Micro-nano dimming device and its manufacturing method and control method

Abstract

This invention proposes a micro / nano dimming device and its fabrication and control methods, comprising: a first substrate; a first patterned electrode located on one side of the first substrate, the first patterned electrode including at least one first sub-electrode; a liquid crystal layer located on the side of the first patterned electrode away from the first substrate, the liquid crystal layer including a liquid crystal body and a dielectric pillar structure, the dielectric pillar structure including at least one sub-dielectric pillar, the sub-dielectric pillars corresponding one-to-one with the first sub-electrodes, and the orthographic projection of the corresponding sub-dielectric pillar on the first substrate at least partially overlapping the orthographic projection of the first sub-electrode on the first substrate; a second electrode located on the side of the liquid crystal layer away from the first patterned electrode; and a second substrate located on the side of the second electrode away from the liquid crystal. Thus, the thickness of the micro / nano dimming device can be reduced by using the dielectric pillar structure, meeting various application scenarios.

Description

Technical Field

[0001] The present invention relates to the field of display, and in particular to a micro-nano dimming device and a manufacturing method and a control method thereof. Background Art

[0002] Beam steering has been widely used in radar technology, and the more recent light detection and ranging technology has been further developed based on radar technology. Lidar (Light detection and Ranging) technology uses a laser source to illuminate the target object and calculate the distance of the object by detecting the return time (flight time) of the reflected light pulse beam. Initially used for simple measurements (distance or vehicle speed), lidar technology has gradually gained important applications in various advanced devices, such as autonomous driving, artificial intelligence robots, etc. Consumer electronics include iPhone, iPad and Microsoft's indoor motion capture sensors, as well as applications for AR and VR displays. Given the potential of lidar based on real-world use and potential economic impact, research and development in both hardware and software will trigger rapid growth even in the short term. In the field of consumer electronics, not only the cost and size of the electronic device are very important, but also the measurement accuracy, measurable range and stability of the lidar device are also critical for precision equipment.

[0003] Therefore, the current micro-nano dimming devices and their manufacturing methods and control methods still need to be improved. Summary of the invention

[0004] This application is based on the inventor's discovery of the following problems:

[0005] Although the Lidar devices in the related art have good measurement accuracy and stability in use, they are generally large in size and easily disturbed by the external environment. They cannot meet the requirements of high precision and high stability in use while meeting the requirements of miniaturization. For example, for Lidar devices used in the security field, because they involve the personal safety of users, they must meet the requirements of safe measurement distance, high precision, 360° real-time working range, etc., and due to the influence of external environmental factors, they should also be able to overcome bad weather conditions and ensure stable operation under different sunlight conditions. In addition, for some special applications, such as vehicle-mounted Lidar devices, the decision-making time of Lidar devices needs to be as short as possible, so as to provide enough time for vehicle braking, so as to ensure safe stopping in dangerous situations. Based on the above requirements, Lidar devices should have the characteristics of miniaturization, high precision, 360° real-time working range, high stability in use, etc. In the present application, the inventors discovered that by combining liquid crystal materials with nanostructures and independently regulating electrodes, a miniaturized micro-nano dimming device is obtained. The micro-nano dimming device can be used in conjunction with different control methods to achieve multiple types of detection, thereby obtaining a micro-nano dimming device with multiple detection functions.

[0006] The present application aims to solve one of the technical problems in the related art to a certain extent.

[0007] In one aspect of the present application, the present invention proposes a micro-nano dimming device, comprising: a first substrate; a first patterned electrode, the first patterned electrode is located on one side of the first substrate, the first patterned electrode includes at least one first sub-electrode, a liquid crystal layer, the liquid crystal layer is located on the side of the first patterned electrode away from the first substrate, the liquid crystal layer includes a liquid crystal body and a dielectric column structure, the dielectric column structure includes at least one sub-dielectric column, the sub-dielectric column corresponds to the first sub-electrode one-to-one, and the corresponding sub-dielectric column on the first substrate The positive projection and the positive projection of the first sub-electrode on the first substrate at least partially overlap; a second electrode, the second electrode is located on the side of the liquid crystal layer away from the first patterned electrode; a second substrate, the second substrate is located on the side of the second electrode away from the liquid crystal. Thus, the thickness of the micro-nano dimming device can be thinned by the dielectric column structure to meet a variety of usage scenarios.

[0008] According to an embodiment of the present invention, the material of the dielectric column structure is at least one of silicon nitride, titanium dioxide, gallium nitride and silicon. Thus, the dielectric column structure can be prepared by a relatively simple method.

[0009] According to an embodiment of the present invention, the height of the sub-dielectric column is 400-800 nm, and the diameter of the sub-dielectric column is 40-200 nm. Thus, the thickness of the micro-nano dimming device can be further reduced by the dielectric column structure.

[0010] According to an embodiment of the present invention, the orthographic projection of the corresponding sub-dielectric column on the first substrate is located inside the orthographic projection of the first sub-electrode on the first substrate. Thus, the regulating effect of the first sub-electrode on the pixel unit can be further improved. According to an embodiment of the present invention, the difference between the refractive index of the liquid crystal layer when it is in the off state and the refractive index of the liquid crystal layer when it is in the on state is not less than 0.2. Thus, the micro-nano dimming device can achieve 360° detection.

[0011] According to an embodiment of the present invention, the second electrode is a patterned electrode, the second electrode includes a plurality of second sub-electrodes, the sub-dielectric columns correspond to the second sub-electrodes one by one, and the orthographic projection of the corresponding sub-dielectric column on the first substrate is located inside the orthographic projection of the second sub-electrode on the first substrate. Thus, the detection performance of the micro-nano dimming device can be further improved.

[0012] According to an embodiment of the present invention, the area of ​​the micro-nano dimming device is less than 2.5 square micrometers, thereby further improving the application range of the micro-nano dimming device.

[0013] In another aspect of the present application, the present invention proposes a method for manufacturing the aforementioned micro-nano dimming device, comprising: forming a first electrode layer on one side of the first substrate; forming a dielectric column layer on the side of the first electrode layer away from the first substrate; forming a first optical adhesive layer on the side of the dielectric column layer away from the first electrode layer; performing a first patterning process on the first optical adhesive layer to form a first patterned optical adhesive layer; performing a first etching process on the dielectric column layer to form a dielectric column structure; performing a second etching process on the first electrode layer to form a first patterned electrode; providing a second substrate having a second electrode; aligning a side surface of the first substrate having the first patterned electrode with a side surface of the second substrate having the second electrode to form a closed space between the first substrate and the second substrate; injecting a liquid crystal material into the closed space to obtain the aforementioned micro-nano dimming device. Thus, the aforementioned miniaturized micro-nano dimming device can be obtained by a relatively simple method, so the manufacturing method has all the characteristics and advantages of the aforementioned micro-nano dimming device, which will not be repeated here.

[0014] According to an embodiment of the present invention, providing the second substrate having the second electrode further comprises: forming the second electrode layer on one side of the second substrate; forming a second optical adhesive layer on a side of the second electrode layer away from the second substrate; performing a second patterning process on the second optical adhesive layer to form a second patterned optical adhesive layer; performing a third etching process on the second electrode layer to form the second electrode. Thus, the performance of the micro-nano dimming device can be further improved by setting the patterned second electrode.

[0015] In another aspect of the present application, the present invention proposes a method for controlling the aforementioned micro-nano dimming device, comprising: (1) establishing a two-dimensional rectangular coordinate system (x, y) based on the plane where the first substrate is located, and determining a first pixel unit on the micro-nano dimming device, using the coordinate value of the orthogonal projection of the first pixel unit on the first substrate on the two-dimensional coordinate system as the coordinate origin (x0, y0), and simultaneously obtaining the detection light wavelength λ1; (2) obtaining the angle θ between the direction to be detected and the normal of the plane where the micro-nano dimming device is located; (3) obtaining the coordinate value (x0, y0) of the pixel unit to be adjusted and the orthogonal projection on the first substrate on the two-dimensional coordinate system; a ,y a ); (4) obtaining a distance difference r1 between the pixel unit to be adjusted and the first pixel unit, wherein (5) According to the formula Obtain the phase of the pixel unit to be adjusted (6) According to the phase Obtaining a voltage value; (7) Determining the voltage applied to the two ends of the pixel unit to be adjusted according to the voltage value. Thus, the aforementioned micro-nano dimming device can realize arbitrary regulation of the incident wavefront direction through the above control method.

[0016] According to an embodiment of the present invention, the first substrate is rectangular, and the orthographic projection of the first pixel unit on the first substrate is located at the vertex of the first substrate. Thus, it is convenient to realize arbitrary regulation of the incident wavefront direction.

[0017] According to an embodiment of the present invention, λ1 is 450-700 nm, thereby facilitating the improvement of the applicable scope of the control method.

[0018] In another aspect of the present application, the present invention proposes a method for controlling the aforementioned micro-nano light-adjusting device, comprising: (1) establishing a two-dimensional rectangular coordinate system (m, n) on the plane where the first substrate is located, and determining a first pixel unit on the micro-nano light-adjusting device, using the coordinate value of the orthogonal projection of the first pixel unit on the first substrate on the two-dimensional coordinate system as the coordinate origin (m0, n0), and simultaneously obtaining the detection light wavelength λ2; (2) obtaining the coordinate value (m0, n0) of the pixel unit to be adjusted and the orthogonal projection on the first substrate on the two-dimensional coordinate system a , n a ); (3) obtaining a distance difference r2 between the pixel unit to be adjusted and the first pixel unit, wherein (4) Obtain the coordinate value (m) of the focus to be detected and the orthographic projection on the first substrate on the two-dimensional coordinate system j , n j );(5) Obtain the distance difference r between the pixel unit to be adjusted and the focus to be detected offset ,in (6) Obtaining the focal length f between the pixel unit to be adjusted and the focus to be detected; (7) According to the formula Obtain the phase of the pixel unit to be adjusted (8) According to the phase Obtaining a voltage value; (9) Determining the voltage applied to the two ends of the pixel unit to be adjusted according to the voltage value. Thus, the aforementioned micro-nano dimming device can realize dynamic control of the focus position through the above control method.

[0019] According to an embodiment of the present invention, the first substrate is rectangular, and the orthographic projection of the first pixel unit on the first substrate is located at the center of the first substrate, thereby facilitating dynamic control of the point focus position.

[0020] According to an embodiment of the present invention, λ2 is 450-700 nm, thereby facilitating the improvement of the applicable scope of the control method. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0022] Figure 1 A schematic diagram of the structure of a micro-nano dimming device according to an embodiment of the present invention is shown;

[0023] Figure 2 A partial schematic diagram of the process of manufacturing a micro-nano dimming device according to an embodiment of the present invention is shown;

[0024] Figure 3A partial schematic diagram of the process of manufacturing a micro-nano dimming device according to another embodiment of the present invention is shown;

[0025] Figure 4 A partial schematic diagram of the process of manufacturing a micro-nano dimming device according to another embodiment of the present invention is shown;

[0026] Figure 5 shows a schematic structural diagram of a first electrode according to an embodiment of the present invention;

[0027] Figure 6 A schematic diagram showing the principle of a control method for a micro-nano dimming device according to an embodiment of the present invention;

[0028] Figure 7 A schematic diagram showing the principle of a control method for a micro-nano dimming device according to yet another embodiment of the present invention;

[0029] Figure 8 A schematic diagram showing the principle of a control method for a micro-nano dimming device according to yet another embodiment of the present invention;

[0030] Fig. 9 A schematic diagram showing the principle of a control method for a micro-nano dimming device according to yet another embodiment of the present invention;

[0031] Fig.10 A partial structural schematic diagram of a micro-nano dimming device according to an embodiment of the present invention is shown;

[0032] Fig.11 A diagram showing the phase relationship between the diameter of a sub-medium column and a pixel unit according to an embodiment of the present invention is shown;

[0033] Fig.12 An effect diagram of a control method according to an embodiment of the present invention is shown;

[0034] Fig.13 An effect diagram of a control method according to another embodiment of the present invention is shown;

[0035] Fig.14 A schematic flow chart showing a method for preparing a micro-nano dimming device according to an embodiment of the present invention is shown;

[0036] Fig.15 A partial schematic diagram of a method for preparing a micro-nano dimming device according to an embodiment of the present invention is shown.

[0037] Description of reference numerals:

[0038] 100: first substrate; 110: first patterned electrode; 111: first electrode layer; 120: first sub-electrode; 200: second substrate; 210: second electrode; 211: second electrode layer; 310: liquid crystal body; 320: sub-dielectric column; 321: dielectric column layer; 400: pixel unit to be adjusted; 510: direction to be detected; 520: focus to be detected; 610: first optical adhesive layer; 611: first patterned optical adhesive layer; 620: second optical adhesive layer; 621: second patterned optical adhesive layer; 700: liquid crystal alignment layer. DETAILED DESCRIPTION

[0039] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0040] In one aspect of the present application, reference Figure 1 and Fig.10 The present invention proposes a micro-nano dimming device, comprising: a first substrate 100; a first patterned electrode 110, the first patterned electrode 110 is located on one side of the first substrate 100, and the first patterned electrode 110 includes at least one first sub-electrode 120 (i.e. Figure 1 The convex part of the first patterned electrode 110, each convex part is a first sub-electrode), the liquid crystal layer, the liquid crystal layer is located on the side of the first patterned electrode 110 away from the first substrate 100, the liquid crystal layer includes a liquid crystal body 310 and a dielectric column structure, the dielectric column structure includes at least one sub-dielectric column 320, the sub-dielectric column corresponds to the first sub-electrode 120 one by one, and the orthographic projection of the corresponding sub-dielectric column 320 on the first substrate 100 overlaps with the orthographic projection of the first sub-electrode 120 on the first substrate 100 at least partially; the second electrode 210, the second electrode 210 is located on the side of the liquid crystal layer away from the first patterned electrode 110; the second substrate 200, the second substrate 200 is located on the side of the second electrode 210 away from the liquid crystal. Therefore, the thickness of the micro-nano dimming device can be thinned by the dielectric column structure, so that the micro-nano dimming device can be miniaturized and lightweight, thereby meeting a variety of usage scenarios.

[0041] For ease of understanding, the following is a brief description of the principle by which the micro-nano dimming device can achieve the above beneficial effects:

[0042] The development of nanophotonics and advanced process manufacturing has been considered to support or even replace traditional Lidar systems. In particular, several miniaturized beam control platforms, such as chip optical arrays and planar optical devices, can greatly reduce the size of the device. Nanophotonic Lidar platforms can achieve high image quality. In this application, the inventors found that for a periodic unit of finite height cylinder, it can be regarded as a truncated equivalent waveguide, and the characteristics of each periodic unit can be changed by changing the equivalent refractive index within the unit. For example, refer to Fig.10 For a pixel unit, the overall thickness of the liquid crystal layer can be adjusted by adjusting the diameter and height of the sub-dielectric column 320. Specifically, for a pixel unit, if there is no sub-dielectric column 320, the equivalent refractive index of the pixel unit is the refractive index of the liquid crystal body 310. When part of the space in the pixel unit is occupied by the sub-dielectric column 320, the equivalent refractive index of the pixel unit is the refractive index of the sub-dielectric column 320. At this time, the phase of the detection light entering the micro-nano dimming device when passing through a pixel unit is Where, λ is the wavelength of the incident detection light, n eff is the equivalent refractive index, h is the height of the sub-medium column, it can be seen that at a specific wavelength, when the height of the sub-medium column is constant, the higher the equivalent refractive index, the larger the collected phase. In the case of a unit period, since the refractive index of the sub-medium column is higher than that of the liquid crystal body, refer to Fig.11 When the diameter of the sub-medium column (pilllar diameter) is larger, the equivalent refractive index n of the pixel unit is eff The larger the value, the greater the phase of light gathered when passing through a pixel unit. That is, by setting the dielectric column structure, a thinner liquid crystal layer can achieve a larger refractive index change. Then, by regulating the voltage at both ends of the pixel unit, the above-mentioned thinner micro-nano dimming device can achieve 360° detection. It should be noted that the 360° detection in this application refers to the detection that can be achieved within the range of 2π radians.

[0043] According to some embodiments of the present invention, the materials of the first substrate and the second substrate are not particularly limited. For example, the material forming the first substrate and the second substrate may be silicon dioxide.

[0044] According to some embodiments of the present invention, the materials of the first patterned electrode and the second electrode are not particularly limited. For example, the material forming the first patterned electrode and the second electrode may be ITO.

[0045] According to some embodiments of the present invention, the material of the dielectric column structure is not particularly limited. For example, the material forming the dielectric column structure can be at least one of silicon nitride, titanium dioxide, gallium nitride and silicon. When the material forming the dielectric column structure is the above-mentioned material, it is convenient to prepare by a relatively simple method, such as atomic layer deposition, and the high refractive index of the dielectric column can be used to achieve the thinning of the liquid crystal layer of the micro-nano dimming device.

[0046] According to some embodiments of the present invention, the height and diameter of the sub-dielectric column are not particularly limited. For example, the height of the sub-dielectric column may be 400-800 nm, and the diameter of the sub-dielectric column may be 40-200 nm. When the height and diameter of the sub-dielectric column are within the above range, the equivalent refractive index n of the pixel unit may be eff The larger the pixel size, the larger the phase of light gathered when passing through a pixel unit, which can ultimately further reduce the thickness of the micro-nano dimming device.

[0047] According to some embodiments of the present invention, reference Fig.10 The orthographic projection of the corresponding sub-dielectric column 320 on the first substrate 100 may be located inside the orthographic projection of the first sub-electrode 120 on the first substrate 100, so that each corresponding pixel unit can be precisely controlled by the first sub-electrode.

[0048] According to some embodiments of the present invention, since a dielectric column structure is added to the liquid crystal layer in the present application, the thickness of the liquid crystal layer is reduced, and the thickness of the liquid crystal layer is not particularly limited. For example, in the present application, when a sub-dielectric column is provided in a pixel unit, the thickness of the liquid crystal layer may be 2.25-3.75 microns. Specifically, the thickness of the liquid crystal layer may be 2.7 microns.

[0049] According to some embodiments of the present invention, the change in the refractive index of the liquid crystal layer is not particularly limited, as long as it can detect a change of not less than 2π radians by detecting the optical phase. For example, the difference between the refractive index of the liquid crystal layer when it is in the off state and the refractive index of the liquid crystal layer when it is in the on state should be not less than 0.2. Specifically, the refractive index of the liquid crystal layer when it is in the off state can be 1.7, and the refractive index of the liquid crystal layer when it is in the on state can be 1.5.

[0050] According to some embodiments of the present invention, the structure of the second electrode is not particularly limited. For example, the second electrode can be an electrode structure prepared in a whole layer. Therefore, because the opposing electrode is the first patterned electrode, the phase control of a single pixel unit can be achieved by applying different voltages to multiple sub-electrodes of the first patterned electrode and applying a common voltage value to the second electrode.

[0051] According to other embodiments of the present invention, the second electrode may be a patterned electrode structure corresponding to the first patterned electrode. Specifically, the second electrode may include a plurality of second sub-electrodes, wherein the sub-dielectric columns correspond to the second sub-electrodes one by one, and the orthographic projection of the corresponding sub-dielectric column on the first substrate is located inside the orthographic projection of the second sub-electrode on the first substrate. Thus, it is possible to realize a pixel unit including a first sub-electrode, a second sub-electrode and a sub-dielectric column structure, thereby achieving more precise regulation.

[0052] According to some embodiments of the present invention, the structure of the micro-nano dimming device is not particularly limited. For example, a liquid crystal alignment layer may be further included between the second electrode and the liquid crystal layer. Thus, the liquid crystal main body in the liquid crystal layer can be arranged in an orderly manner by setting the liquid crystal alignment layer, so that the phase control is more accurate.

[0053] According to some embodiments of the present invention, the area of ​​the micro-nano dimming device is not particularly limited. For example, the micro-nano dimming device may have only 25 pixel units arranged in an array, such as Figure 5 As shown in (only the first patterned electrode 110 and its multiple sub-electrodes 120 are shown, and the second electrode, the liquid crystal body, and the dielectric column structure are not shown), 360° detection can be achieved. Specifically, the area of ​​the micro-nano dimming device can be less than 2.5 square microns. As a result, the micro-nano dimming device can meet a variety of different usage scenarios.

[0054] According to some embodiments of the present invention, the patterned structure of the first patterned electrode is not particularly limited, as long as each sub-dielectric column corresponds to a first sub-electrode, thereby achieving control of the applied voltage value of each single pixel unit, and further achieving phase control. Figure 5 The shape of the first sub-electrode 120 may be a rectangle. On the premise of meeting the above requirements for the first sub-electrode, those skilled in the art may make a selection according to actual conditions.

[0055] In another aspect of the present application, the present invention provides a method for manufacturing the aforementioned micro-nano dimming device.

[0056] Specifically, refer to Fig.14 , including the following steps:

[0057] S100: forming a first electrode layer on one side of the first substrate

[0058] According to some embodiments of the present invention, reference Figure 2 In (a), in this step, a first electrode layer 111 is formed on one side of the first substrate 100. Specifically, the method of forming the first electrode layer 111 may be spin coating, and the material forming the first electrode layer may be ITO.

[0059] S200: forming a dielectric column layer on a side of the first electrode layer away from the first substrate

[0060] According to some embodiments of the present invention, reference Figure 2 In step (b), a dielectric column layer 321 is formed on a side of the first electrode layer 111 away from the first substrate 100. Specifically, the material for forming the dielectric column is the same as that described above and will not be described in detail herein.

[0061] According to some embodiments of the present invention, the method of forming the dielectric column layer is not particularly limited. For example, the dielectric column layer may be formed by an atomic layer deposition method.

[0062] S300: forming a first optical adhesive layer on a side of the dielectric column layer away from the first electrode layer

[0063] According to some embodiments of the present invention, reference Figure 2 In (c), a first optical adhesive layer 610 is formed on a side of the dielectric column layer 321 away from the first electrode layer 111. Specifically, the optical adhesive used to form the first optical adhesive layer 610 may be PR adhesive, and the method for forming the first optical adhesive layer 610 may be spin coating.

[0064] S400: performing a first patterning process on the first optical adhesive layer

[0065] According to some embodiments of the present invention, reference Figure 2 In (d), in this step, the first optical adhesive layer is subjected to a first patterning process to form a first patterned optical adhesive layer 611. Specifically, the first patterning process may be performed by nanoimprinting.

[0066] S500: Performing a first etching process on the dielectric column layer

[0067] According to some embodiments of the present invention, reference Figure 2 In (e), after the first optical adhesive layer is subjected to a first patterning process to form the first patterned optical adhesive layer 611, the dielectric column layer 321 may be subjected to a first etching process to form a dielectric column structure, and after the dielectric column structure is formed, the first patterned optical adhesive layer 611 may be removed. Specifically, the first etching process may be inductive plasma coupling.

[0068] S600: performing a second etching process on the first electrode layer

[0069] According to some embodiments of the present invention, reference Figure 2 In step (f), the first electrode layer is subjected to a second etching process to form the first patterned electrode 110. Specifically, when the material forming the first electrode layer is ITO, the second etching process may be etching the first electrode layer with an ITO etching solution to form the first patterned electrode 110.

[0070] S700: Providing a second substrate having a second electrode

[0071] Specifically, refer to Fig.15 , providing a second substrate having a second electrode comprises the following steps:

[0072] S710: forming a second electrode layer on one side of the second substrate

[0073] According to some embodiments of the present invention, reference Figure 3 In (a), in this step, a second electrode layer 211 is formed on one side of the second substrate 200. Specifically, the second electrode layer may be formed by spin coating, and the material used to form the second electrode layer may be ITO.

[0074] S720: forming a second optical adhesive layer on a side of the second electrode layer away from the second substrate

[0075] According to some embodiments of the present invention, reference Figure 3 In (b), in this step, a second optical adhesive layer 620 is formed on a side of the second electrode layer 211 away from the second substrate 200. Specifically, the optical adhesive forming the second optical adhesive layer 620 may be PR adhesive, and the method for forming the second optical adhesive layer 620 may be spin coating.

[0076] S730: Performing a second patterning process on the second optical adhesive layer

[0077] According to some embodiments of the present invention, reference Figure 3 In (c), in this step, the second optical adhesive layer is subjected to a second patterning process to form a second patterned optical adhesive layer 621. Specifically, the second patterning process can be performed by nanoimprinting.

[0078] S740: performing a third etching process on the second electrode layer

[0079] According to some embodiments of the present invention, reference Figure 3 (d) in which the second electrode layer is subjected to a third etching process to form the second electrode 210. Specifically, when the material forming the second electrode layer is ITO, the third etching process may be etching the first electrode layer with an ITO etching solution to form the second electrode 210. At this time, the second electrode 210 is the aforementioned patterned electrode, including a plurality of second sub-electrodes. After the third etching process is completed, the second patterned optical adhesive layer may be removed to facilitate subsequent preparation processes.

[0080] In order to further improve the orderly arrangement of the liquid crystal body, after forming the second electrode, a liquid crystal alignment layer may be further formed on a side of the second electrode away from the second substrate, specifically, comprising the following steps:

[0081] S750: forming a liquid crystal alignment layer on a side of the second electrode away from the second substrate

[0082] According to some embodiments of the present invention, reference Figure 3 In step (e), a liquid crystal alignment layer 700 is formed on a side of the second electrode 210 away from the second substrate 200, so that after the subsequent injection of the liquid crystal material, the liquid crystal body can be oriented.

[0083] S800: Aligning a side surface of the first substrate having the first patterned electrode with a side surface of the second substrate having the second electrode

[0084] According to some embodiments of the present invention, reference Figure 4 In step (a), a side surface of the first substrate 100 having the first patterned electrode 110 is aligned with a side surface of the second substrate 200 having the second electrode 210 to form a closed space between the first substrate 100 and the second substrate 200. Specifically, the method for forming the closed space includes applying a sealant to the gap between the edges of the first substrate and the second substrate to form a complete closed space.

[0085] S900: Injecting liquid crystal material into a confined space

[0086] According to some embodiments of the present invention, reference Figure 4 In step (b), liquid crystal material is injected into the confined space to form a liquid crystal body 310, thereby obtaining a complete micro-nano dimming device. Finally, the aforementioned miniaturized micro-nano dimming device is manufactured by a relatively simple method.

[0087] When it is necessary to explain in particular, there is no order between making the first substrate and the first patterned electrode and dielectric column structure thereon, and making the second substrate and the second electrode and liquid crystal alignment layer thereon, that is, the first substrate and the first patterned electrode and dielectric column structure thereon can be made first, and then the second substrate and the second electrode and liquid crystal alignment layer thereon can be made; or the second substrate and the second electrode and liquid crystal alignment layer thereon can be made first, and then the first substrate and the first patterned electrode and dielectric column structure thereon can be made. As long as the structures on the first substrate and the second substrate remain intact when the first substrate and the second substrate are aligned.

[0088] In another aspect of the present application, the present invention proposes a method for controlling the aforementioned micro-nano dimming device, through which the direction of the incident wavefront of the micro-nano dimming device can be arbitrarily regulated.

[0089] Specifically, refer to Figure 6 and Figure 7 , the control method comprises the following steps:

[0090] (1) A two-dimensional rectangular coordinate system (x, y) is established on the plane where the first substrate 100 is located, and a first pixel unit is determined on the micro-nano dimming device. The coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system is used as the coordinate origin (x0, y0), and the detection light wavelength λ1 is obtained at the same time.

[0091] According to some embodiments of the present invention, the position of the first pixel unit is not particularly limited as long as it has a complete pixel unit structure. Specifically, when the first substrate is a rectangle, the orthographic projection of the first pixel unit on the first substrate can be located at the vertex of the first substrate, that is, at the edge of the first substrate. This facilitates regulation along the x-axis or along the y-axis, thereby improving the accuracy of regulation.

[0092] According to some embodiments of the present invention, the detection light incident on the micro-nano optical modulation device is not particularly limited. For example, the detection light wavelength λ1 can be 450-700nm. When the detection light wavelength is within the above range, any regulation of the incident wavefront direction can be achieved through detection lights of various wavelengths. Specifically, the detection light wavelength λ1 can be 530nm.

[0093] (2) Obtain the angle θ between the direction to be detected and the normal of the plane where the micro-nano dimming device is located

[0094] According to some embodiments of the present invention, reference Figure 6 After determining the direction 510 to be detected, the angle θ between the direction to be detected and the normal line of the plane where the micro-nano dimming device is located is determined according to the direction 510 to be detected and the plane where the micro-nano device is located, such as the plane where the first substrate 100 is located.

[0095] (3) Obtain the coordinate value (x) of the pixel unit to be adjusted and the orthographic projection on the first substrate in the two-dimensional coordinate system. a ,y a )

[0096] According to some embodiments of the present invention, reference Figure 6 and Figure 7 In step 100, the pixel unit 400 to be adjusted is orthographically projected onto the first substrate 100, thereby determining the coordinate value (x, y) of the pixel unit 400 to be adjusted according to the coordinate system (x, y) established on the first substrate. a ,y a ).

[0097] (4) Obtaining the distance difference r1 between the pixel unit to be adjusted and the first pixel unit, where

[0098] According to some embodiments of the present invention, in this step, a distance difference r1 between the pixel unit to be adjusted and the first pixel unit is determined.

[0099] (5) According to the formula Get the phase of the pixel unit to be adjusted

[0100] According to some embodiments of the present invention, in this step, the phase of the pixel unit to be adjusted is obtained according to the above formula.

[0101] (6) According to the phase Get voltage value

[0102] According to some embodiments of the present invention, in this step, the voltage to be applied to the pixel unit to be adjusted is calculated based on the phase value required by the pixel unit to be adjusted, thereby ensuring the control of the beam direction.

[0103] (7) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value

[0104] According to some embodiments of the present invention, in the step, the voltage applied to both ends of the pixel unit to be adjusted is controlled according to the voltage value obtained by the above calculation. Specifically, when the second electrode is an electrode prepared in a whole layer, the voltage change at both ends of the pixel unit to be adjusted can be achieved by adjusting the voltage of the first sub-electrode corresponding to the pixel unit to be adjusted; when the second electrode is a patterned electrode, the voltage change at both ends of the pixel unit to be adjusted can be achieved by simultaneously adjusting the voltages of the first sub-electrode and the second sub-electrode corresponding to the pixel unit to be adjusted.

[0105] It should be noted that there is no particular order between the above steps (2) and (3), and step (2) can be performed first and then step (3); or step (3) can be performed first and then step (2). Those skilled in the art can make the selection according to the actual situation.

[0106] In another aspect of the present application, the present invention proposes a method for controlling the aforementioned micro-nano dimming device, through which the micro-nano dimming device can achieve dynamic regulation of the focus position.

[0107] For ease of understanding, firstly, a brief description is given of the beneficial effects achieved by the control method:

[0108] The focusing principle of the super lens is as follows: Based on the lens design in geometric optics, the thickness of the lens gradually decreases from the middle to the sides, so as to ensure that the phase delay of each position after the light passes through the lens is different, and finally the plane wavefront is converted into a spherical wavefront to ensure the effect of beam focusing. In this application, the inventor found that the design in the super lens is to ensure the planar design of the entire mirror surface, thereby simplifying the manufacturing process, and the modulation units are all hundreds of nanometers, which maximizes the ultra-thin super lens structure design. By adjusting the voltage deflection of each pixel unit, due to the birefringence characteristics of the liquid crystal molecules, different voltages correspond to different liquid crystal deflections, ensuring that the phase delay of the pixel unit is different, so that the micro-nano dimming device can achieve the beam focusing characteristics of the super lens.

[0109] Specifically, refer to Figure 8 and Fig. 9 , the control method comprises the following steps:

[0110] (1) A two-dimensional rectangular coordinate system (m, n) is established on the plane where the first substrate is located, and a first pixel unit is determined on the micro-nano optical modulation device. The coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system is used as the coordinate origin (m0, n0), and the wavelength λ2 of the detection light is obtained at the same time.

[0111] According to some embodiments of the present invention, the position of the first pixel unit is not particularly limited as long as it has a complete pixel unit structure. Specifically, when the first substrate is rectangular, the orthographic projection of the first pixel unit on the first substrate can be located at the center of the first substrate, that is, at the intersection of two diagonals of the first substrate. As a result, it is easy to delay the phase of the pixel unit from the central area to the peripheral area, thereby accurately realizing dynamic control of the focus position.

[0112] According to some embodiments of the present invention, the detection light incident on the micro-nano dimming device is not particularly limited. For example, the detection light wavelength λ2 can be 450-700nm. When the detection light wavelength is within the above range, dynamic control of the focus position can be achieved through detection lights of multiple different wavelengths. Specifically, the detection light wavelength λ2 can be 530nm.

[0113] (2) Obtain the coordinate value (m) of the pixel unit to be adjusted and the orthographic projection on the first substrate in the two-dimensional coordinate system a , n a )

[0114] According to some embodiments of the present invention, reference Figure 8 and Fig. 9 In step 100, the pixel unit 400 to be adjusted is orthographically projected onto the first substrate 100, thereby determining the coordinate value (m) of the pixel unit 400 to be adjusted according to the coordinate system (m, n) established on the first substrate.a , n a ).

[0115] (3) Obtaining the distance difference r2 between the pixel unit to be adjusted and the first pixel unit, where

[0116] According to some embodiments of the present invention, in this step, a distance difference r2 between the pixel unit to be adjusted and the first pixel unit is determined.

[0117] (4) Obtain the coordinate value (m) of the focus to be detected and the orthographic projection on the first substrate in the two-dimensional coordinate system j , n j )

[0118] According to some embodiments of the present invention, reference Figure 8 and Fig. 9 After determining the focus 520 to be detected, the focus 520 to be detected is projected onto the first substrate 100, thereby determining the coordinate value (m) of the pixel unit 400 to be adjusted according to the coordinate system (m, n) established on the first substrate. j , n j ).

[0119] (5) Obtain the distance difference r between the pixel unit to be adjusted and the focus to be detected offset ,in

[0120] According to some embodiments of the present invention, in this step, the distance difference r between the pixel unit to be adjusted and the focus to be detected is determined. offset .

[0121] (6) Obtain the focal length f between the pixel unit to be adjusted and the focus to be detected

[0122] According to some embodiments of the present invention, reference Figure 8 After determining the focus 520 to be detected, it can be understood that if the pixel unit 400 to be adjusted needs to be focused on the focus 520 to be detected, there is a focal length f that can make the pixel unit 400 to be adjusted focus on the focus 520 to be detected. Specifically, the focus 520 to be detected can be connected to the pixel unit 400 to be adjusted, and the length of the connection line is the focal length f.

[0123] (7) According to the formula Get the phase of the pixel unit to be adjusted

[0124] According to some embodiments of the present invention, in step 1, the phase of the pixel unit to be adjusted is obtained according to the above formula.

[0125] (8) According to the phase Get voltage value

[0126] According to some embodiments of the present invention, in this step, the voltage to be applied to the pixel unit to be adjusted is calculated according to the phase value required by the pixel unit to be adjusted, so that multiple pixel units can be focused to the focus to be detected.

[0127] (9) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value

[0128] According to some embodiments of the present invention, in the step, the voltage applied to both ends of the pixel unit to be adjusted is controlled according to the voltage value obtained by the above calculation. Specifically, when the second electrode is an electrode prepared in a whole layer, the voltage change at both ends of the pixel unit to be adjusted can be achieved by adjusting the voltage of the first sub-electrode corresponding to the pixel unit to be adjusted; when the second electrode is a patterned electrode, the voltage change at both ends of the pixel unit to be adjusted can be achieved by simultaneously adjusting the voltages of the first sub-electrode and the second sub-electrode corresponding to the pixel unit to be adjusted.

[0129] It should be noted that there is no particular order between the above steps (2) and (6). Step (2) can be performed first and then step (6); or step (6) can be performed first and then step (2). Those skilled in the art can make the selection according to the actual situation.

[0130] The scheme of the present application is described below by specific examples. It should be noted that the following examples are only used to illustrate the present application and should not be considered as limiting the scope of the present application. If no specific technology or conditions are specified in the examples, the technology or conditions described in the literature in this area or the product instructions are used. The reagents or instruments used are not specified by the manufacturer, and are all conventional products that can be obtained commercially.

[0131] Embodiment 1:

[0132] (1) A two-dimensional rectangular coordinate system (x, y) is established on the plane where the first substrate is located, and a first pixel unit is determined on the micro-nano optical modulation device. The coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system is taken as the coordinate origin (x0, y0), and the wavelength λ1 of the detection light is 530 nm;

[0133] (2) Obtain the angle θ between the direction to be detected and the normal line of the plane where the micro-nano dimming device is located, where: Fig.12 In (a), θ is 30°. Fig.12 In (b), θ is 0°; Fig.12 In (c), θ is -30°.

[0134] (3) Obtain the coordinate value (x) of the pixel unit to be adjusted and the orthographic projection on the first substrate in the two-dimensional coordinate system. a ,ya );

[0135] (4) Obtaining the distance difference r1 between the pixel unit to be adjusted and the first pixel unit, where

[0136] (5) According to the formula Get the phase of the pixel unit to be adjusted

[0137] (6) According to the phase Get the voltage value;

[0138] (7) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value.

[0139] The results show that the micro-nano dimming device controlled by the above control method can realize the regulation of the incident wavefront direction at various angles. This control method is applicable to multiple pixel units on the micro-nano dimming device and can be used in the Lidar wavefront dynamic control device in the future.

[0140] Embodiment 2:

[0141] (1) A two-dimensional rectangular coordinate system (m, n) is established on the plane where the first substrate is located, and a first pixel unit is determined on the micro-nano dimming device. The coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system is taken as the coordinate origin (m0, n0), and the detection light wavelength λ2 is 530 nm.

[0142] (2) Obtain the coordinate value (m) of the pixel unit to be adjusted and the orthographic projection on the first substrate in the two-dimensional coordinate system a , n a );

[0143] (3) Obtaining the distance difference r2 between the pixel unit to be adjusted and the first pixel unit, where

[0144] (4) Obtain the coordinate value (m) of the focus to be detected and the orthographic projection on the first substrate in the two-dimensional coordinate system j , n j );

[0145] (5) Obtain the distance difference r between the pixel unit to be adjusted and the focus to be detected offset ,in in, Fig.13 (a) in the equation, r offset -3 microns, Fig.13 (b) in the offset is 0 microns; Fig.13 (c) in r offset is 3 microns.

[0146] (6) respectively obtaining the focal length f between the pixel unit to be adjusted and the focus to be detected;

[0147] (7) According to the formula Get the phase of the pixel unit to be adjusted

[0148] (8) According to the phase Get the voltage value;

[0149] (9) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value.

[0150] The results show that the micro-nano dimming device controlled by the above control method can accurately focus on any focus to be detected. This control method is applicable to multiple pixel units on the micro-nano dimming device and can be used to solve the crosstalk problem of photoelectric sensor receiving signals in the future.

[0151] In the description of the present invention, the orientation or position relationship indicated by the terms "upper" and "lower" etc. is based on the orientation or position relationship shown in the drawings and is only for the convenience of describing the present invention rather than requiring the present invention to be constructed and operated in a specific orientation. Therefore, it should not be understood as a limitation on the present invention.

[0152] In the description of this specification, the description with reference to the terms "one embodiment", "another embodiment", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment are included in at least one embodiment of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine the different embodiments or examples described in this specification and the features of different embodiments or examples, unless they are contradictory. In addition, it should be noted that in this specification, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated.

[0153] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present invention. A person skilled in the art may change, modify, replace and vary the above embodiments within the scope of the present invention.

Claims

1. A micro-nano dimming device, characterized in that: include: a first substrate; a first patterned electrode, the first patterned electrode is located on one side of the first substrate, the first patterned electrode includes at least one first sub-electrode, a liquid crystal layer, the liquid crystal layer being located on a side of the first patterned electrode away from the first substrate, the liquid crystal layer comprising a liquid crystal body and a dielectric column structure, the dielectric column structure comprising at least one sub-dielectric column, the sub-dielectric column corresponding to the first sub-electrode one-to-one, and an orthographic projection of the corresponding sub-dielectric column on the first substrate at least partially overlaps with an orthographic projection of the first sub-electrode on the first substrate; a second electrode, the second electrode being located at a side of the liquid crystal layer away from the first patterned electrode; a second substrate, the second substrate being located at a side of the second electrode away from the liquid crystal layer; The height of the sub-medium column is 400-800nm, and the diameter of the sub-medium column is 40-200nm; The difference between the refractive index of the liquid crystal layer in the off state and the refractive index of the liquid crystal layer in the on state is not less than 0.2; The thickness of the liquid crystal layer is 2.25-3.75 μm; The wavelength of the incident detection light entering the micro-nano light modulating device is 450-700nm.

2. The micro-nano dimming device according to claim 1, characterized in that: The material of the dielectric column structure is at least one of silicon nitride, titanium dioxide, gallium nitride and silicon.

3. The micro-nano dimming device according to claim 1, characterized in that: The corresponding orthographic projection of the sub-dielectric column on the first substrate is located inside the orthographic projection of the first sub-electrode on the first substrate.

4. The micro-nano dimming device according to claim 1, characterized in that: The second electrode is a patterned electrode, comprising a plurality of second sub-electrodes, the sub-dielectric columns correspond to the second sub-electrodes one by one, and the orthographic projections of the corresponding sub-dielectric columns on the first substrate are located inside the orthographic projections of the second sub-electrodes on the first substrate.

5. The micro-nano dimming device according to claim 1, characterized in that: The area of ​​the micro-nano dimming device is less than 2.5 square microns.

6. A method for manufacturing the micro-nano dimming device according to any one of claims 1 to 5, characterized in that: include: forming a first electrode layer on one side of the first substrate; forming a dielectric column layer on a side of the first electrode layer away from the first substrate; forming a first optical adhesive layer on a side of the dielectric column layer away from the first electrode layer; Performing a first patterning process on the first optical adhesive layer to form a first patterned optical adhesive layer; Performing a first etching process on the dielectric column layer to form a dielectric column structure; performing a second etching process on the first electrode layer to form a first patterned electrode; providing a second substrate having a second electrode; Aligning a side surface of the first substrate having the first patterned electrode with a side surface of the second substrate having the second electrode to form a closed space between the first substrate and the second substrate; Liquid crystal material is injected into the enclosed space to obtain the micro-nano dimming device.

7. The method according to claim 6, characterized in that Providing the second substrate having the second electrode further comprises: forming the second electrode layer on one side of the second substrate; forming a second optical adhesive layer on a side of the second electrode layer away from the second substrate; Performing a second patterning process on the second optical adhesive layer to form a second patterned optical adhesive layer; A third etching process is performed on the second electrode layer to form the second electrode.

8. A method for controlling the micro-nano dimming device according to any one of claims 1 to 5, characterized in that: include: (1) establishing a two-dimensional rectangular coordinate system (x, y) on the plane where the first substrate is located, and determining a first pixel unit on the micro-nano optical modulation device, using the coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system as the coordinate origin (x0, y0), and acquiring the detection light wavelength λ1 at the same time; (2) obtaining an angle θ between the direction to be detected and the normal of the plane where the micro-nano dimming device is located; (3) Obtain the coordinate value (x) of the pixel unit to be adjusted and the orthographic projection on the first substrate on the two-dimensional coordinate system. a ,y a ); (4) Obtaining a distance difference r1 between the pixel unit to be adjusted and the first pixel unit, where (5) According to the formula Obtain the phase of the pixel unit to be adjusted (6) According to the phase Get the voltage value; (7) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value.

9. The method according to claim 8, characterized in that The first substrate is rectangular, and the orthographic projection of the first pixel unit on the first substrate is located at a vertex of the first substrate.

10. The method according to claim 8, characterized in that λ1 is 450-700nm.

11. A method for controlling the micro-nano dimming device according to any one of claims 1 to 5, characterized in that: include: (1) establishing a two-dimensional rectangular coordinate system (m, n) on the plane where the first substrate is located, and determining a first pixel unit on the micro-nano optical modulation device, using the coordinate value of the orthographic projection of the first pixel unit on the first substrate on the two-dimensional coordinate system as the coordinate origin (m0, n0), and acquiring the detection light wavelength λ2 at the same time; (2) Obtaining the coordinate value (m) of the pixel unit to be adjusted and the orthographic projection on the first substrate on the two-dimensional coordinate system a , n a ); (3) Obtaining a distance difference r2 between the pixel unit to be adjusted and the first pixel unit, where (4) Obtain the coordinate value (m) of the focus to be detected and the orthographic projection on the first substrate on the two-dimensional coordinate system j , n j ); (5) Obtaining the distance difference r between the pixel unit to be adjusted and the focus to be detected offset ,in (6) obtaining the focal length f between the pixel unit to be adjusted and the focus to be detected; (7) According to the formula Obtain the phase of the pixel unit to be adjusted (8) According to the phase Get the voltage value; (9) Determine the voltage applied to both ends of the pixel unit to be adjusted according to the voltage value.

12. The method according to claim 11, characterized in that The first substrate is rectangular, and the orthographic projection of the first pixel unit on the first substrate is located at the center of the first substrate.

13. The method according to claim 11, characterized in that λ2 is 450-700nm.

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