Display panel and manufacturing method thereof

Abstract

This application discloses a display panel and a method for manufacturing the same. The display panel comprises: an array substrate; a light-emitting structure disposed on one side of the array substrate; and a color filter layer disposed on a side of the light-emitting structure away from the array substrate. The color filter layer includes an overlapping region and a single-color region. The technical advantages of this application include saving on photomasks, reducing costs, and improving the viewing angle of the display panel while reducing reflectivity.

Description

Technical Field

[0001] The present application relates to the field of display, and in particular to a display panel and a method for preparing the same. Background Art

[0002] To reduce the reflectivity of OLED panels (Organic Light Emitting Diodes), circular polarizers are added to the module structure to reduce reflectivity through phase shift. However, the transmittance of polarizers is less than 50%, which means that to achieve the same brightness as without polarizers, device efficiency and panel power consumption must be doubled.

[0003] To reduce panel power consumption, the polarizer is replaced with a color film layer (CF) with higher transmittance, which is called depolarizer technology (Pol-less). While ensuring the reflectivity, the transmittance of the entire device is improved and power consumption is reduced.

[0004] Traditional display panel design faces the following challenges: Four photomasks are typically required to prepare the red color resist (R), green color resist (G), blue color resist (B), and black matrix (BM), resulting in high costs. High-transmittance color resist materials mean that depolarizer technology struggles to achieve extremely low reflectivity, leading to high process costs. Furthermore, the black matrix can lead to deterioration in brightness and viewing angle. Improvements are urgently needed to address these issues. Summary of the Invention

[0005] The purpose of this application is to provide a display panel and a method for manufacturing the same, which can solve technical problems such as the large number of light masks, high cost, and poor display viewing angle in existing depolarizer display panels.

[0006] To achieve the above-mentioned objectives, the present application provides a display panel, comprising: an array substrate; a light-emitting structure, arranged on one side of the array substrate; and a color filter layer, arranged on a side of the light-emitting structure away from the array substrate; wherein the color filter layer includes an overlapping area and a monochrome area.

[0007] Furthermore, the light-emitting layer includes: a pixel definition layer, which is arranged on one side of the array substrate, and the pixel definition layer is provided with a light-emitting area and a non-light-emitting area; and a light-emitting layer, which is arranged in the light-emitting area; wherein the overlapping area of ​​the color filter layer is arranged opposite to the non-light-emitting area of ​​the pixel definition layer; and the monochrome area of ​​the color filter layer is arranged opposite to the light-emitting area of ​​the pixel definition layer.

[0008] Furthermore, the overlapping area includes two color resists of different colors, namely a first color resist and a second color resist, and the first color resist and the second color resist are stacked.

[0009] Furthermore, the distance from the first color resist to the light emitting structure is greater than the distance from the second color resist to the light emitting structure.

[0010] Furthermore, the thickness of the first color resist is 50% to 70% of the thickness of the color resist of the same color in the adjacent single-color area.

[0011] Furthermore, the viewing angle of the second color resist is better than that of the first color resist.

[0012] Furthermore, the color of the pixel definition layer includes one of transparent, black, and gray.

[0013] To achieve the above-mentioned objectives, the present application also provides a method for preparing a display panel, comprising the following steps: providing an array substrate; preparing a light-emitting structure on the array substrate; and preparing a color filter layer on the light-emitting structure; wherein the step of preparing the color filter layer on the light-emitting structure comprises: preparing a first color resist on a substrate; patterning the first color resist using a half-engraving process to form first color resists of different thicknesses, wherein the portion with a larger thickness serves as a single-color area, and the portion with a smaller thickness serves as part of an overlapping area; preparing a second color resist on the substrate, wherein the second color resist portion is superimposed on the first color resist with a smaller thickness to form an overlapping area.

[0014] Furthermore, before the step of preparing a color filter layer on the light-emitting structure, the method for preparing the display panel also includes: judging the viewing angles of the different color resist materials according to their reflectance spectra, and the manufacturing process of the color resist material with poor viewing angle is earlier than that of the color resist material with good viewing angle.

[0015] Furthermore, the method for preparing the display panel also includes: judging whether there is an overlapping area in the spectrum diagram of the color filter layer according to the spectrum diagram; if there is an overlapping area, making the pixel definition layer in the light-emitting structure into a black or gray pixel definition layer; if there is no overlapping area, making the pixel definition layer in the light-emitting structure into a transparent pixel definition layer.

[0016] The technical advantage of this application lies in stacking the different colored color resists in the color filter layer, creating an overlapping area that acts like a black matrix for light shielding. This saves on the black matrix masking process and reduces production costs. Furthermore, changing the position of the different colored color resists can further improve the viewing angle while reducing reflectivity, thereby enhancing the display quality and viewing angle of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 is a schematic structural diagram of a display panel provided in an embodiment of the present application;

[0019] Figure 2 This is a spectrum diagram of the color filter layer provided in the embodiment of the present application;

[0020] Figure 3 is a structural diagram of another display panel provided in an embodiment of the present application;

[0021] Figure 4 This is a structural diagram of another display panel provided in an embodiment of the present application;

[0022] Figure 5 This is a flow chart of a method for manufacturing a display panel provided in an embodiment of the present application.

[0023] Description of reference numerals:

[0024] 100, array substrate; 200, light-emitting structure; 300, color filter layer;

[0025] 201, luminous area; 202, non-luminous area;

[0026] 210, pixel definition layer; 220, light emitting layer;

[0027] 301, monochrome area; 302, overlapping area;

[0028] 310, first color resistance; 320, second color resistance; 330, third color resistance;

[0029] 10. Overlap area; 20. Half-width. DETAILED DESCRIPTION

[0030] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present application. In addition, it should be understood that the specific implementation methods described herein are only used to illustrate and explain the present application, and are not used to limit the present application. In the present application, unless otherwise specified, the directional words used, such as "upper" and "lower", generally refer to the upper and lower parts of the device in actual use or working state, specifically the drawing direction in the accompanying drawings; and "inside" and "outside" refer to the outline of the device.

[0031] like Figures 1 to 5 As shown, the embodiments of the present application provide a display panel and a method for manufacturing the same. Detailed descriptions are given below. It should be noted that the order in which the following embodiments are described does not limit the preferred order of the embodiments.

[0032] like Figure 1 As shown, this embodiment provides a display panel, including: an array substrate 100, a light-emitting structure 200, and a color filter layer 300. To reduce the power consumption of the display panel, this embodiment uses a color filter layer with higher transmittance to replace the original polarizer, which is called polarizer-less technology. While maintaining the reflectivity, it can improve the transmittance of the entire device and reduce power consumption.

[0033] The array substrate 100 is a driving circuit component of the display panel, which plays the role of controlling the circuit switch. The array substrate 100 generally includes multiple thin film transistors, which have a film layer structure including an active layer, a gate insulation layer, a gate layer, a dielectric layer, a source and drain layer, etc., which will not be described in detail in this embodiment.

[0034] The light-emitting structure 200 is disposed on one side of the array substrate 100. In this embodiment, the light-emitting structure 200 is disposed on the upper surface of the array substrate 100. The light-emitting structure 200 includes a pixel definition layer 210 and a light-emitting layer 220, which are divided into a light-emitting area 201 and a non-light-emitting area 202. The area where the light-emitting layer 220 is located is the light-emitting area 201, and the area where the pixel definition layer 210 is located is the non-light-emitting area 202.

[0035] The pixel definition layer 210 is provided with a plurality of through holes for defining the size of the light emitting area 201. The light emitting layer 220 is provided in the through holes to form the light emitting area 201. Figure 1 In the structural diagram shown, only one group of three light-emitting layers 220 of different colors is given as an example. In practice, there are several groups of light-emitting layers of different colors.

[0036] The color filter layer 300 is disposed on a side of the light-emitting structure 200 away from the array substrate 100. The color filter layer 300 includes a monochrome region 301 and an overlapping region 302. The overlapping region 302 of the color filter layer 300 is disposed opposite the non-luminescent region 202 of the pixel definition layer 210, while the monochrome region 301 of the color filter layer 300 is disposed opposite the luminescent region 201 of the pixel definition layer 210.

[0037] The color filter layer 300 includes three color resists of different colors, exemplified by a first color resist 310, a second color resist 320, and a third color resist 330. In this embodiment, the first color resist 310 is a blue color resist, the second color resist 320 is a red color resist, and the third color resist 330 is a green color resist as an example for further explanation.

[0038] The design line width of the monochrome color resistance on the color filter layer 300 just covers the material width of the pixel definition layer 210 on the array substrate side in the area beyond the light-emitting area 201, and the overlapping area 301 just overlaps directly above the pixel definition layer 210. The effect of the overlapping area 301 is equivalent to the good light-shielding effect of the black matrix, thereby achieving the purpose of saving masks and reducing costs.

[0039] The overlapping region 302 includes two different color resists. For example, the first color resist 310 and the second color resist 320 are stacked. The thickness of the first color resist 310 in the overlapping region 302 is 50% to 70% of the thickness of the same color resist in the adjacent single-color region 301. The distance between the first color resist 310 and the light-emitting structure 200 is greater than the distance between the second color resist 320 and the light-emitting structure 200, meaning that the first color resist 310 is positioned above the second color resist 320. The color resists in the remaining overlapping regions 320 overlap in a similar manner, each forming a "Z" shape in cross-section.

[0040] Although the order of the monochromatic color resists in the manufacturing process does not affect the reflectivity, it does affect the reflected hue and viewing angle. Therefore, the order in which the different color resists are stacked up and down needs to be determined based on the reflectance spectra of the different color resist materials. When judging the viewing angle of the different color resist materials, the manufacturing process of the color resist material with a poor viewing angle is earlier than that of the color resist material with a good viewing angle, so the color resist with a poor viewing angle is located above the color resist with a good viewing angle. Because the viewing angle of the third color resist is better than that of the second color resist, and the viewing angle of the second color resist is better than that of the first color resist, the first color resist 310 is located above the second color resist 320, and the second color resist 320 is located above the third color resist 330, that is, the blue color resist is located above the red color resist, and the red color resist is located above the green color resist.

[0041] like Figure 4 As shown, because the viewing angle of the blue color resist is poor, the blue color resist is used as the color resist in the upper part of the overlapping area 302, that is, the light-emitting side, and the color resists of the other two colors are placed at the bottom, so a "convex"-shaped color resist will appear. Furthermore, the thickness of the blue color resist in the overlapping area 302 can be increased to further improve the viewing angle of blue light.

[0042] In this embodiment, the material color of the pixel definition layer 210 is determined according to the spectrum of the light transmittance of the color filter layer 300. Figure 2 The portion circled by a dotted circle in the figure is the overlap region 10 in the spectrum diagram. Because of the existence of the overlap region 10, the pixel definition layer 210 needs to be made into a black or gray pixel definition layer (see Figure 3 If the overlapped region 10 does not exist in the spectrum graph, the pixel definition layer 210 can be made into a transparent pixel definition layer without further reducing the scattering rate.

[0043] Preferably, the transmittance of the color filter layer 300 should be such that there is no overlap area 10 as much as possible. Figure 2 The narrower the half-peak width 20 is, the lower the reflectivity is. Therefore, the reflectivity problem in the depolarizer technology can be improved by adjusting the half-peak width of the transmittance spectrum of the color filter layer 300, that is, the reflectivity of the depolarizer display panel can be improved.

[0044] The technical benefit of the display panel described in this embodiment lies in the fact that the different colored color resists within the color filter layer are stacked in an overlapping structure, creating an overlapping area that acts like a black matrix for light shielding. This reduces the need for a black matrix mask, thereby reducing production costs. Furthermore, altering the position of the different colored color resists not only reduces reflectivity but also further improves viewing angles, enhancing the display quality and viewing angle of the display panel.

[0045] like Figure 5 As shown, this embodiment further provides a method for manufacturing a display panel, including steps S1 to S3.

[0046] S1 provides an array substrate 100, and sequentially prepares film layer structures such as an active layer, a gate insulating layer, a gate layer, a dielectric layer, and a source and drain layer. The specific process is not described in detail in this embodiment. The array substrate 100 is a driving circuit component of the display panel, which plays the role of controlling the circuit switch.

[0047] S2 prepares the light emitting structure 200 on the array substrate 100 , including preparing a pixel definition layer 210 and a light emitting layer 220 . The area where the light emitting layer 220 is located forms a light emitting area 201 , and the area where the pixel definition layer 210 is located forms a non-light emitting area 202 .

[0048] The color filter layer 300 includes three color resists of different colors, exemplified by a first color resist 310, a second color resist 320, and a third color resist 330. In this embodiment, the first color resist 310 is a blue color resist, the second color resist 320 is a red color resist, and the third color resist 330 is a green color resist as an example for further explanation.

[0049] The viewing angles of the different color resist materials are determined according to their reflectance spectra. The color resist material with poor viewing angle needs to be manufactured earlier than the color resist material with good viewing angle.

[0050] According to Figure 2 The spectrum diagram of the color filter layer shown is used to determine whether there is an overlapping area 10 in the spectrum diagram. If there is an overlapping area 10, the pixel definition layer 210 in the light-emitting structure 200 is made into a black or gray pixel definition layer; if there is no overlapping area 10, the pixel definition layer 210 in the light-emitting structure 200 is made into a transparent pixel definition layer.

[0051] S3 prepares a color filter layer 300 on the light emitting structure 200, specifically, comprising the following steps: preparing a first color filter 310 on a substrate, patterning the first color filter 310 using a half-engraving process to form first color filters 310 of different thicknesses, wherein the thicker portion serves as a single color area 301, and the thinner portion serves as a portion of an overlapping area 302, preparing a second color filter 320 on the substrate, and partially overlapping the second color filter 320 on the thinner first color filter 310 to form an overlapping area 302 (see FIG. 3 ). Figure 1 ).

[0052] The design line width of the monochrome color resistance on the color filter layer 300 just covers the material width of the pixel definition layer 210 on the array substrate side in the area beyond the light-emitting area 201. The overlapping area 301 just overlaps directly above the pixel definition layer 210 in the process. The effect of the overlapping area 301 is equivalent to the good light-shielding effect of the black matrix, thereby achieving the purpose of saving masks and reducing costs.

[0053] The overlapping region 302 includes two different color resists. For example, the first color resist 310 and the second color resist 320 are stacked. The thickness of the first color resist 310 in the overlapping region 302 is 50% to 70% of the thickness of the same color resist in the adjacent single-color region 301. The distance between the first color resist 310 and the light-emitting structure 200 is greater than the distance between the second color resist 320 and the light-emitting structure 200, meaning that the first color resist 310 is positioned above the second color resist 320. The color resists in the remaining overlapping regions 320 overlap in a similar manner, each forming a "Z" shape in cross-section.

[0054] Although the order of the monochromatic color resists in the manufacturing process does not affect the reflectivity, it does affect the reflected hue and viewing angle. Therefore, the order in which the different color resists are stacked up and down needs to be determined based on the reflectance spectra of the different color resist materials. When judging the viewing angle of the different color resist materials, the manufacturing process of the color resist material with a poor viewing angle is earlier than that of the color resist material with a good viewing angle, so the color resist with a poor viewing angle is located above the color resist with a good viewing angle. Because the viewing angle of the third color resist is better than that of the second color resist, and the viewing angle of the second color resist is better than that of the first color resist, the first color resist 310 is located above the second color resist 320, and the second color resist 320 is located above the third color resist 330, that is, the blue color resist is located above the red color resist, and the red color resist is located above the green color resist.

[0055] like Figure 4 As shown, because the viewing angle of the blue color resist is poor, the blue color resist is first produced as the color resist in the upper part of the overlapping area 302, that is, the light-emitting side, and the color resists of the other two colors are produced subsequently and placed at the bottom, so a "convex"-shaped color resist structure will appear. Furthermore, the thickness of the blue color resist in the overlapping area 302 can be increased to further improve the viewing angle of blue light.

[0056] In this embodiment, the material color of the pixel definition layer 210 is determined according to the spectrum of the light transmittance of the color filter layer 300. Figure 2 The portion circled by a dotted circle in the figure is the overlap region 10 in the spectrum diagram. Because of the existence of the overlap region 10, the pixel definition layer 210 needs to be made into a black or gray pixel definition layer (see Figure 3 If the overlapped region 10 does not exist in the spectrum graph, the pixel definition layer 210 can be made into a transparent pixel definition layer without further reducing the scattering rate.

[0057] Preferably, the transmittance of the color filter layer 300 should be such that there is no overlap area 10 as much as possible. Figure 2 The narrower the half-peak width 20 is, the lower the reflectivity is. Therefore, the reflectivity problem in the depolarizer technology can be improved by adjusting the half-peak width of the transmittance spectrum of the color filter layer 300, that is, the reflectivity of the depolarizer display panel can be improved.

[0058] The technical benefit of the display panel manufacturing method described in this embodiment lies in stacking the different colored color resists in the color filter layer, creating an overlapping area that acts like a black matrix for light shielding. This saves on the black matrix photomask process and reduces production costs. Furthermore, by repositioning the different colored color resists, producing those with poor viewing angles first and those with good viewing angles later, this reduces reflectivity while further improving the viewing angle, thereby enhancing the display quality and viewing angle of the display panel.

[0059] The above is a detailed introduction to a display panel and a preparation method thereof provided in an embodiment of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea. At the same time, for technical personnel in this field, based on the ideas of the present application, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A display panel, characterized in that: include: array substrate; a light emitting structure, provided on one side of the array substrate; as well as A color filter layer is provided on a side of the light-emitting structure away from the array substrate; the color filter layer includes an overlapping area and a monochrome area; the color filter layer includes a first color resist, a second color resist, and a third color resist; in the monochrome area, the viewing angle of the third color resist is better than that of the second color resist, and the viewing angle of the second color resist is better than that of the first color resist; the overlapping area includes a first overlapping area, a second overlapping area, and a third overlapping area; in the first overlapping area, the first color resist is located on a side of the second color resist away from the pixel definition layer; in the second overlapping area, the second color resist is located on a side of the third color resist away from the pixel definition layer; and in the third overlapping area, the first color resist is located on a side of the third color resist away from the pixel definition layer; a pixel definition layer, disposed on one side of the array substrate, wherein the pixel definition layer is provided with a light-emitting area and a non-light-emitting area; and a light-emitting layer, disposed in the light-emitting area; The overlapping area of ​​the color filter layer is arranged opposite to the non-luminescent area of ​​the pixel definition layer, and the monochrome area of ​​the color filter layer is arranged opposite to the luminescent area of ​​the pixel definition layer.

2. The display panel according to claim 1, wherein The thickness of the first color resist is 50% to 70% of the thickness of the color resist of the same color in the adjacent single-color area.

3. The display panel according to claim 2, wherein: The color of the pixel definition layer includes one of transparent, black and gray.

4. A method for preparing a display panel, characterized in that: The following steps are involved: providing an array substrate; preparing a light-emitting structure on the array substrate; as well as preparing a color film layer on the light-emitting structure; The step of preparing a color filter layer on the light-emitting structure includes: preparing a third color resist on a substrate; A second color resist is prepared on the substrate. In a monochrome area, the viewing angle of the third color resist is better than that of the second color resist. The second color resist is partially overlapped on the extension of the third color resist to form a second overlapping area. A first color block is prepared on the substrate. In a monochrome area, the viewing angle of the second color block is better than that of the first color block. The first color block is partially overlapped on the epitaxial portion of the second color block to form a first overlapping area. The first color block is partially overlapped on the epitaxial portion of the third color block to form a third overlapping area.

5. The method for manufacturing a display panel according to claim 4, wherein: The third color resist is patterned by a half-engraving process to form third color resists of different thicknesses, wherein a portion with a larger thickness serves as a single-color area, and a portion with a smaller thickness serves as a part of an overlapping area.

6. The method for manufacturing a display panel according to claim 4, wherein: Also includes: determining, based on the spectrum of the color filter layer, whether there is an overlapping area in the spectrum; If there is an overlapping area, the pixel definition layer in the light-emitting structure is made into a black or gray pixel definition layer; If there is no overlapping area, the pixel definition layer in the light emitting structure is made into a transparent pixel definition layer.

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