Pattern optical anti-counterfeiting structure, its manufacturing method, and coin or medal

Abstract

The present invention provides a pattern optical anti-counterfeiting structure, a manufacturing method thereof and a coin or medal. For a coin or medal, the pattern optical anti-counterfeiting structure comprises: a relief pattern provided on the coin or medal; the relief pattern includes a planar relief pattern, a three-dimensional relief pattern or a combination of a planar relief pattern and a three-dimensional relief pattern; the outline of the relief pattern includes text and / or graphic elements, and a grating microstructure with preset graphic or character elements is filled within the outline of the relief pattern; wherein, the grating microstructure enables the relief pattern to present a three-dimensional relief pattern with different colors when viewed from different viewing angles. The pattern optical anti-counterfeiting structure provided by the present invention can not only enhance the three-dimensional effect of the relief and produce a richer optical visual effect, but also combine the planar relief and the three-dimensional relief to present a unique visual effect.

Description

Technical Field

[0001] The present invention relates to the field of highly secure or high - value - added printed matter. Specifically, it relates to a pattern optical anti - counterfeiting structure, a manufacturing method thereof, and coins and badges. Background Art

[0002] Currently, in order to prevent forgery by means such as scanning and photocopying, diffraction light - variable images (such as holograms, dynamic diffraction patterns, etc.) optical anti - counterfeiting elements are widely used in various highly secure or high - value - added printed matter such as banknotes, ID cards, and product packaging, and very good results have been achieved. For example, large - denomination euro banknotes use diffraction light - variable image hot - stamping marks, small - denomination banknotes use diffraction light - variable image hot - stamping wide strips, Chinese yuan banknotes except for the 1 - yuan note use diffraction light - variable image windowed security threads, Chinese UnionPay credit cards use diffraction light - variable image hot - stamping marks, and important documents such as Chinese ID cards, driver's licenses, and passports also use diffraction light - variable image anti - counterfeiting technology. So far, most banknotes, credit cards, passports and other security cards in the world use diffraction light - variable image anti - counterfeiting technology.

[0003] With the increasing popularity of diffraction light - variable image technology, this technology has also been widely applied in general commodities and packaging. For example, the packaging of cigarettes, wines, medicines, etc., and even the labels of textiles and toys use this technology. However, due to technical limitations, diffraction light - variable image anti - counterfeiting technology has not been able to be maturely applied to coins and badges yet.

[0004] Therefore, how to propose a new pattern optical anti - counterfeiting structure that can be applied to coins and badges has become an urgent problem to be solved at present. Summary of the Invention

[0005] The present invention aims to provide a pattern optical anti - counterfeiting structure to solve the problems existing in the prior art or related technologies.

[0006] Therefore, the first object of the present invention is to provide a pattern optical anti - counterfeiting structure.

[0007] The second object of the present invention is to provide a manufacturing method of the pattern optical anti - counterfeiting structure for manufacturing the above - mentioned pattern optical anti - counterfeiting structure.

[0008] The third object of the present invention is to provide a coin or badge including the above - mentioned pattern optical anti - counterfeiting structure or manufactured by using the manufacturing method of the above - mentioned pattern optical anti - counterfeiting structure.

[0009] To achieve the above object, the technical solution of the present invention provides a pattern optical anti-counterfeiting structure for coins and medals. The pattern optical anti-counterfeiting structure includes: a relief pattern provided on the coin or medal; the relief pattern includes a planar relief pattern or a three-dimensional relief pattern or a combination of a planar relief pattern and a three-dimensional relief pattern; the outline of the relief pattern includes characters and / or graphic elements, and the outline of the relief pattern is filled with a grating microstructure with preset graphic elements; wherein, the grating microstructure enables the relief pattern to present a three-dimensional relief pattern with different colors when viewed from different viewing angles.

[0010] According to the pattern optical anti-counterfeiting structure provided by the present invention, which is used on coins and medals, the pattern optical anti-counterfeiting structure includes a relief pattern composed of characters and graphic elements. The relief pattern includes a planar relief pattern or a three-dimensional relief pattern or a combination of a planar relief pattern and a three-dimensional relief pattern. That is to say, the pattern optical anti-counterfeiting structure can be a single planar relief pattern, or a single three-dimensional relief pattern, or a relief pattern formed by combining a planar relief pattern and a three-dimensional relief pattern. Therefore, the anti-counterfeiting structure of this application has multiple forms for anti-counterfeiting. The outline of the relief pattern is composed of characters and / or graphic elements, and a grating microstructure with preset graphic elements is filled within the outline of the relief pattern, that is, the grating microstructure itself also presents a preset graphic and shape. By filling the grating microstructure, on the one hand, the pattern optical anti-counterfeiting structure can present a three-dimensional relief pattern with different colors when viewed from different viewing angles. Compared with the existing pattern optical anti-counterfeiting structure with a single effect, a shallow relief depth with an optical anti-counterfeiting effect, and a general three-dimensional relief effect, this application can not only enhance the three-dimensional effect of the relief, produce a richer optical visual effect, but also combine planar relief and three-dimensional relief for anti-counterfeiting, presenting a unique visual effect. This combined relief is extremely difficult to forge, so it increases the difficulty of replication and forgery, making the anti-counterfeiting effect better, realizing that the anti-counterfeiting technology is difficult to replicate, and meeting the anti-counterfeiting requirements of high-security products. Therefore, it has made outstanding progress in the field of anti-counterfeiting.

[0011] In the above technical solution, the height of the grating microstructure is less than the height of the outline of the relief pattern.

[0012] In this technical solution, the height of the grating microstructure is less than the height of the outline of the relief pattern. Therefore, it can make the three-dimensional effect of the relief pattern better and present a more beautiful effect.

[0013] In the above technical solution, the planar relief pattern is provided on the coin or medal or on the three-dimensional relief pattern, and the three-dimensional relief pattern is provided on the coin or medal.

[0014] In this technical solution, the planar relief pattern can be set on the coin or medal, or on the three-dimensional relief pattern, and the three-dimensional relief pattern is set on the coin or medal. With this setting, the planar relief pattern can be set on the three-dimensional relief pattern, thus forming a relief pattern combining the planar relief pattern and the three-dimensional relief pattern. This kind of relief pattern is extremely difficult to forge, so it is convenient to enhance the anti-counterfeiting ability.

[0015] In the above technical solution, magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: characters, graphic elements, planar relief patterns, three-dimensional relief patterns, grating microstructures.

[0016] In this technical solution, magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: characters, graphic elements, planar relief patterns, three-dimensional relief patterns, grating microstructures. With this setting, anti-counterfeiting judgment can be made by magnifying the relief pattern and checking the content presented by the magnification. For example, it can be determined whether the graphics and texts presented by the grating microstructure match the preset graphics and shapes for anti-counterfeiting judgment.

[0017] Among them, when observing the pattern optical anti-counterfeiting structure by a certain magnification, it can be seen that these microtexts or elements are composed of smaller grating microstructures.

[0018] In the above technical solution, the height of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm.

[0019] In this technical solution, the height of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns is greater than or equal to 0.01 mm and less than or equal to 0.4 mm. With this setting, by limiting the height of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns to be greater than or equal to 0.01 mm and less than or equal to 0.4 mm, the visual effect presented by the relief pattern can be better.

[0020] In the above technical solution, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.

[0021] In this technical solution, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm. With this setting, by limiting the grating period of the grating microstructure and the grating groove depth of the grating microstructure within a certain range, the effect achieved by the pattern optical anti-counterfeiting structure can be guaranteed.

[0022] In any of the above technical solutions, the preset graphic elements include at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, and three-dimensional relief patterns.

[0023] In this technical solution, the preset graphic elements include at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, and three-dimensional relief patterns. That is to say, it is possible to fill text, graphic elements, planar relief patterns, and three-dimensional relief patterns within the outline of the relief pattern, thereby forming a more complex relief pattern, and further increasing the difficulty of imitating the relief pattern.

[0024] In any of the above technical solutions, the three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns.

[0025] In these technical solutions, the three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns.

[0026] In any of the above technical solutions, the graphic optical anti-counterfeiting structure is embossed or engraved on the coin or medal; and / or the pattern optical anti-counterfeiting structure is arranged in an array.

[0027] In these technical solutions, the graphic optical anti-counterfeiting structure is embossed or engraved on the coin or medal; and / or the pattern optical anti-counterfeiting structure is arranged in an array, further increasing the difficulty of imitation and improving the anti-counterfeiting effect.

[0028] In any of the above technical solutions, when the pattern optical anti-counterfeiting structure is viewed from different viewing angles, the patterns presented by the relief pattern are the same or different.

[0029] In these technical solutions, when the pattern optical anti-counterfeiting structure is viewed from different viewing angles, the patterns presented by the relief pattern are the same or different, further increasing the anti-counterfeiting difficulty.

[0030] The technical solution of the second aspect of the present invention provides a method for manufacturing a pattern optical anti-counterfeiting structure, which is used to manufacture the pattern optical anti-counterfeiting structure in the technical solution of the first aspect. The manufacturing method includes: obtaining image data of at least one characteristic area on the surface of the coin or medal; respectively calculating the image data of each characteristic area, identifying the characteristics of each characteristic area, and bending or deflecting the curves in the grating array matching with the identified results to highlight a specific contour to form a planar relief pattern; arranging the text and / or graphic elements along the bent or deflected curves to form a text planar relief pattern or an element planar relief pattern; engraving the text planar relief pattern or the element planar relief pattern on the coin or medal mold by laser with specific parameters; engraving the grating microstructure by laser with specific parameters in registration and filling it within the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin or medal mold; transferring or engraving the coin or medal at a predetermined temperature with a hard mold having a planar relief pattern with grating microstructure characteristics and / or a preset three-dimensional relief pattern to form a pattern optical anti-counterfeiting structure.

[0031] According to the method for manufacturing a pattern optical anti-counterfeiting structure provided by the present invention, it includes: obtaining image data of at least one characteristic area on the surface of the coin or medal; respectively calculating the image data of each characteristic area, identifying the characteristics of each characteristic area, and bending or deflecting the curves in the grating array matching with the identified results to highlight a specific contour to form a planar relief pattern; arranging the text and / or graphic elements along the bent or deflected curves to form a text planar relief pattern or an element planar relief pattern; engraving the text planar relief pattern or the element planar relief pattern on the coin or medal mold by laser with specific parameters; engraving the grating microstructure by laser with specific parameters in registration and filling it within the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin or medal mold; transferring or engraving the coin or medal at a predetermined temperature with a hard mold having a planar relief pattern with grating microstructure characteristics and / or a preset three-dimensional relief pattern to form a pattern optical anti-counterfeiting structure. The present application forms a relief pattern through step-by-step manufacturing, making the manufacturing of the relief pattern more complex, thereby greatly increasing the difficulty of counterfeiting. Since it is used to manufacture the pattern optical anti-counterfeiting structure in the technical solution of the first aspect. Therefore, the method for manufacturing a pattern optical anti-counterfeiting structure provided by the present invention has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the technical solution of the first aspect, which will not be elaborated here.

[0032] The technical solution of the third aspect of the present invention provides a coin or medal, which includes the pattern optical anti-counterfeiting structure in the technical solution of the first aspect above, or the pattern optical anti-counterfeiting structure is made by using the method for manufacturing a pattern optical anti-counterfeiting structure provided by the technical solution of the second aspect.

[0033] According to the coin or medal provided by the present invention, since it includes the pattern optical anti-counterfeiting structure provided by the technical solution of the first aspect, or the pattern optical anti-counterfeiting structure is made by using the manufacturing method of the pattern optical anti-counterfeiting structure provided by the technical solution of the second aspect. Therefore, the coin or medal provided by the present invention has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the technical solution of the first aspect, or has all the beneficial effects of the manufacturing method of the pattern optical anti-counterfeiting structure provided by the technical solution of the second aspect, which will not be elaborated here.

[0034] In the above technical solution, the coin or medal includes one of a coin, a badge, a commemorative coin, and a game coin.

[0035] In any of the above technical solutions, the pattern optical anti-counterfeiting structure is provided on one or both sides of the coin or medal.

[0036] The additional aspects and advantages of the present invention will become apparent in the following description section or be learned through the practice of the present invention. Brief Description of the Drawings

[0037] The above and / or additional aspects and advantages of the present invention will become apparent and be readily understood from the description of the embodiments in conjunction with the following drawings, where:

[0038] Figure 1 is a schematic structural diagram of a coin or medal with a pattern optical anti-counterfeiting structure provided by an embodiment of the present invention;

[0039] Figure 2 is a schematic diagram of a pattern optical anti-counterfeiting structure provided by an embodiment of the present invention;

[0040] Figure 3 is a flowchart of a manufacturing method of a pattern optical anti-counterfeiting structure provided by an embodiment of the present invention.

[0041] Wherein, Figure 1 and Figure 2 the corresponding relationship between the reference numerals and the component names in

[0042] is: 1 coin or medal, 2 embossed pattern. Detailed Description of the Embodiments

[0043] In order to more clearly understand the above objects, features, and advantages of the present invention, the present invention will be further described in detail below in conjunction with the drawings and specific embodiments. It should be noted that, without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other.

[0044] Many specific details are set forth in the following description in order to fully understand the present invention. However, the present invention can also be implemented in other ways different from those described herein. Therefore, the protection scope of the present invention is not limited by the specific embodiments disclosed below.

[0045] The following will refer to Figure 1 and Figure 2 to describe the pattern optical anti-counterfeiting structure provided according to an embodiment of the present invention.

[0046] As Figure 1 and Figure 2 shown, an embodiment of the present invention provides a pattern optical anti-counterfeiting structure for a coin or medal 1. The pattern optical anti-counterfeiting structure includes: a relief pattern 2 provided on the coin or medal 1; the relief pattern 2 includes a planar relief pattern or a three-dimensional relief pattern or a combination of a planar relief pattern and a three-dimensional relief pattern; the outline of the relief pattern 2 includes characters and / or graphic elements, and a grating microstructure with preset graphic elements is filled inside the outline of the relief pattern 2; wherein, the grating microstructure enables the relief pattern 2 to present a three-dimensional relief pattern 2 with different colors when viewed from different viewing angles.

[0047] According to the pattern optical anti-counterfeiting structure provided by the present invention, for the coin or medal 1, its pattern optical anti-counterfeiting structure includes a relief pattern 2 composed of characters and graphic elements. The relief pattern 2 includes a planar relief pattern or a three-dimensional relief pattern or a combination of a planar relief pattern and a three-dimensional relief pattern. That is to say, the pattern optical anti-counterfeiting structure can be a single planar relief pattern, or a single three-dimensional relief pattern, or a relief pattern 2 formed by combining a planar relief pattern and a three-dimensional relief pattern. Therefore, the anti-counterfeiting structure of this application has various forms for anti-counterfeiting. The outline of the relief pattern 2 is composed of characters and / or graphic elements, and a grating microstructure with preset graphic elements is filled inside the outline of the relief pattern 2, that is, the grating microstructure itself also has a preset graphic and shape. By filling the grating microstructure, on the one hand, the pattern optical anti-counterfeiting structure can present a three-dimensional relief pattern 2 with different colors when viewed from different viewing angles. Compared with the existing pattern optical anti-counterfeiting structure with a single effect, a shallow relief depth with optical anti-counterfeiting effect, and a general three-dimensional relief effect, this application can not only enhance the three-dimensional effect of the relief, produce a richer optical visual effect, but also combine planar relief and three-dimensional relief for anti-counterfeiting. This combined relief is extremely difficult to forge, so the difficulty of copying and forging is increased, making the anti-counterfeiting effect better, realizing that the anti-counterfeiting technology is difficult to copy, and meeting the anti-counterfeiting requirements of high-security products. Therefore, it has made outstanding progress in the field of anti-counterfeiting.

[0048] In the above embodiment, the height of the grating microstructure is less than the height of the outline of the relief pattern 2.

[0049] In this embodiment, the height of the grating microstructure is less than the height of the outline of the relief pattern 2. Therefore, it can make the three-dimensional effect of the relief pattern 2 better and present a more beautiful effect.

[0050] In the above embodiments, the planar relief pattern is provided on the coin or medal 1 or on the three-dimensional relief pattern, and the three-dimensional relief pattern is provided on the coin or medal 1.

[0051] In this embodiment, the planar relief pattern can be provided on the coin or medal 1 or on the three-dimensional relief pattern, and the three-dimensional relief pattern is provided on the coin or medal 1. With this kind of arrangement, the planar relief pattern can be provided on the three-dimensional relief pattern, thereby forming the relief pattern 2 combining the planar relief pattern and the three-dimensional relief pattern. This kind of relief pattern 2 is extremely difficult to forge. Therefore, it is convenient to enhance the anti-counterfeiting ability.

[0052] In the above embodiments, magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: characters, graphic elements, planar relief patterns, three-dimensional relief patterns, grating microstructures.

[0053] In this embodiment, magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: characters, graphic elements, planar relief patterns, three-dimensional relief patterns, grating microstructures. With this kind of arrangement, the relief pattern 2 can be magnified, and anti-counterfeiting judgment can be made based on the content presented by the magnification. For example, it can be determined whether the graphics and texts presented by the grating microstructure match the preset graphics and shapes for anti-counterfeiting judgment.

[0054] Among them, when observing by magnifying the pattern optical anti-counterfeiting structure, when magnified 5 to 50 times, the microscopic structure composition can be characters or graphic elements. And by further magnifying these characters or graphic elements with a microscope to 200 to 1000 times, it can be seen that these micro-characters or elements are composed of smaller grating microstructures.

[0055] In the above embodiments, the heights of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns are greater than or equal to 0.01 mm and less than or equal to 0.4 mm.

[0056] In this embodiment, the heights of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns are greater than or equal to 0.01 mm and less than or equal to 0.4 mm. With this kind of arrangement, by limiting the heights of the characters, graphic elements, planar relief patterns, and three-dimensional relief patterns to be greater than or equal to 0.01 mm and less than or equal to 0.4 mm, the visual effect presented by the relief pattern 2 can be better.

[0057] In the above embodiments, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.

[0058] In this embodiment, the grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or the grating trench depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm. With such a setting, by limiting the grating period of the grating microstructure and the grating trench depth of the grating microstructure within a certain range, the effect achieved by the pattern optical anti-counterfeiting structure can be ensured.

[0059] In any of the above embodiments, the preset graphic elements include at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns.

[0060] In this embodiment, the preset graphic elements include at least one of the following or a combination thereof: text, graphic elements, planar relief patterns, three-dimensional relief patterns. That is to say, text, graphic elements, planar relief patterns, and three-dimensional relief patterns can be filled within the outline of the relief pattern 2, so as to form a more complex relief pattern 2, thereby increasing the difficulty of counterfeiting the relief pattern 2.

[0061] In any of the above embodiments, the three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns.

[0062] In these embodiments, the three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns.

[0063] In any of the above embodiments, the graphic optical anti-counterfeiting structure is embossed or engraved on the coin or medal 1; and / or the pattern optical anti-counterfeiting structure is arranged in an array.

[0064] In these embodiments, the graphic optical anti-counterfeiting structure is embossed or engraved on the coin or medal 1; and / or the pattern optical anti-counterfeiting structure is arranged in an array, further increasing the difficulty of counterfeiting and improving the anti-counterfeiting effect.

[0065] In any of the above embodiments, when the pattern optical anti-counterfeiting structure is viewed from different viewing angles, the patterns presented by the relief pattern 2 are the same or different.

[0066] In these embodiments, when the pattern optical anti-counterfeiting structure is viewed from different viewing angles, the patterns presented by the relief pattern 2 are the same or different, further increasing the difficulty of anti-counterfeiting.

[0067] As Figure 3 shown, an embodiment of the second aspect of the present invention provides a method for manufacturing a pattern optical anti-counterfeiting structure for manufacturing the pattern optical anti-counterfeiting structure in the embodiment of the first aspect. The manufacturing method includes:

[0068] S102, obtaining image data of at least one characteristic area on the surface of the coin or medal.

[0069] S104. Calculate the image data of each feature area respectively, identify the characteristics of each feature area, and according to the recognition results, bend or deflect the curves in the grating array that match them to highlight specific contours to form a planar relief pattern.

[0070] S106. Arrange the text and / or graphic elements along the bent or deflected curves to form a text planar relief pattern or an element planar relief pattern.

[0071] S108. Laser engrave the text planar relief pattern or the element planar relief pattern on the coin or medal die with specific parameters.

[0072] S110. Laser engrave and fill the grating microstructure in alignment within the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin or medal die with specific parameters.

[0073] S112. Transfer or engrave the coin or medal at a predetermined temperature with a hard die having a planar relief pattern with grating microstructure features and / or a preset three-dimensional relief pattern to form a pattern optical anti-counterfeiting structure.

[0074] According to the method for manufacturing the pattern optical anti-counterfeiting structure provided by the present invention, it includes: obtaining the image data of at least one feature area on the surface of the coin or medal; calculating the grayscale of each pixel of the image data of each feature area respectively, identifying the characteristics of each feature area, and according to the recognition results, bending or deflecting the curves in the grating array that match them to highlight specific contours to form a planar relief pattern; arranging the text and / or graphic elements along the bent or deflected curves to form a text planar relief pattern or an element planar relief pattern; laser engraving the text planar relief pattern or the element planar relief pattern on the coin or medal die with specific parameters; laser engraving and filling the grating microstructure in alignment within the contour of the planar relief pattern or the preset three-dimensional relief pattern on the coin or medal die with specific parameters; transferring or engraving the coin or medal at a predetermined temperature with a hard die having a planar relief pattern with grating microstructure features and / or a preset three-dimensional relief pattern to form a pattern optical anti-counterfeiting structure. This application forms a relief pattern through a step-by-step manufacturing process, making the manufacturing of the relief pattern more complex, thereby greatly increasing the difficulty of counterfeiting. Since it is used to manufacture the pattern optical anti-counterfeiting structure in the first aspect of the embodiment. Therefore, the method for manufacturing the pattern optical anti-counterfeiting structure provided by the present invention has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect of the embodiment, which will not be elaborated here.

[0075] An embodiment of the third aspect of the present invention provides a coin or medal 1, including the pattern optical anti-counterfeiting structure of the first aspect of the above embodiment, or the pattern optical anti-counterfeiting structure is made by using the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect of the embodiment.

[0076] According to the coin or medal 1 provided by the present invention, since it includes the pattern optical anti-counterfeiting structure provided by the first aspect embodiment, or the pattern optical anti-counterfeiting structure is made by using the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect embodiment. Therefore, the coin or medal provided by the present invention has all the beneficial effects of the pattern optical anti-counterfeiting structure provided by the first aspect embodiment, or has all the beneficial effects of the manufacturing method of the pattern optical anti-counterfeiting structure provided by the second aspect embodiment, which will not be elaborated here.

[0077] In the above embodiment, the coin or medal 1 includes one of a coin, a badge, a commemorative coin, and a game coin.

[0078] In any of the above embodiments, the pattern optical anti-counterfeiting structure is provided on one or both sides of the coin or medal 1.

[0079] In the description of this specification, terms such as "connection", "installation", "fixation", etc. should all be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0080] In the description of this specification, the descriptions of terms such as "one embodiment", "some embodiments", "specific embodiments", etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or instance. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or examples.

[0081] The above are only the preferred embodiments of the present invention and are not used to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A manufacturing method of a pattern optical anti-counterfeiting structure, characterized in that, The described pattern optical anti-counterfeiting structure is used for coins and badges. The pattern optical anti-counterfeiting structure includes: a relief pattern provided on the coin or badge; the relief pattern includes a combination of a planar relief pattern and a three-dimensional relief pattern; the outline of the relief pattern includes characters and / or graphic elements, and the outline of the relief pattern is filled with a grating microstructure with preset graphic elements; the planar relief pattern is provided on the three-dimensional relief pattern, and the three-dimensional relief pattern is provided on the coin or badge. The manufacturing method includes: Obtaining image data of at least one characteristic area on the surface of the coin or badge; Calculating the image data of each characteristic area respectively, identifying the characteristics of each characteristic area, and bending or deflecting the curves in the grating array matching the identified results to form a planar relief pattern with prominent outlines; Arranging the characters and / or graphic elements along the bent or deflected curves to form a character planar relief pattern or a graphic element planar relief pattern; Laser engraving the character planar relief pattern or the graphic element planar relief pattern on the coin or badge mold; Laser registration filling and engraving the grating microstructure within the outline of the planar relief pattern or the three-dimensional relief pattern on the coin or badge mold; Transferring or engraving the coin or badge at a predetermined temperature using a hard mold with the planar relief pattern and the three-dimensional relief pattern having the grating microstructure characteristics to form the pattern optical anti-counterfeiting structure.

2. The manufacturing method of the pattern optical anti-counterfeiting structure according to claim 1, characterized in that, The height of the grating microstructure is less than the height of the outline of the relief pattern.

3. The manufacturing method of the pattern optical anti-counterfeiting structure according to claim 1, characterized in that, Magnifying the pattern optical anti-counterfeiting structure can present at least one of the following or a combination thereof: the characters, the graphic elements, the planar relief pattern, the three-dimensional relief pattern, the grating microstructure.

4. The manufacturing method of the pattern optical anti-counterfeiting structure according to claim 1, characterized in that, The height of the characters, the graphic elements, the planar relief pattern, and the three-dimensional relief pattern is greater than or equal to 0.01 mm and less than or equal to 0.4 mm; and / or The grating period of the grating microstructure is greater than or equal to 0.01 mm and less than or equal to 0.3 mm; and / or The grating groove depth of the grating microstructure is greater than or equal to 50 nm and less than or equal to 350 nm.

5. The manufacturing method of the pattern optical anti-counterfeiting structure according to claim 1 or 2, characterized in that The preset graphic elements include at least one of the following or a combination thereof: characters, graphic elements, planar relief patterns, three-dimensional relief patterns; and / or The three-dimensional relief pattern includes continuous or discontinuous patterns, and the planar relief pattern includes discontinuous patterns; and / or The graphic optical anti-counterfeiting structure is embossed or engraved on the coin or badge; and / or The pattern optical anti-counterfeiting structure is arranged in an array.

6. A coin or badge, characterized in that The coin or badge includes a pattern optical anti-counterfeiting structure, The pattern optical anti-counterfeiting structure is made by using the manufacturing method of the pattern optical anti-counterfeiting structure according to any one of claims 1 to 5.

7. The coin or badge according to claim 6, characterized in that The coin or badge includes one of a coin, a badge, a commemorative coin, and a game coin.

8. The coin or badge according to claim 6 or 7, characterized in that One side or both sides of the coin or badge are provided with the pattern optical anti-counterfeiting structure.

Images