A waste self-cleaning etching mold structure and use method thereof

Abstract

The present invention discloses a waste self-cleaning etching mold structure and a method for using the same, and relates to the field of etching mold structures. A waste self-cleaning etching mold structure comprises a lower mold, wherein an etching chamber and a waste liquid treatment chamber are arranged in the lower mold, and further comprises: a screw rod, which is slidably connected in the lower mold, and one end of the screw rod is located in the etching chamber; a liquid discharge port, which is arranged in the screw rod, and the liquid outlet end of the liquid discharge port is located in the waste liquid treatment chamber; a floating plate, which is connected to the screw rod, and the floating plate is located in the etching chamber; the present invention uses the arrangement of a piston cylinder, a screw rod, a floating plate and other devices, and the buoyancy generated by the liquid rise causes the rotating plate to rotate, thereby preventing waste residue from being deposited and adhering to the bottom of the etching chamber, and facilitating the discharge of waste residue; at the same time, through the arrangement of the piston cylinder and the liquid discharge port, waste residue and waste liquid are separated, and waste residue is discharged at the same time, which facilitates the classification and treatment of waste residue and waste liquid.

Description

Technical Field

[0001] The invention belongs to the technical field of etching mold structures, and in particular relates to a waste self-cleaning etching mold structure and a use method thereof. Background Art

[0002] Etching usually refers to etching, also known as photochemical etching, which refers to the removal of the protective film of the area to be etched after exposure and development. During etching, it comes into contact with chemical solutions to achieve the effect of dissolving and corroding, forming a concave-convex or hollow-out effect.

[0003] When the existing etching mold is in use, a large amount of waste liquid containing metal waste slag will be generated. These waste slags are also waste materials. They are very small and can easily be deposited at the bottom of the etching cavity in the mold. Since the waste materials in the waste liquid have a certain recycling value, in order to avoid waste, the metal waste slag in the waste liquid is usually collected. However, the existing etching mold does not have the function of separating the waste slag from the waste liquid when in use. Therefore, it is necessary to separate the waste liquid separately in the subsequent process. Since the waste slag will accumulate in the mold, the long-term accumulation will cause the waste slag to adhere to the mold. At this time, it is necessary to stop the work and align for processing, which affects the work efficiency and is inconvenient to use.

[0004] In view of this, the present invention is proposed. Summary of the invention

[0005] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a waste self-cleaning etching mold structure that can overcome the above problems or at least partially solve the above problems.

[0006] In order to solve the above technical problems, the present invention mainly includes the basic concept of the technical solution: a waste self-cleaning etching mold structure, including a lower mold, wherein the lower mold is provided with an etching cavity and a waste liquid treatment cavity, and further comprising:

[0007] A screw rod is slidably connected in the lower mold, and one end of the screw rod is located in the etching cavity;

[0008] A liquid discharge port is arranged in the screw rod, and a liquid outlet end of the liquid discharge port is located in the waste liquid treatment chamber;

[0009] A floating plate connected to the lead screw, and the floating plate is located in the etching chamber;

[0010] A shaft sleeve is rotatably connected in the etching chamber, and the shaft sleeve is threadedly connected to the lead screw;

[0011] Four groups of fixed blocks, fixedly connected in the waste liquid treatment chamber, wherein two groups of the fixed blocks are connected with extrusion springs;

[0012] A filter screen is obliquely arranged in the waste liquid treatment chamber, one end of the filter screen is connected to the extrusion spring, and the other end of the filter screen is connected to the fixed block;

[0013] A piston cylinder is fixedly connected in the lower mold, and the telescopic end of the piston cylinder is located outside the lower mold;

[0014] A liquid inlet pipe is connected to the piston cylinder, a liquid inlet end of the liquid inlet pipe is communicated with the etching chamber, and a one-way valve is connected inside the liquid inlet pipe;

[0015] A liquid outlet pipe is connected to the piston cylinder, a one-way valve is arranged in the liquid outlet pipe, the other end of the liquid outlet pipe is communicated with the waste liquid treatment chamber, and the liquid outlet end of the liquid outlet pipe is located above the filter screen.

[0016] In order to facilitate the rapid flow of waste liquid in the waste liquid pipe, the cam can quickly squeeze the filter screen. Furthermore, a fan blade is rotatably connected in the liquid outlet pipe, a transmission shaft is fixedly connected to the fan blade, and a cam is fixedly connected to the transmission shaft.

[0017] In order to facilitate the rotation of the transmission shaft, further, a support rod is fixedly connected inside the liquid outlet pipe, a rotating shaft is fixedly connected to the support rod, and the transmission shaft is connected to the rotating shaft.

[0018] In order to facilitate the movement of the baffle through the rapid flow of liquid, further, a piston rod is fixedly connected in the lower mold, and a baffle is fixedly connected to the telescopic end of the piston rod, the baffle is in contact with the liquid outlet end of the liquid outlet pipe, and the baffle is slidably connected to the transmission shaft.

[0019] In order to shorten the piston rod 2 by extending the piston rod 1, so as to facilitate the adjustment of the inclination angle of the filter screen and the discharge of the waste residue on the filter screen, the fixing block is fixedly connected with the piston rod 2, and the piston rod 2 is connected with a connecting pipe, and the other end of the connecting pipe is connected with the piston rod 1.

[0020] In order to facilitate the rotation of the rotating plate, further, the rotating plate is rotatably connected to a plurality of rotating wheels, and the rotating wheels are in contact with the bottom of the etching chamber.

[0021] In order to facilitate the discharge of waste residues on the filter screen, the lower mold is further provided with a residue discharge port and a sewage discharge port, the sewage discharge port is communicated with the waste liquid treatment chamber, the residue discharge port is located on the sewage discharge port, and the residue discharge port is inclined, and the higher end of the residue discharge port is in contact with the lower end of the filter screen.

[0022] In order to place the plate to be etched, a positioning block is further fixedly connected in the etching chamber.

[0023] In order to facilitate etching of the plate, further, an upper mold is provided above the lower mold, a mounting cavity is provided in the upper mold, and a plurality of groups of liquid spray heads are connected in the mounting cavity.

[0024] A method for using a waste self-cleaning etching mold mainly comprises the following steps:

[0025] S1. When in use, place the plate to be etched on the positioning block, then fit the upper mold with the lower mold, and continuously spray the etching liquid through the spray head in the upper mold to etch the plate. At the same time, the waste liquid generated by etching will flow to the bottom of the etching chamber. At this time, the floating plate will rise with the increase of waste liquid, causing the shaft sleeve to rotate, so that the metal debris deposited at the bottom of the etching chamber will float up again, and be discharged through the drain port and fall into the waste liquid treatment chamber for treatment;

[0026] S2. After processing a plate, the upper mold stops spraying the etching liquid and resets. At this time, the plate after etching is taken out, and a new plate is put into it, and the upper mold is moved down again and the etching liquid is sprayed. In this process, the upper mold is first moved up, and the piston cylinder is reset to absorb a large amount of waste liquid accumulated in the etching chamber. At the same time, as the liquid drops, the floating plate drops quickly, and the shaft sleeve rotates, so that the accumulated waste residue floats again, so that the waste residue accumulated at the bottom of the etching chamber can be discharged through the drain port or the liquid inlet pipe;

[0027] Subsequently, as the upper mold approaches the lower mold, the piston cylinder is squeezed to discharge the previously collected waste liquid and discharge it through the liquid outlet pipe, generating waste liquid with a faster flow rate, which impacts the filter screen, promotes the separation of waste residue and liquid in the waste liquid, and at the same time causes the filter screen to vibrate to a certain extent, promoting the discharge of waste residue.

[0028] After adopting the above technical scheme, the present invention has the following beneficial effects compared with the prior art: the present invention, through the arrangement of devices such as a piston cylinder, a screw rod, and a floating plate, rotates the rotating plate through the buoyancy generated by the rising liquid, thereby preventing waste residue from being deposited and adhering to the bottom of the etching chamber, and facilitating the discharge of the waste residue. At the same time, through the arrangement of the piston cylinder and the drain port, the waste residue and the waste liquid are separated, and the waste residue is discharged at the same time, which facilitates the classification and treatment of the waste residue and the waste liquid.

[0029] The specific implementation modes of the present invention are further described in detail below in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The accompanying drawings are part of the present invention and are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention, but do not constitute an improper limitation of the present invention. Obviously, the accompanying drawings described below are only some embodiments. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without creative work.

[0031] In the attached picture:

[0032] Figure 1 A three-dimensional schematic diagram of a waste self-cleaning etching mold structure proposed by the present invention Figure 1 ;

[0033] Figure 2 A waste self-cleaning etching mold structure proposed by the present invention Figure 1 The structural diagram of A in the figure;

[0034] Figure 3 A waste self-cleaning etching mold structure proposed by the present invention Figure 1 Schematic diagram of the structure of B;

[0035] Figure 4 A waste self-cleaning etching mold structure proposed by the present invention Figure 1 Schematic diagram of the structure of C;

[0036] Figure 5 A waste self-cleaning etching mold structure proposed by the present invention Figure 1 Schematic diagram of the structure of D;

[0037] Figure 6 A three-dimensional schematic diagram of a screw rod in a waste self-cleaning etching mold structure proposed by the present invention Figure 1 ;

[0038] Figure 7 A three-dimensional schematic diagram of a screw rod in a waste self-cleaning etching mold structure proposed by the present invention Figure 2 .

[0039] In the figure: 1. lower mold; 101. etching chamber; 102. positioning block; 103. waste liquid treatment chamber; 104. slag discharge port; 105. sewage discharge port; 2. upper mold; 201. installation chamber; 202. spray head; 3. piston cylinder; 301. liquid inlet pipe; 302. liquid outlet pipe; 401. floating plate; 402. screw rod; 4021. liquid discharge port; 403. bushing; 4031. rotating plate; 4032. rotating wheel; 501. fan blade; 502. transmission shaft; 503. cam; 6. filter screen; 601. fixing block; 602. extrusion spring; 701. piston rod one; 7011. baffle; 702. connecting pipe; 703. piston rod two.

[0040] It should be noted that these drawings and textual descriptions are not intended to limit the conceptual scope of the present invention in any way, but are intended to illustrate the concept of the present invention for those skilled in the art by referring to specific embodiments. Implementation

[0041] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. The following embodiments are used to illustrate the present invention but are not used to limit the scope of the present invention. Example

[0042] Reference Figure 1-7 A waste self-cleaning etching mold structure includes a lower mold 1, in which an etching chamber 101 and a waste liquid treatment chamber 103 are arranged, and further includes: a screw rod 402, which is slidably connected in the lower mold 1, one end of the screw rod 402 is located in the etching chamber 101, and the lower part of the screw rod 402 is a light rod for hanging light, and a card slot is arranged on the upper part to facilitate the upward and downward movement of the screw rod 402; a liquid discharge port 4021, which is arranged in the screw rod 402, and the liquid outlet end of the liquid discharge port 4021 is located in the waste liquid treatment chamber 103; a floating The floating plate 401 is connected to the screw rod 402, and the floating plate 401 is located in the etching chamber 101; the shaft sleeve 403 is rotatably connected in the etching chamber 101, and the shaft sleeve 403 is threadedly connected to the screw rod 402; four groups of fixed blocks 601 are fixedly connected in the waste liquid treatment chamber 103, and two groups of fixed blocks 601 are connected to the extrusion spring 602; the filter screen 6 is obliquely arranged in the waste liquid treatment chamber 103, and one end of the filter screen 6 is connected to the extrusion spring 602, and the filter screen 6 The other end is connected to the fixed block 601; the piston cylinder 3 is fixedly connected to the lower mold 1, and the telescopic end of the piston cylinder 3 is located outside the lower mold 1; the liquid inlet pipe 301 is connected to the piston cylinder 3, the liquid inlet end of the liquid inlet pipe 301 is connected to the etching chamber 101, and a one-way valve is connected to the liquid inlet pipe 301; the liquid outlet pipe 302 is connected to the piston cylinder 3, a one-way valve is provided in the liquid outlet pipe 302, the other end of the liquid outlet pipe 302 is connected to the waste liquid treatment chamber 103, and the liquid outlet end of the liquid outlet pipe 302 is located Above the filter screen 6, a slag discharge port 104 and a sewage discharge port 105 are provided in the lower mold 1. The sewage discharge port 105 is communicated with the waste liquid treatment chamber 103. The slag discharge port 104 is located on the sewage discharge port 105, and the slag discharge port 104 is inclined. The higher end of the slag discharge port 104 is in contact with the lower end of the filter screen 6. A positioning block 102 is fixedly connected in the etching chamber 101. An upper mold 2 is provided above the lower mold 1. An installation cavity 201 is provided in the upper mold 2. A plurality of groups of liquid spray heads 202 are connected in the installation cavity 201.

[0043] When the device is in use, the lower mold 1 needs to be fixed on the machine tool, and the upper mold 2 needs to be fixed on the telescopic rod on the machine tool. At the same time, an external liquid storage tank is provided, and the etching liquid is filled inside and pumped out by a water pump, so that the etching liquid can be discharged through the liquid spray head 202. After the preparation is completed, the plate to be etched, such as a copper plate, can be placed. At this time, alkaline copper chloride etching liquid can be used. The specific plate and etching liquid used need to be selected according to the actual situation. At the same time, a protective film needs to be attached to the copper plate. This protective film is used to protect part of the copper plate, so that the etching liquid can corrode the copper plate and form various patterns.

[0044] Specifically, when in use, the copper plate to be etched is placed on the positioning block 102 in the etching chamber 101, and then the telescopic rod is started. The upper mold 2 is made close to the lower mold 1 by the extension of the telescopic rod. At this time, the etching liquid can be pumped out by the water pump to etch the surface of the copper plate, and the waste liquid after etching will fall into the bottom of the etching chamber 101 below. As the waste liquid in the etching chamber 101 accumulates, the floating plate 401 will rise, and then the screw rod 402 will slowly move up. At this time, under the action of the thread, the sleeve 403 slowly rotates, and then the rotating plate 4031 moves to contact the waste accumulated at the bottom of the etching chamber 101, so that it floats in the waste liquid again. Figure 6 As shown, drain ports 4021 are provided in the screw rod 402, and are divided into three groups. In the default state of the device, only one group of drain ports 4021 is always in contact with the waste liquid in the etching chamber 101, so that the waste liquid enters the waste liquid treatment chamber 103 below through the drain ports 4021. As the liquid rises, the three groups of drain ports 4021 are finally in contact with the waste liquid, which is convenient for the discharge of the waste liquid. At the same time, the generation speed of the waste liquid is greater than the discharge speed of the two groups of drain ports 4021, but less than the discharge speed of the three groups of drain ports 4021. The discharged waste liquid will first fall on the filter screen 6. Since one end of the filter screen 6 is connected to the extrusion spring 602, the falling of the waste liquid at this time will cause the filter screen 6 to shake up and down to a certain extent. At this time, the waste residue, i.e., the waste material, filtered and intercepted by the filter screen 6 will continue to jump, and finally come to the lower place and be discharged through the residue discharge port 104. The user needs to set a collection box at the residue discharge port 104 to collect the waste residue for easy recycling.

[0045] After the etching of a copper plate is completed, the water pump is turned off, the telescopic rod is retracted, and the upper mold 2 is moved away from the lower mold 1. At this time, the copper plate after etching is taken out, a new copper plate is placed, the telescopic rod is extended again, and the water pump is started;

[0046] In this process, first, as the upper mold 2 moves away, the piston cylinder 3 is no longer squeezed and resets itself. Since both the liquid inlet pipe 301 and the liquid outlet pipe 302 are provided with a one-way valve, and the one-way valve has the effect of a mobile pressure valve, that is, it will open only when it receives pressure, so as to facilitate the discharge of the liquid, at this time, as the piston cylinder 3 is reset, the liquid inlet pipe 301 absorbs the remaining waste liquid in the etching chamber 101, and the height of the waste liquid drops rapidly at this time, and the floating plate 401 moves downward rapidly, thereby causing the rotating plate 4031 to rotate faster, stirring the waste residue accumulated at the bottom of the etching chamber 101 to make it float again, so as to facilitate the absorption of the waste liquid containing the waste residue by the liquid inlet pipe 301 and the liquid outlet 4021. At this time, a large amount of waste liquid will enter the piston cylinder 3;

[0047] Subsequently, as the upper mold 2 is again fitted with the lower mold 1, the piston cylinder 3 is squeezed and the accumulated waste liquid is discharged through the liquid outlet pipe 302. Since the copper plate replacement time is short, the waste residue in the waste liquid in the piston cylinder 3 is still in a floating state at this time, which is convenient for the discharge of the waste residue. As the upper mold 2 quickly squeezes the piston cylinder 3, the internal waste liquid will be quickly discharged. At this time, the waste liquid will impact the filter screen 6, causing the filter screen 6 to vibrate to a certain extent. At the same time, the fast-flowing liquid generated will push the waste residue on the filter screen 6 to move it. The combined effect of shaking facilitates the discharge of the waste residue. Example

[0048] Reference Figure 1-5 A waste self-cleaning etching mold structure is basically the same as Example 1, and further: a fan blade 501 is rotatably connected in the liquid outlet pipe 302, a transmission shaft 502 is fixedly connected to the fan blade 501, a cam 503 is fixedly connected to the transmission shaft 502, a support rod is fixedly connected in the liquid outlet pipe 302, a rotating shaft is fixedly connected to the support rod, and the transmission shaft 502 is connected to the rotating shaft.

[0049] When the waste liquid in the piston cylinder 3 is discharged quickly, it will drive the fan blade 501 to rotate, and then the cam 503 will rotate, squeezing the surface of the filter screen 6, causing the waste residue on the filter screen 6 to jump, so that the waste residue left on the filter screen 6 can move to the lower end of the inclined filter screen 6, and finally be discharged through the residue discharge port 104. Example

[0050] Reference Figure 1-5 , a waste self-cleaning etching mold structure, which is basically the same as Example 2, and further: a piston rod 1 701 is fixedly connected in the lower mold 1, and a baffle 7011 is fixedly connected to the telescopic end of the piston rod 1 701, the baffle 7011 is in contact with the liquid outlet end of the liquid outlet pipe 302, and the baffle 7011 is slidably connected to the transmission shaft 502, and a piston rod 2 703 is fixedly connected to the fixed block 601, and a connecting pipe 702 is connected to the piston rod 1 701. The other end of the connecting pipe 702 is connected to the piston rod 1 701.

[0051] By setting the baffle 7011, when the liquid is discharged from the liquid outlet pipe 302, it will move under the action of the impact force, thereby extending the piston rod 1 701 and then contracting the piston rod 2 703. At this time, the inclination angle of the filter screen 6 increases, which is convenient for the discharge of waste residue. Example

[0052] Reference Figure 4A waste self-cleaning etching mold structure is basically the same as Example 3, and further: a plurality of rotating wheels 4032 are rotatably connected to a rotating plate 4031, the rotating wheels 4032 are attached to the bottom of the etching chamber 101, and the rotating wheels 4032 do not overlap with the position of the liquid inlet pipe 301.

[0053] The provision of the rotating wheel 4032 facilitates the rotation of the rotating plate 4031 , thereby preventing the rotating plate 4031 from being attached to the bottom of the etching chamber 101 , thereby facilitating the rotation of the rotating plate 4031 . Example

[0054] Reference Figure 1-7 A method for using a waste self-cleaning etching mold mainly includes the following steps:

[0055] S1. When in use, the plate to be etched is placed on the positioning block 102, and then the upper mold 2 is fitted with the lower mold 1. The etching liquid is continuously sprayed by the liquid spray head 202 in the upper mold 2 to etch the plate. At the same time, the waste liquid generated by the etching will flow to the bottom of the etching chamber 101. At this time, the floating plate 401 will rise with the increase of the waste liquid, so that the shaft sleeve 403 rotates, so that the waste liquid at the bottom flows, so that the metal debris, i.e., the waste material, deposited at the bottom of the etching chamber 101 floats up again, and is discharged through the drain port 4021, falls into the waste liquid treatment chamber 103, and comes to the filter screen 6, and the waste liquid and waste residue are filtered and separated by the filter screen 6;

[0056] S2. After processing a plate, the upper mold 2 stops spraying the etching liquid and resets. At this time, the plate after etching is taken out, and a new plate is put into it, and the upper mold 2 is moved down again and the etching liquid is sprayed. In this process, the upper mold 2 is first moved up, and the piston cylinder 3 is reset to absorb a large amount of waste liquid accumulated in the etching chamber 101. At the same time, as the liquid descends, the floating plate 401 descends rapidly, and the shaft sleeve 403 rotates, so that the accumulated waste residue floats again, so that the waste residue accumulated at the bottom of the etching chamber 101 can be discharged through the drain port 4021 or the liquid inlet pipe 301;

[0057] Subsequently, as the upper mold 2 approaches the lower mold 1, the piston cylinder 3 is squeezed to discharge the previously collected waste liquid, and discharges it through the liquid outlet pipe 302, generating waste liquid with a faster flow rate, impacting the filter screen 6, promoting the separation of waste residue and liquid in the waste liquid, and at the same time causing the filter screen 6 to produce a certain degree of shaking, promoting the discharge of waste residue.

[0058] The present invention arranges the piston cylinder 3, the screw rod 402, the floating plate 401 and other devices, and the buoyancy generated by the liquid rise causes the rotating plate 4031 to rotate, so as to prevent the waste residue from being deposited and adhering to the bottom of the etching chamber 101, thereby facilitating the discharge of the waste residue. At the same time, the waste residue is separated from the waste liquid through the arrangement of the piston cylinder 3 and the liquid discharge port 4021, and the waste residue is discharged at the same time, so as to facilitate the classification and treatment of the waste residue and the waste liquid.

[0059] In the description provided herein, a large number of specific details are described. However, it is understood that embodiments of the present invention can be practiced without these specific details. In some instances, well-known methods, structures and techniques are not shown in detail so as not to obscure the understanding of this description.

[0060] The above is only a preferred embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment, it is not used to limit the present invention. Any technician familiar with this patent can make some changes or modify the technical contents suggested above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the solution of the present invention.

Claims

1. A waste self-cleaning etching mold structure, comprising a lower mold (1), wherein the lower mold (1) is provided with an etching chamber (101) and a waste liquid treatment chamber (103), characterized in that: It also includes: a screw rod (402) slidably connected in the lower mold (1), and one end of the screw rod (402) is located in the etching cavity (101); A liquid discharge port (4021) is arranged in the screw rod (402), and a liquid outlet end of the liquid discharge port (4021) is located in the waste liquid treatment chamber (103); A floating plate (401) connected to the lead screw (402), and the floating plate (401) is located in the etching chamber (101); A shaft sleeve (403) is rotatably connected in the etching chamber (101), and the shaft sleeve (403) is threadedly connected to the lead screw (402); Four groups of fixed blocks (601) are fixedly connected in the waste liquid treatment chamber (103), wherein two groups of the fixed blocks (601) are connected with compression springs (602); A filter screen (6) is obliquely arranged in the waste liquid treatment chamber (103), one end of the filter screen (6) is connected to a squeeze spring (602), and the other end of the filter screen (6) is connected to a fixed block (601); A piston cylinder (3) is fixedly connected inside the lower mold (1), and the telescopic end of the piston cylinder (3) is located outside the lower mold (1); A liquid inlet pipe (301) is connected to the piston cylinder (3), the liquid inlet end of the liquid inlet pipe (301) is in communication with the etching chamber (101), and a one-way valve is connected inside the liquid inlet pipe (301); A liquid outlet pipe (302) is connected to the piston cylinder (3), a one-way valve is provided in the liquid outlet pipe (302), the other end of the liquid outlet pipe (302) is communicated with the waste liquid treatment chamber (103), and the liquid outlet end of the liquid outlet pipe (302) is located above the filter screen (6).

2. A waste self-cleaning etching mold structure according to claim 1, characterized in that: A fan blade (501) is rotatably connected inside the liquid outlet pipe (302), a transmission shaft (502) is fixedly connected to the fan blade (501), and a cam (503) is fixedly connected to the transmission shaft (502).

3. A waste self-cleaning etching mold structure according to claim 2, characterized in that: A support rod is fixedly connected inside the liquid outlet pipe (302), a rotating shaft is fixedly connected to the support rod, and the transmission shaft (502) is connected to the rotating shaft.

4. A waste self-cleaning etching mold structure according to claim 2, characterized in that: A piston rod 1 (701) is fixedly connected inside the lower mold (1), and a baffle (7011) is fixedly connected to the telescopic end of the piston rod 1 (701), the baffle (7011) is in contact with the liquid outlet end of the liquid outlet pipe (302), and the baffle (7011) is slidably connected to the transmission shaft (502).

5. A waste self-cleaning etching mold structure according to claim 4, characterized in that: The fixed block (601) is fixedly connected to a second piston rod (703), the second piston rod (703) is connected to a connecting pipe (702), and the other end of the connecting pipe (702) is in communication with the first piston rod (701).

6. The waste self-cleaning etching mold structure according to claim 1, characterized in that: The outer wall of the shaft sleeve (403) is fixedly connected with a rotating plate (4031), and a plurality of groups of rotating wheels (4032) are rotatably connected to the rotating plate (4031), and the rotating wheels (4032) are in contact with the bottom of the etching chamber (101).

7. The waste self-cleaning etching mold structure according to claim 1, characterized in that: The lower mold (1) is provided with a slag discharge port (104) and a sewage discharge port (105), the sewage discharge port (105) is communicated with the waste liquid treatment chamber (103), the slag discharge port (104) is located on the sewage discharge port (105), and the slag discharge port (104) is inclined, and the higher end of the slag discharge port (104) is in contact with the lower end of the filter screen (6).

8. The waste self-cleaning etching mold structure according to claim 6, characterized in that: A positioning block (102) is fixedly connected inside the etching chamber (101).

9. The waste self-cleaning etching mold structure according to claim 8, characterized in that: An upper mold (2) is arranged above the lower mold (1), a mounting cavity (201) is arranged in the upper mold (2), and a plurality of groups of liquid spray heads (202) are connected in the mounting cavity (201).

10. A method for using a waste self-cleaning etching mold, comprising the waste self-cleaning etching mold structure according to claim 9, characterized in that: The method comprises the following steps: S1, when in use, placing a plate to be etched on a positioning block (102), then fitting an upper mold (2) with a lower mold (1), and continuously spraying etching liquid through a liquid spray head (202) in the upper mold (2) to etch the plate, while waste liquid generated by etching will flow to the bottom of the etching chamber (101), at which time the floating plate (401) will rise as the waste liquid increases, causing the shaft sleeve (403) to rotate, so that the metal debris deposited at the bottom of the etching chamber (101) will float up again, and be discharged through a liquid discharge port (4021), and fall into a waste liquid treatment chamber (103) for treatment; S2. After processing a plate, the upper mold (2) stops spraying the etching liquid and resets. At this time, the plate after etching is taken out and a new plate is placed therein. The upper mold (2) is moved down again and the etching liquid is sprayed. In this process, the upper mold (2) is first moved up, and the piston cylinder (3) is reset to absorb a large amount of waste liquid accumulated in the etching chamber (101). At the same time, as the liquid descends, the floating plate (401) is rapidly lowered, and the shaft sleeve (403) rotates, so that the accumulated waste residue floats again, so that the waste residue accumulated at the bottom of the etching chamber (101) can be discharged through the drain port (4021) or the liquid inlet pipe (301); Subsequently, as the upper mold (2) approaches the lower mold (1), the piston cylinder (3) is squeezed to discharge the previously collected waste liquid, and discharges it through the liquid outlet pipe (302), generating waste liquid with a faster flow rate, impacting the filter screen (6), promoting the separation of waste residue and liquid in the waste liquid, and at the same time causing the filter screen (6) to produce a certain degree of shaking, promoting the discharge of waste residue.

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