Adaptive Intelligent Scheduling Control Method for Copper Chemical Mechanical Polishing Equipment Based on Dispatching Rules

Abstract

An intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules, the method comprising: providing a basic data unit for storing information of each LOT and the copper CMP equipment; providing a parameter configuration unit having equipment parameters, LOT parameters and allocation model parameters, and configuring the parameters so that the scheduling result meets the requirements of the production line; providing a model unit having a main level unit and an auxiliary level unit, the main level unit allocating according to the equipment IDLE (idle time), the available operation LOT time of the equipment, and the available LOTs, and the auxiliary level unit making adjustments on the basis of the main level unit to complete the intelligent scheduling of the copper CMP equipment; a scheduling output unit, calculating to obtain a dispatching list for each equipment, and the equipment dispatching according to the dispatching list. The present invention is not only presented through a scheduling interface, facilitating the production line personnel to query the equipment dispatching schedule, but also can improve the equipment utilization rate and reduce the product quality risk, and is worthy of promotion and use in the industry.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, and in particular to an intelligent scheduling control method for adaptive copper CMP equipment based on dispatching rules. Background Art

[0002] The production of wafers is divided into the front section, middle section and back section, and the back section is called the copper area. In the production process of the copper area, the equipment passed through is copper sputtering equipment, copper electroplating equipment, and copper chemical mechanical polishing equipment.

[0003] As we all know, due to process limitations, the longest waiting time is set for copper electroplating equipment and copper chemical mechanical polishing equipment during the production process, and the longest waiting time cannot be exceeded during the production process. In addition, at least one copper chemical mechanical polishing equipment is in maintenance every day, which requires the processing unit LOT to be scheduled in the copper chemical mechanical polishing equipment to ensure the balance of processing LOT on each equipment.

[0004] Seeking a control method that can intelligently schedule copper chemical mechanical polishing equipment, improve equipment utilization, and reduce product quality risks has become one of the technical problems that technical personnel in this field need to solve urgently.

[0005] Therefore, in response to the problems existing in the prior art, the designers of this case, relying on their many years of experience in this industry, actively researched and improved the method, and thus came up with the present invention, an adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules. Summary of the invention

[0006] The present invention provides an adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules to address the defects in the prior art, such as the traditional copper CMP equipment scheduling affecting the production capacity and failing to ensure the balance of LOT processed by each equipment.

[0007] To achieve the purpose of the present invention, the present invention provides an intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on a dispatching rule, the adaptive copper chemical mechanical polishing equipment intelligent scheduling control method based on a dispatching rule comprising:

[0008] Execute step S1: provide a basic data unit, wherein the basic data unit is used to store information of each card LOT and copper CMP equipment;

[0009] Execute step S2, provide a parameter configuration unit having equipment parameters, LOT parameters and allocation model parameters, and configure the parameters so that the scheduling result meets the production line requirements;

[0010] Execute step S3, provide a model unit with a main level unit and an auxiliary level unit, the main level unit is allocated according to the equipment IDLE (idle time), the equipment operational LOT time, and the operational LOT, and the auxiliary level unit is adjusted based on the main level unit to complete the intelligent scheduling of the copper CMP equipment;

[0011] Execute step S4, the scheduling output unit obtains a scheduling list for each device based on the calculation, and the device is dispatched according to the scheduling list.

[0012] Optionally, the LOT per card stored in the basic data unit is the LOT of all waiting operations from the copper sputtering equipment to the copper chemical mechanical polishing equipment and the LOT that has been operating in the copper CMP equipment.

[0013] Optionally, the allocated LOTs are divided into LOT0 which is already in the copper CMP equipment, LOT1 which is not in the copper CMP equipment and is waiting, and LOT2 which will arrive at the copper CMP equipment within the next T hours.

[0014] Optionally, the basic data unit also needs to prepare other information of each card LOT and copper CMP equipment, the information being at least one of prohibition (Inhibit), machine limitation of the platform, machine operating time period, number of products already in the copper CMP machine, whether it is a run lot (Pirun Lot), and whether the APC system has passed.

[0015] Optionally, the setting of the device parameters, LOT parameters and allocation model parameters further includes:

[0016] Execute step S21 to configure the equipment parameters, set the unavailable time period for each equipment according to the equipment maintenance plan, and do not schedule the equipment during the unavailable time period; when it is detected that the time is at the set unavailable time start point and end time point, the model unit will be started immediately to recalculate; define the number of operable LOTs;

[0017] Execute step S22 to configure the LOT parameters, which will reach the T parameters of the copper CMP equipment within the next T hours;

[0018] Execute step S23 to configure the allocation model parameters: main-level allocation time, i.e., main-level model allocation time point and allocation time interval, with point M as the starting point, allocation at intervals of N hours, cyclic allocation, and the interval time needs to be no greater than the total LOT operation time scheduled for each device; auxiliary-level allocation time, i.e., auxiliary-level model allocation time point and allocation time interval, with point M as the starting point, allocation at intervals of N minutes, cyclic allocation.

[0019] Optionally, the assigned global rule is at least one of Inhibit, remaining Q-time, number of equipment stations from CCU, Q-time urgency, Q-time end time, and number of operable machines.

[0020] Optionally, the assigned local rule is at least one of whether it is a run lot, whether the APC system has passed, and whether the equipment has a non-operating time.

[0021] Optionally, the operable LOTs are allocated, that is, the LOTs are allocated cyclically until all the equipment and LOTs are allocated.

[0022] Optionally, the cyclic allocation of LOT further comprises:

[0023] Execute step S31 to select the first allocated device, that is, select and allocate the first device based on the ascending order of the number of operable LOTs of the device and the ascending order of the IDLE time of the device;

[0024] Execute step S32, filter the operable LOTs of the equipment and sort them, that is, sort them according to the basic information of the equipment, such as the remaining Q-time in descending order, the number of distances to the copper CMP station in ascending order, the Q-time urgency in descending order, the Q-time end time in ascending order, the number of operable machines in ascending order, and select the first LOT;

[0025] Execute step S33 to check whether the non-operation time is set. If the non-operation time is set, go to step S34. Otherwise, determine whether the LOT exceeds the Q-time limit when the device is idle. If not, assign the LOT to the device and update the device IDLE time. Go to step S35. If it exceeds the Q-time limit, assign the LOT to other devices and go to step S32.

[0026] Execute step S34 to detect the inoperable time range. If it is in the inoperable time period, no allocation is performed, and the next device is taken, and the process goes to step S31 for loop. If there is no device to be allocated, the allocation is terminated.

[0027] Execute step S35 to detect the idle time point of the device update. If it does not exceed the next allocation time point, go to step S32 for loop; if it exceeds the next allocation time point, the device is allocated, take the next device, go to step S31 for loop, and if there is no device to allocate, end the allocation.

[0028] In summary, the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention is not only presented in a scheduling interface, which is convenient for production line personnel to query equipment dispatching schedules, but also can improve equipment utilization and reduce product quality risks. It is worthy of promotion and use in the industry. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 The figure shows a flow chart of the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention;

[0030] Figure 2 The figure shows the operation logic diagram of the adaptive copper CMP equipment scheduling based on the dispatching rule of the present invention;

[0031] Figure 3 Shown is the main level unit scheduling logic diagram;

[0032] Figure 4 The figure shows an information configuration interface diagram used by the adaptive copper CMP equipment intelligent scheduling control method based on the dispatching rule of the present invention;

[0033] Figure 5 The following is a visual interface for scheduling;

[0034] Figure 6 It is a comparison diagram of the overall operation capacity of the equipment after the adaptive copper CMP equipment intelligent scheduling control method based on the dispatching rule of the present invention is adopted;

[0035] Figure 7 The figure shows the improvement of equipment utilization after adopting the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention. DETAILED DESCRIPTION

[0036] In order to explain the technical content, structural features, objectives and effects of the present invention in detail, the following will be described in detail with reference to embodiments and accompanying drawings.

[0037] See also Figure 1 , Figure 2 , Figure 1 Shown is a flow chart of the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention. Figure 2 The figure shows the operation logic diagram of the adaptive copper CMP equipment scheduling based on the dispatching rules of the present invention. The adaptive copper CMP equipment intelligent scheduling control method based on the dispatching rules includes:

[0038] Execute step S1: provide a basic data unit, wherein the basic data unit is used to store information of each card LOT and copper CMP equipment;

[0039] As a person skilled in the art, it is easy to understand that the scheduling of copper CMP equipment not only needs to arrange the LOTs of the copper CMP equipment as stations, but also needs to predict and schedule the LOTs that will arrive at the copper CMP equipment as stations in the future. Therefore, the LOTs of each card stored in the basic data unit are all the LOTs waiting for operation from the copper sputtering equipment to the copper chemical mechanical polishing equipment and the LOTs that have been operating in the copper CMP equipment. More specifically, for the allocated LOTs, it can be divided into LOT0 that is already in the copper CMP equipment, LOT1 that is not in the copper CMP equipment as stations and is waiting to be stations, and LOT2 that will arrive at the copper CMP equipment within the next T hours.

[0040] The basic data unit also needs to prepare other information of each card LOT and copper CMP equipment, including but not limited to prohibition (Inhibit), platform machine limitation, machine operating time period, number of products already in the copper CMP machine, whether it is a run lot (Pirun Lot), whether the APC system has passed, etc., which can be prepared and screened according to actual needs.

[0041] Execute step S2, provide a parameter configuration unit having equipment parameters, LOT parameters and allocation model parameters, and configure the parameters so that the scheduling result meets the production line requirements; the setting of the equipment parameters, LOT parameters and allocation model parameters further includes:

[0042] Execute step S21 to configure the equipment parameters, set the unavailable time period for each equipment according to the equipment maintenance plan, and do not schedule the equipment during the unavailable time period; when it is detected that the time is at the set unavailable time start point and end time point, the model unit will be started immediately to recalculate; define the number of operable LOTs;

[0043] Execute step S22 to configure the LOT parameters, which will reach the T parameters of the copper CMP equipment within the next T hours;

[0044] Execute step S23 to configure the allocation model parameters: the main-level allocation time, i.e., the main-level model allocation time point and allocation time interval, with point M as the starting point, allocation at intervals of N hours, and cyclic allocation (for example, the initial value 10 o'clock as the starting point, allocation at intervals of 6 hours), and the interval time needs to be no greater than the total LOT operation time scheduled for each device; the auxiliary-level allocation time, i.e., the auxiliary-level model allocation time point and allocation time interval, with point M as the starting point, allocation at intervals of N minutes, and cyclic allocation (for example, the initial value 10:10 as the starting point, allocation at intervals of 10 minutes).

[0045] Execute step S3, provide a model unit with a main level unit and an auxiliary level unit, the main level unit is allocated according to the equipment IDLE (idle time), the equipment operational LOT time, and the operational LOT, and the auxiliary level unit is adjusted based on the main level unit to complete the intelligent scheduling of the copper CMP equipment;

[0046] The main level unit is the core control unit of the model unit. It allocates the available LOT according to the equipment IDLE (idle time), the equipment operational LOT time, and the available LOT. Among them, the global rules include but are not limited to prohibition, remaining Q-time, the number of copper CMP equipment stations, Q-time urgency, Q-time end time, and the number of operational machines; the local rules include but are not limited to whether it is a run lot (Pirun Lot), whether the APC system has passed, and whether the equipment has a non-operation time;

[0047] More specifically, the predicted equipment IDLE time, that is, the IDLE time of equipment Mi is the estimated end time of all LOTs on equipment Mi. All LOTs include LOTs in operation of the copper CMP equipment and LOTs in the copper CMP equipment that have not yet been operated.

[0048] Predict the number of LOTs that can be operated by the equipment, that is, based on the basic settings of the equipment, such as prohibition (Inhibit), whether it is a run lot (Pirun Lot), whether the APC system has passed and other basic information, check the basic information of the LOT that can be operated by each device.

[0049] Allocating the operable LOTs is called cyclic allocation of LOTs until all equipment and LOTs are allocated. The cyclic allocation of LOTs further includes:

[0050] Execute step S31 to select the first allocated device, that is, select and allocate the first device based on the ascending order of the number of operable LOTs of the device and the ascending order of the IDLE time of the device;

[0051] Execute step S32, filter the operable LOTs of the equipment and sort them, that is, sort them according to the basic information of the equipment, such as the remaining Q-time in descending order, the number of distances to the copper CMP station in ascending order, the Q-time urgency in descending order, the Q-time end time in ascending order, the number of operable machines in ascending order, and select the first LOT;

[0052] Execute step S33 to check whether the non-operation time is set. If the non-operation time is set, go to step S34. Otherwise, determine whether the LOT exceeds the Q-time limit when the device is idle. If not, assign the LOT to the device and update the device IDLE time. Go to step S35. If it exceeds the Q-time limit, assign the LOT to other devices and go to step S32.

[0053] Execute step S34 to detect the inoperable time range. If it is in the inoperable time period, no allocation is performed, and the next device is taken, and the process goes to step S31 for loop. If there is no device to be allocated, the allocation is terminated.

[0054] Execute step S35 to detect the idle time point of the device update. If it does not exceed the next allocation time point, go to step S32 for loop; if it exceeds the next allocation time point, the device is allocated, the next device is taken, and go to step S31 for loop. If there is no device to be allocated, the allocation is terminated.

[0055] See also Figure 3 , Figure 3 The main level unit scheduling logic diagram is shown as follows. The cycle allocation Lot can be integrated and used Figure 3 This is achieved through the main level unit scheduling logic diagram.

[0056] Auxiliary level units are adjusted based on the main level units.

[0057] The main level unit runs at a fixed time every day. In order to prevent the LOT information from changing and causing the pre-allocated equipment to be unable to operate, the auxiliary level unit needs to be adjusted between two runs. That is, it is used to fine-tune the main logic allocation results, mainly considering global rules, including but not limited to LOT status, Q-time LOT, and arrival time correction. Check whether the Q-time end time point of the LOT allocated to the device exceeds the device idle time point. If not, the allocation ends; if exceeded, the LOT is removed from the corresponding device and allocated to other devices until the LOT allocation ends, and then the next LOT is allocated in a cyclic manner.

[0058] Execute step S4, the scheduling output unit obtains the scheduling list of each device according to the calculation, and the device is dispatched according to the scheduling list. Each device corresponds to multiple sequential LOT schedules, and each card LOT corresponds to only one device, which is a one-to-many mapping relationship.

[0059] See also Figure 4 , Figure 5 , Figure 4 The figure shows the information configuration interface adopted by the adaptive copper CMP equipment intelligent scheduling control method based on the work dispatching rule of the present invention. Figure 5Shown is the scheduling visualization interface.

[0060] See also Figure 6 , Figure 7 , Figure 6 Shown is a comparison chart of the overall operating capacity of the equipment after the adaptive copper CMP equipment intelligent scheduling control method based on the dispatching rules of the present invention is adopted. Figure 7 The figure shows the improvement of equipment utilization after the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention is adopted. Figure 6 , Figure 7 It can be seen that the overall daily operation of copper chemical mechanical polishing equipment increased by 536 pieces, and the utilization rate of copper chemical mechanical polishing equipment increased by 2%.

[0061] In summary, the adaptive copper CMP equipment intelligent scheduling control method based on dispatching rules of the present invention is not only presented in a scheduling interface, which is convenient for production line personnel to query equipment dispatching schedules, but also can improve equipment utilization and reduce product quality risks. It is worthy of promotion and use in the industry.

[0062] Those skilled in the art will appreciate that various modifications and variations may be made to the present invention without departing from the spirit or scope of the present invention. Therefore, if any modification or variation falls within the scope of protection of the appended claims and equivalents, it is considered that the present invention covers these modifications and variations.

Claims

1. An intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules, characterized in that, it includes: Performing step S1: Providing a basic data unit for storing information of each LOT and the copper CMP equipment; Performing step S2, providing a parameter configuration unit with equipment parameters, LOT parameters and distribution model parameters, and configuring the parameters to make the scheduling result meet the production line requirements; Performing step S3, providing a model unit with a primary level unit and an auxiliary level unit. The primary level unit allocates according to the equipment IDLE (idle time), the available operation time of the equipment for LOTs, and the available LOTs. The auxiliary level unit makes adjustments based on the primary level unit to complete the intelligent scheduling of the copper CMP equipment; Performing step S4, the scheduling output unit calculates the shipping list for each equipment, and the equipment dispatches work according to the shipping list.

2. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules as described in claim 1, characterized in that, each LOT stored in the basic data unit is all the LOTs waiting for operation from the copper sputtering equipment to the copper chemical mechanical polishing equipment and the LOTs already operating on the copper CMP equipment.

3. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules as described in claim 2, characterized in that, the LOTs already on the copper CMP equipment are divided into LOT0, the LOTs not at the equipment and waiting at the current station of the copper CMP are divided into LOT1, and the LOTs arriving at the copper CMP equipment within the next T hours are divided into LOT2.

4. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules as described in claim 1, characterized in that, the basic data unit also needs to prepare other information of each LOT and the copper CMP equipment, and the information is at least one of Inhibit, machine restrictions of the platform, available operation time periods of the machines, the number of products on the copper CMP machines, whether it is a pirun lot, and whether the APC system passes.

5. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on dispatching rules as described in claim 1, characterized in that, the setting of the equipment parameters, LOT parameters and distribution model parameters further includes: Performing step S21, configuring the equipment parameters, setting the unavailable time periods for each equipment according to the equipment maintenance plan, and not scheduling the equipment during the unavailable time periods; when it is detected that the time is at the start point and end point of the set unavailable time, the model unit will be immediately started for recalculation; defining the number of available LOTs; Performing step S22, configuring the LOT parameters, the T parameter of the LOTs arriving at the copper CMP equipment within the next T hours; Step S23 is executed to configure the allocation model parameters. The main level allocates time, that is, the main level model allocates the time point and time interval. Point M is the starting point, and it is allocated at intervals of N hours and circulated. Moreover, the interval time needs to be no greater than the total operation time of the LOT scheduled for each device; the auxiliary level allocates time, that is, the auxiliary level model allocates the time point and time interval. Point M is the starting point, and it is allocated at intervals of N minutes and circulated.

6. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on the dispatching rule as described in claim 1, characterized in that the global (Global) rules for the main level unit to allocate according to the device IDLE (idle time), the LOT time available for the device operation, and the LOT available for operation are at least one of Inhibit, remaining Q-time, the number of stations from the copper CMP device, the urgency of Q-time, the end time of Q-time, and the number of available machines.

7. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on the dispatching rule as described in claim 1, characterized in that the local (Local) rules for the main level unit to allocate according to the device IDLE (idle time), the LOT time available for the device operation, and the LOT available for operation are at least one of whether it is a pirun lot, whether the APC system passes, and whether the device has a non-operable time.

8. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on the dispatching rule as described in claim 1, characterized in that allocating the LOT available for operation, that is, circulating and allocating the LOT until all devices and LOTs are allocated.

9. The intelligent scheduling control method for an adaptive copper chemical mechanical polishing equipment based on the dispatching rule as described in claim 8, characterized in that the circulating allocation of the LOT further includes: executing step S31 to screen the first allocated device, that is, screening and allocating the first device according to the ascending order of the number of LOTs available for the device operation and the ascending order of the device IDLE time; executing step S32 to screen and sort the LOTs available for the device operation, that is, sorting according to parameters such as the descending order of the remaining Q-time, the ascending order of the number of stations from the copper CMP station, the descending order of the urgency of Q-time, the ascending order of the end time of Q-time, and the ascending order of the number of available machines, and selecting the LOT ranked first; executing step S33 to detect whether a non-operable time is set. If there is a non-operable time, go to step S34. Otherwise, judge whether the LOT exceeds the Q-time limit when this device is idle and this LOT is scheduled to this device. If it does not exceed, allocate this LOT to this device and update the device IDLE time, then go to step S35. If it exceeds the Q-time limit, dispatch this LOT to other devices and go to step S32; executing step S34 to detect the non-operable time range. If it is within the non-operable time period, no allocation is performed, take the next device, and go to step S31 for circulation. If there is no device available for allocation, end the allocation; Execute step S35 to detect the updated idle time point of the device. If it does not exceed the next dispatch time point, go to step S32 for loop; if it exceeds the next dispatch time point, the allocation of this device is completed, take the next device, go to step S31 for loop, and if there is no device available for allocation, end the allocation.

Images