Self-cleaning pure copper cleaning tank and its operation method

Abstract

The invention belongs to the field of metal surface treatment, and specifically discloses a self-cleaning pure copper cleaning tank, comprising a pickling box for containing an acid solution, the pickling box being detachably connected with a self-cleaning device, the self-cleaning device comprising a reduction plate for quickly replacing copper and maintaining relative stability under an acid solution and a fixing assembly for installing and fixing the reduction plate, copper ions are reduced to metallic copper by lead on the reduction plate, and the metallic copper can stably exist in dilute sulfuric acid, and the lead is converted into lead sulfate after reducing the copper ions, and the lead sulfate stably exists in dilute sulfuric acid, so this treatment method will not cause any influence on the solution components, and there is no need to stop production for treatment; the multi-layer structure of the self-cleaning device can improve the reduction efficiency through components such as a grid plate, a liquid inlet hole, a mesh bag, etc., and prevent the accumulation of copper; and the reduction plate has a low manufacturing cost, and the reduction plate can be repeatedly activated by an activation device, thereby extending the service life.

Description

Technical Field

[0001] The invention belongs to the field of metal surface treatment, and in particular relates to a self-cleaning pure copper cleaning tank and an operating method thereof. Background Art

[0002] When pure copper parts are placed in an air environment for too long, copper oxide and basic copper carbonate are easily generated on the surface. Treatment with dilute sulfuric acid aqueous solution will not corrode the pure copper parts matrix, and can achieve a good effect of removing corrosion products. However, the corrosion products dissolved in dilute sulfuric acid aqueous solution will gradually increase the concentration of copper ions in the solution. Under the action of the common ion effect, the dissolution rate of corrosion products will decrease. At the same time, as the copper ions accumulate to a certain extent, they will be deposited in the form of copper sulfate crystals at the bottom or around the cleaning tank. At this time, the cleaning solution needs to be chemically precipitated or electrolyzed to remove copper ions. Chemical precipitation will introduce new ions and destroy the components of the cleaning solution. Electrolysis treatment requires production suspension, affecting production efficiency. Summary of the invention

[0003] In view of the problem that copper ions accumulate in large quantities when cleaning copper parts in the prior art and the concentration of copper ions in the dilute sulfuric acid aqueous solution tends to increase, a self-cleaning pure copper parts cleaning tank and its operation method are now proposed. The present invention provides the following technical solutions:

[0004] A self-cleaning pure copper cleaning tank comprises a pickling box for containing an acid solution, the pickling box is detachably connected with a self-cleaning device, the self-cleaning device comprises a reduction plate for quickly replacing copper and maintaining relative stability under the acid solution and a fixing assembly for installing and fixing the reduction plate; the fixing assembly comprises a basket and a mesh bag, a plurality of liquid inlet holes are arranged on the side wall of the basket, the reduction plate is placed in the basket, and the mesh bag is wrapped outside the basket.

[0005] Preferably, the reduction plate is formed by activating a substrate plate, the substrate plate comprises a grid plate and a lead paste, and the lead paste is attached to the grid plate.

[0006] Preferably, the first hanging ear and the second hanging ear are fixedly connected to both sides of the upper end of the grid plate, respectively, and a hanging plate column is fixedly connected to the inner wall of the pickling box, and the first hanging ear and the second hanging ear are hung on the hanging plate column; the upper end of the grid plate is fixedly connected to a cross beam, and shoulders for vertical positioning are fixedly connected to both sides of the cross beam.

[0007] Preferably, the grid material is lead alloy, and the weight percentage of lead is 90%-95%; the lead paste is made by mixing lead powder and dilute sulfuric acid aqueous solution and then drying in the shade; the lead powder contains 99%-99.5% lead and lead oxide by weight, and 0.5%-1% conductive carbon fiber by weight; lead oxide accounts for 70%-90% of the total of lead and lead oxide, and the weight percentage of sulfuric acid in the dilute sulfuric acid aqueous solution is 5%-10%; the lead paste extends beyond the grid surface by 0.2-0.5mm.

[0008] Preferably, it also includes an activation device for restoring the reduction plate, the activation device includes a charger and an activation box for containing activation liquid, and the activation box is equipped with a plurality of hanging strips for hanging the reduction plate.

[0009] Preferably, the wider two side walls of the activation box are provided with 4 groups of bar holes, and 4 hanging strips are provided, which are inserted into the bar holes; the hanging strips include 2 conductive hanging strips and 2 insulating hanging strips, 1 conductive hanging strip and 1 insulating hanging strip form a group, and 2 groups are arranged at intervals.

[0010] Preferably, the second hanging ear is longer than the first hanging ear, and the number of hanging strips pressed by the second hanging ear is greater than that of the first hanging ear.

[0011] An operating method of a self-cleaning pure copper cleaning tank, using the self-cleaning pure copper cleaning tank, comprises the following steps:

[0012] S1, activation, comprising the following steps:

[0013] S11, prepare activation liquid and put it into the activation box;

[0014] S12, insert the conductive hanging strip into the strip placement holes at both ends, and place the two insulating hanging strips in the two inner strip placement holes respectively;

[0015] S13, the same type of hanging ears of two adjacent substrate plates are arranged in opposite directions, and the number of reduction plates on one hanging plate strip is one more than the number of reduction plates on the other hanging plate strip;

[0016] S14, soaking the substrate plate in the activation solution;

[0017] S15, the positive and negative electrodes of the charger are connected to the hanging strips through conductive clips;

[0018] S16, remove the reduction board after charging;

[0019] S2, cleaning, comprising the following steps:

[0020] S21, prepare cleaning solution;

[0021] S22, assembling a self-cleaning device;

[0022] S23, install a self-cleaning device;

[0023] S24, cleaning of the workpiece to be cleaned;

[0024] S3, cyclic use, repeating steps S1 and S2.

[0025] Preferably, in step S16, the activation current during the first charge = [weight of the substrate plate - weight of the substrate grid plate] × [(30 to 40) mA / g × the number of substrate plates on the negative conductive hanging strip connected to the charger], and the charging is 40-45 hours;

[0026] The second and subsequent activation current = [substrate plate weight - substrate plate grid weight] × [(16 to 20) mA / g × the number of reduction plates on the negative conductive hanging strip connected to the charger], charging for 8-10 hours.

[0027] Preferably, in step S11, a portion of the activation solution is introduced into the pickling tank when adjusting the concentration of the activation solution.

[0028] Compared with the prior art, the present invention has the following beneficial effects:

[0029] The present invention uses a reduction plate in a self-cleaning device to quickly replace copper and keep it relatively stable under an acid solution. Specifically, the lead paste of the reduction plate reduces copper ions to metallic copper, which can stably exist in dilute sulfuric acid. After the lead reduces the copper ions, it is converted into lead sulfate, which can stably exist in dilute sulfuric acid. Therefore, this treatment method will not cause any impact on the solution components and does not require production suspension. The multi-layer structure of the self-cleaning device can improve the reduction efficiency and prevent copper accumulation through components such as grid plates, liquid inlet holes, and mesh bags. The reduction plate has a low manufacturing cost and can be repeatedly activated by an activation device to extend its service life. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a side view structural schematic diagram of the pickling box in the present invention;

[0031] Figure 2 It is a schematic diagram of the main structure of the pickling box in the present invention;

[0032] Figure 3 It is a schematic diagram of the top view of the pickling tank in the present invention;

[0033] Figure 4 It is a schematic diagram of the structure of the reduction plate in the present invention;

[0034] Figure 5 It is a schematic diagram of the structure of the basket in the present invention;

[0035] Figure 6 It is a structural schematic diagram of the mesh bag in the present invention;

[0036] Figure 7 It is a schematic diagram of the main structure of the activation box in the present invention;

[0037] Figure 8 It is a schematic diagram of the top view of the activation device in the present invention;

[0038] Fig. 9 It is a structural schematic diagram of the hanging strips in the present invention;

[0039] Fig.10 It is a schematic diagram of the installation structure of the hanging strips in the present invention;

[0040] In the attached drawings, 1, pickling box; 2, lifting ear; 3, hanging plate column; 4, placement port; 5, sulfuric acid aqueous solution; 6, hanging rod; 7, stopper; 8, first hanging ear; 9, second hanging ear; 10, crossbeam; 11, hanging shoulder; 12, grid plate; 13, liquid inlet hole; 14, limit strip; 15, mesh bag; 16, binding belt; 17, activation box; 18, strip placement hole; 19, activation liquid; 20, conductive hanging plate strip; 21, insulating hanging plate strip; 22, V-shaped groove; 23, bayonet; 24, conductive clip; 25, charger. DETAILED DESCRIPTION

[0041] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention is clearly and completely described below in conjunction with the accompanying drawings of the present invention. The directional words mentioned in the following embodiments, such as "up", "down", "left" and "right", etc., are only reference to the directions of the accompanying drawings. Therefore, the directional words used are used to illustrate rather than limit the invention.

[0042] Example 1

[0043] A self-cleaning pure copper cleaning tank comprises a pickling tank 1 and a self-cleaning device.

[0044] like Figure 1-3 As shown, the pickling box 1 is arranged in a rectangular parallelepiped, and contains a sulfuric acid aqueous solution 5; the two narrower outer walls thereof are fixedly connected with hanging ears 2, and the hanging ears 2 are in an inverted L shape; the two narrower inner walls thereof are fixedly connected with hanging plate columns 3, and the hanging plate columns 3 are in an L shape; three groups of placement openings 4 are arranged on the two wider side walls at the top of the pickling box 1, and the placement openings 4 are arc-shaped or V-shaped, and each group of placement openings 4 is respectively supported by a hanging rod 6, and the front and rear ends of the hanging rod 6 are fixedly connected with blocks to prevent the hanging rod 6 from being horizontally displaced, and the hanging rod 6 can be used to hang the copper material to be cleaned.

[0045] The self-cleaning device includes a reduction plate and a fixing assembly, and the fixing assembly includes a basket and a mesh bag 15; Figure 4As shown, the reduction plate is in the form of a plate, which is activated by a substrate plate, the substrate plate includes a grid plate 12 and lead paste, a crossbeam 10 is arranged on the upper part of the substrate plate, a first hanging ear 8 and a second hanging ear 9 are respectively fixedly connected to both ends of the crossbeam 10, and shoulders 11 extend outward from both ends of the crossbeam 10, the first hanging ear 8 and the second hanging ear 9 are both inverted L-shaped and arranged back to back, the lower part of the reduction plate is arranged as a grid plate 12, and the outside of the grid plate 12 is covered with lead paste; as shown Figure 5 As shown, the basket is in a rectangular shape, with an opening on the top, a liquid inlet hole 13 on the bottom and side walls, and two narrow inner side walls are respectively fixedly connected to limit bars 14, and the shoulder 11 is overlapped on the limit bar 14, which can be used for positioning and guiding the reduction plate; Figure 6 As shown, the net bag 15 is put outside the basket and then tied to the first hanging ear 8 and the second hanging ear 9 by a tie.

[0046] The wall thickness of the pickling box 1 is 15-25mm, the distance between the upper edge of the ear 2 and the upper edge of the pickling box 1 is 1 / 4-1 / 3 of the total height of the pickling box 1, and the center distance between the two ears 2 on the side wall of the same pickling box 1 accounts for 1 / 2-2 / 3 of the width of the wide plate. The distance between the lower edge of the hanging plate column 3 and the upper edge of the pickling box 1 is 1 / 4-1 / 3 of the total height of the pickling box 1. The distance between each group of hanging plate columns 3 is 3-5mm larger than the total length of the crossbeam 10 (including the hanging shoulder 11) on the reduction plate, and the length of the bottom of the notch of the hanging plate column 3 is 2 / 3-1 times the overall thickness of the self-cleaning device. The placement opening 4 is semicircular, and the diameter of the semicircle is 2-3mm larger than the diameter of the hanging rod 6. The hanging rod 6 has sufficient mechanical strength for hanging the pure copper piece to be processed, the surface of the hanging rod 6 is resistant to corrosion by dilute sulfuric acid, the cross section of the hanging rod 6 is circular, and the total length of the hanging rod 6 is 20-30 cm larger than the total width of the pickling box 1; the stopper 7 has a thickness of 1-3 cm, the cross section of the stopper 7 is circular, and the cross-sectional diameter is 2-3 times the diameter of the hanging rod 6. The distance between the two stoppers 7 is 3-5 cm larger than the total width of the inner cavity of the pickling box 1. The function of the stopper 7 is to prevent the hanging rod 6 from sliding sideways.

[0047] Specifically, the pickling box 1 is made of a polytetrafluoroethylene plate with a thickness of 20mm to manufacture a pickling box 1 body with an outer size of 1200mm×900mm×900mm; the upper edge of the ear 2 is 250mm away from the upper edge of the box body, the center distance between the two ears 2 on the same side wall is 400mm, and the two hanging plate columns 3 are symmetrically arranged with the vertical center line of the side wall; the lower edge of the hanging plate column 3 is 230mm away from the upper edge of the box body, the distance between each group of hanging plate columns 3 is 205mm, and the length of the bottom of the notch of the hanging plate column 3 is 50mm. The hanging rod 6 is made of a steel pipe wrapped with acid-resistant plastic on the outside, the outer diameter of the hanging rod 6 is 28mm, and the length of the hanging rod 6 is 1100mm; the stopper 7 is 10mm thick, 60mm in diameter, and the distance between the two stoppers 7 is 950mm.

[0048] Specifically, the width of the grid plate 12 is 185 mm, the distance from the bottom of the grid plate 12 to the bottom of the shoulder 11 is 175 mm, the horizontal portion of the first hanging ear 8 is 75 mm long, and the horizontal portion of the second hanging ear is 125 mm shorter. The total height of the hanging ear is 100 mm, and the width of the crossbeam 10 on the reduction grid plate 12 is 12 mm. The inner rib width of the grid plate 12 is 2.5 mm, and the frame width is 5 mm.

[0049] Specifically, the basket wall thickness is 2mm, the length is 192mm, the width is 60mm, the height is 225mm, and the material is PE; the total area occupied by the liquid inlet 13 is 70% of the total area of ​​each plane of the basket. The length of the cavity inside the basket is 188mm, and the limit bar 14 is 5mm wide and 3mm thick. The mesh bag 15 includes a mesh body and a tie, both of which are made of polyester. The mesh body is 194mm long, 62mm wide, 225mm high, and has a pore size of 150 mesh.

[0050] Specifically, the grid plate 12 is made of lead-antimony alloy with a thickness of 2 mm; the lead paste is made by mixing lead powder and dilute sulfuric acid aqueous solution and then drying in the shade; the lead powder contains 99%-99.5% lead and lead oxide by weight, and 0.5%-1% conductive carbon fiber by weight; the lead oxide accounts for 70%-90% of the total of lead and lead oxide, and the weight percentage of sulfuric acid in the acid aqueous solution is 5%-10%; the lead paste exceeds the surface of the grid plate 12 by 0.2-0.5 mm. Specifically, the lead oxide is lead oxide.

[0051] Example 2

[0052] Specifically, the weight percentage of lead is 90%, and the weight percentage of antimony is 10%; the lead powder contains 99% by weight of lead and lead oxide, and 1% by weight of conductive carbon fiber; the lead oxide accounts for 70% of the total of lead and lead oxide, and the weight percentage of sulfuric acid in the acid aqueous solution is 5%; the lead paste exceeds the surface of the grid 12 by 0.2mm.

[0053] Example 3

[0054] Specifically, the weight percentage of lead is 95%, and the weight percentage of antimony is 5%; the lead powder contains 99.5% by weight of lead and lead oxide, and 0.5% by weight of conductive carbon fiber; the lead oxide accounts for 90% of the total of lead and lead oxide, and the weight percentage of sulfuric acid in the acid aqueous solution is 10%; the lead paste exceeds the surface of the grid 12 by 0.5mm.

[0055] Example 4

[0056] Specifically, the weight percentage of lead is 92.5%, the weight percentage of antimony is 7.5%; the lead powder contains 99.25% of lead and lead oxide by weight, and 0.75% of conductive carbon fiber by weight. The lead oxide accounts for 80% of the total of lead and lead oxide, and the weight percentage of sulfuric acid in the acid aqueous solution is 7.5%; the lead paste exceeds the surface of the grid plate 12 by 0.35mm.

[0057] When in use, the installed self-cleaning device is hung on the scraper column through the first hanging ear 8 and the second hanging ear 9; lead can exist stably in dilute sulfuric acid solution, and the copper ions in the solution reach the surface of the lead and will be reduced to metallic copper by the lead. The metallic copper can exist stably in dilute sulfuric acid, which can effectively alleviate the large accumulation of copper ions in the dilute sulfuric acid solution to a large extent, so that the copper ion concentration in the dilute sulfuric acid aqueous solution 5 is always at a low level; after the lead reduces the copper ions, it is converted into lead sulfate, and the lead sulfate exists stably in dilute sulfuric acid. Therefore, this treatment method will not cause any impact on the solution composition and does not require production suspension for treatment.

[0058] Example 5

[0059] On the basis of any one of the embodiments 1-4, the self-cleaning pure copper cleaning tank is also equipped with an activation device, and the reduction plate can be repeatedly activated by the activation device to extend the service life; Figure 7-10 As shown, the activation device includes a charger 25 and an activation box 17 for containing activation liquid 19, and a plurality of hanging strips for hanging reduction plates are installed on the activation box 17. The wider two side walls of the activation box 17 are correspondingly provided with 4 groups of strip placement holes 18, and 4 hanging strips are provided. The bottom of the hanging strips is symmetrically provided with a bayonet 23, and the hanging strips are inserted into the strip placement holes 18 and clamped to the side walls through the bayonet 23. The hanging strips include 2 conductive hanging strips 20 and 2 insulating hanging strips 21, and 1 conductive hanging strip 20 and 1 insulating hanging strip 21 are a group, and 2 groups are arranged at intervals. The second hanging ear 9 is longer than the first hanging ear 8, and the second hanging ear 9 and the first hanging ear 8 press and touch a plurality of hanging strips respectively. As for the number of hanging strips pressed, the second hanging ear 9 is more than the first hanging ear 8. The upper end of the hanging strip is provided with a plurality of V-shaped grooves 22, and the V-shaped grooves 22 receive the first hanging ear 8 and the second hanging ear 9.

[0060] Specifically, the activation box 17 in the activation device is made of 8mm thick polytetrafluoroethylene plate, with an outer dimension of 450mm×300mm×370mm. Eight strip placement holes 18 are symmetrically opened on the two long plates of the activation box 17. The upper edge of the strip placement hole 18 is 5cm away from the upper edge of the activation box 17. The size of the strip placement hole 18 is 10mm×20mm. The center distance between the two inner holes on the same plate is 220mm, and the center distance between the two outer holes is 355mm. The maximum outer dimension of the hanging strip is 400mm×8mm×18mm; the conductive hanging strip 20 is made of lead-plated copper, and the insulating hanging strip 21 is made of polytetrafluoroethylene; the upper opening width of the V-shaped groove 22 is 4mm, the bottom angle is 60°, the center distance between adjacent "V-shaped" grooves is 20mm, and a total of 11 "V-shaped" grooves are opened on each hanging strip. The width of the bayonet 23 is 11mm, the height of the bayonet 23 is 4mm, and the center distance between the two bayonet 23 is 292mm. The activation solution 19 is a sulfuric acid aqueous solution 5 with a weight percentage of 15%, and the upper surface of the activation solution 19 exceeds the upper surface of the beam 10 of the reduction plate by 5 cm. The positive and negative leads of the charger 25 are clamped at the ends of the two conductive hanging strips 20 by conductive clamps 24 respectively.

[0061] Example 6

[0062] An operating method of a self-cleaning pure copper cleaning tank, based on the self-cleaning pure copper cleaning tank in Example 5, performs the following operations:

[0063] S1, activation, comprising the following steps:

[0064] S11, prepare activation solution 19 and put it into activation box 17;

[0065] S12, insert the conductive hanging strip 20 into the strip placement holes 18 at both ends, and place the two insulating hanging strips 21 in the two inner strip placement holes 18 respectively;

[0066] S13, the same type of hanging ears of two adjacent substrate plates are arranged in opposite directions, and the number of reduction plates on one hanging plate strip is one more than the number of reduction plates on the other hanging plate strip;

[0067] Specifically, 11 reduction plates are hung in the V-shaped grooves 22 on the hanging strips, and the same hanging ears of two adjacent reduction plates face in opposite directions. The number of substrate plates on one hanging strip is 5, and the number of substrate plates on the other hanging strip is 6.

[0068] S14, soaking the substrate plate in the activation solution 19;

[0069] Specifically, soak for 10 hours.

[0070] S15, the positive and negative electrodes of the charger 25 are connected to the hanging strips through the conductive clip 24;

[0071] Specifically, the positive lead on the charger 25 is clamped at one end of a conductive hanging strip 20 with six substrate boards by a conductive clip 24, and the negative lead on the charger 25 is clamped at the same end of another conductive hanging strip by a conductive clip 24, while the first hanging ear 8 is only connected to the insulating hanging strip 21, and the second hanging ear 9 is connected to both the conductive hanging strip 20 and the insulating hanging strip 21, so as to facilitate the complete flow of current.

[0072] S16, remove the reduction board after charging;

[0073] Specifically, the activation is carried out at room temperature, the activation current during the first charge = 90g × 30mA / g × 6 = 16.2A, and after charging for 40-45h, the reduction plate on the conductive hanging strip 20 connected to the negative electrode of the charger 25 is activated. The second and subsequent times.

[0074] Since the deactivated reduction plate will consume water in the activation solution 19 and introduce excess sulfate into the activation tank when it is reactivated, the sulfuric acid concentration in the activation tank will gradually increase. In step S11, when adjusting the concentration of the activation solution 19, a portion of the activation solution 19 can be introduced into the pickling tank for recycling.

[0075] S2, cleaning, comprising the following steps:

[0076] S21, prepare cleaning solution and put it into pickling tank 1;

[0077] S22, assembling the self-cleaning device, placing the reduction plate in the basket, covering the basket with a mesh bag 15 and connecting the reduction plate;

[0078] S23, installing the self-cleaning device, and hanging the first hanging ear 8 and the second hanging ear 9 in the self-cleaning device on the hanging plate column 3;

[0079] S24, cleaning the workpiece to be cleaned, hanging the workpiece to be cleaned on the hanging rod 6 for soaking and cleaning;

[0080] S3, cyclic use, repeating steps S1 and S2.

[0081] The copper ions dissolved in the pure copper parts in the pickling tank will diffuse to the surface of the reduction plate and be reduced to copper by the highly active lead and fall into the bottom of the basket with the mesh bag 15. The lead will be converted into lead sulfate. As the processing volume increases, the reduction plate will gradually lose its activity. When the color of the solution in the pickling tank becomes darker, the reduction plate needs to be replaced. Take out the self-cleaning device, untie the laces, take out the reduction plate and put it into the activation tank for re-activation, and take out and collect the copper at the bottom of the basket with the mesh bag 15. The subsequent activation is carried out at room temperature, and the inactivated reduction plate is hung in the activation tank. The activation current = (90g×16mA / g)×(the number of reduction plates on the negative conductive hanging strip 20 connected to the charger 25). After charging for 8 hours, the reduction plate can be restored to a better state of use, thereby extending its service life.

Claims

1. A self-cleaning pure copper cleaning tank, comprising a pickling tank (1) for containing an acid solution, characterized in that: The pickling box (1) is detachably connected to a self-cleaning device, the self-cleaning device comprising a reduction plate for quickly replacing copper and maintaining relative stability in an acid solution and a fixing assembly for mounting and fixing the reduction plate; the fixing assembly comprises a basket and a mesh bag (15), a plurality of liquid inlet holes (13) are provided on the side wall of the basket, the reduction plate is placed in the basket, and the mesh bag (15) is wrapped outside the basket; The reduction plate is formed by activating a substrate plate, the substrate plate comprising a grid plate (12) and lead paste, the lead paste being attached to the grid plate (12); The lead paste is prepared by mixing lead powder and dilute sulfuric acid aqueous solution and then drying in the shade; the lead powder contains 99%-99.5% by weight of lead and lead oxide, and 0.5%-1% by weight of conductive carbon fiber; the lead oxide accounts for 70%-90% of the total of lead and lead oxide; It also includes an activation device for restoring the reduction plate, the activation device including a charger (25) and an activation box (17) for containing an activation liquid (19).

2. The self-cleaning pure copper cleaning tank according to claim 1, characterized in that: A first hanging ear (8) and a second hanging ear (9) are respectively fixedly connected to both sides of the upper end of the grid plate (12); a hanging plate column (3) is fixedly connected to the inner wall of the pickling box (1); the first hanging ear (8) and the second hanging ear (9) are hung on the hanging plate column (3); a crossbeam (10) is fixedly connected to the upper end of the grid plate (12); and shoulders (11) for vertical positioning are fixedly connected to both sides of the crossbeam (10).

3. The self-cleaning pure copper cleaning tank according to claim 2 is characterized in that: The material of the grid plate (12) is a lead alloy, the weight percentage of lead is 90%-95%; the weight percentage of sulfuric acid in the dilute sulfuric acid aqueous solution is 5%-10%; the lead paste protrudes from the surface of the grid plate (12) by 0.2-0.5 mm.

4. The self-cleaning pure copper cleaning tank according to claim 3 is characterized in that: The activation box (17) is provided with a plurality of hanging strips for hanging reduction plates.

5. The self-cleaning pure copper cleaning tank according to claim 4, characterized in that: Four groups of strip placement holes (18) are correspondingly arranged on the wider two side walls of the activation box (17), and four hanging strips are arranged, and the hanging strips are inserted into the strip placement holes (18); the hanging strips include two conductive hanging strips (20) and two insulating hanging strips (21), one conductive hanging strip (20) and one insulating hanging strip (21) form a group, and two groups are arranged at intervals.

6. The self-cleaning pure copper cleaning tank according to claim 5, characterized in that: The second hanging ear (9) is longer than the first hanging ear (8), and the number of hanging strips pressed by the second hanging ear (9) is greater than that of the first hanging ear (8).

7. An operating method of a self-cleaning pure copper cleaning tank, characterized in that: Using the self-cleaning pure copper cleaning tank as described in any one of claims 1 to 6 comprises the following steps: S1, activation, comprising the following steps: S11, preparing an activation liquid (19), and placing the activation liquid in an activation box (17); S12, inserting the conductive hanging strip (20) into the strip placement holes (18) at both ends, and placing the two insulating hanging strips (21) in the two inner strip placement holes (18) respectively; S13, the same type of hanging ears of two adjacent substrate plates are arranged in opposite directions, and the number of reduction plates on one hanging plate strip is one more than the number of reduction plates on the other hanging plate strip; S14, soaking the substrate plate in the activation solution (19); S15, the positive and negative electrodes of the charger (25) are connected to the hanging strips through the conductive clip (24); S16, remove the reduction board after charging; S2, cleaning, comprising the following steps: S21, prepare cleaning solution; S22, assembling a self-cleaning device; S23, install a self-cleaning device; S24, cleaning of the workpiece to be cleaned; S3, cyclic use, repeating steps S1 and S2.

8. The method for operating the self-cleaning pure copper cleaning tank according to claim 7, characterized in that: In step S16, the activation current during the first charge = [weight of the substrate plate - weight of the substrate grid plate (12)] × [(30 to 40) mA / g × the number of substrate plates on the negative conductive hanging strip (20) connected to the charger (25)], and the charging is performed for 40-45 hours; The second and subsequent activation currents = [weight of substrate plate - weight of substrate grid plate (12)] × [(16 to 20) mA / g × the number of reduction plates on the negative conductive hanging strip (20) connected to the charger (25)], and the charging time is 8-10 hours.

9. The method for operating the self-cleaning pure copper cleaning tank according to claim 7, characterized in that: In step S11, a portion of the activation solution (19) is introduced into the pickling tank (1) while adjusting the concentration of the activation solution (19).

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