Cleaning base station, cleaning equipment, cleaning system and charging device
By adopting a double buffer mechanism and a limit mechanism design in the cleaning base station, the problems of hard collision and reverse thrust when the cleaning robot is charging with the base station are solved, and a safe and efficient charging process is achieved.
Patent Information
- Application Number
- CN202211128986.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-09-16
- Publication Date
- 2025-09-30
- Estimated Expiration
- 2042-09-16
AI Technical Summary
Existing cleaning robots are prone to component damage due to collisions when charging with base stations, and the reduced contact area of the electrodes during charging causes severe heating, and may even burn the robot and base station.
A double buffer mechanism design is adopted. The first pole piece moves through the first buffer mechanism in the first stroke until it contacts and conducts with the second pole piece, and then moves synchronously in the second stroke. Combined with the limit mechanism and sliding seat, stable contact and conduction are ensured to reduce impact force.
It achieves stable docking between the cleaning equipment and the charging device, avoids hard collisions and reverse thrust, ensures a safe and efficient charging process, and reduces overheating problems caused by incomplete electrode contact.
Smart Images
Figure CN115553674B_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the field of cleaning technology, and specifically relates to a charging device, a cleaning device and a cleaning base station using the charging device, and a cleaning system using the cleaning device or the cleaning base station. Background Art
[0002] With the advancement of technology and the continuous improvement of living standards, people's demand for cleaning equipment is increasing, and intelligent cleaning equipment is becoming more and more common, such as commercial robots that clean in commercial environments such as shopping malls and office buildings.
[0003] Due to the limited capacity of its own battery, the cleaning robot needs to move to the base station regularly for docking and charging. Since the robot has a certain amount of inertia, it will collide with the base station during docking, causing damage to components. Especially for commercial robots, which are larger in size and have greater inertia, they are more likely to cause damage to components due to collisions. In order to avoid hard collisions between the robot and the base station body as much as possible, the docking platforms of existing base stations are mostly configured as retractable buffer structures, and some buffer travel is reserved. In the case of low elasticity of the buffer structure, hard collisions between the robot and the base station may still occur. In the case of high elasticity of the buffer structure, after the robot stops moving, the rebound force of the buffer structure will be greater than the braking force between the robot and the ground, thereby pushing the robot back out.
[0004] When the robot is pushed back, the contact area between the charging electrodes of the robot and the base station will decrease, which will cause problems such as severe heating of the electrodes, and in severe cases, it will even cause the robot and the base station to burn out. Summary of the Invention
[0005] In order to solve the problems existing in the prior art, the present disclosure provides a cleaning base station, a cleaning device, a cleaning system and a charging device.
[0006] According to a first aspect of the present disclosure, a cleaning base station is provided, comprising a charging device, the charging device comprising:
[0007] base;
[0008] a first pole piece, the first pole piece being arranged on the base via a first buffer mechanism;
[0009] a second pole piece, the second pole piece being disposed on the base via a second buffer mechanism, the second pole piece being configured to be electrically connected to an external power source;
[0010] The first pole piece is configured to be forced to squeeze the first buffer mechanism and move it to contact and conduct with the second pole piece within a first stroke, and the first pole piece and the second pole piece are configured to continue to be forced to squeeze the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke.
[0011] In one embodiment of the present disclosure, the cleaning base station is used to accommodate a cleaning device, and the cleaning device is configured such that during movement, the charging electrode provided thereon is configured to be in contact and conductive with the first electrode, and to squeeze the first electrode to move.
[0012] In one embodiment of the present disclosure, the first stroke L1 is greater than the second stroke L2.
[0013] In one embodiment of the present disclosure, the cleaning base station is provided with a limiting mechanism for limiting the moving range of the cleaning device; the range of the limiting mechanism is L3 = L1 + L2.
[0014] In one embodiment of the present disclosure, the relationship between the braking force F3 of the cleaning device on the cleaning base station, the elastic force F1 provided by the first buffer mechanism in the first and second strokes, and the elastic force F2 provided by the second buffer mechanism in the second stroke is as follows: F3≥F1+F2.
[0015] In one embodiment of the present disclosure, the elastic force F1 provided by the first buffer mechanism in the first stroke and the second stroke is greater than the elastic force F2 provided by the second buffer mechanism in the second stroke.
[0016] In one embodiment of the present disclosure, the charging device includes a sliding seat guided and engaged on the base, and the first pole piece is fixed on the sliding seat; the first pole piece is configured to be driven by force to move the sliding seat relative to the base within a first stroke and a second stroke.
[0017] In one embodiment of the present disclosure, the first buffer mechanism is a first spring provided between the sliding seat and the base; the sliding seat is configured to compress the first spring when moving within a first stroke and a second stroke.
[0018] In one embodiment of the present disclosure, the second pole piece is configured to be disposed in a movement path of the first pole piece through the second buffer mechanism.
[0019] In one embodiment of the present disclosure, the charging device further includes a wire for conducting with an external power source, and the wire is fixed to and conducted with the second electrode.
[0020] According to a second aspect of the present disclosure, there is also provided a cleaning device, comprising:
[0021] base;
[0022] a first pole piece, the first pole piece being arranged on the base via a first buffer mechanism;
[0023] a second pole piece, the second pole piece being arranged on the base via a second buffer mechanism;
[0024] The first pole piece is configured to be forced to squeeze the first buffer mechanism and move it to contact and conduct with the second pole piece within a first stroke, and the first pole piece and the second pole piece are configured to continue to be forced to squeeze the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke.
[0025] According to a third aspect of the present disclosure, a cleaning system is further provided, comprising the cleaning base station described in the above embodiment, and a cleaning device; the cleaning device is configured to squeeze the first pole piece to move during movement.
[0026] According to a fourth aspect of the present disclosure, a cleaning system is further provided, comprising a cleaning base station and the cleaning device of the above embodiment; the cleaning device is configured to pressurize and move the first pole piece during movement.
[0027] According to a fifth aspect of the present disclosure, there is further provided a charging device, comprising:
[0028] base;
[0029] a first pole piece, the first pole piece being arranged on the base via a first buffer mechanism;
[0030] a second pole piece, the second pole piece being arranged on the base via a second buffer mechanism;
[0031] The first pole piece is configured to be forced to squeeze the first buffer mechanism and move it to contact and conduct with the second pole piece within a first stroke, and the first pole piece and the second pole piece are configured to continue to be forced to squeeze the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke.
[0032] One beneficial effect of the present disclosure is that the cleaning base station is docked with the cleaning equipment that needs to be charged through the charging device. When the cleaning equipment is docked with the charging device, the first electrode is squeezed by the cleaning equipment, causing the first buffer mechanism to move in the first stroke until the first electrode contacts the second electrode and begins charging. After that, the first electrode squeezes the second buffer mechanism and moves synchronously with the first buffer mechanism. The second electrode is charged and the first electrode is uncharged. The cleaning equipment is first buffered by the first buffer mechanism to reduce the impact force. After being connected to the second electrode, the second buffer mechanism increases the buffering, further reducing the impact force, so that the cleaning equipment can be in stable and complete contact and conduction with the first and second electrode pieces, and the charging process is safe and efficient.
[0033] Other features and advantages of the present disclosure will become apparent from the following detailed description of exemplary embodiments of the present disclosure with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0034] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure.
[0035] Figure 1 is a schematic structural diagram of the cleaning system disclosed herein;
[0036] Figure 2 is a schematic structural diagram of the charging device disclosed herein;
[0037] Figure 3 This is a schematic diagram of the first pole piece and the second pole piece of the charging device disclosed herein in contact with each other.
[0038] Reference numerals:
[0039] 1. Base; 2. First pole piece; 3. Second pole piece; 4. Charging pole piece; 5. Sliding seat; 6. First spring; 7. Second spring; 8. Wire. DETAILED DESCRIPTION
[0040] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. It should be noted that unless otherwise specifically stated, the relative arrangement of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present disclosure.
[0041] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses.
[0042] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.
[0043] In all examples shown and discussed herein, any specific values should be interpreted as merely exemplary and not limiting. Therefore, other examples of the exemplary embodiments may have different values.
[0044] It should be noted that like reference numerals and letters refer to like items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.
[0045] The cleaning base station disclosed herein can be used in conjunction with cleaning equipment such as self-propelled cleaning robots and handheld floor scrubbers. The cleaning equipment can be deployed with the cleaning base station either by self-propelled movement or by manual placement. The cleaning base station includes a charging device that docks with the cleaning equipment to charge it. The cleaning base station can also integrate functions such as cleaning, drying, dust collection, water injection, and other functions for the cleaning equipment.
[0046] The charging device includes a base, a first electrode, and a second electrode. The first electrode is uncharged, while the second electrode is electrically connected to an external power source. The first electrode is connected to the base via a first buffer mechanism, while the second electrode is connected to the base via a second buffer mechanism. The first and second buffer mechanisms provide cushioning against impact.
[0047] When the cleaning equipment needs to be charged, it moves toward the cleaning base station. During this movement, the charging electrode on the cleaning equipment first contacts and conducts with the first electrode on the charging device. After contact, it continues to move toward the base. Under the action of the cleaning equipment, the first electrode squeezes the first buffer mechanism, and the first buffer mechanism moves toward the second electrode within the first stroke. When the first electrode and the second electrode contact and conduct, the cleaning base station begins to charge the cleaning equipment. The cleaning equipment continues to move due to inertia, squeezing the first and second electrode pieces, causing the first and second buffer mechanisms to continue moving within the second stroke. During the movement of the first and second buffer mechanisms, the impact force of the cleaning equipment is buffered until the cleaning equipment stops moving and charging is performed in the cleaning base station.
[0048] The first electrode of the charging device is uncharged, while the second electrode is charged. After the first and second electrodes come into contact, the second electrode is connected to the charging electrode of the cleaning device through the first electrode, and charging begins. During the docking process between the cleaning device and the cleaning base station, the cleaning device first uses the first buffer mechanism to buffer and reduce impact force. After connecting with the second electrode, the first and second buffer mechanisms can simultaneously buffer and further reduce impact force, so that the first and second electrodes can reach stable and complete contact and conduction, avoiding the problem of overheating during the conduction process caused by incomplete contact between the first and second electrodes, making the charging process safer and more efficient.
[0049] For ease of understanding, the following reference is made to the accompanying drawings. Figures 1 to 3 , the specific structure and working principle of the present disclosure are explained in detail with reference to specific embodiments.
[0050] Example 1
[0051] See also Figure 1The cleaning base station includes a charging device connected to the side wall of the cleaning base station so that the cleaning equipment can move to the charging device for charging. Of course, the charging device can also be connected to the top of the cleaning base station or other locations as long as it can be compatible with the cleaning equipment.
[0052] See also Figure 2 The charging device includes a base 1 connected to the cleaning base station, and also includes a first pole piece 2 and a second pole piece 3. The first pole piece 2 is connected to the base 1 through a first buffer mechanism, the second pole piece 3 is connected to the base 1 through a second buffer mechanism, and the second pole piece 3 is conductively connected to the external power supply. The first pole piece 2 and the second pole piece 3 are located at one end of the base 1 away from the cleaning base station, and the second pole piece 3 is located between the first pole piece 2 and the base 1. The first pole piece 2 can squeeze the first buffer mechanism under the action of an external force, move in a direction close to the second pole piece 3, and move to contact and conduct with the second pole piece 3 within the first stroke. After the first pole piece 2 and the second pole piece 3 are conductive, they continue to squeeze the first buffer mechanism and the second buffer mechanism under the action of an external force, and move synchronously within the second stroke.
[0053] The first and second buffer mechanisms can utilize compression springs to cushion the cleaning device through elastic action. When the cleaning device leaves the charging device, the first and second buffer mechanisms can drive the first and second pole pieces 2 and 3 to reset. Of course, the first and second buffer mechanisms can also utilize other elastic components, such as springs or compression plates.
[0054] Currently, the charging device on existing cleaning base stations consists of a telescopic mechanism and an electrode sheet connected to the end of the telescopic mechanism. The electrode sheet is connected to an external power source via a wire. When the cleaning equipment and the electrode sheet of the charging device are in contact, the telescopic mechanism cushions the impact of the cleaning equipment. Due to the high charging current and the thick diameter of the wire, it does not easily expand or bend with the electrode sheet. This will cause some obstruction to the telescopic mechanism, resulting in a large reverse thrust on the cleaning equipment. As a result, the electrode sheet on the cleaning equipment cannot fully contact with the electrode sheet of the charging device, posing a safety hazard.
[0055] In this embodiment, the second electrode 3 of the charging device is connected to the external power supply via a wire 8. The provision of the first electrode 2 and the first buffer mechanism can reduce the travel distance of the second electrode 3 under sufficient buffering stroke, that is, reduce the distance of the second stroke, thereby reducing the travel distance of the wire 8, and further reducing the impact of the wire 8 on the buffering effect of the second buffer mechanism. This helps to reduce the reverse thrust on the cleaning equipment and prevent the cleaning equipment from being pushed away from the charging device. It also helps to ensure that the first electrode 2 and the second electrode 3 are fully in contact and conductive, avoiding the problem of overheating and burning due to the small contact surface between the two electrode plates during charging.
[0056] When the cleaning device used in conjunction with the cleaning base station needs to be charged due to long-term use, the cleaning device moves to the cleaning base station. The cleaning base station can be provided with a receiving cavity for accommodating the cleaning device. The cleaning device is provided with a charging electrode 4 that cooperates with the first electrode 2. Figure 1 After the cleaning equipment enters the accommodating cavity of the cleaning base station, the charging electrode 4 will contact and squeeze the first electrode 2, thereby causing the first electrode 2 to squeeze the first buffer mechanism. The first electrode 2 moves toward the second electrode 3 within the first stroke until it contacts the second electrode 3. The charging electrode 4 is connected to the second electrode 3 through the first electrode 2, thereby connecting the external power supply to the cleaning equipment to charge the cleaning equipment.
[0057] Because the cleaning device has a certain amount of inertia during its movement toward the cleaning base station, it cannot stop immediately after the first pole piece 2 and the second pole piece 3 come into contact. Therefore, the cleaning device will continue to move toward the cleaning base station, squeezing the first pole piece 2 and the second pole piece 3, driving the first buffer mechanism and the second buffer mechanism to move synchronously toward the base 1 within the second stroke. The first buffer mechanism and the second buffer mechanism further buffer the cleaning device, causing it to stop moving and remain stationary in the cleaning base station for charging. During the movement of the cleaning device toward the cleaning base station, the speed of the cleaning device gradually decreases under the buffering action of the first buffer mechanism and the second buffer mechanism until it stops moving.
[0058] When the cleaning device is docked and charged, to prevent the reverse thrust generated by the first and second buffer mechanisms from pushing the cleaning device away from the charging device, the cleaning device has a braking force capable of overcoming the reverse thrust, thereby ensuring stable engagement with the charging device and continuous charging. The braking force can be generated by the cleaning device's own braking device, friction between the cleaning device and the charging device, and other means.
[0059] In one embodiment of the present disclosure, the reverse thrust of the first buffer mechanism on the cleaning device is F1, the reverse thrust of the second buffer mechanism on the cleaning device is F2, the braking force for the cleaning device to be stabilized in the cleaning base station is F3, and F3 ≥ F1 + F2. In a specific embodiment of the present disclosure, the range of F1 is 5 to 50N, and the range of F2 is 5 to 10N. Since F3 ≥ F1 + F 2， Therefore, when the cleaning device is charging in the cleaning base station, it will not be pushed away from the cleaning base station due to the reverse thrust of the first buffer mechanism and the second buffer mechanism, thereby ensuring the stability of the cleaning device during charging and improving the charging efficiency.
[0060] In one embodiment of the present disclosure, the elastic force F1 provided by the first buffer mechanism during both the first and second strokes is greater than the elastic force F2 provided by the second buffer mechanism during the second stroke. This allows the first buffer mechanism to exert a greater buffering effect, reducing the speed of the cleaning device, thereby relatively reducing the buffering effect of the second buffer mechanism, and further reducing the impact of the wire 8 on the buffering effect of the second buffer mechanism.
[0061] In one embodiment of the present disclosure, a limiting mechanism is also provided in the cleaning base station, which limits the moving distance of the cleaning device in the cleaning device through the limiting mechanism, thereby preventing the cleaning device from moving too long a distance in the cleaning base station, causing the first buffer mechanism and the second buffer mechanism in the charging device to be over-compressed, resulting in excessive reverse thrusts F1 and F2, causing the cleaning device to be pushed away from the cleaning base station.
[0062] In a specific embodiment of the present disclosure, the distance that the limiting mechanism allows the cleaning device to move in the cleaning base station, that is, the stroke of the limiting mechanism is L3, the distance of the first stroke is L1, and the distance of the second stroke is L2. The stroke L3 of the limiting mechanism satisfies: L3=L1+L2. The distance that the limiting mechanism allows the cleaning device to move is equal to the sum of the first stroke and the second stroke, thereby preventing the first buffer mechanism and the second buffer mechanism from being over-compressed. In a specific embodiment of the present disclosure, the range of L1 is 5 to 20 mm, and the range of L2 is 5 to 20 mm. The shorter first stroke and second stroke can ensure that the cleaning device can complete the docking more quickly when docking with the cleaning base station, thereby avoiding a long waiting time for docking due to the first stroke and the second stroke being too long.
[0063] In one embodiment of the present disclosure, the distance L1 of the first stroke is greater than the distance L2 of the second stroke. When the second pole piece 3 is connected to the external power supply via the wire 8, the second pole piece 3 moves under the pressure of the first pole piece 2, and the wire 8 also moves synchronously with the second pole piece 3. Setting a shorter second stroke can reduce the movement distance of the wire 8, thereby preventing the wire 8 from moving too long, thereby reducing the impact of the wire 8 on the buffering effect of the second buffer mechanism, which helps to reduce the reverse thrust on the cleaning equipment and prevents the wire 8 from being damaged.
[0064] When the cleaning device is not charging, the first electrode piece 2 and the second electrode piece 3 are exposed to the outside environment and are inevitably contaminated by impurities such as moisture and dust. This can cause problems. For example, the cleaning device may short-circuit while charging, damaging the cleaning base station or the cleaning device. Alternatively, impurities on the electrode pieces may cause low charging efficiency.
[0065] In order to solve the above problem, in one embodiment of the present disclosure, see Figure 2 、 Figure 3The charging device further includes a sliding seat 5, which is sleeved on the outside of the base 1 and can slide back and forth along the extension direction of the base 1. The movement direction of the sliding seat 5 is consistent with the movement direction of the first pole piece 2 and the second pole piece 3. The first pole piece 2 is fixedly connected to the end of the sliding seat 5 away from the base 1 and passes through the sliding seat 5. The side of the first pole piece 2 away from the base 1 and the side close to the base 1 are both exposed from the sliding seat 5. The side of the first pole piece 2 away from the base 1 is used to contact and conduct electricity with the charging pole piece 4 on the cleaning device, and the side of the first pole piece 2 close to the base 1 is used to contact and conduct electricity with the second pole piece 3.
[0066] When the cleaning device squeezes the first pole piece 2, it also squeezes the sliding seat 5, causing the sliding seat 5 to move with the first pole piece 2 within the first and second strokes. The sliding seat 5 can enclose the first and second pole pieces 2, 3, thereby preventing the first and second pole pieces 2, 3 from coming into contact with dust, water stains, etc. in the external environment when the cleaning base station is idle, thereby preventing the cleaning device or the cleaning base station from malfunctioning during charging.
[0067] Moreover, when the sliding seat 5 is not installed, the first pole piece 2 and the second pole piece 3 are connected to the base 1 only through the first buffer mechanism and the second buffer mechanism during movement, and may be offset during movement, causing the first pole piece 2 to move in other directions and unable to contact the second pole piece 3. The sliding seat 5 can be configured to cooperate with the base 1 to guide the movement direction of the first pole piece 2. Figure 2 The sliding seat 5 is wrapped around the outside of the base 1 and is supported by the base 1 when sliding, so that the sliding seat 5 is more stable during the sliding process and will not deviate, thereby ensuring that the first pole piece 2 and the second pole piece 3 can be fully docked and matched.
[0068] In one embodiment of the present disclosure, the first buffer mechanism is a first spring 6, see Figure 2 , one end of the first spring 6 is connected to the end of the sliding seat 5 facing the base 1, and the other end is connected to the base 1, that is, the first pole piece 2 is connected to the base 1 through the sliding seat 5 and the first spring 6. The side of the first pole piece 2 close to the cleaning device can protrude from the surface of the sliding seat 5. When the cleaning device squeezes the first pole piece 2, the first pole piece 2 drives the sliding seat 5 to move toward the direction of the second pole piece 3 within the first stroke, while squeezing the first spring 6. After the first pole piece 2 and the second pole piece 3 come into contact, they continue to move within the second stroke under the squeezing of the cleaning device until the cleaning device stops in the cleaning base station. In another embodiment, the side of the first pole piece 2 close to the cleaning device can also be flush with the surface of the sliding seat 5, and the cleaning device can squeeze the first pole piece 2 and the sliding seat 5 at the same time.
[0069] In one embodiment of the present disclosure, the second pole piece 3 is arranged in the movement path of the first pole piece 2 through a second buffer mechanism. Figure 2The second buffer mechanism can be a second spring 7, one end of which is connected to the second pole piece 3 and the other end is connected to the base 1. The first spring 6 and the second spring 7 can both be compression springs. The second pole piece 3 and the second spring 7 are sleeved in the first spring 6. The wire 8 passes through the second spring 7 and is connected to the second pole piece 3. The second pole piece 3 is arranged in the first spring 6, which facilitates the movement of the first pole piece 2 until it is completely connected to the second pole piece 3.
[0070] The first pole piece 2 and the second pole piece 3 of the charging device can be provided with at least one group. Figure 2 In the illustrated embodiment, two sets of first and second pole pieces 2 and 3 are provided. The two first pole pieces 2 are connected to the base 1 via their corresponding first buffer mechanisms, and the two second pole pieces 3 are connected to the base 1 via their corresponding second buffer mechanisms. The two first pole pieces 2 are simultaneously disposed on the sliding seat 5 and spaced a certain distance apart. The charging pole piece 4 of the cleaning device can simultaneously contact and conduct electricity with the two first pole pieces 2. The first strokes of the two first pole pieces 2 are equal, and the second strokes of the two second pole pieces 3 are equal, so that the two first pole pieces 2 and the two second pole pieces 3 can move synchronously. Providing two or more sets of first and second pole pieces 2 and 3 can effectively improve charging efficiency.
[0071] Example 2
[0072] The present disclosure also provides a cleaning device, comprising a base 1, and a first electrode 2 and a second electrode 3 connected to the base 1 via a first buffer mechanism and a second buffer mechanism. The first electrode 2 is connected to the base 1 only via the first buffer mechanism, while the second electrode 3 is connected not only to the base 1 but also to a battery in the cleaning device.
[0073] When the cleaning equipment needs to be charged, it moves toward the cleaning base station. During the movement, the charging electrode on the cleaning base station first contacts and conducts with the first electrode on the charging device. After contact, it continues to move toward the base. The first electrode squeezes the first buffer mechanism during the movement of the cleaning base station. The first buffer mechanism moves toward the second electrode within the first stroke. When the first electrode contacts and conducts with the second electrode, the cleaning base station begins to charge the cleaning equipment. The cleaning equipment continues to move due to inertia, squeezing the first and second electrode pieces, causing the first and second buffer mechanisms to continue moving within the second stroke. During the movement of the first and second buffer mechanisms, the impact force of the cleaning equipment is buffered until the cleaning equipment stops moving and is charged in the cleaning base station.
[0074] Example 3
[0075] The present disclosure further provides a cleaning system, comprising the cleaning base station and a cleaning device in Embodiment 1. The cleaning device may be a sweeping robot, a floor scrubbing robot, etc., which is not limited in the present disclosure.
[0076] The structure, connection relationship, positional relationship of each component in the cleaning base station and the process of the cleaning device moving to the cleaning base and charging are the same as those described in Example 1 and will not be repeated here.
[0077] Example 4
[0078] The present disclosure further provides a cleaning system, including a cleaning base station and the cleaning device in Example 2. The cleaning device may be a sweeping robot, a floor scrubbing robot, etc., which is not limited in the present disclosure.
[0079] The structure, connection relationship, positional relationship of each component in the cleaning device and the process of the cleaning device moving toward the cleaning base and charging are the same as those described in Example 2 and will not be described in detail here.
[0080] Example 5
[0081] The present disclosure also provides a charging device, comprising a base 1, a first electrode 2, and a second electrode 3. The first electrode 2 is disposed on the base 1 via a first buffer mechanism, and the second electrode 3 is disposed on the base 1 via a second buffer mechanism. The first electrode 2 is configured to be forced to squeeze the first buffer mechanism and move within a first stroke until it contacts and conducts with the second electrode 3. The first electrode 2 and the second electrode 3 are configured to continue to be forced to squeeze the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke. The other structures, connection relationships, and positional relationships in the charging device are the same as those in the charging device in Example 1 and will not be described in detail here.
[0082] The charging device disclosed herein can be used not only in cleaning base stations and cleaning equipment, but also in other equipment that requires contact charging, and the present disclosure does not impose any restrictions on this.
[0083] Application Scenario 1
[0084] Taking the charging device being located at the cleaning base station as an example, when the cleaning equipment needs to be charged after a long period of work, the cleaning equipment moves to the location of the cleaning base station for charging.
[0085] During the movement of the cleaning equipment toward the cleaning base station, the charging electrode 4 on the cleaning equipment will contact and squeeze the first electrode 2 of the charging device on the cleaning base station. After the first electrode 2 is squeezed, the sliding seat 5 is synchronously squeezed to slide in the direction of the second electrode 3 within the first stroke, and the first buffer mechanism is squeezed during the sliding process until the first electrode 2 and the second electrode 3 are in contact with each other, and the cleaning equipment begins to be charged.
[0086] However, since the cleaning device has a certain inertia in the process of moving toward the cleaning base station, it cannot stop immediately after the first pole piece 2 contacts the second pole piece 3. Therefore, the cleaning device will continue to move toward the cleaning base station, squeezing the first pole piece 2 and the second pole piece 3, driving the first buffer mechanism and the second buffer mechanism to move synchronously toward the direction of the base 1 within the second stroke. The first buffer mechanism and the second buffer mechanism further buffer the cleaning device, and the movement speed of the cleaning device gradually decreases until it stops moving and is charged in the cleaning base station.
[0087] After charging is completed, the cleaning device leaves the cleaning base station, and the first pole piece 2, the second pole piece 3 and the sliding seat 5 are restored to their uncharged positions under the action of the first buffer mechanism and the second buffer mechanism.
[0088] Application Scenario 2
[0089] Taking the case where the charging device is located on the cleaning equipment as an example, when the cleaning equipment needs to be charged after a long period of work, the cleaning equipment moves to the location of the cleaning base station for charging.
[0090] The cleaning device moves toward the cleaning base station until the first electrode 2 contacts the charging electrode 4 on the cleaning base station. The charging electrode 4 squeezes the first electrode 2 and moves in the direction of the second electrode 3 within the first stroke. During the movement of the first electrode 2, the first buffer mechanism is squeezed and moves synchronously until the first electrode 2 contacts the second electrode 3, the first electrode 2 and the second electrode 3 are connected, and the cleaning device starts charging.
[0091] However, since the cleaning device has a certain inertia in the process of moving toward the cleaning base station, it cannot stop immediately after the first pole piece 2 contacts the second pole piece 3. Therefore, the cleaning device will continue to move toward the cleaning base station, squeezing the first pole piece 2 and the second pole piece 3, driving the first buffer mechanism and the second buffer mechanism to move synchronously toward the base 1 within the second stroke. The first buffer mechanism and the second buffer mechanism further buffer the cleaning device, and the movement speed of the cleaning device gradually decreases until it stops moving and is charged in the cleaning base station.
[0092] After charging is completed, the cleaning device leaves the cleaning base station, and the first pole piece 2 and the second pole piece 3 are restored to the position where no charging is performed under the action of the first buffer mechanism and the second buffer mechanism.
[0093] The embodiments of the present disclosure have been described above. The above description is exemplary, not exhaustive, and is not limited to the disclosed embodiments. Many modifications and variations will be apparent to those skilled in the art without departing from the scope and spirit of the described embodiments. The terms used herein are selected to best explain the principles of the embodiments, their practical applications, or technical improvements in the marketplace, or to enable other persons skilled in the art to understand the embodiments disclosed herein. The scope of the present disclosure is defined by the appended claims.
Claims
1. A cleaning base station, characterized in that: A charging device is included, the charging device comprising: Base (1); a first pole piece (2), the first pole piece (2) being arranged on the base (1) via a first buffer mechanism; a second pole piece (3), the second pole piece (3) being arranged on the base (1) via a second buffer mechanism, the second pole piece (3) being configured to be connected to an external power source; The first pole piece (2) is configured to be pressed by the first buffer mechanism and move within a first stroke L1 until it contacts and conducts with the second pole piece (3); the first pole piece (2) and the second pole piece (3) are configured to continue to be pressed by the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke L2.
2. The cleaning base station according to claim 1, characterized in that The cleaning base station is used to accommodate a cleaning device, and the cleaning device is configured such that during movement, a charging electrode (4) provided thereon is configured to contact and conduct with the first electrode (2), and to squeeze the first electrode (2) to move.
3. The cleaning base station according to claim 2, characterized in that The first stroke L1 is greater than the second stroke L2.
4. The cleaning base station according to claim 3, characterized in that The cleaning base station is provided with a limiting mechanism for limiting the moving range of the cleaning device; the range of the limiting mechanism is L3 = L1 + L2.
5. The cleaning base station according to claim 2, characterized in that: The relationship between the braking force F3 of the cleaning device on the cleaning base station, the elastic force F1 provided by the first buffer mechanism in the first and second strokes, and the elastic force F2 provided by the second buffer mechanism in the second stroke is as follows: F3≥F1+F2.
6. The cleaning base station according to claim 5, characterized in that: The elastic force F1 provided by the first buffer mechanism in the first stroke and the second stroke is greater than the elastic force F2 provided by the second buffer mechanism in the second stroke.
7. The cleaning base station according to any one of claims 1 to 6, characterized in that: The charging device comprises a sliding seat (5) guided and engaged on the base (1), and the first pole piece (2) is fixed on the sliding seat (5); the first pole piece (2) is configured to be driven by a force to move the sliding seat (5) relative to the base (1) within a first stroke and a second stroke.
8. The cleaning base station according to claim 7, characterized in that: The first buffer mechanism is a first spring (6) arranged between the sliding seat (5) and the base (1); the sliding seat (5) is configured to compress the first spring (6) when moving within a first stroke and a second stroke.
9. The cleaning base station according to claim 7, characterized in that: The second pole piece (3) is configured to be arranged in the movement path of the first pole piece (2) through the second buffer mechanism.
10. The cleaning base station according to claim 1, characterized in that: The charging device further comprises a wire (8) for conducting with an external power source, wherein the wire (8) is fixed to and conducts with the second pole piece (3).
11. A cleaning device, characterized in that: include: Base (1); a first pole piece (2), the first pole piece (2) being arranged on the base (1) via a first buffer mechanism; a second pole piece (3), the second pole piece (3) being arranged on the base (1) via a second buffer mechanism; The first pole piece (2) is configured to be pressed by the first buffer mechanism and move within a first stroke until it contacts and conducts with the second pole piece (3); the first pole piece (2) and the second pole piece (3) are configured to continue to be pressed by the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke.
12. A cleaning system, characterized in that: The cleaning base station comprises the cleaning base station according to any one of claims 1 to 10, and further comprises a cleaning device; the cleaning device is configured to squeeze the first pole piece (2) to move during the movement.
13. A cleaning system, characterized in that: It comprises a cleaning base station and a cleaning device according to claim 11; the cleaning device is configured to cause the first pole piece (2) to move under pressure during the movement.
14. A charging device, characterized in that: include: Base (1); a first pole piece (2), the first pole piece (2) being arranged on the base (1) via a first buffer mechanism; a second pole piece (3), the second pole piece (3) being arranged on the base (1) via a second buffer mechanism; The first pole piece (2) is configured to be pressed by the first buffer mechanism and move within a first stroke until it contacts and conducts with the second pole piece (3); the first pole piece (2) and the second pole piece (3) are configured to continue to be pressed by the first buffer mechanism and the second buffer mechanism and move synchronously within a second stroke.