On-chip integrated ar display element system and method based on inverse design wavelength division multiplexing

Abstract

The application discloses a kind of on-chip integrated AR display element systems based on reverse design wavelength demultiplexing, including dielectric substrate layer, optical waveguide layer, element grating structure and nano brick structure;Optical waveguide layer is set on dielectric substrate layer;Element grating structure, it is laid on optical waveguide layer, it is structured optimization using reverse design, so that the light beam of two different wavelengths of vertical incidence element grating structure, along opposite direction into optical waveguide layer;Nano brick structure is arranged on optical waveguide layer, and on the two sides of element grating structure, it is the on-chip metasurface nano brick array arranged according to detour phase principle, so that the guided wave that propagates in opposite direction in optical waveguide layer is decoupled into free space and forms arbitrary optical field when passing through nano brick structure, respectively realizes the holographic display of target image.

Description

Technical Field

[0001] This invention relates to the fields of micro-nano optics, integrated photonics, optical waveguide technology, and augmented reality display technology, and in particular to an on-chip integrated AR display element system based on reverse-designed wavelength demultiplexing. Background Technology

[0002] As one of the most important display technologies, Augmented Reality (AR) enhances human interaction with the real world through virtual information, and has enormous development potential in transportation, education, healthcare, and entertainment. Optical waveguide technology is the most promising method for realizing AR display devices, providing an on-chip platform for integrating optical components to build multifunctional, high-performance, and compact optical systems. However, current coupling / decoupling optical components between free-space light and guided waves are typically bulky (such as prisms and gratings in traditional couplers / decouplers), severely limiting the freedom of arbitrary optical manipulation and resulting in very limited functionality.

[0003] Recently, metasurfaces integrated onto optical waveguides, as a new generation of miniature optical devices, have emerged, enabling the manipulation of guided waves and facilitating arbitrary conversions between free-space light and on-chip guided waves. On-chip metasurfaces inherit the coded degrees of freedom of traditional metasurfaces, allowing for the design of light amplitude, phase, and polarization states at subwavelength scales, thus creating a variety of practical functions, including beam control, optical routers, lenses, and holographic displays. However, realizing fully integrated on-chip systems and creating arbitrary engineered optical functions remains unexplored and challenging. For example, most previous work focused only on individual coupler / decoupler components, lacking complete optical integration for arbitrary coded conversions between on-chip and free-space light, as well as the synergistic cooperation between each element. Currently, the functionality of coupling / decoupling elements remains too simplistic to allow for customized manipulation of incident light. Summary of the Invention

[0004] The main objective of this invention is to provide a complete optical integration that can be used for arbitrary encoding conversion between on-chip and free space light, thereby realizing multi-channel integrated AR display.

[0005] The technical solution adopted in this invention is:

[0006] An on-chip integrated AR display element system based on reverse design wavelength demultiplexing is provided, including a dielectric substrate layer, an optical waveguide layer, an element grating structure, and a nanobrick structure;

[0007] The optical waveguide layer is disposed on the dielectric substrate layer;

[0008] The meta-grating structure is arranged on the optical waveguide layer. It adopts a reverse design for structural optimization, so that two beams of different wavelengths that are perpendicularly incident on the meta-grating structure enter the optical waveguide layer in opposite directions.

[0009] The nano-brick structure is arranged on the optical waveguide layer, and on both sides of the meta-grating structure, an on-chip metasurface nano-brick array arranged according to the detour phase principle is formed, so that the guided waves propagating in opposite directions in the optical waveguide layer are decoupled into free space through the nano-brick structure to form an arbitrary optical field, and the holographic display of the target image is realized.

[0010] According to the above technical solution, the optimization target of the reverse design is the coupling efficiency of the free space light of two different wavelengths into the optical waveguide layer in opposite directions and the separation ratio.

[0011] According to the above technical solution, the reverse design specifically adopts binary coding, decomposes the meta-grating structure of the region to be designed into a binary sequence with a length of 200, and 1 and 0 respectively represent whether the corresponding region is filled with silicon or blank; the finite difference time domain method is used for electromagnetic simulation of the meta-grating to calculate the fitness function of the coupling efficiency and the separation ratio; individuals are selected according to the fitness function, and genetic operators are used for combination crossover and mutation to generate a new population; the process is repeated until the termination condition is met, and the best individual and the optimal solution are output to obtain the final meta-grating structure.

[0012] According to the above technical solution, the arrangement of the nano-brick structure is specifically calculated according to the Gerchberg-Saxton algorithm to obtain the phase distribution matrix required to realize the holographic display of the target image, and then the position information of the nano-brick is obtained according to the relationship between the phase given by the detour phase and the relative displacement of the nano-brick to obtain the position arrangement of the nano-brick in each unit structure.

[0013] According to the above technical solution, the dielectric substrate layer is a silicon dioxide layer; and the optical waveguide layer is Si3N4 deposited on the dielectric substrate layer by using plasma enhanced chemical vapor deposition technology.

[0014] According to the above technical solution, the meta-grating structure is a one-dimensional grating structure, forming two opposite light channels; two different wavelengths of light beams perpendicularly incident on the meta-grating structure enter the optical waveguide layer in opposite directions.

[0015] Or the meta-grating structure is a two-dimensional grating, each forming two opposite light channels in each dimension.

[0016] According to the above technical solution, the length and width of the nano-brick in the nano-brick structure are equal and are both subwavelength scales, and the sizes are completely consistent.

[0017] According to the above technical solution, an xoy coordinate system is established with the direction parallel to the two edges of the working surface of the optical waveguide layer as the x-axis and the y-axis, and the long axis and the short axis of the meta-grating and the nano-brick are parallel to the working surface of the optical waveguide layer.

[0018] The application also provides an AR holographic display method based on a wavelength demultiplexing dual-color channel designed reversely, characterized by the on-chip integrated AR display element system based on the wavelength demultiplexing designed reversely.

[0019] The application also provides an application of the on-chip integrated AR display element system based on the wavelength demultiplexing designed reversely, characterized by integrating the on-chip integrated AR display element system based on the wavelength demultiplexing designed reversely into an AR display device as a lens to realize the AR display of multiple wavelength channels and project virtual holographic image information into a real environment.

[0020] The application has the beneficial effects that the wavelength demultiplexing element grating is integrated above a waveguide as an incident coupler, and an on-chip metasurface is used as an output decoupler, so that the customized coupling conversion between free space light and guided waves can be realized, and wavelength-selective coded light information is used for operation, so that the holographic display of multiple channels can be realized. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0022] Figure 1 is a structure and function schematic diagram of a wavelength demultiplexing element grating designed reversely provided by the embodiments of the present application, wherein 1 is an element grating structure, 2 is a light waveguide layer, and 3 is a dielectric substrate layer;

[0023] Figure 2 is a reverse design algorithm flow and an optimized final structure diagram of the wavelength demultiplexing element grating, wherein the grating height h1 is 380 nm, the waveguide thickness h2 is 220 nm, and the design area length D is 20 microns;

[0024] Figure 3 is a wideband coupling efficiency diagram of the wavelength demultiplexing element grating simulated in the embodiments of the present application. The efficiency of coupling into the left waveguide at the design wavelength 550 nm is 12.4%, and the efficiency of coupling into the right waveguide at 650 nm is 7.1%. The separation ratios at the two working wavelengths are about 40 and 100, respectively.

[0025] Figure 4is the electric field distribution diagram of the free space light vertical incidence element grating with the wavelength of 550nm and 650nm simulated in the embodiment of the present application;

[0026] Figure 5 is a unit structure schematic diagram of the on-chip metasurface provided in the embodiment of the present application, wherein, 4-nanometer brick structure, 2-optical waveguide layer, 3-dielectric substrate layer, L=W=90nm, H=h1=380nm;

[0027] Figure 6 is a waveguide manipulation schematic diagram of the on-chip metasurface based on the detour phase arrangement in the embodiment of the present application, wherein, the unit structure period is Lambda=340nm;

[0028] Figure 7 is a process schematic diagram and a simulation hologram of the on-chip metasurface based on the detour phase to realize holography in the embodiment of the present application;

[0029] Figure 8 is an on-chip metasurface holographic and AR holographic projection display diagram realized by the proposed full-chip integrated optical element system in the embodiment of the present application, wherein, the holographic images of green 'apple' and red 'cherry' correspond to the wavelengths of 540nm and 610nm vertical incidence element grating respectively;

[0030] In the figure, the thickness of the silicon nitride waveguide is 220nm, and the thickness of the silicon dioxide substrate is 500mu m; lambda G and lambda R are two working wavelengths, H is the height of the nanobrick, Lambda is the period of the unit structure in the x direction, and s is the distance of the nanobrick moving in the x direction in the unit structure;

[0031] Figure 9 is a structure schematic diagram of the on-chip integrated AR display element system based on the reverse design wavelength demultiplexing in the embodiment of the present application. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application is further described in detail below in combination with the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, and are not used to limit the present application.

[0033] The present application integrates a wavelength demultiplexing element grating incident coupler and an on-chip metasurface output decoupler above the waveguide, realizes customized coupling conversion between free space light and guided waves, and operates by using wavelength-selective coded light information.

[0034] The on-chip integrated AR display element system based on the reverse design wavelength demultiplexing in the embodiment of the present application, as shown in Figure 9 , includes a dielectric substrate layer, an optical waveguide layer, an element grating structure and a nanobrick structure.

[0035] The optical waveguide layer is arranged on the dielectric substrate layer;

[0036] The meta-grating structure is arranged on the optical waveguide layer, and is optimized by reverse design, so that two light beams of different wavelengths vertically incident on the meta-grating structure enter the optical waveguide layer in opposite directions;

[0037] The nano-brick structure is arranged on the optical waveguide layer and on both sides of the meta-grating structure, and is an on-chip metasurface nano-brick array arranged according to the detour phase principle, so that the guided waves propagating in opposite directions in the optical waveguide layer are decoupled into free space through the nano-brick structure to form an arbitrary light field, and the holographic display of the target image is realized.

[0038] The optimization target of the reverse design is the coupling efficiency and the separation ratio of the free-space light of two different wavelengths into the optical waveguide layer in opposite directions.

[0039] In an embodiment of the present application, the reverse design process of the wavelength demultiplexing meta-grating is as follows:

[0040] The wavelength demultiplexing meta-grating is designed by reverse design, and specifically, a genetic algorithm is used for structure optimization to achieve the desired function. The structural parameters of the meta-grating, such as thickness, waveguide thickness and design region length, are initially defined. The incident light is defined as a vertically incident Gaussian beam containing two specific wavelengths, and the polarization is perpendicular to the grating. The optimization target of the reverse design is the coupling efficiency and the separation ratio of the free-space light of the two different wavelengths into the waveguide in opposite directions. The implementation steps of the genetic algorithm for optimizing the meta-grating are as follows: binary coding is used to divide the design region into a binary sequence with a length of 200, and 1 and 0 represent whether the corresponding region is filled with silicon or blank; finite difference time domain method is used for electromagnetic simulation of the meta-grating to calculate the coupling efficiency and the separation ratio as two fitness functions; individuals are selected according to the fitness functions, and genetic operators are used for combination, crossover and mutation to generate a new population; the above process is repeated until the termination condition is met, and the best individual and the optimal solution are output to obtain the final meta-grating structure.

[0041] The detour phase control principle of the on-chip metasurface nano-brick is as follows:

[0042] The guided wave propagating in the waveguide will be extracted by the silicon nano-brick structure and decoupled into free space to form an arbitrary light field, and the phase distribution can be designed by the phase accumulation of the guided wave propagation. For the guided wave with a propagation constant of β propagating along the x direction, the extracted phase is determined by the initial phase of the incident light and the propagation distance. The period of the nano structure is set as Λ = 2π / β = λ0 / n eff , where λ0 is the wavelength of the free-space light, n effis the effective refractive index of the waveguide. When the nanobricks are distributed in a period Λ, a phase modulation of 0~2π can be achieved. Through the above derivation, the detour phase of the nanobrick extraction light can be expressed as:

[0043]

[0044] where s n and Δφ n are the displacement of the nth nanobrick in the x direction within a period and the corresponding extraction phase in the x direction, respectively. Therefore, by strategically distributing the meta-atoms along the waveguide, precise control of the detour phase profile can extract and shape the guided wave into any wavefront in free space to achieve various optical functions.

[0045] The arrangement of the nanobrick structure is specifically calculated according to the Gerchberg-Saxton algorithm to obtain the phase distribution matrix required to achieve the target image hologram. Then, the position information of the nanobrick is obtained according to the relationship between the phase given by the detour phase and the relative displacement of the nanobrick, and the position arrangement of the nanobrick in each unit structure is obtained. The specific method can also refer to the patents previously applied by the applicant (such as patents CN202111429402.X and CN202210337142.1), which specifically describe how to obtain the phase distribution matrix and the position arrangement of the nanobrick.

[0046] The embodiment of the application utilizes the all-chip-integrated optical meta-system to realize the method for wavelength demultiplexing dual-color channel AR holographic display, which is based on the above-mentioned embodiment of the chip-integrated AR display meta-system based on reverse design wavelength demultiplexing, takes the meta-grating structure as the wavelength multiplexing input coupler, and takes the nanobrick structure as the decoupler to realize the holographic display of two channels. The method for AR holographic display includes the following steps:

[0047] (1) Selecting the working wavelengths of the wavelength demultiplexing gratings as λ G and λ R , optimizing the meta-grating structure through the reverse design algorithm, and coupling the free-space light with wavelengths of λ G and λ R into the waveguide to form guided waves with opposite propagation directions;

[0048] (2) Selecting two binary images as the holographic images of the green light and red light wavelength channels, and encoding the metasurfaces according to the spatial positions corresponding to the propagation directions of the guided waves of different wavelengths;

[0049] (3) Using the GS algorithm to obtain the phase matrix distribution of the target far-field holographic image, so as to obtain the position information of the silicon nanobrick corresponding to the two metasurfaces in the unit structure along the x direction according to the detour phase principle and equation (1), and the nanobrick is located at the center position of the unit structure in the y direction;

[0050] (4) The wavelength demultiplexing metagrating is designed by the inverse design algorithm, and the wavelength demultiplexing metagrating is integrated on the waveguide to realize the on-chip dual-wavelength channel hologram. G , λ R of the free-space polarization light is vertically incident on the metagrating, forming the corresponding wavelength guided waves propagating in opposite directions in the waveguide. The guided waves pass through the metasurface array above the waveguide, and the on-chip dual-wavelength channel hologram can be obtained.

[0051] (5) The virtual image information floating in the real environment can be directly photographed by using the camera of the mobile phone, that is, the realization of AR holographic display.

[0052] The nanostructure in the unit structure responding to the guided waves of green and red wavelengths is composed of silicon nano bricks, the length and width of the nano bricks are equal and are both subwavelength scales, and the sizes are completely consistent.

[0053] As a preferred embodiment, the wavelength demultiplexing metagrating designed by the inverse design algorithm and the on-chip metasurface are integrated on the waveguide. The metagrating structure of this embodiment is a one-dimensional grating structure, forming two opposite light channels. The light beams of two different wavelengths of the vertically incident metagrating structure enter the optical waveguide layer in opposite directions. Figure 1 is a schematic diagram of the wavelength demultiplexing metagrating structure. The grating is located above the Si3N4 (thickness of 220 nm) waveguide (the waveguide can also be selected from other materials, such as lithium niobate waveguide, which has a larger refractive index than silicon dioxide.) The refractive index of the waveguide is about 2.05, and the thickness of the silicon dioxide layer as the substrate is about 500 μm. Figure 2 is a flowchart for realizing the wavelength demultiplexing function of the metagrating by the inverse design algorithm. The structure of the metagrating is coded by a binary sequence with a length of 200, indicating whether the corresponding area is filled with silicon (1) or blank (0). The goal of the inverse design algorithm is to optimize the efficiency and separation ratio of the two wavelengths coupled into the waveguide in opposite directions. The fitness function is calculated by using the electromagnetic simulation software FDTD Solutions, and the final structure meeting the conditions is obtained through iterative optimization by the genetic algorithm. The structure of the metagrating used has a height of h1 = 380 nm, a waveguide thickness of h2 = 220 nm, and a design area length of D = 20 μm.

[0054] Figure 3 is the broadband coupling efficiency diagram obtained by simulating the wavelength demultiplexing metagrating structure described above in the visible light band. The performance of the metagrating meets the expectation. The coupling efficiency into the left waveguide at the design wavelength of 550 nm is 12.4%, and the coupling efficiency into the right waveguide at 650 nm is 7.1%. The separation ratios at the two working wavelengths are about 40 and 100, respectively. In addition, the cross-sectional electric field distribution of the two working wavelengths vertically incident on the above metagrating structure further illustrates the function of wavelength demultiplexing. The 550 nm incident light in the free space is coupled into the left waveguide, while the 650 nm light is coupled into the right waveguide (as shown in the electric field distribution of Figure 4 ).

[0055] To realize the extraction of the above-mentioned waveguide formed by coupling into the waveguide and the reconstruction of the holographic image in free space, a supercell is arranged on both sides of the wavelength demultiplexing grating. The position of the meandering phase arrangement nanobrick array can be used to realize the phase modulation in the range of 2π, so as to shape the extracted guided wave into an arbitrary wave front, and then cooperate with the wavelength demultiplexing grating to realize the on-chip double-wavelength channel holography. Figure 5 It is a unit structure diagram, and the unit structure of the amorphous silicon nanobrick constituting the supercell is located on the same waveguide and substrate as the grating structure. The height of the silicon nanobrick is the same as the grating height, H = h1 = 380 nm, and the structural length and width size of the nanobrick are L = W = 90 nm. The supercell is encoded with meandering phase to meet the wide band operation requirement. Figure 6 It shows the principle of supercell on-chip manipulation of guided wave based on meandering phase, and the phase extracted by the supercell is determined by the relative displacement s of the nanobrick in the unit structure within one period (Λ = 340 nm). By strategically arranging the silicon nanobrick array of the supercell on-chip, the guided wave can be extracted into an arbitrary wave front in free space.

[0056] Figure 7 The process of realizing on-chip holography based on supercell with meandering phase is shown. First, the phase matrix required by the target image is calculated by using the GS algorithm, then the position information of the corresponding nanobrick in each pixel is obtained by combining the meandering phase conversion position information, and finally the holographic image is obtained through simulation and simulation.

[0057] Next, a sample of the on-chip grating system integrated with wavelength demultiplexing grating and supercell on-chip is made. A 220 nm thick Si3N4 waveguide is deposited on a 500 μm thick silicon dioxide layer by plasma enhanced chemical vapor deposition (PECVD) technology, and a 380 nm thick Si layer is deposited on the waveguide; the polymethyl methacrylate (PMMA) is spin-coated on the Si layer and baked, and then developed in a solution by electron beam lithography (EBL); then the pattern is transferred to the Si layer using a chromium layer as a mask, and finally the chromium is removed to obtain the sample.

[0058] The laser emitted by the laser source is vertically incident on the grating after passing through the linear polarizer, and the wavelength demultiplexing function of the grating is characterized by adjusting the wavelength of the light source, and the holographic image is obtained by shooting at the corresponding supercell position.

[0059] Figure 8 The experimental holographic image with good consistency with the target holographic image is shown. Under the illumination of 540 nm and 610 nm light, the images of green "apple" and red "cherry" are captured at output port 1 and output port 2, respectively. Under single wavelength illumination, the holographic images of the two output ports have strong contrast.

[0060] Finally, to verify the practical AR holographic multiplexing function, the virtual information floating in the real world environment is captured by the camera in the mobile phone, such as Figure 8 As shown. We clearly observe the actual view of the green "apple" and red "cherry" floating on the real background image (goggles) with good imaging intensity and clarity. The proposed AR strategy based on the full-chip integrated optical meta-system is compatible with the current PIC technology, which will also show great application potential in wearable devices (glasses lenses or contact lenses) integration and next-generation new screen display technology.

[0061] The meta-grating structure can also be a two-dimensional grating, which forms two opposite light channels in each dimension. Taking the grating with orthogonal structure as an example, two opposite light channels are formed in each direction, and four light channels are formed in two orthogonal directions.

[0062] Due to the good transparent characteristics of the all-dielectric structure and the on-chip optical transmission mechanism, the proposed AR display full-chip integrated optical meta-system based on reverse design wavelength demultiplexing can be integrated into the AR display device as a lens to realize multi-wavelength channel AR display and project virtual holographic image information into the real environment. That is, the virtual image is projected into the real environment, and this technology will show great application potential in wearable devices (glasses lenses or contact lenses) integration and next-generation screen display technology.

[0063] It should be understood that, for those skilled in the art, improvements or changes can be made according to the above description, and all these improvements and changes shall belong to the protection scope of the appended claims of the present application.

Claims

1. An on-chip integrated AR display system based on reverse design wavelength demultiplexing, characterized in that, This includes dielectric substrate layers, optical waveguide layers, elementary grating structures, and nanobrick structures; The optical waveguide layer is disposed on the dielectric substrate layer; The meta-grating structure is arranged on the optical waveguide layer. It adopts a reverse design for structural optimization, so that two beams of different wavelengths that are perpendicularly incident on the meta-grating structure enter the optical waveguide layer in opposite directions. The nanobrick structure is arranged on the optical waveguide layer, and on both sides of the meta-grating structure, it is an on-chip metasurface nanobrick array arranged according to the principle of detour phase. This allows the guided waves propagating in opposite directions in the optical waveguide layer to decouple into free space when passing through the nanobrick structure, forming arbitrary light fields, thereby realizing the holographic display of the target image.

2. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The optimization objective of the reverse design is to optimize the efficiency and separation ratio of two free-space light of different wavelengths coupled into the waveguide layer in opposite directions.

3. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The reverse design specifically employs binary encoding, decomposing the meta-grating structure of the region to be designed into a binary sequence of length 200, where 1 and 0 represent whether the corresponding region is filled with silicon or empty, respectively; electromagnetic simulation of the meta-grating is performed using the finite-difference time-domain method to calculate the fitness function of coupling efficiency and separation ratio; individuals are selected based on the fitness function, and new populations are generated by combining, crossovering, and mutation using genetic operators; This process is repeated, and the best individual and the optimal solution are output after the termination condition is met, thus obtaining the final meta-grating structure.

4. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The arrangement of the nanobrick structures is specifically calculated based on the Gerchberg-Saxton algorithm to obtain the phase distribution matrix required to achieve holography of the target image. Then, the position information of the nanobricks is obtained based on the relationship between the phase given by the detour phase and the relative displacement of the nanobricks, thus obtaining the position arrangement of the nanobricks in each unit structure.

5. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The dielectric substrate is a silicon dioxide layer; the optical waveguide layer is Si3N4 deposited on the dielectric substrate using plasma-enhanced chemical vapor deposition technology.

6. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The meta-grating structure is a one-dimensional grating structure that forms two opposite optical channels. Two beams of different wavelengths are incident perpendicularly on the meta-grating structure and enter the optical waveguide layer in opposite directions. Alternatively, the meta-grating structure can be a two-dimensional grating, forming two opposite light channels in each dimension.

7. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to claim 1, characterized in that, The nanobricks in the nanobrick structure have equal length and width, both of which are subwavelength scale, and are completely uniform in size.

8. The on-chip integrated AR display system based on reverse design wavelength demultiplexing according to any one of claims 1-7, characterized in that, An xoy coordinate system is established with the two sides parallel to the working surface of the optical waveguide layer as the x-axis and y-axis, and the major and minor axes of the meta-grating and nano-brick are parallel to the working surface of the optical waveguide layer.

9. An AR holographic display method based on reverse design wavelength demultiplexing dual color channels, characterized in that, Based on the on-chip integrated AR display element system based on reverse design wavelength demultiplexing as described in claim 1, it uses the element grating structure as the wavelength multiplexing input coupler and the nanobrick structure as the decoupler to realize two-channel holographic display.

10. An application of an on-chip integrated AR display metasystem based on reverse-designed wavelength demultiplexing, characterized in that, The on-chip integrated AR display element system based on reverse design wavelength demultiplexing as described in claim 1 is used as a lens and integrated into the AR display device to realize multi-wavelength channel AR display and project virtual holographic image information into the real environment.

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