Organic solar cell module and method of manufacturing the same

Abstract

The present application relates to a kind of organic solar cell module and its preparation method.The organic solar cell module, in addition to deposit a conductive layer (1A,1B) on the first electrode layer, etching connection channel (P2) and partition channel (P3) on the conductive layer.Compared with prior art, the significant advantages of the present application are: when laser etching connection channel (P2) and partition channel (P3), it improves the fault tolerance of etching, both protects the first electrode layer, and makes each layer be etched completely, improves the performance of device.

Description

Technical Field

[0001] This invention belongs to the field of organic thin-film solar cell manufacturing, and in particular to an organic solar cell module and its preparation method. Background Technology

[0002] In recent years, pollution-free and renewable solar energy has become a hot topic in scientific research and commercial applications. Among them, photovoltaic solar cells have gained particular favor because they can safely and efficiently convert solar energy into electrical energy.

[0003] As solar energy technology has developed, first-generation solar cells, represented by monocrystalline and polycrystalline silicon, are relatively mature, but their fabrication processes are complex. Second-generation inorganic thin-film solar cells, represented by gallium arsenide and copper indium gallium selenide, offer high energy conversion efficiency but are expensive, and the safety hazards and pollution problems caused by heavy metals are unavoidable. Currently, third-generation solar cells, represented by organic semiconductor materials, are gradually becoming a research hotspot. Compared to traditional solar cell technologies, organic solar cells exhibit superior photoelectric conversion performance under low light and indoor light conditions, offering a wider range of applications. Furthermore, due to their flexibility, environmental friendliness, and roll-to-roll printing capabilities, organic solar cells represent a crucial development and research direction for new energy technologies.

[0004] In practical applications, to reduce energy loss due to the resistance of the transparent electrodes in organic solar cells and to obtain the required output voltage, researchers typically fabricate organic solar cell modules composed of series-connected sub-cells. Currently, the series connection structure between sub-cells is mainly achieved by patterning each functional layer using laser etching.

[0005] Reference: Peter Kubis, Ning Li, Tobias Stubhan. Patterning of organic photovoltaic modules by ultrafast laser. Prog. Photovolt: Res. Appl. 2015;23:238–246. Laser etching region P1 separates the first electrode, defining parallel sub-cell regions. Electrical connections between sub-cells are achieved at laser etching region P2 via the second electrode. Laser etching region P3 separates the second electrode, completing the series connection between sub-cells. However, due to etching precision, laser energy fluctuations, and other etching errors, problems easily arise during P2 and P3 processes, such as P2 being etched too shallowly, failing to expose the first electrode, or P2 and P3 being etched too deeply, damaging the first electrode layer. This affects the device's photoelectric conversion efficiency and may even cause the device to malfunction. In particular, when using conductive polymers as the first electrode material, the electrode material is similar to the organic functional layer material and is easily damaged during the P2 and P3 laser etching processes. While high-precision ultrafast lasers (picosecond or femtosecond lasers) can mitigate this technical deficiency to some extent, their high cost increases manufacturing expenses. Therefore, solving this technical problem is crucial for improving the efficiency and yield of organic solar cell modules. Summary of the Invention

[0006] The purpose of this invention is to provide an organic solar cell module and its preparation method, so as to solve the problem of poor electrical series connection between sub-cells caused by the inaccuracy of the laser etching process in the existing organic solar cell module preparation process, thereby improving the photoelectric conversion efficiency and yield of the organic solar cell module.

[0007] To achieve the objectives of this invention, the following technical solution is provided:

[0008] An organic solar cell module includes a substrate (100) and a plurality of solar cell units, wherein the solar cell units are located on the substrate (100); and the solar cell units are arranged from bottom to top as a first electrode layer (101), a photovoltaic layer (102), and a second electrode layer (103):

[0009] At least one insulating channel (P1) is etched on the first electrode layer (101), the insulating channel (P1) extends to the substrate, dividing the first electrode layer into a plurality of mutually insulated sub-electrodes, and the insulating channel (P1) is filled with the same material as the photovoltaic layer (102).

[0010] A conductive layer (1A, 1B) is provided on each sub-electrode of the first electrode layer (101).

[0011] At least one connection channel (P2) is etched on the photovoltaic layer (102). The connection channel (P2) extends through the photovoltaic layer (102) to the conductive layer (1A, 1B) region. The connection channel (P2) is filled with the same material as the second electrode layer (103) so that adjacent sub-electrodes are connected in series.

[0012] The second electrode layer (103) is etched with at least one isolation channel (P3), which penetrates the second electrode layer (103) and the photovoltaic layer (102) to the conductive layer (1A, 1B) region;

[0013] The connecting channel (P2) is located between the insulating channel (P1) and the isolation channel (P3).

[0014] Furthermore, the conductive layers (1A, 1B) do not overlap or partially overlap with the insulating channel (P1).

[0015] In one embodiment, the substrate can use a base with excellent transparency, surface smoothness, ease of handling, and water resistance. Specifically, a glass substrate, a thin-film glass substrate, or a transparent plastic substrate can be used. The plastic substrate may include, but is not limited to, single-layer or multi-layer films such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyetheretherketone (PEEK), and polyimide (PI). Therefore, the substrate can be rigid or flexible.

[0016] The first electrode layer can be made of a transparent or translucent conductive material, but is not limited to this. The conductive material can be a conductive metal oxide, such as indium oxide, zinc oxide, tin oxide, indium tin oxide (ITO), fluorine-doped tin oxide (FTO), gallium-doped zinc oxide (GZO), aluminum-doped zinc oxide (AZO), indium zinc oxide (IZO), and indium gallium zinc oxide (IGZO); conductive polymers, such as poly(3,4-ethylenedioxythiophene) / poly(4-styrene sulfonate) (PEDOT / PSS), polypyrrole, and polyaniline; conductive carbon materials, such as graphene and carbon nanotubes; nanoconductive materials, such as metal nanoparticles or nanowires; ultrathin metal layers capable of maintaining a certain degree of light transmittance, and composite stacks containing them, such as metal layers formed of metals like gold, platinum, silver, copper, cobalt, nickel, indium, or aluminum, or film stacks of alloys containing any of these metals.

[0017] Furthermore, the thickness of the first electrode layer is preferably 50-500 nm.

[0018] The conductive layer can be prepared by selective deposition.

[0019] In one embodiment, the conductive layer material is selected from metals, carbon materials, or carbon / polymer composites. In a specific embodiment, the conductive layer material may be an alloy containing metals such as aluminum, gold, platinum, silver, copper, indium, bismuth, lead, tin, zinc, iron, cobalt, nickel, titanium, zirconium, molybdenum, tungsten, chromium, or tantalum, or any of the aforementioned metals; it may also be a carbon material layer such as carbon nanotubes or graphene; or a composite material layer, wherein particles and fibers of the aforementioned metal or carbon materials are dispersed in a polymer material (metal / polymer composite layer or carbon / polymer composite layer). Preferably, the conductive layer material is selected from silver or silver nanomaterials, copper or copper nanomaterials, or aluminum or aluminum nanomaterials.

[0020] In one embodiment, the width of the conductive layer is selected from 200-500 μm; the width of the conductive layer is smaller than the width of the first electrode layer of the solar cell unit.

[0021] Furthermore, the thickness is selected from 50-500 nm;

[0022] Furthermore, the spacing between two adjacent conductive layers is 0.2-2 cm.

[0023] Under the same laser etching conditions, the power required to etch the conductive layer material is greater than the power required to etch the first electrode layer material, which can effectively prevent the first electrode layer from being damaged during laser etching of connecting channels and isolation channels.

[0024] An insulating channel is obtained by laser etching on the first electrode layer or the conductive layer; preferably, the spacing between two adjacent insulating channels is equal. The width of the insulating channel can be between 10-200 μm, and the first electrode layer is divided into sub-electrodes with a width of 0.5-2 cm.

[0025] In one embodiment, the insulating channel is located at the edge of the conductive layer.

[0026] In one embodiment, the photovoltaic layer can be a single layer, selected from photoactive layers; the photovoltaic layer can also be multiple layers, preferably three layers, such as... Figure 2 The device structure shown consists of a first charge transport layer, a photoactive layer, and a second charge transport layer, arranged sequentially from the first electrode layer upwards.

[0027] When the photovoltaic layer is a single layer, the connecting channel is filled with a photoactive layer material; when the photovoltaic layer is multi-layered, the connecting channel is filled with a first charge layer material.

[0028] The photoactive layer comprises an electron donor material and an electron acceptor material. In the photoactive layer, photons are absorbed by the electron donor or acceptor material to form strongly bound electron-hole pairs (excitons). In order to effectively convert light energy into electrical energy, the excitons must diffuse to the donor / acceptor material interface before recombination and achieve exciton separation through charge transfer, forming free electrons and holes, which are then collected by the cathode and anode, respectively, to achieve photoelectric conversion.

[0029] In one embodiment, the mass ratio of electron donor material to electron acceptor material in the photoactive layer can be from 1:10 to 10:1. Further, the mass ratio of electron donor material to electron acceptor material can be from 1:0.5 to 1:5; specifically, the mass ratio of electron donor material to electron acceptor material is from 1:1.2 to 1:1.5.

[0030] In one embodiment, the photoactive layer comprises a donor material and an acceptor material; preferably, the donor material is selected from polymer donor materials; and the acceptor material is selected from small molecule organic materials.

[0031] In another embodiment, the photoactive material is selected from one donor material and two acceptor materials; preferably, the acceptor material is selected from one non-fullerene acceptor material and one fullerene acceptor material.

[0032] In one embodiment, the electron donor material may be polythiophene and its derivatives, polypyrrole and its derivatives, pyrazoline derivatives, arylamine derivatives, triphenyldiamine derivatives, oligothiophene and its derivatives, polyvinylcarbazole and its derivatives, polysilane and its derivatives, polysiloxane derivatives having an aromatic amine on an aromatic amine, or polyaniline and its derivatives, phthalocyanine derivatives, porphyrin and its derivatives, polyphenylene vinylidene and its derivatives, polythiophene vinylidene and its derivatives, etc., with side chains or main chains. More specifically, the donor material can be a polythiophene material system, such as P3AT, P3HT, P3OT, P3DDT, etc.; a fluorene-containing polymer material system, such as PF8BT, etc.; a novel structural narrow bandgap polymer material system, such as benzothiadiazoles (BT, BBT), quinoxalines (QU, PQ), pyrazines (TP, PQ), and copolymers with electron-rich groups (such as thiophene derivatives), such as PCDTBT, PCPDTBT, PFO-DBT, PTQ10, PTB7, PM6, J52, etc. These donor materials can be used in combination, or mixtures or compounds of any of these materials with another material can be used. The electron acceptor can be a fullerene and its derivatives, such as C60 or C70 or their derivatives, specifically selected from PC 61 BM, PC 71BM; or it can be a non-fullerene small molecule acceptor, such as BO-4Cl and its derivatives, Y6 and its derivatives, BTA and its derivatives, EH-IDTBR, TTPBT-IC, IEICO-4F, etc.; or a non-fullerene polymer acceptor material, such as N2200, etc. Like donor materials, these acceptor materials can also be used in combination.

[0033] The aforementioned first and second charge transport layers are used in pairs; that is, if the first charge transport layer is an electron transport layer, then the second charge transport layer is a hole transport layer; conversely, if the first charge transport layer is a hole transport layer, then the second charge transport layer is an electron transport layer. The function of the charge transport layers is to efficiently and selectively transport electrons and holes separated from the photoactive layer to the corresponding electrodes. The electron transport layer can efficiently transport electrons to the cathode, and its material can be a low work function metal oxide, fullerene derivative, polymer, or a composite thereof, such as titanium oxide (TiO₂). x Materials used include, but are not limited to, zinc oxide (ZnO), tin oxide (SnO2), polyethylenimine ethoxylated (PEIE), polyetherimide (PEI), PFN, PFN-Br, and ZnO-PEIE composites, PEI-Zn, and ZnO-PEI composites. The hole transport layer can efficiently transport holes to the anode, and its materials can be high work function metal oxides such as molybdenum oxide (MoO2). x ), vanadium oxide (V₂O₅), nickel oxide (NiO), tungsten oxide (WO₂) x ), or polymer materials such as PEDOT:PSS and polyaniline derivatives, but not limited to these.

[0034] The thickness of the photovoltaic layer is preferably 100-500 nm; more preferably 150-200 nm.

[0035] A connection channel is obtained by laser etching on the photovoltaic layer. The connection channel is located above the conductive layer region and extends through the photovoltaic layer to the conductive layer region.

[0036] The width of the connecting channel is 40 to 200 μm; preferably 50 to 100 μm.

[0037] The function of the connecting channel is to connect the cathodes and anodes of two adjacent sub-cells by filling them with the material of the second electrode layer, thus forming a series circuit.

[0038] In one embodiment, the connecting channel and the insulating channel are separated by a first distance d1, where d1 is selected from 20 to 100 μm, preferably 50 to 70 μm.

[0039] The connection channel is located above the conductive layer region because fluctuations in laser energy, low precision, and uneven film thickness can lead to damage to the first electrode or incomplete etching of the functional layer during the laser etching process. This results in increased contact resistance at P2 in subsequent fabrication processes, affecting the photoelectric conversion efficiency of the organic solar cell module. This invention, by depositing an additional conductive layer in the laser etching region, allows for control of the laser energy to limit the etching depth to this conductive layer. This ensures complete etching of the functional layer without damaging the first electrode layer, thus improving device performance.

[0040] The second electrode layer can be a translucent or opaque conductive material. The conductive material can be a metal or alloy of gold, platinum, silver, copper, cobalt, nickel, indium, or aluminum; conductive metal oxides, such as indium oxide, zinc oxide, tin oxide, indium tin oxide (ITO), fluorine-doped tin oxide (FTO), gallium-doped zinc oxide (GZO), aluminum-doped zinc oxide (AZO), indium zinc oxide (IZO), and indium gallium zinc oxide (IGZO); conductive polymers, such as poly(3,4-ethylenedioxythiophene) / poly(4-styrene sulfonate) (PEDOT / PSS), polypyrrole, and polyaniline; conductive carbon materials, such as graphene and carbon nanotubes; nanoconductive materials, such as metal nanoparticles or nanowires; or composites of the above conductive materials.

[0041] Laser etching is performed on the second conductive layer to obtain an isolation channel. The isolation channel is located in the upper part of the conductive layer region and extends through the second conductive layer and the photovoltaic layer to the conductive layer region.

[0042] The second electrode layer is separated into multiple sub-cells by using a partition channel.

[0043] The width of the partition channel is 20 to 200 μm; preferably 40 to 100 μm.

[0044] The partition channel and the connecting channel are separated by a second distance d2, where d2 is selected from 20 to 100 μm, preferably 50 to 70 μm.

[0045] The reason the isolation channel is located above the conductive layer region is that, in traditional methods, i.e., without a conductive layer, especially when the second conductive layer is a metal or metal oxide, the laser energy used to etch the second electrode layer is usually higher than the laser energy required to etch the functional layer. This often results in the first electrode portion at the isolation channel being partially or even completely destroyed. On the other hand, if the laser etching energy at the isolation channel is reduced, the second electrode is often not completely isolated. However, by depositing a conductive layer on the first electrode at the isolation channel, the first electrode can be effectively protected, ensuring the normal operation of the device.

[0046] The present invention also provides a method for preparing the above-mentioned organic solar cell module, comprising the following steps:

[0047] Step 1. Form a first electrode layer (101) on a substrate (100).

[0048] Step 2. Deposit conductive layers (1A, 1B) on the first electrode layer (101);

[0049] Step 3. An insulating channel (P1) is obtained on the first electrode layer (101) or conductive layer (1A, 1B) by laser etching, and the insulating channel (P1) extends to the substrate (100).

[0050] Step 4. Deposit a photovoltaic layer (102) on the first electrode layer (101), the conductive layer (1A, 1B), and the insulating channel (P1).

[0051] Step 5. A connection channel (P2) is obtained on the photovoltaic layer (102) by laser etching. The connection channel (P2) extends through the photovoltaic layer (102) to the conductive layer (1A, 1B).

[0052] Step 6. Deposit a second electrode layer (103) on the photovoltaic layer (102) and the connecting channel (P2);

[0053] Step 7. A barrier channel (P3) is obtained on the second electrode layer (103) by laser etching. The barrier channel (P3) is adjacent to the connecting channel (P2) and extends through the second electrode layer (103) and the photovoltaic layer (102) to the conductive layer (1A, 1B).

[0054] The laser used in this invention can be a nanosecond, picosecond, or femtosecond laser in the infrared or visible light band. Preferably, a nanosecond laser is used to reduce equipment costs.

[0055] In step 1, the first electrode can be prepared onto the substrate by methods such as sputtering, electron beam deposition, thermal deposition, spin coating, inkjet printing, spraying, blade coating, slot coating, etc., but is not limited to the above methods.

[0056] In step 2, the conductive layer can be prepared onto the substrate by inkjet printing, screen printing, or vacuum evaporation, but is not limited to the above methods.

[0057] In step 4, the photovoltaic layer can be prepared by methods such as spin coating, inkjet printing, slot coating, blade coating, and vacuum evaporation, but is not limited to the above methods.

[0058] In step 6, the second electrode layer can be prepared by methods such as sputtering, electron beam deposition, vacuum evaporation, spin coating, inkjet printing, spraying, blade coating, slot coating, etc., but is not limited to the above methods.

[0059] The reason for step 2 preceding step 3 is that if an insulating channel is etched first on the first electrode layer, and then a conductive layer is deposited at the edge of the insulating channel as a protective layer for the first electrode during the etching of the connecting and separating channels, a certain deviation can easily occur in the positioning during the deposition of the conductive layer. This can cause the conductive material to be deposited into the grooves of the insulating channel, resulting in incomplete separation of the first electrode layer, thus causing the device to malfunction. Furthermore, if the conductive layer is deposited away from P1, the dead zone of the organic solar cell module is increased, reducing its effective photoelectric conversion area and leading to a decrease in photoelectric conversion efficiency.

[0060] The significant advantages of this invention compared to existing technologies are:

[0061] 1. In this invention, an additional conductive layer is deposited on the first electrode layer. When the laser is etching the connection channel P2, it is positioned on the conductive layer. By controlling the laser energy, the etching depth is limited to the conductive layer, which ensures that the functional layer is completely etched without damaging the first electrode layer, thus improving the performance of the device.

[0062] 2. When the laser is etching the isolation channel P3, the conductive layer can effectively protect the first electrode, avoiding the situation where the first electrode is partially or even completely destroyed or the second electrode is not completely isolated during the etching of the isolation channel.

[0063] 3. According to the method for preparing an organic solar cell module provided by the present invention, a conductive layer is first prepared, and then laser etching is performed to obtain an insulating channel. This can prevent the conductive layer material from entering the insulating area, which would cause the two adjacent first electrode layers to be uninsulated, thus leading to a short circuit. At the same time, the conductive layer can also play a positioning role when laser etching the insulating area. Attached Figure Description

[0064] Figure 1A This is a schematic diagram of step 1 in the preparation method of the organic solar cell module of the present invention.

[0065] Figure 1B This is a schematic diagram of step 2 in the preparation method of the organic solar cell module of the present invention.

[0066] Figure 1C This is a schematic diagram of step 3 in the preparation method of the organic solar cell module of the present invention.

[0067] Figure 1D This is a schematic diagram of step 4 in the preparation method of the organic solar cell module of the present invention.

[0068] Figure 1E This is a schematic diagram of step 5 in the preparation method of the organic solar cell module of the present invention.

[0069] Figure 1FThis is a schematic diagram of step 6 in the preparation method of the organic solar cell module of the present invention.

[0070] Figure 1G This is a schematic diagram of step 7 in the preparation method of the organic solar cell module of the present invention.

[0071] Figure 2 This is a schematic diagram of the structure of the organic solar cell unit provided by the present invention.

[0072] Figure 3 This is a schematic diagram of the structure of the organic solar cell module of Comparative Examples 1, 2, and 3 of the present invention.

[0073] Figure 4 This is a schematic diagram of the structure of the organic solar cell module of Comparative Example 4 of the present invention.

[0074] Figure 5 These are actual optical micrographs of P1 and P2 of the organic photovoltaic module in Comparative Example 1.

[0075] Figure 6 This is a physical optical micrograph of P3 of the organic photovoltaic module in Comparative Example 2.

[0076] Figure 7 These are actual optical micrographs of P1 and P2 of the organic photovoltaic module in Comparative Example 3.

[0077] Figure 8 This is a physical optical micrograph of the organic photovoltaic module P3 in Comparative Example 4.

[0078] Wherein, 100 is the substrate, 101 is the first electrode layer, 102 is the photovoltaic layer, 103 is the second electrode layer, 104 is the first charge transport layer, 105 is the photoactive layer, 106 is the second charge transport layer, P1 is the insulating channel, P2 is the connecting channel, P3 is the blocking channel, 1A is the conductive layer, and 1B is the conductive layer. Detailed Implementation

[0079] To make the technical problems to be solved, the technical solutions, and the beneficial effects of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and are not intended to limit the present invention. Example 1

[0080] The fabrication of organic solar cell modules includes the following steps:

[0081] Step 1: Form a first electrode layer 101 on a glass substrate by sputtering. The material is ITO and the thickness is 150 nm.

[0082] Step 2: Print a conductive paste containing silver nanoparticles using inkjet printing. After drying, multiple conductive layers with a thickness of about 100 nm are formed, each with a width of 300 μm and a spacing of 0.5 cm.

[0083] Step 3: Using a green laser etching system with a wavelength of 532 nm and a power of 20 W, locate the edge of the conductive layer and etch out the insulating channel P1. The laser parameters for etching are: current 28 mA, etching speed 200 mm / s, Q frequency 80 kHz, and Q release 5 μs. The final width of P1 is about 30 nm.

[0084] Step 4: PEI-Zn is coated onto the first electrode 101 and the conductive layer as the first charge transport layer 104 using a blade coating method. The PEI-Zn precursor solution is prepared according to the reference (Nature Communications, 2020, 11, 4508). After coating, 150... o Annealing at C for 10 minutes yielded a film approximately 40 nm thick. Next, a photoactive layer 105 was coated onto the first charge transport layer 104, wherein the polymer donor PM6 and the small molecule acceptor BO-4Cl were mixed at a ratio of 1:1.2 and dissolved in toluene, with a total concentration of 10 mg / ml. After coating, the film was annealed at 100 °C. o Annealing at C for 10 minutes yielded a photoactive layer 105 of approximately 100 nm. On top of this, vacuum evaporation was performed (evaporation environment 1*10). -5 10 nm MoO3 was deposited as the second charge transport layer 106 using a method with a evaporation rate of 1 Å / s (Pa).

[0085] Step 5: Using the same laser etching system, locate and etch the connection channel P2 in the region above the conductive layer, where the distance between the connection channel P2 and the insulating channel P1 is approximately 50 μm. The laser parameters used for etching are: current 23.4 mA, etching rate 100 mm / s, Q frequency 80 kHz, Q release 5 μs, and by two scribing operations, the final width of P2 is approximately 80 nm. The connection channel penetrates the second charge transport layer, the photoactive layer, the first charge transport layer, and reaches the conductive layer.

[0086] Step 6: Vacuum evaporation (evaporation environment is 1*10) -5 120 nm of metallic silver was deposited as the second electrode layer 103 using a method with a evaporation rate of 5 Å / s (Pa).

[0087] Step 7: Using the same laser system described above, locate and etch the isolation channel P3 in the region above the conductive layer, where the interval between P3 and P2 is 50 μm. The laser parameters used for etching are: current 24 mA, etching rate 120 mm / s, Q frequency 80 kHz, and Q release 5 μs, resulting in a width of approximately 40 nm for P3. The isolation channel penetrates the second electrode layer, the second charge transport layer, the photoactive layer, the first charge transport layer, and finally to the conductive layer.

[0088] The size prepared in this embodiment is 16cm. 2 Organic solar photovoltaic modules at a standard 100 mW / cm 2 The photoelectric conversion efficiency under the AM1.5G solar simulator is 12.8%. Example 2

[0089] The fabrication of organic solar cell modules includes the following steps:

[0090] Step 1: Coat a first electrode layer 101 of 200 nm highly conductive PEDOT:PSS (PH1000, Heraeus) onto a flexible PET substrate.

[0091] Step 2 is the same as the method used in Step 2 of Example 1, but a conductive ink containing copper nanoparticles is used.

[0092] Step 3: Using the same green laser etching system as in Example 1, locate the edge of the conductive layer and etch out the insulating channel P1. The parameters used are different. Specifically, the laser parameters for etching are: current 22.5 mA, etching speed 100 mm / s, Q frequency 80 kHz, Q release 0.5 μs, and the final width of P1 is about 40 nm.

[0093] Step 4: Prepare the first charge transport layer 104 using the same method and materials as in Example 1. Coat the first charge transport layer 104 with a photoactive layer 105. The materials used are different: a polymer donor PTQ10, a non-fullerene acceptor BO-4Cl, and a fullerene acceptor PC60BM are mixed in a ternary ratio of 1:1.2:0.3 and dissolved in toluene, with a total concentration of 25 mg / ml. After coating, the film is heated to 100°C. o Annealing at C for 10 minutes yielded a photoactive layer of approximately 120 nm. Then, a second charge transport layer 106, made of PEDOT:PSS (Clevios AI 4083, Heraeus), was coated onto the active layer 105 using a blade coating process. 0.1 wt% Capstone-30 (DuPont) was added to reduce surface tension and improve wettability on the photoactive layer surface. After coating, the PEDOT:PSS layer was annealed at 110 °C. oAnnealing in C for 10 minutes resulted in a final thickness of 40 nm.

[0094] Step 5: Using the same laser etching system, locate and etch the connection channel P2 in the region above the conductive layer, where the interval between P2 and P1 is approximately 50 μm. The laser parameters used for etching are: current 22 mA, etching rate 100 mm / s, Q frequency 80 kHz, Q release 0.2 μs, and by scribe two lines, the final width of the connection channel is approximately 80 nm. The connection channel penetrates the second charge transport layer, the photoactive layer, the first charge transport layer, and then to the conductive layer.

[0095] Step 6: Obtain a 150 nm silver nanowire second electrode layer 103 by coating silver nanowire ink (diameter ~30 nm, length 30-50 μm, XFNANO).

[0096] Step 7: Using the same laser system described above, locate and etch a barrier channel in the region above the conductive layer, wherein the barrier channel and the connecting channel are spaced 50 μm apart. The laser parameters used for etching are: current 23 mA, etching rate 100 mm / s, Q frequency 80 kHz, and Q release 5 μs, resulting in a P3 width of approximately 40 nm. The barrier channel penetrates the second electrode layer, the second charge transport layer, the photoactive layer, the first charge transport layer, and finally to the conductive layer.

[0097] The size prepared in this embodiment is 4 cm. 2 The photoelectric conversion efficiency of the organic solar photovoltaic module is 18.1% when illuminated by an LED lamp with a color temperature of 3000K and a light intensity of 1000Lux. Example 3

[0098] The fabrication of organic solar cell modules includes the following steps:

[0099] Step 1: Coat a first electrode layer 101 of 200 nm highly conductive PEDOT:PSS (PH1000, Heraeus) onto a flexible PET substrate.

[0100] Step 2: Vacuum evaporation of 100 nm aluminum metal as a conductive layer using a mask, with each layer having a width of 300 μm and a spacing of 0.5 cm.

[0101] Step 3: Using a green laser etching system with a wavelength of 532 nm and a power of 20 W, locate the edge of the conductive layer and etch out the insulating channel P1. The laser parameters for etching are: current 23.4 mA, etching speed 100 mm / s, Q frequency 80 kHz, and Q release 5 μs. The final width of P1 is about 40 nm.

[0102] Step 4: PEI-Zn is coated onto the first electrode layer 101 and the conductive layer as the first charge transport layer 104 using a blade coating method. The PEI-Zn precursor solution is prepared according to the reference (Nature Communications, 2020, 11, 4508). After coating, 150... o Annealing at C for 10 minutes yielded a film approximately 40 nm thick. Next, a photoactive layer 105 was coated onto the first charge transport layer 104. This layer consisted of a ternary mixture of polymer donor PTQ10, non-fullerene acceptor BO-4Cl, and fullerene acceptor PC60BM in a 1:1.2:0.3 ratio, dissolved in toluene, with a total concentration of 25 mg / ml. After coating, the film was annealed at 100 °C. o Annealing at C for 10 minutes yielded a photoactive layer 105 with a wavelength of approximately 120 nm. On top of this, vacuum evaporation was performed (evaporation environment 1*10). -5 10 nm MoO3 was deposited as the second charge transport layer 106 using a method with a evaporation rate of 1 Å / s (Pa).

[0103] Step 5: The etching method and width of the connecting channel P2 are the same as in Example 2.

[0104] Step 6: Vacuum evaporation is performed on the second charge transport layer 106 (evaporation environment is 1*10). -5 A 120 nm layer of metallic silver was deposited as the second electrode layer using a method with a evaporation rate of 5 Å / s (Pa).

[0105] Step 7: Using the same laser system described above, locate and etch the isolation channel P3 in the region above the conductive layer, wherein the spacing between the isolation channel and the connecting channel is 50 μm. The laser parameters used for etching are: current 24 mA, etching rate 100 mm / s, Q frequency 80 kHz, and Q release 5 μs, resulting in a width of approximately 40 nm for P3. The isolation channel penetrates through the second electrode layer, the second charge transport layer, the photoactive layer, the first charge transport layer, and down to the conductive layer.

[0106] The size prepared in this embodiment is 4cm. 2 The photoelectric conversion efficiency of the organic solar photovoltaic module is 20.5% when illuminated by an LED lamp with a color temperature of 3000K and a light intensity of 1000Lux. Comparative Example 1

[0107] The fabrication steps for the organic solar cell module are the same as in Example 1, except that a conductive layer is not deposited on the first electrode layer 101. The module structure is as follows. Figure 3 .

[0108] like Figure 5As shown, when the etching conditions used for the connecting channel and the partition channel are the same as in the embodiment, it can be seen that the ITO is scratched and holes appear locally, which results in the series resistance of Comparative Example 1 being higher than that of Example 1.

[0109] The size of the comparative sample was 16cm. 2 Organic solar photovoltaic modules at a standard 100 mW / cm 2 The photoelectric conversion efficiency under the AM1.5G solar simulator is 10.2%. Comparative Example 2

[0110] The fabrication of the organic solar cell module follows the same steps as in Example 1, except that no conductive layer is deposited on the first electrode layer 101. In step 7, when laser etching the isolation channel, the laser parameters used are: current 23.5 mA, etching rate 120 mm / s, Q frequency 80 kHz, and Q release 5 μs. The module structure is as follows: Figure 3 As shown.

[0111] like Figure 6 As shown, when the current used for laser etching at P3 is reduced, incomplete etching will occur, especially at P3, where the silver electrode cannot be completely separated, causing the device to malfunction. Comparative Example 3

[0112] Fabrication of organic solar cell modules:

[0113] The fabrication steps are the same as in Example 2, except that no conductive layer is deposited on the first electrode layer 101. The module structure is as follows: Figure 3 .

[0114] like Figure 7 As shown, since the first electrode layer and the photovoltaic layer (including the first charge transport layer 104, the photoactive layer 105 and the second charge transport layer 106) in this comparative example are both organic materials, when the same laser etching conditions as in Example 2 are used, the electrode at the connecting channel P2 is completely etched, and the series connection between the sub-cells at P2 is poor, resulting in the device not working.

[0115] Similarly, since both the first electrode and the photovoltaic layer are organic materials, it is difficult to precisely control the depth of laser etching at the interface between the first electrode and the functional layer by adjusting the etching parameters, which affects the repeatability and yield of device fabrication. Comparative Example 4

[0116] Fabrication of organic solar cell modules:

[0117] The fabrication steps are the same as in Example 3, except that the isolation channel P3 is located in the conductive layer region. The device structure is as follows: Figure 4.

[0118] like Figure 8 As shown, the device does not work when illuminated by an LED lamp with a color temperature of 3000K and a light intensity of 1000Lux. This is because when P3 is etched under the same laser etching conditions as in Example 3, the large energy required to etch the silver electrode severely damages or even completely removes the first electrode made of organic material during the etching process, preventing the sub-cells from being connected in series and causing the device to malfunction. Comparative Example 5

[0119] Fabrication of organic solar cell modules:

[0120] The fabrication steps are the same as in Example 1, except that an insulating channel P1 is first etched on the first electrode layer 101, and then a conductive layer is deposited at the edge of P1 as a protective layer for the first electrode during the etching of P2-P3. The device structure is shown in Figure 1 (the difference is that steps 2 and 3 are reversed).

[0121] The organic solar photovoltaic module was tested under the same conditions as in Example 1 at a standard 100 mW / cm². 2 The device does not work under the AM1.5G solar simulator. This is because there is a certain deviation in positioning during the deposition of the conductive layer. It was observed that the conductive material was deposited into the P1 groove, resulting in incomplete separation of the first electrode layer, which in turn caused the device to malfunction.

Claims

1. An organic solar cell module, the organic solar cell module comprising a substrate (100) and a plurality of solar cell units, the solar cell units being located on the substrate (100); and the solar cell units being, from bottom to top, a first electrode layer (101), a photovoltaic layer (102), and a second electrode layer (103), characterized in that: At least one insulating channel (P1) is etched on the first electrode layer (101), the insulating channel (P1) extends to the substrate, dividing the first electrode layer into a plurality of mutually insulated sub-electrodes, and the insulating channel (P1) is filled with the same material as the photovoltaic layer (102). A conductive layer (1A, 1B) is provided on each sub-electrode of the first electrode layer (101); the thickness of the conductive layer is selected from 50-500 nm. A connection channel (P2) is etched on the photovoltaic layer (102). The connection channel (P2) extends through the photovoltaic layer (102) to the conductive layer (1A, 1B) region. The connection channel (P2) is filled with the material of the second electrode layer (103) so that adjacent sub-electrodes are connected in series. An isolation channel (P3) is etched in the second electrode layer (103), and the isolation channel (P3) penetrates the second electrode layer (103) and the photovoltaic layer (102) to the conductive layer (1A, 1B) region; The connecting channel (P2) is located between the insulating channel (P1) and the isolation channel (P3); The laser power required to etch the conductive layer (1A, 1B) material is greater than the power required to etch the first electrode layer (101) material; The organic solar cell module is prepared as follows: Step 1. Form a first electrode layer (101) on the substrate (100); Step 2. Deposit conductive layers (1A, 1B) on the first electrode layer (101); the conductive layers (1A, 1B) are prepared by inkjet printing. Step 3. An insulating channel (P1) is obtained on the first electrode layer (101) or conductive layer (1A, 1B) by laser etching, and the insulating channel (P1) extends to the substrate (100). Step 4. Deposit a photovoltaic layer (102) on the first electrode layer (101), the conductive layer (1A, 1B), and the insulating channel (P1); Step 5. A connection channel (P2) is obtained on the photovoltaic layer (102) by laser etching. The connection channel (P2) extends through the photovoltaic layer (102) to the conductive layer (1A, 1B). Step 6. Deposit a second electrode layer (103) on the photovoltaic layer (102) and the connecting channel (P2); the second electrode layer (103) is prepared by vacuum evaporation. Step 7. A barrier channel (P3) is obtained on the second electrode layer (103) by laser etching. The barrier channel (P3) is adjacent to the connecting channel (P2) and extends through the second electrode layer (103) and the photovoltaic layer (102) to the conductive layer (1A, 1B).

2. The organic solar cell module according to claim 1, characterized in that: The conductive layer (1A, 1B) material is selected from metallic materials, carbon materials, conductive polymers, or composite materials.

3. An organic solar cell module according to claim 1, characterized in that: The conductive layer (1A, 1B) material is selected from metals or alloys containing aluminum, gold, platinum, silver, copper, indium, bismuth, lead, tin, zinc, iron, cobalt, nickel, titanium, zirconium, molybdenum, tungsten, chromium or tantalum.

4. An organic solar cell module according to claim 1, characterized in that: The material of the first electrode layer (101) is selected from conductive metal oxides, conductive polymers, conductive carbon materials or nano-conductive materials.

5. An organic solar cell module according to claim 1, characterized in that: The photovoltaic layer (102) includes a first charge transport layer (104), a photoactive layer (105), and a second charge transport layer (106); the insulating channel (P1) is filled with the same material as the first charge transport layer.

6. An organic solar cell module according to claim 1, characterized in that: The isolation channel (P3) is 20 to 100 μm apart from the connecting channel (P2).

7. An organic solar cell module according to claim 1, characterized in that: The material of the second electrode layer (103) is selected from metallic materials, alloys, conductive metal oxides, conductive polymers, conductive carbon materials or nano-conductive materials.

8. An organic solar cell module according to claim 1, characterized in that: The connecting channel (P2) is 20 to 100 μm apart from the insulating channel (P1).

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