A high-precision glass polishing process polishing liquid online regulation and control system and regulation and control method

Abstract

The present application relates to a kind of high-precision glass polishing process polishing liquid online regulation and control system and regulation and control method, wherein regulation and control system includes surface tension regulation and control module, abrasive particle size particle shape regulation and control module, abrasive concentration regulation and control module and polishing liquid circulating device being connected with control unit communication;The polishing liquid circulating device includes circulating pipeline and be used for the circulating pump of polishing liquid in circulating pipeline flow;The circulating pipeline is sequentially passed through surface tension regulation and control module, abrasive particle size particle shape regulation and control module, abrasive concentration regulation and control module and polishing station.The regulation and control system and regulation and control method in the present application are through experimental simulation different abrasive particle diameter and roundness polishing liquid after mixing result, obtain the active agent of new polishing liquid, abrasive particle diameter, abrasive roundness and abrasive concentration that need to be supplemented when polishing liquid particle diameter and roundness change, real-time monitoring the physical and chemical properties of polishing liquid, supplement certain concentration specified particle diameter and roundness new polishing liquid, so that polishing liquid overall particle diameter and roundness keep at fixed level.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of physical polishing, in particular to a high-precision glass polishing process polishing liquid online regulation system and regulation method. BACKGROUND

[0002] In the field of physical polishing processing, polishing liquid is an essential processing auxiliary material. The polishing liquid is generally composed of a solvent and an abrasive according to a specific ratio. In the polishing process, the active agent in the polishing liquid gradually decreases, the abrasive particle size gradually decreases, the abrasive concentration gradually decreases, and the abrasive roundness gradually increases, which reduces the removal effect of the polishing liquid and greatly reduces the polishing efficiency. The existing polishing equipment generally solves this problem by manually supplementing new polishing liquid. However, the time and amount of supplementing the polishing liquid cannot be accurately controlled, resulting in poor polishing effect and low efficiency. SUMMARY

[0003] The first object of the present application is a high-precision glass polishing process polishing liquid online regulation system, which can simulate the results of mixing different abrasive particle sizes and roundness polishing liquids through experiments, obtain the active agent, abrasive particle size, abrasive roundness, and abrasive concentration of the new polishing liquid needed to be supplemented when the polishing liquid particle size and roundness change, monitor the physical and chemical properties of the polishing liquid in real time, and supplement new polishing liquid with a certain concentration, specified particle size, and roundness to keep the overall particle size and roundness of the polishing liquid at a fixed level.

[0004] The technical solution for achieving the first object of the present application is: the high-precision glass polishing process polishing liquid online regulation system in the present application, which includes a surface tension regulation module, an abrasive particle size and shape regulation module, an abrasive concentration regulation module, and a polishing liquid circulating device in communication with a control unit; the polishing liquid circulating device includes a circulating pipeline and a circulating pump for the flow of polishing liquid in the circulating pipeline; the circulating pipeline passes through the surface tension regulation module, the abrasive particle size and shape regulation module, the abrasive concentration regulation module, and the polishing station in sequence;

[0005] The surface tension regulation module includes a first liquid taking device for taking a certain amount of polishing liquid from the circulating pipeline, a surface tension detector for detecting the surface tension of the polishing liquid, and a first feeding device for supplementing a surfactant into the circulating pipeline;

[0006] The abrasive particle size and shape regulation module includes a second liquid taking device for taking a certain amount of polishing liquid from the circulating pipeline, a particle size and shape detector for detecting the particle size and shape of the abrasive in the polishing liquid, and a second feeding device for supplementing abrasive with a matching corresponding edge angle into the circulating pipeline;

[0007] The abrasive concentration regulation module comprises a third liquid taking device for quantitatively taking the polishing liquid in the circulating pipeline, a turbidity detector for detecting the abrasive concentration in the polishing liquid, and a third feeding device for supplementing the polishing liquid into the circulating pipeline.

[0008] Further, an automatic sampling mechanism for carrying the taken polishing liquid and transferring the polishing liquid to a detection position is arranged between the first liquid taking device and the surface tension detector, between the second liquid taking device and the particle size and shape detector, and between the third liquid taking device and the turbidity detector, respectively; the automatic sampling mechanism is in communication connection with the control unit.

[0009] Further, the automatic sampling mechanism comprises a measuring cup carrying table, a detected carrying table and a mechanical hand arranged on the rack; the measuring cup carrying table comprises a first rotating table rotatably arranged on the rack and capable of rotating under the driving of a first motor; the detected carrying table comprises a second rotating table rotatably arranged on the rack and capable of rotating under the driving of a second motor; a plurality of placing positions for placing measuring cups are uniformly distributed along the circumferences of the rotating shafts of the first rotating table and the second rotating table; one of the placing positions on the first rotating table corresponds to the liquid outlet of the first liquid taking device or the second liquid taking device or the third liquid taking device;

[0010] The mechanical hand is used for grabbing the measuring cup on the measuring cup carrying table to the surface tension detector or the particle size and shape detector or the turbidity detector, and is used for transferring the measuring cup at the surface tension detector or the particle size and shape detector or the turbidity detector to the detected carrying table;

[0011] The first motor, the second motor and the mechanical hand are in electrical connection with the control unit.

[0012] Further, the placing positions on the first rotating table and the second rotating table are provided with measuring cup carrying assemblies; the measuring cup carrying assembly comprises a carrying table slidingly arranged on the first rotating table or the second rotating table and capable of ascending and descending under the driving of an electric push rod; a measuring cup positioning fence is fixedly arranged around the carrying table on the first rotating table and the second rotating table; the upper limit position of the carrying table exceeds the upper end of the measuring cup positioning fence; the electric push rod is in electrical connection with the control unit.

[0013] Further, the first liquid taking device, the second liquid taking device and the third liquid taking device are all adjustable quantitative liquid feeders; the liquid inlet pipe of the adjustable quantitative liquid feeder is in communication with the circulating pipeline, and an electromagnetic valve in electrical connection with the control unit is arranged on the liquid inlet pipe.

[0014] The second feeding device comprises a plurality of storage tanks for respectively storing different kinds of abrasives in the polishing liquid; the discharge outlets of the storage tanks are respectively connected with the inlet ports of a plurality of powder metering pumps, the discharge outlets of the powder metering pumps are in communication with the inlet ports of the polishing liquid storage tank; the powder metering pumps are in electrical connection with the control unit.

[0015] The second object of the present application is to provide a regulating method using the regulating system described above, which can automatically detect the polishing liquid condition, implement accurate regulation of the polishing liquid composition, and ensure poor polishing effect.

[0016] The technical solution for realizing the second object of the present application is: the regulating method using the high-precision glass polishing process polishing liquid online regulating system in the present application, comprising the following steps:

[0017] S1, preparation: setting the detection period of the polishing liquid surface tension, the detection period of the granularity and shape of the abrasive in the polishing liquid, and the detection period of the abrasive concentration in the polishing liquid on the control unit;

[0018] S2, according to the detection periods set in step S1, the following detections are respectively performed:

[0019] Detection of the polishing liquid surface tension: sampling from the circulating pipeline through the first sampling device; then placing the sampled polishing liquid under the surface tension detector for detection; and then transmitting the detection result to the control unit;

[0020] Detection of the granularity and shape of the abrasive in the polishing liquid: sampling from the circulating pipeline through the second sampling device; then placing the sampled polishing liquid under the granularity and shape detector for detection; and then transmitting the detection result to the control unit;

[0021] Detection of the abrasive concentration in the polishing liquid: sampling from the circulating pipeline through the third sampling device; then placing the sampled polishing liquid under the turbidity detector for detection; and then transmitting the detection result to the control unit;

[0022] S3, according to the detection results of step S2, the following regulation is performed:

[0023] Regulation of the surface tension: the control unit obtains the addition amount of the surfactant according to the detection result, and transmits the addition command to the first feeding device; the first feeding device adds the surfactant into the circulating pipeline according to the addition command;

[0024] Regulation of the granularity and shape of the abrasive: the control unit matches the abrasive type and the addition amount of the corresponding cutting angle according to the detection result, and transmits the matching result to the control command to the second feeding device; the second feeding device adds the matched corresponding abrasive into the circulating pipeline according to the control command;

[0025] Regulation of the abrasive concentration: the control unit obtains the addition amount of the polishing liquid according to the detection result, and transmits the addition command to the third feeding device; the third feeding device adds the polishing liquid into the circulating pipeline according to the addition command;

[0026] In the regulation of the abrasive concentration, the abrasive concentration of the added polishing liquid is higher than the polishing liquid concentration used for polishing.

[0027] The method for regulating the polishing liquid on-line control system with automatic sampling mechanism in high-precision glass polishing process comprises the following steps:

[0028] S1, preparation: set the detection period of the surface tension of the polishing liquid, the detection period of the granularity of the abrasive in the polishing liquid, and the detection period of the concentration of the abrasive in the polishing liquid on the control unit;

[0029] S2, according to the detection periods set in step S1, the following detections are carried out respectively:

[0030] Detection of the surface tension of the polishing liquid: the first sampling device samples from the circulating pipeline, and the sampled polishing liquid is introduced into the measuring cup on the measuring cup carrying table; then the robot transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the position below the surface tension detector for detection; then the detection result is transmitted to the control unit; then the robot transfers the measuring cup containing the monitored polishing liquid to the detected carrying table;

[0031] Detection of the granularity of the abrasive in the polishing liquid: the second sampling device samples from the circulating pipeline, and the sampled polishing liquid is introduced into the measuring cup on the measuring cup carrying table; then the robot transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the position below the granularity detector for detection; then the detection result is transmitted to the control unit; then the robot transfers the measuring cup containing the monitored polishing liquid to the detected carrying table;

[0032] Detection of the concentration of the abrasive in the polishing liquid: the third sampling device samples from the circulating pipeline, and the sampled polishing liquid is introduced into the measuring cup on the measuring cup carrying table; then the robot transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the position below the turbidity detector for detection; then the detection result is transmitted to the control unit; then the robot transfers the measuring cup containing the monitored polishing liquid to the detected carrying table;

[0033] Wherein, after the robot takes away the measuring cup on the measuring cup carrying table, the first rotating table rotates and transfers the measuring cup at the next placement position to the position where the robot grasps the measuring cup; after the robot places the measuring cup on the detected carrying table, the second rotating table rotates and transfers the measuring cup at the next placement position to the position where the robot places the measuring cup;

[0034] S3, according to the detection results of step S2, the following regulation is carried out:

[0035] Regulation of the surface tension: the control unit obtains the addition amount of the surfactant according to the detection result, and sends the addition command to the first feeding device; the first feeding device adds the surfactant into the circulating pipeline according to the addition command;

[0036] Controlling the granularity and shape of the abrasive: the control unit matches the abrasive type and the adding amount according to the detection result, and sends the matching result to the second feeding device in the form of a control command; the second feeding device adds the matched abrasive into the circulating pipeline according to the control command;

[0037] Controlling the concentration of the abrasive: the control unit obtains the adding amount of the polishing liquid according to the detection result, and sends the adding command to the third feeding device; the third feeding device adds the polishing liquid into the circulating pipeline according to the adding command;

[0038] In the controlling of the concentration of the abrasive, the polishing liquid added has a higher abrasive concentration than the polishing liquid concentration used for polishing.

[0039] The above surfactant adding amount m = (C1-C2)*V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device, C1 is the effective concentration corresponding to the typical value of the surface tension, and C2 is the effective concentration corresponding to the detected surface tension value.

[0040] According to the detected abrasive particle size value, if the roundness > 0.95, add the abrasive with roundness ≤ 0.8, and if the roundness > 0.9, add the abrasive with roundness ≤ 0.85. The abrasive is cerium oxide.

[0041] The above abrasive adding amount m = (C3-C4)*V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device, C3 is the abrasive concentration corresponding to the typical value of the turbidity, and C4 is the abrasive concentration corresponding to the detected turbidity value.

[0042] The present application has the following advantages: the present application proposes an online polishing liquid control system for the problem that the changes of the physical and chemical properties of the polishing liquid affect the polishing effect and efficiency during the polishing process, which integrates the monitoring and dynamic adjustment of the physical and chemical properties of the polishing liquid, and timely supplements the appropriate particle size, roundness and concentration of the polishing liquid, so that the overall particle size and roundness of the polishing liquid are maintained at a fixed level. The whole process relies on computer control, has high intelligence, greatly saves the labor cost, and improves the polishing efficiency and quality. BRIEF DESCRIPTION OF DRAWINGS

[0043] In order to make the content of the present application more easily understood, the present application will be further described in detail below according to specific embodiments and in combination with the drawings, in which

[0044] Figure 1 Fig. 1 is a structural schematic diagram of the online polishing liquid control system for high-precision glass polishing process in the present application;

[0045] Figure 2 Fig. 4 is a structural schematic diagram of the automatic sampling mechanism in the present application;

[0046] Figure 3 Fig. 6 is a structural schematic diagram of the cup bearing table in the present application;

[0047] Figure 4 This is a flowchart of the process of the present invention;

[0048] Figure 5 This is a graph showing the surface tension versus concentration in this invention.

[0049] Figure 6 This is a turbidity and concentration curve in this invention. Detailed Implementation

[0050] See Figures 1 to 3 The present invention discloses an online control system for polishing slurry in the high-precision glass polishing process, comprising a surface tension control module 1, an abrasive particle size and shape control module 2, an abrasive concentration control module 3, and a polishing slurry circulation device 4, which are communicatively connected to a control unit; the polishing slurry circulation device 4 includes a circulation pipe and a circulation pump 41 for the polishing slurry to flow within the circulation pipe; the circulation pipe sequentially passes through the surface tension control module 1, the abrasive particle size and shape control module 2, the abrasive concentration control module 3, and the polishing station 5;

[0051] The surface tension control module 1 includes a first liquid extraction device 11 for quantitatively extracting polishing liquid from the circulation pipe, a surface tension detector 12 for detecting the surface tension of the polishing liquid (the surface tension detector 12 can be a fully automatic tension measuring instrument, model MEZL-503C), and a first feeding device 13 for replenishing surfactant into the circulation pipe.

[0052] The abrasive particle size and shape control module 2 includes a second liquid extraction device 21 for quantitatively extracting polishing liquid from the circulation pipeline, a particle size and shape detector 22 for detecting the particle size and shape of the abrasive in the polishing liquid (the particle size and shape detector 22 can be a fully automatic particle size and shape analyzer, model Morphologi-4), and a second feeding device 23 for replenishing the circulation pipeline with abrasive of the corresponding cutting edge angle.

[0053] The abrasive concentration control module 3 includes a third liquid extraction device 31 for quantitatively extracting polishing liquid from the circulation pipe, a turbidity detector 32 for detecting the abrasive concentration in the polishing liquid (the turbidity detector 32 can be a WGZ-1C automatic turbidity water quality analyzer), and a third feeding device 33 for replenishing polishing liquid into the circulation pipe.

[0054] Automatic sampling mechanisms 6 are respectively provided between the first liquid sampling device 11 and the surface tension detector 12, between the second liquid sampling device 21 and the particle size and shape detector 22, and between the third liquid sampling device 31 and the turbidity detector 32 for carrying the extracted polishing liquid and transferring the polishing liquid to the detection position; the automatic sampling mechanism 6 is communicatively connected to the control unit.

[0055] The automatic sampling mechanism 6 comprises a measuring cup carrying table 62, a detected carrying table 63 and a mechanical hand 64 arranged on a rack 61; the measuring cup carrying table 62 comprises a first rotating table 622 rotatably arranged on the rack 61 and capable of rotating under the drive of a first motor 621; the detected carrying table 63 comprises a second rotating table rotatably arranged on the rack 61 and capable of rotating under the drive of a second motor; a plurality of placing positions 623 for placing measuring cups are uniformly distributed along the rotating axes of the first rotating table 622 and the second rotating table; one of the placing positions 623 on the first rotating table 622 corresponds to the liquid outlet of the first liquid taking device 11, the second liquid taking device 21 or the third liquid taking device 31;

[0056] The mechanical hand 64 is used for grabbing the measuring cup on the measuring cup carrying table 62 to the surface tension detector 12, the granularity and shape detector 22 or the turbidity detector 32, and is used for transferring the measuring cup at the surface tension detector 12, the granularity and shape detector 22 or the turbidity detector 32 to the detected carrying table 63.

[0057] The first motor 621, the second motor and the mechanical hand 64 are electrically connected with the control unit.

[0058] The placing positions 623 on the first rotating table 622 and the second rotating table are provided with measuring cup carrying assemblies; the measuring cup carrying assembly comprises a carrying table 625 slidingly arranged on the first rotating table 622 or the second rotating table and capable of performing lifting movement under the drive of an electric push rod 624; a measuring cup positioning fence 626 is fixedly arranged around the carrying table 625 on the first rotating table 622 or the second rotating table; the upper limit position of the carrying table 625 is beyond the upper end of the measuring cup positioning fence 626; the electric push rod 624 is electrically connected with the control unit.

[0059] The first liquid taking device 11, the second liquid taking device 21 and the third liquid taking device 31 are all adjustable constant-quantity liquid adding devices, and a LBX-HandyStep adjustable constant-quantity liquid adding device can be used; the liquid inlet pipe of the adjustable constant-quantity liquid adding device is in communication with the circulating pipeline, and an electromagnetic valve electrically connected with the control unit is arranged on the liquid inlet pipe.

[0060] The second feeding device 23 is a plurality of storage tanks for respectively storing different kinds of abrasives in the polishing liquid; the discharge outlets of the storage tanks are respectively connected with the inlet ports of a plurality of powder metering pumps, the discharge outlets of the powder metering pumps are connected with the inlet ports of the polishing liquid storage tank in communication; the powder metering pumps are electrically connected with the control unit.

[0061] See Figure 4 The control method using the high-precision glass polishing process polishing liquid online control system in the application comprises the following steps:

[0062] S1, preparation: set the detection period of the surface tension of the polishing liquid, the detection period of the granularity and shape of the abrasive in the polishing liquid, and the detection period of the concentration of the abrasive in the polishing liquid on the control unit;

[0063] S2, according to the detection periods set in step S1, the following detections are respectively performed:

[0064] Detection of the surface tension of the polishing liquid: the first sampling device 11 samples from the circulating pipeline, and the removed polishing liquid is introduced into the measuring cup on the measuring cup carrying table 62; then the mechanical hand 64 transfers the measuring cup on the measuring cup carrying table 62 to the surface tension detector 12 for detection; then the detection result is transmitted to the control unit; then the mechanical hand 64 transfers the measuring cup containing the monitored polishing liquid to the detected carrying table 63;

[0065] Detection of the granularity and shape of the abrasive in the polishing liquid: the second sampling device 21 samples from the circulating pipeline, and the removed polishing liquid is introduced into the measuring cup on the measuring cup carrying table 62; then the mechanical hand 64 transfers the measuring cup on the measuring cup carrying table 62 to the granularity and shape detector 22 for detection; then the detection result is transmitted to the control unit; then the mechanical hand 64 transfers the measuring cup containing the monitored polishing liquid to the detected carrying table 63;

[0066] Detection of the concentration of the abrasive in the polishing liquid: the third sampling device 31 samples from the circulating pipeline, and the removed polishing liquid is introduced into the measuring cup on the measuring cup carrying table 62; then the mechanical hand 64 transfers the measuring cup on the measuring cup carrying table 62 to the turbidity detector 32 for detection; then the detection result is transmitted to the control unit; then the mechanical hand 64 transfers the measuring cup containing the monitored polishing liquid to the detected carrying table 63;

[0067] Wherein, after the mechanical hand 64 removes the measuring cup on the measuring cup carrying table 62, the first rotating table 622 rotates and transfers the measuring cup on the next placing position 623 to the position where the mechanical hand 64 grasps the measuring cup; after the mechanical hand 64 places the measuring cup on the detected carrying table 63, the second rotating table rotates and transfers the measuring cup on the next placing position 623 to the position where the mechanical hand 64 places the measuring cup;

[0068] S3, according to the detection results of step S2, the following control is performed:

[0069] Control of the surface tension: the control unit obtains the addition amount of the surfactant according to the detection result, and transmits the addition command to the first feeding device 13; the first feeding device 13 adds the surfactant into the circulating pipeline according to the addition command;

[0070] Controlling the granularity and shape of the abrasive: the control unit matches the abrasive type and the adding amount according to the detection result, and sends the matching result to the second feeding device 23 in the form of a control command; the second feeding device 23 adds the matched abrasive into the circulating pipeline according to the control command;

[0071] Controlling the concentration of the abrasive: the control unit obtains the adding amount of the polishing liquid according to the detection result, and sends the adding command to the third feeding device 33; the third feeding device 33 adds the polishing liquid into the circulating pipeline according to the adding command;

[0072] The polishing liquid added in the process of controlling the concentration of the abrasive has a higher abrasive concentration than the polishing liquid concentration used for polishing.

[0073] The above surfactant adding amount m = (C1-C2)*V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device 4, C1 is the effective concentration corresponding to the typical value of the surface tension, and C2 is the effective concentration corresponding to the detected surface tension value.

[0074] According to the detected abrasive granularity value, if the roundness > 0.95, add the abrasive with a roundness ≤ 0.8, and if the roundness > 0.9, add the abrasive with a roundness ≤ 0.85. The abrasive is cerium oxide.

[0075] The above abrasive adding amount m = (C3-C4)*V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device 4, C3 is the abrasive concentration corresponding to the typical value of the turbidity, and C4 is the abrasive concentration corresponding to the detected turbidity value.

[0076] The technical process of the control unit for the detection result is illustrated as follows:

[0077] Controlling the surface tension: first take 100ml of the polishing liquid, the system automatically reads the surface tension value 38, and after 2 hours, the surface tension becomes 40 when the detection is performed again. According to the surface tension and concentration curve (see Fig. 5), the surfactant adding amount m = (0.0063-0.005)*200 = 0.26kg is automatically added;

[0078] Controlling the granularity and shape of the abrasive: sample every 2 hours, test the roundness value change of the abrasive in the polishing liquid by the image method; according to the feedback abrasive granularity value 0.93, because 0.95 > 0.93 > 0.9, according to the judgment standard roundness > 0.95, add cerium oxide with a roundness ≤ 0.8; if the roundness > 0.9, add cerium oxide with a roundness ≤ 0.85;

[0079] Controlling the concentration of the abrasive: sample every 2 hours to test the turbidity of the polishing liquid; according to the feedback abrasive turbidity value 4, compare the turbidity & concentration curve (see Fig. 6), and the system automatically adds the polishing liquid with a turbidity ≤ 0.8. Figure 6), the abrasive concentration C4 in the existing polishing liquid is calculated, and the abrasive addition amount m = (0.04-0.02)*200 = 4 g.

[0080] The above-described specific embodiments further illustrate the purposes, technical solutions and beneficial effects of the present application. It should be understood that the above-described specific embodiments are merely examples of the present application and are not intended to limit the present application. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A high-precision glass polishing process polishing liquid online regulation system, characterized in that: The polishing system comprises a surface tension control module, a polishing material granularity and shape control module, a polishing material concentration control module and a polishing liquid circulating device, which are in communication connection with the control unit; the polishing liquid circulating device comprises a circulating pipeline and a circulating pump for the flow of the polishing liquid in the circulating pipeline; the circulating pipeline sequentially passes through the surface tension control module, the polishing material granularity and shape control module, the polishing material concentration control module and the polishing station; The surface tension control module comprises a first liquid taking device for taking out the polishing liquid in the circulating pipeline, a surface tension detector for detecting the surface tension of the polishing liquid, and a first feeding device for supplementing the surfactant into the circulating pipeline; The polishing material granularity and shape control module comprises a second liquid taking device for taking out the polishing liquid in the circulating pipeline, a granularity and shape detector for detecting the granularity and shape of the polishing material, and a second feeding device for supplementing the polishing material with the matched corresponding cutting angle into the circulating pipeline; The polishing material concentration control module comprises a third liquid taking device for taking out the polishing liquid in the circulating pipeline, a turbidity detector for detecting the concentration of the polishing material, and a third feeding device for supplementing the polishing liquid into the circulating pipeline; According to the detection results, the following control is performed: Surface tension control: the control unit obtains the addition amount of the surfactant according to the detection results, and transmits the addition command to the first feeding device; the first feeding device adds the surfactant into the circulating pipeline according to the addition command; Polishing material granularity and shape control: the control unit matches the polishing material type and addition amount corresponding to the cutting angle according to the detection results, and transmits the matching result to the second feeding device in the form of a control command; The second feeding device adds the matched corresponding polishing material into the circulating pipeline according to the control command; Polishing material concentration control: the control unit obtains the addition amount of the polishing liquid according to the detection results, and transmits the addition command to the third feeding device; the third feeding device adds the polishing liquid into the circulating pipeline according to the addition command; The polishing liquid added in the polishing material concentration control has a higher polishing material concentration than the polishing liquid concentration used for polishing; The above surfactant addition amount m=(C1-C2)×V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device, C1 is the effective concentration corresponding to the typical value of the surface tension, and C2 is the effective concentration corresponding to the detected surface tension value; According to the detected polishing material granularity value, if the roundness is >0.95, the polishing material with a roundness of ≤0.8 is added, and if the roundness is >0.9, the polishing material with a roundness of ≤0.85 is added; the polishing material is cerium oxide; The above polishing material addition amount m=(C3-C4)×V; wherein V is the volume of the polishing liquid in the polishing liquid circulating device, C3 is the polishing material concentration corresponding to the typical value of the turbidity, and C4 is the polishing material concentration corresponding to the detected turbidity value.

2. The online conditioning system for high-precision glass polishing process according to claim 1, wherein: Between the first liquid taking device and the surface tension detector, between the second liquid taking device and the granularity and shape detector, and between the third liquid taking device and the turbidity detector, there are respectively provided automatic sampling mechanisms for carrying the taken polishing liquid and transferring the polishing liquid to the detection position; the automatic sampling mechanisms are in communication connection with the control unit.

3. The online conditioning system for high-precision glass polishing process according to claim 2, wherein: The automatic sampling mechanism comprises a measuring cup carrying table, a detected carrying table and a mechanical hand arranged on the rack; the measuring cup carrying table comprises a first rotating table rotatably arranged on the rack and capable of rotating under the drive of a first motor; the detected carrying table comprises a second rotating table rotatably arranged on the rack and capable of rotating under the drive of a second motor; a plurality of placing positions for placing measuring cups are uniformly distributed along the rotating axes of the first rotating table and the second rotating table; one of the placing positions on the first rotating table corresponds to the liquid outlet of the first liquid taking device, the second liquid taking device or the third liquid taking device; The mechanical hand is used for grabbing the measuring cup on the measuring cup carrying table to the surface tension detector, the particle size and shape detector or the turbidity detector, and is used for transferring the measuring cup at the surface tension detector, the particle size and shape detector or the turbidity detector to the detected carrying table; The first motor, the second motor and the mechanical hand are electrically connected with the control unit.

4. The online conditioning system for high-precision glass polishing process according to claim 3, wherein: The placing positions on the first rotating table and the second rotating table are provided with measuring cup carrying assemblies; the measuring cup carrying assembly comprises a carrying table slidably arranged on the first rotating table or the second rotating table and capable of ascending and descending under the drive of an electric push rod; a measuring cup positioning fence is fixedly arranged around the carrying table on the first rotating table and the second rotating table; the upper limit position of the carrying table exceeds the upper end of the measuring cup positioning fence; the electric push rod is electrically connected with the control unit.

5. The online conditioning system for high precision glass polishing process according to claim 1, wherein: The first liquid taking device, the second liquid taking device and the third liquid taking device are all adjustable constant-quantity liquid adding devices; the liquid inlet pipe of the adjustable constant-quantity liquid adding device is in communication with the circulating pipeline, and an electromagnetic valve electrically connected with the control unit is arranged on the liquid inlet pipe.

6. The online conditioning system for high precision glass polishing process according to claim 1, wherein: The second feeding device comprises a plurality of storage tanks for respectively storing different kinds of abrasives in the polishing liquid; the discharge outlets of the storage tanks are respectively connected with the feeding inlets of a plurality of powder metering pumps; the discharge outlets of the powder metering pumps are connected with the feeding inlets of the polishing liquid storage tank in communication; the powder metering pumps are electrically connected with the control unit.

7. A method of regulating the process of polishing using the high-precision glass polishing process polishing fluid online regulation system according to claim 1, characterized in that The method comprises the following steps: S1, preparation: setting the detection period of the surface tension of the polishing liquid, the detection period of the particle size and shape of the abrasives in the polishing liquid and the detection period of the concentration of the abrasives in the polishing liquid on the control unit; S2, performing the following detections according to the detection periods set in step S1: The detection of the surface tension of the polishing liquid: taking sample from the circulating pipeline by the first liquid taking device; then placing the sampled polishing liquid under the surface tension detector for detection; then transmitting the detection result to the control unit; The detection of the particle size and shape of the abrasives in the polishing liquid: taking sample from the circulating pipeline by the second sampling device; then placing the sampled polishing liquid under the particle size and shape detector for detection; then transmitting the detection result to the control unit; The detection of the concentration of the abrasives in the polishing liquid: taking sample from the circulating pipeline by the third sampling device; then placing the sampled polishing liquid under the turbidity detector for detection; then transmitting the detection result to the control unit; S3, performing the following regulation according to the detection result of step S2: The regulation of the surface tension: the control unit obtains the adding amount of the surfactant according to the detection result, and transmits the adding command to the first feeding device; the first feeding device adds the surfactant into the circulating pipeline according to the adding command. The control unit matches the abrasive type and the adding amount according to the detection result, and sends the matching result to the second feeding device as a control command; The second feeding device adds the matched abrasive into the circulating pipeline according to the control command; The control unit obtains the adding amount of the polishing liquid according to the detection result, and sends the adding command to the third feeding device; the third feeding device adds the polishing liquid into the circulating pipeline according to the adding command; The polishing liquid added in the control of the abrasive concentration has a higher abrasive concentration than the polishing liquid concentration used for polishing.

8. A method for regulating the process of polishing using the high-precision glass polishing process polishing fluid online regulation system according to claim 3, characterized in that The method comprises the following steps: S1, preparation: setting the detection period of the surface tension of the polishing liquid, the detection period of the particle size and shape of the abrasive in the polishing liquid, and the detection period of the abrasive concentration of the polishing liquid on the control unit; S2, performing the following detections according to the detection periods set in step S1: The surface tension of the polishing liquid is detected by taking the sample from the circulating pipeline through the first sampling device, and guiding the taken polishing liquid into the measuring cup on the measuring cup carrying table; then the mechanical hand transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the surface tension detector for detection; then the detection result is transmitted to the control unit; then the mechanical hand transfers the measuring cup containing the detected polishing liquid to the detected carrying table; The particle size and shape of the abrasive in the polishing liquid are detected by taking the sample from the circulating pipeline through the second sampling device, and guiding the taken polishing liquid into the measuring cup on the measuring cup carrying table; then the mechanical hand transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the particle size and shape detector for detection; then the detection result is transmitted to the control unit; then the mechanical hand transfers the measuring cup containing the detected polishing liquid to the detected carrying table; The abrasive concentration of the polishing liquid is detected by taking the sample from the circulating pipeline through the third sampling device, and guiding the taken polishing liquid into the measuring cup on the measuring cup carrying table; then the mechanical hand transfers the measuring cup carrying table with the measuring cup containing the polishing liquid to the turbidity detector for detection; then the detection result is transmitted to the control unit; then the mechanical hand transfers the measuring cup containing the detected polishing liquid to the detected carrying table; When the mechanical hand takes away the measuring cup on the measuring cup carrying table, the first rotating table rotates and transfers the measuring cup in the next placement position to the position where the mechanical hand grasps the measuring cup; when the mechanical hand places the measuring cup on the detected carrying table, the second rotating table rotates and transfers the measuring cup in the next placement position to the position where the mechanical hand places the measuring cup; S3, according to the detection result of step S2, the following control is performed: The control unit obtains the adding amount of the surfactant according to the detection result, and sends the adding command to the first feeding device; the first feeding device adds the surfactant into the circulating pipeline according to the adding command; The control unit matches the abrasive type and the adding amount according to the detection result, and sends the matching result to the second feeding device as a control command; the second feeding device adds the matched abrasive into the circulating pipeline according to the control command; Controlling of abrasive concentration: the control unit obtains the adding amount of polishing liquid according to the detection result, and sends the adding command to the third feeding device; the third feeding device adds the polishing liquid into the circulating pipeline according to the adding command; In the controlling of abrasive concentration, the abrasive concentration of the added polishing liquid is higher than the polishing liquid concentration used for polishing.

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