Gas supply control device

Abstract

A gas supply control device supplies gas to a processing chamber for processing a workpiece. The gas supply control device includes: a first port connected to a gas source of purge gas; a second port connected to a gas source of processing gas; a collective pipe that allows the purge gas and the processing gas supplied from the first port and the second port, respectively, to flow in a confluent manner; a first flow controller provided between the first port and the collective pipe; and a second flow controller provided between the second port and the collective pipe. A gas flow path through which the purge gas flows is formed from the output side of the first flow controller to the input side of the second flow controller.

Description

Technical Field

[0001] The present invention relates to a gas supply control device. In particular, the present invention relates to a gas supply control device that is connected to a surface treatment device that uses a process gas such as etching, CVD (chemical vapor deposition), ashing, and surface modification to process a workpiece, and is used to control the flow and flow path of the gas to the surface treatment device. Background Art

[0002] For example, in the production of electrical components such as semiconductor elements, liquid crystal elements, solar cells, MEMS and their measuring devices, and precision mechanical components, surface treatment devices use high-purity process gases with various gas characteristics to process the surfaces of workpieces such as wafers. Such surface treatment devices are important industrial machines indispensable in today's world. Surface treatment devices can also be renamed semiconductor manufacturing devices, substrate processing devices, plasma processing devices, or vacuum processing devices.

[0003] In these surface treatment devices, the supply of the process gas is controlled according to the process information of each step of the set treatment recipe. A mass flow rate controller (hereinafter referred to as MFC) using a thermal sensor method, a pressure flow rate controller (hereinafter referred to as PFC), etc. are used to control the gas flow rate. The supply and stop of the process gas are controlled by controlling the opening and closing of the gas valves arranged before and after the flow controller. A single process gas, or a mixed gas that controls the mixing ratio of a single process gas and other process gases by gas flow rate, is introduced into a processing chamber or reactor (hereinafter referred to as a chamber) containing the workpiece. The single process gas or mixed gas introduced into the chamber may sometimes be further mixed with other process gases in the chamber.

[0004] The gas introduced into the chamber is supplied to the surface treatment device from the customer's building-side supply equipment via a convergence point. On the surface treatment device side, usually, a variety of gases are introduced into a gas integration valve and a mixed gas is supplied via a flow control device (also called a flow controller). In the case of gases that cannot be mixed in the pipe, for example, a combustion-supporting gas and a combustible gas are separately collected in independent integration valves. The outlet of the collective pipe of each integration valve (after the mixed gas is formed) and the chamber are supplied using independent pipes. Each independently supplied mixed gas is first mixed in the chamber.

[0005] Even if the gas introduced into the chamber, for example, reacts and causes an explosion, the pressure that can ensure the safety of the chamber by maintaining and monitoring the vacuum state will be maintained, so that the pressure in the chamber after the reaction will not exceed the atmospheric pressure. In other words, the chamber will not be damaged, and thus the operation of the surface treatment device is managed.

[0006] These integrated valves are housed in a gas box or a box that can exhaust the housing, which is called an MFC unit. Considering that even in the event of a gas leak, the operator will not be attracted.

[0007] Generally, in the integrated valve connected to the surface treatment device, between the position of the gas supply port (port) upstream of the supply process gas and the gas input side of the flow controller, a gasket filter (for equipment protection against foreign matters via piping), a manual valve (used for blocking (isolating) when the gas supply stops), a supply air pressure detector (sometimes not provided), and a supply source valve (pneumatic valve) are connected towards the downstream (chamber supply side). The gas output side of the flow controller is connected to the collective pipe via a downstream valve (pneumatic valve). The gas whose flow has been controlled from each gas supply system becomes the gas mixed in the collective pipe, and the mixed gas is supplied from the gas box to the chamber via the collective pipe.

[0008] In the pulse supply of gas (a technique for cyclically switching gases), the gas flowing out from the flow controller is divided into two collective pipes. One collective pipe is connected to the chamber for performing the process treatment, and the other collective pipe is connected to the exhaust system. Sometimes, the gas from the other collective pipe is directly discarded (which does not contribute to the treatment of the workpiece).

[0009] Prior Art Documents

[0010] Patent Documents

[0011] Patent Document 1: International Publication No. WO2013 / 046660

[0012] Patent Document 2: International Application No. PCT / JP2021 / 004546

[0013] Patent Document 3: International Publication No. WO2008 / 069227

[0014] Patent Document 4: Japanese Unexamined Patent Application Publication No. JP2004-264881

[0015] Patent Document 5: International Publication No. WO2016 / 121075 Summary of the Invention

[0016] -Technical Problem to be Solved by the Invention-

[0017] In Patent Document 1, it is described that: aiming at further miniaturization of a gas supply pipeline and a gas device and enabling easier maintenance management of each device type, a combined arrangement in which they are arranged in parallel and stacked is adopted, thereby compactly constructing an integrated valve. However, it does not become a structure for dealing with gases that cannot flow simultaneously or for the pulsed gas supply where gases need to be discarded in the exhaust. Further, in this integrated gas supply device, a plurality of gas supply pipelines S are arranged in parallel such that process gas flows sequentially in the order of an inlet opening / closing valve 1, a three-way switching opening / closing valve 2, a flow controller 3, and an outlet opening / closing valve 5, and purge gas flows through the three-way switching opening / closing valve 2. When the inlet-side opening / closing valve 1 is closed to perform gas purging, there is a dead corner at a position upstream of the purge gas. If the gas liquefies at this dead corner, efficient purging cannot be achieved.

[0018] Furthermore, in Patent Document 2, the structure of a supply pipeline for process gas (processing gas) is schematically shown. In this structure, it is characterized in that a collecting pipe for collecting the gas supplied to the chamber and a collecting pipe for collecting the gas directly discarded into the exhaust system without bringing the gas into contact with the workpiece are independently provided. The process gas flows from the anti-diaphragm side to the diaphragm side, and the purge gas (purge gas) flows in the opposite direction from the diaphragm side to the anti-diaphragm side. Also, the following structure is shown: when the supply of the process gas to the chamber is stopped, the purge gas from the upstream side rapidly expels the process gas without dead volume, thereby suppressing the dilution of the gas, which is advantageous for gas pulses (switching of cyclic gases). It is also shown that for gases that cannot flow together in the same gas pipeline, gases are supplied to each supply block bundled according to gases that can flow together without problems.

[0019] However, in the gas supply with the above-described structure, when foreign matter flows into the gas supply system for some reason, or a specific gas pipeline is mixed with other gases due to misoperation by the construction side, or the device is stopped for a certain period due to equipment addition, etc., and also when liquefaction occurs in the pipeline as described above, it is necessary to perform gas purging before and after the gas flow controller using a gas with low reactivity such as argon (hereinafter referred to as Ar) gas and nitrogen (hereinafter referred to as N2) gas. After completely and reliably discharging this gas, recovery is performed by purging using Ar gas and N2 gas, or component replacement is required after atmospheric opening according to the situation. In addition, a function for checking the controllability (flow calibration) of the flow controller for this process gas is required. However, in Patent Document 2, such purging cannot be performed, and the check of controllability (flow calibration) is not touched upon.

[0020] In addition, when it comes to flow rate calibration, there is the following example in Patent Document 3. On the flow path through which the fluid to be flow-controlled flows, a flow control device to be tested and a reference flow control device are sequentially arranged in series from the upstream. The flow control device to be tested is set to a flow rate non-control state in which its valve is almost fully open, and the fluid flow rate is controlled to a given flow rate by using the reference flow control device. In this state, it is determined whether the measured flow rate based on the flow control device to be tested is within the given range based on the measured flow rate of the reference flow control device. The purpose of the flow control device is to measure or predict the flow rate in order to accurately control the flow rate. However, in this calibration method, although it is possible to judge whether the measurement of the flow rate is accurate, there is a problem that it is impossible to determine whether the drive part such as the valve that can accurately control the flow rate is operating normally.

[0021] In particular, regarding the difficulty of flow rate control using hydrogen fluoride (hereinafter referred to as HF) gas, it can be learned from Patent Document 4. Since HF has the property that the higher the pressure and the lower the temperature, the more the gas molecules are connected based on the electrode polarity they possess to form clusters, and the properties of the gas become different, it becomes a problem to measure the flow rate after the gas is made monomolecular and its characteristics are stabilized. In the flow rate monitoring system of Patent Document 3, since the measurement is carried out after increasing the pressure, there is a problem that the measurement becomes inaccurate in the case where clusters are easily formed, especially when the flow rate is relatively large.

[0022] Furthermore, in Patent Document 5, the following method is described: a normally closed pneumatic valve is used for the control of the process gas in the same way as in Patent Document 2, and a three-way shut-off solenoid valve is used for the control of gas valves that cannot be opened simultaneously, so that the individual gas valves will not be opened simultaneously. However, the usage method or other applications in the case of integrated valve implementation are not clear. In safety standards such as SEMI (Semiconductor Equipment and Materials International), for example, it is required that a single error does not lead to a major failure or disaster. In existing integrated valves, for process gases with unconnected piping or in a system of process gases not used in the device, it is considered to block them with a manual valve provided at the part where the process gas enters the integrated valve, so that even if the gas valve is inadvertently opened, the impact will be minimized. Moreover, in some valve manufacturers, there are sometimes valves that can be manually controlled to open and close pneumatically (manual valve priority). However, in the case where there are problems such as internal leakage (internal leakage where the gas cannot be separated) in the manual valve itself, there is a possibility that a single error in the manual valve may cause a major accident such as gas leakage during the maintenance of the chamber or gas leakage during the replacement of components, and such a situation is also expected to be improved.

[0023] One of the problems of the present invention is to provide a gas supply control device capable of performing gas purging before and after a flow controller for a processing gas.

[0024] Other problems and new features will become clear from the description of this specification and the accompanying drawings.

[0025] -Means for Solving Technical Problems-

[0026] If a representative outline of the present invention is simply described, it is as follows.

[0027] A gas supply control device according to an embodiment is a gas supply control device that supplies gas to a processing chamber for processing a workpiece, and includes: a first port connected to a gas source of a purging gas; a second port connected to a gas source of a processing gas; a collective pipe that allows the purging gas and the processing gas supplied from the first port and the second port to flow in a merged manner; a first flow controller provided between the first port and the collective pipe; and a second flow controller provided between the second port and the collective pipe. The gas flow path through which the purging gas flows is formed from the output side of the first flow controller to the input side of the second flow controller.

[0028] -Advantages of the Invention-

[0029] According to the gas supply control device according to an embodiment, gas purging before and after the second flow controller can be performed. Description of the Drawings

[0030] Figure 1 It is a diagram showing a structural example of a surface treatment device and a gas supply control device according to an embodiment of the present invention.

[0031] Figure 2 It is a diagram showing Figure 1 an external view of a gas integration valve of the gas supply control device.

[0032] Figure 3A It is a cross-sectional view of a process gas pipeline in the present invention.

[0033] Figure 3B It is a cross-sectional view of a purging pipeline observed from Figure 3A the reference numeral O (O) in the drawings.

[0034] Figure 4A It is a cross-sectional view of a process gas pipeline in other embodiments.

[0035] Figure 4B It is an external view of an integration valve in other embodiments.

[0036] Figure 5A It is a cross-sectional view of a process gas pipeline in yet another embodiment.

[0037] Figure 5B It is from Figure 5A A cross-sectional view of the purge pipeline observed from the reference numeral O (cái yī) of the drawing.

[0038] Figure 6 It is a cross-sectional view of a process gas pipeline and a cross-sectional view of a purge pipeline in yet another embodiment.

[0039] Figure 7 It is a structural diagram of the air control of the gas valve of the present invention. Detailed Embodiments

[0040] Hereinafter, examples and embodiments will be described with reference to the drawings. In the following description, sometimes the same reference numerals are given to the same structural elements and repeated descriptions are omitted. In addition, for the sake of clarity of the description, the drawings are sometimes shown schematically as compared with the actual embodiments, and are merely examples and do not limit the interpretation of the present invention.

[0041] In order to overcome the problems of the prior art, the following structure is adopted in the present embodiment.

[0042] First, regarding the setting of gas purge for the process gas pipeline, a gas path (gas flow path, purge gas pipeline) is set as follows: The gas coming out from the downstream side (outlet side) of the flow controller of the gas flow system of the purge gas at the uppermost upstream position of the collective pipeline is bypassed and introduced from the uppermost upstream side of each process gas pipeline. In other words, a gas path for introducing purge gas is connected to the upstream side (input side) of the flow controller of the gas flow system of the process gas, and the purge gas can be introduced from the uppermost upstream side of the process gas pipeline. In order to purge and expel the process gas in the process gas pipeline without residue and effectively, it is necessary to perform the purge from the upstream side. However, the process gas in the process gas pipeline needs to be guided to a gas valve deeper on the downstream side than the purge gas pipeline, and this can be solved by using a three-dimensional intersection considering the structure of the valve and the base member.

[0043] In addition, regarding the flow calibration process of the flow rate of process gases such as HF, the standard gas that has been used all along (Ar gas or N2 gas used for purge gas) is used for purging, and its flow controller is fully opened and used as a flow monitor. The flow controller of this process gas located downstream is operated, and by using the flow monitor of the continuously flowing standard gas, it is determined whether the flow controller of this process gas implements accurate control, and thus calibration is performed. In other words, by comparing the flow measurement value of the flow controller of the purge gas with the flow control value of the flow controller of the process gas, the flow controller of the process gas is calibrated. Thereby, the accuracy of both the flow monitor and the flow control can be confirmed.

[0044] However, in a polyatomic gas composed of multiple molecules such as a cluster of HF gas, sometimes a viscosity difference that is significantly different from that in the case of heating the standard gas and cannot be ignored will be exhibited. Furthermore, in the case of an MFC, since the degrees of freedom of molecules are different in polyatomic gas and monomer gas, a difference in heat conductivity is generated, which further controls the flow rate variation. However, by setting it to a high temperature and lowering the control pressure, as long as the supply of HF gas monomer is basic, the flow controller can be controlled to keep the gas in a monomer state at a temperature and pressure. Therefore, since both the standard gas and this process gas are gas monomers, the temperature difference is eliminated, and thus calibration using only the gas conversion coefficient at this temperature that has been previously confirmed can be achieved.

[0045] In addition, regarding the problem that a single error in a manual valve could potentially lead to a major accident in the past, the manual valve itself is removed. Instead, in order to effectively utilize manual operation, a manual air switching valve (mechanical valve) that blocks the air supply to the pneumatic valve for supplying process gas to the integrated valve is installed on the outer wall of the gas box, and it can block the air supply to the pneumatic valve for taking in to the integrated valve. A sensor that is of the blocking correspondence type and can detect the situation where closing is performed manually is provided. When this Close signal is detected, control is performed so that the control solenoid valves of the pneumatic valve on the downstream side of the outlet of the MFC connected to the gas pipe and the pneumatic valve for purging are electrically closed (Close), and air is not supplied to these two pneumatic valves and they are closed. Therefore, a double shut-off is achieved, that is, the pneumatic valve for supplying process gas and the pneumatic valve on the downstream side of the outlet of the MFC are both closed so that there is no leakage to the downstream side, and the pneumatic valve for supplying process gas and the pneumatic valve for purging are both closed so that there is no leakage to the purge gas pipeline side. Even if one pneumatic valve fails (internal leakage), it can be closed by the other pneumatic valve, so major accidents or failures can be avoided.

[0046] Of course, when it is necessary to replace the gas valve itself controlled by the mechanical valve due to a malfunction, it goes without saying that the manual valve on the customer side of the gas supply line on the customer side is closed independently of the mechanical valve operated on the outer wall of the gas tank. Furthermore, if necessary, the supply from the gas source is also disconnected to perform the replacement operation. This is the same as the case of replacing the manual valve provided in the gas line in the existing structure, and thus there is no change compared to the existing replacement operation.

[0047] According to the present invention, one or more of the following effects can be obtained.

[0048] 1) By making flexible use of the pipeline for the purge gas of the collective pipeline, the equipment is not increased, and the purge gas can be supplied more compactly to the upstream of each process gas.

[0049] 2) Since the purge gas of each process gas is supplied from the uppermost upstream of each process gas supply pipeline, it becomes possible to purge the process gas without dead volume. This enables the purge treatment of the gas that is easily liquefied at the dead volume, and also shortens the time required for gas purging.

[0050] 3) It is possible to perform a flow measurement for calibrating the flow controller for the process gas by using the purge gas as a reference gas under temperature and pressure conditions close to the actual use conditions.

[0051] 4) By eliminating the manual gas valve provided on the process gas pipeline, the overall length of the integrated valve can be shortened to make it more compact, and it becomes possible to perform the operation of shutting off the gas supply that complies with the safety guidelines of the SEMI requirements standard.

[0052] Hereinafter, Figures 1 to 7 will be used to describe the embodiments of the present invention.

[0053] [Embodiment]

[0054] The structure of the gas supply control device for controlling the flow and flow path of the gas in this embodiment will be described. Figure 1FIG. is a structural example diagram showing a surface treatment apparatus and a gas supply control apparatus according to an embodiment. A process treatment apparatus (not shown in its entirety) that is connected to the gas supply control apparatus and serves as a surface treatment apparatus includes a chamber (reactor, processing chamber, etc.) 3 that houses a stage 2 on which a workpiece 1 is mounted and is isolated from the atmosphere. A gas dispersion chamber (sub-chamber) 4 is provided above the stage 2 in the chamber 3. Inside the gas dispersion chamber 4, a top plate 5, spacers 6a, 6b, 6c, gas dispersion plates 7a, 7b, and a shower plate 8 are provided. Diagonally above the chamber 3, a halogen lamp 10 serving as a source of infrared light is provided surrounding the atmosphere side, and the generated infrared light can be irradiated into the chamber 3 containing the workpiece 1 through a transmissive window 11. A gate valve 15 for loading and unloading the workpiece 1 is installed on the side wall of the chamber 3. The gate valve 15 itself is also housed in a vacuum chamber of another transfer chamber (not shown), and the system is configured such that the chamber 3 does not become atmospheric each time the workpiece 1 is loaded and unloaded during normal process treatment, and is not affected by residual atmospheric components.

[0055] It is designed such that the gas inside the chamber 3 gathers at the exhaust pipe 20 on the back side of the stage 2 from a plurality of exhaust ports 20a, 20b, etc. in the chamber 3, and exhaust is evenly performed around the workpiece 1. The gas gathered in the exhaust pipe 20 reaches the main valve 22 after adjusting its exhaust speed through a pressure regulating valve 21. The main valve 22 is opened during process treatment, during the transfer of the workpiece 1, or in an idle state waiting for the input of the workpiece 1 to form an exhaust passage. It is closed when the chamber 3 is opened to the atmosphere for cleaning, partial replacement, or maintenance inside the chamber 3. A dry pump 25 is connected downstream of the main valve 22 to exhaust the gas. The exhaust gas of the dry pump 25 is further made harmless by an exhaust gas treatment device or the like (not shown) and released into the atmosphere. The pressure inside the chamber 3 and the exhaust pipe 27 connecting the main valve 22 and the dry pump 25 is monitored by pressure gauges 28 and 29 respectively. In this figure, although a device that performs process treatment by exhausting through the dry pump 25 is shown, even when other exhaust units, turbo molecular pumps are used, or when multiple pumps are arranged in parallel, there is no change for the gas supply unit of the present invention.

[0056] To be used with Figure 1The portion 30 enclosed by the dashed line on the right side is set as the air tank of the gas supply control device. In the air tank 30, there are the following functions and components: a plurality of solenoid valves for controlling the opening and closing of pneumatic valves (not shown), a detection function when gas leaks, an external air intake port, a function of exhausting the housing through a pipe when gas leaks, a function of constantly monitoring the negative pressure (when being exhausted) in the internal space of the air tank 30, and components for this. Also, a limit switch can be set on the cover (not shown) that can be opened during the maintenance of the air tank 30 to monitor the situation of entering the inside of the air tank 30, that is, the cover being opened, so as to implement the control of cutting off the gas flow path. In Figure 1 In the internal structure of the air tank 30, only the key components in direct contact with the process gas are described. ◎ represents a gas source supplied from a building or the like outside this process device, and the gas ports are named A to D from the upper side of the figure.

[0057] In this embodiment, since the gases are composed of gases that can flow simultaneously without problems, the air tank 30 is formed by one integrated valve. In the case where there are gas species that cannot flow together, another integrated valve is also prepared to form the same structure as Figure 1 and the collective pipes leading to the chamber or the exhaust system need to be set independently separately. The gases that cannot flow together are first mixed at the positions of the chamber 3, the gas dispersion chamber 4, and the exhaust pipe 27. For example, in the case of the above-mentioned integrated valve for combustible gas and the integrated valve for combustion-supporting gas that supply gas to the process treatment device, considering the chemical reaction of each gas, the pressure gauges 28 and 29 are used for monitoring so that the pressure of these gases does not exceed the atmospheric pressure when they are completely burned (reacted). When the monitored pressure is exceeded, all the gas valves are closed to achieve safety.

[0058] If the gas names of each of the A - D ports are described specifically, then A: Ar gas, B: Ar gas, C: HF gas, D: oxygen (hereinafter recorded as O2) gas. In this embodiment, these four systems of gases are set, but as long as the gases can flow simultaneously, more gas supply systems can be further juxtaposed and added. In this figure, the A pipeline is the Ar gas for purging, and the B pipeline is the Ar gas for diluting the HF gas in the C pipeline.

[0059] The gas valve used in the air tank 30 is a normally closed (spring return) type air-driven diaphragm valve, but it is set as a bellows valve with the drive shaft sealed by a bellows and a valve body provided at the front end, and it makes no change to the content of the present invention.

[0060] The process gas introduced from the gas source ◎ on the right side of the figure is guided to the integrated valve through the gas valve represented by G3* (additionally, the names A to D of each gas system are inserted at *). A small pressure gauge represented by PG* is provided between it and the flow controller (marked with FC*). This pressure gauge PG* is used for monitoring the gas supply pressure or determining the end of vacuum exhaust. Each process gas whose flow rate has been controlled by the flow controller FC* is guided to the gas valve G2* shown on the downstream side. Then, each process gas can flow out through the gas valve G1C* of the pipeline leading to the chamber 3 or the gas valve G1E* of the pipeline for discarding the gas to the exhaust system.

[0061] (Structural example of gas purge of process gas pipeline)

[0062] Figure 1 The gas valve G2A of the A pipeline of the gas box 30 is closed during the process treatment, but the inlet and outlet on the diaphragm side (represented by the white triangle Δ) are always unblocked, and regardless of the opening and closing of the gas valve G2A, it is connected to the diaphragm side of the downstream gas valves G1EA and G1CA. The gas pipe (gas flow path, purge gas pipeline) 100 on the anti-diaphragm side (represented by the black triangle ▲) where the purge gas flows out when the gas valve G2A is opened is guided to the uppermost upstream side (the right side of the figure) of the A to D pipelines, and is guided to the uppermost upstream of each pipeline on the diaphragm side of the gas valve GP*. The idle port 33 corresponding to the position of the gas valve GPA of the A pipeline is not equipped with a valve, but for the idle port 34 corresponding to the position of the gas valve GPB of the B pipeline, in order to be able to adopt the same structure as the other C and D pipelines, the gas valve is shown in gray. At the positions of this idle port 33 and idle port 34, as described later, the sealing bolt structure replaced with a gas valve for passing the purge gas is actually improved. The gas pipe at the outlet on the diaphragm side of the valve GPD is connected to the collective pipe of the exhaust system line through the discard gas valve G1EP of the purge gas pipeline 100 leading to the exhaust system, and is connected to the collective pipe 101 for supplying to the chamber 3 through the discard gas valve G1CP of the purge gas pipeline 100 leading to the chamber 3. In order to evacuate the purge gas pipeline 100 and discharge the residual gas, by having these gas valves G1EP and G1CP, the exhaust of the purge pipeline 100 becomes possible.

[0063] In other words, the gas supply control device 30 includes: an A port (first port) connected to a gas source of purge gas; a C port (second port) connected to a gas source of process gas; a manifold pipe 101 connected to the processing chamber 3 through which the purge gas and the process gas supplied from the A port and the C port flow together; a flow controller (first flow controller) FCA connected between the A port and the manifold pipe 101; and a flow controller (second flow controller) FCC connected between the C port and the manifold pipe 101. Further, a gas flow path 100 through which the purge gas flows is formed from the output side of the flow controller FCA to the input side of the flow controller FCC. In Figure 1 the gas flow path 100 is provided between a gas valve G2A connected to the output side of the flow controller FCA and a gas valve GPC connected to the input side of the flow controller FCC and between a gas valve GPD connected to the input side of the flow controller FCD.

[0064] (Steps for calibrating the flow controller)

[0065] Next, the steps for calibrating each flow controller in the integrated valve will be described. As an example, the flow calibration of the process gas in the C pipeline will be described. All gas supply valves are closed, the main valve 22 is opened, the chamber 3 is evacuated, and heaters (not shown) control the temperature of each part (manage the temperature) so that it becomes the same temperature as in the actual process treatment. When warming up from a stable state (simply evacuating the chamber 3 by vacuum, the process treatment can start at any time) through the operation of the discharge part (not attached in this embodiment) or infrared irradiation based on the halogen lamp 10, it is preferable to wait until the temperature becomes close to the stable state (within ±10 °C) according to the previously obtained cooling temperature data and then start. Calibration is started from this state.

[0066] First, close the main valve 22 and the gas valve G3C to block the supply of the actual process gas. Open the gas valves G1E, G1EC, and G2C, set a fixed and adjusted flow rate in the flow controller (second flow controller) FCC, make the pressure shown by the pressure gauge PGC zero (vacuum), and confirm that the actual process gas (HF gas) in the C pipeline remaining in the pipes, valves, and flow controller has been discharged by the exhaust system. Once confirmed, keep the gas valve G1E open and temporarily close all of the opened gas valves G1EC and G2C.

[0067] Next, open the gas valve G1EP, open the gas valves G2A and G3A, set the flow rate at the flow controller (first flow controller) FCA, and confirm that the purge gas (Ar gas) in pipeline A flows smoothly into the purge gas pipeline 100. Once the confirmation is completed, close the gas valves G1E and G1EP. Next, open the main valve 22 and evacuate the chamber 3, and open the gas valves G1C, G1CC, G2C, and GPC so that the purge gas (Ar gas) in pipeline A can be supplied to the flow controller FCC via the purge gas pipeline 100.

[0068] Then calibration is performed. Set the control flow rate of the flow controller FCA to the maximum and use it as a gas flow monitor. Continuously vary the gas flow rate at the flow controller FCC from the minimum gas flow rate to the maximum gas flow rate in multiple points or continuously in a simulated manner, and at the same time monitor the flow rate of the purge gas (Ar) actually flowing through pipeline A using the flow controller FCA.

[0069] Through this test, the flow controller FCC can continuously and normally perform flow control. Also, by using the gas conversion coefficient of the purge gas in pipeline A and the process gas in pipeline C (which has been obtained in advance at the temperature controlled by the flow controller FCC), the occurrence of time-dependent failures and changes in gas sensitivity can be detected, and the flow rate can be corrected to an accurate value, thereby performing calibration.

[0070] As in this example, in the case of an integrated valve that requires a dilution gas, a valve is also provided at the position of the idle port 34 in the B pipeline of the dilution gas, and the purge gas (Ar gas or N2 gas) used as the standard gas is introduced. In this case, it can also be used for the following means: continuously introduce the standard gas into the flow controller FCA and the flow controller FCB to confirm whether the flow controllers FCA and FCB accurately control each other.

[0071] After the flow rate measurement, first close the gas valve GPC, confirm with the pressure gauge PGC that the purge gas in pipeline A in the pipe has been discharged, close the gas valves G2C, G1CC, and G1C, and restore the valve condition to the stable state. The gas valve G3C in pipeline C can also be opened later to pre-fill the space before and after the flow controller FCC with the process gas. Furthermore, the gas valve G1C at the final stage for supplying gas to the chamber 3 is closed in the stable state, but it can also be controlled to be opened in the stable state during the operation of the process treatment device.

[0072] Basically, while considering the gas conversion coefficient, it flows at the maximum flow rate of the flow controller FCC. Even at this time, the flow controller FCA can be used to monitor a flow rate larger than this flow rate. If it is not necessary to cover all the gas flow control regions of the flow controller FCC (when the flow controller FCC can also form an unmeasurable flow region), it is not limited to this.

[0073] Figure 2 Indicates Figure 1 The external view after the integration valve of the gas tank 30 shown. In Figure 2 The air piping for the gas valves used to drive each pneumatic valve, and the wires for the power or electrical signals required by the flow controller are not shown and are omitted. Above the base 35 of the equipment for each integrated valve installed in accordance with the standard of the integrated valve, each equipment is installed. In addition, in order to facilitate the discrimination of each equipment, appliance numbers are directly assigned to some of the equipment. On the base of this integrated valve, there are also arranged: a pressure gauge 38 for monitoring the pressure of the collective pipe ([[]] Figure 1 101) that supplies gas to the chamber 3 side; and a pressure gauge 39 for monitoring the pressure of the collective pipe that supplies discarded gas to the exhaust pipe side. Downstream of the gas valve G3*, PG* is installed at the position indicated by the arrow extending from the small pressure gauge PG*. At the downstream ports of the pressure gauges 38 and 39 where there are no installed equipment, instead of the equipment, plugs 62 and 63 are installed to allow the gas in the collective pipe to pass through. However, whether a specified block that only allows up and down communication is installed, or a through hole is provided on the base 35 side, there is no change in the present invention.

[0074] In Figure 2 A purge gas pipeline 100 for supplying purge gas is provided between the unit above the gas valve G2C and the unit above the idle port 33. Furthermore, similarly, at the idle ports 33 and 34 where there are no installed equipment, at the positions of the gas valves (the positions of GPC and GPD) on the upstream side of the purge gas pipeline 100, plugs 64 and 65 are provided instead of the gas valves in the same way to form a passage for the purge gas to pass through.

[0075] Figure 3A Is a cross-sectional view of the process gas pipeline in the present invention. In Figure 3AIn the figure, a longitudinal cross-section of the upstream side of the unit that takes in the process gas (HF gas) of pipeline C into the integrated valve is shown. The air piping, electrical wiring, the air drive part of the valve, and the internal cross-section below the flow controller FCC are omitted. According to this embodiment, the base member 51 of the lower layer that forms the gas path is installed on the base 35. On the upper part of the base member 51, equipment for controlling the gas is installed. Also, on the right side of this figure, a union 53 is provided, and the union 53 becomes the convergence point with the supply piping on the customer side. Although the union on the customer side is described, the upstream piping is omitted. This convergence point is provided inside the gas box 30, and in the case of a leak from the union 53, people will not be exposed to the exhaust port (not shown) of the housing of the gas box 30, and it can be safely discharged.

[0076] On the upper part of the base member 51, a double four-way valve 61 is provided with two gas valves GPC and G3C arranged from the right side of this figure. The meaning of four-way comes from: the purge gas enters through these two valves into both the inlet and outlet on the diaphragm side of the gas valve GPC, and the process gas inlet supplied to the anti-diaphragm side of the gas valve G3C and the outlet towards the downstream flow controller FCC combine to form four directions.

[0077] Figure 3B Indicates Figure 3A A cross-sectional view of the purge gas pipeline observed from the reference numeral O (O) in the figure. The purge gas pipeline 100 is arranged to penetrate the idle ports 33 and 34 and is connected to the gas valves GPC and GPD. The purge gas that connects the idle port 33 and the idle port 34 via the purge gas pipeline 100 is introduced into the diaphragm side of the gas valve GPC. The gas valve GPC forms an outlet-side passage on the diaphragm side and is communicated with the input side on the diaphragm side of the gas valve GPD. If the valve body of the gas valve GPC rises and the diaphragm of the gas valve GPC opens, it can be communicated with the anti-diaphragm side of the gas valve GPC, and the purge gas can flow towards the diaphragm side of the gas valve G3C. Similarly, if the valve body of the gas valve GPD rises and the diaphragm of the gas valve GPD opens, it can be communicated with the anti-diaphragm side of the gas valve GPD, and the purge gas can flow towards the diaphragm side of the gas valve G3D. Thus, the purge gas can be supplied to the input sides of the flow controllers FCC and FCD, so that gas purging before and after the flow controllers FCC and FCD (the input side and the output side of the flow controller) can be implemented.

[0078] In Figure 3A , Figure 3B In the structural example shown, in order to form the path of the purge gas pipeline 100 as the bypass gas pipeline of the purge gas, the block 55 of the base member 51 that straddles the adjacent gas system lines is used in an embedded form, but for the purpose of forming the path, even if it is other methods or other block shapes, the present invention remains unchanged.

[0079] Use Figure 4A and Figure 4B to illustrate the cross-sectional view and external view of the purge gas pipeline for constructing other embodiments. Figure 4A is a cross-sectional view of the process gas pipeline in other embodiments. Figure 4B is the external view of the integrated valve in other embodiments. The purge gas pipeline 100 is constituted by gas holes 59' that penetrate through a block 51' integrally provided across the upstream portions of the respective gas systems. The gas holes 59' are connected to the gas valves GPC, GPD and the idle ports 33', 34' at the upper part. At the idle ports 33' and 34', they are sealed with sealing plugs 64' and 65' respectively. In the gas valves GPC, GPD, the gas holes 59' pass through the valve base 60b and communicate with the diaphragm sides of the gas valves GPC, GPD. The anti-diaphragm sides of the gas valves G3* pass through the valve base 60a and the block 51' respectively and communicate with the A - D ports. The diaphragm sides of the gas valves G3C, G3D pass through the valve base 60a, the block 51' and the valve base 60b respectively and communicate with the diaphragm sides of the gas valves GPC, GPD.

[0080] By driving and opening the gas valves GPC, GPD, the purge gas supplied to the gas holes 59' can flow to the anti-diaphragm sides of the gas valves GPC, GPD. The purge gas (Ar gas) flowing out to the anti-diaphragm sides of the gas valves GPC, GPD can pass through the block 51' and flow to the diaphragm sides of the downstream gas valves G3C, G3D.

[0081] Compared with Figure 3A and Figure 3B the structural examples of Figure 4A and Figure 4B the structural examples of

[0082] Next, use Figure 5A and Figure 5B to illustrate the cross-sectional view and external view of the purge gas pipeline for constructing yet another embodiment. Figure 5A is a cross-sectional view of the process gas pipeline in yet another embodiment. Figure 5B is from Figure 5ACross-sectional view of the purge line observed by the reference numeral O (talent one). Figure 5A The base 35, the union 53, the double four-way valve 61, and Figure 3A Similarly, repeated descriptions are omitted. The purge gas line 100 is formed by the block 56 provided across each gas system and the upper gas valves GPC, GPC, and the idle ports 33, 34. The base member 52 of each gas system is configured to be narrowed and buried straight into the groove of the block 56 in this cross-section. There is no direct gas sealing structure between the straight block 56 and the base member 52. However, since the sealing with the equipment is performed, the accuracy that is not a problem for temperature changes and impacts in the height direction can be ensured.

[0083] Use Figure 6 to illustrate another embodiment of the present invention. Figure 6 It is a cross-sectional view of the process gas line and a cross-sectional view of the purge line in another embodiment.

[0084] Figure 6 In, instead of Figure 3A the double four-way valve 61, a double three-way valve 67 with seat surfaces perpendicular to each other is used. Thus, a structural example that shortens the piping path and reduces the gas sealing portion can be provided. Furthermore, in this case, the pressure gauge PGC flow controller is provided in the piping between the gas valves GPC and G3D, which are in the same space, and are the upstream-side piping of the FCC. In addition, the base member 58 is integrally provided across each gas system, and the gas hole 59 is provided straight along the gas hole starting from each union 53 as the supply portion. It is the flow path of the purge gas of the purge gas line 100. The gas valve GPC provided above the base member 58 enters only one of the gas hole 59 and the diaphragm side of the purge gas flow path 100, so one direction is reduced and it becomes a double three-way valve 67. MVC represents a mechanical valve.

[0085] (Flow of process gas)

[0086] Returning to Figure 3, the flow of the process gas will be described. The process gas (C port system: HF gas) introduced from the union 53 at the confluence point reaches the anti-diaphragm side of the gas valve G3C after passing through the lower part of the gas valve GPC. If a signal to open the gas valve G3C is received according to the gas supply command and manual operation, the solenoid valve (not shown in Figure 3) is driven, and the supply of the air signal to the gas valve G3C is started. This air will reach the gas valve G3C if the manually described mechanical valve is opened, the valve body of the gas valve G3C is raised, the diaphragm of the gas valve G3C leaves the seat surface of the valve seat, and the process gas flows out to the diaphragm side of the gas valve G3D.

[0087] If a signal to close the gas valve G3C is received in response to a process end command or manual operation, the solenoid valve (not shown in FIG. 3 ) is closed, the supply of air signal to the gas valve G3C is stopped, and the gas is exhausted to the atmosphere. The driving air of the gas valve G3C is removed, the valve body of the gas valve G3C descends, and the diaphragm of the gas valve G3C is pressed against the seat surface of the valve seat, stopping the outflow of process gas to the diaphragm side of the gas valve G3C.

[0088] (Gas Purge Method)

[0089] When all process treatments are interrupted, for example, when the calibration of the gas control flow rate mentioned above, the purge treatment of the gas pipeline, or maintenance after opening to the atmosphere is required, it is necessary to discharge the process gas remaining in the valve. At this time, first keep the two valves of gas valve G3D and GPC closed, and open the gas valve equivalent to the exhaust path from the downstream side to discharge the residual gas. It goes without saying that the flow controller FCC should be set with an appropriate control flow rate at this time. Once the pressure gauge PGC confirms that a vacuum has been achieved, the purge gas (Ar gas, etc.) is allowed to flow from the gas flow controller FCA through the gas valve G2A to the purge gas pipeline 100. If the gas valve GPC is opened, gas purge can be performed from the upstream of the process gas C system, the dead volume is also minimized, and the process gas can be discharged smoothly. Once the fixed time of purge is completed, all the opened gas valves are closed and ended, thereby expelling the residual process gas.

[0090] (Configuration example of gas valve control)

[0091] Next, use Figure 7 A configuration example of air control of a gas valve will be described. Figure 7 It is a structural diagram of the air control of the gas valve of the present invention. Figure 7 The schematic diagram in the figure shows an example of the structure of the valve control of the upstream part of the integrated valve of the present invention. The controller (also called the control part, the control device) 81 of the process treatment device is a so-called controller that performs electrical output in response to electrical input. The controller 81 may be, for example, a PLC (Programmable Logic Controller) or a relay circuit. The controller 81 may also sometimes operate in conjunction with a higher-level controller (not shown). Figure 7In the figure, the air piping is represented by double lines with a dashed line, the electric signal is represented by a dashed line, and the purge gas piping (A-port system gas piping connected to port A), the dilution gas piping (B-port system gas piping connected to port B), and the process gas piping (C-port system gas piping connected to port C and D-port system gas piping connected to port D) are shown by solid lines. It is configured such that mechanical valves MVA, MVB, MVC, and MVD for controlling whether or not gas can flow into the interior of the integrated valve are provided for each of the A to D port system gas pipings, and air is supplied from port E of the supply air source (Air source) to each of the mechanical valves MVA, MVB, MVC, and MVD. The operation part of the mechanical valve MV* is assembled so as to be operable from the surface of the air tank 30, and the closing can also be operated from the outside without opening the interior of the air tank 30 (refer to Figure 6 ). The mechanical valve MV* (*: the names A to D inserted into each gas system) usually allows the received air to pass directly through, but the air passage is blocked by closing the mechanical valve MV*, and in addition, the air remaining in the downstream piping can be discharged into the air tank 30 that discharges to the housing. Furthermore, a reed switch for detecting the state in which the mechanical valve MV* is closed to stop the inflow of the process gas is attached to the mechanical valve MV*, and its signal is taken into the controller 81. In the controller 81, once an electric signal indicating the stop of the inflow is received from the mechanical valve MV*, control is performed so that an electric signal is not sent to the solenoid valve for opening the relevant gas valve. In this figure, since the piping, air piping, and wiring of the electric signal are intricate and difficult to see clearly, the connection state of the actual air piping and the wiring of the electric signal is shown for the C-port system gas piping (gas pipeline of the C system). Regarding the other gas pipelines (A-port system gas piping, B-port system gas piping, and D-port system gas piping), the description of their air piping and the wiring of the electric signal is omitted.

[0092] The mechanical valve MVC usually allows air to pass through, supplies the air required for the opening operation of the gas valves G3C and GPC to a three-way shut-off solenoid valve (always exhaust type) having a solenoid pair italicized as G3Ca and GPCa, and supplies the air for opening the gas valve G2C to a 3-port solenoid valve also italicized as G2Ca. In this state, if an electric signal for opening the gas valve G3C or the gas valve G2C, that is, an opening instruction (generation of an opening instruction), is output from the controller 81, the solenoid valve (G2Ca, G3Ca, and GPCa) side becomes connected, air is supplied to the gas valve G3C or the gas valve G2C, and the C-port system process gas can flow downstream via the gas valve G3C, the flow controller FCC, and the gas valve G2C.

[0093] In the mechanical valve MVC, when an operation to cut off the air is performed, the air supply downstream of the mechanical valve MVC is interrupted, and the remaining air is discharged into the air tank 30. In addition, the controller 81 that has received an electrical signal indicating that it has been electrically cut off from the mechanical valve MVC performs control so that an electrical signal (i.e., an opening command) that activates the solenoids G2Ca, G3Ca, and GPCa is not output (prohibition of the generation of the opening command).

[0094] Although the operations of the three-way shut-off solenoid valves (G3Aa, G3Ba, G3Da, and GPD3) and the 3-port solenoid valves (G2Aa, G2Ba, G2Da) are not described, based on the description of the above solenoid valves (G2Ca, G3Ca, and GPCa), those skilled in the art can easily understand the operations of the mechanical valves MVA, MVB, MVDC and the solenoid valves (G3Aa, G3Ba, G3Da, GPD3, G2Aa, G2Ba, G2Da).

[0095] By having this cut-off function, a double hard interlock can be formed: neither the energy source for opening the gas valve, i.e., air, is output, nor an electrical signal that activates the solenoid for forming a pneumatic control circuit is output. Also, even when the gas valve G3C for process gas has an internal leak due to a foreign object getting stuck on the seat surface of the diaphragm, since the frequency of simultaneous internal leaks of the gas valve G2C for process gas on the downstream side of the gas valve G3C and the gas valve GPC for process gas separated from the purge gas pipeline is low, it is safer.

[0096] In this Figure 6 and Figure 7 In the embodiment, the cut-off detection of the mechanical valve MV* uses a reed switch. Even if a pressure switch that detects the air pressure is provided at a downstream position of the air pipe of the mechanical valve MV* instead of the reed switch to detect the cut-off, there is no significant difference based on safe control.

[0097] In addition, when an internal leak occurs in the gas valve G3C or the gas valve GPC, even if vacuum pumping is performed during the residual gas exhaust, the pressure of the pressure gauge PGC will not reach the vacuum side, so the internal leak can be detected. In particular, when an internal leak occurs in the gas valve G3C, the manual valve provided not in this air tank 30 but on the building side is closed, the residual gas including the confluence point is discharged, and after purging each gas path with the purge gas, the inside of the air tank 30 is entered for maintenance or replacement of the double two-way four-way valve 61 or the double three-way valve 67 formed by the gas valve G3C and the gas valve GPC. This operation is the same as the disposal when an internal leak occurs in the manual valve provided on the existing process gas pipeline, and the coping method remains unchanged.

[0098] Furthermore, in the present embodiment, the distribution destinations of the air source supplied by the mechanical valve MV* are shown as the gas valves GP*, G3*, and G2*, but the gas valves G1E* and G1C* may also be added. This is because the collective pipe is connected to the diaphragm sides of the gas valves G1E* and G1C* at the outlets of these respective process gas systems.

[0099] As described above, the invention completed by the present inventor has been specifically described based on the embodiments and implementation manners. However, the present invention is not limited to the above-described embodiments and implementation manners, and needless to say, various modifications can be made.

[0100] -Description of Reference Numerals-

[0101] 1: Workpiece

[0102] 2: Stage

[0103] 3: Chamber (reactor, etc.)

[0104] 4: Gas dispersion chamber (sub-chamber)

[0105] 5: Top plate

[0106] 6a, 6b, 6c: Spacers

[0107] 7a, 7b: Gas dispersion plates

[0108] 8: Shower plate

[0109] 9: Nozzle

[0110] 10: Halogen lamp

[0111] 11: Transparent window

[0112] 15: Gate valve

[0113] 16: Gate valve drive shaft

[0114] 20a, 20b: Exhaust ports

[0115] 20: Exhaust pipe

[0116] 21: Pressure regulating valve

[0117] 22: Main valve

[0118] 25: Dry pump

[0119] 26: Connecting pipe

[0120] 27: Exhaust pipe

[0121] 28: Pressure gauge (for chamber)

[0122] 29: Pressure gauge (for exhaust pipe)

[0123] 30: Gas box

[0124] 33: Idle port

[0125] 34: Idle port

[0126] 35: Base

[0127] 38: Pressure gauge (flammable / gas supply for chamber combined piping)

[0128] 39: Pressure gauge (flammable / exhaust system discarded gas combined piping)

[0129] 42: Idle port

[0130] 43: Idle port

[0131] 51: Base member

[0132] 52: Base member

[0133] 53: Union

[0134] 55: Block

[0135] 56: Block

[0136] 58: Base member

[0137] 59, 59’: Gas hole

[0138] 60a, 60b: Valve base

[0139] 61: Double two-way four-way valve

[0140] 62, 63, 64, 65, 64’, 65’: Sealing bolt

[0141] 67: Double two-way three-way valve

[0142] 81: Controller

[0143] 100: Purge gas pipeline (gas flow path)

[0144] 101: Combined piping

[0145] G3C, G3D: Gas valves on the upstream side of the flow controller

[0146] PGA, PGB, PGC, PGD: Pressure gauges

[0147] FCA, FCB, FCC, FCD: Flow controllers

[0148] G2A, G2B, G2C, G2D: Gas valves on the downstream side of the flow controller

[0149] G1CA, G1CC, G1CD: Gas valves for the pipelines leading to the chamber

[0150] G1EA, G1EB, G1EC, G1CD: Gas valves for the pipelines where the discarded gas goes to the exhaust system

[0151] G1C: The final-stage gas valve for the pipeline leading to the chamber

[0152] G1E: The final-stage gas valve for the pipeline where the discarded gas goes to the exhaust system

[0153] G1EP: The discarded gas valve for the purging pipeline leading to the exhaust system

[0154] G1CP: The discarded gas valve for the purging pipeline leading to the chamber.

Claims

1. A gas supply control device supplies gas to a processing chamber for processing a workpiece. The gas supply control device is characterized by comprising: A first port connected to a gas source of purge gas; A second port connected to a gas source of processing gas; A manifold pipe connected to the processing chamber and allowing the purge gas and the processing gas supplied from the first port and the second port respectively to flow in a combined manner; A first flow controller connected between the first port and the manifold pipe; A second flow controller connected between the second port and the manifold pipe, The gas flow path through which the purge gas flows is formed from the output side of the first flow controller to the input side of the second flow controller, The gas flow path includes: a first gas valve provided on the uppermost upstream side between the second port and the input side of the second flow controller, and performing the supply operation and stop operation of the purge gas, The first gas valve controls the direction of flow of the purge gas to be from the diaphragm side to the anti-diaphragm side.

2. The gas supply control device according to claim 1, characterized in that The gas supply control device includes: a second gas valve provided between the input side of the second flow controller and the first gas valve, The second gas valve controls the direction of flow of the processing gas to be from the anti-diaphragm side to the diaphragm side.

3. The gas supply control device according to claim 2, characterized in that A double four-way valve is formed by the first gas valve and the second gas valve.

4. The gas supply control device according to claim 2, characterized in that A double three-way valve is formed by the first gas valve and the second gas valve.

5. A gas supply control device supplies gas to a processing chamber for processing a workpiece. The gas supply control device is characterized by comprising: A first port connected to a gas source of processing gas; A second port connected to an air source; A manifold pipe connected to the processing chamber and allowing the processing gas supplied from the first port to flow; A flow controller connected between the first port and the manifold pipe; A first gas valve connected between the first port and the input side of the flow controller; A second gas valve connected between the manifold pipe and the output side of the flow controller; An electromagnetic valve controls the opening and closing of the first gas valve and the second gas valve; A mechanical valve is connected to the second port and controls the supply and stop of air required for the opening operation of the first gas valve and the second gas valve to the electromagnetic valve; and A controller generates an opening command for the electromagnetic valve, The mechanical valve generates an electrical signal when stopping the supply of air to the electromagnetic valve, The controller prohibits the generation of the opening command for the electromagnetic valve based on the electrical signal.

6. The gas supply control device according to claim 5, characterized in that The mechanical valve includes a reed switch that generates the electrical signal when closing the supply of air.

7. The gas supply control device according to claim 5, characterized in that The mechanical valve includes a pressure switch that monitors the air pressure downstream of the mechanical valve, and the pressure switch generates the electrical signal when it detects that the air pressure has decreased.

8. The gas supply control device according to claim 5, wherein the gas supply control device further comprises: a third port connected to a gas source of the purging gas; and a third gas valve disposed between the first port and the first gas valve, and allowing the purging gas supplied to the third port to flow into the input side of the flow controller, and the electromagnetic valve controls the opening and closing of the first gas valve, the second gas valve, and the third gas valve.

Images