An electronic ceramic material production and processing equipment

Abstract

The present invention discloses a production and processing device for electronic ceramic materials, including a reaction kettle. An installation cavity is arranged inside the reaction kettle, and a grinding mechanism is arranged in the installation cavity. The top of the reaction kettle is fitted and connected with a cover plate. A feeding hopper is arranged on the top of the cover plate, and a feeding mechanism is arranged on the top of the cover plate. The feeding mechanism is located above the grinding mechanism. An accelerating reaction mechanism is arranged on the outer side of the reaction kettle. The feeding mechanism includes a grinding head, a feeding pipe, and a first valve. The grinding head is fixedly connected to the top of the cover plate, and the bottom of the grinding head is located inside the installation cavity. The advantages are as follows: Compared with the prior art, the present invention solves the problem that in the traditional method, a large amount of materials are directly scattered and reacted with the solution, resulting in a slow reaction rate between the materials and the solution. It realizes the effect of uniformly spreading the materials to improve the reaction rate, and at the same time realizes the effect of continuously accelerating the reaction between the solution and the materials.

Description

Technical Field

[0001] The present invention relates to the technical field of material manufacturing, and particularly relates to a production and processing device for electronic ceramic materials. Background Art

[0002] Electronic ceramics are mainly composed of inorganic non-metallic materials as basic components. Electronic ceramics are an important part and indispensable material basis for high-tech fields such as aerospace, new energy, new materials, microelectronics, lasers, ocean engineering, and bioengineering, and are also one of the hotspots in the current high-tech competition. Barium titanate powder is an important basic raw material for electronic ceramic components. Industrially, barium oxalate titanate crystals are obtained by the oxalate co-precipitation method, and barium titanate powder can be obtained by calcination. The raw material, namely barium carbonate, often exists in a blocky form.

[0003] To improve its acid leaching rate, the blocky barium carbonate needs to be crushed. However, the powder particles processed by traditional crushers are uneven, resulting in a low acid leaching rate, which will reduce the quality of ceramic powder. Therefore, we designed a production and processing device for electronic ceramic materials to solve the above problems. Summary of the Invention

[0004] The purpose of the present invention is to solve the problems in the prior art that the uneven powder particles processed by the crusher will cause a low acid leaching rate, thereby reducing the quality of ceramic powder, etc., and to propose a production and processing device for electronic ceramic materials.

[0005] To achieve the above purpose, the present invention adopts the following technical scheme:

[0006] A production and processing device for electronic ceramic materials, including a reaction kettle. An installation cavity is provided inside the reaction kettle. A grinding mechanism is provided in the installation cavity. The top of the reaction kettle is hermetically connected with a cover plate. A feeding hopper is provided on the top of the cover plate. A feeding mechanism is provided on the top of the cover plate. The feeding mechanism is located above the grinding mechanism. An acceleration reaction mechanism is provided outside the reaction kettle.

[0007] In the above-mentioned large-capacity rectifier transformer cooled by a plate-type radiator, the feeding mechanism includes a grinding head, a feeding pipe, and a first valve. The grinding head is fixedly connected to the top of the cover plate, and the bottom of the grinding head is located in the installation cavity. A grinding knife is rotatably provided in the grinding head. A plurality of feeding ports are opened at the bottom of the grinding head. The feeding pipe is fixedly connected to the top end of the grinding head and is communicated with the grinding head. The feeding hopper is fixedly connected to the top end of the feeding pipe. The first valve is provided on the feeding pipe.

[0008] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, the grinding mechanism includes a mounting box, an intake pipe, a guide pipe, a rotating shaft, a first bevel gear, a second bevel gear, a drive shaft, a circulating impeller water pump, a diversion pipe, and a heat dissipation box. A cavity is provided inside the mounting box. The intake pipe is fixedly connected to the bottom of the mounting box and is in communication with the cavity. The guide pipe is inserted into the top of the mounting box, and the other end of the guide pipe penetrates the reaction kettle and is fixedly connected to an impeller air pump. A limiting fan is arranged in the cavity. The rotating shaft is rotatably connected to one side of the mounting box, and the limiting fan is in transmission connection with one end of the rotating shaft. The first bevel gear is fixedly connected to the other end of the rotating shaft. The second bevel gear is rotatably connected to the bottom of the grinding head and is in transmission connection with the grinding knife. The second bevel gear is meshed with the first bevel gear. The impeller shaft between the impeller air pump and the circulating impeller water pump is connected by a drive shaft. The diversion pipe is fixedly connected to the rear side of the circulating impeller water pump. The heat dissipation box is fixedly connected to one end of the diversion pipe away from the circulating impeller water pump. An exhaust pipe is arranged on one side of the impeller air pump.

[0009] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, the acceleration reaction mechanism includes a return pipe, a fixed pipe, a total pipe, a mounting cylinder, three annular pipes, a plurality of insertion pipes, and a plurality of fixing holes. The three annular pipes are sleeved on the reaction kettle from top to bottom at equal intervals. A plurality of the insertion pipes are respectively fixedly connected to the inner circumference of the three annular pipes at equal intervals, and the other end of the insertion pipe is inserted into the reaction kettle. The return pipe is fixedly connected to the rear side of the circulating impeller water pump. The bottom of the fixed pipe is fixedly connected to the heat dissipation box. The total pipe is fixedly connected to one end of the fixed pipe away from the heat dissipation box. Installation pipes are fixedly connected to the front sides of the three annular pipes. The other end of the installation pipe is fixedly connected to the total pipe. The mounting cylinder is fixedly connected to the reaction kettle. The plurality of fixing holes are divided into three layers and are opened on the mounting cylinder at equal intervals. The other end of the return pipe is fixedly connected to the bottom of the mounting cylinder.

[0010] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, a limiting port is opened at the top of the reaction kettle. A mounting seat is fixedly connected to one side of the top of the reaction kettle. A pin shaft is arranged in the mounting seat. One side of the cover plate is rotatably sleeved on the pin shaft, and the cover plate abuts against the limiting port.

[0011] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, a bottom plate is fixedly connected to the bottom of the reaction kettle, and anti-slip patterns are arranged on the bottom of the bottom plate.

[0012] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, a discharge pipe is fixedly connected to one side of the reaction kettle, and a second valve is arranged on the discharge pipe.

[0013] In the above-mentioned large-capacity rectifier transformer cooled by a chip radiator, a controller is provided on the top of the bottom plate, and the controller is electrically connected to both the first valve and the second valve.

[0014] Compared with the existing technology, the advantages of the present invention are as follows:

[0015] 1. In the first embodiment, by putting the material into the hopper, and then the material falls along the feeding pipe into the grinding head. At this time, the material will slowly seep through the feeding port, and then the material seeping into the installation cavity will contact and react with the solution, avoiding the problem that a large amount of materials are directly scattered in the traditional way, resulting in too slow reaction between the materials and the solution, and achieving the effect of uniform material scattering and thus improving the reaction rate.

[0016] 2. In the second embodiment, during the reaction between the material and the solution, since barium titanate powder reacts with acid to generate carbon dioxide, more carbon dioxide will be generated during this reaction process. Since the density of carbon dioxide is smaller than that of the solution and it is insoluble in the solution, the carbon dioxide will slowly rise and enter the intake pipe. The continuously entering carbon dioxide will drive the limit fan to rotate, so that the limit fan drives the rotating shaft and the first bevel gear to rotate, and the second bevel gear drives the grinding knife to rotate to grind and break the materials in the grinding head. Then the broken material powder falls and contacts and reacts with the solution, increasing the contact area between the material and the solution, which helps to improve the reaction rate. Subsequently, the carbon dioxide entering the intake pipe will pass through the guide pipe and the impeller air pump, and finally be discharged to the outside through the exhaust pipe.

[0017] 3. In the third embodiment, during the reaction of the solution, the generated carbon dioxide enters the guide pipe, and then enters the impeller air pump. Subsequently, the first impeller fan is driven to rotate by the carbon dioxide gas, and at the same time, the transmission shaft drives the second impeller fan to rotate, so that the wind force sucks the solution in the reaction kettle into the fixed pipe and the assembly pipe through the annular pipe and finally into the heat dissipation box for cooling. Subsequently, the cooled solution will enter the installation cylinder through the return pipe. During this process, the solution will form a convection with the fixed holes and the insertion pipes, making the carbon dioxide gas rise obliquely upward in a parabolic form, which helps to increase the rate and efficiency of the carbon dioxide entering the intake pipe, and thus can continuously accelerate the reaction between the solution and the material. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a top view structural schematic diagram of an electronic ceramic material production and processing device proposed by the present invention;

[0019] Figure 2 It is a three-dimensional structural schematic diagram of the outside of an electronic ceramic material production and processing device proposed by the present invention;

[0020] Figure 3Schematic diagram of the side structure of a production and processing device for electronic ceramic materials proposed by the present invention;

[0021] Figure 4 Schematic diagram of the top view of the second bevel gear of a production and processing device for electronic ceramic materials proposed by the present invention;

[0022] Figure 5 Schematic diagram of the top view of the cover plate of a production and processing device for electronic ceramic materials proposed by the present invention;

[0023] Figure 6 Schematic diagram of the side structure of the cover plate of a production and processing device for electronic ceramic materials proposed by the present invention;

[0024] Figure 7 Schematic diagram of the structure of the installation cylinder of a production and processing device for electronic ceramic materials proposed by the present invention;

[0025] Figure 8 For Figure 2 The enlarged view at position A in

[0026] Figure 9 Cross-sectional view of the impeller air pump in a production and processing device for electronic ceramic materials proposed by the present invention.

[0027] In the figure: 1, reaction kettle; 2, cover plate; 3, grinding head; 4, feed pipe; 5, feed hopper; 6, first valve; 7, installation box; 8, intake pipe; 9, guide pipe; 10, rotating shaft; 11, first bevel gear; 12, second bevel gear; 13, annular pipe; 14, insertion pipe; 15, impeller air pump; 16, drive shaft; 17, circulating impeller water pump; 18, diversion pipe; 19, heat dissipation box; 20, return pipe; 21, fixed pipe; 22, assembly pipe; 23, installation cylinder; 24, fixing hole; 25, second valve; 26, controller. Specific embodiments

[0028] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0029] Embodiment 1

[0030] Refer to Figure 1-3, An electronic ceramic material production and processing device, including a reaction kettle 1. An installation cavity is provided inside the reaction kettle 1. A grinding mechanism is arranged in the installation cavity. The top of the reaction kettle 1 is adhesively connected with a cover plate 2. A feeding hopper 5 is arranged on the top of the cover plate 2. A feeding mechanism is arranged on the top of the cover plate 2. The feeding mechanism is located above the grinding mechanism. An accelerating reaction mechanism is arranged outside the reaction kettle 1.

[0031] Refer to Figure 5-6 , The feeding mechanism includes a grinding head 3, a feeding pipe 4, and a first valve 6. The grinding head 3 is fixedly connected to the top of the cover plate 2, and the bottom of the grinding head 3 is located inside the installation cavity. A grinding knife is rotatably arranged inside the grinding head 3. A plurality of feeding ports are opened at the bottom of the grinding head 3. The feeding pipe 4 is fixedly connected to the top end of the grinding head 3 and is communicated with the grinding head 3. The feeding hopper 5 is fixedly connected to the top end of the feeding pipe 4. The first valve 6 is arranged on the feeding pipe 4;

[0032] A limiting port is opened at the top of the reaction kettle 1. A mounting seat is fixedly connected to one side of the top of the reaction kettle 1. A pin shaft is arranged inside the mounting seat. One side of the cover plate 2 is rotatably sleeved on the pin shaft, and the cover plate 2 abuts against the limiting port.

[0033] In this way, by setting the first valve 6, the rate of the material entering the grinding head 3 and the feeding pipe 4 can be controlled, preventing the problem of blockage caused by a large amount of materials accumulating in the grinding head 3.

[0034] In this embodiment, by putting the material into the feeding hopper 5, then the material falls into the grinding head 3 along the feeding pipe 4. At this time, the material will slowly seep through the feeding ports, and then the material seeping into the installation cavity will contact the solution and react, avoiding the problem that the traditional direct dropping of a large amount of materials leads to too slow reaction between the materials and the solution, and achieving the effect of uniform material spreading and thus improving the reaction rate.

[0035] Embodiment Two

[0036] Refer to Figure 4 and 6, the difference between this embodiment and the first embodiment is that the grinding mechanism includes an installation box 7, an air inlet pipe 8, a guide air pipe 9, a rotating shaft 10, a first bevel gear 11, a second bevel gear 12, a transmission shaft 16, a circulating impeller water pump 17, a diversion pipe 18 and a heat dissipation box 19. A cavity is provided inside the installation box 7. The air inlet pipe 8 is fixedly connected to the bottom of the installation box 7 and is in communication with the cavity. The guide air pipe 9 is inserted into the top of the installation box 7, and the other end of the guide air pipe 9 penetrates through the reaction kettle 1 and is fixedly connected to an impeller air pump 15. A limiting fan is arranged in the cavity. The rotating shaft 10 is rotatably connected to one side of the installation box 7, and the limiting fan is in transmission connection with one end of the rotating shaft 10. The first bevel gear 11 is fixedly connected to the other end of the rotating shaft 10. The second bevel gear 12 is rotatably connected to the bottom of the grinding head 3 and is in transmission connection with the grinding knife. The second bevel gear 12 is meshed with the first bevel gear 11. The impeller shaft between the impeller air pump 15 and the circulating impeller water pump 17 is connected through the transmission shaft 16. The diversion pipe 18 is fixedly connected to the rear side of the circulating impeller water pump 17. The heat dissipation box 19 is fixedly connected to one end of the diversion pipe 18 away from the circulating impeller water pump 17. An exhaust air pipe is arranged on one side of the impeller air pump 15;

[0037] A discharge pipe is fixedly connected to one side of the reaction kettle 1, and a second valve 25 is arranged on the discharge pipe.

[0038] In this embodiment, through the reaction of the material and the solution, since barium titanate powder reacts with acid to generate carbon dioxide, more carbon dioxide will be generated during the reaction process. Since the density of carbon dioxide is smaller than that of the solution and it is insoluble in the solution, the carbon dioxide will slowly rise and enter the air inlet pipe 8. The continuously entering carbon dioxide will push the limiting fan to rotate, so that the limiting fan drives the rotating shaft 10 and the first bevel gear 11 to rotate, so that the second bevel gear 12 drives the grinding knife to rotate, grinding and crushing the material in the grinding head 3. Then the crushed material powder falls and contacts and reacts with the solution, increasing the contact area between the material and the solution, thereby helping to improve the reaction rate. Subsequently, the carbon dioxide entering the air inlet pipe 8 will pass through the guide air pipe 9 and the impeller air pump 15, and finally be discharged to the outside through the exhaust air pipe.

[0039] Embodiment Three

[0040] Refer to Figure 7-9, the acceleration reaction mechanism includes a reflux pipe 20, a fixed pipe 21, an assembly pipe 22, an installation cylinder 23, three annular pipes 13, a plurality of insertion pipes 14 and a plurality of fixing holes 24. The three annular pipes 13 are sleeved on the reaction kettle 1 at equal intervals from top to bottom. A plurality of insertion pipes 14 are respectively fixedly connected at equal intervals around the inner circle of the three annular pipes 13, and the other ends of the insertion pipes 14 are inserted into the reaction kettle 1. The reflux pipe 20 is fixedly connected to the rear side of the circulating impeller water pump 17. The bottom of the fixed pipe 21 is fixedly connected to the heat dissipation box 19. The assembly pipe 22 is fixedly connected to one end of the fixed pipe 21 away from the heat dissipation box 19. Installation pipes are fixedly connected to the front sides of the three annular pipes 13, and the other ends of the installation pipes are fixedly connected to the assembly pipe 22. The installation cylinder 23 is fixedly connected inside the reaction kettle 1. The plurality of fixing holes 24 are divided into three layers and are opened on the installation cylinder 23 at equal intervals. The other end of the reflux pipe 20 is fixedly connected to the bottom of the installation cylinder 23;

[0041] The bottom of the reaction kettle 1 is fixedly connected with a bottom plate, and anti-slip patterns are provided on the bottom of the bottom plate;

[0042] A controller 26 is arranged on the top of the bottom plate, and the controller 26 is electrically connected to both the first valve 6 and the second valve 25.

[0043] In this embodiment, during the solution reaction process, the generated carbon dioxide enters the air guide pipe 9, and then enters the impeller air pump 15. The impeller air pump 15 is driven to rotate by the carbon dioxide gas, and at the same time, the transmission shaft 16 drives the circulating impeller water pump 17 to rotate. The wind sucks the solution in the reaction kettle 1 into the fixed pipe 21 and the assembly pipe 22 through the annular pipe 13 and finally enters the heat dissipation box 19 for cooling. Then, the cooled solution will enter the installation cylinder 23 through the reflux pipe 20. During this process, the solution will form a convection with the fixing holes 24 and the insertion pipes 14, so that the carbon dioxide gas rises obliquely upward in a parabolic form, which helps to increase the rate and efficiency of the carbon dioxide entering the air inlet pipe 8, thereby continuously accelerating the reaction between the solution and the material, and improving the processing rate.

[0044] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, makes equivalent replacements or changes, and should be covered by the protection scope of the present invention.

Claims

1. An electronic ceramic material production and processing device, including a reaction kettle (1), characterized in that, An installation cavity is provided inside the reactor (1), and a grinding mechanism is arranged in the installation cavity. The top of the reactor (1) is fitted and connected with a cover plate (2). A feeding hopper (5) is arranged on the top of the cover plate (2). A feeding mechanism is arranged on the top of the cover plate (2), and the feeding mechanism is located above the grinding mechanism. An accelerating reaction mechanism is arranged on the outer side of the reactor (1). The feeding mechanism includes a grinding head (3), a feeding pipe (4), and a first valve (6). The grinding head (3) is fixedly connected to the top of the cover plate (2), and the bottom of the grinding head (3) is located inside the installation cavity. A grinding knife is rotatably arranged inside the grinding head (3). A plurality of feeding ports are opened at the bottom of the grinding head (3). The feeding pipe (4) is fixedly connected to the top end of the grinding head (3), and the feeding pipe (4) is communicated with the grinding head (3). The feeding hopper (5) is fixedly connected to the top end of the feeding pipe (4). The first valve (6) is arranged on the feeding pipe (4). The grinding mechanism includes an installation box (7), an air inlet pipe (8), a guide air pipe (9), a rotating shaft (10), a first bevel gear (11), a second bevel gear (12), a transmission shaft (16), a circulating impeller water pump (17), a guide pipe (18), and a heat dissipation box (19). A cavity is arranged inside the installation box (7). The air inlet pipe (8) is fixedly connected to the bottom of the installation box (7), and the air inlet pipe (8) is communicated with the cavity. The guide air pipe (9) is inserted into the top of the installation box (7), and the other end of the guide air pipe (9) penetrates through the reactor (1) and is fixedly connected with an impeller air pump (15). A limiting fan is arranged inside the cavity. The rotating shaft (10) is rotatably connected to one side of the installation box (7), and the limiting fan is in transmission connection with one end of the rotating shaft (10). The first bevel gear (11) is fixedly connected to the other end of the rotating shaft (10). The second bevel gear (12) is rotatably connected to the bottom of the grinding head (3), and the second bevel gear (12) is in transmission connection with the grinding knife. The second bevel gear (12) is meshed with the first bevel gear (11). The impeller shaft between the impeller air pump (15) and the circulating impeller water pump (17) is connected through the transmission shaft (16). The guide pipe (18) is fixedly connected to the rear side of the circulating impeller water pump (17). The heat dissipation box (19) is fixedly connected to one end of the guide pipe (18) away from the circulating impeller water pump (17). An exhaust air pipe is arranged on one side of the impeller air pump (15). The accelerating reaction mechanism includes a return pipe (20), a fixed pipe (21), a total pipe (22), an installation cylinder (23), three annular pipes (13), a plurality of insertion pipes (14), and a plurality of fixing holes (24). The three annular pipes (13) are sleeved on the reactor (1) in equal intervals from top to bottom. The plurality of insertion pipes (14) are respectively fixedly connected to the inner circumference of the three annular pipes (13) at equal intervals, and the other end of the insertion pipe (14) is inserted into the reactor (1).The reflux pipe (20) is fixedly connected to the rear side of the circulating impeller water pump (17), the bottom of the fixed pipe (21) is fixedly connected to the heat dissipation box (19), the assembly pipe (22) is fixedly connected to one end of the fixed pipe (21) away from the heat dissipation box (19), the front sides of the three annular pipes (13) are all fixedly connected with installation pipes, the other ends of the installation pipes are fixedly connected to the assembly pipe (22), the installation cylinder (23) is fixedly connected inside the reaction kettle (1), and the plurality of fixing holes (24) are divided into three layers and are equidistantly arranged on the installation cylinder (23). The other end of the reflux pipe (20) is fixedly connected to the bottom of the installation cylinder (23).

2. An electronic ceramic material production and processing device according to claim 1, characterized in that, A limiting port is provided at the top of the reactor (1). One side of the top of the reactor (1) is fixedly connected to a mounting seat. A pin shaft is arranged in the mounting seat. One side of the cover plate (2) is rotatably sleeved on the pin shaft, and the cover plate (2) abuts against the limiting port.

3. An electronic ceramic material production and processing device according to claim 1, characterized in that, The bottom of the reactor (1) is fixedly connected to a bottom plate, and anti-slip patterns are provided on the bottom of the bottom plate.

4. An electronic ceramic material production and processing device according to claim 1, characterized in that, A discharge pipe is fixedly connected to one side of the reactor (1), and a second valve (25) is arranged on the discharge pipe.

5. An electronic ceramic material production and processing device according to claim 3, characterized in that, A controller (26) is arranged on the top of the bottom plate, and the controller (26) is electrically connected to both the first valve (6) and the second valve (25).

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