Plasma discharge stability control method, system, computer equipment and medium

Abstract

The present invention provides a plasma discharge stability control method, system, computer equipment and medium. The plasma discharge stability control method includes: obtaining the discharge current peak value of the plasma in each discharge cycle; calculating the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​according to each discharge current peak value; judging the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values; and adjusting the external power supply control parameters of the plasma according to the state of the plasma. Through the present invention, the plasma discharge stability is monitored to keep the plasma in a stable state.

Description

Technical Field

[0001] The present invention relates to the field of plasma, and in particular to a plasma discharge stability control method, system, computer equipment and medium. Background Art

[0002] In a plasma generator, the main ways to generate plasma include glow discharge, arc discharge, corona discharge, and dielectric barrier discharge. Since plasma is a complex dissipative nonlinear system, the discharge behavior will also show rich nonlinear characteristics. Therefore, the number and type of particles generated by the discharge in each cycle fluctuate, resulting in problems such as excessive or shallow etching depth of the material surface, failure to achieve material modification effects, skin surface burns, and unstable synthetic effective gas composition during the use of the plasma generator, which affects the application effect of the plasma generator. In the fields of material synthesis and modification, energy chemical industry, and biomedicine, there are requirements for the stability of the number and energy of active particles in a plasma, which requires a stable plasma generator.

[0003] Existing devices for determining the stability of plasma discharge only monitor the discharge state at the beginning of the discharge. After determining that the discharge has entered a stable state, they no longer monitor the discharge state. In addition, they lack the ability to identify multi-cycle unstable phenomena such as discharge doubling periods and chaotic discharges, which is not conducive to the application of plasma discharge devices in various scenarios. Summary of the invention

[0004] In order to monitor the stability of plasma discharge and keep the plasma in a stable state, the present invention proposes a plasma discharge stability control method, system, computer equipment and medium.

[0005] In a first aspect, the present invention provides a method for controlling plasma discharge stability, the method comprising:

[0006] Obtaining the discharge current peak value of the plasma in each discharge cycle;

[0007] Calculating a difference threshold between the discharge current peak values ​​and a difference between the discharge current peak values ​​according to the discharge current peak values;

[0008] Determine the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values;

[0009] According to the state of plasma, the external power supply control parameters of plasma are adjusted.

[0010] Through the above method, the discharge current peak of the plasma in each discharge cycle is obtained according to actual needs, the discharge current peak is associated with the state of the plasma, and then the external power supply control parameters are changed according to the state of the plasma, so as to realize real-time monitoring of the plasma discharge stability, keep the plasma in a stable state, and improve the accuracy and stability of the plasma.

[0011] In combination with the first aspect, in a first embodiment of the first aspect, controlling the external power supply control parameters of the plasma according to the state of the plasma includes:

[0012] When the state of the plasma is an unstable state, the control parameters of the external power supply of the plasma are adjusted until the state of the plasma is a stable state.

[0013] In combination with the first embodiment of the first aspect, in a second embodiment of the first aspect, the external power supply control parameter includes any one of an externally applied voltage amplitude and an externally applied voltage frequency.

[0014] In combination with the first aspect, in a third embodiment of the first aspect, calculating a difference threshold between discharge current peak values ​​according to each discharge current peak value includes:

[0015] According to each discharge current peak value, calculate the average value of the discharge current peak value;

[0016] A difference threshold between the discharge current peak values ​​is determined according to the average of the preset ratio.

[0017] In combination with the first aspect or the third embodiment of the first aspect, in a fourth embodiment of the first aspect, judging the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​includes:

[0018] When there is at least one difference value greater than the difference value threshold, it is determined that the state of the plasma is an unstable state.

[0019] In combination with the second embodiment of the first aspect, in a fifth embodiment of the first aspect, when the state of the plasma is an unstable state, adjusting the control parameters of the external power supply for the plasma includes:

[0020] When the plasma is in an unstable state, the amplitude of the externally applied voltage is reduced, or the frequency of the externally applied voltage is reduced.

[0021] In a second aspect, the present invention further provides a plasma discharge stability control system, the system comprising:

[0022] Waveform sampling equipment, host computer, and control equipment;

[0023] A waveform sampling device is used to obtain the discharge current peak value of the plasma in each discharge cycle;

[0024] The host computer is used to calculate the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​according to the discharge current peak values; and judge the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values;

[0025] The control device is used to adjust the control parameters of the external power supply of the plasma according to the state of the plasma.

[0026] Through the above system, the discharge current peak of the plasma in each discharge cycle is obtained according to actual needs, and the discharge current peak is associated with the state of the plasma. Then, the external power supply control parameters are changed according to the state of the plasma, so as to realize real-time monitoring of the plasma discharge stability, keep the plasma in a stable state, and improve the accuracy and stability of the plasma.

[0027] In conjunction with the second aspect, in a first embodiment of the second aspect, the system further includes:

[0028] The alarm device is used to send out an alarm signal when the state of the plasma is unstable.

[0029] In a third aspect, the present invention further provides a computer device, comprising a memory and a processor, the memory and the processor being communicatively connected to each other, the memory storing computer instructions, and the processor executing the steps of the plasma discharge stability control method of the first aspect or any embodiment of the first aspect by executing the computer instructions.

[0030] In a fourth aspect, the present invention further provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the plasma discharge stability control method of the first aspect or any embodiment of the first aspect. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0032] Figure 1 is a flow chart of a plasma discharge stability control method proposed according to an exemplary embodiment;

[0033] Figure 2 is a curve diagram showing the change in the amplitude of the discharge current over time under four times the discharge cycle in an example;

[0034] Figure 3 is a curve diagram showing the change of the amplitude of the discharge current over time under chaotic discharge in an example;

[0035] Figure 4 is a graph showing the relationship between the average number of electrons in space, the average electron energy and the average power and the amplitude of the externally applied voltage, respectively, in an example;

[0036] Figure 5 In one example, a graph showing the relationship between the average number of electrons in space, the average electron energy, and the average power and the frequency of an externally applied voltage;

[0037] Figure 6 A plasma discharge stability control system is proposed according to an exemplary embodiment;

[0038] Figure 7 is a control flow chart of a plasma discharge stability control system proposed according to an exemplary embodiment;

[0039] Figure 8 is a schematic structural diagram of a plasma discharge stability control device proposed according to an exemplary embodiment;

[0040] Fig. 9 It is a schematic diagram of the hardware structure of a computer device proposed according to an exemplary embodiment. DETAILED DESCRIPTION

[0041] The technical solution of the present invention will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0042] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0043] In order to monitor the stability of plasma discharge and keep the plasma in a stable state, the present invention proposes a plasma discharge stability control method, system, computer equipment and medium.

[0044] Figure 1 FIG. 1 is a flow chart of a plasma discharge stability control method according to an exemplary embodiment. Figure 1 As shown, the method includes the following steps S101 to S104.

[0045] In step S101, the discharge current peak value of the plasma in each discharge cycle is obtained.

[0046] In an optional embodiment, the discharge current peak value of each discharge cycle is determined within a preset time period before the current moment. The preset time period can be set according to actual needs and is not specifically limited here. Exemplarily, the preset time period is 20 discharge cycles.

[0047] In step S102, a difference threshold between the discharge current peak values ​​and a difference between the discharge current peak values ​​are calculated according to the discharge current peak values.

[0048] In an optional embodiment, the difference threshold between the discharge current peak values ​​is determined according to the average value of each discharge current peak value.

[0049] In an optional embodiment, since each discharge cycle is a discharge cycle within a preset time before the current moment, the discharge current peak value in each discharge cycle will also change with the change of the current moment. Therefore, the difference threshold value determined according to the average value of each discharge current peak value also changes with the current discharge moment.

[0050] In step S103, the state of the plasma is determined according to the difference threshold between the discharge current peak values ​​and the difference between the respective discharge current peak values.

[0051] In an optional embodiment, the state of the plasma includes a stable state and an unstable state. When the plasma is in an unstable state, time-domain nonlinear behavior occurs, which is specifically manifested as a double-cycle discharge or a chaotic discharge. At this time, the discharge voltage, discharge current and various particle densities will have obvious differences in each discharge cycle, so the state of the plasma can be determined based on the current peak value of each discharge cycle.

[0052] In step S104, according to the state of the plasma, the control parameters of the external power supply of the plasma are adjusted.

[0053] In an optional embodiment, when the plasma is in a stable state, the control parameters of the external power supply in the plasma are not adjusted.

[0054] In an optional embodiment, when the state of the plasma is an unstable state, the control parameters of the external power supply to the plasma are adjusted until the state of the plasma is a stable state.

[0055] In an optional embodiment, the external power supply control parameter includes any one of an externally applied voltage amplitude and an externally applied voltage frequency.

[0056] In an optional embodiment, the adjustment range of the external power supply control parameter is set according to actual needs, and no specific limitation is made here. For example, the external voltage amplitude adjustment range is 25kV, and the external voltage frequency is 3kHz.

[0057] Considering that when plasma discharge is in an unstable state in the time domain, it often manifests as a multiple-period discharge or a chaotic discharge. At this time, the discharge current peak value of the discharge cycle will show obvious differences and is easy to detect. Therefore, through the method provided in the embodiment of the present invention, the discharge current peak value of the plasma in each discharge cycle is obtained according to actual needs, the discharge current peak value is associated with the state of the plasma, and multi-cycle unstable states such as discharge multiple-period and chaotic discharge are identified. The external power supply control parameters are changed according to the state of the plasma to achieve real-time monitoring of the plasma discharge stability, so that the plasma is in a stable state, the accuracy and stability of the plasma are improved, and the application effect of the plasma in various scenarios is guaranteed.

[0058] During the plasma discharge process, a discharge cycle generally only produces one discharge, generating a discharge current pulse. When the plasma is in an unstable state, the discharge current peaks in different discharge cycles will vary significantly. Figure 2 It is the change of the discharge current with time under four times discharge cycle. Figure 3 is the change of the discharge current amplitude with time under chaotic discharge. Figure 2 and Figure 3 It can be seen from the figure that when the plasma is in an unstable state, there are obvious differences in the discharge current peaks in different discharge cycles. Therefore, the state of the plasma can be judged based on the discharge current peaks.

[0059] In one example, the step S102 calculates the difference threshold between the discharge current peaks through the following steps:

[0060] First, the average value of the discharge current peak values ​​is calculated based on the respective discharge current peak values.

[0061] Then, a difference threshold between the discharge current peak values ​​is determined according to the average of the preset ratio.

[0062] In an optional embodiment, the preset ratio can be set as needed, and no specific limitation is made here. For example, the preset ratio can be 20%. When the preset ratio is 20%, 20% of the average value of the discharge current peak value is used as the difference threshold.

[0063] In one example, in the above step S103, when there is at least one difference value greater than a difference value threshold, it is determined that the state of the plasma is an unstable state.

[0064] In the plasma discharge simulation experiment, the plasma discharge is often unstable in the first few discharge cycles, and there are also differences in the seed electron density. When the average number of electrons in the space of the plasma generator decreases, the average electron energy increases, and the average power decreases, it indicates that the electron reaction decreases, and the difference in seed electron density in the initial few cycles of the discharge is more easily offset as the discharge develops, and the discharge is easy to reach a stable state. On the contrary, when the average number of electrons in the space increases, the average electron energy decreases, and the average power increases, the difference in seed electrons in the first few cycles of the discharge will further expand in multiple discharges, and the discharge will be difficult to stabilize and more likely to develop into a chaotic mode. Therefore, the changing trend of the average number of electrons, average electron energy, and average power in the space is closely related to the evolution of the plasma state.

[0065] The average number of electrons, average electron energy and average power in space are related to the amplitude and frequency of the externally applied voltage. Figure 4 It is a curve diagram showing the relationship between the average number of electrons in space, the average electron energy, and the average power and the amplitude of the externally applied voltage. Figure 5 It is a graph showing the relationship between the average number of electrons in space, the average electron energy, and the average power and the frequency of the externally applied voltage. e_ave is the average number of electrons, T e_ave is the average electron energy, P gs is the average power, V a is the externally applied voltage amplitude, and f is the externally applied voltage frequency. Figure 4 It can be seen that when the external applied voltage amplitude decreases, the average number of electrons decreases, the average electron energy increases, the average power decreases, and the plasma discharge will more easily develop into a stable state. Figure 5 It can be seen that when the frequency of the externally applied voltage decreases, the average number of electrons decreases, the average electron energy increases, and the average power decreases, and the plasma discharge is more likely to develop into a stable state. Therefore, in the above step S104, when the state of the plasma is an unstable state, the plasma state can be adjusted to a stable state by reducing the amplitude of the externally applied voltage or reducing the frequency of the externally applied voltage.

[0066] Figure 6A plasma discharge stability control system is proposed according to an exemplary embodiment. The system includes a waveform sampling device, a host computer, and a control device. The waveform sampling device is used to obtain the discharge current peak value of the plasma in each discharge cycle; the host computer is used to calculate the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​according to the discharge current peak values; the state of the plasma is judged according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values; the control device is used to adjust the control parameters of the external power supply of the plasma according to the state of the plasma.

[0067] The system also includes a power supply device for providing the electric energy required by the system; and an alarm device for sending an alarm signal when the state of the plasma is unstable.

[0068] exist Figure 6 In the present invention, the plasma discharge device is a dielectric barrier discharge device, and the alarm device is an alarm light. The current acquisition device acquires current from the dielectric barrier discharge device, obtains the discharge current peak value of the plasma in each discharge cycle through the waveform sampling device, and then inputs the acquired current into the host computer for real-time analysis to determine whether the difference between the discharge current peak values ​​of multiple discharge cycles is greater than the difference threshold. When the difference between any two discharge cycles is greater than the preset difference threshold, the plasma discharge device is determined to be in a time domain unstable state, and the alarm light is on. The control device adjusts the external applied voltage amplitude or the external applied voltage frequency of the plasma until the state of the plasma is stable. The adjustment amplitude of the external applied voltage amplitude is set to 25kV each time, and the adjustment amplitude of the external applied voltage frequency is set to 3kHz each time. After each adjustment is completed, the state of the plasma discharge device is re-judged until the state of the plasma discharge device is stable, the alarm light goes out, and the control is completed.

[0069] Figure 7 The following is the control flow chart of the system. The system monitors the discharge current peaks of multiple discharge cycles before the current moment to determine whether the plasma discharge device is stable. When the state of the plasma discharge device is determined to be unstable based on the discharge current peak, the alarm light is always on. At this time, the system determines whether it is the first adjustment. When the system is adjusting the plasma discharge device for the first time, a prompt to select the externally applied voltage amplitude and the externally applied voltage frequency will appear. The user chooses to adjust the externally applied voltage amplitude or the externally applied voltage frequency according to the prompt, and then locks the control device to control the externally applied voltage amplitude or the externally applied voltage frequency until the state of the plasma discharge device is stable, the alarm light goes out, the control option is unlocked, and the control ends.

[0070] Based on the same inventive concept, the present invention also provides a plasma discharge stability control device, such as Figure 8As shown, the device comprises:

[0071] The acquisition module 801 is used to acquire the discharge current peak value of the plasma in each discharge cycle; for details, please refer to the description of step S101 in the above embodiment, which will not be repeated here.

[0072] The calculation module 802 is used to calculate the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​according to the discharge current peak values; for details, please refer to the description of step S102 in the above embodiment, which will not be repeated here.

[0073] The judgment module 803 is used to judge the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between each discharge current peak value; for details, please refer to the description of step S103 in the above embodiment, which will not be repeated here.

[0074] The adjustment module 804 is used to adjust the control parameters of the external power supply of the plasma according to the state of the plasma. For details, please refer to the description of step S104 in the above embodiment, which will not be repeated here.

[0075] Through the above device, the discharge current peak of the plasma in each discharge cycle is obtained according to actual needs, the discharge current peak is associated with the state of the plasma, and then the external power supply control parameters are changed according to the state of the plasma, so as to realize real-time monitoring of the plasma discharge stability, keep the plasma in a stable state, and improve the accuracy and stability of the plasma.

[0076] In one example, the adjustment module 804 includes:

[0077] The regulating submodule is used to adjust the external power supply control parameters of the plasma when the plasma is in an unstable state until the plasma is in a stable state. For details, please refer to the description in the above embodiment, which will not be repeated here.

[0078] In an optional embodiment, the external power supply control parameter in the adjustment submodule includes any one of the external applied voltage amplitude and the external applied voltage frequency. For details, please refer to the description in the above embodiment, which will not be repeated here.

[0079] In an optional embodiment, the regulating submodule includes:

[0080] The regulating unit is used to reduce the amplitude of the externally applied voltage or the frequency of the externally applied voltage when the plasma is in an unstable state. For details, please refer to the description in the above embodiment, which will not be repeated here.

[0081] In one example, the calculation module 802 includes:

[0082] The calculation submodule is used to calculate the average of the discharge current peak values ​​according to the discharge current peak values. For details, please refer to the description in the above embodiment and will not be repeated here.

[0083] The determination submodule is used to determine the difference threshold between the peak values ​​of the discharge current according to the mean of the preset ratio. For details, please refer to the description in the above embodiment, which will not be repeated here.

[0084] In one example, the determination module 803 includes:

[0085] The determination submodule is used to determine that the state of the plasma is an unstable state when at least one difference value is greater than a difference value threshold value. For details, please refer to the description in the above embodiment, which will not be repeated here.

[0086] The specific definition and beneficial effects of the above-mentioned device can be found in the definition of the plasma discharge stability control method above, which will not be repeated here. The above-mentioned modules can be implemented in whole or in part by software, hardware and a combination thereof. The above-mentioned modules can be embedded in or independent of the processor in the computer device in the form of hardware, or can be stored in the memory in the computer device in the form of software, so that the processor can call and execute the operations corresponding to the above modules.

[0087] Fig. 9 FIG. 1 is a schematic diagram of a hardware structure of a computer device according to an exemplary embodiment. Fig. 9 As shown, the device includes one or more processors 910 and a memory 920, and the memory 920 includes a persistent memory, a volatile memory, and a hard disk. Fig. 9 A processor 910 is taken as an example. The device may also include: an input device 930 and an output device 940.

[0088] The processor 910, the memory 920, the input device 930 and the output device 940 may be connected via a bus or other means. Fig. 9 The example of connecting through bus is taken in the following.

[0089] The processor 910 may be a central processing unit (CPU). The processor 910 may also be other general-purpose processors, digital signal processors (DSP), application-specific integrated circuits (ASIC), field-programmable gate arrays (FPGA) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, or a combination of the above chips. A general-purpose processor may be a microprocessor or the processor may be any conventional processor.

[0090] The memory 920 is a non-transient computer-readable storage medium, including a persistent memory, a volatile memory, and a hard disk, and can be used to store non-transient software programs, non-transient computer executable programs, and modules, such as program instructions / modules corresponding to the plasma discharge stability control method in the embodiment of the present application. The processor 910 executes various functional applications and data processing of the server by running the non-transient software programs, instructions, and modules stored in the memory 920, that is, implementing any of the above-mentioned plasma discharge stability control methods.

[0091] The memory 920 may include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application required by at least one function; the data storage area may store data required for use, etc. In addition, the memory 920 may include a high-speed random access memory, and may also include a non-transitory memory, such as at least one disk storage device, a flash memory device, or other non-transitory solid-state storage device. In some embodiments, the memory 920 may optionally include a memory remotely arranged relative to the processor 910, and these remote memories may be connected to the data processing device via a network. Examples of the above-mentioned network include, but are not limited to, the Internet, an intranet, a local area network, a mobile communication network, and combinations thereof.

[0092] The input device 930 can receive input digital or character information and generate signal input related to user settings and function control. The output device 940 can include display devices such as display screens.

[0093] One or more modules are stored in the memory 920, and when executed by one or more processors 910, the execution is as follows: Figure 1 The method shown.

[0094] The above-mentioned product can execute the method provided by the embodiment of the present invention, and has the functional modules and beneficial effects corresponding to the execution method. For technical details not described in detail in this embodiment, please refer to Figure 1 Related description of the illustrated embodiment.

[0095] The embodiment of the present invention further provides a non-transitory computer storage medium, which stores computer executable instructions, and the computer executable instructions can execute the control method in any of the above method embodiments. Among them, the storage medium can be a disk, an optical disk, a read-only memory (ROM), a random access memory (RAM), a flash memory (Flash Memory), a hard disk (HDD) or a solid-state drive (SSD), etc.; the storage medium can also include a combination of the above types of memory.

[0096] It should be noted that, in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0097] The above is only a specific embodiment of the present invention, so that those skilled in the art can understand or implement the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but should conform to the widest scope consistent with the principles and novel features applied herein.

Claims

1. A plasma discharge stability control method, characterized in that: The method comprises: Obtaining the discharge current peak value of the plasma in each discharge cycle; Calculating a difference threshold between the discharge current peak values ​​and a difference between the discharge current peak values ​​according to the discharge current peak values; Determining the state of the plasma according to a difference threshold between discharge current peak values ​​and a difference between each of the discharge current peak values; According to the state of the plasma, adjusting the control parameters of the external power supply of the plasma; When the state of the plasma is an unstable state, adjusting the external power supply control parameter of the plasma until the state of the plasma is a stable state, the external power supply control parameter including any one of an externally applied voltage amplitude and an externally applied voltage frequency; When the state of the plasma is in an unstable state, adjusting the control parameters of the external power supply of the plasma until the state of the plasma is in a stable state includes: When the state of the plasma is unstable, determine whether it is the first adjustment. If it is the first adjustment, select the external applied voltage amplitude or the external applied voltage frequency for adjustment, lock the control device to reduce the external applied voltage amplitude or the external applied voltage frequency for regulation, until the state of the plasma discharge device is stable, and unlock the control option.

2. The method according to claim 1, characterized in that Calculating a difference threshold between the discharge current peak values ​​according to the discharge current peak values, including: Calculating the average of the discharge current peak values ​​according to the discharge current peak values; A difference threshold between discharge current peak values ​​is determined according to the mean values ​​of the preset ratio.

3. The method according to claim 1 or 2, characterized in that: Judging the state of the plasma according to a difference threshold between discharge current peak values ​​and a difference between each of the discharge current peak values, comprises: When there is at least one of the differences greater than the difference threshold, it is determined that the state of the plasma is an unstable state.

4. The method according to claim 1, characterized in that When the state of the plasma is an unstable state, adjusting the control parameters of the external power supply of the plasma includes: When the state of the plasma is an unstable state, the amplitude of the externally applied voltage is reduced, or the frequency of the externally applied voltage is reduced.

5. A plasma discharge stability control system, characterized in that: The system includes: a waveform sampling device, a host computer, and a control device; The waveform sampling device is used to obtain the discharge current peak value of the plasma in each discharge cycle; The host computer is used to calculate the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values ​​according to the discharge current peak values; and judge the state of the plasma according to the difference threshold between the discharge current peak values ​​and the difference between the discharge current peak values; The control device is used to adjust the external power control parameters of the plasma according to the state of the plasma; when the state of the plasma is an unstable state, adjust the external power control parameters of the plasma until the state of the plasma is a stable state, and the external power control parameters include any one of the external applied voltage amplitude and the external applied voltage frequency; when the state of the plasma is an unstable state, adjust the external power control parameters of the plasma until the state of the plasma is a stable state, including: when the state of the plasma is an unstable state, determine whether it is the first adjustment, when it is the first adjustment, select the external applied voltage amplitude or the external applied voltage frequency for adjustment, lock the control device to reduce the external applied voltage amplitude or the external applied voltage frequency until the state of the plasma discharge device is a stable state, and unlock the control option.

6. The system according to claim 5, characterized in that The system further comprises: The alarm device is used to send out an alarm signal when the state of the plasma is unstable.

7. A computer device, characterized in that: The invention comprises a memory and a processor, wherein the memory and the processor are connected to communicate with each other, the memory stores computer instructions, and the processor executes the steps of the plasma discharge stability control method according to any one of claims 1 to 4 by executing the computer instructions.

8. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the plasma discharge stability control method according to any one of claims 1 to 4 are implemented.

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