Methods and systems for monitoring the service life of photoresist filters and photoresist supply systems

Abstract

This invention discloses a method, system, and photoresist supply system for monitoring the usage cycle of a photoresist filter. The monitoring method includes: providing a photoresist filter to trap particulate matter within the photoresist to filter it; running the photoresist filter; acquiring the filtration status of the photoresist filter and determining whether the filtration status has reached a preset first threshold; if not, returning to continue running the photoresist filter; if yes, acquiring the state of the particulate matter within the photoresist filter; determining whether the state of the particulate matter has reached a preset second threshold; if not, returning to continue running the photoresist filter; if yes, stopping the operation of the photoresist filter and capturing the current filtration status of the photoresist filter as the photoresist filter's usage cycle. This invention's monitoring method is simple and can accurately detect the filter's usage cycle.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing, and in particular to a method, system, and photoresist supply system for monitoring the lifespan of a photoresist filter. Background Technology

[0002] Micro-circuit patterns are created on the surface of semiconductor wafers or glass substrates for liquid crystal displays through photolithography and etching processes. In the photolithography process, a photoresist supply device applies a liquid such as photoresist (also known as photoresist liquid) to the surface of the wafer or glass substrate. The photoresist, contained in a supply bottle, is drawn in by a pump and applied to the substrate through a nozzle via a filter. Currently, in photoresist supply systems, the lifespan of photoresist filters is generally defined based on the manufacturer's recommendations, making it difficult to accurately determine the filter's lifespan. This often results in filters being discarded before fully utilizing their filtering function, leading to resource waste, or overuse of filters causing pattern defects in the photoresist on the substrate, affecting the final semiconductor product's yield and quality, and simultaneously impacting the semiconductor manufacturing process's production line and productivity. Summary of the Invention

[0003] Therefore, the purpose of this invention is to provide a method, system, and photoresist supply system for monitoring the lifespan of a photoresist filter. According to this invention, the lifespan of the photoresist filter can be effectively and accurately defined, thereby reducing defects in semiconductor products.

[0004] Some embodiments of the present invention provide a method for monitoring the usage cycle of a photoresist filter, comprising: providing a photoresist filter, the photoresist filter trapping particulate matter within the photoresist to filter the photoresist; running the photoresist filter; acquiring the filtration status of the photoresist filter and determining whether the filtration status has reached a preset first threshold; if not, returning to continue running the photoresist filter; if yes, acquiring the status of the particulate matter within the photoresist filter; determining whether the status of the particulate matter has reached a preset second threshold; if not, returning to continue running the photoresist filter; if yes, stopping the operation of the photoresist filter and capturing the current filtration status of the photoresist filter as the usage cycle of the photoresist filter.

[0005] In some embodiments, the method further includes: issuing an alarm regarding the current filtering status to prompt the cessation of operation of the photoresist filter.

[0006] In some embodiments, obtaining the filtration status of the photoresist filter includes: obtaining the filtration status of the photoresist filter in real time; or, obtaining the filtration status of the photoresist filter periodically.

[0007] In some embodiments, the filtration state is the filtration amount or filtration time of the photoresist filter, and the first threshold is a preset filtration amount value or filtration time value, respectively.

[0008] In some embodiments, the filtration state includes the filtration time and filtration amount of the photoresist filter, and the first threshold includes a preset filtration time value and a filtration amount value; wherein, determining whether the filtration state has reached the preset first threshold includes: determining the first threshold based on whether one of the preset filtration time value and the filtration amount value is reached earlier.

[0009] In some embodiments, the state of the particulate matter includes the number of particulate matter and / or the particle size of the particulate matter.

[0010] In some embodiments, obtaining the state of the particles within the photoresist filter includes:

[0011] Real-time acquisition of the state of the particles within the photoresist filter; or,

[0012] The state of the particles inside the photoresist filter is acquired periodically.

[0013] Some embodiments of the present invention also provide a monitoring system for the usage cycle of a photoresist filter. The monitoring system monitors the photoresist filter, which traps particulate matter within the photoresist to filter it. The monitoring system includes: a first data collection unit for acquiring the filtration status value of the photoresist filter; a first comparison unit for extracting a preset first threshold from a database and comparing it with the filtration status value acquired by the first data collection unit to determine whether the filtration status has reached the preset first threshold; if not, returning to continue running the photoresist filter; if yes, acquiring the status value of the particulate matter within the photoresist filter; and a first output unit for outputting the first comparison value. The comparison result of the unit is output to the photoresist filter to drive the adjustment of the photoresist filter; the second data collection unit acquires the state value of the particles in the photoresist filter; the second comparison unit is used to extract a preset second threshold from the database and compare it with the state value of the particles to determine whether the state of the particles reaches the preset second threshold; if not, return to continue running the photoresist filter; if yes, stop running the photoresist filter and capture the current filtration state of the photoresist filter as the photoresist filter usage cycle; the second output unit outputs the comparison result of the second comparison unit to the photoresist filter to drive the adjustment of the photoresist filter.

[0014] In some embodiments, the monitoring system includes an alarm unit that issues an alarm regarding the current filtering status to prompt the cessation of operation of the photoresist filter.

[0015] Some embodiments of the present invention also provide a photoresist supply system, the supply system comprising: a photoresist supply bottle containing photoresist to be filtered; a buffer connected to the photoresist supply bottle, wherein the photoresist to be filtered is temporarily stored in the buffer; a pump connected to the buffer, wherein the pump draws the photoresist to be filtered temporarily stored in the buffer; a photoresist filter connected to the pump to filter the photoresist to be filtered drawn by the pump to obtain filtered photoresist; a switching valve connected to the photoresist filter; a nozzle connected to the switching valve to spray the filtered photoresist onto the object to be coated; a monitoring system communicatively connected to the photoresist filter to monitor the usage cycle of the photoresist filter; and a control system communicatively connected to the pump and the switching valve to control the pump and the switching valve.

[0016] In some embodiments, the supply system further includes an inert gas supply unit connected to the photoresist supply bottle to introduce inert gas into the photoresist to be filtered.

[0017] In some embodiments, the nozzle includes a receiving cavity to temporarily store the filtered photoresist.

[0018] This invention provides a method for monitoring the service life of a light-blocking filter. In addition to monitoring the filter's filtration status, such as filtration volume and filtration time, the method also monitors the state of particulate matter within the filter, thereby accurately defining the filter's service life. Specifically, it defines the upper limit of filtration volume and the upper limit of service time. The process is simple, avoids product defects caused by exceeding the service limit, and reduces filter replacement costs. Attached Figure Description

[0019] Figure 1 This is a process diagram of filtering photoresist in the filter of the present invention;

[0020] Figure 2 This is a schematic diagram illustrating the impact of incompletely filtered photoresist on the product.

[0021] Figure 3 This is a flowchart of the monitoring method according to the first embodiment of the present invention;

[0022] Figure 4 This is a flowchart of the monitoring method according to the second embodiment of the present invention;

[0023] Figure 5 This is a schematic diagram of the photoresist supply system.

[0024] Figure label:

[0025] 1: Photoresist supply bottle; 2: Buffer; 3: Pump; 4: Photoresist filter; 41: Filter media; 5: Switch valve; 6: Nozzle; 7: Chip; 8: Inert gas supply unit. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to specific embodiments and the accompanying drawings. It should be understood that these descriptions are merely exemplary and not intended to limit the scope of the invention. Furthermore, descriptions of well-known structures and techniques are omitted in the following description to avoid unnecessarily obscuring the concept of the invention.

[0027] Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0028] Furthermore, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0029] In the description of this invention, it should be noted that the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0030] Figure 1 This is a process diagram of filtering photoresist in the filter of the present invention.

[0031] See Figure 1 The filter uses porous filter media 41 to filter unfiltered photoresist. The filter media filters out particulate matter from the unfiltered photoresist and leaves it on the surface or inside the filter media. The particulate matter left on the surface or inside the filter media is also called impurities in the photoresist.

[0032] The function of a filter is to remove impurities from unfiltered photoresist, bringing it to the required cleanliness level – this is the photoresist we use. When a filter reaches its maximum capacity, it becomes saturated and fails. At this point, impurities in the photoresist cannot be completely removed, causing defects in the pattern during chip application. Possible defects include... Figure 2 The diagram shows several bridging methods, with defect sizes ranging from approximately 1 to 1000 μm. The occurrence of these defects has a fatal impact on the yield rate. Each type of photoresist used in the photolithography process requires a filter. The process involves at least 60 steps of photolithography coating, all of which can be affected by the filters.

[0033] First Implementation Method

[0034] Figure 3This is a flowchart of the monitoring method according to the first embodiment of the present invention.

[0035] See Figure 3 This embodiment provides a method for monitoring the service life of a photoresist filter, including:

[0036] A photoresist filter is provided, which traps particulate matter within the photoresist to filter the photoresist;

[0037] Run the light-blocking filter;

[0038] Obtain the filtration status of the photoresist filter and determine whether the filtration status has reached a preset first threshold.

[0039] If not, return to continue running the photoresist filter;

[0040] If so, obtain the state of the particles within the photoresist filter;

[0041] Determine whether the state of the particulate matter has reached a preset second threshold;

[0042] If not, return to continue running the photoresist filter;

[0043] If so, stop the operation of the photoresist filter and capture the current filtration status of the photoresist filter as the photoresist filter usage cycle.

[0044] The first threshold for the filtration status to reach the preset threshold can be the theoretical filtration capacity of the filter, or 60% or 80% of the theoretical filtration capacity, or the standard upper limit set by the filter manufacturer at the time of manufacture. Since the standard upper limit set by the manufacturer is not set for specific light resistance or flow rate, but is just a general standard value, the filter has often not reached its limit when the filtration capacity and usage time have reached the standard upper limit, and can still filter the light resistance and filter it cleanly. If the filter is replaced when the filtration capacity and usage time have reached the standard upper limit, it will often waste the filter due to underutilization of resources, and will increase production and labor costs due to frequent disassembly and replacement of equipment.

[0045] When the state of particulate matter reaches the preset second threshold, it means that the photoresist after filtration cannot meet the usage standard requirements, that is, the filtered photoresist will cause defects in the chip, resulting in the chip's pass rate not meeting the standard.

[0046] The method for monitoring the lifespan of the photoresist filter in this embodiment first detects the filtration status, and then detects the state of particulate matter when the filtration status reaches a preset first threshold. The lifespan of the photoresist filter is determined based on whether the state of particulate matter reaches a preset second threshold. The process is simple, and the multi-level control can accurately detect the upper limit of the filter's lifespan, avoiding product defects caused by exceeding the upper limit. This method can make full use of the filter, reduce waste, and reduce equipment replacement costs.

[0047] The photoresist filter usage cycle monitoring method of this embodiment can establish a relationship between the unfiltered photoresist data and the upper limits of filtration capacity and usage time (i.e., usage cycle) of the photoresist based on the data of the unfiltered photoresist (e.g., photoresist type, impurity type, impurity concentration, flow rate, or process data), as well as the upper limits of filtration capacity and usage time (i.e., usage cycle) obtained for different unfiltered photoresists. This allows for the prediction of the upper limits of filtration capacity and usage time for photoresists that have not been measured. Based on the predicted baseline filtration capacity and baseline usage time, the system controls the filter's usage period to schedule filter replacement in advance, prevent defects, and effectively reduce the impact on production capacity by combining it with machine maintenance time or other machine scheduling, thus avoiding the risk of emergency production line interruption and the impact on the yield rate. Furthermore, the photoresist filter usage cycle monitoring method of this embodiment can establish a relationship (which can be a function relationship) between the unfiltered photoresist data (e.g., photoresist type, impurity type, impurity concentration, flow rate, or process data) and filter type, as well as the baseline filtration amount and baseline usage time obtained by different filters for different unfiltered photoresists. This relationship allows for the prediction of the filter's upper limit for filtration amount and upper limit for usage time. Based on these upper limits, the filter's usage period can be systematically controlled to allow for advance filter replacement, preventing defects. Simultaneously, it can be pre-arranged in conjunction with machine maintenance time or other machine scheduling to effectively reduce the impact on production capacity, avoid the risk of emergency production line shutdowns, and mitigate the impact on yield.

[0048] In some embodiments, the method for monitoring the usage period of the photoresist filter further includes: issuing an alarm on the current filtration status to prompt the shutdown of the photoresist filter, in order to prevent the photoresist filter from being used beyond its usage limit.

[0049] In some embodiments, obtaining the filtration status of the photoresist filter includes: obtaining the filtration status of the photoresist filter in real time, or obtaining the filtration status of the photoresist filter periodically. The specific method can be determined according to production and testing requirements.

[0050] In some embodiments, the filtration state refers to the filtration capacity of the photoresist filter, and the first threshold is a preset filtration capacity value. This first threshold can be determined by a standard upper limit of the filtration capacity set by the manufacturer at the time of manufacture, or it can be the theoretical filtration capacity of the filter, etc.

[0051] In some embodiments, the filtration state is the filtration time of the photoresist filter, and the first threshold is a preset filtration time value. The first threshold can be determined by a standard upper limit of the filtration time set by the manufacturer at the time of manufacture, or it can be the theoretical filtration time of the filter, etc.

[0052] In some embodiments, the filtration state includes the filtration time and filtration amount of the photoresist filter, and the first threshold includes a preset filtration time value and a filtration amount value; wherein, determining whether the filtration state has reached the preset first threshold includes: determining the first threshold based on whether the preset filtration time value or the filtration amount value is reached first. For example, this can be done by having the manufacturer set standard upper limits for both the filtration amount and filtration time at the time of manufacture to ensure accurate results.

[0053] In some embodiments, the state of the particulate matter includes the number of particles and / or the particle size. That is, the state is determined by both the number and particle size, or by one of them. For example, the state of the particulate matter can be detected by a routine testing machine, with a preset second threshold based on the basic level value of the routine testing machine. Alternatively, the second threshold could be the degree of change in the state of the particulate matter per unit time. If the number or particle size of the particles no longer changes within a unit time, the filter is determined to have entered a failure state, thus improving the accuracy of the photoresist filter monitoring.

[0054] In some embodiments, obtaining the state of the particulate matter within the photoresist filter includes: obtaining the state of the particulate matter within the photoresist filter in real time; or, obtaining the state of the particulate matter within the photoresist filter periodically. The specific method can be determined according to production and testing requirements.

[0055] Second Implementation Method

[0056] Figure 4 This is a flowchart of the detection method according to the second embodiment of the present invention.

[0057] See Figure 4 This embodiment provides a method for monitoring the service life of a photoresist filter, including:

[0058] A photoresist filter is provided, which traps particulate matter within the photoresist to filter the photoresist;

[0059] Run the light-blocking filter;

[0060] Obtain the filtration status of the photoresist filter and determine whether the filtration status has reached a preset safety threshold;

[0061] If not, return to continue running the photoresist filter;

[0062] If so, stop operating the photoresist filter; wherein, the safety threshold is the filtration state value of the filter when the state of the particulate matter reaches a preset state.

[0063] The method for monitoring the service life of the photoresist filter in this embodiment can determine the service life of the filter when the safety threshold of the filter is known. It can accurately determine the service life of the filter, reduce multiple judgments, and arrange filter replacement in advance according to the service life to prevent defects. At the same time, it can be combined with machine maintenance time or other machine scheduling to effectively reduce the impact on production capacity, avoid the risk of emergency production line interruption and the impact on the pass rate.

[0064] In some embodiments, the filtration status includes filtration quantity and / or filtration time, that is, the filtration status is determined by both filtration quantity and filtration time, or by one of them.

[0065] Third Implementation Method

[0066] This embodiment provides a monitoring system for the service life of a photoresist filter. The monitoring system monitors the photoresist filter, which traps particulate matter within the photoresist to filter it. The monitoring system includes:

[0067] The first data collection unit acquires the filtration status value of the photoresist filter;

[0068] The first comparison unit is used to extract a preset first threshold from the database and compare it with the filtering status value obtained by the first data collection unit to determine whether the filtering status has reached the preset first threshold.

[0069] If not, return to continue running the photoresist filter;

[0070] If so, obtain the state value of the particles within the photoresist filter;

[0071] The first output unit outputs the comparison result of the first comparison unit to the photoresist filter, driving the adjustment of the photoresist filter;

[0072] The second data collection unit acquires the state value of the particulate matter within the photoresist filter;

[0073] The second comparison unit is used to extract a preset second threshold from the database and compare it with the state value of the particulate matter to determine whether the state of the particulate matter reaches the preset second threshold.

[0074] If not, return to continue running the photoresist filter;

[0075] If so, stop the operation of the photoresist filter and capture the current filtration status of the photoresist filter as the photoresist filter usage cycle;

[0076] The second output unit outputs the comparison result of the second comparison unit to the photoresist filter, driving the adjustment of the photoresist filter.

[0077] The photoresist filter usage cycle monitoring system of this embodiment first detects the filtration status, and then detects the particulate matter status when the filtration status reaches a preset first threshold. The photoresist filter usage cycle is determined based on whether the particulate matter status reaches a preset second threshold. The process is simple and can accurately detect the upper limit of filter usage, avoiding product defects caused by exceeding the upper limit of usage. It can make full use of the filter, reduce waste, and reduce equipment replacement costs.

[0078] The photoresist filter usage cycle monitoring system of this embodiment can establish a relationship between the unfiltered photoresist data and the upper limits of filtration capacity and usage time (i.e., usage cycle) of the photoresist based on the data of the unfiltered photoresist (e.g., photoresist type, impurity type, impurity concentration, flow rate, or process data), as well as the upper limits of filtration capacity and usage time (i.e., usage cycle) obtained for different unfiltered photoresists. This allows for the prediction of the upper limits of filtration capacity and usage time for photoresists that have not been measured. Based on the predicted baseline filtration capacity and baseline usage time, the system controls the filter's usage period to schedule filter replacement in advance, prevent defects, and effectively reduce the impact on production capacity by combining it with machine maintenance time or other machine scheduling, thus avoiding the risk of emergency production line interruption and the impact on the yield rate. Furthermore, the photoresist filter usage cycle monitoring method of this embodiment can establish a relationship (which can be a function relationship) between the unfiltered photoresist data (e.g., photoresist type, impurity type, impurity concentration, flow rate, or process data) and filter type, as well as the baseline filtration amount and baseline usage time obtained by different filters for different unfiltered photoresists. This relationship allows for the prediction of the filter's upper limit for filtration amount and upper limit for usage time. Based on these upper limits, the filter's usage period can be systematically controlled to allow for advance filter replacement, preventing defects. Simultaneously, it can be pre-arranged in conjunction with machine maintenance time or other machine scheduling to effectively reduce the impact on production capacity, avoid the risk of emergency production line shutdowns, and mitigate the impact on yield.

[0079] In some embodiments, the monitoring system for the lifespan of the photoresist filter further includes an alarm unit that issues an alert regarding the current filtration status to prompt the cessation of operation of the photoresist filter. This is to prevent the photoresist filter from being used beyond its usage limit.

[0080] In some embodiments, the first comparison unit includes: a real-time first comparison unit, used to acquire the filtration status of the photoresist filter in real time.

[0081] In some embodiments, the first comparison unit includes: a timed first comparison unit, used to periodically acquire the filtration status of the photoresist filter.

[0082] In some embodiments, the filtration state is the filtration amount of the photoresist filter, and the first threshold is a preset filtration amount value. That is, it is determined by the standard upper limit of the filtration amount set by the manufacturer at the time of shipment.

[0083] In some embodiments, the filtration state is the filtration time of the photoresist filter, and the first threshold is a preset filtration time value. That is, it is determined by the standard upper limit of the filtration time set by the manufacturer at the time of shipment.

[0084] In some embodiments, the filtration state includes the filtration time and filtration amount of the photoresist filter, and the first threshold includes a preset filtration time value and a filtration amount value; wherein, determining whether the filtration state has reached the preset first threshold includes: determining the first threshold based on whether the preset filtration time value or the filtration amount value is reached first. That is, the determination is made by combining the standard upper limits of filtration amount and filtration time set by the manufacturer at the time of shipment, so as to ensure the accuracy of the result.

[0085] In some embodiments, the state of the particulate matter includes the number of particles and / or the particle size. That is, the state is determined by both the number of particles and the particle size, or by using only one of them. Specifically, there are routine testing machines on the production line that detect the state of the particulate matter, and a preset second threshold is based on the basic level value of the routine testing machine.

[0086] In some embodiments, the second comparison unit includes: a real-time second comparison unit, used to acquire the state of the particles in the photoresist filter in real time.

[0087] In some embodiments, the second comparison unit includes: a timed second comparison unit, used to periodically acquire the state of the particles in the photoresist filter.

[0088] The similarities between this embodiment and the first or second embodiment will not be elaborated here.

[0089] Fourth Implementation Method

[0090] Figure 5 This is a schematic diagram of the photoresist supply system.

[0091] See Figure 5The photoresist is filtered and supplied through the supply system shown in the figure. This photoresist supply system can be applied, for example, to a coating and developing machine. The photoresist supply system includes: a photoresist supply bottle 1, a buffer 2, a pump 3, a photoresist filter 4, a switching valve 5, a nozzle 6, and a monitoring and control system according to the third embodiment. Specifically, the photoresist supply bottle 1 contains the photoresist to be filtered; the buffer 2 is connected to the photoresist supply bottle 1, and the photoresist to be filtered is temporarily stored in the buffer 2; the pump 3 is connected to the buffer 2, and the pump 3 draws the photoresist to be filtered temporarily stored in the buffer 2; the photoresist filter 4 is connected to the pump 3 to filter the photoresist to be filtered, obtaining filtered photoresist; the switching valve 5 is connected to the photoresist filter 4; the nozzle 6 is connected to the switching valve 5, and sprays the filtered photoresist onto the object to be coated; the monitoring system is communicatively connected to the photoresist filter, and the monitoring system monitors the usage cycle of the photoresist filter; the control system is communicatively connected to the pump 3 and the switching valve 5 to control the pump 3 and the switching valve 5. If photoresist is required, control the switching valve 5 and pump 3 to spray the photoresist onto the chip 7 through the nozzle 6.

[0092] In some embodiments, the supply system further includes an inert gas supply unit 8, connected to the photoresist supply bottle 1, which introduces inert gas into the photoresist to be filtered to push out the air in the bottle and form a vacuum state, wherein the inert gas may be N2.

[0093] This embodiment also provides a storage medium storing a computer program, which, when executed by a processor, implements a method for monitoring the usage cycle of a photoresist filter as provided in the first or second embodiment of the present invention.

[0094] This embodiment also provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the program, it implements a method for monitoring the usage cycle of a photoresist filter as provided in the first or second embodiment of the present invention.

[0095] It should be understood that the specific embodiments described above are merely illustrative or explanatory of the principles of the invention and do not constitute a limitation thereof. Therefore, any modifications, equivalent substitutions, improvements, etc., made without departing from the spirit and scope of the invention should be included within the protection scope of the invention. Furthermore, the appended claims are intended to cover all variations and modifications falling within the scope and boundaries of the appended claims, or equivalent forms of such scope and boundaries.

[0096] Those skilled in the art will understand that embodiments of the present invention can be provided as methods, systems, or computer program products. Therefore, the present invention can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention can take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0097] This invention is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the invention. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart illustrations and / or block diagrams. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0098] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0099] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

[0100] Those skilled in the art will understand that all or part of the steps in the methods of the above embodiments can be implemented by a program instructing related hardware. The program can be stored in a computer-readable storage medium, and when executed, it includes the flows of the embodiments of the methods described above. The storage medium can be a magnetic disk, optical disk, read-only memory (ROM), or random access memory (RAM), etc.

[0101] The steps in the method of this invention can be adjusted, merged, or deleted according to actual needs. The modules in the system of this invention can be merged, divided, or deleted according to actual needs.

Claims

1. A method for monitoring the service life of a photoresist filter, characterized in that, include: A photoresist filter is provided, which traps particulate matter within the photoresist to filter the photoresist; Run the light-blocking filter; The filtration status of the photoresist filter is obtained, and it is determined whether the filtration status has reached a preset first threshold, wherein the filtration status is the filtration amount and / or filtration time. If not, return to continue running the photoresist filter; If so, obtain the state of the particles within the photoresist filter; Determine whether the state of the particulate matter has reached a preset second threshold; If not, return to continue running the photoresist filter; If so, stop the operation of the photoresist filter and capture the current filtration status of the photoresist filter as the photoresist filter usage cycle.

2. The method for monitoring the service life of a photoresist filter according to claim 1, characterized in that, The method further includes: issuing an alarm for the current filtering status to prompt the shutdown of the photoresist filter.

3. The method for monitoring the service life of a photoresist filter according to claim 1, characterized in that, The process of obtaining the filtration status of the photoresist filter includes: The filtration status of the photoresist filter is acquired in real time; or, The filtration status of the photoresist filter is acquired periodically.

4. The method for monitoring the service life of a light-blocking filter according to any one of claims 1 to 3, characterized in that, The filtration state refers to the filtration amount or filtration time of the photoresist filter, and the first threshold is a preset filtration amount value or filtration time value, respectively.

5. The method for monitoring the service life of a photoresist filter according to claim 1, characterized in that, The filtration status includes the filtration time and filtration amount of the photoresist filter, and the first threshold includes a preset filtration time value and filtration amount value. Determining whether the filtering state has reached a preset first threshold includes: The first threshold is determined based on whether the preset filtering time value or the filtering amount value is reached first.

6. The method for monitoring the service life of a photoresist filter according to claim 1, characterized in that, The state of the particulate matter includes the number of particulate matter and / or the particle size.

7. The method for monitoring the service life of a photoresist filter according to claim 1, characterized in that, The step of obtaining the state of the particles within the photoresist filter includes: Real-time acquisition of the state of the particles within the photoresist filter; or, The state of the particles inside the photoresist filter is acquired periodically.

8. A monitoring system for the service life of a light resist filter, characterized in that, The monitoring system monitors the photoresist filter, which traps particulate matter within the photoresist to filter it. The monitoring system includes: The first data collection unit acquires the filtration status value of the photoresist filter, wherein the filtration status is the filtration amount and / or filtration time. The first comparison unit is used to extract a preset first threshold from the database and compare it with the filtering status value obtained by the first data collection unit to determine whether the filtering status has reached the preset first threshold. If not, return to continue running the photoresist filter; If so, obtain the state value of the particles within the photoresist filter; The first output unit outputs the comparison result of the first comparison unit to the photoresist filter, driving the adjustment of the photoresist filter; The second data collection unit acquires the state value of the particulate matter within the photoresist filter; The second comparison unit is used to extract a preset second threshold from the database and compare it with the state value of the particulate matter to determine whether the state of the particulate matter reaches the preset second threshold. If not, return to continue running the photoresist filter; If so, stop the operation of the photoresist filter and capture the current filtration status of the photoresist filter as the photoresist filter usage cycle; The second output unit outputs the comparison result of the second comparison unit to the photoresist filter, driving the adjustment of the photoresist filter.

9. The monitoring system for the service life of the photoresist filter according to claim 8, characterized in that, The monitoring system includes an alarm unit that issues an alarm for the current filtering status to prompt the stop operation of the photoresist filter.

10. A photoresist supply system, characterized in that, The supply system includes: The photoresist supply bottle contains the photoresist to be filtered. A buffer is connected to the photoresist supply bottle, and the photoresist to be filtered is temporarily stored in the buffer. A pump, connected to the buffer, draws in the photoresist to be filtered temporarily stored in the buffer; A light resist filter is connected to the pump to filter the light resist to be filtered by the pump, so as to obtain filtered light resist. Switch valve, connected to light-blocking filter; The nozzle, connected to the switching valve, sprays the filtered photoresist onto the object to be coated. The monitoring system as described in claim 8 or 9 is communicatively connected to the photoresist filter, and the monitoring system monitors the usage cycle of the photoresist filter; The control system is communicatively connected to the pump and the switching valve to control the pump and the switching valve.

11. The photoresist supply system according to claim 10, characterized in that, The supply system further includes an inert gas supply unit connected to the photoresist supply bottle to introduce inert gas into the photoresist to be filtered.

12. The photoresist supply system according to claim 10, characterized in that, The nozzle includes a receiving cavity to temporarily store the filtered photoresist.

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