An anti-allergic and repairing facial mask
By using specific formulas and ingredients in the mask, the problem of limited efficacy of existing masks in anti-allergic and repair is solved, significant skin barrier repair and anti-allergic effects are achieved, and the skin's moisture retention ability is improved.
Patent Information
- Application Number
- CN202310029886.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-01-09
- Publication Date
- 2025-04-15
- Estimated Expiration
- 2043-01-09
AI Technical Summary
Existing facial masks have limited efficacy in anti-allergic and repairing, making it difficult to effectively repair the skin barrier and improve skin resistance.
An anti-allergic empowered repair mask is adopted, containing deionized water, EDTA-2NA, allantoin, inositol, PEG/PPG-17/6 copolymer, dipropylene glycol, crosslinked acrylic polymer, clear hansheng gel, hyaluronic acid, arginine, 1,3 butanediol, para-hydroxyacetophenone, hexanediol, sphingosine complex, HNM-2 and tetrahydromethylpyrimidine carboxylic acid and other components. It is prepared through complex formulas and processes to enhance the anti-allergic and repair effects of the mask.
This mask significantly improves the skin's anti-allergicity and repair effect, can effectively repair the skin barrier, enhance the skin's resistance, and retains skin moisture for 7 days without reuse.
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Abstract
Description
Technical Field
[0001] The invention relates to the field of cosmetics, and in particular to an anti-allergic and energy-enhancing repairing facial mask. Background Art
[0002] In recent years, allergies have increased significantly. The causes of allergies are diverse. First, the current environmental pollution may be more and more serious. Environmental problems such as water quality and haze are emerging one after another. These pollution sources will cause damage to the skin when they come into contact with the skin, causing skin sensitivity and other problems. Second, it may be due to improper personal skin care, using skin care products that are not suitable for one's own skin condition, which puts a burden on the skin and causes damage to the stratum corneum, as well as various other reasons. Therefore, compared with most masks on the market that have a single effect of moisturizing or false effects, a mask that can both resist allergies and enhance the protection of the skin is needed. It can strengthen the skin barrier while repairing the skin barrier and enable the repair of skin damage. Summary of the invention
[0003] In order to solve at least one technical problem existing in the prior art, the present invention provides the following technical solution.
[0004] The technical solution of the present invention is as follows:
[0005] The present invention provides an anti-allergic energy-enhancing repairing facial mask, comprising the following components in parts by weight: deionized water
[0006] 80-90 parts, EDTA-2NA 0.01-0.4 parts, allantoin 0.1-0.4 parts, inositol 0.4-0.6 parts, PEG / PPG-17 / 6 copolymer 1-3 parts, dipropylene glycol 2-4 parts, cross-linked acrylic acid polymer 0.1-0.3 parts, transparent xanthan gum 0.05-0.1 parts, hyaluronic acid 0.02-0.8 parts, arginine 0.1-0.2 parts, 1,3-butanediol 2-4 parts, p-hydroxyacetophenone 0.1-0.2 parts, hexylene glycol 0.2-0.8 parts, sphingosine complex 0.1-0.8 parts, HNM-2 1-3 parts, and tetrahydromethylpyrimidine carboxylic acid 0.1-0.4 parts.
[0007] Preferably, the anti-allergic repairing mask comprises the following components in parts by weight:
[0008] 80-90 parts of water, 0.2 parts of EDTA-2NA, 0.2 parts of allantoin, 0.5 parts of inositol, 2 parts of PEG / PPG-17 / 6 copolymer, 3 parts of dipropylene glycol, 0.2 parts of cross-linked acrylic polymer, 0.08 parts of transparent xanthan gum, 0.4 parts of hyaluronic acid, 0.15 parts of arginine, 3 parts of 1,3-butylene glycol, 0.15 parts of p-hydroxyacetophenone, 0.5 parts of hexylene glycol, 0.5 parts of sphingosine complex, 2 parts of HNM-2, and 0.3 parts of tetrahydromethylpyrimidine carboxylic acid.
[0009] Preferably, the preparation method of the sphingosine complex is:
[0010] The mixture is homogenized and heated in a homogenizing pot at a mass ratio of 1:1-3, and then 4-6% by mass of the spirulina extract is added and stirred for 10-15 minutes to obtain a sphingosine complex.
[0011] Preferably, the homogenization heating time is 10-15 min, and the heating temperature is 70-90°C.
[0012] Preferably, the preparation method of HNM-2 is:
[0013] Step 1: Grind and sieve soybeans, Centella asiatica and mung beans at a mass ratio of 1:1:1, mix with 2-4 volume times of nutrient solution to prepare a liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 30-35°C for 24-36 hours, sterilize at high temperature, cool to room temperature, inoculate with composite enzymes and continue fermentation for 1-3 hours;
[0014] Step 2: The liquid culture medium after fermentation is ultrafiltered, and the filtrate is purified by distillation with anhydrous ethanol. After reduced pressure concentration, a compressed liquid with a mass fraction of 10-13% chitosan is added and stirred to obtain HNM-2.
[0015] Preferably, the nutrient solution comprises the following raw materials in parts by weight: 3-5 parts of glucose, glycerol
[0016] 1-3 parts, yeast extract 1-3 parts and deionized water 10-13 parts.
[0017] Preferably, the complex enzyme is composed of bromelain, cellulase and β-glucanase.
[0018] The weight ratio of bromelain, cellulase and beta-glucanase is 1-3:1-3:0.5-1.5.
[0019] Preferably, the composite bacteria is composed of yeast and Bacillus subtilis, wherein the yeast concentration is
[0020] Degree is 10 3- 10 5 / mL, the concentration of Bacillus subtilis was 10 4- 10 7 Pieces / mL.
[0021] The preparation method of the anti-allergic repairing facial mask of the present invention comprises the following steps:
[0022] Step 1: Disodium EDTA, allantoin, inositol, PEG / PPG-17 / 6 copolymer
[0023] Add to pure water and stir evenly
[0024] Step 2: Add dispersed dipropylene glycol, cross-linked acrylic polymer, transparent xanthan gum, and hyaluronic acid, stir and heat to 75-85°C, homogenize for 10 minutes, and keep warm for 30 minutes.
[0025] Step 3: Cool down to 60-70℃, add dissolved transparent arginine, stir for 5-10 minutes, transfer
[0026] Speed 3000~3500rpm / min.
[0027] Step 4: Continue to cool down to 40-50℃, add dissolved 1,3-butanediol and p-hydroxystyrene
[0028] The aqueous solution of ketone, hexanediol and sphingosine complex, HNM-2 and tetrahydromethylpyrimidine carboxylic acid is stirred evenly and discharged.
[0029] Preferably, the aqueous solution of ectoine is ectoine and de
[0030] It is prepared by stirring and dissolving deionized water in a ratio of 1:1-2.
[0031] Ectohydropyrimidine carboxylic acid: By repairing the skin, restoring and regulating the skin's moisture content, Ectohydropyrimidine carboxylic acid reduces transepidermal water loss, improves hydration levels, and retains skin moisture for 7 days without repeated use. It has moisturizing, anti-aging, and repairing effects.
[0032] Phytosphingosine: has antibacterial, acne-removing and after-sun repair effects.
[0033] HNM-2: A multifunctional biopeptide constructed by genetic engineering and produced by yeast fermentation technology
[0034] Active ingredients: Repair skin barrier, replenish skin defensins, improve skin resistance; repair after cosmetic surgery, and promote wound healing.
[0035] The present invention has found through a large number of experiments that the repairing facial mask prepared by the present invention is added with HNM-2 prepared by the method of the present invention, contains a variety of active peptides, has significant effects on repairing skin barrier and healing wounds, and is compounded with sphingosine complex and tetrahydromethylpyrimidine carboxylic acid to further improve the anti-allergic repair effect.
[0036] Beneficial effects of the present invention: The present invention is rich in a variety of repair ingredients, suitable for barrier-damaged skin, moisturizing the skin, promoting wound healing and improving skin resistance, wherein HNM-2 is added with a sphingosine complex and tetrahydromethylpyrimidine carboxylic acid, and the anti-allergic and repairing effects are significant. DETAILED DESCRIPTION
[0037] The present invention is described below with reference to specific embodiments. It is hereby stated that the embodiments selected herein are only used to illustrate and explain the present invention and are not used to limit the present invention.
[0038] Example 1
[0039] This embodiment provides an anti-allergic and energy-repairing facial mask, comprising the following components in parts by weight:
[0040] 85 parts of water, 0.2 parts of EDTA-2NA, 0.2 parts of allantoin, 0.5 parts of inositol, 2 parts of PEG / PPG-17 / 6 copolymer, 3 parts of dipropylene glycol, 0.2 parts of cross-linked acrylic polymer, 0.08 parts of transparent xanthan gum, 0.4 parts of hyaluronic acid, 0.15 parts of arginine, 3 parts of 1,3-butylene glycol, 0.15 parts of p-hydroxyacetophenone, 0.5 parts of hexylene glycol, 0.5 parts of sphingosine complex, 2 parts of HNM-2, and 0.3 parts of ectoine.
[0041] The preparation method of the sphingosine complex is: phytosphingosine and cyclodextrin are mixed in a mass ratio of
[0042] 1:2 was homogenized and heated in a homogenizer, and then 5% by mass of Spirulina extract was added and stirring was continued for 12 minutes to obtain a sphingosine complex.
[0043] The homogenization heating time is 12 minutes and the heating temperature is 80°C.
[0044] The preparation method of HNM-2 is:
[0045] Step 1: Grind and sieve soybeans, Centella asiatica and mung beans in a mass ratio of 1:1:1, mix with 3 volumes of nutrient solution to prepare a liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 32°C for 30 hours, sterilize at high temperature, cool to room temperature, inoculate with composite enzymes and continue fermentation for 2 hours;
[0046] Step 2: The liquid culture medium after fermentation is ultrafiltered, and the filtrate is purified by distillation with anhydrous ethanol. After reduced pressure concentration, compressed liquid with a mass fraction of 12% chitosan is added and stirred to obtain HNM-2.
[0047] The nutrient solution comprises the following raw materials by weight: 4 parts of glucose, 2 parts of glycerol,
[0048] 2 parts of master paste and 12 parts of deionized water.
[0049] The complex enzyme is composed of bromelain, cellulase and β-glucanase.
[0050] The weight ratio of enzyme, cellulase and β-glucanase is 2:2:1.
[0051] The composite bacteria is composed of yeast and Bacillus subtilis, wherein the yeast concentration is
[0052] Degree is 10 4 / mL, the concentration of Bacillus subtilis was 10 5 Pieces / mL.
[0053] Example 2
[0054] The present embodiment provides an anti-allergic empowering repairing facial mask, comprising the following components in parts by weight: 80 parts of deionized water, 0.01 parts of EDTA-2NA, 0.1 parts of allantoin, 0.4 parts of inositol, 1 part of PEG / PPG-17 / 6 copolymer, 2 parts of dipropylene glycol, 0.1 parts of cross-linked acrylic polymer, 0.05 parts of transparent xanthan gum, 0.02 parts of hyaluronic acid, 0.1 parts of arginine, 2 parts of 1,3-butylene glycol, 0.1 parts of p-hydroxyacetophenone, 0.2 parts of hexylene glycol, 0.1 parts of sphingosine complex, 1 part of HNM-2, and 0.1 parts of tetrahydromethylpyrimidine carboxylic acid.
[0055] The preparation method of the sphingosine complex is: phytosphingosine and cyclodextrin are mixed in a mass ratio of
[0056] 1:1 was homogenized and heated in a homogenizer, and then 4% by mass of Spirulina extract was added and stirred for 10 minutes to obtain a sphingosine complex.
[0057] The homogenization heating time is 10 minutes and the heating temperature is 70°C.
[0058] The preparation method of HNM-2 is:
[0059] Step 1: Grind and sieve soybeans, Centella asiatica and mung beans in a mass ratio of 1:1:1, mix with 2 volumes of nutrient solution to prepare a liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 30°C for 24 hours, sterilize at high temperature, cool to room temperature, inoculate with composite enzymes and continue fermentation for 1 hour;
[0060] Step 2: The liquid culture medium after fermentation is ultrafiltered, and the filtrate is purified by distillation with anhydrous ethanol. After reduced pressure concentration, a compressed liquid with a mass fraction of 10% chitosan is added and stirred to obtain HNM-2.
[0061] The nutrient solution comprises the following raw materials by weight: 3 parts of glucose, 1 part of glycerol, and yeast extract.
[0062] 1 part and 10 parts of deionized water.
[0063] The complex enzyme is composed of bromelain, cellulase and β-glucanase.
[0064] The weight ratio of enzyme, cellulase and beta-glucanase is 1:1:0.5.
[0065] The composite bacteria is composed of yeast and Bacillus subtilis, wherein the concentration of yeast is
[0066] 10 3 / mL, the concentration of Bacillus subtilis was 10 4 Pieces / mL.
[0067] Example 3
[0068] This embodiment provides an anti-allergic energy repairing facial mask, comprising the following components in parts by weight: deionized water
[0069] 90 parts of water, 0.4 parts of EDTA-2NA, 0.4 parts of allantoin, 0.6 parts of inositol, 3 parts of PEG / PPG-17 / 6 copolymer, 4 parts of dipropylene glycol, 0.3 parts of cross-linked acrylic acid polymer, 0.1 parts of transparent xanthan gum, 0.8 parts of hyaluronic acid, 0.2 parts of arginine, 4 parts of 1,3-butylene glycol, 0.2 parts of p-hydroxyacetophenone, 0.8 parts of hexylene glycol, 0.8 parts of sphingosine complex, 3 parts of HNM-2, and 0.4 parts of ectoine.
[0070] The preparation method of the sphingosine complex is: phytosphingosine and cyclodextrin are mixed in a mass ratio of
[0071] 1:3 was homogenized and heated in a homogenizer, and then 6% by mass of Spirulina extract was added and stirred for 15 minutes to obtain a sphingosine complex.
[0072] The homogenization heating time is 15 minutes and the heating temperature is 90°C.
[0073] The preparation method of HNM-2 is:
[0074] Step 1: Grind and sieve soybeans, Centella asiatica and mung beans in a mass ratio of 1:1:1, mix with 4 volumes of nutrient solution to prepare a liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 35°C for 36 hours, sterilize at high temperature, cool to room temperature, inoculate with composite enzymes and continue fermentation for 3 hours;
[0075] Step 2: The liquid culture medium after fermentation is ultrafiltered, and the filtrate is purified by distillation with anhydrous ethanol. After reduced pressure concentration, compressed liquid with a mass fraction of 13% chitosan is added and stirred to obtain HNM-2.
[0076] The nutrient solution comprises the following raw materials by weight: 5 parts of glucose, 3 parts of glycerol,
[0077] 3 parts of master paste and 13 parts of deionized water.
[0078] The complex enzyme is composed of bromelain, cellulase and β-glucanase.
[0079] The weight ratio of enzyme, cellulase and β-glucanase is 3:3:1.5.
[0080] The composite bacteria is composed of yeast and Bacillus subtilis, wherein the concentration of yeast is
[0081] 10 5 / mL, the concentration of Bacillus subtilis was 10 7 Pieces / mL.
[0082] The preparation method of the anti-allergic repairing facial mask described in Examples 1-3 comprises the following steps:
[0083] Step 1: Disodium EDTA, allantoin, inositol, PEG / PPG-17 / 6 copolymer
[0084] Add into pure water and stir well.
[0085] Step 2: Add dispersed dipropylene glycol, cross-linked acrylic polymer, transparent xanthan gum, and hyaluronic acid, stir and heat to 80°C, homogenize for 10 minutes, and keep warm for 30 minutes.
[0086] Step 3: Cool down to 65°C, add dissolved transparent arginine, stir for 7 minutes, and speed
[0087] 3200rpm / min.
[0088] Step 4: Continue to cool down to 45°C, add dissolved 1,3-butanediol, p-hydroxyacetophenone,
[0089] The aqueous solution of hexanediol and sphingosine complex, HNM-2 and tetrahydromethylpyrimidine carboxylic acid is stirred evenly and discharged.
[0090] The aqueous solution of ectoine carboxylic acid is ectoine carboxylic acid and deionized water.
[0091] It is prepared by stirring and dissolving in a ratio of 1:2.
[0092] Comparative Example 1
[0093] The difference between Comparative Example 1 and Example 1 is that, in Comparative Example 1, ectoine is not added.
[0094] Comparative Example 2
[0095] The difference between Comparative Example 2 and Example 1 is that no sphingosine complex is added in Comparative Example 2.
[0096] Comparative Example 3
[0097] The difference between Comparative Example 3 and Example 1 is that HNM-2 is not added in Comparative Example 3.
[0098] Comparative Example 4
[0099] The difference between Comparative Example 4 and Example 1 is that the preparation method of the sphingosine complex in Comparative Example 4 is as follows:
[0100] The preparation method is different. The preparation method is: homogenizing and heating phytosphingosine and cyclodextrin in a homogenizing pot at a mass ratio of 1:2 to obtain a sphingosine complex.
[0101] The homogenization heating time is 12 minutes and the heating temperature is 80°C.
[0102] Comparative Example 5
[0103] The difference between Comparative Example 5 and Example 1 is that no Centella asiatica is added during the HNM-2 process of Comparative Example 4.
[0104] Comparative Example 6
[0105] The difference between Comparative Example 6 and Example 1 is that the preparation method of HNM-2 in Comparative Example 4 is different, and the preparation method is as follows: Step 1: Grind and sieve soybeans, Centella asiatica and mung beans in a mass ratio of 1:1:1, mix with 3 volume times of nutrient solution to prepare a liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 32°C for 30 hours, then sterilize at high temperature, distill and purify the filtrate with anhydrous ethanol, and concentrate under reduced pressure to obtain HNM-2.
[0106] The nutrient solution comprises the following raw materials by weight: 4 parts of glucose, 2 parts of glycerol,
[0107] 2 parts of master paste and 12 parts of deionized water.
[0108] The composite bacteria is composed of yeast and Bacillus subtilis, wherein the yeast concentration is
[0109] Degree is 10 4 / mL, the concentration of Bacillus subtilis was 10 5 Pieces / mL.
[0110] Efficacy verification
[0111] MTT assay principle:
[0112] Within a certain range of cell numbers, the amount of MTT crystals formed is proportional to the number of cells. The number of living cells is determined based on the measured absorbance value. The larger the OD value, the stronger the cell activity.
[0113] The experiment used skin fibroblasts to make a 3×10 6The cell suspension of 100 μg / ml was added to a 96-well plate and cultured at 37°C, 5% CO2 for 48 hours. 60 μL / well of PBS solution was added as a negative control, and after culturing for 24 hours, 60 μg / ml SDS solution was added and cultured for 24 hours. 60 μL / well of the mask solution prepared in the embodiment and the comparative example were added, 1 mg / ml MTT solution was added to each well, and the supernatant was removed after being placed in an incubator for 4 hours. 150 μL / well of dimethyl sulfoxide was added, and after shaking on a shaker for 10 minutes, the absorbance at 570 nm was measured with an enzyme-linked immunosorbent assay. The test results are shown in Table 1.
[0114] Table 1.
[0115]
[0116] It can be seen from the test results that the anti-allergic empowering repair mask prepared within the scope of the present invention can effectively promote cell growth, and the cell activity is significantly stronger than that of the control group; from comparative examples 1-3, it can be seen that the present invention adopts HNM-2 in combination with sphingosine complex and tetrahydromethylpyrimidine carboxylic acid, and the mask prepared is more effective in repairing damaged cells than the mask lacking one of them; from comparative example 4, it can be seen that the sphingosine complex prepared by the method of the present invention has a stronger repair effect than the sphingosine complex prepared by other methods; from comparative examples 5-6, it can be seen that the HNM-2 prepared by the present invention separates and extracts the active peptides of plants and protects them with chitosan, which has a better repair effect than HNM-2 prepared by other methods.
[0117] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit the protection scope of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solution of the present invention can be modified or replaced by equivalents without departing from the essence and scope of the technical solution of the present invention.
Claims
1. An anti-allergic and energizing repairing facial mask, comprising the following components in parts by weight: 80-90 parts of deionized water, 0.01-0.4 parts of EDTA-2Na, 0.1-0.4 parts of allantoin, 0.4-0.6 parts of inositol, 1-3 parts of PEG / PPG-17 / 6 copolymer, 2-4 parts of dipropylene glycol, 0.1-0.3 parts of cross-linked acrylic acid polymer, 0.05-0.1 parts of transparent xanthan gum, 0.02-0.8 parts of hyaluronic acid, 0.1-0.2 parts of arginine, 2-4 parts of 1,3-butylene glycol, 0.1-0.2 parts of p-hydroxyacetophenone, 0.2-0.8 parts of hexylene glycol, 0.1-0.8 parts of sphingosine complex, 1-3 parts of HNM-2, and 0.1-0.4 parts of tetrahydromethylpyrimidine carboxylic acid; The preparation method of HNM-2 is: Step 1: grind and sieve soybeans, Centella asiatica and mung beans in a mass ratio of 1:1:1, mix with 2-4 volume times of nutrient solution to prepare liquid fermentation medium, inoculate the composite bacteria into the liquid fermentation medium for liquid fermentation at 30-35°C for 24-36h, sterilize at high temperature, cool to room temperature, and then inoculate with composite enzyme for enzymolysis for 1-3h; Step 2: The fermented liquid culture medium is ultrafiltered, and the filtrate is purified by distillation with anhydrous ethanol, concentrated under reduced pressure, and then a compressed liquid with a mass fraction of 10-13% chitosan is added and stirred to obtain HNM-2; The nutrient solution comprises the following raw materials in parts by weight: 3-5 parts of glucose, 1-3 parts of glycerol, 1-3 parts of yeast extract and 10-13 parts of deionized water; The complex enzyme is composed of bromelain, cellulase and beta-glucanase, and the weight ratio of bromelain, cellulase and beta-glucanase is 1-3:1-3:0.5-1.5; The composite bacteria is composed of yeast and Bacillus subtilis, wherein the concentration of yeast is 10 3 -10 5 / mL, the concentration of Bacillus subtilis was 10 4 -10 7 Pieces / mL; The preparation method of the sphingosine complex is as follows: phytosphingosine and cyclodextrin are homogenized and heated in a homogenizing pot at a mass ratio of 1:1-3, and then 4-6% of spirulina extract is added and stirred for 10-15 minutes to obtain the sphingosine complex.
2. The anti-allergic repairing facial mask according to claim 1, characterized in that: The invention comprises the following components in parts by weight: 80-90 parts of deionized water, 0.2 parts of EDTA-2Na, 0.2 parts of allantoin, 0.5 parts of inositol, 2 parts of PEG / PPG-17 / 6 copolymer, 3 parts of dipropylene glycol, 0.2 parts of cross-linked acrylic polymer, 0.08 parts of transparent xanthan gum, 0.4 parts of hyaluronic acid, 0.15 parts of arginine, 3 parts of 1,3-butylene glycol, 0.15 parts of p-hydroxyacetophenone, 0.5 parts of hexylene glycol, 0.5 parts of sphingosine complex, 2 parts of HNM-2 and 0.3 parts of tetrahydromethylpyrimidine carboxylic acid.
3. The anti-allergic repairing facial mask according to claim 1, characterized in that: The homogenization heating time is 10-15 minutes, and the heating temperature is 70-90°C.
4. The anti-allergic repairing facial mask according to claim 1, characterized in that: The nutrient solution comprises the following raw materials in parts by weight: 3-5 parts of glucose, 1-3 parts of glycerol, 1-3 parts of yeast extract and 10-13 parts of deionized water.
5. An anti-allergic repairing facial mask according to any one of claims 1 to 4, characterized in that: The preparation method of the anti-allergic repairing facial mask comprises the following steps: Step 1: Add EDTA-2Na, allantoin, inositol, and PEG / PPG-17 / 6 copolymer into deionized water and stir evenly; Step 2: Add dispersed dipropylene glycol, cross-linked acrylic polymer, transparent xanthan gum, and hyaluronic acid, stir and heat to 75-85°C, homogenize for 10 minutes, and keep warm for 30 minutes; Step 3: Cool down to 60-70℃, add dissolved transparent arginine, stir for 5-10min, and rotate at 3000~3500rpm / min; Step 4: Continue to cool to 40-50°C, add the aqueous solution of dissolved 1,3-butanediol, p-hydroxyacetophenone, hexylene glycol and sphingosine complex, HNM-2, and tetrahydromethylpyrimidine carboxylic acid, stir evenly, and discharge.
6. The anti-allergic repairing facial mask according to claim 5, characterized in that: The aqueous solution of ectoine is prepared by stirring and dissolving ectoine and deionized water in a ratio of 1:1-2.
Citation Information
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