Implant storage container

Abstract

An implant storage container according to one embodiment of the present invention comprises: an implant body; a support block connected to the implant body; a cover body used to accommodate the implant body and connected to the support block; and a sealing component capable of maintaining a vacuum state inside the cover body by sealing the boundary between the support block and the cover body.

Description

Technical Field

[0001] The present invention relates to an implant storage container, and more particularly, to an implant storage container capable of forming a vacuum inside the storage container that accommodates and stores an implant fixture. Background Art

[0002] An implant is a substitute for human tissue when it is lost. In dentistry, it refers to an artificial tooth structure.

[0003] During implant surgery, an artificial tooth root made of a material that does not cause rejection in the human body (e.g., titanium, etc.) is implanted into the bone to replace the root of the lost tooth. Afterwards, the artificial tooth root is adhered to the alveolar bone and the restoration is fixed to form an artificial tooth structure.

[0004] Generally, a dental implant includes a fixture, which is made of peptide and implanted in the alveolar bone; an abutment, which is fixed on the fixture and used to support the prosthesis; an abutment screw, which is used to fix the abutment on the fixture; and a prosthesis, which is an artificial tooth fixed on the abutment.

[0005] The components of dental implants are inserted into human tissues, so they should be kept sterile and surface activated, so preventing contamination or damage during packaging, transportation, and unpacking is becoming the most important task. Summary of the invention

[0006] Problems to be solved by the invention

[0007] The technical problem to be solved by the present invention is to provide a vacuum sealing structure to prevent contamination and damage to the implant stored in the storage container.

[0008] Furthermore, another technical problem to be solved by the present invention is to provide a storage container for storing implants, which includes a dielectric layer for dielectric barrier discharge or a structure for applying electrodes, or a material that allows ultraviolet rays to pass when the above-mentioned implants are subjected to plasma or ultraviolet treatment for surface modification.

[0009] The technical problem to be solved by the present invention is to provide an implant storage container, a device used therefor, and a method of using the same, wherein the implant storage container is used to impart characteristics corresponding to plasma treatment of a treated object such as a biological material.

[0010] Another technical problem to be solved by the present invention is to provide an implant storage container, a device used therefor, and a method of using the same, wherein the implant storage container replaces a high voltage part for generating plasma by applying electricity to the object to be processed, thereby simplifying the device.

[0011] Another technical problem to be solved by the present invention is to provide an implant storage container, a device used therefor and a method of using the same, wherein the implant storage container changes the connection of the connecting part of the device for applying electricity to the treated object into a line contact or surface contact with the side, thereby preventing damage caused by the connecting part of the above-mentioned device being connected to the treated object or its connecting part by point contact.

[0012] Another technical problem to be solved by the present invention is to provide an implant storage container, a device therefor and a method of using the same, wherein the implant storage container can form a vacuum state in a plasma treatment space to ensure the sterility of the plasma treatment space.

[0013] Another technical problem to be solved by the present invention is to provide an implant storage container, a device therefor and a method of using the same, wherein the implant storage container can maintain sterility and biocompatibility so as to be stored in a vacuum state after the plasma surface treatment is completed.

[0014] Another technical problem to be solved by the present invention is to provide an implant storage container, a device for the same and a method for using the same, wherein when the implant storage container is surface treated by plasma under vacuum conditions, contamination during the process of moving the fixing device to the vacuum chamber is prevented.

[0015] The technical problem to be solved by the present invention is to provide an implant storage container, which includes a cover body, in which the implant body is accommodated and connected to the cover body, so as to maintain the internal gas environment filled with discharge gas in a sealed state, and the discharge gas is used for plasma discharge according to a preset composition ratio.

[0016] Solutions for solving problems

[0017] An implant storage container according to an embodiment of the present invention may include: an implant body; a support block connected to the implant body; a cover body used to accommodate the implant body and connected to the support block; and a sealing component that can maintain a vacuum state inside the cover body by sealing the boundary between the support block and the cover body.

[0018] In some embodiments, the sealing component may be an elastic O-ring or a sealing gasket.

[0019] In some embodiments, the sealing component is made of an elastic material and can perform the following recovery operation: when exhausting the internal air of the cover body, an air circulation path is temporarily formed in the sealing component, and then the air circulation path is closed.

[0020] In some embodiments, the cover body includes: an inner cover body, which is used to accommodate the implant body; and an outer cover body, which is used to accommodate the inner cover body. The sealing component maintains the vacuum state inside the outer cover body by sealing the boundary between the outer cover body and the support block.

[0021] In some embodiments, the inner cover may be provided with a path for allowing the internal air to flow from the inner cover toward the outer cover.

[0022] In some embodiments, when the outer cover is separated from the support block, the inner cover and the outer cover may be separated from the support block together.

[0023] In some embodiments, the inner cover may be provided with a dielectric region for dielectric barrier discharge.

[0024] In some embodiments, the support block may be formed with a hole for exhausting the internal air of the cover.

[0025] In some embodiments, the hole is provided with the following recovery structure: after exhausting the internal air of the cover body, the inner side of the cover body is kept in vacuum.

[0026] In some embodiments, in the recovery structure, when exhausting the internal air of the cover body, an air circulation path is temporarily formed in the recovery structure, and then the air circulation path is closed to keep the inner side of the cover body in vacuum.

[0027] In some embodiments, the cover body may be provided with a valve port for exhausting the internal air of the cover body.

[0028] In some embodiments, the outer surface of the support block includes an electrical terminal, and the support block is also provided with an electrical connection portion for connecting the electrical terminal with the implant body.

[0029] In some embodiments, the cover may be provided with a dielectric region for dielectric barrier discharge.

[0030] In some embodiments, the dielectric region is ultraviolet-transmissive.

[0031] An implant storage container according to one embodiment of the present invention comprises: a fixing portion, which fixes the object to be processed by contacting the object to be processed; and a cover body, which is used to accommodate the fixing portion, and the fixing portion can receive electricity from the contact portion by contacting the side of the contact portion, and the contact portion is inserted from the outside of the cover body into the inside of the cover body.

[0032] In some embodiments, the fixing portion and the processed object are made of electrically conductive materials, and the processed object can become a power supply portion for generating plasma by receiving electricity from the contact portion.

[0033] In some embodiments, the cover body includes a first area penetrated by the contact portion, and the first area is made of an elastic material, so that even if the contact portion penetrates the first area, the interior of the cover body can be sealed to maintain a vacuum state.

[0034] In some embodiments, the air inside the cover is exhausted through the contact portion, thereby maintaining the interior of the cover in a vacuum state.

[0035] In some embodiments, the fixing portion includes a convex portion protruding inwardly, the convex portion can contact the side portion of the contact portion, and the contact portion is inserted into the inner side.

[0036] In some embodiments, the fixing portion includes: a first fixing component, which is in contact with the object to be processed; and a second fixing component, which is combined with the first fixing component. The first fixing component and the second fixing component are made of conductive materials, so that the electricity applied by the second fixing component in contact with the contact portion can be transferred to the object to be processed.

[0037] In some embodiments, an inner angle of the insertion groove formed by the protrusion may be greater than an inner angle of a front end of the contact portion.

[0038] In some embodiments, the first fixing member includes a D-groove-shaped portion in which a portion of the outer circumference is cut into a planar shape, thereby fixing the processed object to prevent it from rotating.

[0039] In some embodiments, the cover body includes: an inner cover body, which is used to accommodate the processed object and the fixing part; and an outer cover body, which is used to accommodate the inner cover body, and the inner cover body and the outer cover body can be separated by a specified distance.

[0040] In some embodiments, the implant storage container further includes a sealing component connected to the cover body, the sealing component includes a through portion penetrated by the contact portion, and the through portion is made of an elastic material. Thus, even if the through portion is penetrated by the contact portion, the interior of the cover body can be sealed to maintain a vacuum state.

[0041] In some embodiments, an elastic O-ring or a sealing gasket may be included between the sealing component and the cover body.

[0042] In some embodiments, the inner cover may include a path for allowing the internal air of the inner cover to flow toward the outer cover.

[0043] In some embodiments, the implant storage container further includes: a sealing component connected to the outer cover body; and an O-ring or a sealing gasket, which is located between the sealing component and the outer cover body and has elasticity, the sealing component is connected to the inner cover body, and the inner cover body is connected to the outer cover body through a cap having an elasticity, when the internal air of the outer cover body is exhausted, the interior of the outer cover body can be sealed to maintain a vacuum state by the O-ring or the sealing gasket having the elasticity, as the internal air of the outer cover body is exhausted, the internal pressure of the outer cover body increases, and the connection between the inner cover body and the outer cover body is strengthened by the cap, when the interior of the outer cover body is ventilated, the internal pressure of the outer cover body decreases, and the connection between the inner cover body and the outer cover body can be weakened by the elastic recovery of the cap.

[0044] A plasma processing device according to an embodiment of the present invention may include: a receiving portion, which is used to receive a container, wherein the container receives a processed object; a contact portion, which is inserted into the inner side of the container, and a side of the contact portion is electrically connected to the processed object; and a power supply portion, which applies power for generating plasma to the processed object through the contact portion.

[0045] In some embodiments, the contact portion may include a front end portion capable of penetrating through the outer surface of the container.

[0046] In some embodiments, the contact portion may include an air flow path inside the contact portion for exhausting the internal air of the container.

[0047] In some embodiments, the hole formed in the contact portion for exhausting the internal air of the container may be formed at a position farther from the object to be processed than a position where the contact portion and the object to be processed are in electrical contact.

[0048] In some embodiments, the present invention also includes an exhaust portion, which is connected to the air flow path of the contact portion to exhaust the internal air of the container. The contact portion is an electrically conductive material, and the path connected to the exhaust portion of the contact portion may also include an insulating portion.

[0049] In some embodiments, the present invention may further include a grounding electrode portion, which is adjacent to the outer peripheral surface of the container and is connected to the power supply portion and grounded.

[0050] In some embodiments, the receiving portion may further include a fixing portion for receiving and fixing the container.

[0051] A plasma processing method according to an embodiment of the present invention may include the following steps: a receiving container, wherein the container receives a processed object; moving a contact portion to the inner side of the container so that a side of the contact portion is electrically connected to the processed object; exhausting the internal air of the container through the contact portion; and applying a power source for generating plasma to the processed object through the contact portion.

[0052] In some embodiments, the present invention may include the following steps: detecting whether the container is accommodated, and applying the power when the container is accommodated.

[0053] The implant storage container of an embodiment of the present invention may include: an implant body; a cover body, which accommodates the implant body inside; and a storage container body, which is connected to the cover body and maintains the internal gas environment filled with discharge gas in a sealed state, and the discharge gas is used for plasma discharge according to a preset composition ratio.

[0054] According to an embodiment, the implant storage container may further include a sealing member for sealing a boundary between the storage container body and the cover.

[0055] According to an embodiment, the sealing component may be an elastic O-ring or a sealing pad.

[0056] According to an embodiment, the storage container body may include a through portion made of an elastic material, and may perform a recovery operation as follows: when the discharge gas is injected into the interior of the cover, a gas flow path is temporarily formed, and then the gas flow path is closed.

[0057] According to an embodiment, a display unit for displaying information related to the internal gas environment may be further included on the outer surface of the storage container body or the outer surface of the cover.

[0058] According to an embodiment, the display unit may display at least one of a type of the discharge gas filled in the implant storage container, a composition ratio of the discharge gas, an internal pressure of the discharge gas, and a usable period.

[0059] According to an embodiment, the implant storage container may further include a fixing portion connected to the implant body and used to fix the implant body.

[0060] According to an embodiment, the fixing portion may include: a first fixing component connected to the implant body; and a second fixing component combined with the first fixing component.

[0061] According to an embodiment, the first fixing member and the second fixing member are made of an electrically conductive material, and can transmit a voltage applied to the second fixing member to the implant body.

[0062] According to an embodiment, the implant body may operate as an electrode for dielectric barrier discharge when a voltage is applied.

[0063] According to an embodiment, the discharge gas may be composed of helium, neon, argon, krypton, xenon, radon, nitrogen, hydrogen selenide, deuterium, fluorine, chlorine, bromine, iodine, hydrogen, mercury, or a combination thereof.

[0064] According to an embodiment, the cover body includes: an inner cover body for accommodating the implant body; and an outer cover body for accommodating the inner cover body, and the inner cover body and the outer cover body may be separated by a specified distance.

[0065] According to an embodiment, a handle portion formed by a protruding structure may be provided on the inner cover.

[0066] According to an embodiment, the inner cover may include a path for passing gas between the inner cover and the outer cover.

[0067] Effects of the Invention

[0068] The device of the embodiment of the present invention has the following effects: vacuum sealing can be achieved to maintain sterilization of the implant contained therein and prevent damage and contamination.

[0069] Furthermore, the device according to the embodiment of the present invention has the following effects: vacuum sealing can be achieved, thereby improving the efficiency of dielectric barrier discharge when plasma surface treatment is performed on the implant accommodated therein.

[0070] Furthermore, the device of the embodiment of the present invention has the following effects: it has a dielectric layer for plasma surface treatment of the accommodated implant and a structure for applying electrodes, so it has lower cost and can be connected to a high-efficiency treatment device.

[0071] Furthermore, the device of the embodiment of the present invention has the following effects: it is made of ultraviolet-transmitting material for ultraviolet surface treatment of the accommodated implant, and can be connected to a high-efficiency treatment device.

[0072] Furthermore, the device according to the embodiment of the present invention has the following effect: the plasma surface treatment and the ultraviolet surface treatment are performed on the received implant at the same time, thereby maximizing the efficiency of the surface treatment.

[0073] Furthermore, the device according to the embodiment of the present invention has the following effect: the implant fixture is sealed in a vacuum and circulated, thereby preventing organic matter from being attached to the surface of the fixture.

[0074] Furthermore, the device of the embodiment of the present invention has the following effects: in the packaged state, the implant fixture is surface treated, thereby removing organic matter on the surface of the fixture and improving biocompatibility.

[0075] The container, the device, and the method according to the embodiments of the present invention have the following effects: properties corresponding to plasma treatment of a treatment object such as a biological material are imparted.

[0076] Furthermore, the container, the device, and the method according to the embodiment of the present invention have the following effect: the object to be processed functions as a high voltage unit for generating plasma by receiving electricity, thereby simplifying the device.

[0077] Furthermore, the container, device and method of the embodiments of the present invention have the following effects: the connection position for applying electricity to the processed object is changed to line contact or surface contact rather than point contact, thereby preventing the structure of the device for the connection position from being damaged and reducing the difficulty of the operation for forming the connection position.

[0078] Furthermore, the container, the device and the method of the embodiments of the present invention have the following effects: uniform and stable plasma surface treatment can be performed under vacuum conditions, and have higher spatial uniformity and improved surface treatment performance.

[0079] Furthermore, the container, the device and the method according to the embodiment of the present invention have the following effects: the sterility of the plasma treatment space can be ensured.

[0080] Furthermore, the container, device and method of the embodiment of the present invention have the following effects: vacuum sealing can be achieved for the treated object after the plasma treatment to maintain sterilization and prevent damage and contamination.

[0081] Furthermore, the container, the device, and the method according to the embodiment of the present invention have the following effects: after the plasma surface treatment is completed, the container can be stored in a vacuum state, thereby maintaining sterility and biocompatibility.

[0082] Furthermore, the container, the device, and the method according to the embodiment of the present invention have the following effects: when a surface treatment using plasma is performed under vacuum conditions, contamination during the process of moving the fixture to a vacuum chamber for treatment is prevented.

[0083] The device and method of the embodiment of the present invention have the following effects: a sealed state can be maintained to prevent contamination of the implant body contained therein, maintain a sterilized state, and prevent damage.

[0084] Furthermore, in the device and method of the embodiments of the present invention, the internal gas environment filled with discharge gas is maintained in a sealed state, and the discharge gas is used for plasma discharge according to a preset composition ratio, thereby being used for plasma treatment while optimizing the state of the implant storage container containing the implant body.

[0085] Furthermore, in the apparatus and method of the embodiments of the present invention, when a voltage is applied to the implant body, it works as an electrode for dielectric barrier discharge, thereby effectively performing plasma treatment on the implant body.

[0086] Furthermore, in the device and method of the embodiments of the present invention, the type of discharge gas filled in the implant storage container, the composition ratio of the discharge gas, the internal pressure of the discharge gas and at least one of the usable period are displayed by a display unit outside the implant storage container, thereby effectively managing the implant storage container. BRIEF DESCRIPTION OF THE DRAWINGS

[0087] In order to more fully understand the drawings cited in the detailed description of the present invention, a brief description of each drawing is provided.

[0088] Figure 1 The present invention briefly illustrates the structure of an implant storage container according to an embodiment of the present invention.

[0089] Figure 2 For along Figure 1 Schematic cross-sectional view obtained along line AA.

[0090] Figure 3 The present invention is a cross-sectional view briefly showing the structure of an implant storage container according to another embodiment of the present invention.

[0091] Figure 4 The present invention is a cross-sectional view briefly showing the structure of an implant storage container according to another embodiment of the present invention.

[0092] Figure 5 The present invention briefly shows the structure of an implant storage container according to another embodiment of the present invention.

[0093] Figure 6 The present invention briefly illustrates the structure of an implant storage container according to an embodiment of the present invention.

[0094] Figure 7 For along Figure 6 Schematic cross-sectional view obtained along line AA.

[0095] Figure 8 To show Figure 7 A schematic cross-sectional view of a state in which the contact portion is inserted.

[0096] Fig. 9 To enlarge Figure 8 Figure 3 is obtained by looking at the B region.

[0097] Fig.10 The structure of a plasma processing device according to an embodiment of the present invention is briefly shown.

[0098] Fig.11 To briefly show Fig.10 Structural diagram of a state in which the contact portion is inserted into a container.

[0099] Fig.12 FIG. 4 is a flow chart showing a plasma processing method according to an embodiment of the present invention.

[0100] Fig.13 This is a three-dimensional view of an implant storage container according to an embodiment of the present invention.

[0101] Fig.14 For along Fig.13 A cross-sectional view of an embodiment when cutting along the AA line.

[0102] Fig.15 To show Fig.14 A diagram showing a state in which the contact portion is inserted into an implant storage container.

[0103] Fig.16 To enlarge Fig.15 Magnified view of area B.

[0104] Fig.17 FIG. 4 is a schematic diagram of a plasma processing system according to an embodiment of the present invention.

[0105] Fig.18 To show Fig.17 A diagram showing a state in which a contact part in a plasma treatment system is inserted into an implant storage container. DETAILED DESCRIPTION

[0106] The technical concept of the present invention can be modified in various ways and has a variety of embodiments. Specific embodiments are illustrated in the drawings and described in detail. However, this does not limit the technical concept of the present invention to specific embodiments, and includes all modifications, equivalent technical solutions or alternative technical solutions included in the scope of the technical concept of the present invention.

[0107] When describing the technical idea of ​​the present invention, if it is determined that the specific description related to the related known technology unnecessarily confuses the main idea of ​​the present invention, the detailed description will be omitted. In addition, the numbers (e.g., first, second, etc.) used in the description of this specification are only identifiers for distinguishing one component from other components.

[0108] Furthermore, in the present specification, when it is mentioned that a component is “connected” or “coupled” to another component, the above-mentioned component may be directly connected or directly coupled to the above-mentioned other component, and, unless there is a specific description to the contrary, it can also be understood that it is connected or coupled through other components in the middle.

[0109] Furthermore, the terms “part,” “device,” “component,” “module,” etc. described in this specification refer to a unit for processing at least one function or operation, which may be implemented by hardware or software, or a combination of hardware and software, such as a processor, a microprocessor, a microcontroller, a central processing unit (CPU), a graphics processing unit (GPU), an accelerated processing unit (APU), a digital signal processor (DSP), an application specific integrated circuit (ASIC), a field programmable gate array (FPGA), etc., and may also be implemented in a form combined with a memory for storing data required to process at least one function or operation.

[0110] Furthermore, it should be made clear that in this specification, the distinction between constituent units is made only according to the main functions that each constituent unit is responsible for. That is, two or more constituent units to be described below can be combined into one constituent unit, or one constituent unit can be divided into two or more constituent units according to further subdivided functions. Furthermore, in each constituent unit to be described below, in addition to the main functions that it is responsible for, it can also perform part or all of the functions that other constituent units are responsible for, and part of the main functions that each constituent unit is responsible for can be performed by other constituent units.

[0111] Hereinafter, embodiments of the technical concept of the present invention will be described in detail one by one.

[0112] Figure 1 To briefly illustrate the structure of an implant storage container according to an embodiment of the present invention, Figure 2 For along Figure 1 Schematic anatomical view of AA line acquisition.

[0113] Reference Figure 1 and Figure 2An implant storage container 100 according to an embodiment of the present invention includes: an implant body 110; a support block 120 connected to the implant body 110; covers 130 and 140 for accommodating the implant body 110 and connected to the support block 120; and a sealing component 150, which can maintain a vacuum state inside the covers 130 and 140 by sealing the boundaries between the support block 120 and the covers 130 and 140.

[0114] The implant storage container 100 can store the implant body 110 in a state where the implant body 110 is accommodated therein. The implant storage container 100 may also be called an implant ampoule or the like.

[0115] According to the embodiment, the implant body 110 is composed of a predetermined structure inserted into the alveolar bone to support the artificial tooth. According to the embodiment, the implant body 110 extends in the up-down direction and is generally in a columnar shape. It can be made of a material such as titanium that is harmless to the human body and easily integrates with bone tissue, but is not limited thereto. Therefore, any material having properties similar to those described above can be used.

[0116] Furthermore, according to the embodiment, the implant body 110 has a screw-like shape, thereby having a structure that increases the contact area with the surroundings, and having a structure in which the outer diameter expands or contracts in one direction.

[0117] The implant body 110 is an object to be stored in the implant storage container 100, and can be an object to be treated by the plasma treatment when the entire implant storage container 100 is subjected to the plasma treatment.

[0118] According to an embodiment, the implant body 110 may be replaced by other treated objects (or treated items) that are powered on.

[0119] According to an embodiment, the implant body 110 may broadly refer to a portion of the implant that needs to be plasma treated. For example, the implant body 110 may be an implant fixture, but is not limited thereto.

[0120] The implant body 110 is received in the caps 130 and 140. The caps 130 and 140 may have a cylindrical or rectangular main body.

[0121] According to an embodiment, the covers 130 and 140 may include: an inner cover 130 for receiving the implant body 110 ; and an outer cover 140 for receiving the inner cover 130 .

[0122] According to an embodiment, the outer cover 140 is made of a resin material.

[0123] According to the embodiment, the outer cover 140 and the support block 120 may be sealed by the sealing member 150 to maintain the vacuum state inside the outer cover 140. Also, the outer cover 140 may be connected to the support block 120 by the sealing member 150 to form a vacuum boundary condition.

[0124] According to an embodiment, the inner cover body 130 is provided with support units 131 and 132 for placing and supporting the implant body 110, which can support the implant body 110 at a specified height. The support units 131 and 132 may include: a lower support unit 131, which is located at the lower part of the implant body 110 to fix and support the implant body 110; and an upper support unit 132, which is located at the upper part of the implant body 110 to fix and support the implant body 110.

[0125] In the present specification, a “support unit” may broadly refer to a structure that supports or fixes the implant body 110 regardless of the configuration, and may also be referred to as a “fixing portion” according to an embodiment.

[0126] According to an embodiment, the support units 131 and 132 may be made of the same material as the implant body 110 , or may be made of a material such as titanium that is harmless to the human body and easily integrates with bone tissue, thereby preventing contamination and damage to the implant body 110 .

[0127] According to an embodiment, the inner cover 130 includes an inner cover cap 133 that fixes the upper support unit 132 by elastic compression.

[0128] The inner cap 133 has elasticity, and applies elastic pressure to the upper supporting unit 132 to fix the implant body 110 .

[0129] According to an embodiment, the inner cap 133 includes a path 134 for allowing the inner air of the inner cover 130 to flow from the inner cover 130 toward the outer cover 140 .

[0130] According to an embodiment, the inner cap 133 is made of a silicon material.

[0131] According to an embodiment, the inner cover 130 may be made of a dielectric to form a dielectric region for dielectric barrier discharge. Also, a portion of the outer circumference of the inner cover 130 may be made of a dielectric to form a dielectric region for dielectric barrier discharge.

[0132] According to an embodiment, the inner cover 130 is made of low expansion heat-resistant glass. For example, the inner cover 130 is made of borosilicate glass.

[0133] According to the embodiment, the outer cover 140 may serve as a grounding region for dielectric barrier discharge. In addition, a portion of the outer peripheral surface of the outer cover 140 may serve as a grounding region for dielectric barrier discharge.

[0134] According to the embodiment, the outer cover 140 is formed of a non-conductor that does not conduct electricity, thereby ensuring the safety of the user on the outer surface even if electricity is applied to the implant body 110 .

[0135] According to an embodiment, the inner cover 130 and the outer cover 140 can transmit ultraviolet rays so as to perform ultraviolet treatment on the implant body 110 .

[0136] Thus, the covers 130 and 140 can be subjected to plasma surface treatment or ultraviolet treatment sequentially, individually or simultaneously in a state where an internal vacuum is formed, thereby improving the efficiency of the surface treatment of the implant body 110 .

[0137] The support block 120 is connected to the implant body 110 .

[0138] In the present specification, a "support block" may broadly refer to a structure that directly or indirectly supports or fixes the implant body 110, and may also be referred to as a "storage container body" or the like according to an embodiment.

[0139] According to an embodiment, the support block 120 includes an electric terminal 122 on an outer surface, and is connected to the implant body 110 by including an electric connection portion 121 for connecting the electric terminal 122 and the lower support unit 131 .

[0140] According to an embodiment, the electrical connection portion 121 is made of a metal material capable of achieving electrical connection, and is connected to an electrical terminal 122 exposed on the outer surface of the implant storage container 100 .

[0141] According to an embodiment, the electrical terminal 122 is connected to an external power source and transmits electrical application to the implant body 110 through the electrical connection portion 121 and the lower support unit 131, so that the implant body 110 becomes an electrode of dielectric barrier discharge.

[0142] According to an embodiment, the support block 120 includes an insulating portion 123 at the outer circumference of the electrical connection portion 121 in order to prevent a risk of damage caused by energization to other structures when electricity is applied through the electrical connection portion 121 .

[0143] According to an embodiment, the support block 120 includes a hole 124 for exhausting the internal air of the cover bodies 130 , 140 .

[0144] According to the embodiment, the hole 124 is composed of a plurality of flow paths and a plurality of holes for exhausting the internal air of the cover bodies 130 and 140 .

[0145] The hole 124 is a recovery structure for exhausting the internal air of the cover bodies 130 and 140 to keep the inside of the cover bodies 130 and 140 in a vacuum, and includes a sealing gasket (not shown).

[0146] The sealing gasket is made of an elastic material, and when the internal air of the above-mentioned cover bodies 130, 140 is exhausted, an air circulation path is temporarily formed, and then the air circulation path is closed by elastic recovery, thereby keeping the inner side of the cover bodies 130, 140 vacuum.

[0147] Thus, the implant body 110 is isolated from the external air and can be subjected to plasma surface treatment without being contaminated.

[0148] According to an embodiment, the support block 120 and the insulating part 123 are made of a resin material.

[0149] The sealing member 150 can maintain a vacuum state inside the covers 130 and 140 by sealing the boundaries between the support block 120 and the covers 130 and 140 .

[0150] According to an embodiment, the sealing member 150 maintains a vacuum state inside the outer cover 140 by sealing a boundary between the outer cover 140 and the support block 120 .

[0151] Furthermore, according to the embodiment, the sealing member 150 forms a vacuum boundary condition at the surface where the support block 120 is connected to the cover bodies 130 and 140 .

[0152] According to an embodiment, the sealing member 150 includes an O-ring or a sealing gasket having elasticity.

[0153] According to an embodiment, the sealing member 150 is made of an elastic material. Thus, in the sealing member 150, when the hole 123 for air circulation is penetrated by a sharp object of a small diameter such as a needle to exhaust the internal air of the cover bodies 130 and 140, an air circulation path can be temporarily formed. And after the internal air is exhausted, the sealing member 150 can realize the recovery of the air circulation path by elastically closing it.

[0154] According to an embodiment, the sealing member 150 is made of a silicon material.

[0155] According to the embodiment, the outer cover 140 is connected to the support block 120 by a detachable combination structure, and the inner cover 130 is elastically fixed to the outer cover 140 and the support block 120 by the inner cover cap 133 .

[0156] Therefore, when the outer cover 140 is separated from the support block 120 , the inner cover 130 and the outer cover 140 are separated from the support block 120 together.

[0157] According to an embodiment, when the inner cover 130 is separated from the support block 120 , the inner cover 130 is individually separated from the outer cover 140 and the support block 120 .

[0158] Figure 3 The present invention is a cross-sectional view briefly showing the structure of an implant storage container according to another embodiment of the present invention.

[0159] Reference Figure 3 An implant storage container 300 according to another embodiment of the present invention includes: an implant body 310; a support block 320 connected to the implant body 310; a cover body 330 for accommodating the implant body 310 and connected to the support block 320; and a sealing component 370, which can maintain a vacuum state inside the cover body 330 by sealing the boundary between the support block 320 and the cover body 330.

[0160] According to the embodiment, the implant body 310 is fixedly coupled to the extension member 340 , the extension member 340 is fixedly coupled to a base plate 350 , and the base plate 350 is connected to the support block 320 .

[0161] Furthermore, according to an embodiment, the support block 320 includes a through electrical connection portion 360 , which is exposed on an outer surface of the support block 320 , and receives an external power source to apply voltage to the implant body 310 by connecting to the outer surface exposed by the extension part 340 .

[0162] According to the embodiment, the electrical connection part 360 is respectively provided on the inner cover 130 and the outer cover 140 . When the inner cover 130 is separated from the outer cover 140 and the support block 120 , the electrical connection part on the inner cover 130 side and the electrical connection part on the outer cover 140 side can be separated.

[0163] According to an embodiment, the electrical connection part 360 receives electricity from an external power source and applies the electricity to the implant body 310 , thereby enabling plasma surface treatment.

[0164] Also, according to an embodiment, during the plasma surface treatment by applying electricity to the implant body 310 , the sealing member 370 may form a vacuum state inside the cover body 330 and maintain the vacuum state.

[0165] According to an embodiment, the cover body 330 includes a valve port 380 for exhausting the internal air of the cover body 330. Also, the valve port 380 may be a check valve port that can be opened and closed.

[0166] According to an embodiment, the valve port 380 may maintain a vacuum in a closed structure and may be constructed to minimize the area exposed to the vacuum in order to reduce the force required to vent air by exhausting the air.

[0167] According to an embodiment, the base plate 350 includes vacuum passage holes 351 , 352 to exhaust the internal air more smoothly.

[0168] According to an embodiment, the cover 330 is made of a dielectric.

[0169] According to an embodiment, the sealing member 370 is a vacuum-tight O-ring or a rubber injection-molded sealing pad.

[0170] Figure 4 The present invention is a cross-sectional view briefly showing the structure of an implant storage container according to another embodiment of the present invention.

[0171] Reference Figure 4 An implant storage container 400 according to another embodiment of the present invention includes: an implant body 410; a support block 420 connected to the implant body 410; a cover body 430 for accommodating the implant body 410 and connected to the support block 420; and a sealing component 470, which can maintain a vacuum state inside the cover body 430 by sealing the boundary between the support block 420 and the cover body 430.

[0172] According to the embodiment, the implant body 410 is fixedly coupled to the extension component 440 , the extension component 440 is fixedly coupled to the base plate 450 , and the base plate 450 is connected to the support block 420 .

[0173] Furthermore, according to an embodiment, the support block 420 includes a through and curved electrical connection portion 460, which is exposed on the outer surface of the support block 420 and connected to the extension part 440, and the electrical connection portion 460 receives an external power source through the exposed outer surface and applies voltage to the implant body 410.

[0174] Compared with the implant fixture 410 located at the center portion of the container 400 , the electric connection portion 460 is bent in order to allow application of the external power source to be offset from the center or applied from the side.

[0175] According to an embodiment, the support block 420 includes an exhaust hole 480 for exhausting the internal air of the cover body 430 , and includes a vacuum suction port 490 having elasticity for blocking the exhaust hole 480 .

[0176] Figure 5 The present invention briefly shows the structure of an implant storage container according to another embodiment of the present invention.

[0177] Reference Figure 5Another embodiment of the implant storage container of the present invention includes: an implant body 510; a support block 520, which is connected to the implant body 510; a cover body 530, 540, which is used to accommodate the implant body 510 and is connected to the support block 520; and a sealing component 550, which can maintain the vacuum state inside the cover body 530, 540 by sealing the boundary between the support block 520 and the cover body 530, 540.

[0178] Furthermore, the implant storage container 500 further includes a first ventilation member 560 for performing ventilation to release the vacuum state inside the lid bodies 530 and 540 .

[0179] The first ventilation member 560 contacts the elastic sealing member 550 and transmits a force pressing the sealing member 550 to change the shape of the sealing member 550 , thereby generating a path for external air to flow into the covers 530 , 540 .

[0180] Furthermore, the implant storage container 500 further includes a second ventilation member 570 for performing ventilation to release the vacuum state inside the lid 530 .

[0181] According to an embodiment, the covers 530 and 540 may include: an inner cover 530 for receiving the implant body 510 ; and an outer cover 540 for receiving the inner cover 530 .

[0182] According to an embodiment, the inner cover 530 has elasticity and includes an inner cover cap 531 .

[0183] The second ventilation member 570 contacts the inner cap 531 through the hole of the outer cover body 540 , and the vacuum state inside the cover bodies 530 , 540 is maintained by the elastic property of the inner cap 531 .

[0184] The second ventilation member 570 changes the shape of the inner cap 531 by transmitting a force pressing the inner cap 531 , thereby generating a path for the external air to flow into the cover bodies 530 , 540 .

[0185] Figure 6 The present invention briefly illustrates the structure of an implant storage container according to an embodiment of the present invention.

[0186] Reference Figure 6 The implant storage container according to one embodiment of the present invention includes: a fixing portion 620 that fixes the object 610 by contacting the object 610 ; and a cover 630 that is used to accommodate the fixing portion 620 .

[0187] According to an embodiment, the object to be processed 610 may be an implant body.

[0188] According to an embodiment, the cover 630 is transparent and made of polycarbonate.

[0189] Figure 7 For along Figure 6 A schematic cross-sectional view obtained along line AA, Figure 8 To show Figure 7 A schematic cross-sectional view of a state in which the contact portion is inserted.

[0190] Further references Figure 7 and Figure 8 The fixing portion 620 contacts the side of the contact portion 700 inserted into the inside of the cover body 630 from the outside of the cover body 630 .

[0191] According to an embodiment, the contact part 700 applies electricity to the fixing part 620 by being connected to a power source.

[0192] According to the embodiment, the fixing part 620 and the object 610 are made of an electrically conductive material, and the electricity received from the contact part 700 is transmitted to the object 610 through the fixing part 620, so that the object 610 becomes a power supply part for generating plasma. Thus, the object 111 is used as a high voltage part in the process of generating plasma by dielectric barrier discharge.

[0193] According to the embodiment, the contact part 700 is a needle with a sharp tip, which is a conductive material, and can simultaneously achieve the functions of connecting electricity and performing internal exhaust by setting an internal air circulation path.

[0194] According to an embodiment, a hole 710 for taking in air when exhausting air may be formed at the contact portion 700 .

[0195] According to an embodiment, the cover 630 includes a first area 641 penetrated by the contact part 700. The first area 641 is made of an elastic material and can perform the following recovery operation: even if the contact part 700 penetrates, the vacuum state can be maintained by sealing the inside of the cover 630, and when the contact part 700 is detached, the penetrated area is closed.

[0196] According to the embodiment, the cover body 630 exhausts the internal air through the contact part 700 so that the inside of the cover body 630 is kept in a vacuum state, and is sealed to maintain this state.

[0197] According to an embodiment, the fixing portion 620 includes a protrusion 622 - 1 protruding toward the inner side where the contact portion 700 is inserted, and when the contact portion 700 is inserted and moved, the protrusion 622 - 1 contacts the side of the contact portion 700 .

[0198] Fig. 9 To enlarge Figure 8 Figure 3 is obtained by looking at the B region.

[0199] Further references Fig. 9, the inner angle b1 of the insertion groove formed by the protrusion 622 - 1 is greater than the inner angle b2 of the front end of the contact portion 700 .

[0200] That is, the contact portion 700 is inserted into the insertion groove formed by the convex portion 622 - 1 at a predetermined depth, but is locked due to the size of the internal angle and contacts the convex portion 622 - 1 .

[0201] According to an embodiment, the inner angle b1 of the insertion groove formed by the protrusion 622-1 is greater than the inner angle b2 of the front end of the contact portion 700, thereby inserting the contact portion 700 and making the side of the contact portion 700 contact the protrusion 622-1 when the front end of the contact portion 700 is not in contact with the fixing portion 620, and the insertion groove has a specified depth.

[0202] Thus, the protrusion 622 - 1 prevents the front end of the contact part 700 from contacting other components and being damaged, and contacts the side of the contact part 700 so that the front end of the contact part 700 does not contact other components, thereby preventing it from being further inserted.

[0203] In particular, the convex portion 622-1 is in line contact or surface contact with the side of the contact portion 700, so there is an effect that there is no need to accurately adjust the insertion degree of the contact portion 700. This is because accurate tolerance management is required to make the front end of the contact portion 700 contact, but when the side of the contact portion 700 is in line contact or surface contact, even if the tolerance management accuracy is low, the reliability of electrical contact can be achieved.

[0204] According to the embodiment, the contact part 700 does not apply electricity to the object 610 through point contact with a damaged front end, but is connected in a manner of applying electricity to the object 610 through line contact or surface contact at the side.

[0205] According to an embodiment, the fixing portion 620 includes: a first fixing component 621 which contacts the processed object 610 ; and a second fixing component 622 which is combined with the first fixing component 621 .

[0206] According to an embodiment, the first fixing member 621 is a stopper, which is made of titanium material, the same material as the object 610 , and fixes the object 610 to prevent the object 610 from moving up and down or rotating.

[0207] According to an embodiment, the second fixing member 622 is made of aluminum material and is physically combined with the first fixing member 621 .

[0208] Thus, the contact portion 700 may reduce damage by contacting the second fixing member 622 having a lower hardness than the first fixing member 621 .

[0209] According to an embodiment, the first fixing member 621 and the second fixing member 622 are made of a conductive material, and the second fixing member 622 is brought into contact with the contact portion 700 to transfer the applied electricity to the processed object 610 .

[0210] According to the embodiment, the first fixing member 621 includes a D-groove-shaped portion 621 - 1 in which a portion of the outer peripheral surface is cut into a plane shape, thereby fixing the processed object 610 to prevent the processed object 610 from rotating.

[0211] According to an embodiment, the second fixing member 622 includes a D-groove-shaped portion (not shown) in which a portion of the outer circumferential surface is cut into a plane shape, and fixes the processed object 610 to prevent the processed object 610 from rotating.

[0212] According to the embodiment, the cover 630 includes: an inner cover 631 for accommodating the processed object 610 and the fixing portion 620; and an outer cover 632 for accommodating the inner cover 631, and the inner cover 631 and the outer cover 632 are separated by a specified distance.

[0213] According to the embodiment, the inner cover 631 includes a path for circulating the internal air of the inner cover 631 toward the outer cover 632 side.

[0214] Thus, when the air is exhausted through the contact portion 700 , both the air inside the inner cover 631 and the air inside the outer cover 632 are exhausted.

[0215] Thus, the inner cover 631 has a structure for applying electricity to the processed object 610 and a shape for dielectric barrier discharge, and the outer cover 632 provides a structure that can be sealed with the outside of the container to form a vacuum and provides safety from external insulation.

[0216] According to an embodiment, the outer cover 632 is a vacuum dielectric barrier discharge cover, which is transparent and made of a polycarbonate material.

[0217] According to an embodiment, the inner cover 631 is a dielectric barrier discharge cover, which is transparent and made of a polycarbonate material.

[0218] According to an embodiment, the implant storage container according to an embodiment of the present invention further includes a sealing component 640 connected to the cover 630 .

[0219] According to the embodiment, the sealing member 640 includes a through portion 641 penetrated by the contact portion 700 , and the through portion 641 is made of an elastic material, thereby maintaining a vacuum state by sealing the inside of the cover body 630 even if the contact portion 700 penetrates.

[0220] According to an embodiment, the sealing member 640 and the through portion 641 are made of styrene-based ABS material, a silicon material having a hardness of 60, or a mixed material thereof.

[0221] According to an embodiment, in the implant storage container according to an embodiment of the present invention, an elastic O-ring 650 or a sealing gasket is further provided between the sealing component 640 and the cover 630 .

[0222] According to an embodiment, the sealing member 640 is threadedly coupled to the cover body 630, and when the internal air is exhausted, the O-ring 650 or the sealing gasket is compressed, thereby sealing to prevent vacuum leakage.

[0223] According to an embodiment, the O-ring 650 or gasket is made of a fluorocarbon material.

[0224] According to the embodiment, when exhausting the internal air of the outer cover 632, the combination of the inner cover 631 and the sealing member 640 is strengthened. The inner cover 631 is detachably combined with the sealing member 640. For example, the inner cover 631 and the sealing member 640 are inserted and combined, and are sealed in a manner to maintain the internal vacuum.

[0225] According to the embodiment, when exhausting the internal air of the outer cover 632, the combination of the inner cover 631 and the outer cover 632 is strengthened. The inner cover 631 is detachably combined with the outer cover 632 and is sealed in a manner to maintain the internal vacuum.

[0226] According to the embodiment, when the air inside the outer cover 632 is exhausted, the pressure of the point, line or surface where the inner cover 631 contacts the outer cover 632 or the sealing member 640 is increased, thereby strengthening the fixation. For example, the cap 670 has elasticity and connects the outer cover 632 and the inner cover 631. When the air inside the outer cover 632 is exhausted, the cap 670 is squeezed at a specified pressure, thereby strengthening the connection between the outer cover 632 and the inner cover 631. On the contrary, when the inside of the outer cover 632 is ventilated, the pressure of the cap 670 is weakened and the elasticity is restored, thereby weakening the connection between the outer cover 632 and the inner cover 631.

[0227] According to the embodiment, when the inside of the outer cover 632 is ventilated, the pressure of the point, line or surface where the inner cover 631 contacts the outer cover 632 or the sealing member 640 is reduced, thereby weakening the fixation of the inner cover 631 .

[0228] Thus, when the plasma surface treatment of the object 610 contained in the implant storage container is completed, when the interior of the implant storage container which is in a vacuum state is ventilated, the user can separate the inner cover 631 from the container without touching the inner cover 631.

[0229] In particular, when the user separates the outer cover 632 and the sealing member 640 by ventilating the interior of the implant storage container, the inner cover 631 can be separated from the outer cover 632 in a state of being detachably coupled to the sealing member 640. Afterwards, the user can separate the inner cover 631 and the sealing member 640, which are connected via the inner cap 671, by holding the handle 672 of the cap 670, thereby taking out the treated object 610.

[0230] According to the embodiment, the processed object 610 is connected to the guide portion 680 or the inner cap portion 671 , and when the inner cover body 631 and the sealing component 640 are separated by the handle portion 672 , the processed object 610 may be located on the handle portion 672 side.

[0231] That is, the inner cover 631 can be moved to the operating room, operating table or tray without being touched by a user, thereby preventing the inner cover 631 from being infected during the process.

[0232] According to an embodiment, the implant storage container according to an embodiment of the present invention further includes a guide portion 680 , which is used to make the treated object 610 more firmly fixed and is made of titanium material, which is the same material as the treated object 610 .

[0233] According to the embodiment, the object 610 is fixed by contacting the first fixing member 621 at the lower portion and contacting the guide portion 680 at the upper portion.

[0234] According to an embodiment, the implant storage container according to an embodiment of the present invention further includes a cap portion 670 connected to the guide portion 680 .

[0235] According to an embodiment, the cap portion 670 is detachably connected to the guide portion 680, and the guide portion 680 is detachably connected to the processed object 610, and by holding the cap portion 670 and pulling it toward the outside of the container, the processed object 610 and the guide portion 680 can be detached from the container without touching the processed object 610 and the guide portion 680 with hands.

[0236] According to an embodiment, the cap portion 670 includes an inner cap portion 671 for covering the upper portion of the inner cover body 631 , and a handle portion 672 for applying a squeezing force by contacting the outer cover body 632 to prevent the inner cap portion 671 from detaching.

[0237] According to an embodiment, the inner cap portion 671 is a styrene-based ABS material, and the handle portion 672 is an opaque polycarbonate material.

[0238] According to an embodiment, the implant storage container according to an embodiment of the present invention further includes a path portion 660 , which is a movement path for the contact portion 700 to contact the convex portion 622 - 1 after being inserted into the through portion 641 by piercing.

[0239] Fig.10 The structure of a plasma processing device according to an embodiment of the present invention is briefly shown.

[0240] Reference Fig.10 A plasma processing device according to an embodiment of the present invention includes: a receiving portion 820 for receiving a container 810, wherein the container 810 receives a processed object 811; a contact portion 830 electrically connected to the processed object 811; and a power supply portion 840 for applying power for generating plasma to the processed object 811 through the contact portion 830.

[0241] According to the embodiment, the processed object 811 is an implant body, and the container 810 may be an implant storage container for accommodating the implant body.

[0242] According to an embodiment, the contact part 830 is a needle including a front end portion 831 that can penetrate the outer surface of the container 810 and is a conductive material.

[0243] According to an embodiment, the contact part 830 includes an air flow path inside for exhausting the internal air of the container 810. That is, the contact part 830 is a hollow tube.

[0244] Fig.11 To briefly show Fig.10 Structural diagram of a state in which the contact portion is inserted into a container.

[0245] Further references Fig.11 The contact portion 830 is inserted into the inner side of the container 810 , so that the side of the contact portion 830 is electrically connected to the processed object 811 through the contact portion 830 .

[0246] According to the embodiment, the contact portion 830 is inserted into the insertion groove of the component 812 electrically connected to the processed object 811, so that the side of the contact portion 830 contacts and electrically connects with the inner protrusion of the component 812.

[0247] According to an embodiment, the hole 832 for exhausting the internal air of the container 810 formed in the contact part 830 is formed at a position farther from the object 811 than the electrical contact position between the contact part 830 and the object 811 .

[0248] According to the embodiment, the hole 832 is formed at a position closer to the plasma processing device side than the line or surface where the side of the contact portion 830 contacts the component 812. Thus, exhaust through the hole 832 strengthens the connection between the line or surface where the side of the contact portion 830 contacts the component 812, and solves the problem of preventing the internal air of the container 810 from being completely exhausted.

[0249] According to an embodiment, the plasma processing apparatus of one embodiment of the present invention further includes a grounding electrode portion 821 . When the container 810 is accommodated, the grounding electrode portion 821 is connected to the power supply portion 840 and grounded, and is adjacent to the outer peripheral surface of the container 810 .

[0250] According to an embodiment, the receiving portion 820 further includes a fixing portion (not shown) for receiving and fixing the container 810 .

[0251] Preferably, the receiving portion 820 further includes a sensing portion (not shown) for determining whether the container 810 is received, and preventing operational errors of the device based on whether the container 810 is received as determined by the sensing portion.

[0252] According to an embodiment, the plasma processing apparatus according to an embodiment of the present invention further includes an exhaust portion 850 , which is connected to the air flow path of the contact portion 830 and is used to exhaust the internal air of the container 810 .

[0253] According to an embodiment, the contact portion 830 is a conductive material, and a path connected to the exhaust portion 850 of the contact portion 830 further includes an insulating portion 860 .

[0254] According to an embodiment, the power supply part 840 is controlled by a power control part 881 , which is controlled by information measured by a current measurement part 883 for monitoring the current of the power supply part 840 .

[0255] According to the embodiment, the receiving portion 820 includes a ground electrode portion 821 and a dielectric portion 822 .

[0256] According to an embodiment, the dielectric portion 822 is in contact with the ground electrode portion 821 , and is disposed closer to the container 810 than the ground electrode portion 821 .

[0257] According to an embodiment, the plasma processing apparatus according to an embodiment of the present invention further includes a movement control unit 882 for controlling the movement of the contact unit 830 .

[0258] According to an embodiment, the movement control portion 882 utilizes information received through an upper limit sensor and a lower limit sensor for controlling the contact portion 830 to move through a designated path.

[0259] According to an embodiment, the plasma processing apparatus according to an embodiment of the present invention further includes a pressure sensor 871 for measuring the pressure of the exhausted air.

[0260] According to an embodiment, the plasma processing apparatus according to an embodiment of the present invention includes a valve 872 for driving or stopping the exhaust operation.

[0261] According to an embodiment, the exhaust part 850 is configured in an independent manner by a housing independently separated from the plasma processing apparatus.

[0262] According to an embodiment, the exhaust section 850 includes an exhaust pump 851; a mist collector 852, which recovers the oil discharged from the exhaust pump 851 through an oil recovery path 855; and an ozone filter 853 and a high efficiency particulate air (HEPA) filter 854, which are used to prevent contamination of the air discharged to the outside of the exhaust section 850.

[0263] Fig.12 FIG. 4 is a flow chart showing a plasma processing method according to an embodiment of the present invention.

[0264] Reference Fig.12 A plasma processing method according to an embodiment of the present invention includes: step (S1210), a receiving container, wherein the container receives a processed object; step (S1220), a contact portion moves toward the inner side of the container; step (S1230), exhausting the internal air of the container; and step (S1240), applying power to the processed object.

[0265] In step (S1210), a container containing a processed object is stored in a storage section of the device.

[0266] In step (S1220), the contact portion of the device is moved to the inside of the container in such a manner that the side of the contact portion is electrically connected to the object to be processed.

[0267] In step (S1230), the contact portion of the device is used to exhaust the internal air of the container.

[0268] In step (S1240), the power supply unit of the apparatus applies power for generating plasma to the object to be processed through the contact unit.

[0269] According to an embodiment, the plasma processing method of an embodiment of the present invention further includes the following step: detecting whether the container is accommodated or not, and applying power only when the container is accommodated.

[0270] Fig.13 This is a three-dimensional view of an implant storage container according to an embodiment of the present invention. Fig.14 For along Fig.13A cross-sectional view of an embodiment when cutting along the AA line. Fig.15 To show Fig.14 A diagram showing a state in which the contact portion is inserted into an implant storage container.

[0271] Reference Figures 13 to 15 The implant storage container 900 of the embodiment of the present invention may include an implant body 910, a fixing portion 920, a cover 930, a storage container body 940, a through portion 941, a sealing component 950, a path portion 960, a cap portion 970 and a guide portion 980.

[0272] The implant storage container 900 can store the implant body 910 in a state where the implant body 910 is accommodated therein. The implant storage container 900 may also be called an implant ampoule or the like.

[0273] The implant body 910 is an object to be stored in the implant storage container 900, and can be an object to be treated by the plasma treatment when the entire implant storage container 900 is subjected to the plasma treatment.

[0274] According to an embodiment, the implant body 910 may broadly refer to a portion of the implant that needs to be plasma treated. For example, the implant body 910 may be an implant fixture, but is not limited thereto.

[0275] The fixing part 920 may fix the implant body 910 by coming into contact with the implant body 910 .

[0276] According to an embodiment, the fixing portion 920 may include a first fixing part 921 and a second fixing part 922 .

[0277] The first fixing member 921 is configured to contact the implant body 910 , thereby fixing the implant body 910 to prevent the implant body 910 from moving in the up-down, left-right, or rotational directions.

[0278] According to an embodiment, the first fixing member 921 may be implemented by an electrically conductive material.

[0279] According to an embodiment, the first fixing member 921 may be implemented by the same material as the implant body 910 (eg, titanium).

[0280] According to an embodiment, the first fixing member 921 may include a D-groove shaped portion 921-1 in which a portion of the outer circumference is cut into a plane shape. At this time, the D-groove shaped portion 921-1 may cooperate with the lower end of the implant body 910 to prevent the implant body 910 from moving.

[0281] The second fixing member 922 is arranged to contact the first fixing member 922. When the contact part 1000 for applying voltage is inserted into the implant storage container 900, the second fixing member 922 has a structure that allows the contact part 1000 to stably contact without being damaged.

[0282] According to an embodiment, the second fixing member 922 may be implemented by a material (eg, aluminum) that is electrically conductive and relatively lower in hardness than the first fixing member.

[0283] Reference Fig.15 When a voltage is applied through the contact part 1000 in order to perform plasma treatment on the implant body 910, the contact part 1000 contacts the fixing part 920, for example, the contact part 1000 may apply the voltage by contacting the second fixing member 922 of the fixing part 920. The voltage applied to the fixing part 920 is transmitted to the implant body 910, and when the voltage is applied, the implant body 910 may operate as an electrode for dielectric barrier discharge.

[0284] According to an embodiment, the fixing portion 920 , for example, the first fixing member 921 and the second fixing member 922 constituting the fixing portion 920 , may be made of an electrically conductive material.

[0285] According to an embodiment, the fixing part 920 may include a convex part 922-1 which protrudes toward the inner side into which the contact part 1000 is inserted. When the convex part 922-1 is inserted, the convex part 922-1 may receive a voltage by contacting a side of the contact part 1000.

[0286] The cover body 930 can accommodate the implant body 910 therein.

[0287] According to an embodiment, the cover 930 may be made of a transparent material. According to an embodiment, the cover 930 may be made of a polycarbonate material.

[0288] The lid 930 is connected to a storage container body 940 described later, and can keep the interior in a sealed state.

[0289] The cover body 930 may include: an inner cover body 931 for accommodating the implant body 910 ; and an outer cover body 932 for accommodating the inner cover body 931 .

[0290] According to an embodiment, the inner cover 931 and the outer cover 932 may be spaced apart from each other by a predetermined distance.

[0291] According to an embodiment, the inner cover 931 may include a path for flowing the internal gas of the inner cover 931 toward the outer cover 932. In this case, the gas can freely move between the inside and the outside of the inner cover 931.

[0292] According to an embodiment, the inner cover 931 and the outer cover 932 may be made of polycarbonate material respectively.

[0293] According to an embodiment, one of the inner cover 931 or the outer cover 932 may be omitted.

[0294] The storage container body 940 is connected to the cover body 930 , thereby maintaining an internal gas environment filled with discharge gas in a sealed state. The discharge gas is used for plasma discharge according to a preset composition ratio.

[0295] In this specification, the “storage container body” can broadly refer to a structure that constitutes at least a part of the implant storage container 900 .

[0296] According to an embodiment, a sealing member 950 for sealing a boundary between the storage container body 940 and the cover body 930 may be included between the storage container body 940 and the cover body 930 .

[0297] According to an embodiment, the sealing member 950 may be made of an elastic material.

[0298] According to an embodiment, the internal gas environment may be maintained at a pressure lower than the atmospheric pressure. In this case, the sealing member 950 may be compressed by the pressure generated by the difference between the internal pressure of the implant storage container 900 and the atmospheric pressure to maintain the sealed state.

[0299] According to an embodiment, the sealing member 950 may be an O-ring or a sealing gasket.

[0300] According to an embodiment, the internal gas environment may include an environment of a composition ratio of the discharge gas, an internal pressure of the discharge gas, and the like.

[0301] According to an embodiment, the storage container body 940 may be threadedly coupled to the cover body 930 .

[0302] The discharge gas may be filled in the internal space sealed by the cover 930 (eg, the outer cover 932 ) and the storage container body 940 .

[0303] According to an embodiment, the discharge gas may be composed of helium, neon, argon, krypton, xenon, radon, nitrogen, hydrogen selenide, deuterium, fluorine, chlorine, bromine, iodine, hydrogen, mercury, or a combination thereof.

[0304] According to an embodiment, the storage container body 940 may be made of styrene-based ABS material, silicon material, or a mixed material thereof, but is not limited thereto.

[0305] A through portion 941 and a path portion 960 may be formed at a lower portion of the storage container body 940 .

[0306] The through portion 941 is made of an elastic material, and can perform a recovery operation as follows: when a discharge gas is injected into the implant storage container 900 , a gas flow path is temporarily formed, and then the gas flow path is closed.

[0307] The through portion 941 is formed in a manner that allows it to be penetrated by the contact portion 1000. When the through portion 941 is penetrated by the contact portion 1000, the penetrated portion is tightly attached to the contact portion 1000, thereby allowing the internal gas environment of the discharge gas filled in the internal space to be maintained in a sealed state. The internal space is sealed by the cover body 930 and the storage container body 940.

[0308] According to an embodiment, the through portion 941 may be made of a styrene-based ABS material, a silicon material, or a mixed material thereof, without being limited thereto.

[0309] The path portion 960 can provide a path for the contact portion 1000 to move after passing through the through portion 941 when the contact portion 1000 is inserted into the implant storage container 900 .

[0310] The cap portion 970 may include an inner cap portion 971 and a handle portion 972 .

[0311] The inner cap portion 971 is made of an elastic material, and can be maintained in a squeezed state between the inner cover 931 and the outer cover 932 in a state of sealing the cover 930 and the storage container body 940 .

[0312] According to an embodiment, the inner cap portion 971 may be made of a styrene-based ABS material, a silicon material, or a mixed material thereof, without being limited thereto.

[0313] After the plasma treatment of the implant body 910 in the implant storage container 900 is completed, if the interior of the implant storage container 900 is ventilated, the inner cover 931 and the outer cover 932 are subjected to an upward force in a direction away from each other due to the restoring force of the inner cap 971. As a result, the inner cover 931 and the outer cover 932 can be separated without touching each other.

[0314] After the inner cover 931 and the outer cover 932 are separated, the user can pull the handle 972 to separate the inner cover 931 containing the implant body 910 to be plasma-treated from the storage container body 940 .

[0315] According to the embodiment, the implant body 910 is connected to the guide portion 980 or the inner cap portion 971 , and when the user separates the inner cover body 931 and the storage container body 940 by pulling the handle portion 972 , the implant body 910 can be located on the inner cover body 931 side.

[0316] The inner cover 931 and the outer cover 932 are separated in the final use step, and therefore, the inner cover 931 is blocked from contact except for the person who finally contacts the implant body 910, thereby minimizing external infection.

[0317] According to an embodiment, the cap part 970 is connected with the guide part 980 , and the guide part 980 may fix the implant body 910 by contacting the upper portion of the implant body 910 .

[0318] The outer surface of the storage container body 940 may include a display unit 990 for displaying information related to the internal gas environment.

[0319] According to an embodiment, the display portion 990 may also be disposed on the cover body 930 , for example, may also be disposed on the outer surface of the outer cover body 932 .

[0320] According to an embodiment, the display unit 990 may display at least one of the type of discharge gas filled in the implant storage container 900, the composition ratio of the discharge gas, the internal pressure of the discharge gas, and the usable period.

[0321] Fig.16 To enlarge Fig.15 Magnified view of area B.

[0322] Reference Figures 13 to 16 According to an embodiment, an inner angle b1 of the insertion groove formed by the protrusion 922 - 1 may be greater than an inner angle b2 of the front end of the contact portion 1000 .

[0323] In this case, after the contact part 1000 is inserted into the insertion groove formed by the convex part 922 - 1 to a predetermined depth, it is locked to the convex part 922 - 1 and contacts the convex part 922 - 1 .

[0324] According to an embodiment, the size of the inner angle b1 of the insertion groove formed by the convex portion 922-1 can be set as follows: when the contact part 1000 is inserted and the front end of the contact part 1000 is not in contact with the first fixing member 921, the side of the contact part 1000 is in contact with the convex portion 922-1. That is, the convex portion 922-1 can be implemented in the following manner: the front end of the contact part 1000 is prevented from contacting with other parts and being damaged, and the side of the contact part 1000 can be stably contacted.

[0325] According to an embodiment, the inner angle b1 of the insertion groove may also have the same value as the inner angle b2 of the front end.

[0326] The convex portion 922-1 is in line contact or surface contact with the side of the contact portion 1000, so that even if there is an error in the insertion degree of the contact portion 1000, a voltage can be applied through stable contact. That is, in the contact portion 1000, the side of the contact portion 1000 is in line contact or surface contact with the convex portion 922-1, so that a voltage can be applied to the implant body 910 through the fixing portion 920.

[0327] Fig.17 FIG. 4 is a schematic diagram of a plasma processing system according to an embodiment of the present invention. Fig.18 To show Fig.17 A diagram showing a state in which a contact part in a plasma treatment system is inserted into an implant storage container.

[0328] Reference Fig.17 and Fig.18 The plasma processing system 1100 of one embodiment of the present invention may include an implant storage container 1210, a receiving portion 1220, a ground electrode portion 1221, a dielectric portion 1222, a contact portion 1230, a driving portion 1240, an insulating portion 1242, a power supply portion 1250, a current measuring portion 1252 and a power supply control portion 1254.

[0329] According to an embodiment, the housing portion 1220 , the ground electrode portion 1221 , the dielectric portion 1222 , the contact portion 1230 , the driving portion 1240 , the insulating portion 1242 , the power supply portion 1250 , the current measuring portion 1252 and the power control portion 1254 may be implemented in the form of a plasma processing device independent of the implant storage container 1210 .

[0330] For ease of explanation, Fig.17 and Fig.18 The implant storage container 1210 shown in FIG. 1 only shows the implant body 1211 and the fixing portion 1212 contained in the cover body, but the implant storage container 1210 may be Figures 13 to 15 An implant storage container 900 according to an embodiment of the present invention is shown in FIG.

[0331] The receiving portion 1220 of the plasma treatment device provides a space for receiving the implant storage container 1210 .

[0332] The housing portion 1220 may include a ground electrode portion 1221 and a dielectric portion 1222 disposed adjacent to the outer peripheral surface of the implant storage container 1210 .

[0333] The ground electrode unit 1221 is connected to a ground terminal of the power supply unit 1250 to function as a ground electrode.

[0334] The dielectric portion 1222 is made of a dielectric and may be included in the receiving portion 1220 in order to improve the effect of plasma barrier discharge. However, according to an embodiment, the dielectric portion 1222 may not be included.

[0335] According to an embodiment, the medium portion 1222 may be disposed closer to the implant storage container 1210 than the ground electrode portion 1221 .

[0336] The contact part 1230 can be inserted into the implant storage container 1210 so that the side of the contact part 1230 contacts the fixing part 1212. Thus, the contact part 1230 can apply the voltage received from the power supply part 1250 to the implant body 1211 through the fixing part 1212.

[0337] The driving portion 1240 may control the movement of the contact portion 1230 , for example, may control the movement of the contact portion 1230 in the up and down directions.

[0338] According to an embodiment, the driving part 1240 may make the contact part 1230 move a predetermined distance through a designated path using sensing information collected through the upper limit sensor and the lower limit sensor.

[0339] According to an embodiment, the driving part 1240 may include a motor for moving the contact part 1230 .

[0340] According to another embodiment, the driving part 1240 may be replaced by an unpowered elastic material. In this case, the position of the contact part 1230 is fixed by the elastic material, and when the implant storage container 1210 is inserted into the receiving part 1220, the contact part 1230 can be inserted into the implant storage container 1210 by utilizing the restoring force of the elastic material. For example, the driving part 1240 may include a spring having a predetermined elasticity.

[0341] The insulating portion 1242 may maintain an insulating state between the contact portion 1230 and other components (eg, the driving portion 1240 ) implemented by a conductive material.

[0342] The power supply part 1250 may apply power for generating plasma to the implant body 1211 through the contact part 1230 .

[0343] The current measuring part 1252 is used to monitor the current provided by the power supply part 1250 and can transmit information related to the monitored current to the power supply control part 1254 .

[0344] The power control part 1254 may control the power supplied using the information on the monitored current transmitted from the current measurement part 1252 .

[0345] The present invention has been described in detail above through preferred embodiments. The present invention is not limited to the above embodiments, and a person skilled in the art can make various modifications and changes within the technical concept and scope of the present invention.

Claims

1. An implant storage container, characterized in that: include: Implant body; A support block connected to the implant body and comprising an electrical terminal on an outer surface and an electrical connection portion connected to the electrical terminal; A cover body, comprising an inner cover body for accommodating the implant body, provided with a support unit for supporting the implant body, and provided with a dielectric area for dielectric barrier discharge, and an outer cover body for accommodating the inner cover body, connected to the support block, and provided with a grounding area for dielectric barrier discharge; and a sealing member, which maintains a vacuum state inside the outer cover body by sealing the boundary between the support block and the outer cover body, The electrical connection portion receives external electricity and applies voltage to the implant body, so that the implant body can operate as an electrode. The support block includes a hole for exhausting the internal air of the outer cover body. The hole is covered by the sealing member, The sealing component includes an elastic O-ring or a sealing gasket, and after the hole is penetrated by a sharp object with a small diameter to temporarily form a gas flow path, the gas flow path can be closed and restored.

2. The implant storage container according to claim 1, characterized in that: The inner cover is provided with a path for allowing internal air to flow from the inner cover toward the outer cover.

3. The implant storage container according to claim 1, characterized in that: When the outer cover is separated from the support block, the inner cover is separated from the support block together with the outer cover.

4. The implant storage container according to claim 1, characterized in that: The cover body is provided with a valve port, which is used to exhaust the internal air of the cover body.

5. The implant storage container according to claim 1, characterized in that: The medium region is capable of transmitting ultraviolet light.

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