Thin film deposition equipment for sensing the opening and closing of a shielding mechanism

Abstract

The present invention provides a thin film deposition device for sensing the opening and closing of a shielding mechanism, which mainly includes a reaction chamber, a carrier plate, a shielding mechanism and two distance sensing units, wherein the carrier plate and part of the shielding mechanism are located in the accommodating space of the reaction chamber. The shielding mechanism includes two shielding units and at least one driving device, wherein the driving device connects and drives the two shielding units to swing in opposite directions, so that the two shielding units operate in an open state and a shielding state. A reflecting surface is provided on each of the two shielding units. When the shielding units operate in the shielding state, the sensing light beams generated by the two distance sensing units are respectively projected onto the reflecting surfaces of the two shielding units, and the distances between the two shielding units and the distance sensing unit are measured to determine that the shielding mechanism operates in the shielding state.

Description

Technical Field

[0001] The invention relates to a thin film deposition device for sensing the opening and closing of a shielding mechanism. The device mainly projects sensing light beams to two shielding units respectively through two distance sensing units to determine whether the two shielding units are operating in a shielding state. Background Art

[0002] Chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) are all commonly used thin film deposition equipment and are widely used in the manufacturing processes of integrated circuits, light emitting diodes and displays.

[0003] The deposition equipment mainly includes a chamber and a wafer carrier, wherein the wafer carrier is located in the chamber and is used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the chamber, wherein the target material faces the wafer on the wafer carrier. When performing physical vapor deposition, an inert gas and / or a reactive gas can be delivered into the chamber to apply bias voltage to the target material and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated.

[0004] The inert gas in the chamber is ionized by the high voltage electric field, and the ionized inert gas is attracted by the bias voltage on the target and bombards the target. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

[0005] After a period of use, a deposited film will form on the inner surface of the chamber, so the chamber needs to be cleaned periodically to prevent the deposited film from falling off during the process and contaminating the wafer. In addition, oxides or other contaminants may form on the surface of the target, so the target also needs to be cleaned periodically. Generally speaking, a burn-in process is usually performed to bombard the target in the chamber with plasma ions to remove oxides or other contaminants on the surface of the target.

[0006] When cleaning the chamber and the target, it is necessary to remove the wafer carrier and the wafer in the chamber, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process. Summary of the invention

[0007] Generally speaking, after a period of use, thin film deposition equipment usually needs to be cleaned to remove the oxides or nitrides on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and the contaminants. The present invention proposes a thin film deposition equipment for sensing the opening and closing of a shielding mechanism, which mainly drives two shielding plates to swing in opposite directions through a driving device, so that the two shielding plates operate in an open state and a shielding state.

[0008] When cleaning the reaction chamber, the driving device drives the two shielding units to swing closer to each other, so that the two shielding units are close to each other and shield the carrier in the accommodating space to prevent the plasma used in the cleaning process or the contamination generated from contacting the carrier and / or the substrate it carries. When performing a deposition process, the driving device drives the two shielding units to swing away from each other and perform thin film deposition on the substrate in the reaction chamber.

[0009] One object of the present invention is to provide a thin film deposition device for sensing the opening and closing of a shielding mechanism, which mainly includes a reaction chamber, a carrier plate and a shielding mechanism. The shielding mechanism includes at least one driving device, two shielding units and two distance sensing units, wherein the driving device connects and drives the two shielding units to swing in opposite directions, so that the two shielding units operate in an open state or a shielding state.

[0010] A reflective surface is provided on each of the two shielding units. When the two shielding units are operated in the shielding state, the sensing light beams generated by the two distance sensing units are respectively projected onto the reflective surfaces of the two shielding units, and the distances between the two distance sensing units and the two shielding units are measured to determine whether the two shielding units are operated in the shielding state.

[0011] The two distance sensing units will start pre-burning and cleaning only after determining that the two shielding units are operating in the shielding state, which can effectively prevent pollutants generated during the pre-burning or cleaning process from contacting the carrier plate and / or the reaction chamber under the carrier plate.

[0012] One purpose of the present invention is to provide a thin film deposition device for sensing the opening and closing of a shielding mechanism, mainly comprising two shielding plate sensing units arranged on a reaction chamber, wherein the two shielding plate sensing units are respectively used to sense two shielding units in an open state to confirm that the two shielding units are indeed operating in an open state.

[0013] When the two shielding plate sensing units determine that the two shielding units are in the open state, the carrier plate will drive the substrate to move upward and perform a thin film deposition process on the substrate. Therefore, it can effectively prevent the two shielding units from being operated in the open state, causing the carrier plate to drive the substrate to move upward and collide with the shielding units, thereby causing damage to the shielding units, the carrier plate and the substrate.

[0014] In order to achieve the above-mentioned purpose, the present invention proposes a thin film deposition device for sensing the opening and closing of a shielding mechanism, comprising: a reaction chamber, comprising a containing space; a carrier plate, located in the containing space and used to carry at least one substrate; and a shielding mechanism, comprising: a first shielding unit, located in the containing space and comprising a first reflecting surface; a second shielding unit, located in the containing space and comprising a second reflecting surface; at least one driving device, connecting the first shielding unit and the second shielding unit, and respectively driving the first shielding unit and the second shielding unit to swing in opposite directions, so that the first shielding unit and the second shielding unit are The shielding unit switches between an open state and a shielding state, wherein the first shielding unit in the shielding state is close to the second shielding unit, and a separation space is formed between the first shielding unit and the second shielding unit in the open state; a first distance sensing unit is arranged on the reaction chamber and is used to project a first sensing light beam to a first reflecting surface of the first shielding unit to confirm that the first shielding unit operates in the shielding state; and a second distance sensing unit is arranged on the reaction chamber and is used to project a second sensing light beam to a second reflecting surface of the second shielding unit to confirm that the second shielding unit operates in the shielding state.

[0015] The thin film deposition device for sensing the opening and closing of a shielding mechanism comprises two sensing areas connected to a reaction chamber, the sensing areas protrude from the reaction chamber, and the heights of the two sensing areas are smaller than the reaction chamber.

[0016] The thin film deposition equipment for sensing the opening and closing of the shielding mechanism comprises two shielding plate sensing units respectively arranged in two sensing areas, and respectively used to sense the first shielding unit and the second shielding unit entering the two sensing areas to determine whether the first shielding unit and the second shielding unit are operating in the open state.

[0017] The thin film deposition equipment for sensing the opening and closing of a shielding mechanism, wherein the first shielding unit includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate via the first connecting arm, and the first reflecting surface is arranged on the first connecting arm, and the second shielding unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate via the second connecting arm, and the second reflecting surface is arranged on the second connecting arm.

[0018] The thin film deposition device for sensing the opening and closing of a shielding mechanism, wherein the first connecting arm includes a first protrusion, the first reflecting surface is arranged on the first protrusion, and the second connecting arm includes a second protrusion, the second reflecting surface is arranged on the second protrusion.

[0019] In the thin film deposition device for sensing the opening and closing of a shielding mechanism, the first shielding unit and the second shielding unit are operated in a shielding state, and the first sensing light beam is perpendicular to the first reflection surface, and the second sensing light beam is perpendicular to the second reflection surface.

[0020] The thin film deposition equipment for sensing the opening and closing of the shielding mechanism, wherein the driving device includes a shaft sealing device and at least one driving motor, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, the driving motor is connected to the first shielding unit through the outer tube body, connected to the second shielding unit through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions.

[0021] The thin film deposition equipment for sensing the opening and closing of the shielding mechanism includes two first sensing units adjacent to the outer tube body, which are respectively used to sense the outer tube body rotating to a first position and a second position. When the outer tube body rotates to the first position, the first shielding unit operates in an open state, and when the outer tube body rotates to the second position, the first shielding unit operates in a shielding state.

[0022] The thin film deposition equipment for sensing the opening and closing of the shielding mechanism includes two second sensing units adjacent to the shaft, and are respectively used to sense the shaft rotating to a third position and a fourth position. When the shaft rotates to the third position, the second shielding unit operates in an open state, and when the shaft rotates to the fourth position, the second shielding unit operates in a shielding state.

[0023] The thin film deposition equipment for sensing the opening and closing of a shielding mechanism comprises a first protruding unit and a second protruding unit, wherein the first protruding unit is connected to an outer tube body, and the second protruding unit is connected to an axis body, wherein the first protruding unit rotates with the outer tube body, and is sensed by a first sensing unit, and the second protruding unit rotates with the axis body, and is sensed by a second sensing unit.

[0024] The beneficial effect of the present invention is to provide a novel thin film deposition device for sensing the opening and closing of a shielding mechanism, mainly by projecting sensing light beams to two shielding units respectively through two distance sensing units to determine that the two shielding units are operating in a shielding state. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 The figure is a side cross-sectional schematic diagram of an embodiment of the thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention, operating in a shielding state.

[0026] Figure 2 It is a three-dimensional schematic diagram of an embodiment of a shielding mechanism of a thin film deposition device of the present invention operating in an open state.

[0027] Figure 3 It is a cross-sectional schematic diagram of an embodiment of a driving device of a shielding mechanism of the present invention.

[0028] Figure 4 The diagram is a three-dimensional schematic diagram of a partial structure of a thin film deposition device for sensing the opening and closing of a shielding mechanism according to an embodiment of the present invention.

[0029] Figure 5 The figure is a side cross-sectional schematic diagram of another embodiment of the thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention, operating in a shielding state.

[0030] Figure 6 It is a three-dimensional schematic diagram of an embodiment of a reaction chamber of a thin film deposition device for sensing the opening and closing of a shielding mechanism according to the present invention.

[0031] Figure 7 The diagram is a top perspective view of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention, operating in an open state.

[0032] Figure 8 It is a top view of an embodiment of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention, operating in a shielding state.

[0033] Fig. 9 It is a cross-sectional schematic diagram of another embodiment of the driving device of the shielding mechanism of the present invention.

[0034] Explanation of reference numerals: 10-thin film deposition device for sensing the opening and closing of a shielding mechanism; 100-shielding mechanism; 11-reaction chamber; 111-blocking member; 112-opening; 113-sensing area; 115-light-transmitting window; 12-accommodating space; 121-cleaning space; 131-first sensing unit; 133-second sensing unit; 135-first protruding unit; 137-second protruding unit; 14-first shielding unit; 141-first connecting arm; 143-first shielding plate; 145-first reflecting surface; 147-first protruding portion; 15-second shielding unit; 151-second connecting arm; 152-interval space ;153-second shielding plate;155-second reflecting surface;157-second protrusion;161-target material;163-substrate;165-carrying plate;17-driving device;171-driving motor;1711-first driving motor;1713-second driving motor;173-shaft sealing device;1731-outer tube body;1732-space;1733-shaft body;18-interlocking mechanism;191-first distance sensing unit;193-second distance sensing unit;195-shielding plate sensing unit;20-thin film deposition equipment for sensing the opening and closing of the shielding mechanism;L1-first sensing beam;L2-second sensing beam. DETAILED DESCRIPTION

[0035] See also Figure 1, is a side cross-sectional schematic diagram of an embodiment of the thin film deposition apparatus for sensing the opening and closing of a shielding mechanism of the present invention operating in a shielding state. As shown in the figure, the thin film deposition apparatus 10 for sensing the opening and closing of a shielding mechanism mainly includes a reaction chamber 11, a carrier plate 165 and a shielding mechanism 100, wherein the reaction chamber 11 includes a receiving space 12 for receiving the carrier plate 165 and part of the shielding mechanism 100.

[0036] The carrier plate 165 is located in the accommodating space 12 of the reaction chamber 11 and is used to carry at least one substrate 163. For example, the thin film deposition apparatus 10 for sensing the opening and closing of the shielding mechanism is a physical vapor deposition chamber, and a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the carrier plate 165. For example, the target 161 can be disposed on the upper surface of the reaction chamber 11 and faces the carrier plate 165 and / or the substrate 163 located in the accommodating space 12.

[0037] Please refer to Figure 2 The shielding mechanism 100 includes a first shielding unit 14, a second shielding unit 15 and a driving device 17, wherein the first shielding unit 14 and the second shielding unit 15 are located in the accommodating space 12. The driving device 17 connects the first shielding unit 14 and the second shielding unit 15, and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, for example, the first shielding unit 14 and the second shielding unit 15 swing synchronously with the driving device 17 as the axis.

[0038] In one embodiment of the present invention, the first shielding unit 14 includes a first connecting arm 141 and a first shielding plate 143, wherein the first connecting arm 141 is used to carry the first shielding plate 143. The second shielding unit 15 includes a second connecting arm 151 and a second shielding plate 153, wherein the second connecting arm 151 is used to carry the second shielding plate 153. The driving device 17 drives the first shielding plate 143 and the second shielding plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 151 respectively.

[0039] The first shielding plate 143 and the second shielding plate 153 can be plates, wherein the area and shape of the first shielding plate 143 and the second shielding plate 153 can be similar, for example, the first shielding plate 143 and the second shielding plate 153 can be semicircular plates. When the driving device 17 drives the first shielding plate 143 and the second shielding plate 153 to close, the first shielding plate 143 and the second shielding plate 153 will approach each other and form a circular shielding member, and is used to shield the carrier plate 165 and / or the substrate 163. The first shielding plate 143 and the second shielding plate 153 having similar areas and shapes and being semicircular plates are only one embodiment of the present invention and are not a limitation of the scope of the present invention.

[0040] The first shielding unit 14 and the second shielding unit 15 described in the embodiment of the present invention operate in a shielding state, which can be defined as the first shielding plate 143 and the second shielding plate 153 approaching each other until the distance therebetween is less than a threshold value, for example, less than 1 mm, so as to prevent the first shielding plate 143 and the second shielding plate 153 from generating particles during the contact process and contaminating the accommodating space 12 of the reaction chamber 11 and / or the carrier plate 165.

[0041] Specifically, the thin film deposition apparatus 10 and / or the shielding mechanism 100 for sensing the opening and closing of the shielding mechanism of the present invention can be operated in two states, namely, an open state and a shielding state. Figure 2 As shown, the driving device 17 can drive the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, so that the first shielding unit 14 and the second shielding unit 15 are separated from each other and operated in an open state. A separation space 152 is formed between the first shielding unit 14 and the second shielding unit 15 in the open state, so that the first shielding unit 14 and the second shielding unit 15 do not exist between the target 161 and the carrier plate 165 and the substrate 163.

[0042] Then, the carrier plate 165 and the substrate 163 may be driven to approach the target 161 , and the gas in the accommodating space 12 , such as an inert gas, may impact the target 161 to deposit a thin film on the surface of the substrate 163 .

[0043] In one embodiment of the present invention, Figure 1 As shown, a blocking member 111 may be provided in the accommodation space 12 of the reaction chamber 11, wherein one end of the blocking member 111 is connected to the reaction chamber 11, and the other end of the blocking member 111 forms an opening 112. When the carrier plate 165 approaches the target material 161, the reaction chamber 11, the carrier plate 165 and the blocking member 111 will separate a reaction space in the accommodation space 12, and a thin film will be deposited on the surface of the substrate 163 in the reaction space.

[0044] In addition, if Figure 1 and Figure 8 As shown, the driving device 17 can drive the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, so that the first shielding unit 14 and the second shielding unit 15 are close to each other and operate in a shielding state. The closed first shielding unit 14 and the second shielding unit 15 are located between the target 161 and the carrier plate 165 to shield the carrier plate 165 and isolate the target 161 and the carrier plate 165.

[0045] The first shielding unit 14 and the second shielding unit 15 operating in the shielding state can separate a clean space 121 in the accommodating space 12, wherein the clean space 121 partially overlaps or is close to the area of ​​the reaction space. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 11 and / or the blocking member 111 in the clean space 121, and remove oxides, nitrides or other contaminants on the surface of the target 161, and deposited films on the surface of the reaction chamber 11 and / or the blocking member 111, so as to prevent substances generated during the cleaning process from contaminating or depositing on the surface of the carrier plate 165 and / or the substrate 163.

[0046] In one embodiment of the present invention, Figure 3 As shown, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding unit 14 and the second shielding unit 15 through the shaft sealing device 173, for example, the driving motor 171 is respectively connected to and drives the first shielding unit 14 and the second shielding unit 15 to swing synchronously in opposite directions through a linkage mechanism 18. The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is arranged on the reaction chamber 11, wherein a part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.

[0047] The shaft sealing device 173 includes an outer tube 1731 and a shaft 1733. The outer tube 1731 includes a space 1732 for accommodating the shaft 1733, wherein the outer tube 1731 and the shaft 1733 are coaxially arranged, and the outer tube 1731 and the shaft 1733 can rotate relative to each other. The outer tube 1731 is connected to the first connecting arm 141, and is connected to and drives the first shielding plate 143 to swing through the first connecting arm 141. The shaft 1733 is connected to the second connecting arm 151, and is connected to and drives the second shielding plate 153 to swing through the second connecting arm 151.

[0048] The shaft seal device 173 may be a common shaft seal, which is mainly used to isolate the accommodation space 12 of the reaction chamber 11 from the external space to maintain the vacuum of the accommodation space 12. In another embodiment of the present invention, the shaft seal device 173 may be a magnetic fluid shaft seal.

[0049] In order to confirm whether the first shielding unit 14 and the second shielding unit 15 are operating in the shielding state, Figure 1 and Figure 8 As shown, the present invention further provides a first reflective surface 145 and a second reflective surface 155 on the first shielding unit 14 and the second shielding unit 15, respectively, and provides a first distance sensing unit 191 and a second distance sensing unit 193 on the reaction chamber 11. In practical applications, the first distance sensing unit 191 and the second distance sensing unit 193 can be optical distance meters.

[0050] The first distance sensing unit 191 and the first shielding unit 14 are disposed on the same side of the reaction chamber 11, wherein the first distance sensing unit 191 is used to project a first sensing light beam L1 onto the first shielding unit 14. In practical applications, the setting position of the first distance sensing unit 191 can be adjusted so that when the first shielding unit 14 is operated in the shielding state, the first sensing light beam L1 generated by the first distance sensing unit 191 is projected onto the first reflecting surface 145 of the first shielding unit 14. At this time, the first sensing light beam L1 is perpendicular to the first reflecting surface 145, so that the first distance sensing unit 191 receives the first sensing light beam L1 reflected by the first reflecting surface 145.

[0051] The first distance sensing unit 191 can measure the distance between the first shielding unit 14 and the first distance sensing unit 191 by the reflected first sensing beam L1 , and determine whether the first shielding unit 14 is actually operating in the shielding state based on the measured distance.

[0052] The second distance sensing unit 193 and the second shielding unit 15 are disposed on the same side of the reaction chamber 11, wherein the second distance sensing unit 193 is used to project a second sensing beam L2 onto the second shielding unit 15. When the second shielding unit 15 is operated in the shielding state, the second sensing beam L2 generated by the second distance sensing unit 193 is projected onto the second reflecting surface 155 of the second shielding unit 15, wherein the second sensing beam L2 is perpendicular to the second reflecting surface 155, so that the second distance sensing unit 193 can receive the reflected second sensing beam L2 to measure the distance between the second shielding unit 15 and the second sensing unit 133, and determine whether the second shielding unit 15 is indeed operated in the shielding state based on the measured distance.

[0053] In one embodiment of the present invention, Figure 1 As shown, a light-transmitting window 115 may be respectively disposed on the reaction chamber 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 face the two light-transmitting windows 115 respectively, and project the first sensing light beam L1 and the second sensing light beam L2 onto the first shielding unit 14 and the second shielding unit 15 in the reaction chamber 11 respectively through the two light-transmitting windows 115.

[0054] In one embodiment of the present invention, Figure 4 As shown, the first connecting arm 141 may include a first protrusion 147, wherein the first reflective surface 145 is disposed on the first protrusion 147 of the first connecting arm 141. The second connecting arm 151 may include a second protrusion 157, wherein the second reflective surface 155 is disposed on the second protrusion 157 of the second connecting arm 151.

[0055] See also Figure 5, is a side cross-sectional schematic diagram of another embodiment of the thin film deposition apparatus for sensing the opening and closing of a shielding mechanism of the present invention operating in a shielding state. As shown in the figure, the thin film deposition apparatus 20 for sensing the opening and closing of a shielding mechanism mainly includes a reaction chamber 11, a carrier plate 165 and a shielding mechanism 100, wherein the reaction chamber 11 includes a receiving space 12 for receiving the carrier plate 165 and part of the shielding mechanism 100.

[0056] Please refer to Figure 6 , Figure 7 and Figure 8 As shown, two sensing areas 113 are respectively disposed on the reaction chamber 11, wherein the two sensing areas 113 protrude from the reaction chamber 11. The height of the two sensing areas 113 is smaller than that of the reaction chamber 11, and a light-transmitting window 115 may be respectively disposed on the two sensing areas 113. The first distance sensing unit 191 and the second distance sensing unit 193 are respectively disposed in the two sensing areas 113, and face the two light-transmitting windows 115 respectively. The first distance sensing unit 191 and the second distance sensing unit 193 generate a first sensing light beam L1 and a second sensing light beam L2 that respectively penetrate the two light-transmitting windows 115 and are projected onto the first shielding unit 14 and the second shielding unit 15 in the reaction chamber 11.

[0057] When the first shielding unit 14 and the second shielding unit 15 are operated in the shielding state, the first sensing beam L1 and the second sensing beam L2 are respectively projected onto the first reflecting surface 145 of the first shielding unit 14 and the second reflecting surface 155 of the second shielding unit 15. The first distance sensing unit 191 and the second distance sensing unit 193 respectively receive the first sensing beam L1 and the second sensing beam L2 reflected by the first reflecting surface 145 and the second reflecting surface 155, and measure the distance between the first shielding unit 14 and the first distance sensing unit 191, and the distance between the second shielding unit 15 and the second distance sensing unit 193, and determine whether the first shielding unit 14 and the second shielding unit 15 are indeed operated in the shielding state, such as Figure 8 shown.

[0058] In addition, a shielding plate sensing unit 195 may be further disposed on each of the two sensing areas 113, wherein the two shielding plate sensing units 195 are respectively used to sense the first shielding unit 14 and the second shielding unit 15 entering the two sensing areas 113. When the two shielding plate sensing units 195 sense the first shielding unit 14 and the second shielding unit 15, it can be determined that the first shielding unit 14 and the second shielding unit 15 are operating in the open state, such as Figure 7 shown.

[0059] In one embodiment of the present invention, Fig. 9As shown, the number of driving motors 171 can be two, namely the first driving motor 1711 and the second driving motor 1713. The first driving motor 1711 and the second driving motor 1713 are respectively connected to the outer tube body 1731 and the shaft body 1733 of the shaft sealing device 173, and respectively drive the first shielding unit 14 and the second shielding unit 15 to swing in different directions through the outer tube body 1731 and the shaft body 1733.

[0060] The two first sensing units 131 are adjacent to the outer tube body 1731 of the shaft sealing device 173, wherein there is a distance between the two first sensing units 131. For example, the two first sensing units 131 form an angle with the axis of the outer tube body 1731, and are used to sense whether the outer tube body 1731 is rotated to a first position (or a first angle) and a second position (or a second angle), respectively.

[0061] When the outer tube 1731 rotates to the first position, it drives the first shielding plate 143 to rotate to the open state, and when the outer tube 1731 rotates to the second position, it drives the first shielding plate 143 to rotate to the shielding state. Since the outer tube 1731 and the first shielding plate 143 basically do not rotate relative to each other, the two first sensing units 131 can sense that the outer tube 1731 rotates to the first position or the second position, and confirm whether the first shielding plate 143 is actually operated in the open state or the shielding state.

[0062] In one embodiment of the present invention, a first protruding unit 135 may be provided on the outer tube 1731, wherein the first protruding unit 135 protrudes toward the radially outer side of the outer tube 1731. For example, the first protruding unit 135 may be a long strip and fixed to the outer tube 1731 by screws or welding. When the outer tube 1731 rotates, the first protruding unit 135 is driven to rotate, so that the first protruding unit 135 interferes with the first sensing unit 131, so as to facilitate the first sensing unit 131 to sense that the outer tube 1731 rotates to the first position or the second position.

[0063] In another embodiment of the present invention, the shielding mechanism 100 may further be provided with two second sensing units 133, wherein the two second sensing units 133 are adjacent to the shaft body 1733 of the shaft sealing device 173. There is a distance between the two second sensing units 133, and they are used to sense the shaft body 1733 rotating to a third position (or a third angle) and a fourth position (or a fourth angle), respectively.

[0064] When the shaft 1733 rotates to the third position, the second shielding plate 153 is driven to rotate to the open state, and when the shaft 1733 rotates to the fourth position, the second shielding plate 153 is driven to rotate to the shielding state. Since the shaft 1733 and the second shielding plate 153 basically do not rotate relative to each other, the two second sensing units 133 can sense that the shaft 1733 rotates to the third position or the fourth position, and confirm whether the second shielding plate 153 is indeed rotated to the open state or the shielding state.

[0065] In one embodiment of the present invention, a second protruding unit 137 may be disposed on the shaft 1733, wherein the second protruding unit 137 protrudes along the radial direction of the shaft 1733 and interferes with the second sensing unit 133 to facilitate the second sensing unit 133 to sense that the shaft 1733 rotates to the third position or the fourth position.

[0066] The first sensing unit 131 and the second sensing unit 133 of the present invention can also be applied to a structure with only a single driving motor 171, such as Figure 3 Through the structural design of the present invention, it can be confirmed that the first shielding unit 14 and the second shielding unit 15 are operated in the shielding state or the open state, which can effectively prevent the reaction chamber 11 and the carrier plate 165 from being contaminated during the cleaning or pre-firing process, and at the same time, it can prevent the carrier plate 165 from colliding with the first shielding unit 14 and / or the second shielding unit 15, thereby causing damage to the mechanism.

[0067] Advantages of the present invention:

[0068] A novel thin film deposition device for sensing the opening and closing of a shielding mechanism is provided. The device mainly projects sensing light beams to two shielding units respectively through two distance sensing units to determine whether the two shielding units are operating in a shielding state.

[0069] The above is only a preferred embodiment of the present invention and is not intended to limit the scope of the present invention. That is, all equivalent changes and modifications to the shape, structure, characteristics and spirit described in the patent application scope of the present invention should be included in the patent application scope of the present invention.

Claims

1. A thin film deposition device for sensing the opening and closing of a shielding mechanism, It is characterized in that include: A reaction chamber, comprising a containing space; A carrier plate, located in the accommodating space and used for carrying at least one substrate; and A shielding mechanism, comprising: A first shielding unit is located in the accommodating space and includes a first reflecting surface; A second shielding unit is located in the accommodating space and includes a second reflecting surface; At least one driving device is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit to swing in opposite directions respectively, so that the first shielding unit and the second shielding unit switch between an open state and a shielding state, wherein the first shielding unit in the shielding state is close to the second shielding unit, and a separation space is formed between the first shielding unit and the second shielding unit in the open state, wherein the driving device includes a shaft sealing device and at least one driving motor, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, the driving motor is connected to the first shielding unit through the outer tube body, is connected to the second shielding unit through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions; a first distance sensing unit, disposed on the reaction chamber and used for projecting a first sensing beam onto the first reflecting surface of the first shielding unit to confirm that the first shielding unit is operating in the shielding state; and a second distance sensing unit, disposed on the reaction chamber and used for projecting a second sensing light beam onto the second reflective surface of the second shielding unit to determine that the second shielding unit is operating in the shielding state; Two sensing areas are connected to the reaction chamber, the sensing areas protrude from the reaction chamber, and the heights of the two sensing areas are smaller than the reaction chamber; Two shielding plate sensing units are respectively disposed in the two sensing areas and are respectively used to sense the first shielding unit and the second shielding unit entering the two sensing areas to determine that the first shielding unit and the second shielding unit are operating in the open state.

2. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 1, It is characterized in that The first shielding unit and the second shielding unit are operated in the shielding state, and the first sensing light beam is perpendicular to the first reflecting surface, and the second sensing light beam is perpendicular to the second reflecting surface.

3. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 1, It is characterized in that It includes two first sensing units adjacent to the outer tube body, respectively used to sense the outer tube body rotating to a first position and a second position. When the outer tube body rotates to the first position, the first shielding unit operates in the open state, and when the outer tube body rotates to the second position, the first shielding unit operates in the shielding state.

4. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 3, It is characterized in that It includes two second sensing units adjacent to the shaft and used to sense the shaft rotating to a third position and a fourth position respectively. When the shaft rotates to the third position, the second shielding unit operates in the open state, and when the shaft rotates to the fourth position, the second shielding unit operates in the shielding state.

5. The thin film deposition device for sensing the opening and closing of the shielding mechanism according to claim 4, It is characterized in that It includes a first protruding unit and a second protruding unit, the first protruding unit is connected to the outer tube body, and the second protruding unit is connected to the shaft body, wherein the first protruding unit rotates with the outer tube body and is sensed by the first sensing unit, and the second protruding unit rotates with the shaft body and is sensed by the second sensing unit.

6. A thin film deposition device for sensing the opening and closing of a shielding mechanism, It is characterized in that include: A reaction chamber, comprising a containing space; A carrier plate, located in the accommodating space and used for carrying at least one substrate; and A shielding mechanism, comprising: A first shielding unit is located in the accommodating space and includes a first reflecting surface; A second shielding unit is located in the accommodating space and includes a second reflecting surface; At least one driving device is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit to swing in opposite directions respectively, so that the first shielding unit and the second shielding unit switch between an open state and a shielding state, wherein the first shielding unit in the shielding state is close to the second shielding unit, and a separation space is formed between the first shielding unit and the second shielding unit in the open state, wherein the driving device includes a shaft sealing device and at least one driving motor, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, the driving motor is connected to the first shielding unit through the outer tube body, is connected to the second shielding unit through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions; a first distance sensing unit, disposed on the reaction chamber and used for projecting a first sensing beam onto the first reflecting surface of the first shielding unit to confirm that the first shielding unit is operating in the shielding state; and a second distance sensing unit, disposed on the reaction chamber and used for projecting a second sensing light beam onto the second reflective surface of the second shielding unit to determine that the second shielding unit is operating in the shielding state; The first shielding unit includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate via the first connecting arm, and the first reflecting surface is arranged on the first connecting arm, and the second shielding unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate via the second connecting arm, and the second reflecting surface is arranged on the second connecting arm; The first connecting arm includes a first protruding portion, the first reflecting surface is arranged on the first protruding portion, and the second connecting arm includes a second protruding portion, the second reflecting surface is arranged on the second protruding portion.

7. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 6, It is characterized in that The first shielding unit and the second shielding unit are operated in the shielding state, and the first sensing light beam is perpendicular to the first reflecting surface, and the second sensing light beam is perpendicular to the second reflecting surface.

8. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 6, It is characterized in that It includes two first sensing units adjacent to the outer tube body, respectively used to sense the outer tube body rotating to a first position and a second position. When the outer tube body rotates to the first position, the first shielding unit operates in the open state, and when the outer tube body rotates to the second position, the first shielding unit operates in the shielding state.

9. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 8, It is characterized in that It includes two second sensing units adjacent to the shaft and used to sense the shaft rotating to a third position and a fourth position respectively. When the shaft rotates to the third position, the second shielding unit operates in the open state, and when the shaft rotates to the fourth position, the second shielding unit operates in the shielding state.

10. The thin film deposition device for sensing the opening and closing of a shielding mechanism according to claim 9, It is characterized in that It includes a first protruding unit and a second protruding unit, the first protruding unit is connected to the outer tube body, and the second protruding unit is connected to the shaft body, wherein the first protruding unit rotates with the outer tube body and is sensed by the first sensing unit, and the second protruding unit rotates with the shaft body and is sensed by the second sensing unit.

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