Optimization Method, System and Device for Laser Bitmap Processing Designed for Denim Fabric
By adopting SEI bitmap mode and lower orthogonal axis resolution, adjusting marking parameters and laser motion, the problem of low processing efficiency of existing laser denims is solved, and more efficient denim fabric production is achieved.
Patent Information
- Application Number
- CN202211136164.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-09-19
- Publication Date
- 2025-07-25
- Estimated Expiration
- 2042-09-19
AI Technical Summary
The existing laser denim processing technology is difficult to improve efficiency without increasing the laser power, and the equipment cost increases accordingly, and the processing time is not significantly shortened under the traditional mode.
The SEI bitmap mode and lower orthogonal axis resolution are adopted, and the positions of the meridians and meridians in the orthogonal axis direction are ignored. By adjusting the marking parameters and laser motion characteristics, the marking speed is improved and 50% of the marking time is saved.
Without affecting the quality of marking, the production efficiency of denim fabrics is significantly improved and 50% of marking time is saved.
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Figure CN115592271B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to an optimized method, system and device for laser bitmap processing designed for denim fabrics. Background Art
[0002] As one of the larger application fields of laser processing technology, laser marking technology is also a modern precision processing technology. Compared with traditional processing technologies, its advantages of high efficiency, pollution-free, fast speed and low cost make it have a very broad application prospect. Laser marking technology is a new type of high-precision marking technology. Its working principle is to use a laser beam with a high energy density controlled by a computer to mark various characters, symbols and patterns on the surface of the workpiece to make permanent marks, trademarks, etc. Compared with traditional marking methods such as chemical drug corrosion, mechanical engraving, and ink printing, laser marking technology has incomparable advantages.
[0003] Existing laser denim technologies all import jpg lamp graphics and control the laser intensity according to the gray scale depth of the picture content on the basis of the pixels made in Photoshop. As Figure 2 shown, in order to shorten the laser denim processing time, a galvanometer laser is used in combination with a high-power CO2 laser, and then the focusing spot size is increased at 30 dpi. Therefore, laser denim processing can be directly carried out using 30 to 40 dpi.
[0004] Since most laser equipment manufacturers use 30 to 40 dpi for laser bitmap processing, if the laser bitmap is processed according to this mode, the processing time is the same, and at the same time, it is impossible to increase the denim processing efficiency without increasing the laser power. The higher the laser power, the higher the equipment cost. Summary of the Invention
[0005] The purpose of the present invention is to provide a technical solution for an optimized method, system and device for laser bitmap processing designed for denim fabrics in view of the deficiencies of the existing technology. By adopting the SEI bitmap mode and a lower orthogonal axis resolution, the positions of the warp threads in the orthogonal axis direction can be ignored, the marking speed can be increased, the production efficiency can be improved, the marking quality is not affected, and 50% of the marking time can be saved compared with the traditional mode.
[0006] In order to solve the above technical problems, the present invention adopts the following technical solutions:
[0007] An optimized method for laser bitmap processing designed for denim fabrics, characterized by comprising the following steps:
[0008] S01. Obtain a picture in bitmap format;
[0009] S02. Set marking parameters, where the marking parameters include the marking direction and resolution. The marking direction includes the marking axis direction and the orthogonal axis direction, and the resolution includes the marking axis resolution and the orthogonal axis resolution;
[0010] S03. Adjust the orthogonal axis resolution according to the distance between two adjacent warp threads on the upper surface of the denim;
[0011] S04. Obtain the clarity in the marking axis direction, and control the lasers in the marking axis direction and the orthogonal axis direction to perform marking along the warp threads on the upper surface of the denim according to the movement characteristics of the galvanometer mirrors.
[0012] This optimization method has simple steps. By adopting the SEI bitmap mode and a lower orthogonal axis resolution, the positions of the warp threads in the orthogonal axis direction can be ignored, the marking speed can be increased, the production efficiency can be improved, and the marking quality is not affected. Compared with the traditional mode, 50% of the marking time can be saved.
[0013] Furthermore, the picture in step S01 is imported in the SEI denim mode to form a bitmap format.
[0014] Furthermore, when the picture is in the jpg format, it is parsed by the SEI software, and the marking axis resolution and the orthogonal axis resolution of the picture are resampled and adjusted to enable the galvanometer mirrors to perform marking in the required manner.
[0015] Furthermore, the smaller the orthogonal axis resolution, the shorter the relative marking time.
[0016] Furthermore, the marking axis direction in step S02 is the direction in which the laser travels after focusing.
[0017] Furthermore, the marking axis resolution in step S02 is greater than the orthogonal axis resolution.
[0018] Furthermore, when adjusting the orthogonal axis resolution in step S03, the marking axis resolution remains unchanged.
[0019] Furthermore, the direction in which the laser in step S04 moves includes first moving along the marking axis direction to perform marking, after marking a row of points along the marking axis direction, then moving a distance of one point along the orthogonal axis direction, and then performing marking of the points along the marking axis direction in the next row.
[0020] A laser bitmap processing optimization system, characterized by including:
[0021] An acquisition unit, used to acquire a picture in bitmap format;
[0022] A setting unit, used to set marking parameters, where the marking parameters include the marking direction and resolution. The marking direction includes the marking axis direction and the orthogonal axis direction, and the resolution includes the marking axis resolution and the orthogonal axis resolution;
[0023] An adjustment unit for adjusting the orthogonal axis resolution according to the distance between two adjacent warp threads on the upper surface of the denim fabric.
[0024] A control unit for obtaining the clarity in the marking axis direction and controlling the lasers in the marking axis direction and the orthogonal axis direction to perform marking along the warp threads on the upper surface of the denim fabric according to the movement characteristics of the galvanometer scanner.
[0025] A laser bitmap processing optimization device, characterized by comprising
[0026] A laser, a memory, a processor, and a laser bitmap processing optimization program stored on the memory and executable on the processor. When the laser bitmap processing optimization program is executed by the processor, the steps of the laser bitmap processing optimization method as described above are implemented.
[0027] A computer-readable storage medium, characterized in that a laser bitmap processing optimization program is stored thereon. When the laser bitmap processing optimization program is executed by the processor, the steps of the laser bitmap processing optimization method as described above are implemented.
[0028] Due to the adoption of the above technical solution, the present invention has the following beneficial effects:
[0029] By adopting the SEI bitmap mode and a lower orthogonal axis resolution, the present invention can ignore the positions of the warp threads in the orthogonal axis direction, improve the marking speed, enhance the production efficiency, and do not affect the marking quality. Compared with the traditional mode, it can save 50% of the marking time. At the same time, the depth of the marking can be changed according to the bitmap pixels on the warp threads, showing a gradual change effect in the marked grayscale. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] The present invention will be further described below in conjunction with the accompanying drawings:
[0031] Figure 1 It is a flowchart of the laser bitmap processing optimization method, system, and device designed by the present invention for denim fabrics;
[0032] Figure 2 It is a marking schematic diagram using the normal bitmap mode in the prior art;
[0033] Figure 3 It is a marking schematic diagram using the SEI bitmap mode in the present invention;
[0034] Figure 4 It is a block diagram of the laser bitmap processing optimization system in the present invention.
[0035] In the figure: 401 - acquisition unit; 402 - setting unit; 403 - adjustment unit; 404 - control unit. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0036] It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments may be combined with each other. The present invention will be described in detail below with reference to the drawings and in conjunction with the embodiments.
[0037] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the scope of protection of the present invention.
[0038] It should be noted that the terms "first", "second", etc. in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and do not have to be used to describe a specific order or sequence. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion.
[0039] As Figure 1 shown, a laser bitmap processing optimization method for denim fabric design according to the present invention includes the following steps:
[0040] Step S01: Obtain a picture in bitmap format;
[0041] The picture can be imported through the SEI denim mode to form a bitmap format; when the picture is in jpg format, it is parsed through SEI software, and the marking axis resolution and orthogonal axis resolution of the picture are resampled and adjusted to enable the galvanometer to mark in the required manner.
[0042] Step S02: Set the marking parameters. The marking parameters include the marking direction and resolution. The marking direction includes the marking axis direction and the orthogonal axis direction, and the resolution includes the marking axis resolution and the orthogonal axis resolution. The marking axis resolution is greater than the orthogonal axis resolution. The density of the axial points of the marking axis corresponding to the marking axis direction can be 40-100 dpi, or higher. The dot density in the marking axis direction can be relatively concentrated, without affecting the marking time, while the axial dot density of the orthogonal axis corresponding to the orthogonal axis direction is less than the axial dot density of the marking axis. The SEI bitmap format makes a change on the marking axis, uses a higher resolution to mark along the marking axis direction, and uses a lower resolution in the orthogonal axis direction to ignore the positions of the warp threads, which can effectively improve the marking speed without affecting the marking quality. As Figure 2 and Figure 3As shown, within the specified graphic size, taking 50mm * 50mm as an example, in the normal bitmap mode, there are 40 * 40 dpi in the 50mm * 50mm bitmap, that is, there are 40 points evenly distributed along both the marking axis and the orthogonal axis. While in the SEI bitmap mode, there are 40 * 20 dpi in the 50mm * 50mm bitmap, that is, there are 40 points distributed along the marking axis and 20 points distributed along the orthogonal axis. Without changing the size, the distribution of points changes.
[0043] After the setting is completed, transfer the marking image, marking parameters, and processing requirement parameters to the laser marking machine through the network or removable storage medium. The smaller the orthogonal axis resolution, the shorter the relative marking time.
[0044] The marking parameters also include processing parameters, which mainly refer to speed, power, frequency, pulse width, jump speed, and also include the total number of marking times, filling parameters (filling times / shape / spacing / margin / angle).
[0045] The marking axis direction is the direction in which the laser travels after focusing. The number of times the orthogonal axis moves determines the number of times the galvanometer travels along the marking axis trajectory.
[0046] Step S03: Adjust the orthogonal axis resolution according to the spacing between two adjacent warp threads on the upper surface of the denim; when adjusting the orthogonal axis resolution, the marking axis resolution remains unchanged.
[0047] Step S04: Obtain the clarity in the marking axis direction, and control the lasers in the marking axis direction and the orthogonal axis direction to mark along the warp threads on the upper surface of the denim according to the movement characteristics of the galvanometer. The moving direction of the laser includes first moving along the marking axis direction to mark, after marking a row of points along the marking axis direction, then moving a distance of one point along the orthogonal axis direction to mark the next row of points along the marking axis direction.
[0048] This optimization method has simple steps. By adopting the SEI bitmap mode and a lower orthogonal axis resolution, the positions between warp threads in the orthogonal axis direction can be ignored, the marking speed can be increased, the production efficiency can be improved, the marking quality is not affected, and the marking time can be saved by 50% compared with the traditional mode.
[0049] A laser bitmap processing optimization system, as Figure 4 shown, includes:
[0050] An acquisition unit 401, used to acquire a picture in bitmap format; when the picture is in jpg format, it is parsed through SEI software, and the marking axis resolution and orthogonal axis resolution of the picture are resampled and adjusted to enable the galvanometer to mark in the required manner.
[0051] A setting unit 402 is configured to set marking parameters, where the marking parameters include a marking direction and a resolution. The marking direction includes a marking axis direction and an orthogonal axis direction, and the resolution includes a marking axis resolution and an orthogonal axis resolution. The marking axis resolution is greater than the orthogonal axis resolution. The density of the axial points of the marking axis corresponding to the marking axis direction can be 40 - 100 dpi, or higher. The dot density in the marking axis direction can be relatively concentrated without affecting the marking time, while the axial dot density of the orthogonal axis corresponding to the orthogonal axis direction is less than the axial dot density of the marking axis.
[0052] An adjustment unit 403 is configured to adjust the orthogonal axis resolution according to the distance between two adjacent warp threads on the upper surface of the denim. When the orthogonal axis resolution is adjusted, the marking axis resolution remains unchanged.
[0053] A control unit 404 is configured to obtain the clarity in the marking axis direction and control the lasers in the marking axis direction and the orthogonal axis direction to perform marking along the warp threads on the upper surface of the denim according to the movement characteristics of the galvanometer. The moving direction of the laser includes first moving along the marking axis direction for marking, after marking a row of points along the marking axis direction, then moving a distance of one point along the orthogonal axis direction to perform marking of the next row of points along the marking axis direction.
[0054] A laser bitmap processing optimization device includes
[0055] Lasers, a memory, a processor, and a laser bitmap processing optimization program stored on the memory and executable on the processor. When the laser bitmap processing optimization program is executed by the processor, it implements the steps of the laser bitmap processing optimization method as described above.
[0056] A computer-readable storage medium stores a laser bitmap processing optimization program. When the laser bitmap processing optimization program is executed by the processor, it implements the steps of the laser bitmap processing optimization method as described above.
[0057] Those of ordinary skill in the art will understand that all or some of the steps in the methods disclosed above, and the functional modules / units in systems and devices, can be implemented as software, firmware, hardware, and appropriate combinations thereof. In the hardware implementation, the division of functional modules / units mentioned above does not necessarily correspond to the division of physical components: for example, one physical component can have multiple functions, or one function or step can be executed by several physical components in cooperation. Some or all components can be implemented as software executed by a processor, such as a digital signal processor or a microprocessor, or as hardware, or as an integrated circuit, such as an application-specific integrated circuit. Such software can be distributed on a computer-readable medium, which can include a computer storage medium (or non-transitory medium) and a communication medium (or transitory medium). As is well known to those of ordinary skill in the art, the term computer storage medium includes volatile and non-volatile, removable and non-removable media implemented in any method or technology for storing information, such as computer-readable instructions, data structures, program modules, or other data. Computer storage media include, but are not limited to, RAM, ROM, EEPROM, flash memory or other memory technologies, CD-ROM, digital versatile discs or other optical disc storage, or other magnetic storage devices, or any other medium that can be used to store the desired information and can be accessed by a computer. In addition, as is well known to those of ordinary skill in the art, a communication medium typically contains computer-readable instructions, data structures, program modules, or other data in a modulated data signal such as a carrier wave or other transmission mechanism, and can include any information delivery medium.
[0058] The embodiments of the present application are described with reference to the flowcharts and / or block diagrams of methods, systems, devices, and computer-readable storage media according to the embodiments of the present application. It should be understood that each process and / or block in the flowchart and / or block diagram, and the combination of processes and / or blocks in the flowchart and / or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing terminal devices to generate a machine, such that the instructions executed by the processor of the computer or other programmable data processing terminal devices generate a device for implementing the functions specified in Figure 1 a process and / or block Figure 1 or multiple blocks.
[0059] These computer program instructions can also be stored in a computer-readable memory that can direct a computer or other programmable data processing terminal device to work in a specific manner, such that the instructions stored in the computer-readable memory generate a manufactured article including an instruction device that implements the functions in Figure 1 a process or multiple processes and / or blocks Figure 1The functions specified in one or more boxes.
[0060] These computer program instructions can also be loaded onto a computer or other programmable data processing terminal device, so that a series of operation steps are executed on the computer or other programmable terminal device to generate a computer-implemented process. Thus, the instructions executed on the computer or other programmable terminal device provide for implementing the steps of the functions specified in Figure 1 One process or more processes and / or boxes Figure 1 The steps of the functions specified in one box or more boxes.
[0061] The above are only specific embodiments of the present invention, but the technical features of the present invention are not limited thereto. Any simple changes, equivalent replacements or modifications made on the basis of the present invention to achieve substantially the same technical effects are all covered by the protection scope of the present invention.
Claims
1. An optimized method for laser bitmap processing designed for denim fabrics, characterized in that It includes the following steps: S01. Obtain a picture in bitmap format; the picture is imported in the SEI denim mode to form a bitmap format; when the picture is in jpg format, it is parsed by the SEI software, and the marking axis resolution and orthogonal axis resolution of the picture are resampled and adjusted to enable the galvanometer to mark in the required manner; S02. Set marking parameters, where the marking parameters include a marking direction and a resolution. The marking direction includes a marking axis direction and an orthogonal axis direction, and the resolution includes a marking axis resolution and an orthogonal axis resolution; S03. Adjust the orthogonal axis resolution according to the distance between two adjacent warp threads on the upper surface of the denim; the smaller the orthogonal axis resolution, the relatively shorter the marking time; S04. Obtain the clarity in the marking axis direction, and control the lasers in the marking axis direction and the orthogonal axis direction to mark along the warp threads on the upper surface of the denim according to the movement characteristics of the galvanometer.
2. The laser bitmap processing optimization method for denim fabric design according to claim 1, characterized in that: The marking axis direction in step S02 is the direction in which the laser travels after focusing.
3. The laser bitmap processing optimization method for denim fabric design according to claim 1, characterized in that: The marking axis resolution in step S02 is greater than the orthogonal axis resolution.
4. A laser bitmap processing optimization method for denim fabric design according to claim 1, characterized in that: When the orthogonal axis resolution in step S03 is adjusted, the marking axis resolution remains unchanged.
5. A laser bitmap processing optimization method for denim fabric design according to claim 1, characterized in that: The direction in which the laser in step S04 moves includes first moving along the marking axis direction to mark, after marking a row of points along the marking axis direction, then moving a distance of one point along the orthogonal axis direction to mark the next row of points along the marking axis direction.
6. A laser bitmap processing optimization system, characterized in that It includes: An acquisition unit for obtaining a picture in bitmap format; A setting unit for setting marking parameters, where the marking parameters include a marking direction and a resolution. The marking direction includes a marking axis direction and an orthogonal axis direction, and the resolution includes a marking axis resolution and an orthogonal axis resolution; An adjustment unit for adjusting the orthogonal axis resolution according to the distance between two adjacent warp threads on the upper surface of the denim; A control unit for obtaining the clarity in the marking axis direction and controlling the lasers in the marking axis direction and the orthogonal axis direction to mark along the warp threads on the upper surface of the denim according to the movement characteristics of the galvanometer.
7. A laser bitmap processing optimization device, characterized in that: It includes A laser, a memory, a processor, and a laser bitmap processing optimization program stored on the memory and executable on the processor. When the laser bitmap processing optimization program is executed by the processor, it realizes the steps of the laser bitmap processing optimization method according to any one of claims 1 to 5.
Citation Information
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