An adjustable light source device based on line spectrum and its use method

Abstract

The present invention discloses an adjustable light source device based on a line spectrum and a method for using the same. The device includes: a spectral confocal line scanning device, a plane reflector, a flat glass, and a measuring platform. The spectral confocal line scanning device is located above the plane reflector and the flat glass. The plane reflector and the flat glass are located between the spectral confocal line scanning device and the measuring platform. The plane reflector and the flat glass are both located in the same installation position for interchangeable use. The measuring platform is located at the bottom. The present invention can select wavelengths within the visible light band to achieve any combination of light source output wavelengths. As an adjustable light source device based on a line spectrum and a method for using the same, the present invention can be widely applied to the field of line light source construction technology.

Description

Technical Field

[0001] The present invention relates to the technical field of line light source construction, and in particular to an adjustable light source device based on a line spectrum and a method of using the same. Background Art

[0002] In physics, a light source refers to an object that can emit electromagnetic waves within a certain wavelength range. Electromagnetic waves include visible light and invisible light such as ultraviolet rays and x-rays. A light source usually refers to a luminous body that can emit visible light. There are many types of light sources. For example, a thermal radiation light source refers to a light source in which an electric current flows through a conductive object, causing it to radiate light energy at high temperature, including incandescent lamps and halogen tungsten lamps. A gas discharge light source refers to a light source in which an electric current flows through a gas or metal vapor, causing it to produce gas discharge and emit light, including arc discharge and glow discharge. Light sources are widely used in photoelectric detection, optical illumination, optical processing, optical microscopy, optical micromanipulation, spectroscopy, optical measurement, photochemistry, optical imaging, laser medicine, optical projection, optical encoding and fluorescence excitation, and play a vital role. The existing technology for wavelength-adjustable light sources adjusts the output wavelength by utilizing the geometric structure of the laser resonant cavity to adjust the gain so that the gain is greater than the loss to achieve laser output. The system is complex and the method of using the light source is difficult to implement. It is also limited by the intrinsic gain characteristics of the gain medium. The system wavelength adjustment range is limited, and the light source system is not easy to adjust after it is built. In addition, it has high requirements for mechanical positioning, poor flexibility in system construction and wavelength adjustment, weak functional expandability, and low intelligence. Summary of the Invention

[0003] In order to solve the above technical problems, the purpose of the present invention is to provide an adjustable light source device based on line spectrum and a method of using the same, which can select wavelengths within the visible light band to achieve any combination of light source output wavelengths.

[0004] In order to achieve the above object of the invention, the technical solution of the present invention is as follows:

[0005] An adjustable light source device based on line spectrum includes a spectral confocal line scanning device, a plane reflector, a flat glass, and a measuring platform. The spectral confocal line scanning device is located above the plane reflector and the flat glass. The plane reflector and the flat glass are located between the spectral confocal line scanning device and the measuring platform. The plane reflector and the flat glass are in the same installation position for interchangeable use.

[0006] The spectral confocal line scanning device is used to detect plane reflectors and flat glass;

[0007] The plane reflector is used to calibrate the dispersion range of the light source and construct the wavelength-position relationship curve of the spectral confocal line scanning device and the pixel-position relationship curve of the sensor imaging;

[0008] The flat glass is used to gather the light source of the spectral confocal line scanning device and transmit the height information of the flat glass surface to the spectral confocal line scanning device;

[0009] The measuring platform is used to support a spectral confocal line scanning device, a plane reflecting mirror and a flat glass.

[0010] Furthermore, the spectral confocal line scanning device includes a line light source, a slit, a first-stage dispersive objective lens group, an aperture, a second-stage dispersive objective lens group, and a measuring unit, wherein the line light source and the measuring unit are located on the same side of the slit, the first-stage dispersive objective lens group and the second-stage dispersive objective lens group are coaxially arranged, and an aperture is provided between the first-stage dispersive objective lens group and the second-stage dispersive objective lens group, wherein:

[0011] The line light source is used to emit continuous visible light beams of different wavelengths;

[0012] The slit is used for the emission and incidence of visible light beams;

[0013] The first-stage dispersion objective lens group and the second-stage dispersion objective lens group are used to converge the incident light at a focusing position corresponding to the wavelength on the optical axis;

[0014] The aperture is used to separate the incident light path and the reflected light path;

[0015] The measuring part is used for receiving and processing the reflected light.

[0016] Furthermore, the measuring unit specifically includes a reflector, a spectrometer and a sensor, wherein the spectrometer is located between the reflector and the sensor, wherein:

[0017] The reflector is used to receive the reflected light output from the slit and guide the reflected light to the beam splitter;

[0018] The spectrometer is used to receive and measure the reflected light;

[0019] The sensor is used to convert the optical signal from the optical splitter into an electrical signal.

[0020] Furthermore, the spectrometer specifically includes a collimating lens, a diffraction grating and a focusing lens, wherein the diffraction grating is located between the collimating lens and the focusing lens, wherein:

[0021] The collimating lens is used to collimate and refract the reflected light from the reflector;

[0022] The diffraction grating is used to diffract the reflected light from the collimating lens;

[0023] The focusing lens is used to focus the reflected light diffracted by the diffraction grating onto the sensor.

[0024] At the same time, the present invention also provides a method for using an adjustable light source device based on a line spectrum, which specifically includes the following steps:

[0025] S1, emitting a line light source and pre-processing the line light source, shielding the line light source beam at the center, and obtaining a ring-shaped light beam;

[0026] S2. Filtering the wavelength of the annular light beam to obtain a light beam with a specific wavelength range located on the confocal line;

[0027] S3, performing axial chromatic aberration processing on the light beam with a specific wavelength range on the confocal line, converging the light beam on the plane reflector and calibrating the position;

[0028] S4. Observe and detect the light beam through a sensor and a spectrometer to obtain the imaging pixels and peak wavelength of the light beam;

[0029] S5. Move the plane reflector upward and recalibrate the position of the light beam on the plane reflector. Observe and detect the light beam again using the sensor and spectrometer to obtain the imaging pixels and peak wavelength of the light beam after the movement.

[0030] S6. Move the plane reflector multiple times and record the data. Fit the position data of the light beam with the imaging pixels and peak wavelength of the light beam to construct a pixel-position relationship curve and a peak wavelength-position relationship curve.

[0031] S7. Replace the plane reflector with flat glass, and encode the light beam on the flat glass according to the pixel-position relationship curve and the peak wavelength-position relationship curve to obtain the wavelength expressions corresponding to the various output lights after refraction through the flat glass.

[0032] Furthermore, in step S6, the pixel-position relationship curve constructed is specifically expressed as follows:

[0033]

[0034] In the above formula, a k Represents the fitting polynomial coefficient, y k represents the corresponding pixel of the sensor imaging at the corresponding height h, k represents the corresponding pixel number and the position number of the standard plane reflector, and h represents the height of the upper surface of the plane reflector from the measurement platform.

[0035] Furthermore, in step S6, the peak wavelength-position relationship curve constructed is specifically expressed as follows:

[0036]

[0037] In the above formula, λ represents the peak wavelength determined by the spectrometer detection at the corresponding height h, b lrepresents the fitting polynomial coefficient, l represents the corresponding peak wavelength number and the standard plane reflector position number, h l Indicates the height of the upper surface of the plane reflector from the measurement platform.

[0038] Furthermore, in step S7, the wavelength expressions corresponding to the various outgoing lights after refraction by the flat glass are specifically expressed as follows:

[0039]

[0040] In the above formula, λ p Indicates that the focus is on the optical axis and the height from the measuring platform is h p The wavelength of the flat glass, n represents the refractive index of the flat glass, d represents the thickness of the flat glass, and p represents the data recorded when the flat mirror is moved for the pth time.

[0041] The method and device of the present invention have the following beneficial effects: based on the action mechanism of a dispersive objective lens group, the present invention causes a linear light source to disperse after being focused by the dispersive objective lens group, forming continuous monochromatic light focuses on the optical axis with different distances from the dispersive objective lens group, thereby establishing a linear relationship between wavelength and axial distance, then using spectral information after reflection from the surface of the measured object to obtain corresponding position information, using the relationship between the output wavelength, the thickness of the flat glass and the refractive index of the medium, the flat glass is fixed to a certain height, the output wavelength can be changed by changing the thickness of the flat glass, the wavelength within the visible light band can be selected, and any combination of light source output wavelengths can be achieved, with the characteristics of simple use and easy implementation. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 It is a structural schematic diagram of an adjustable light source device based on line spectrum of the present invention;

[0043] Figure 2 This is a flowchart of the steps of a method for using an adjustable light source device based on a line spectrum according to the present invention;

[0044] Figure 3 It is a schematic structural diagram of the diaphragm in the spectral confocal line scanning device of the present invention;

[0045] Figure 4 is a schematic diagram of the surface reflection on the detection surface in a specific embodiment of the present invention;

[0046] Figure numerals: 1. sensor; 2. focusing lens; 3. diffraction grating; 4. collimating lens; 5. reflector; 6. spectrometer; 7. measuring part; 8. line light source; 9. slit; 10. first-stage dispersion objective lens group; 11. aperture; 12. second-stage dispersion objective lens group; 13. light exit; 14. light entrance; S0, measuring platform; S1, plane reflector; S2, flat glass; A1: upper surface limit position of flat glass; A2: lower surface limit position of flat glass. DETAILED DESCRIPTION

[0047] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The step numbers in the following embodiments are provided for ease of description only and do not limit the order of the steps. The order of execution of the steps in the embodiments can be adaptively adjusted based on the understanding of those skilled in the art.

[0048] Reference Figure 1 The present invention provides an adjustable light source device based on line spectrum, including a spectral confocal line scanning device, a plane mirror S1, a flat glass S2 and a measuring platform S0, wherein the spectral confocal line scanning device is located above the plane mirror S1 and the flat glass S2, and the plane mirror S1 and the flat glass S2 are located between the spectral confocal line scanning device and the measuring platform S0, and the plane mirror S1 and the flat glass S2 are in the same installation position for interchangeable use, and the measuring platform S0 is located at the bottom.

[0049] Reference Figure 4 , A1 and A2 represent the thickness of the flat glass or the maximum and minimum heights that can be reached by the flat glass. Different light wave light source outputs can be achieved by adjusting the position of the flat glass. The spectral confocal line scanning device is used to detect the plane reflector S1 and the flat glass S2. The spectral confocal line scanning device specifically includes a line light source 8, a slit 9, a first-stage dispersive objective lens group 10, an aperture 11, a second-stage dispersive objective lens group 12 and a measuring part 7. The line light source 8 and the measuring part 7 are located on the same side of the slit 9. The first-stage dispersive objective lens group 10 and the second-stage dispersive objective lens group 2 are coaxially arranged. A aperture 11 is provided between the first-stage dispersive objective lens group 10 and the second-stage dispersive objective lens group 12. The aperture 11 has two channels, namely a light outlet 13 and a light inlet 14.

[0050] Specifically, the line light source 8 serves as an incident light source, emitting a continuous visible light beam having different wavelengths ranging from a blue wavelength range to a red wavelength range as the measurement light;

[0051] Specifically, the slit 9 is used for both light emission and light incidence. After passing through the slit 9, the measurement light beam from the line light source 8 enters only one side of the second-stage dispersive objective lens group 12 from a single side of the first-stage dispersive objective lens group 10. After being reflected by the measurement surface S1, it is emitted from the second-stage dispersive objective lens group 12 and the relatively symmetrical sides of the first-stage dispersive objective lens group 10, and then passes through the slit 9 to reach the measurement unit 7. With this optical path control method, only light beams with specific wavelengths located on the confocal line can pass through the slit 9 to reach the measurement unit 7, effectively reducing interference from other reflected wavelengths outside the confocal line and improving test sensitivity. Because the light beams share the same entrance slit for both incidence and reflection, installation and commissioning are more efficient.

[0052] Specifically, the first-stage dispersive objective lens group and the second-stage dispersive objective lens group are lenses involved in the spectral confocal sensor 1 and generate axial chromatic aberration, so that the incident light is focused at a focal position corresponding to the wavelength on the optical axis, so that light beams of different wavelengths contained in the corresponding light source are focused to different focal positions;

[0053] Specifically, refer to Figure 3 The aperture 11 is provided with two channels for input and output of light respectively. The shape of the two channels is square, but can also be other shapes. With the help of the aperture 11, the incident and reflected light paths can be effectively separated, stray light can be filtered, and interference from other reflected wavelengths outside the confocal line can also be reduced;

[0054] Specifically, the measuring unit 7 is used to receive and process the reflected light to obtain a measurement result, and includes a reflector 5, a spectrometer 6, and a sensor 1. The reflector 5 is used to receive the reflected light output from the slit 9 and guide the reflected light to the spectrometer 6. The spectrometer 6 includes a collimating lens 4, a diffraction grating 3, and a focusing lens 2, and is used to receive and process the reflected light to obtain a measurement result. The collimating lens 4 is used to collimate and refract the reflected light, the diffraction grating 3 is used to diffract the reflected light from the collimating lens 4, and the focusing lens 2 is used to focus the diffracted reflected light from the diffraction grating 3 onto the sensor 1. The sensor 1 is used to convert the reflected light from the spectrometer into an electrical signal, and the processor calculates the measurement result based on the electrical signal.

[0055] The plane reflector S1 is used to calibrate the dispersion range of the light source and construct the wavelength-position relationship curve of the spectral confocal line scanning device and the pixel-position relationship curve of the imaging of the sensor 1;

[0056] Specifically, a spectral confocal line scanning device is used to detect the standard plane reflector S1, the standard plane reflector S1 is moved axially, and the coordinate position of the standard plane reflector S1 is recorded at the same time, the dispersion range of the dispersive lens group, the wavelength-position relationship curve of the spectral confocal line scanning device, and the corresponding pixel-position relationship curve when the sensor 1 is imaging are calibrated, the standard plane reflector S1 is detected by the spectral confocal line scanning device, the standard plane reflector S1 is moved axially, and when the sensor 1 just observes the imaging, the position of the standard plane reflector S1 is selected as the initial position, starting from the initial position h0, it is moved upward along the axial direction, and the coordinate position of the standard plane reflector S1 is recorded at the same time. The coordinate position of S1 and the pixel corresponding to the image on sensor 1 are used to form a pixel-position data table. At the same time, a spectrometer is used to detect and determine the peak wavelength focused on the standard plane reflector S1. The coordinate position of the standard plane reflector S1 and the corresponding focused peak wavelength are recorded to form a peak wavelength-position data table. The standard plane reflector S1 is continued to be moved until the image on sensor 1 disappears and the movement of the standard plane reflector S1 is stopped. The data in the pixel-position data table and the peak wavelength-position data table are respectively curve fitted to obtain a pixel-position relationship curve and a peak wavelength-position relationship curve of the line scanning measurement system, as well as a dispersion range of the dispersive objective lens group.

[0057] Standard plane mirror S1 moving position coordinate h i It is expressed as follows:

[0058] h i =h0+Δh

[0059] In the above formula, h0 represents the initial position coordinate, with the measurement platform S0 as the reference surface, where Δh = 1 mm;

[0060] The polynomial fitting process of the pixel and the standard plane mirror S1 coordinate position is as follows:

[0061] Sample data (y i ,h i ), y i is the pixel corresponding to the image formed by the sensor 1 each time the plane reflector S1 is moved, i is the corresponding pixel number and the position number of the standard plane reflector S1, i = 0, 1, 2, 3…q, where q is the absolute value of the pixel recorded when the plane reflector S1 is moved axially close to the dispersive objective lens group and the maximum position number of the standard plane reflector S1;

[0062] The fitting polynomial is further shown as follows:

[0063]

[0064] In the above formula, a k Represents the fitting polynomial coefficient, where k = 0, 1, 2, 3…n;

[0065] Then the pixel-position relationship curve of the spectral confocal line scanning device is:

[0066]

[0067] In the above formula, a k Represents the fitting polynomial coefficient, y k represents the corresponding pixel of sensor 1 imaging at the corresponding height h, k represents the corresponding pixel number and the position number of the standard plane reflector S1, and h represents the height of the upper surface of the plane reflector S1 from the measuring platform S0;

[0068] The relationship between pixels and coordinate positions (heights) recorded during the further experiment is shown in the following table, where y i Unit: piece; h i Unit: mm, the height of the measuring platform S0 is set to 0:

[0069] Table 1 Data record of the position height of imaging pixels and plane reflector S1

[0070] <![CDATA[h 1～10 ]]> 19.54 20.59 21.64 22.69 23.74 24.79 25.84 11.89 27.94 28.99 30.04 <![CDATA[y 1～10 ]]> 2014 1787 1579 1425 1279 1155 1043 925 830 737 656 <![CDATA[h 11～22 ]]> 31.09 32.14 33.19 34.24 35.29 36.34 37.39 38.44 39.49 40.54 41.59 <![CDATA[y 11～22 ]]> 594 510 448 387 325 272 9 173 131 90 47

[0071] Based on the above experimental data, the quadratic fitting polynomial of pixels and height is as follows:

[0072] h=5.025×10 -6 y 2 -0.02093y+41.909

[0073] The polynomial fitting process of the peak wavelength and the coordinate position of the standard plane mirror S1 is as follows:

[0074] Sample data (y i ,h i ), λ i is the peak wavelength detected by the spectrometer each time the plane reflector S1 is moved; i is the peak wavelength number and the position number of the standard plane reflector S1, i = 0, 1, 2, 3…q, where q is the absolute value of the peak wavelength recorded when the plane reflector S1 is moved axially close to the dispersive objective lens group and the maximum position number of the standard plane reflector S1;

[0075] The further fitting polynomial is as follows:

[0076]

[0077] In the above formula, a k Represents the fitting polynomial coefficient, where l = 0, 1, 2, 3…m

[0078] The peak wavelength-position relationship curve of the spectral confocal line scanning device is as follows:

[0079]

[0080] In the above formula, λ represents the peak wavelength determined by the spectrometer detection at the corresponding height h, b l represents the fitting polynomial coefficient, l represents the corresponding peak wavelength number and the position number of the standard plane reflector S1, h l Indicates the height of the upper surface of the plane reflector S1 from the measuring platform S0;

[0081] The relationship between the peak wavelength and the coordinate position (height) recorded during the further experiment is shown in the following table, where λ i Unit: piece; h i Unit: mm, the height of the measuring platform S0 is set to 0:

[0082] Table 2 Peak wavelength and position height data record of plane reflector S1

[0083] <![CDATA[h 1～10 ]]> 19.54 20.59 21.64 22.69 23.74 24.79 25.84 11.89 27.94 28.99 30.04 <![CDATA[λ 1～10 ]]> 702.9 680.4 658.9 638.4 618.9 600.3 582.8 566.2 550.7 536.1 522.6 <![CDATA[h 11～22 ]]> 31.09 32.14 33.19 34.24 35.29 36.34 37.39 38.44 39.49 40.54 41.59 <![CDATA[λ 11～22 ]]> 510 498.5 487.9 478.3 469.7 462.1 455.5 449.9 445.4 441.7 439.1

[0084] Based on the above experimental data, the quadratic fitting polynomial of peak wavelength and height is as follows:

[0085] λ=-39.559h+0.45141h 2 +1232.13

[0086] The flat glass S2 is used to gather the light source of the spectral confocal line scanning device and transmit the height information of the surface of the flat glass S2 to the spectral confocal line scanning device;

[0087] Specifically, the standard plane reflector S1 is replaced with a flat glass S2 for testing, and is placed within the dispersion focusing range of the dispersion lens group. The light field focused on the surface of the flat glass S2 carries the surface height information of the flat glass S2 and passes through the second-stage dispersion objective lens group 12, the aperture 11, the first-stage dispersion objective lens group 10, the slit 9, the reflector 5, the collimating lens 4, the diffraction grating 3, the focusing lens 2, and the sensor 1. By analyzing the image formed by the sensor 1, and based on the peak wavelength-position and pixel-position relationship curves, the corresponding wavelength of the reflected light focused on the upper surface of the flat glass S2 is decoded.

[0088] By changing the height and thickness of the flat glass S2, more than two wavelengths can be output simultaneously;

[0089] The wavelength λ1 of the reflected light focused on the upper surface of the flat glass S2 is expressed as follows:

[0090]

[0091] In the above formula, h1 represents the height of the upper surface of the flat glass S2 from the measuring platform S0, yl Indicates the corresponding pixel of sensor 1 imaging corresponding to height h1;

[0092] Using the relationship between the wavelength of reflected light and the thickness and refractive index of the parallel plate, the corresponding wavelength expressions of various outgoing lights after refraction through the flat glass S2 are determined;

[0093] The wavelengths corresponding to the multiple outgoing lights include: the wavelength focused on the lower surface of the flat glass S2 after being refracted by the flat glass S2, and the wavelength that should have been focused at a certain axial position of the flat glass S2 and then emitted after multiple reflections. The expressions for the wavelengths corresponding to the multiple outgoing lights after being refracted by the flat glass S2 are as follows:

[0094]

[0095]

[0096]

[0097] …

[0098]

[0099] In the above formula, λ p Indicates that the focus is on the optical axis and the height from the measuring platform S0 is h p The wavelength of the flat glass S2, n represents the refractive index of the flat glass S2, d represents the thickness of the flat glass S2, and p represents the data recorded when the flat reflector is moved for the pth time;

[0100] By changing the thickness or refractive index of the parallel plates, an adjustable light source with any wavelength combination in the visible light band can be achieved;

[0101] At the same time, the present invention also provides a method for using an adjustable light source device based on a line spectrum, which specifically includes the following steps:

[0102] S1, emitting a line light source and pre-processing the line light source so that the line light source beam at the center is shielded to obtain a ring-shaped light beam;

[0103] S2. Filtering the wavelength of the annular light beam to obtain a light beam with a specific wavelength range located on the confocal line;

[0104] S3, performing axial chromatic aberration processing on the light beam with a specific wavelength range on the confocal line, converging the light beam on the plane reflector S1 and calibrating the position;

[0105] S4. Observe and detect the light beam through sensor 1 and the spectrometer to obtain the imaging pixel and peak wavelength of the light beam;

[0106] S5. Move the plane reflector S1 upward and recalibrate the position of the light beam on the plane reflector S1. Observe and detect the light beam again through the sensor 1 and the spectrometer to obtain the imaging pixels and peak wavelength of the light beam after the movement.

[0107] S6. Perform multiple movements and observations, and fit the position data of the light beam with the imaging pixels and peak wavelength of the light beam, respectively, to construct pixel-position relationship curves and peak wavelength-position relationship curves;

[0108] S7. Replace the plane reflector S1 with the flat glass S2. According to the pixel-position relationship curve and the peak wavelength-position relationship curve, encode the light beam on the flat glass S2 to obtain the wavelength expressions corresponding to the various output lights after refraction by the flat glass S2.

[0109] Specifically, refer to Figure 2 The line light source 8 emits a continuous visible light beam with different wavelengths ranging from the blue wavelength range to the red wavelength range. After passing through the slit 9, it enters from a single side of the first-stage dispersive objective lens group 10, passes through the light inlet 13 of the aperture 11, and enters a single side of the second-stage dispersive objective lens group 12, and then converges on the upper surface S1 of the flat glass S2. The reflected light is emitted from the other side of the second-stage dispersive objective lens group 12, passes through the light outlet 14 of the aperture 11, and is reflected by the reflector 5 after exiting the slit 9. It is split by the collimating lens 4, the diffraction grating 3, and the focusing lens 2 and reaches the sensor 1. The wavelength of the reflected light focused on the upper surface of the flat glass S2 is determined according to the pixel corresponding to the imaging of the sensor 1 and the pixel-position curve and the peak wavelength-position curve fitted after calibration of the standard plane reflector S1. The light field with the wavelength corresponding to the focus focused on the surface of the flat glass S2 can return along the optical path on the other side of the second-stage dispersive objective lens group 12. The parallel glass has an upper and lower surface, which should be focused on the flat glass. A monochromatic wavelength at a certain axial position between the upper and lower surfaces of the flat glass S2 is refracted by the flat glass S2 and focused on the lower surface of the flat glass S2. The reflected light field passes through the second-stage dispersive objective lens group 12, the light outlet 14 of the aperture 11, the first-stage dispersive objective lens group 10, and the slit 9 and reaches the measuring part 7. The position of the original focusing point of the wavelength is determined, and the wavelength of the reflected light is determined based on the peak wavelength-position curve. Since the surface reflectivity of the flat glass S2 is relatively high, the wavelength that should be focused at a certain axial position of the flat glass S2 is emitted after multiple reflections. The reflected light field passes through the second-stage dispersive objective lens group 12, the light outlet 14 of the aperture 11, the first-stage dispersive objective lens group 10, and the slit 9 and reaches the measuring part 7. The position of the original focusing point of the wavelength is determined, and the wavelength of the reflected light is determined based on the peak wavelength-position curve. Finally, the simultaneous output of multiple monochromatic wavelengths is achieved. By changing the thickness or refractive index of the flat glass S2, a light source with any wavelength combination in the visible light band can be achieved.

[0110] The contents of the above method embodiments are all applicable to the present system embodiments. The functions specifically implemented by the present system embodiments are the same as those of the above method embodiments, and the beneficial effects achieved are also the same as those achieved by the above method embodiments.

[0111] The above is a specific description of the preferred implementation of the present invention, but the invention is not limited to the embodiments. Those skilled in the art can make various equivalent modifications or substitutions without violating the spirit of the present invention. These equivalent modifications or substitutions are all included in the scope defined by the claims of this application.

Claims

1. An adjustable light source device based on a line spectrum, characterized in that: The device comprises a spectral confocal line scanning device, a plane reflector, a flat glass, and a measuring platform. The spectral confocal line scanning device is located above the plane reflector and the flat glass. The plane reflector and the flat glass are located between the spectral confocal line scanning device and the measuring platform. The plane reflector and the flat glass are in the same installation position for interchangeable use. The spectral confocal line scanning device is used to detect plane reflectors and flat glass; The plane reflector is used to calibrate the dispersion range of the light source and construct the wavelength-position relationship curve of the spectral confocal line scanning device and the pixel-position relationship curve of the sensor imaging; The flat glass is used to gather the light source of the spectral confocal line scanning device and transmit the height information of the flat glass surface to the spectral confocal line scanning device; The measuring platform is used to support a spectral confocal line scanning device, a plane reflecting mirror and a flat glass.

2. The adjustable light source device based on line spectrum according to claim 1, characterized in that: The spectral confocal line scanning device includes a line light source, a slit, a first-stage dispersive objective lens group, an aperture, a second-stage dispersive objective lens group, and a measuring unit. The line light source and the measuring unit are located on the same side of the slit. The first-stage dispersive objective lens group and the second-stage dispersive objective lens group are coaxially arranged. The aperture is provided between the first-stage dispersive objective lens group and the second-stage dispersive objective lens group, wherein: The line light source is used to emit continuous visible light beams of different wavelengths; The slit is used for the emission and incidence of visible light beams; The first-stage dispersion objective lens group and the second-stage dispersion objective lens group are used to converge the incident light at a focusing position corresponding to the wavelength on the optical axis; The aperture is used to separate the incident light path and the reflected light path; The measuring part is used for receiving and processing the reflected light.

3. The adjustable light source device based on line spectrum according to claim 2, characterized in that: The measuring part specifically includes a reflector, a spectrometer and a sensor, wherein the spectrometer is located between the reflector and the sensor, wherein: The reflector is used to receive the reflected light output from the slit and guide the reflected light to the beam splitter; The spectrometer is used to receive and measure the reflected light; The sensor is used to convert the optical signal from the optical splitter into an electrical signal.

4. The adjustable light source device based on line spectrum according to claim 3, characterized in that: The spectrometer specifically includes a collimating lens, a diffraction grating, and a focusing lens, wherein the diffraction grating is located between the collimating lens and the focusing lens, wherein: The collimating lens is used to collimate and refract the reflected light from the reflector; The diffraction grating is used to diffract the reflected light from the collimating lens; The focusing lens is used to focus the reflected light diffracted by the diffraction grating onto the sensor.

5. A method for using the adjustable light source device based on a line spectrum according to any one of claims 1 to 4, characterized in that: The following steps are involved: S1, emitting a line light source and pre-processing the line light source, shielding the line light source beam at the center, and obtaining a ring-shaped light beam; S2. Filtering the wavelength of the annular light beam to obtain a light beam with a specific wavelength range located on the confocal line; S3, performing axial chromatic aberration processing on the light beam with a specific wavelength range on the confocal line, converging the light beam on the plane reflector and calibrating the position; S4. Observe and detect the light beam through a sensor and a spectrometer to obtain the imaging pixels and peak wavelength of the light beam; S5. Move the plane reflector upward and recalibrate the position of the light beam on the plane reflector. Observe and detect the light beam again using the sensor and spectrometer to obtain the imaging pixels and peak wavelength of the light beam after the movement. S6. Move the plane reflector multiple times and record the data. Fit the position data of the light beam with the imaging pixels and peak wavelength of the light beam to construct a pixel-position relationship curve and a peak wavelength-position relationship curve. S7. Replace the plane reflector with flat glass, and encode the light beam on the flat glass according to the pixel-position relationship curve and the peak wavelength-position relationship curve to obtain the wavelength expressions corresponding to the various output lights after refraction through the flat glass.

6. The method of use according to claim 5, characterized in that: In step S6, the pixel-position relationship curve constructed is specifically expressed as follows: In the above formula, a k Represents the fitting polynomial coefficient, y k represents the corresponding pixel of the sensor imaging at the corresponding height h, k represents the corresponding pixel number and the position number of the standard plane reflector, and h represents the height of the upper surface of the plane reflector from the measurement platform.

7. The method of use according to claim 5, characterized in that: In step S6, the peak wavelength-position relationship curve constructed is specifically expressed as follows: In the above formula, λ represents the peak wavelength determined by the spectrometer detection at the corresponding height h, b l represents the fitting polynomial coefficient, l represents the corresponding peak wavelength number and the standard plane reflector position number, h l Indicates the height of the upper surface of the plane reflector from the measurement platform.

8. The method of use according to claim 5, characterized in that: In step S7, the wavelength expressions corresponding to the various outgoing lights after refraction by the flat glass are specifically expressed as follows: In the above formula, λ p Indicates that the focus is on the optical axis and the height from the measuring platform is h p The wavelength of the flat glass, n represents the refractive index of the flat glass, d represents the thickness of the flat glass, and p represents the data recorded when the flat mirror is moved for the pth time.

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