A fluid speed regulating device
By using a direct-drive motor to drive the fluid recovery disc and combining it with the design of jet and liquid spray channels, the problem of particulate matter contamination introduced by indirect drive methods is solved, achieving efficient chemical recovery and simplified maintenance processes, and improving the process effect of semiconductor wet processes.
Patent Information
- Application Number
- CN202211712616.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-12-26
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2042-12-26
AI Technical Summary
In existing semiconductor wet process technologies, fluid recovery devices using indirect drive methods are prone to introducing particulate matter contamination, which affects process performance and is inconvenient to maintain.
A direct-drive motor drives the fluid recovery disc, which rotates directly through the fluid recovery disc connecting ring. Combined with jet and liquid spray channels, it achieves direct drive and modular design, avoiding particulate matter pollution caused by indirect drive.
It improves the recovery rate of chemicals, simplifies the maintenance process, reduces particulate matter pollution, and ensures the process effect of semiconductor wet processing.
Smart Images

Figure CN115999823B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor wet process technology, specifically a fluid speed control device. Background Technology
[0002] In the field of semiconductor wet processing, with the updating and development of processes, the demand for the recovery and reuse of chemicals is increasing. Current technologies generally use methods such as motor + gear transmission or compressed air + impeller to drive the fluid recovery disc. These methods are complex, inconvenient to maintain, and strictly speaking, all are indirect drives, involving many components requiring maintenance. Furthermore, some indirect transmission structures, such as gear drives, require the application of lubricating oil or grease; compressed air driving the impeller can experience wear. Therefore, these structures easily introduce particulate matter contamination into the clean environment, affecting the process efficiency of semiconductor wet processing. Summary of the Invention
[0003] To address the above-mentioned problems, the present invention aims to provide a fluid speed regulating device.
[0004] The objective of this invention is achieved through the following technical solution:
[0005] A fluid speed regulating device includes a base, a substrate rotating shaft, a fixing ring, a fluid recovery tray, a fluid recovery tray connecting ring, a substrate rotating shaft drive, and a fluid recovery tray drive.
[0006] The substrate shaft passes through the middle of the base and is connected at its lower end to the substrate shaft drive. The substrate shaft drive is mounted on the lower part of the base. The fixing ring is mounted on the base on the outer periphery of the substrate shaft. The fluid recovery disk drive is mounted on the base on the outer periphery of the fixing ring. The drive end of the fluid recovery disk drive is connected to the fluid recovery disk connecting ring. The fluid recovery disk connecting ring is connected to the fluid recovery disk.
[0007] The axial center lines of the substrate rotating shaft, the fixed ring, the fluid recovery tray, the fluid recovery tray connecting ring, the substrate rotating shaft drive, and the fluid recovery tray drive are all collinear.
[0008] The top of the substrate shaft is a support plate, the middle of the substrate shaft is provided with a vacuum channel, and the top surface of the support plate of the substrate shaft is provided with a vacuum groove that communicates with the vacuum channel.
[0009] The substrate shaft drive is a hollow shaft motor.
[0010] Several air jet channels A are provided on the outer peripheral surface of the support disk portion of the substrate shaft.
[0011] The fluid recovery disc drive uses a direct drive motor.
[0012] The drive end of the fluid recovery disc drive is connected to the fluid recovery disc connecting ring by screws, and the fluid recovery disc connecting ring is connected to the fluid recovery disc by screws.
[0013] The top surface of the substrate shaft is higher than the top surface of the fixing ring, and the top surface of the fixing ring is higher than the top surface of the fluid recovery disc.
[0014] The fixed ring has several spray channels, and the outer circumferential surface of the fixed ring has several jet channels B, with the jet nozzle of each jet channel B located outside the spray nozzle of the spray channel.
[0015] The liquid spraying channel is provided with two channels, and the air jets of the two channels are located on opposite sides of the fixing ring.
[0016] The advantages and positive effects of this invention are as follows:
[0017] Compared with existing technologies, this invention uses a direct-drive motor to drive the fluid recovery disc. The fluid recovery disc can be directly driven to rotate through the fluid recovery disc connecting ring. This not only improves the chemical recovery rate, but also achieves modularization of the drive end, which is convenient for installation and maintenance. It can effectively avoid particulate matter contamination problems caused by indirect drive methods such as gear transmission or compressed air driving impeller, and ensure the process effect of semiconductor wet processing. Attached Figure Description
[0018] Figure 1 This is a schematic diagram of the external structure of the present invention;
[0019] Figure 2 This is a schematic diagram of the internal structure of the present invention;
[0020] Figure 3 for Figure 2 Enlarged view of point A.
[0021] In the figure: 1 is the base, 2 is the substrate shaft, 201 is the jet channel A, 3 is the fixing ring, 301 is the liquid spraying channel, 302 is the jet channel B, 4 is the fluid recovery tray, 5 is the fluid recovery tray connecting ring, 6 is the substrate shaft drive component, and 7 is the fluid recovery tray drive component. Detailed Implementation
[0022] The following is in conjunction with the appendix Figure 1-3 The present invention will be described in further detail below.
[0023] A fluid speed control device, such as Figure 1-3As shown, this embodiment includes a base 1, a substrate rotating shaft 2, a fixing ring 3, a fluid recovery tray 4, a fluid recovery tray connecting ring 5, a substrate rotating shaft driving component 6, and a fluid recovery tray driving component 7.
[0024] The substrate shaft 2 passes through the middle of the base 1 and is connected to the substrate shaft drive 6 at its lower end. The substrate shaft drive 6 is installed at the lower part of the base 1. The fixing ring 3 is installed on the base 1 on the outer periphery of the substrate shaft 2. The fluid recovery disk drive 7 is installed on the base 1 on the outer periphery of the fixing ring 3. The drive end of the fluid recovery disk drive 7 is connected to the fluid recovery disk connecting ring 5. The fluid recovery disk connecting ring 5 is connected to the fluid recovery disk 4.
[0025] Specifically, in this embodiment, the axial center lines of the substrate rotating shaft 2, the fixing ring 3, the fluid recovery tray 4, the fluid recovery tray connecting ring 5, the substrate rotating shaft drive 6, and the fluid recovery tray drive 7 are all collinear, which facilitates installation and ensures stable and accurate operation of the equipment.
[0026] Specifically, in this embodiment, the top of the substrate rotating shaft 2 is a support plate, which provides basic support for the substrate. A vacuum channel is formed in the middle of the substrate rotating shaft 2, and a vacuum groove communicating with the vacuum channel is formed on the top surface of the support plate. In this embodiment, a vacuum source communicating with the vacuum channel is also connected to the lower end of the substrate rotating shaft 2; this connection structure is existing technology. When the substrate is located on the top surface of the support plate of the substrate rotating shaft 2, a vacuum is created by evacuating the vacuum channel, forming a vacuum in the communicating vacuum groove, allowing the substrate to be stably adsorbed onto the top surface of the support plate of the substrate rotating shaft 2. In this embodiment, the substrate rotating shaft drive 6 uses a commercially available hollow shaft motor, controlled by an external host computer; this connection structure is existing technology. Using a hollow shaft motor facilitates communication between the vacuum source and the vacuum channel via a pipeline. In this embodiment, a plurality of jet channels A201 are provided on the outer peripheral surface of the support disk of the substrate shaft 2. Each jet channel A201 is connected to an external air source on the lower side of the base 1 and is used to spray air onto the substrate to dry the back of the substrate and to provide fluid protection for the back of the substrate.
[0027] Specifically, in this embodiment, the fluid recovery tray driver 7 uses a commercially available hollow direct-drive motor, controlled by an external host computer. The drive end of the fluid recovery tray driver 7 is connected to the fluid recovery tray connecting ring 5 by screws, and the fluid recovery tray connecting ring 5 is connected to the fluid recovery tray 4 by screws. The fluid recovery tray driver 7 can directly drive the fluid recovery tray 4 to rotate through the fluid recovery tray connecting ring 5, which is convenient for installation and maintenance and avoids particulate matter pollution problems caused by indirect drive methods such as gear transmission or compressed air driving impeller. The liquid on the substrate on the substrate shaft 2 is thrown onto the fluid recovery tray 4, and the fluid recovery tray driver 7 drives the fluid recovery tray 4 to rotate. The rotation speed of the fluid recovery tray 4 is higher than that of the substrate shaft 2, so that the fluid recovery tray 4 can fully throw out the liquid on it, and the liquid is recovered by the recovery tank device on the outside of the fluid recovery tray 4. By adjusting the rotation speed of the substrate shaft 2 and the fluid recovery tray 4, it can be used with substrates of various sizes. In this embodiment, the top surface of the substrate shaft 2 is higher than the top surface of the fixing ring 3, and the top surface of the fixing ring 3 is higher than the top surface of the fluid recovery tray 4, so that the liquid on the fluid recovery tray 4 can be fully ejected.
[0028] Specifically, in this embodiment, the fixing ring 3 is provided with two spray channels 301, and the air jets of the two spray channels 301 are located on opposite sides of the fixing ring 3. Several air jet channels B 302 are provided on the outer circumferential surface of the fixing ring 3, and the air jets of each air jet channel B 302 are located outside the air jets of the spray channels 301. The spray channels 301 are connected to the liquid supply device on the lower side of the base 1 to spray the required liquid during the process; the connection method adopts existing technology. Each air jet channel B 302 is also connected to an external air source on the lower side of the base 1 to spray air onto the substrate to dry the back of the substrate and to provide fluid protection for the back of the substrate. It can also blow the liquid on the fluid recovery tray 4, allowing the liquid on the fluid recovery tray 4 to leave the fluid recovery tray 4 more quickly, thereby improving the liquid recovery efficiency.
[0029] Working principle:
[0030] The support plate of the substrate shaft 2 provides basic support for the substrate. The substrate shaft drive 6 drives the substrate shaft 2 to rotate. Through the arrangement of each jet channel A 201 and the base, jets can be sprayed onto the substrate to dry the back side and provide fluid protection. Liquid on the substrate on the substrate shaft 2 is thrown onto the fluid recovery tray 4. The fluid recovery tray drive 7 drives the fluid recovery tray 4 to rotate. The rotation speed of the fluid recovery tray 4 is higher than that of the substrate shaft 2, so that the fluid recovery tray 4 can fully throw out the liquid, which is then recovered by the recovery tank device on the outside of the fluid recovery tray 4. The fluid recovery tray drive 7 can directly drive the fluid recovery tray 4 to rotate via the fluid recovery tray connecting ring 5, facilitating installation and maintenance and avoiding particulate matter contamination problems caused by indirect drives such as gear transmission or compressed air-driven impellers. The spray channel 301 is used to spray the required liquid during the process. Each jet channel B... 302 is used to spray air onto the substrate to dry the back of the substrate and to protect the back of the substrate from fluid. It can also blow the liquid on the fluid recovery tray 4, so that the liquid on the fluid recovery tray 4 leaves the fluid recovery tray 4 faster and improve the liquid recovery efficiency.
Claims
1. A fluid speed regulating device, characterized in that: It includes a base (1), a substrate rotating shaft (2), a fixing ring (3), a fluid recovery tray (4), a fluid recovery tray connecting ring (5), a substrate rotating shaft drive (6), and a fluid recovery tray drive (7). The substrate shaft (2) passes through the middle of the base (1) and is connected to the substrate shaft drive (6) at its lower end. The substrate shaft drive (6) is installed on the lower part of the base (1). The fixing ring (3) is installed on the base (1) on the outer periphery of the substrate shaft (2). The fluid recovery disk drive (7) is installed on the base (1) on the outer periphery of the fixing ring (3). The drive end of the fluid recovery disk drive (7) is connected to the fluid recovery disk connecting ring (5). The fluid recovery disk connecting ring (5) is connected to the fluid recovery disk (4). The axial center lines of the substrate rotating shaft (2), the fixed ring (3), the fluid recovery disk (4), the fluid recovery disk connecting ring (5), the substrate rotating shaft drive (6), and the fluid recovery disk drive (7) are all collinear. The top of the substrate rotating shaft (2) is a support plate, the middle of the substrate rotating shaft (2) is provided with a vacuum channel, and the top surface of the support plate of the substrate rotating shaft (2) is provided with a vacuum groove that communicates with the vacuum channel. Several jet channels A (201) are provided on the outer peripheral surface of the support disk of the substrate shaft (2). The top surface of the substrate shaft (2) is higher than the top surface of the fixing ring (3), and the top surface of the fixing ring (3) is higher than the top surface of the fluid recovery disc (4); The fixed ring (3) has several spray channels (301) and several jet channels B (302) are provided on the outer circumferential surface of the fixed ring (3). The jet outlet of each jet channel B (302) is located outside the spray outlet of the spray channel (301).
2. The fluid speed regulating device according to claim 1, characterized in that: The substrate rotating shaft drive (6) adopts a hollow shaft motor.
3. The fluid speed regulating device according to claim 1, characterized in that: The fluid recovery disc drive (7) uses a direct drive motor.
4. A fluid speed regulating device according to claim 3, characterized in that: The driving end of the fluid recovery disc drive (7) is connected to the fluid recovery disc connecting ring (5) by screws, and the fluid recovery disc connecting ring (5) is connected to the fluid recovery disc (4) by screws.
5. A fluid speed regulating device according to claim 1, characterized in that: Two spray channels (301) are provided, and the air nozzles of the two spray channels (301) are located on opposite sides of the fixing ring (3).
Citation Information
Patent Citations
Fluid collection device of rotary etching and cleaning machine
CN106711060A
Splash-proof device and corrosion process reaction equipment
CN109698149A