Gas mixing device, method and semiconductor process system

Abstract

The application relates to a gas mixing device, a method and a semiconductor process system, which comprise a first gas conveying unit, a second gas conveying unit, a concentration monitoring unit, a mixing buffer unit, an exhaust unit, a pressure relief unit and a purge unit. The device has the advantages that the concentration monitoring unit can be used for high-precision and low-concentration gas dilution, thereby meeting different process requirements; the mixing buffer unit is used for mixing and diluting a first gas source conveyed by the first gas conveying unit and a second gas source conveyed by the second gas conveying unit on site to reach a process-required concentration, thereby prolonging the single-use time of the second gas source, reducing the frequency of replacing the second gas source and improving process efficiency; and the exhaust unit, the pressure relief unit and the purge unit are matched to empty, purge and depressurize the pipeline of the gas mixing device and the mixing buffer unit, meet clean requirements, avoid residual previous process gas sources and thus can perform gas source replacement operation.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor production, and in particular to a gas mixing device, a gas mixing method and a semiconductor process system. BACKGROUND

[0002] In the semiconductor production process, mixed gases are generally used, such as 20PPM-200PPM of PH3 / H2, B2H6 / H2, etc., 3%-5% of H2 / N2, etc. For epitaxial equipment, a lot of low-concentration PH3 / H2 and B2H6 / H2 are used. The semiconductor process has high requirements for the stability of the gas concentration when using these gases. The general gas supply mode is a 40L or 47L finished product mixed gas cylinder.

[0003] After each cylinder is used up, the pipeline needs to be re-purged and replaced to remove the residual mixed gas in the pipeline, and then the cylinder is replaced. However, if the gas consumption increases and large cylinders cannot be used for gas supply, the frequency of replacing the cylinder will increase, which not only increases the process cost but also affects the process efficiency.

[0004] In addition, some mixed gases have a shelf life. If the mixed gas is not used for a long time, the mixed gas will decompose, thereby affecting the gas concentration and failing to ensure the accuracy of the gas concentration, thereby affecting the process efficiency.

[0005] In order to solve the above problems, the prior art adopts a method of mixing gas on site. Generally, two different gas sources are introduced into a gas mixing tank for mixing, and then transported to the process chamber. However, this gas mixing method cannot guarantee the uniformity of the concentration, thereby affecting the process efficiency and reducing the product yield.

[0006] At present, there is no effective solution to the problems of high cylinder replacement frequency, low process efficiency, and inability to guarantee the uniformity of the concentration of the mixed gas on site in the related art. SUMMARY

[0007] The purpose of the present application is to solve the problems of high cylinder replacement frequency, low process efficiency, and inability to guarantee the uniformity of the concentration of the mixed gas on site in the related art by providing a gas mixing device, a gas mixing method and a semiconductor process system.

[0008] To achieve the above purpose, the technical solution adopted by the present application is as follows:

[0009] In a first aspect, the present application provides a gas mixing device, comprising:

[0010] a first gas delivery unit for delivering a first gas source to a downstream;

[0011] The second gas delivery unit is used to deliver a second gas source downstream;

[0012] A concentration monitoring unit, which is connected to the second gas delivery unit, is used to monitor the concentration of the second gas source;

[0013] A mixing buffer unit is connected to the first gas delivery unit and the second gas delivery unit respectively, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and to deliver the mixed gas source to the process chamber;

[0014] An exhaust unit is connected to the first gas delivery unit, the second gas delivery unit, and the mixing buffer unit, respectively.

[0015] The pressure relief unit is connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the exhaust unit, respectively.

[0016] The purging unit is connected to the first gas delivery unit and the second gas delivery unit respectively.

[0017] In some embodiments, the first gas delivery unit includes:

[0018] A first gas delivery element is connected to the mixing buffer unit and is used to deliver a first gas source to the mixing buffer unit;

[0019] A first valve element is disposed in a pipeline that is connected to the first gas delivery element and the mixing buffer unit respectively, and is used to control the opening and closing of the pipeline;

[0020] The second valve element is disposed in a pipeline that is connected to the first gas delivery element and the mixing buffer unit respectively, and is located downstream of the first valve element, for controlling the opening and closing of the pipeline;

[0021] A first pressure monitoring element is disposed in a pipeline that is connected to the first gas delivery element and the mixing buffer unit respectively, and is used to monitor the pipeline pressure.

[0022] A first flow monitoring element is disposed in a pipeline that is connected to the first gas delivery element and the mixing buffer unit respectively, and is used to monitor the flow rate of the first gas source.

[0023] In some embodiments, the second gas delivery unit includes:

[0024] The second gas delivery element is connected to the mixing buffer unit and is used to deliver a second gas source to the mixing buffer unit.

[0025] a third valve element disposed in a pipe communicating with the second gas delivery element and the mixing buffer unit, for controlling opening and closing of the pipe;

[0026] a fourth valve element disposed in a pipe communicating with the second gas delivery element and the mixing buffer unit, downstream of the third valve element, for controlling opening and closing of the pipe;

[0027] a second pressure monitoring element disposed in a pipe communicating with the second gas delivery element and the mixing buffer unit, for monitoring pressure of the pipe;

[0028] a second flow monitoring element disposed in a pipe communicating with the second gas delivery element and the mixing buffer unit, for monitoring flow of the second gas source.

[0029] 2buffer unit, for monitoring flow of the second gas source.

[0030] In some embodiments, the mixing buffer unit comprises:

[0031] a mixing buffer element communicating with the first gas delivery unit, the second gas delivery unit, the exhaust unit, and the pressure relief unit, for mixing the first gas source and the second gas source to obtain a mixed gas source, and delivering the mixed gas source to the process chamber;

[0032] a fifth valve element disposed in a pipe communicating with the first gas delivery unit, the second gas delivery unit, the mixing buffer element, and the exhaust unit, for controlling gas flow direction of the pipe;

[0033] a sixth valve element disposed in a pipe communicating with the first gas delivery unit, the second gas delivery unit, and the mixing buffer element, downstream of the fifth valve element, for controlling opening and closing of the pipe;

[0034] a seventh valve element disposed in a pipe communicating with the mixing buffer element and the process chamber, for controlling opening and closing of the pipe;

[0035] a third pressure monitoring element disposed in a pipe communicating with the mixing buffer element and the process chamber, for monitoring pressure of the pipe.

[0036] In some embodiments, the mixing buffer unit further comprises:

[0037] a fourth gas delivery element in communication with the mixing buffer element;

[0038] a fourteenth valve element disposed in a line in communication with the mixing buffer element, the fourth gas delivery element, respectively.

[0039] In some embodiments thereof, the exhaust unit comprises:

[0040] a first vacuum element in communication with the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, the pressure relief unit, respectively;

[0041] an eighth valve element disposed in a line in communication with the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, the first vacuum element, the pressure relief unit, respectively;

[0042] a ninth valve element disposed in a line in communication with the first vacuum element for controlling a line for exhausting gas out of the first vacuum element;

[0043] a tenth valve element disposed in a line in communication with the first vacuum element for controlling a line for delivering a gas source to the first vacuum element.

[0044] In some embodiments thereof, the pressure relief unit comprises:

[0045] a second vacuum element in communication with the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, the exhaust unit, respectively;

[0046] an eleventh valve element disposed in a line in communication with the mixing buffer unit, the exhaust unit, the second vacuum element, respectively;

[0047] a twelfth valve element disposed in a line in communication with the mixing buffer unit, the exhaust unit, the second vacuum element, respectively.

[0048] In some embodiments thereof, the pressure relief unit further comprises:

[0049] a fifteenth valve element disposed in a line in communication with the mixing buffer unit, the second vacuum element, respectively;

[0050] a fourth pressure monitoring element disposed in a line in communication with the mixing buffer unit, the second vacuum element, respectively, for monitoring line pressure.

[0051] In some embodiments, the purging unit comprises:

[0052] a third gas conveying element in communication with the first gas conveying unit and the second gas conveying unit, respectively;

[0053] a thirteenth valve element disposed in a pipeline in communication with the first gas conveying unit, the second gas conveying unit and the third gas conveying element, respectively.

[0054] In some embodiments, the gas mixing device further comprises:

[0055] a security assurance unit disposed at the top of the environment where the gas mixing device is located, for monitoring environmental information.

[0056] In some embodiments, the security assurance unit comprises:

[0057] a smoke monitoring element disposed at the top of the environment where the gas mixing device is located, for monitoring smoke information of the environment;

[0058] a liquid spraying element disposed at the top of the environment where the gas mixing device is located, for spraying liquid to the environment;

[0059] a switching element disposed at the top of the environment where the gas mixing device is located;

[0060] a blowing element disposed at the top of the environment where the gas mixing device is located, for discharging gas of the environment.

[0061] In a second aspect, the present application provides a gas mixing method applied to the gas mixing device as described in the first aspect.

[0062] In a third aspect, the present application provides a semiconductor process system comprising:

[0063] the gas mixing device as described in the first aspect.

[0064] Compared with the prior art, the present application has the following technical effects:

[0065] The gas mixing device, method and semiconductor process system can monitor the concentration of the second gas source provided by the second gas delivery unit through the concentration monitoring unit, accurately dilute the high-concentration gas on site, reduce the frequency of replacing the second gas source, and improve the process efficiency; the first gas source delivered by the first gas delivery unit and the second gas source delivered by the second gas delivery unit are mixed and diluted on site by the mixing buffer unit to reach the concentration required by the process, thereby prolonging the single-use time of the second gas source, reducing the frequency of replacing the second gas source, and further improving the process efficiency; in addition, the concentration monitoring unit can dilute the gas with high precision and low concentration, thereby meeting different process requirements; through the cooperation of the exhaust unit, the pressure relief unit and the purge unit, the pipeline of the gas mixing device and the mixing buffer unit can be emptied, purged and pressure relieved, meeting the cleanliness requirement, avoiding the residual previous process gas source, and thereby the gas source replacement operation can be performed. BRIEF DESCRIPTION OF DRAWINGS

[0066] Figure 1 is a schematic diagram of a gas mixing device according to an embodiment of the present application (one);

[0067] Figure 2 is a schematic diagram of a first gas delivery unit according to an embodiment of the present application;

[0068] Figure 3 is a schematic diagram of a second gas delivery unit according to an embodiment of the present application;

[0069] Figure 4 is a schematic diagram of a mixing buffer unit according to an embodiment of the present application (one);

[0070] Figure 5 is a schematic diagram of an exhaust unit according to an embodiment of the present application;

[0071] Figure 6 is a schematic diagram of a pressure relief unit according to an embodiment of the present application (one);

[0072] Figure 7 is a schematic diagram of a purge unit according to an embodiment of the present application;

[0073] Figure 8 is a schematic diagram of a mixing buffer unit according to an embodiment of the present application (two);

[0074] Figure 9 is a schematic diagram of a pressure relief unit according to an embodiment of the present application (two);

[0075] Figure 10 is a schematic diagram of a gas mixing device according to an embodiment of the present application (two);

[0076] Figure 11 is a schematic diagram of a safety guarantee unit according to an embodiment of the present application;

[0077] Figure 12 is a specific embodiment of the gas mixing device according to the embodiments of the present application.

[0078] wherein the reference signs are: 100, first gas delivery unit; 110, first gas delivery element; 120, first valve element; 130, second valve element; 140, first pressure monitoring element; 150, first flow monitoring element;

[0079] 200, second gas delivery unit; 210, second gas delivery element; 220, third valve element; 230, fourth valve element; 240, second pressure monitoring element; 250, second flow monitoring element;

[0080] 300, concentration monitoring unit;

[0081] 400, mixing buffer unit; 410, mixing buffer element; 420, fifth valve element; 430, sixth valve element; 440, seventh valve element; 450, third pressure monitoring element; 460, fourth gas delivery element; 470, fourteenth valve element;

[0082] 500, exhaust unit; 510, first vacuum element; 520, eighth valve element; 530, ninth valve element; 540, tenth valve element;

[0083] 600, pressure relief unit; 610, second vacuum element; 620, eleventh valve element; 630, twelfth valve element; 640, fifteenth valve element; 650, fourth pressure monitoring element;

[0084] 700, purge unit; 710, third gas delivery element; 720, thirteenth valve element;

[0085] 800, safety assurance unit; 810, smoke monitoring element; 820, liquid spraying element; 830, switch element; 840, air blowing element. DETAILED DESCRIPTION

[0086] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be described and illustrated in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application. Based on the embodiments provided herein, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of the present application.

[0087] It is apparent that the accompanying drawings described below in the description are only some examples or embodiments of the present application, and for those skilled in the art, the present application can be applied to other similar situations according to these drawings without creative labor. In addition, it can be understood that although the efforts made in this development process can be complex and lengthy, some design, manufacture or production changes based on the technology disclosed in the present application are only routine technical means for those skilled in the art related to the disclosure of the present application, and should not be understood as insufficient disclosure of the present application.

[0088] Reference to "an embodiment" in this application means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the application. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are they necessarily mutually exclusive of other embodiments. It is explicitly contemplated that embodiments described herein can be combined with other embodiments in suitable combinations, even if not explicitly made such combinations.

[0089] Unless otherwise defined, technical terms or scientific terms used in the present application should be understood as their common meanings to those skilled in the art. The terms "a", "an", "one", "the", and similar terms in the present application do not represent quantity limitation, but can represent singular or plural. The terms "include", "contain", "have", and any variations thereof in the present application are intended to cover non-exclusive inclusion; for example, a process, method, system, product or device including a series of steps or units (units) is not limited to the listed steps or units, but can also include steps or units not listed, or can also include other steps or units inherent to these processes, methods, products or devices. The terms "connect", "connect", "couple" and similar terms in the present application are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The term "multiple" in the present application refers to two or more. The association between the associated objects described by "and / or" can represent three relationships, for example, "A and / or B" can represent three cases: A exists alone, A and B exist together, and B exists alone. The character " / " generally represents an "or" relationship between the associated objects. The terms "first", "second", "third" and the like in the present application are only to distinguish similar objects, and do not represent a specific order for the objects.

[0090] Embodiment 1

[0091] This embodiment relates to the gas mixing device of the present application.

[0092] An exemplary embodiment of the present application, as shown in Figure 1 A gas mixing device, including a first gas delivery unit 100, a second gas delivery unit 200, a concentration monitoring unit 300, a mixing buffer unit 400, an exhaust unit 500, a pressure relief unit 600 and a purge unit 700. The first gas delivery unit 100 is configured to deliver a first gas source downstream; the second gas delivery unit 200 is configured to deliver a second gas source downstream; the concentration monitoring unit 300 is in communication with the second gas delivery unit 200 and configured to monitor the concentration of the second gas source; the mixing buffer unit 400 is in communication with the first gas delivery unit 100 and the second gas delivery unit 200 respectively, and configured to mix the first gas source and the second gas source to obtain a mixed gas source and deliver the mixed gas source to a process chamber; the exhaust unit 500 is in communication with the first gas delivery unit 100, the second gas delivery unit 200 and the mixing buffer unit 400 respectively; the pressure relief unit 600 is in communication with the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400 and the exhaust unit 500 respectively; the purge unit 700 is in communication with the first gas delivery unit 100 and the second gas delivery unit 200 respectively.

[0093] The gas mixing method of the present application is as follows:

[0094] (I) Gas mixing

[0095] The first gas delivery unit 100 delivers the first gas source (generally single component) to the mixing buffer unit 400;

[0096] The second gas delivery unit 200 delivers the second gas source (generally mixed component) to the mixing buffer unit 400;

[0097] The concentration monitoring unit 300 monitors the concentration of the second gas source and controls the flow rate of the first gas source and the flow rate of the second gas source according to the concentration of the second gas source;

[0098] The mixing buffer unit 400 mixes the first gas source and the second gas source into a mixed gas with a preset concentration;

[0099] The mixing buffer unit 400 delivers the mixed gas to the process chamber;

[0100] (II) Exhaust

[0101] The pipeline that makes the mixing buffer unit 400 in communication with the first gas delivery unit 100 and the second gas delivery unit 200 respectively becomes open circuit;

[0102] The exhaust unit 500 exhausts the pipeline that is in communication with the first gas delivery unit 100 and the second gas delivery unit 200;

[0103] (III) Purge

[0104] The pipeline that makes the exhaust unit 500 communicate with the first gas delivery unit 100 and the second gas delivery unit 200 respectively becomes open circuit;

[0105] The purge unit 700 purges the pipeline that communicates with the first gas delivery unit 100 and the second gas delivery unit 200;

[0106] (Four) pressure relief

[0107] The pressure relief unit 600 respectively relieves the first gas delivery unit 100, the second gas delivery unit 200 and the mixing buffer unit 400, so that the mixing buffer unit 400 is in a negative pressure state.

[0108] Among them, steps (two) to (four) can be carried out before mixing, or after mixing. In addition, steps (two) to (four) can only exhaust and purge the pipeline, or exhaust and purge the pipeline and the mixing buffer unit 400 together.

[0109] As shown in Figure 2 The first gas delivery unit 100 includes a first gas delivery element 110, a first valve element 120, a second valve element 130, a first pressure monitoring element 140 and a first flow monitoring element 150. Among them, the first gas delivery element 110 communicates with the mixing buffer unit 400, and is used to deliver the first gas source to the mixing buffer unit 400; the first valve element 120 is arranged in the pipeline that respectively communicates with the first gas delivery element 110 and the mixing buffer unit 400, and is used to control the opening and closing of the pipeline; the second valve element 130 is arranged in the pipeline that respectively communicates with the first gas delivery element 110 and the mixing buffer unit 400, and is located downstream of the first valve element 120, and is used to control the opening and closing of the pipeline; the first pressure monitoring element 140 is arranged in the pipeline that respectively communicates with the first gas delivery element 110 and the mixing buffer unit 400, and is used to monitor the pressure of the pipeline; the first flow monitoring element 150 is arranged in the pipeline that respectively communicates with the first gas delivery element 110 and the mixing buffer unit 400, and is used to monitor the flow of the first gas source.

[0110] In some embodiments, the first gas delivery element 110 includes a first gas source supply source and a first outlet. Among them, the first outlet is arranged in the first gas source supply source and communicates with the mixing buffer unit 400.

[0111] Among them, the first outlet is composed of a first outlet pipe and a first outlet interface. Among them, the first outlet pipe communicates with the first gas source supply source; the first outlet interface is arranged at the end of the first outlet pipe, and is used to communicate with the mixing buffer unit 400.

[0112] More specifically, the first outlet interface is connected with the pipeline that communicates with the mixing buffer unit 400.

[0113] In some embodiments, the first valve element 120 includes, but is not limited to, a diaphragm valve, a pressure regulating valve, a check valve.

[0114] In some embodiments, the first valve element 120 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

[0115] In some embodiments, the first valve element 120 includes a plurality of diaphragm valves and pressure regulating valves. The plurality of diaphragm valves and pressure regulating valves are arranged in the pipeline respectively communicating with the first gas delivery element 110 and the mixing buffer unit 400.

[0116] Specifically, the first valve element 120 includes a first manual diaphragm valve, a first pressure regulating valve, and a second manual diaphragm valve. The first manual diaphragm valve is arranged at the inlet of the pipeline respectively communicating with the first gas delivery element 110 and the mixing buffer unit 400; the first pressure regulating valve is arranged downstream of the first manual diaphragm valve and upstream of the pipeline communicating with the first gas delivery element 110 and the purge unit 700; the second manual diaphragm valve is arranged downstream of the first pressure regulating valve and downstream of the pipeline communicating with the first gas delivery element 110 and the purge unit 700.

[0117] In some embodiments, the second valve element 130 includes, but is not limited to, a diaphragm valve, a pressure regulating valve, a check valve.

[0118] In some embodiments, the second valve element 130 includes, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

[0119] In some embodiments, the second valve element 130 includes a plurality of diaphragm valves. The plurality of diaphragm valves are arranged in the pipeline respectively communicating with the first gas delivery element 110 and the mixing buffer unit 400.

[0120] Specifically, the second valve element 130 includes a first pneumatic diaphragm valve and a second pneumatic diaphragm valve. The first pneumatic diaphragm valve is arranged downstream of the first valve element 120 (the second manual diaphragm valve); the second pneumatic diaphragm valve is arranged at the outlet of the pipeline respectively communicating with the first gas delivery element 110 and the mixing buffer unit 400 and downstream of the first pneumatic diaphragm valve.

[0121] In some embodiments, the first pressure monitoring element 140 includes, but is not limited to, a pressure sensor, a pressure gauge, a pressure meter.

[0122] In some embodiments, the first pressure monitoring element 140 is a plurality of first pressure monitoring elements 140. The plurality of first pressure monitoring elements 140 are arranged in the pipeline respectively communicating with the first gas delivery element 110 and the mixing buffer unit 400.

[0123] In some embodiments, there are at least two first pressure monitoring elements 140. At least one first pressure monitoring element 140 is disposed between the first manual diaphragm valve and the first pressure regulating valve for monitoring the line pressure; and at least one first pressure monitoring element 140 is disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve for monitoring the line pressure.

[0124] In some embodiments, there are at least three first pressure monitoring elements 140. At least one first pressure monitoring element 140 is disposed between the first manual diaphragm valve and the first pressure regulating valve for monitoring the line pressure; at least one first pressure monitoring element 140 is disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve for monitoring the line pressure; and at least one first pressure monitoring element 140 is disposed between the first pressure regulating valve and the second manual diaphragm valve for monitoring the line pressure.

[0125] In particular, the first pressure monitoring element 140 disposed between the first pressure regulating valve and the second manual diaphragm valve is used to confirm whether the pressure is the same as that of the first pressure monitoring element 140 disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve after pressure regulation, so as to avoid errors.

[0126] In some embodiments, if the first pressure monitoring element 140 is disposed between the first pressure regulating valve and the second manual diaphragm valve, it is located upstream of the line communicating the first gas delivery element 110 and the purge unit 700.

[0127] In some embodiments, the first flow monitoring element 150 includes, but is not limited to, a flow sensor, a mass flow meter, and a mass flow controller.

[0128] In some embodiments, there is at least one first flow monitoring element 150.

[0129] In some embodiments, the first flow monitoring element 150 is disposed at the outlet of the line communicating with the first gas delivery element 110 and the mixing buffer unit 400, respectively.

[0130] In some embodiments, the first flow monitoring element 150 is disposed between the first pneumatic diaphragm valve and the second pneumatic diaphragm valve.

[0131] As Figure 3As shown, the second gas delivery unit 200 comprises a second gas delivery element 210, a third valve element 220, a fourth valve element 230, a second pressure monitoring element 240, and a second flow monitoring element 250. Among them, the second gas delivery element 210 is in communication with the mixing buffer unit 400 for delivering the second gas source to the mixing buffer unit 400; the third valve element 220 is arranged in the pipeline in communication with the second gas delivery element 210 and the mixing buffer unit 400 respectively, for controlling the opening and closing of the pipeline; the fourth valve element 230 is arranged in the pipeline in communication with the second gas delivery element 210 and the mixing buffer unit 400 respectively, and is located downstream of the third valve element 220, for controlling the opening and closing of the pipeline; the second pressure monitoring element 240 is arranged in the pipeline in communication with the second gas delivery element 210 and the mixing buffer unit 400 respectively, for monitoring the pressure of the pipeline; the second flow monitoring element 250 is arranged in the pipeline in communication with the second gas delivery element 210 and the mixing buffer unit 400 respectively, for monitoring the flow of the second gas source.

[0132] In some embodiments, the second gas delivery element 210 comprises a second gas source supply and a second outlet. Among them, the second outlet is arranged at the second gas source supply and is in communication with the mixing buffer unit 400.

[0133] Among them, the second outlet is composed of a second outlet pipe and a second outlet interface. Among them, the second outlet pipe is in communication with the second gas source supply; the second outlet interface is arranged at the end of the second outlet pipe, for communication with the mixing buffer unit 400.

[0134] More specifically, the second outlet interface is connected with the pipeline in communication with the mixing buffer unit 400.

[0135] In some embodiments, the third valve element 220 comprises but is not limited to a diaphragm valve, a pressure regulating valve, and a one-way valve.

[0136] In some embodiments, the third valve element 220 comprises but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.

[0137] In some embodiments, the third valve element 220 comprises a plurality of diaphragm valves and pressure regulating valves. Among them, the plurality of diaphragm valves and pressure regulating valves are arranged at intervals in the pipeline in communication with the second gas delivery element 210 and the mixing buffer unit 400 respectively.

[0138] Specifically, the third valve element 220 comprises a third manual diaphragm valve, a second pressure regulating valve and a fourth manual diaphragm valve. Among them, the third manual diaphragm valve is arranged at the inlet of the pipeline respectively communicating with the second gas conveying element 210 and the mixing buffer unit 400; the second pressure regulating valve is arranged downstream of the third manual diaphragm valve and upstream of the pipeline communicating with the second gas conveying element 210 and the purge unit 700; the fourth manual diaphragm valve is arranged downstream of the second pressure regulating valve and downstream of the pipeline communicating with the second gas conveying element 210 and the purge unit 700.

[0139] In some embodiments, the fourth valve element 230 comprises but is not limited to a diaphragm valve, a pressure regulating valve, a one-way valve.

[0140] In some embodiments, the fourth valve element 230 comprises but is not limited to a manual diaphragm valve, a pneumatic diaphragm valve.

[0141] In some embodiments, the fourth valve element 230 comprises a plurality of diaphragm valves. Among them, the plurality of diaphragm valves are arranged at intervals in the pipelines respectively communicating with the second gas conveying element 210 and the mixing buffer unit 400.

[0142] Specifically, the fourth valve element 230 comprises a third pneumatic diaphragm valve and a fourth pneumatic diaphragm valve. Among them, the third pneumatic diaphragm valve is arranged downstream of the third valve element 220 (the fourth manual diaphragm valve); the fourth pneumatic diaphragm valve is arranged at the outlet of the pipeline respectively communicating with the second gas conveying element 210 and the mixing buffer unit 400 and downstream of the third pneumatic diaphragm valve.

[0143] In some embodiments, the second pressure monitoring element 240 comprises but is not limited to a pressure sensor, a pressure gauge, a pressure meter.

[0144] In some embodiments, the second pressure monitoring element 240 is a plurality of second pressure monitoring elements 240. The plurality of second pressure monitoring elements 240 are arranged at intervals in the pipelines respectively communicating with the second gas conveying element 210 and the mixing buffer unit 400.

[0145] In some embodiments, the second pressure monitoring element 240 is at least two second pressure monitoring elements 240. Among them, at least one second pressure monitoring element 240 is arranged between the third manual diaphragm valve and the second pressure regulating valve for monitoring the pipeline pressure; at least one second pressure monitoring element 240 is arranged between the fourth manual diaphragm valve and the third pneumatic diaphragm valve for monitoring the pipeline pressure.

[0146] In some embodiments, the second pressure monitoring element 240 is at least three. Among them, at least one second pressure monitoring element 240 is arranged between the third manual diaphragm valve and the second pressure regulating valve for monitoring the pipeline pressure; at least one second pressure monitoring element 240 is arranged between the fourth manual diaphragm valve and the third pneumatic diaphragm valve for monitoring the pipeline pressure; at least one second pressure monitoring element 240 is arranged between the second pressure regulating valve and the fourth manual diaphragm valve for monitoring the pipeline pressure.

[0147] Specifically, the second pressure monitoring element 240 arranged between the second pressure regulating valve and the fourth manual diaphragm valve is used to confirm whether the pressure after pressure regulation is the same as the pressure of the second pressure monitoring element 240 arranged between the fourth manual diaphragm valve and the third pneumatic diaphragm valve, so as to avoid errors.

[0148] In some embodiments, if the second pressure monitoring element 240 is arranged between the second pressure regulating valve and the fourth manual diaphragm valve, it is located upstream of the pipeline communicating with the second gas delivery element 210 and the purge unit 700.

[0149] In some embodiments, the second flow monitoring element 250 includes but is not limited to a flow sensor, a mass flow meter, and a mass flow controller.

[0150] In some embodiments, the second flow monitoring element 250 is at least one.

[0151] In some embodiments, the second flow monitoring element 250 is arranged at the outlet of the pipeline respectively communicating with the second gas delivery element 210 and the mixing buffer unit 400.

[0152] In some embodiments, the second flow monitoring element 250 is arranged between the third pneumatic diaphragm valve and the fourth pneumatic diaphragm valve.

[0153] The concentration monitoring unit 300 is arranged in the pipeline respectively communicating with the second gas delivery unit 200 and the mixing buffer unit 400.

[0154] Specifically, the concentration monitoring unit 300 is arranged in the pipeline respectively communicating with the second gas delivery element 210 and the mixing buffer unit 400.

[0155] In some embodiments, the concentration monitoring unit 300 is arranged upstream of the second flow monitoring element 250.

[0156] In some embodiments, the concentration monitoring unit 300 is arranged between the fourth manual diaphragm valve and the third pneumatic diaphragm valve.

[0157] In some embodiments, the concentration monitoring unit 300 includes but is not limited to a concentration sensor and a concentration meter.

[0158] like Figure 4 As shown, the hybrid buffer unit 400 includes a hybrid buffer element 410, a fifth valve element 420, a sixth valve element 430, a seventh valve element 440, and a third pressure monitoring element 450. The mixing buffer element 410 is connected to the first gas delivery unit 100, the second gas delivery unit 200, the exhaust unit 500, and the pressure relief unit 600, respectively, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and to deliver the mixed gas source to the process chamber; the fifth valve element 420 is disposed in the pipeline connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600, respectively, and is used to control the gas flow direction of the pipeline; the sixth valve element 430 is disposed in the pipeline connected to the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer element 410, respectively, and is located downstream of the fifth valve element 420, and is used to control the opening and closing of the pipeline; the seventh valve element 440 is disposed in the pipeline connected to the mixing buffer element 410 and the process chamber, respectively, and is used to control the opening and closing of the pipeline; the third pressure monitoring element 450 is disposed in the pipeline connected to the mixing buffer element 410 and the process chamber, respectively, and is used to monitor the pipeline pressure.

[0159] Specifically, the mixing buffer element 410 is connected to the first gas conveying element 110 and the second gas conveying element 210 respectively; the fifth valve element 420 is disposed in the pipeline connected to the first gas conveying element 110, the second gas conveying element 210, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600 respectively; and the sixth valve element 430 is disposed in the pipeline connected to the first gas conveying element 110, the second gas conveying element 210, and the mixing buffer element 410 respectively.

[0160] In some embodiments, the mixing buffer element 410 includes a mixing buffer tank, an air inlet, and an air outlet. The air inlet is located in the mixing buffer tank and is connected to the first gas delivery element 110 and the second gas delivery element 210, respectively; the air outlet is located in the mixing buffer tank and is connected to the exhaust unit 500, the pressure relief unit 600, and the process chamber, respectively.

[0161] The air inlet includes an air inlet pipe and an air inlet interface. The air inlet pipe is located in the mixing buffer tank; the air inlet interface is located at the end of the air inlet pipe, outside the mixing buffer tank, and is connected to pipelines that are respectively connected to the first gas delivery element 110, the second gas delivery element 210, and the mixing buffer element 410.

[0162] The gas outlet includes a gas outlet pipe and a gas outlet interface. The gas outlet pipe is arranged in the mixing buffer tank. The gas outlet interface is arranged at the end of the gas outlet pipe, located outside the mixing buffer tank, and connected with the pipelines respectively communicated with the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600.

[0163] In some embodiments, the fifth valve element 420 includes but is not limited to a diaphragm valve, a one-way valve.

[0164] In some embodiments, the fifth valve element 420 is a multi-way diaphragm valve.

[0165] In some embodiments, the fifth valve element 420 is a manual multi-way diaphragm valve, a pneumatic multi-way diaphragm valve.

[0166] In some embodiments, the fifth valve element 420 is a three-way pneumatic diaphragm valve.

[0167] In some embodiments, the fifth valve element 420 includes a pneumatic multi-way diaphragm valve and a one-way valve. The pneumatic multi-way diaphragm valve and the one-way valve are arranged at intervals.

[0168] In some embodiments, the fifth valve element 420 includes a pneumatic multi-way diaphragm valve and a first one-way valve. The pneumatic multi-way diaphragm valve is arranged in the pipelines respectively communicated with the first gas conveying element 110, the second gas conveying element 210, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600. The first one-way valve is arranged in the pipelines respectively communicated with the pneumatic multi-way diaphragm valve, the exhaust unit 500, and the pressure relief unit 600.

[0169] Specifically, the first end of the pneumatic multi-way diaphragm valve is respectively communicated with the first gas conveying element 110 and the second gas conveying element 210, and the second end of the pneumatic multi-way diaphragm valve is communicated with the mixing buffer element 410. The third end of the pneumatic multi-way diaphragm valve is respectively communicated with the exhaust unit 500 and the pressure relief unit 600.

[0170] More specifically, the first end of the pneumatic multi-way diaphragm valve is connected with the pipelines respectively communicated with the first gas conveying element 110 and the second gas conveying element 210. The second end of the pneumatic multi-way diaphragm valve is connected with the pipeline communicated with the mixing buffer element 410. The third end of the pneumatic multi-way diaphragm valve is connected with the pipelines respectively communicated with the exhaust unit 500 and the pressure relief unit 600.

[0171] In some embodiments, the sixth valve element 430 includes but is not limited to a diaphragm valve.

[0172] In some embodiments, the sixth valve element 430 includes but is not limited to a manual diaphragm valve, a pneumatic diaphragm valve.

[0173] In some embodiments, the sixth valve element 430 comprises a fifth manual diaphragm valve. In some embodiments, the fifth manual diaphragm valve is disposed in a line in communication with the fifth valve element 420 and the mixing buffer element 410, respectively.

[0174] In some embodiments, the seventh valve element 440 comprises, but is not limited to, a diaphragm valve, a pressure regulating valve.

[0175] In some embodiments, the seventh valve element 440 comprises, but is not limited to, a manual diaphragm valve, a pneumatic diaphragm valve.

[0176] In some embodiments, the seventh valve element 440 comprises at least one diaphragm valve, a pressure regulating valve. In some embodiments, the seventh valve element 440 comprises a plurality of diaphragm valves, a plurality of pressure regulating valves. In some embodiments, the plurality of diaphragm valves, the plurality of pressure regulating valves are disposed in a line in communication with the mixing buffer element 410 and the process chamber, respectively.

[0177] In some embodiments, the seventh valve element 440 comprises a sixth manual diaphragm valve and a third pressure regulating valve. In some embodiments, the sixth manual diaphragm valve is disposed in a line in communication with the mixing buffer element 410 and the process chamber, respectively. In some embodiments, the third pressure regulating valve is disposed in a line in communication with the mixing buffer element 410 and the process chamber, respectively, downstream of the sixth manual diaphragm valve.

[0178] In some embodiments, the sixth manual diaphragm valve is disposed upstream of a line in communication with the mixing buffer element 410, the exhaust unit 500, and the purge unit 700, respectively.

[0179] In some embodiments, the third pressure regulating valve is disposed upstream of a line in communication with the mixing buffer element 410, the exhaust unit 500, and the purge unit 700, respectively.

[0180] Further, the seventh valve element 440 further comprises a fifth pneumatic diaphragm valve. In some embodiments, the fifth pneumatic diaphragm valve is disposed in a line in communication with the mixing buffer element 410 and the process chamber, respectively, downstream of the third pressure regulating valve.

[0181] In some embodiments, the fifth pneumatic diaphragm valve is disposed upstream of a line in communication with the mixing buffer element 410, the exhaust unit 500, and the purge unit 700, respectively.

[0182] In some embodiments, the third pressure monitoring element 450 comprises, but is not limited to, a pressure sensor, a pressure gauge, a pressure meter.

[0183] In some embodiments, the third pressure monitoring element 450 is a plurality of pressure monitoring elements. In some embodiments, the plurality of second pressure monitoring elements 240 are disposed in a line in communication with the mixing buffer element 410 and the process chamber, respectively.

[0184] In some embodiments, there is one third pressure monitoring element 450. The third pressure monitoring element 450 is located downstream of the sixth manual diaphragm valve.

[0185] In some of these embodiments, a third pressure monitoring element 450 is disposed between a sixth manual diaphragm valve and a third pressure regulating valve.

[0186] In some embodiments, there are two third pressure monitoring elements 450. The two third pressure monitoring elements 450 are disposed between the sixth manual diaphragm valve and the fifth pneumatic diaphragm valve.

[0187] In some embodiments, a third pressure monitoring element 450 is disposed between the sixth manual diaphragm valve and the third pressure regulating valve; another third pressure monitoring element 450 is disposed between the third pressure regulating valve and the fifth pneumatic diaphragm valve.

[0188] like Figure 5 As shown, the exhaust unit 500 includes a first vacuum element 510, an eighth valve element 520, a ninth valve element 530, and a tenth valve element 540. The first vacuum element 510 is connected to a first gas delivery unit 100, a second gas delivery unit 200, a mixing buffer unit 400, and a pressure relief unit 600, respectively. The eighth valve element 520 is disposed in a pipeline connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400, the first vacuum element 510, and the pressure relief unit 600, respectively. The ninth valve element 530 is disposed in a pipeline connected to the first vacuum element 510 and is used to control the exhaust of gas from the first vacuum element 510. The tenth valve element 540 is disposed in a pipeline connected to the first vacuum element 510 and is used to control the supply of gas to the first vacuum element 510.

[0189] Specifically, the first vacuum element 510 is connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the pressure relief unit 600, respectively; the eighth valve element 520 is disposed in the pipeline connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the pressure relief unit 600, respectively.

[0190] In some embodiments, the first vacuum element 510 includes a vacuum generator, a first gas port, a second gas port, and a third gas port. The first gas port is disposed in the vacuum generator and connected to pipelines that communicate with the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510, respectively. The second gas port is disposed in the vacuum generator and connected to the pipeline communicating with the first vacuum element 510. The third gas port is disposed in the vacuum generator and connected to the pipeline communicating with the first vacuum element 510.

[0191] The first air port includes a first air pipe and a first air port interface. The first air pipe is connected to the vacuum generator; the first air port interface is located at the end of the first air pipe and is connected to pipelines that are respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510.

[0192] The second air port includes a second air pipe and a second air port interface. The second air pipe is connected to the vacuum generator; the second air port interface is located at the end of the second air pipe and is connected to the pipeline connected to the first vacuum element 510.

[0193] The third air port includes a third air pipe and a third air port interface. The third air pipe is connected to the vacuum generator; the third air port interface is located at the end of the second air pipe and is connected to the pipeline connected to the first vacuum element 510.

[0194] In some of these embodiments, the eighth valve element 520 includes, but is not limited to, a diaphragm valve.

[0195] In some embodiments, the eighth valve element 520 includes, but is not limited to, a manual diaphragm valve and a pneumatic diaphragm valve.

[0196] In some embodiments, the eighth valve element 520 includes a sixth pneumatic diaphragm valve. The sixth pneumatic diaphragm valve is disposed in a pipeline that is connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510, respectively.

[0197] In some of these embodiments, the ninth valve element 530 includes, but is not limited to, a diaphragm valve.

[0198] In some of these embodiments, the ninth valve element 530 includes, but is not limited to, a manual diaphragm valve and a pneumatic diaphragm valve.

[0199] In some embodiments, the ninth valve element 530 includes a seventh manual diaphragm valve. The seventh manual diaphragm valve is located in a conduit connected to the first vacuum element 510.

[0200] In some of these embodiments, the tenth valve element 540 includes, but is not limited to, a diaphragm valve.

[0201] In some of these embodiments, the tenth valve element 540 includes, but is not limited to, a manual diaphragm valve and a pneumatic diaphragm valve.

[0202] In some embodiments, the tenth valve element 540 includes an eighth manual diaphragm valve. The eighth manual diaphragm valve is located in a conduit connected to the first vacuum element 510.

[0203] As shown in Figure 6 The pressure relief unit 600 includes a second vacuum element 610, an eleventh valve element 620, and a twelfth valve element 630. The second vacuum element 610 is in communication with the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400, and the exhaust unit 500, respectively. The eleventh valve element 620 is disposed in a pipeline in communication with the mixing buffer unit 400, the exhaust unit 500, and the second vacuum element 610, respectively. The twelfth valve element 630 is disposed in a pipeline in communication with the mixing buffer unit 400, the exhaust unit 500, and the second vacuum element 610, respectively.

[0204] Specifically, the second vacuum element 610 is in communication with the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510, respectively. The eleventh valve element 620 is disposed in a pipeline in communication with the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, respectively. The twelfth valve element 630 is disposed in a pipeline in communication with the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, respectively.

[0205] In some embodiments, the second vacuum element 610 is a vacuum pump.

[0206] In some embodiments, the eleventh valve element 620 includes, but is not limited to, a diaphragm valve.

[0207] In some embodiments, the eleventh valve element 620 includes, but is not limited to, a manual diaphragm valve and a pneumatic diaphragm valve.

[0208] In some embodiments, the eleventh valve element 620 includes a ninth manual diaphragm valve. The ninth manual diaphragm valve is disposed in a pipeline in communication with the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, respectively.

[0209] More specifically, the ninth manual diaphragm valve is disposed at an inlet of a pipeline in communication with the second vacuum element 610.

[0210] In some embodiments, the twelfth valve element 630 includes, but is not limited to, a diaphragm valve, a pressure regulating valve, and a needle valve.

[0211] In some embodiments, the twelfth valve element 630 includes, but is not limited to, a manual diaphragm valve and a pneumatic diaphragm valve.

[0212] In some embodiments, the twelfth valve element 630 includes a plurality of diaphragm valves, pressure regulating valves, and needle valves. The plurality of diaphragm valves, pressure regulating valves, and needle valves are spaced apart and arranged in pipelines that are respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510.

[0213] In some embodiments, the twelfth valve element 630 includes a tenth manual diaphragm valve. The tenth manual diaphragm valve is disposed in a pipeline that is connected to the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, respectively.

[0214] In some of these embodiments, the tenth manual diaphragm valve is located downstream of the third pressure monitoring element 450.

[0215] Furthermore, the twelfth valve element 630 also includes an eleventh manual diaphragm valve. The eleventh manual diaphragm valve is disposed in a bypass line of the pipelines that are respectively connected to the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, and is located between the ninth manual diaphragm valve and the tenth manual diaphragm valve.

[0216] The bypass pipeline is connected to a gas detection and analysis device, which is used to detect the concentration of the mixed gas in the mixing buffer element 410 through the bypass pipeline and determine whether the concentration of the mixed gas meets the required concentration.

[0217] like Figure 7 As shown, the purging unit 700 includes a third gas delivery element 710 and a thirteenth valve element 720. The third gas delivery element 710 is connected to the first gas delivery unit 100 and the second gas delivery unit 200, respectively; the thirteenth valve element 720 is disposed in a pipeline connected to the first gas delivery unit 100, the second gas delivery unit 200, and the third gas delivery element 710, respectively.

[0218] Specifically, the third gas delivery element 710 is connected to the first gas delivery element 110 and the second gas delivery element 210 respectively; the thirteenth valve element 720 is disposed in the pipeline connected to the first gas delivery element 110, the second gas delivery element 210 and the third gas delivery element 710 respectively.

[0219] In some embodiments, the third gas delivery element 710 includes a third gas supply source and a third outlet. The third outlet is located at the third gas supply source and is connected to the first gas delivery element 110 and the second gas delivery element 210, respectively.

[0220] The third outlet is composed of a third outlet pipe and a third outlet interface. The third outlet pipe is in communication with the third gas source supply. The third outlet interface is arranged at the end of the third outlet pipe and is in communication with the first gas conveying element 110 and the second gas conveying element 210 respectively.

[0221] More specifically, the third outlet interface is connected with the pipelines in communication with the first gas conveying element 110 and the second gas conveying element 210 respectively.

[0222] In some embodiments, the thirteenth valve element 720 includes but is not limited to a diaphragm valve and a one-way valve.

[0223] In some embodiments, the thirteenth valve element 720 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.

[0224] In some embodiments, the thirteenth valve element 720 includes a plurality of diaphragm valves and a plurality of one-way valves. The plurality of diaphragm valves and the plurality of one-way valves are arranged at intervals in the pipelines in communication with the first gas conveying element 110, the second gas conveying element 210 and the third gas conveying element 710 respectively.

[0225] In some embodiments, the thirteenth valve element 720 includes a twelfth manual diaphragm valve, a seventh pneumatic diaphragm valve, an eighth pneumatic diaphragm valve, a ninth pneumatic diaphragm valve, a second one-way valve and a third one-way valve. The twelfth manual diaphragm valve is arranged in the pipelines in communication with the first gas conveying element 110, the second gas conveying element 210 and the third gas conveying element 710 respectively. The seventh pneumatic diaphragm valve is arranged in the pipelines in communication with the first gas conveying element 110, the second gas conveying element 210 and the third gas conveying element 710 and is located downstream of the twelfth manual diaphragm valve. The eighth pneumatic diaphragm valve is arranged in the pipelines in communication with the first gas conveying element 110 and the third gas conveying element 710 respectively. The ninth pneumatic diaphragm valve is arranged in the pipelines in communication with the second gas conveying element 210 and the third gas conveying element 710 respectively. The second one-way valve is arranged in the pipelines in communication with the first gas conveying element 110 and the third gas conveying element 710 respectively and is located downstream of the seventh pneumatic diaphragm valve and upstream of the eighth pneumatic diaphragm valve. The third one-way valve is arranged in the pipelines in communication with the second gas conveying element 210 and the third gas conveying element 710 respectively and is located downstream of the seventh pneumatic diaphragm valve and upstream of the ninth pneumatic diaphragm valve.

[0226] The eighth pneumatic diaphragm valve and the ninth pneumatic diaphragm valve are arranged in parallel. The second one-way valve and the third one-way valve are arranged in parallel.

[0227] In some embodiments, the eighth pneumatic diaphragm valve is arranged between the first pressure regulating valve and the second manual diaphragm valve.

[0228] In some embodiments, the eighth pneumatic diaphragm valve is disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve.

[0229] In some embodiments, the ninth pneumatic diaphragm valve is disposed between the second pressure regulating valve and the fourth manual valve.

[0230] In some embodiments, the ninth pneumatic diaphragm valve is disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve.

[0231] The method for using the present application is as follows:

[0232] (I) Mixing gas

[0233] Switching the state of the fifth valve element 420 to connect the first gas delivery element 110, the second gas delivery element 210, and the mixing buffer element 410;

[0234] Opening the first valve element 120 and the second valve element 130 to allow the first gas delivery element 110 to deliver the first gas source to the mixing buffer element 410;

[0235] Opening the third valve element 220 and the fourth valve element 230 to allow the second gas delivery element 210 to deliver the second gas source to the mixing buffer element 410;

[0236] Opening the sixth valve element 430 to allow the first gas source and the second gas source to be delivered to the mixing buffer element 410, respectively;

[0237] The mixing buffer element 410 mixes the first gas source and the second gas source to form a mixed gas;

[0238] Opening the seventh valve element 440 to allow the mixing buffer element 410 to deliver the mixed gas to the process chamber.

[0239] (II) Exhausting gas

[0240] Closing the first valve element 120 and the third valve element 220;

[0241] Switching the state of the fifth valve element 420 to connect the first gas delivery element 110, the second gas delivery element 210, the first vacuum element 510, and the second vacuum element 610;

[0242] Opening the eighth valve element 520, the ninth valve element 530, the tenth valve element 540, and the eleventh valve element 620;

[0243] The gas in the pipeline is exhausted outwardly through the first vacuum element 510;

[0244] In the case of exhausting, the second vacuum element 610 performs a vacuum pumping function on the pipeline to make the pressure of the pipeline negative;

[0245] In the case that the pressure values of the first pressure monitoring element 140 and the second pressure monitoring element 240 reach the first preset pressure value, the second valve element 130 and the fourth valve element 230 are closed, and the pressure of the pipeline is negative pressure at this time;

[0246] (Three) Purging

[0247] The thirteenth valve element 720 is opened to make the third gas conveying element 710 convey gas to the pipeline;

[0248] In the case that the pressure values of the first pressure monitoring element 140 and the second pressure monitoring element 240 reach the second preset pressure value, the thirteenth valve element 720 is closed, and the pressure of the pipeline is positive pressure at this time;

[0249] (Four) Pressure relief

[0250] After repeating steps (two) to (three) for several times, in the case that the pressure of the pipeline is negative pressure, the twelfth valve element 630 is opened;

[0251] The gas in the mixed buffer element 410 is discharged outward through the first vacuum element 510;

[0252] In the case of emptying, the second vacuum element 610 performs vacuumizing action on the mixed buffer element 410, so that the pressure of the mixed buffer element 410 is negative pressure;

[0253] In the case that the pressure value of the third pressure monitoring element 450 reaches the third preset pressure value, the twelfth valve element 630 is closed, and the pressure of the mixed buffer element 410 is negative pressure at this time;

[0254] In the case that the pressure of the pipeline and the mixed buffer element 410 are both negative pressure, the eighth valve element 520 is closed;

[0255] The state of the fifth valve element 420 is switched to connect the first gas conveying element 110, the second gas conveying element 210 and the mixed buffer element 410, so that step (one) can be performed.

[0256] Further, steps (two) to (four) further comprise:

[0257] (Two) Exhausting

[0258] The state of the fifth valve element 420 is switched to connect the first gas conveying element 110, the second gas conveying element 210 and the mixed buffer element 410;

[0259] The first valve element 120 and the third valve element 220 are closed;

[0260] Switching the state of the fifth valve element 420 to connect the first gas delivery element 110, the second gas delivery element 210, the first vacuum element 510, and the second vacuum element 610;

[0261] Opening the eighth valve element 520, the ninth valve element 530, the tenth valve element 540, and the eleventh valve element 620;

[0262] The gas in the mixing buffer element 410 and the gas in the pipeline are discharged outward through the first vacuum element 510;

[0263] In the case of evacuation, the second vacuum element 610 performs vacuumization on the mixing buffer element 410 and the pipeline, so that the pressure of the mixing buffer element 410 and the pipeline is negative pressure;

[0264] In the case where the pressure values of the first pressure monitoring element 140, the second pressure monitoring element 240, and the third pressure monitoring element 450 reach the first preset pressure value, the eighth valve element 520 is closed, and at this time, the pressure of the mixing buffer element 410 and the pressure of the pipeline are both negative pressure;

[0265] (Three) Purging

[0266] Opening the thirteenth valve element 720 to make the third gas delivery element 710 deliver gas to the pipeline and the mixing buffer element 410;

[0267] In the case where the pressure values of the first pressure monitoring element 140, the second pressure monitoring element 240, and the third pressure monitoring element 450 reach the second preset pressure value, the thirteenth valve element 720 is closed, and at this time, the pressure of the mixing buffer element 410 and the pressure of the pipeline are both positive pressure;

[0268] (Four) Pressure relief

[0269] After repeating steps (two) to (three) for several times, in the case where the pressure of the mixing buffer element 410 and the pressure of the pipeline are negative pressure, the twelfth valve element 630 is opened;

[0270] The gas in the mixing buffer element 410 and the gas in the pipeline are discharged outward through the first vacuum element 510;

[0271] In the case of evacuation, the second vacuum element 610 performs vacuumization on the mixing buffer element 410 and the pipeline, so that the pressure of the mixing buffer element 410 and the pipeline is negative pressure;

[0272] In the case where the pressure values of the first pressure monitoring element 140, the second pressure monitoring element 240, and the third pressure monitoring element 450 reach the third preset pressure value, the twelfth valve element 630 is closed, and at this time, the pressure of the mixing buffer element 410 and the pressure of the pipeline are negative pressure;

[0273] The eighth valve element 520 is closed, and step (1) is performed.

[0274] The present application has the advantages that the concentration of the second gas source provided by the second gas delivery unit is monitored by the concentration monitoring unit, the high-concentration gas can be accurately diluted on site, the frequency of replacing the second gas source is reduced, and the process efficiency is improved; the first gas source delivered by the first gas delivery unit and the second gas source delivered by the second gas delivery unit are mixed and diluted on site by the mixing buffer unit to reach the required concentration, the single-use time of the second gas source is extended, the frequency of replacing the second gas source is reduced, and the process efficiency is further improved; in addition, high-precision and low-concentration gas dilution can be achieved by the concentration monitoring unit, thereby meeting different process requirements; the pipeline of the gas mixing device and the mixing buffer unit can be emptied, purged, and depressurized by the cooperation of the exhaust unit, the pressure relief unit, and the purge unit, meeting the cleanliness requirements and avoiding residual previous process gas sources, so that the gas source replacement operation can be performed.

[0275] Example 2

[0276] This embodiment is a variant of example 1.

[0277] As shown in Figure 8 The mixing buffer unit 400 further includes a fourth gas delivery element 460 and a fourteenth valve element 470. The fourth gas delivery element 460 is in communication with the mixing buffer element 410. The fourteenth valve element 470 is arranged in a pipeline in communication with the fourth gas delivery element 460 and the mixing buffer element 410.

[0278] In some embodiments, the fourth gas delivery element 460 includes a fourth gas source supply and a fourth outlet. The fourth outlet is arranged at the fourth gas source supply and is in communication with the mixing buffer element 410.

[0279] The fourth outlet is composed of a fourth outlet pipe and a fourth outlet interface. The fourth outlet pipe is in communication with the fourth gas source supply. The fourth outlet interface is arranged at the end of the fourth outlet pipe and is used to communicate with the mixing buffer element 410.

[0280] More specifically, the fourth outlet interface is connected to the pipeline in communication with the mixing buffer element 410 and the fourth gas delivery element 460.

[0281] In some embodiments, the fourteenth valve element 470 includes but is not limited to a diaphragm valve.

[0282] In some embodiments, the fourteenth valve element 470 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.

[0283] In some embodiments, the fourteenth valve element 470 includes a plurality of diaphragm valves. The plurality of diaphragm valves are spaced apart in conduits that are respectively connected to the mixing buffer element 410 and the fourth gas delivery element 460.

[0284] In some embodiments, the fourteenth valve element 470 includes a thirteenth manual diaphragm valve and a tenth pneumatic diaphragm valve. The thirteenth manual diaphragm valve is located at the inlet of a pipeline connected to both the mixing buffer element 410 and the fourth gas delivery element 460; the tenth pneumatic diaphragm valve is located at the outlet of a pipeline connected to both the mixing buffer element 410 and the fourth gas delivery element 460, and is downstream of the thirteenth manual diaphragm valve.

[0285] like Figure 9 As shown, the pressure relief unit 600 also includes a fifteenth valve element 640 and a fourth pressure monitoring element 650. The fifteenth valve element 640 is disposed in a pipeline that is connected to the mixing buffer unit 400 and the second vacuum element 610 respectively; the fourth pressure monitoring element 650 is disposed in a pipeline that is connected to the mixing buffer unit 400 and the second vacuum element 610 respectively.

[0286] Specifically, the fifteenth valve element 640 is disposed in a pipeline that is connected to the mixing buffer element 410 and the second vacuum element 610 respectively; the fourth pressure monitoring element 650 is disposed in a pipeline that is connected to the mixing buffer element 410 and the second vacuum element 610 respectively.

[0287] In some embodiments, the fifteenth valve element 640 further includes a fourth pressure regulating valve, a needle valve, and an eleventh pneumatic diaphragm valve. The fourth pressure regulating valve is disposed in a pipeline connected to both the mixing buffer element 410 and the second vacuum element 610, and is located upstream of the ninth manual valve; the needle valve is disposed in a pipeline connected to both the mixing buffer element 410 and the second vacuum element 610, and is located upstream of the fourth pressure regulating valve; the eleventh pneumatic diaphragm valve is disposed in a pipeline connected to both the mixing buffer element 410 and the second vacuum element 610, and is located upstream of the needle valve.

[0288] Among them, the pipelines containing the fourth pressure regulating valve, needle valve and eleventh pneumatic diaphragm valve are connected in parallel with the pipeline containing the tenth manual diaphragm valve. One end of these two pipelines is connected to the mixing buffer element 410, and the other end of these two pipelines is connected to the second vacuum element 610.

[0289] In some of these embodiments, the eleventh pneumatic diaphragm valve is located downstream of the third pressure regulating valve and upstream of the fifth pneumatic diaphragm valve.

[0290] In some of these embodiments, the fourth pressure monitoring element 650 includes, but is not limited to, a pressure sensor, a pressure gauge, or a pressure meter.

[0291] In some embodiments, the fourth pressure monitoring element 650 is one. The fourth pressure monitoring element 650 is disposed between the ninth manual diaphragm valve and the fourth pressure regulating valve.

[0292] In some embodiments, the fourth pressure monitoring element 650 is one. The fourth pressure monitoring element 650 is disposed between the ninth manual diaphragm valve and the fourth pressure regulating valve.

[0293] The use method of the present embodiment is as follows:

[0294] (Five) Replacement pressure relief

[0295] After mixing for a period of time, the mixed buffer element 410 needs to be replaced;

[0296] Open the fifteenth valve element 640, so that the mixed gas of the mixed buffer element 410 is discharged outward through the second vacuum element 610;

[0297] Close the fifteenth valve element 640, open the fourteenth valve element 470, and the fourth gas conveying element 460 conveys mixed gas to the mixed buffer element 410.

[0298] The advantage of the present embodiment is that after the mixed buffer element mixes the first gas source and the second gas source to form mixed gas and conveys the mixed gas to the process chamber for a period of time, the mixed gas inside the mixed buffer element needs to be replaced, so as to avoid inaccurate concentration of the mixed gas inside the mixed buffer element.

[0299] Embodiment 3

[0300] The present embodiment is a variant of embodiments 1-2.

[0301] As shown in Figure 10 , the gas mixing device further includes a safety guarantee unit 800. Among them, the safety guarantee unit 800 is disposed at the top of the environment where the gas mixing device is located, for monitoring environmental information.

[0302] As shown in Figure 11 , the safety guarantee unit 800 includes a smoke monitoring element 810, a liquid spraying element 820, a switch element 830 and a blowing element 840. Among them, the smoke monitoring element 810 is disposed at the top of the environment where the gas mixing device is located, for monitoring the smoke information of the environment; the liquid spraying element 820 is disposed at the top of the environment where the gas mixing device is located, for spraying liquid to the environment; the switch element 830 is disposed at the top of the environment where the gas mixing device is located; the blowing element 840 is disposed at the top of the environment where the gas mixing device is located, for discharging the gas of the environment.

[0303] In some embodiments, the smoke monitoring element 810 is a smoke detector.

[0304] In some embodiments, the liquid spraying element 820 is a shower head.

[0305] In some embodiments, the switch element 830 is a red ultraviolet switch.

[0306] In some embodiments, the air blowing element 840 includes, but is not limited to, an exhaust fan.

[0307] In some embodiments, the safety guarantee unit 800 further includes a gas monitoring element, a flame monitoring element, and a temperature monitoring element.

[0308] The advantages of the present embodiment are that in the case of leakage or combustion of the gas mixing device, the smoke monitoring element is used for early warning; the liquid spraying element is used for spraying to reduce the concentration of related gas and liquid in the environment and prevent explosion; and the air blowing element can quickly discharge the gas in the environment to the waste gas treatment system.

[0309] Embodiment 4

[0310] The present embodiment relates to a gas mixing method of the present application, which is applied to the gas mixing device as described in Embodiments 1-3.

[0311] In one illustrative embodiment of the present application, a gas mixing method comprises:

[0312] (Exhaust step)

[0313] The pipelines that make the mixing buffer unit 400 communicate with the first gas conveying unit 100 and the second gas conveying unit 200 are disconnected;

[0314] The exhaust unit 500 exhausts the pipelines that communicate with the first gas conveying unit 100 and the second gas conveying unit 200;

[0315] In the case of emptying the pipelines, the pressure relief unit 600 performs vacuumization on the pipelines to make the pressure of the pipelines negative;

[0316] (Purge step)

[0317] The pipelines that make the exhaust unit 500 communicate with the first gas conveying unit 100 and the second gas conveying unit 200 are disconnected;

[0318] The purge unit 700 purges the pipelines that communicate with the first gas conveying unit 100 and the second gas conveying unit 200;

[0319] (Pressure relief step)

[0320] The pressure relief unit 600 performs pressure relief on the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400 respectively, so that the mixing buffer unit 400 is in a negative pressure state.

[0321] Specifically, the gas mixing method of the present embodiment is as follows:

[0322] Before purging: the first, second, third, fourth, fifth, sixth, seventh, eighth, ninth, and twelfth manual diaphragm valves are in an open state, the tenth manual diaphragm valve is in a closed state, the first, second, third, and fourth pressure regulating valves are in an open state, the first, second, third, and fourth pneumatic diaphragm valves are in an open state, the sixth, seventh, eighth, and ninth pneumatic diaphragm valves are in a closed state, the pneumatic three-way diaphragm valve is in a state of being connected to the mixing buffer element 410, and the needle valve is in a closed state;

[0323] Exhausting: the first and third manual diaphragm valves are closed, the pneumatic three-way valve is changed to be connected to the second vacuum element 610, the sixth pneumatic diaphragm valve is opened, and the pipeline is exhausted of gas;

[0324] The system determines that the values of the first and second pressure monitoring elements 140 and 240 are lower than the first preset pressure threshold, and then simultaneously closes the first, second, third, and fourth pneumatic diaphragm valves;

[0325] Purging: the seventh pneumatic diaphragm valve is opened, and the eighth and ninth pneumatic diaphragm valves are opened to fill the pipeline with gas;

[0326] The system determines that the values of the first and second pressure monitoring elements 140 and 240 are higher than the second preset pressure threshold, and then closes the eighth and ninth pneumatic diaphragm valves;

[0327] After repeating the exhausting and purging steps several times, the pipeline is considered to be purged clean;

[0328] Pressure relief: then, the pneumatic diaphragm valves are kept open, the tenth manual diaphragm valve is opened, the value of the third pressure monitoring element 450 is observed, and the mixing buffer element 410 is drawn to a negative pressure;

[0329] After the pipeline and the mixing buffer element 410 are in a negative pressure state, the sixth pneumatic diaphragm valve is closed, and the entire system is drawn to a negative pressure again through the second vacuum element 610;

[0330] After pressure relief: the first, third, and tenth manual diaphragm valves are in the closed state, the second, fourth, fifth, ninth, twelfth, seventh, and eighth manual diaphragm valves are in the open state, the first, second, and third pressure regulating valves are in the open state, the first, second, third, fourth, sixth, seventh, seventh, eighth, and ninth pneumatic diaphragm valves are in the closed state, and the pneumatic three-way diaphragm valve is in the state of being open to the mixing buffer element 410.

[0331] The advantage of the present application is that, by the cooperation of the exhaust unit, the pressure relief unit, and the purge unit, the pipelines of the gas mixing device and the mixing buffer unit can be respectively emptied, purged, and pressure relieved, meeting the clean requirement and avoiding the residual of the previous process gas source, so that the gas source replacement operation can be performed.

[0332] Example 5

[0333] This embodiment relates to a gas mixing method of the present application, which is applied to the gas mixing device as described in Examples 1-3.

[0334] In one illustrative embodiment of the present application, a gas mixing method comprises:

[0335] (Exhaust step)

[0336] The exhaust unit 500 exhausts the pipelines communicated with the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400;

[0337] In the case of emptying the pipelines, the pressure relief unit 600 performs vacuumization on the pipelines to make the pressure of the pipelines negative;

[0338] (Purge step)

[0339] The pipelines communicated with the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400 by the exhaust unit 500 are disconnected;

[0340] The purge unit 700 purges the pipelines communicated with the first gas delivery unit 100 and the second gas delivery unit 200;

[0341] (Pressure relief step)

[0342] The pressure relief unit 600 respectively performs pressure relief on the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400 to make the mixing buffer unit 400 in a negative pressure state.

[0343] Specifically, the gas mixing method of the present embodiment is as follows:

[0344] Purge: first manual diaphragm valve, second manual diaphragm valve, third manual diaphragm valve, fourth manual diaphragm valve, fifth manual diaphragm valve, sixth manual diaphragm valve, seventh manual diaphragm valve, eighth manual diaphragm valve, tenth manual diaphragm valve, twelfth manual diaphragm valve are in open state, first pressure regulating valve, second pressure regulating valve, third pressure regulating valve are in open state, first pneumatic diaphragm valve, second pneumatic diaphragm valve, third pneumatic diaphragm valve, fourth pneumatic diaphragm valve, sixth pneumatic diaphragm valve, seventh pneumatic diaphragm valve, eighth pneumatic diaphragm valve, ninth pneumatic diaphragm valve are in closed state, pneumatic three-way diaphragm valve is in state of open to mixing buffer element 410;

[0345] Exhaust: close first manual diaphragm valve, third manual diaphragm valve, open sixth pneumatic diaphragm valve, open first pneumatic diaphragm valve, second pneumatic diaphragm valve, third pneumatic diaphragm valve, fourth pneumatic diaphragm valve;

[0346] After the system determines that the values of first pressure monitoring element 140, second pressure monitoring element 240, third pressure monitoring element 450 are lower than the first preset pressure threshold, close the sixth pneumatic diaphragm valve;

[0347] Purge: open seventh pneumatic diaphragm valve, open eighth pneumatic diaphragm valve, ninth pneumatic diaphragm valve, so that the pipeline is full of gas;

[0348] After the system determines that the values of first pressure monitoring element 140, second pressure monitoring element 240 are higher than the second preset pressure threshold, then close the eighth pneumatic diaphragm valve, ninth pneumatic diaphragm valve;

[0349] After repeating the exhaust step and the purge step several times, it is considered that the pipeline and the mixing buffer element 410 are purged clean;

[0350] Pressure relief: close the sixth pneumatic diaphragm valve, and the whole is extracted to negative pressure again through the second vacuum element 610;

[0351] After pressure relief: first manual diaphragm valve, third manual diaphragm valve, tenth manual diaphragm valve are in closed state, second manual diaphragm valve, fourth manual diaphragm valve, fifth manual diaphragm valve, ninth manual diaphragm valve, twelfth manual diaphragm valve, seventh manual diaphragm valve, eighth manual diaphragm valve are in open state, first pressure regulating valve, second pressure regulating valve, third pressure regulating valve are in open state, first pneumatic diaphragm valve, second pneumatic diaphragm valve, third pneumatic diaphragm valve, fourth pneumatic diaphragm valve, sixth pneumatic diaphragm valve, seventh pneumatic diaphragm valve, seventh pneumatic diaphragm valve, eighth pneumatic diaphragm valve, ninth pneumatic diaphragm valve are in closed state, pneumatic three-way diaphragm valve is in state of open to mixing buffer element 410.

[0352] The advantages of the present application are that through the cooperation of the exhaust unit, pressure relief unit and purge unit, the pipeline of the gas mixing device and the mixing buffer unit can be simultaneously emptied, purged and pressure relieved, meeting the clean requirement, avoiding residual previous process gas source, so that the gas source replacement operation can be performed.

[0353] Example 6

[0354] This embodiment relates to the gas mixing method of the present application, which is applied to the gas mixing device as described in Example 3.

[0355] In one illustrative embodiment of the present application, a gas mixing method comprises:

[0356] (Step of pressure relief)

[0357] The first gas conveying element 110 and the second gas conveying element 210 convey gas into the mixing buffer element 410 for mixing, and after a period of use, replacement is performed, and the mixed gas is sent to the front end of the third pressure regulating valve through the sixth manual diaphragm valve;

[0358] After adjusting the third pressure regulating valve, the mixed gas is sent to the eleventh pneumatic diaphragm valve through the three-way pipeline;

[0359] After the mixed gas flows through the eleventh pneumatic diaphragm valve, it flows to the needle valve, and after passing through the fourth pressure regulating valve with a set adjustment, the mixed gas to be replaced is discharged to the second vacuum element 610 through the ninth manual diaphragm valve;

[0360] (Step of replacement)

[0361] The eleventh pneumatic diaphragm valve is closed, and the thirteenth manual diaphragm valve and the tenth pneumatic diaphragm valve are opened, and the fourth gas conveying element 460 conveys mixed gas to the mixing buffer element 410.

[0362] Further, the adjustment method of the fourth pressure regulating valve is as follows:

[0363] The ninth manual diaphragm valve is closed, and the fourth pressure regulating valve is adjusted to the maximum pressure;

[0364] When the gas passes through the eleventh pneumatic diaphragm valve and the needle valve, the fourth pressure regulating valve is slowly adjusted, and the value displayed by the fourth pressure monitoring element 650 is observed, and after the value is adjusted to be lower than that of the third pressure monitoring element 450, the ninth manual diaphragm valve is opened, and the gas is discharged through the second vacuum element 610;

[0365] In the on-line state, the needle valve and the ninth manual diaphragm valve are in the open state. The system judges the value of the third pressure monitoring element 450 at the front end of the third pressure regulating valve. If the value does not change within 1 hour, the machine equipment is in a resting state. The system first closes the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, and the fourth pneumatic diaphragm valve, and then opens the eleventh pneumatic diaphragm valve to discharge the mixed gas in the mixed buffer element 410 through the second vacuum element 610.

[0366] The mixed buffer element 410 is replaced with new mixed gas.

[0367] Embodiment 7

[0368] This embodiment relates to a semiconductor process system of the present application.

[0369] In one illustrative embodiment of the present application, a semiconductor process system comprises the gas mixing device as described in any one of embodiments 1-3.

[0370] Further, the semiconductor process system further comprises a plurality of process chambers, and the plurality of process chambers are respectively in communication with the mixed buffer unit 400 of the gas mixing device.

[0371] Specifically, the plurality of process chambers are respectively in communication with the mixed buffer element 410 for obtaining the mixed gas delivered by the mixed buffer element 410.

[0372] More specifically, a plurality of fourteenth manual diaphragm valves are arranged on the pipeline through which the plurality of process chambers are in communication with the mixed buffer element 410. At least one fourteenth manual diaphragm valve is arranged on the pipeline through which each process chamber is in communication with the mixed buffer element 410. The on-off of the pipeline is controlled by the fourteenth manual diaphragm valve.

[0373] Further, the semiconductor process system further comprises at least one reserved outlet. The reserved outlet is in communication with the mixed buffer unit 400. Through the reserved outlet, the gas mixing device can supply mixed gas to multiple machine tables.

[0374] Specifically, the reserved outlet is in communication with the mixed buffer element 410.

[0375] More specifically, a fifteenth manual diaphragm valve is arranged on the pipeline through which the reserved outlet is in communication with the mixed buffer element 410. The on-off of the pipeline is controlled by the fifteenth manual diaphragm valve.

[0376] The gas supply method of the present embodiment is as follows:

[0377] The seventh valve element 440 is opened;

[0378] Whether the pressure of the third pressure monitoring element 450 changes is observed;

[0379] Without any changes, open the fourteenth manual diaphragm valve to allow the mixed gas from the mixing buffer element 410 to flow into the process chamber.

[0380] More specifically, the gas supply method in this embodiment is as follows:

[0381] Open the fifth valve element;

[0382] Observe whether there is any change in the pressure of the third pressure monitoring element 450;

[0383] Without any changes, open the fourteenth manual diaphragm valve to allow the mixed gas from the mixing buffer element 410 to flow into the process chamber.

[0384] Example 8

[0385] This embodiment relates to a specific implementation of the present invention.

[0386] like Figure 12 As shown, a gas mixing device comprises a first gas supply module, a second gas supply module, a concentration monitoring module, a gas mixing module, an exhaust module, a pressure relief module, a purging module, and a life safety protection module.

[0387] The first gas supply module includes a first gas source (such as H2), a manual diaphragm valve MV1N, a pressure regulating valve PRV1N, a manual diaphragm valve MV2NA, a pneumatic diaphragm valve AV2NA, a pneumatic diaphragm valve AV3NA, a pressure gauge PT1N, a pressure gauge PT2N, and a mass flow meter MFC.

[0388] The second gas supply module includes a second gas source (such as 1% PH3 & H2), a manual diaphragm valve MV1H, a pressure regulating valve PRV1H, a manual diaphragm valve MV2HA, a pneumatic diaphragm valve AV2HA, a pneumatic diaphragm valve AV3HA, a pressure gauge PT1H, a pressure gauge PT2H, and a mass flow meter MFC.

[0389] The concentration monitoring module includes the concentration meter Mixer.

[0390] The gas mixing module includes a pneumatic three-way valve A-PP3, a one-way valve CV4, a manual diaphragm valve MV3S, a buffer tank BufferVessel, a manual diaphragm valve MV3M, a pressure regulating valve PRV1M, a pneumatic diaphragm valve AV4M, a pressure gauge PT2M, a pressure gauge PT3M, a fourth gas source (mixed gas), a manual diaphragm valve MV5M3, and a pneumatic diaphragm valve AVBK.

[0391] The exhaust module includes a vacuum generator VG / BV / CV, a Vent Gas Outlet, a third gas source (such as GN2), a third gas source pneumatic diaphragm valve PVS, a manual diaphragm valve VGO1, and a manual diaphragm valve VGI1.

[0392] In the venting module, GN2 enters VG / BV / CV through VGI1, and then exits through Vent Gas Outlet through VGO1.

[0393] The pressure relief module includes Vacuum, manual diaphragm valve VAU, manual diaphragm valve TV2V, pneumatic diaphragm valve BKV, needle valve MCV, pressure regulating valve BPR1V, and fourth pressure monitoring element 650.

[0394] The purging module includes a fourth gas source (e.g., LPN2), manual diaphragm valve MV1P, pneumatic diaphragm valve PGV, check valve CP, check valve CP, pneumatic diaphragm valve A-PP1, and pneumatic diaphragm valve A-PP2.

[0395] The life safety assurance module includes gas detectors, flame detectors, temperature sensors, smoke sensors, weighing systems, and pressure systems, and is equipped with a touch control module and an audible and visual alarm module.

[0396] The use method of the embodiment is as follows:

[0397] (Before the exhaust purging, pressure relief, and purging of the gas mixing module, the pipelines of the first gas supply module and the second gas supply module are respectively purged)

[0398] MV1N, MV1H, MV2NA, MV2HA, MV3S, MV1P, VGO1, VGI1, MV3M, VAU are in an open state, TV2V is in a closed state, PRV1N, PRV1H, PRV1M, BPR1V are in an open state, AV2NA, AV2HA, AV3NA, AV3HA are in an open state, PGV, A-PP1, A-PP2, BKV, PVS are in a closed state, A-PP3 is in a state of opening to Buffer Vessel, and MCV is in a closed state;

[0399] Exhaust purging and pressure relief:

[0400] MV1N and MV1H are closed, and A-PP3 is changed to open to Vacuum;

[0401] Pneumatic diaphragm valve PVS is opened again to exhaust air from the pipeline;

[0402] The system determines that the values of PT1N, PT1H, PT2N, and PT2H are lower than -10 psi, and then AV2NA, AV2HA, AV3NA, and AV3HA are closed at the same time;

[0403] PGV is then opened, and after 1S, A-PP1 and APP-2 are opened to fill the pipeline with PN2;

[0404] System determines PT1N, PT1H, PT2N, PT2H values are higher than 100 psi, then close A-PP1, APP-2;

[0405] At the same time, open pneumatic diaphragm valves AV2NA, AV2HA, AV3NA, AV3HA to discharge gas, and such filling and discharging several times are regarded as purging the pipeline clean;

[0406] Subsequently, keep the pneumatic diaphragm valve open, open TV2V, and observe PT3M value, and draw the Buffer Vessel to negative pressure;

[0407] After the pipeline together with the Buffer Vessel is in a negative pressure state, close PVS, and draw the whole to negative pressure again through vacuum;

[0408] After purging:

[0409] MV1N, MV1H, TV2V are in a closed state, MV2NA, MV2HA, MV3S, VAU, MV1P, VGO1, VGI1 are in an open state, PRV1N, PRV1H, PRV1M are in an open state, AV2NA, AV2HA, AV3NA, AV3HA, PGV, A-PP1, A-PP2, BKV, PVS are in a closed state, and A-PP3 is in a state of opening to the Buffer Vessel.

[0410] Generally, before mixing gas when the system is online, the above steps are adopted.

[0411] (B) Before purging and depressurizing the pipeline of the first gas supply module, the pipeline of the second gas supply module and the gas mixing module:

[0412] MV1N, MV1H, MV2NA, MV2HA, MV3S, MV3M, TV2V, VGO1, VGI1, MV1P are in an open state, PRV1N, PRV1H, PRV1M are in an open state, AV2NA, AV2HA, AV3NA, AV3HA, PVS, PGV, A-PP1, A-PP2 are in a closed state, and A-PP3 is in a state of opening to the Buffer Vessel;

[0413] Purging and depressurizing:

[0414] Close MV1N, MV1H, open PVS, and then 5S open AV2NA, AV2HA, AV3NA, AV3HA at the same time;

[0415] System determines PT1N, PT1H, PT2N, PT2H, PT2M, PT3M values are lower than -10 psi, and then closes PVS;

[0416] Then open PGV, 1S after opening A-PP1, APP-2, make the pipeline full of PN2;

[0417] System determines PT1N, PT1H, PT2N, PT2H, PT2M, PT3M value higher than 100 psi, then close A-PP1, APP-2;

[0418] Open PVS to discharge gas, so as to fill the discharge several times, after reaching the standard, it is considered that the pipeline and Buffer Vessel are purged clean;

[0419] The same as above, once Vacuum is carried out, the pipeline and Buffer Vessel are in negative pressure state after purging;

[0420] After purging:

[0421] MV1N, MV1H, MV2NA, MV2HA, MV3S, MV3M, TV2V, VGO1, VGI1, MV1P are in open state, PRV1N, PRV1H, PRV1M are in open state, AV2NA, AV2HA, AV3NA, AV3HA, PVS, PGV, A-PP1, A-PP2 are in closed state, A-PP3 is in open state to Buffer Vessel.

[0422] Generally, the above steps are used when the system is offline.

[0423] (Three) displacement pressure relief

[0424] After mixing gas for a period of time, the Buffer Vessel needs to be replaced, specifically:

[0425] Through MV3M, the mixed gas is sent to the front end of PRV1M;

[0426] After adjusting PRV1M, the gas is sent to BKV through the three-way pipeline, and after the mixed gas flows through BKV, it flows to MCV, and after being set and adjusted by BPR1V, the mixed gas to be replaced is discharged to Vacuum through VAU.

[0427] Among them, the method for adjusting BPR1V includes:

[0428] First, close VAU, and adjust the pressure of BPR1V to the maximum;

[0429] When the gas passes through BKV and MCV, slowly adjust BPR1V, and observe the value displayed by PT1L;

[0430] After adjusting to a value lower than PT2M, open VAU, and discharge the gas through Vacuum;

[0431] When online, both MCV and VAU are enabled, and the system determines the PT2M value of the PRV1M front end by checking the value of the PRV1M front end.

[0432] If no changes occur within 1 hour, the equipment is in a resting state, and the system first shuts down AV2NA, AV2HA, AV3NA, and AV3HA;

[0433] Then, the BKV is turned on, and the mixed gas in the Buffer Vessel is discharged through the vacuum line. The Buffer Vessel is then filled with new mixed gas through the fourth gas source, completing the gas replacement in the Buffer Vessel.

[0434] The above description is merely a preferred embodiment of the present invention and does not limit the implementation and protection scope of the present invention. Those skilled in the art should realize that any equivalent substitutions and obvious changes made based on the description and illustrations of the present invention should be included within the protection scope of the present invention.

Claims

1. A gas mixing device, characterized in that, It includes a first gas delivery unit, a second gas delivery unit, a concentration monitoring unit, a mixing buffer unit, an exhaust unit, a pressure relief unit, and a purging unit; The first gas delivery unit includes a first gas delivery element, a first manual diaphragm valve, a first pressure regulating valve, a second manual diaphragm valve, a first pneumatic diaphragm valve, a first flow monitoring element, a second pneumatic diaphragm valve, and at least three first pressure monitoring elements. The first gas delivery element is connected to a mixing buffer unit and is used to deliver a first gas source to the mixing buffer unit. The first manual diaphragm valve is located at the inlet of the pipelines connected to the first gas delivery element and the mixing buffer unit, respectively. The first pressure regulating valve is located downstream of the first manual diaphragm valve and upstream of the pipeline connecting the first gas delivery element and the purging unit. The second manual diaphragm valve is located downstream of the first pressure regulating valve and downstream of the pipeline connecting the first gas delivery element and the purging unit. A pneumatic diaphragm valve is located downstream of the second manual diaphragm valve; a first flow monitoring element is installed in pipelines connected to the first gas delivery element and the mixing buffer unit, respectively, to monitor the flow rate of the first gas source; a second pneumatic diaphragm valve is installed at the outlet of the pipelines connected to the first gas delivery element and the mixing buffer unit, respectively, and is located downstream of the first flow monitoring element; at least one first pressure monitoring element is installed between the first manual diaphragm valve and the first pressure regulating valve to monitor pipeline pressure; at least one first pressure monitoring element is installed between the second manual diaphragm valve and the first pneumatic diaphragm valve to monitor pipeline pressure; at least one first pressure monitoring element is installed between the first pressure regulating valve and the second manual diaphragm valve to monitor pipeline pressure. The second gas delivery unit includes a second gas delivery element, a third manual diaphragm valve, a second pressure regulating valve, a fourth manual diaphragm valve, a third pneumatic diaphragm valve, a second flow monitoring element, a fourth pneumatic diaphragm valve, and at least three second pressure monitoring elements. The second gas delivery element is connected to a mixing buffer unit and is used to deliver a second gas source to the mixing buffer unit. The third manual diaphragm valve is located at the inlet of the pipelines connected to the second gas delivery element and the mixing buffer unit, respectively. The second pressure regulating valve is located downstream of the third manual diaphragm valve and upstream of the pipeline connecting the second gas delivery element and the purging unit. The fourth manual diaphragm valve is located downstream of the second pressure regulating valve and downstream of the pipeline connecting the second gas delivery element and the purging unit. A pneumatic diaphragm valve is located downstream of the fourth manual diaphragm valve; a second flow monitoring element is located in pipelines connected to the second gas delivery element and the mixing buffer unit, respectively, for monitoring the flow rate of the second gas source; a fourth pneumatic diaphragm valve is located at the outlet of the pipelines connected to the second gas delivery element and the mixing buffer unit, respectively, and is located downstream of the second flow monitoring element; at least one second pressure monitoring element is located between the third manual diaphragm valve and the second pressure regulating valve, for monitoring pipeline pressure; at least one second pressure monitoring element is located between the fourth manual diaphragm valve and the third pneumatic diaphragm valve, for monitoring pipeline pressure; at least one second pressure monitoring element is located between the second pressure regulating valve and the fourth manual diaphragm valve, for monitoring pipeline pressure. The concentration monitoring unit is located in the pipeline connecting the second gas delivery element and the mixing buffer unit, and is located between the fourth manual diaphragm valve and the third pneumatic diaphragm valve, for monitoring the concentration of the second gas source; The mixing buffer unit includes a mixing buffer element, a fourth gas delivery element, and a fourteenth valve element. The mixing buffer element is connected to the first gas delivery unit, the second gas delivery unit, the exhaust unit, and the pressure relief unit, respectively, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and to deliver the mixed gas source to the process chamber. The fourth gas delivery element is connected to the buffer element. The fourteenth valve element is installed in the pipeline connected to the fourth gas delivery element and the mixing buffer element, respectively. The exhaust unit is connected to the first gas delivery unit, the second gas delivery unit, and the mixing buffer unit, respectively. The pressure relief unit includes a second vacuum element and a fifteenth valve element; the second vacuum element is connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the exhaust unit respectively; the fifteenth valve element is installed in the pipelines connected to the mixing buffer unit and the second vacuum element respectively. The purging unit is connected to the first gas delivery unit and the second gas delivery unit.

2. The gas mixing device according to claim 1, characterized in that, The hybrid buffer unit also includes: The fifth valve element is installed in the pipelines that are respectively connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer element, and the exhaust unit, and is used to control the gas flow direction in the pipelines. The sixth valve element is disposed in the pipeline that is connected to the first gas delivery unit, the second gas delivery unit and the mixing buffer element respectively, and is located downstream of the fifth valve element, and is used to control the opening and closing of the pipeline. The seventh valve element is installed in the pipelines that are connected to the mixing buffer element and the process chamber respectively, and is used to control the opening and closing of the pipelines; the third pressure monitoring element is installed in the pipelines that are connected to the mixing buffer element and the process chamber respectively, and is used to monitor the pipeline pressure.

3. The gas mixing device according to claim 1, characterized in that, The exhaust unit includes: The first vacuum element is connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the pressure relief unit, respectively. The eighth valve element is installed in pipelines that are respectively connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, the first vacuum element, and the pressure relief unit; The ninth valve element is disposed in a pipeline connected to the first vacuum element and is used to control the exhaust of the first vacuum element. The tenth valve element is located in the pipeline connected to the first vacuum element and is used to control the pipeline that supplies gas to the first vacuum element.

4. The gas mixing device according to claim 1, characterized in that, The pressure relief unit also includes: The eleventh valve element is installed in the pipelines that are respectively connected to the mixing buffer unit, the exhaust unit, and the second vacuum element; The twelfth valve element is installed in pipelines that are respectively connected to the mixing buffer unit, the exhaust unit, and the second vacuum element; The fourth pressure monitoring element is installed in the pipeline that is connected to the mixing buffer unit and the second vacuum element respectively.

5. The gas mixing device according to claim 1, characterized in that, The purging unit includes: The third gas delivery element is connected to the first gas delivery unit and the second gas delivery unit respectively; The thirteenth valve element is installed in a pipeline that is connected to the first gas delivery unit, the second gas delivery unit, and the third gas delivery element, respectively.

6. The gas mixing device according to claim 2, characterized in that, The fifth valve element includes: A pneumatic multi-port diaphragm valve is installed in pipelines that are respectively connected to a first gas delivery element, a second gas delivery element, a mixing buffer element, an exhaust unit, and a pressure relief unit; The first check valve is installed in the pipeline that is connected to the pneumatic multi-way diaphragm valve, the exhaust unit, and the pressure relief unit respectively; The sixth valve element includes: The fifth manual diaphragm valve is installed in a pipeline that is connected to the fifth valve element and the mixing buffer element respectively; The seventh valve element includes: The sixth manual diaphragm valve is installed in the pipeline that is connected to the mixing buffer element and the process chamber respectively; The third pressure regulating valve is installed in the pipeline that is connected to the mixing buffer element and the process chamber respectively, and is located downstream of the sixth manual diaphragm valve.

7. The gas mixing device according to claim 3, characterized in that, The eighth valve element includes: The sixth pneumatic diaphragm valve is installed in a pipeline that is connected to the first gas delivery element, the second gas delivery element, the mixing buffer element, and the first vacuum element respectively. The ninth valve element includes: The seventh manual diaphragm valve is installed in the pipeline connected to the first vacuum element; The tenth valve element includes: The eighth manual diaphragm valve is located in the pipeline connected to the first vacuum element.

8. The gas mixing device according to claim 4, characterized in that, The eleventh valve component includes: The ninth manual diaphragm valve is installed in pipelines that are respectively connected to the first gas delivery element, the second gas delivery element, the mixing buffer element, the first vacuum element, and the second vacuum element; The twelfth valve element includes: The tenth manual diaphragm valve is installed in a pipeline that is connected to the mixing buffer element, the first vacuum element, and the second vacuum element respectively. The eleventh manual diaphragm valve is located in the bypass line of the pipeline that is connected to the mixing buffer element, the first vacuum element, and the second vacuum element respectively, and is located between the ninth manual diaphragm valve and the tenth manual diaphragm valve.

9. The gas mixing device according to claim 5, characterized in that, The thirteenth valve component includes: The twelfth manual diaphragm valve is installed in a pipeline that is connected to the first gas delivery element, the second gas delivery element, and the third gas delivery element respectively. The seventh pneumatic diaphragm valve is installed in the pipeline connected to the first gas conveying element, the second gas conveying element, and the third gas conveying element, and is located downstream of the twelfth manual diaphragm valve. The eighth pneumatic diaphragm valve is installed in pipelines that are respectively connected to the first gas conveying element and the third gas conveying element; The ninth pneumatic diaphragm valve is installed in pipelines that are respectively connected to the second gas delivery element and the third gas delivery element; The second check valve is installed in the pipelines that are respectively connected to the first gas delivery element and the third gas delivery element, and is located downstream of the seventh pneumatic diaphragm valve and upstream of the eighth pneumatic diaphragm valve. The third check valve is installed in the pipeline that is connected to the second gas delivery element and the third gas delivery element respectively, and is located downstream of the seventh pneumatic diaphragm valve and upstream of the ninth pneumatic diaphragm valve.

10. The gas mixing device according to claim 1, characterized in that, The fourteenth valve element includes: The thirteenth manual diaphragm valve is located at the inlet of the pipeline that is connected to the mixing buffer element and the fourth gas delivery element, respectively. The tenth pneumatic diaphragm valve is located at the outlet of the pipeline that is connected to the mixing buffer element and the fourth gas delivery element, respectively, and is downstream of the thirteenth manual diaphragm valve.

11. The gas mixing device according to claim 1, characterized in that, The fifteenth valve element includes: The fourth pressure regulating valve is located in the pipelines that are connected to the mixing buffer element and the second vacuum element respectively, and is located upstream of the ninth manual valve. The needle valve is installed in the pipelines that are connected to the mixing buffer element and the second vacuum element respectively, and is located upstream of the fourth pressure regulating valve; The eleventh pneumatic diaphragm valve is located in a pipeline that is connected to the mixing buffer element and the second vacuum element, and is located upstream of the needle valve.

12. The gas mixing device according to any one of claims 1 to 11, characterized in that, Also includes: The safety protection unit is located at the top of the environment where the gas mixing device is located and is used to monitor environmental information.

13. A gas mixing method, applied to the gas mixing apparatus as described in any one of claims 1 to 12.

14. A semiconductor process system, characterized in that, include: The gas mixing device as described in any one of claims 1 to 12.

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