated to a desired thickness on a substrate that has undergone predetermined pretreatment (such as a glass substrate or an ITO substrate, and the like) using a spin coating or slit coating method, a roll coating method, a screen printing method, an applicator method, and the like, and the photosensitive resin composition is pre-baked at 70° C. to 110° C. for 1 minute to 10 minutes to remove the solvent and form a film.

[0167] (2) Exposure

[0168] After placing a mask for forming a desired pattern on the obtained coating film, exposure is performed by irradiating actinic rays at a wavelength of 200 to 500 nm. As a light source for irradiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, an argon laser, etc. can be used. In some cases, X-rays, electron beams, and the like can be used.

[0169] When a high-pressure mercury lamp is used, the exposure process uses a light dose of, for example, 500 mJ / cm² or less (using a 365 nm sensor). However, the light dose may vary depending on the types of components, their combination ratio, and dry film thickness.

[0170] (3) Development

[0171] Only the exposed portion remains to form a pattern by dissolving and removing unnecessary portions using an alkaline aqueous solution as a developer.

[0172] (4) Post-processing

[0173] The image pattern obtained by development is subjected to a post-treatment process to obtain a pattern with improved heat resistance, adhesion, chemical resistance, etc. For example, the image pattern obtained by development can be placed in a convection oven at 250° C. after development and then heated (post-baked) for 1 hour.

[0174] Another embodiment provides a display device including a photosensitive resin layer.

[0175] Modes for Carrying Out the Invention

[0176] Hereinafter, examples of the present invention are described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited to the following examples.

[0177] (Preparation of Photosensitive Resin Composition)

[0178] Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1

[0179] The photosensitive resin compositions according to Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were prepared by mixing the components of each composition shown in Table 1 and stirring the resulting mixture for 6 hours. Specifically, after accurately measuring the amount of photopolymerization initiator and adding a solvent thereto, the mixture was thoroughly stirred until the initiator was completely dissolved. Subsequently, a binder resin and a photopolymerizable monomer were added thereto in sequence, and then stirred for approximately another hour. Next, a dispersion containing an inorganic scatterer and other additives were added thereto, a dispersion containing a black inorganic pigment was placed therein, and finally, the entire composition was stirred for 2 hours or more to prepare the photosensitive resin composition.

[0180] [Table 1]

[0181] (Unit: grams)

[0182]

[0183] (A) Binder resin

[0184] (A-1) First Binder Resin

[0185] Cardo-based binder resin (refractive index: 1.6, KBR101, Kyung-In Synthetic Corp.)

[0186] (A-2) Second Binder Resin

[0187] Acrylic binder resin (refractive index: 1.52, RY-25, Showa Denko K.K.)

[0188] (B) Photopolymerizable monomer

[0189] Dipentatyritol hexa(meth)acrylate (DPHA, Nippon Kayaku Co., Ltd.)

[0190] C) Photopolymerization initiator

[0191] (C-1) Oxime initiator (SPI-02, Samyang Corp.)

[0192] (C-2) Acetophenone initiator (IRG-369, BASF)

[0193] (D) Dispersion containing black inorganic pigment

[0194] (D-1) Grinding base containing carbon black (primary particle size of carbon black: 30 nm, SakataSeed Corp.)

[0195] (D-2) Grinding base containing carbon black (primary particle size of carbon black: 45 nm, Sakata Seed Co., Ltd.)

[0196] (D-3) Grinding base containing carbon black (primary particle size of carbon black: 50 nm, Sakata Seed Co., Ltd.)

[0197] (D-4) Grinding base containing carbon black (primary particle size of carbon black: 70 nm, Sakata Seed Co., Ltd.)

[0198] (E) Dispersion containing inorganic scatterers

[0199] Dispersion containing ZrO2 (Mikuni Co.)

[0200] (F) Solvent

[0201] Propylene glycol monomethyl ether acetate (PGMEA, Biryong Corp.)

[0202] (G) Dye

[0203] (G-1) Xanthene series red dye (RD-503, Qingren Synthetic Co., Ltd.)

[0204] (G-2) Azo yellow dye (YDP-301, Qingren Synthetic Co., Ltd.)

[0205] (H) Other additives

[0206] γ-Glycidoxypropyltrimethoxysilane (S-510, Chisso Co.)

[0207] (Evaluate)

[0208] Reflectivity evaluation

[0209] The photosensitive resin compositions according to Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were spin-coated onto glass substrates to a thickness of 1.3 μm and pre-baked at 100°C for 90 seconds. The coated substrates were then cooled at room temperature for 60 seconds and irradiated with ultraviolet (UV) light at 40 mJ / cm² using an ultrahigh-pressure mercury lamp to induce a photocurable reaction in the photosensitive portion. The exposed substrates were developed in a 0.043% KOH aqueous solution using a spray method at room temperature and then washed with a pure solvent for 60 seconds. The washed substrates were then dried at room temperature and post-baked in a 230°C convection oven for 30 minutes to obtain patterned samples. The reflectivity of the patterned samples was then measured using an MCPD (Otsuka Electronics Co., Ltd.) device with reference to the 100% reflectivity of the Cr substrate, and the results are shown in Table 2.

[0210] [Table 2]

[0211] (unit:%)

[0212] Reflectivity (at 550 nm, at 1.2 μm) Example 1 1.51 Example 2 1.45 Example 3 1.50 Comparative Example 1 2.78 Comparative Example 2 1.93 Comparative Example 3 1.53 Reference Example 1 1.38

[0213] Evaluating optical density

[0214] The photosensitive resin compositions according to Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were respectively coated, exposed, developed, and post-baked to obtain patterned samples, and then their optical densities per 1 μm were measured by using an OD meter, and the results are shown in Table 3.

[0215] [Table 3]

[0216] Optical density ( / 1 micron) Example 1 3.64 Example 2 3.73 Example 3 3.67 Comparative Example 1 3.86 Comparative Example 2 3.68 Comparative Example 3 of Cellulose Acetate 3.61 Reference Example 1 2.61

[0217] Refer to Table 2 and Table 3 and Figures 1 to 6 , the photosensitive resin composition according to one embodiment realizes light blocking properties and low reflective properties, and at the same time exhibits excellent patterning capability.

[0218] Although the present invention has been described in conjunction with what are presently considered to be practical example embodiments, it should be understood that the invention is not limited to the disclosed embodiments, but on the contrary, the invention is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Therefore, the foregoing embodiments should be understood as illustrative, but not limiting in any way.

Claims

1. A photosensitive resin composition comprising The binder resin includes a first binder resin and a second binder resin, photopolymerizable monomers, Photopolymerization initiator, Black inorganic pigment, A dispersion comprising an inorganic scatterer, and solvents, wherein the dispersion liquid comprising the inorganic scatterer is contained in an amount of 1 wt % to 10 wt % based on the total amount of the photosensitive resin composition; The inorganic scatterer is contained in an amount of 0.01 wt % to 0.1 wt % based on the total amount of the photosensitive resin composition. The inorganic scatterer includes TiO2, ZrO2, BaSO3 or a combination thereof, The black inorganic pigment is contained in the form of a dispersion, and the amount of the dispersion containing the black inorganic pigment is 3 times or more than the amount of the dispersion containing the inorganic scatterer. the first binder resin has a higher refractive index than the second binder resin, The amount of the second binder resin is at least twice the amount of the first binder resin, The binder resin is contained in an amount of 3 wt % to 9 wt % based on the total amount of the photosensitive resin composition, and The initial particle size of the black inorganic pigment is less than or equal to 45 nanometers. 2 . The photosensitive resin composition according to claim 1 , wherein the second binder resin has a refractive index of less than or equal to 1.

55.

3. The photosensitive resin composition according to claim 1, wherein The first binder resin is a cardo-based binder resin, and The second binder resin is an acrylic binder resin. 4 . The photosensitive resin composition according to claim 1 , wherein the primary particle size of the black inorganic pigment is less than or equal to 30 nanometers. The photosensitive resin composition according to claim 1 , wherein the black inorganic pigment comprises carbon black. The photosensitive resin composition according to claim 1 , further comprising a dye. 7 . The photosensitive resin composition according to claim 6 , wherein the dye comprises a red dye, a yellow dye, a violet dye, or a combination thereof. 8 . The photosensitive resin composition according to claim 6 , wherein an amount of the dye contained therein is smaller than an amount of the dispersion liquid containing the black inorganic pigment.

9. The photosensitive resin composition according to claim 1, wherein Based on the total amount of the photosensitive resin composition, the photosensitive resin composition includes: 0.5 wt% to 5 wt% of said photopolymerizable monomer, 0.1 wt% to 5 wt% of the photopolymerization initiator, 5 to 10 wt% of the black inorganic pigment, and 30 wt% to 70 wt% of the solvent. 10 . The photosensitive resin composition according to claim 1 , wherein the photosensitive resin composition further comprises malonic acid, 3-amino-1,2-propylene glycol, a silane coupling agent, a leveling agent, a surfactant, or a combination thereof. 11 . A photosensitive resin layer produced using the photosensitive resin composition according to claim 1 . 12 . The photosensitive resin layer according to claim 11 , wherein the photosensitive resin layer is a black matrix or a light-blocking partition wall. 13 . A display device comprising the photosensitive resin layer according to claim 11 .

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