Substrate rack and coating equipment

Abstract

The present invention discloses a substrate rack and coating equipment, wherein the substrate rack includes a support frame and a sample loading assembly, the sample loading assembly includes a support plate, a flexible layer and a stopper, the flexible layer covers one side surface of the support plate, and the side of the flexible layer away from the support plate forms a sample loading surface; the stopper is connected to the support plate and / or the flexible layer, and the stopper is used to abut against the edge of the substrate to press the substrate against the sample loading surface. Since the flexible layer has a certain elasticity, even if the substrate has corner warping, shape shrinkage, thermal deformation, etc., resulting in the actual size and shape of the substrate may be different from the theoretical size and shape, and / or the components of the sample loading assembly have size, shape and installation errors, the flexible layer can also tightly cover the back side of the substrate that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating into the back side of the substrate to cause a thin film to be deposited on the back side of the pole piece, improving the yield rate and reducing production costs.

Description

Technical Field

[0001] The present invention relates to the field of film coating technology, and in particular to a sample loading component, a reaction device and a film coating equipment. Background Art

[0002] When using chemical vapor deposition to coat a large substrate, on the one hand, the substrate may have corner warping, shape shrinkage, thermal deformation, etc., which may cause the actual size and shape of the substrate to differ from the theoretical size and shape. On the other hand, the components of the sample loading assembly may also have size, shape and installation errors. Therefore, during the process of mounting the substrate on the substrate rack and performing chemical vapor deposition, the process gas can easily penetrate into the back side of the substrate that does not need to be coated, resulting in the deposition of a thin film on the back side of the substrate, causing the substrate to be scrapped or performance to be reduced, with a low yield and high production cost. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a substrate rack, wherein the sample loading component is provided with a flexible layer, and the flexible layer can tightly cover the back side of the substrate that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating into the back side of the substrate and causing a thin film to be deposited on the back side of the pole piece, thereby improving the yield rate and reducing the production cost.

[0004] The present invention also provides a coating device comprising the substrate rack.

[0005] A substrate rack is provided in an embodiment of the first aspect of the present invention, and is used to install a substrate. The substrate rack comprises: a support frame; a sample loading assembly, which is installed on the support frame, and the sample loading assembly comprises a support plate, a flexible layer and a limiting member, wherein the flexible layer covers a surface of one side of the support plate, and a side of the flexible layer away from the support plate forms a sample loading surface; the limiting member is connected to the support plate and / or the flexible layer, and the limiting member is used to abut against the edge of the substrate so that the substrate is pressed against the sample loading surface.

[0006] A substrate rack provided by an embodiment of the first aspect of the present invention has at least the following beneficial effects: a sample loading assembly for mounting a substrate in the substrate rack is provided with a flexible layer, the flexible layer having a sample loading surface, and when in use, a limiting member abuts against the edge of the substrate so that the substrate is pressed against the sample loading surface, and because the flexible layer has a certain elasticity, even if the substrate has corner warping, shape shrinkage, thermal deformation, etc., resulting in the actual size and shape of the substrate being different from the theoretical size and shape, and / or there are size, shape and installation errors in the components of the sample loading assembly, the flexible layer can also tightly cover the back side of the substrate that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating the back side of the substrate and causing a thin film to be deposited on the back side of the electrode, thereby improving the yield and reducing production costs.

[0007] In some embodiments of the present invention, the sample loading assembly also includes a positioning frame, which is connected to a side of the flexible layer away from the support plate, and the positioning frame has a positioning window, and a portion of the flexible layer is exposed from the positioning window. The positioning window is used to accommodate the substrate, and the limiting member is at least partially located inside the positioning window.

[0008] In some embodiments of the present invention, the sample loading assembly also includes a locking piece, which includes a supporting portion and a connecting portion that are connected to each other, the connecting portion passes through the limiting piece and is connected to the support plate and / or the flexible layer, and the supporting portion is used to press the limiting piece against the flexible layer.

[0009] In some embodiments of the present invention, the connecting portion is threadedly connected to the supporting plate and / or the flexible layer, and the connecting portion and the limiting member are capable of relative rotation.

[0010] In some embodiments of the present invention, the support frame includes a support unit and a support seat, the support unit is connected to the support seat, the support unit includes an upper fixing member and a lower fixing member, the upper end of the sample loading assembly is connected to the upper fixing member, and the lower end of the sample loading assembly is connected to the lower fixing member.

[0011] In some embodiments of the present invention, the sample loading assembly is provided in plurality, the support frame comprises a plurality of the support units, the plurality of the support units are distributed in the circumferential direction of the support seat, and each of the sample loading assembly is correspondingly mounted on one of the support units.

[0012] In some embodiments of the present invention, the support frame also includes a plurality of support columns, and the plurality of support units are distributed in the circumferential direction of the support seat, and a support column is arranged between any two adjacent support units, and the two ends of each upper fixing member are respectively connected to the two support columns, and the two ends of each lower fixing member are respectively connected to the two support columns, and each sample loading assembly is connected to the upper fixing member at the upper end, connected to the lower fixing member at the lower end, and connected to the two support columns on both sides.

[0013] In some embodiments of the present invention, the support unit further comprises an embedding piece, one side of which is embedded in the support column, and the other side of which is in contact with the sample loading assembly.

[0014] In some embodiments of the present invention, the supporting unit further comprises a sealing member, and the sealing member is disposed between the upper fixing member and the sample loading assembly and between the lower fixing member and the sample loading assembly.

[0015] A coating device provided in an embodiment of the second aspect of the present invention is used to coat a substrate, and the coating device comprises: a housing; a substrate rack provided in any embodiment of the first aspect of the present invention, the support frame being mounted on the housing, the sample loading assembly being accommodated inside the housing, a process gas chamber being formed between one side of the sample loading assembly for mounting the substrate and an inner wall of the housing, the process gas chamber being used to accommodate process gas, and an inert gas chamber being formed between the other side of the sample loading assembly and the inner wall of the housing, the inert gas chamber being used to accommodate inert gas; a driving device connected to the support frame, the driving device being used to drive the substrate rack to rotate relative to the housing.

[0016] A coating device provided in an embodiment of the second aspect of the present invention has at least the following beneficial effects: using the substrate rack provided in the embodiment of the first aspect of the present invention, wherein the sample loading assembly is provided with a flexible layer, and the substrate is mounted on the sample loading assembly, and the flexible layer can tightly cover the back side of the substrate that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating the back side of the substrate and causing a thin film to be deposited on the back side of the electrode, thereby improving the yield and reducing production costs.

[0017] In some embodiments of the present invention, the inner wall of the shell is provided with a first guide structure, and the support frame is provided with a second guide structure cooperating with the first guide structure, and the first guide structure and the second guide structure are used to guide the rotation of the support frame relative to the shell.

[0018] In some embodiments of the present invention, the first guide structure has an annular groove extending along the rotation trajectory of the support frame, and the second guide structure includes a guide column and a ball, the guide column is connected to the support frame, and the ball is rotatably connected to the guide column and embedded in the annular groove.

[0019] In some embodiments of the present invention, the second guide structure also includes a ball seat and an elastic member, the ball seat is slidably mounted on the guide column, the ball is rotatably connected to the ball seat, the elastic member is mounted on the guide column, one end of the elastic member abuts against the support frame and the other end abuts against the ball seat.

[0020] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:

[0022] Figure 1 A three-dimensional schematic diagram of a substrate frame provided for some embodiments of the first aspect of the present invention;

[0023] Figure 2 for Figure 1 Front view of the sample loading assembly of the substrate rack shown

[0024] Figure 3 for Figure 2 A side view of the sample loading assembly is shown;

[0025] Figure 4 for Figure 2 An exploded schematic diagram of the sample loading assembly is shown;

[0026] Figure 5 A three-dimensional schematic diagram of a coating device provided for some embodiments of the second aspect of the present invention;

[0027] Figure 6 for Figure 4 A cross-sectional view of a coating device in FIG.

[0028] Figure 7 for Figure 6 The enlarged view of point A in the middle;

[0029] Figure 8 Cross-sectional views of coating equipment provided for other embodiments of the second aspect of the present invention.

[0030] Reference numerals:

[0031] Substrate rack 10, sample loading assembly 100, support plate 110, flexible layer 120, sample loading surface 121, stopper 130, positioning frame 140, positioning window 141, locking member 150, abutment portion 151, connecting portion 152, handle 160, housing 200, upper wall plate 210, process gas inlet 221, first side wall plate 220, second side wall plate 230, lower wall plate 240, process gas chamber 250, inert gas Cavity 260, first guide structure 270, annular groove 271, support unit 310, upper fixing member 311, lower fixing member 312, embedding member 313, upper sealing member 314, lower sealing member 315, support seat 320, second guide structure 330, guide column 331, ball 332, ball seat 333, elastic member 334, support column 340, baffle plate 400, heater 500, drive device 20, substrate 30. DETAILED DESCRIPTION

[0032] Embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0033] In the description of the present invention, it is necessary to understand that descriptions involving orientation, such as up, down, left, right, etc., the orientations or positional relationships indicated are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0034] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific content of the technical solution.

[0035] In the description of the present invention, the description with reference to the terms "one embodiment", "some embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0036] Reference Figure 1 The first embodiment of the present invention provides a substrate rack 10 for mounting a substrate 30. The substrate rack 10 includes a sample loading assembly 100 and a support frame. The sample loading assembly 100 is mounted on the support frame. Figures 2 to 4 The sample loading assembly 100 includes a support plate 110, a flexible layer 120 and a limiting member 130. The flexible layer 120 covers a surface of one side of the support plate 110, and a side of the flexible layer 120 away from the support plate 110 forms a sample loading surface 121; the limiting member 130 is connected to the support plate 110 and / or the flexible layer 120, and the limiting member 130 is used to abut against the edge of the substrate 30 so that the substrate 30 is pressed tightly against the sample loading surface 121. When in use, the limit member 130 abuts against the edge of the substrate 30, so that the substrate 30 is pressed tightly against the sample loading surface 121. Since the flexible layer 120 has a certain elasticity, even if the substrate 30 has corner warping, shape shrinkage, thermal deformation, etc., resulting in the actual size and shape of the substrate 30 may be different from the theoretical size and shape, and / or the components of the sample loading assembly 100 have size, shape and installation errors, the flexible layer 120 can also tightly cover the back side of the substrate 30 that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating the back side of the substrate 30 and causing a thin film to be deposited on the back side of the electrode, thereby improving the yield rate and reducing production costs.

[0037] It can be understood that the flexible layer 120 can be set separately from the support plate 110. After stacking, the flexible layer 120 is adsorbed on the support plate 110, or bonded to the support plate 110, or pressed and fixed by a connector; the flexible layer 120 can also be set to be formed on the surface of the support plate 110 by coating; the outer dimensions of the flexible layer 120 must not be less than the outer dimensions of the substrate 30, so that the flexible layer 120 can completely cover the back side of the substrate 30, thereby protecting the back side of the substrate 30 that does not require coating.

[0038] Further, refer to Figures 2 to 4 The sample loading assembly 100 further includes a positioning frame 140, which is connected to the side of the flexible layer 120 away from the support plate 110, and the positioning frame 140 can fix the flexible layer 120; the positioning frame 140 has a positioning window 141, and part of the flexible layer 120 is exposed from the positioning window 141. The positioning window 141 is used to accommodate the substrate 30, and the stopper 130 is at least partially located inside the positioning window 141. When in use, the substrate 30 is first placed inside the positioning window 141, so that the substrate 30 abuts against the part of the flexible layer 120 exposed from the positioning window 141, and the inner wall of the positioning window 141 performs preliminary positioning on the substrate 30, and then the stopper 130 presses the edge of the substrate 30, which can improve the installation accuracy of the substrate 30, reduce the installation difficulty, and reduce the man-hours required for the installation of the substrate 30, thereby improving production efficiency.

[0039] It is understandable that the positioning frame 140 can be configured as a frame body with an integral structure, or can be configured as a combination of a plurality of strip plates enclosed in sequence.

[0040] Further, refer to Figures 2 to 4The sample loading assembly 100 also includes a locking member 150, and the locking member 150 includes a supporting portion 151 and a connecting portion 152 that are interconnected. The connecting portion 152 is passed through the limiting member 130 and is connected to the support plate 110. Specifically, the connecting portion 152 is threadedly connected to the support plate 110, but is not limited to this. The connecting portion 152 can also be threadedly connected to the flexible layer 120, or the connecting portion 152 can be threadedly connected to the support plate 110 and the flexible layer 120 at the same time; the connecting portion 152 and the limiting member 130 can rotate relative to each other, and the supporting portion 151 is used to press the limiting member 130 against the flexible layer 120. When installing the substrate 30, the locking member 150 can be firstly loosened to loosen the limiting member 130, and the limiting member 130 can be rotated so that the limiting member 130 does not hinder the insertion of the substrate 30, and then after the substrate 30 is placed to the required position, the limiting member 130 is rotated so that the limiting member 130 abuts against the edge of the substrate 30, and finally the locking member 150 is tightened so that the abutting portion 151 presses the limiting member 130, and under the action of the friction force between the abutting portion 151 and the limiting member 130, the limiting member 130 can be fixed at the position abutting against the edge of the substrate 30, thereby reliably fixing the substrate 30. The structure of the locking member 150 and the limiting member 130 is relatively reasonable, and the disassembly and assembly are simple, which is conducive to reducing the man-hours required for the installation of the substrate 30 while ensuring the stability of the substrate 30, thereby improving production efficiency.

[0041] It is understandable that, referring to Figure 2 and Figure 4 There are multiple locking members 150 and limiting members 130, and the multiple locking members 150 are connected to the multiple limiting members 130 one by one. The multiple limiting members 130 are distributed in the circumferential direction of the substrate 30, and the substrate 30 can be fixed at multiple positions in the circumferential direction of the substrate 30, which can improve the stability of the fixation of the substrate 30.

[0042] Further, refer to Figures 2 to 4 The sample loading assembly 100 further includes a handle 160 , which is connected to the positioning frame 140 and is used to provide a convenient gripping position for the sample loading assembly 100 , so as to facilitate operators to install the sample loading assembly 100 .

[0043] Further, refer to Figure 1 The support frame includes a support unit 310 and a support seat 320. The support unit 310 is connected to the support seat 320. The support unit 310 includes an upper fixing member 311 and a lower fixing member 312. The upper end of the sample loading assembly 100 is connected to the upper fixing member 311, and the lower end of the sample loading assembly 100 is connected to the lower fixing member 312. The upper fixing member 311 and the lower fixing member 312 of the support unit 310 provide a mounting position for the sample loading assembly 100, so that the support frame can stably fix the sample loading assembly 100.

[0044] Further, refer to Figure 6When in use, the two sides of the sample loading assembly 100 are the process gas chamber 250 and the inert gas chamber 260. In order to reduce the possibility that the process gas enters the inert gas chamber 260 and causes the part of the support frame located in the inert gas chamber 260 to be contaminated, a sealing member can be provided between the sample loading assembly 100 and the upper fixing member 311 and between the sample loading assembly 100 and the lower fixing member 312. Specifically, referring to Figure 6 An upper sealing member 314 may be provided between the upper end of the sample loading assembly 100 and the upper fixing member 311 to improve the sealing performance between the sample loading assembly 100 and the upper fixing member 311, so that the process gas is not easy to penetrate into the inert gas chamber 260 from the gap between the sample loading assembly 100 and the upper fixing member 311; a lower sealing member 315 may be provided between the lower end of the sample loading assembly 100 and the lower fixing member 312 to improve the sealing performance between the sample loading assembly 100 and the lower fixing member 312, so that the process gas is not easy to penetrate into the inert gas chamber 260 from the gap between the sample loading assembly 100 and the lower fixing member 312. The upper sealing member 314 and the lower sealing member 315 may adopt vacuum-resistant elastic gaskets.

[0045] Further, refer to Figure 1 The sample loading assembly 100 is provided with a plurality of support frames including a plurality of support units 310, and the plurality of support units 310 are sequentially arranged in the circumferential direction of the support seat 320, and each sample loading assembly 100 is correspondingly mounted on a support unit 310. The plurality of sample loading assemblies 100 can be mounted with a plurality of substrates 30, so that a plurality of substrates 30 can be coated at the same time, which can improve production efficiency and reduce production costs.

[0046] Further, refer to Figure 1 A support column 340 is installed between two adjacent support units 310, and both ends of each upper fixing member 311 are respectively connected to two support columns 340, and each lower fixing member 312 is respectively connected to two support columns 340. Each sample loading assembly 100 is connected to the upper fixing member 311 at the upper end, the lower fixing member 312 at the lower end, and the two sides are respectively connected to the two support columns 340. The support column 340 can provide support for the upper fixing member 311 and the lower fixing member 312 on the one hand, and can provide support for the sample loading assembly 100 on the other hand, so as to improve the structural stability of the reaction device.

[0047] Further, in order to improve the versatility of the substrate rack 10, refer to Figure 6 The support unit 310 further includes an insert 313, one side of which is embedded in the support column 340, and the other side of which is in contact with the sample loading assembly 100. In actual production, the shape of the substrate 30 may be different, for example, Figure 6The cross-section of the substrate 30 shown is arc-shaped, so the cross-section of the sample loading assembly 100 is also arc-shaped. The sample loading assembly 100 is installed in the support unit 310, and the position of the support unit 310 for supporting the side of the sample loading assembly 100 is also arc-shaped; in other embodiments, the substrate 30 can also be set to a flat plate shape. It can be understood that the sample loading assembly 100 should also be set to a flat plate shape, and the position of the support unit 310 for supporting the side of the sample loading assembly 100 should also be linear; in other embodiments, the substrate 30 can also be other shapes, and the positions of the sample loading assembly 100 and the support unit 310 for supporting the side of the sample loading assembly 100 must adapt to the shape of the substrate 30.

[0048] It is understood that the shape of the position of the side of the support unit 310 for supporting the sample carrier assembly 100 needs to change according to the change of the shape of the substrate 30. Therefore, an insert 313 is provided. The insert 313 is smaller in size than the support column 340. A plurality of inserts 313 of different shapes can be prepared according to the different shapes of the substrate 30. The shapes of the plurality of inserts 313 of different shapes used to be embedded in one side of the support column 340 are the same, but the shapes of the one side used to be attached to the sample carrier assembly 100 are different. When the shape of the substrate 30 to be coated changes, only the insert 313 needs to be replaced, and the support column 340 does not need to be replaced as a whole. The substrate rack 10 has higher versatility. The same substrate rack 10 can be used to coat substrates 30 of various shapes, which is conducive to reducing equipment costs. It is understood that the insert 313 and the support column 340 should be detachably connected to facilitate production changes.

[0049] It is understandable that, referring to Figure 6 When in use, the two sides of the sample loading assembly 100 are the process gas chamber 250 and the inert gas chamber 260 respectively. In order to reduce the possibility that the process gas enters the inert gas chamber 260 and causes the part of the support frame located in the inert gas chamber 260 to be contaminated, a seal may also be provided between the sample loading assembly 100 and the insert 313 to improve the sealing between the sample loading assembly 100 and the insert 313, so that the process gas is not easy to penetrate into the inert gas chamber 260 from the gap between the sample loading assembly 100 and the insert 313. The seal may be a vacuum-resistant elastic gasket.

[0050] Further, refer to Figure 8, a heater 500 is disposed on the back side of the sample carrier assembly 100, and the heater 500 is connected to the support unit 310, and is used to heat the substrate 30 to meet the requirements of different process temperature ranges, so that the substrate 30 obtains a more uniform and accurate deposition temperature, thereby producing a more uniform film. It is understandable that the arrangement of the heater 500 is not limited, and one or more heaters 500 can be separately disposed on the back side of each sample carrier assembly 100, so that the temperature of each substrate 30 can be adjusted separately, thereby improving the accuracy of the temperature control of the substrate 30; one or more heaters 500 can also be disposed to heat multiple sample carrier assemblies 100 at the same time, so as to reduce the complexity of temperature control and reduce production costs.

[0051] Reference Figures 5 to 7 In order to better reflect the structure, Figure 5 Part of the housing 200 is made transparent. A coating device provided in an embodiment of the second aspect of the present invention is used to coat a substrate 30. The coating device includes a housing 200 and a substrate rack 10. The support frame is installed on the housing 200. The sample carrier 100 is accommodated inside the housing 200. A process gas chamber 250 is formed between one side of the sample carrier 100 for mounting the substrate 30 and the inner wall of the housing 200. The process gas chamber 250 is used to accommodate process gas. An inert gas chamber 260 is formed between the other side of the sample carrier 100 and the inner wall of the housing 200. The inert gas chamber 260 is used to accommodate inert gas. The substrate rack 10 provided in the embodiment of the first aspect of the present invention is used to mount the substrate 30 to the sample carrier 100. The flexible layer 120 can tightly cover the back side of the substrate 30 that does not need to be coated, thereby effectively reducing the possibility of process gas infiltrating the back side of the substrate 30 to cause a thin film to be deposited on the back side of the pole piece, thereby improving the yield rate and reducing the production cost.

[0052] Specifically, refer to Figure 5 The housing 200 includes an upper wall plate 210, a first side wall plate 220, a second side wall plate 230 and a lower wall plate 240. The first side wall plate 220 and the second side wall plate 230 are arranged opposite to each other. The upper wall plate 210 is connected above the first side wall plate 220 and the second side wall plate 230. The lower wall plate 240 is connected below the first side wall plate 220 and the second side wall plate 230. The upper wall plate 210, the first side wall plate 220, the second side wall plate 230 and the lower wall plate 240 enclose and define a reaction chamber; the sample loading assembly 100 is accommodated in the reaction chamber, and a process gas chamber 250 is formed between one side of the sample loading assembly 100 for mounting the substrate 30 and the first side wall plate 220, and an inert gas chamber 260 is formed between the other side of the sample loading assembly 100 and the second side wall plate 230.

[0053] It should be noted that when in use, the support frame drives the sample carrier assembly 100 installed thereon to rotate relative to the outer shell 200. In order to avoid structural interference during the rotation process, a gap is provided between the support frame and the inner wall of the outer shell 200, that is, the process gas chamber 250 and the inert gas chamber 260 are interconnected. Ideally, the process gas should only exist between the sample carrier assembly 100 and the first side wall plate 220, and be deposited on the surface of the substrate 30 to form a thin film. However, since the process gas chamber 250 and the inert gas chamber 260 are interconnected, in actual production, the process gas may enter the inert gas chamber 260, causing the portion of the support frame located in the inert gas chamber 260 to be contaminated. In order to reduce the contamination of the support frame, on the one hand, referring to Figure 6 A process gas inlet 221 may be opened on the first side wall plate 220 so that the process gas can directly flow to the substrate 30 installed on the sample loading assembly 100; on the other hand, the pressure of the inert gas may be set to be greater than the pressure of the process gas, so that the process gas can be more easily confined in the process gas chamber 250, thereby reducing the possibility of the process gas entering the inert gas chamber 260.

[0054] It should be noted that the coating equipment provided by the embodiment of the present invention can be applied to atomic layer deposition ALD coating process or chemical vapor deposition CVD coating process. Designed according to the ALD coating process, the ALD process has periodic characteristics. The higher the rotation speed of the support frame, the more favorable it is to the deposition thickness of the process, and the production efficiency can be improved. However, in the actual production process, the diameter of the device is relatively large and the weight is heavy. The faster the rotation speed, the greater the corresponding torque. When the drive device is selected, the power is relatively large, which may greatly increase the operating cost. In actual demand, the speed is designed according to the process requirements, and the rotation speed should not be too high.

[0055] Furthermore, since there is a gap between the support frame and the inner wall of the housing 200, a gap that is too large may lead to low film forming efficiency, process gas entering the inert gas chamber 260, causing the support frame to be seriously contaminated, and other problems. Based on this, refer to Figure 6 There is a first interval between the upper fixing member 311 and the first side wall plate 220, and between the lower fixing member 312 and the first side wall plate 220, and the width H1 of the first interval is 0.1mm to 50mm, and there is a second interval between the upper fixing member 311 and the upper wall plate 210, and between the lower fixing member 312 and the lower wall plate 240, and the width H2 of the second interval is 0.1mm to 30mm, so that, with reference to Figure 6The process gas is introduced into the process gas chamber 250 along the solid arrow, and the inert gas is filled in the inert gas chamber 260 and the connection between the inert gas chamber 260 and the process gas chamber 250. While avoiding structural interference during the rotation process, the inert gas can better fill the first interval and the second interval, and the process gas is confined between the sample loading component 100 and the first side wall plate 220, thereby ensuring the film forming efficiency, and effectively reducing the possibility of the process gas entering the inert gas chamber 260, thereby reducing the contamination of the support frame.

[0056] Further, refer to Figure 7 The inner wall of the shell 200 is provided with a first guide structure 270, and the support frame is provided with a second guide structure 330 cooperating with the first guide structure 270. The first guide structure 270 and the second guide structure 330 are used to guide the rotation of the support frame relative to the shell 200, so that the radial relative position of the support frame and the shell 200 is more accurate, and the support frame can be stably rotated relative to the shell 200, reducing the jitter during the rotation process and improving the stability of the action process.

[0057] Furthermore, the first guide structure 270 has an annular groove 271 extending along the rotation track of the support frame, and the second guide structure 330 includes a guide column 331 and a ball 332, the guide column 331 is connected to the support frame, and the ball 332 is rotatably connected to the guide column 331 and embedded in the annular groove 271. There is rolling friction between the ball 332 and the inner wall of the annular groove 271, and compared with sliding friction, the resistance of rolling friction is smaller, so that the support frame can rotate more smoothly relative to the housing 200, which can further reduce the jitter during the rotation process and further improve the stability of the action process.

[0058] Furthermore, the second guide structure 330 further includes a ball seat 333 and an elastic member 334. The ball seat 333 is slidably mounted on the guide column 331, the ball 332 is rotatably connected to the ball seat 333, and the elastic member 334 is mounted on the guide column 331. One end of the elastic member 334 abuts against the support frame and the other end abuts against the ball seat 333. The elastic member 334 is in a compressed state, and can provide pressure toward the first guide structure 270 for the ball seat 333, so that the ball 332 can be stably embedded in the annular groove 271. When the support frame and the lower wall plate 240 are offset along the axial direction of the support frame, the elastic member 334 can push the ball seat 333 so that the ball 332 is always engaged with the annular groove 271, so as to prevent the ball 332 from escaping from the annular groove 271, causing structural offset or even interference, thereby further improving the structural stability.

[0059] The embodiments of the present invention are described in detail above in conjunction with the accompanying drawings, but the present invention is not limited to the above embodiments. Various changes can be made within the knowledge of ordinary technicians in the relevant technical field without departing from the purpose of the present invention. In addition, the embodiments of the present invention and the features in the embodiments can be combined with each other without conflict.

Claims

1. A substrate rack, used for mounting a substrate, characterized in that: The substrate frame comprises: Support frame; A sample loading assembly is installed on the support frame, and the sample loading assembly includes a support plate, a flexible layer and a limiting member, wherein the flexible layer covers a surface of one side of the support plate, and the side of the flexible layer away from the support plate forms a sample loading surface; the limiting member is connected to the support plate and / or the flexible layer, and the limiting member is used to abut against the edge of the substrate so that the substrate is pressed against the sample loading surface.

2. The substrate holder according to claim 1, characterized in that: The sample loading assembly also includes a positioning frame, which is connected to a side of the flexible layer away from the support plate. The positioning frame has a positioning window, and a portion of the flexible layer is exposed from the positioning window. The positioning window is used to accommodate the substrate, and the limiting member is at least partially located inside the positioning window.

3. The substrate holder according to claim 1, characterized in that: The sample loading assembly also includes a locking piece, which includes a supporting portion and a connecting portion that are connected to each other. The connecting portion passes through the limiting piece and is connected to the support plate and / or the flexible layer. The supporting portion is used to press the limiting piece against the flexible layer.

4. The substrate holder according to claim 3, characterized in that: The connecting portion is threadedly connected to the supporting plate and / or the flexible layer, and the connecting portion and the limiting member are capable of relative rotation.

5. The substrate holder according to claim 1, characterized in that: The support frame includes a support unit and a support seat, the support unit is connected to the support seat, the support unit includes an upper fixing member and a lower fixing member, the upper end of the sample loading component is connected to the upper fixing member, and the lower end of the sample loading component is connected to the lower fixing member.

6. The substrate holder according to claim 5, characterized in that: The sample loading components are provided in plurality, the support frame comprises a plurality of the support units, the plurality of the support units are sequentially arranged in the circumferential direction of the support seat, and each of the sample loading components is correspondingly mounted on one of the support units.

7. The substrate holder according to claim 6, characterized in that: The support frame also includes a plurality of support columns, and the plurality of support units are distributed in the circumferential direction of the support seat, and a support column is arranged between any two adjacent support units, and the two ends of each upper fixing member are respectively connected to the two support columns, and the two ends of each lower fixing member are respectively connected to the two support columns, and each sample loading assembly has an upper end connected to the upper fixing member, a lower end connected to the lower fixing member, and two sides respectively connected to the two support columns.

8. The substrate holder according to claim 7, characterized in that: The support unit further comprises an embedding piece, one side of which is embedded in the support column, and the other side of which is in contact with the sample loading component.

9. The substrate holder according to claim 5, characterized in that: The supporting unit further comprises a sealing member, and the sealing member is disposed between the upper fixing member and the sample loading assembly and between the lower fixing member and the sample loading assembly.

10. A coating device for coating a substrate, characterized in that: The coating equipment comprises: shell; The substrate rack according to any one of claims 1 to 9, wherein the support frame is mounted on the housing, the sample loading assembly is accommodated inside the housing, a process gas chamber is formed between one side of the sample loading assembly for mounting the substrate and the inner wall of the housing, the process gas chamber is used to accommodate process gas, and an inert gas chamber is formed between the other side of the sample loading assembly and the inner wall of the housing, the inert gas chamber is used to accommodate inert gas; A driving device is connected to the supporting frame, and is used for driving the substrate frame to rotate relative to the housing.

11. The coating device according to claim 10, characterized in that: The inner wall of the shell is provided with a first guide structure, and the support frame is provided with a second guide structure matched with the first guide structure, and the first guide structure and the second guide structure are used to guide the rotation of the support frame relative to the shell.

12. The coating device according to claim 11, characterized in that: The first guide structure has an annular slide groove extending along the rotation trajectory of the support frame, and the second guide structure includes a guide column and a ball, the guide column is connected to the support frame, and the ball is rotatably connected to the guide column and embedded in the annular slide groove.

13. The coating device according to claim 12, characterized in that: The second guide structure also includes a ball seat and an elastic member. The ball seat can be slidably mounted on the guide column. The ball is rotatably connected to the ball seat. The elastic member is mounted on the guide column. One end of the elastic member abuts against the support frame and the other end abuts against the ball seat.

Images