Air bath device

By designing a gas-liquid heat exchange unit and a rectifier jet unit in the lithography machine, forming two layers of gas walls, the problem of temperature and pressure gradient caused by the high-speed movement of the workpiece stage in the lithography machine is solved, thereby improving the measurement accuracy and environmental stability of the grating interferometer.

CN115682922BActive Publication Date: 2026-04-07BEIJING U PRECISION TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-09-15
Publication Date
2026-04-07

AI Technical Summary

Technical Problem

In lithography machines, the temperature and pressure gradient changes caused by the high-speed movement of the workpiece stage affect the measurement accuracy of the grating interferometer, and existing gas bath devices cannot effectively solve this problem.

Method used

An air bath device was designed, comprising an air-liquid heat exchange unit and a rectifier jet unit. The temperature gradient is reduced through air-liquid heat exchange, and two layers of air walls with different flow velocities are formed around the optical path area of ​​the optical component to reduce the pressure gradient and stabilize the measurement environment.

Benefits of technology

It improves the measurement accuracy of the grating interferometer in lithography machines, reduces the displacement measurement error at the nanometer resolution, is suitable for use within the limited space of lithography machines, and has high-temperature stability and uniformity.

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Abstract

The present application belongs to the technical field of photoetching machine, and particularly relates to a gas bath device. The gas bath device comprises a gas-liquid heat exchange unit and a rectifying jet unit. The bottom surface of the gas-liquid heat exchange unit is attached to the surface of a heat dissipation component. The gas-liquid heat exchange unit is connected to the rectifying jet unit to input the heat-exchanged gas into the rectifying jet unit. The rectifying jet unit can jet two layers of gas walls with different flow rates to envelope the optical path area of the optical component. The gas bath device can form a double-layer "gas wall" with super-high temperature stability and uniformity around the optical path area of the optical component through the cooperation of the gas-liquid heat exchange unit and the rectifying jet unit, thereby ensuring the measurement accuracy of the measurement system.
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Description

Technical Field

[0001] This invention belongs to the field of photolithography technology, and particularly relates to a gas bath device. Background Technology

[0002] Photolithography machines are ultra-precise, multidisciplinary industrial products and core tools for semiconductor material processing and manufacturing. Grating interferometers, as a core measurement component in photolithography machines, bear the crucial responsibility of providing position measurement feedback for subsystems such as dual-stage, leveling and focusing, and silicon wafer alignment. Due to the ability of gas bath devices to create extremely stable microenvironments, they are widely used in optical measurement, biomedicine, and semiconductor manufacturing. Because of the limitations of photolithography machine usage scenarios and the large temperature and pressure gradients created by the high-speed movement of the stage in the interferometer's optical path, which affect measurement accuracy, the interferometer's gas bath device must be miniaturized, easy to install, and possess excellent temperature control performance.

[0003] Whole-machine air bath devices are a common option in the field of environmental control. They typically use multi-channel input and uniform gas input to provide a stable, uniform and clean working environment for the whole machine. However, the high-speed movement of the motion table breaks this stable and uniform local environment, and the local disturbance airflow causes problems such as a decrease in the measurement accuracy of core optical components.

[0004] Meanwhile, the performance of the gas bath device is determined by the temperature uniformity and stability of its ejected gas. Therefore, the ejection unit of the gas bath device must be far away from the gas source, and the ejected gas must undergo sufficient heat exchange. Due to the compact internal space of the lithography machine, the distance between the gas bath device and the gas source leads to an increase in the gas temperature gradient in the pipeline, causing an imbalance in the temperature stability of the ejected gas. Summary of the Invention

[0005] This invention provides an air bath device to solve the technical problem of measurement accuracy of the measurement system caused by external disturbance gas interference caused by the high-speed movement of the workpiece stage. It can avoid systematic measurement errors caused by environmental changes such as different temperatures and pressures.

[0006] The air bath device of the present invention includes: a gas-liquid heat exchange unit and a rectifier jet unit.

[0007] The bottom surface of the gas-liquid heat exchange unit is in contact with the surface of the heat dissipation component, so that the gas input into the gas-liquid heat exchange unit can exchange heat with the heat exchange liquid in the heat dissipation component.

[0008] The gas-liquid heat exchange unit is connected to the rectifier injection unit to input the heat-exchanged gas into the rectifier injection unit.

[0009] The rectifier jet unit can spray two layers of air walls with different flow rates to enclose the optical path area of ​​the optical components.

[0010] In one embodiment, the gas-liquid heat exchange unit is provided with a plurality of uniformly distributed micro heat exchange channels. The gas-liquid heat exchange unit has an air inlet and an air outlet. The air outlet is connected to the rectifying injection unit, and the air inlet is connected to a gas source. The two ends of the micro heat exchange channels are respectively connected to the air inlet and the air outlet.

[0011] The gas source input from the air inlet disperses the gas into the micro heat exchange channel to exchange heat with the heat exchange liquid in the heat dissipation component. After heat exchange, the gas is collected at the air outlet and input into the rectifier jet unit from the air outlet.

[0012] In one embodiment, a confluence column is provided at the gas junction of two adjacent micro heat exchange channels.

[0013] In one embodiment, an air inlet is provided with an air delivery bend, and the air delivery bend has a variable diameter section with an increased diameter. The gas-liquid heat exchange unit is connected to the gas source through the air delivery bend.

[0014] In one embodiment, the bottom of the gas-liquid heat exchange unit is provided with a heat-conducting base plate made of a material with high thermal conductivity, and the heat-conducting base plate is in contact with the surface of the heat dissipation component.

[0015] In one embodiment, a mounting area for accommodating the optical component is provided on the first surface of the rectifying jet unit, and a first jet port and a second jet port are sequentially arranged from the inside to the outside around the outer periphery of the mounting area.

[0016] The first and second injection ports inject gas at different flow rates, thereby forming two air walls with different flow rates around the optical path area of ​​the optical component.

[0017] In one embodiment, the rectifying injection unit includes a first layer and a second layer stacked together.

[0018] The first layer has a first planar flow channel, and the second layer has a first annular flow channel and a second annular flow channel, with the first annular flow channel located inside the second annular flow channel.

[0019] The first planar flow channel is connected to the gas-liquid heat exchange unit. Both the first annular flow channel and the second annular flow channel are connected to the first planar flow channel. The first annular flow channel is connected to the first injection port, and the second annular flow channel is connected to the second injection port.

[0020] The radial cross-sectional area of ​​the first planar flow channel is greater than the radial cross-sectional area of ​​the first annular flow channel and the radial cross-sectional area of ​​the second annular flow channel.

[0021] In one embodiment, the first annular flow channel is connected to the first planar flow channel through a plurality of first flow holes.

[0022] The second annular flow channel is connected to the first planar flow channel through multiple second flow holes.

[0023] In one embodiment, a gas filtering component is provided in the first annular flow channel and / or the second annular flow channel.

[0024] In one embodiment, the radial width of the first injection port is smaller than the radial width of the second injection port;

[0025] Alternatively, the radial width of the first injection port is greater than the radial width of the second injection port.

[0026] In one embodiment, the second injection port includes a plurality of injection holes spaced apart around the outer periphery of the first injection port.

[0027] Compared with the prior art, the advantages of the present invention are as follows: The air bath device of the present invention is a local air bath device, which is a micro-environment control device for the optical path area of ​​the optical component. The input gas exchanges heat with the heat dissipation component through the gas-liquid heat exchange unit, reducing the temperature gradient. At the same time, the gas after heat exchange is injected at different flow rates through the inner first injection port and the outer second injection port, forming two layers of air walls. This generates a relatively static pressure area around the optical path area of ​​the optical component, reducing the pressure gradient and thus blocking the influence of the environment on the measurement system under high-speed or high-acceleration motion of the workpiece stage. This improves the environmental stability and uniformity near the optical path area, reduces the system error caused by the environment, and ensures the measurement accuracy of the measurement system.

[0028] In summary, the gas bath device of the present invention, through the cooperation of the gas-liquid heat exchange unit and the rectifier jet unit, can form a double-layer "gas wall" with ultra-high temperature stability and uniformity around the optical path area of ​​optical components, and has a wide range of applications in measurement systems such as grating interferometers in lithography machines. Attached Figure Description

[0029] The invention will now be described in more detail with reference to embodiments and the accompanying drawings.

[0030] Figure 1 This is a schematic diagram of the structure of an air bath device according to an embodiment of the present invention;

[0031] Figure 2This is a schematic diagram of the layout of a heat exchange structure according to an embodiment of the present invention;

[0032] Figure 3 This is a schematic diagram of the internal structure of the gas-liquid heat exchange unit according to Embodiment 1 of the present invention;

[0033] Figure 4 This is a schematic diagram of the internal structure of the gas-liquid heat exchange unit according to Embodiment 2 of the present invention;

[0034] Figure 5 This is a schematic diagram of the internal structure of a rectifier injection unit according to an embodiment of the present invention;

[0035] Figure 3 , Figure 4 and Figure 5 The arrows in the diagram indicate the direction of gas flow.

[0036] Figure label:

[0037] 1. Gas-liquid heat exchange unit; 2. Rectifying injection unit; 3. Gas delivery bend;

[0038] 4. Inlet flow channel; 5. Heat dissipation components;

[0039] 11. Micro heat exchanger channel; 12. Converging column; 13. Heat-conducting base plate;

[0040] 21. First injection port; 22. Second injection port; 221. Injection hole;

[0041] 23. First planar flow channel; 24. First annular flow channel; 25. Second annular flow channel;

[0042] 26. Gas filter component; 27. First flow hole; 28. Second flow hole;

[0043] 29. Installation area. Detailed Implementation

[0044] The invention will now be further described with reference to the accompanying drawings.

[0045] like Figure 1-5 As shown, the air bath device of the present invention includes a gas-liquid heat exchange unit 1 and a rectifier jet unit 2. The bottom surface of the gas-liquid heat exchange unit 1 is in contact with the surface of the heat dissipation component 5 so that the gas input into the gas-liquid heat exchange unit 1 exchanges heat with the heat exchange liquid in the heat dissipation component 5. The gas-liquid heat exchange unit 1 is connected to the rectifier jet unit 2 so that the gas after heat exchange is input into the rectifier jet unit 2. The rectifier jet unit 2 can spray two layers of air walls with different flow rates to enclose the optical path area of ​​the optical component.

[0046] The air bath device of the present invention is a local air bath device, which is a micro-environment control device for the optical path area of ​​an optical component. The input gas exchanges heat with the heat dissipation component 5 through the gas-liquid heat exchange unit 1, reducing the temperature gradient. At the same time, the gas after heat exchange is sprayed at different flow rates through the inner first injection port 21 and the outer second injection port 22, forming two layers of air walls. This creates a relatively static pressure area around the optical path area of ​​the optical component, reducing the pressure gradient and thus blocking the influence of the environment under high-speed or high-acceleration motion of the workpiece stage on the measurement system, so as to ensure the measurement accuracy of the measurement system.

[0047] It should be noted that both the gas-liquid heat exchange unit 1 and the rectifier jet unit 2 are mounted on the workpiece stage and move together with the optical components of the measurement system. Furthermore, the gas bath device of this invention occupies little space and is suitable for placement within the limited space inside the grating interferometer measurement system. This addresses the technical problem of external disturbance gas interfering with the measurement accuracy of the measurement system due to the high-speed movement of the workpiece stage, and can reduce the displacement measurement error at the nanometer-level resolution of the grating interferometer measurement system.

[0048] Furthermore, the aforementioned heat dissipation component 5 can be a water-cooled plate, and correspondingly, the aforementioned heat exchange liquid is water. The optical component of the aforementioned measurement system can be the reading head of an interferometer.

[0049] In summary, the gas bath device of the present invention, through the cooperation of the gas-liquid heat exchange unit 1 and the rectifier jet unit 2, can form a double-layer "gas wall" with ultra-high temperature stability and uniformity around the optical path area of ​​the optical component, and has a wide range of applications in measurement systems such as grating interferometers of lithography machines.

[0050] Therefore, this paper presents a novel pipeline design method to address the temperature stability and uniformity of the injected gas. This gas bath device employs a special manufacturing process, resulting in pipelines with diameters of only a few millimeters and uniform, densely distributed pipes, further enhancing heat exchange efficiency and reducing the temperature gradient.

[0051] The gas-liquid heat exchange unit 1 will be described in detail below.

[0052] In this invention, the gas-liquid heat exchange unit 1 is provided with multiple uniformly distributed micro heat exchange channels 11. The gas-liquid heat exchange unit 1 has an air inlet and an air outlet. The air outlet is connected to the rectifying jet unit 2, and the air inlet is connected to the air source. The two ends of the micro heat exchange channels 11 are respectively connected to the air inlet and the air outlet. The gas input from the air source through the air inlet is dispersed into the micro heat exchange channels 11 to exchange heat with the heat exchange liquid in the heat dissipation component 5. After heat exchange, the gas is collected at the air outlet and input into the rectifying jet unit 2.

[0053] In this invention, multiple uniformly distributed micro-heat exchange channels 11 within the gas-liquid heat exchange unit 1 achieve sufficient heat exchange between the input gas and the heat dissipation component 5, further improving heat exchange efficiency and reducing the temperature gradient. The diameter of each micro-heat exchange channel 11 is only a few millimeters.

[0054] Among them, the lengths of the multiple micro heat exchange channels 11 are (approximately) the same, so that the gas flow rate and heat exchange time in each micro heat exchange channel 11 are consistent, reducing the temperature gradient between the gases that converge at the outlet, thereby achieving better heat exchange effect.

[0055] Preferably, the micro heat exchange channel 11 is a tortuous channel, thereby increasing the length of the micro heat exchange channel 11 within a limited arrangement space to achieve sufficient heat exchange.

[0056] Preferably, a confluence column 12 is provided at the gas confluence of two adjacent micro heat exchange channels 11 to reduce vortices and collisions generated at the gas confluence, reduce device vibration and noise, and thus ensure the measurement accuracy of the measurement system.

[0057] Preferably, such as Figure 1 As shown, a gas-liquid heat exchange unit 1 has a gas delivery bend 3 at its air inlet. The gas delivery bend 3 has a diameter-increasing variable section, and the gas-liquid heat exchange unit 1 is connected to the gas source through the gas delivery bend 3. The bend design has a shock-absorbing effect, preventing the gas from directly spraying onto the wall and causing vibration. Furthermore, the variable diameter section of the gas delivery bend 3 provides a buffer space for the gas, which can reduce vibration and noise.

[0058] Preferably, the bottom of the gas-liquid heat exchange unit 1 is provided with a heat-conducting base plate 13 made of a material with high thermal conductivity, and the heat-conducting base plate 13 is in contact with the surface of the heat dissipation component 5. Further, the heat-conducting base plate 13 is made of thermally conductive silicone material, wherein the thermally conductive silicone material itself is loose and has flowability when pressed, thus having the function of shock absorption and noise absorption.

[0059] Specifically, the outlet of the gas-liquid heat exchange unit 1 is connected to the inlet of the rectifier jet unit 2 through the input flow channel 4.

[0060] Example 1

[0061] like Figure 3 As shown, after the gas supplied by the gas source is input through the gas inlet of the gas-liquid heat exchange unit 1, the input gas is evenly distributed into two gas paths, and each gas path is further divided into four micro heat exchange channels 11 (from the outside to the inside on the left, the first channel, the second channel, the third channel, and the fourth channel are respectively; from the outside to the inside on the right, the fifth channel, the sixth channel, the seventh channel, and the eighth channel are respectively).

[0062] Example 2

[0063] like Figure 4 As shown, after the gas supplied by the gas source is input through the air inlet of the gas-liquid heat exchange unit 1, the input gas is evenly distributed into two gas paths. Each gas path is further divided into four micro heat exchange channels 11 (from the outside to the inside on the left, they are the first channel, the second channel, the third channel, and the fourth channel; from the outside to the inside on the right, they are the fifth channel, the sixth channel, the seventh channel, and the eighth channel). Among them, the gas velocity in the outermost first and fifth channels is relatively fast. Therefore, the portion of the first and fifth channels near the air inlet is further divided into three channels to reduce the gas velocity. In addition, to reduce the vortex and collision generated at the airflow convergence point, cylindrical confluence columns 12 are added at their respective airflow convergence points in the first and fifth channels, thereby reducing vibration and noise. At the junction of the airflows in the third and seventh flow channels and at the junction of the airflows in the fourth and eighth flow channels, a long strip-shaped confluence column 12 is set to guide and converge the airflows, thereby reducing the noise and vibration generated by the collision of airflows on both sides.

[0064] The following is a detailed description of the rectifier jet unit 2.

[0065] In this invention, a mounting area 29 for accommodating optical components of a measurement system is provided on the first surface of the rectifier jet unit 2. A first jet port 21 and a second jet port 22 are arranged sequentially from the inside to the outside around the outer periphery of the mounting area 29. The first jet port 21 and the second jet port 22 respectively jet gas (after heat exchange) at different flow rates, thereby forming two layers of air walls with different flow rates around the optical path area of ​​the optical components.

[0066] Example 3

[0067] In this embodiment, the rectifying injection unit 2 includes a first layer and a second layer stacked together. The first layer is provided with a first planar flow channel 23, and the second layer is provided with a first annular flow channel 24 and a second annular flow channel 25 sequentially from the inside to the outside. The first planar flow channel 23 is connected to the gas-liquid heat exchange unit 1, and both the first annular flow channel 24 and the second annular flow channel 25 are connected to the first planar flow channel 23. The first annular flow channel 24 is connected to the first injection port 21, and the second annular flow channel 25 is connected to the second injection port 22. The radial cross-sectional area of ​​the first planar flow channel 23 is larger than the radial cross-sectional area of ​​the first annular flow channel 24 and the radial cross-sectional area of ​​the second annular flow channel 25, respectively.

[0068] In this embodiment, the arrangement of two channels in the rectifier jet unit 2 makes the airflow channel smaller and smaller, gradually forming jet pressure, and finally ejected from the first jet port 21 and the second jet port 22 to form a double-layer air wall.

[0069] Specifically, such as Figure 5 As shown, the first annular flow channel 24 is connected to the first planar flow channel 23 through multiple first flow holes 27, and the second annular flow channel 25 is connected to the first planar flow channel 23 through multiple second flow holes. The connection between the two flow channels of the rectifying jet unit 2 via several flow holes achieves a uniform airflow effect with low wind resistance, allowing the rectifying jet unit 2 to eject airflow at a high velocity, making it suitable for installation on workpiece stages with relatively high movement speeds.

[0070] Example 4

[0071] This embodiment describes the differences from Embodiment 3, while the similarities will not be repeated.

[0072] In this embodiment, the radial width of the first injection port 21 is smaller than the radial width of the second injection port 22.

[0073] like Figure 1 As shown, the inner first nozzle 21 has a smaller radial width, specifically an annular nozzle slit, for spraying relatively high-speed "turbulent flow"; the outer second nozzle 22 has a larger radial width, for spraying relatively low-speed "laminar flow".

[0074] Specifically, the second injection port 22 includes a plurality of injection holes 221, which are spaced apart around the outer periphery of the first injection port 21. The second injection port 22 is formed by spaced-apart injection holes 221 for ease of implementation.

[0075] Preferably, a gas filter component 26, such as a porous medium, is provided inside the second annular flow channel 25. The gas filter component 26 is a loose, porous, anisotropic material (i.e., a porous medium), which can reduce the flow noise generated by the airflow in the narrow flow channel, increase the injection pressure at the rectifying injection unit 2, and enable the rectifying injection unit 2 to inject airflow stably and uniformly.

[0076] Example 5

[0077] This embodiment describes the differences from Embodiments 3 and 4, while the similarities will not be repeated.

[0078] In this embodiment, the radial width of the first injection port 21 is greater than the radial width of the second injection port 22.

[0079] In this embodiment, the radial width of the outer second injection port 22 is smaller, specifically an annular injection slit, for injecting relatively high-speed "turbulent flow"; the radial width of the inner first injection port 21 is larger, for injecting relatively low-speed "laminar flow".

[0080] Specifically, the first injection port 21 includes a plurality of injection holes 221, which are spaced apart around the outer periphery of the mounting area 29. The first injection port 21 is formed by spaced-apart injection holes 221 for ease of implementation.

[0081] Preferably, a gas filter component 26, such as a porous medium, is provided inside the first annular flow channel 24. The gas filter component 26 is a loose, porous, anisotropic material (i.e., a porous medium), which can reduce the flow noise generated by the airflow in the narrow flow channel, increase the injection pressure at the rectifying injection unit 2, and enable the rectifying injection unit 2 to inject airflow stably and uniformly.

[0082] The primary objective of this invention is to address the systematic measurement errors caused by environmental variations such as temperature and pressure in planar grating interferometry modules used in lithography machines. By controlling the environment around the interferometry modules immersed in the lithography machine, ultra-high precision in environmental control indicators such as temperature stability, temperature uniformity, and pressure gradient can be achieved. Compared to existing whole-machine air bath devices, the air bath device of this invention fully considers the spatial dimensions between the interferometer's optical components and the planar grating, featuring a compact structure, detachability, and ease of maintenance, effectively reducing the impact of temperature and pressure caused by the high-speed movement of the workpiece stage.

[0083] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0084] The terms "upper" and "lower" used in this invention are defined according to their common meaning. For example, referring to the direction of gravity, the direction of gravity is downward, and the opposite direction is upward. Similarly, "upper" is the top, and "lower" is the bottom. Likewise, for ease of understanding and description, "inner" and "outer" refer to the inner and outer contours relative to the outline of each component itself. They are only for clarity of description and are not used to limit the scope of the invention. Changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered within the scope of the invention. Furthermore, the terms "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first," "second," "third," and "fourth" may explicitly or implicitly include one or more of that feature.

[0085] Although the invention has been described with reference to preferred embodiments, various modifications can be made and components can be replaced with equivalents without departing from the scope of the invention. In particular, the technical features mentioned in the various embodiments can be combined in any manner as long as there is no structural conflict. The invention is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A gas bath device, characterized in that, include: Gas-liquid heat exchange unit and rectifier jet unit, The bottom surface of the gas-liquid heat exchange unit is in contact with the surface of the heat dissipation component, so that the gas input into the gas-liquid heat exchange unit can exchange heat with the heat exchange liquid in the heat dissipation component. The gas-liquid heat exchange unit is connected to the rectifier jet unit to input the heat-exchanged gas into the rectifier jet unit. The gas-liquid heat exchange unit is provided with multiple micro heat exchange channels that are evenly and densely distributed. The rectifier jet unit can jet two layers of air walls with different flow rates to enclose the optical path area of ​​the optical components; The first surface of the rectifying jet unit is provided with a mounting area for accommodating the optical component, and a first jet nozzle and a second jet nozzle are arranged sequentially from the inside to the outside around the outer periphery of the mounting area. The first and second injection ports inject gas at different flow rates, thereby forming two air walls with different flow rates around the optical path area of ​​the optical component.

2. The air bath device according to claim 1, characterized in that, The gas-liquid heat exchange unit has an air inlet and an air outlet. The air outlet is connected to the rectifier injection unit, and the air inlet is connected to a gas source. The two ends of the micro heat exchange channel are respectively connected to the air inlet and the air outlet. The gas source input from the air inlet disperses the gas into the micro heat exchange channel to exchange heat with the heat exchange liquid in the heat dissipation component. After heat exchange, the gas is collected at the air outlet and input into the rectifier jet unit from the air outlet.

3. The air bath device according to claim 2, characterized in that, A confluence column is provided at the gas junction of two adjacent micro heat exchange channels.

4. The air bath device according to claim 2, characterized in that, An air inlet is provided with an air delivery bend, and the air delivery bend has a variable diameter section with an increased diameter. The gas-liquid heat exchange unit is connected to the air source through the air delivery bend.

5. The air bath device according to any one of claims 1-4, characterized in that, The bottom of the gas-liquid heat exchange unit is provided with a heat-conducting base plate made of a material with high thermal conductivity, and the heat-conducting base plate is in contact with the surface of the heat dissipation component.

6. The air bath device according to claim 1, characterized in that, The rectifying injection unit includes a first layer and a second layer stacked together. The first layer has a first planar flow channel, and the second layer has a first annular flow channel and a second annular flow channel arranged sequentially from the inside to the outside. The first planar flow channel is connected to the gas-liquid heat exchange unit. Both the first annular flow channel and the second annular flow channel are connected to the first planar flow channel. The first annular flow channel is connected to the first injection port, and the second annular flow channel is connected to the second injection port. The radial cross-sectional area of ​​the first planar flow channel is greater than the radial cross-sectional area of ​​the first annular flow channel and the radial cross-sectional area of ​​the second annular flow channel.

7. The air bath device according to claim 6, characterized in that, The first annular flow channel is connected to the first planar flow channel through multiple first flow holes. The second annular flow channel is connected to the first planar flow channel through multiple second flow holes.

8. The air bath device according to claim 6, characterized in that, A gas filtration component is provided in the first annular flow channel and / or the second annular flow channel.

9. The air bath device according to claim 1, characterized in that, The radial width of the first injection port is smaller than the radial width of the second injection port; Alternatively, the radial width of the first injection port is greater than the radial width of the second injection port.

10. The air bath device according to claim 1, characterized in that, The second injection port includes a plurality of injection holes, which are spaced apart around the outer periphery of the first injection port.

Citation Information

Patent Citations

  • Air bath device, preparation method of air bath device and photolithography equipment

    CN109725494A

  • Gas bath cavity structure, gas bath device and photoetching equipment

    CN110658682A